Abstract: Disclosed herein are cleaner/corrosion inhibiting compositions useful in applications relating to the production, transportation, storage, and separation of crude oil and natural gas. Also disclosed herein are methods of using the compositions as cleaners/corrosion inhibitors, particularly in applications relating to the production, transportation, storage, and separation of crude oil and natural gas.

Abstract: An antimicrobial solution for disinfecting instruments in an automatic sterilization device, the solution comprising: a peracid reaction product formed in situ from combining a liquid acetyl donor with a solid source of peroxide, wherein the in situ reaction takes place in the sterilization device, along with a containment and delivery ampule for use in an automatic sterilization device, and methods for disinfecting a medical instrument employing the inventive antibacterial solution.

Abstract: Disclosed herein is a resist stripping composition, which has an excellent ability of stripping a residual resist remaining after dry or wet etching at the tune of forming patterns in a process of manufacturing a flat panel display substrate.

Abstract: A method of cleaning a substrate having a metal layer including copper or a copper-containing alloy, the method including cleaning the substrate using a cleaning liquid that includes a mercapto compound represented by one or both of the following formulas (1) and (2), and a solvent containing water and a water-soluble organic solvent: in which R represents a substituent group; m is an integer of 1 to 3; and n is an integer of 0 to 3, when m is 2 or 3, R may be the same or different; HS—(CH2)x—OH??(2), in which x is an integer of no less than 3.

Abstract: An cleaning composition and process for cleaning post-chemical mechanical polishing (CMP) residue and contaminants from a microelectronic device having said residue and contaminants thereon. The cleaning compositions include novel corrosion inhibitors. The composition achieves highly efficacious cleaning of the post-CMP residue and contaminant material from the surface of the microelectronic device without compromising the low-k dielectric material or the copper interconnect material.

Abstract: A composition effective for removing contaminates from a manufactured product either as a concentrated material or when diluted with water. The composition designed for effective removal of all types of undesirable contaminates from a manufactured product, including but not limited to, solder flux, oils, greases, soil, and particulate matter. Depending on the nature of the process the cleaning composition maybe used in a multistep process. The composition contains propylene glycol phenyl ether and an alkali and has a pH of greater than 7.5. The composition may contain additional optional solvents and additives to enhance cleaning of articles or to impart other properties to the composition. The composition can be contacted with a surface to be cleaned in a number of ways and under a number of conditions depending on the manufacturing or processing variables present.

Abstract: Disclosed herein is a composition and method for semiconductor processing. In one embodiment, a wet-cleaning composition for removal of photoresist is provided. The composition comprises a strong base; an oxidant; and a polar solvent. In another embodiment, a method for removing photoresist is provided. The method comprises the steps of applying a wet-cleaning composition comprising about 0.1 to about 30 weight percent strong base; about one to about 30 weight percent oxidant; about 20 to about 95 weight percent polar solvent; and removing the photoresist.

Abstract: The invention relates to a double-layered compacted solid water-purification product, comprising at least one first layer and at least one second layer, characterized in that the first layer comprises at least one flocculating system and at least one dispersion system, the second layer comprises at least one disinfectant which liberates free chlorine on contact with water and at least one excipient for the disinfectant, whereby said excipient releases the disinfectant into the water at a controlled rate such that the combination of excipient and disinfectant releases 0.1 to 100 mg/l of free chlorine per hour. The invention further relates to the method for production of such a product.

Abstract: Aqueous alkaline cleaning composition free from organic solvents and metal ion-free silicates, the said compositions comprising (A) a thioamino acid having at least one primary amino group and at least one mercapto group, (B) a quaternary ammonium hydroxide, (C) a chelating and/or corrosion inhibiting agent selected from the group consisting of aliphatic and cycloaliphatic amines having at least two primary amino groups, and aliphatic and cycloaliphatic amines having at least one hydroxy group, (D) a nonionic surfactant selected from the group of acetylenic alcohols, alkyloxylated acetylenic alcohols and alkyloxylated sorbitan monocarboxylic acid mono esters; the use of the alkaline cleaning composition for the processing of substrates useful for fabricating electrical and optical devices; and a method for processing substrates useful for fabricating electrical and optical devices making use of the said aqueous alkaline cleaning composition.

Abstract: The present invention relates to a compacted solid product for water purification comprising:—at least a first layer comprising at least a coagulant/flocculant system comprising at least one polyvalent inorganic salt, at least one water-soluble cationic polymer and at least one high-molecular-weight anionic polymer,—at least a second layer comprising at least one disinfectant that releases active chlorine on contact with water, characterized in that said coagulant/flocculant system moreover comprises a sodium alginate. The invention also relates to the method for preparing such a product.

Abstract: Disclosed herein is a composition and method for semiconductor processing. In one embodiment, a wet-cleaning composition for removal of photoresist is provided. The composition comprises a strong base; an oxidant; and a polar solvent. In another embodiment, a method for removing photoresist is provided. The method comprises the steps of applying a wet-cleaning composition comprising about 0.1 to about 30 weight percent strong base; about one to about 30 weight percent oxidant; about 20 to about 95 weight percent polar solvent; and removing the photoresist.

Abstract: Corrosion of metallic tubulars in an oil, gas or geothermal well may be inhibited by introducing into the well a dithiazine or dithiazine of the formula: wherein R is selected from the group consisting of a C1 to C12 saturated or unsaturated hydrocarbyl group or a C1 to C10 ?-hydroxy saturated or unsaturated hydrocarbyl group; R1 is selected from the group consisting of a C1-C24 straight chain or branched alkyl group or a C1-C24 arylalkyl; R2 is selected from the group consisting of X-R4-X, R4 being a C1-C6 alkyl group; and X is chlorine, bromine or iodine. The dithiazine may he isolated from a whole spent fluid formed by reaction of hydrogen sulfide and a triazine. Alternately, the whole spent fluid containing the dithiazine may be introduced into the well. The dithiazines of formulae (II) and (III) are quaternized derivatives of the dithiazine of formula (I).

Abstract: Corrosion of metallic tubulars in an oil, gas or geothermal well may be inhibited by introducing into the well a dithiazine of the formula: wherein R is selected from the group consisting of a C1 to C10 saturated or unsaturated hydrocarbyl group or a C1 to C10 ?-hydroxy saturated or unsaturated hydrocarbyl group. The dithiazine may be isolated from a whole spent fluid formed by reaction of hydrogen sulfide and a triazine. Alternately, the whole spent fluid containing the dithiazine may be introduced into the well. In addition, the dithiazine or whole spent fluid may be formulated with at least one component selected from alkyl, alkylaryl or arylamine quaternary salts; mono or polycyclic aromatic amine salts; imidazoline derivative or a quaternary salt thereof; a mono-, di- or trialkyl or alkylaryl phosphate ester; or a monomeric or oligomeric fatty acid.

Abstract: Disclosed is a method for preparing a cleaner containing silicate (64-75% SiO2) satisfying the standard of silicate contents as defined in the Drinking Water Quality Standards provided by the Ministry of Environment by using sodium silicate (Na2SiO3-10H2O). Sodium silicate is mixed with sodium bicarbonate, dodecylbenzene sulfonate and alkylbenzene sulfonate are added thereto, and then drinking water is further added thereto. Due to the sterilization and cleaning functions of sodium silicate contained in the cleaner, the cleaner is used in cleaning applications, particularly in restaurants and hospitals, or in bathing infants or pet dogs, while not adversely affecting the human body. Additionally, the cleaner has an excellent cleaning effect, and is suitable for cleaning metal surface ions that are in contact with water by inhibiting oxidation of metals.

Abstract: Corrosion inhibiting composition for use in aqueous or semi-aqueous stripping, cleaning, abrasive lapping and abrasive slurry compositions that form 5, 6, 7, or 8-membered chelating rings with a base metal together with a film forming polymeric chelation agent. Optionally there is included an oxygen scavenger.

Abstract: The present invention relates to corrosion inhibitor systems, in particular to cleaning and corrosion inhibiting compositions for surfaces of aluminum or colored metals and alloys thereof under alkaline conditions, especially in the food and pharmaceutical industries. The cleaning and corrosion inhibiting compositions comprise as a corrosion inhibitor at least one alkyleneoxy alkylphosphate di- or triester having the general formula (I) where Z is either —O—M or —O—(AO)n2— Alkyl wherein M is an ammonium, alkali metal or alkaline earth metal cation, Alkyl is a C5-C22 alkyl or alkylaryl group, AO is a C2-4-alkylene oxide unit and n1, n2 and n3 each are integers from 2 to 10.

Abstract: A liquid corrosion inhibitor comprising a primary, secondary, tertiary or mixed amine complexing agent and a carboxylic acid complexing agent, and may further contain a pH adjusting agent and an antifreeze agent, which is capable of providing both short-term and long-term corrosion protection on ferrous and non-ferrous metal substrates and protection from flash rusting commonly associated with ferrous metal substrates, without adversely affecting high gloss in coatings.

Abstract: A composition for removing resists and etching residue from substrates containing at least one nucleophilic amine compound having oxidation and reduction potentials, at least one organic solvent, water and, optionally, a chelating agent is described. The chelating agent is preferred to be included since it provides added stability and activity to the cleaning composition so that the composition has long term effectiveness. If a chelating agent is not present, the composition, while providing for adequate stripping and cleaning upon initial use of the composition following mixing, has only short term stability. In this latter instance, the nucleophilic amine compound and organic solvent components of the composition preferably are maintained separate from each other until it is desired to use the composition. Thereafter, the components are combined. Following use of the composition, the non-used portion of the composition can be disposed of or be reactivated by the addition of a chelating agent.

Abstract: In one embodiment, a scale inhibitor comprising at least one polymethylenephosphonate derivative having the following formula: wherein n is a number, wherein M is hydrogen or a cation, wherein R1, R2, and R3 are each independently selected from the group consisting of CH2PO3M2, CH2R4, wherein R4 is CHOHCH3, CHOHCH2Cl, or CHOHCH2OH, (CH2)mSO3M, wherein m is 3 or 4, and CH2CH2R5, wherein R5 is CONH2, CHO, COOR6, COOX, or CN, wherein R6 is CH3 or C2H5, and wherein X is an alkali metal or ammonium, and wherein at least one of R1, R2, and R3 is not CH2PO3M2. In another embodiment, a method for inhibiting scale formation in water, and in still another embodiment, a method for sequestering iron ions in a water systems, each of the methods comprising the step of providing the water with the above described polymethylenephosphonate derivative.

Abstract: A method of substantially reducing biofilm-associated microorganisms on a surface and a composition designed to substantially reduce biofilm-associated microorganisms on surfaces are disclosed. In one embodiment, the composition is an anionic surfactant selected from the group consisting of alkyl sulfates, alkyl sulfonates, and aryl sulfonates with alkyl or aryl substituents, an acid, and an alcohol solvent, wherein the pH of the composition is between pH 1 and pH 5.

Abstract: An environmentally friendly decontaminant solution, which may be disposed of after use without posing significant environmental hazards, is formulated without molybdenum-based corrosion inhibitors and preferably is free of all heavy metals. A zeolite-based buffering system optionally replaces phosphate buffers for maintaining the pH of the decontaminant solution at an appropriate pH for effective antimicrobial decontamination. Molybdenum-free decontaminant solutions containing peracetic acid retain their peracetic acid levels, and thus their antimicrobial effectiveness, for longer periods than comparable solutions formulated with a molybdate corrosion inhibitor.

Abstract: The invention relates to stabilized amido acid compositions. More particularly, the invention relates to compositions of amido acids, such as 6-nonanoylamidohexanoic acid, stabilized with antioxidants. The stabilized amido acid compositions are useful in the manufacture of bleach activators such as sodium nonanamidohexanoyloxybenzenesulfonate. Bleach activators made from the stabilized amido acids of the invention are capable of possessing improved coloration.

Abstract: The present invention relates to compositions for the chemical mechanical planarization (“CMP”) of barrier/adhesion layers, particularly Ta/TaN barrier/adhesion layers as occur in the manufacture of integrated circuits. CMP compositions comprise an aqueous solution of oxidizer and colloidal silica abrasive. Oxidizers include hydroxylamine nitrate, nitric acid, benzotriazole, ammonium nitrate, aluminum nitrate, hydrazine and mixtures thereof in aqueous solution.

Abstract: A stable free-flowing solid chelant composition is produced by the process comprising the steps of: a) adjusting the pH of an aqueous solution of the chelant to a value of from about 1.2 to about 3.0 by the addition of an inorganic acid; and b) drying the pH adjusted aqueous chelant product.

Abstract: This invention relates to a bivalent iron compound comprising a bivalent iron salt, an amino acid and a reducing material. It is known that bivalent iron salts exhibit specific effects in wide applications, for example, agricultural applications such as modification of soil quality, fishing applications such as quality preservation of fishes, medical applications such as treatment of diseases and industrial applications such as prevention of metal corrosion and purification of waste water and exhaust gas. However, the conventional bivalent iron salts suffer a problem that they cannot exhibit such effect for extended periods. This invention was successful in chemically stabilizing the bivalent iron salts by adding amino acids and reducing materials so as to sustain the effects inherent in the bivalent iron salts and to enable utilization thereof in industrial applications.

Abstract: There are provided a metal-corrosion inhibitor and a cleaning liquid comprising said corrosion inhibitor, which are suitable for cleaning semiconductor devices, and less than that so far in use in the possibility of affecting human health and the ecological system through a water medium, the corrosion inhibitor comprising an aliphatic alcohol compound having at least one mercapto group in the molecule, wherein a number of carbon atoms constituting said alcohol compound is not less than 2, and a carbon atom bonded with a mercato group and another carbon atom bonded with a hydroxyl group are contiguously bonded with each other.

Abstract: The invention relates to a dishwasher detergent in the form of a multi-layer tablet comprising a bleach, a bleach activator, a silver/copper corrosion inhibitor and also other customary constituents, where the silver/copper corrosion inhibitor is not present together with the bleach and the bleach activator in one layer.

Abstract: An aqueous stripping composition comprising a mixture of an organic amine and a corrosion inhibitor which is benzotriazole alone or in combination with gallic acid, its ester or analog. The stripping composition is effective to strip photoresists, residues from plasma process generated organic, metal-organic materials, inorganic salts, oxides, hydroxides or complexes in combination with or exclusive of organic photoresist films at low temperatures with little corrosion of copper or titanium containing substrates.

Abstract: A cleaning composition comprising at least one low molecular weight polyorganosiloxane selected from the group consisting of straight chain polydiorganosiloxane represented by a general formula: ##STR1## (wherein R.sup.1 is an organic group of single valence substituted by the same or different group or unsubstituted, and l is an integer from 0 to 5), and cyclic polydiorganosiloxane represented by a general formula: ##STR2## (wherein R.sup.1 is an organic group of single valence substituted by the same or different group or unsubstituted, and m is an integer from 3 to 7). To use it as a water system cleaning agent, polyoxyalkylene group containing polyorganosiloxane, a surfactant, and water are additionally mixed. Accordingly, a cleaning effect free from environmental destruction and contamination, equivalent to flon containing cleaning agents, and satisfactorily stable in terms of dispersion as a water system cleaning agent can be obtained.

Abstract: An automatic dishwashing composition which is in the form of a multilayer table comprises an alkali metal phosphate detergent builder salt, an alkali metal carbonate, a dialkali metal disilicate, a nonionic surfactant, an alkali metal metasilicate, optionally a polymer containing sulfonic acid groups, a wax coated chlorine bleach compound, and a hydrotrope.

Abstract: A chemical cleaning composition for silver- or copper-containing surfaces consists of a water-soluble solid or powder comprising thiourea or a derivative thereof, and is formulated in unit application form, e.g. in tablet or sachet form. A preferred composition comprises up to 60% thiourea or a derivative thereof; up to 4% surfactant; not more than 40% acidifier; less than 20% disintegrant; up to 10% binder; 0-1% lubricant; and up to 40% diluent.

Abstract: A remover solution composition for resist which comprises (a) a salt of hydrofluoric acid with a metal-free base, (b) a water-soluble organic solvent, and (c) water and optionally (d) an anticorrosive, and has a pH or 5 to 8. A method for removing resist which comprises the steps of (I) forming a resist layer on a substrate having a metal film, (II) light-exposing the resist layer through a mask pattern and subsequently developing the resist layer to form a resist pattern, and (III) dry-etching the substrate using the resist pattern as a mask and then removing the unnecessary resist and modified resist film with the remover solution composition.

Abstract: A stripping and cleaning composition for removing resists and etching residue from substrates containing hydroxylamine and at least one alkanolamine is described. Further, a cleaning composition for removing etching residue from semiconductor substrates containing hydroxylamine, at least one alkanolamine, at least one chelating agent, and water is described. The preferred chelating agent is 1,2-dihydroxybenzene or a derivative thereof. The chelating agent provides added stability and effectiveness to the cleaning composition.

Abstract: A process for inhibiting the corrosion of silver in a dishwashing detergent solution by adding to the solution an inorganic redox-active substance.

Abstract: The present invention relates to a machine dishwashing composition comprisingfrom 1% to 80% by weight of detergent builder compoundoxygen-releasing bleaching agentfrom 0.05% to 2.5% by weight, preferably 0.1% to 1% by weight of paraffin oil,nitrogen-containing corrosion inhibitor compoundMost preferably the oxygen-releasing bleaching agent is incorporated such that the level of available oxygen measured according to the method herein is from 0.3 to 1.7, preferably 0.5 to 1.

Abstract: A liquid composition useful for selective dissolution of soft metal is disclosed. The composition comprises an organic nitrocompound and a carboxylic acid. The organic nitrocompound, upon exposure to the soft metal, oxidizes the soft metal to form a first soft metal salt. The carboxylic acid, upon exposure to the soft metal salt, react with the first soft metal salt to form a second soft metal salt that is soluble in the composition. Related methods are also disclosed.

Abstract: A remover solution composition for resist which comprises (a) a salt of hydrofluoric acid with a metal-free base, (b) a water-soluble organic solvent, and (c) water and optionally (d) an anticorrosive, and has a pH of 5 to 8. A method for removing resist which comprises the steps of (I) forming a resist layer on a substrate having a metal film, (II) light-exposing the resist layer through a mask pattern and subsequently developing the resist layer to form a resist pattern, and (III) dry-etching the substrate using the resist pattern as a mask and then removing the unnecessary resist and modified resist film with the remover solution composition.

Abstract: Organic stripping composition for photoresists comprising organic polar solvents and basic amines which includes an inhibitor which forms a coordination complex with a metal.

Abstract: Water soluble polymers are prepared from an allyloxybenzenesulfonic acid monomer, a methallyl sulfonic acid monomer, a copolymerizable nonionic monomer, and a copolymerizable olefinically unsaturated carboxylic acid monomer. Aqueous compositions containing the water soluble polymers and nonionic surfactants are stable to phase separation of the polymer from the nonionic surfactant.

Abstract: A stripping and cleaning composition for removing resists and etching residue from substrates containing hydroxylamine and at least one alkanolamine is described. Further, a cleaning composition for removing etching residue from semiconductor substrates containing hydroxylamine, at least one alkanolamine, at least one chelating agent, and water is described. The preferred chelating agent is 1,2-dihydroxybenzene or a derivative thereof. The chelating agent provides added stability and effectiveness to the cleaning composition.

Abstract: A photoresist stripping composition containing:(a) 20-70% by weight of an organic polar solvent having a dipole moment of more than 3.5;(b) 70-20% by weight of alkanolamine compounds; and(c) 0.1-10% by weight of 6,6',6"-(1,3,5-triazine-2,4,6-triyltriimino) tris(hexanoic acid).

Abstract: The invention teaches an aqueous stripping composition that is essentially free of any hydroxylamine compounds. The composition consists essentially of an aqueous mixture of monoethanolamine and preferably includes an inhibitor. The composition is particularly useful for cleaning substrates containing organic residues.

Abstract: The invention teaches an aqueous stripping composition that is essentially free of any hydroxylamine compounds. The composition is an aqueous mixture of an alkanolamine, tetraalkylammonium hydroxide, and an inhibitor. The composition is particularly useful for cleaning substrates containing organic residues.

Abstract: Organic stripping composition for photoresists comprising organic polar solvents and basic amines which includes an inhibitor which forms a coordination complex with a metal.

Abstract: Microemulsion for all purpose hard surface cleaning compositions which contain an anticorrosion system designed to protect acid sensitive surfaces from attack by acidic materials.

Abstract: The present invention provides a method of inhibiting corrosion of ferrous metals in aqueous systems. The corrosion is inhibited by adding an effective amount of one or more poly(amino acids) to the aqueous system. Aqueous systems include for example water treatment systems and equipment used for detergent applications. The poly(amino acids) comprise a reaction product of at least one compound selected from amino acids, amic acids, ammonium salts of monoethylenically unsaturated dicarboxylic acids, ammonium salts of hydroxypolycarboxylic acids and combinations thereof.In one embodiment the poly(amino acids) are added to detergent solutions to inhibit corrosion in equipment for detergent applications. In another embodiment, corrosion inhibitors comprising one or more homopolymers of amino acids and one or more pyrophosphates are added to aqueous systems to inhibit corrosion.