Abstract: The present invention relates to surfactant/solvent systems for liquid formulations comprising &agr;) one or more nonaromatic-based surfactants, &bgr;) as solvent, one or more triester(s) of phosphoric acid with alcohols, preferably from the group consisting of 1 ) monohydric alkanols having 5 to 22 carbon atoms, for example with n-, i- or neo-pentanol, n-hexanol, n-octanol, 2-ethylhexanol, 2) diols or polyols, such as ethylene glycol, propylene glycol or glycerol, 3) aryl, alkylaryl, poly(alkyl)aryl and poly(arylalkyl)aryl alcohols, for example with phenol and/or cresol, octylphenol, nonylphenol, triisobutylphenol, tristyrylphenol, 4) alkoxylated alcohols obtained by reacting the alcohols mentioned above under 1), 2) or 3) with alkylene oxides, preferably (C1-C4)alkylene oxides, and 5) alkoxylated alcohols obtained by reacting monohydric alkanols having 1 to 4 carbon atoms and alkylene oxides.

Abstract: An aqueous alkaline solution comprising at least a caustic and a viscosity stabilizing amount of diutan gum.

Abstract: A detergent composition containing an inexpensive detergent builder in the form of a selected crystalline calcium carbonate is provided. Specifically, the crystalline calcium carbonate has a substantially rhombohedral crystal structure with {1,0-1,1} crystallographic indices. The crystalline calcium carbonate can be calcite that has been specially modified to a rhombohedral crystal structure with {1,0-1,1} indices. The crystalline calcium carbonate of the present invention is extremely inexpensive because it can be readily formed from inexpensive naturally occurring calcite, and it performs well even when used at large median particle sizes.

Abstract: Detergent compositions containing low molecular weight organic diamines are provided. More particularly, detergent compositions for hand dishwashing which have improved grease removal performance and benefits in sudsing are provided. Further, such detergent compositions have improved low temperature stability properties and dissolution properties.

Abstract: An antibacterial liquid dish cleaning composition with desirable cleansing and de-staining properties comprising a C8-18 ethoxylated alkyl ether sulfate, two anionic surfactant, a betaine surfactant, a hydroxy containing organic acid, polyethylene glycol, hydrogen peroxide and water.

Abstract: A water-based formulation for the removal of ink comprising a detergent builder including sodium carbonate, neutralized polyacrylic acid, and an acrylic acid/maleic anhydride copolymer; a chelating agent including tetrasodium ethylenediaminetetraacetate and ethylenediaminetetraacetic acid; and a detergent/emulsifier including C9-11 Pareth 8, C6-12 Pareth 6, and PEG Cocomonium Chloride.

Abstract: Ultrasonic cleaning products comprise a cleaning composition comprising a cleaning component and a source of dissolved gas and an ultrasonic wave generating source for imparting ultrasonic energy to a surface to be cleaned. Methods for removing soil from a surface in need of cleaning comprise applying a cleaning composition comprising a cleaning component and a source of a dissolved gas to a surface in need of cleaning, and contacting the surface with a source of ultrasonic energy.

Abstract: A method for cleaning polyethylene terephthalate containers including contacting the PET container with an alkaline wash solution having a temperature ranging of less than about 60° C. is disclosed. The alkaline wash solution is formulated from a first concentrate, a second concentrate, an alkalinity source, and a balance of water. The first concentrate preferably has a first nonionic surfactant, a first builder, and acid in an amount effective to provide a phase stable solution. The second concentrate preferably has a second nonionic surfactant and a second builder. The first and second concentrate are present in the wash solution in a concentration ranging from about 0.3 wt. % to 2.0 wt. %. Preferably, the first nonionic surfactant has a cloud point ranging from about 5° C. to 60° C.

Abstract: Aqueous detergent concentrates for rough, especially profiled tiles and flags, based on nonionic, anionic, amphoteric surfactants, with or without the use of customary auxiliaries and additives, said concentrates comprising quaternary alkoxylated amine compounds as cleaning enhancers.

Abstract: A composition and method are provided for cleaning contaminants from the surface of a semiconductor wafer after the wafer has been chemically-mechanically polished. The cleaning composition comprises a carboxylic acid, an amine-containing compound, a phosphonic acid, and water. The cleaning composition is useful in removing abrasive remnants as well as metal contaminants from the surface of a semiconductor wafer following chemical-mechanical polishing.

Abstract: The present invention relates to a clear and stable, highly alkaline composition with controlled foaming, containing a high amount of surface active nonionic alkylene oxide adduct and a hexyl glycoside as a hydrotrope. This composition has a very good wetting and cleaning ability and can be used for cleaning of hard surfaces, in a mercerization process and for a cleaning, desizing or scouring process of fibres and fabrics.

Abstract: A color stable liquid dish cleaning composition with desirable cleansing and de-staining properties comprising a C8-18 ethoxylated alkyl ether sulfate, two anionic surfactant, a betaine surfactant, hydrogen peroxide, a colorant, a hydroxy containing organic acid, polyethylene glycol, peracetic acid and water.

Abstract: A low foaming surfactant blend for use in highly alkaline conditions including at least one C3 to C10 alkyl polyglucoside, at least one amine oxide, at least one polycarboxylated alcohol alkoxylate, and at least one alcohol alkoxylate. The blend may combined with other optional ingredients including a source of alkalinity, water conditioning agents, a source of chlorine, silicates, solvents, high foam amine oxides, other surfactants, and so forth to form a cleaning concentrate. The concentrate may be diluted to use solutions with water.

Abstract: A decontamination formulation is provided which is effective against a broad spectrum of chemical and biological warfare agents and radioactive dusts, comprising an active decontamination agent, a co-solvent, a buffer system to optimize the initial reaction pH above 8.5 and more preferably in the range of 10 to 11 for favoring oxidation of VX and HD and hydrolysis of G agents, and a surfactant similar to fire-fighting foaming agent. Formulations comprise, in water by weight, 1% to 15% of a hydrated chloroisocyanuric acid salt, 1% to 10% of a polypropylene glycol co-solvent, 1% to 15% surfactant and a buffer system to initially maintain said formulation at a pH from about 11 to about 8.5 for sufficient duration to effect decontamination. The formulation can be provided in kit form or concentrate form, be prepared, in part, in advance or on site, and be dispensed in foam form which aids in coating and adhering of the decontamination formulation to contaminated surfaces.

Abstract: Hand dishwashing compositions comprising a low molecular weight organic diamine having a pK1 and a pK2 value in the range of from 8 10 11.5, an anionic surfactant, an amine oxide, and magnesium ions, said magnesium being present at an equimolar or less than equimolar amount of said diamine.

Abstract: A scale dissolver composition and method for using the composition is provided. Broadly, the dissolver compositions are formed by adding a base such as ammonium hydroxide to a mixture comprising a salt of a chelating agent, a carbonate, and a component selected from the group consisting of organophosphorus compounds, carboxylic acids, and mixtures thereof. The preferred organophosphorus compound is aminotrismethylidine diphosphonic acid while the preferred chelating agent salt is EDTA tetrasodium salt. In use, the dissolver composition is preferably heated to a temperature of from about 100-170° F. and then contacted with the target scale. The compositions are particularly useful for removing barium sulfate and calcium sulfate scales from gas and oil well and pipeline equipment in an efficient and cost-effective manner.

Abstract: The invention relates to a A highly alkaline or mildly alkaline detergent composition having enhanced cleaning properties. The detergent which combines a source of alkalinity and with a blend of nonionic surfactants that enhances cleaning waxy-fatty soils. This blend of surfactants shows surprising cooperation in reducing surface tension and comprises a nonionic or amphoteric surfactant and a silicone containing surfactant.

Abstract: An alkaline cleaner composition comprising an alkyl or alkylaryl ethoxy carboxylate, a strong chelating agent and a source of alkalinity, its manufacture and use in removing greasy soil from hard surface areas is described. The compositions are especially effective in removing lime-soaps in such greasy soil especially on institutional and commercial kitchen floors.

Abstract: The present invention is based on the unexpected finding that the combination of a carboxylate containing anionic polymer, of molecular weight greater than about 1000 daltons, with cleaning agents, provides improved contact lens cleaning preparations. The present invention includes contacting a soiled contact lens with an aqueous solution comprising an anionically charged polymer and a surfactant or surfactant combination selected from the classes of nonionic surfactants, anionic surfactants, and amphoteric surfactants.

Abstract: A stain removing liquid dish cleaning composition with desirable cleansing and de-staining properties comprising a C8-18 ethoxylated alkyl ether sulfate, two anionic surfactant, a betaine surfactant, a hydroxy containing organic acid, polyethylene glycol, peracetic acid and water.

Abstract: The present invention relates to a degreasing composition, to a liquid, to a gel and to a degreasing foam which comprise said composition. The composition according to the invention comprises a base, a polyethoxylated fatty alcohol, saturated or unsaturated, a copolymer of ethylene oxide and propylene oxide, and water. The invention also relates to a degreasing and/or decontamination process of a surface using said composition, said liquid, said gel, and/or said degreasing foam.

Abstract: Disclosed is a liquid pine oil cleaning composition containing: A) water; B) about 5-20% by weight of pine oil; C) about 2-10% by weight of an organic solubilizer distinct from said pine oil; D) about 0.1-5% by weight of an alkalinity agent; E) about 0.1-15% by weight of an anionic surfactant; F) about 0.01 to about 2% by weight by weight of a cationic surfactant comprising a quaternary ammonium salt represented by the formula wherein R9 and R10 are independently a hydrogen or a C1-3 alkyl group; R11 is a C8-C18 alkyl group; and R12 is a C1-3 alkyl group or an ethoxylate group represented by the formula —(CH2CH2O)yH, wherein y is a number from 1 to 3; and X− is a halide ion or a methosulfate, and G) about 0.1 to 10% by weight of a nonionic surfactant comprising an alcohol alkoxylate. Also disclosed is a method for cleaning a hard surface comprising contacting the hard surface in need of cleaning with the aforementioned pine oil cleaning composition.

Abstract: Washing items are washed simultaneously with softening washing water comprising alkali metal ion and at least one of carbonate ion and bicarbonate ion. The washing water before being softened is obtained by electrolyzing an aqueous solution of sodium hydrogencarbonate having a pH of 9.5 or more and an electric conductivity of 150 mS/m or more. The softened washing water has a total hardness of 40 ppm or less.

Abstract: An abrasive cleaning composition comprises abrasive particles, preferable of a soluble abrasive, cationic or non ionic surfactants and a quaternary ammonium antibacterial agent.

Abstract: A chromium oxide coating is removed from a surface of an article by cleaning the article in an alkaline degreasing/rust removal solution at a degreasing/rust removal temperature of from about 180° F. to about 200° F., scale conditioning the article in an alkaline permanganate conditioning solution at a scale-conditioning temperature of from about 160° F. to about 200° F., and contacting the article to an acidic stripping solution comprising hydrochloric acid and an etching inhibitor at a stripping temperature of from about 130° F. to about 140° F.

Abstract: A cleaning solution for electronic materials contains dissolved oxygen gas at a concentration greater than atmospheric saturation concentration, 0.1-10,000 mg/liter of ammonia, and 0.1-10,000 mg/liter of hydrogen peroxide in water. Alternatively, the cleaning solution contains dissolved reducing agents, 0.1-10,000 mg/liter of ammonia, and 0.1-10,000 mg/liter of hydrogen peroxide in water. A method for making the cleaning solution of the present invention is provided. A method for cleaning electronic materials using the cleaning solution of the present invention is also provided.

Abstract: Brass articles having leachable lead are contacted with an aqueous caustic solution having a pH of about 10 to about 14 that contains a chelating agent. During contact, the brass articles can be sonicated. The brass articles can be optionally pretreated by contacting them with an aqueous solution containing an organic carboxylic acid and an inorganic per-salt. The brass article can optionally further be post treated by contacting them with an aqueous solution containing thiourea.

Abstract: An adduct that has an acidic solution of sparingly-soluble Group IIA complexes (“AGIIS”) and at least one additive. The AGIIS can be prepared by mixing a mineral acid (such as sulfuric acid), and a Group IIA hydroxide (such as calcium hydroxide) or a Group IIA salt of a dibasic acid (such as calcium sulfate), or a mixture of the two Group IIA compounds, followed by removing the solid formed. The additives can be an alcohol, an organic acid or a surface active agent. The composition has various uses, including cleaning, food production, decontamination, bioremediation, agricultural application, medical application, and detoxification of substances.

Abstract: Brass articles having leachable lead are contacted with an aqueous caustic solution having a pH of about 10 to about 14 that contains a chelating agent. During contact, the brass articles can be sonicated. The brass articles can be optionally pretreated by contacting them with an aqueous solution containing an organic carboxylic acid and an inorganic per-salt. The brass article can optionally further be post treated by contacting them with an aqueous solution containing sodium persulfate.

Abstract: The invention provides an aqueous, hard surface cleaner with significantly improved residue removal and substantially reduced filming/streaking, said cleaner comprising: (a) an effective amount of at least one organic solvent with a vapor pressure of at least 0.001 mm Hg at 25° C., and mixtures of such solvents; (b) an effective amount of a mixture of anionic surfactants; (c) an effective amount of a buffering system which comprises a nitrogenous buffer which will result in a pH of greater than 6.5; and (d) the remainder as substantially all water.

Abstract: A composition and method are provided for cleaning contaminants from the surface of a semiconductor wafer after the wafer has been chemically-mechanically polished. The cleaning composition comprises a carboxylic acid, an amine-containing compound, a phosphonic acid, and water. The cleaning composition is useful in removing abrasive remnants as well as metal contaminants from the surface of a semiconductor wafer following chemical-mechanical polishing.

Abstract: Hard surface cleaning and disinfecting compositions include a film-forming, organosilicone quaternary ammonium compound providing a protective layer for water and stain repellency.

Abstract: A novel anti-etch and cleaning solution is described. The solution comprises a hetero functionalized polymer, caustic and optionally, an anti-etch component and unexpectedly results in glassware that is substantially free of contaminants and etching after washing.

Abstract: A wet spray cleaning process for removing thick organic layers including hardened photoresist from the surface of silicon wafers yields low residual particle counts for photoresist thicknesses up to 3 microns, and maintains low residual particle density for oxide-covered wafer regions. The cleaning process uses multiple cycles of SPM/DI/APM/DI, without an intervening drying step therebetween.

Abstract: A disinfecting cleaning composition comprising an aqueous solution of a cleansing amount of ammonia which results in the removal of a significant amount of soils and stains when applied to a surface after appropriate dilution, and an amount of a biocidal, nonampholytic quaternary ammonium salt (quat) which is less than that necessary to achieve complete disinfection after dilution in the absence of ammonia.

Abstract: A scale dissolver composition and method for using the composition is provided. Broadly, the dissolver compositions are formed by adding a base such as ammonium hydroxide to a mixture comprising a salt of a chelating agent, a carbonate, and a component selected from the group consisting of organophosphorus compounds, carboxylic acids, and mixtures thereof. The preferred organophosphorus compound is aminotristmethylidine diphosphonic acid while the preferred chelating agent salt is EDTA tetrasodium salt. In use, the dissolver composition is preferably heated to a temperature of from about 100-170° F. and then contacted with the target scale. The compositions are particularly useful for removing barium sulfate and calcium sulfate scales from gas and oil well and pipeline equipment in an efficient and cost-effective manner.

Abstract: The present invention relates to cleaning and degreasing compositions. It is an aqueous concentrate comprising caustic soda, a metal salt of silica, three surfactants, and a bonding agent. The concentrate can be diluted to provide a reusable, low foaming, non-toxic and biodegradable composition useful for degreasing, cleaning, and disinfecting, and for separating solids, oils, and greases suspended in water. Methods of use are also provided.

Abstract: A detergent composition containing alkali-metal silicate with an average molar ratio of SiO2/M2O of 1-4.2, preferably 2.5-4.2, wherein M is an alkali metal, the composition being non-corrosive to glass, crystal, porcelain and decorative prints thereon upon repeated washing. The composition being such that when disposed in a washing medium at a normal working concentration, a protonated silicic monomer Si(OH)4 is produced in a concentration of at least 2.5×10−3 mol/liter of the washing medium.

Abstract: An all purpose household cleansing solution is disclosed. An aqueous solution comprising 6 parts of water to 1 part each of liquid rubbing alcohol and liquid ammonia is combined with two tablespoons of lemon scented liquid dish detergent to form an improved, safe all-purpose cleanser which replaces numerous other household cleansers. The all purpose household cleansing solution is adaptable for application from a spray bottle or may be diluted in a gallon of water depending on the strength required of the cleaning job.

Abstract: An alkaline cleaner composition comprising an alkyl or alkylaryl ethoxy carboxylate, a strong chelating agent and a source of alkalinity, its manufacture and use in removing greasy soil from hard surface areas is described. The compositions are especially effective in removing lime-soaps in such greasy soil especially on institutional and commercial kitchen floors.

Abstract: The process for the direct preparation of cleaning solutions for semiconductor manufacture comprises producing the cleaning solutions directly at the site of use by mixing a gas with high-purity water, with a static mixer system being used. At least one of the gases NH3, HCl, ozone or HF is added.

Abstract: A low viscosity aqueous cleaning composition provides increasing viscosity upon dilution which provides a high viscosity diluted cleaning composition having solvents compatible with the rod micelle thickener and the cleaning system that clings for an extended period of time in a thickened form containing cleaning system ingredients that can penetrate and remove hard baked-on soils on vertical surfaces in cleaning units. The composition contains active cleaning ingredients (acid, alkaline and enzyme) that, in combination with thickening systems, provide the useful properties. The thickened materials can be applied on cold or hot surfaces and can successfully penetrate, soften and remove baked-on food soil on a variety of surfaces including oven walls, doors and grills, baking dishes, utensils, etc.

Abstract: A method for cleaning polyethylene terephthalate containers including contacting the PET container with an alkaline wash solution having a temperature ranging of less than about 60° C. is disclosed. The alkaline wash solution is formulated from a first concentrate, a second concentrate, an alkalinity source, and a balance of water. The first concentrate preferably has a first nonionic surfactant, a first builder, and acid in an amount effect to provide a phase stable solution. The second concentrate preferably has a second nonionic surfactant and a second builder. The first and second concentrate are present in the wash solution in a concentration ranging from about 0.3 wt. % to 2.0 wt. %. Preferably, the first nonionic surfactant has a cloud point ranging from about 5° C. to 60° C.

Abstract: A method is disclosed for removing pad nodules. The method provides a wafer comprising pads and pad nodules which are formed on said pads, wherein said pads are made from a metal selected from the group consisting of aluminum and an aluminum-copper alloy. Then, the method dips the wafer into deionized water for removing the pad nodules. Thereafter, the method spin-dries the wafer and coats an alkaloid developer on the wafer for further removing the pad nodules. Finally, the method removes the alkaloid developer from the wafer and bakes the wafer.

Abstract: An improved cleaning composition is provided for shower and tub surfaces which is of the “shower rinsing” type, requiring no scrubbing, wiping, or immediate rinsing. The composition comprises: (a) a glycoside surfactant, the total amount of said surfactant being present in a cleaning effective amount; (b) a chelating agent, said chelating agent present in an amount effective to enhance bathroom soil removal in said composition; and (c) the remainder, water. A solvent such as isopropyl alcohol may also be added. The employment of a glycoside surfactant, especially one having an HLB value of greater than 13, remarkably improves the performance of such a shower rinsing composition both with respect to surface appearance streaking and filming and also bathroom soil and soap scum removing ability.

Abstract: A method and composition for removing deposits of heavy hydrocarbonaceous materials and finely divided inorganic particulate matter from wellbore and flowline surfaces using a composition containing an alkyl polyglycoside, an ethoxylated alcohol, a caustic and an alkyl alcohol.

Abstract: A cleaning composition includes a detectable substance which is relatively stable in the cleaning composition, for indicating whether the cleaning composition has been thoroughly removed from a vessel following a cleaning process. For pharmaceutical applications, the detectable substance is preferably a low-foaming surfactant that is detectable by high performance liquid chromatography at concentrations of around 10 ppm, or less. The surfactant is thus detectable in the same analytical procedure as are traces of pharmaceutical residues which have not been removed from the vessel. The analytical procedure is used to develop a cleaning protocol for future cleaning processes by determining the number of rinses needed for reducing the surfactant, and hence the cleaning product, and also the pharmaceutical residues, in the rinse water to predetermined acceptable levels.

Abstract: A pink colored automatic dishwasher detergent composition is formulated as a gel-like aqueous product of exceptionally good physical stability, low bottle residue, low cup leakage, red color stability and improved cleaning performance. Linear viscoelasticity and pseudoplastic behavior is attributed by incorporation of cross-linked high molecular weight polyacrylic acid type thickener.

Abstract: A surface treatment composition containing a complexing agent as a metal deposition preventive in a liquid medium, in which the complexing agent is an ethylenediaminephenol derivative of the following general formula (1) or its salt: wherein X1 and X2 are hydroxyl groups; Y1 to Y8 are respectively independently a hydrogen atom, a hydroxyl group, a halogen atom, a carboxyl group, a phosphonic acid group, a sulfonic acid group, a carbonyl group, a nitro group, a nitroso group, an amino group, an imino group, a nitrilo group, a nitrile group, a thiocyanate group, a hydroxyamino group, a hydroxyimino group, or an alkyl or alkoxy group which may have a substituent, provided that at least one of Y1 to Y8 is not a hydrogen atom; Z1 to Z4 are respectively independently a hydrogen atom, a carboxyl group or a sulfonic acid group; and R1 to R4 are respectively independently a hydrogen atom or an alkyl group which may have a substituent.

Abstract: An alkaline aqueous cleaning composition for cleaning a substrate contaminated with industrial-type soil contaminants contains (i) an aqueous portion and (ii) an active-ingredient portion composed of (A) an alkalinity-providing agent and (B) a surfactant mixture containing (a) an active concentration of an ethoxylated C12-14 alkanol surfactant having an HLB value at 25° C. of from 8 to 12 and (b) an active concentration of at least one aminocarboxylic acid surfactant of the general formula R—N(H)—R′, wherein R is a straight or branched chain aliphatic organic group having from 10 to 20 carbon atoms, and R′ is a straight or branched chain carboxylic acid having from 1 to 7 carbon atoms. At an active-concentration ratio of surfactant (a) to surfactant (b) of about 2.5:1, the surfactants have a synergistic effect on the cleaning composition's ability to remove certain types of industrial-soil contaminants.