Chemical Reactant Has Two Or More Ethylenic Groups Patents (Class 522/117)
  • Patent number: 5250591
    Abstract: A curable adhesive composition is disclosed, comprising a polymerizable prepolymer, a reactive diluent, and a polymerization initiator, wherein said composition further comprises an inorganic filler and/or a (meth)acrylate having an isocyanurate ring.The adhesive composition of the invention is curable by the action of heat or light and is extremely useful as an adhesive for surface mounting devices.
    Type: Grant
    Filed: June 19, 1991
    Date of Patent: October 5, 1993
    Assignee: Somar Corporation
    Inventors: Ryuichi Fujii, Takayuki Kawano
  • Patent number: 5223356
    Abstract: A novel photocrosslinkable polymeric system has been developed for processing into films having stable second-order nonlinear optical properties. In the present system, polymers bearing photo-crosslinkable chromophores, such as polyvinylcinnamate and are reacted with appropriately designed nonlinear optical molecules with the cinnamate or other photocrosslinkable functionalities for photocrosslinking at one, two or more points. The system can be poled and photocrosslinked in the poled state to yield a material with stable optical nonlinearity and large electro-optic coefficients.
    Type: Grant
    Filed: May 15, 1991
    Date of Patent: June 29, 1993
    Assignee: University of Lowell
    Inventors: Jayant Kumar, Sukant K. Tripathy, Braja K. Mandal, Jan-Chan Huang
  • Patent number: 5221589
    Abstract: Disclosed is a photosensitive resin composition which, can be hot melt molding and and is water-developable. The composition does not need the preliminary exposure process and when cured has suitable hardness and printing properties. The photosensitive resin composition comprises;(A) a water soluble or water dispersible polyvinyl alcohol prepared by saponifying a copolymer obtained by copolymerizing 90 to 99.9 mol % of a vinyl ester and 0.1 to 10 mol % of an ionic group-containing monomer; said polyvinyl alcohol having a saponification degree of the vinyl ester unit of 60 to 75 mol % and a hot melt flow starting temperature of 95.degree. to 170.degree. C.,(B) a polymerizable compound prepared by reacting in the presence of an acid catalyst, (i) N-methylol (meth)acrylamide or N-alkoxymethyl (meth)acrylamide and (ii) a compound selected from the group consisting of monoalcohols, polyhydric alcohols, amides, haloalkylamides, aromatic compounds, ureas and mixtures thereof, and(C) a photopolymerization initiator.
    Type: Grant
    Filed: April 3, 1991
    Date of Patent: June 22, 1993
    Assignee: Nippon Paint Co., Ltd.
    Inventors: Osamu Nanba, Chitoshi Kawaguchi, Seiji Arimatsu, Kazunori Kanda
  • Patent number: 5196478
    Abstract: This invention relates to radio-derivatized polymers and a method of producing them by contacting non-polymerizable conjugands with radiolysable polymers in the presence of irradiation. The resulting radio-derivatized polymers can be further linked with ligands of organic or inorganic nature to immobilize such ligands.
    Type: Grant
    Filed: April 9, 1990
    Date of Patent: March 23, 1993
    Assignee: Epipharm Allergie-Service Gesellschaft m.b.H.
    Inventors: Janos M. Varga, Peter Fritsch
  • Patent number: 5153102
    Abstract: An alkaline-solution-developable liquid image-producing composition useful as a permanent protective layer for printed circuit boards is disclosed comprising at least: (1) an acrylic copolymer with hyroxy group, carboxyl group and branched unsaturated carbon double bond. Its number average molecular weight is 3,000 to 10,000 and its acid value is at least 30 mg KOH/g; (2) a photo reactive monomer with hydroxy group, the number of the unsaturated carbon double bond functional groups should be not less than 2; (3) a melamine compound; and (4) a free radical photo initiator.
    Type: Grant
    Filed: August 10, 1990
    Date of Patent: October 6, 1992
    Assignee: Industrial Technology Research Institute
    Inventors: Rong-Jer Lee, Chein-Dhau Lee, Wen-Shin Shen, Dhei-Jhai Lin
  • Patent number: 5112881
    Abstract: A novel photocrosslinkable polymeric system has been developed for processing into films having stable second-order nonlinear optical properties. In the present system, polymers bearing photocrosslinkable chromophores, such as polyvinylcinnamate and are reacted with appropriately designed nonlinear optical molecules with the cinnamate or other photocrosslinkable functionalities for photocrosslinking at one, two or more points. The system can be poled and photocrosslinked in the poled state to yield a material with stable optical nonlinearity and large electro-optic coefficients.
    Type: Grant
    Filed: August 24, 1990
    Date of Patent: May 12, 1992
    Assignee: University of Lowell
    Inventors: Braja K. Mandal, Sukant K. Tripathy, Jan-Chan Huang, Jayant Kumar
  • Patent number: 5061602
    Abstract: In a photosensitive recording material suitable for producing plates or resist patterns, the photopolymerizable recording layer contains as polymeric binder a film-forming copolymer which has a multiphase morphology, one phase having a glass transistion temperature below room temperature and a further phase having a glass transition temperature above room temperature and this copolymer having been obtained by free radical copolymerization of one or more macromers with one or more further olefinically unsaturated copolymerizable organic compounds.
    Type: Grant
    Filed: July 25, 1989
    Date of Patent: October 29, 1991
    Assignee: BASF Aktiengesellschaft
    Inventors: Horst Koch, Hans Schupp, Reinhold Schwalm
  • Patent number: 5057390
    Abstract: A photosensitive composition characterized by comprising:(a) a vinyl alcohol polymer containing the following structural unit A and having a saponification degree of a vinyl ester unit of not less than 70 mol %: ##STR1## wherein R.sup.1, R.sup.2 and R.sup.3 each represents H or a hydrocarbon group having 1 to 4 carbon atoms;(b) a radically polymerizable ethylenic unsaturated compound; and,(c) a photopolymerization initiator,having flexiblity and impact resistance which can maintain sufficient softness but are not broken particularly even at low temperature and low humidity so that resin plates showing high printing quality can be obtained from the photosensitive composition.
    Type: Grant
    Filed: November 20, 1986
    Date of Patent: October 15, 1991
    Assignee: Kuraray Company, Ltd.
    Inventors: Toshiaki Sato, Junnosuke Yamuchi, Takuji Okaya
  • Patent number: 5023165
    Abstract: A printing plate having a photosensitive layer formed of a photosensitive polymer composition including the following components A, B, and C:A. 100 parts by weight of parially saponified polyvinyl acetate having a saponification degree of 60 to 99 mole %;B. 20 to 200 parts by weight of polyfunctional acrylate or methacrylate having a molecular weight of not more than 2000 and having at least two acryloyl or methacryloyl groups in the same molecule thereof and a number of a hydroxyl group or groups not more than the number of said acryloyl and methacryloyl groups in the same molecule thereof; andC. 1 to 60 parts by weight of a saturated compound having a molecular weight of not more than 1000 and a boiling point of not less than 150.degree. C. and having at least one hydroxyl group in the molecule thereof.
    Type: Grant
    Filed: February 27, 1989
    Date of Patent: June 11, 1991
    Assignee: Toray Industries, Inc.
    Inventor: Junichi Fujikawa
  • Patent number: 5002975
    Abstract: Liquid, photocurable coating compositions containing nitrile copolymers. Such compositions comprises from about 10 percent to about 60 percent by weight of a high nitrile copolymer, containing at least about 70 percent by weight of a nitrile polymer; from about 30 percent to 90 percent by weight of a photopolymerizable solvent for the high nitrile copolymer, wherein the photopolymerizable solvent is selected from the group consisting of N-vinyl pyrrolidone, cyanoethylacrylate, styrene, N,N-dimethylacylamide, N,N-methylenebisacrylamide, gamma-butyrolactone and combinations thereof, and from about 0.1 percent to about 10 percent by weight of a photoinitiator soluble in the photopolymerizable solvent for curing the high nitrile copolymer with the incorporation of at least 50 percent by weight of the solvent therein upon exposure to ultraviolet radiation, having a wavelength of from about 2000 .ANG. to 14,000 .ANG.
    Type: Grant
    Filed: December 23, 1988
    Date of Patent: March 26, 1991
    Assignee: The Standard Oil Company
    Inventors: Rosemary Bartoszek-Loza, Richard J. Butler
  • Patent number: 4999242
    Abstract: There is provided a radiation-curable adhesive tape comprising a radiation-curable adhesive layer which is formed on a radiation transmitting substrate. The radiation-curable adhesive layer is composed of an acrylic adhesive and radiation-curable compound having carbon-carbon double bonds. The radiation-curable tape can be used preferably in processing steps for the production of semiconductor wafer, ceramics and glass employing a direct picking-up system.
    Type: Grant
    Filed: July 7, 1988
    Date of Patent: March 12, 1991
    Assignee: Furukawa Electric Co., Ltd.
    Inventors: Shinichi Ishiwata, Michio Ueyama, Hiroyuki Nakae, Yoshiyuki Funayama, Kazushige Iwamoto, Isamu Noguchi
  • Patent number: 4996134
    Abstract: A conjugated diene copolymer comprising (A) 10 to 60 mole % of a conjugated diene compound unit, (B) 5 to 50 mole % of an .alpha.,.beta.-ethylenically unsaturated carboxylic acid unit, (C) 0.1 to 20 mole % of a polyfunctional alkenyl compound unit, (D) 0 to 10 mole % of a diene compound unit having cyclic carbon-carbon double bonds and (E) 0 to 80 mole % of a monoolefinically unsaturated compound unit, the sum of the amounts of units (A), (B), (C), (D) and (E) being 100 mole %, said copolymer having an intrinsic viscosity [.eta.] of 0.01 to 3.0 dl/g as measured at 30.degree. C. in dimethylformamide. The copolymer is soluble in aqueous alkali solutions, excels in processability and photosetting property, and has excellent rubber elasticity and transparency even after photosetting.
    Type: Grant
    Filed: March 26, 1985
    Date of Patent: February 26, 1991
    Assignee: Japan Synthetic Rubber Co., Ltd.
    Inventors: Hiroji Enyo, Shin-ichiro Iwanaga, Yasuhiko Takemura
  • Patent number: 4987053
    Abstract: Compounds of the general formula I ##STR1## are described in which Q denotes ##STR2## R denotes alkyl, hydroxyalkyl or aryl, R.sup.1 and R.sup.2 denote H, alkyl or alkoxyalkyl,R.sup.3 denotes H, methyl or ethyl,D.sup.1 and D.sup.2 denote saturated hydrocarbon groups,E denotes alkylene, cycloalkylene, arylene, saturated or unsaturated heteroyls or a group of the formula II ##STR3## a and b denote integers from 1 to 4. c denotes an integer from 1 to 3,m denotes 2, 3 or 4, depending on the valency of Q, andn denotes an integer from 1 to m, where all radicals of the same definition may be identical to or different from one another.The compounds are suitable as polymerizable compounds for photopolymerizable mixtures and are distinguished by ready polymerizability in combination with photoinitiators and long shelf lives in the layer.
    Type: Grant
    Filed: November 14, 1988
    Date of Patent: January 22, 1991
    Assignee: Hoechst Aktiengesellschaft
    Inventors: Joachim Gersdorf, Klaus Rose
  • Patent number: 4980269
    Abstract: A photosensitive elastomeric composition comprising (1) at least one elastomer, (2) an addition-polymerizable compound having at least one CH.sub.2 .dbd.C< group and (3) a polymerization initiator activatable by actinic light, wherein the elastomer (1) is an elastomer selected from (a) an elastomeric polymer composed of a polyene monomer containing at least two non-conjugated double bonds and a conjugated diene-type monomer or both a conjugated diene-type monomer and a copolymerizable vinyl monomer and (b) an elastomeric linear A-B type (wherein A represents a polymer block of a monovinyl aromatic compound and B represents a polymer block of a conjugated diene-type monomer) block copolymer in which a terminal group having a polymerizable ethylenic double bond is present in at least one end of the molecular chain.
    Type: Grant
    Filed: May 11, 1988
    Date of Patent: December 25, 1990
    Assignee: Nippon Zeon Co., Ltd.
    Inventors: Fusayoshi Sakurai, Hiroto Kidokoro, Mitsuhiro Tamura
  • Patent number: 4957852
    Abstract: In hot embossing plates which are crosslinkable by photopolymerization and comprise(a) a heat-stable, dimensionally stable base and(b) a relief-forming layer which is crosslinkable by photopolymerization and soluble or dispersible in water and contains(b.sub.1) one or more partially or virtually completely hydrolyzed polyvinyl alkanecarboxylates as binders,(b.sub.2) one or more alkenecarbonylamino-N-methylene ethers of polyhydric alcohols as photopolymerizable monomers and(b.sub.3) photopolymerization initiators,the relief-forming layer (b) contains, as further binders (b.sub.1),(b.sub.11) alkenecarboxylates and/or alkenecarbonylamino-N-methylene ethers of partially or virtually completely hydrolyzed polyvinyl alkanecarboxylates and/or(b.sub.12) alkenecarboxylates and/or alkenecarbonylamino-N-methylene ethers of partially or virtually completely hydrolyzed graft copolymers of vinyl alkanecarboxylates and alkylene oxides,and is more than 0.8 mm thick.
    Type: Grant
    Filed: June 10, 1988
    Date of Patent: September 18, 1990
    Assignee: BASF Aktiengesellschaft
    Inventor: Bernd Bronstert
  • Patent number: 4940650
    Abstract: A flexographic printing plate which is resistant to ozone cracking and where the flexible recording layer has an anisotropy factor AF of <1.5 is produced from a photosensitive mixture consisting of(A) one or more elastomeric binders,(B) a mixture of(B1) from 5 to 20% by weight of one or more photopolymerizable organic compounds which are compatible with (A) and contain two or more olefinic double bonds and(B2) from 1 to 15% by weight of one or more monoolefinically unsaturated organic compounds which are compatible with (A) and whose homopolymer has a glass transition temperature which is below room temperature,(C) from 0.1 to 10% by weight of one or more photoinitiators and(D) from 0 to 27% by weight of conventional assistants and additives,the anisotropy factor AF of the flexible recording layer being defined as the ratio of the moduli of elasticity at 100% elongation of strips measuring 2.times.
    Type: Grant
    Filed: March 31, 1989
    Date of Patent: July 10, 1990
    Assignee: BASF Aktiengesellschaft
    Inventors: Karl-Rudolf Kurtz, Horst Koch, Guenther Schulz
  • Patent number: 4920037
    Abstract: Disclosed herein is a photopolymerizable composition containing at least (A) a high-molecular compound with a weight-average molecular weight of not less than 10,000 having a polymerizable double bond in the side chain, and (B) a polymerizable monomer represented by the following formula (I): ##STR1## (wherein R.sup.1, R.sup.2 and R.sup.3 represent hydrogen atom, ##STR2## and two or more of them are not hydrogen atom at the same time).
    Type: Grant
    Filed: September 13, 1989
    Date of Patent: April 24, 1990
    Assignee: Mitsubishi Kasei Corporation
    Inventors: Noriaki Takahashi, Noriko Watanabe
  • Patent number: 4895788
    Abstract: This invention relates to a radiation polymerizable composition for use in a photographic element such as a lithographic printing plate comprising in admixture(a) a binder resin having the general formula-A-B-C-wherein a plurality of each of components A, B and C occur in ordered or random sequence in the resin and wherein A is present in said resin at about 5% to about 20% by weight and comprises groups of the formula ##STR1## B is present in said resin at about 4% to about 30% by weight and comprises groups of the formula ##STR2## and C is present in said resin at about 50% to about 91% by weight and comprises acetal groups consisting of groups of the formulae ##STR3## where R is lower alkyl or hydrogen, and wherein said group I is present in component C from about 75% to about 85%, group II is present in component C from about 3% to about 5%; and group III is present in component C from about 10% to about 22%;(b) a photoinitiator;(c) a photopolymerizable mixture of(1) a polyethoxylate diacrylate monomer; a
    Type: Grant
    Filed: May 26, 1988
    Date of Patent: January 23, 1990
    Assignee: Hoechst Celanese Corporation
    Inventors: John E. Walls, Frank C. Pagano
  • Patent number: 4877818
    Abstract: The invention is directed to a photosensitive polymer composition capable of being electrophoretically depositable as an adherent, uniform photosensitive film on a conductive surface. The photosensitive polymer composition useful for electrodeposition is formed from an aqueous solution or emulsion of at least one polymer having charged carrier groups, a photoinitiator and a source of unsaturation for crosslinking the resulting film upon exposure to actinic radiation. The photosensitive film formed from the photosensitive polymer composition is aqueous developable and resistant to strong inorganic acids and strong bases. The photosensitive polymer composition is useful in the preparation of printed circuit boards, lithographic printing plates, cathode ray tubes, as well as in chemical milling, solder resist and planarizing layer applications.
    Type: Grant
    Filed: January 11, 1988
    Date of Patent: October 31, 1989
    Assignee: Rohm and Haas Company
    Inventors: William D. Emmons, Mark R. Winkle
  • Patent number: 4851454
    Abstract: Photolytically crosslinkable thermally stable compositions comprising at least one crosslinkable polymer and a crosslinkable quantity of a multifunctional 3,4-disubstituted maleimide. The compositions may be employed to prepare adhesives and photo printing mats.
    Type: Grant
    Filed: October 26, 1987
    Date of Patent: July 25, 1989
    Assignee: The Dow Chemical Company
    Inventors: Jerry E. White, Lu Ho Tung, Mary K. Dehnke
  • Patent number: 4839261
    Abstract: A process for forming electroless copper plating patterns comprising: (a) laminating a substrate with a photocurable laminate, (b) exposing said photocurable laminate to a high energy ray, (c) removing unexposed parts of the laminate, and (d) electrolessly plating a desired pat of the laminate with copper; wherein said photocurable layer comprises (a) 100 parts by weight of a compound having recurring units represented by the following formulae [A] and [B] ##STR1## and (b) 5 to 1,000 parts by weight of a compound, which is compatible with compound (a), having a group represented by the formula--(R.sub.4).sub.nwherein R.sub.4 is a group having a double bond and n is an integer of 1 to 50 and characterized by a viscosity at 20.degree. C. of from 0.001 to 500 poises.
    Type: Grant
    Filed: September 15, 1987
    Date of Patent: June 13, 1989
    Assignee: Asahi Kasei Kogyo Kabushiki Kaisha
    Inventors: Nobuo Nakazaki, Hideo Ai, Manabu Miyao
  • Patent number: 4828963
    Abstract: A printing plate having a photosensitive layer formed of a photosensitive polymer composition including the following components A, B, and C:A. 100 parts by weight of partially saponified polyvinyl acetate having a saponification degree of 60 to 99 mole %;B. 20 to 200 parts by weight of polyfunctional acrylate or methacrylate having a molecular weight of not more than 2000 and having at least two acryloyl or methacryloyl groups in the same molecule thereof and a number of a hydroxyl group or groups not more than the number of said acryloyl and methacryloyl groups in the same molecule thereof; andC. 1 to 60 parts by weight of a saturated compound having a molecular weight of not more than 1000 and a boiling point of not less than 150.degree. C. and having at least one hydroxyl group in the molecule thereof.
    Type: Grant
    Filed: December 17, 1987
    Date of Patent: May 9, 1989
    Assignee: Toray Industries, Inc.
    Inventor: Junichi Fujikawa
  • Patent number: 4772538
    Abstract: This invention relates to a radiation polymerizable composition for use in a photographic element such as a lithographic printing plate comprising in admixture(a) a binder resin having the general formula--A--B--C--wherein a plurality of each of components A, B and C occur in ordered or random sequence in the resin and wherein A is present in said resin at about 5% to about 20% by weight and comprises groups of the formula ##STR1## B is present in said resin at about 4% to about 30% by weight and comprises groups of the formula ##STR2## and C is present in said resin at about 50% to about 91% by weight and comprises acetal groups consisting of groups of the formulae ##STR3## where R is lower alkyl or hydrogen, and wherein said group I is present in component C from about 75% to about 85%, group II is present in component C from about 3% to about 5%; and group III is present in component C from about 10% to about 22%;(b) a photoinitiator;(c) a photopolymerizable mixture of(1) a polyethoxylate diacrylate monome
    Type: Grant
    Filed: August 2, 1985
    Date of Patent: September 20, 1988
    Assignee: American Hoechst Corporation
    Inventors: John E. Walls, Frank C. Pagano
  • Patent number: 4767797
    Abstract: A linear polymer having a recurring unit represented by the formula (I): ##STR1## wherein R.sub.1, R.sub.2, R.sub.3 and R.sub.4 each independently is a hydrogen atom, a C.sub.1-10 alkyl group, a C.sub.6-10 cycloalkyl group, an aryl group, or a halogen atom and the ethynyl group is in either meta position or para position to the main polymer chain;and a weight-average molecular weight of 1,000 to 1,000,000. A resin composition consisting essentially of (i) a polymer having a recurring unit represented by the formula (I) or a polymer having a recurring unit represented by the formula (I) and a recurring unit represented by the formula (II): ##STR2## wherein X and Y each independently is a C.sub.6-20 aryl group, a C.sub.1-10 alkyl group, a C.sub.6-10 cycloalkyl group, a silyl group having a C.sub.1-10 alkyl group or a C.sub.
    Type: Grant
    Filed: August 25, 1986
    Date of Patent: August 30, 1988
    Assignee: Asahi Kasei Kogyo Kabushiki Kaisha
    Inventors: Hideo Ai, Yohsuke Koizumi, Naohiro Tsuruta
  • Patent number: 4761435
    Abstract: Ultraviolet-curable ethylenically unsaturated liquid coating composition are disclosed which consist essentially of:1--polyethylenically unsaturated material in which the ethylenically unsaturated groups are polymerizable groups which are not (meth)acrylate groups;2--a polyamine resin, preferably a polytertiary amine resin; and3--an aryl ketone photosensitizer.
    Type: Grant
    Filed: October 3, 1986
    Date of Patent: August 2, 1988
    Assignee: DeSoto, Inc.
    Inventors: Edward J. Murphy, Ronald S. Conti
  • Patent number: 4731393
    Abstract: s-Triazine compounds, the molecule of which contains at least one ethylenically unsaturated group and at least one 2,2,6,6-tetramethylpiperidine group can be grafted onto organic polymers, in particular onto polyolefines, in the presence of free-radical formers or by means of irradiation. Examples of free-radical formers are peroxy or azo compounds. If polyunsaturated piperidine-triazine compounds are used, it is also possible to achieve crosslinking of the polymer, particularly in the case of polyethylene.
    Type: Grant
    Filed: June 11, 1986
    Date of Patent: March 15, 1988
    Assignee: Ciba-Geigy Corporation
    Inventors: Friedrich Karrer, Peter Hofmann
  • Patent number: 4716093
    Abstract: Solvent developable composition useful as photoresist contains binder formed from methylmethacrylate and a C.sub.2 to C.sub.4 alkyl methacrylate whereby improved development and/or stripping is obtained.
    Type: Grant
    Filed: March 17, 1986
    Date of Patent: December 29, 1987
    Assignee: E. I. Du Pont de Nemours and Company
    Inventor: Richard J. Kempf
  • Patent number: 4677047
    Abstract: Novel compositions of matter which crosslink under the action of light and which contain(A) an aliphatically unsaturated polymerization product which is free of aromatic groups and which can contain structural elements of the formula I ##STR1## (B) a bisimide of the formula II ##STR2## and a sensitizer and, if desired, a further crosslinking agent, where R and R' are alkyl or together are tetramethylene, R.sub.1 is hydrogen, chlorine or methyl, Y and Y' are each --OH or together are --O-- and R.sub.4 is alkylene, arylene or bis-arylene, are suitable, inter alia, for preparing printing plates or as photoresist materials.
    Type: Grant
    Filed: September 23, 1985
    Date of Patent: June 30, 1987
    Assignee: Ciba-Geigy Corporation
    Inventors: Joseph Berger, Friedrich Lohse
  • Patent number: 4654294
    Abstract: A photosensitive composition which comprises:(a) a vinyl alcohol polymer having at least one thiol group in the molecule thereof,(b) an ethylenically unsaturated compound which is radically polymerizable, and,(c) a photoinitiator,and is free from the defect of the removal of the vinyl alcohol polymer at the hardened regions upon development with water.
    Type: Grant
    Filed: March 18, 1986
    Date of Patent: March 31, 1987
    Assignee: Kuraray Co., Ltd.
    Inventors: Toshiaki Sato, Junnosuke Yamauchi, Takuji Okaya
  • Patent number: 4652592
    Abstract: The disclosure relates to enhancement of mechanical strength and heat resistance of a graft copolymer which is obtained by graft copolymerization of a fluorine-containing monomer that gives a crystalline polymer, such as vinylidene fluoride, with an elastomeric copolymer having peroxy bond, such as a ternary copolymer of vinylidene fluoride, chlorotrifluoroethylene and an unsaturated peroxy compound. A small amount of triallylisocyanurate is mixed with the graft copolymer, and the mixture is formed into a desired shape by a usual method such as calendering or compression moulding. The shaping material is exposed to ionizing radiation such as gamma-ray, which causes cross-linking of the graft copolymer.
    Type: Grant
    Filed: July 11, 1985
    Date of Patent: March 24, 1987
    Assignee: Central Glass Company, Limited
    Inventors: Chikashi Kawashima, Shinji Ogasawara, Isao Tanaka, Yasufumi Koga
  • Patent number: 4643963
    Abstract: For the production of printing plates, in particular lithographic printing plates by exposing a photopolymerizable recording material imagewise to actinic light and then effecting development with an aqueous alkaline developer, it is proposed to use photopolymerizable recording materials possessing a photopolymerizable copying layer (L) applied on a dimensionally stable base, where, in addition to containing ethylenically unsaturated photopolymerizable low molecular weight compounds, one or more photoinitiators, dyes and/or pigments, and, if required, further additives and/or assistants, the said copying layer (L) also contains, as a binder, one or more oligomeric and/or relatively high molecular weight copolymers which are soluble or dispersible in aqueous alkaline media and are based on cyclic dienes, in particular unsubstituted or substituted cyclopentadiene or unsubstituted or substituted di- or tricyclopentadiene.
    Type: Grant
    Filed: October 31, 1984
    Date of Patent: February 17, 1987
    Assignee: BASF Aktiengesellschaft
    Inventors: Heinrich Hartmann, Gerhard Hoffmann, Hellmut Buensch, Reiner Hofmann
  • Patent number: 4604342
    Abstract: A photopolymerizable mixture is described which contains the following: a binding agent which is soluble or at least capable of swelling in aqueous-alkaline solutions, a photoinitiator or a photoinitiator system and at least one ethylenically unsaturated monomer, whereby at least one monomer contains an aromatic hydroxyl-, mercapto-, sulfonamide- or a mono-N-substituted sulfonamide group, or combinations thereof.
    Type: Grant
    Filed: March 13, 1985
    Date of Patent: August 5, 1986
    Assignee: E. I. Du Pont de Nemours and Company
    Inventors: Manfred A. J. Sondergeld, Mario Grossa
  • Patent number: 4572887
    Abstract: Disclosed is a radiation-polymerizable mixture which includes a polymerizable compound, a radiation-activatable polymerization initiator and a polymeric binder with lateral cross-linking groups of the formula--CH.sub.2 OR,wherein R denotes a hydrogen atom or a lower alkyl group, a lower acyl group or a lower hydroxyalkyl group. The mixture is cured by heating after development. Also disclosed is a polymerizable copying material which includes a layer comprising the mixture and a process for producing a solder mask including a laminating step for laminating a photoresist layer which includes the layer.
    Type: Grant
    Filed: August 13, 1984
    Date of Patent: February 25, 1986
    Assignee: Hoechst Aktiengesellschaft
    Inventor: Ulrich Geissler