Sulfur Patents (Class 522/118)
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Patent number: 8962709Abstract: The invention includes a new photopolymerizable resin system for dental restorative materials. The resin system utilizes a thiol-ene component as the reactive diluent in dimethacrylate systems. The ternary resin system comprises a thiol monomer, an ene monomer and a dimethacrylate monomer. The system of the invention has enhanced overall functional group conversion, improved polymer mechanical properties, and reduced shrinkage stress of the ternary system when compared to either traditional dimethacrylate or thiol-ene resin systems.Type: GrantFiled: January 7, 2013Date of Patent: February 24, 2015Assignee: The Regents of the University of Colorado, a Body CorporateInventors: Christopher N. Bowman, Neil B. Cramer
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Patent number: 8937116Abstract: The present invention relates to a sheet for forming a hard coating and a method of formation thereof. The present invention can provide a transfer material or a surface protection sheet having a high refractive index and superior physical properties, such as hardness, friction resistance, abrasion resistance, chemical resistance, transparency, luster, and the like, for forming a hard coating on the surface of various molded products, including resin molded products or wood products, and a method for forming a hard coating from such transfer material or surface protection sheets.Type: GrantFiled: February 9, 2011Date of Patent: January 20, 2015Assignee: LG Hausys, Ltd.Inventors: Yun-Bong Kim, Won-Kook Kim, Dong-Joo Gwon, Yang-Gu Kang, Jin-Woo Kim, Mu-Seon Ryu
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Publication number: 20150010848Abstract: Disclosed is a production method including the steps of: graft-polymerizing a first monomer onto a polymer substrate so as to form a first graft polymer; and graft-polymerizing a second monomer onto the first graft polymer so as to form a second graft polymer. The first monomer contains a polar group. The second monomer contains at least one selected from the group consisting of an ion-conducting group and a site into which an ion-conducting group can be introduced. The second monomer has a higher polarity than the first monomer.Type: ApplicationFiled: March 11, 2013Publication date: January 8, 2015Inventors: Takashi Suzuki, Hideyuki Emori, Hiroyuki Nishii
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Patent number: 8901196Abstract: A liquid resin composition is provided which satisfies both a tackiness-free requirement and a curing sensitivity requirement for production of an optical waveguide by a roll-to-roll process. An optical waveguide produced by using the liquid resin composition and a production method of the optical waveguide are also provided. The liquid resin composition for the production of the optical waveguide comprises: (A) a (meth)acrylate polymer, as a major component, having a plurality of (meth)acryl groups in its molecule; (B) a liquid thiol monomer having a plurality of thiol groups in its molecule; and (C) a photopolymerization initiator.Type: GrantFiled: January 6, 2011Date of Patent: December 2, 2014Assignee: Nitto Denko CorporationInventor: Tomoyuki Hirayama
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Publication number: 20130129953Abstract: Compositions are provided herein comprising a base polymer having engrafted with a secondary polymeric matrix having hydrophilic and lubricious copolymer brushes. Each copolymer brush further comprises functional groups immobilized along the surface of the brush in a plurality of layers, the functional groups conferring hydrophilic and lubricious properties to the base polymer. These polymer compositions are useful for e.g., fabricating devices for delivery of intraocular lenses (IOLs) as well as improving the hydrophilic properties of contact lenses.Type: ApplicationFiled: September 30, 2011Publication date: May 23, 2013Applicant: AST Products, Inc.Inventor: William Lee
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Patent number: 8297976Abstract: A dental adhesive composition comprising (i) at least one non-acidic polymerizable monomer having at least one ethylenically unsaturated group, (ii) optionally one or more acidic compounds, (iii) at least one photoinitiator, (iv) at least one solvent, and (v) about 0-40% by weight of one or more fillers; wherein the weight ratio of non-acidic polymerizable monomers/acidic compounds in the adhesive composition is more than about 4.5; the viscosity of the adhesive composition is less than about 350 centipoise (cP) at 25° C.; and the adhesive composition excluding solvent and filler has an acid number of less than about 0.75 mmol NaOH/g. The dental adhesive composition is used with a dental primer composition, which may be provided together in a kit.Type: GrantFiled: June 20, 2011Date of Patent: October 30, 2012Assignee: Kerr CorporationInventor: Xuejun Qian
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Patent number: 8217130Abstract: Disclosed herein is a curable composition excellent in workability, adhesion properties, rubber-like properties, storage stability, and quick curability. The curable composition comprises (A) a crosslinkable silyl group-containing organic polymer and (B) a (meth)acrylic polymer obtained by polymerizing a (meth)acrylic monomer having a polymerizable unsaturated bond in the presence of a metallocene compound and a crosslinkable silyl group-containing thiol compound, at least one end of the (meth)acrylic polymer being bonded to a residue, —S—R3 (where R3 represents a group having a crosslinkable silyl group) obtained by removing a hydrogen atom from the crosslinkable silyl group-containing thiol compound.Type: GrantFiled: June 25, 2010Date of Patent: July 10, 2012Assignee: Cemedine Co., Ltd.Inventors: Atsushi Saito, Tomonori Saito, Naomi Okamura
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Patent number: 8106134Abstract: A golf ball having a polymer layer that has been subjected to impregnation treatment with an isocyanate and/or isothiocyanate-containing olefin compound exhibits at least one improved golf ball attribute, such as scuff resistance or spin performance, compared with an original golf ball that has not been treated by impregnation.Type: GrantFiled: August 28, 2008Date of Patent: January 31, 2012Assignee: Bridgestone Sports Co., Ltd.Inventors: Yoshinori Egashira, Jun Shindo, Eiji Takehana, Takashi Ohira
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Patent number: 8044111Abstract: The invention provide a new class of silicone-containing prepolymers containing poly(oxyalkylene) blocks, polysiloxane blocks, and actinically-crosslinkable groups which are acryl groups, thiol groups, ene-containing groups or combinations thereof. A prepolymer of the invention is prepared in a one-pot procedure according to the Michael addition of thiol to electron deficient alkenes, such as ?,?-unsaturated carbonyl compounds, without need for additional reaction step(s) to introduce actinically crosslinkable groups. The present invention is also related to silicone hydrogel contact lenses made from this class of silicone-containing prepolymers and to methods for making the silicone hydrogel contact lenses.Type: GrantFiled: November 20, 2008Date of Patent: October 25, 2011Assignee: Novartis AGInventors: Frank Chang, Guigui Wang
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Publication number: 20110245365Abstract: A method for producing a graft polymer comprises the steps of: a) irradiating a base polymer with an electron beam or a source of ?-radiation, b) contacting a grafting solution with the base polymer, wherein the grafting solution contains at least one oxygen scavenger and at least one graft monomer selected from the group consisting of styrene and styrene derivatives, and c) graft polymerizing the mixture of the base polymer and the grafting solution obtained in step b).Type: ApplicationFiled: February 23, 2009Publication date: October 6, 2011Applicant: Belenos Clean Power Holding AGInventor: Dirk Henkensmeier
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Patent number: 8008366Abstract: A process for producing a cured coating is provided that includes a step of forming on a substrate layer of a curable composition that includes at least one compound represented by Formula (I) and a step of curing the layer of the curable composition by irradiation with electron beam. In formula (I) , Q1 denoted a cyano group or a —COX2 group, X1 denoted a hydrogen atom, organic residue, or polymer chain bonded to carbon atom CA via a heteroatom, or a halogen atom, X2 denoted a hydrogen atom, organic residue, or polymer chain boned to the carbonyl group via a heteroatom, or a halogen atom, Ra and Rb independently denote a hydrogen atom, a halogen atom, a cyano group, or an organic residue, and X1 and X2, Ra and Rb, and X1 and Ra or Rb may be bonded to each other to form a cyclic structure. There is also provided an electron beam-curable composition that includes a compound represented by Formula (I).Type: GrantFiled: February 7, 2008Date of Patent: August 30, 2011Assignee: FUJIFILM CorporationInventor: Kazuto Kunita
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Patent number: 7951429Abstract: A radiation curable coating composition comprising: (i) a thermoplastic polymer; (ii) at least one ethylenically unsaturated adhesion-promoting monomer or oligomer; (iii) at least one other ethylenically unsaturated radiation polymerizable reactant; and (iv) at least one initiator for initiating cure.Type: GrantFiled: May 4, 2009Date of Patent: May 31, 2011Assignee: The Sherwin-Williams CompanyInventor: Joseph E. Miller
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Patent number: 7888400Abstract: The invention features dental compositions comprising at least one hybrid monomer that comprises a cyclic allylic sulfide moiety attached to a (meth)acryloyl moiety. These two functional moieties are typically joined either directly to each via a chemical bond or through some chemical structure or spacer molecule. The composition may optionally contain additional polymerizable compounds, such as ethylenically unsaturated compounds, that are typically used in dental compositions.Type: GrantFiled: May 9, 2006Date of Patent: February 15, 2011Assignee: 3M Innovative Properties CompanyInventors: Ahmed S. Abuelyaman, Sumita B. Mitra, Kevin M. Lewandowski, David J. Plaut
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Patent number: 7781559Abstract: Disclosed herein is a curable composition excellent in workability, adhesion properties, rubber-like properties, storage stability, and quick curability. The curable composition comprises (A) a crosslinkable silyl group-containing organic polymer and (B) a (meth)acrylic polymer obtained by polymerizing a (meth)acrylic monomer having a polymerizable unsaturated bond in the presence of a metallocene compound and a crosslinkable silyl group-containing thiol compound, at least one end of the (meth)acrylic polymer being bonded to a residue, —S—R3 (where R3 represents a group having a crosslinkable silyl group) obtained by removing a hydrogen atom from the crosslinkable silyl group-containing thiol compound.Type: GrantFiled: July 30, 2004Date of Patent: August 24, 2010Assignee: Cemedine Co., Ltd.Inventors: Atsushi Saito, Tomonori Saito, Naomi Okamura
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Patent number: 7642298Abstract: A polymeric surfactant formed by the reaction of an oligomeric or polymeric substrate with at least one ethylenically unsaturated monomer, wherein the reaction is conducted in the presence of a type II photo initiator and by the action of actinic radiation. The polymeric surfactant is useful for stabilising the interface in emulsions or dispersions.Type: GrantFiled: May 26, 2004Date of Patent: January 5, 2010Assignee: Ciba Specialty Chemicals Water Treatments Ltd.Inventor: Michael Singh
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Patent number: 7030171Abstract: The objective of the present invention is to provide a production method by which a polymer of a functional group-terminated vinyl monomer can be easily and practically produced. Further, it is another object of the present invention to provide a functional group-terminated vinyl polymer which is useful as a material for the production of various functional products. The first aspect of the present invention is concerned with a production method of a functional group-terminated vinyl polymer comprising a step of synthesizing a halogen atom-terminated vinyl polymer by the radical polymerization reaction of a vinyl monomer in the presence of a halogen compound and a step of introducing a functional group to a terminus by substituting a functional group-containing group for the terminal halogen atom of said vinyl polymer.Type: GrantFiled: October 31, 2003Date of Patent: April 18, 2006Assignee: Sekisui Chemical Co., Ltd.Inventors: Takeshi Wakiya, Takamaro Kakehi
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Patent number: 6916855Abstract: The invention relates to a radiation curable composition comprising radiation curable components wherein at least one component of the radiation curable composition contains a functional group which, when attached to an acrylate group has a calculated Boltzmann average dipole moment of higher than 3.5 Debye. The invention further relates to radiation curable optical fiber coating compositions having a high dielectric constant.Type: GrantFiled: November 21, 2001Date of Patent: July 12, 2005Assignee: DSM IP Assets B.V.Inventors: Johan F. G. A. Jansen, Aylvin J. A. A. Dias, Marko Dorschu, Betty B Coussens
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Patent number: 6693142Abstract: The objective of the present invention is to provide a production method by which a polymer of a functional group-terminated vinyl monomer can be easily and practically produced. Further, it is another object of the present invention to provide a functional group-terminated vinyl polymer which is useful as a material for the production of various functional products. The first aspect of the present invention is concerned with a production method of a functional group-terminated vinyl polymer comprising a step of synthesizing a halogen atom-terminated vinyl polymer by the radical polymerization reaction of a vinyl monomer in the presence of a halogen compound and a step of introducing a functional group to a terminus by substituting a functional group-containing group for the terminal halogen atom of said vinyl polymer.Type: GrantFiled: June 24, 2002Date of Patent: February 17, 2004Assignee: Sekisui Chemical Co., Ltd.Inventors: Takeshi Wakiya, Takamaro Kakehi
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Publication number: 20030087982Abstract: A method of modifying a polymeric material which comprises the steps of activation-treatment and a hydrophilic polymer-treatment, or comprises the steps of activation-treatment, a hydrophilic polymer-treatment, and monomer grafting in this order, or comprises the step of a solvent-treatment followed by these steps. Thus, the polymeric material, e.g., polyolefin, is improved in hydrophilicity, adhesion, etc. without lowering the practical strength thereof The polymeric material thus improved in adhesion and other properties can be used in many applications where water absorption and adhesion are required, such as an absorption material, e.g., a wiping/cleansing material, a water retention material, a material for microorganism culture media, a separator for batteries (or cells), a synthetic paper, a filter medium, a textile product for clothing, a medical/sanitary/cosmetic supply, and reinforcing fibers for composite materials.Type: ApplicationFiled: August 27, 2001Publication date: May 8, 2003Inventor: Hitoshi Kanazawa
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Patent number: 6515039Abstract: The invention relates to a method for the parallel and combinatory synthesis of compounds bound to a continuous polymeric solid phase supporting material. According to the method, a continuous polymeric solid phase supporting material is prepared, the material comprising a matrix of a supporting polymeric material and graft copolymer chains covalently bound to the supporting matrix, the graft copolymer chains having reactive groups being able to react with organic compounds, thereby forming spatially defined reaction sites. The method then comprises the sequential spotting of synthesis building blocks or reagents at the various reaction sites on the continuous solid phase supporting material to yield a substrate library of compounds bound to the solid phase supporting material, whereby each reaction site on the continuous solid phase supporting material determines the composition of the synthesized compound, which is bound directly on the supporting matrix via the reactive groups of the graft polymer chain.Type: GrantFiled: June 15, 2000Date of Patent: February 4, 2003Assignee: Poly-An GmbHInventors: Mathias Ulbricht, Rudolf Volkmer-Engert, Lothar Germeroth, Holger Wenschuh
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Patent number: 6476092Abstract: A photopolymerizable composition which is capable of successfully ensuring both high sensitivity and excellent storage stability is provided as a radical photopolymerization-system composition which is highest in the sensitivity and very promising out of the image-forming techniques. The photopolymerizable composition comprises a polymerizable group-containing compound having a specific structure set forth below wherein X1 and X2 each independently represent a group containing a hetero atom wherein the hetero atom is in the &agr;-position or a halogen atom and a photopolymerization initiator.Type: GrantFiled: September 20, 2000Date of Patent: November 5, 2002Assignee: Fuji Photo Film Co., Ltd.Inventor: Kazuto Kunita
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Patent number: 6326127Abstract: The present invention relates to a photo-curable polymer composition comprising (a) a first block copolymer comprising at least two blocks A of polymerised monovinyl aromatic monomer, at least one internal block B of polymerised conjugated diene monomer, and at least one tapered or random block C of polymerised monovinyl aromatic monomer and polymerised conjugated diene monomer and/or at least one block D which may be a block of polymerised conjugated diene monomer or a tapered or random block of polymerised monovinyl aromatic monomer and polymerised conjugated diene monomer, wherein block C is an internal polymer block adjacent a terminal block A or an internal block A which is adjacent to a terminal block D, and block D is a terminal block adjacent an internal block A, and, optionally, a residue of a coupling agent, wherein the residue, if present, is derived from a coupling agent containing alkoxy or epoxy functional groups; and (b) a photo-initiator.Type: GrantFiled: December 16, 1999Date of Patent: December 4, 2001Assignee: Kraton Polymers U.S. LLCInventors: Karin Marie-Louise Renee Morren, Xavier Muyldermans
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Patent number: 6306924Abstract: This invention provides an improved coating composition for glass substrates that comprises a tetrasubstituted compound. The introduction of a tetrasubstituted compound in a coating composition for a glass substrate, and in particular an optical fiber, acts to delay the rate of deterioration of the glass or optical fiber due to moisture, and improves adhesion between the glass substrate and the coating composition. The introduction of a tetrasubtituted compound into a polymeric coating composition also improves the interlayer adhesion when more than one coating is applied to a glass substrate. This invention further relates to an outer primary coating composition or matrix material that comprises an acid functional ethylenically unsaturated monomer.Type: GrantFiled: August 21, 1998Date of Patent: October 23, 2001Assignee: DSM Desotech, Inc.Inventor: David M. Szum
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Patent number: 6265462Abstract: A method of forming a diffusion barrier on an article of a polymer blend of (i) a high surface energy polymer and (ii) a low surface energy polymer. Most commonly the low surface energy polymer is an organosilicon polymer, as a polysilane or a polysiloxane. The surface of the article is exposed to ozone and ultraviolet radiation to form a diffusion barrier.Type: GrantFiled: January 28, 2000Date of Patent: July 24, 2001Assignee: International Business Machines CorporationInventors: Frank Daniel Egitto, Luis Jesus Matienzo, Bruce Otho Morrison, Jr.
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Patent number: 6232363Abstract: A method of forming a diffusion barrier on an article of a polymer blend of (i) a high surface energy polymer and (ii) a low surface energy polymer. Most commonly the low surface energy polymer is an organosilicon polymer, as a polysilane or a polysiloxane. The surface of the article is exposed to ozone and ultraviolet radiation to form a diffusion barrier.Type: GrantFiled: April 25, 2000Date of Patent: May 15, 2001Assignee: International Business Machines CorporationInventors: Frank Daniel Egitto, Luis Jesus Matienzo, Bruce Otho Morrison, Jr.
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Patent number: 5743940Abstract: A process for producing a fabric absorbent that is capable of efficient removal of odorous substances, in particular malodorous substances. The absorbent is obtained by exposing an organic high-molecular weight compound, such as polyolefinic polymers or halogenated polyolefinic polymers, to an ionizing radiation and thereafter graft polymerizing the high-molecular weight compound with a polymerizable monomer that contains ion-exchange groups and/or a polymerizable monomer that can be converted to ion-exchange groups so as to incorporate the ion-exchange groups in the high-molecular weight compound.Type: GrantFiled: June 23, 1994Date of Patent: April 28, 1998Assignees: Japan Atomic Energy Research Institute, Ebara CorporationInventors: Takanobu Sugo, Jiro Okamoto, Kunio Fujiwara, Hideaki Sekiguchi, Toshiaki Fujii
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Patent number: 5658967Abstract: The invention relates to a method for providing a surface with carboxyl groups. A compound is applied to the surface with at least one functional group which can be converted into a carboxyl group. Thereafter, this surface is treated with a plasma to immobilize the compound, and then the functional group is converted into a carboxyl group. Also provided is a surface having carboxyl groups which is obtained with this method and a product with such a surface for exposure to blood, typically in vivo blood flows.Type: GrantFiled: May 18, 1995Date of Patent: August 19, 1997Assignee: Cordis CorporationInventors: Jan Feijen, Johannes G. A. Terlingen, Jan Pleun Lens
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Patent number: 5164424Abstract: A polymer is disclosed which has a betaine structure on at least one side chain. The polymer according to this invention is suitable for use as a material for producing a pervaporation membrane. A process is described for producing the polymer according to this invention whereby betaine groups are introduced into a starting polymer. The betaine groups are introduced into the starting polymer by irradiation of the starting polymer with ionizing radiation and then treatment of the irradiated starting polymer with monomers that are capable of a graft reaction. Monomers that either already contain a betaine function or are capable of forming such a function are used. The betaine can be formed, e.g., by alkylating quaternation of a nitrogen atom present in the monomer if an acid group is introduced simultaneously with the alkylating agent.Type: GrantFiled: March 25, 1991Date of Patent: November 17, 1992Assignee: Deutsche Carbone AGInventors: Hartmut E. A. Brueschke, Guenter F. Tuesel, Guido Ellinghorst, Axel Niemoeller
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Patent number: 5137799Abstract: An electrically conductive resist material is disclosed, comprising at least one polymer which is sensitive to ionizing radiation and a soluble electrically conductive oligomer or polymer. A process for producing the resist material is also described, comprising admixing an electrically conductive oligomer or polymer dissolved in a solvent to at least one polymer which is sensitive to ionizing radiation. The resist material is useful in preparing electron beam resists which prevent electrostatic charging and resultant electrostatic fields.Type: GrantFiled: February 2, 1990Date of Patent: August 11, 1992Assignee: Hoechst AktiengesellschaftInventors: Guenther Kaempf, Michael Feldhues, Ude Scheunemann, Juergen Lingnau
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Patent number: 4962158Abstract: A radical polymerizable composition comprising(A) a compound having a pi-electron conjugated structure and(B) a radical polymerizable compound, which is useful for molding into an arbitrary shape, which can be rendered electrically conductive and which is, therefore, useful as a material for electrodes or circuits in the electrical and electronic industry.Type: GrantFiled: February 25, 1988Date of Patent: October 9, 1990Assignee: Showa Denko Kabushiki KaishaInventors: Masao Kobayashi, Reiko Otsuka
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Patent number: 4952481Abstract: There is hereby provided a photosensitive resin composition suitable for a relief printing plate having an excellent resistance to a water based ink, whereby water or a water like solvent can be employed as a developing solution, which comprises;(i) a polymer (A) having a molecular weight of 5,000 to 500,000 which contains an amino group and a polymerizable double bond moiety,(ii) a monomer (B) having an .alpha.,.beta.-ethylenically unsaturated bond and a free acid group which can quaternize the nitrogen atom of the polymer (A),(iii) a photopolymerizable unsaturated compound (C), and(iv) a photopolymerization initiator (D).Type: GrantFiled: December 27, 1988Date of Patent: August 28, 1990Assignee: Napp Systems (USA), Inc.Inventors: Mamoru Seio, Hidefumi Kusuda, Masami Kawabata
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Patent number: 4865743Abstract: For producing solution/diffusion membranes, homogeneous dense films prepared by melt extrusion or casting from synthetic polymers, having a melting temperature above 140.degree. C., a glass transition temperature above 0.degree. C. and long time stability against boiling ethanol are irradiated with accelerated electrons and submitted to a subsequent radical graft copolymerization. After graft polymerzation, the functional groups are converted into the dissociated salts.Type: GrantFiled: December 29, 1986Date of Patent: September 12, 1989Assignee: GFT Gesellschaft fur Trenntechnik mbhInventors: Guido Ellinghorst, Bernd Goetz, Axel Niemoeller, Horst Scholz, Hartmut E. A. Brueschke, Guenter Tusel
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Patent number: 4743657Abstract: A method is provided for preparing a polymer bound stabilizer which comprises reacting a stabilizer precursor molecule containing a reactive double bound which is not readily homopolymerizable with a pre-formed polymer in the presence of a free radical.Type: GrantFiled: March 17, 1986Date of Patent: May 10, 1988Assignee: Milliken Research CorporationInventors: John W. Rekers, Gerald Scott
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Patent number: 4622366Abstract: A uranium adsorbing material made of a graft polymer with a graft ratio of 20 to 100% which contains amidoxime groups and cation exchange groups in a molar ratio of 1:1 to 20:1 and a process for preparing said material are herein disclosed.Type: GrantFiled: November 28, 1984Date of Patent: November 11, 1986Assignee: Japan Atomic Energy Research InstituteInventors: Takanobu Sugo, Jiro Okamoto, Isao Ishigaki, Akio Katakai
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Patent number: 4604342Abstract: A photopolymerizable mixture is described which contains the following: a binding agent which is soluble or at least capable of swelling in aqueous-alkaline solutions, a photoinitiator or a photoinitiator system and at least one ethylenically unsaturated monomer, whereby at least one monomer contains an aromatic hydroxyl-, mercapto-, sulfonamide- or a mono-N-substituted sulfonamide group, or combinations thereof.Type: GrantFiled: March 13, 1985Date of Patent: August 5, 1986Assignee: E. I. Du Pont de Nemours and CompanyInventors: Manfred A. J. Sondergeld, Mario Grossa
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Patent number: 4581401Abstract: A radiation sensitive polymeric material comprising a copolymer of methyl methacrylate and allyl methacrylate and at least one organosulfur compound having at least two --SH groups per molecule, said material being useful as a polymer resist sensitive to high energy radiation.Type: GrantFiled: September 19, 1984Date of Patent: April 8, 1986Assignee: Rohm GmbHInventors: Frithjof Asmussen, Peter Quis, Winfried Wunderlich, Wolfram Schnabel, Hideto Sotobayashi