Chemical Reactant Has Two Or More Ethylenic Groups Patents (Class 522/121)
  • Patent number: 10118892
    Abstract: The present invention relates to sulfonium salts of formula (I): (I), their preparation, and utility as precursors for preparing functionalized organic compounds, wherein R1 and R2 are the same or different and each is independently selected from an optionally substituted aryl group, an optionally substituted alkynyl group, an optionally substituted alkenyl group, an optionally substituted alkyl group, an optionally substituted cycloalkyl group, an optionally substituted cycloalkenyl group, an optionally substituted aralkyl group, an optionally substituted arylalkenyl group, an optionally substituted heteroaryl group, an optionally substituted heterocyclyl group, an optionally substituted amine, an optionally substituted alkoxy group, an optionally substituted thioether group, an optionally substituted phosphine group, an optionally substituted boron species, an optionally substituted carbene, an organometallic moiety, and a halide, or R1 and R2 are joined together to form an optionally substituted sulfur-con
    Type: Grant
    Filed: October 14, 2013
    Date of Patent: November 6, 2018
    Assignee: UCL BUSINESS PLC
    Inventors: Erik Arstad, Kerstin Sander, Thibault Gendron
  • Patent number: 9944800
    Abstract: UV curing hydrophilic coating compositions and methods to make and use the compositions are disclosed. The compositions include about 40 wt. percent to about 95 wt. percent of a vinyl ether compound, an epoxide compound, a compound with vinyl ether and epoxy functional groups, or any combination thereof; about 0.1 wt. percent to about 40 wt. percent of at least one polar diluent; about 40 wt. percent or less of at least one non-polar diluent; and about 0.5 wt. percent to about 12 wt. percent of at least one photoinitiator.
    Type: Grant
    Filed: October 24, 2014
    Date of Patent: April 17, 2018
    Assignee: Empire Technology Development LLC
    Inventor: Kock-Yee Law
  • Patent number: 9568497
    Abstract: A method of manufacturing a scratch resistant, touch sensor comprising: (1) applying a non-polymer protective coating solution to a touch sensor; and (2) forming a cross-linked polymer structure by curing the protective coating solution.
    Type: Grant
    Filed: October 24, 2012
    Date of Patent: February 14, 2017
    Assignee: UNIPIXEL DISPLAYS, INC.
    Inventors: Robert J. Petcavich, Danliang Jin
  • Patent number: 9034938
    Abstract: A description is given of a photoreactive polymer preparable by radical polymerization using at least one photoreactive monomer, where the photoreactive monomer has at least one radically polymerizable C—C double bond, at least one hydrophilic group selected from an ethylene glycol group and polyethylene glycol groups having at least 2 ethylene glycol units, and at least one photoreactive group, the photoreactive group being a photoenolizable carbonyl group.
    Type: Grant
    Filed: September 9, 2013
    Date of Patent: May 19, 2015
    Assignee: BASF SE
    Inventors: Dieter Urban, Ulrike Licht, Theo Smit, Christopher Barner-Kowollik, Guillaume Delaittre, Elena Frick
  • Patent number: 9034937
    Abstract: A method of treating a surface of a substrate using modified urushiol derived from Toxicodendron vernicifluum is provided. More particularly, the reactivity of a hydroxyl group of urushiol extracted from fresh Toxicodendron vernicifluum is removed before the lacquer is used as a UV coating agent for a substrate such as a steel sheet. Therefore, the substrate may have high antibacterial activity, and excellent appearance and functionalities such as far-infrared radiation, blocking of electromagnetic waves, enhanced corrosion resistance, high crosslinking speed when a low content of a photoinitiator is used, excellent surface gloss and high scratch resistance.
    Type: Grant
    Filed: December 28, 2010
    Date of Patent: May 19, 2015
    Assignee: POSCO
    Inventors: Hye Jin Yoo, In Woo Cheong, Chang Se Byeon, Jae Ryung Lee, Jin Tae Kim, Jung Hwan Lee, Yang Ho Choi
  • Patent number: 8952078
    Abstract: This invention relates to a printing ink and in particular to an ink for ink-jet printing which is cured by irradiation. The ink comprises at least one radiation-curable monomer; at least one passive thermoplastic resin; at least one radical photoinitiator; and at least one colouring agent; wherein the ink has a viscosity of less than 100 mPas at 25° C., and wherein the at least one passive resin is present at 2 to 15 wt % based on the total weight of the ink and has a molecular weight of 1,500 to 70,000.
    Type: Grant
    Filed: July 4, 2007
    Date of Patent: February 10, 2015
    Assignee: Sericol Limited
    Inventor: Nigel Paul Gould
  • Patent number: 8940811
    Abstract: A free radical curable liquid for inkjet printing of food packaging materials includes no initiator or otherwise one or more initiators selected from the group consisting of non-polymeric di- or multifunctional initiators, oligomeric initiators, polymeric initiators, and polymerizable initiators; wherein the polymerizable composition of the liquid consists of: a) 25-100 wt % of one or more polymerizable compounds A having at least one acrylate group G1 and at least one second ethylenically unsaturated polymerizable functional group G2 different from the group G1; b) 0-55 wt % of one or more polymerizable compounds B selected from the group consisting of monofunctional acrylates and difunctional acrylates; and c) 0-55 wt % of one or more polymerizable compounds C selected from the group consisting of trifunctional acrylates, tetrafunctional acrylates, pentafunctional acrylates and hexafunctional acrylates.
    Type: Grant
    Filed: April 25, 2013
    Date of Patent: January 27, 2015
    Assignee: Agfa Graphics NV
    Inventors: Roland Claes, Johan Loccufier
  • Patent number: 8933141
    Abstract: An ink composition which is used for active energy ray-curable inkjet printing, has excellent curability or adhesiveness to multiple base materials while having low viscosity, and exhibits excellent non-yellowing properties of the printed matter is provided. The composition comprises a polymerizable monomer (A) and photopolymerization initiators (B), the polymerizable monomer comprising 2-(2-vinyloxyethoxy)ethyl acrylate (A-1), and the photopolymerization initiators comprising oligo(2-hydroxy-2-methyl-1-(4-(1-methylvinyl)phenyl)propanone) (B-1) and other initiator (B-2).
    Type: Grant
    Filed: March 29, 2012
    Date of Patent: January 13, 2015
    Assignees: Toyo Ink SC Holdings Co., Ltd., Toyo Ink Co., Ltd.
    Inventors: Norio Suzuki, Kazuhiro Jonai, Mayuko Okamoto, Yuji Kameyama, Yohei Konda
  • Patent number: 8921445
    Abstract: Curable adhesive compositions are provided that exhibit a high refractive index.
    Type: Grant
    Filed: April 12, 2010
    Date of Patent: December 30, 2014
    Assignee: Mitsui Chemicals, Inc.
    Inventors: Yassin Turshani, Omar Mohamed Buazza
  • Patent number: 8901199
    Abstract: The present disclosure relates generally to compositions for natural and artificial nail coatings, and particularly, but not by way of limitation, to polymerizable compositions that provide improved adhesion-promoting and improved solvent-susceptibility.
    Type: Grant
    Filed: March 7, 2011
    Date of Patent: December 2, 2014
    Assignee: Creative Nail Design, Inc.
    Inventors: Thong Vu, Chad Conger, Diane Marie Larsen, David Valia, Douglas D. Schoon
  • Patent number: 8853293
    Abstract: A radiation curable solid ink composition comprising at least one curable wax that is curable by free radical polymerization; at least one monomer, oligomer, or prepolymer; at least one non-curable wax; at least one free-radical photoinitiator or photoinitiating moiety; and a colorant; wherein the components form a curable ink composition that is a solid at a first temperature of from about 20 to about 25° C.; and wherein the components form a liquid composition at a second temperature of greater than about 40° C.
    Type: Grant
    Filed: December 18, 2009
    Date of Patent: October 7, 2014
    Assignee: Xerox Corporation
    Inventors: Marcel P. Breton, Michelle N. Chretien, Peter G. Odell, Christopher Wagner
  • Patent number: 8835530
    Abstract: A glass printing ink and glass printing lacquer are prepared, which contain at least one photoinitiator, at least one resin and at least one additional substance. The resin is an epoxy resin based on bisphenol A, diluted in a UV-curing monomer, or a resin with functional groups containing free functional amino, hydroxy, epoxy, acid, acid anhydride and/or acrylate groups, or a combination of the epoxy resin with the resin with functional groups. The at least one additional substance is a wax. The use of the glass printing ink and glass printing lacquer in printing a glass substrate and processes for the printing of a glass substrate are also described.
    Type: Grant
    Filed: January 4, 2007
    Date of Patent: September 16, 2014
    Assignee: Marabu GmbH & Co., KG
    Inventors: Wolfgang Schaefer, Dimitrios Triantafillidis
  • Patent number: 8822562
    Abstract: Ink deposited on a substrate by an ink-jet arrangement to form a protective layer includes hardenable oligomer, hardenable monomer selected from a group including alkoxylated and/or poly-alkoxylated acrylic monomers comprising one or more di- or tri-acrylates, and a photoinitiator. The oligomer has a room temperature viscosity greater than 1 Pa·s. The oligomer to monomer weight ratio is between 1/6 and 1/25. The ink has a room temperature viscosity between 15 and 22 mPa·s and between 5 and 2 mPa·s at 60° C., and a room temperature surface tension between 15 and 28 mN/m. The photoinitiator is activated by a UV source having an appropriate wavelength and intensity.
    Type: Grant
    Filed: December 30, 2009
    Date of Patent: September 2, 2014
    Assignee: M.G.I. USA, Inc.
    Inventor: Edmond Abergel
  • Patent number: 8809412
    Abstract: The present invention relates to the use of oligomeric siloxane components in radiation-curable formulations which in the cured state offer a particular degree of corrosion control for metallic substrates.
    Type: Grant
    Filed: June 4, 2008
    Date of Patent: August 19, 2014
    Assignee: Evonik Degussa GmbH
    Inventors: Emmanouil Spyrou, Rene Koschabek, Burkhard Standke
  • Publication number: 20140212532
    Abstract: The present disclosure provides a micro-composite material used in the fabrication of three-dimensional objects, and associated methods and systems. In one example, a micro-composite material used in the fabrication of a three-dimensional object can comprise micronized polymeric particles; a photocurable curing agent; and a dye present in the micro-composite material in an amount at from 0.0001 wt % to 0.1 wt %, the dye having a ?max between 350 nm and 800 nm.
    Type: Application
    Filed: January 28, 2013
    Publication date: July 31, 2014
    Applicant: Hewlett-Packard Development Company, L.P.
    Inventors: Sivapackia Ganapathiappan, Krzysztof Nauka, Hou T. Ng
  • Patent number: 8785513
    Abstract: The present invention relates to fiber-reinforced composites, particularly application-oriented composites useful in dental and medical applications/appliances, such as fiber reinforced dental composites, and to a method for the manufacture thereof. Particularly the invention concerns random glass fiber-reinforced restorative composite resins with semi-interpenetrating polymer network matrix and their use in dental applications like cavity fillings, core composites, provisional and semi-permanent crown and bridge composite, cements and adhesives.
    Type: Grant
    Filed: June 29, 2007
    Date of Patent: July 22, 2014
    Assignee: Stick Tech Oy
    Inventors: Lippo V. J. Lassila, Pekka K. Vallittu, Sufyan Garoushi, Karri Airola
  • Patent number: 8785517
    Abstract: A pre-adhesive composition is described comprising an acid- and epoxy-functional (meth)acryloyl copolymer, which when crosslinked using an ionic photoacid generator (PAG) provides a pressure-sensitive adhesive and pressure-sensitive adhesive articles having desirable properties.
    Type: Grant
    Filed: June 8, 2011
    Date of Patent: July 22, 2014
    Assignee: 3M Innovative Properties Company
    Inventors: Arlin L. Weikel, Larry R. Krepski, Jason D. Clapper, Wayne S. Mahoney, Babu N. Gaddam
  • Publication number: 20140179823
    Abstract: The present invention provides low solvent or substantially solvent-free multi-ethylenically unsaturated acrylate composition imbibed particles of an acid functional group containing acrylic polymer for ultraviolet curing coating applications and methods of making the same wherein the acrylic polymer is formed by polymerizing in organic solvent, then neutralized and combined with a multi-ethylenically unsaturated acrylate composition prior to dispersing the mixture into water and, preferably, removing solvent.
    Type: Application
    Filed: December 16, 2013
    Publication date: June 26, 2014
    Applicant: Rohm and Haas Company
    Inventors: Andrew Hejl, Eric Greyson, Wenqin Wang
  • Patent number: 8729147
    Abstract: A flexographic printing ink for use in a flexographic printing process with wet on wet capability, comprising a polymer and a combination of liquids comprising radiation curable monomers and/or oligomers, diluents, colorants, additives, and photoinitiators, the components having the Hansen Solubility Parameters adjusted to generate an ink with a capability to form a gel having the required physical characteristics, and that is in a liquid form in the presence of a small quantity of non reactive solvent, or is brought to a liquid state during the printing process. The disclosure is also directed to a flexographic printing process with wet on wet capability based on controlled polymer or polymer segment precipitation that leads to gel formation of ink compounds by controlling the solubility parameter of the ink system.
    Type: Grant
    Filed: March 28, 2012
    Date of Patent: May 20, 2014
    Assignee: Technosolutions Assessoria Ltda
    Inventors: Valter Marques Baptista, Wilson Andrade Paduan
  • Publication number: 20140073717
    Abstract: A description is given of a photoreactive polymer preparable by radical polymerization using at least one photoreactive monomer, where the photoreactive monomer has at least one radically polymerizable C—C double bond, at least one hydrophilic group selected from an ethylene glycol group and polyethylene glycol groups having at least 2 ethylene glycol units, and at least one photoreactive group, the photoreactive group being a photoenolizable carbonyl group.
    Type: Application
    Filed: September 9, 2013
    Publication date: March 13, 2014
    Applicant: BASF SE
    Inventors: Dieter URBAN, Ulrike LICHT, Theo SMIT, Christopher BARNER-KOWOLLIK, Guillaume DELAITTRE, Elena FRICK
  • Publication number: 20140039085
    Abstract: A thiol-ene polymeric material is disclosed. The material is produced by the photopolymerization of reactants having thiol and olefin moieties. The material can incorporate encapsulated components, including cells. Additionally, the material can be derivatized by reacting the polymeric material with components such as proteins.
    Type: Application
    Filed: July 25, 2013
    Publication date: February 6, 2014
    Applicant: The Regents of the University of Colorado, A Body Corporate
    Inventors: Christopher BOWMAN, Kristi ANSETH, Bilge HACIOGLU, Charlie NUTTELMAN
  • Patent number: 8642673
    Abstract: The present invention relates to the use of alkoxysilane components in the presence of acid-generating photoinitiators in radiation-curable, free-radically crosslinkable formulations which in the cured state offer a particular degree of corrosion control for metallic substrates.
    Type: Grant
    Filed: February 5, 2009
    Date of Patent: February 4, 2014
    Assignee: Evonik Degussa GmbH
    Inventor: Emmanouil Spyrou
  • Patent number: 8632952
    Abstract: Provided are a photosensitive resin composition which is soluble in an alkaline aqueous solution and which has a good propagation loss in a visible light wavelength region, a photosensitive resin cured matter, a photosensitive resin film, a photosensitive resin film cured matter and an optical waveguide obtained by using the same. Provided are, to be specific, a photosensitive resin composition comprising (A) a vinyl polymer having at least one chain-polymerizable functional group in a molecule, (B) a polymerizable compound and (C) a polymerization initiator, wherein the component (C) is at least one selected from the group consisting of 2-[2-oxo-2-phenylacetoxyethoxy]ethyl oxyphenylacetate, 2-(2-hydroxyethoxy)ethyl oxyphenylacetate and oligo{2-hyroxy-2-methyl-1-[4-(1-methylvinyl)phenyl]}propanone, a photosensitive resin cured matter, a photosensitive resin film, a photosensitive resin film cured matter and an optical waveguide obtained by using the same.
    Type: Grant
    Filed: November 17, 2008
    Date of Patent: January 21, 2014
    Assignee: Hitachi Chemical Company, Ltd.
    Inventors: Kouji Suzumura, Tatsuya Makino, Atsushi Takahashi
  • Patent number: 8629192
    Abstract: A method of producing a HIPE foam using Ultraviolet (UV) light to polymerize a High Internal Phase Emulsion (HIPE) having two or more layers. The method uses UV light to polymerize HIPEs having two or more layers wherein each of the layers comprises a continuous oil phase containing monomers, photoinitiator, and an aqueous phase.
    Type: Grant
    Filed: June 7, 2010
    Date of Patent: January 14, 2014
    Assignee: The Procter and Gamble Company
    Inventors: Steven Ray Merrigan, Thomas Allen Desmarais
  • Patent number: 8609742
    Abstract: Disclosed is a high energy ray-curable composition which is excellent in storage stability before curing and enables to form a cured coating film which is excellent in hardness, property of preventing adhesion of fats and oils, property of wiping off fats and oils, abrasion resistance, transparency, water repellency, adhesion, smoothness and uniformity. Specifically disclosed is a high energy ray-curable composition containing the following components (A)-(D). (A) 100 parts by weight of a polyfunctional acrylate (B) 1-30 parts by weight of an organoalkoxysilane having an aliphatic unsaturated bond (C) 1-100 parts by weight of colloidal silica (D) 0.2-20 parts by weight of a fluorine compound having an aliphatic unsaturated bond.
    Type: Grant
    Filed: February 28, 2007
    Date of Patent: December 17, 2013
    Assignees: Daikin Industries, Ltd., Dow Corning Corporation
    Inventors: Mari Wakita, Motoshi Sasaki, Peter Cheshire Hupfield, Yasuo Itami, Kaori Ozawa, Masahiko Maeda
  • Patent number: 8574822
    Abstract: A nanoimprint resist includes a hyperbranched polyurethane oligomer, a perfluoropolyether, a methylmethacrylate, a diluent solvent, and a photo initiator. The hyperbranched polyurethane oligomer can be polymerized by a copolymerization of trimellitic anhydride, ethylene mercaptan, and epoxy acrylic acid. The hyperbranched polyurethane oligomer can also be polymerized by a ring-opening copolymerization epoxy acrylic acid and ethylene glycol.
    Type: Grant
    Filed: May 24, 2012
    Date of Patent: November 5, 2013
    Assignees: Tsinghua University, Hon Hai Precision Industry Co., Ltd.
    Inventors: Zhen-Dong Zhu, Qun-Qing Li, Li-Hui Zhang, Mo Chen
  • Patent number: 8568873
    Abstract: Provided are a pressure-sensitive adhesive for polarizing plates which can apply a polarizing plate on a liquid crystal cell with good adhesion and has the characteristic that a liquid crystal display device obtained therefrom is less liable to cause light leakage even under the environment of high temperature and high humidity and which has a removability and a polarizing plate with the above pressure-sensitive adhesive and a production process for the same. The pressure-sensitive adhesive for polarizing plates is prepared by irradiating a pressure-sensitive adhesive material comprising (A) an acrylic base polymer comprising a monomer having a carboxyl group in a monomer composition ratio of 0.5 mass % or less and (B) an active energy beam-curable compound with an active energy beam and it has a storage elastic modulus (G?) of 0.3 MPa or more at 23° C.
    Type: Grant
    Filed: December 7, 2006
    Date of Patent: October 29, 2013
    Assignee: Lintec Corporation
    Inventors: Kentaro Kusama, Koichi Nagamoto, Mikihiro Kashio, Kazuhiro Kon, Motoyuki Hayakawa
  • Patent number: 8563624
    Abstract: A free radical curable liquid for inkjet printing of food packaging materials includes no initiator or otherwise one or more initiators selected from the group consisting of non-polymeric di- or multifunctional initiators, oligomeric initiators, polymeric initiators, and polymerizable initiators; wherein the polymerizable composition of the liquid consists essentially of: a) 25-100 wt % of one or more polymerizable compounds A having at least one acrylate group G1 and at least one second ethylenically unsaturated polymerizable functional group G2 different from the group G1; b) 0-55 wt % of one or more polymerizable compounds B selected from the group consisting of monofunctional acrylates and difunctional acrylates; and c) 0-55 wt % of one or more polymerizable compounds C selected from the group consisting of trifunctional acrylates, tetrafunctional acrylates, pentafunctional acrylates and hexafunctional acrylates.
    Type: Grant
    Filed: October 16, 2008
    Date of Patent: October 22, 2013
    Assignee: Agfa Graphics NV
    Inventors: Roland Claes, Johan Loccufier
  • Patent number: 8557890
    Abstract: The present invention provides a coating composition and a coating film that comprises a binder containing a UV-curable functional group, a compound containing a fluorine UV-curable functional group, a photoinitiator; and nano-sized particles. The coating film according to the present invention has excellent abrasion resistance and contamination resistance such as fingerprint trace removability and scribbling resistance.
    Type: Grant
    Filed: November 28, 2008
    Date of Patent: October 15, 2013
    Assignee: LG Chem, Ltd.
    Inventors: Yeong-Rae Chang, Joon-Koo Kang, Kyung-Ki Hong, Eun-Sang Yoo, Sung-Su Kim, Ju-Young Kim, Soon-Hwa Jung, Young-Jun Hong
  • Patent number: 8546461
    Abstract: The present invention relates to a method for producing water-absorbing polymer particles by radiation-inducing polymerization on a continuously revolving belt, electromagnetic radiation having a wavelength of greater than 400 nm being shielded.
    Type: Grant
    Filed: November 24, 2008
    Date of Patent: October 1, 2013
    Assignee: BASF SE
    Inventors: Matthias Weismantel, Rüdiger Funk, Leigh R. Blair, Kevin D. Heitzhaus
  • Patent number: 8541482
    Abstract: The present disclosure relates generally to compositions for nail coatings, and particularly, but not by way of limitation, to polymerizable compositions. The disclosure further relates to methods of making a polymerizable, protective and scratch resistant topcoat layer that can be easily removed.
    Type: Grant
    Filed: October 5, 2009
    Date of Patent: September 24, 2013
    Assignee: Creative Nail Design, Inc.
    Inventors: Thong Vu, Douglas D. Schoon
  • Patent number: 8536242
    Abstract: The present invention provides a photocurable composition which contains a photobase generator capable of generating a satisfactory amount of a base in a high quantum yield when irradiated even with a small quantity of light for a short time, and contains a curable compound that is rapidly cured by the generated base such that the composition is cured into a cured product. The photocurable composition comprises: a photobase generator (A) which is a salt of a carboxylic acid (a1-1) represented by the following formula (1-1) with a basic compound (a2), and a curable compound (B) which has, in one molecule thereof, at least two functional groups selected from among epoxy group, (meth)acryloyl group, isocyanato group, acid anhydride group, and alkoxysilyl group, where R1 to R7 in the above formula (1-1) each are hydrogen or an organic group, R1 to R7 may be the same or different, and two of R1 to R7 may be bonded to each other to form a ring structure.
    Type: Grant
    Filed: July 23, 2008
    Date of Patent: September 17, 2013
    Assignees: Sekisui Chemical Co., Ltd., Tokyo University of Science Educational Foundation Administrative Organization
    Inventors: Hiroji Fukui, Shunsuke Kondo, Koji Arimitsu
  • Patent number: 8519408
    Abstract: Disclosed is a method of producing a thin film transistor substrate having high light sensitivity, heat-resistance, impact resistance, and a photosensitive composition used by the same, the method including forming data wires on an insulating substrate, forming an organic insulating film on the data wires by applying a photosensitive composition comprising a terpolymer, where the terpolymer is derived from monomers of an unsaturated carboxylic acid, an unsaturated carboxylic acid anhydride, or a mixture thereof, an unsaturated epoxy group-containing compound, and an olefinic compound.
    Type: Grant
    Filed: August 30, 2012
    Date of Patent: August 27, 2013
    Assignee: Samsung Display Co., Ltd.
    Inventors: Hoon Kang, Jae-sung Kim, Yang-ho Jung, Hi-kuk Lee
  • Patent number: 8519018
    Abstract: A resin includes: an acrylate; and a curing agent to cure the acrylate. The resin is adapted to adhere to a degradable material selected from the group consisting of polylactic polymer (PLA), polyhydroxyalkonate (PHA), poly 3 hydroxybutrate co 3 hydroxyhexanote (PHBH), and paper. The curing agent includes a photoinitiator or a sensitizer that, when cured, form a hard coat when the resin is exposed to ultraviolet radiation or an electron beam.
    Type: Grant
    Filed: February 21, 2010
    Date of Patent: August 27, 2013
    Assignee: Innovative Bottles, LLC
    Inventor: Shantu Patel
  • Publication number: 20130216945
    Abstract: An object of the present invention is to provide a pigment dispersion liquid which has excellent pigment dispersion stability and high productivity even in the case of using a fine pigment and having high pigment concentration; a method for producing the pigment dispersion liquid; a color resin composition which has excellent pigment dispersion stability, causes no clogging problem, has excellent adhesion, and is able to form color layers with high pigment concentration, with accuracy; and a color filter comprising the resin composition. Disclosed is a method for producing a pigment dispersion liquid, comprising the step of dispersing a pigment by mixing at least a pigment (A), a polymer (B) having tertiary or lower amines, an amine-reactive low molecular compound (C), and a dispersion medium (D), and dispersing the pigment (A) while reacting the polymer (B) with the low molecular compound (C), and a pigment dispersion liquid produced by the production method.
    Type: Application
    Filed: October 19, 2010
    Publication date: August 22, 2013
    Applicant: DNP FINE CHEMICALS CO., LTD.
    Inventors: Masayo Konno, Yukie Kawazu, Yumi Saiki, Shoichi Komatsu, Syuichi Mitsuhashi, Shunsuke Shinozaki
  • Patent number: 8492452
    Abstract: A polymerizable photoinitiator is represented by Formula (I): wherein R1, R2 and R3 are independently selected from the group consisting of a hydrogen, an optionally substituted alkyl group and an optionally substituted aryl group or R1 and R3 represent the necessary atoms to form a five to eight membered ring; p, w, y and z are all integers with y representing a value 1 to 6; p representing the sum of w and z; p representing a value of 1 to 6; w=1 to (p?z) and z=0 to (p?w); L represents an optionally substituted (p+y)-valent linking group comprising 1 to 14 carbon atoms; A represents a radically polymerizable group selected from the group consisting of an acrylate group, a methacrylate group, a styrene group, an acryl amide group, a methacryl amide group, a maleate group, a fumarate group, an itaconate group, a vinyl ether group, an allyl ether group, an allyl ester group and a vinyl ester group; and X represents a photoinitiating moiety including at least one group capable of initiating a free radical p
    Type: Grant
    Filed: December 1, 2009
    Date of Patent: July 23, 2013
    Assignee: Agfa Graphics NV
    Inventors: Johan Loccufier, Luc Van Maele, Jaymes Van Luppen, Roland Claes
  • Patent number: 8492453
    Abstract: A photosensitive resin composition is provided, which has properties necessary for a solder resist (insulative property, solder heat resistance, alkali developability and the like) and is capable of forming a film that is excellent in folding endurance even after the IR reflow process. A flexible circuit board employing the photosensitive resin composition and a circuit board production method are also provided. The photosensitive resin composition comprises: (A) a linear polymer of an ethylenically unsaturated compound comprising a carboxyl-containing ethylenically unsaturated compound; (B) an epoxy resin; (C) a polymerizable compound containing an ethylenically unsaturated group; and (D) a photopolymerization initiator. The photosensitive resin composition has a tensile breaking elongation percentage of not less than 10% and a 2% weight loss temperature of not lower than 260° C. after being cured.
    Type: Grant
    Filed: April 23, 2010
    Date of Patent: July 23, 2013
    Assignee: Nitto Denko Corporation
    Inventors: Masaki Mizutani, Toshikazu Baba
  • Patent number: 8492071
    Abstract: A curable composition containing (A) a polymerizable compound having an alkyleneoxy group having two or more carbon atoms, (B) a polymerizable compound lacking an alkyleneoxy group having two or more carbon atoms, (C) an i-line absorber, (D) a photopolymerization initiator, (E) an alkali-soluble resin, and (F) a pigment, wherein a mass ratio [(A)/((A)+(B))] is from 0.5 to 0.9, and an i-line transmittance obtainable when the curable composition is formed into a coating film having a thickness of 0.7 ?m, is 10% or less. The curable composition of the invention has enhanced adhesiveness upon forming a micro pattern, and can reduce development residues in unexposed non-cured areas. The curable composition of the invention is suitable for the use in color filters.
    Type: Grant
    Filed: March 27, 2009
    Date of Patent: July 23, 2013
    Assignee: FUJIFILM Corporation
    Inventor: Hiroshi Taguchi
  • Patent number: 8492454
    Abstract: The present disclosure relates to a nail coating system comprising a basecoat, a color layer, and a topcoat. The system of the present disclosure may be applied to natural and/or pre-existing artificial nail coatings. The present disclosure relates generally to compositions for natural and artificial nail coatings, and particularly, but not by way of limitation, to polymerizable compositions and color layers polymerized therefrom. The disclosure further relates to methods of making a polymerized color layer.
    Type: Grant
    Filed: October 5, 2009
    Date of Patent: July 23, 2013
    Assignee: Creative Nail Design, Inc.
    Inventors: Thong H. Vu, Diane Marie Larsen, Chad Conger, Douglas D. Schoon
  • Publication number: 20130184371
    Abstract: The present invention includes vinyl ether functional oligomers and methods for their preparation, the method including alternating free radical copolymerization of a dialkyl maleate or dialkyl fumerate monomer with a multifunctional vinyl ether monomer in the presence of a solvent with a high chain transfer constant. Also within the scope of the invention are uses for the vinyl ether functional oligomers compositions of this invention, including radiation curable coatings, adhesives, printing inks and composites.
    Type: Application
    Filed: September 29, 2011
    Publication date: July 18, 2013
    Applicant: RENSSELAER POLYTECHNIC INSTITUTE
    Inventor: James V. Crivello
  • Patent number: 8431065
    Abstract: Methods for making a crosslinked elastomeric composition and articles made of the same are provided. In at least one specific embodiment, an elastomeric composition comprising at least one propylene-based polymer is blended with at least one component selected from the group consisting of multifunctional acrylates, multifunctional methacrylates, functionalized polybutadiene resins, functionalized cyanurate, and allyl isocyanurate; and blended with at least one component selected from the group consisting of hindered phenols, phosphites, and hindered amines. The propylene-based polymer can include propylene derived units and one or more dienes, and have a triad tacticity of from 50% to 99% and a heat of fusion of less than 80 J/g. The blended composition can then be extruded and crosslinked. The extruded polymer can be crosslinked using electron beam radiation having an e-beam dose of about 100 KGy or less. The crosslinked polymers are particularly useful for making fibers and films.
    Type: Grant
    Filed: April 13, 2012
    Date of Patent: April 30, 2013
    Assignee: ExxonMobil Chemical Patents Inc.
    Inventor: Sunny Jacob
  • Publication number: 20130101837
    Abstract: Radiation-curable coating compositions for a surface such as a concrete floor, which include at least one multi-functional monomer or oligomer, a polymer, at least one photoinitiator, and one or more tertiary amine compounds containing zero or one crosslinkable double bonds are described and claimed. These coating compositions allow for application of at least about 0.15 mm (6 mil) thickness of the coating composition over an area larger than a UV radiation source, without the formation of wrinkles or buckles following each pass of the UV radiation source in the areas where light leakage from a side light shielding of the UV radiation source results in a very weak radiation intensity.
    Type: Application
    Filed: June 30, 2011
    Publication date: April 25, 2013
    Applicant: DSM IP ASSETS B.V.
    Inventors: Huimin Cao, Wenguang Li, Tai Yeon Lee
  • Patent number: 8426485
    Abstract: An EB (electron beam) or UV (ultra violet) curable, low-gloss, dry-erase coating formulation for static and electronic whiteboards is disclosed. The coating contains an acrylate silica blend, an aliphatic urethane acrylate or a polyester acrylate, a polyfunctional reactive diluent and at least one photoinitiator.
    Type: Grant
    Filed: June 20, 2011
    Date of Patent: April 23, 2013
    Assignee: Exopack-Technology, LLC
    Inventors: Mark O'Neil Outlaw, Michael Ray Carter
  • Patent number: 8415425
    Abstract: Provided is a method for protecting the surface of a member to be processed, which comprises providing a protective film made of a photocurable resin composition for surface protection on the surface of the member to be processed, processing the member to be processed, and removing the protective film from the member to be processed, wherein the photocurable resin composition comprises (A) a polyfunctional (meth)acrylate, (B) a monofunctional (meth)acrylate, (C) a resin having a cyclopentadiene skeleton and (D) a photopolymerization initiator, which comprises from 1 to 50 parts by weight of (A), from 5 to 95 by mass of (B) and from 0.1 to 50 parts by mass of (C).
    Type: Grant
    Filed: March 30, 2012
    Date of Patent: April 9, 2013
    Assignee: Denki Kagaku Kogyo Kabushiki Kaisha
    Inventors: Tomoyuki Kanai, Kazuhiro Oshima
  • Patent number: 8399537
    Abstract: The present disclosure relates generally to compositions for natural and artificial nail coatings, and particularly, but not by way of limitation, to polymerizable compositions and adhesion-promoting basecoats polymerized therefrom. The disclosure further relates to methods of making a polymerized basecoat that are more easily removed than artificial nail enhancements and more durable and long lasting than nail polish coatings.
    Type: Grant
    Filed: April 4, 2011
    Date of Patent: March 19, 2013
    Assignee: Creative Nail Design, Inc.
    Inventors: Chad Conger, Thong Vu
  • Patent number: 8389595
    Abstract: The invention relates to the production of superabsorbent polymers comprising polymerizing a monomer solution on a continuous belt reactor, wherein the consistency of the formed polymer gel at the end of the continuous belt reactor is controlled by adjusting the intensity of energy-rich radiation.
    Type: Grant
    Filed: February 21, 2008
    Date of Patent: March 5, 2013
    Assignee: BASF SE
    Inventors: Matthias Weismantel, Rüdiger Funk, Sylvia Bertha, Leigh R. Blair, Kevin D. Heitzhaus, Bruce Storey
  • Patent number: 8389593
    Abstract: A composition for forming column spacers is provided. The composition comprises a radical polymerization inhibitor. The use of the composition enables simultaneous formation of a saturated pattern and a semi-transmissive pattern as column spacer patterns having different shapes, whose difference in thickness is controllable as desired although the sensitivity is slightly reduced, through a slit or semi-transmissive mask by varying the kind and amount of the radical polymerization inhibitor. Further provided are column spacers formed using composition and a liquid crystal display using the column spacers.
    Type: Grant
    Filed: December 23, 2009
    Date of Patent: March 5, 2013
    Assignee: LG Chem, Ltd.
    Inventors: Chang Ho Cho, Keon Woo Lee, Sung Hyun Kim, Sang Kyu Kwak, Dong Kung Oh, Chang Soon Lee
  • Patent number: 8367157
    Abstract: Radiation curable compositions comprising at least one radiation curable oligomer responding to a structure (C)—(B)-(A)-[(B)(C)]x wherein (A) is the residue of one or more hydroxyl functional polyester having a molecular weight MN higher than 900, a TG and/or Tm of 5 less than 30° C., and which is obtained from an acid constituent comprising at least 75 mole % of saturated aliphatic polyacid and, optionally, 0 to 25 mole % of another polyacid and an alcohol constituent, (B) is the residue of one or more polyisocyanate, (C) is the residue of one or more ethylenically unsaturated hydroxyl compound, and x is from 0.5 to 10.
    Type: Grant
    Filed: February 2, 2007
    Date of Patent: February 5, 2013
    Assignee: Cytec Surface Specialties, S.A.
    Inventors: Isabelle Fallais, Jean-Yves Salviato, Thierry Randoux
  • Patent number: 8367744
    Abstract: Disclosed is a sealant composition for a liquid crystal display device, the sealant composition including a (meta) acrylate compound as expressed in Chemical Formula 1 below
    Type: Grant
    Filed: May 27, 2010
    Date of Patent: February 5, 2013
    Assignee: Korea Kumho Petrochemical Co., Ltd.
    Inventors: Ki In Son, Joo Hyun Park, Gyu Won Cho
  • Patent number: 8361696
    Abstract: The present invention relates to a polymer resin compound including a new polycyclic compound, and a photosensitive resin composition including the polymer resin compound as an effective binder matrix. In particular, the photosensitive resin composition according to the present invention uses a polymer resin compound, which includes a compound having double cyclic structure in one molecule as a monomer, as a binder matrix. Accordingly, the photosensitive resin composition has an excellent photosensitivity and an excellent developing property, and has a low distortion property during plastic processing. For this reason, the photosensitive resin composition has an advantage of curing various transparent photosensitive materials used to manufacture a color filter of a liquid crystal display, for example, a column spacer, an overcoat, a passivation material, and the like.
    Type: Grant
    Filed: January 15, 2008
    Date of Patent: January 29, 2013
    Assignee: LG Chem, Ltd.
    Inventors: Keon-Woo Lee, Sung-Hyun Kim, Chang-Ho Cho, Dong-Kung Oh, Min-Young Lim, Ji-Heum Yoo, Sang-Kyu Kwak