Contains C-oh Group Other Than As Part Of A Coo-moiety Patents (Class 522/123)
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Patent number: 9000064Abstract: A composition for forming a pattern includes: about 1% to about 10% by weight of a liquid prepolymer, about 40% to about 60% by weight of an acrylate having a hydrophilic group, about 10% to about 20% by weight of a viscosity modifier, about 1% to about 5% by weight of a photoinitiator, and an additive.Type: GrantFiled: July 28, 2014Date of Patent: April 7, 2015Assignee: LG Display Co., Ltd.Inventor: Jin-Wuk Kim
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Publication number: 20140194547Abstract: The present invention aims to provide a method for surface-modifying a rubber vulcanizate or a thermoplastic elastomer, which is capable of cost-effectively imparting a variety of functions, such as sliding properties and biocompatibility, according to the applications. The present invention relates to a surface modification method for surface-modifying an object of a rubber vulcanizate or a thermoplastic elastomer, the method including: step 1 of forming polymerization initiation points A on a surface of the object; step 2 of radically polymerizing a non-functional monomer, starting from the polymerization initiation points A, to grow non-functional polymer chains; step 3 of forming polymerization initiation points B on the surface of the object where the non-functional polymer chains are formed; and step 4 of radically polymerizing a functional monomer, starting from the polymerization initiation points B, to grow functional polymer chains.Type: ApplicationFiled: December 16, 2013Publication date: July 10, 2014Applicant: SUMITOMO RUBBER INDUSTRIES, LTD.Inventor: Yasuhisa MINAGAWA
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Publication number: 20140155513Abstract: A method for forming a composition comprising a propylene-based polymer and a co-agent is provided. The method comprises introducing a propylene-based polymer to an extruder and introducing the co-agent to the extruder at a position within the extruder where the temperature is from 23° C. to 125° C.Type: ApplicationFiled: November 30, 2012Publication date: June 5, 2014Applicant: ExxonMobil Chemical Patents Inc.Inventors: Sunny Jacob, Michael J. Goncy, Peter D. Hartwell, Bruce R. Lundmark
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Publication number: 20130335645Abstract: A photosensitive resin composition includes (A) a conjugated diene polymer having a (meth)acryloyl group, (B) a compound having at least one ethylenically unsaturated group, (C) a photo-initiator, and (D) a compound represented by formula (I): where R1 and R2 independently represent a C1-C20 alkyl group or a C1-C20 aryl group, R3 represents hydrogen or methyl, and a is an integer ranging from 2 to 20.Type: ApplicationFiled: June 18, 2013Publication date: December 19, 2013Inventors: Chia-Hui YU, Chih-Hung LIN
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Publication number: 20130267626Abstract: The present invention allows for a photocurable composition which exhibits stable physical characteristics in a heat resistance test and an oil resistance test, and exhibits good debubbling properties and excellent workability. A photocurable composition including components (A) to (C). component (A): a compound that has a polymer obtained from a (meth)acrylic monomer as a main skeleton, and has at least two (meth)acrylic groups in the molecule component (B): a (meth)acrylic monomer including a component (b-1) and/or a component (b-2) component (b-1): a (meth)acrylic monomer having a hydroxyl group in the molecule, in an amount of 0.1 to 50 parts by mass with respect to 100 parts by mass of the component (A), component (b-2): a (meth)acrylic monomer having a saturated alicyclic skeleton in the molecule, in an amount of 0.Type: ApplicationFiled: November 15, 2011Publication date: October 10, 2013Applicant: THREE BOND CO., LTD.Inventors: Nao Arita, Kuniyuki Watanabe, Masayuki Tanaka
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Publication number: 20130099423Abstract: Disclosed is a photocurable composition for imprint which has good pattern-transferring property and good detachability from mold (pattern formation surface) regardless of the type of polymerizable monomer to be used, whereby it is possible to form a pattern having a shape with excellent reproducibility; and a method for forming a pattern on a substrate by photoimprint using the composition. The photocurable composition for imprint includes (A) polymerizable monomer having (meth)acrylic group, (B) photoinitiator, and (C) hyperbranched polymer obtained by polymerizing polymerizable monomer having (meth)acrylic group. Preferably, the composition includes 0.1-10 parts by mass of the photoinitiator (B) and 0.1-10 parts by mass of the hyperbranched polymer (C) relative to 100 parts by mass of the polymerizable monomer (A).Type: ApplicationFiled: June 29, 2011Publication date: April 25, 2013Applicant: TOKUYAMA CORPORATIONInventors: Hideki Umekawa, Yuichiro Kawabata
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Patent number: 8354458Abstract: A UV curable intermediate transfer media, such as a belt, that includes for example, a first supporting substrate, such as a polyimide substrate layer, and a second surface layer of a mixture of a dendritic, crosslinked, or branched polyester polyol acrylate, an acrylate, an optional vinyl monomer, and a photoinitiator component.Type: GrantFiled: August 30, 2010Date of Patent: January 15, 2013Assignee: Xerox CorporationInventors: Jin Wu, Jonathan H. Herko, Lanhui Zhang, Lin Ma
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Patent number: 8318053Abstract: Disclosed is a photosensitive resin composition including (A) a photopolymerizable monomer including a compound represented by the following Chemical Formula 1, wherein the substituents of Chemical Formula 1 are the same as defined in the specification, (B) a binder resin, (C) a photopolymerization initiator, (D) a pigment and (E) a solvent, and a color filter using the same.Type: GrantFiled: August 25, 2011Date of Patent: November 27, 2012Assignee: Cheil Industries Inc.Inventors: Jung-Sik Choi, Chang-Min Lee, Jin-Woo Park, Kyung-Won Ahn, Myung-Ho Cho
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Patent number: 8303862Abstract: Disclosed are a photosensitive resin composition for a color filter and a color filter including the same. The photosensitive resin composition for a color filter may include (A) an acrylic-based copolymer including a structural unit represented by the following Chemical Formula 1 and a structural unit represented by the following Chemical Formula 2, wherein the substituents of Chemical Formula 1 and Chemical Formula 2 are the same as defined in the specification; (B) an acrylic-based photopolymerizable monomer; (C) a photopolymerization initiator; (D) a pigment; and (E) a solvent.Type: GrantFiled: September 21, 2011Date of Patent: November 6, 2012Assignee: Cheil Industries Inc.Inventors: Chang-Min Lee, Kil-Sung Lee, Jae-Hyun Kim, Jun-Seok Kim, Sang-Won Cho, Gyu-Seok Han
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Patent number: 8298454Abstract: Disclosed are a photosensitive resin composition and a light blocking layer using the same. The photosensitive resin composition includes (A) a cardo-based monomer represented by the following Chemical Formula 1 or 2, wherein the substituents of Chemical Formula 1 and Chemical Formula 2 are the same as defined in the detailed description, (B) a cardo-based resin, (C) a reactive unsaturated compound, (D) a pigment, (E) an initiator, and (F) a solvent.Type: GrantFiled: September 23, 2011Date of Patent: October 30, 2012Assignee: Cheil Industries Inc.Inventors: Chang-Min Lee, Jun-Seok Kim, Kil-Sung Lee, Min-Sung Kim
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Patent number: 8293149Abstract: Disclosed are a photosensitive resin composition for a color filter and a color filter using the same. The photosensitive resin composition for a color filter may include (A) a copolymer including a structural unit represented by the following Chemical Formula 1, wherein the substituents of Chemical Formula 1 are the same as defined in the specification; (B) an acrylic-based photopolymerizable monomer; (C) a photopolymerization initiator; (D) a pigment; and (E) a solvent.Type: GrantFiled: July 26, 2011Date of Patent: October 23, 2012Assignee: Cheil Industries Inc.Inventors: Chang-Min Lee, Jun-Seok Kim, Kil-Sung Lee
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Patent number: 8277701Abstract: Disclosed are a photosensitive resin composition for a color filter and a color filter using the same. The photosensitive resin composition for a color filter includes (A) an acrylic-based binder resin including a structural unit represented by the following Chemical Formula 1, wherein the substituents of Chemical Formula 1 are the same as defined in the specification; (B) an acrylic-based photopolymerizable monomer; (C) a photopolymerization initiator; (D) a pigment; and (E) a solvent.Type: GrantFiled: August 1, 2011Date of Patent: October 2, 2012Assignee: Cheil Industries Inc.Inventors: Chang-Min Lee, Kil-Sung Lee, Jun-Seok Kim, Seong-Yong Uhm, Sang-Won Cho
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Patent number: 8273270Abstract: Disclosed are a photosensitive resin composition that includes (A) a cardo-based resin including repeating units represented by the following Chemical Formulae 1 and 2, wherein the substituents of Chemical Formulae 1 and 2 are the same as defined in the specification, (B) reactive unsaturated compound, (C) a pigment, (D) an initiator, and (E) a solvent, and a light blocking layer using the photosensitive resin composition.Type: GrantFiled: June 16, 2011Date of Patent: September 25, 2012Assignee: Cheil Industries Inc.Inventors: Chang-Min Lee, Kil-Sung Lee, Jun-Seok Kim, Jung-Sik Choi
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Patent number: 8263675Abstract: The present invention relates to a photosensitive resin composition for a color filter and a color filter fabricated using the same. The photosensitive resin composition includes (a) an acrylic-based resin, (b) a photopolymerizable monomer, (c) a photopolymerization initiator, (d) a pigment, and (e) a solvent. The acrylic-based resin is a copolymer including a repeating unit of an ethylenic unsaturated monomer including a carboxyl group and a repeating unit of an ethylenic unsaturated monomer including an alkoxy 4-oxo butanoic acid group. The photosensitive resin composition for a color filter can have residue removing characteristics, and is capable of forming fine pixels and providing a color filter having high resolution.Type: GrantFiled: March 4, 2010Date of Patent: September 11, 2012Assignee: Cheil Industries Inc.Inventors: Kil-Sung Lee, Jae-Hyun Kim, Chang-Min Lee, Eui-June Jeong
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Patent number: 7576138Abstract: A method of surface cross-linking superabsorbent polymer particles using UV irradiation is provided. The method is carried out in a so-called drum reactor, which comprises a hollow drum and an irradiation source. The drum has a longitudinal axis and a cross-section. Superabsorbent polymer particles are fed into the drum and are irradiated while they move within the drum, which is rotated around its longitudinal axis. The irradiation source is provided such that the radiation emitted by the irradiation source is able to reach superabsorbent polymer particles within said drum. The irradiation source for use in the method is able to emit UV radiation of a wavelength between about 100 nm and about 200 nm.Type: GrantFiled: August 23, 2006Date of Patent: August 18, 2009Assignee: The Procter & Gamble CompanyInventors: Andreas Flohr, Torsten Lindner, Esther Oliveros, Yoshiro Mitsukami
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Patent number: 7569618Abstract: A method of surface cross-linking superabsorbent polymer particles using UV irradiation is provided. The method is carried out in a so-called drum reactor, which comprises a hollow drum and an irradiation source. The drum has a longitudinal axis and a cross-section. Radical former molecules are applied on the surface of superabsorbent polymer particles. These superabsorbent polymer particles are fed into the drum and are irradiated while they move within the drum, which is rotated around its longitudinal axis. The irradiation source is provided such that the radiation emitted by the irradiation source is able to reach superabsorbent polymer particles within said drum. The irradiation source for use in the method is able to emit UV radiation of a wavelength between about 201 nm and about 400 nm.Type: GrantFiled: August 23, 2006Date of Patent: August 4, 2009Assignee: The Procter & Gamble CompanyInventors: Andreas Flohr, Torsten Lindner, Esther Oliveros, Yoshiro Mitsukami
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Patent number: 7537810Abstract: There are provided: a curable resin composition having a high exposure sensitivity and a good developing property, and thereby capable of forming an accurate and precise pattern; a liquid crystal panel substrate on which a protective film for covering a color layer or spacers for a liquid crystal layer, by using the curable resin composition, hardly causing a color irregularity and contrast irregularity; and a liquid crystal panel using the liquid crystal panel substrate and having a superior display quality. The curable resin composition of the present invention comprises: a copolymer (a) having a molecular structure in which a constitutional unit including an acidic functional unit and a constitutional unit including a photocurable functional group are linked at least; a photopolymerization initiator (b) having a tertiary amine structure; and a photocurable compound (c) having at least one acidic functional group and at least three photocurable functional groups.Type: GrantFiled: March 24, 2004Date of Patent: May 26, 2009Assignee: Dai Nippon Printing Co., Ltd.Inventors: Shinji Hayashi, Shunsuke Sega, Hiromu Taguchi, Mitsutaka Hasegawa
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Patent number: 7521487Abstract: A process for preparing a polyacrylate-based shaped article, a polyacrylate being polymerized by a conventional method, wherein the polyacrylate comprises copolymerized comonomers having thermally crosslinkable groups and comonomers having attached photoinitiators, and the polyacrylate is crosslinked thermally in a first step and by irradiation with UV light in a second step.Type: GrantFiled: April 29, 2005Date of Patent: April 21, 2009Assignee: tesa AktiengesellschaftInventors: Sven Hansen, Marc Husemann, Kay Brandes, Stephan Zollner
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Patent number: 7273896Abstract: This invention relates generally to compositions and systems for forming biomaterials containing a transient colorant for visualizing tissue or surgical materials coated with such biomaterials, to methods of using such compositions as bioadhesives, for tissue augmentation, in the prevention of surgical adhesions, for coating surfaces of synthetic implants, as drug delivery matrices, for ophthalmic applications, and in other applications.Type: GrantFiled: April 10, 2003Date of Patent: September 25, 2007Assignee: Angiotech Pharmaceuticals (US), Inc.Inventors: George Y. Daniloff, John R. Daniels
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Patent number: 7241817Abstract: The present invention relates to a process for grafting an unsaturated monomer onto a fluoropolymer, having the steps of: a) melt blending the fluoropolymer with the unsaturated monomer; b) forming the blend obtained in a) into films, sheets, granules or powder; c) exposing the products from step b), in the absence of air, to photon (?) or electron (?) irradiation with a dose of between 1 and 15 Mrad; and d) optionally treating the product obtained at c) in order to remove all or part of the unsaturated monomer that has not been grafted onto the fluoropolymer. Structures made with these materials are barriers to many fluids and in particular to petrol and to air-conditioning fluids and may be formed into bottles, tanks, containers, pipes, hoses and vessels of all sorts. They may also be converted into films with which packaging is made.Type: GrantFiled: June 2, 2004Date of Patent: July 10, 2007Assignee: Arkema FranceInventors: Anthony Bonnet, Barbara Ramfel, Fabrice Chopinez, Karine Triballier, Michael Werth, Thierry Pascal
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Patent number: 7037972Abstract: A multicomponent system curable thermally and with actinic radiation (dual cure), comprising (A) at least one component comprising at least one constituent containing at least one isocyanate-reactive functional group and at least one functional group having at least one bond which can be activated with actinic radiation, and at least one vinylaromatic-allyl alcohol copolymer, and (B) at least one component comprising at least one polyisocyanate, and its use as a coating material, adhesive and sealing compound.Type: GrantFiled: September 26, 2001Date of Patent: May 2, 2006Assignee: BASF Coatings AGInventors: Egbert Nienhaus, Bernhard Lettmann
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Patent number: 6852802Abstract: An object of the present invention is to provide a heavy metal ion scavenger having more excellent scavenging performance than previously. In order to attain this object, organic polymer materials of the present invention are characterized in that they have a polymer side chain derived from a haloalkyl-substituted styrene on the backbone of an organic polymer base and a functional group capable of forming a complex with a heavy metal ion has been introduced onto said polymer side chain. These organic polymer materials have excellent heavy metal ion scavenging performance so that they can be suitably used as heavy metal ion scavengers.Type: GrantFiled: October 20, 2000Date of Patent: February 8, 2005Assignee: Ebara CorporationInventors: Makoto Komatsu, Kazuyoshi Takeda, Kunio Fujiwara, Takeshi Takai
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Patent number: 6783809Abstract: A photosensitive composition of (a) a compound of formula (Ia) or (Ib) and (b) a bifunctional acrylate or methacrylate.Type: GrantFiled: September 17, 2001Date of Patent: August 31, 2004Assignee: Huntsman Advanced Materials Americas Inc.Inventors: Bettina Steinmann, Adrian Schulthess, Max Hunziker
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Patent number: 6620887Abstract: Crosslinked fine particles having a Tg of 100° C. or higher and an amount of remaining double bonds of 0.01 mmol/g or more, which are obtainable by polymerizing a compound (a1) having one or two radical-polymerizable ethylenic unsaturated groups in the molecule and a compound (a2) having three or more (meth)acryloyl groups in the molecule.Type: GrantFiled: June 25, 2001Date of Patent: September 16, 2003Assignee: Mitsubishi Rayon Co., Ltd.Inventors: Juichi Fujimoto, Seiji Nushi, Hiroshi Fukushima
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Patent number: 6515039Abstract: The invention relates to a method for the parallel and combinatory synthesis of compounds bound to a continuous polymeric solid phase supporting material. According to the method, a continuous polymeric solid phase supporting material is prepared, the material comprising a matrix of a supporting polymeric material and graft copolymer chains covalently bound to the supporting matrix, the graft copolymer chains having reactive groups being able to react with organic compounds, thereby forming spatially defined reaction sites. The method then comprises the sequential spotting of synthesis building blocks or reagents at the various reaction sites on the continuous solid phase supporting material to yield a substrate library of compounds bound to the solid phase supporting material, whereby each reaction site on the continuous solid phase supporting material determines the composition of the synthesized compound, which is bound directly on the supporting matrix via the reactive groups of the graft polymer chain.Type: GrantFiled: June 15, 2000Date of Patent: February 4, 2003Assignee: Poly-An GmbHInventors: Mathias Ulbricht, Rudolf Volkmer-Engert, Lothar Germeroth, Holger Wenschuh
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Patent number: 6326127Abstract: The present invention relates to a photo-curable polymer composition comprising (a) a first block copolymer comprising at least two blocks A of polymerised monovinyl aromatic monomer, at least one internal block B of polymerised conjugated diene monomer, and at least one tapered or random block C of polymerised monovinyl aromatic monomer and polymerised conjugated diene monomer and/or at least one block D which may be a block of polymerised conjugated diene monomer or a tapered or random block of polymerised monovinyl aromatic monomer and polymerised conjugated diene monomer, wherein block C is an internal polymer block adjacent a terminal block A or an internal block A which is adjacent to a terminal block D, and block D is a terminal block adjacent an internal block A, and, optionally, a residue of a coupling agent, wherein the residue, if present, is derived from a coupling agent containing alkoxy or epoxy functional groups; and (b) a photo-initiator.Type: GrantFiled: December 16, 1999Date of Patent: December 4, 2001Assignee: Kraton Polymers U.S. LLCInventors: Karin Marie-Louise Renee Morren, Xavier Muyldermans
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Patent number: 6054252Abstract: A negative-acting photoimageable composition useful as a primary imaging resist in the manufacture of printed circuit boards comprises an acid-functional binder polymer, a photopolymerizable component, and a photoinitiator chemical system, in which the binder polymer has an anhydride functional backbone half-esterified with a meth(acrylate) functional hydroxy-terminated oligomer, wherein the meth(acrylate) functionality is separated from the half-ester linkage by at least two alkoxylate groups and at least one ring opened lactone group for improved stripping ability in strong alkaline aqueous stripping solutions, while maintaining good chemical resistance to other processing chemicals, such as alkaline developing solutions, acid etching solutions, and acid plating baths.Type: GrantFiled: July 30, 1999Date of Patent: April 25, 2000Assignee: Morton International, Inc.Inventors: Daniel E. Lundy, Robert K. Barr, Edward J. Reardon
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Patent number: 5800965Abstract: A photopolymerizable composition for a photosensitive lithographic printing plate, comprising (A) addition-polymerizable ethylenically unsaturated bond-containing monomers, (B) a photopolymerization initiator system and (C) a polymer binder having carboxyl groups in its molecule, wherein the addition-polymerizable ethylenically unsaturated bond-containing monomers (A) contain a specific monomer which is a phosphoric acid ester compound (A-1) having at least one (meth)acryloyl group and/or a compound (A-2) of the following formula ##STR1## wherein R.sup.1 is a hydrogen atom or a methyl group, X is a C.sub.1-6 alkylene group which may be branched and may be substituted by halogen, and m is an integer of at least 2, and the polymer binder (C) having carboxyl groups in its molecule, is a compound having at least a part of the carboxyl groups reacted with an alicyclic epoxy group-containing unsaturated compound.Type: GrantFiled: December 26, 1996Date of Patent: September 1, 1998Assignee: Mitsubishi Chemical CorporationInventors: Shigeo Tsuji, Hideaki Okamoto
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Patent number: 5658967Abstract: The invention relates to a method for providing a surface with carboxyl groups. A compound is applied to the surface with at least one functional group which can be converted into a carboxyl group. Thereafter, this surface is treated with a plasma to immobilize the compound, and then the functional group is converted into a carboxyl group. Also provided is a surface having carboxyl groups which is obtained with this method and a product with such a surface for exposure to blood, typically in vivo blood flows.Type: GrantFiled: May 18, 1995Date of Patent: August 19, 1997Assignee: Cordis CorporationInventors: Jan Feijen, Johannes G. A. Terlingen, Jan Pleun Lens
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Patent number: 5338769Abstract: A photo-curable resin composition containing a polycarbonate having a number average molecular weight of between 200 and 10,000 and containing at least two (meth)acrylate groups in the molecule, or a diglycidyl phthalate (meth)acrylate, an organic polymer fine powder having an average particle diameter of between 1 .mu.m and 50 .mu.m and a photo-radical polymerization initiator; and a coating liquid to be applied to a resin pattern. This resin composition is useful for preparing a clasp pattern exhibiting a theoretical form for retention, durability, etc., i.e., a cast clasp basic pattern, for producing, by a lost wax method, a cast clasp which is a metal component for holding a partial denture, retaining it and supporting it.Type: GrantFiled: February 11, 1992Date of Patent: August 16, 1994Assignee: Mitsui Petrochemical Industries, Ltd.Inventor: Ryoichi Miyamoto
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Patent number: 5194454Abstract: According to the invention the material, in particular a textile, includes in its polymeric structure grafts forming complexes with at least one metal ion possessing recognized antiseptic activity. These grafts are formed by polymerization of unsaturated monomers with a complexing function, including the phosphate of ethylene glycol methacrylate or a polymerizable derivative of quinoline such as acryl 8-hydroxy quinoline. The process of preparation comprises a first step of grafting, for example by electronic irradiation of the material and impregnation with a bath of monomer, and a second step of impregnation of the grafted material with one or serveral baths containing the metal ion(s), such as copper, zinc, tin, mercury.Type: GrantFiled: January 29, 1991Date of Patent: March 16, 1993Assignee: Centre Technique Industriel dit: Institut Textile De FranceInventors: Roger Chatelin, Louis Gavet, Michel Bourgeois, Christine Darroux
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Patent number: 5100763Abstract: Disclosed is a water-developable photosensitive resin composition capable of hot melt molding, which comprises:(i) a water soluble or water dispersible polyvinyl alcohol prepared by saponifying a copolymer of a vinyl ester and another copolymerizable monomer, which has a saponification degree of the vinyl ester unit of 50 to 70 mol % and a hot melt flow starting temperature of 60.degree. to 130.degree. C.,(ii) a polymerizable monomer, and(iii) a photopolymerization initiator.Type: GrantFiled: March 12, 1990Date of Patent: March 31, 1992Assignee: Nippon Paint Co., Ltd.Inventors: Koichi Kimoto, Yasushi Umeda, Chitoshi Kawaguchi, Toshitaka Kawanami
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Patent number: 4935333Abstract: Disclosed is a water-developable photosensitive resin composition capable of hot melt molding, which comprises:(i) a water soluble or water dispersible polyvinyl alcohol prepared by saponifying a copolymer which is obtained from copolymerizing 0 to 20 mol % of a monomer not having an ionic group (hereinafter referred to as "nonionic monomer"), 0 to 10 mol % of an ionic group-containing monomer (hereinafter referred to as "ionic monomer") and the remaining amount of a vinyl ester in the presence of a thiolic acid wherein the total content of the ionic monomer and nonionic monomer is 0.1 to 20 mol %; said polyvinyl alcohol having a terminal mercapto group, a saponification degree of the vinyl ester unit of 50 to 70 mol %, and a hot melt flow starting temperature of 60.degree. to 130.degree. C.(ii) a polymerizable monomer, and(iii) a photopolymerization initiator.Type: GrantFiled: January 15, 1988Date of Patent: June 19, 1990Assignee: Nippon Paint Co., Ltd.Inventors: Koichi Kimoto, Yasushi Umeda, Chitoshi Kawaguchi, Toshitaka Kawanami
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Patent number: 4761436Abstract: A contact lens comprising a lens substrate in shape of a lens which comprises a triorganovinylsilane based polymer, said lens substrate having a hydrophilic polymeric chain grafted onto the surface thereof. This contact lens is not only excellent in oxygen permeability, mechanical strength, dimensional stability, vision correcting ability, staining resistance and handleability, but also good in affinity with eyes due to good hydrophilic property possessed by the surface, which can be worn continuously for a long time.Type: GrantFiled: October 21, 1986Date of Patent: August 2, 1988Assignee: Shin-Etsu Chemical Co., Ltd.Inventors: Yoshiyuki Kohno, Kenichi Tomita, Minoru Takamizawa, Tetsuya Mayuzumi, Shigehiro Nagura, Akira Yamamoto
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Patent number: 4743657Abstract: A method is provided for preparing a polymer bound stabilizer which comprises reacting a stabilizer precursor molecule containing a reactive double bound which is not readily homopolymerizable with a pre-formed polymer in the presence of a free radical.Type: GrantFiled: March 17, 1986Date of Patent: May 10, 1988Assignee: Milliken Research CorporationInventors: John W. Rekers, Gerald Scott
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Patent number: 4732943Abstract: An adhesive for attaching polymeric or polymerizable restorative materials to dentine or other tooth structure, which comprises a polymer of (a) a condensate of .epsilon.-caprolactone with one or more acrylic monomers containing hydroxy groups and (b) a polymer containing binding groups capable of binding to the dentine or other tooth structure, optionally dissolved in a suitable solvent.The adhesive may be used in adhesive compositions including polymerizable monomers, polymerization initiators or fillers.Type: GrantFiled: April 21, 1986Date of Patent: March 22, 1988Assignee: Commonwealth Scientific and Industrial Research OrganizationInventors: Derrick R. Beech, Ezio Rizzardo, Wayne D. Cook, Malcolm C. Smail
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Patent number: 4604342Abstract: A photopolymerizable mixture is described which contains the following: a binding agent which is soluble or at least capable of swelling in aqueous-alkaline solutions, a photoinitiator or a photoinitiator system and at least one ethylenically unsaturated monomer, whereby at least one monomer contains an aromatic hydroxyl-, mercapto-, sulfonamide- or a mono-N-substituted sulfonamide group, or combinations thereof.Type: GrantFiled: March 13, 1985Date of Patent: August 5, 1986Assignee: E. I. Du Pont de Nemours and CompanyInventors: Manfred A. J. Sondergeld, Mario Grossa