Carbon And Hyrogen Only Patents (Class 522/125)
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Patent number: 5445919Abstract: A photopolymerizable composition for forming protective layers of color filters, which comprises:(1) a photopolymerization initiator or a photopolymerization initiator system,(2) an addition-polymerizable monomer having an ethylenically unsaturated double bond, and(3) a resin produced by reaction of an anhydride-containing copolymer having a number average molecular weight of 500 to 30,000 which contains repeating units represented by at least formulas (I), (II) and (III), respectively, with a primary amine represented by formula (IV) with the ratio of the primary amine to the copolymer being 0.1 to 1.0 equivalent per equivalent of the anhydride in the copolymer: ##STR1## wherein the variables in formulas (I), (II), (III) and (IV) are defined in the specification.Type: GrantFiled: June 10, 1994Date of Patent: August 29, 1995Assignee: Fuji Photo Film Co., Ltd.Inventors: Yuichi Wakata, Masayuki Iwasaki, Koji Inoue
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Patent number: 5411994Abstract: Disclosed are graft copolymers of polyolefins and a method of preparing said graft copolymers. The method comprises irradiating a mass of olefin polymer particles and thereafter treating the mass of particles with a vinyl monomer in liquid form. A nonoxidizing environment is maintained throughout the process while free radicals produced in the olefin polymer by the irradiation are present, thereby preventing degradation of the polymer. In a final step, residual free radicals are deactivated, and any unreacted monomer is removed.Type: GrantFiled: November 6, 1992Date of Patent: May 2, 1995Assignee: Himont IncorporatedInventors: Paolo Galli, Anthony J. DeNicola, Jr., Jeanine A. Smith
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Patent number: 5350604Abstract: A process for cationically polymerizing 1,3-diisopropenylbenzene to produce a polymer which is predominantly a polyindane is disclosed. The resulting polyindanes are novel compounds useful as low dielectric constant coatings. Compositions containing 1,3-diisopropenylbenzene and cationic photoinitiators, and optionally containing a polyindane useful for preparing coatings, are disclosed as are processes for coating substrates using the compositions.Type: GrantFiled: December 9, 1992Date of Patent: September 27, 1994Assignee: Rensselaer Polytechnic InstituteInventor: James V. Crivello
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Patent number: 5160464Abstract: A process for the preparation of an oriented homo- or co-polyalkene material of improved strain rate sensitivity, which process comprises subjecting the oriented homo- or co-polyalkene material having a weight average molecular weight (M.sub.w).ltoreq.350,000, a number average molecular weight (M.sub.n).gtoreq.5,000, and a 2% secant modulus of at least 10 GPa at a strain rate of 2.times.10.sup.-5 sec.sup.-1 to a high energy irradiation of a dosage of at least 1 Mrad and not more than 60 Mrads at an elevated temperature in vacuo or in an inert or sensitizing atmosphere.Type: GrantFiled: March 8, 1988Date of Patent: November 3, 1992Assignee: National Research Development CorporationInventors: Ian M. Ward, Denis W. Woods, Walter K. Busfield
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Patent number: 5135837Abstract: A photosensitive elastomeric composition and process of using the composition to prepare flexographic printing plates having substantially improved solvent resistance are described.Type: GrantFiled: September 5, 1990Date of Patent: August 4, 1992Assignee: E. I. Du Pont de Nemours and CompanyInventor: David W. Swatton
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Patent number: 5104921Abstract: A cured composition possessing excellent cohesive strength at high temperatures along with excellent adhesion, shear strength and solvent resistance is prepared by the high energy ionizing radiation initiated curing of a polymer composition comprising an alkenyl arene/conjugated diene block copolymer and a oligomer such that the unsaturation index of the composition is minimized. The radiation initiated curing of the adhesive composition is accomplished without requiring the aid of a coupling agent to promote crosslinking of the block copolymer during exposure to the radiation.Type: GrantFiled: October 12, 1989Date of Patent: April 14, 1992Assignee: Shell Oil CompanyInventors: James R. Erickson, Earle E. Ewins, Jr.
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Patent number: 5002975Abstract: Liquid, photocurable coating compositions containing nitrile copolymers. Such compositions comprises from about 10 percent to about 60 percent by weight of a high nitrile copolymer, containing at least about 70 percent by weight of a nitrile polymer; from about 30 percent to 90 percent by weight of a photopolymerizable solvent for the high nitrile copolymer, wherein the photopolymerizable solvent is selected from the group consisting of N-vinyl pyrrolidone, cyanoethylacrylate, styrene, N,N-dimethylacylamide, N,N-methylenebisacrylamide, gamma-butyrolactone and combinations thereof, and from about 0.1 percent to about 10 percent by weight of a photoinitiator soluble in the photopolymerizable solvent for curing the high nitrile copolymer with the incorporation of at least 50 percent by weight of the solvent therein upon exposure to ultraviolet radiation, having a wavelength of from about 2000 .ANG. to 14,000 .ANG.Type: GrantFiled: December 23, 1988Date of Patent: March 26, 1991Assignee: The Standard Oil CompanyInventors: Rosemary Bartoszek-Loza, Richard J. Butler
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Patent number: 4996134Abstract: A conjugated diene copolymer comprising (A) 10 to 60 mole % of a conjugated diene compound unit, (B) 5 to 50 mole % of an .alpha.,.beta.-ethylenically unsaturated carboxylic acid unit, (C) 0.1 to 20 mole % of a polyfunctional alkenyl compound unit, (D) 0 to 10 mole % of a diene compound unit having cyclic carbon-carbon double bonds and (E) 0 to 80 mole % of a monoolefinically unsaturated compound unit, the sum of the amounts of units (A), (B), (C), (D) and (E) being 100 mole %, said copolymer having an intrinsic viscosity [.eta.] of 0.01 to 3.0 dl/g as measured at 30.degree. C. in dimethylformamide. The copolymer is soluble in aqueous alkali solutions, excels in processability and photosetting property, and has excellent rubber elasticity and transparency even after photosetting.Type: GrantFiled: March 26, 1985Date of Patent: February 26, 1991Assignee: Japan Synthetic Rubber Co., Ltd.Inventors: Hiroji Enyo, Shin-ichiro Iwanaga, Yasuhiko Takemura
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Patent number: 4980269Abstract: A photosensitive elastomeric composition comprising (1) at least one elastomer, (2) an addition-polymerizable compound having at least one CH.sub.2 .dbd.C< group and (3) a polymerization initiator activatable by actinic light, wherein the elastomer (1) is an elastomer selected from (a) an elastomeric polymer composed of a polyene monomer containing at least two non-conjugated double bonds and a conjugated diene-type monomer or both a conjugated diene-type monomer and a copolymerizable vinyl monomer and (b) an elastomeric linear A-B type (wherein A represents a polymer block of a monovinyl aromatic compound and B represents a polymer block of a conjugated diene-type monomer) block copolymer in which a terminal group having a polymerizable ethylenic double bond is present in at least one end of the molecular chain.Type: GrantFiled: May 11, 1988Date of Patent: December 25, 1990Assignee: Nippon Zeon Co., Ltd.Inventors: Fusayoshi Sakurai, Hiroto Kidokoro, Mitsuhiro Tamura
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Patent number: 4940650Abstract: A flexographic printing plate which is resistant to ozone cracking and where the flexible recording layer has an anisotropy factor AF of <1.5 is produced from a photosensitive mixture consisting of(A) one or more elastomeric binders,(B) a mixture of(B1) from 5 to 20% by weight of one or more photopolymerizable organic compounds which are compatible with (A) and contain two or more olefinic double bonds and(B2) from 1 to 15% by weight of one or more monoolefinically unsaturated organic compounds which are compatible with (A) and whose homopolymer has a glass transition temperature which is below room temperature,(C) from 0.1 to 10% by weight of one or more photoinitiators and(D) from 0 to 27% by weight of conventional assistants and additives,the anisotropy factor AF of the flexible recording layer being defined as the ratio of the moduli of elasticity at 100% elongation of strips measuring 2.times.Type: GrantFiled: March 31, 1989Date of Patent: July 10, 1990Assignee: BASF AktiengesellschaftInventors: Karl-Rudolf Kurtz, Horst Koch, Guenther Schulz
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Patent number: 4839261Abstract: A process for forming electroless copper plating patterns comprising: (a) laminating a substrate with a photocurable laminate, (b) exposing said photocurable laminate to a high energy ray, (c) removing unexposed parts of the laminate, and (d) electrolessly plating a desired pat of the laminate with copper; wherein said photocurable layer comprises (a) 100 parts by weight of a compound having recurring units represented by the following formulae [A] and [B] ##STR1## and (b) 5 to 1,000 parts by weight of a compound, which is compatible with compound (a), having a group represented by the formula--(R.sub.4).sub.nwherein R.sub.4 is a group having a double bond and n is an integer of 1 to 50 and characterized by a viscosity at 20.degree. C. of from 0.001 to 500 poises.Type: GrantFiled: September 15, 1987Date of Patent: June 13, 1989Assignee: Asahi Kasei Kogyo Kabushiki KaishaInventors: Nobuo Nakazaki, Hideo Ai, Manabu Miyao
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Patent number: 4794130Abstract: A shaped article of halogenated polymer which is obtained by causing a halogen to react upon a shaped article of a polymer by irradiation of light is irradiated with light in the presence of an acetylene compound to have the acetylene compound graft polymerized onto the shaped article of polymer.Type: GrantFiled: March 30, 1987Date of Patent: December 27, 1988Assignees: Agency of Industrial Science and Technology, Ministry of International Trade and IndustryInventors: Kiyoshi Hayakawa, Hiromi Yamakita, Masato Tazawa, Hiroshi Taoda
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Patent number: 4767797Abstract: A linear polymer having a recurring unit represented by the formula (I): ##STR1## wherein R.sub.1, R.sub.2, R.sub.3 and R.sub.4 each independently is a hydrogen atom, a C.sub.1-10 alkyl group, a C.sub.6-10 cycloalkyl group, an aryl group, or a halogen atom and the ethynyl group is in either meta position or para position to the main polymer chain;and a weight-average molecular weight of 1,000 to 1,000,000. A resin composition consisting essentially of (i) a polymer having a recurring unit represented by the formula (I) or a polymer having a recurring unit represented by the formula (I) and a recurring unit represented by the formula (II): ##STR2## wherein X and Y each independently is a C.sub.6-20 aryl group, a C.sub.1-10 alkyl group, a C.sub.6-10 cycloalkyl group, a silyl group having a C.sub.1-10 alkyl group or a C.sub.Type: GrantFiled: August 25, 1986Date of Patent: August 30, 1988Assignee: Asahi Kasei Kogyo Kabushiki KaishaInventors: Hideo Ai, Yohsuke Koizumi, Naohiro Tsuruta
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Patent number: 4743657Abstract: A method is provided for preparing a polymer bound stabilizer which comprises reacting a stabilizer precursor molecule containing a reactive double bound which is not readily homopolymerizable with a pre-formed polymer in the presence of a free radical.Type: GrantFiled: March 17, 1986Date of Patent: May 10, 1988Assignee: Milliken Research CorporationInventors: John W. Rekers, Gerald Scott
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Patent number: 4585808Abstract: A method of reducing the monomer content of a polymer or polymerization media comprising subjecting the polymer containing the monomer to sufficient irradiation with a high energy radiation to polymerize said monomer, said radiation preferably occurring in presence of chemical agent that accelerate the rate of consumption of the undesirable monomer, i.e. the monomer considered hazardous and/or protects the polymer from radiation degradation.Type: GrantFiled: February 4, 1982Date of Patent: April 29, 1986Assignee: The Goodyear Tire & Rubber CompanyInventor: Patrick J. Reilly