Processes Of Chemically Modifying A Solid Polymer Or Sicp Derived From At Least One Saturated Monomer By Treating Solid Polymer Or Sicp With A Chemical Reactant; Or Compositions Therefor Patents (Class 522/134)
  • Publication number: 20030078314
    Abstract: The present invention provides solid supports (e.g., glass) and polymer hydrogels (particularly polymer hydrogel arrays present on a solid support) comprising one or more reactive sites for the attachment of biomolecules, as well as biomolecules comprising one or more reactive sites for attachment to solid supports and polymer hydrogels. The invention further provides novel compositions and methods for the preparation of biomolecules, solid supports, and polymer hydrogels comprising reactive sites. The invention also provides for preparation of crosslinked solid supports, polymer hydrogels, and hydrogel arrays, wherein one or more biomolecules is attached by means of the reactive sites in a photocycloaddition reaction. Advantageously, according to the invention, crosslinking of the hydrogel and attachment of biomolecules can be done in a single step.
    Type: Application
    Filed: October 11, 2001
    Publication date: April 24, 2003
    Applicant: Motorola Inc.
    Inventors: Travis Johnson, John McGowen, Allyson Beuhler, Charles Kimball Brush, Robert Emil Lajos
  • Publication number: 20030069322
    Abstract: A latent material having various controlled shrinkage tensions and patterns and a method of making the same. The materials include polymer materials that are capable of absorbing microwave energy. Different degrees of shrinkage of the material may be controlled to create different tensions in the material. Additionally, various stereo and three-dimensional patterns may be generated on the material. These materials may be used in the formation of personal care articles. The materials are made by incorporating a polymer material onto the film, wherein the polymer material is capable of turning microwave energy into heat. Upon exposure to microwave radiation, the heat will cause the latent material to shrink. The use of different types and amounts of polymer materials will result in a latent material having different tensions and patterns.
    Type: Application
    Filed: August 26, 2002
    Publication date: April 10, 2003
    Inventors: Peiguang Zhou, Lance James Garrett
  • Publication number: 20030039768
    Abstract: A photoactive polymer from the class of polyimides, polyamide acids and esters thereof comprises as a side-chain a photocrosslinkable group of the general formula (I) 1
    Type: Application
    Filed: July 16, 2002
    Publication date: February 27, 2003
    Inventors: Richard Buchecker, Guy Marck, Olivier Muller
  • Patent number: 6518327
    Abstract: Graft copolymers are prepared, in a non-oxidizing atmosphere, by (1) irradiating a particulate olefin polymer material with high energy ionizing radiation, (2) treating the irradiated olefin polymer material with at least one grafting monomer that is capable of forming side chains on the olefin polymer material, in the presence of at least one additive to control the molecular weight of the side chains of the polymerized grafting monomer selected from (a) at least one hydroxylamine derivative polymerization inhibitor, and (b) at least one thio-, nitro-, or halogen-substituted aliphatic or aromatic compound or an aliphatic or aromatic phosphine derivative, and (3) deactivating the residual free radicals in the resulting grafted olefin polymer material and removing any unreacted vinyl monomer from the material. Graft copolymers with low molecular weight side chains are produced that are easier to process and have improved internal and surface morphology.
    Type: Grant
    Filed: November 2, 2000
    Date of Patent: February 11, 2003
    Assignee: Basell Poliolefine Italia S.p.A.
    Inventors: Vu A. Dang, Tam T. M. Phan, Jeanine A. Smith, Cheng Q. Song
  • Patent number: 6500877
    Abstract: The present invention discloses an ultraviolet light curable paint composition and method for applying and making such a composition to a substrate. Suitable substrates include glass, metals, and various plastics such as polycarbonates. The disclosed composition does not contain any significant amount of volatile organic solvents that do not become incorporated in the coating or are released to ambient after curing.
    Type: Grant
    Filed: September 25, 2000
    Date of Patent: December 31, 2002
    Assignee: Krohn Industries, Inc.
    Inventor: Roy C. Krohn
  • Patent number: 6500878
    Abstract: In a process for improving the adhesive strength of radiation-cured films of acrylate resins which comprise compounds having at least one amine group and at least one unsaturated acrylate group and, in particular, an amino-modified acrylate resin having a molecular weight Mn of at least 300, on substrates, the acrylate resins are admixed with amine-hardenable polyepoxides having an epoxide value of from 1 to 15 mol/kg such as polyglycidyl esters or polyglycidyl ethers. Preferred curable mixtures of amine-modified acrylate resins with polyepoxides have amine numbers of from 1 to 250 mg KOH/g and epoxide values of from 0.1 to 4 mol/kg. The mixtures applied as coating films to metal substrates or plastics substrates, in particular, are radiation-cured with, e.g., UV light and an at least partial amine hardening of the polyepoxide compounds in the mixture is conducted by thermal conditioning at, e.g., from 50 to 120° C.
    Type: Grant
    Filed: July 18, 2000
    Date of Patent: December 31, 2002
    Assignee: BASF Aktiengesellschaft
    Inventors: Wolfgang Reich, Peter Enenkel, Edmund Keil, Matthias Lokai, Erich Beck, Klaus Menzel
  • Patent number: 6475701
    Abstract: There is provided an active energy beam curable composition, which is useful for forming a solder resist film for a printed wiring board, which can be developed through an ultraviolet exposure and a dilute alkali aqueous solution, and is excel lent in heat resistance, adhesivity and chemical resistance. There is also proposed a printed wiring board provided with a cured film of such an active energy beam curable composition. This composition is featured in that it comprises not only an active energy beam curable vinyl copolymer modified resin wherein an epoxy compound having an ethylenic unsaturated group is added to a copolymer comprising styrene, (metha)acrylic acid, and, as an optional component, (metha)acrylate; but also an active energy beam curable bisphenol type epoxyacrylate resin.
    Type: Grant
    Filed: February 12, 2001
    Date of Patent: November 5, 2002
    Assignee: Tamura Kaken Corporation
    Inventors: Takao Ohno, Ken Ito, Ichiro Miura
  • Patent number: 6461691
    Abstract: A radiation curable, flexible, paintable composition produced from epoxy compounds and one or more polyol(s) has enhanced durability, thick and thin film adhesion, resistance to mold growth and dimensional changes while reducing solvent emissions. The composition can reduce, if not eliminate, runs and drips during the thermal bake cycles which are associated with using conventional compositions in automotive applications.
    Type: Grant
    Filed: November 24, 1999
    Date of Patent: October 8, 2002
    Assignee: Denovus LLC
    Inventors: Donald W. Taylor, Todd W. Scrivens, Laurie Denise Lovshe, Jeffrey T. Pachl
  • Publication number: 20020136968
    Abstract: This invention provides a colored photosensitive composition comprising a colorant (A), a binder polymer (B) containing monomer unit having oxetane structure, a photo-polymerizable compound (C) and a photo-polymerization initiator (D), and, using the colored photosensitive composition of the invention, color pattern having excellent solvent resistance can be formed even when the colored photosensitive composition contains the colorant (A) in a high concentration.
    Type: Application
    Filed: January 22, 2002
    Publication date: September 26, 2002
    Inventor: Kazuo Takebe
  • Patent number: 6451386
    Abstract: A process using acrylate monomers and ultraviolet light permits modification of porous polymeric materials without the use of a free radical initiator is described as is the material so modified. The modified polymeric material exhibits new properties such as wetability and advantageous flow characteristics that are useful in filtration.
    Type: Grant
    Filed: August 30, 2000
    Date of Patent: September 17, 2002
    Assignee: PTI Advanced Filtration, Inc.
    Inventor: John A. Simonetti
  • Publication number: 20020091173
    Abstract: A curable re-release adhesive which, when subjected to a curing reaction caused by irradiation with radiation, shows a sufficient drop of adhesion and causes the adherend to be warped to a minimized extent as developed by the shrinkage force caused by the curing reaction. The re-release adhesive contains a radiation-reactive polymer including a main chain and a plurality of intramolecular side chains, each such side chain having a terminal carbon-carbon double bond, a chain length of 6 or more in terms of number of atoms, and the same or a different number of atoms as each other side chain in the polymer. The release adhesive shows a shrinkage force of 30 MPa or less as developed by a curing reaction upon irradiation. A re-release adhesive sheet is also disclosed, including a substrate film and an adhesive layer containing the re-release adhesive, provided on one surface thereof.
    Type: Application
    Filed: December 13, 2001
    Publication date: July 11, 2002
    Applicant: NITTO DENKO CORPORATION
    Inventors: Kouichi Hashimoto, Takahiro Fukuoka, Koji Akazawa, Yoshio Nakagawa, Tatsuya Kubozono
  • Patent number: 6407146
    Abstract: A curable composition which comprises the following two components: (I) a vinyl polymer having at least one crosslinkable silyl group represented by the general formula (1) given below, and (II) an epoxy resin or a polyether polymer having at least one crosslinkable silyl group; —[Si(R1)2−b(Y)bO]m—Si(R2)3−a(Y)a  (1) {wherein R1 and R2 each represents an alkyl group containing 1 to 20 carbon atoms, an aryl group containing 6 to 20 carbon atoms, an aralkyl group containing 7 to 20 carbon atoms, or a triorganosiloxy group represented by the formula (R′)3SiO— (in which R′ represents a monovalent hydrocarbon group containing 1 to 20 carbon atoms and the three R's may be the same or different) and, when there are two or more R1 or R2 groups, they may be the same or different; Y represents a hydroxy group or a hydrolyzable group and, when there are two or more Y groups, they may be the same or different; a represents 0, 1, 2 or 3; b represents
    Type: Grant
    Filed: April 27, 2000
    Date of Patent: June 18, 2002
    Assignee: Kaneka Corporation
    Inventors: Masayuki Fujita, Yoshiki Nakagawa, Masato Kusakabe
  • Publication number: 20020055550
    Abstract: By blending novel organosiloxane polymers of the invention with a crosslinking agent and a photoacid generator, photo-curable resin compositions are formulated which can be exposed to radiation in a broad wavelength range and readily form a thin film without oxygen attack. From the compositions, fine patterns having improved dry etching resistance can be formed. Cured coatings of the compositions having improved substrate adhesion, heat resistance, and electrical insulation are suitable as a protective film for electric and electronic parts.
    Type: Application
    Filed: September 12, 2001
    Publication date: May 9, 2002
    Applicant: Shin-Etsu Chemical Co. Ltd.
    Inventors: Hideto Kato, Takafumi Ueda, Tomoyoshi Furihata
  • Patent number: 6369123
    Abstract: Radiation-crosslinkable elastomeric compositions containing: (a) an elastomeric polymer containing abstractable hydrogen atoms in an amount sufficient to enable the elastomeric polymer to undergo crosslinking in the presence of a suitable radiation-activatable crosslinking agent; and (b) a radiation-activatable crosslinking agent of the formula: wherein: X represents CH3—; phenyl; or substituted-phenyl; or substituted-phenyl with the proviso that any substituents on the substituted-phenyl do not interfere with the light-absorbing capacity of the radiation-activatable crosslinking agent and do not promote intramolecular hydrogen abstraction of the radiation activatable crosslinking agent; W represents —O—, —NH—, or —S—; Z represents an organic spacer selected from the group consisting of aliphatic, aromatic, aralkyl, heteroaromatic, and cycloaliphatic groups free of esters, amides, ketones, urethanes, and also free of ethers, thiols, allylic grou
    Type: Grant
    Filed: August 14, 1995
    Date of Patent: April 9, 2002
    Assignee: 3M Innovative Properties Company
    Inventors: Peter A. Stark, Edward G. Stewart, Albert I. Everaerts
  • Patent number: 6329443
    Abstract: New imido(meth) acrylates of general formula (1), wherein R1, R2 and R3 may be the same or different and each represents H or CH3; R4 to R7 may be the same or different and each represents H or CmH2m+1 (in which m is 1 to 6); and n represents 1 to 4, and radiation-curable compositions prepared from them, easily cured by the irradiation with radiations, particularly ultraviolet rays, to form cured compositions excellent in weather resistance, abrasion resistance and adhesion to a base, and free from the problem of odor.
    Type: Grant
    Filed: December 20, 1999
    Date of Patent: December 11, 2001
    Assignee: Toagosei CO, Ltd.
    Inventors: Eiichi Okazaki, Tetsuji Jitsumatsu
  • Publication number: 20010039300
    Abstract: The present photo-curable resin composition, at least one of which comprises an organic silicic compound, an epoxy resin and a photo initiator capable of polymerizing the organic silicic compound or epoxy resin upon absorption of actinic ray, undergoes polymerization and curing upon absorption of actinic ray, and is suitably applied to multilayered wiring boards and semiconductor devices because its cured product can maintain a desired modulus of elasticity at temperatures as high as or higher than Tg without any decrease in the bonding strength at elevated temperatures and with less development of cracks or peeling.
    Type: Application
    Filed: February 23, 2001
    Publication date: November 8, 2001
    Inventors: Masao Suzuki, Yuichi Satsu, Akio Takahashi, Harukazu Nakai, Yuzo Ito
  • Patent number: 6291543
    Abstract: A surfacially ultraviolet radiation-crosslinked article formed of a homogeneous composition including an elastoplastic material, a cross-linker component that is cross-linkable by free-radical polymerization, and a free-radical source material generating free radicals in exposure to ultraviolet radiation, wherein the elastoplastic material is surfacially cross-linked by exposure to ultraviolet radiation, wherein the sub-surface bulk volume of the article is non-cross-linked, and the article is resiliently deformable from and resiliently recoverable to a shape of the article when it was exposed to ultraviolet radiation for surfacial cross-linking thereof. The article is particularly amenable to embodiment as a catheter, or other similar medical device for cardiovascular or other medical procedures.
    Type: Grant
    Filed: May 24, 2000
    Date of Patent: September 18, 2001
    Assignee: Polyzen, Inc.
    Inventor: Tilak M. Shah
  • Patent number: 6274643
    Abstract: A curable composition comprising a) a curable epoxy resin, a thermoplastic ethylene-vinyl acetate copolymer resin, and an effective amount of a photocatalyst for the curable epoxy resin, wherein the composition is free from hydrocarbon polyolefins and wherein the sum of a) and b) is 100 weight percent.
    Type: Grant
    Filed: July 26, 2000
    Date of Patent: August 14, 2001
    Assignee: 3M Innovative Properties Company
    Inventors: Naimul Karim, Clayton A. George, Christopher M. Meyer
  • Patent number: 6274695
    Abstract: The present invention relates to a treating agent for liquid crystal alignment, which is an agent for liquid crystal alignment to be used for a method in which polarized ultraviolet rays or electron rays are irradiated on a polymer thin film formed on a substrate in a predetermined direction relative to the substrate plane, and said substrate is used for aligning liquid crystal without rubbing treatment, wherein said agent for liquid crystal alignment contains a polymer compound having photochemically reactive groups in the polymer main chain and a glass transition temperature of at least 200° C.
    Type: Grant
    Filed: November 1, 1999
    Date of Patent: August 14, 2001
    Assignee: Nissan Chemical Industries, Ltd.
    Inventors: Hideyuki Endou, Takayasu Nihira, Hiroyoshi Fukuro
  • Publication number: 20010003759
    Abstract: A photo curable resin composition, which comprises (A) an acid-modified, vinyl group-containing epoxy resin, (B) an elastormer, (C) a photopolymerization initiator, (D) a diluent and (E) a curing agent, can gives a high performance cured film having distinguished heat resistance, humidity-heat resistance, adhesibility, mechanical characteristics and electrical characteristics, and a photosensitive element, which comprises a support and a layer of the photo curable resin composition laid on the support, has distinguished heat resistance, humidity-heat resistance, adhesibility, mechanical characteristics and electrical characteristics.
    Type: Application
    Filed: November 24, 1998
    Publication date: June 14, 2001
    Inventors: KUNIAKI SATO, HIROAKI HIRAKURA, TOSHIHIKO ITO, TAKAO HIRAYAMA, TOSHIZUMI YOSHINO
  • Patent number: 6184263
    Abstract: A composition which comprises a mixture of (A) a first component comprising a polymer, at least some of the monomer repeat units of which have at least one photosensitivity-imparting group thereon, said polymer having a first degree of photosensitivity-imparting group substitution and being of the formulae specified in the claims, and (B) a second component which comprises either (1) a polymer having a second degree of photosensitivity-imparting group substitution lower than the first degree of photosensitivity-imparting group substitution, wherein said second degree of photosensitivity-imparting group substitution may be zero, wherein the mixture of the first component and the second component has a third degree of photosensitivity-imparting group substitution which is lower than the first degree of photosensitivity-imparting group substitution and higher than the second degree of photosensitivity-imparting group substitution, or (2) a reactive diluent having at least one photosensitivity-imparting group per
    Type: Grant
    Filed: December 23, 1998
    Date of Patent: February 6, 2001
    Assignee: Xerox Corporation
    Inventors: Ram S. Narang, Timothy J. Fuller
  • Patent number: 6177144
    Abstract: The present invention relates to a radiation-curable binder BM consisting of a copolymer which is composed of: A) from 80 to 99% by weight of a hydroxyl-containing polyether acrylate and/or polyester acrylate A), which optionally contains a mono-, di- and/or polyamine AA) as adduct, and of B) from 1 to 20% by weight of benzophenonetetracarboxylic acid, its anhydrides and/or its esters. The invention additionally relates to processes for the preparation of the binder BM and to the use of the binders BM in radiation-curable coating compositions.
    Type: Grant
    Filed: January 14, 1999
    Date of Patent: January 23, 2001
    Assignee: BASF Coatings AG
    Inventors: Wolfgang Kranig, Rainer Blum
  • Patent number: 6165563
    Abstract: This invention relates to star-branched polymers containing pendent olefinic groups which have been crosslinked using actinic radiation and the use of these polymers in adhesives and coating applications.
    Type: Grant
    Filed: November 12, 1998
    Date of Patent: December 26, 2000
    Assignee: National Starch and Chemical Investment Holding Corporation
    Inventors: Rama S. Chandran, Smita M. Shah, Paul B. Foreman
  • Patent number: 6156815
    Abstract: 1,2-Disulfones are particularly suitable as thermally and photochemically activatable latent acid catalysts for binder systems which contain at least one acid-curable component.
    Type: Grant
    Filed: June 10, 1999
    Date of Patent: December 5, 2000
    Assignee: Ciba Specialty Chemicals Corporation
    Inventors: Ekkehard Bartmann, Jorg Ohngemach
  • Patent number: 6153302
    Abstract: A curable composition comprising a) a curable epoxy resin, a thermoplastic ethylene-vinyl acetate copolymer resin, and an effective amount of a photocatalyst for the curable epoxy resin, wherein the composition is free from hydrocarbon polyolefins and wherein the sum of a) and b) is 100 weight percent.
    Type: Grant
    Filed: February 29, 2000
    Date of Patent: November 28, 2000
    Assignee: 3M Innovative Properties Company
    Inventors: Naimul Karim, Clayton A. George, Christopher M. Meyer
  • Patent number: 6136384
    Abstract: A curable composition comprising a) a curable epoxy resin, a thermoplastic ethylene-vinyl acetate copolymer resin, and an effective amount of a photocatalyst for the curable epoxy resin, wherein the composition is free from hydrocarbon polyolefins and wherein the sum of a) and b) is 100 weight percent.
    Type: Grant
    Filed: February 29, 2000
    Date of Patent: October 24, 2000
    Assignee: 3M Innovative Properties Company
    Inventors: Naimul Karim, Clayton A. George, Christopher M. Meyer
  • Patent number: 6063829
    Abstract: A treating method for liquid crystal alignment, which comprises applying polarized ultraviolet or electron rays to a polymer thin film formed on a substrate, in a predetermined direction relative to the substrate surface, and using the substrate to align liquid crystal without rubbing treatment, wherein the polymer thin film is a polyimide resin containing a repeating unit of the formula (I): ##STR1## (wherein R.sup.1 is a tetravalent organic group having an alicyclic structure, and R.sup.2 is a bivalent organic group), which is obtained by dehydration ring-closure of a polyimide precursor having a reduced viscosity of from 0.05 to 3.0 dl/g (in N-methyl-2-pyrrolidone at temperature of 300.degree. C. at a concentration of 0.
    Type: Grant
    Filed: September 4, 1998
    Date of Patent: May 16, 2000
    Assignee: Nissan Chemical Industries, Ltd.
    Inventors: Hideyuki Endou, Hiroyoshi Fukuro
  • Patent number: 6057382
    Abstract: A curable composition comprising a) a curable epoxy resin, a thermoplastic ethylene-vinyl acetate copolymer resin, and an effective amount of a photocatalyst for the curable epoxy resin, wherein the composition is free from hydrocarbon polyolefins and wherein the sum of a) and b) is 100 weight percent.
    Type: Grant
    Filed: May 1, 1998
    Date of Patent: May 2, 2000
    Assignee: 3M Innovative Properties Company
    Inventors: Naimul Karim, Clayton A. George, Christopher M. Meyer
  • Patent number: 6051652
    Abstract: A composition for preparing a reactive hot melt composition comprises (a) a thermoplastic polymer which comprises a polyolefin having an epoxy group, and (b) a radiation polymerizable component containing (b-1) an aliphatic alkyl (meth)acrylate and (b-2) an acrylic compound having a functional group reactive with an epoxy group. A reactive hot melt composition is obtained by polymerizing this composition so as to polymerize the radiation polymerizable component.The reactive hot melt composition which can be easily hot melt coated, crosslinked quickly in the absence of radiation or moisture after bonding adherends, does not form moisture during crosslinking, and has high flowability during hot melting.
    Type: Grant
    Filed: April 30, 1998
    Date of Patent: April 18, 2000
    Assignee: 3M Innovative Properties Company
    Inventors: Kohichiro Kawate, Shigeyoshi Ishii
  • Patent number: 5976706
    Abstract: Polyesterdiols having low viscosities of less than 3500 cps, high content of non-volatile matter in excess of 96 wt %, and narrow molecular weight distribution of less than about 1.4 are prepared by esterification of one or more aliphatic dicarboxylic acids or ester derivatives thereof using at least a 1.5 molar excess of one or more aliphatic diols until an acid number of less than 20 is achieved, and stripping excess diol from the polyesterdiol reaction product. Where esterification catalyst is used, catalyst is substantially removed prior to stripping excess unreacted diol from polyesterdiol reaction product. The polyesterdiols so produced are useful as (i) curable components in thermosettable resin compositions, particularly compositions essentially free of volatile organic solvent and also containing a crosslinking agent and a reactive hardening agent: and/or (ii) useful as coatings, paints and adhesives, providing coatings with very low content of volatile organic compounds.
    Type: Grant
    Filed: July 27, 1998
    Date of Patent: November 2, 1999
    Assignee: Exxon Chemical Patents Inc.
    Inventors: Albert Ilya Yezrielev, Konstantinos R. Rigopoulos, Richard William Ryan, Karen K. Kuo, George Andrew Knudsen
  • Patent number: 5889140
    Abstract: A crosslinkable polylactone-based composition comprising formulating 100 parts by weight of a polylactone (A) whose number average molecular weight is in the range of 10,000 to 300,000 and 0.1 to 30 parts by weight of a crosslinkable monomer (B) which can confine the molecular chain of the polylactone (A) by irradiating active energy radiation or by heating, a production method of a polylactone-based crosslinked molded article prepared by irradiating active energy radiation or by heating after melting and molding the above-mentioned crosslinkable polylactone-based composition at the temperature where crosslinking does not occur, and a polylactone-based crosslinked molded article obtained by the above method are offered. A cured polylactone-based molded article having similar properties is also obtained from the curable polylactone-based composition composed of a polylactone or polylactone composition (X) comprising a prescribed polylactone (C) and polyvalent alcohol (D), and a prescribed curing agent (Y).
    Type: Grant
    Filed: March 10, 1997
    Date of Patent: March 30, 1999
    Assignee: Daicel Chemical Industries, Ltd.
    Inventor: Kazushi Watanabe
  • Patent number: 5885723
    Abstract: Provided is bonding film for printed circuit boards which is resistant to cracking even when bent with a small radius of curvature, has a sufficient mechanical strength even in its semi-cured state so that the handling may be facilitated, is not undesirably brittle and therefore does not produce undesired debris when cut, and is flexible and flame retardant at the same time. The bonding film may consist of (i) high polymer epoxy resin; (ii) denatured polyamide obtained by reacting epoxy resin and polyamide; (iii) polyfunctional epoxy resin; and (iv) curing agent. Preferably, the denatured polyamide includes a polyalkylene-glycol residue or a polycarbonate-diol residue. Preferably, the high polymer epoxy resin is produced by the polymerization of bifunctional epoxy resin and bifunctional phenol resin, and has a weight averaged molecular weight equal to 50,000 or higher.
    Type: Grant
    Filed: December 19, 1997
    Date of Patent: March 23, 1999
    Assignee: Hitachi Chemical Company, Ltd.
    Inventors: Atsushi Takahashi, Shinji Ogi, Koji Morita, Kazunori Yamamoto, Ken Nanaumi, Kiyoshi Hirosawa, Akinari Kida, Takao Hirayama, Toshihiko Ito, Hiroaki Hirakura
  • Patent number: 5792819
    Abstract: The present invention relates to zwitterionic neutral transition metal compounds. The compounds are suitable as catalyst components for the polymerization of olefins.
    Type: Grant
    Filed: June 7, 1995
    Date of Patent: August 11, 1998
    Assignee: Targor GmbH
    Inventors: Gerhard Erker, Bodo Temme, Michael Aulbach, Bernd Bachmann, Frank Kuber
  • Patent number: 5710233
    Abstract: Polyurethane elastomers with reduced gas permeability are prepared by reaction of:a) diisocyanates,b) compounds with a molecular weight of 500 to 10,000 having at least two hydrogen atoms that are reactive towards isocyanates,c) compounds with a molecular weight of 61 to 499 having at least two hydrogen atoms that are reactive towards isocyanates, and optionallyd) further auxiliaries and additives,characterized in thati) the ratio of the isocyanate groups in a) to the sum of the isocyanate-reactive groups in b) and c) is between 1:0.80 and 1:1.05 (isocyanate:isocyanate-reactive), andii) the compound b) contains 3 to 15% by wt.
    Type: Grant
    Filed: January 6, 1997
    Date of Patent: January 20, 1998
    Assignee: Rhein Chemie Rheinau GmbH
    Inventors: Walter Meckel, Klaus Konig, Hans-Dieter Thomas
  • Patent number: 5594041
    Abstract: The present invention provides a method for improving the structural integrity of polymers using a combination of high energy radiation and improved crosslinking agents. The crosslinking agents are 1,3-butadiene, three carbon cyclic compounds, three membered heterocyclic organic compounds, or linear analogues of three carbon cyclic compounds and three membered heterocyclic organic compounds, which are compact enough to diffuse to a suitable depth within the polymeric network. Preferred cyclic crosslinking agents are cyclopropane and ethylene oxide. Preferred linear crosslinking agents include propylene, 1,3-butadiene, dimethyl ether, and propane. A preferred form of high energy radiation is a beam of energetic low mass ions.
    Type: Grant
    Filed: June 7, 1995
    Date of Patent: January 14, 1997
    Assignee: Southwest Research Institute
    Inventors: Geoffrey Dearnaley, Leonard F. Herk, Jr.
  • Patent number: 5529885
    Abstract: Disclosed are a negative photosensitive composition comprising an alkali-soluble resin, a photo acid generating system, and a crosslinking agent for the alkali-soluble resin which acts on the resin under acidic conditions, in which the crosslinking agent is a highly-alkylated alkoxymethylmelamine resin having a monomer content of from 5 to 40% by weight, and a method for forming a negative photo-resist pattern using the composition. The resist composition is stable during storage and gives good pattern profiles having high aspect ratios even though the resist film is made thick.
    Type: Grant
    Filed: June 3, 1994
    Date of Patent: June 25, 1996
    Assignee: Mitsubishi Chemical Corporation
    Inventors: Tameichi Ochiai, Ryuichiro Takasaki, Yasuhiro Kameyama, Shichiro Takahashi
  • Patent number: 5512606
    Abstract: Photo-crosslinkable materials comprising a linear polyamide and a 2-substituted anthraquinone as photo-crosslinking agent, the 2-substituted anthraquinone preferably being 2-acrylamidooanthraquinone, 2-acryloxyanthraquinone or 2-benzoylaminoanthraquinone.
    Type: Grant
    Filed: August 16, 1994
    Date of Patent: April 30, 1996
    Inventors: Norman S. Allen, John P. Hurley
  • Patent number: 5486326
    Abstract: A polyketone is contacted with an organic peroxyacid in a reactive, oxidization, slurry process to produce a polyester polymer.
    Type: Grant
    Filed: May 17, 1995
    Date of Patent: January 23, 1996
    Assignee: Exxon Chemical Patents Inc.
    Inventor: Palanisamy Arjunan
  • Patent number: 5466780
    Abstract: A polyketone is contacted with an organic peroxyacid in a reactive, oxidization, slurry process to produce a polyester polymer.
    Type: Grant
    Filed: March 30, 1994
    Date of Patent: November 14, 1995
    Assignee: Exxon Chemical Patents Inc.
    Inventor: Palanisamy Arjunan
  • Patent number: 5352712
    Abstract: Ultraviolet radiation-curable primary and secondary coating compositions for optical fibers are disclosed. The primary coatings comprise a hydrocarbon polyol-based reactively terminated aliphatic urethane oligomer; a hydrocarbon monomer terminated with at least one end group capable of reacting with the terminus of the oligomer; and an optional photoinitiator. The secondary coatings comprise a polyester and/or polyether-based aliphatic urethane reactively terminated oligomer; a hydrocarbonaceous viscosity-adjusting component capable of reacting with the reactive terminus of (I); and an optional photoinitiator. Also disclosed are optical fibers coated with the secondary coating alone or with the primary and secondary coatings of the invention.
    Type: Grant
    Filed: April 16, 1992
    Date of Patent: October 4, 1994
    Assignee: Borden, Inc.
    Inventor: Paul J. Shustack
  • Patent number: 5229251
    Abstract: A dry developable photoresist composition that contains in admixture a polymeric epoxide; a di- or polyfunctional organosilicon material; and an onium salt; and use thereof to produce an image.
    Type: Grant
    Filed: April 29, 1991
    Date of Patent: July 20, 1993
    Assignee: International Business Machines Corp.
    Inventors: Edward D. Babich, Jeffrey D. Gelorme, Ronald W. Nunes, Sharon L. Nunes, Jurij R. Paraszczak, Russell J. Serino
  • Patent number: 5196478
    Abstract: This invention relates to radio-derivatized polymers and a method of producing them by contacting non-polymerizable conjugands with radiolysable polymers in the presence of irradiation. The resulting radio-derivatized polymers can be further linked with ligands of organic or inorganic nature to immobilize such ligands.
    Type: Grant
    Filed: April 9, 1990
    Date of Patent: March 23, 1993
    Assignee: Epipharm Allergie-Service Gesellschaft m.b.H.
    Inventors: Janos M. Varga, Peter Fritsch
  • Patent number: 5176982
    Abstract: Disclosed is a photosensitive resin composition for forming a polyimide film pattern. The composition contains a polyamic acid and at least one silyl ketone compound represented by general formula (II) given below, ##STR1## where each of R.sup.3 to R.sup.16 is a are substituted or unsubstituted alkyl group having 1 to 12 carbon atoms or a substituted or unsubstituted aromatic group having 6 to 14 carbon atoms, each of R.sup.5 to R.sup.16 may be a substituted or unsubstituted silyl group, and each of l, m, n, s, t and u is 0 or 1, at least one of l, m, n, s, t and u being 1. The composition further contains a sensitizer, as required. A semiconductor substrate is coated with the composition, followed by exposing the coating through a predetermined mask and subsequently developing and heat-treating the coating so as to form a polyimide film pattern.
    Type: Grant
    Filed: July 5, 1991
    Date of Patent: January 5, 1993
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Yukihiro Mikogami, Shuzi Hayase, Yoshihiko Nakano
  • Patent number: 5051312
    Abstract: This invention concerns a process for modifying polymer surfaces by contacting the surface with a selected organic modifying agent while irradiating the surface with ultraviolet and/or visible light that can be absorbed by the modifier. Patterns of modified and unmodified surfaces can be produced. Polymers with modified surfaces are useful for absorbing biologically active molecules, composites, printing plates and electronics.
    Type: Grant
    Filed: March 29, 1990
    Date of Patent: September 24, 1991
    Assignee: E. I. Du Pont de Nemours and Company
    Inventor: Klas G. M. Allmer
  • Patent number: 5019481
    Abstract: An aqueous base developable negative resist composition comprising a phenolic resin, a radio-chemical acid generator and a small molecule which upon irradication and postbake reacts with the phenolic resin to decrease its rate of dissolution.
    Type: Grant
    Filed: September 25, 1989
    Date of Patent: May 28, 1991
    Assignee: International Business Machines Corporation
    Inventor: Hiroshi Ito
  • Patent number: 4946760
    Abstract: A radiation-sensitive mixture, in particular photosensitive mixture, is disclosed that contains a compound which forms a strong acid on exposure to actinic radiation and a polymeric reaction product of (i) a polymeric organic compound containing free OH groups, (ii) an organic compound containing at least two isocyanate groups or at least two epoxy groups, and (iii) a compound containing repeating acid-cleavable acetal or ketal groups and at least one free OH group. The mixture yields printing plates or photoresists with a longer storage life.
    Type: Grant
    Filed: November 1, 1988
    Date of Patent: August 7, 1990
    Assignee: Hoechst Aktiengesellschaft
    Inventor: Andreas Elsaesser
  • Patent number: 4879338
    Abstract: This invention discloses novel composition comprising a blend of a poly(aryl ether ketone) and from about 1% to about 50% of poly(phenylene oxide). The blends have high use temperatures, abraision resistance and solvent resistance, and are extrudable. Further, the blends can be crosslinked.
    Type: Grant
    Filed: February 13, 1985
    Date of Patent: November 7, 1989
    Assignee: Raychem Corporation
    Inventors: Frank W. Mercer, Michael F. Froix, Tai C. Cheng
  • Patent number: 4752426
    Abstract: Plastic resinous tubes, particularly for medical use is improved in blood compatibility when brought into contact with blood, by applying a low-temperature plasma treatment to inner surfaces of the tubes, which plasma is produced through electrodeless electric discharges by the effect of microwave to make it possible to prevent the tube from being heated in such a treatment. The inner surfaces of the tubes thus activated may be further subjected to an inner surface graft copolymerization treatment to enhance blood compatibility.
    Type: Grant
    Filed: June 27, 1986
    Date of Patent: June 21, 1988
    Assignees: Yoshito Ikada, Japan Medical Supply Co., Ltd.
    Inventor: Tsuneo Cho
  • Patent number: 4727118
    Abstract: A polyether imide resin composition is proposed which has improved ductility and is less harmful to mating parts during sliding and thus can be used as the material for parts requiring rub resistance and abrasion resistance. It comprises 50-99.5 percent by weight of a polyether imide and 50-0.5 percent by weight of a vulcanizable organopolysiloxane elastomer.
    Type: Grant
    Filed: August 30, 1985
    Date of Patent: February 23, 1988
    Assignee: NTN-Rulon Industries Co., Ltd.
    Inventor: Masaki Egami