Processes Of Treating A Reaction Product Of A Solid Polymer And Ethylenic Reactant; Or Compositions Therefore E.g., Graft- Or Graft-type Polymer, Etc. Patents (Class 522/149)
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Patent number: 5990193Abstract: The present invention provides crosslinked polymeric networks that are reversibly crosslinked upon exposure to light of a suitable wavelength. In one embodiment photocrosslinkable branched hydrophilic polymers containing photochromic groups are synthesized. Cinnamylidene groups and derivatives of cinnamylidene are preferably used as the photochromic agents or photocrosslinking agents.Type: GrantFiled: December 12, 1995Date of Patent: November 23, 1999Assignee: University of PittsburghInventors: Alan J. Russell, Eric J. Beckman, Fotios M. Andreopoulos, William R. Wagner
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Patent number: 5985990Abstract: Cross-linked, hydrophilic pressure sensitive adhesive compositions, (meth)acrylate-functional polar polymers which serve as precursors to them, and medical products using such adhesives are disclosed. The cross-linked polymer is prepared by free-radically cross-linking reactive polymers that are functionalized with pendant polymerizable moieties. Medical products that include such compositions are biomedical electrodes, pharmaceutical delivery devices, and medical skin coverings such as wound dressings.Type: GrantFiled: June 23, 1998Date of Patent: November 16, 1999Assignee: 3M Innovative Properties CompanyInventors: Steven S. Kantner, Wilhelm Kuester
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Patent number: 5945253Abstract: Disclosed is a composition which comprises a polymer containing at least some monomer repeat units with photosensitivity-imparting substituents which enable crosslinking or chain extension of the polymer upon exposure to actinic radiation, said polymer being of the formula ##STR1## wherein x is an integer of 0 or 1, A is one of several specified groups, such as ##STR2## B is one of several specified groups, such as ##STR3## or mixtures thereof, and n is an integer representing the number of repeating monomer units, wherein said photosensitivity-imparting substituents are allyl ether groups, epoxy groups, or mixtures thereof. Also disclosed are a process for preparing a thermal ink jet printhead containing the aforementioned polymers and processes for preparing the aforementioned polymers.Type: GrantFiled: August 29, 1996Date of Patent: August 31, 1999Assignee: Xerox CorporationInventors: Ram S. Narang, Timothy J. Fuller
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Patent number: 5925715Abstract: A dental cement system containing a photocurable ionomer, reactive powder and water undergoes both a conventional setting reaction and a photocuring reaction.The cement system can provide a long working time and can be cured on demand by exposure to an appropriate source of radiant energy. The surface of the cement cured in this manner is then hard enough to allow subsequent clinical procedures to be performed, while the ongoing chemical-cure "setting" reaction hardens the remainder of the cement.Type: GrantFiled: November 12, 1997Date of Patent: July 20, 1999Assignee: Minnesota Mining and Manufacturing CompanyInventor: Sumita B. Mitra
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Patent number: 5925497Abstract: A photosensitive composition is prepared containing a polymer of the formula B(X)(Y) wherein B represents an organic backbone, each X independently is an acidic group or salt thereof and each Y independently is a photocurable group and a photoinitating compound or compounds. Preferably, free-radically polymerizable multi-functional monomer and/or oligomer is added to the photosensitive composition. The photosensitive composition can be coated on a suitable substrate for planographic printing plate applications. Imagewise irradiation causes the light struck regions to photocure, becoming insoluble in aqueous and organic mediums, while the non-light struck regions remain highly soluble/dispersable. Printing plates of this construction do not require processing prior to being run on a press.Type: GrantFiled: March 4, 1997Date of Patent: July 20, 1999Assignee: Minnesota Mining and Manufacturing CompanyInventors: Minyu Li, James P. Gardner, John E. Kluge, Sumita B. Mitra
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Patent number: 5916713Abstract: The present invention provides a polymerizable composition for a color filter, which comprises a (meth)acrylate copolymer containing alicyclic (meth)acryloyl groups in its side chains, a compound having at least one ethylenically unsaturated double bond, a photopolymerization initiator and a colorant, a color filter obtained by coating the composition on a glass substrate, followed by exposure and development; and a method for producing a color filter, which comprises coating the composition on a glass substrate, followed by exposure and development.The polymerizable composition of the present invention is highly sensitive and excellent in chemical resistance. Accordingly, according to the present invention, it is possible to produce a color filter of a high quality without a protective layer such as an oxygen-shielding film.Type: GrantFiled: September 25, 1996Date of Patent: June 29, 1999Assignee: Mitsubishi Chemical CorporationInventors: Tameichi Ochiai, Ryuichiro Takasaki, Noriko Endou, Yuzuru Chika
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Patent number: 5907001Abstract: A process comprising:reacting a first polymer containing at least one haloalkyl substituted styrene, with a reactive acrylate compound wherein the haloalkyl substituent is converted to an alkylacrylate ester or an alkylacrylate ester ammonium salt to form an acrylated second polymer, andirradiating said acrylated second polymer.Type: GrantFiled: September 24, 1997Date of Patent: May 25, 1999Assignee: Xerox CorporationInventors: Daniel A. Foucher, Katsumi Daimon, Peter M. Kazmaier, Timothy J. Fuller, Ram S. Narang
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Patent number: 5895800Abstract: A resin composition comprising an epoxy group-containing cycloolefin resin and a crosslinking agent is provided. More specifically, a resin composition comprising an epoxy group-containing thermoplastic norbornene resin obtained by introducing epoxy groups into a thermoplastic norbornene resin, and as the crosslinking agent, a curing agent for epoxy resins or a photoreactive substance is provided. The resin composition is suitable for use as an insulating material.Type: GrantFiled: June 29, 1998Date of Patent: April 20, 1999Assignees: Nippon Zeon Co., Ltd., Fujitsu LimitedInventors: Hideaki Kataoka, Eiko Yuda, Shigemitsu Kamiya, Masahide Yamamoto, Yoshikatsu Ishizuki, Yasuhiro Yoneda, Daisuke Mizutani, Kishio Yokouchi
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Patent number: 5882843Abstract: A photosensitive resin composition is disclosed.The photosensitive resin composition is characterized by containing (a) a reaction product of a polymer having a specific segment with (3,4-epoxycylohexyl)-methyl methacrylate, (b) a polymerization initiator allowing the initiation of the polymerization of said reaction product when irradiated with an actinic radiation, and (c) a solvent. Preferably, the composition further contains (d) a thermal crosslinker, a compound having a polymerizable unsaturated bond and/or a pigment in addition to the above ingredients.Type: GrantFiled: November 14, 1995Date of Patent: March 16, 1999Assignee: Hoechst Japan LimitedInventors: Takanori Kudo, Yuko Nozaki, Kazuya Nagao, Yuki Nanjo
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Patent number: 5866627Abstract: New photosensitive polyamic acid precursors are disclosed which have the formula: ##STR1## where Z is a tetravalent organic radical which contains at least one aromatic ring, Z' is a divalent organic radical which contains at least one aromatic ring, and R* is a photo polymerizable group. Particularly preferred compounds include BPDA-PDA and BPDA-ODA polyamic acid precursors. The precursor compositions within the practice of this invention are i-line, g-line, and i-/g-line active and show good photoresolution. The films formed exhibit excellent self-adhesion and adhesion to glass ceramic and silicon wafer substrates have low internal stress, a very low degree of solvent swelling, high thermal stability, and excellent mechanical properties such as high modulus/tensile strength and high elongation at break.Type: GrantFiled: June 30, 1997Date of Patent: February 2, 1999Assignee: International Business Machines CorporationInventors: George Czornyj, Moonhor Ree, Willi Volksen, Dominic Changwon Yang
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Patent number: 5849809Abstract: Disclosed is a composition which comprises (a) a polymer containing at least some monomer repeat units with photosensitivity-imparting substituents which enable crosslinking or chain extension of the polymer upon exposure to actinic radiation, said polymer being of the formula ##STR1## wherein x is an integer of 0 or 1, A is one of several specified groups, such as ##STR2## B is one of several specified groups, such as ##STR3## or mixtures thereof, and n is an integer representing the number of repeating monomer units, wherein said photosensitivity-imparting substituents are hydroxyalkyl groups; (b) at least one member selected from the group consisting of photoinitiators and sensitizers; and (c) an optional solvent. Also disclosed are processes for preparing the above polymers and methods of preparing thermal ink jet printheads containing the above polymers.Type: GrantFiled: August 29, 1996Date of Patent: December 15, 1998Assignee: Xerox CorporationInventors: Ram S. Narang, Timothy J. Fuller
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Patent number: 5849462Abstract: A photosensitive composition is prepared containing a polymer of the formula B(X)(Y) wherein B represents an organic backbone, each X independently is an acidic group or salt thereof and each Y independently is a photocurable group and a photoinitating compound or compounds. Preferably, free-radically polymerizable multi-functional monomer and/or oligomer is added to the photosensitive composition. The photosensitive composition can be coated on a suitable substrate for planographic printing plate applications. Imagewise irradiation causes the light struck regions to photocure, becoming insoluble in aqueous and organic mediums, while the non-light struck regions remain highly soluble/dispersable. Printing plates of this construction do not require processing prior to being run on a press.Type: GrantFiled: August 20, 1997Date of Patent: December 15, 1998Assignee: Minnesota Mining & Manufacturing CompanyInventors: Minyu Li, James P. Gardner, John E. Kluge, Sumita B. Mitra
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Patent number: 5847022Abstract: The present invention provides a radiation curable resin composition and method of production therefor; the present composition has wide applications as an ink, coating or the like, is dilutable in water or an organic solvent, and forms a coating which has excellent hardening characteristics and adherence to a substrate, as well as superior resistance to heat, chemicals and boiling, this resin composition may be redissolved with water or an organic solvent prior to hardening; which have a number average weight of 500 to 50,000, characterized in that the aprotic ammonium salt represented by general formula 1 is contained in the resin in the amount of 0.1 to 4.0 mol/kg.Type: GrantFiled: March 21, 1996Date of Patent: December 8, 1998Assignee: Dainippon Ink and Chemicals, Inc.Inventors: Yozo Yamashina, Eiju Ichinose, Yoichi Abe, Hidenobu Ishikawa
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Patent number: 5834274Abstract: Water soluble macromers are modified by addition of free radical polymerizable groups, such as those containing a carbon-carbon double or triple bond, which can be polymerized under mild conditions to encapsulate tissues, cells, or biologically active materials. The polymeric materials are particularly useful as tissue adhesives, coatings for tissue lumens including blood vessels, coatings for cells such as islets of Langerhans, coatings, plugs, supports or substrates for contact with biological materials such as the body, and as drug delivery devices for biologically active molecules.Type: GrantFiled: June 6, 1995Date of Patent: November 10, 1998Assignee: Board of Regents, The University of Texas SystemInventors: Jeffrey A. Hubbell, Chandrashekhar P. Pathak, Amarpreet S. Sawhney, Neil P. Desai, Jennifer L. Hill, Syed F. A. Hossainy
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Patent number: 5833916Abstract: A molded article containing an outer decorative film and a support, and a method and composition for making the same are disclosed. The outer film has a decorative layer and a protective layer, the protective layer being formed from a photopolymerizable resin composition. In an uncured state, the composition includes (a) an acrylic copolymer containing a backbone and at least one side chain linked to the backbone, the at least one side group having at least one (meth)acryloyl group, the backbone having a glass transition temperature of about 40.degree. C. to about 120.degree. C. and a weight-average molecular weight of about 10,000 to about 200,000; (b) a compound other than the copolymer (a), the compound having at least three (meth)acryloyl groups; and a photopolymerization initiator. The at least one (meth)acryloyl group is preferably linked to the backbone by a reacted glycidyl group.Type: GrantFiled: August 21, 1996Date of Patent: November 10, 1998Assignee: Toyoda Gosei Co., Ltd.Inventors: Ryouichi Takada, Hiroshi Watarai, Toshimichi Kawata, Daijou Ikeda, Takashi Mita
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Patent number: 5824717Abstract: The invention relates to peroxide- or radiation-curable copolymer containing compositions and to the resulting radiation- or peroxide- cured compositions. The compositions may optionally contain a reinforcing filler. Copolymers employed in the compositions are acrylate modified copolymers of an isoolefin of 4 to 7 carbon atoms and para-alkylstyrene comonomers. Since the percentage of extractables from the cured composition is negligible, the cured compositions are suitable for use in the manufacture of a variety of high purity rubber goods used in the pharmaceutical and health care industries. In addition, the compositions may be employed as condenser packings and as food contact materials or wire cable insulation materials. Further, the cured composition may be employed in the manufacture of high purity hoses.Type: GrantFiled: June 7, 1995Date of Patent: October 20, 1998Assignee: Exxon Chemical Patents Inc.Inventors: Natalie Ann Merrill, Hsien-Chang Wang, Anthony Jay Dias
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Patent number: 5804311Abstract: A liquid curable resin composition for optical fibers comprising a polymer (a) having a number average molecular weight of 5,000 or more and derived from at least two types of recurring ethylenic units, of which one type has a substituent group containing an ethylenically unsaturated group and the second type is substituted by a group --COOR.sup.3 (wherein R.sup.3 is a hydrogen atom or a hydrocarbon group having 1-30 carbon atoms), an aryl group, a cyano group, an alkyl group having 1-10 carbon atoms or by one or more halogen atoms.Type: GrantFiled: August 22, 1996Date of Patent: September 8, 1998Assignee: DSM N.V.Inventors: Mitsuhito Suwa, Zen Komiya, Yuji Takasugi, Takashi Ukachi
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Patent number: 5801033Abstract: This invention provides novel methods for the formation of biocompatible membranes around biological materials using photopolymerization of water soluble molecules. The membranes can be used as a covering to encapsulate biological materials or biomedical devices, as a "glue" to cause more than one biological substance to adhere together, or as carriers for biologically active species. Several methods for forming these membranes are provided. Each of these methods utilizes a polymerization system containing water-soluble macromers, species which are at once polymers and macromolecules capable of further polymerization. The macromers are polymerized using a photoinitiator (such as a dye), optionally a cocatalyst, optionally an accelerator, and radiation in the form of visible or long wavelength UV light. The reaction occurs either by suspension polymerization or by interfacial polymerization.Type: GrantFiled: June 7, 1995Date of Patent: September 1, 1998Assignee: The Board of Regents, The University of Texas SystemInventors: Jeffrey A. Hubbell, Chandrashekhar P. Pathak, Amarpreet S. Sawhney, Neil P. Desai, Syed F. A. Hossainy
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Patent number: 5783639Abstract: A resin composition comprising an epoxy group-containing cycloolefin resin and a crosslinking agent is provided. More specifically, a resin composition comprising an epoxy group-containing thermoplastic norbornene resin obtained by introducing epoxy groups into a thermoplastic norbornene resin, and as the crosslinking agent, a curing agent for epoxy resins or a photoreactive substance is provided. The resin composition is suitable for use as an insulating material.Type: GrantFiled: January 13, 1997Date of Patent: July 21, 1998Assignees: Nipon Zeon Co., Ltd., Fujitsu LimitedInventors: Hideaki Kataoka, Eiko Yuda, Shigemitsu Kamiya, Masahide Yamamoto, Yoshikatsu Ishizuki, Yasuhiro Yoneda, Daisuke Mizutani, Kishio Yokouchi
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Patent number: 5777039Abstract: Block copolymers suitable for hot melt adhesive composition characterized in that they have the general formula (AB).sub.p (B.sup.1).sub.q X, wherein A is poly(vinylaromatic) block and B and B.sup.1 are the same or different poly(butadiene) blocks, wherein the 1,2 addition (vinyl) content is in the range of from 25 to 70% by weight, wherein X is the residue of a multivalent coupling agent having a maximum of active sites (m) in the range of from 3 to 6, wherein p and q both are integers of from 0 to m, provided that the sum of p and q values is less than m and the coupling efficiency is less than 90%, said block copolymer having an average total vinyl aromatic content in the range of from 10 to 50 wt % and preferably in the range of from 10 to 30 wt %, and having a total apparent molecular weight in the range of from 100,000 to 500,000.Type: GrantFiled: February 5, 1997Date of Patent: July 7, 1998Assignee: Shell Oil CompanyInventors: Luc Ives Jaak De Craene, Martine Jeanne DuPont, Eric-Jack Gerard, Noel Raymond Maurice De Keyzer, Karin Marie-Louise Renee Morren, Jeroen Van Westrenen
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Patent number: 5741408Abstract: In order to produce a polymer electrolyte membrane from sulfonated, aromatic polyether ketone, an aromatic polyether ketone of the formula (I) ##STR1## in which Ar is a phenylene ring having p- and/or m-bonds,Ar' is a phenylene, naphthylene, biphenylene, anthrylene or another divalent aromatic unit,X, N and M, independently of one another are 0 or 1,Y is 0, 1, 2 or 3,P is 1, 2, 3 or 4,is sulfonated and the sulfonic acid is isolated. At least 5% of the sulfonic groups in the sulfonic acid are converted into sulfonyl chloride groups, and these are reacted with an amine containing at least one crosslinkable substituent or a further functional group, and unreacted sulfonyl chloride groups are subsequently hydrolyzed. The resultant aromatic sulfonamide is isolated and dissolved in an organic solvent, the solution is converted into a film, and the crosslinkable substituents in the film are then crosslinked.In specific cases, the crosslinkable substituents can be omitted.Type: GrantFiled: May 19, 1995Date of Patent: April 21, 1998Assignee: Hoechst AktiengesellschaftInventors: Freddy Helmer-Metzmann, Frank Osan, Arnold Schneller, Helmut Ritter, Konstantin Ledjeff, Roland Nolte, Ralf Thorwirth
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Patent number: 5728749Abstract: This photopolymerizable composition includes an grafted reactive telomer containing trifluoroethyl methacrylate units, a reactive diluent and a photopolymerization initiator. It gives hydrophobic transparent coatings.Type: GrantFiled: November 30, 1995Date of Patent: March 17, 1998Assignee: Elf Atochem S.A.Inventors: Didier Vanhoye, Elsa Ballot, Robert Legros, Olivier Loubet, Bernard Boutevin, Bruno Ameduri
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Patent number: 5723511Abstract: A process for the preparation of branched thermoplastic resins comprising: heating a mixture of a free radical initiator, at least one first free radical reactive monomer, at least one free radical reactive branching agent compound, and at least one stable free radical agent, to produce a linear or unbranched polymer product with a free radical initator fragment at one end and a covalently bonded stable free radical agent at the other end of the polymerized chain of monomers; and irradiating the unbranched polymer product in the presence of a reactive compound selected from the group consisting of a free radical reactive monomer, a branching agent compound, and mixtures thereof to form a branched polymeric product.Type: GrantFiled: June 17, 1996Date of Patent: March 3, 1998Assignee: Xerox CorporationInventors: Peter M. Kazmaier, Barkev Keoshkerian, Karen A. Moffat, Michael K. Georges, Gordon K. Hamer, Richard P. N. Veregin
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Patent number: 5698370Abstract: A photoimageable composition, useful as a photoresist for forming a printed circuit board, is both alkaline aqueous developable but, subsequent to exposure and development, is processable in highly alkaline environments, such as additive plating baths and ammoniacal etchants. The photoimageable composition comprises A) between about 25 and about 75 wt % of a binder polymer, B) between about 20 and about 60 wt % of a photopolymerizeable material which is a multifunctional photopolymerizeable monomer or short chain oligomer, and C) between about 2 and about 20 wt % of a photoinitiator chemical system, the weight percentages being based on the total weight of components A)-C).Type: GrantFiled: September 6, 1996Date of Patent: December 16, 1997Assignee: Morton International, Inc.Inventors: Charles R. Keil, Randall William Kautz
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Patent number: 5698372Abstract: A photosensitive lithographic printing plate is described, which comprises a photopolymerizable composition containing at least the following components (i) to (iii): (i) a polymerizable compound having an addition-polymerizable unsaturated bond, (ii) a photopolymerization initiator, and (iii) a pigment dispersion, wherein the pigment dispersion is dispersed in the presence of a polymer having an aliphatic double bond in a main chain or a side chain thereof.Type: GrantFiled: September 9, 1996Date of Patent: December 16, 1997Assignee: Fuji Photo Film Co., Ltd.Inventors: Yasuo Okamoto, Syunichi Kondo, Hiroyuki Nagase
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Patent number: 5698192Abstract: A method for modifying an ocular implant polymer surface by the gamma-irradiation induced polymerization thereon of N-vinylpyrrolidone, 2-hydroxyethylmethacrylate or a mixture thereof while maintaining the following conditions:(a) monomer concentration in the range of from about 0.1% to about 50%, by weight;(b) total gamma dose in the range of from about 0.001 to less than about 0.50 Mrad; and(c) gamma dose rate in the range of from above about 2,500 to about 10.sup.8 rads/minute.Type: GrantFiled: September 25, 1996Date of Patent: December 16, 1997Assignee: University of FloridaInventor: Eugene P. Goldberg
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Patent number: 5672463Abstract: A polyfunctional vinyl ether compound represented by formula (I): ##STR1## wherein n, which is an average repeating number, represents a number of from 0 to 20; R.sub.1 and R.sub.2 each independently represents a hydrogen atom, a halogen atom, an alkyl group, an aryl group, an aralkyl group, an alkoxy group, an aryloxy group, or a cycloalkyl group; Q each independently represents --OH or a group represented by the formula --OROCH.dbd.CH.sub.2, wherein R represents an alkylene group having from 1 to 12 carbon atoms, the molar ratio of (--OH)/(--OROCH.dbd.CH.sub.2) being from 10/90 to 90/10; and A each independently represents a divalent hydrocarbon group having from 1 to 30 carbon atoms.Type: GrantFiled: October 20, 1995Date of Patent: September 30, 1997Assignee: Sumitomo Chemical Company, LimitedInventors: Shigeo Hozumi, Shinichiro Kitayama, Hiroya Nakagawa
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Patent number: 5650453Abstract: Blends of epoxysilicone polymers and vinyl ether monomers or oligomers and an effective amount of a suitable iodonium photocatalyst provide an ultraviolet curable low viscosity silicone coating composition.Type: GrantFiled: April 28, 1995Date of Patent: July 22, 1997Assignee: General Electric CompanyInventors: Richard P. Eckberg, Michael J. O'Brien
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Patent number: 5631316Abstract: Vulcanizable tire innerliner compositions are described which are essentially free of halogen atoms or contain a reduced halogen content. The innerliners contain a saturated elastomeric interpolymer of a C.sub.4 -C.sub.7 isomonoolefin, e.g., isobutylene and a para-alkylstyrene e.g., para-methylstyrene, which contains benzylic ester functionality having the structure: ##STR1## wherein R.sub.2 and R.sub.3 are independently selected from hydrogen or C.sub.1 to C.sub.6 alkyl, and R.sub.4 is selected from hydrogen, C.sub.1, to C.sub.28 alkyl, aryl or C.sub.2 to C.sub.28 alkenyl.Innerliners of the invention provide excellent impermeability to air, heat aging properties and good adhesion to tire carcass stock required for tire innerliners, and are also essentially free of halogen or contain low halogen content thereby reducing environmental concerns occasioned by the incineration of used tires.Type: GrantFiled: June 7, 1995Date of Patent: May 20, 1997Assignee: Exxon Chemical Patents Inc.Inventors: Bernard J. Costemalle, James V. Fusco, Pierre T. Hous, Hsien-Chang Wang
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Patent number: 5621018Abstract: Compounds of formula I: ##STR1## are disclosed. The compounds are photoinitiators which can be functionalized by means of ethylenic groups or can be bonded to H-active substances, in order, for example, to modify surfaces by means of photopolymerizable substances. The compounds are especially useful in the manufacture of contact lenses.Type: GrantFiled: June 6, 1995Date of Patent: April 15, 1997Assignee: CIBA GEIGY CorporationInventors: Peter Chabrecek, Dieter Lohmann
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Photosensitive resin composition and a process for forming a patterned polyimide film using the same
Patent number: 5616448Abstract: The composition comprises (A) a specified polyimide precursor and (B) at least one member selected from the group consisting of a sensitizer, a photopolymerization initiator and a combination thereof. The above process comprises applying a solution of the above photosensitive resin composition on a substrate, followed by drying to form a film; exposing the film to light, followed by developing with an aqueous alkaline solution to form a patterned film; and curing the patterned film. The composition has little ionic impurities mixed therein during the preparation of the composition; is excellent in storage stability in the state of a solution; can be developed with an aqueous alkaline solution, which does not cause the problems such as a problem to health and a problem to the treatment of waste liquids, within a short time; and exhibits a good sensitivity even when formed a thick film, thereby readily providing a patterned resinous film.Type: GrantFiled: January 26, 1996Date of Patent: April 1, 1997Assignee: Shin-Etsu Chemical Co., Ltd.Inventor: Hideto Kato -
Patent number: 5612391Abstract: Contact lenses formed from compounds of formula I: ##STR1## are disclosed. The compounds are photoinitiators which can be functionalized by means of ethylenic groups or can be bonded to H-active substances, in order, for example, to modify surfaces by means of photopolymerizable substances. The compounds are especially useful in the manufacture of contact lenses.Type: GrantFiled: June 6, 1995Date of Patent: March 18, 1997Assignee: Ciba Geigy CorporationInventors: Peter Chabrecek, Dieter Lohmann
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Patent number: 5609991Abstract: A photoimageable composition, useful as a photoresist for forming a printed circuit board, is both alkaline aqueous developable but, subsequent to exposure and development, is processable in highly alkaline environments, such as additive plating baths and ammoniacal etchants. The photoimageable composition is tack-free and is resistance to polymerization inhibition by oxygen, and is therefore particularly suitable for contact printing. The photoimageable composition comprises A) between about 25 and about 75 wt % of a binder polymer, B) between about 20 and about 60 wt % of a photopolymerizeable material which is a multifunctional photopolymerizeable monomer or short chain oligomer, and C) between about 2 and about 20 wt % of a photoimageable chemical system, the weight percentages being based on the total weight of components A)-C).Type: GrantFiled: August 3, 1995Date of Patent: March 11, 1997Assignee: Morton International, Inc.Inventors: James J. Briguglio, Charles R. Keil, Vinai M. Tara, Edward J. Reardon, Jr., Randall W. Kautz
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Patent number: 5610206Abstract: A high molecular weight compound having a number average molecular weight of 5,000 to 30,000 formed from a styrenic or acrylic monomer chain and a rubber chain which are attached as block or graft polymers. A photopolymerizable resin composition includes a copolymer having a number average molecular weight of 5,000 to 30,000. The copolymer has a styrenic or acrylic monomer chain and a rubber chain attached in block or graft form.Type: GrantFiled: December 12, 1994Date of Patent: March 11, 1997Assignee: Canon Kabushiki KaishaInventors: Hirokazu Komuro, Hiromichi Noguchi, Takahiro Mori
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Patent number: 5608013Abstract: A polyimide obtained by reacting an acid dianhydride such as catechol bistrimellitate dianhydride, bisphenol A bistrimellitate dianhydride, etc. with a diamine such as 4,4'-diamino-3,3',5,5'-tetraisopropyl-diphenylmethane, etc. has high solubility in organic solvents and good moldability at low temperatures, and can provide a thermosetting resin composition together with a polymaleimide.Type: GrantFiled: March 7, 1995Date of Patent: March 4, 1997Assignee: Hitachi Chemical Company, Ltd.Inventors: Hidekazu Matsuura, Yasuo Miyadera
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Patent number: 5587404Abstract: Gels for thermotropic layers, obtainable by irradiation of a mixture comprisinga) an uncrosslinked polymer,b) monomers capable of free-radical polymerization andc) water or an organic solvent or mixtures thereof, with high-energy light.Type: GrantFiled: April 18, 1995Date of Patent: December 24, 1996Assignee: Basf AktiengesellschaftInventors: Hubertus Kroner, Ekkehard Jahns, Manfred Mielke
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Patent number: 5587274Abstract: Disclosed is a positive type resist composition which can form a good pattern by subjecting a resist layer to plural exposures and developments, which results in excellent adhesion between the resist layer and a substrate. The composition comprises:(a) a polymer having an acid value of 2 to 200, prepared from 20 to 94% by weight of a t-butyl ester of a .alpha.,.beta.-ethylenically unsaturated carboxylic acid, 5 to 79% by weight of a (meth)acrylate of the formula:CH.sub.2 .dbd.C(R.sub.1)--COO--(R.sub.2 --O).sub.n --R.sub.3 Iwherein R.sub.1 is hydrogen or a methyl group, R.sub.2 represents ##STR1## wherein R.sub.4 represents hydrogen or an alkyl group, R.sub.5 represents hydrogen or an alkyl group, R.sub.6 represents a branched or straight chain alkylene group, provided that a total carbon number of R.sub.4, R.sub.5 and R.sub.6 is 1 to 5, R.sub.3 is an alkyl group, an aryl group or an aralkyl group having 1 to 6 carbon atoms, and n is an integer of 1 to 10 and 1 to 75% by weight of another .alpha.,.beta.Type: GrantFiled: December 7, 1994Date of Patent: December 24, 1996Assignee: Nippon Paint Co., Ltd.Inventors: Takahito Kishida, Akira Matsumura, Atsushi Kawakami
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Photosensitive resin composition and a process for forming a patterned polyimide film using the same
Patent number: 5587275Abstract: The composition comprises (A) a specified polyimide precursor and (B) at least one member selected from the group consisting of a sensitizer, a photopolymerization initiator and a combination thereof. The above method comprises coating the solution of the above photosensitive resin composition on a substrate, followed by drying to form a coating film; exposing the coating film to light, followed by developing with an aqueous alkaline solution to form a patterned film; and heat-curing the patterned film. The composition has little ionic impurities mixed therein during the preparation of the composition; is excellent in storage stability in the state of a solution; can be developed with an aqueous alkaline solution, which does not cause the problems such as a problem to health and a problem to the treatment of waste liquids, within a short time; and exhibits a good sensitivity even when formed a thick film, thereby readily providing a patterned resinous film.Type: GrantFiled: July 5, 1995Date of Patent: December 24, 1996Assignee: Shin-Etsu Chemical Co., Ltd.Inventor: Hideto Kato -
Patent number: 5585221Abstract: An active energy ray-curing resin composition comprises a graft copolymerized polymer and at least one of a monomer having an ethylenically unsaturated bond and a partially esterified epoxy resin.Type: GrantFiled: March 2, 1994Date of Patent: December 17, 1996Assignee: Canon Kabushiki KaishaInventors: Hiromichi Noguchi, Tadayoshi Inamoto, Megumi Munakata
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Patent number: 5576145Abstract: A photoimageable composition, useful as a photoresist for forming a printed circuit board, is both alkaline aqueous developable but, subsequent to exposure and development, is processable in highly alkaline environments, such as additive plating baths and ammoniacal etchants. The photoimageable composition comprises A) between about 25 and about 75 wt % of a binder polymer, B) between about 20 and about 60 wt % of a photopolymerizeable material which is a multifunctional photopolymerizeable monomer or short chain oligomer, and C) between about 2 and about 20 wt % of a photoinitiator chemical system, the weight percentages being based on the total weight of components A)-C).Type: GrantFiled: February 10, 1995Date of Patent: November 19, 1996Assignee: Morton International, Inc.Inventors: Charles R. Keil, Randall W. Kautz
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Patent number: 5576356Abstract: The invention provides a radiation curable release coating composition comprising:(a) about 1 to about 50 percent by weight of a cationically reactive polydiorganosiloxane liquid rubber having the following formula: ##STR1## wherein R are monovalent moieties which can be the same or different selected from the group consisting of alkyl, substituted alkyl, aryl, and substituted aryl wherein at least about 50% of the total number of silicon atoms have two methyl groups bonded thereto;E is an organic monovalent functional group comprising from about 1 to about 20 carbon atoms having at least one cationically co-reactive functional group;a and b both represent integers, wherein the sum of a plus b is an integer of about 10 to about 1200;b has a value ranging from about 0 to about 0.Type: GrantFiled: November 2, 1994Date of Patent: November 19, 1996Assignee: Minnesota Mining and Manufacturing CompanyInventors: Charles M. Leir, William R. Berggren, William R. Bronn, David J. Kinning, Olester Benson, Jr.
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Patent number: 5561202Abstract: In order to produce a polymer electrolyte membrane from sulfonated, aromatic polyether ketone, an aromatic polyether ketone of the formula (I) ##STR1## in which Ar is a phenylene ring having p- and/or m-bonds,Ar' is a phenylene, naphthylene, biphenylene, anthrylene or another divalent aromatic unit,X, N and M, independently of one another are 0 or 1,Y is 0, 1, 2 or 3,P is 1, 2, 3 or 4,is sulfonated and the sulfonic acid is isolated. At least 5% of the sulfonic groups in the sulfonic acid are converted into sulfonyl chloride groups, and these are reacted with an amine containing at least one crosslinkable substituent or a further functional group, and unreacted sulfonyl chloride groups are subsequently hydrolyzed. The resultant aromatic sulfonamide is isolated and dissolved in an organic solvent, the solution is converted into a film, and the crosslinkable substituents in the film are then crosslinked.In specific cases, the crosslinkable substituents can be omitted.Type: GrantFiled: May 19, 1995Date of Patent: October 1, 1996Assignee: Hoechst AktiengesellschaftInventors: Freddy Helmer-Metzmann, Frank Osan, Arnold Schneller, Helmut Ritter, Konstantin Ledjeff, Roland Nolte, Ralf Thorwirth
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Patent number: 5536759Abstract: This invention is a hot melt pressure sensitive adhesive formed by copolymerizing acrylic, or a combination of acrylic and vinyl, monomers, at least one of which is a photoinitiator, with the functional monomer, 1-(1-isocyanato-1-methyl ethyl)-3-(1-methyl ethenyl)benzene (m-TMI), to give a saturated polymer with pendant vinyl groups that are crosslinked by UV radiation.Type: GrantFiled: October 13, 1994Date of Patent: July 16, 1996Assignee: National Starch and Chemical Investment Holding CorporationInventors: Roopram Ramharack, Rama Chandran
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Patent number: 5529914Abstract: This invention provides novel methods for the formation of biocompatible membranes around biological materials using photopolymerization of water soluble molecules. The membranes can be used as a covering to encapsulate biological materials or biomedical devices, as a "glue" to cause more than one biological substance to adhere together, or as carriers for biologically active species. Several methods for forming these membranes are provided. Each of these methods utilizes a polymerization system containing water-soluble macromers, species which are at once polymers and macromolecules capable of further polymerization. The macromers are polymerized using a photoinitiator (such as a dye), optionally a cocatalyst, optionally an accelerator, and radiation in the form of visible or long wavelength UV light. The reaction occurs either by suspension polymerization or by interfacial polymerization.Type: GrantFiled: October 7, 1992Date of Patent: June 25, 1996Assignee: The Board of Regents the Univeristy of Texas SystemInventors: Jeffrey A. Hubbell, Chandrashekhar P. Pathak, Amarpreet S. Sawhney, Neil P. Desai, Syed F. A. Hossainy
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Patent number: 5523383Abstract: A process for the preparation of a photocurable resin which comprises the steps of(I) (a) imidating 20 to 80 mole % of the acid arthydride groups present in an adduct prepared by the addition reaction of an .alpha.,.beta.-unsaturated dicarboxylic acid arthydride to a conjugated diene polymer or copolymer with a primary amine to produce water and an amide,(b) reacting the thus formed water as a by-product with at least a part of the remaining acid arthydride groups in said adduct to produce the succinic acid groups by opening the ring of said acid arthydride groups,(II) dehydrating the thus produced succinic acid groups by heating to cause ring closure again thereby forming acid anhydride groups and(III) reacting at least a part, preferably at least 50 mole %, of the acid anhydride rings present in the polymer with an .alpha.,.beta.-unsaturated monocarboxylic acid ester having an alcoholic hydroxyl group to conduct a half-esterification by opening the ring of said acid arthydride groups.Type: GrantFiled: May 11, 1994Date of Patent: June 4, 1996Assignee: Nippon Petrochemicals Co., Ltd.Inventors: Nobuo Ikeda, Teruhisa Kuroki, Tatsuo Yamaguchi, Hiroyoshi Oomiya
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Patent number: 5476752Abstract: An active energy ray-curing resin composition comprises:(i) a linear polymer having a glass transition temperature of 50.degree. C. or higher and a weight average molecular weight of about 3.0.times.10.sup.4 or higher;(ii) a monomer having an ethylenically unsaturated bond;(iii) an epoxy resin comprising at least one compound having one or more epoxy groups in the molecule; and(iv) a polymerization initiator capable of generating a Lewis acid by irradiation with an active energy ray.Type: GrantFiled: April 3, 1995Date of Patent: December 19, 1995Assignee: Canon Kabushiki KaishaInventors: Hiromichi Noguchi, Tadayoshi Inamoto, Megumi Munakata
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Patent number: 5459174Abstract: A radiation curable functionalized polymer is disclosed. The functionalized polymer is a copolymer of an isoolefin of 4 to 7 carbon atoms and para-alkylstyrene, wherein the para-alkylstyrene is functionalized with an acrylate or a mixture of acrylates and/or a photosensitizer and/or other functional groups at the para-alkyl groups of the para-alkylstyrene.Type: GrantFiled: June 24, 1994Date of Patent: October 17, 1995Inventors: Natalie A. Merrill, Hsian-Chang Wang, Anthony J. Dias
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Patent number: 5445916Abstract: Photopolymers based on polyvinyl alcohol derivatives of 8-hydroxy quinoline compositions having a high degree of photosensitivity, a marked degree of water solubility, and the ability to photodimerize when exposed to actinic radiation.Type: GrantFiled: April 5, 1993Date of Patent: August 29, 1995Assignee: Ulano CorporationInventor: John Curtis
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Patent number: 5437932Abstract: Novel photosensitive compositions based on azlactone derived polymers are described. The polymers have a hydroearbyl backbone and pendant peptide groups with free-radically polymerizable functionality attached thereto, said polymer further comprising at least one oxyacid group or salt thereof, and optionally quaternary ammonium salt groups. A high speed durable printing plate having a mild pH aqueous developability is disclosed which incorporates these polymers in combination with a photoinitiator. The polymers are also useful as proofing films in graphic arts applications.Type: GrantFiled: May 13, 1994Date of Patent: August 1, 1995Assignee: Minnesota Mining and Manufacturing CompanyInventors: M. Zaki Ali, Mahfuza B. Ali, Dean M. Moren
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Patent number: 5438082Abstract: In order to produce a polymer electrolyte membrane from sulfonated, aromatic polyether ketone, an aromatic polyether ketone of the formula (I) ##STR1## in which Ar is a phenylene ring having p- and/or m-bonds,Ar' is a phenylene, naphthylene, biphenylene, anthrylene or another divalent aromatic unit,X, N and M, independently of one another are 0 or 1,Y is 0, 1, 2 or 3,P is 1, 2, 3 or 4,is sulfonated and the sulfonic acid is isolated. At least 5% of the sulfonic groups in the sulfonic acid are converted into sulfonyl chloride groups, and these are reacted with an amine containing at least one crosslinkable substituent or a further functional group, and unreacted sulfonyl chloride groups are subsequently hydrolyzed. The resultant aromatic sulfonamide is isolated and dissolved in an organic solvent, the solution is converted into a film, and the crosslinkable substituents in the film are then crosslinked.In specific cases, the crosslinkable substituents can be omitted.Type: GrantFiled: June 10, 1993Date of Patent: August 1, 1995Assignee: Hoechst AktiengesellschaftInventors: Freddy Helmer-Metzmann, Frank Osan, Arnold Schneller, Helmut Ritter, Konstantin Ledjeff, Roland Nolte, Ralf Thorwirth