Solid Polymer Derived From Carboxylic Acid Or Derivative Monomer Patents (Class 522/153)
  • Patent number: 8569394
    Abstract: An active light-curable ink composition contains a polymerizable compound, a color material having an absorption peak in a wavelength region, and a polymerization initiator having an absorption peak in a different wavelength region from the color material.
    Type: Grant
    Filed: March 3, 2009
    Date of Patent: October 29, 2013
    Assignee: Seiko Epson Corporation
    Inventor: Satoru Miura
  • Patent number: 8552083
    Abstract: The present invention relates to a radiation-curable composition having a refractive index less than 1.40 comprising (1) a curable perfluoropolyether oligomer having a structural formula selected from the group consisting of: and wherein R represents a hydrogen atom or a methyl group, wherein A represents a straight chained or branched alkylene group, wherein m represents an integer from 1 to 4, wherein the integers represented by m within individual —((CF2)m—O)n— repeat units can be the same or different, and wherein n represents an integer from 1 to 20; (2) a diluent; (3) a photo-initiator; and (4) an adhesion promoter; wherein the radiation-curable composition is free of compounds containing —CF3 groups.
    Type: Grant
    Filed: June 29, 2011
    Date of Patent: October 8, 2013
    Assignee: Ovation Polymer Technology and Engineered Materials, Inc.
    Inventors: Prasad Taranekar, Austin L. Schuman, Asis Banerjie
  • Publication number: 20130243862
    Abstract: A water-soluble photo-activatable polymer including: a photo-activatable group adapted to be activated by an irradiation source and to form a covalent bond between the water-soluble photo-activatable polymer and a matrix having at least one carbon; a reactive group adapted to covalently react with a biomaterial for subsequent delivery of the biomaterial to a cell; a hydrophilic group; and a polymer precursor. A composition including a monomolecular layer of the water-soluble photo-activatable polymer and a matrix having at least one carbon, wherein the monomolecular layer is covalently attached to the matrix by a covalent bond between the photo-activatable group and the at least one carbon. The composition further includes a biomaterial having a plurality of active groups, wherein the biomaterial is covalently attached to the monomolecular layer by covalent bonding between the active groups and reactive groups. Also provided is a method for delivery of a biomaterial to a cell.
    Type: Application
    Filed: September 7, 2012
    Publication date: September 19, 2013
    Applicant: The Children's Hospital of Philadelphia
    Inventors: Ivan Alferiev, Ilia Fishbein, Michael Chorny, Robert J. Levy, Benjamin Yellen, Darryl Williams
  • Patent number: 8535644
    Abstract: Techniques are provided to produce and use non-spherical colloidal particles with independently tuned size, shape, flexibility, and chemical properties. A pre-polymer mixture for forming hydrogel particles includes a percentage of PEGDA selected to impart a target stiffness to the particles and includes, a percentage of acrylic acid selected to impart an independent target chemical function to the particles. The mixture also includes a percentage of photo-initiator to polymerize PEGDA upon exposure to a light source to impart an independently selected target size or shape or both to the particles.
    Type: Grant
    Filed: October 13, 2009
    Date of Patent: September 17, 2013
    Assignees: Massachusetts Institute of Technology, The General Hospital Corporation
    Inventors: Ramin Haghgooie, Patrick Seamus Doyle, Mehmet Toner, Daniel Colin Pregibon
  • Patent number: 8530539
    Abstract: Disclosed is a photocurable resin composition for nanoimprint, containing a curable monomer component with or without a binder resin. The composition further contains 0.001 to 5 parts by weight of a compound having a reactive functional group and a hydrophobic functional group in the same molecular skeleton, per 100 parts by weight of the total amount of the curable monomer component and binder resin. Preferably, the reactive functional group is at least one functional group selected from the group consisting of hydroxyl groups, epoxy groups, vinyl ether groups, oxetanyl groups, alkoxysilane groups, and free-radically polymerizable vinyl groups, and the hydrophobic functional group is at least one functional group selected from the group consisting of fluorine-containing groups, alkylsilane groups, alicyclic hydrocarbon groups, and aliphatic hydrocarbon groups having 4 or more carbon atoms.
    Type: Grant
    Filed: January 8, 2009
    Date of Patent: September 10, 2013
    Assignee: Daicel Chemical Industries, Ltd.
    Inventors: Hiroto Miyake, Shuso Iyoshi
  • Patent number: 8524795
    Abstract: A radiation curable ink composition has improved adhesion towards rigid recording media, good jetting behavior and no or minimal health and safety risks. The radiation curable ink has a viscosity of 30 mPa·s, or less, at 50° C.
    Type: Grant
    Filed: May 7, 2012
    Date of Patent: September 3, 2013
    Assignee: Oce-Technologies B.V.
    Inventors: Franciscus H. M. Stappers, Peter M. A. Wetjens, Hendrik J. A. Ogrinc, Gerardus C. P. Vercoulen
  • Publication number: 20130220533
    Abstract: The present invention aims to provide an adhesive composition which has high initial adhesion and can strongly fix an adherend, while can be peeled off easily by light irradiation even after undergoing a high-temperature process at 200° C. or higher. The present invention also aims to provide an adhesive tape produced from the adhesive composition, and wafer treatment method using the adhesive composition. The present invention provides an adhesive composition including an adhesive component, a photoinitiator, and a silicone compound containing a functional group that is crosslinkable with the adhesive component.
    Type: Application
    Filed: September 14, 2011
    Publication date: August 29, 2013
    Inventors: Toru Tonegawa, Takahiro Asao, Yuichi Sumii, Shigeru Nomura, Masateru Fukuoka, Daihei Sugita
  • Publication number: 20130223086
    Abstract: A motor vehicle part comprising a material based on polymer(s), the material being surface treated by ion bombardment in order to improve the surface appearance of the material. The invention also relates to a process for obtaining this part and the use thereof, in particular for the manufacture of lighting and/or signaling devices.
    Type: Application
    Filed: September 19, 2011
    Publication date: August 29, 2013
    Applicant: VALEO VISION
    Inventors: Alexis Chenet, Frédéric Moret, Marc Brassier
  • Patent number: 8519017
    Abstract: A catalyst precursor resin composition includes an organic polymer resin; a fluorinated-organic complex of silver ion; a monomer having multifunctional ethylene-unsaturated bonds; a photoinitiator; and an organic solvent. The metallic pattern is formed by forming catalyst pattern on a base using the catalyst precursor resin composition reducing the formed catalyst pattern, and electroless plating the reduced catalyst pattern. In the case of forming metallic pattern using the catalyst precursor resin composition, a compatibility of catalyst is good enough not to make precipitation, chemical resistance and adhesive force of the formed catalyst layer are good, catalyst loss is reduced during wet process such as development or plating process, depositing speed is improved, and thus a metallic pattern having good homogeneous and micro pattern property may be formed after electroless plating.
    Type: Grant
    Filed: May 15, 2008
    Date of Patent: August 27, 2013
    Assignee: LG Chem, Ltd.
    Inventors: Min Kyoun Kim, Min Jin Ko, Sang Chul Lee, Jeong Im Roh
  • Patent number: 8519408
    Abstract: Disclosed is a method of producing a thin film transistor substrate having high light sensitivity, heat-resistance, impact resistance, and a photosensitive composition used by the same, the method including forming data wires on an insulating substrate, forming an organic insulating film on the data wires by applying a photosensitive composition comprising a terpolymer, where the terpolymer is derived from monomers of an unsaturated carboxylic acid, an unsaturated carboxylic acid anhydride, or a mixture thereof, an unsaturated epoxy group-containing compound, and an olefinic compound.
    Type: Grant
    Filed: August 30, 2012
    Date of Patent: August 27, 2013
    Assignee: Samsung Display Co., Ltd.
    Inventors: Hoon Kang, Jae-sung Kim, Yang-ho Jung, Hi-kuk Lee
  • Patent number: 8513332
    Abstract: Disclosed is a color filter ink composition that includes an acrylic-based copolymer resin including repeating units represented by a particular chemical formula, a polymerizable monomer, a pigment, and a solvent. According to the present invention, the color filter ink composition can have excellent ejection properties and ejection stability by using a new acrylic-based copolymer resin as a binder resin, and also can have excellent storage stability, so that it can be used for a long period. In addition, a pattern formed using the color filter ink composition can have improved heat resistance, chemical resistance, and film strength.
    Type: Grant
    Filed: April 16, 2010
    Date of Patent: August 20, 2013
    Assignee: Cheil Industries Inc.
    Inventors: Jong-Seung Park, In-Jae Lee, Jin-Ki Hong, Seung-Joo Shin, Sung-Woong Kim, Tae-Woon Cha
  • Patent number: 8513321
    Abstract: Disclosed herein are dual cure coating compositions that include (a) a melamine-group containing polyethylenically unsaturated compound and (b) an acrylate-containing compound different from (a), wherein the acrylate-containing compound is present at a level sufficient to provide a cured coating layer having a glass transition temperature of 100° C. or below and a crosslink density of 20.0 mmoles/cc or below. Also disclosed are related multi-component composite coatings, coated substrates, and methods for coating a substrate.
    Type: Grant
    Filed: November 5, 2010
    Date of Patent: August 20, 2013
    Assignee: PPG Industries Ohio, Inc.
    Inventors: David C. Martin, Brian K. Rearick, Christina A. Winters, Mary Ann Fuhry, Cynthia Kutchko
  • Patent number: 8513322
    Abstract: Polymeric beads and methods of making the polymeric beads are described. The polymeric beads are crosslinked hydrogels or dried hydrogels. The polymeric beads are formed from droplets of a precursor composition that are exposed to radiation. The droplets are totally surrounded by a gas phase. The precursor composition contains a polar solvent and a polymerizable material miscible in the polar solvent. The polymerizable material has an average number of ethylenically unsaturated groups per monomer molecule equal to at least 1.2.
    Type: Grant
    Filed: June 7, 2007
    Date of Patent: August 20, 2013
    Assignee: 3M Innovative Properties Company
    Inventors: Robin E. Wright, Mahfuza B. Ali, Jessica M. Buchholz, Louis C. Haddad, Linda K. M. Olson, Matthew T. Scholz, Narina Y. Stepanova, Michael J. Svarovsky, Richard L. Walter, Caroline M. Ylitalo, Diane R. Wolk, Yifan Zhang
  • Patent number: 8507726
    Abstract: Photoinitiators mixture comprising (i) at least one compound selected from the group consisting of alpha-hydroxy ketones, monoacylphosphine oxides, bisacylphosphine oxides, ketosulfones, benzil ketals, benzoin ether, phenylglyoxylates, borates and titanocenes; and (ii) at least one compound of the formula (I) or (I?) R1, R?1, R2 and R2? R?9 independently of each other for example are hydrogen or C1-C12alkyl R7, R8, R9, R?8 and R?9 independently of each other for example are hydrogen, C1-C12alkyl which optionally is substituted or phenyl which optionally is substituted, exhibit excellent photoinitiating properties.
    Type: Grant
    Filed: October 23, 2009
    Date of Patent: August 13, 2013
    Assignee: BASF SE
    Inventors: Katia Studer, Sébastien Villeneuve, Akira Matsumoto, Hisatoshi Kura, Jan Sültemeyer
  • Patent number: 8507725
    Abstract: Compounds of the formula I or (I?), wherein R1 and R?1 for example are hydrogen, C3-C8cycloalkyl or C1-C12alkyl, R2 and R2? for example are hydrogen; unsubstituted C1-C20alkyl or substituted C1-C20alkyl; and R8 and R9 for example are hydrogen, C1-C12alkyl which optionally is substituted, or phenyl which optionally is substituted; exhibit an unexpectedly good performance in photopolymerization reactions.
    Type: Grant
    Filed: May 27, 2009
    Date of Patent: August 13, 2013
    Assignee: BASF SE
    Inventors: Akira Matsumoto, Hisatoshi Kura
  • Patent number: 8501830
    Abstract: The invention describes a radiation-curable ink jet ink, which comprises at least 50% by weight of cyclic trimethylolpropane formal acrylate (CTFA), and further comprises a free-radical photoinitiator, and which is substantially free of volatile compounds.
    Type: Grant
    Filed: September 15, 2008
    Date of Patent: August 6, 2013
    Assignee: Sun Chemical Corporation
    Inventors: Hartley David Selman, Graeme Edward Charles Beats, Nigel Anthony Caiger, Andrew David Speirs, Stephen Paul Wilson
  • Patent number: 8492452
    Abstract: A polymerizable photoinitiator is represented by Formula (I): wherein R1, R2 and R3 are independently selected from the group consisting of a hydrogen, an optionally substituted alkyl group and an optionally substituted aryl group or R1 and R3 represent the necessary atoms to form a five to eight membered ring; p, w, y and z are all integers with y representing a value 1 to 6; p representing the sum of w and z; p representing a value of 1 to 6; w=1 to (p?z) and z=0 to (p?w); L represents an optionally substituted (p+y)-valent linking group comprising 1 to 14 carbon atoms; A represents a radically polymerizable group selected from the group consisting of an acrylate group, a methacrylate group, a styrene group, an acryl amide group, a methacryl amide group, a maleate group, a fumarate group, an itaconate group, a vinyl ether group, an allyl ether group, an allyl ester group and a vinyl ester group; and X represents a photoinitiating moiety including at least one group capable of initiating a free radical p
    Type: Grant
    Filed: December 1, 2009
    Date of Patent: July 23, 2013
    Assignee: Agfa Graphics NV
    Inventors: Johan Loccufier, Luc Van Maele, Jaymes Van Luppen, Roland Claes
  • Patent number: 8492071
    Abstract: A curable composition containing (A) a polymerizable compound having an alkyleneoxy group having two or more carbon atoms, (B) a polymerizable compound lacking an alkyleneoxy group having two or more carbon atoms, (C) an i-line absorber, (D) a photopolymerization initiator, (E) an alkali-soluble resin, and (F) a pigment, wherein a mass ratio [(A)/((A)+(B))] is from 0.5 to 0.9, and an i-line transmittance obtainable when the curable composition is formed into a coating film having a thickness of 0.7 ?m, is 10% or less. The curable composition of the invention has enhanced adhesiveness upon forming a micro pattern, and can reduce development residues in unexposed non-cured areas. The curable composition of the invention is suitable for the use in color filters.
    Type: Grant
    Filed: March 27, 2009
    Date of Patent: July 23, 2013
    Assignee: FUJIFILM Corporation
    Inventor: Hiroshi Taguchi
  • Publication number: 20130184371
    Abstract: The present invention includes vinyl ether functional oligomers and methods for their preparation, the method including alternating free radical copolymerization of a dialkyl maleate or dialkyl fumerate monomer with a multifunctional vinyl ether monomer in the presence of a solvent with a high chain transfer constant. Also within the scope of the invention are uses for the vinyl ether functional oligomers compositions of this invention, including radiation curable coatings, adhesives, printing inks and composites.
    Type: Application
    Filed: September 29, 2011
    Publication date: July 18, 2013
    Applicant: RENSSELAER POLYTECHNIC INSTITUTE
    Inventor: James V. Crivello
  • Patent number: 8476334
    Abstract: A radiation-curable acrylate-modified aminoamide resin which is the Michael addition product of an aminoamide thermoplastic polymer derived from a polymerised unsaturated fatty acid with a polyol ester having at least three (meth)acrylate ester groups, the aminoamide thermoplastic polymer having an amine number of from 40 to 60 mgKOH/g, the ratio of the initial (meth) acrylate groups of the polyol ester to the initial amino functional groups of the aminoamide polymer being at least 4:1, is liquid at 25° C., and is useful as the resin component of various types of energy-curable coating composition, including inks, varnishes and lacquers, especially lithographic inks.
    Type: Grant
    Filed: December 2, 2005
    Date of Patent: July 2, 2013
    Assignee: Sun Chemical Corporation
    Inventors: Derek Ronald Illsley, Martin John Thompson, Sean Phillip Francis Mayers, Douglas Frederick Pavey
  • Patent number: 8461225
    Abstract: The present invention relates to methods for making oxidation resistant homogenized polymeric materials and medical implants that comprise polymeric materials, for example, ultra-high molecular weight polyethylene (UHMWPE). The invention also provides methods of making antioxidant-doped medical implants, for example, doping of medical devices containing cross-linked UHMWPE with vitamin E by diffusion and annealing the antioxidant doped UHMWPE in a super critical fluid, and materials used therein.
    Type: Grant
    Filed: August 18, 2006
    Date of Patent: June 11, 2013
    Assignee: The General Hospital Corporation
    Inventors: Orhun K. Muratoglu, Ebru Oral
  • Publication number: 20130123383
    Abstract: This invention focuses on improving mechanical properties without deteriorating flame retardancy in peroxide cross-linked and radiation cross-linked thermosetting clean flame retardant compositions. Optimal mechanical properties can be obtained by modifying the ratios of MAGNIFIN H10A/Ultracarb LH 15X in peroxide crosslinked or radiation crosslinked clean flame retardant composition. Higher tensile strength can be obtained by higher MAGNIFIN H10A content, and higher elongation at break can be obtained by higher Ultracarb LH 15X content. The invented compositions show excellent mechanical properties, flame retardancy, thermal properties, electrical properties and process ability for meeting the stringent specifications of wire and cable industry. Composition is made of 100 parts by weight of resin (polyolefin or 100 parts by weight of polyolefin/EPDM), 90-150 parts by weight of MAGNIFIN H10A/Ultracarb LH 15X as main flame retardants, 1-20 parts by weight of auxiliary secondary flame retardant agents and 0.2-1.
    Type: Application
    Filed: December 17, 2012
    Publication date: May 16, 2013
    Applicant: King Abdulaziz City Science and Technology
    Inventor: King Abdulaziz City Science and Technology
  • Patent number: 8426487
    Abstract: The present invention provides a fluorine-based compound and a coating composition and a film including the same. By using the fluorine-based compound according to the present invention, a film having excellent functionalities of water repellency, oil repellency, weatherability and contamination resistance can be provided.
    Type: Grant
    Filed: September 18, 2009
    Date of Patent: April 23, 2013
    Assignee: LG Chem, Ltd.
    Inventors: Chong-Kyu Shin, Yeong-Rae Chang, Joon-Koo Kang
  • Patent number: 8420296
    Abstract: Disclosed is a photosensitive resin composition for a color filter protective layer including a cross-linkable alkali soluble resin including a repeating unit represented by the following Chemical Formula 1, a reactive unsaturated compound, a photopolymerization initiator, and a solvent. In Chemical Formulae 1 to 3, R1 to R6 and A1 to A3 are the same as in the detailed description.
    Type: Grant
    Filed: August 26, 2010
    Date of Patent: April 16, 2013
    Assignee: Cheil Industries Inc.
    Inventors: Jae-Hyun Kim, Se-Young Choi, Nam-Gwang Kim, Eui-June Jeong, Chang-Min Lee
  • Patent number: 8419971
    Abstract: A process for producing water-absorbing polymer particles by polymerizing droplets of a monomer solution in a gas phase surrounding the droplets, wherein the particle surface is coated at least partly with at least one polymer and/or wax.
    Type: Grant
    Filed: December 12, 2007
    Date of Patent: April 16, 2013
    Assignee: BASF SE
    Inventors: Uwe Stueven, Rüdiger Funk, Matthias Weismantel, Wilfried Heide, Marco Krüger
  • Patent number: 8420709
    Abstract: The present invention relates to a coating composition comprising at least one photo-initiator and at least one (meth)acryl-polymer having units that are derived from (meth)acryl-monomers that have at least one double bond and 8 to 40 carbon atoms in the alkyl residue. The present invention furthermore relates to a monomer mixture comprising at least one (meth)acryl-monomer having at least one double bond and 8 to 40 carbon atoms in the alkyl residue and at least one photo-initiator monomer and a (meth)acryl-polymer that can be obtained by polymerization of said monomer mixture. The present invention furthermore relates to a method for producing a coating. The present invention furthermore relates to a coated object comprising a coating obtained by said method.
    Type: Grant
    Filed: March 30, 2010
    Date of Patent: April 16, 2013
    Assignee: Evonik Röhm GmbH
    Inventors: Christine Maria Breiner, Gerold Schmitt, Thorben Schuetz, Joachim Knebel, Ina Zwierzchowski, Margarita Stein
  • Patent number: 8404797
    Abstract: An end-modified soluble polyfunctional vinyl aromatic copolymer, which is improved in heat resistance, thermal stability, solvent solubility, and compatibility with acrylate compounds, and a curable resin composition using the same are disclosed. The end-modified soluble polyfunctional vinyl aromatic copolymer is obtained by allowing a divinyl aromatic compound (a), a monovinyl aromatic compound (b), and an aromatic ether compound (c) to react with each other, and has, at an end, an end group derived from the aromatic ether compound and having an acrylate bond. The copolymer has a number average molecular weight Mn of 500 to 100,000, an introduction amount (c1) of the end group derived from the aromatic ether compound satisfies (c1)?1.0 (group/molecule), a molar fraction a? of a structural unit derived from the divinyl aromatic compound and a molar fraction b? of a structural unit derived from the monovinyl aromatic compound in the copolymer satisfy 0.05?a?/(a?+b?)?0.95.
    Type: Grant
    Filed: March 3, 2009
    Date of Patent: March 26, 2013
    Assignee: Nippon Steel Chemical Co., Ltd.
    Inventors: Masanao Kawabe, Hiroko Terao, Natsuko Okazaki
  • Patent number: 8404758
    Abstract: The invention provides methods for inducing reversible chain cleavage of polymer chains in a crosslinked polymeric material. Reversible cleavage of the polymer backbone is capable of relieving stress in the polymeric material as the bonds reform in a less stressed state. The invention also provides methods for making polymeric materials capable of reversible chain cleavage, materials made by the methods of the invention, and linear monomers containing reversible chain cleavage groups which are useful in the materials and methods of the invention.
    Type: Grant
    Filed: May 17, 2011
    Date of Patent: March 26, 2013
    Assignee: The Regents of the University of Colorado, a body corporate
    Inventors: Christopher N. Bowman, Timothy F. Scott
  • Publication number: 20130059411
    Abstract: The present invention relates to UV curable encapsulant compositions based on acrylic and/or methacrylic block copolymers, to structures containing these compositions especially photovoltaic cells and to the use of these compositions in photovoltaic cells. The liquid encapsulant composition according to the invention comprises: an acrylic or methacrylic block copolymer, at least one acrylic or methacrylic monomer and/or oligomer, and at least one photo initiator.
    Type: Application
    Filed: May 3, 2010
    Publication date: March 7, 2013
    Applicants: PYTHAGORAS SOLAR INC., ARKEMA FRANCE
    Inventors: Pierre Gerard, Izhar Halahmi, Pasha Solel
  • Patent number: 8389595
    Abstract: The invention relates to the production of superabsorbent polymers comprising polymerizing a monomer solution on a continuous belt reactor, wherein the consistency of the formed polymer gel at the end of the continuous belt reactor is controlled by adjusting the intensity of energy-rich radiation.
    Type: Grant
    Filed: February 21, 2008
    Date of Patent: March 5, 2013
    Assignee: BASF SE
    Inventors: Matthias Weismantel, Rüdiger Funk, Sylvia Bertha, Leigh R. Blair, Kevin D. Heitzhaus, Bruce Storey
  • Patent number: 8362151
    Abstract: The present invention provides novel hybrid polymer useful for alignment layers for inducing alignment of a liquid crystal medium. Hybrid polymers of this invention are prepared from a) at least one component selected from the group consisting of oligomer(s) and polymer(s) within the class of polyimides, poly(amic acids) and esters thereof wherein the at least one component comprises at least one initiator generating moiety, and b) at least one component selected from the group consisting of addition monomer(s) and addition polymer(s), wherein the two components are covalently bonded to form a copolymer. The invention further describes liquid crystal elements such as all liquid crystal display products or modes, liquid crystal devices and liquid crystal optical films comprising the novel hybrid polymer alignment layers.
    Type: Grant
    Filed: December 15, 2009
    Date of Patent: January 29, 2013
    Assignee: Elsicon, Inc.
    Inventors: Chunhong Li, Wayne Gibbons
  • Patent number: 8361696
    Abstract: The present invention relates to a polymer resin compound including a new polycyclic compound, and a photosensitive resin composition including the polymer resin compound as an effective binder matrix. In particular, the photosensitive resin composition according to the present invention uses a polymer resin compound, which includes a compound having double cyclic structure in one molecule as a monomer, as a binder matrix. Accordingly, the photosensitive resin composition has an excellent photosensitivity and an excellent developing property, and has a low distortion property during plastic processing. For this reason, the photosensitive resin composition has an advantage of curing various transparent photosensitive materials used to manufacture a color filter of a liquid crystal display, for example, a column spacer, an overcoat, a passivation material, and the like.
    Type: Grant
    Filed: January 15, 2008
    Date of Patent: January 29, 2013
    Assignee: LG Chem, Ltd.
    Inventors: Keon-Woo Lee, Sung-Hyun Kim, Chang-Ho Cho, Dong-Kung Oh, Min-Young Lim, Ji-Heum Yoo, Sang-Kyu Kwak
  • Patent number: 8354458
    Abstract: A UV curable intermediate transfer media, such as a belt, that includes for example, a first supporting substrate, such as a polyimide substrate layer, and a second surface layer of a mixture of a dendritic, crosslinked, or branched polyester polyol acrylate, an acrylate, an optional vinyl monomer, and a photoinitiator component.
    Type: Grant
    Filed: August 30, 2010
    Date of Patent: January 15, 2013
    Assignee: Xerox Corporation
    Inventors: Jin Wu, Jonathan H. Herko, Lanhui Zhang, Lin Ma
  • Patent number: 8354459
    Abstract: An object of the present invention is to provide a method for producing a block copolymer solid in which microphase-separated structures are formed with good productivity. The present invention provides a method for producing a block copolymer solid in which a microphase-separated structure is formed, or an alloy, blend or composite solid containing a block copolymer in which a microphase-separated structure is formed, which comprises the following steps (1) to (3): (1) immersing a block copolymer solid or an alloy, blend or composite solid containing a block copolymer in a solvent in which each component is insoluble; (2) putting the solid obtained in (1) above in a pressure-resistant container; and (3) irradiating the solid or the solvent in (2) above with microwave.
    Type: Grant
    Filed: August 17, 2010
    Date of Patent: January 15, 2013
    Assignee: Japan Science and Technology Agency
    Inventors: Hiroshi Yabu, Takeshi Higuchi
  • Publication number: 20120329902
    Abstract: The subject invention relates to a method of preparing a biocompatible polymer comprising epsilon-linked L-lysine having free alpha-amino and carboxy functions. The invention further encompasses the resulting biocompatible polymer and articles made from the polymer, in particular contact and intraocular lenses.
    Type: Application
    Filed: January 11, 2011
    Publication date: December 27, 2012
    Inventors: Rolf Schäfer, Hans Hitz
  • Patent number: 8329079
    Abstract: Methods and apparatus for continuous production of a partially polymerized composition according to the invention comprise those that facilitate continuously providing polymerizable composition comprising one or more monomers to an angled plane at an elevated position thereon; irradiating the polymerizable composition to form the partially polymerized composition; and continuously removing the partially polymerized composition from the angled plane at a lower position thereon, wherein the angle of the angled plane facilitates free flow of polymerizing composition from the elevated position to the lower position.
    Type: Grant
    Filed: April 20, 2009
    Date of Patent: December 11, 2012
    Assignee: entrochem, inc.
    Inventors: James E. McGuire, Jr., Andrew C. Strange, Daniel E. Lamone
  • Patent number: 8323535
    Abstract: The present invention relates to a photochromic composition comprising multifunctional (meth)acrylate-based monomers having two or more functional groups, a photochromic dye and an aromatic vinyl compound, in which the content of the aromatic vinyl compound is more than 30% by weight and 70% by weight or less, a photochromic film produced by using the same, and a method for producing the photochromic film.
    Type: Grant
    Filed: October 31, 2008
    Date of Patent: December 4, 2012
    Assignee: LG Chem, Ltd.
    Inventors: Hyeon Choi, Jee-Seon Kim, Woo-Sung Kim, Young-Jun Hong
  • Patent number: 8318053
    Abstract: Disclosed is a photosensitive resin composition including (A) a photopolymerizable monomer including a compound represented by the following Chemical Formula 1, wherein the substituents of Chemical Formula 1 are the same as defined in the specification, (B) a binder resin, (C) a photopolymerization initiator, (D) a pigment and (E) a solvent, and a color filter using the same.
    Type: Grant
    Filed: August 25, 2011
    Date of Patent: November 27, 2012
    Assignee: Cheil Industries Inc.
    Inventors: Jung-Sik Choi, Chang-Min Lee, Jin-Woo Park, Kyung-Won Ahn, Myung-Ho Cho
  • Patent number: 8313666
    Abstract: There is provided novel curable ink compositions comprising polymer-coated magnetic metal nanoparticles. In particular, there is provided ultraviolet (UV) curable gel inks comprising at least the coated magnetic metal nanoparticles, one curable monomer, a radiation activated initiator that initiates polymerization of curable components of the ink, a gellant. The inks may also include optional colorants and one or more optional additives. These curable gel UV ink compositions can be used for ink jet printing in a variety of applications.
    Type: Grant
    Filed: March 17, 2011
    Date of Patent: November 20, 2012
    Assignee: Xerox Corporation
    Inventors: Gabriel Iftime, Naveen Chopra, Barkev Keoshkerian, Peter G. Odell, Marcel P. Breton
  • Patent number: 8309621
    Abstract: Disclosed is a radiation curable solid ink composition comprising: (a) a curable wax; (b) at least one curable monomer, oligomer, or prepolymer; (c) at least one photoinitiator; and (d) a pigment colorant; wherein the ink is a solid at a first temperature of about 25° C. or lower; and wherein the ink is a liquid at a second temperature of about 40° C. or higher; said ink being curable by free-radical polymerization.
    Type: Grant
    Filed: December 17, 2010
    Date of Patent: November 13, 2012
    Assignee: Xerox Corporation
    Inventors: Marcel P Breton, Michelle N Chretien, Barkev Keoshkerian
  • Patent number: 8303862
    Abstract: Disclosed are a photosensitive resin composition for a color filter and a color filter including the same. The photosensitive resin composition for a color filter may include (A) an acrylic-based copolymer including a structural unit represented by the following Chemical Formula 1 and a structural unit represented by the following Chemical Formula 2, wherein the substituents of Chemical Formula 1 and Chemical Formula 2 are the same as defined in the specification; (B) an acrylic-based photopolymerizable monomer; (C) a photopolymerization initiator; (D) a pigment; and (E) a solvent.
    Type: Grant
    Filed: September 21, 2011
    Date of Patent: November 6, 2012
    Assignee: Cheil Industries Inc.
    Inventors: Chang-Min Lee, Kil-Sung Lee, Jae-Hyun Kim, Jun-Seok Kim, Sang-Won Cho, Gyu-Seok Han
  • Patent number: 8303838
    Abstract: There is provided novel curable ink compositions comprising inorganic oxide-coated magnetic metal nanoparticles. In particular, there is provided ultraviolet (UV) curable gel inks comprising at least the inorganic oxide-coated magnetic metal nanoparticles, one curable monomer, a radiation activated initiator that initiates polymerization of curable components of the ink. In particular the ink may include a gellant. The inks may also include optional colorants and one or more optional additives. These curable UV ink compositions can be used for ink jet printing in a variety of applications.
    Type: Grant
    Filed: March 17, 2011
    Date of Patent: November 6, 2012
    Assignee: Xerox Corporation
    Inventors: Gabriel Iftime, Naveen Chopra, Barkev Keoshkerian, Peter G. Odell, Marcel P. Breton
  • Publication number: 20120277341
    Abstract: The present invention is directed to an adhesive composition comprising a crosslinkable acrylic copolymer, a multi-functionalized crosslinkable oligomer and a photoinitiator wherein the partially cured composition exhibits excellent wet out characteristics as reflected in a tan delta value of at least 0.4, preferably greater than 0.5, more preferable greater than 0.6 as measured at 20° C. resulting from a first curing stage, and the fully cured composition exhibits an improved stiffness and temperature resistance as reflected in a storage elastic modulus of at least 175,000 Pa at 20° C. and a shear adhesion failure temperature of at least 425° F. (218.3° C.) at 1 Kg/in2 (0.155 Kg/cm2), respectively, which result from a second sequential curing stage.
    Type: Application
    Filed: July 11, 2012
    Publication date: November 1, 2012
    Applicant: Curwood, Inc.
    Inventors: Timothy Michael Smith, Gary Allan McMaster
  • Patent number: 8298454
    Abstract: Disclosed are a photosensitive resin composition and a light blocking layer using the same. The photosensitive resin composition includes (A) a cardo-based monomer represented by the following Chemical Formula 1 or 2, wherein the substituents of Chemical Formula 1 and Chemical Formula 2 are the same as defined in the detailed description, (B) a cardo-based resin, (C) a reactive unsaturated compound, (D) a pigment, (E) an initiator, and (F) a solvent.
    Type: Grant
    Filed: September 23, 2011
    Date of Patent: October 30, 2012
    Assignee: Cheil Industries Inc.
    Inventors: Chang-Min Lee, Jun-Seok Kim, Kil-Sung Lee, Min-Sung Kim
  • Patent number: 8293149
    Abstract: Disclosed are a photosensitive resin composition for a color filter and a color filter using the same. The photosensitive resin composition for a color filter may include (A) a copolymer including a structural unit represented by the following Chemical Formula 1, wherein the substituents of Chemical Formula 1 are the same as defined in the specification; (B) an acrylic-based photopolymerizable monomer; (C) a photopolymerization initiator; (D) a pigment; and (E) a solvent.
    Type: Grant
    Filed: July 26, 2011
    Date of Patent: October 23, 2012
    Assignee: Cheil Industries Inc.
    Inventors: Chang-Min Lee, Jun-Seok Kim, Kil-Sung Lee
  • Patent number: 8288450
    Abstract: An adhesive composition and an optical member, the adhesive composition including 100 parts by weight of a polymer prepared by polymerization of (meth)acrylic ester containing monomers; 0.01 to about 3 parts by weight of an antistatic agent containing an ionic compound and/or a lithium salt; 0 to about 1 part by weight of a silane coupling agent; and about 3 to about 20 parts by weight of a benzotriazole group containing compound; and about 0.05 to about 5 parts by weight of a cross-linking agent, or about 3 to about 30 parts by weight of a multifunctional (meth)acrylate monomer, and 0 to about 5 parts by weight of an active energy-ray initiator.
    Type: Grant
    Filed: June 13, 2011
    Date of Patent: October 16, 2012
    Assignee: Cheil Industries, Inc.
    Inventors: Cheong Hun Song, Hiroshi Ogawa, Tatsuhiro Suwa
  • Publication number: 20120251831
    Abstract: An object of the present invention is to provide a near infrared absorbent dye capable of providing a near infrared shielding filter with excellent transparency as well as high heat resistance and hygrothermal resistance. The near infrared absorbent dye is characterized in that it is made of the amorphous form of diimmonium salt represented by formula (1).
    Type: Application
    Filed: December 16, 2010
    Publication date: October 4, 2012
    Applicant: JAPAN CARLIT CO., LTD
    Inventors: Akinori Okayasu, Masaaki Tamura
  • Patent number: 8277701
    Abstract: Disclosed are a photosensitive resin composition for a color filter and a color filter using the same. The photosensitive resin composition for a color filter includes (A) an acrylic-based binder resin including a structural unit represented by the following Chemical Formula 1, wherein the substituents of Chemical Formula 1 are the same as defined in the specification; (B) an acrylic-based photopolymerizable monomer; (C) a photopolymerization initiator; (D) a pigment; and (E) a solvent.
    Type: Grant
    Filed: August 1, 2011
    Date of Patent: October 2, 2012
    Assignee: Cheil Industries Inc.
    Inventors: Chang-Min Lee, Kil-Sung Lee, Jun-Seok Kim, Seong-Yong Uhm, Sang-Won Cho
  • Patent number: 8278021
    Abstract: Disclosed is a method of producing a thin film transistor substrate having high light sensitivity, heat-resistance, impact resistance, and a photosensitive composition used by the same, the method including forming data wires on an insulating substrate, forming an organic insulating film on the data wires by applying a photosensitive composition comprising a terpolymer, where the terpolymer is derived from monomers of an unsaturated carboxylic acid, an unsaturated carboxylic acid anhydride, or a mixture thereof, an unsaturated epoxy group-containing compound, and an olefinic compound.
    Type: Grant
    Filed: July 10, 2008
    Date of Patent: October 2, 2012
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Hoon Kang, Jae-sung Kim, Yang-ho Jung, Hi-kuk Lee
  • Patent number: 8273270
    Abstract: Disclosed are a photosensitive resin composition that includes (A) a cardo-based resin including repeating units represented by the following Chemical Formulae 1 and 2, wherein the substituents of Chemical Formulae 1 and 2 are the same as defined in the specification, (B) reactive unsaturated compound, (C) a pigment, (D) an initiator, and (E) a solvent, and a light blocking layer using the photosensitive resin composition.
    Type: Grant
    Filed: June 16, 2011
    Date of Patent: September 25, 2012
    Assignee: Cheil Industries Inc.
    Inventors: Chang-Min Lee, Kil-Sung Lee, Jun-Seok Kim, Jung-Sik Choi