Carboxylic Acid Or Derivative Patents (Class 522/182)
  • Publication number: 20130337161
    Abstract: An organic-inorganic composite film containing an organic-inorganic composite including an inorganic compound particle and a polymer bonded to the inorganic compound particles. A percentage of voids in the film is 3 to 70 volume % with reference to a volume of the film.
    Type: Application
    Filed: February 20, 2012
    Publication date: December 19, 2013
    Applicant: ASAHI KASEI CHEMICALS CORPORATION
    Inventors: Mitsuyo Akimoto, Kenya Tanaka
  • Patent number: 8597786
    Abstract: The present invention relates to a pressure-sensitive adhesive composition including, as a main ingredient, a monomer mixture or an acrylic copolymer material obtained by at least partially polymerizing the monomer mixture, the monomer mixture including: at least one monomer (monomer m1) selected from alkyl (meth)acrylates represented by the following formula (I) CH2?C(R1)COOR2 in which R1 is a hydrogen atom or a methyl group, and R2 is an alkyl group having 1 to 20 carbon atoms: at least one monomer (monomer m2) selected from N-hydroxyalkyl(meth)acrylamides represented by the following formula (II) CH2?C(R1)CONHR4 in which R3 is a hydrogen atom or a methyl group, and R4 is a hydroxyalkyl group having 2 to 4 carbon atoms: and at least one monomer (monomer m3) selected from N-vinyl cyclic amides and (meth)acrylamides that may have an N-alkyl group; and the monomer mixture including substantially no carboxyl group-containing monomer.
    Type: Grant
    Filed: May 21, 2009
    Date of Patent: December 3, 2013
    Assignee: Nitto Denko Corporation
    Inventors: Masahito Niwa, Masayuki Okamoto, Naoaki Higuchi
  • Patent number: 8598250
    Abstract: The present invention relates to a photocurable acrylic viscoelastic material composition including: an acrylic monomer mixture containing an alkyl (meth)acrylate as a main monomer component and a polar group-containing vinyl monomer, or a partial polymerization product thereof; a (meth)acrylate compound having at least one isocyanate group within the molecule thereof; and a photopolymerization initiator. The photocurable acrylic viscoelastic material composition of the present invention has, by virtue of the above-described construction, excellent pot life and excellent storage stability, despite containing an isocyanate compound having at least one isocyanate group within the molecule thereof, and further can form an acrylic viscoelastic material excellent in the holding power at high temperatures through photocuring. Also, the acrylic viscoelastic material and acrylic viscoelastic material layer tape or sheet of the present invention is excellent in the holding power at high temperatures.
    Type: Grant
    Filed: January 22, 2009
    Date of Patent: December 3, 2013
    Assignee: Nitto Denko Corporation
    Inventors: Akira Hirao, Kunio Nagasaki, Kazuhisa Maeda
  • Patent number: 8586646
    Abstract: A process for the preparation of barium containing polyacrylates for optical and coating applications. The process consists in dispersing octahydrate of barium hydroxide in acrylic acid to form a monomer mixture. An aromatic carboxylic acid is added to the monomer mixture and then a cross linking agent is added thereto. Such a monomer mixture is subjected to the step of polymerization by gamma radiation.
    Type: Grant
    Filed: March 9, 2007
    Date of Patent: November 19, 2013
    Assignee: Shriram Institute for Industrial Research
    Inventors: Rakesh Kumar Khandal, Amita Malik, Geetha Seshadri, Mukti Tyagi
  • Patent number: 8586645
    Abstract: A process for the preparation of lead containing polyacrylates for optical applications. The process consists in dispersing lead monoxide in acrylic acid to form a monomer mixture. An aromatic carboxylic acid is added to the monomer mixture and then a cross linking agent is added thereto. Such a monomer mixture is subjected to the step of polymerization by gamma radiation.
    Type: Grant
    Filed: March 9, 2007
    Date of Patent: November 19, 2013
    Assignee: Shriram Institute for Industrial Research
    Inventors: Rakesh Kumar Khandal, Amita Malik, Geetha Seshadri, Mukti Tyagi
  • Patent number: 8580906
    Abstract: Provided are a polyrotaxane capable of using an aqueous solvent in a fabricating process although it has hydrophobicity, an aqueous composition having the polyrotaxane, a crosslinked body comprising the polyrotaxane, etc. The polyrotaxane comprises blocking groups located at both ends of a pseudo-polyrotaxane having cyclic molecules and a linear molecule which pierces the cavities of the cyclic molecules in a skewered manner to form a clathrate therewith so as not to detach the cyclic molecules, wherein the cyclic molecules have a group represented by Formula I, a group represented by Formula II and a group represented by Formula III. Incidentally, M represents, for example, a group derived from ring-opening polymerization of ?-caprolactone or the like, A represents a hydroxy group or the like, B represents a —COOH group or the like, and C represents A and/or B: -M-A??Formula I; -M-B??Formula II; and —C??Formula III.
    Type: Grant
    Filed: May 15, 2009
    Date of Patent: November 12, 2013
    Assignee: Advanced Softmaterials Inc.
    Inventors: Yuki Hayashi, Mariko Shibuya, Masabumi Kudoh, Masahiko Yamanaka
  • Patent number: 8580143
    Abstract: The present invention relates to a lyotropic chromonic liquid crystal composition, a method for manufacturing a lyotropic chromonic liquid crystal coating film and a lyotropic chromonic liquid crystal coating film manufactured thereby. The lyotropic chromonic liquid crystal composition of the present invention includes chromonic liquid crystal compounds and monomers each having opposing acid-base properties. Use of the lyotropic chromonic liquid crystal composition in the formation of optical films leads to improvements in electrical and optical properties such as mechanical strength, an insulating characteristic and a refractive index.
    Type: Grant
    Filed: November 5, 2009
    Date of Patent: November 12, 2013
    Assignees: Korea Institute of Industrial Technology, Industrial Cooperation Foundation Chonbuk National University
    Inventors: Seung Han Shin, Eu Gene Chang, Myong Hoon Lee, Kwang Un Jeong, Yun Ju Bae
  • Publication number: 20130286604
    Abstract: A photocurable resin composition which hardly causes leakage and is easily formed into a desired shape and an image display device using this photocurable resin composition are provided. Namely, a photocurable resin composition comprises a compound (A) having a photopolymerizable functional group and an oil gelling agent (B), is provided. Also, an image display device having a laminate structure including an image display unit having an image display part, a transparent protective plate, and a resin layer existent between the image display unit and the transparent protective plate, wherein the resin layer is a cured material of the above-described photocurable resin composition, is provided.
    Type: Application
    Filed: March 21, 2013
    Publication date: October 31, 2013
    Applicant: HITACHI CHEMICAL COMPANY, LTD.
    Inventor: Hitachi Chemical Company, Ltd.
  • Patent number: 8563624
    Abstract: A free radical curable liquid for inkjet printing of food packaging materials includes no initiator or otherwise one or more initiators selected from the group consisting of non-polymeric di- or multifunctional initiators, oligomeric initiators, polymeric initiators, and polymerizable initiators; wherein the polymerizable composition of the liquid consists essentially of: a) 25-100 wt % of one or more polymerizable compounds A having at least one acrylate group G1 and at least one second ethylenically unsaturated polymerizable functional group G2 different from the group G1; b) 0-55 wt % of one or more polymerizable compounds B selected from the group consisting of monofunctional acrylates and difunctional acrylates; and c) 0-55 wt % of one or more polymerizable compounds C selected from the group consisting of trifunctional acrylates, tetrafunctional acrylates, pentafunctional acrylates and hexafunctional acrylates.
    Type: Grant
    Filed: October 16, 2008
    Date of Patent: October 22, 2013
    Assignee: Agfa Graphics NV
    Inventors: Roland Claes, Johan Loccufier
  • Publication number: 20130273384
    Abstract: Bio-based glacial acrylic acid, produced from hydroxypropionic acid, hydroxypropionic acid derivatives, or mixtures thereof and having impurities of hydroxypropionic acid, hydroxypropionic acid derivatives, or mixtures thereof, is polymerized to poly(acrylic acid) or superabsorbent polymer using the same processes as petroleum-derived glacial acrylic acid.
    Type: Application
    Filed: March 15, 2013
    Publication date: October 17, 2013
    Applicant: THE PROCTER & GAMBLE COMPANY
    Inventors: Jane Ellen Godlewski, Janette Villalobos, Dimitris Ioannis Collias, Axel Meyer, Peter Dziezok, Juan Estaban Velasquez
  • Publication number: 20130270223
    Abstract: A photoresist composition includes about 65% by weight to about 80% by weight of a mono-functional monomer, about 5% by weight to about 20% by weight of a di-functional monomer, about 1% by weight to about 10% by weight of a multi-functional monomer including three or more functional groups, about 1% by weight to about 5% by weight of a photoinitiator, and less than about 1% by weight of a surfactant, each based on a total weight of the photoresist composition.
    Type: Application
    Filed: December 11, 2012
    Publication date: October 17, 2013
    Applicant: SAMSUNG DISPLAY CO., LTD.
    Inventors: Ki-Beom LEE, Dae-Hwan JANG, Atsushi TAKAKUWA
  • Patent number: 8552088
    Abstract: A cement for dental use, containing a first agent and a second agent, wherein both of the first agent and the second agent contain a polymerizable monomer (a) and a filler (b), wherein the first agent and/or the second agent further contains a photopolymerization initiator (c), wherein further as a chemical polymerization initiator (d), either one of the first agent and the second agent contains an oxidizing agent (f) and the other contains a reducing agent (g), the oxidizing agent (f) and the reducing agent (g) constituting a redox polymerization initiator, wherein the photopolymerization initiator (c) contains an ?-diketone, and the photopolymerization initiator (c) is contained in a total amount of from 0.010 to 0.100 parts by weight, based on 100 parts by weight of the total amount of the polymerizable monomer (a), wherein the chemical polymerization initiator (d) is contained in a total amount of from 0.
    Type: Grant
    Filed: December 25, 2008
    Date of Patent: October 8, 2013
    Assignee: Kuraray Noritake Dental Inc.
    Inventors: Hiroki Shinoda, Mitsuru Takei, Hidemi Nakayama
  • Patent number: 8546461
    Abstract: The present invention relates to a method for producing water-absorbing polymer particles by radiation-inducing polymerization on a continuously revolving belt, electromagnetic radiation having a wavelength of greater than 400 nm being shielded.
    Type: Grant
    Filed: November 24, 2008
    Date of Patent: October 1, 2013
    Assignee: BASF SE
    Inventors: Matthias Weismantel, Rüdiger Funk, Leigh R. Blair, Kevin D. Heitzhaus
  • Patent number: 8541482
    Abstract: The present disclosure relates generally to compositions for nail coatings, and particularly, but not by way of limitation, to polymerizable compositions. The disclosure further relates to methods of making a polymerizable, protective and scratch resistant topcoat layer that can be easily removed.
    Type: Grant
    Filed: October 5, 2009
    Date of Patent: September 24, 2013
    Assignee: Creative Nail Design, Inc.
    Inventors: Thong Vu, Douglas D. Schoon
  • Publication number: 20130235515
    Abstract: An electronic display (100) is provided that includes a display panel (106) having an image—forming region, a substantially clear photocured bonding layer (104) which is the reaction product of a first photocurable resin system disposed upon the image—forming region, an obscuring layer (108) in proximity to at least a portion of the substantially clear photocurable bonding layer, and a substantially transparent outer panel (106) in contact with at least a portion of the obscuring layer. The bonding layer (104) is disposed partially beneath the obscuring layer (108). The obscuring layer has an average light transmission of less than about 5% in the wavelength range of 420 nm to 700 nm and a light transmission of greater than about 5% in the wavelength range of 300 to 400 nm. Also provided is a method for making the electronic display.
    Type: Application
    Filed: November 2, 2011
    Publication date: September 12, 2013
    Applicant: 3M INNOVATIVE PROPERTIES COMPANY
    Inventors: Andrew J. Ouderkirk, Scott B. Charles, Stanley C. Busman
  • Publication number: 20130237630
    Abstract: A heat-resistant cured product is efficiently produced by obtaining a semi-cured product where a curable resin composition containing a (meth)acrylate monomer, a non-conjugated vinylidene group-containing compound and a thermal radical-polymerization initiator is processed by at least one of photoirradiation and heating to give a semi-cured product having a complex viscosity of from 105 to 108 mPa·s at 25° C. and at a frequency of 10 Hz; and putting the semi-cured product in a forming die for pressure formation therein, and heating it therein for thermal polymerization to give a cured product.
    Type: Application
    Filed: April 24, 2013
    Publication date: September 12, 2013
    Applicant: FUJIFILM Corporation
    Inventors: Naoyuki MOROOKA, Rie OKUTSU, Tatsuhiko OBAYASHI, Hiroaki MOCHIZUKI
  • Patent number: 8530540
    Abstract: A curable composition for imprints, comprising at least one polymerizable monomer and a photopolymerization initiator, wherein the content of a polymerizable monomer having a viscosity at 25° C. of 7 mPa·s or more is 80% by mass or more, relative to all the polymerizable monomers contained in the composition. The curable composition for imprints has low volatility of the components even in a thin film coating on a substrate and is thus capable of forming a good pattern.
    Type: Grant
    Filed: July 7, 2009
    Date of Patent: September 10, 2013
    Assignee: FUJIFILM Corporation
    Inventor: Kunihiko Kodama
  • Patent number: 8530538
    Abstract: An ultraviolet hardenable ink composition excelling in the wetting characteristic (repellence prevention) of ink having impacted a recording medium. There is provided an ultraviolet hardenable ink composition characterized by containing a polyester-modified polydimethylsiloxane as a surfactant in an amount of 0.01 to 1% based on the ultraviolet hardenable ink. Preferably, at least allyl glycol and/or a N-vinyl compound is contained as a polymerizable compound. Incorporation of the polyester-modified polydimethylsiloxane in the surfactant has realized enhancing of the wetting characteristic on all nonabsorptive material surfaces and avoiding of ink repellence.
    Type: Grant
    Filed: March 29, 2006
    Date of Patent: September 10, 2013
    Assignee: Seiko Epson Corporation
    Inventors: Keitaro Nakano, Takashi Oyanagi
  • Patent number: 8524795
    Abstract: A radiation curable ink composition has improved adhesion towards rigid recording media, good jetting behavior and no or minimal health and safety risks. The radiation curable ink has a viscosity of 30 mPa·s, or less, at 50° C.
    Type: Grant
    Filed: May 7, 2012
    Date of Patent: September 3, 2013
    Assignee: Oce-Technologies B.V.
    Inventors: Franciscus H. M. Stappers, Peter M. A. Wetjens, Hendrik J. A. Ogrinc, Gerardus C. P. Vercoulen
  • Patent number: 8519018
    Abstract: A resin includes: an acrylate; and a curing agent to cure the acrylate. The resin is adapted to adhere to a degradable material selected from the group consisting of polylactic polymer (PLA), polyhydroxyalkonate (PHA), poly 3 hydroxybutrate co 3 hydroxyhexanote (PHBH), and paper. The curing agent includes a photoinitiator or a sensitizer that, when cured, form a hard coat when the resin is exposed to ultraviolet radiation or an electron beam.
    Type: Grant
    Filed: February 21, 2010
    Date of Patent: August 27, 2013
    Assignee: Innovative Bottles, LLC
    Inventor: Shantu Patel
  • Patent number: 8519408
    Abstract: Disclosed is a method of producing a thin film transistor substrate having high light sensitivity, heat-resistance, impact resistance, and a photosensitive composition used by the same, the method including forming data wires on an insulating substrate, forming an organic insulating film on the data wires by applying a photosensitive composition comprising a terpolymer, where the terpolymer is derived from monomers of an unsaturated carboxylic acid, an unsaturated carboxylic acid anhydride, or a mixture thereof, an unsaturated epoxy group-containing compound, and an olefinic compound.
    Type: Grant
    Filed: August 30, 2012
    Date of Patent: August 27, 2013
    Assignee: Samsung Display Co., Ltd.
    Inventors: Hoon Kang, Jae-sung Kim, Yang-ho Jung, Hi-kuk Lee
  • Patent number: 8519212
    Abstract: The present invention provides a production process by which a water-absorbent resin of excellent quality can be obtained at a low cost by reasonable steps in aqueous solution polymerization. The process for producing a water-absorbent resin comprises the step of polymerizing an aqueous solution of water-absorbent resin-forming monomers including acrylic acid and/or its sodium salt as major components, wherein: (1) the aqueous solution has a monomer component concentration of not less than 45 weight %; (2) the polymerization is carried out while water is evaporated so that the ratio (concentration ratio) between a solid component concentration in a hydropolymer as formed by the polymerization and a solid component concentration in the aqueous monomer solution will not be less than 1.10; and (3) the solid component concentration in the hydropolymer as formed by the polymerization is not more than 80 weight %.
    Type: Grant
    Filed: May 11, 2010
    Date of Patent: August 27, 2013
    Assignee: Nippon Shokubai Co., Ltd.
    Inventors: Yorimichi Dairoku, Yoshio Irie, Shinichi Fujino, Yasuhiro Fujita, Takashi Azumi, Kunihiko Ishizaki
  • Patent number: 8513321
    Abstract: Disclosed herein are dual cure coating compositions that include (a) a melamine-group containing polyethylenically unsaturated compound and (b) an acrylate-containing compound different from (a), wherein the acrylate-containing compound is present at a level sufficient to provide a cured coating layer having a glass transition temperature of 100° C. or below and a crosslink density of 20.0 mmoles/cc or below. Also disclosed are related multi-component composite coatings, coated substrates, and methods for coating a substrate.
    Type: Grant
    Filed: November 5, 2010
    Date of Patent: August 20, 2013
    Assignee: PPG Industries Ohio, Inc.
    Inventors: David C. Martin, Brian K. Rearick, Christina A. Winters, Mary Ann Fuhry, Cynthia Kutchko
  • Publication number: 20130210957
    Abstract: Disclosed is an activation energy ray-curable resin composition comprising 70 to 95 parts by mass of a multifunctional monomer (A) which has a surface free energy of 37 mJ/m2 or more when cured and 5 to 30 parts by mass of a fluorine (meth)acrylate (B) which is compatible with the multifunctional monomer (A) (a total content of all monomers in the composition shall be 100 parts by mass), wherein the multifunctional monomer (A) has three or more radical polymerizable functional groups in a molecule and a value of a molecular weight thereof divided by the number of the radical polymerizable functional group (molecular weight/number of radical polymerizable functional group) is 110 to 200, and wherein the fluorine (meth)acrylate (B) has one or more radical polymerizable functional groups in a molecule.
    Type: Application
    Filed: April 4, 2011
    Publication date: August 15, 2013
    Applicant: Mitsubishi Rayon Co., Ltd
    Inventors: Tsuyoshi Takihara, Hiroshi Onomoto, Eiko Okamoto
  • Patent number: 8507575
    Abstract: A radiation-sensitive resin composition includes a first polymer including a repeating unit represented by a following formula (I). X+ is an onium cation. X+ in the formula (I) is preferably an onium cation represented by a following formula (1-1), an onium cation represented by a following formula (1-2) or a combination thereof.
    Type: Grant
    Filed: October 13, 2011
    Date of Patent: August 13, 2013
    Assignee: JSR Corporation
    Inventors: Nobuji Matsumura, Yukio Nishimura, Akimasa Soyano, Ryuichi Serizawa, Noboru Otsuka, Hiroshi Tomioka
  • Patent number: 8507571
    Abstract: Disclosed herein is a macro-photoinitiator comprising a photoinitiator covalently bound to a polymer. Also disclosed herein is a process for the enzymatic polymerization of monomers and photoinitiators performed at atmospheric pressure and relatively low temperatures to form the macro-photoinitiator.
    Type: Grant
    Filed: December 2, 2009
    Date of Patent: August 13, 2013
    Assignee: Xerox Corporation
    Inventor: Santiago Faucher
  • Patent number: 8507725
    Abstract: Compounds of the formula I or (I?), wherein R1 and R?1 for example are hydrogen, C3-C8cycloalkyl or C1-C12alkyl, R2 and R2? for example are hydrogen; unsubstituted C1-C20alkyl or substituted C1-C20alkyl; and R8 and R9 for example are hydrogen, C1-C12alkyl which optionally is substituted, or phenyl which optionally is substituted; exhibit an unexpectedly good performance in photopolymerization reactions.
    Type: Grant
    Filed: May 27, 2009
    Date of Patent: August 13, 2013
    Assignee: BASF SE
    Inventors: Akira Matsumoto, Hisatoshi Kura
  • Patent number: 8507726
    Abstract: Photoinitiators mixture comprising (i) at least one compound selected from the group consisting of alpha-hydroxy ketones, monoacylphosphine oxides, bisacylphosphine oxides, ketosulfones, benzil ketals, benzoin ether, phenylglyoxylates, borates and titanocenes; and (ii) at least one compound of the formula (I) or (I?) R1, R?1, R2 and R2? R?9 independently of each other for example are hydrogen or C1-C12alkyl R7, R8, R9, R?8 and R?9 independently of each other for example are hydrogen, C1-C12alkyl which optionally is substituted or phenyl which optionally is substituted, exhibit excellent photoinitiating properties.
    Type: Grant
    Filed: October 23, 2009
    Date of Patent: August 13, 2013
    Assignee: BASF SE
    Inventors: Katia Studer, Sébastien Villeneuve, Akira Matsumoto, Hisatoshi Kura, Jan Sültemeyer
  • Patent number: 8507583
    Abstract: An actinic energy radiation curable ink-jet ink comprising an actinic energy radiation polymerizable compound, wherein the actinic energy radiation polymerizable compound comprises a vinyl ether compound, a total content of the vinyl ether compound is 30% or more by mass, the vinyl ether compound comprises a bis-vinyl ether compound and a multifunctional vinyl compound having three or more vinyl ether groups, 10 to 70% by mass of the ink is the bis-vinyl ether compound, and 5 to 70% by mass of the ink is the multifunctional vinyl compound having three or more vinyl ether groups.
    Type: Grant
    Filed: March 9, 2010
    Date of Patent: August 13, 2013
    Assignee: Konica Minolta IJ Technologies, Inc.
    Inventors: Atsushi Nakajima, Masaki Nakamura
  • Patent number: 8501830
    Abstract: The invention describes a radiation-curable ink jet ink, which comprises at least 50% by weight of cyclic trimethylolpropane formal acrylate (CTFA), and further comprises a free-radical photoinitiator, and which is substantially free of volatile compounds.
    Type: Grant
    Filed: September 15, 2008
    Date of Patent: August 6, 2013
    Assignee: Sun Chemical Corporation
    Inventors: Hartley David Selman, Graeme Edward Charles Beats, Nigel Anthony Caiger, Andrew David Speirs, Stephen Paul Wilson
  • Publication number: 20130189850
    Abstract: An underlayer coating is used as an underlayer of photoresists in lithography process of the manufacture of semiconductor devices and has a high dry etching rate in comparison to the photoresists, does not intermix with the photoresists, and is capable of flattening the surface of a semiconductor substrate having holes of a high aspect ratio; and an underlayer coating forming composition can form the underlayer coating. The underlayer coating forming composition for forming by light irradiation an underlayer coating used as an underlayer of a photoresist in a lithography process of the manufacture of semiconductor devices, includes a polymerizable substance and a photopolymerization initiator.
    Type: Application
    Filed: March 12, 2013
    Publication date: July 25, 2013
    Applicant: NISSAN CHEMICAL INDUSTRIES, LTD.
    Inventor: NISSAN CHEMICAL INDUSTRIES, LTD.
  • Patent number: 8492452
    Abstract: A polymerizable photoinitiator is represented by Formula (I): wherein R1, R2 and R3 are independently selected from the group consisting of a hydrogen, an optionally substituted alkyl group and an optionally substituted aryl group or R1 and R3 represent the necessary atoms to form a five to eight membered ring; p, w, y and z are all integers with y representing a value 1 to 6; p representing the sum of w and z; p representing a value of 1 to 6; w=1 to (p?z) and z=0 to (p?w); L represents an optionally substituted (p+y)-valent linking group comprising 1 to 14 carbon atoms; A represents a radically polymerizable group selected from the group consisting of an acrylate group, a methacrylate group, a styrene group, an acryl amide group, a methacryl amide group, a maleate group, a fumarate group, an itaconate group, a vinyl ether group, an allyl ether group, an allyl ester group and a vinyl ester group; and X represents a photoinitiating moiety including at least one group capable of initiating a free radical p
    Type: Grant
    Filed: December 1, 2009
    Date of Patent: July 23, 2013
    Assignee: Agfa Graphics NV
    Inventors: Johan Loccufier, Luc Van Maele, Jaymes Van Luppen, Roland Claes
  • Patent number: 8492454
    Abstract: The present disclosure relates to a nail coating system comprising a basecoat, a color layer, and a topcoat. The system of the present disclosure may be applied to natural and/or pre-existing artificial nail coatings. The present disclosure relates generally to compositions for natural and artificial nail coatings, and particularly, but not by way of limitation, to polymerizable compositions and color layers polymerized therefrom. The disclosure further relates to methods of making a polymerized color layer.
    Type: Grant
    Filed: October 5, 2009
    Date of Patent: July 23, 2013
    Assignee: Creative Nail Design, Inc.
    Inventors: Thong H. Vu, Diane Marie Larsen, Chad Conger, Douglas D. Schoon
  • Patent number: 8492071
    Abstract: A curable composition containing (A) a polymerizable compound having an alkyleneoxy group having two or more carbon atoms, (B) a polymerizable compound lacking an alkyleneoxy group having two or more carbon atoms, (C) an i-line absorber, (D) a photopolymerization initiator, (E) an alkali-soluble resin, and (F) a pigment, wherein a mass ratio [(A)/((A)+(B))] is from 0.5 to 0.9, and an i-line transmittance obtainable when the curable composition is formed into a coating film having a thickness of 0.7 ?m, is 10% or less. The curable composition of the invention has enhanced adhesiveness upon forming a micro pattern, and can reduce development residues in unexposed non-cured areas. The curable composition of the invention is suitable for the use in color filters.
    Type: Grant
    Filed: March 27, 2009
    Date of Patent: July 23, 2013
    Assignee: FUJIFILM Corporation
    Inventor: Hiroshi Taguchi
  • Patent number: 8481241
    Abstract: A radiation curing composition suitable for building a three-dimensional object by a solid freeform method is disclosed. The composition includes one or more mono-functional monomers where a respective polymer has a Glass Transition Temperature higher than about 60° C., one or more di-functional oligomers where a respective polymer has a Glass Transition Temperature lower than about 40° C. and a phase separation inducing component. The phase separation may be induced during curing, resulting in a non-clear cured material having an improved impact strength and higher elongation, when compared to similar compositions without a phase separation including component.
    Type: Grant
    Filed: January 30, 2012
    Date of Patent: July 9, 2013
    Assignee: Stratasys Ltd.
    Inventors: Eduardo Napadensky, David Brusilovsky
  • Patent number: 8476334
    Abstract: A radiation-curable acrylate-modified aminoamide resin which is the Michael addition product of an aminoamide thermoplastic polymer derived from a polymerised unsaturated fatty acid with a polyol ester having at least three (meth)acrylate ester groups, the aminoamide thermoplastic polymer having an amine number of from 40 to 60 mgKOH/g, the ratio of the initial (meth) acrylate groups of the polyol ester to the initial amino functional groups of the aminoamide polymer being at least 4:1, is liquid at 25° C., and is useful as the resin component of various types of energy-curable coating composition, including inks, varnishes and lacquers, especially lithographic inks.
    Type: Grant
    Filed: December 2, 2005
    Date of Patent: July 2, 2013
    Assignee: Sun Chemical Corporation
    Inventors: Derek Ronald Illsley, Martin John Thompson, Sean Phillip Francis Mayers, Douglas Frederick Pavey
  • Patent number: 8476335
    Abstract: The present invention relates to a method of manufacturing a polymer-based monolithic stationary phase in an ionic liquid reaction medium via microwave-assisted vinylization and polymerization. The invention is time-effective and environmental friendly for not using volatile organic compounds.
    Type: Grant
    Filed: September 19, 2011
    Date of Patent: July 2, 2013
    Assignee: Chung Yuan Christian University
    Inventors: Hsi-Ya Huang, Yung-Han Shih, Chao-Hsiang Hsu, Wan-Ling Liu, Singco Brenda
  • Patent number: 8466208
    Abstract: A curable sheet composition able to follow up a mold shape under the application of heat and pressure, able to polymerize and cure upon being irradiated with light, permitting an optical element molding pattern to be fixed, and comprising 50% to 94% of a polycarbonate diol-modified urethane acrylate oligomer, 5% to 40% of a (meth)acrylate containing at least one carboxyl group in each molecule thereof, and 0.5% to 5% of a photopolymerization initiator.
    Type: Grant
    Filed: October 6, 2008
    Date of Patent: June 18, 2013
    Assignee: Three Bond Co., Ltd.
    Inventor: Takashi Nemoto
  • Patent number: 8450420
    Abstract: A polylactic acid-containing resin composition that include (a) a polylactic acid and (b) a (meth)acrylic copolymer having a molecular weight in excess of 30,000 and that is the reaction product of a monomer mixture including a methyl (meth)acrylate (i) and a (meth)acrylic acid ester (ii) that is different than the methyl (meth)acrylate (i). The (meth)acrylic acid ester (ii) is represented by any one of formula (I): CH2?C(R1)—COO—R2 formula (II): CH2?C(R1)—COO—(CH2CH2O)m—R3, or formula (III): CH2?C(R1)—COO—(CH2CH2O)n-Ph. A method for preparing the (meth)acrylic copolymer is also provided as well as articles formed from polylactic acid-containing resin compositions.
    Type: Grant
    Filed: March 29, 2007
    Date of Patent: May 28, 2013
    Assignee: 3M Innovative Properties Company
    Inventor: Aizoh Sakurai
  • Publication number: 20130118671
    Abstract: Adhesive composition according to the present invention includes an adhesive base agent consisting of a monomer and a polymerization initiator. Adhesion of the adhesive composition changes to take local maximum value, minimum value and a value greater than the local maximum value along with increase of irradiation amount of the electromagnetic wave or particle beam irradiated to the adhesive composition under a predetermined temperature environment. In a method for manufacturing a laminate according to the present invention allows for easy peeling of adherends and a layer of the adhesive composition when adhesion of the adhesive composition takes the minimum value.
    Type: Application
    Filed: April 28, 2011
    Publication date: May 16, 2013
    Applicant: NITTO DENKO CORPORATION
    Inventors: Kentarou Takeda, Miki Okamoto, Takuya Mori, Tatsuki Nagatsuka
  • Publication number: 20130114026
    Abstract: An adhesive composition which allows for preventing misalignment when mutually laminating adherends, mutually strongly bonding the adherends when correction of lamination is not required, as well as peeling the adherends without causing any damage thereto when correction of lamination is required. The adhesive composition includes an adhesive base agent consisting of a monomer and a polymerization initiator. Adhesive strength of the adhesive composition changes to take a local maximum value, a local minimum value and a value greater than the local maximum value along with increase of irradiation amount of the electromagnetic wave or particle beam irradiated to the adhesive composition under a predetermined temperature environment.
    Type: Application
    Filed: April 30, 2010
    Publication date: May 9, 2013
    Applicant: NITTO DENKO CORPORATION
    Inventors: Miki Okamoto, Takuya Mori, Kentarou Takeda, Tatsuki Nagatsuka
  • Patent number: 8436066
    Abstract: Compositions that can be polymerized and/or crosslinked into coatings by cationic and/or radical irradiation contain at least one photoinitiator and at least one compound having at least one isocyanate function.
    Type: Grant
    Filed: July 23, 2007
    Date of Patent: May 7, 2013
    Assignee: Vencorex France
    Inventors: Jean-Marc Frances, Philippe Barbeau, Jean-Marie Bernard, Damien Bourgeois
  • Patent number: 8426021
    Abstract: The invention relates to a Radiation Curable Secondary Coating composition for use on an Optical Fiber. The Radiation Curable Secondary Coating composition is a urethane-free Alpha Oligomer prepared by reaction of the following: (a) an acrylate compound selected from an alcohol-containing acrylate or alcohol-containing methacrylate compound, (b) an anhydride compound, (c) an epoxy-containing compound, (d) optionally an extender compound, and (e) optionally a catalyst. The invention also relates to a coated wire and to a coated optical fiber.
    Type: Grant
    Filed: September 15, 2011
    Date of Patent: April 23, 2013
    Assignee: DSM IP Assets B.V.
    Inventors: Wendell Wayne Cattron, Steven R. Schmid, Edward J. Murphy, John M. Zimmerman, Anthony Joseph Tortorello
  • Publication number: 20130096225
    Abstract: An inkjet printing method includes the steps of a) providing a white inkjet ink and at least one colour inkjet ink to an inkjet printer; and b) jetting the white inkjet ink at a higher temperature than the colour inkjet ink onto an ink-receiver. The difference in jetting temperature between the white inkjet ink and the colour inkjet ink is at least 5° C. Inkjet ink sets and inkjet printers are also disclosed.
    Type: Application
    Filed: December 7, 2012
    Publication date: April 18, 2013
    Applicant: AGFA GRAPHICS NV
    Inventor: AGFA GRAPHICS NV
  • Patent number: 8410188
    Abstract: A sealant for a one drop fill process is characterized by curing through two steps consisting of photocure using visible light from which 400 nm or shorter wavelengths are cut off and thermal cure and, when in contact with a liquid crystal composition, is less contaminating to the liquid crystal composition with a photo radical initiator, and exhibits high adhesive strength to a substrate. The sealant contains (1) a titanocene photo radical initiator, (2) a photocuring resin, (3) a latent epoxy curing agent and, if necessary, (4) a monomer having at least two glycidyl ether groups per molecule as a thermosetting resin.
    Type: Grant
    Filed: June 24, 2010
    Date of Patent: April 2, 2013
    Assignee: Adeka Corporation
    Inventors: Hirokatsu Shinano, Hiroya Fukunaga, Kazuyuki Itano
  • Publication number: 20130072593
    Abstract: The present invention relates to a method of manufacturing a polymer-based monolithic stationary phase in an ionic liquid reaction medium via microwave-assisted vinylization and polymerization. The invention is time-effective and environmental friendly for not using volatile organic compounds.
    Type: Application
    Filed: September 19, 2011
    Publication date: March 21, 2013
    Inventors: Hsi-Ya Huang, Yung-Han Shih, Chao-Hsiang Hsu, Wan-Ling Liu, Singco Brenda
  • Patent number: 8399534
    Abstract: Energy curable inks formulations are disclosed having improved resistance properties.
    Type: Grant
    Filed: January 30, 2009
    Date of Patent: March 19, 2013
    Assignee: Sun Chemical Corporation
    Inventors: Ramesh Arora, Percy Agboat
  • Patent number: 8399537
    Abstract: The present disclosure relates generally to compositions for natural and artificial nail coatings, and particularly, but not by way of limitation, to polymerizable compositions and adhesion-promoting basecoats polymerized therefrom. The disclosure further relates to methods of making a polymerized basecoat that are more easily removed than artificial nail enhancements and more durable and long lasting than nail polish coatings.
    Type: Grant
    Filed: April 4, 2011
    Date of Patent: March 19, 2013
    Assignee: Creative Nail Design, Inc.
    Inventors: Chad Conger, Thong Vu
  • Patent number: 8399533
    Abstract: A photocurable composition includes at least one N-oxyazinium salt photoinitiator, a photosensitizer for the N-oxyazinium salt photoinitiator, an N-oxyazinium salt efficiency amplifier, and one or more photocurable acrylates. This composition can be cured using irradiation under high efficiency. Curing can be carried out in oxygen-containing environment.
    Type: Grant
    Filed: November 15, 2010
    Date of Patent: March 19, 2013
    Assignee: Eastman Kodak Company
    Inventor: Deepak Shukla
  • Patent number: 8389595
    Abstract: The invention relates to the production of superabsorbent polymers comprising polymerizing a monomer solution on a continuous belt reactor, wherein the consistency of the formed polymer gel at the end of the continuous belt reactor is controlled by adjusting the intensity of energy-rich radiation.
    Type: Grant
    Filed: February 21, 2008
    Date of Patent: March 5, 2013
    Assignee: BASF SE
    Inventors: Matthias Weismantel, Rüdiger Funk, Sylvia Bertha, Leigh R. Blair, Kevin D. Heitzhaus, Bruce Storey