Contained In Polymeric Rate-affecting Material, E.g., Synthetic Resin, Etc. Patents (Class 522/35)
  • Patent number: 6008265
    Abstract: An ionic compound comprising at least one group A.sup.+ X.sup.-, comprising:a cationic group A.sup.+ selected from the group consisting of biaryliodonium, arylsulfonium, arylacylsulfonium, diazonium and organometallic cations comprising a transition metal complexed with at least one unsaturated cyclic compound comprising 4-12 carbon atoms, said cationic group being part of a polymer chain; whereinX.sup.- is an imide anion, [FSO.sub.2 NSO.sub.2 R'.sub.F ].sup.- or [R.sub.F CH.sub.2 OSO.sub.2 NSO.sub.2 R'.sub.F ].sup.- or [(R.sub.F).sub.2 CHOSO.sub.2 NSO.sub.2 R'.sub.F ].sup.-, or a methylide anion [FSO.sub.2 C(Q)SO.sub.2 R'.sub.F ].sup.-, or a [R.sub.F CH.sub.2 OSO.sub.2 C(Q)SO.sub.2 R'.sub.F ].sup.- or [(R.sub.F).sub.2 CHOSO.sub.2 C(Q)SO.sub.2 R'.sub.F ].sup.31 .
    Type: Grant
    Filed: October 3, 1997
    Date of Patent: December 28, 1999
    Assignees: Hydro-Quebec, Centre National de la Recherche Scientifique
    Inventors: Alain Vallee, Michel Armand, Xavier Ollivrin, Christophe Michot
  • Patent number: 5998496
    Abstract: A compound of the general formula:A-L.sup.+ D.sup.-where A is a moiety which absorbs radiation and enters an excited state in which it accepts an electron; D.sup.- is a moiety which donates an electron to the excited state A and releases a free radical; and L.sup.+ is a cationic linking group which tethers electron acceptor moiety A to electron donor moiety D.sup.-. Cationic linking moiety L.sup.+ has the formula:-L'-G-where L' is a moiety which forms a stable radical with acceptor moiety A upon transfer of an electron from donor moiety D.sup.- to electron acceptor moiety A, and G is a moiety which forms a leaving group upon transfer of the electron from donor moiety D.sup.- to acceptor moiety A.
    Type: Grant
    Filed: August 19, 1996
    Date of Patent: December 7, 1999
    Assignee: Spectra Group Limited, Inc.
    Inventors: Salah A. Hassoon, Ananda M. Sarker, Douglas C. Neckers
  • Patent number: 5994033
    Abstract: A screen printing stencil made from a composition comprising polyhydroxy compounds having a plurality of 1,2- or 1,3-diol groups along a polymer backbone, the diol groups grafted thereto a compound of formula (I) (where A is an arylene or an alkylene group; X is an oxygen atom, a sulfur atom, a carbon-carbon bond, or a group of formula (a), (b) or (c); R is a hydrogen atom or a methyl group; R.sup.1 is a (C.sub.1 -C.sub.4) alkyl group; m is an integer of from 1 to 8; n is an integer of from 1 to 3; and p is 1 or 2); or an acetal of the polyhydroxy, compound with ethylene glycol.
    Type: Grant
    Filed: June 2, 1999
    Date of Patent: November 30, 1999
    Assignee: Sericol Limited
    Inventors: Robert S. Davidson, Stuart J. Palmer, Julie E. Pratt, Stephen P. Wilson
  • Patent number: 5994425
    Abstract: Disclosed is an improved composition comprising a photopatternable polymer containing at least some monomer repeat units with photosensitivity-imparting substituents, said photopatternable polymer being of the general formula ##STR1## wherein x is an integer of 0 or 1, A is one of several specified groups, such as ##STR2## B is one of several specified groups, such as ##STR3## or mixtures thereof, and n is an integer representing the number of repeating monomer units. Also disclosed is a process for preparing a thermal ink jet printhead with the aforementioned polymer and a thermal ink jet printhead containing therein a layer of a crosslinked or chain extended polymer of the above formula.
    Type: Grant
    Filed: August 29, 1996
    Date of Patent: November 30, 1999
    Assignee: Xerox Corporation
    Inventors: Ram S. Narang, Timothy J. Fuller, Thomas W. Smith, David J. Luca, Ralph A. Mosher
  • Patent number: 5977201
    Abstract: Polymer systems having reversibly temperature-dependent radiation transmission which are crosslinked with radiation induction, a process for their production, and their use for reversibly temperature-dependent control of the radiation transmission of glazing systems and solar-energy devices.
    Type: Grant
    Filed: January 6, 1998
    Date of Patent: November 2, 1999
    Assignee: BASF Aktiengesellschaft
    Inventors: Ekkehard Jahns, Hubertus Kroner, Wolfgang Schrof, Utz Klodwig
  • Patent number: 5958995
    Abstract: Disclosed is a composition for preparing a thermal ink jet printhead which comprises a mixture of (A) a polymer, some monomer repeat units of which have at least one photosensitivity-imparting group thereon, said polymer having a first degree of photosensitivity-imparting group substitution measured in milliequivalents photosensitivity-imparting group per gram either (1) a polymer having a second degree of photosensitivity-imparting group substitution measured in milliequivalents of photosensitivity-imparting group per gram lower than the first degree of photosensitivity-imparting group substitution, wherein said second degree of photosensitivity-imparting group substitution may be zero, wherein the mixture of the first component and the second component has a third degree of photosensitivity-imparting group substitution measured in milliequivalents of photosensitivity-imparting group per gram which is lower than the first degree of photosensitivity-imparting group substitution and higher than the second degr
    Type: Grant
    Filed: August 29, 1996
    Date of Patent: September 28, 1999
    Assignee: Xerox Corporation
    Inventors: Ram S. Narang, Timothy J. Fuller
  • Patent number: 5942555
    Abstract: A photoactivatable reagent useful as a chain transfer reagent for providing a semitelechelic polymer having one or more terminal photoactivatable groups. The reagent provides one or more photoactivatable groups and one or more sulfhydryl (or other chain transfer) groups, the photoactivatable and chain transfer groups optionally being joined together by a spacer group. The reagent can be used to prepare a polymer by serving to initiate the polymerization of ethylenically unsaturated monomers. The reagent itself becomes an integral part of the resultant polymer, thereby providing the polymer with a terminal photoactivatable nature. The method provides a number of benefits, including the ability to provide homogeneous photoactivatable polymer compositions, e.g., in terms of the uniform location of the photogroup(s) on the terminal portion of each polymer molecule and the ability to build a desired nonpolar quality, and in turn improved surfactancy, into otherwise polar polymers.
    Type: Grant
    Filed: March 21, 1996
    Date of Patent: August 24, 1999
    Assignee: SurModics, Inc.
    Inventors: Melvin J. Swanson, Richard A. Amos, Dale G. Swan, Gary W. Opperman
  • Patent number: 5932625
    Abstract: A photo-curable resin composition suitable as a material for photo-fabricating and capable of producing cured products with excellent mechanical strength and high heat resistance. Further disclosed is a process for molding a resin-based mold which provides superior molding dimensional precision and superb repetition durability. The resin composition contains a monomer component containing (A) 30-70 wt % of a polyfunctional unsaturated monomer having a cyclic structure and (B) 70-30 wt % of a monofunctional unsaturated monomer having a cyclic structure of which the homopolymer has a glass transition temperature (Tg) of 70.degree. C. or higher; (C) a photo-initiator; and (D) an inorganic filler having an average particle diameter or an average fiber length of 1-50 .mu.
    Type: Grant
    Filed: May 30, 1997
    Date of Patent: August 3, 1999
    Assignees: DSM N.V., JSR Corporation, Japan Fine Coatings Co., Ltd.
    Inventors: Tsuyoshi Watanabe, Ayao Matsumura, Yuichi Haruta, Takashi Ukachi
  • Patent number: 5902836
    Abstract: Solute polymers in solvent monomers form a coatable syrup that can be cured to a viscoelastomeric material when radiation-sensitive .alpha.-cleaving groups in either the polymer or one of the monomers are exposed to ultraviolet radiation. The solute polymers can be formed from the solvent monomers in situ or be added thereto to form the syrup.
    Type: Grant
    Filed: August 23, 1995
    Date of Patent: May 11, 1999
    Assignee: Minnesota Mining and Manufacturing Company
    Inventors: Greggory S. Bennett, Gaddam N. Babu, Kejian Chen, Louis E. Winslow, George F. Vesley, Patrick G. Zimmerman
  • Patent number: 5889077
    Abstract: Disclosed is a process which comprises reacting a polymer of the general formula ##STR1## wherein x is an integer of 0 or 1, A is one of several specified groups, such as ##STR2## B is one of several specified groups, such as ##STR3## or mixtures thereof, and n is an integer representing the number of repeating monomer units, with (i) a formaldehyde source, and (ii) an unsaturated acid in the presence of an acid catalyst, thereby forming a curable polymer with unsaturated ester groups. Also disclosed is a process for preparing an ink jet printhead with the above polymer.
    Type: Grant
    Filed: August 29, 1996
    Date of Patent: March 30, 1999
    Assignee: Xerox Corporation
    Inventors: Timothy J. Fuller, Ram S. Narang, Thomas W. Smith, David J. Luca, Raymond K. Crandall
  • Patent number: 5859084
    Abstract: A process for the preparation of a radiation-curable acrylate composition, wherein to compounds A containing at least 2 acrylic groups there are added benzophenone derivatives which are not copolymerizable by free-radical copolymerization and which contain at least one primary or secondary amino group or a hydroxyl group or a mercapto group.
    Type: Grant
    Filed: July 15, 1996
    Date of Patent: January 12, 1999
    Assignee: BASF Aktiengesellschaft
    Inventors: Jochen Schroder, Wolfgang Reich, Erich Beck, Martin Fischer, Wolfram Weiss
  • Patent number: 5849809
    Abstract: Disclosed is a composition which comprises (a) a polymer containing at least some monomer repeat units with photosensitivity-imparting substituents which enable crosslinking or chain extension of the polymer upon exposure to actinic radiation, said polymer being of the formula ##STR1## wherein x is an integer of 0 or 1, A is one of several specified groups, such as ##STR2## B is one of several specified groups, such as ##STR3## or mixtures thereof, and n is an integer representing the number of repeating monomer units, wherein said photosensitivity-imparting substituents are hydroxyalkyl groups; (b) at least one member selected from the group consisting of photoinitiators and sensitizers; and (c) an optional solvent. Also disclosed are processes for preparing the above polymers and methods of preparing thermal ink jet printheads containing the above polymers.
    Type: Grant
    Filed: August 29, 1996
    Date of Patent: December 15, 1998
    Assignee: Xerox Corporation
    Inventors: Ram S. Narang, Timothy J. Fuller
  • Patent number: 5837746
    Abstract: Compounds of the formulaRG--A--INwherein IN is a photoinitiator basic structure A is a spacer group and RG is a functional reactive group can be employed as coreactive photoinitiators for photo-polymerization of systems containing ethylenically unsaturated compounds.
    Type: Grant
    Filed: June 23, 1997
    Date of Patent: November 17, 1998
    Assignee: Ciba Specialty Chemicals Corporation
    Inventors: Manfred Kohler, Jorg Ohngemach, Eike Poetsch, Rudolf Eidenschink, Gerhard Greber, Dieter Dorsch, Jurgen Gehlhaus, Konrad Dorfner, Hans Ludwig Hirsch
  • Patent number: 5824717
    Abstract: The invention relates to peroxide- or radiation-curable copolymer containing compositions and to the resulting radiation- or peroxide- cured compositions. The compositions may optionally contain a reinforcing filler. Copolymers employed in the compositions are acrylate modified copolymers of an isoolefin of 4 to 7 carbon atoms and para-alkylstyrene comonomers. Since the percentage of extractables from the cured composition is negligible, the cured compositions are suitable for use in the manufacture of a variety of high purity rubber goods used in the pharmaceutical and health care industries. In addition, the compositions may be employed as condenser packings and as food contact materials or wire cable insulation materials. Further, the cured composition may be employed in the manufacture of high purity hoses.
    Type: Grant
    Filed: June 7, 1995
    Date of Patent: October 20, 1998
    Assignee: Exxon Chemical Patents Inc.
    Inventors: Natalie Ann Merrill, Hsien-Chang Wang, Anthony Jay Dias
  • Patent number: 5773485
    Abstract: Solute polymers in solvent monomers form a coatable syrup that can be cured to a viscoelastomeric material when radiation-sensitive hydrogen abstracting groups in either the polymer or one of the monomers are exposed to ultraviolet radiation. The solute polymers can be formed from the solvent monomers.
    Type: Grant
    Filed: August 23, 1995
    Date of Patent: June 30, 1998
    Assignee: Minnesota Mining and Manufacturing Company
    Inventors: Greggory S. Bennett, Louis E. Winslow, Gaddam N. Babu
  • Patent number: 5744512
    Abstract: Compounds of the formulaRG--A--INwhereinIN is a photoinitiator basic structureA is a spacer group andRG is a functional reactive group can be employed as coreactive photoinitiators for photopolymerization of systems containing ethylenically unsaturated compounds.
    Type: Grant
    Filed: March 20, 1996
    Date of Patent: April 28, 1998
    Assignee: Ciba Specialty Chemicals Corporation
    Inventors: Manfred Kohler, Jorg Ohngemach, Eike Poetsch, Rudolf Eidenschink, Gerhard Greber, Dieter Dorsch, Jurgen Gehlhaus, Konrad Dorfner, Hans Ludwig Hirsch
  • Patent number: 5741829
    Abstract: Radiation-curable (meth)acrylates obtainable by reacting compounds of the formula ##STR1## in which R is C.sub.1 -C.sub.4 -alkyl, aryl or R.sup.1 and R.sup.1 is ##STR2## in which R.sup.2 to R.sup.6 independently of one another are H, C.sub.1 -C.sub.4 -alkyl, C.sub.1 -C.sub.4 -alkoxy, OH, phenyl, SH, SCH.sub.3, SC.sub.2 H.sub.5, F, Cl, Br, CN, COOH, COO--(C.sub.1 -C.sub.17 -alkyl), COO--(C.sub.5 -C.sub.10 -aryl), CF.sub.3, N(alkyl).sub.2, N(alkyl)(aryl), N(aryl).sub.2, N.sup..sym. (alkyl).sub.3 A.sup..crclbar., N.sup..sym. H(alkyl).sub.2 A.sup..crclbar., A.sup..crclbar. is the anion of an acid, and alkyl or aryl, unless indicated otherwise, is C.sub.1 -C.sub.10 -alkyl or C.sub.5 -C.sub.10 -aryl, respectively, and at least one but not more than 3 of R.sup.2 to R.sup.6 are ##STR3## with hydroxy(meth)acrylates containing at least 1 free hydroxyl group and at least 2 (meth)acrylic groups in the molecule.
    Type: Grant
    Filed: July 3, 1996
    Date of Patent: April 21, 1998
    Assignee: BASF Aktiengesellschaft
    Inventors: Wolfgang Reich, Erich Beck, Ulrich Jager, Reinhold Schwalm
  • Patent number: 5723511
    Abstract: A process for the preparation of branched thermoplastic resins comprising: heating a mixture of a free radical initiator, at least one first free radical reactive monomer, at least one free radical reactive branching agent compound, and at least one stable free radical agent, to produce a linear or unbranched polymer product with a free radical initator fragment at one end and a covalently bonded stable free radical agent at the other end of the polymerized chain of monomers; and irradiating the unbranched polymer product in the presence of a reactive compound selected from the group consisting of a free radical reactive monomer, a branching agent compound, and mixtures thereof to form a branched polymeric product.
    Type: Grant
    Filed: June 17, 1996
    Date of Patent: March 3, 1998
    Assignee: Xerox Corporation
    Inventors: Peter M. Kazmaier, Barkev Keoshkerian, Karen A. Moffat, Michael K. Georges, Gordon K. Hamer, Richard P. N. Veregin
  • Patent number: 5710193
    Abstract: Colorants, polymeric binder resins, photoinitiators, photosensitizers, color-change agents, anti-halation agents, stabilizers, and other active hydrogen-containing components of radiation sensitive compositions for lithographic printing plate production and the like are reacted with a polyethylenically unsaturated monoisocyanate compound of the formula ##STR1## wherein Y is the residue of a monohydroxyl compound of formula YOH and Y contains at least two ethylenically unsaturated double bonds. In this way the components are bonded to the image on exposure.
    Type: Grant
    Filed: May 21, 1996
    Date of Patent: January 20, 1998
    Assignee: DuPont (UK) Limited
    Inventors: John Robert Wade, Michael John Pratt, Jianrong Ren
  • Patent number: 5700850
    Abstract: A light-stable colored composition which includes a colorant and a radiation transorber. The colorant, in the presence of the radiation transorber, is adapted, upon exposure of the transorber to specific, narrow bandwidth radiation, to be mutable. The radiation transorber also imparts light-stability to the colorant so that the colorant does not fade when exposed to sunlight or artificial light.
    Type: Grant
    Filed: June 5, 1995
    Date of Patent: December 23, 1997
    Assignee: Kimberly-Clark Worldwide
    Inventors: Ronald Sinclair Nohr, John Gavin MacDonald
  • Patent number: 5663214
    Abstract: A photocuring denture base lining material is disclosed, comprising:a powder component comprising a methacrylic acid ester polymer powder and/or a methacrylic acid ester polymer powder having from 0.01 to 5% by weight of a photocuring catalyst compounded therewith; anda liquid component comprising (a) from 10 to 40% by weight of benzyl methacrylate, (b) from 20 to 40% by weight of at least one of compounds represented by the following structural formula (1): ##STR1## wherein R represents an alkyl group, (c) from 20 to 70% by weight of at least one of methacrylic acid esters having two or three methacryloyl groups in one molecule, and (d) from 0.01 to 5% by weight of a photocuring catalyst. The photocuring denture base lining material of the invention is extremely low in the unpleasant odors and irritation, is superior in the fitness and the operability, and has a high surface hardness after curing.
    Type: Grant
    Filed: April 8, 1996
    Date of Patent: September 2, 1997
    Assignee: GC Corporation
    Inventor: Junichi Okada
  • Patent number: 5621018
    Abstract: Compounds of formula I: ##STR1## are disclosed. The compounds are photoinitiators which can be functionalized by means of ethylenic groups or can be bonded to H-active substances, in order, for example, to modify surfaces by means of photopolymerizable substances. The compounds are especially useful in the manufacture of contact lenses.
    Type: Grant
    Filed: June 6, 1995
    Date of Patent: April 15, 1997
    Assignee: CIBA GEIGY Corporation
    Inventors: Peter Chabrecek, Dieter Lohmann
  • Patent number: 5612389
    Abstract: Compounds of formula I: ##STR1## are disclosed. The compounds are photoinitiators which can be functionalized by means of ethylenic groups or can be bonded to H-active substances, in order, for example, to modify surfaces by means of photopolymerizable substances. The compounds are especially useful in the manufacture of contact lenses.
    Type: Grant
    Filed: June 6, 1995
    Date of Patent: March 18, 1997
    Assignee: Ciba Geigy Corporation
    Inventors: Peter Chabrecek, Dieter Lohmann
  • Patent number: 5612391
    Abstract: Contact lenses formed from compounds of formula I: ##STR1## are disclosed. The compounds are photoinitiators which can be functionalized by means of ethylenic groups or can be bonded to H-active substances, in order, for example, to modify surfaces by means of photopolymerizable substances. The compounds are especially useful in the manufacture of contact lenses.
    Type: Grant
    Filed: June 6, 1995
    Date of Patent: March 18, 1997
    Assignee: Ciba Geigy Corporation
    Inventors: Peter Chabrecek, Dieter Lohmann
  • Patent number: 5585416
    Abstract: A lithographic coating and method of framing a lithographic image are disclosed. The method comprises coating at least a portion of a surface of an article with a radiation-crosslinkable polymer, and exposing the coated surface to a pattern of radiation to crosslink the polymer in a lithographic image. The functionalized polymer is a copolymer of an isoolefin of 4 to 7 carbon atoms and para-alkylstyrene, wherein the para-alkylstyrene is functionalized with a radiation reactive group at the para-alkyl group of the para-alkylstyrene.
    Type: Grant
    Filed: June 7, 1995
    Date of Patent: December 17, 1996
    Assignee: Exxon Chemical Patents Inc.
    Inventors: Jay D. Audett, Kenneth O. McElrath
  • Patent number: 5536759
    Abstract: This invention is a hot melt pressure sensitive adhesive formed by copolymerizing acrylic, or a combination of acrylic and vinyl, monomers, at least one of which is a photoinitiator, with the functional monomer, 1-(1-isocyanato-1-methyl ethyl)-3-(1-methyl ethenyl)benzene (m-TMI), to give a saturated polymer with pendant vinyl groups that are crosslinked by UV radiation.
    Type: Grant
    Filed: October 13, 1994
    Date of Patent: July 16, 1996
    Assignee: National Starch and Chemical Investment Holding Corporation
    Inventors: Roopram Ramharack, Rama Chandran
  • Patent number: 5534558
    Abstract: In a process for cladding an optical fiber, a photoinitiator monomer having both a photoinitiating group and an ethylenically unsaturated group is reacted with a fluorosubstituted monomer having an ethylenically unsaturated group, thereby preparing a copolymer having pendant photoinitiating groups. This copolymer is then mixed with a fluorosubstituted diacrylate, thereby forming a photopolymerizable composition, which is coated on to the optical fiber and exposed to ultraviolet light, thereby curing the photopolymerizable composition to produce a cladding on the optical fiber. Preferred claddings can have refractive indices below 1.35.
    Type: Grant
    Filed: June 2, 1995
    Date of Patent: July 9, 1996
    Assignee: Polaroid Corporation
    Inventor: Richard A. Minns
  • Patent number: 5527925
    Abstract: Compounds of formula I: ##STR1## are disclosed. The compounds are photoinitiators which can be functionalized by means of ethylenic groups or can be bonded to H-active substances, in order, for example, to modify surfaces by means of photopolymerizable substances. The compounds are especially useful in the manufacture of contact lenses.
    Type: Grant
    Filed: June 24, 1994
    Date of Patent: June 18, 1996
    Assignee: Ciba-Geigy Corporation
    Inventors: Peter Chabrecek, Dieter Lohmann
  • Patent number: 5506279
    Abstract: The invention provides novel acrylamide functional disubstituted acetyl aryl ketones and a process for their preparation in high yields uncontaminated by difunctional material. The invention further provides photocrosslinkable compositions comprising one or more ethylenically-unsaturated monomers and as photoinitiator the acrylamide functional disubstituted acetyl aryl ketone of the invention. The compositions are useful for the preparation of films and coatings, particularly pressure-sensitive adhesive coatings.
    Type: Grant
    Filed: May 3, 1994
    Date of Patent: April 9, 1996
    Assignee: Minnesota Mining and Manufacturing Company
    Inventors: Gaddam N. Babu, Greggory S. Bennett, Kejian Chen, Steven M. Heilmann, Howell K. Smith, II, Louis E. Winslow
  • Patent number: 5492987
    Abstract: In a process for cladding an optical fiber, a photoinitiator monomer having both a photoinitiating group and an ethylenically unsaturated group is reacted with a fluorosubstituted monomer having an ethylenically unsaturated group, thereby preparing a copolymer having pendant photoinitiating groups. This copolymer is then mixed with a fluorosubstituted diacrylate, thereby forming a photopolymerizable composition, which is coated on to the optical fiber and exposed to ultraviolet light, thereby curing the photopolymerizable composition to produce a cladding on the optical fiber. Preferred claddings can have refractive indices below 1.35.
    Type: Grant
    Filed: June 2, 1995
    Date of Patent: February 20, 1996
    Assignee: Polaroid Corporation
    Inventor: Richard A. Minns
  • Patent number: 5484821
    Abstract: A novel photocrosslinkable polymeric system has been developed for processing into films having stable second-order nonlinear optical properties. In the present system, polymers bearing photo-crosslinkable chromophores, such as polyvinylcinnamate and are reacted with appropriately designed nonlinear optical molecules with the cinnamate or other photocrosslinkable functionalities for photocrosslinking at one, two or more points. The system can be poled and photocrosslinked in the poled state to yield a material with stable optical nonlinearity and large electro-optic coefficients.
    Type: Grant
    Filed: February 7, 1994
    Date of Patent: January 16, 1996
    Assignee: University of Lowell
    Inventors: Braja K. Mandal, Sukant K. Tripathy, Jan-Chan Huang, Jayant Kumar
  • Patent number: 5484822
    Abstract: In a process for cladding an optical fiber, a photoinitiator monomer having both a photoinitiating group and an ethylenically unsaturated group is reacted with a fluorosubstituted monomer having an ethylenically unsaturated group, thereby preparing a copolymer having pendant photoinitiating groups. This copolymer is then mixed with a fluorosubstituted diacrylate, thereby forming a photopolymerizable composition, which is coated on to the optical fiber and exposed to ultraviolet light, thereby curing the photopolymerizable composition to produce a cladding on the optical fiber. Preferred claddings can have refractive indices below 1.35.
    Type: Grant
    Filed: June 24, 1991
    Date of Patent: January 16, 1996
    Assignee: Polaroid Corporation
    Inventor: Richard A. Minns
  • Patent number: 5459174
    Abstract: A radiation curable functionalized polymer is disclosed. The functionalized polymer is a copolymer of an isoolefin of 4 to 7 carbon atoms and para-alkylstyrene, wherein the para-alkylstyrene is functionalized with an acrylate or a mixture of acrylates and/or a photosensitizer and/or other functional groups at the para-alkyl groups of the para-alkylstyrene.
    Type: Grant
    Filed: June 24, 1994
    Date of Patent: October 17, 1995
    Inventors: Natalie A. Merrill, Hsian-Chang Wang, Anthony J. Dias
  • Patent number: 5407971
    Abstract: Disclosed are radiation-crosslinkable elastomeric compositions containing:(a) an elastomeric polymer containing abstractable hydrogen atoms in an amount sufficient to enable the elastomeric polymer to undergo crosslinking in the presence of a suitable radiation-activatable crosslinking agent; and(b) a radiation-activatable crosslinking agent of the formula: ##STR1## wherein: W represents --O--, --N--, or --S--;X represents CH.sub.3 -- or ##STR2## Y represents a ketone, ester, or amide functionality; Z represents an organic spacer which does not contain hydrogen atoms that are more photoabstractable than hydrogen atoms of the elastomeric polymer;m represents an integer of 0 to 6;a represents 0 or 1; andn represents an integer of 2 or greater.Radiation-crosslinked elastomers are prepared by exposing the radiation-crosslinkable elastomeric compositions to radiation (e.g., UV light) to abstract hydrogen atoms from the elastomeric polymer by the resulting radiation-activated crosslinking agent.
    Type: Grant
    Filed: January 26, 1994
    Date of Patent: April 18, 1995
    Assignee: Minnesota Mining and Manufacturing Company
    Inventors: Albert I. Everaerts, Audrey A. Sherman, Charles M. Leir
  • Patent number: 5389699
    Abstract: UV-crosslinkable materials based on (meth)acrylate copolymers and containing from 0.01 to 10% by weight, based on the copolymer, of copolymerized monomers of the formula I ##STR1## where x is alkyl of 1 to 3 carbon atoms or is phenyl which is unsubstituted or substituted by n Y groups, Y is --H, --CF.sub.3, --O-- alkyl and/or alkyl-COO--, where alkyl in each case is of 1 to 4 carbon atoms, halogen, --CH, --COOH or a non-ortho --OH group, n is from 0 to 4 and Z is a group of the formula ##STR2## where R is H or C.sub.1 -C.sub.4 -alkyl and A is an alkylene, oxaalkylene or polyoxaalkylene radical of 2 to 12 carbon atoms are used as hotmelt adhesives, for coating sheet-like mineral substrates and as surface coatings.
    Type: Grant
    Filed: July 8, 1993
    Date of Patent: February 14, 1995
    Assignee: BASF Aktiengesellschaft
    Inventors: Gerd Rehmer, Andreas Boettcher, Michael Portugall
  • Patent number: 5376503
    Abstract: A lithographic coating and method of framing a lithographic image are disclosed. The method comprises coating at least a portion of a surface of an article with a radiation-crosslinkable polymer, and exposing the coated surface to a pattern of radiation to crosslink the polymer in a lithographic image. The functionalized polymer is a copolymer of an isoolefin of 4 to 7 carbon atoms and para-alkylstyrene, wherein the para-alkylstyrene is functionalized with a radiation reactive group at the para-alkyl group of the para-alkylstyrene.
    Type: Grant
    Filed: November 24, 1992
    Date of Patent: December 27, 1994
    Assignee: Exxon Chemical Patents Inc.
    Inventors: Jay D. Audett, Kenneth O. McElrath
  • Patent number: 5371116
    Abstract: Vulcanizable organopolysiloxane compositions comprise a hydroxy-terminated organopolysiloxane, an acrylic or methacryllc functional alkoxy silane, a divalent tin compound, an alkoxy-.alpha.-silyl ester, a photopolymerization initiator, and a curing catalyst whereby the composition is cured by UV irradiation and/or by the action of moisture in air. The composition has good shelf stability and can yield rubber elastomers having good physical properties.
    Type: Grant
    Filed: July 13, 1993
    Date of Patent: December 6, 1994
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Takafumi Sakamoto, Masatoshi Arai, Kei Miyoshi
  • Patent number: 5294688
    Abstract: The invention relates to UV-crosslinkable copolymers built up fromA) from 99.5 to 75% by weight of olefinically unsaturated monomers,B) from 0.5 to 25% by weight of unsaturated compounds of the formula I ##STR1## and C) from 0.01 to 10% by weight of copolymerizable, olefinically unsaturated acetophenone and/or benzophenone derivatives containing no phenyl group having a free hydroxyl group in the ortho-position to the carbonyl group, whereX is O, S or NR.sup.1 andR is unsubstituted or substituted C.sub.2 - to C.sub.6 -alkylene, andR.sup.1 is C.sub.1 - to C.sub.8 -alkyl or phenyl.The copolymers according to the invention are suitable, after crosslinking, as coating agents, impregnants or adhesives and in particular as contact adhesives.
    Type: Grant
    Filed: November 16, 1992
    Date of Patent: March 15, 1994
    Assignee: BASF Aktiengesellschaft
    Inventors: Gerd Rehmer, Gerhard Auchter, Andreas Boettcher, Lothar Franz, Helmut Jaeger
  • Patent number: 5276069
    Abstract: Synthetic resins are obtainable by chemically bonding one or more compounds of the general formula I ##STR1## where R.sup.1 is --OH, --NH.sub.2, ##STR2## --NHR.sup.3 or ##STR3## R.sup.2 is --H, --CH.sub.3 or --C.sub.2 H.sub.5, R.sup.3 is --C.sub.m H.sub.2m+1, where m is from 1 to 6, R.sup.4 is --H or --CH.sub.3 and n is from 1 to 12, via the oxygen or nitrogen atom of R.sup.1 to one or more polymers A which consist ofa) from 50 to 100% by weight of one or more esters of acrylic or methacrylic acid with monohydric alcohols of 1 to 18 carbon atoms or a mixture of these esters (monomers a) andb) from 0 to 50% by weight of other copolymerizable monomers (monomers b) in polymerized form,in amounts such that the synthetic resin contains from 0.01 to 1 mole of double bonds per kg of polymer A.After exposure to ultraviolet light or to electrons, these synthetic resins are suitable as contact adhesives.
    Type: Grant
    Filed: May 3, 1991
    Date of Patent: January 4, 1994
    Assignee: BASF Aktiengesellschaft
    Inventors: Gerd Rehmer, Gerhard Auchter, Helmut Jaeger
  • Patent number: 5264533
    Abstract: UV-crosslinkable materials based on (meth)acrylate copolymers and containing special modified unsaturated benzophenone derivatives as copolymerized units are used as hotmelt adhesives, for coating sheet-like mineral substrates and as surface coatings.
    Type: Grant
    Filed: August 1, 1991
    Date of Patent: November 23, 1993
    Assignee: BASF Aktiengesellschaft
    Inventors: Gerd Rehmer, Andreas Boettcher, Michael Portugall
  • Patent number: 5218019
    Abstract: A sublimation dispersion dye receptive resin composition which comprises a polyester resin, a cross- linking agent obtained by curing by activating energy, and a releasing agent which can effect the cross-linked construction of at least one selected from the group of silicon functional groups and functional groups containing fluorine. This resin composition is especially applicable to image-receiving paper or image-receiving film for sublimation-type thermal dye transfer methods; it has superior anti-blocking and heat-resistant characteristics. Furthermore, by means of the addition of benzotriazol ultraviolet stabilizer or hindered amine photostabilizer, the fading characteristics are improved.
    Type: Grant
    Filed: June 8, 1992
    Date of Patent: June 8, 1993
    Assignee: Mitsubishi Rayon Co., Ltd.
    Inventors: Kenji Kushi, Tadayuki Fujiwara
  • Patent number: 5202221
    Abstract: The present invention relates to a light-sensitive composition comprising (a) a photo-crosslinkable polymer having a maleimido group at a side chain and (b) a sensitizer such as the following compounds: ##STR1## The present invention provides a light-sensitive composition having very high sensitivity; providing excellent images during only a short exposure time; and being sensitive to light of long wave length.
    Type: Grant
    Filed: November 9, 1989
    Date of Patent: April 13, 1993
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Masanori Imai, Noriaki Watanabe, Kouichi Kawamura
  • Patent number: 5180756
    Abstract: Agents which are curable by ultraviolet radiation are based on a binder formulation of (1) from 99.0 to 20% by weight of a copolymer, (2) from 1.0 to 80% by weight of monoolefinically unsaturated compounds and (3) from 0.0 to 20% by weight of polyolefinically unsaturated compounds. The agents contain copolymers (1) which are obtainable by subjecting a mixture of (A) from 80 to 99.9% by weight of olefinically unsaturated monomers, (B) from 0 to 10% by weight of a copolymerizable olefinically unsaturated photoinitiator and (C) from 0 to 10% by weight of a polymerization-regulating photoinitiator to free radical polymerization, the sum of (B) and (C) being not less than 0.1% by weight and the stated percentages by weight being based on the sum of the weights of (A)+(B)+(C).
    Type: Grant
    Filed: April 6, 1990
    Date of Patent: January 19, 1993
    Assignee: BASF Aktiengesellschaft
    Inventors: Gerd Rehmer, Andreas Boettcher
  • Patent number: 5176982
    Abstract: Disclosed is a photosensitive resin composition for forming a polyimide film pattern. The composition contains a polyamic acid and at least one silyl ketone compound represented by general formula (II) given below, ##STR1## where each of R.sup.3 to R.sup.16 is a are substituted or unsubstituted alkyl group having 1 to 12 carbon atoms or a substituted or unsubstituted aromatic group having 6 to 14 carbon atoms, each of R.sup.5 to R.sup.16 may be a substituted or unsubstituted silyl group, and each of l, m, n, s, t and u is 0 or 1, at least one of l, m, n, s, t and u being 1. The composition further contains a sensitizer, as required. A semiconductor substrate is coated with the composition, followed by exposing the coating through a predetermined mask and subsequently developing and heat-treating the coating so as to form a polyimide film pattern.
    Type: Grant
    Filed: July 5, 1991
    Date of Patent: January 5, 1993
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Yukihiro Mikogami, Shuzi Hayase, Yoshihiko Nakano
  • Patent number: 5128386
    Abstract: UV-crosslinkable materials based on (meth)acrylate copolymers contain copolymerized monomers of the general formula I ##STR1## where R is a certain alkyl radical, an aryl radical or a radical R.sup.1 and R.sup.1 is a radical ##STR2## where R.sup.2 to R.sup.6 are each H, alkyl, a non-ortho OH group, OCH.sub.3, OC.sub.2 H.sub.3, SH, SCH.sub.3, Cl, F, CN, COOH, COO(C.sub.1 -C.sub.3 -alkyl), CF.sub.3, N(CH.sub.3).sub.2, N(C.sub.2 H.sub.5).sub.2, N(CH.sub.3)C.sub.6 H.sub.5, .sup.+ N(CH.sub.3).sub.3 X.sup.- or .sup.+N(CH.sub.3).sub.X X.sup.-, where X.sup.- is an acid anion, and one or more of the radicals R.sup.2 to R.sup.
    Type: Grant
    Filed: December 15, 1989
    Date of Patent: July 7, 1992
    Assignee: BASF Aktiengesellschaft
    Inventors: Gerd Rehmer, Andreas Boettchher, Gerhard Auchter
  • Patent number: 5095044
    Abstract: Compounds of the formula I ##STR1## in which n is 1-30 and X, Y, R, Ar.sup.1 and Ar.sup.2 are as defined in claim 1 can be prepared by reaction of a benzil dialkyl ketal with a diol. Depending on the molar ratio of the two reaction components, products having a different polycondensation degree n are obtained. the compounds can be used as photoinitiators.
    Type: Grant
    Filed: April 27, 1990
    Date of Patent: March 10, 1992
    Assignee: Ciba-Geigy Corporation
    Inventors: Rinaldo Husler, Rudolf Kirchmayr, Werner Rutsch, Manfred Rembold
  • Patent number: 5087550
    Abstract: Radiation-reactive mixtures suitable for producing insulating layers and printed circuits are composed of certain precursors for preparing polyimides, polyisoindoloquinazolinediones, polyoxiazinediones, polyquinazolinediones or polyquinazolones and aryl-containing carbonyl compounds which when excited by UV radiation are capable of hydrogen abstraction, these mixtures undergoing solubility differentiation on irradiation with actinic light.
    Type: Grant
    Filed: September 26, 1989
    Date of Patent: February 11, 1992
    Assignee: BASF Aktiengesellschaft
    Inventors: Rainer Blum, Gerd Rehmer, Hans Schupp
  • Patent number: 5073611
    Abstract: Copolymers which are curable by ultraviolet radiation in the air are prepared by a process in which a mixture of (A) from 80 to 99.9% by weight of olefinically unsaturated monomers, (B) from 0 to 10% by weight of a copolymerizable olefinically unsaturated, photoreactive compound which, in the excited state produced by UV radiation, is capable of abstracting hydrogen and (C) from 0 to 10% by weight of a polymerization-regulating photoreactive compound which, in the excited state, is capable of abstracting hydrogen is subjected to free radical polymerization, the sum of (B) and (C) being not less than 0.1% by weight and the stated percentages by weight being based on the sum of the weights of (A)+(B)+(C).
    Type: Grant
    Filed: April 29, 1991
    Date of Patent: December 17, 1991
    Assignee: BASF Aktiengesellschaft
    Inventors: Gerd Rehmer, Andreas Boettcher
  • Patent number: 5071732
    Abstract: Radiation-curable two-layer systems containing immobilized photoinitiators are suitable for the production of coatings of constant thickness and good adhesion, and relief structures of high resolution and edge steepness.
    Type: Grant
    Filed: December 14, 1989
    Date of Patent: December 10, 1991
    Assignee: Merck Patent Gesellschaft Mit Beschrankter Haftung
    Inventors: Manfred Kohler, Eike Poetsch, Jorg Ohngemach, Dieter Dorsch, Rudolf Eidenschink, Gerhard Greber
  • Patent number: 5026740
    Abstract: The invention relates to the use of a new class of sulphurated derivatives of aromatic-aliphatic or aliphatic ketones as a) polymerization or crosslinking photoinitiators for transparent or pigmented mixtures containing ethylenically unsaturated photopolymerizable compounds, in particular for obtaining polyacrylates, b) photochemically releasable latent acid catalysts, useful for crosslinking systems polycondensable by acid catalysis, of the type comprising etherified aminoplasts together with compounds containing hydroxyl, carboxyl, amido, amino and other functionalities.Said sulphurated derivatives enable manufactured articles to be obtained with exceptionally clear color while maintaining photochemical reactivity at high levels.
    Type: Grant
    Filed: July 15, 1988
    Date of Patent: June 25, 1991
    Assignee: Fratelli Lamberti S.p.A.
    Inventors: Giuseppe Li Bassi, Luciano Cadona, Carlo Nicora