Containing Nitrogen Patents (Class 522/39)
  • Patent number: 12147158
    Abstract: A photocurable composition for forming coating film having flattening properties on a substrate, with high fillability into patterns and capability of forming a coating film that is free from thermal shrinkage, which contains at least one compound that contains a photodegradable nitrogen-containing and/or photodegradable sulfur-containing structure, a hydrocarbon structure, and a solvent. The compound may have the photodegradable nitrogen-containing and/or photodegradable sulfur-containing structure and the hydrocarbon structure in one molecule, or may be a combination of compounds which contain the structures in separate molecules.
    Type: Grant
    Filed: March 30, 2023
    Date of Patent: November 19, 2024
    Assignee: NISSAN CHEMICAL CORPORATION
    Inventors: Hikaru Tokunaga, Takafumi Endo, Keisuke Hashimoto, Rikimaru Sakamoto
  • Patent number: 11135137
    Abstract: According to one aspect of the present invention, a dental photopolymerizable composition includes: a (meth)acrylate compound; a filler; a photopolymerization initiator; and a phthalic acid derivative and/or a thiophene derivative, wherein a content of the phthalic acid derivative and/or the thiophene derivative is greater than or equal to 0.05% by mass and less than or equal to 0.25% by mass.
    Type: Grant
    Filed: May 14, 2018
    Date of Patent: October 5, 2021
    Assignee: GC Corporation
    Inventors: Daisuke Takada, Shuji Kariya
  • Patent number: 10928726
    Abstract: Provided are a dispersion liquid and a composition which have excellent particle dispersibility and make it possible to manufacture a film having a high color valency. Also provided are a film, a manufacturing method of a film, and a dispersant. The dispersion liquid contains particles, a solvent, and a dispersant. The dispersant has a particle adsorption portion and a solvophilic portion, and the solvophilic portion includes a moiety which is decomposed or denatured by an external stimulus.
    Type: Grant
    Filed: March 12, 2019
    Date of Patent: February 23, 2021
    Assignee: FUJIFILM Corporation
    Inventors: Takashi Kawashima, Yoshinori Taguchi
  • Patent number: 10717062
    Abstract: A method and a system for producing a change in a medium disposed in an artificial container. The method places in a vicinity of the medium at least one of a plasmonics agent and an energy modulation agent. The method applies an initiation energy through the artificial container to the medium. The initiation energy interacts with the plasmonics agent or the energy modulation agent to directly or indirectly produce the change in the medium. The system includes an initiation energy source configured to apply an initiation energy to the medium to activate the plasmonics agent or the energy modulation agent.
    Type: Grant
    Filed: January 2, 2019
    Date of Patent: July 21, 2020
    Assignees: IMMUNOLIGHT, LLC, DUKE UNIVERSITY
    Inventors: Frederic A. Bourke, Jr., Tuan Vo-Dinh
  • Patent number: 10696768
    Abstract: The present invention pertains to a process for the manufacture of a crosslinkable fluoropolymer, to said crosslinkable fluoropolymer and the crosslinked fluoropolymer obtainable therefrom, to a film comprising said crosslinkable fluoropolymer or said crosslinked fluoropolymer and to uses of said crosslinked fluoropolymer film in various applications.
    Type: Grant
    Filed: February 25, 2015
    Date of Patent: June 30, 2020
    Assignee: SOLVAY SPECIALITY POLYMERS ITALY S.P.A.
    Inventors: Marco Apostolo, Francesco Maria Triulzi, Paula Cojocaru, Ivan Wlassics, Giuseppe Marchionni, Claudio Adolfo Pietro Tonelli
  • Patent number: 10227292
    Abstract: A polymerizable compound, a polymerizable composition, and a polymer, which have a low melting point at a practical level and exhibit excellent solubility in a general-purpose solvent, can be produced at low cost. The polymerizable compound, polymerizable composition, and polymer can produce an optical film, which exhibits excellent transparency and achieves uniform conversion of polarized light over a wide wavelength band, and an optically anisotropic article. The polymerizable compound is represented by formula (I).
    Type: Grant
    Filed: February 12, 2014
    Date of Patent: March 12, 2019
    Assignee: ZEON CORPORATION
    Inventors: Kei Sakamoto, Satoshi Kiriki, Kumi Okuyama, Kanako Sanuki
  • Patent number: 10053609
    Abstract: Provided herein is a dispersion composition comprising a blend of a semi-crystalline, selectively hydrogenated block copolymer and a low polarity fluid for oilfield applications. The block copolymer comprises blocks of semi-crystalline hydrogenated polybutadiene, blocks of poly(mono alkenyl arenes), and blocks of hydrogenated, non-crystalline conjugated dienes. The dispersions can be converted to thixotropic fluids or cohesive gels and find application as insulating packer fluids, fluid loss pills, drilling fluids and completion fluids.
    Type: Grant
    Filed: June 7, 2016
    Date of Patent: August 21, 2018
    Assignee: Kraton Polymers U.S. LLC
    Inventors: Robert C. Bening, Erin Murphy, Carl L. Willis
  • Patent number: 10035911
    Abstract: Provided is a one part, dual curable composition comprising (A) a first acrylic functional polyorganosiloxane with at least one moisture curable functional group, (B) a second acrylic functional polyorganosiloxane, which may optionally contain a moisture curable functional group, and (C) a third functional polyorganosiloxane, which optionally contains an acrylic and moisture curable functional group. The combination of (A), (B), and (C) provides a composition that is both moisture curable and radiation curable and provides a material that is fast curing via the dual cure functionality and provides a cured material exhibiting a relatively low modulus, good adhesion, and optical clarity.
    Type: Grant
    Filed: May 19, 2016
    Date of Patent: July 31, 2018
    Assignee: Momentive Performance Materials Inc.
    Inventors: Soumya Sarkar, Amol Murlidharrao Kendhale, Tanigawa Eiji
  • Patent number: 9857504
    Abstract: An optical waveguide photosensitive resin composition containing an aliphatic resin having a polymerizable substituent and a photopolymerization initiator, in which the aliphatic resin having the polymerizable substituent is formed of a side-chain polyfunctional aliphatic resin (A) and a bifunctional long-chain aliphatic resin (B), is provided. Accordingly, the composition brings together high transparency, satisfactory roll-to-roll compatibility, and a high resolution patterning property, and has excellent reflow resistance. Therefore, the composition is useful as a material for forming an optical waveguide, especially a core layer-forming material.
    Type: Grant
    Filed: October 24, 2014
    Date of Patent: January 2, 2018
    Assignee: NITTO DENKO CORPORATION
    Inventors: Tomoyuki Hirayama, Yuichi Tsujita
  • Patent number: 9809668
    Abstract: It is an object of the present invention to provide a polymerizable compound suitable as a material for optically anisotropic bodies having excellent optical properties, a composition containing the polymerizable compound, a polymer obtained by polymerizing the polymerizable compound, an optically anisotropic body formed of the polymer, and a liquid crystal display device including the optically anisotropic body.
    Type: Grant
    Filed: November 27, 2014
    Date of Patent: November 7, 2017
    Assignee: DIC CORPORATION
    Inventors: Hiroshi Hasebe, Yoshio Aoki, Kunihiko Kotani, Akihiro Koiso, Hidetoshi Nakata
  • Patent number: 9726975
    Abstract: A photoresist composition, comprising: from 0.1 to 1.0 parts of a polyether-modified organosilicon levelling agent 58; from 7 to 23 parts of a polyfunctional monomer; from 13 to 29 parts of a alkaline soluble resin; from 23 to 62.8 parts of a pigment dispersion; from 1.5 to 11.9 parts of a photo-initiator; and from 10 to 45 parts of a solvent, on the basis of parts by weight. The photoresist composition can solve the problem of poor levelling property of the coating film and shrinkage of the film surface after high temperature baking occurring in the existing photoresist composition.
    Type: Grant
    Filed: October 24, 2014
    Date of Patent: August 8, 2017
    Assignee: BOE Technology Group Co., Ltd.
    Inventor: Xuelan Wang
  • Patent number: 9359542
    Abstract: The invention relates to a preparation method of a polymeric phase-change material, comprising: using 1, 2 or 3 of (meth)acrylate poly(ethylene glycol) n-alkyl ether ester as a raw material, wherein the (meth)acrylate poly(ethylene glycol) n-alkyl ether ester has a structural general formula of CH2?C(CH3)—COO(CH2CH2O)mCnH2n+1 or CH2?CH—COO(CH2CH2O)mCnH2n+1, m=1 to 100, and n=10 to 50; washing the raw material with a solution of sodium hydroxide, potassium hydroxide, sodium carbonate or potassium carbonate having a mass percentage of 1% to 10% to remove a polymerization inhibitor, and subjecting reduced-pressure distillation, and then to a polymerization reaction by adopting one of the following process; 1. polymerization reaction initiated by irradiation; 2. polymerization reaction initiated by an initiator; 3.
    Type: Grant
    Filed: March 21, 2013
    Date of Patent: June 7, 2016
    Assignee: Tianjin Polytechnic University
    Inventors: Xing Xiang Zhang, Xiao Fen Tang, Jie Yun Meng, Hai Feng Shi, Zhi Li Zhang
  • Patent number: 9029434
    Abstract: The present invention provides a dye that is excellent in solubility and heat-resistance, and a novel compound that is suitable for the dye, and specifically provides a yellow dye having a maximum absorption wavelength in the region of 420 to 470 nm. Furthermore, the present invention provides a colored (alkali-developable) photosensitive composition and an optical filter using the dye, and specifically provides a color filter that does not decrease luminance and thus is preferable for an image display device such as a liquid crystal display panel. Specifically, the present invention provides a novel compound represented by the following general formula (1), a dye using the compound, and a colored (alkali-developable) photosensitive composition and a color filter. The content of the above-mentioned general formula (1) is as described in the description.
    Type: Grant
    Filed: July 22, 2014
    Date of Patent: May 12, 2015
    Assignee: Adeka Corporation
    Inventors: Yosuke Maeda, Masaaki Shimizu, Koichi Shigeno
  • Publication number: 20150126638
    Abstract: The present invention relates to a varnish which is for covering the surface of a substrate and deposited by inkjet, to a process for preparing said varnish and to the use thereof as a laminable and/or overprintable ink or varnish.
    Type: Application
    Filed: April 24, 2013
    Publication date: May 7, 2015
    Inventors: Edmond Abergel, Pierre Ivry Sur Seine
  • Publication number: 20150126636
    Abstract: To provide a photopolymerizable composition, which includes photopolymerizable monomers containing glycerol dimethacrylate, caprolactone-modified dipentaerythritol hexaacrylate, and diethylene glycol dimethacrylate, wherein an amount of the glycerol dimethacrylate in the photopolymerizable monomers is 25% by mass or greater.
    Type: Application
    Filed: May 17, 2013
    Publication date: May 7, 2015
    Inventor: Takao HIRAOKA
  • Publication number: 20150111981
    Abstract: The present invention provides a method of preparing UV-curable inkjet pigment ink for textile printing, in which mini-emulsion techniques are used to encapsulate monomer, photo initiator, thermal initiator and pigment in mini-emulsion particles to make a UV-curable pigment paste, and the UV-curable pigment paste is mixed with water-soluble co-solvent, surfactant and water to make a UV-curable pigment ink. The preparation process is simple and easy. The UV-curable inkjet pigment ink of the invention exhibits good fluency during printing, bright color and strong color fastness in printed products.
    Type: Application
    Filed: August 20, 2014
    Publication date: April 23, 2015
    Inventors: Shaohai Fu, Yu Guan, Anli Tian, Xia Zhang, Chunxia Wang, Chaoxia Wang
  • Publication number: 20150099820
    Abstract: The present invention relates to a polymerizable liquid crystal compound, a liquid crystal composition including the same, and an optically anisotropic body. The polymerizable liquid crystal compound according to the present invention has not only high birefringence but also excellent coating orientation, and thus it is possible to prepare a optically anisotropic body which is thin but superior in optical properties.
    Type: Application
    Filed: June 25, 2013
    Publication date: April 9, 2015
    Inventors: Kyung Chang Seo, Sung-Ho Chun, Dai Seung Choi, Mi-Ra Hong, Hyeong Bin Jang
  • Publication number: 20150086755
    Abstract: To provide a photocured product having small mold releasing force. A photocured product obtained by curing with light and containing a surface active agent, wherein a peak area of the ether bond derived peak is 3.0 times or more as large as a peak area of the ester bond derived peak, wherein the peak areas are obtained by peak separation processing by curve fitting of an X-ray photoelectron spectroscopy spectrum obtained as an analytical result on a chemical state of carbon at topmost surface of the photocured product, the analytical result being among analytical results on the topmost surface of the photocured product obtained by surface analysis of the photocured product with angle resolved X-ray photoelectron spectroscopy.
    Type: Application
    Filed: May 21, 2013
    Publication date: March 26, 2015
    Inventors: Chieko Mihara, Toshiki Ito, Yohei Murayama, Motoki Okinaka
  • Publication number: 20150044451
    Abstract: Provided is a black photosensitive resin composition being microfabricatable due to its photosensitivity, allowing a cured film obtainable therefrom to be excellent in flexibility, being small in post-curing warpage of a substrate, being excellent in flame retardancy and electric insulation reliability, allowing a reduction in process contamination due to less outgassing during a reflow process, and avoiding a reduction in film thickness.
    Type: Application
    Filed: November 20, 2012
    Publication date: February 12, 2015
    Inventors: Masayoshi Kido, Yoshihide Sekito
  • Publication number: 20150042731
    Abstract: A non-aqueous photopolymerizable inkjet ink, including as a photopolymerizable monomer: (a) ethylene glycol dimethacrylate; and (b) caprolactone-modified dipentaerythritol hexaacrylate or ethylene oxide-modified trimethylolpropane tri-methacrylate, or both thereof, wherein the ink includes the (a) component by 10% by mass to 95% by mass with respect to the entire photopolymerizable monomer, and the ink includes the (b) component by 5% by mass to 90% by mass with respect to the entire photopolymerizable monomer, and wherein the ink does not include a diluting solvent.
    Type: Application
    Filed: February 27, 2013
    Publication date: February 12, 2015
    Inventor: Takao Hiraoka
  • Publication number: 20150045472
    Abstract: It is an object of the present invention to provide an anchor coating agent that can be used in one layer as an anchor coating for a base material and an inorganic material. An organic-inorganic hybrid coating composition that can be used as the anchor coating agent of the present invention contains the following components. a) an organic silicon compound which is at least one represented by formula (I) RnSiX4-n . . . (I) (wherein R represents an organic group having a carbon atom directly bonded to Si, and X represents a hydroxyl group or a hydrolyzable group; and n represents 1 or 2, wherein when n is 2, each R is the same or different, and when (4-n) is 2, each X is the same or different), wherein a solubility parameter of Rn (SP1) obtained by Fedors' estimation method is smaller than a solubility parameter of an olefin-based polymer (SP2) obtained by Fedors' estimation method and a difference between the SP1 and the SP2 is 1.
    Type: Application
    Filed: February 27, 2013
    Publication date: February 12, 2015
    Inventor: Taiki Yamate
  • Publication number: 20150037588
    Abstract: Provided is a photosensitive resin composition which has excellent heat resistance, pore explosion resistance, empty foam resistance and crack resistance. A photosensitive resin composition of the present invention contains (A) a carboxyl group-containing resin, (B) a photopolymerization initiator, (C) a diluent solvent, (D) a compound that has two or more ethylenically unsaturated groups in each molecule and (E) a thermosetting component that has two or more cyclic ether groups and/or cyclic thioether groups in each molecule.
    Type: Application
    Filed: August 15, 2012
    Publication date: February 5, 2015
    Applicant: TAIYO INK (SUZHOU) CO., LTD.
    Inventor: Kenji Kato
  • Publication number: 20150030843
    Abstract: Disclosed are an auto-repairing composition for overcoat layer, a method of producing the same, and a display apparatus. The composition for overcoat layer comprising 1-10 wt % of microcapsules based on the total weight of the composition for overcoat layer, said microcapsule including a capsule wall and a capsule core, wherein the capsule wall comprises an alkali-insoluble resin, and the capsule core comprises, based on the total weight of the capsule core, 30-60 wt % of a photo-curable unsaturated oligomer, 30-60 wt % of a photo-polymerizable monomer, 1-10 wt % of a photo-initiator, and 0-5 wt % of additive.
    Type: Application
    Filed: December 20, 2013
    Publication date: January 29, 2015
    Inventors: Tonghua Yang, Min Li, Jikai Zhang, Sikai Zhang, He Feng
  • Patent number: 8933138
    Abstract: The present invention provides photolatent Ti-chelate catalyst compounds of formula (I), wherein R1 is for example C6-C14 aryl which is substituted by one or more R?2, R?3 or R?4; or the two R1 together are unsubstituted linear or branched C1-C12alkylene; R2, R3, R4, R?2, R?3, and R?4 independently of each other are for example hydrogen, halogen or linear or branched C1-C20alkyl; R5, R6 and R7 independently of each other are hydrogen, linear or branched C1-C20alkyl, C6-C14aryl, Br or Cl, provided that not more than one of R5, R6 and R7 is hydrogen; as well as formulations comprising said compounds and defined 1,3-diketones.
    Type: Grant
    Filed: September 1, 2010
    Date of Patent: January 13, 2015
    Assignee: BASF SE
    Inventors: Tobias Hintermann, Didier Bauer, Antoine Carroy, Caroline Lordelot, Rachel Kohli Steck
  • Publication number: 20150005406
    Abstract: Provided is a photocurable moisture-proof insulating coating material which places little burden on the environment and has excellent surface curability with low irradiation. In addition, this photocurable moisture-proof insulating coating material is hydrophobic and exhibits high adhesion to a substrate material. Also provided is a novel urethane (meth)acrylate which is used for this moisture-proof insulating coating material. A urethane (meth)acrylate of the present invention is obtained by reacting (a) a polyester polyol that has a structural unit derived from a hydrogenated dimer acid and a structural unit derived from a hydrogenated dimer diol, (b) a polyisocyanate compound and (c) a hydroxyl group-containing (meth)acrylate. A moisture-proof insulating coating material of the present invention contains this urethane (meth)acrylate and a (meth)acryloyl group-containing compound that does not contain a silicon atom.
    Type: Application
    Filed: February 1, 2013
    Publication date: January 1, 2015
    Applicant: SHOWA DENKO K.K.
    Inventors: Kazuhiko Ooga, Hiroto Kouka, Kai Suzuki
  • Publication number: 20140364530
    Abstract: The present invention relates to a (meth)acrylated compound (A) prepared from: (i) a polyol constituent, (ii) a polyacid constituent and (iii) one or more (meth)acrylating compounds, wherein the polyol constituent comprises at least 30% by weight of one or more cyclic ether polyols, relative to the total weight of the polyol constituent, and wherein the compound (A) optionally further contains one or more moieties selected from the group consisting of (poly)caprolactone-containing moieties (ai), (poly)lactide- and/or (poly)glycolide-containing moieties (aii), moieties providing epoxide groups (aiii) and moieties providing alkylene oxide groups containing from 2 to 4 carbon atoms (aiv). The compounds of the invention are in particular suited for the making of radiation curable coating compositions and inks less prone to migration.
    Type: Application
    Filed: March 22, 2013
    Publication date: December 11, 2014
    Inventors: Luc Lindekens, Thierry Randouz, Ruben Cleymans, Paul Gevaert
  • Publication number: 20140363634
    Abstract: Ink contains at least one of a compound represented by the following chemical formula 1, a compound represented by chemical formula 2, a compound represented by chemical formula 3, or a compound represented by chemical formula 4.
    Type: Application
    Filed: May 27, 2014
    Publication date: December 11, 2014
    Inventors: Mitsunobu MORITA, Soh NOGUCHI, Okitoshi KIMURA
  • Patent number: 8901201
    Abstract: A durable ambient light curable waterproof liquid rubber coating with volatile organic compound (VOC) content of less than 450 grams per liter made from ethylene propylene diene terpolymer (EPDM) in a solvent, a photoinitiator, an additive, pigments, and fillers, and a co-agent and a method for making the formulation, wherein the formulation is devoid of thermally activated accelerators.
    Type: Grant
    Filed: February 12, 2014
    Date of Patent: December 2, 2014
    Assignee: Lion Copolymer Geismar, LLC
    Inventors: Michael J. Molnar, Daniel S. Nelson, Arthur J. Fontenot, III, Harold William Young, Jr., Augusto Caesar Ibay, Zhiyong Zhu
  • Publication number: 20140349086
    Abstract: The present invention provides a photo-curable composition that requires a small demolding force. The present invention also provides a UV imprint method that requires a small demolding force. The photo-curable composition contains a polymerizable monomer (A), a polymerization initiator (B), and a fluorine-containing surfactant (C). A photo-cured product of the photo-curable composition has a water contact angle of 74 degrees or less.
    Type: Application
    Filed: October 24, 2012
    Publication date: November 27, 2014
    Applicant: CANON KABUSHIKI KAISHA
    Inventors: Toshiki Ito, Chieko Mihara, Kanae Kawahata, Motoki Okinaka
  • Publication number: 20140334027
    Abstract: Oxime ester compounds of formula (I), wherein R1, R2, R3, R4, R5, R6, R7, R8, R9, and R10 independently of each other are hydrogen, C1-C20alkyl, (A), COR14, NO2, or OR15; provided that at least one of R1, R2, R3, R4, R5, R6, R7, R8, R9, and R10 is (A), and provided that at least one of the remaining R1, R2, R3, R4, R5, R6, R7, R8, R9, and R10 is COR14 or NO2; R11 is for example C1-C20alkyl, M or (B); X and X1 are for example a direct bond; R12 and R?12 are for example hydrogen or C1-C20alkyl; R13 and R?13 are for example C6-C20aryl or C3-C20heteroaryl; M is (X), (Y) or (Z); X3 is O, S or NR19; R14 and R15 are for example phenyl; R20, R21, R22, R23, R24, or R25 for example are hydrogen, COR14, NO2, or (B); provided that at least two oxime ester groups are present in the molecule; are useful as photoinitiators.
    Type: Application
    Filed: December 3, 2012
    Publication date: November 13, 2014
    Applicant: BASF SE
    Inventors: Yuichi Nishimae, Hisatoshi Kura, Kazuhiko Kunimoto, Ryuhei Yamagami, Keita Tanaka
  • Publication number: 20140335350
    Abstract: The method for forming a protective coat on an electrode for a touch panel according to the invention comprises a first step in which a photosensitive layer comprising a photosensitive resin composition containing a binder polymer, a photopolymerizable compound and a photopolymerization initiator is provided on a base material having an electrode for a touch panel, a second step in which prescribed sections of the photosensitive layer are cured by irradiation with active light rays, and a third step in which the sections other than the prescribed sections of the photosensitive layer are removed to form a protective coat comprising the cured sections of the photosensitive layer covering all or a portion of the electrode, wherein the hydroxyl value of the photosensitive resin composition is no greater than 40 mgKOH/g.
    Type: Application
    Filed: December 4, 2012
    Publication date: November 13, 2014
    Inventors: Hiroyuki Tanaka, Yasuharu Murakami, Naoki Sasahara, Ikuo Mukai, Yoshimi Igarashi, Masahiko Ebihara, Hiroshi Yamazaki
  • Patent number: 8865786
    Abstract: Coating compositions, and methods for depositing them on the surface of an article to produce an antireflection coating, are disclosed. In one embodiment, the coating composition includes a (meth)acrylate-functional silicon alkoxide, silica particles, a (meth)acrylate monomer, an epoxy (meth)acrylate oligomer, a photoinitiator, a solvent, an acid, and water. The relative amounts of these constituents are controlled such that, when the coating composition is deposited onto the surface of an article and cured, it has a refractive index less than about 1.60 at a wavelength of 510 nm. In another embodiment, the coating composition includes an organo-metallic compound other than an organo-metallic compound of silicon, an epoxy-functional silicon alkoxide, a non-epoxy-functional silicon alkoxide, a curing agent compatible with epoxy-functional molecules, a solvent, an inorganic acid, and water.
    Type: Grant
    Filed: June 19, 2009
    Date of Patent: October 21, 2014
    Assignee: Yazaki Corporation
    Inventors: Yongan Yan, Satyabrata Raychaudhuri, Matthew Emilio Coda
  • Patent number: 8865812
    Abstract: A liquid sealant composition that can be cured by photoinitiation, heat-activated free radical initiation or both that includes an effective amount of an elastomeric acrylic polyolefin; an effective amount of a low molecular weight acrylic functional monomer component, the acrylic functional monomer component containing one or more unreacted acrylic or methacrylic double bonds, the low molecular weight acrylic functional monomer component having greater than 75% monofunctional monomers, wherein the elastomeric acrylic polyolefin is soluble in the low molecular weight acrylic functional monomer; at least one plasticizer; and at least one curing agent, the curing agent including at least one photoinitiator, at least one heat-activated free radical initiator, or a combination of at least one photoinitiator and at least one heat-activated free radical initiator.
    Type: Grant
    Filed: May 20, 2013
    Date of Patent: October 21, 2014
    Assignee: ND Industries, Inc.
    Inventor: Brian J. Phillips
  • Publication number: 20140287219
    Abstract: An optical element material which is obtained by curing a resin composition for photoimprinting containing a photocurable monomer (A) of the formula (1) and a photocurable monomer (B) of the formula (2) in a weight ratio of from 30/70 to 87/13, and containing a photopolymerization initiator (C) in a content of from 0.01 to 30 parts by weight per 100 parts by weight of the total weight of the monomer (A) and the monomer (B), and which has a shrinkage on curing of at most 4.5%, and a method for producing it: wherein R1 is —CH?CH2, —CH2CH2—O—CH?CH2, —CH2—C(CH3)?CH2 or a glycidyl group; R2 and R3 are each independently hydrogen or a C1-4 alkyl group; R4 and R5 are each independently —O—CH?CH2, —O—CH2CH2—O—CH?CH2, —O—CO—CH?CH2, —O—CO—C(CH3)?CH2, —O—CH2CH2—O—CO—CH?CH2, —O—CH2CH2—O—CO—C(CH3)?CH2 or a glycidyl ether group; and R6 and R7 are each independently hydrogen or a C1-4 alkyl group.
    Type: Application
    Filed: September 25, 2012
    Publication date: September 25, 2014
    Applicant: MARUZEN PETROCHEMICAL CO., LTD.
    Inventors: Yoshihisa Hayashida, Takuro Satsuka, Teruyo Ikeda
  • Publication number: 20140285568
    Abstract: A radiation curable liquid includes at least one free radical polymerizable monomer or oligomer, at least one diffusion hindered acetalysation catalyst, and at least one diffusion hindered hydroxyl containing compound. The radiation curable liquid applied to a substrate prevents migration of very low viscous monomers, such as vinyl ether acrylate monomers, into the substrate.
    Type: Application
    Filed: November 30, 2012
    Publication date: September 25, 2014
    Applicant: AGFA GRAPHICS NV
    Inventors: Johan Loccufier, Roel De Mondt
  • Publication number: 20140240414
    Abstract: To provide a photopolymerizable inkjet ink, which contains photopolymerizable monomers containing at least one selected from the following compound group (A) compounds of which are negative for skin sensitization, and at least one selected from the following compound group (B) compounds of which are negative for skin sensitization, wherein the compound group (A) is a compound group consisting of caprolactone-modified dipentaerythritol hexaacrylate, polyethoxylated tetramethylol methane tetraacrylate, ethylene oxide-modified bisphenol A diacrylate, caprolactone-modified hydroxy pivalic acid neopentyl glycol diacrylate, polypropylene glycol diacrylate [CH2?CH—CO—(OC3H6)n-OCOCH?CH2 (n?12)], hydroxyethyl acryl amide, trimethylol propane trimethacrylate, and tricyclodecane dimethanol dimethacrylate, and the compound group (B) is a compound group consisting of ethylene oxide-modified phenolacrylate, isostearyl acrylate, ethylene oxide-modified trimethylol propane trimethacrylate, stearyl methacrylate, and glycerin
    Type: Application
    Filed: October 30, 2012
    Publication date: August 28, 2014
    Inventor: Takao Hiraoka
  • Publication number: 20140228466
    Abstract: Antimicrobial compositions and methods are disclosed. The antimicrobial compositions are particularly useful in providing antimicrobial capability to a wide-range of medical devices. In one aspect the invention relates a UV curable antimicrobial coating comprising a UV curable composition comprising an oligomer, a momoner, and a photoinitiator which are together capable of forming a UV curable polymer composition. The compositions also include insoluble antimicrobial agents, which may be selected from a wide array of agents. The insoluble antimicrobial agents include a particle size less than 15 ?m. Representative insoluble antimicrobial agents include chlorhexidine diacetate, chlorhexidine base, alexidine(dihydrochloride), silver sufladiazene, silver citrate, triclosan, octenidine(dihydrochloride), and rifampicin.
    Type: Application
    Filed: February 13, 2013
    Publication date: August 14, 2014
    Applicant: BECTON, DICKINSON AND COMPANY
    Inventors: Janice Lin, Yiping Ma
  • Publication number: 20140213682
    Abstract: The disclosure provides curable inks including a diurethane gelator having the structure of Formula I. wherein R and R? each, independently of the other, is a C1-C22 saturated aliphatic hydrocarbon group selected from the group consisting of (1) linear aliphatic groups, (2) branched aliphatic groups, (3) cyclic aliphatic groups, (4) aliphatic groups containing both cyclic and acyclic portions, any carbon atom of the saturated aliphatic hydrocarbon group may be optionally substituted with an alkyl group (cyclic or acyclic), wherein (1) and (2) groups have a carbon number of from about 1 to about 22 carbons, and wherein (3) and (4) groups have a carbon number of from about 4 to about 10 carbons; and X is selected from the group consisting of: (i) an alkylene group, (ii) an arylene group, (iii) an arylalkylene group, and (iv) an alkylarylene group.
    Type: Application
    Filed: January 28, 2013
    Publication date: July 31, 2014
    Applicant: XEROX CORPORATION
    Inventors: Naveen Chopra, Michelle N. Chretien, Barkev Keoshkerian, Jenny Eliyahu, Daryl W. Vanbesien, Adela Goredema
  • Publication number: 20140210140
    Abstract: A nanoimprinting method employs a resist composition including polymerizable compounds and a polymerization initiating agent, each having absorption spectrum properties with absorption regions within a range from 250 nm to 500 nm. The polymerization initiating agent has an absorption region with a longer wavelength end wavelength longer than the longer wavelength end wavelength of the absorption region of the polymerizable compounds. Further, exposure of the resist composition is executed by light having spectral intensity properties that satisfy a predetermined relational formula. The present invention enables contamination of molds by adhered matter to be suppressed, and enables formation of resist patterns having sufficient etching resistance by nanoimprinting.
    Type: Application
    Filed: March 28, 2014
    Publication date: July 31, 2014
    Applicant: FUJIFILM CORPORATION
    Inventors: Tadashi OMATSU, Kazuharu Nakamura, Satoshi Wakamatsu
  • Publication number: 20140206789
    Abstract: The objective of the present invention is to provide a derivative of polybutadiene suitable as a material of a curable composition for obtaining a cured product having high shearing stress. The present invention provides: a silylated polybutadiene characterized by containing a repeating unit represented by formula (I) (in the formula: R1, R2, and R3 each independently represents an unsubstituted or substituted aryl group, an alkyl group, or an aralkyl group. Among R1 to R3, at least one of R1 to R3 is an aryl group or aralkyl group.); a curable composition characterized by containing the silylated polybutadiene and a polymerization initiator; and a cured product obtained by curing the curable composition.
    Type: Application
    Filed: October 3, 2012
    Publication date: July 24, 2014
    Inventors: Hiroki Hashimoto, Taiki Yamata
  • Publication number: 20140179820
    Abstract: The invention provides meltable and UV-crosslinkable pressure-sensitive adhesives, such as acrylate hotmelts or hotmelt formulations, which can be processed by commonplace hotmelt processes and also on customary hotmelt coating lines, without any immediate alteration in the product properties in the event of (unwanted) deviation in the operational parameters. The compositions of the invention are UV-crosslinkable and meltable pressure-sensitive adhesives comprising (i) mixtures of UV-crosslinkable polyacrylate polymers selected from a) mixtures of UV-crosslinkable polymers with at least one photoinitiator bonded covalently to the backbone of the polymers, and b) mixtures of UV-crosslinkable polyacrylate polymers, monomers and at least one photoinitiator, and also (ii) at least one UV stabilizer, and also methods for producing them and the use thereof as bonding agents.
    Type: Application
    Filed: December 11, 2013
    Publication date: June 26, 2014
    Applicant: tesa SE
    Inventors: Alexander Prenzel, Stephan Zöllner, Michael Siebert
  • Patent number: 8753739
    Abstract: The present invention relates to a multi-layer product, the first layer being a UV-cured protective layer which contains SiO2 nanoparticles, and the second layer containing a thermoplastic substrate. In addition, the invention relates to the composition of the UV-curable first layer, a process for the production of the multi-layer products and products, such as e.g. glazing products, which contain the named multi-layer products.
    Type: Grant
    Filed: April 3, 2007
    Date of Patent: June 17, 2014
    Assignee: Bayer MaterialScience AG
    Inventors: Frank Buckel, Robert Maleika, Walter Koehler, Reiner Meyer
  • Publication number: 20140163131
    Abstract: Disclosed are a photosensitive resin composition including (A) a thermally curing initiator having a half-life of about one hour at a temperature ranging from about 100 to about 150° C.; (B) a photopolymerization initiator; (C) a binder resin; (D) a photopolymerizable compound; (E) a colorant; and (F) a solvent, and a black spacer using the same.
    Type: Application
    Filed: October 28, 2013
    Publication date: June 12, 2014
    Applicant: Cheil Industries Inc.
    Inventors: A-Rum YU, Ji-Hye KIM, Kyung-Won AHN, Jae-Bum YIM, Hwan-Sung CHEON, Ju-Ho JUNG, Hyun-Moo CHOI
  • Publication number: 20140154471
    Abstract: Disclosed is a to provide a curable composition for imprints capable of keeping a good patternability and of producing less defects even after repetitive pattern transfer. The curable composition for imprints comprising: a polymerizable compound (A); a photo-polymerization initiator (B); and a non-polymerizable compound (C) having a polyalkylene glycol structure having at least one terminal hydroxy group, or at least one etherified terminal hydroxy group, and containing substantially no fluorine atom and no silicon atom.
    Type: Application
    Filed: January 9, 2014
    Publication date: June 5, 2014
    Applicant: FUJIFILM Corporation
    Inventors: Kunihiko KODAMA, Yuichiro ENOMOTO, Kazuyuki USUKI, Tadashi OMATSU, Hirotaka KITAGAWA
  • Publication number: 20140139596
    Abstract: An improved polymerizable ink composition contains polymerizable monomers containing one or both of an acrylic acid ester compound and a methacrylic acid ester compound and a vinyl ether compound; an alkali component; and an aromatic secondary amine compound.
    Type: Application
    Filed: November 18, 2013
    Publication date: May 22, 2014
    Applicant: RICOH COMPANY, LTD.
    Inventor: Takao Hiraoka
  • Patent number: 8722755
    Abstract: The invention relates to a photosensitive resin composition, and an overcoat and/or spacer for a liquid crystal display component formed thereby has good heat-resistant transmittance, good chemical resistance and good elastic recovery rate. The invention also provides a method for forming a thin film on a substrate, a thin film on a substrate and a liquid crystal display component.
    Type: Grant
    Filed: February 28, 2013
    Date of Patent: May 13, 2014
    Assignee: Chi Mei Corporation
    Inventors: Yu-Jie Tsai, Ming-Ju Wu
  • Publication number: 20140121292
    Abstract: Provided is a curable composition for imprints having good patternability and dry etching resistance.
    Type: Application
    Filed: December 24, 2013
    Publication date: May 1, 2014
    Applicant: FUJIFILM Corporation
    Inventors: Kunihiko KODAMA, Kyouhei SAKITA, Hiroyuki YONEZAWA
  • Publication number: 20140107247
    Abstract: The invention provides a polymerizable compound represented by formula (I), a polymerizable composition, and a polymer that have a practical low melting point, can be produced at low cost, and can produce an optical film that achieves uniform conversion of polarized light over a wide wavelength band, and an optically anisotropic article.
    Type: Application
    Filed: April 12, 2012
    Publication date: April 17, 2014
    Applicant: ZEON CORPORATION
    Inventors: Kei Sakamoto, Kumi Okuyama
  • Patent number: 8691352
    Abstract: Disclosed is a photopolymerizable composition which contains a photopolymerization initiator (A) that has a partial structure represented by the following Formula (1) and a polymerizable compound (B). In General formula (1), R3 and R4 each independently represents a hydrogen atom, an alkyl group, an alkenyl group, an alkynyl group, an aryl group, a heteroaryl group or an alkoxy group; R3 and R4 may form a ring with each other; and X represents OR5, SR6, or NR17R18. The photopolymerizable composition is capable of forming a cured film that has high sensitivity, excellent intra-membrane curability and excellent adhesion to a support. The cured film is able to maintain a patterned shape even during post-heating after development and has good pattern formability, while coloring due to heating with passage of time being suppressed.
    Type: Grant
    Filed: August 10, 2010
    Date of Patent: April 8, 2014
    Assignee: FUJIFILM Corporation
    Inventor: Masaomi Makino
  • Publication number: 20140088216
    Abstract: There is provided a highly branched lipophilic polymer that is excellent in blending and dispersing properties in a matrix resin, and is possible to provide surface modification properties such as excellent lipophilicity (anti-fingerprint property) and the like to a coating that is obtained from the resin composition while the intrinsic transparency of the resin is not impaired; and a photopolymeizable composition comprising the highly branched lipophilic polymer. A highly branched lipophilic polymer obtained by polymerizing a monomer A containing two or more radically polymerizable double bonds per molecule and a monomer B containing a C6-30 alkyl group or a C3-30 alicyclic group and at least one radically polymerizable double bond per molecule in the presence of 5 to 200 mol % of a polymerization initiator C relative to the number of moles of the monomer A. A photopolymeizable composition comprising the highly branched lipophilic polymer.
    Type: Application
    Filed: March 16, 2012
    Publication date: March 27, 2014
    Applicant: NISSAN CHEMICAL INDUSTRIES, LTD.
    Inventors: Motonobu Matsuyama, Masayuki Haraguchi, Masaaki Ozawa