Containing Nitrogen Patents (Class 522/39)
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Patent number: 6171756Abstract: Organic photoprecursors of amines are provided for use in photosensitive imaging systems, finding particular application in the preparation of lithographic printing plates. Said photoprecursors generate free amines on exposure to long wavelength UV or visible radiation, have high solubility in organic solvents, and include photolabile 2-nitrobenzyl functional groups. Methods for the synthesis of the photoprecursors are described, and the use of the said photoprecursors for the production of printing plates using both positive working and negative working techniques are discussed.Type: GrantFiled: December 22, 1998Date of Patent: January 9, 2001Assignee: Afga-Gevaert, N.V.Inventors: Maria de Lurdes dos Santos Cristiano, John Kynaston Davies, Sharon Dowd, Robert Alexander Walker Johnstone, Michael John Pratt, John Robert Wade
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Patent number: 6156816Abstract: A substantially water-free, water-washable, energy-curable composition includes an epoxy oligomer and/or urethane oligomer having at least two ethylenically unsaturated moieties, at least one alkoxylated polyol monomer having at least two ethylenically unsaturated moieties and capable of being copolymerized with the oligomer, and a surface active agent capable of being integrated into the molecular structure of the cured polymer and further capable of rendering the uncured composition dispersible in water. Optionally, the composition can contain a photoinitiator. The composition is self-dispersible in water and is especially suitable for use as a coating material for a printing screen.Type: GrantFiled: August 20, 1998Date of Patent: December 5, 2000Assignee: Henkel CorporationInventor: Marie-Esther Saint Victor
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Patent number: 6130269Abstract: A thermosetting pressure-sensitive adhesive comprising a photopolymerization product of a composition containing a) 100 parts by weight of a (meth) acrylic acid alkyl ester wherein the average carbon atom number of the alkyl group is from 2 to 14 and from 30 to 1% by weight of a monoethylenically unsaturated acid copolymerizable with the ester, b) from 0.02 to 5 parts by weight of a polyfunctional (meth)acrylate as a crosslinking agent, c) from 0.01 to 4 parts by weight of a photopolymerization initiator, and d) from 5 to 30 parts by weight of an epoxy resin, and not substantially containing a curing agent for the epoxy resin, and an adhesive sheet using the thermosetting type pressure-sensitive adhesive.Type: GrantFiled: November 24, 1998Date of Patent: October 10, 2000Assignee: Nitto Denko CorporationInventors: Kazuhito Hosokawa, Shigeki Muta, Hitoshi Takahira, Takao Yoshikawa
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Patent number: 6127445Abstract: The present invention relates to anionic photoinitiator compounds, compositions containing them, and methods of using them having the structure: ##STR1## wherein X and Y are independently selected from the group consisting of a direct single bond and --C(.dbd.O)--, wherein at least one of X and Y is --C(.dbd.O)--;R.sup.1 and R.sup.2 are independently selected from the group consisting of H and substituted phenyl, wherein both R.sup.1 and R.sup.2 are not H;and wherein neither --X--R.sup.1 nor --Y--R.sup.2 is --C(.dbd.O)H. The anionic photoinitiators have improved storage stability, without loss of photosensitivity, even when stored with polymerizable or crosslinkable monomer, oligomer, or crosslinkable polymer species.Type: GrantFiled: November 3, 1998Date of Patent: October 3, 2000Assignee: The University of Georgia Research Foundation, Inc.Inventors: Charles R. Kutal, Yoshikazu Yamaguchi
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Patent number: 6124371Abstract: The invention relates to a composition comprising polymerizable material and an anionic photocatalyst. The photocatalyst is a photolabile compound able to liberate a strong base having a pK.sub.a .gtoreq.12. The catalyst can be illustrated by the structural formula Z-A wherein Z is a photolabile group and A is a strong base, for example, a nitrogen containing compound such as, a secondary amine, a guanidine or amidine and Z is covalently bound to A.Type: GrantFiled: August 21, 1998Date of Patent: September 26, 2000Assignee: DSM N.V.Inventors: Dirk A. W. Stanssens, Johan F. G. A. Jansen
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Patent number: 6114406Abstract: A UV-curable ink jet composition comprises a polyfunctional alkoxylated or polyalkoxylated acrylate monomer (80% to 95% by weight), a photoinitiator (e.g. from 1 to 15% by weight) and preferably a colorant (e.g. 1% to 10% by weight).Type: GrantFiled: December 3, 1998Date of Patent: September 5, 2000Assignee: Coates Brothers PLCInventors: Nigel Antony Caiger, Hartley David Selman
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Patent number: 6090236Abstract: A method of generating reactive species which includes exposing a polymolecular photoreactor to radiation, in which the polymolecular photoreactor comprises a wavelength-specific sensitizer associated with a reactive species-generating photoinitiator. The sensitizer absorbs energy and transfers the absorbed energy to the photoinitiator which in turn, generates reactive species. The wavelength-specific sensitizer is adapted to have an absorption wavelength band generally corresponding to an emission peak of the radiation. The radiation to which the polymolecular photoreactor is exposed generally will have a wavelength of from about 4 to about 1,000 nanometers. Thus, the radiation may be ultraviolet radiation, including near ultraviolet and far or vacuum ultraviolet radiation: visible radiation: and near infrared radiation. Desirably, the radiation will have a wavelength of from about 100 to about 900 nanometers.Type: GrantFiled: December 31, 1997Date of Patent: July 18, 2000Assignee: Kimberly-Clark Worldwide, Inc.Inventors: Ronald Sinclair Nohr, John Gavin MacDonald
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Patent number: 6087412Abstract: The invention relates to crosslinked polymers, which are polymerisation products of a polymerisable mixture that comprises the following components:a) a macromer of formula C ##STR1## wherein Macro is an m-valent radical of a macromer from which the number m of groups Rx.sub.x --H has been removed,each R.sub.x, independently of the others, is a bond, --O--, --NR.sub.N -- or --S-- wherein R.sub.N is hydrogen or lower alkyl,PI* is a bivalent radical of a photoinitiator,R.sub.aa is the moiety of a photoinitiator that forms the less reactive free radical on cleavage of the photoinitiator, andm is an integer from 1 to 100,b) a copolymerisable vinyl monomer andc) a copolymerisable crosslinker.The polymers are suitable especially for the production of mouldings, such as for contact lenses.Type: GrantFiled: September 12, 1997Date of Patent: July 11, 2000Assignee: Novartis AGInventors: Peter Chabrecek, Dieter Lohmann, Kurt Dietliker
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Patent number: 6071979Abstract: A method of generating reactive species which includes exposing a wavelength specific photoreactor to radiation, in which the wavelength specific photoreactor comprises a wavelength-specific sensitizer associated with one or more reactive species-generating photoinitiators. Also described are methods of polymerizing unsaturated monomers and curing an unsaturated oligomer/monomer mixture.Type: GrantFiled: December 26, 1997Date of Patent: June 6, 2000Assignee: Kimberly-Clark Worldwide, Inc.Inventors: John Gavin MacDonald, Ronald Sinclair Nohr
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Patent number: 6066435Abstract: A photosensitive composition which is liquid at room temperature and which comprisesa) 18 to 22% by weight of a binder polymer based on a styrene-maleic anhydride halfester copolymer,b) 10 to 15% by weight of at least one photocurable acrylate compound,c) 0.1 to 10% by weight of a photoinitiator, andd) 45 to 70% by weight of a propylene glycol halfester or propylene glycol halfester, the sum of the components a) to d) being 100% by weight,is suitable for the production of photostructured objects, preferably for the production of telephone cards.Type: GrantFiled: May 11, 1998Date of Patent: May 23, 2000Assignee: CIBA Specialty Chemicals Corp.Inventor: Kurt Munk
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Patent number: 6057380Abstract: Compounds of formula I, II or III ##STR1## X is a divalent radical; Y is C.sub.1 -C.sub.6 aklylene, cyclohexylene or a direct bond;Ar.sub.1 is an aromatic radical as defined in claim 1,R.sub.1 and R.sub.2 are each independently the other, inter alia, a radical of formula ##STR2## in which p is zero or 1, or a radical of formula ##STR3## R.sub.3 is, inter alia, hydrogen, C.sub.1 -C.sub.12 alkyl, C.sub.5 -C.sub.12 cycloalkyl or phenyl-C.sub.1 -C.sub.3 alkyl;R.sub.4 is, inter alia, C.sub.1 -C.sub.12 cycloalkyl, phenyl-C.sub.1 -C.sub.3 alkyl or phenyl;or an acid addition salt of a compound of formula I, II or III;are useful as photosensitive base catalysts in base crosslinking compositions.Type: GrantFiled: December 5, 1997Date of Patent: May 2, 2000Assignee: Ciba Specialty Chemicals CorporationInventors: Jean-Luc Birbaum, Martin Kunz, Akira Kimura, Hisatoshi Kura, Hidetaka Oka, Hiroko Nakashima
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Patent number: 6048653Abstract: The present invention provides a polymerizable composition for a color filter, which comprises a (meth)acrylate copolymer containing alicyclic (meth)acryloyl groups in its side chains, a compound having at least one ethylenically unsaturated double bond, a photopolymerization initiator and a colorant, a color filter obtained by coating the composition on a glass substrate, followed by exposure and development; and a method for producing a color filter, which comprises coating the composition on a glass substrate, followed by exposure and development.The polymerizable composition of the present invention is highly sensitive and excellent in chemical resistance. Accordingly, according to the present invention, it is possible to produce a color filter of a high quality without a protective layer such as an oxygen-shielding film.Type: GrantFiled: January 21, 1998Date of Patent: April 11, 2000Assignee: Mitsubishi Chemical CorporationInventors: Tameichi Ochiai, Ryuichiro Takasaki, Noriko Endou, Yuzuru Chika
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Patent number: 6031044Abstract: A polyurethane which is substantially self-dispersible in water and is obtainable by reactinga) at least one polyisocyanate withb) at least one polyol andc) at least one photoinitiator of the general formula I ##STR1## where R is a radical of the formula II ##STR2## or is --CR.sup.7 R.sup.8 R.sup.9, P(.dbd.O)(R.sup.10).sub.2 or SO.sub.2 R.sup.11,the number-average molecular weight M.sub.n of the polyurethane being greater than 2700, and its use. The invention also relates to aqueous polyurethane resin dispersions and coating compositions comprising the novel polyurethanes, and to their use.Type: GrantFiled: December 18, 1997Date of Patent: February 29, 2000Assignee: BASF AktiengesellschaftInventors: Nicolas Kokel, Harald Larbig, Klaus Menzel, Erich Beck, Wolfgang Reich, Guido Voit
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Patent number: 6022906Abstract: Compounds of the formulae I, II, III and IV ##STR1## wherein Ar for example is a phenyl, biphenyl or benzoylphenyl group, which is unsubstituted or substituted; Ar.sub.1, for example, has the same meanings as Ar; Ar.sub.2 is inter alia phenyl; X may be a direct bond; Y hydrogen, etc.; R.sub.1 and R.sub.2 for example C.sub.1 -C.sub.8 alkyl; R.sub.3 inter alia hydrogen or C.sub.1 -C.sub.12 alkyl; R.sub.4 is inter alia C.sub.1 -C.sub.12 alkyl; or R.sub.3 and R.sub.4 together are C.sub.3 -C.sub.7 alkylene; R.sub.5 is for example C.sub.1 -C.sub.6 alkylene; and Z is a divalent radical; provided that at least one of the radicals Ar, Ar.sub.1, Ar.sub.2, Ar.sub.3, R.sub.1, R.sub.2, R.sub.3, R.sub.4, R.sub.5 or Y is substituted by 1 to 5 SH groups, or provided that Y contains at least one --SS-- group, are photoinitiators for the polymerization of ethylenically unsaturated compounds.Type: GrantFiled: December 1, 1997Date of Patent: February 8, 2000Assignee: Ciba Specialty Chemicals CorporationInventors: Masaki Ohwa, Hitoshi Yamoto, Jean-Luc Birbaum, Hiroko Nakashima, Akira Matsumoto, Hidetaka Oka
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Patent number: 6010821Abstract: Water coatable and water developable negative-acting color proofing single sheet and overlay systems are described. The water-soluble photosensitive color layer employed in each type of proofing construction includes a photopolymerizable polymer having a weight-average molecular weight between 5,000 and 100,000; an alkaline soluble resin having a weight-average molecular weight between 1,000 and 200,000 and an acid number between 50 and 300; and a water-soluble photoinitiator.Type: GrantFiled: May 23, 1997Date of Patent: January 4, 2000Assignee: Minnesota Mining and Manufacturing CompanyInventors: Gordon Christopher Smith, Hamid Barjesteh, James Alan Bonham
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Patent number: 6008268Abstract: A method of generating reactive species which includes exposing a photoreactor composition to radiation, in which the photoreactor composition comprises a wavelength-specific sensitizer associated with one or more reactive species-generating photoinitiators. Also described are methods of polymerizing unsaturated monomers and curing an unsaturated oligomer/monomer mixture.Type: GrantFiled: January 22, 1998Date of Patent: December 28, 1999Assignee: Kimberly-Clark Worldwide, Inc.Inventors: Ronald Sinclair Nohr, John Gavin MacDonald
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Patent number: 6008269Abstract: [Problem] To provide ultraviolet hardening type ink compositions with a temperature-sensitive color change property, which has both the hardening property and the printing strength of UV ink and also has an excellent light resistance.[Solution] Ultraviolet hardening type ink compositions comprising microcapsules with a temperature-sensitive color change property and a photopolymerization initiator, wherein said microcapsules contain no ultraviolet absorber and have the mean diameter of 0.5-50 .mu.m whereas said photopolymerization initiator comprises at least one of the compounds selected from ace tophenone type compounds and benzophenone type compounds.Type: GrantFiled: November 18, 1997Date of Patent: December 28, 1999Assignee: Matsui Shikiso Chemical Co., Ltd.Inventors: Yosuke Kitagawa, Ryuichi Hoshikawa
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Patent number: 5998496Abstract: A compound of the general formula:A-L.sup.+ D.sup.-where A is a moiety which absorbs radiation and enters an excited state in which it accepts an electron; D.sup.- is a moiety which donates an electron to the excited state A and releases a free radical; and L.sup.+ is a cationic linking group which tethers electron acceptor moiety A to electron donor moiety D.sup.-. Cationic linking moiety L.sup.+ has the formula:-L'-G-where L' is a moiety which forms a stable radical with acceptor moiety A upon transfer of an electron from donor moiety D.sup.- to electron acceptor moiety A, and G is a moiety which forms a leaving group upon transfer of the electron from donor moiety D.sup.- to acceptor moiety A.Type: GrantFiled: August 19, 1996Date of Patent: December 7, 1999Assignee: Spectra Group Limited, Inc.Inventors: Salah A. Hassoon, Ananda M. Sarker, Douglas C. Neckers
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Patent number: 5945462Abstract: The present invention relates to an aqueous-based coating composition for forming strippable, protective coating for protecting surfaces, such as glass, metal, ceramic, plastic or other materials of construction. More specifically, the compositions and coatings formed therefrom of this invention are particularly useful in connection with protecting precision surfaces, such as optical lenses, including but not limited to ophthalmic lenses, telescopic lenses, microscopic lenses, and the like, which protection is desirably only of a temporary nature.Type: GrantFiled: October 2, 1997Date of Patent: August 31, 1999Assignee: Loctite CorporationInventor: Peter A. Salamon
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Patent number: 5942371Abstract: Photopolymerisable compositions are described which comprisea) 20 to 80% by weight of a specific film-forming, acid group-containing acrylate of higher molecular weight which is neutralised with ammonia or an amine or an inorganic base, at least 10% by weight of component a) consisting of a acrylate of higher molecular weight which is derived from a reaction product of a polymolecular epoxy resin that is advanced with a bisphenol and an ethylenically unsaturated monocarboxylic acid and after subsequent reaction with a cyclic anhydride of an organic polycarboxylic acid,b) 0.1 to 15% by weight of a photoinitiator,c) 1 to 25% by weight of optional components, andd) water, as well ase) at least one additional optional (meth)acrylate monomer or (meth)acrylate oligomer or a vinyl compound that can be crosslinked with light.The compositions contain no additional polymolecular polymer binders and which can be used as aqueous applicable photoresist compositions, preferably for coating printed circuit boards.Type: GrantFiled: September 13, 1996Date of Patent: August 24, 1999Assignee: Ciba Specialty Chemicals Corp.Inventors: Roger Pierre-Elie Salvin, Martin Roth
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Patent number: 5939465Abstract: A photopolymerizable composition comprises (i) a compound represented by formula (I): ##STR1## wherein R.sup.1 and R.sup.2 each independently represents a hydrogen atom, a cyano group, a substituted carbonyl group, a substituted or unsubstituted, alkyl group, aryl group, alkenyl group, or alkynyl group; R.sup.3, R.sup.4 and R.sup.5 each independently represents a substituted or unsubstituted, alkyl group, aryl group, alkenyl group, or alkynyl group; Z represents a nonmetallic atom group necessary for forming a heterocyclic nucleus containing an N atom; n represents an integer of 0, 1 or 2; and G.sup.1 and G.sup.2 each independently represents a hydrogen atom, a cyano group, a substituted, carbonyl group, oxy group, amino group, thio group, sulfonyl group, sulfinyl group or an atomic group represented by formula (II) described in the specification, provided that G.sup.1 and G.sup.Type: GrantFiled: July 30, 1997Date of Patent: August 17, 1999Assignee: Fuji Photo Film Co., Ltd.Inventors: Kazuto Kunita, Yasuo Okamoto
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Patent number: 5910516Abstract: A photochromic cured product is produced by subjecting a photopolymerizable composition containing(A) a radical-polymerizable monomer,(B) an ultraviolet polymerization initiator having the main absorption in an ultraviolet region and a molar extinction coefficient at 400 nm of 150 lit./(mol.multidot.cm) or more, and(C) a photochromic compound, to an irradiation with an active energy ray having, as the main spectrum, an emission spectrum of 400 nm or more, to cure the composition, whereby the polymerization can be performed easily in a short time and a cured product having an excellent photochromic property can be obtained.Type: GrantFiled: January 23, 1997Date of Patent: June 8, 1999Assignee: Tokuyama CorporationInventors: Satoshi Imura, Toshihiro Nishitake
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Patent number: 5908873Abstract: A one-part, cured, radiation-curable liquid matrix composition for affixing coated and inked optical fibers in a ribbon configuration which is peelable from the coated and inked fibers without damage to the integrity of itself or the fibers is disclosed. The composition comprises an aliphatic urethane acrylate oligomer; a reactive monomer having one or more acrylate or methacrylate moieties; a release agent; and an optional photoinitiator. Also disclosed are an optical fiber ribbon array prepared therefrom; a process for removing such matrix composition from inked and coated fibers; a process for preparing such ribbon array; and a radiation-curable coating composition generally applicable for coating a substrate.Type: GrantFiled: December 20, 1995Date of Patent: June 1, 1999Assignee: Borden Chemicals, Inc.Inventor: Paul J. Shustack
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Patent number: 5824716Abstract: This invention relates to dicyclopentyl-oxyethyl methacrylate acrylic copolymer latices forming photocurable coalesced films and prepared by adding a photoinitiator to the latex, and which are useful for preparing lacquers and paints, particularly for building facades.Type: GrantFiled: July 19, 1996Date of Patent: October 20, 1998Assignee: Elf Atochem S.A.Inventors: Xavier Coqueret, Pierre Rousseau, Christophe Verge
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Patent number: 5821280Abstract: A process for producing a conductive composition for a biological electrode wherein casting or injection is preformed while maintaining the flowability of the feedstock solution to thereby enable the molding of the solid gel into a desired shape. A process for producing a conductive gel composition for a biological electrode having a function of electrically and physically connecting a living body to an electrode element and comprising at least the following components:(1) a radical-polymerizable unsaturated compound;(2) an acid reacting with NaOH or KOH to thereby give a reaction product which is a moisturizer serving as a plasticizer and having a function of supplementing and promoting the physiological humidifying function of the horny layer;(3) water;(4) NaOH and/or KOH;(5) a photopolymerization or light polymerization initiator; and(6) a crosslinking agent.Type: GrantFiled: July 26, 1996Date of Patent: October 13, 1998Assignee: Nihon Kohden CorporationInventors: Shin Suda, Toru Kurata, Toshihiro Fukai, Kenichiro Maeda
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Patent number: 5811505Abstract: An energy-polymerizable composition derived from ingredients comprising: a cyanate ester monomer or oligomer comprising an organic radical bonded through aromatic carbon atoms to at least two --OCN groups; a low molecular weight polyalkylene glycol; and an organometallic compound in which at least one carbon atom of an organic group is bonded to a metal atom. The composition can be cured by at least one of thermal energy, radiation, and accelerated particles, to produce a cured, homogeneous composition.Type: GrantFiled: December 17, 1997Date of Patent: September 22, 1998Assignee: Minnesota Mining and Manufacturing CompanyInventor: Fred B. McCormick
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Patent number: 5789459Abstract: A surface-coated vessel or a surface-coated product having a hard coating layer is obtained, by coating a substrate of, for example, resin product with a resin composition for hard coating which comprises(a) a poly?(meth)acryloyloxyalkyl! (iso)cyanurate represented by the following general formula (1) or (2): ##STR1## wherein X.sup.1, X.sup.2 and X.sup.3 are each an acryloyl group, methacryloyl group, hydrogen atom or an alkyl group, with a proviso that at least two of them are (meth)acryloyl groups, and R.sup.1, R.sup.2 and R.sup.3 are each an oxyalkylene group or a polyoxyalkylene group;(b) a poly(meth)acrylated polyoxyalkane polyol;(c) a photopolymerization initiator consisting of 2-methyl-1-?4-(methylthio)phenyl!-2-morpholino-1-propanone;(d) a photopolymerization initiator based on thioxanthone;(e) a UV-absorber based on monohydroxybenzophenone;(f) an organic solvent.Type: GrantFiled: August 22, 1997Date of Patent: August 4, 1998Assignee: Mitsui Petrochemical Industries, Ltd.Inventors: Hajime Inagaki, Koji Yoshii
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Patent number: 5773488Abstract: A method for hydrophilizing a hydrophobic plastic surface which exhibits a hydrophobic polymer that has hydrogens that bind to sp.sup.3 -hybridized carbon atoms, characterized by the steps of: (i) contacting the plastic surface with a liquid having dissolved therein (a) a hydrogen-abstracting UV-initiator and (b) a hydrophilic polymer which has one or more alkene groups; and (ii) irradiating the solution with UV light which activates the initiator.Type: GrantFiled: January 6, 1997Date of Patent: June 30, 1998Assignee: Amersham Pharmacia Biotech ABInventor: Klas Allmer
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Patent number: 5773531Abstract: A modified acrylic urethane prepolymer composition and an unsaturated polyester resin composition to which the prepolymer has been added. The prepolymer composition includes an acrylic urethane prepolymer prepared by the reaction of diisocyanate, like MDI, with an hydroxyl-containing acrylate monomer, such as a pentaerythritol triacrylate, which prepolymer composition may contain a styrene monomer and an inhibitor, such as benzoquinone, to retard the reaction of the prepolymer and styrene monomer prior to the addition of the prepolymer composition into the polyester resin composition. The employment of the modified urethane prepolymer composition provides for the reduction in the amount of styrene monomer used in the unsaturated resin composition and also provides for improved chemical and physical properties of the cured, unsaturated resin composition, such as a reduction in glass roll-out when the resin composition is employed with fiberglass.Type: GrantFiled: August 29, 1997Date of Patent: June 30, 1998Assignee: Hehr International Inc.Inventor: Stuart B. Smith
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Patent number: 5753720Abstract: The present invention relates to a hardenable organopolysiloxane composition having a viscosity of less than 30,000 Poise at 25.degree. C. comprising (A) 30 to 75 wt % of a silicone resin, (B) 70 to 25 wt % of a mercapto functional organopolysiloxane, (C) 0.1 to 10 parts by weight per 100 parts by weight of (A)+(B) of a mercapto functional organosilane, and (D) 0.01 to 10 parts by weight per 100 parts by weight of (A)+(B) of a condensation catalyst. The present invention also relates to an article of manufacture obtained by applying the hardenable organopolysiloxane composition to a substrate, exposing the composition and substrate to high energy radiation, and then applying a solid support to the coated substrate.Type: GrantFiled: January 31, 1997Date of Patent: May 19, 1998Assignee: Dow Corning Toray Silicone Co., Ltd.Inventors: Junji Nakanishi, Makoto Yoshitake
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Patent number: 5747172Abstract: Silicone release agents comprising propenyl-ether functionalized silicones exhibit a rapid cationic induce photo-cure. Such propenyl-ether functionalized silicones are synthesized by the hydrosilation of various .alpha.-allyloxy-.omega.-(1-propenoxy) alkanes with various linear and cyclic hydrogen functional siloxanes.Type: GrantFiled: August 30, 1995Date of Patent: May 5, 1998Assignee: General Electric CompanyInventor: James V. Crivello
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Patent number: 5744512Abstract: Compounds of the formulaRG--A--INwhereinIN is a photoinitiator basic structureA is a spacer group andRG is a functional reactive group can be employed as coreactive photoinitiators for photopolymerization of systems containing ethylenically unsaturated compounds.Type: GrantFiled: March 20, 1996Date of Patent: April 28, 1998Assignee: Ciba Specialty Chemicals CorporationInventors: Manfred Kohler, Jorg Ohngemach, Eike Poetsch, Rudolf Eidenschink, Gerhard Greber, Dieter Dorsch, Jurgen Gehlhaus, Konrad Dorfner, Hans Ludwig Hirsch
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Patent number: 5721291Abstract: The invention relates to a composition based on crosslinkable epoxy-functional organopolysiloxanes. This composition comprises:A. at least 10% by weight of a linear polyorganosiloxane A (POS) of average general formula (II): ##STR1## in which: R.sub.1 is CH.sub.3, R' is an alkylene containing 2 to 50 C, R is an alkyl having from 6 to 26 C, X is R.sub.1, H, --R'-epoxy or hydroxyl, x=40-150, t=3-9, z=0-5 and y=0,B. at least one second crosslinkable epoxy-functional POS (B), B being present in the proportion of at most 90% by weight and corresponding to: B(a) with x=160-1000, t=1-15, z=0-5 and y=0, B(b) with x=0-120, t=10-30, z=0-5 and y=0, or B(c) with x=0-200, t=0-5, z=0-5 and y=10-90,C. and at least one photoinitiator.This composition can be used in the manufacture of protectors for adhesive bodies ("release liners"), papers or plastics or of liner-free self-adhesive labels.Type: GrantFiled: February 20, 1996Date of Patent: February 24, 1998Assignee: Rhone-Poulenc ChimieInventors: Eric Gaulle, Christian Priou, Andre Soldat
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Patent number: 5721287Abstract: A method of mutating a colorant in a composition which includes a colorant and a radiation transorber by irradiating the composition. The colorant, in the presence of the radiation transorber, is adapted, upon exposure of the transorber to specific, narrow bandwidth radiation, to be mutable. The radiation transorber also imparts light-stability to the colorant so that the colorant does not fade when exposed to sunlight or artificial light.Type: GrantFiled: June 5, 1995Date of Patent: February 24, 1998Assignee: Kimberly-Clark Worldwide, Inc.Inventors: Ronald Sinclair Nohr, John Gavin MacDonald
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Patent number: 5709955Abstract: An adhesive composition, a laminated structure, and a method of laminating a structure. The adhesive composition comprises an admixture of unsaturated polymerizable material and a photoreactor, the photoreactor comprising a wavelength-specific sensitizer covalently bonded to a reactive species-generating photoinitiator. Suitable wavelength-specific sensitizers have a molar extinction coefficient greater than about 5000 liters per mole per cm at an absorption maximum and resulting photoreactors have a quantum yield of greater than about 0.5 at an absorption maximum. Suitable photoreactors include 2-?p-(2-methyllactoyl)phenoxy!ethyl-1,3-dioxo-2-isoindolineacetate, 2-hydroxy-2-methyl-4'-?2-?p-(3-oxobutyl)phenoxy!ethoxy!propiophenone, 4-?p-?(4-benzoylcyclohexyl)oxy!phenyl!-2-butanone, and 1,3-dioxo-2-isoindolineacetic acid diester with 2-hydroxy-4'-(2-hydroxyethoxy)-2-methylpropiophenone.Type: GrantFiled: October 16, 1996Date of Patent: January 20, 1998Assignee: Kimberly-Clark CorporationInventors: Ronald Sinclair Nohr, John Gavin MacDonald
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Patent number: 5708047Abstract: A method for decorating a substrate with hot stamping foil comprising the steps of:a) applying an ink composition comprised of a cationically radiation cured cycloaliphatic epoxide to the substrate in a predetermined design, said ink being operable when cured to bond to the substrate,b) curing the ink on the substrate by exposing to the radiation by which it is curable, thereby bonding the ink composition to the substrate,c) pressing a sheet of hot stamping foil against the substrate with a die heated to a temperature sufficient to cause a portion of the hot stamping foil to adhere to the heated, cured ink design but not to the ink-free areas of the substrate, andd) removing the die, thereby leaving behind a portion of the foil adhered to the ink design.Type: GrantFiled: December 30, 1994Date of Patent: January 13, 1998Assignee: Revlon Consumer Products CorporationInventors: Melvin Edwin Kamen, Bhupendra Patel
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Patent number: 5698285Abstract: An adhesive for use in producing an optical disk comprising two transparent substrates bonded to each other with a photocurable adhesive at respective bonding surfaces thereof and having an information recording layer formed on one or both of the bonding surfaces is disclosed, which is a composition comprising ingredient (A) shown below and a photopolymerization initiator comprising ingredient (B) and/or ingredient (C) shown below:(A) a radical-polymerizable vinyl compound,(B) an acylphosphine oxide compound represented by the general formula ##STR1## and (C) an .alpha.-aminoacetophenone compound represented by the following formula. ##STR2## With this adhesive, optical disk substrates having an extremely low light transmittance can be easily bonded to each other in a short time period without impairing their appearance.Type: GrantFiled: October 16, 1996Date of Patent: December 16, 1997Assignee: Three Bond Co., Ltd.Inventor: Kazuhiro Kojima
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Patent number: 5686503Abstract: A method of generating reactive species which includes exposing a polymolecular photoreactor to radiation, in which the polymolecular photoreactor comprises a wavelength-specific sensitizer associated with a reactive species-generating photoinitiator. The sensitizer absorbs energy and transfers the absorbed energy to the photoinitiator which, in turn, generates reactive species. The wavelength-specific sensitizer is adapted to have an absorption wavelength band generally corresponding to an emission peak of the radiation. The radiation to which the polymolecular photoreactor is exposed generally will have a wavelength of from about 4 to about 1,000 nanometers. Thus, the radiation may be ultraviolet radiation, including near ultraviolet and far or vacuum ultraviolet radiation: visible radiation: and near infrared radiation. Desirably, the radiation will have a wavelength of from about 100 to about 900 nanometers.Type: GrantFiled: January 22, 1996Date of Patent: November 11, 1997Assignee: Kimberly-Clark CorporationInventors: Ronald Sinclair Nohr, John Gavin MacDonald
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Patent number: 5629356Abstract: Compounds of the formula I, II, III and IIIa ##STR1## in which Ar.sup.1 is an unsubstituted or substituted aromatic radical and at least one of the radicals R.sup.1 and R.sup.2 is an alkenyl, cycloalkenyl or arylmethyl group, are effective photoinitiators for photopolymerization of unsaturated compounds. They are particularly suitable for photocuring of pigmented systems.Type: GrantFiled: March 12, 1996Date of Patent: May 13, 1997Assignee: Ciba Geigy CorporationInventors: Vincent Desobry, Kurt Dietliker, Rinaldo H usler, Werner Rutsch, Manfred Rembold, Franciszek Sitek
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Patent number: 5561029Abstract: The present invention sets forth the incorporation of a substituted 2-phenyl-4,6-bis (trichloromethyl)-1,3,5-triazine in photoresists of lithographic printing plates for the purpose of promoting their shelf-life, room light stability, and developability. The present invention provides a photocurable composition comprising at least a photopolymerizable ethylenically unsaturated monomer having at least one terminal ethylenic group and capable of forming a polymer upon exposure to actinic radiation; and an s-triazine capable of initiating free radical polymerization of the photopolymerizable ethylenically unsaturated monomer and being represented by the following general formula [I]: ##STR1## wherein R.sub.1 is either OR.sub.4 or NR.sub.5 R.sub.6, wherein R.sub.5 and R.sub.6 may or may not be identical with each other, either R.sub.5 or R.sub.6 may represent hydrogen, and wherein R.sub.4 and at least one of R.sub.5 and R.sub.Type: GrantFiled: April 28, 1995Date of Patent: October 1, 1996Assignee: Polaroid CorporationInventors: Maurice J. Fitzgerald, Frederick R. Kearney, Rong-Chang Liang, William C. Schwarzel, Donna J. Guarrera, John M. Hardin, John C. Warner
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Patent number: 5554663Abstract: Compounds of the formula I, II, III and IIIa ##STR1## in which Ar.sup.1 is an unsubstituted or substituted aromatic radical and at least one of the radicals R.sup.1 and R.sup.2 is an alkenyl, cycloalkenyl or arylmethyl group, are effective photoinitiators for photopolymerization of unsaturated compounds. They are particularly suitable for photocuring of pigmented systems.Type: GrantFiled: June 6, 1995Date of Patent: September 10, 1996Assignee: Ciba-Geigy CorporationInventors: Vincent Desobry, Kurt Dietliker, Rinaldo H usler, Werner Rutsch, Manfred Rembold, Franciszek Sitek
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Patent number: 5534629Abstract: Compounds of the formula I, II, III and IIIa ##STR1## in which Ar.sup.1 is an unsubstituted or substituted aromatic radical and at least one of the radicals R.sup.1 and R.sup.2 is an alkenyl, cycloalkenyl or arylmethyl group, are effective photoinitiators for photopolymerization of unsaturated compounds. They are particularly suitable for photocuring of pigmented systems.Type: GrantFiled: May 1, 1995Date of Patent: July 9, 1996Assignee: Ciba-Geigy CorporationInventors: Vincent Desobry, Kurt Dietliker, Rinaldo Husler, Werner Rutsch, Manfred Rembold, Franciszek Sitek
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Patent number: 5532112Abstract: Compounds of the formulaRG--A--INwhereinIN is a photoinitiator basic structureA is a spacer group andRG is a functional reactive groupcan be employed as coreactive photoinitiators for photopolymerization of systems containing ethylenically unsaturated compounds.Type: GrantFiled: June 2, 1994Date of Patent: July 2, 1996Assignee: Ciba-Geigy CorporationInventors: Manfred Kohler, Jorg Ohngemach, Eike Poetsch, Rudolf Eidenschink, Gerhard Greber, Dieter Dorsch, Jurgen Gehlhaus, Konrad Dorfner, Hans L. Hirsch
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Patent number: 5527925Abstract: Compounds of formula I: ##STR1## are disclosed. The compounds are photoinitiators which can be functionalized by means of ethylenic groups or can be bonded to H-active substances, in order, for example, to modify surfaces by means of photopolymerizable substances. The compounds are especially useful in the manufacture of contact lenses.Type: GrantFiled: June 24, 1994Date of Patent: June 18, 1996Assignee: Ciba-Geigy CorporationInventors: Peter Chabrecek, Dieter Lohmann
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Patent number: 5516812Abstract: A radiation and moisture curable silicone conformal coating composition comprises a silicone fluid of a monovalent ethylenically unsaturated functional group endcapped silicone and at least one (meth)acryl-functionalized silicone; and a photoinitiator effective for radiation curing of the silicone composition. The encapped silicone is the product of a reaction between a silanol terminated silicone and a silane cross linker having joined directly to a silicon atom thereof a monovalent ethylenically unsaturated functional group and at least 2 hydrolyzable groups.Type: GrantFiled: August 1, 1994Date of Patent: May 14, 1996Assignee: Loctite CorporationInventors: Hsien K. Chu, Robert P. Cross, Lester D. Bennington
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Patent number: 5512607Abstract: This invention provides a photosensitive resin composition which can be developed using water and can form a resist layer having superior hardness, adhesion and water resistance.The photosensitive resin composition of the present invention is characterized by containing an unsaturated epoxyester compound prepared by esterifying some of the epoxy side groups of an unsaturated epoxyester compound, and then reacting the remained epoxy groups of the epoxyester compound with a tertiary amine and acid component, such as phosphoric acid, a monoester of phosphoric acid or a diester of phosphoric acid or combination thereof, to convert the epoxy groups into quaternary ammonium salt groups having phosphate anions.Type: GrantFiled: June 6, 1995Date of Patent: April 30, 1996Assignee: W. R. Grace & Co.-Conn.Inventors: Keiichi Kinashi, Hiroshi Samukawa, Reiko Chiba
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Patent number: 5482816Abstract: A radiation-sensitive composition comprising (A) a polymer having a recurring unit represented by formula (1): ##STR1## wherein R.sup.1 represents a substituted methyl group, a substituted ethyl group, a silyl group, a germyl group or an alkoxycarbonyl group, and R.sup.2 represents --OR.sup.3 or --NR.sup.4 R.sup.5 in which R.sup.3 is a hydrogen atom, a straight-chain alkyl group, a cyclic alkyl group, an aryl group, an aralkyl group, a substituted methyl group, a substituted ethyl group, a silyl group, a germyl group or an alkoxycarbonyl group, and R.sup.4 and R.sup.5, which may be the same or different, are hydrogen atoms, straight-chain alkyl groups, cyclic alkyl groups, aralkyl groups or aryl groups, and (B) a radiation-sensitive acid forming agent.Type: GrantFiled: June 21, 1994Date of Patent: January 9, 1996Assignee: Japan Synthetic Rubber Co., Ltd.Inventors: Makoto Murata, Mikio Yamachika, Yoshiji Yumoto, Takao Miura
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Patent number: 5412002Abstract: An epoxy resin composition contains an epoxy resin represented by the formula (I) and a curing accelerator: ##STR1## wherein R.sup.1 stands for ##STR2## where G stands for a glycidyl group, R.sup.2 stands for an alkyl group having 1 to 4 carbon atoms, R.sup.3 and R.sup.4 stand for the same or different groups and each denote a hydrogen atom or a glycidyl group, m and x each denote an integer of 0 to 10, n denotes an integer of 0 to 2, provided that m.gtoreq.x and, if m=0, then x=0, in which case at least one of R.sup.3 and R.sup.4 denotes a glycidyl group on the condition that when m.gtoreq.1 and m>x, R.sup.1 may each stand for different groups.Type: GrantFiled: December 9, 1992Date of Patent: May 2, 1995Assignee: Nippon Oil Co., Ltd.Inventors: Masami Enomoto, Susumu Kubota, Hitoshi Yuasa, Fumiaki Oshimi, Yutaka Otsuki
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Patent number: 5378734Abstract: A UV and moisture-curable organopolysiloxane composition comprising (i) an organopolysiloxane terminated with a radical of formula (1): ##STR1## wherein R.sup.1 is a hydrogen atom or monovalent hydrocarbon radical, each of R.sup.2 and R.sup.3 is a divalent hydrocarbon radical which may contain a NH bond or ether bond, each of R.sup.4 and R.sup.5 is a monovalent hydrocarbon radical which may contain an ether bond, and a is equal to 0 or 1, (ii) a photo-polymerization initiator, and (iii) a curing catalyst. The composition readily cures either upon exposure to UV radiation or upon contact with moisture and from the surface to the deep interior within a short time, yielding cured products having satisfactory physical properties.Type: GrantFiled: August 27, 1993Date of Patent: January 3, 1995Assignee: Shin-Etsu Chemical Company, Ltd.Inventor: Yoshio Inoue
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Patent number: 5362603Abstract: The present invention relates to a photopolymerizable composition containing a photopolymerizable compound having at least one ethylenically unsaturated double bond, a photopolymerization initiator, a pigment and optionally another resin, wherein said photopolymerizable compound contained therein comprises not less than 60%.Type: GrantFiled: February 24, 1993Date of Patent: November 8, 1994Assignee: Nippon Kayaku Kabushiki KaishaInventors: Yoshinori Katoh, Naoko Ichinose, Teruhito Sotogoshi