Containing Nitrogen Patents (Class 522/39)
  • Patent number: 6171756
    Abstract: Organic photoprecursors of amines are provided for use in photosensitive imaging systems, finding particular application in the preparation of lithographic printing plates. Said photoprecursors generate free amines on exposure to long wavelength UV or visible radiation, have high solubility in organic solvents, and include photolabile 2-nitrobenzyl functional groups. Methods for the synthesis of the photoprecursors are described, and the use of the said photoprecursors for the production of printing plates using both positive working and negative working techniques are discussed.
    Type: Grant
    Filed: December 22, 1998
    Date of Patent: January 9, 2001
    Assignee: Afga-Gevaert, N.V.
    Inventors: Maria de Lurdes dos Santos Cristiano, John Kynaston Davies, Sharon Dowd, Robert Alexander Walker Johnstone, Michael John Pratt, John Robert Wade
  • Patent number: 6156816
    Abstract: A substantially water-free, water-washable, energy-curable composition includes an epoxy oligomer and/or urethane oligomer having at least two ethylenically unsaturated moieties, at least one alkoxylated polyol monomer having at least two ethylenically unsaturated moieties and capable of being copolymerized with the oligomer, and a surface active agent capable of being integrated into the molecular structure of the cured polymer and further capable of rendering the uncured composition dispersible in water. Optionally, the composition can contain a photoinitiator. The composition is self-dispersible in water and is especially suitable for use as a coating material for a printing screen.
    Type: Grant
    Filed: August 20, 1998
    Date of Patent: December 5, 2000
    Assignee: Henkel Corporation
    Inventor: Marie-Esther Saint Victor
  • Patent number: 6130269
    Abstract: A thermosetting pressure-sensitive adhesive comprising a photopolymerization product of a composition containing a) 100 parts by weight of a (meth) acrylic acid alkyl ester wherein the average carbon atom number of the alkyl group is from 2 to 14 and from 30 to 1% by weight of a monoethylenically unsaturated acid copolymerizable with the ester, b) from 0.02 to 5 parts by weight of a polyfunctional (meth)acrylate as a crosslinking agent, c) from 0.01 to 4 parts by weight of a photopolymerization initiator, and d) from 5 to 30 parts by weight of an epoxy resin, and not substantially containing a curing agent for the epoxy resin, and an adhesive sheet using the thermosetting type pressure-sensitive adhesive.
    Type: Grant
    Filed: November 24, 1998
    Date of Patent: October 10, 2000
    Assignee: Nitto Denko Corporation
    Inventors: Kazuhito Hosokawa, Shigeki Muta, Hitoshi Takahira, Takao Yoshikawa
  • Patent number: 6127445
    Abstract: The present invention relates to anionic photoinitiator compounds, compositions containing them, and methods of using them having the structure: ##STR1## wherein X and Y are independently selected from the group consisting of a direct single bond and --C(.dbd.O)--, wherein at least one of X and Y is --C(.dbd.O)--;R.sup.1 and R.sup.2 are independently selected from the group consisting of H and substituted phenyl, wherein both R.sup.1 and R.sup.2 are not H;and wherein neither --X--R.sup.1 nor --Y--R.sup.2 is --C(.dbd.O)H. The anionic photoinitiators have improved storage stability, without loss of photosensitivity, even when stored with polymerizable or crosslinkable monomer, oligomer, or crosslinkable polymer species.
    Type: Grant
    Filed: November 3, 1998
    Date of Patent: October 3, 2000
    Assignee: The University of Georgia Research Foundation, Inc.
    Inventors: Charles R. Kutal, Yoshikazu Yamaguchi
  • Patent number: 6124371
    Abstract: The invention relates to a composition comprising polymerizable material and an anionic photocatalyst. The photocatalyst is a photolabile compound able to liberate a strong base having a pK.sub.a .gtoreq.12. The catalyst can be illustrated by the structural formula Z-A wherein Z is a photolabile group and A is a strong base, for example, a nitrogen containing compound such as, a secondary amine, a guanidine or amidine and Z is covalently bound to A.
    Type: Grant
    Filed: August 21, 1998
    Date of Patent: September 26, 2000
    Assignee: DSM N.V.
    Inventors: Dirk A. W. Stanssens, Johan F. G. A. Jansen
  • Patent number: 6114406
    Abstract: A UV-curable ink jet composition comprises a polyfunctional alkoxylated or polyalkoxylated acrylate monomer (80% to 95% by weight), a photoinitiator (e.g. from 1 to 15% by weight) and preferably a colorant (e.g. 1% to 10% by weight).
    Type: Grant
    Filed: December 3, 1998
    Date of Patent: September 5, 2000
    Assignee: Coates Brothers PLC
    Inventors: Nigel Antony Caiger, Hartley David Selman
  • Patent number: 6090236
    Abstract: A method of generating reactive species which includes exposing a polymolecular photoreactor to radiation, in which the polymolecular photoreactor comprises a wavelength-specific sensitizer associated with a reactive species-generating photoinitiator. The sensitizer absorbs energy and transfers the absorbed energy to the photoinitiator which in turn, generates reactive species. The wavelength-specific sensitizer is adapted to have an absorption wavelength band generally corresponding to an emission peak of the radiation. The radiation to which the polymolecular photoreactor is exposed generally will have a wavelength of from about 4 to about 1,000 nanometers. Thus, the radiation may be ultraviolet radiation, including near ultraviolet and far or vacuum ultraviolet radiation: visible radiation: and near infrared radiation. Desirably, the radiation will have a wavelength of from about 100 to about 900 nanometers.
    Type: Grant
    Filed: December 31, 1997
    Date of Patent: July 18, 2000
    Assignee: Kimberly-Clark Worldwide, Inc.
    Inventors: Ronald Sinclair Nohr, John Gavin MacDonald
  • Patent number: 6087412
    Abstract: The invention relates to crosslinked polymers, which are polymerisation products of a polymerisable mixture that comprises the following components:a) a macromer of formula C ##STR1## wherein Macro is an m-valent radical of a macromer from which the number m of groups Rx.sub.x --H has been removed,each R.sub.x, independently of the others, is a bond, --O--, --NR.sub.N -- or --S-- wherein R.sub.N is hydrogen or lower alkyl,PI* is a bivalent radical of a photoinitiator,R.sub.aa is the moiety of a photoinitiator that forms the less reactive free radical on cleavage of the photoinitiator, andm is an integer from 1 to 100,b) a copolymerisable vinyl monomer andc) a copolymerisable crosslinker.The polymers are suitable especially for the production of mouldings, such as for contact lenses.
    Type: Grant
    Filed: September 12, 1997
    Date of Patent: July 11, 2000
    Assignee: Novartis AG
    Inventors: Peter Chabrecek, Dieter Lohmann, Kurt Dietliker
  • Patent number: 6071979
    Abstract: A method of generating reactive species which includes exposing a wavelength specific photoreactor to radiation, in which the wavelength specific photoreactor comprises a wavelength-specific sensitizer associated with one or more reactive species-generating photoinitiators. Also described are methods of polymerizing unsaturated monomers and curing an unsaturated oligomer/monomer mixture.
    Type: Grant
    Filed: December 26, 1997
    Date of Patent: June 6, 2000
    Assignee: Kimberly-Clark Worldwide, Inc.
    Inventors: John Gavin MacDonald, Ronald Sinclair Nohr
  • Patent number: 6066435
    Abstract: A photosensitive composition which is liquid at room temperature and which comprisesa) 18 to 22% by weight of a binder polymer based on a styrene-maleic anhydride halfester copolymer,b) 10 to 15% by weight of at least one photocurable acrylate compound,c) 0.1 to 10% by weight of a photoinitiator, andd) 45 to 70% by weight of a propylene glycol halfester or propylene glycol halfester, the sum of the components a) to d) being 100% by weight,is suitable for the production of photostructured objects, preferably for the production of telephone cards.
    Type: Grant
    Filed: May 11, 1998
    Date of Patent: May 23, 2000
    Assignee: CIBA Specialty Chemicals Corp.
    Inventor: Kurt Munk
  • Patent number: 6057380
    Abstract: Compounds of formula I, II or III ##STR1## X is a divalent radical; Y is C.sub.1 -C.sub.6 aklylene, cyclohexylene or a direct bond;Ar.sub.1 is an aromatic radical as defined in claim 1,R.sub.1 and R.sub.2 are each independently the other, inter alia, a radical of formula ##STR2## in which p is zero or 1, or a radical of formula ##STR3## R.sub.3 is, inter alia, hydrogen, C.sub.1 -C.sub.12 alkyl, C.sub.5 -C.sub.12 cycloalkyl or phenyl-C.sub.1 -C.sub.3 alkyl;R.sub.4 is, inter alia, C.sub.1 -C.sub.12 cycloalkyl, phenyl-C.sub.1 -C.sub.3 alkyl or phenyl;or an acid addition salt of a compound of formula I, II or III;are useful as photosensitive base catalysts in base crosslinking compositions.
    Type: Grant
    Filed: December 5, 1997
    Date of Patent: May 2, 2000
    Assignee: Ciba Specialty Chemicals Corporation
    Inventors: Jean-Luc Birbaum, Martin Kunz, Akira Kimura, Hisatoshi Kura, Hidetaka Oka, Hiroko Nakashima
  • Patent number: 6048653
    Abstract: The present invention provides a polymerizable composition for a color filter, which comprises a (meth)acrylate copolymer containing alicyclic (meth)acryloyl groups in its side chains, a compound having at least one ethylenically unsaturated double bond, a photopolymerization initiator and a colorant, a color filter obtained by coating the composition on a glass substrate, followed by exposure and development; and a method for producing a color filter, which comprises coating the composition on a glass substrate, followed by exposure and development.The polymerizable composition of the present invention is highly sensitive and excellent in chemical resistance. Accordingly, according to the present invention, it is possible to produce a color filter of a high quality without a protective layer such as an oxygen-shielding film.
    Type: Grant
    Filed: January 21, 1998
    Date of Patent: April 11, 2000
    Assignee: Mitsubishi Chemical Corporation
    Inventors: Tameichi Ochiai, Ryuichiro Takasaki, Noriko Endou, Yuzuru Chika
  • Patent number: 6031044
    Abstract: A polyurethane which is substantially self-dispersible in water and is obtainable by reactinga) at least one polyisocyanate withb) at least one polyol andc) at least one photoinitiator of the general formula I ##STR1## where R is a radical of the formula II ##STR2## or is --CR.sup.7 R.sup.8 R.sup.9, P(.dbd.O)(R.sup.10).sub.2 or SO.sub.2 R.sup.11,the number-average molecular weight M.sub.n of the polyurethane being greater than 2700, and its use. The invention also relates to aqueous polyurethane resin dispersions and coating compositions comprising the novel polyurethanes, and to their use.
    Type: Grant
    Filed: December 18, 1997
    Date of Patent: February 29, 2000
    Assignee: BASF Aktiengesellschaft
    Inventors: Nicolas Kokel, Harald Larbig, Klaus Menzel, Erich Beck, Wolfgang Reich, Guido Voit
  • Patent number: 6022906
    Abstract: Compounds of the formulae I, II, III and IV ##STR1## wherein Ar for example is a phenyl, biphenyl or benzoylphenyl group, which is unsubstituted or substituted; Ar.sub.1, for example, has the same meanings as Ar; Ar.sub.2 is inter alia phenyl; X may be a direct bond; Y hydrogen, etc.; R.sub.1 and R.sub.2 for example C.sub.1 -C.sub.8 alkyl; R.sub.3 inter alia hydrogen or C.sub.1 -C.sub.12 alkyl; R.sub.4 is inter alia C.sub.1 -C.sub.12 alkyl; or R.sub.3 and R.sub.4 together are C.sub.3 -C.sub.7 alkylene; R.sub.5 is for example C.sub.1 -C.sub.6 alkylene; and Z is a divalent radical; provided that at least one of the radicals Ar, Ar.sub.1, Ar.sub.2, Ar.sub.3, R.sub.1, R.sub.2, R.sub.3, R.sub.4, R.sub.5 or Y is substituted by 1 to 5 SH groups, or provided that Y contains at least one --SS-- group, are photoinitiators for the polymerization of ethylenically unsaturated compounds.
    Type: Grant
    Filed: December 1, 1997
    Date of Patent: February 8, 2000
    Assignee: Ciba Specialty Chemicals Corporation
    Inventors: Masaki Ohwa, Hitoshi Yamoto, Jean-Luc Birbaum, Hiroko Nakashima, Akira Matsumoto, Hidetaka Oka
  • Patent number: 6010821
    Abstract: Water coatable and water developable negative-acting color proofing single sheet and overlay systems are described. The water-soluble photosensitive color layer employed in each type of proofing construction includes a photopolymerizable polymer having a weight-average molecular weight between 5,000 and 100,000; an alkaline soluble resin having a weight-average molecular weight between 1,000 and 200,000 and an acid number between 50 and 300; and a water-soluble photoinitiator.
    Type: Grant
    Filed: May 23, 1997
    Date of Patent: January 4, 2000
    Assignee: Minnesota Mining and Manufacturing Company
    Inventors: Gordon Christopher Smith, Hamid Barjesteh, James Alan Bonham
  • Patent number: 6008268
    Abstract: A method of generating reactive species which includes exposing a photoreactor composition to radiation, in which the photoreactor composition comprises a wavelength-specific sensitizer associated with one or more reactive species-generating photoinitiators. Also described are methods of polymerizing unsaturated monomers and curing an unsaturated oligomer/monomer mixture.
    Type: Grant
    Filed: January 22, 1998
    Date of Patent: December 28, 1999
    Assignee: Kimberly-Clark Worldwide, Inc.
    Inventors: Ronald Sinclair Nohr, John Gavin MacDonald
  • Patent number: 6008269
    Abstract: [Problem] To provide ultraviolet hardening type ink compositions with a temperature-sensitive color change property, which has both the hardening property and the printing strength of UV ink and also has an excellent light resistance.[Solution] Ultraviolet hardening type ink compositions comprising microcapsules with a temperature-sensitive color change property and a photopolymerization initiator, wherein said microcapsules contain no ultraviolet absorber and have the mean diameter of 0.5-50 .mu.m whereas said photopolymerization initiator comprises at least one of the compounds selected from ace tophenone type compounds and benzophenone type compounds.
    Type: Grant
    Filed: November 18, 1997
    Date of Patent: December 28, 1999
    Assignee: Matsui Shikiso Chemical Co., Ltd.
    Inventors: Yosuke Kitagawa, Ryuichi Hoshikawa
  • Patent number: 5998496
    Abstract: A compound of the general formula:A-L.sup.+ D.sup.-where A is a moiety which absorbs radiation and enters an excited state in which it accepts an electron; D.sup.- is a moiety which donates an electron to the excited state A and releases a free radical; and L.sup.+ is a cationic linking group which tethers electron acceptor moiety A to electron donor moiety D.sup.-. Cationic linking moiety L.sup.+ has the formula:-L'-G-where L' is a moiety which forms a stable radical with acceptor moiety A upon transfer of an electron from donor moiety D.sup.- to electron acceptor moiety A, and G is a moiety which forms a leaving group upon transfer of the electron from donor moiety D.sup.- to acceptor moiety A.
    Type: Grant
    Filed: August 19, 1996
    Date of Patent: December 7, 1999
    Assignee: Spectra Group Limited, Inc.
    Inventors: Salah A. Hassoon, Ananda M. Sarker, Douglas C. Neckers
  • Patent number: 5945462
    Abstract: The present invention relates to an aqueous-based coating composition for forming strippable, protective coating for protecting surfaces, such as glass, metal, ceramic, plastic or other materials of construction. More specifically, the compositions and coatings formed therefrom of this invention are particularly useful in connection with protecting precision surfaces, such as optical lenses, including but not limited to ophthalmic lenses, telescopic lenses, microscopic lenses, and the like, which protection is desirably only of a temporary nature.
    Type: Grant
    Filed: October 2, 1997
    Date of Patent: August 31, 1999
    Assignee: Loctite Corporation
    Inventor: Peter A. Salamon
  • Patent number: 5942371
    Abstract: Photopolymerisable compositions are described which comprisea) 20 to 80% by weight of a specific film-forming, acid group-containing acrylate of higher molecular weight which is neutralised with ammonia or an amine or an inorganic base, at least 10% by weight of component a) consisting of a acrylate of higher molecular weight which is derived from a reaction product of a polymolecular epoxy resin that is advanced with a bisphenol and an ethylenically unsaturated monocarboxylic acid and after subsequent reaction with a cyclic anhydride of an organic polycarboxylic acid,b) 0.1 to 15% by weight of a photoinitiator,c) 1 to 25% by weight of optional components, andd) water, as well ase) at least one additional optional (meth)acrylate monomer or (meth)acrylate oligomer or a vinyl compound that can be crosslinked with light.The compositions contain no additional polymolecular polymer binders and which can be used as aqueous applicable photoresist compositions, preferably for coating printed circuit boards.
    Type: Grant
    Filed: September 13, 1996
    Date of Patent: August 24, 1999
    Assignee: Ciba Specialty Chemicals Corp.
    Inventors: Roger Pierre-Elie Salvin, Martin Roth
  • Patent number: 5939465
    Abstract: A photopolymerizable composition comprises (i) a compound represented by formula (I): ##STR1## wherein R.sup.1 and R.sup.2 each independently represents a hydrogen atom, a cyano group, a substituted carbonyl group, a substituted or unsubstituted, alkyl group, aryl group, alkenyl group, or alkynyl group; R.sup.3, R.sup.4 and R.sup.5 each independently represents a substituted or unsubstituted, alkyl group, aryl group, alkenyl group, or alkynyl group; Z represents a nonmetallic atom group necessary for forming a heterocyclic nucleus containing an N atom; n represents an integer of 0, 1 or 2; and G.sup.1 and G.sup.2 each independently represents a hydrogen atom, a cyano group, a substituted, carbonyl group, oxy group, amino group, thio group, sulfonyl group, sulfinyl group or an atomic group represented by formula (II) described in the specification, provided that G.sup.1 and G.sup.
    Type: Grant
    Filed: July 30, 1997
    Date of Patent: August 17, 1999
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Kazuto Kunita, Yasuo Okamoto
  • Patent number: 5910516
    Abstract: A photochromic cured product is produced by subjecting a photopolymerizable composition containing(A) a radical-polymerizable monomer,(B) an ultraviolet polymerization initiator having the main absorption in an ultraviolet region and a molar extinction coefficient at 400 nm of 150 lit./(mol.multidot.cm) or more, and(C) a photochromic compound, to an irradiation with an active energy ray having, as the main spectrum, an emission spectrum of 400 nm or more, to cure the composition, whereby the polymerization can be performed easily in a short time and a cured product having an excellent photochromic property can be obtained.
    Type: Grant
    Filed: January 23, 1997
    Date of Patent: June 8, 1999
    Assignee: Tokuyama Corporation
    Inventors: Satoshi Imura, Toshihiro Nishitake
  • Patent number: 5908873
    Abstract: A one-part, cured, radiation-curable liquid matrix composition for affixing coated and inked optical fibers in a ribbon configuration which is peelable from the coated and inked fibers without damage to the integrity of itself or the fibers is disclosed. The composition comprises an aliphatic urethane acrylate oligomer; a reactive monomer having one or more acrylate or methacrylate moieties; a release agent; and an optional photoinitiator. Also disclosed are an optical fiber ribbon array prepared therefrom; a process for removing such matrix composition from inked and coated fibers; a process for preparing such ribbon array; and a radiation-curable coating composition generally applicable for coating a substrate.
    Type: Grant
    Filed: December 20, 1995
    Date of Patent: June 1, 1999
    Assignee: Borden Chemicals, Inc.
    Inventor: Paul J. Shustack
  • Patent number: 5824716
    Abstract: This invention relates to dicyclopentyl-oxyethyl methacrylate acrylic copolymer latices forming photocurable coalesced films and prepared by adding a photoinitiator to the latex, and which are useful for preparing lacquers and paints, particularly for building facades.
    Type: Grant
    Filed: July 19, 1996
    Date of Patent: October 20, 1998
    Assignee: Elf Atochem S.A.
    Inventors: Xavier Coqueret, Pierre Rousseau, Christophe Verge
  • Patent number: 5821280
    Abstract: A process for producing a conductive composition for a biological electrode wherein casting or injection is preformed while maintaining the flowability of the feedstock solution to thereby enable the molding of the solid gel into a desired shape. A process for producing a conductive gel composition for a biological electrode having a function of electrically and physically connecting a living body to an electrode element and comprising at least the following components:(1) a radical-polymerizable unsaturated compound;(2) an acid reacting with NaOH or KOH to thereby give a reaction product which is a moisturizer serving as a plasticizer and having a function of supplementing and promoting the physiological humidifying function of the horny layer;(3) water;(4) NaOH and/or KOH;(5) a photopolymerization or light polymerization initiator; and(6) a crosslinking agent.
    Type: Grant
    Filed: July 26, 1996
    Date of Patent: October 13, 1998
    Assignee: Nihon Kohden Corporation
    Inventors: Shin Suda, Toru Kurata, Toshihiro Fukai, Kenichiro Maeda
  • Patent number: 5811505
    Abstract: An energy-polymerizable composition derived from ingredients comprising: a cyanate ester monomer or oligomer comprising an organic radical bonded through aromatic carbon atoms to at least two --OCN groups; a low molecular weight polyalkylene glycol; and an organometallic compound in which at least one carbon atom of an organic group is bonded to a metal atom. The composition can be cured by at least one of thermal energy, radiation, and accelerated particles, to produce a cured, homogeneous composition.
    Type: Grant
    Filed: December 17, 1997
    Date of Patent: September 22, 1998
    Assignee: Minnesota Mining and Manufacturing Company
    Inventor: Fred B. McCormick
  • Patent number: 5789459
    Abstract: A surface-coated vessel or a surface-coated product having a hard coating layer is obtained, by coating a substrate of, for example, resin product with a resin composition for hard coating which comprises(a) a poly?(meth)acryloyloxyalkyl! (iso)cyanurate represented by the following general formula (1) or (2): ##STR1## wherein X.sup.1, X.sup.2 and X.sup.3 are each an acryloyl group, methacryloyl group, hydrogen atom or an alkyl group, with a proviso that at least two of them are (meth)acryloyl groups, and R.sup.1, R.sup.2 and R.sup.3 are each an oxyalkylene group or a polyoxyalkylene group;(b) a poly(meth)acrylated polyoxyalkane polyol;(c) a photopolymerization initiator consisting of 2-methyl-1-?4-(methylthio)phenyl!-2-morpholino-1-propanone;(d) a photopolymerization initiator based on thioxanthone;(e) a UV-absorber based on monohydroxybenzophenone;(f) an organic solvent.
    Type: Grant
    Filed: August 22, 1997
    Date of Patent: August 4, 1998
    Assignee: Mitsui Petrochemical Industries, Ltd.
    Inventors: Hajime Inagaki, Koji Yoshii
  • Patent number: 5773488
    Abstract: A method for hydrophilizing a hydrophobic plastic surface which exhibits a hydrophobic polymer that has hydrogens that bind to sp.sup.3 -hybridized carbon atoms, characterized by the steps of: (i) contacting the plastic surface with a liquid having dissolved therein (a) a hydrogen-abstracting UV-initiator and (b) a hydrophilic polymer which has one or more alkene groups; and (ii) irradiating the solution with UV light which activates the initiator.
    Type: Grant
    Filed: January 6, 1997
    Date of Patent: June 30, 1998
    Assignee: Amersham Pharmacia Biotech AB
    Inventor: Klas Allmer
  • Patent number: 5773531
    Abstract: A modified acrylic urethane prepolymer composition and an unsaturated polyester resin composition to which the prepolymer has been added. The prepolymer composition includes an acrylic urethane prepolymer prepared by the reaction of diisocyanate, like MDI, with an hydroxyl-containing acrylate monomer, such as a pentaerythritol triacrylate, which prepolymer composition may contain a styrene monomer and an inhibitor, such as benzoquinone, to retard the reaction of the prepolymer and styrene monomer prior to the addition of the prepolymer composition into the polyester resin composition. The employment of the modified urethane prepolymer composition provides for the reduction in the amount of styrene monomer used in the unsaturated resin composition and also provides for improved chemical and physical properties of the cured, unsaturated resin composition, such as a reduction in glass roll-out when the resin composition is employed with fiberglass.
    Type: Grant
    Filed: August 29, 1997
    Date of Patent: June 30, 1998
    Assignee: Hehr International Inc.
    Inventor: Stuart B. Smith
  • Patent number: 5753720
    Abstract: The present invention relates to a hardenable organopolysiloxane composition having a viscosity of less than 30,000 Poise at 25.degree. C. comprising (A) 30 to 75 wt % of a silicone resin, (B) 70 to 25 wt % of a mercapto functional organopolysiloxane, (C) 0.1 to 10 parts by weight per 100 parts by weight of (A)+(B) of a mercapto functional organosilane, and (D) 0.01 to 10 parts by weight per 100 parts by weight of (A)+(B) of a condensation catalyst. The present invention also relates to an article of manufacture obtained by applying the hardenable organopolysiloxane composition to a substrate, exposing the composition and substrate to high energy radiation, and then applying a solid support to the coated substrate.
    Type: Grant
    Filed: January 31, 1997
    Date of Patent: May 19, 1998
    Assignee: Dow Corning Toray Silicone Co., Ltd.
    Inventors: Junji Nakanishi, Makoto Yoshitake
  • Patent number: 5747172
    Abstract: Silicone release agents comprising propenyl-ether functionalized silicones exhibit a rapid cationic induce photo-cure. Such propenyl-ether functionalized silicones are synthesized by the hydrosilation of various .alpha.-allyloxy-.omega.-(1-propenoxy) alkanes with various linear and cyclic hydrogen functional siloxanes.
    Type: Grant
    Filed: August 30, 1995
    Date of Patent: May 5, 1998
    Assignee: General Electric Company
    Inventor: James V. Crivello
  • Patent number: 5744512
    Abstract: Compounds of the formulaRG--A--INwhereinIN is a photoinitiator basic structureA is a spacer group andRG is a functional reactive group can be employed as coreactive photoinitiators for photopolymerization of systems containing ethylenically unsaturated compounds.
    Type: Grant
    Filed: March 20, 1996
    Date of Patent: April 28, 1998
    Assignee: Ciba Specialty Chemicals Corporation
    Inventors: Manfred Kohler, Jorg Ohngemach, Eike Poetsch, Rudolf Eidenschink, Gerhard Greber, Dieter Dorsch, Jurgen Gehlhaus, Konrad Dorfner, Hans Ludwig Hirsch
  • Patent number: 5721291
    Abstract: The invention relates to a composition based on crosslinkable epoxy-functional organopolysiloxanes. This composition comprises:A. at least 10% by weight of a linear polyorganosiloxane A (POS) of average general formula (II): ##STR1## in which: R.sub.1 is CH.sub.3, R' is an alkylene containing 2 to 50 C, R is an alkyl having from 6 to 26 C, X is R.sub.1, H, --R'-epoxy or hydroxyl, x=40-150, t=3-9, z=0-5 and y=0,B. at least one second crosslinkable epoxy-functional POS (B), B being present in the proportion of at most 90% by weight and corresponding to: B(a) with x=160-1000, t=1-15, z=0-5 and y=0, B(b) with x=0-120, t=10-30, z=0-5 and y=0, or B(c) with x=0-200, t=0-5, z=0-5 and y=10-90,C. and at least one photoinitiator.This composition can be used in the manufacture of protectors for adhesive bodies ("release liners"), papers or plastics or of liner-free self-adhesive labels.
    Type: Grant
    Filed: February 20, 1996
    Date of Patent: February 24, 1998
    Assignee: Rhone-Poulenc Chimie
    Inventors: Eric Gaulle, Christian Priou, Andre Soldat
  • Patent number: 5721287
    Abstract: A method of mutating a colorant in a composition which includes a colorant and a radiation transorber by irradiating the composition. The colorant, in the presence of the radiation transorber, is adapted, upon exposure of the transorber to specific, narrow bandwidth radiation, to be mutable. The radiation transorber also imparts light-stability to the colorant so that the colorant does not fade when exposed to sunlight or artificial light.
    Type: Grant
    Filed: June 5, 1995
    Date of Patent: February 24, 1998
    Assignee: Kimberly-Clark Worldwide, Inc.
    Inventors: Ronald Sinclair Nohr, John Gavin MacDonald
  • Patent number: 5709955
    Abstract: An adhesive composition, a laminated structure, and a method of laminating a structure. The adhesive composition comprises an admixture of unsaturated polymerizable material and a photoreactor, the photoreactor comprising a wavelength-specific sensitizer covalently bonded to a reactive species-generating photoinitiator. Suitable wavelength-specific sensitizers have a molar extinction coefficient greater than about 5000 liters per mole per cm at an absorption maximum and resulting photoreactors have a quantum yield of greater than about 0.5 at an absorption maximum. Suitable photoreactors include 2-?p-(2-methyllactoyl)phenoxy!ethyl-1,3-dioxo-2-isoindolineacetate, 2-hydroxy-2-methyl-4'-?2-?p-(3-oxobutyl)phenoxy!ethoxy!propiophenone, 4-?p-?(4-benzoylcyclohexyl)oxy!phenyl!-2-butanone, and 1,3-dioxo-2-isoindolineacetic acid diester with 2-hydroxy-4'-(2-hydroxyethoxy)-2-methylpropiophenone.
    Type: Grant
    Filed: October 16, 1996
    Date of Patent: January 20, 1998
    Assignee: Kimberly-Clark Corporation
    Inventors: Ronald Sinclair Nohr, John Gavin MacDonald
  • Patent number: 5708047
    Abstract: A method for decorating a substrate with hot stamping foil comprising the steps of:a) applying an ink composition comprised of a cationically radiation cured cycloaliphatic epoxide to the substrate in a predetermined design, said ink being operable when cured to bond to the substrate,b) curing the ink on the substrate by exposing to the radiation by which it is curable, thereby bonding the ink composition to the substrate,c) pressing a sheet of hot stamping foil against the substrate with a die heated to a temperature sufficient to cause a portion of the hot stamping foil to adhere to the heated, cured ink design but not to the ink-free areas of the substrate, andd) removing the die, thereby leaving behind a portion of the foil adhered to the ink design.
    Type: Grant
    Filed: December 30, 1994
    Date of Patent: January 13, 1998
    Assignee: Revlon Consumer Products Corporation
    Inventors: Melvin Edwin Kamen, Bhupendra Patel
  • Patent number: 5698285
    Abstract: An adhesive for use in producing an optical disk comprising two transparent substrates bonded to each other with a photocurable adhesive at respective bonding surfaces thereof and having an information recording layer formed on one or both of the bonding surfaces is disclosed, which is a composition comprising ingredient (A) shown below and a photopolymerization initiator comprising ingredient (B) and/or ingredient (C) shown below:(A) a radical-polymerizable vinyl compound,(B) an acylphosphine oxide compound represented by the general formula ##STR1## and (C) an .alpha.-aminoacetophenone compound represented by the following formula. ##STR2## With this adhesive, optical disk substrates having an extremely low light transmittance can be easily bonded to each other in a short time period without impairing their appearance.
    Type: Grant
    Filed: October 16, 1996
    Date of Patent: December 16, 1997
    Assignee: Three Bond Co., Ltd.
    Inventor: Kazuhiro Kojima
  • Patent number: 5686503
    Abstract: A method of generating reactive species which includes exposing a polymolecular photoreactor to radiation, in which the polymolecular photoreactor comprises a wavelength-specific sensitizer associated with a reactive species-generating photoinitiator. The sensitizer absorbs energy and transfers the absorbed energy to the photoinitiator which, in turn, generates reactive species. The wavelength-specific sensitizer is adapted to have an absorption wavelength band generally corresponding to an emission peak of the radiation. The radiation to which the polymolecular photoreactor is exposed generally will have a wavelength of from about 4 to about 1,000 nanometers. Thus, the radiation may be ultraviolet radiation, including near ultraviolet and far or vacuum ultraviolet radiation: visible radiation: and near infrared radiation. Desirably, the radiation will have a wavelength of from about 100 to about 900 nanometers.
    Type: Grant
    Filed: January 22, 1996
    Date of Patent: November 11, 1997
    Assignee: Kimberly-Clark Corporation
    Inventors: Ronald Sinclair Nohr, John Gavin MacDonald
  • Patent number: 5629356
    Abstract: Compounds of the formula I, II, III and IIIa ##STR1## in which Ar.sup.1 is an unsubstituted or substituted aromatic radical and at least one of the radicals R.sup.1 and R.sup.2 is an alkenyl, cycloalkenyl or arylmethyl group, are effective photoinitiators for photopolymerization of unsaturated compounds. They are particularly suitable for photocuring of pigmented systems.
    Type: Grant
    Filed: March 12, 1996
    Date of Patent: May 13, 1997
    Assignee: Ciba Geigy Corporation
    Inventors: Vincent Desobry, Kurt Dietliker, Rinaldo H usler, Werner Rutsch, Manfred Rembold, Franciszek Sitek
  • Patent number: 5561029
    Abstract: The present invention sets forth the incorporation of a substituted 2-phenyl-4,6-bis (trichloromethyl)-1,3,5-triazine in photoresists of lithographic printing plates for the purpose of promoting their shelf-life, room light stability, and developability. The present invention provides a photocurable composition comprising at least a photopolymerizable ethylenically unsaturated monomer having at least one terminal ethylenic group and capable of forming a polymer upon exposure to actinic radiation; and an s-triazine capable of initiating free radical polymerization of the photopolymerizable ethylenically unsaturated monomer and being represented by the following general formula [I]: ##STR1## wherein R.sub.1 is either OR.sub.4 or NR.sub.5 R.sub.6, wherein R.sub.5 and R.sub.6 may or may not be identical with each other, either R.sub.5 or R.sub.6 may represent hydrogen, and wherein R.sub.4 and at least one of R.sub.5 and R.sub.
    Type: Grant
    Filed: April 28, 1995
    Date of Patent: October 1, 1996
    Assignee: Polaroid Corporation
    Inventors: Maurice J. Fitzgerald, Frederick R. Kearney, Rong-Chang Liang, William C. Schwarzel, Donna J. Guarrera, John M. Hardin, John C. Warner
  • Patent number: 5554663
    Abstract: Compounds of the formula I, II, III and IIIa ##STR1## in which Ar.sup.1 is an unsubstituted or substituted aromatic radical and at least one of the radicals R.sup.1 and R.sup.2 is an alkenyl, cycloalkenyl or arylmethyl group, are effective photoinitiators for photopolymerization of unsaturated compounds. They are particularly suitable for photocuring of pigmented systems.
    Type: Grant
    Filed: June 6, 1995
    Date of Patent: September 10, 1996
    Assignee: Ciba-Geigy Corporation
    Inventors: Vincent Desobry, Kurt Dietliker, Rinaldo H usler, Werner Rutsch, Manfred Rembold, Franciszek Sitek
  • Patent number: 5534629
    Abstract: Compounds of the formula I, II, III and IIIa ##STR1## in which Ar.sup.1 is an unsubstituted or substituted aromatic radical and at least one of the radicals R.sup.1 and R.sup.2 is an alkenyl, cycloalkenyl or arylmethyl group, are effective photoinitiators for photopolymerization of unsaturated compounds. They are particularly suitable for photocuring of pigmented systems.
    Type: Grant
    Filed: May 1, 1995
    Date of Patent: July 9, 1996
    Assignee: Ciba-Geigy Corporation
    Inventors: Vincent Desobry, Kurt Dietliker, Rinaldo Husler, Werner Rutsch, Manfred Rembold, Franciszek Sitek
  • Patent number: 5532112
    Abstract: Compounds of the formulaRG--A--INwhereinIN is a photoinitiator basic structureA is a spacer group andRG is a functional reactive groupcan be employed as coreactive photoinitiators for photopolymerization of systems containing ethylenically unsaturated compounds.
    Type: Grant
    Filed: June 2, 1994
    Date of Patent: July 2, 1996
    Assignee: Ciba-Geigy Corporation
    Inventors: Manfred Kohler, Jorg Ohngemach, Eike Poetsch, Rudolf Eidenschink, Gerhard Greber, Dieter Dorsch, Jurgen Gehlhaus, Konrad Dorfner, Hans L. Hirsch
  • Patent number: 5527925
    Abstract: Compounds of formula I: ##STR1## are disclosed. The compounds are photoinitiators which can be functionalized by means of ethylenic groups or can be bonded to H-active substances, in order, for example, to modify surfaces by means of photopolymerizable substances. The compounds are especially useful in the manufacture of contact lenses.
    Type: Grant
    Filed: June 24, 1994
    Date of Patent: June 18, 1996
    Assignee: Ciba-Geigy Corporation
    Inventors: Peter Chabrecek, Dieter Lohmann
  • Patent number: 5516812
    Abstract: A radiation and moisture curable silicone conformal coating composition comprises a silicone fluid of a monovalent ethylenically unsaturated functional group endcapped silicone and at least one (meth)acryl-functionalized silicone; and a photoinitiator effective for radiation curing of the silicone composition. The encapped silicone is the product of a reaction between a silanol terminated silicone and a silane cross linker having joined directly to a silicon atom thereof a monovalent ethylenically unsaturated functional group and at least 2 hydrolyzable groups.
    Type: Grant
    Filed: August 1, 1994
    Date of Patent: May 14, 1996
    Assignee: Loctite Corporation
    Inventors: Hsien K. Chu, Robert P. Cross, Lester D. Bennington
  • Patent number: 5512607
    Abstract: This invention provides a photosensitive resin composition which can be developed using water and can form a resist layer having superior hardness, adhesion and water resistance.The photosensitive resin composition of the present invention is characterized by containing an unsaturated epoxyester compound prepared by esterifying some of the epoxy side groups of an unsaturated epoxyester compound, and then reacting the remained epoxy groups of the epoxyester compound with a tertiary amine and acid component, such as phosphoric acid, a monoester of phosphoric acid or a diester of phosphoric acid or combination thereof, to convert the epoxy groups into quaternary ammonium salt groups having phosphate anions.
    Type: Grant
    Filed: June 6, 1995
    Date of Patent: April 30, 1996
    Assignee: W. R. Grace & Co.-Conn.
    Inventors: Keiichi Kinashi, Hiroshi Samukawa, Reiko Chiba
  • Patent number: 5482816
    Abstract: A radiation-sensitive composition comprising (A) a polymer having a recurring unit represented by formula (1): ##STR1## wherein R.sup.1 represents a substituted methyl group, a substituted ethyl group, a silyl group, a germyl group or an alkoxycarbonyl group, and R.sup.2 represents --OR.sup.3 or --NR.sup.4 R.sup.5 in which R.sup.3 is a hydrogen atom, a straight-chain alkyl group, a cyclic alkyl group, an aryl group, an aralkyl group, a substituted methyl group, a substituted ethyl group, a silyl group, a germyl group or an alkoxycarbonyl group, and R.sup.4 and R.sup.5, which may be the same or different, are hydrogen atoms, straight-chain alkyl groups, cyclic alkyl groups, aralkyl groups or aryl groups, and (B) a radiation-sensitive acid forming agent.
    Type: Grant
    Filed: June 21, 1994
    Date of Patent: January 9, 1996
    Assignee: Japan Synthetic Rubber Co., Ltd.
    Inventors: Makoto Murata, Mikio Yamachika, Yoshiji Yumoto, Takao Miura
  • Patent number: 5412002
    Abstract: An epoxy resin composition contains an epoxy resin represented by the formula (I) and a curing accelerator: ##STR1## wherein R.sup.1 stands for ##STR2## where G stands for a glycidyl group, R.sup.2 stands for an alkyl group having 1 to 4 carbon atoms, R.sup.3 and R.sup.4 stand for the same or different groups and each denote a hydrogen atom or a glycidyl group, m and x each denote an integer of 0 to 10, n denotes an integer of 0 to 2, provided that m.gtoreq.x and, if m=0, then x=0, in which case at least one of R.sup.3 and R.sup.4 denotes a glycidyl group on the condition that when m.gtoreq.1 and m>x, R.sup.1 may each stand for different groups.
    Type: Grant
    Filed: December 9, 1992
    Date of Patent: May 2, 1995
    Assignee: Nippon Oil Co., Ltd.
    Inventors: Masami Enomoto, Susumu Kubota, Hitoshi Yuasa, Fumiaki Oshimi, Yutaka Otsuki
  • Patent number: 5378734
    Abstract: A UV and moisture-curable organopolysiloxane composition comprising (i) an organopolysiloxane terminated with a radical of formula (1): ##STR1## wherein R.sup.1 is a hydrogen atom or monovalent hydrocarbon radical, each of R.sup.2 and R.sup.3 is a divalent hydrocarbon radical which may contain a NH bond or ether bond, each of R.sup.4 and R.sup.5 is a monovalent hydrocarbon radical which may contain an ether bond, and a is equal to 0 or 1, (ii) a photo-polymerization initiator, and (iii) a curing catalyst. The composition readily cures either upon exposure to UV radiation or upon contact with moisture and from the surface to the deep interior within a short time, yielding cured products having satisfactory physical properties.
    Type: Grant
    Filed: August 27, 1993
    Date of Patent: January 3, 1995
    Assignee: Shin-Etsu Chemical Company, Ltd.
    Inventor: Yoshio Inoue
  • Patent number: 5362603
    Abstract: The present invention relates to a photopolymerizable composition containing a photopolymerizable compound having at least one ethylenically unsaturated double bond, a photopolymerization initiator, a pigment and optionally another resin, wherein said photopolymerizable compound contained therein comprises not less than 60%.
    Type: Grant
    Filed: February 24, 1993
    Date of Patent: November 8, 1994
    Assignee: Nippon Kayaku Kabushiki Kaisha
    Inventors: Yoshinori Katoh, Naoko Ichinose, Teruhito Sotogoshi