Containing C-co-c(r)(or) Wherein R Is Organic, E.g., Diethoxyacetophenone, Etc. Patents (Class 522/44)
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Patent number: 10208228Abstract: The present invention relates to a water-borne UV-curable coating composition for use in wood finishing of interior joinery, furniture, and in particular in kitchen industry.Type: GrantFiled: September 9, 2015Date of Patent: February 19, 2019Assignee: SHERWIN-WILLIAMS DEUTSCHLAND GMBHInventors: Frank Von Ameln, Gerhard Bitzer
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Patent number: 9724276Abstract: Dental materials may be made from polyhydric phenols that are non-genotoxic and exhibit estrogenic activity less than that of bisphenol S, while exhibiting properties such as strength and flexibility comparable to those of conventional BPA-derived dental materials.Type: GrantFiled: March 15, 2013Date of Patent: August 8, 2017Assignee: Valspar Sourcing, Inc.Inventors: Jeffrey Niederst, Richard H. Evans, Robert M. O'Brien, Kevin Romagnoli, Carl Cavallin, T. Howard Killilea, Mark S. Von Maier
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Patent number: 9365507Abstract: The present invention provides a diaryl sulfone compound represented by Formula (1): wherein R1 to R4 and R1? to R4? are the same or different, and each represents hydrogen, C1-4 alkyl, or halogen, and R5 represents C2-6 alkenyl, C1-4 alkyl, or aromatic heterocyclic group; a method for producing the diaryl sulfone compound represented by Formula (1) by reacting a 4,4?-dihaloarylsulfone compound with thiol salt compound having an alkylene group; and a method for producing the diaryl sulfone compound represented by Formula (1) by reacting a 4,4?-dihaloarylsulfone compound with a thiol salt compound having a hydroxyl group, and subjecting the resulting compound to reaction with a halogenating agent, followed by a dehydrohalogenation reaction.Type: GrantFiled: March 9, 2011Date of Patent: June 14, 2016Assignee: SUMITOMO SEIKA CHEMICALS CO., LTD.Inventors: Paul Kuad, Hisaaki Kanda, Takeshi Fujiwara, Hiroyuki Shiraishi
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Patent number: 9133361Abstract: Disclosed is a photocurable coating composition for an optical product, wherein the photocurable coating composition includes a (meth)acryloyl monomer, a (meth)acryloyl oligomer, an organic solvent and a diluted monomer, which provides heat resistance, storage stability and high light transmission while having a low viscosity sufficient to prevent discoloration of the optical product.Type: GrantFiled: December 18, 2009Date of Patent: September 15, 2015Assignee: SAMSUNG ELECTRONICS CO., LTD.Inventors: Cheoul Young Kim, Hyun Surk Kim
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Publication number: 20150111982Abstract: The present invention relates to a facile process for the preparation of non-covalently cross-linked self-assembled perylene bisimide nano structures using hydrogen bonding interactions with poly-4-vinyl pyridine or oligophenylene vinylene (OPV) as structural motif.Type: ApplicationFiled: March 4, 2013Publication date: April 23, 2015Inventors: Asha Syamakumari, Rekha Narayan, Shekhar Shinde, Saibal Bhaumik
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Patent number: 9004131Abstract: A method and a system for producing a change in a medium disposed in an artificial container. The method places in a vicinity of the medium at least one of a plasmonics agent and an energy modulation agent. The method applies an initiation energy through the artificial container to the medium. The initiation energy interacts with the plasmonics agent or the energy modulation agent to directly or indirectly produce the change in the medium. The system includes an initiation energy source configured to apply an initiation energy to the medium to activate the plasmonics agent or the energy modulation agent.Type: GrantFiled: December 13, 2012Date of Patent: April 14, 2015Assignees: Duke University, Immunolight, LLCInventors: Frederic Avery Bourke, Jr., Tuan Vo-Dinh
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Patent number: 8962709Abstract: The invention includes a new photopolymerizable resin system for dental restorative materials. The resin system utilizes a thiol-ene component as the reactive diluent in dimethacrylate systems. The ternary resin system comprises a thiol monomer, an ene monomer and a dimethacrylate monomer. The system of the invention has enhanced overall functional group conversion, improved polymer mechanical properties, and reduced shrinkage stress of the ternary system when compared to either traditional dimethacrylate or thiol-ene resin systems.Type: GrantFiled: January 7, 2013Date of Patent: February 24, 2015Assignee: The Regents of the University of Colorado, a Body CorporateInventors: Christopher N. Bowman, Neil B. Cramer
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Patent number: 8921447Abstract: The invention provides a process for manufacturing a polymeric material having a compositional gradient, comprising: forming a mixture comprising a first photopolymerizable polymer precursor and a second photopolymerizable precursor, and subjecting said mixture to an intensity gradient of electromagnetic radiation, wherein said first precursor has a greater reactivity ratio than said second precursor, and/or said first precursor is mono-functional and said second precursor is di-functional, and/or said first precursor is less inhibited by oxygen than said second precursor.Type: GrantFiled: April 8, 2011Date of Patent: December 30, 2014Assignee: The University of Iowa Research FoundationInventors: Clinton J. Cook, C. Allan Guymon
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Publication number: 20140349086Abstract: The present invention provides a photo-curable composition that requires a small demolding force. The present invention also provides a UV imprint method that requires a small demolding force. The photo-curable composition contains a polymerizable monomer (A), a polymerization initiator (B), and a fluorine-containing surfactant (C). A photo-cured product of the photo-curable composition has a water contact angle of 74 degrees or less.Type: ApplicationFiled: October 24, 2012Publication date: November 27, 2014Applicant: CANON KABUSHIKI KAISHAInventors: Toshiki Ito, Chieko Mihara, Kanae Kawahata, Motoki Okinaka
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Publication number: 20140303268Abstract: Compositions and processes for development of sustainable materials based upon a method of thermoplastic polymer recycling with a solvent that is also a monomer for renewable polymer synthesis. By combining petroleum-derived polymers with bio-based monomer feedstocks, biphasic, blended polymer products are produced and are shown to exhibit facile tunability of physical and material properties. This one-pot, solvent-based recycling approach yields neat recycled products without the use of solvent evaporation or solute precipitation, and the functional utility of the resulting polymer blends greatly exceeds that of either homopolymer alone.Type: ApplicationFiled: March 11, 2014Publication date: October 9, 2014Applicant: POLY6 TECHNOLOGIES,INC.Inventor: Keith Hearon
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Patent number: 8727775Abstract: The present invention provides polymerizable dental compositions comprising a dimer acid-derived monomer such as a dimer acid-derived di(meth)acrylate monomer.Type: GrantFiled: December 29, 2004Date of Patent: May 20, 2014Assignee: The Regents of the University of Colorado, a Body CorporateInventors: Jeffrey W. Stansbury, Christopher N. Bowman, Marianela Trujillo
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Publication number: 20140078457Abstract: Embodiments of the invention provide a frame sealant and a process for preparing the same, as well as use thereof. The frame sealant comprises, by weight, 25%-30% acrylic resins, 25%-30% oligmers as shown in Structure Formula I, 10%-15% organic powders, 10%-15% inorganic powders, 0%-10% epoxy resins, 10%-15% heat curing agents, 0.1%-1% photoinitiators, and 0.1%-1% coupling agents, wherein, in Structure Formula I, n indicates an integer of 10-20.Type: ApplicationFiled: September 16, 2013Publication date: March 20, 2014Applicant: Beijing BOE Optoelectronics Technology Co.,Ltd.Inventors: Ang Xiao, Haibo Zhu, Sung Hun Song
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Patent number: 8575768Abstract: A radiation-curable ink jet ink composition contains a polymerizable compound, an photopolymerization initiator and polysiloxane, in which the ink composition is used for recording on a package substrate as a recording medium; the polymerizable compound contains one or more kinds of compound having a pentaerythritol skeleton; an HLB value of the polysiloxane is 5 to 12; and the polysiloxane content is 0.1 to 2% by mass with respect to the total amount of the ink composition.Type: GrantFiled: November 30, 2011Date of Patent: November 5, 2013Assignee: Seiko Epson CorporationInventors: Hiroki Nakane, Jun Ito
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Publication number: 20130277890Abstract: The present invention includes compositions that are useful to prepare dual-cure shape memory polymer systems. The present invention further provides methods of generating a shape memory polymer, optical device, polymer pad with an imprint, or suture anchor system.Type: ApplicationFiled: November 4, 2011Publication date: October 24, 2013Applicant: The Regents of the University of Colorado, a body corporateInventors: Christopher Bowman, Devatha Nair, Neil Cramer, Robin Shandas
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Publication number: 20130248110Abstract: A sealing composition and a method of manufacturing a display panel using the sealing composition are disclosed. The sealing composition includes about 10% by weight to about 80% by weight of a denatured epoxy resin having a methacrylate group, about 5% by weight to about 40% by weight of a photo-curing acrylate monomer, about 1% by weight to about 10% by weight of a heat-curing agent, about 1% by weight to about 10% by weight of a photo-polymerization initiator, about 5% by weight to about 50% by weight of a filler, about 1% by weight to about 10% by weight of a flexibility improving agent and about 0.001% by weight to about 8% by weight of an additive.Type: ApplicationFiled: February 7, 2013Publication date: September 26, 2013Applicant: Samsung Display Co., Ltd.Inventors: Ki-Beom LEE, Hyang-Shik Kong, Hyun-Seok Kim, Sung Hee Lee, Seung-Jun Lee, Jae-Hyuk Chang, Gug-Rae Jo
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Publication number: 20130236674Abstract: The present invention relates to an adhesive composition for a touch panel, an adhesive film, and a touch panel. When coupled to the touch panel, for example, to a conductive layer and to a hard coating surface of an electrostatic capacitive touch panel, the present invention has superior durability, such as resistance to peeling, detaching, or air bubbles under high-temperature and high-humidity conditions, and can provide an adhesive composition or adhesive agent also having superior workability, wettability, and adhesion to various objects to be adhered.Type: ApplicationFiled: November 14, 2011Publication date: September 12, 2013Applicant: LG Hausys, Ltd.Inventors: Jang-Soon Kim, Min-Seok Song, Eun-Kyung Park, Seong-Jin Kim, Hyung-Min Cha, Won-Yup Lee, Woong-Gi Kim
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Publication number: 20130236673Abstract: The present invention relates to an adhesive composition for a touch panel, and adhesive film, and to a touch panel. When the adhesive composition of the present invention is applied to the touch panel, for example, to an electrostatic capacitance-type touch panel, the present invention has superior durability under high-temperature and high-humidity conditions and superior wettability and adhesiveness to various objects to be adhered, and can provide the adhesive composition and the adhesive film having excellent durability to chemicals, such as resistance to sebum.Type: ApplicationFiled: November 18, 2011Publication date: September 12, 2013Applicant: LG HAUSYS, LTD,Inventors: Jang Soon Kim, Min-Seok Song, Eun-Kyung Park, Seong-Jin Kim, Hyung-Min Cha, won-Yup Lee, Woong-Gi Kim
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Curable composition, color filter and process for production thereof, and solid-state imaging device
Patent number: 8492071Abstract: A curable composition containing (A) a polymerizable compound having an alkyleneoxy group having two or more carbon atoms, (B) a polymerizable compound lacking an alkyleneoxy group having two or more carbon atoms, (C) an i-line absorber, (D) a photopolymerization initiator, (E) an alkali-soluble resin, and (F) a pigment, wherein a mass ratio [(A)/((A)+(B))] is from 0.5 to 0.9, and an i-line transmittance obtainable when the curable composition is formed into a coating film having a thickness of 0.7 ?m, is 10% or less. The curable composition of the invention has enhanced adhesiveness upon forming a micro pattern, and can reduce development residues in unexposed non-cured areas. The curable composition of the invention is suitable for the use in color filters.Type: GrantFiled: March 27, 2009Date of Patent: July 23, 2013Assignee: FUJIFILM CorporationInventor: Hiroshi Taguchi -
Publication number: 20130139963Abstract: The present invention relates to a photo-curable resin composition and a method for preparing a replica mold using the same. The photo-curable resin composition according to the present invention comprises a photo-reactive polymer comprising polydimethylsiloxane (PDMS) that binds to silsesquioxane comprising at least one polymeric functionalized group; and a photo-initiator.Type: ApplicationFiled: September 14, 2012Publication date: June 6, 2013Applicant: Electronics and Telecommunications Research InstituteInventor: Bong Kuk LEE
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Patent number: 8389591Abstract: A coating composition includes a UV curable film forming resin; a thixotropic and/or pseudoplastic anti-settling agent selected from at least one of an amine salt of a synthetic wax, a microcrystalline cellulose compound (MCC), a urea urethane, or a urethane enzymatically modified starch; a mar/scratch resistant additive selected from at least one of a mineral abrasive, glass particles, and ceramic particles; and water.Type: GrantFiled: August 10, 2010Date of Patent: March 5, 2013Assignee: Valspar Sourcing, Inc.Inventor: James Madison Bohannon
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Patent number: 8376013Abstract: A method and a system for producing a change in a medium disposed in an artificial container. The method places in a vicinity of the medium at least one of a plasmonics agent and an energy modulation agent. The method applies an initiation energy through the artificial container to the medium. The initiation energy interacts with the plasmonics agent or the energy modulation agent to directly or indirectly produce the change in the medium. The system includes an initiation energy source configured to apply an initiation energy to the medium to activate the plasmonics agent or the energy modulation agent.Type: GrantFiled: March 10, 2009Date of Patent: February 19, 2013Assignees: Duke University, Immunolight, LLCInventors: Frederic Avery Bourke, Jr., Tuan Vo-Dinh
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Patent number: 8372516Abstract: The invention is directed to compositions on a surface which comprise a) at least a (meth)acrylate prepolymer, b) an adhesion promoting monomer of formula (I) wherein Q, R1, R2, R4, R5, m and n are defined herein. Further the compositions may be used to improve the adhesion to surfaces, especially metallic surfaces and may include additional optional components such as adhesion promoting photoinitiators.Type: GrantFiled: October 21, 2009Date of Patent: February 12, 2013Assignee: BASF SEInventors: Liliana Craciun, Ying Dong, Orest Polishchuk, Christopher Koenigsmann, Belinda W. Ho
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Patent number: 8338556Abstract: A patterned composite ferroelectric layer, having ferroelectric electronic properties, on a substrate. Individual layers are each made of metal acrylate compounds, a photoinitiator compound and an acrylate crosslinking compound. The individual layers are stacked on the substrate to form a composite layer. A photomask is formed on the composite layer. Unmasked areas of the composite layer are irradiated with ultraviolet light. A solvent removes non-irradiated areas of the composite layer from the substrate. The patterned composite layer is heated in an oxygen atmosphere to cause a chemical reaction among the metal acrylate compounds and oxygen, a patterned composite ferroelectric layer being formed on the substrate.Type: GrantFiled: April 14, 2011Date of Patent: December 25, 2012Assignee: The United States of America as Represented by the Secretary of the NavyInventor: Thomas Kirk Dougherty
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Patent number: 8334092Abstract: The present invention relates to a photo-sensitive resin composition having superior heat-resistant and mechanical property, and a protective film for printed circuit board, and particularly provides a photo-sensitive resin composition including an acid-modified oligomer, a photo-polymerizable monomer, a photo-initiator, an epoxy resin, and a butadiene-modified epoxy resin including epoxy group and at least one double bond in the main chain, and a protective film for printed circuit board prepared by using the composition.Type: GrantFiled: June 20, 2011Date of Patent: December 18, 2012Assignee: LG Chem, Ltd.Inventors: Bo-Yun Choi, Byung-Ju Choi, Woo-Jae Jeong, Kwang-Joo Lee, Min-Su Jeong
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Patent number: 8318830Abstract: The present invention provides organometallic latent catalyst compounds, which are suitable as catalysts in polyaddition or polycondensation reactions which are catalysed by a Lewis acid type catalyst, in particular for the crosslinking of a blocked or unblocked isocyanate or isothiocyanate component with a polyol or polythiolto form a polyurethane (PU).Type: GrantFiled: October 10, 2008Date of Patent: November 27, 2012Assignee: BASF SEInventors: Rachel Kohli Steck, Caroline Lordelot, Thomas Vogel, Gisele Baudin, Paul Brown, Kurt Dietliker, Rinaldo Huesler, Tunja Jung, Peter Simmendinger, Katia Studer, Antoine Carroy
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Patent number: 8242185Abstract: The present invention is directed to an adhesive composition comprising a crosslinkable acrylic copolymer, a multi-functionalized crosslinkable oligomer and a photoinitiator wherein the composition exhibits excellent wet out characteristics as reflected in a tan delta value of at least 0.5, preferably greater than 0.5, more preferable greater than 0.8 as measured at 20° C. resulting from a first curing stage, and improved stiffness and temperature resistance as reflected in a storage elastic modulus of at least 300,000 Pa at 20° C. and a shear adhesion failure temperature of at least 425° F. (218.3° C.) at 1 Kg/in2 (0.155 Kg/cm2), respectively, which result from a second sequential curing stage.Type: GrantFiled: August 3, 2009Date of Patent: August 14, 2012Assignee: Morgan Adhesives CompanyInventors: Timothy Michael Smith, Gary Allan McMaster
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Patent number: 8192673Abstract: The disclosure provides a new photopolymerizable resin system for dental restorative materials. The resin system utilizes a thiol-ene component as the reactive diluent in dimethacrylate systems. The ternary resin system comprises a thiol monomer, an ene monomer and a dimethacrylate monomer. Use of an off-stoichiometric ratio of thiol:ene functional groups in favor of excess thiols results in enhanced overall functional group conversion, improved polymer mechanical properties, and reduced shrinkage stress of the ternary system when compared to either traditional dimethacrylate or thiol-ene resin systems.Type: GrantFiled: March 31, 2009Date of Patent: June 5, 2012Assignee: University of KansasInventors: Christopher N. Bowman, Neil B. Cramer
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Publication number: 20120133060Abstract: A radiation-curable ink jet ink composition contains a polymerizable compound, an photopolymerization initiator and polysiloxane, in which the ink composition is used for recording on a package substrate as a recording medium; the polymerizable compound contains one or more kinds of compound having a pentaerythritol skeleton; an HLB value of the polysiloxane is 5 to 12; and the polysiloxane content is 0.1 to 2% by mass with respect to the total amount of the ink composition.Type: ApplicationFiled: November 30, 2011Publication date: May 31, 2012Applicant: SEIKO EPSON CORPORATIONInventors: Hiroki Nakane, Jun Ito
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Patent number: 8183303Abstract: Disclosed is an adhesive composition including a compound having a multi-functional urethane (meth)acrylate group and an adhesive film prepared by using it. The adhesive composition includes compounds represented by Chemical Formulae 1 to 3. The compound represented by Chemical Formulae 1 to 3 includes an urethane (meth)acrylate group represented by the Chemical Formula 1-1 or 1-2.Type: GrantFiled: August 11, 2009Date of Patent: May 22, 2012Assignee: Samsung Electronics Co., Ltd.Inventors: Chul Ho Jeong, Yi Yeol Lyu, Sun Jin Song
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Publication number: 20120077898Abstract: Crosslinked polyolefin blends, methods for their production, and articles made of the same are provided. In at least one specific embodiment, the polyolefin blends comprise a first polymer formed in a first reactor and a second polymer formed in a second reactor. The first and second polymers, as well as the resulting blend, may comprise units derived from propylene, ethylene, and a diene. The blended composition can then be compounded with one or more coagents, antioxidants, UV sensitizers, and/or other additives and crosslinked, preferably by exposure to UV radiation and/or energetic photons. The crosslinked polymers are particularly useful for making fibers, films, and nonwovens.Type: ApplicationFiled: October 14, 2011Publication date: March 29, 2012Inventor: Sunny Jacob
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Publication number: 20120041092Abstract: A coating composition includes a UV curable film forming resin; a thixotropic and/or pseudoplastic anti-settling agent selected from at least one of an amine salt of a synthetic wax, a microcrystalline cellulose compound (MCC), a urea urethane, or a urethane enzymatically modified starch; a mar/scratch resistant additive selected from at least one of a mineral abrasive, glass particles, and ceramic particles; and water.Type: ApplicationFiled: August 10, 2010Publication date: February 16, 2012Applicant: Valspar SourcingInventor: James Madison Bohannon
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Publication number: 20120021142Abstract: The present invention relates to a liquid crystal alignment layer composition showing excellent adhesive strength to a substrate and a liquid crystal layer and excellent homeotropic alignment of liquid crystals, a liquid crystal alignment layer prepared with the same, a preparation method of the liquid crystal alignment layer, an optical film including the liquid crystal alignment layer, and a display device including the same. According to the present invention, provided are a liquid crystal alignment layer composition which comprises 1-50 wt % of a photocurable resin binder, 0.01-5 wt % of an amine compound selected from the group consisting of primary and secondary amino-based coupling agents, 0.Type: ApplicationFiled: April 8, 2010Publication date: January 26, 2012Inventors: Dae-Hee Lee, Moon-Soo Park
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Patent number: 8053486Abstract: The invention provides a coating composition comprising a thermal plastic resin selected from the group consisting of a polycycloolefin resin, polyester resin, polyacrylate resin, and a mixture thereof; and a radiation curable resin comprising a radiation polymer containing at least one mono- or multi-functional acrylic acid based monomer as a polymerization unit, an oligomer containing an ethylenically unsaturated functional group, and a photoinitiator, wherein the radiation curable resin is used in an amount of 220-1000% by weight on the basis of the weight of the thermal plastic resin. The invention improves the hardness of the coating composition, prevent the coated substrate from being scratched or impaired, and impart the substrate with high transparency without causing warping problem.Type: GrantFiled: December 19, 2008Date of Patent: November 8, 2011Assignee: Eternal Chemical Co., Ltd.Inventors: Lung-Lin Hsu, Sue-Hong Liu
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Publication number: 20110251299Abstract: The invention provides a process for manufacturing a polymeric material having a compositional gradient, comprising: forming a mixture comprising a first photopolymerizable polymer precursor and a second photopolymerizable precursor, and subjecting said mixture to an intensity gradient of electromagnetic radiation, wherein said first precursor has a greater reactivity ratio than said second precursor, and/or said first precursor is mono-functional and said second precursor is di-functional, and/or said first precursor is less inhibited by oxygen than said second precursor.Type: ApplicationFiled: April 8, 2011Publication date: October 13, 2011Applicant: THE UNIVERSITY OF IOWA RESEARCH FOUNDATIONInventors: Clinton J. Cook, C. Allan Guymon
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Patent number: 8017193Abstract: A monomeric formulation for creating self-propagating polymer optical waveguides and a system and a method of using the same. The monomeric formulation includes a plurality of unsaturated molecules, a molecule having a structure of R—X—H (e.g., X?O, S, N), and a photoinitiator. The monomeric formulation can further include a free radical inhibitor. The system includes a light source, a reservoir having a monomeric formulation and a patterning apparatus configured to guide a light beam from the light source into the monomeric formulation to form at least one self-propagating polymer waveguide.Type: GrantFiled: August 6, 2008Date of Patent: September 13, 2011Assignee: HRL Laboratories, LLCInventors: Chaoyin Zhou, Alan J. Jacobsen
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Publication number: 20110214717Abstract: Provided are photovoltaic modules that can include a liquid encapsulant formulation. Also provided are such liquid encapsulant formulations.Type: ApplicationFiled: November 12, 2009Publication date: September 8, 2011Applicant: PYTHAGORAS SOLAR INC.Inventors: Izhar Halahmi, Pasha Solel, Itay Baruchi
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Publication number: 20110086937Abstract: Disclosed is a sealant composition for liquid crystal display device, the sealant composition including a monomer as expressed in Chemical Formula 1 below wherein X is O, S, or NH, R1 is H or CH3, and R2 is an alkyl group or an aryl group of C2-30.Type: ApplicationFiled: May 27, 2010Publication date: April 14, 2011Inventors: Ki In SON, Joo Hyun Park, Gyu Won Cho
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Publication number: 20110028584Abstract: Disclosed herein is a curable cyclic phosphazene compound having a low dielectric constant, a low dielectric loss index and high thermal stability, and a method of preparing the same. The curable cyclic phosphozene polymer prepared using the compound has a low dielectric constant and excellent thermal properties, compared to conventional phosphozene polymers.Type: ApplicationFiled: July 29, 2009Publication date: February 3, 2011Inventors: Jae Choon CHO, Do Yeung Yoon, Ji Young Chang, Ho Lim, Hwa Young Lee
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Patent number: 7838571Abstract: Photopolymerizable polymer composites based on dimethacrylate systems have been increasingly utilized as dental restorative materials. One of the biggest drawbacks of current dental resin systems is the volume shrinkage and shrinkage induced stresses that arise during the polymerization. Other major problems include incomplete double bond conversion and insufficient wear resistance. This invention involves the development of an entirely novel approach to the photopolymerization process that utilizes thiol-ene systems as low shrinkage and ultra-low shrinkage stress dental restorative materials. Compared with the traditional dimethacrylate dental resins, these novel photopolymerizations have demonstrated a dramatically decreased volume shrinkage, extremely rapid polymerization, abilities to photopolymerize ultrathick materials and achieve much higher conversion, lack of oxygen inhibition and ultra-low shrinkage stress due to low volume shrinkage and drastically delayed gel point conversion.Type: GrantFiled: October 22, 2004Date of Patent: November 23, 2010Assignee: The Regents of the University of ColoradoInventors: Christopher N. Bowman, Hui Lu, Jeffrey W. Stansbury
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Publication number: 20100212824Abstract: The present invention relates to photocurable elastomer compositions and methods of preparation and use of such compositions for cure-in-place applications such as gaskets. The curable compositions generally include an elastomer component, a monofunctional and/or multifunctional reactant and a photoinitiator that in various aspects may be a visible and/or UV curing initiator. The various components may be present in different amounts, depending on the combination of components and composition desired.Type: ApplicationFiled: June 19, 2006Publication date: August 26, 2010Applicant: HENKEL CORPORATIONInventors: James E. Lionberger, John G. Woods, Joel D. Schall
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Patent number: 7772295Abstract: To provide a resin composition excellent in conformability to special shapes and in holding power without the need of containing a low molecular softener such as a plasticizer, other than a polysiloxane, and a cured product and a sheet using it. A resin composition characterized by comprising (a) an acrylic rubber, (b) a compound containing at least two mercapto groups per molecule, (c) a compound containing at least two acryloyl and/or methacryloyl groups per molecule, (d) an acrylate and/or methacrylate having a C2-12 alkyl group, and (e) acrylic acid or methacrylic acid. The above resin composition which contains a thermally conductive filler. A cured product and sheet using it.Type: GrantFiled: February 2, 2006Date of Patent: August 10, 2010Assignee: Denki Kagaku Kogyo Kabushiki KaishaInventors: Koichi Taguchi, Keiji Takano
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Patent number: 7767727Abstract: An autoxidisable architectural coating composition suitable for application to surfaces found in and around buildings at ambient temperatures and in natural daylight wherein surface autoxidation of the composition is promoted by a combination of low concentrations of metal ions (especially manganese or vanadium) and 2,2-dimethoxy-1,2-diphenylethan-1-one as photoinitiator. The composition avoids the need to use more than trace amounts cobalt ions which are rumoured to be carcinogenic yet achieves adequately fast rates of autoxidation. Preferably the use of cobalt is avoided altogether. The use of the low concentrations of the other metal ions reduces discoloration of the compositions often to levels below what is achieved using conventional cobalt promoters. Also a modification in which surface autoxidation is promoted by a combination of 2,2-dimethoxy-1,2-diphenylethan-1-one and trace amounts of cobalt ions in the absence of other surface autoxidation promoting metal ions.Type: GrantFiled: June 11, 2006Date of Patent: August 3, 2010Assignee: Imperial Chemical Industries PLCInventor: Philip Louis Taylor
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Superabsorbent polymers having radiation activatable surface cross-linkers and method of making them
Patent number: 7700663Abstract: Superabsorbent polymer particles having improved surface cross-linking and their use in absorbent articles. The superabsorbent polymer particles comprise a water-absorbing resin and the reaction product of a radiation activatable surface cross-linker. The reaction product of the radiation activatable surface cross-linker is present at the surface of the superabsorbent polymer particle. The radiation activatable surface cross-linker includes at least two radiation activatable groups R, which are covalently bound to each other or to at least one spacer group S.Type: GrantFiled: October 3, 2008Date of Patent: April 20, 2010Assignee: The Procter & Gamble CompanyInventor: Andreas Flohr -
Patent number: 7687549Abstract: The invention relates to di- and tri-carboxylic acid compounds and polyester oligomers and polymers made therefrom. Curable compositions comprising the polyester oligomers and polymers are also described.Type: GrantFiled: June 30, 2005Date of Patent: March 30, 2010Assignee: Cargill, IncorporatedInventors: Shuang Zhou, Tzyy-Jan Han
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Publication number: 20100076106Abstract: Provided is an optical material which has a high transmittance, a high refractive index, a low Abbe constant, a high secondary dispersion property, and a low water absorption rate. The optical material includes a polymer of a mixture which contains: a sulfur-containing compound represented by the following general formula (1): a sulfur-containing compound represented by the following general formula (2): and an energy polymerization initiator, in which a content of the sulfur-containing compound represented by the chemical formula-2 is 10% by weight or more to 60% by weight or less, an Abbe constant (?d) of the polymer of the mixture satisfies 18<?d<23, and a secondary dispersion property (?g,F) thereof satisfies 0.68<?g,F<0.69.Type: ApplicationFiled: September 8, 2009Publication date: March 25, 2010Applicant: CANON KABUSHIKI KAISHAInventors: Hidefumi Iwasa, Shigeo Kiso, Terunobu Saitoh, Toshiji Nishiguchi
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Patent number: 7649026Abstract: Radiation curable compositions, such as UV curable ink compositions, contain a polymeric dispersant, a curable material, and a nanoscale pigment particle composition including an organic monoazo laked pigment including at least one functional moiety, and a sterically bulky stabilizer compound including at least one functional group, wherein the functional moiety of the pigment associates non-covalently with the functional group of the stabilizer; and the presence of the associated stabilizer limits the extent of particle growth and aggregation, to afford nanoscale-sized pigment particles.Type: GrantFiled: November 1, 2007Date of Patent: January 19, 2010Assignee: Xerox CorporationInventors: C. Geoffrey Allen, Rina Carlini, Sandra J. Gardner
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Patent number: 7642296Abstract: The invention relates to novel photoinitators of formulae (I), (II), (III), (IV), (V) and (VI) wherein R1 and R2 are each independently of the other C1-C8alkyl; C1-C4alkyl substituted by OH, C1-C4alkoxy, —COO(C1-C8alkyl), (C1-C4alkyl)-COO—, —CN, benzyl, phenyl or by —N(R15)(R16); C3-C6alkerlyl, benzyl, —CH2—C6H4—(C1-C4alkyl) or phenyl; or R1 and R2 together are unbranched or branched C2-C9alkylene or C3-C6-oxa- or -azaalkylene; R3, R4, R5 and R6 are each independently of the others hydrogen, C1-C8alkyl, C3-C6alkenyl, benzyl, —CH2—C6H4—(C1-C4alkyl) or phenyl; R3 and R4 together and/or R5 and R6 together are unbranched or branched C2-C9alkylene; A is CI, Br, —O—R9, —N(R11)(R12) or —S—R18, A? is —O—, —NH— or —NR11—; A? is CI, Br, —O—R9, —N(R11)(R12) or —S—R18 or hydrogen, X is —O—R10 or —N(R13)(R14), n is an integer from 1 to 10, preferably an integer from 1 to 4, especially 1, 2 or 3; R7 is a linker; R8 is a bivalent C2-C3alkylele radical.Type: GrantFiled: April 11, 2005Date of Patent: January 5, 2010Assignee: Ciba Specialty Chemicals CorporationInventors: Rinaldo Hüsler, Thomas Horni, André Fuchs, Tunja Jung, Reinhard H. Sommerlade
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Patent number: 7625956Abstract: Disclosed is a phase change ink comprising a colorant, an initiator, and an ink vehicle, said ink vehicle comprising (a) at least one radically curable monomer compound, and (b) a compound of the formula wherein R1 is an alkylene, arylalkylene, or alkylarylene group, R2 and R2? each, independently of the other, are alkylene, arylene, arylalkylene, or alkylarylene groups, R3 and R3? each, independently of the other, are either (a) photoinitiating groups, or (b) groups which are alkyl, aryl, arylalkyl, or alkylaryl groups, provided that at least one of R3 and R3? is a photoinitiating group, and X and X? each, independently of the other, is an oxygen atom or a group of the formula —NR4—, wherein R4 is a hydrogen atom, an alkyl group, an aryl group, an arylalkyl group, or an alkylaryl group.Type: GrantFiled: November 30, 2005Date of Patent: December 1, 2009Assignee: Xerox CorporationInventors: Peter G. Odell, Eniko Toma, Jennifer L. Belelie
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Publication number: 20090270528Abstract: The disclosure provides a new photopolymerizable resin system for dental restorative materials. The resin system utilizes a thiol-ene component as the reactive diluent in dimethacrylate systems. The ternary resin system comprises a thiol monomer, an ene monomer and a dimethacrylate monomer. Use of an off-stoichiometric ratio of thiol:ene functional groups in favor of excess thiols results in enhanced overall functional group conversion, improved polymer mechanical properties, and reduced shrinkage stress of the ternary system when compared to either traditional dimethacrylate or thiol-ene resin systems.Type: ApplicationFiled: March 31, 2009Publication date: October 29, 2009Applicant: The Regents of the University of Colorado, a body corporateInventors: Christopher N. Bowman, Neil B. Cramer
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Publication number: 20090258155Abstract: A substantially colorless radiation overcoat composition suitable for overcoating ink-based images and xerographic-based images. The overcoat composition comprises at least one gellant, at least one monomer, at least one substantially non-yellowing photoinitiator, optionally a curable wax, and optionally a surfactant.Type: ApplicationFiled: April 10, 2008Publication date: October 15, 2009Applicant: XEROX CORPORATIONInventors: Peter G. ODELL, Jennifer L. BELELIE, Michelle N. CHRETIEN, Gordon SISLER, Christopher A. WAGNER