Abstract: A curable composition according to the present invention for sealing optical semiconductor includes components (A), (B), and (C). Another curable composition according to the present invention for sealing optical semiconductor further includes a component (D) in addition to the components (A), (B) and (C). The component (A) is a compound containing at least one functional group selected from the group consisting of epoxy groups, oxetanyl groups, vinyl ether groups, and (meth)acryloyl groups. The component (B) is a cycloaliphatic epoxy compound. The component (C) is a curing catalyst including a cationic component and an anionic component and generating an acid upon application of light or heat, where the cationic component contains an aromatic ring, and the anionic component contains a central element selected from boron and phosphorus. The component (D) is conductive fiber-bearing particles each including a particulate substance and a fibrous conductive substance lying on or over the particulate substance.

Abstract: Provided are a salt compound, cationic polymerization initiator and cationically polymerizable composition, which have a superior acid-generating capacity and high sensitivity, and are free from coloration. The salt compound is represented by the following general Formula (1): (wherein, R01 to R05 each independently represents a group selected from a hydrogen atom, a fluorine atom and —YR group, one of the R01 to R05 being a —YR group and at least two of the R01 to R05 being fluorine atoms; Y represents an oxygen atom or a sulfur atom; R represents a C1-C4 alkyl group; Ctp+ represents a p-valent cation, the p being 1 or 2; and n represents a coefficient required for maintaining electrical neutrality).

Abstract: The photobase generator of the invention is represented by the following formula 1: wherein Ar, R, A+ and X? are as defined in the specification. Since the photobase generator of the formula 1 absorbs ultraviolet lights of relatively long wavelength and is photolyzed to generate a strong base efficiently, a composition containing the photobase generator and an episulfide compound is easily cured by polymerization under ultraviolet irradiation.

Abstract: A fast-curing, low viscosity composition for coating an optical waveguide, more specifically, an optical fiber, and optical fibers coated therewith are disclosed. The coating composition is a radiation curable composition containing: a radiation curable oligomer, a free radical photoinitiator, and a mixture of reactive diluents including a low molecular weight (meth)acrylate having tri-, tetra-, penta- or higher functionality.

Abstract: There is provided a radiation-curable coating composition containing oligomers that each have two end groups X1 and X2, wherein the end groups X1 and X2, which may be the same or different, are a photoinitiator group or an adhesion promoter group. The coating composition may exclude the presence of non-reactive photoinitiator groups and non-reactive adhesion promoter groups, each of which would fail to covalently bond itself to an oligomer backbone.

Abstract: An solvent-based pressure sensitive adhesive (PSA) having improved shear adhesion is composed of an acrylic-based PSA resin, an ethylenically unsaturated polyester, an ultraviolet radiation (UV) photosensitizer, and fugative organic solvent for the acrylic-based PSA resin. The PSA is cured by evaporation of the fugative organic solvent coupled with heat and UV irradiation or UV irradiation alone. Such PSA has improved shear adhesion by dint of the addition of the ethylenically-unsaturated polyester and an ultraviolet radiation (UV) photosensitizer. A method for adhering two substrates using the PSA includes applying the PSA to one or both of substrates. The solvent in the PSA is evaporated from the applied PSA. Finally, the polyester component of the applied PSA is cured by exposure of the applied PSA to ultraviolet (UV) radiation.

Abstract: An ultraviolet-curable adhesive having an excellent moisture resistance and suitable for bonding optical disks having an information recording layer (vapor deposition layer), particularly optical disks having a thick vapor deposition layer, which contains, as essential components, (A) N-vinylpyrrolidone, (B) a urethane (meth)acrylate oligomer derived from a caprolactone-based polyol, an alicyclic diisocyanate and (meth)acrylic acid, and (C) a photopolymerization initiator containing (C-1) a photopolymerization initiator composed of only a carbon atom, a hydrogen atom and an oxygen atom without containing a nitrogen atom, a sulfur atom and a phosphorus atom and (C-2) a photopolymerization initiator containing a nitrogen atom and/or a sulfur atom in a (C-1)/(C-2) ratio of 70/30 to 100/0 by weight.

Abstract: A method of generating reactive species which includes exposing a wavelength specific photoreactor composition to radiation, in which the wavelength specific photoreactor composition comprises one or more wavelength-specific sensitizers associated with one or more reactive species-generating photoinitiators. Also described are methods of polymerizing unsaturated monomers, methods of curing an unsaturated oligomer/monomer mixture, and methods of laminating.

Abstract: A photosensitive composition comprising (a) an ethylenically unsaturated double bond-containing compound, (b) a sensitizing dye and (c) a photopolymerization initiator, wherein the sensitizing dye is a phthalocyanine compound showing the maximum absorption within a range of from 750 to 1,200 nm.

Abstract: The present invention relates to anionic photoinitiator compounds, compositions containing them, and methods of using them having the structure: ##STR1## wherein X and Y are independently selected from the group consisting of a direct single bond and --C(.dbd.O)--, wherein at least one of X and Y is --C(.dbd.O)--;R.sup.1 and R.sup.2 are independently selected from the group consisting of H and substituted phenyl, wherein both R.sup.1 and R.sup.2 are not H;and wherein neither --X--R.sup.1 nor --Y--R.sup.2 is --C(.dbd.O)H. The anionic photoinitiators have improved storage stability, without loss of photosensitivity, even when stored with polymerizable or crosslinkable monomer, oligomer, or crosslinkable polymer species.

Abstract: A compound of the general formula:A-L.sup.+ D.sup.-where A is a moiety which absorbs radiation and enters an excited state in which it accepts an electron; D.sup.- is a moiety which donates an electron to the excited state A and releases a free radical; and L.sup.+ is a cationic linking group which tethers electron acceptor moiety A to electron donor moiety D.sup.-. Cationic linking moiety L.sup.+ has the formula:-L'-G-where L' is a moiety which forms a stable radical with acceptor moiety A upon transfer of an electron from donor moiety D.sup.- to electron acceptor moiety A, and G is a moiety which forms a leaving group upon transfer of the electron from donor moiety D.sup.- to acceptor moiety A.

Abstract: A photocurable and thermosetting resin composition developable with an aqueous alkali solution is disclosed. The composition comprises in combination: (A) a photosensitive prepolymer soluble in a dilute aqueous alkali solution obtained by esterifying an epoxy resin represented by the following general formula (1) with (meth)acrylic acid and further adding an acid anhydride thereto until an acid value reaches a level in the range of 60 to 120 mg KOH/g, (B) a diglycidyl ether type epoxy compound containing two epoxy groups in the molecular unit thereof, (C) a photopolymerization initiator, and (D) a diluent at such ratios of combination that said epoxy compound (B) accounts for a proportion in the range of 5 to 120 parts by weight and said photopolymerization initiator (C) for a proportion in the range of 0.1 to 30 parts by weight, based on 100 parts by weight of said photosensitive prepolymer (A): ##STR1## wherein X represents CH.sub.2, C(CH.sub.3).sub.2, or SO.sub.

Abstract: The present invention relates to a hardenable organopolysiloxane composition having a viscosity of less than 30,000 Poise at 25.degree. C. comprising (A) 30 to 75 wt % of a silicone resin, (B) 70 to 25 wt % of a mercapto functional organopolysiloxane, (C) 0.1 to 10 parts by weight per 100 parts by weight of (A)+(B) of a mercapto functional organosilane, and (D) 0.01 to 10 parts by weight per 100 parts by weight of (A)+(B) of a condensation catalyst. The present invention also relates to an article of manufacture obtained by applying the hardenable organopolysiloxane composition to a substrate, exposing the composition and substrate to high energy radiation, and then applying a solid support to the coated substrate.

Abstract: A radiation-curable release composition is disclosed which comprises:(A) an organopolysiloxane represented by the formulaRSi(CH.sub.3).sub.2 --O--(Si(CH.sub.3).sub.2 O).sub.n (Si(CH.sub.3)(R)O).sub.m Si(CH.sub.3).sub.2 R (I)wherein in Formula (I), each R is --R.sup.1 --O(O)C--C(R.sup.2).dbd.CH.sub.2, --R.sup.1 --O--C(R.sup.2).dbd.CH.sub.2 or is derived from an organic molecule containing both ethylenic unsaturation and epoxide functionality; R.sup.1 is a hydrocarbylene group; each R.sup.2 is independently hydrogen or a methyl or ethyl group; m is a number from about 1 to about 15; and n is a number from about 50 to about 300; and(B) an organosiloxane copolymer represented by the formula(R.sub.3 SiO).sub.x (SiO.sub.4/2).sub.y (II)wherein in Formula (II), each R is independently a hydrocarbon group or a group represented by the formula--O(O)C--C(R*).dbd.CH.sub.2wherein R* is hydrogen or a methyl or ethyl group; x is a number from about 0.

Abstract: A fluorine-containing benzophenone derivative of the formula (1), (2) or (3):.PHI..sup.1 (--X.sup.1 --Q.sup.1 --R.sub.f.sup.1).sub.n (1).PHI..sup.2 --X.sup.2 --Q.sup.2 --R.sub.f.sup.2 --Q.sup.3 --X.sup.3 --.PHI..sup.3 (2).PHI..sup.4 --X.sup.4 --Q.sub.f --X.sup.5 --.PHI..sup.5 (3)wherein .PHI..sup.1 is a 2-hydroxybenzophenone structure of the formula ka-1: ##STR1## (wherein Y is a hydrogen atom or a hydroxyl group, each of k and m indicates the number of bond sites, k is an integer of from 0 to 3, and m is an integer of from 0 to 3, provided that 1.ltoreq.(k+m).ltoreq.4), n corresponds to (k+m) and is an integer of from 1 to 4, each of .PHI..sup.2, .PHI..sup.3, .PHI..sup.4 and .PHI..sup.5 is a 2-hydroxybenzophenone structure of the formula ka-1 wherein (k+m) is 1, each of X.sup.1, X.sup.2, X.sup.3, X.sup.4 and X.sup.5 is a single bond or an oxygen atom, Q.sup.1 is a single bond or a bivalent linking group having a carbon atom directly bonded to X.sup.1, each of Q.sup.2 and Q.sup.

Abstract: Photoinitiators having a terminal fluoroalkyl moiety are useful for photopolymerizing and photocuring fluorinated as well as non-fluorinated monomers, especially fluorinated acrylic monomers.

Abstract: A UV and moisture-curable organopolysiloxane composition comprising (i) an organopolysiloxane terminated with a radical of formula (1): ##STR1## wherein R.sup.1 is a hydrogen atom or monovalent hydrocarbon radical, each of R.sup.2 and R.sup.3 is a divalent hydrocarbon radical which may contain a NH bond or ether bond, each of R.sup.4 and R.sup.5 is a monovalent hydrocarbon radical which may contain an ether bond, and a is equal to 0 or 1, (ii) a photo-polymerization initiator, and (iii) a curing catalyst. The composition readily cures either upon exposure to UV radiation or upon contact with moisture and from the surface to the deep interior within a short time, yielding cured products having satisfactory physical properties.

Abstract: A process is described for photoinitiated control of inorganic network fotion in the sol-gel process, which comprises eitherA) subjecting one or more hydrolytically polycondensable compounds of constituent elements of glass or ceramic, excluding silicon compounds containing polymerizable organic groups, to hydrolytic polycondensation in a liquid reaction medium to form a sol andirradiating the resulting sol in a structured or unstructured manner in the presence of a photoinitiator which can change the pH of the reaction medium on irradiation, using radiation of a wavelength range in which the photoinitiator absorbs;orB) liberating water in an anhydrous reaction medium which contains an alcohol, one or more hydrolytically polycondensable compounds of constituent elements of glass or ceramic and a photoinitiator which can liberate water by a photochemical reaction or a secondary reaction when irradiated, by structured or non-structured irradiation using radiation of a wavelength range in which the photoinitiato

Abstract: Liquid highly active photoinitiators are obtained by dissolving a solid photoinitiator of the titanocene type in liquid photoinitiators of the acetal or ketal type. The liquid mixtures have a long dark storage stability.

Abstract: A radiation-sensitive compound has the general formula ##STR1## wherein A represents the ring members required to complete a 5- or 6-membered heterocyclic ring which may optionally be fused to an optionally substituted aromatic nucleus,B represents H, acyl, aroyl, heterocyclyl carbonyl or ##STR2## R represents an optionally substituted alkyl group, E and G, which may be the same or different, each represents H or CH.sub.p X.sub.3-p,J and K, which may be the same or different, each represents an aryl or heterocyclic group, which may optionally include a substituent additional to E or G,X represents Cl or Br, and m,n and p, which may be the same or different, each represents an integer equal to 0, 1 or 2.The compound can be used to form radiation sensitive compositions for the production of radiation sensitive plates in lithographic printing plate manufacture.

Abstract: Disclosed are ink compositions having improved freeze-thaw properties that contain an effective amount of propylene glycol, for example, 0.5 to 10 weight percent. The inks also contain a water-dissipatable polyester prepared from certain amounts of isophthalic acid, 5-sodiosulfoisophthalic acid, cyclohexanedimethanol, and diethylene glycol.

Abstract: A photoresist composition is disclosed. The photoresist composition comprises a base resin, a photosensitizer, and a solvent. The base resin comprises polyhydroxystyrene represented by the following structural formula (I): ##STR1## (wherein k is a positive integer). The photosensitizer comprises a polyhalogen compound(s). The photoresist composition of the present invention has dry etching resistance characteristics comparable to those of conventional positive novolak photoresist compositions and can form a resist pattern with a high resolution and vertical sidewall profiles. This makes microprocessing possible.

Abstract: Radiation-curable two-layer systems containing immobilized photoinitiators are suitable for the production of coatings of constant thickness and good adhesion, and relief structures of high resolution and edge steepness.

Abstract: Ink compositions which are aqueous dispersions of a water-dispersible polymer, a Disperse dye, and a dihydroxybenzophenone or derivative thereof are stable with respect to precipitation.

Abstract: Disclosed is a compound of the general formula ##STR1## wherein L=H or CO--(R.sup.1).sub.n (CX.sub.3).sub.m, M=alkylene, alkenylene, Q=S, Se, O, dialkylmethylene, alken-1,2-ylene, 1,2-phenylene or N-R, with M+Q together forming 3 or 4 ring members, R=alkyl, aralkyl or alkoxyalkyl, R.sup.1 is an aromatic group and X=Cl, Br or I, with n=O and m=1 or n=1 and m=1 or 2. The compounds, on exposure, eliminate HX and form free radicals and are therefore highly effective as acid donors and free radical initiators for photochemical processes.

Abstract: The ultraviolet-curable organoploysiloxane composition of the invention comprises (A) an organopolysiloxane having bonded to a silicon atom thereof a silyl-substituted ethyl group represented by the general formula[CH.sub.2 .dbd.CR.sup.1 --CO--O--(--CH.sub.2 --).sub.a --SiR.sup.2.sub.2 --](R.sup.2 .sub.3 Si--O--).sub.c R.sup.2.sub.2--c Si--C.sub.2 H.sub.4 --,in which R.sup.1 is a hydrogen atom or a methyl group, R.sup.2 is a monovalent hydrocarbon group, a is 1, 2 or 3 and c is 1 or 2, and (B) a photopolymerization initiator. The composition is rapidly cured by ultraviolet irradiation into a gel-like material having adhesiveness without the disadvantages of catalyst poisoning and undue volume shrinkage so that the composition is useful as a potting agent in electronic and electric components.

Abstract: Disclosed herein are novel diesters of (meth)acrylic acid represented by the following formula: ##STR1## wherein the mean values of m and n are respectively 0 to 5, preferably 0 to 3, the mean value of m+n is 1 to 10, preferably 1 to 6, and R represents H or CH.sub.3.Also, disclosed herein are resin compositions comprising said diester(s) of (meth)acrylic acid, polyurethane (meth)acrylate(s), monoethylenically unsaturated monomer(s) and initiator(s) of photopolymerization as an optional component.

Abstract: This invention describes UV-stabilized step growth polymers such as polyesters, polyurethanes, polycarbonates, and combinations thereof. The UV-stabilizing moieties present in these polymers comprise chemically bound, pendant ortho-hydroxydiphenyl ketone based moieties. The polymers are especially useful as protective films and fibers which are highly resistant to ultraviolet (UV) and sunlight degradation.