Quinone Ring Is Part Of Polynuclear System, E.g., Anthraquinone, Etc. Patents (Class 522/48)
  • Patent number: 4933398
    Abstract: A curable composition comprising (a) an epoxy resin, (b) a hardener if necessary, (c) an anthraquinone of formula I ##STR1## wherein R.sup.1 is --COOH or a radical of formula II ##STR2## wherein n is 0 or a number from 1 to 12, R.sup.2 is H, C.sub.1 -C.sub.12 -alkyl or --CN and R.sup.3 is H, --CN or the radical --C.sub.m H.sub.2m X, where m is 0 or a number from 1 to 12 and X is --COOH or --CN, and (d) an amino alcohol. The cured compositions are photosensitive and are suitable for the preparation of metallic coatings and images by electroless metal deposition.
    Type: Grant
    Filed: June 20, 1988
    Date of Patent: June 12, 1990
    Assignee: Ciba-Geigy Corporation
    Inventors: Walter Fischer, Jurgen Finter
  • Patent number: 4933260
    Abstract: A water-based photopolymerizable resin composition is disclosed which is suitable for the preparation of a relief printing plate by the photolithographic techniques. The inventive composition, which basically comprises a water-soluble polymer, e.g., poly(vinyl alcohol), a photopolymerizable monomer and a photopolymerization initiator, is characterized in that at least a part of the photopolymerizable monomer is N-tetrahydrofurfuryloxymethyl acrylamide or N-tetrahydrofurfuryloxymethyl methacrylamide. By virtue of this unique ingredient in the composition, the printing plate prepared from the inventive composition is imparted with improved fidelity of pattern reproduction and durability in printing as a consequence of increased hardness and pliability to be freed from the drawback of crack formation in printing even on a cylinder of small diameter under a cold and low-humidity condition.
    Type: Grant
    Filed: August 31, 1989
    Date of Patent: June 12, 1990
    Assignee: Tokyo Ohka Kogyo Co., Ltd.
    Inventors: Naoya Katsumata, Syunzi Nakazato, Katsuyuki Ohta, Toshimi Aoyama
  • Patent number: 4927865
    Abstract: Anthraquinones of formula I ##STR1## wherein X is the group --CR.sup.2 R.sup.3 --, where R.sup.2 is H, --CH or C.sub.1 -C.sub.5 -alkyl and R.sup.3 is H or --CN, R.sup.1 is H or C.sub.1 -C.sub.5 -alkyl and R is a direct bond or linear or branched C.sub.1 -C.sub.18 -alkylene which, alone or together with the --CR.sup.2 R.sup.3 -- group, can be interrupted by one or more --O-- when R.sup.2 and/or R.sup.3 are not --CN, and curable compositions comprising (a) an epoxy resin, (b) a hardener if necessary, (c) an anthraquinone of formula I and (d) an amino alcohol. The cured compositions are photosensitive and are suitable for the preparation of coatings and metallic images by electroless metal deposition.
    Type: Grant
    Filed: May 12, 1989
    Date of Patent: May 22, 1990
    Assignee: Ciba-Geigy Corporation
    Inventors: Rudolf Duthaler, Jurgen Finter, Walter Fischer, Visvanathan Ramanathan
  • Patent number: 4916169
    Abstract: A process for the addition of compounds containing silicon-bonded hydrogen to compounds containing aliphatic unsaturation and compositions suitable for said process. The process is activated by visible radiation and is conducted in the presence of a platinum complex having one cyclopentadienyl group that is eta-bonded to the platinum atom and three aliphatic groups that are sigma-bonded to the platinum atom and a sensitizer that is capable of absorbing visible light and is capable of transferring energy to said platinum complex such that the hydrosilation reaction is initiated upon exposure to visible light. The invention also provides for use in the aforementioned process.
    Type: Grant
    Filed: September 9, 1988
    Date of Patent: April 10, 1990
    Assignee: Minnesota Mining and Manufacturing Company
    Inventors: Larry D. Boardman, Joel D. Oxman
  • Patent number: 4910232
    Abstract: The ultraviolet-curable organoploysiloxane composition of the invention comprises (A) an organopolysiloxane having bonded to a silicon atom thereof a silyl-substituted ethyl group represented by the general formula[CH.sub.2 .dbd.CR.sup.1 --CO--O--(--CH.sub.2 --).sub.a --SiR.sup.2.sub.2 --](R.sup.2 .sub.3 Si--O--).sub.c R.sup.2.sub.2--c Si--C.sub.2 H.sub.4 --,in which R.sup.1 is a hydrogen atom or a methyl group, R.sup.2 is a monovalent hydrocarbon group, a is 1, 2 or 3 and c is 1 or 2, and (B) a photopolymerization initiator. The composition is rapidly cured by ultraviolet irradiation into a gel-like material having adhesiveness without the disadvantages of catalyst poisoning and undue volume shrinkage so that the composition is useful as a potting agent in electronic and electric components.
    Type: Grant
    Filed: July 7, 1988
    Date of Patent: March 20, 1990
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventor: Masatoshi Arai
  • Patent number: 4877818
    Abstract: The invention is directed to a photosensitive polymer composition capable of being electrophoretically depositable as an adherent, uniform photosensitive film on a conductive surface. The photosensitive polymer composition useful for electrodeposition is formed from an aqueous solution or emulsion of at least one polymer having charged carrier groups, a photoinitiator and a source of unsaturation for crosslinking the resulting film upon exposure to actinic radiation. The photosensitive film formed from the photosensitive polymer composition is aqueous developable and resistant to strong inorganic acids and strong bases. The photosensitive polymer composition is useful in the preparation of printed circuit boards, lithographic printing plates, cathode ray tubes, as well as in chemical milling, solder resist and planarizing layer applications.
    Type: Grant
    Filed: January 11, 1988
    Date of Patent: October 31, 1989
    Assignee: Rohm and Haas Company
    Inventors: William D. Emmons, Mark R. Winkle
  • Patent number: 4857434
    Abstract: This invention is directed to a thermal or radiation curable prepolymer, formulations containing same and processes of using same, said prepolymer comprising a liquid meth(acrylate) terminated polymeric hydrocarbon maleate having pendant maleate groups. Said prepolymer either per se or formulated with mono- or multi-functional unsaturated monomers and either a thermal or photoinitiator on exposure to heat or UV or high energy ionizing radiation forms a cured material utilizable as a printing plate, coating, adhesive or sealant.
    Type: Grant
    Filed: September 2, 1987
    Date of Patent: August 15, 1989
    Assignee: W. R. Grace & Co.
    Inventor: Lori J. Klinger
  • Patent number: 4843111
    Abstract: Disclosed herein are novel diesters of (meth)acrylic acid represented by the following formula: ##STR1## wherein the mean values of m and n are respectively 0 to 5, preferably 0 to 3, the mean value of m+n is 1 to 10, preferably 1 to 6, and R represents H or CH.sub.3.Also, disclosed herein are resin compositions comprising said diester(s) of (meth)acrylic acid, polyurethane (meth)acrylate(s), monoethylenically unsaturated monomer(s) and initiator(s) of photopolymerization as an optional component.
    Type: Grant
    Filed: January 21, 1987
    Date of Patent: June 27, 1989
    Assignee: Nippon Kayaku Kabushiki Kaisha
    Inventors: Minoru Yokoshima, Tetsuo Ohkubo, Hideaki Hattori, Masayuki Kiyomoto
  • Patent number: 4839399
    Abstract: An active energy beam-curable type resin composition, which comprises (A) a graft copolymer comprising a main chain composed mainly of structural units of monomers containing one (meth)acryloyl group and a dicyclopentenyl derivative group represented by the following general formula (I): ##STR1## wherein Z represents a five-membered ring given by ##STR2## and R.sub.1 and R.sub.
    Type: Grant
    Filed: March 5, 1987
    Date of Patent: June 13, 1989
    Assignee: Canon Kabushiki Kaisha
    Inventors: Yasufumi Sato, Megumi Munakata, Hiromichi Noguchi
  • Patent number: 4839400
    Abstract: An active energy ray-curable resin composition comprises (A) a graft copolymerized polymer comprising graft chains composed mainly of structural units derived from at least one monomer selected from the group consisting of (a) hydroxyl containing (meth)acrylic monomers, (b) amino or alkylamino containing (meth)acrylic monomers, (c) carboxyl containing (meth)acrylic or vinyl monomers, (d) N-vinylpyrrolidone, (e) vinylpyridine or its derivatives and (f) (meth)acrylic amide derivatives represented by the general formula (II) shown below: ##STR1## (wherein R.sub.1 is hydrogen or methyl group and R.sub.2 is hydrogen or an alkyl or acyl group having 1 to 4 carbon atoms which may have hydroxyl group added to trunk chains composed mainly of structural units compsiting at least one monomer selected from the group consisting of the monomer represented by the general formula (I) shown below: ##STR2## (wherein R.sub.1 to R.sub.
    Type: Grant
    Filed: March 6, 1987
    Date of Patent: June 13, 1989
    Assignee: Canon Kabushiki Kaisha
    Inventors: Yasufumi Sato, Megumi Munakata, Hiromichi Noguchi
  • Patent number: 4835193
    Abstract: A photopolymerizable epoxy resin composition comprising (a) an epoxy resin and (b) a heteropoly-acid aromatic sulfonium salt or a heteropoly-acid aromatic iodonium salt as a photocuring catalyst exhibits rapid photopolymerization, with the cured product being great in hardness, the corrosive action being weak, and the electrical properties being excellent. The industrial utility of the composition is therefore substantial.
    Type: Grant
    Filed: May 7, 1987
    Date of Patent: May 30, 1989
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Shuzi Hayase, Yasunobu Onishi, Shuichi Suzuki, Moriyasu Wada
  • Patent number: 4794130
    Abstract: A shaped article of halogenated polymer which is obtained by causing a halogen to react upon a shaped article of a polymer by irradiation of light is irradiated with light in the presence of an acetylene compound to have the acetylene compound graft polymerized onto the shaped article of polymer.
    Type: Grant
    Filed: March 30, 1987
    Date of Patent: December 27, 1988
    Assignees: Agency of Industrial Science and Technology, Ministry of International Trade and Industry
    Inventors: Kiyoshi Hayakawa, Hiromi Yamakita, Masato Tazawa, Hiroshi Taoda
  • Patent number: 4777213
    Abstract: Promoters for a crosslinking reaction involved in the curing of a system comprising crosslinkable polymers are bound to polymeric microparticles having a diameter of about 0.01 to 6 microns prepared by polymerizing a mixture of ethylenically unsaturated monomers. The microparticles carrying the crosslinking reaction promoter may be incorporated to coating compositions, printing inks, sealants, adhesives and other polymeric products in place of conventional crosslinking reaction promoters.
    Type: Grant
    Filed: March 2, 1987
    Date of Patent: October 11, 1988
    Assignee: Nippon Paint Co., Ltd.
    Inventors: Kazunori Kanda, Shinichi Ishikura, Keizou Ishii, Akio Kashihara
  • Patent number: 4767797
    Abstract: A linear polymer having a recurring unit represented by the formula (I): ##STR1## wherein R.sub.1, R.sub.2, R.sub.3 and R.sub.4 each independently is a hydrogen atom, a C.sub.1-10 alkyl group, a C.sub.6-10 cycloalkyl group, an aryl group, or a halogen atom and the ethynyl group is in either meta position or para position to the main polymer chain;and a weight-average molecular weight of 1,000 to 1,000,000. A resin composition consisting essentially of (i) a polymer having a recurring unit represented by the formula (I) or a polymer having a recurring unit represented by the formula (I) and a recurring unit represented by the formula (II): ##STR2## wherein X and Y each independently is a C.sub.6-20 aryl group, a C.sub.1-10 alkyl group, a C.sub.6-10 cycloalkyl group, a silyl group having a C.sub.1-10 alkyl group or a C.sub.
    Type: Grant
    Filed: August 25, 1986
    Date of Patent: August 30, 1988
    Assignee: Asahi Kasei Kogyo Kabushiki Kaisha
    Inventors: Hideo Ai, Yohsuke Koizumi, Naohiro Tsuruta
  • Patent number: 4762887
    Abstract: A process for preparing radiation polymerizable acrylate-functional organopolysiloxane-urethane copolymers by reacting aminofunctional polysiloxanes with acrylated urethane oligomers in the presence of a solvent.
    Type: Grant
    Filed: January 15, 1987
    Date of Patent: August 9, 1988
    Assignee: Wacker Silicones Corporation
    Inventors: Roy M. Griswold, Douglas G. Vanderlaan
  • Patent number: 4742092
    Abstract: The curable organopolysiloxane composition of the invention is formulated with two kinds of crosslinking agents including an organosilane compound having 2 or 3 isopropenyloxy groups in a molecule and an organopolysiloxane having at least 2 mercapto groups in a molecule added to the base ingredient of a hydroxy-terminated diorganopolysiloxane together with a curing catalyst and a photosensitizer. The composition has two-way curability by the condensation reaction in the presence of atmospheric moisture between the silanolic hydroxy groups and the isopropenyloxy groups and by the ultraviolet-induced addition reaction between the isopropenyloxy groups and the mercapto groups to exhibit very reliable curing behavior giving a cured rubbery elastomer having excellent properties.
    Type: Grant
    Filed: October 14, 1986
    Date of Patent: May 3, 1988
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Yoshio Inoue, Masatoshi Arai
  • Patent number: 4683250
    Abstract: Room temperature-curable composition made from a silicone-modified polyether containing silyl end groups having hydrolyzable groups and ester provide a cured silicone product which does not have a tacky surface. Adding a sensitizer to the composition increases the reliability of the surface to be void of tack. These compositions have less dirt pickup.
    Type: Grant
    Filed: November 28, 1986
    Date of Patent: July 28, 1987
    Assignee: Toray Silicone Co., Ltd.
    Inventor: Ryuzo Mikami
  • Patent number: 4680368
    Abstract: An ultraviolet curable ink composition comprising, as main components,(A) a polyurethane poly(meth)acrylate obtained by reacting a polyisocyanate compound of the formula: ##STR1## wherein R.sub.1 is a hydrogen atom or a methyl group, and n is an integer of from 1 to 20, with a hydroxyl group-containing (meth)acrylate, and having, in one molecule, at least two (meth)acryloyl groups and at least two urethane bonds,(B) a radical polymerizable low molecular weight compound, and(C) a photopolymerization initiator.
    Type: Grant
    Filed: June 3, 1986
    Date of Patent: July 14, 1987
    Assignee: Mitsubishi Rayon Company Limited
    Inventors: Hideo Nakamoto, Fumito Aosai, Hiroshi Fukushima, Eriko Suda
  • Patent number: 4657842
    Abstract: Photosensitive compositions of matter which are capable of undergoing condensation or addition reactions and may or may not be crosslinkable, and which contain an anthraquinone of the formula I ##STR1## in which X, X', R' and R" are as defined in patent claim 1 and X or X' is, for example, --OH or --NH.sub.2, at least one monomeric, oligomeric or polymeric compound which can be reacted with this anthraquinone, for example, if X is --OH, a polymer with terminal glycidyl groups, and, where relevant, a crosslinking agent and/or a salt of a metal of group Ib or VIII of the periodic table, are suitable for image formation by means of electroless metal deposition.
    Type: Grant
    Filed: November 4, 1985
    Date of Patent: April 14, 1987
    Assignee: Ciba-Geigy Corporation
    Inventors: Jurgen Finter, Walter Fischer, Friedrich Lohse
  • Patent number: 4624971
    Abstract: A process is disclosed for producing an abrasion resistant UV curable photopolymerizable composition for coating substrates. The process involves dense grafting and comprises hydrolyzing in an aqueous acidic solution a trialkoxysilane to render it organophillic followed by dispersion with fine silica or alumina. Grafting of the hydrolyzed trialkoxysilane to the silica or alumina is effected through dehydration. The grafted material is then dispersed into intimate contact with one or more photopolymerizable monomers and photoinitiators.
    Type: Grant
    Filed: March 1, 1985
    Date of Patent: November 25, 1986
    Assignee: Battelle Development Corporation
    Inventors: Nguyen van Tao, Gunter Bellmann
  • Patent number: 4595635
    Abstract: This invention provides organopolysiloxane materials having cone penetration between about 100 and about 350 (10.sup.-1 mm) and ultimate elongation of at least 100% and having reduced surface tack. This invention provides three methods of obtaining said materials with reduced surface tack. The first method comprises applying to the surface of such material an organic peroxide or a photoinitiator and irradiating the surface with ultraviolet light to further crosslink the surface to reduce or eliminate the tack of the surface. The second method comprises mixing a photoinitiator, such as benzophenone, in an organopolysiloxane fluid, thermally crosslinking the organopolysiloxane fluid to produce the material with the above cone penetration and ultimate elongation then irradiating the surface of the material with ultraviolet light to reduce or eliminate the tack of the surface.
    Type: Grant
    Filed: May 2, 1985
    Date of Patent: June 17, 1986
    Assignee: Raychem Corporation
    Inventors: Robert S. Dubrow, Catherine A. Dittmer, William D. Uken
  • Patent number: 4584260
    Abstract: A photopolymerizable composition comprising an addition polymerizable unsaturated compound containing at least two ethylenically unsaturated double bonds in the molecule thereof and photopolymerization initiators, wherein a 4,4'-bis(dialkylamino)benzophenone represented by general formula I below, a benzophenone derivative represented by general formula II below and a compound having a group represented by general formula III below are contained as said photopolymerization initiators: ##STR1## wherein R represents an alkyl, cycloalkyl or hydroxyalkyl group having 1 to 6 carbon atoms or is combined with another R substituted on the same nitrogen atom to form tetramethylene, pentamethylene or oxybisethylene; ##STR2## wherein R.sup.1 represents a hydrogen atom ##STR3## X.sub.1 and X.sub.2 each represents an alkyl group, an alkoxy group, a carboxy group, an alkoxycarbonyl group, an aryloxycarbonyl group or a halogen atom; m and n each represents 0, 1 or 2 and when m and n each represents 2, X.sub.1 and X.sub.
    Type: Grant
    Filed: June 6, 1985
    Date of Patent: April 22, 1986
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Masayuki Iwasaki, Minoru Maeda, Fumiaki Shinozaki