Specified Rate-affecting Material Contains Nitrogen Patents (Class 522/65)
  • Patent number: 9527995
    Abstract: A polyester AB is disclosed comprising moieties derived from di- or polyfunctional organic acid compounds A and moieties derived from di- or polyfunctional organic hydroxy compounds B, wherein the compounds A comprise “hard” acid compounds Al selected from the group consisting of isophthalic acid, trimellithic acid anhydride, hexahydrophthalic acid, cyclohexane-1,4-dicarboxylic acid, and tetrahydrophthalic acid, and soft acid compounds A2 selected from the group consisting of adipic acid, dimer fatty acids, and sebacic acid, and the compounds B comprise “hard” hydroxyfunctional compounds selected from the group consisting of trimethylolpropane, 1,2-bishydroxymethyl cyclohexane, and 1,2-dihydroxy-propane, and soft hydroxyfunctional compounds B2 selected from the group consisting of 1,4-butanediol, 1,6-hexanediol, 2,2?-dihydroxydiethyl ether, and 1,2-bis(2-hydroxypropoxy)-propane, and coating compositions prepared from this polyester together with crosslinkers selected from the group consisting of isocyanates,
    Type: Grant
    Filed: November 22, 2010
    Date of Patent: December 27, 2016
    Assignee: Allnex Austria GmbH
    Inventors: Roland Feola, Johann Gmoser, Oliver Etz
  • Patent number: 9056938
    Abstract: A fluorine-containing cyclic olefin polymer composition of the present invention includes a fluorine-containing cyclic olefin polymer (A) containing a repeating structural unit represented by the general formula (1) and having a fluorine atom content rate of 40 to 75% by mass; a photocurable compound (B); and a photocuring initiator (C).
    Type: Grant
    Filed: August 20, 2010
    Date of Patent: June 16, 2015
    Assignee: MITSUI CHEMICALS, INC.
    Inventors: Tadahiro Sunaga, Takashi Oda
  • Publication number: 20150126638
    Abstract: The present invention relates to a varnish which is for covering the surface of a substrate and deposited by inkjet, to a process for preparing said varnish and to the use thereof as a laminable and/or overprintable ink or varnish.
    Type: Application
    Filed: April 24, 2013
    Publication date: May 7, 2015
    Inventors: Edmond Abergel, Pierre Ivry Sur Seine
  • Patent number: 8952367
    Abstract: Provided is an organic light emitting element having a high light emission efficiency and a low drive voltage. In the organic light emitting element including a positive electrode, a negative electrode and an organic compound layer disposed between the positive electrode and the negative electrode, the organic compound layer includes a thioxanthone compound represented by the following general formula [1].
    Type: Grant
    Filed: October 31, 2011
    Date of Patent: February 10, 2015
    Assignee: Canon Kabushiki Kaisha
    Inventors: Jun Kamatani, Masanori Seki, Takeshi Sekiguchi, Yosuke Nishide, Akihito Saitoh
  • Publication number: 20140370248
    Abstract: An energy curable inkjet ink includes a nitroxy inhibitor, a compound having an ethylenic unsaturated bond, a photoinitiator, a coloring agent, and a stray light resistance index of at least 7. A method of preparing an energy curable inkjet ink with stray light resistance includes providing a nitroxy inhibitor; providing a mixture of a compound having an ethylenic unsaturated bond, and a photoinitiator, and a coloring agent; combining the nitroxy inhibitor and the mixture to obtain the energy curable inkjet ink and thereby to increase a stray light resistance index of the energy curable inkjet ink to at least 7.
    Type: Application
    Filed: December 13, 2012
    Publication date: December 18, 2014
    Applicant: SUN CHEMICAL CORPORATION
    Inventors: Stephen Anthony Hall, Kirsty Margaret McVean
  • Patent number: 8846160
    Abstract: A method for building three-dimensional articles using a thermal polymerization process in provided. The articles are built by using a composition that includes a thermally polymerizable composition, a thermal initiator, and a nonlinear light-to-heat conversion material such as a reverse saturable dye. The article is built by the sequential exposure of adjacent voxels with a laser beam. Microlens arrays can be used to expose more than one voxel at a time.
    Type: Grant
    Filed: November 11, 2009
    Date of Patent: September 30, 2014
    Assignee: 3M Innovative Properties Company
    Inventors: Pingfan Wu, Ying-Yuh Lu, Robin E. Wright, Robert J. DeVoe, Travis L. Potts, Douglas S. Dunn, Wayne S. Mahoney, Dong-Wei Zhu
  • Patent number: 8841064
    Abstract: Disclosed are a positive photosensitive resin composition that includes (A) an alkali soluble resin; (B) a dissolution controlling agent including the compound represented by Chemical Formula 6; (C) a photosensitive diazoquinone compound; (D) a silane compound; and (E) a solvent, and a photosensitive resin film prepared by using the same.
    Type: Grant
    Filed: November 11, 2011
    Date of Patent: September 23, 2014
    Assignee: Cheil Industries Inc.
    Inventors: Myoung-Hwan Cha, Jong-Hwa Lee, Mi-Ra Im, Min-Kook Chung, Ji-Young Jeong, Hyun-Yong Cho, Hwan-Sung Cheon
  • Publication number: 20140228466
    Abstract: Antimicrobial compositions and methods are disclosed. The antimicrobial compositions are particularly useful in providing antimicrobial capability to a wide-range of medical devices. In one aspect the invention relates a UV curable antimicrobial coating comprising a UV curable composition comprising an oligomer, a momoner, and a photoinitiator which are together capable of forming a UV curable polymer composition. The compositions also include insoluble antimicrobial agents, which may be selected from a wide array of agents. The insoluble antimicrobial agents include a particle size less than 15 ?m. Representative insoluble antimicrobial agents include chlorhexidine diacetate, chlorhexidine base, alexidine(dihydrochloride), silver sufladiazene, silver citrate, triclosan, octenidine(dihydrochloride), and rifampicin.
    Type: Application
    Filed: February 13, 2013
    Publication date: August 14, 2014
    Applicant: BECTON, DICKINSON AND COMPANY
    Inventors: Janice Lin, Yiping Ma
  • Publication number: 20140179820
    Abstract: The invention provides meltable and UV-crosslinkable pressure-sensitive adhesives, such as acrylate hotmelts or hotmelt formulations, which can be processed by commonplace hotmelt processes and also on customary hotmelt coating lines, without any immediate alteration in the product properties in the event of (unwanted) deviation in the operational parameters. The compositions of the invention are UV-crosslinkable and meltable pressure-sensitive adhesives comprising (i) mixtures of UV-crosslinkable polyacrylate polymers selected from a) mixtures of UV-crosslinkable polymers with at least one photoinitiator bonded covalently to the backbone of the polymers, and b) mixtures of UV-crosslinkable polyacrylate polymers, monomers and at least one photoinitiator, and also (ii) at least one UV stabilizer, and also methods for producing them and the use thereof as bonding agents.
    Type: Application
    Filed: December 11, 2013
    Publication date: June 26, 2014
    Applicant: tesa SE
    Inventors: Alexander Prenzel, Stephan Zöllner, Michael Siebert
  • Patent number: 8753739
    Abstract: The present invention relates to a multi-layer product, the first layer being a UV-cured protective layer which contains SiO2 nanoparticles, and the second layer containing a thermoplastic substrate. In addition, the invention relates to the composition of the UV-curable first layer, a process for the production of the multi-layer products and products, such as e.g. glazing products, which contain the named multi-layer products.
    Type: Grant
    Filed: April 3, 2007
    Date of Patent: June 17, 2014
    Assignee: Bayer MaterialScience AG
    Inventors: Frank Buckel, Robert Maleika, Walter Koehler, Reiner Meyer
  • Patent number: 8727775
    Abstract: The present invention provides polymerizable dental compositions comprising a dimer acid-derived monomer such as a dimer acid-derived di(meth)acrylate monomer.
    Type: Grant
    Filed: December 29, 2004
    Date of Patent: May 20, 2014
    Assignee: The Regents of the University of Colorado, a Body Corporate
    Inventors: Jeffrey W. Stansbury, Christopher N. Bowman, Marianela Trujillo
  • Patent number: 8703840
    Abstract: The present invention provides a dental adhesive material kit having excellent bond durability. The present invention is represented by a dental adhesive material kit containing a dental aqueous adhesive composition (A) and a multi-part type dental nonaqueous curable composition (B). The dental aqueous adhesive composition (A) contains a polymerizable monomer (a) having an acidic group, an aliphatic polymerizable monomer (b) having no acidic group, water (c), and an amine-based reducing agent (d1) containing no sulfur atom. The multi-part type dental nonaqueous curable composition (B) contains an aliphatic polymerizable monomer (b) having no acidic group, an aromatic polymerizable monomer (e) having no acidic group, a powdery water-soluble reducing compound (f) containing a sulfur atom, an organic peroxide (g), and an amine-based reducing agent (d2) containing no sulfur atom.
    Type: Grant
    Filed: March 25, 2011
    Date of Patent: April 22, 2014
    Assignee: Kuraray Noritake Dental Inc.
    Inventors: Michiya Kawana, Hidemi Nakayama, Mitsuru Takei, Kenji Suzuki, Ai Hinamoto
  • Patent number: 8691352
    Abstract: Disclosed is a photopolymerizable composition which contains a photopolymerization initiator (A) that has a partial structure represented by the following Formula (1) and a polymerizable compound (B). In General formula (1), R3 and R4 each independently represents a hydrogen atom, an alkyl group, an alkenyl group, an alkynyl group, an aryl group, a heteroaryl group or an alkoxy group; R3 and R4 may form a ring with each other; and X represents OR5, SR6, or NR17R18. The photopolymerizable composition is capable of forming a cured film that has high sensitivity, excellent intra-membrane curability and excellent adhesion to a support. The cured film is able to maintain a patterned shape even during post-heating after development and has good pattern formability, while coloring due to heating with passage of time being suppressed.
    Type: Grant
    Filed: August 10, 2010
    Date of Patent: April 8, 2014
    Assignee: FUJIFILM Corporation
    Inventor: Masaomi Makino
  • Patent number: 8673996
    Abstract: An adhesive (co)polymers comprising: a) an isobutylene copolymer having pendent anhydride groups, b) a polyamine photobase generator and c) optionally a tackifier is described.
    Type: Grant
    Filed: October 25, 2011
    Date of Patent: March 18, 2014
    Assignee: 3M Innovative Properties Company
    Inventors: Hae-Seung Lee, Joon Chatterjee, Gregg A. Caldwell, Babu N. Gaddam
  • Publication number: 20140045106
    Abstract: A colored curable composition is provided which includes (A) at least one colorant selected from the group consisting of a compound represented by the following formula (I) and a compound represented by the following formula (II); (B) a colorant having a hue different from that of the (A) colorant; and (C) a polymerizable compound. In the formulae, each of R1 to R8 independently represents a hydrogen atom, an alkyl group, an alkoxy group, an alkoxycarbonyl group, a carbamoyl group, a sulfamoyl group, a sulfonylamino group, a carbonylamino group, a cyano group, an aryl group, or a heteroaryl group.
    Type: Application
    Filed: October 22, 2013
    Publication date: February 13, 2014
    Applicant: FUJIFILM CORPORATION
    Inventors: Akinori FUJITA, Kazumasa MOROZUMI, Youhei ISHIJI, Tomohiro KODAMA
  • Patent number: 8507726
    Abstract: Photoinitiators mixture comprising (i) at least one compound selected from the group consisting of alpha-hydroxy ketones, monoacylphosphine oxides, bisacylphosphine oxides, ketosulfones, benzil ketals, benzoin ether, phenylglyoxylates, borates and titanocenes; and (ii) at least one compound of the formula (I) or (I?) R1, R?1, R2 and R2? R?9 independently of each other for example are hydrogen or C1-C12alkyl R7, R8, R9, R?8 and R?9 independently of each other for example are hydrogen, C1-C12alkyl which optionally is substituted or phenyl which optionally is substituted, exhibit excellent photoinitiating properties.
    Type: Grant
    Filed: October 23, 2009
    Date of Patent: August 13, 2013
    Assignee: BASF SE
    Inventors: Katia Studer, Sébastien Villeneuve, Akira Matsumoto, Hisatoshi Kura, Jan Sültemeyer
  • Patent number: 8507725
    Abstract: Compounds of the formula I or (I?), wherein R1 and R?1 for example are hydrogen, C3-C8cycloalkyl or C1-C12alkyl, R2 and R2? for example are hydrogen; unsubstituted C1-C20alkyl or substituted C1-C20alkyl; and R8 and R9 for example are hydrogen, C1-C12alkyl which optionally is substituted, or phenyl which optionally is substituted; exhibit an unexpectedly good performance in photopolymerization reactions.
    Type: Grant
    Filed: May 27, 2009
    Date of Patent: August 13, 2013
    Assignee: BASF SE
    Inventors: Akira Matsumoto, Hisatoshi Kura
  • Patent number: 8492071
    Abstract: A curable composition containing (A) a polymerizable compound having an alkyleneoxy group having two or more carbon atoms, (B) a polymerizable compound lacking an alkyleneoxy group having two or more carbon atoms, (C) an i-line absorber, (D) a photopolymerization initiator, (E) an alkali-soluble resin, and (F) a pigment, wherein a mass ratio [(A)/((A)+(B))] is from 0.5 to 0.9, and an i-line transmittance obtainable when the curable composition is formed into a coating film having a thickness of 0.7 ?m, is 10% or less. The curable composition of the invention has enhanced adhesiveness upon forming a micro pattern, and can reduce development residues in unexposed non-cured areas. The curable composition of the invention is suitable for the use in color filters.
    Type: Grant
    Filed: March 27, 2009
    Date of Patent: July 23, 2013
    Assignee: FUJIFILM Corporation
    Inventor: Hiroshi Taguchi
  • Patent number: 8420709
    Abstract: The present invention relates to a coating composition comprising at least one photo-initiator and at least one (meth)acryl-polymer having units that are derived from (meth)acryl-monomers that have at least one double bond and 8 to 40 carbon atoms in the alkyl residue. The present invention furthermore relates to a monomer mixture comprising at least one (meth)acryl-monomer having at least one double bond and 8 to 40 carbon atoms in the alkyl residue and at least one photo-initiator monomer and a (meth)acryl-polymer that can be obtained by polymerization of said monomer mixture. The present invention furthermore relates to a method for producing a coating. The present invention furthermore relates to a coated object comprising a coating obtained by said method.
    Type: Grant
    Filed: March 30, 2010
    Date of Patent: April 16, 2013
    Assignee: Evonik Röhm GmbH
    Inventors: Christine Maria Breiner, Gerold Schmitt, Thorben Schuetz, Joachim Knebel, Ina Zwierzchowski, Margarita Stein
  • Patent number: 8389769
    Abstract: A polymerizable Type II photoinitiator according to Formula (I): wherein: A represents a Norrish Type II initiating group; L represents a divalent linking group positioning the Norrish Type II initiating group A and the CR2R3-group in a 1-5 to a 1-8 position wherein position 1 is defined as the first atom in the aromatic or alicyclic ring of A to which L is covalently bonded and the position 5 to 8 is defined as the carbon atom of the CR2R3-group to which L is covalently bonded, with the proviso that L does not contain an amine. Radiation curable compositions and inks include the multifunctional Type II photoinitiator.
    Type: Grant
    Filed: May 28, 2009
    Date of Patent: March 5, 2013
    Assignee: Agfa Graphics NV
    Inventors: Johan Loccufier, Jaymes Van Luppen
  • Patent number: 8367190
    Abstract: The present invention relates to a composition for preparing an excellent protecting film with high strength, wear resistance, and excellent barrier property by low temperature hardening, a protecting film prepared therefrom, a substrate comprising the same, and a component or device comprising the same. The composition comprises an organosiloxane polymer a), a photobase generator b), and an organic solvent c).
    Type: Grant
    Filed: September 18, 2007
    Date of Patent: February 5, 2013
    Assignee: LG Chem, Ltd.
    Inventors: Jeong-Man Son, Minjin Ko, Myungsun Moon, Byung-Ro Kim, Jaeho Cheong
  • Patent number: 8362101
    Abstract: A multifunctional Type II photoinitiator according to Formula (I): wherein X represents a structural moiety according to Formula (II): wherein: A represents a Norrish Type II initiating group; and L represents a divalent linking group positioning the Norrish Type II initiating group A and the CR2R3-group in a 1-5 to a 1-9 position wherein position 1 is defined as the first atom in the aromatic or alicyclic ring of A to which L is covalently bonded and the position 5 to 9 is defined as the carbon atom of the CR2R3-group to which L is covalently bonded, with the proviso that L does not contain an amine. Radiation curable compositions and inks include the multifunctional Type II photoinitiator.
    Type: Grant
    Filed: May 28, 2009
    Date of Patent: January 29, 2013
    Assignee: Agfa Graphics NV
    Inventors: Johan Loccufier, Jaymes Van Luppen
  • Patent number: 8344038
    Abstract: A liquid radiation curable composition for inkjet printing includes a photoinitiating system consisting of one or more diffusion hindered photoinitiators selected from the group consisting of non-polymeric di- or multifunctional initiators, oligomeric or polymeric initiators, and polymerizable initiators, and one or more polymerizable co-initiators, wherein at least one of the polymerizable co-initiators is a polymerizable aromatic tertiary amine. Inkjet inks, an inkjet printing process, and packaging materials may include the liquid radiation curable composition.
    Type: Grant
    Filed: September 1, 2008
    Date of Patent: January 1, 2013
    Assignee: Agfa Graphics NV
    Inventors: Johan Loccufier, Roland Claes
  • Patent number: 8329771
    Abstract: The object of the present invention is to provide a photobase generator capable of efficiently generating amines (tertiary amines and amidine) high in catalytic activity by sensing light with a wavelength of from 350 to 500 nm (especially, from 400 to 500 nm). The present invention is a photobase generator characterized in being represented by general formula (1) or (2). Y+ is a quaternary ammonio group of general formula (3) to (5), and X? is a counter anion selected from among a borate anion, a phenolate anion, and a carboxylate anion.
    Type: Grant
    Filed: March 18, 2009
    Date of Patent: December 11, 2012
    Assignee: San-Apro Limited
    Inventors: Atsushi Shiraishi, Hideki Kimura
  • Publication number: 20120277340
    Abstract: An inkjet printing method includes in order the steps of: a) providing to an inkjet printer one or more colorless liquids and a white ink including a pigment with a refractive index greater than 1.60; b) mixing the white ink in a controlled amount with the one or more colorless liquids to form a white ink-mixture wherein the viscosity is reduced by at least 5 mPa·s by reference to the white ink when measuring the viscosity at 40° C. with a Brookfield DV-II+Pro at 12 rotations per minute; and c) printing the white ink-mixture with the inkjet printer onto an ink-receiver. Additionally, a color inkjet ink set includes the one or more colorless liquids and the white ink, and an inkjet printer for use in the inkjet printing method.
    Type: Application
    Filed: July 12, 2012
    Publication date: November 1, 2012
    Applicant: AGFA GRAPHICS NV
    Inventors: Etienne Van Thillo, Frank De Voeght, Emiel Verdonck
  • Patent number: 8293436
    Abstract: There are provided a compound represented by the following formula (I), a photopolymerizable composition containing (A) a photopolymerization initiator represented by the formula (I) and (B) a radical polymerizable monomer, a color filter produced by using the photopolymerizable composition, and a process for producing the color filter.
    Type: Grant
    Filed: January 6, 2010
    Date of Patent: October 23, 2012
    Assignee: FUJIFILM Corporation
    Inventor: Tomoya Sasaki
  • Patent number: 8288449
    Abstract: Latent photoactivatable precatalysts are provided for metathesis polymerization and has the general formula (Ru(NHC)n(X1)m(L)0p+((X2)?)p. Wherein NHC is an N-heterocyclic carbene, n=1 or 2; X1 is a C1-C18 mono or polyhalogenized carbolic acid or trifluoromethane sulfate; X2 is a C1-C18 mono or polyhalogenized carbolic acid, trifluoromethane sulfate, tetrafluoroborate, hexafluorophosphate, or hexafluoroantimonate; m=0, 1, or 2 and L=a C4-C18 carbolic acid nitrile or a C4-C18 carbolic acid di or trinitrile; o=6?n?m or 5?n?m and p=2?m.
    Type: Grant
    Filed: January 16, 2009
    Date of Patent: October 16, 2012
    Assignee: Deutsche Institute fuer Textil- und Faserforschung Denkendorf
    Inventors: Michael R. Buchmeiser, Dongren Wang
  • Publication number: 20120258313
    Abstract: The invention describes novel coating agents that include a polymer, one or more latent reactive groups and one or more noncovalent linking groups, the noncovalent linking groups selected to interact with a substrate to which the coating agent is applied. The coating agents are useful for providing a coating that can be further functionalized (for example, by application of additional coating layers), or for providing desirable properties to a surface.
    Type: Application
    Filed: December 21, 2010
    Publication date: October 11, 2012
    Inventors: Jie Wen, Kristin Taton, Laurie Lawin, William Knopke, Eric Guire, Patrick Guire
  • Patent number: 8273519
    Abstract: A hardmask composition includes a solvent and an organosilicon copolymer. The organosilicon copolymer may be represented by Formula A: (SiO1.5—Y—SiO1.5)x(R3SiO1.5)y??(A) wherein x and y may satisfy the following relations: x is about 0.05 to about 0.9, y is about 0.05 to about 0.9, and x+y=1, R3 may be a C1-C12 alkyl group, and Y may be a linking group including a substituted or unsubstituted, linear or branched C1-C20 alkyl group, a C1-C20 group containing a chain that includes an aromatic ring, a heterocyclic ring, a urea group or an isocyanurate group, or a C2-C20 group containing one or more multiple bonds.
    Type: Grant
    Filed: November 21, 2007
    Date of Patent: September 25, 2012
    Assignee: Cheil Industries, Inc.
    Inventors: Mi Young Kim, Sang Kyun Kim, Sang Hak Lim, Sang Ran Koh, Hui Chan Yun, Do Hyeon Kim, Dong Seon Uh, Jong Seob Kim
  • Patent number: 8258199
    Abstract: Compounds represented by the following structural formulas can be used as photoacid generators: Such compounds are useful, for example, in fabricating arrays of polymers.
    Type: Grant
    Filed: May 9, 2011
    Date of Patent: September 4, 2012
    Assignee: Affymetrix, Inc.
    Inventors: Glenn H. McGall, Andrea Cuppoletti
  • Publication number: 20120208914
    Abstract: The photocuring efficiency of a photoinitiator is increased by mixing it with an organic phosphite and an aldehyde. This mixture or photoinitiator composition can be used to cure acrylates or other photocurable compounds, particularly in an oxygen-containing environment.
    Type: Application
    Filed: February 14, 2011
    Publication date: August 16, 2012
    Inventor: Deepak Shukla
  • Publication number: 20120207939
    Abstract: The photocuring efficiency of a photoinitiator is increased by mixing it with an organic phosphite and an aldehyde. This mixture or photoinitiator composition can be used to cure acrylates or other photocurable compounds, particularly in an oxygen-containing environment.
    Type: Application
    Filed: February 14, 2011
    Publication date: August 16, 2012
    Inventor: Deepak Shukla
  • Publication number: 20120207945
    Abstract: A photocurable ink contains a colorant dissolved or dispersed within a solvent, a photoinitiator, an organic phosphite, an aldehyde, and a photocurable compound. The organic phosphite is present in a molar excess relative to the aldehyde moieties that are present. The photocurable ink can be used for imaging or other applications where a uniform or patterned image is desired. The photocurable ink can be cured partially before application, or totally cured after application.
    Type: Application
    Filed: February 14, 2011
    Publication date: August 16, 2012
    Inventor: Deepak Shukla
  • Patent number: 8217096
    Abstract: The present invention provides a photocurable pressure-sensitive adhesive composition which has sufficient adhesion before being irradiated with light, and after being irradiated with light, keeps a sufficient pot life and has a short cure-completion time at a room temperature. A cured product produced from the composition has high adhesion force to adherends difficult to be attached, and excellent durability. The photocurable pressure-sensitive adhesive composition comprises a crosslinking compound (A) that is crosslinkable by the action of a base, a photobase generator (B) which becomes active upon light irradiation to generate a base, and a tackifying component (C).
    Type: Grant
    Filed: June 4, 2008
    Date of Patent: July 10, 2012
    Assignee: Sekisui Chemical Co., Ltd.
    Inventor: Hiroji Fukui
  • Patent number: 8202679
    Abstract: An oxime ester compound of formula (I) useful as a photopolymerization initiator. A photopolymerization initiator having the oxime ester compound as an active ingredient is activated through efficient absorption of light of long wavelength, e.g., 405 nm or 365 nm, to exhibit high sensitivity. In formula (I), R1 and R2 are each R11, OR11, COR11, SR11, CONR12R13, or CN; R11, R12, and R13 are each hydrogen, a C1-C20 alkyl group, C6-C30 aryl group, a C7-C30 arylalkyl group, or a C2-C20 heterocyclic group; R3 and R4 are each R11, OR11, SR11, COR11, CONR12R13, NR12COR11, OCOR11, COOR11, SCOR11, OCSR11, COSR11, CSOR11, CN, halogen, or a hydroxyl group; a and b is each 0 to 4; X is oxygen, sulfur, selenium, CR31R32, CO, NR33, or PR34; and R31, R32, R33, and R34 each have the same meaning as R1.
    Type: Grant
    Filed: December 25, 2007
    Date of Patent: June 19, 2012
    Assignee: Adeka Corporation
    Inventors: Daisuke Sawamoto, Nobuhide Tominaga
  • Publication number: 20120149798
    Abstract: To provide a photocurable fluorinated polymer composition which has a high curing rate, shows little shrinkage before and after photocuring and requires no post treatment such as heat treatment after photocuring and whereby it is possible to obtain a cured resin excellent in heat resistance and weather resistance. According to the photocurable fluorinated polymer composition comprising a fluorinated polymer (A) containing polymerized units derived from a fluoroolefin and polymerized units derived from an unsaturated monomer having an oxetanyl group or a substituted oxetanyl group, and a photoreaction initiator (B), of the present invention, it is possible to provide a photocurable fluorinated polymer composition which has a high curing rate, shows little shrinkage before and after photocuring and requires no post treatment such as heat treatment after photocuring and whereby it is possible to obtain a cured resin excellent in heat resistance and weather resistance.
    Type: Application
    Filed: February 17, 2012
    Publication date: June 14, 2012
    Applicant: Asahi Glass Company, Limited
    Inventors: Shun SAITO, Hiroshi Nishio, Sho Masuda
  • Publication number: 20120142807
    Abstract: Polymerizable compositions are provided that contain an epoxy compound and a polymerizable, ethylenically-unsaturated resin having an acid functional group where the epoxy compound is polymerized by cationic polymerization initiated by the acid functional group and the polymerizable, ethylenically-unsaturated resin is polymerized by free-radical polymerization. To that end, a two-part polymerizable composition is provided that has a first part containing the epoxy compound; and a second part containing the polymerizable, ethylenically-unsaturated resin having an acid functional group. The first part and/or the second part further contain a radical initiator effective to initiate either self-curing or light-curing by free-radical polymerization.
    Type: Application
    Filed: June 11, 2010
    Publication date: June 7, 2012
    Applicant: PENTRON CLINICAL TECHNOLOGIES L.L.C.
    Inventors: Shuhua Jin, Weitao Jia
  • Publication number: 20120123011
    Abstract: An adhesive (co)polymers comprising: a) an isobutylene copolymer having pendent anhydride groups, b) a polyamine photobase generator and c) optionally a tackifier is described.
    Type: Application
    Filed: October 25, 2011
    Publication date: May 17, 2012
    Inventors: Hae-Seung Lee, Joon Chatterjee, Gregg A. Caldwell, Babu N. Gaddam
  • Publication number: 20120095124
    Abstract: The present invention relates to an aminimide compound having a structure represented by the following general formula (I) in the molecule thereof, relates to a curable composition using the aminimide compound and relates to a method for curing the composition; in which R0 represents a hydrogen atom, an alkyl group which may have an optional substituent, an aryl group which may have an optional substituent, or a heterocyclic residue which may have an optional substituent. R1, R2 and R3 each independently represent a hydrogen atom, or an optional substituent. However, at least two of R1, R2 and R3 may bond to each other to form a cyclic structure.
    Type: Application
    Filed: June 16, 2010
    Publication date: April 19, 2012
    Applicant: Three Bond Co., Ltd.
    Inventor: Manabu Kirino
  • Patent number: 8133656
    Abstract: An oxime ester compound represented by general formula (I): wherein R1 and R2 each independently represent R11, OR11, COR11, SR11, CONR12R13, or CN; R11, R12, and R13 each independently represent a hydrogen atom, an alkyl group having 1 to 20 carbon atoms, an aryl group having 6 to 30 carbon atoms, an arylalkyl group having 7 to 30 carbon atoms, or a heterocyclic group having 2 to 20 carbon atoms, R3 and R4 each independently represent R11, OR11, SR11, COR11, CONR12R13, NR12COR11, OCOR11, COOR11, SCOR11, OCSR11, COSR11, CSOR11, CN, a halogen atom, or a hydroxyl group; a and b each independently represent 0 to 4; X represents an oxygen atom, a sulfur atom, a selenium atom, CR31R32, CO, NR33, or PR34; R31, R32, R33, and R34 each independently represent R11, OR11, COR11, SR11, CONR12R13, or CN.
    Type: Grant
    Filed: December 21, 2007
    Date of Patent: March 13, 2012
    Assignee: Adeka Corporation
    Inventors: Daisuke Sawamoto, Koichi Kimijima
  • Patent number: 8133415
    Abstract: Provided is an ink composition for manufacturing color filters. The ink composition includes an acrylic binder resin obtained by polymerizing the group of monomers containing a compound represented by Formula 1. The ink composition has good chemical resistance and adhesive properties and is used for manufacturing color filters exhibiting a high contrast ratio: (where Ra is —H, or —CH3, and Rb is an alkyl group having 6-30 carbon atoms).
    Type: Grant
    Filed: March 15, 2011
    Date of Patent: March 13, 2012
    Assignee: LG Chem, Ltd.
    Inventors: Min-A Yu, Han-Soo Kim, Sun-Hwa Kim
  • Patent number: 8110610
    Abstract: A radiation curable composition comprising a curable compound, a photo-initiator and a co-initiator, characterized in that said co-initiator is a oligomer or polymer having a repeating unit, said repeating unit comprising at least two tertiary amines, and said polymer being prepared by the polycondensation of di- or oligofunctional Michael acceptors with mono- or oligofunctional aliphatic primary amines or with di- or oligofunctional aliphatic secondary amines or with a mixture thereof.
    Type: Grant
    Filed: December 17, 2007
    Date of Patent: February 7, 2012
    Assignee: Agfa Graphics N.V.
    Inventors: Johan Loccufier, Roland Claes
  • Patent number: 8062844
    Abstract: Protective groups which may be cleaved with an activatable deprotecting reagents are employed to achieve a highly sensitive, high resolution, combinatorial synthesis of pattern arrays of diverse polymers. In preferred embodiments of the instant invention, the activatable deprotecting reagent is a photoacid generator and the protective groups are DMT for nucleic acids and tBOC for amino acids. This invention has a wide variety of applications and is particularly useful for the solid phase combinatorial synthesis of polymers.
    Type: Grant
    Filed: January 21, 2011
    Date of Patent: November 22, 2011
    Assignee: Affymetrix, Inc.
    Inventors: Robert G. Kuimelis, Glenn H. McGall, Martin J. Goldberg, Guangyu Xu
  • Patent number: 8063115
    Abstract: A radiation curable composition comprising a curable compound, a photo-initiator and a co-initiator, wherein said co-initiator has a structure according to Formula I A-L-B??Formula I wherein A represents a structural moiety comprising an aromatic tertiary amine; B represents a structural moiety comprising at least one aliphatic tertiary amine; L represents a divalent linking group positioning the nitrogen atom of the aromatic amine of the structural moiety A and the nitrogen of at least one aliphatic amine of the structural moiety B in a 1-3 to 1-23 position; with the proviso that at least one aromatic and at least one aliphatic amine each have at least one alfa-hydrogen.
    Type: Grant
    Filed: November 19, 2007
    Date of Patent: November 22, 2011
    Assignee: Agfa Graphics NV
    Inventors: Johan Loccufier, Roland Claes
  • Patent number: 8053567
    Abstract: The use of at least one diazonium salt bearing an initiator function, for forming an undercoat obtained by grafting a graft derived from the diazonium salt and bearing an initiator function at the surface of a conductive or semiconductive material on the undercoat, and for forming on the undercoat a polymeric layer obtained by polymerization, in particular free radical polymerization, in situ of at least one monomer, initiated from the initiator function.
    Type: Grant
    Filed: June 2, 2005
    Date of Patent: November 8, 2011
    Assignees: Universite Paris 7—Denis Diderot, Alchimedics
    Inventors: Mohamed Mehdi Chehimi, Jean Pinson, Bernadette Charleux, Christophe Bureau, Christopher Tronche, Tarik Matrab, Christian Perruchot, Eva Cabet-Deliry, Maud Save
  • Publication number: 20110269867
    Abstract: A novel alkali-soluble polymer compound including a dehydrogenated pimaric acid and/or its isomer as a repeating unit, and a photosensitive resin composition including the alkali-soluble polymer compound as an effective binder matrix are provided. A photosensitive resin composition using the alkali-soluble polymer compound including a dehydrogenated resin acid has excellent photosensitivity and developing characteristics cause a less deformation in a firing process, has excellent elasticity. Thus, the photosensitive resin composition is advantageous for curing various transparent photosensitive materials, in particular, materials of column spacers, an overcoat, a passivation layer, or the like, used for fabricating color filters of an LCD.
    Type: Application
    Filed: April 28, 2011
    Publication date: November 3, 2011
    Applicant: LG CHEM. LTD.
    Inventors: Keon Woo LEE, Sang Kyu KWAK, Chang Soon LEE, Hye Hyeon KIM
  • Publication number: 20110269866
    Abstract: The present invention relates to a photo-curable and thermo-curable resin composition and a dry film solder resist make it possible to provide the dry film solder resist having superior heat-resistance and dimensional stability while exhibiting more improved alkali developing property. The resin composition may comprises an acid-modified oligomer having carboxyl group (—COOH) and photo-curable functional group; a photo-polymerizable monomer comprising a compound having a structure of that 3- or more functional epoxy acrylate groups are bonded to a heterocyclic structure containing nitrogen, and a functional group having carboxyl group is bonded to at least one epoxy acrylate group; a thermo-curable binder having thermo-curable functional group; and a photo-initiator.
    Type: Application
    Filed: July 11, 2011
    Publication date: November 3, 2011
    Applicant: LG CHEM, LTD.
    Inventors: Woo-Jae JEONG, Byung-Ju CHOI, Bo-Yun CHOI, Kwang-Joo LEE, Min-Su JEONG
  • Patent number: 8048613
    Abstract: An alkali development-type solder resist includes (A) a carboxyl group-containing photosensitive resin obtained by reacting (a) a compound having two or more cyclic ether or thioether groups in the molecule with (b) an unsaturated monocarboxylic acid, reacting the product with (c) a polybasic acid anhydride, reacting the resulting resin with (d) a compound having a cyclic ether group and an ethylenic unsaturated group in the molecule, and reacting the product additionally with (c) a polybasic acid anhydride, (B) an oxime ester-based photopolymerization initiator containing a specific oxime ester group, (C) a compound having two or more ethylenic unsaturated groups in the molecule, and (D) a thermosetting component, wherein the dry film obtained by applying the composition has an absorbance of 0.3 to 1.2 per 25 ?m of the film thickness at a wavelength of 350 to 375 nm.
    Type: Grant
    Filed: October 13, 2008
    Date of Patent: November 1, 2011
    Assignee: Taiyo Ink Mfg. Co., Ltd.
    Inventors: Nobuhito Itoh, Yoko Shibasaki, Kenji Kato, Masao Arima
  • Publication number: 20110242468
    Abstract: A liquid crystal display panel, including: a pixel electrode formed on a first substrate; an alignment layer formed on the pixel electrode, wherein the alignment layer includes an alignment layer material and aligns first liquid crystal molecules in a direction substantially perpendicular to the pixel electrode; and a photo hardening layer formed on the alignment layer, wherein the photo hardening layer includes a photo hardening layer material and aligns second liquid crystal molecules to be tilted with respect to the pixel electrode, wherein the alignment layer material and the photo hardening layer material have different polarities from each other.
    Type: Application
    Filed: February 1, 2011
    Publication date: October 6, 2011
    Applicant: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Kyong-Sik Choi, Myung-Jae Park, Min-Wook Park, Sung-Hoon Kim, Gak-Seok Lee, Woo-Jung Shin, Jun-Hyup Lee, Keun-Chan Oh, Sang-Gyun Kim, Su-Jeong Kim, Seung-Beom Park, Youn-Hak Jeong
  • Patent number: 8029877
    Abstract: There are provided: a curable resin composition having a high exposure sensitivity and a good developing property, and thereby capable of forming an accurate and precise pattern; a liquid crystal panel substrate on which a protective film for covering a color layer or spacers for a liquid crystal layer, by using the curable resin composition, hardly causing a color irregularity and contrast irregularity; and a liquid crystal panel using the liquid crystal panel substrate and having a superior display quality. The curable resin composition of the present invention comprises: a copolymer (a) having a molecular structure in which a constitutional unit including an acidic functional unit and a constitutional unit including a photocurable functional group are linked at least; a photopolymerization initiator (h) having a tertiary amine structure; and a photocurable compound (c) having at least one acidic functional group and at least three photocurable functional groups.
    Type: Grant
    Filed: June 8, 2010
    Date of Patent: October 4, 2011
    Assignee: Dai Nippon Printing Co., Ltd.
    Inventors: Shinji Hayashi, Shunsuke Sega, Hiromu Taguchi, Mitsutaka Hasegawa