Specified Rate-affecting Material Contains Metal Atom Patents (Class 522/66)
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Patent number: 7417075Abstract: A cationically polymerizable composition containing a cationically polymerizable compound and a cationic polymerization initiator, wherein a total content of a cationic compound, a metal compound and a strong acid compound contained in the cationically polymerizable composition is in the range of 1 to 500 ppm by weight based on the total weight of the cationically polymerizable composition.Type: GrantFiled: August 22, 2005Date of Patent: August 26, 2008Assignee: Konica Minolta Medical & Graphic, Inc.Inventor: Nobumasa Sasa
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Publication number: 20080187457Abstract: An acrylic or other polymer composition, optionally containing aluminum trihydrate, and having undoped or doped titanium dioxide dispersed throughout is disclosed. Said composition provides a “renewable” surface and further provides a highly-sterile surface upon photoactivation of the surface by at least either low-level ultraviolet irradiation or ambient/natural light (as when using doped titanium dioxide).Type: ApplicationFiled: November 8, 2007Publication date: August 7, 2008Inventor: John R. Mangiardi
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Patent number: 7378455Abstract: A curable method useful for encapsulating solid state devices includes (A) an epoxy resin; (B) an effective amount of a cure catalyst comprising (B1) a first latent cationic cure catalyst comprising a diaryl iodonium hexafluoroantimonate salt; (B2) a second latent cationic cure catalyst comprising (B2a) a diaryl iodonium cation, and (B2b) an anion selected from perchlorate, imidodisulfurylfluoride anion, unsubstituted and substituted (C1-C12)-hydrocarbylsulfonates, (C2-C12)-perfluoroalkanoates, tetrafluoroborate, unsubstituted and substituted tetra-(C1-C12)-hydrocarbylborates, hexafluorophosphate, hexafluoroarsenate, tris(trifluoromethylsulfonyl)methyl anion, bis(trifluoromethylsulfonyl)methyl anion, bis(trifluoromethylsulfuryl)imide anion, and combinations thereof; and (B3) a cure co-catalyst selected from free-radical generating aromatic compounds, peroxy compounds, copper (II) salts of aliphatic carboxylic acids, copper (II) salts of aromatic carboxylic acids, copper (II) acetylacetonate, and combinationsType: GrantFiled: June 30, 2005Date of Patent: May 27, 2008Assignee: General Electric CompanyInventors: Qiwei Lu, Michael O'Brien, Michael Vallance
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Publication number: 20080119581Abstract: The present invention provides a process for forming a metal pattern in which a metal is chemically absorbed, and a pattern forming material and a crosslinkable monomer used for the process. The process includes: a step for forming a pattern by photolithography including an exposure step for carrying out exposure with a purified water-based developer having a pH of less than 7 on a pattern forming material containing (A) a matrix polymer having at least one of a carboxyl and a sulfonate group, and a rinsing step; a step for forming a metal-containing pattern by immersing the pattern in an aqueous solution containing a metal compound to allow for chemical absorption of a metal ion or a complex ion to the pattern; and a step for forming a metal pattern containing the elemental metal or further containing metal oxide by sintering the metal-containing pattern. A crosslinkable monomer containing a condensation product of a polyhydric alcohol with N-methylol(meth)acrylamide was used.Type: ApplicationFiled: December 28, 2005Publication date: May 22, 2008Applicant: Tokyo Ohka Kogyo Co., Ltd.Inventors: Hiroshi Takanashi, Syozo Miyazawa, Tomoya Kudo
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Publication number: 20080076847Abstract: Composition with at least one polymerizable binder and a polymerization initiator, which contains at least one acylgermane according to general Formula (I), in which R0 is a substituted or unsubstituted C1-18-alkyl radical or an acyl group; R1 and R2 are H, an acyl group or have one of the meanings given for R3; R3 is a branched or linear C1-18-alkyl radical which can be unsubstituted or substituted one or more times by —O—, —NH—, —NR—, —S— or interrupted by other groups, trimethylsilyl, hal-(CH3)2Si—[OSi(CH3)2]r?, (CH3)3Si—[OSi(CH3)2]r—, —COOH, —COO—R10, —CO—NR11R12, —CO-vinyl, —CO-phenyl, phenyl-C1-4-alkyl, phenyl, naphthyl or biphenyl, C5-12 cycloalkyl, a 5 or 6-membered O, S or N-containing heterocyclic ring, halogen, OH, an aromatic C6-30 radical which can be substituted or unsubstituted and/or interrupted by O, S or —NR—, or a branched, cyclic or linear C1-20 alkyl, -alkenyl, -alkoxy or -alkenoxy radical; m is 1, 2 or 3; n is 0 or 1 and p is 0 or 1; and the use of acyl germanes of Formula (I) for exType: ApplicationFiled: April 2, 2007Publication date: March 27, 2008Applicant: IVOCLAR VIVADENT AGInventors: Norbert Moszner, Ulrich Salz, Urs Karl Fischer, Robert Liska, Heinrich Gruber, Beate Ganster
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Publication number: 20080045619Abstract: A photo-crosslinkable polyolefin composition comprises a polyolefin, a source of functionality receptive to crosslinking by UV radiation, a cationic photoinitiator and optionally includes a free-radical photoinitiator, a crosslinking accelerator or sensitizer, and other additives such as compatibilizers, inorganic fillers, nanofillers, glass, polymeric and ceramic microspheres, glass fibres, flame retardants, antioxidants, stabilizers, processing aids, foaming agents and pigments. A method for manufacturing a UV-crosslinked polyolefin article comprises forming an article by extruding, moulding or otherwise forming the UV-crosslinkable polyolefin composition and subjecting the article to UV radiation on-line with the extrusion, moulding or other forming operation.Type: ApplicationFiled: February 28, 2007Publication date: February 21, 2008Applicant: SHAWCOR LTD.Inventors: Peter Jackson, Eileen Wan
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Patent number: 7311945Abstract: A silicone composition which can be used in the production of varnishes that can be applied to supports to reduce the friction coefficient. The silicone composition includes at least one polyorganosilane A (POS) which can be cationically and radically cross-linked by functional cross-linking groups (GER) and a primer C chosen from onium borates. The composition also includes molecules (POS D) which are substituted by secondary functional groups (GFS) caned by silicon atoms and selected from those that include at least one alkoxy and/or epoxy and/or carboxy motif and optionally a charge (e.g. silica).Type: GrantFiled: September 21, 2004Date of Patent: December 25, 2007Assignee: Rhodia ChimieInventors: Jean-Louis Bertry, Jean-Marc Frances, Fabrice Bohin, Christian Priou
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Patent number: 7291655Abstract: A polymerization process with elevated productivity using a coordination catalyst, wherein electromagnetic radiation is applied during polymerization. The irradiation of light greatly increases the activity of the coordination catalyst.Type: GrantFiled: May 29, 2002Date of Patent: November 6, 2007Assignee: Borealis Technology OyInventors: Karl-Heinz Reichert, Annette Wittebrock, Kalle Kallio
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Patent number: 7276544Abstract: A process for producing intraocular lenses (IOLs) capable of absorbing blue light and ultraviolet light using photo curing. Intraocular lenses so produced block blue light and ultraviolet light from reaching the retina of an eye implanted with the IOL. By blocking blue light and ultraviolet light from reaching the retina, the IOL thereby prevents potential damage to the retina.Type: GrantFiled: September 8, 2003Date of Patent: October 2, 2007Assignee: Bausch & Lomb IncorporatedInventors: Yu-Chin Lai, Dominic V. Ruscio, George F. Green
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Patent number: 7256221Abstract: Disclosed are photo or electron beam polymerizable compositions, and preparation thereof and devices containing them. The composition contains completely or substantially completely hydrogenated hydrocarbon-based material completely free or substantially free of carbon-carbon double and triple bonds containing photo or electron beam curable terminal or pendant groups, low-outgassing photoinitiators, an optional viscosity adjustment component and an optional filler. The composition is visible light, UV or electron beam curable. It cures into a low-modulus, low outgassing polymer material. The composition can be used as an adhesive, sealant or lens potting material. It is ideal for use in lithographic tools involving deep or vacuum ultraviolet radiations, in particular, as lens potting materials for 157 nm lithographic tools.Type: GrantFiled: November 7, 2003Date of Patent: August 14, 2007Assignee: Corning IncorporatedInventors: Kelsee L. Coykendall, Paul G. Dewa, Robert Sabia, David C. Sauer, Paul J. Shustack, Kamal K. Soni
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Patent number: 7253213Abstract: The invention relates to a process for polymerising a monomer, polymerizing and/or crosslinking an oligomer, or crosslinking a polymer or copolymer, said monomer, oligomer, polymer and copolymer being selected among precursor monomers, urethane, thiourethane and episulfide oligomers, and urethane, thiourethane and episulfide polymers and copolymers, which comprises: (a) adding to precursor monomers or oligomers or polymers or copolymers an effective amount of at least one complex of Co, Mo or W which under irradiation conditions photochemically reacts to release at least one anionically charged nucleophile or uncharged Lewis base; and (b) irradiating the mixture of (a) to release the at least one anionically charged nucleophile or uncharged Lewis base to initiate polymerisation and/or crosslinking of the monomer, oligomer, polymer or copolymer.Type: GrantFiled: April 26, 2005Date of Patent: August 7, 2007Inventors: Charles R. Kutal, Sirisoma Wanigatunga, Gabriel Keita, Yassin Turshani
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Patent number: 7135544Abstract: Processes for the living polymerization of olefin monomers with terminal carbon-carbon double bonds are disclosed. The processes employ initiators that include a metal atom and a ligand having two group 15 atoms and a group 16 atom or three group 15 atoms. The ligand is bonded to the metal atom through two anionic or covalent bonds and a dative bond. The initiators are particularly stable under reaction conditions in the absence of olefin monomer. The processes provide polymers having low polydispersities, especially block copolymers having low polydispersities. It is an additional advantage of these processes that, during block copolymer synthesis, a relatively small amount of homopolymer is formed.Type: GrantFiled: December 3, 2004Date of Patent: November 14, 2006Assignee: Massachusetts Institute of TechnologyInventors: Richard R. Schrock, Robert Bauman
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Patent number: 7122290Abstract: Holographic storage mediums, methods for producing the storage medium, methods for storing data in the holographic storage medium, and optical storage reading methods are described herein. The holographic storage medium can be formed from a composition comprising a thermally crosslinked polysiloxane binder; a photoactive material; and a photo-initiator, wherein the photoactive material has a concentration that remains about the same before and after a thermal cure process to form the thermally crosslinked polysiloxane binder.Type: GrantFiled: June 15, 2004Date of Patent: October 17, 2006Assignee: General Electric CompanyInventors: Michael Jeffrey McLaughlin, Marc Dubois, James Edward Pickett, Peifang Tian
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Patent number: 7053133Abstract: An ultraviolet activatable adhesive film comprising an epoxy resin, an ultraviolet activatable cationic polymerization catalyst and cationic polymerization inhibitor and water in an amount effective to suppress the cationic polymerization of the film and prolong the time from activation to thermal press-bonding after the ultraviolet activatable adhesive film is activated by irradiation by ultraviolet rays.Type: GrantFiled: May 3, 2002Date of Patent: May 30, 2006Inventors: Hiroaki Yamaguchi, Tetsu Kitamura
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Patent number: 7030171Abstract: The objective of the present invention is to provide a production method by which a polymer of a functional group-terminated vinyl monomer can be easily and practically produced. Further, it is another object of the present invention to provide a functional group-terminated vinyl polymer which is useful as a material for the production of various functional products. The first aspect of the present invention is concerned with a production method of a functional group-terminated vinyl polymer comprising a step of synthesizing a halogen atom-terminated vinyl polymer by the radical polymerization reaction of a vinyl monomer in the presence of a halogen compound and a step of introducing a functional group to a terminus by substituting a functional group-containing group for the terminal halogen atom of said vinyl polymer.Type: GrantFiled: October 31, 2003Date of Patent: April 18, 2006Assignee: Sekisui Chemical Co., Ltd.Inventors: Takeshi Wakiya, Takamaro Kakehi
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Patent number: 7025954Abstract: In the disclosed method for the reshaping (adornment, repair, covering, prosthetic extension, etc.) of essentially rigid, keratinaceous surfaces such as nail plates with a free radical-polymerizable acrylic ester, the free radical initiator contains an encapsulated compound of the formula III wherein R1 through R4 are identical to or different from each other and are hydrogen, a mononuclear carbocyclic aromatic group, a C1-C18 aliphatic group, a C1-C18 aliphatic radical substituted with a mononuclear carbocyclic aromatic group, a cycloaliphatic group or an aromatic radical having from 6 to 10 ring carbon atoms and up to five aliphatic or oxy- or oxo-aliphatic substituents, with the proviso that at least R3 or R4 is hydrogen. The compound of formula III, in chemically-curable systems is encapsulated into the polymer matrix and utilized in combination with a metal salt co-catalyst that is mixed with the polymer and, optionally, an organic buffering compound and a crosslinker.Type: GrantFiled: May 20, 2002Date of Patent: April 11, 2006Assignee: Esstech, Inc.Inventor: Allen D. Johnston
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Patent number: 6984262Abstract: Described is a coating composition adapted to enhance the adhesion of a polymeric coating or film applied to a substrate. The coating composition is interposed between the substrate and the polymeric coating and comprises (a) at least one coupling agent, partial hydrolysates thereof or mixtures thereof in a concentration greater than 25 weight percent, based on the weight of the total composition, and (b) an adhesion enhancing amount of an epoxy-containing material having at least two epoxy groups. The coating composition is substantially free of photochromic materials and colloidal particles chosen from silica, alumina or mixtures thereof. Also described is a process for using the coating composition and articles coated with the composition and additional coatings and films which can be photochromic.Type: GrantFiled: July 16, 2003Date of Patent: January 10, 2006Assignee: Transitions Optical, Inc.Inventors: Eric M. King, James P. Colton, Jessica A. Hoch
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Patent number: 6921454Abstract: A radiation curable adhesive composition which includes: a) an ?,?-olefinically unsaturated ether monomer component consisting of one or more compounds having the formula: R[O—CH?CHR1]n??(I) where R is an n-valent carbon-linked organic group R1 is H or a monovalent carbon-linked organic group and n has a value of 1 or more, b) an elastomeric polymer having a tensile strength at break of greater than 1500 psi (10342 kPa), and an elongation at break of greater than 100%, and c) a cationic photoinitiator.Type: GrantFiled: November 27, 2001Date of Patent: July 26, 2005Assignee: Henkel CorporationInventors: Weitong Shi, JoAnn DeMarco, Shabbir Attarwala
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Patent number: 6919385Abstract: An energy-ray curing resin composition comprising a photopolymerizable resin component which can be cured by irradiation with an energy ray, a photopolymerization initiator component which makes it possible to cure the above photopolymerizable resin component by irradiation with an energy ray and a curing agent component used for curing at least one of the above photopolymerizable resin components by a method other than irradiation with an energy ray. To provide a high curability energy-ray curing resin composition which has a very high curing capacity as compared with those of conventional energy-ray curing resins and which is simple and has a high design freedom.Type: GrantFiled: February 4, 2003Date of Patent: July 19, 2005Assignee: Mitsubishi Heavy Industries, Ltd.Inventor: Noriya Hayashi
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Patent number: 6911485Abstract: The invention relates to a process for polymerising a monomer, polymerizing and/or crosslinking a oligomer, or crosslinking a polymer or copolymer, said monomer, oligomer, polymer and copolymer being selected among precursor monomers, urethane, thiourethane and episulfide oligomers, and urethane, thiourethane and episulfide polymers and copolymers, which comprises: (a) adding to precursor monomers or oligomers or polymers or copolymers an effective amount of at least one complex of Co, Mo or W which under irradiation conditions photochemically reacts to release at least one anionically charged nucleophile or uncharged Lewis base; and (b) irridiating the mixture of (a) to release the at least one anionically charged nucleophile or uncharged Lewis base to initiate polymerisation and/or crosslinking of the monomer, oligomer, polymer or copolymer.Type: GrantFiled: April 19, 2002Date of Patent: June 28, 2005Assignees: The University of Georgia Research Foundation, Inc., Essilor International Campagnie Generale D'OptiqueInventors: Charles R. Kutal, Sirisoma Wanigatunga, Gabriel Keita, Yassin Turshani
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Patent number: 6906156Abstract: Accelerators that can be useful for an energy polymerizable composition comprising a cationically curable material; energy polymerizable compositions comprising at least one cationically curable material and an initiation system therefor, the initiation system comprising at least one organometallic complex salt and at least one accelerator; and a method for curing the compositions. The cured compositions can provide useful articles. The invention also provides compositions of matter comprising an organometallic complex salt and at least one compound selected from the Class 1 through Class 4 compounds disclosed herein.Type: GrantFiled: September 2, 2003Date of Patent: June 14, 2005Assignee: 3M Innovative Properties CompanyInventors: Wayne S. Mahoney, Michael C. Palazzotto
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Patent number: 6902816Abstract: The invention relates to silicone compositions that are used in the production of varnishes that can be applied to supports in order to reduce the friction coefficient. The inventive composition comprises at least one polyorganosiloxane A (POS) which can be cationically and radically cross-linked by functional cross-linking groups (GFR) and a primer C chosen from onium borates, characterized in that the inventive composition also comprises molecules (POS D) which are substituted by secondary functional groups (GFS) carried by silicon atoms and selected from those that include at least one alkoxy and/or epoxy and/or carboxy motif and optionally a charge (e.g. silica). The invention can be used with anti-friction varnishes for RTV silicone coatings for material used in air bags, thermal transfer ribbons or packing films.Type: GrantFiled: April 5, 2000Date of Patent: June 7, 2005Assignee: Rhodia ChimieInventors: Jean-Louis Bertry, Jean-Marc Frances, Fabrice Bohin, Christian Priou
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Patent number: 6894084Abstract: The present invention provides radiation curable resin compositions that contain no or essentially no volatile organic components (VOCs), and to methods of using these compositions. The radiation curable resin compositions find particular use as coating compositions. In particular, the radiation curable resin compositions of this invention comprise a vinyl dioxolane end-capped oligomer blended with a photoinitiator.Type: GrantFiled: February 12, 2001Date of Patent: May 17, 2005Assignee: Foster-Miller, Inc.Inventors: Robert F. Kovar, Nese Orbey, Stanley Wentworth
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Patent number: 6878505Abstract: A photosensitive composition comprising (i) a sensitizing dye represented by the following formula (I), (II) or (III) defined in the specification, (ii) a titanocene compound and (iii) a compound of undergoing a reaction with at least one of a radical and an acid to change at least one of its physical and chemical properties and maintaining the changed physical or chemical property, and a lithographic printing plate having a photosensitive layer comprising the photosensitive composition.Type: GrantFiled: May 28, 2002Date of Patent: April 12, 2005Assignee: Fuji Photo Film Co., Ltd.Inventors: Akinori Shibuya, Kazuto Kunita
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Patent number: 6867242Abstract: The invention relates to a method for producing a sealed impregnation and/or release coating of flat joints, in particular of cylinder-head gaskets such as composite seals, metallic joints and multi-layered steel joints. The invention uses a silicone composition including at least a polyorganosiloxane A crosslinkable by a cationic and/or radical process by appropriate crosslinking functional groups, for example, of the alkenyl ether, acrylic, acrylate, epoxide and/or oxethane type; at least an initiator salt B selected among onium borates or an organometallic complex; and at least a reactive diluent C including a nonorganosilicon or organosilicon compound comprising in its structure at least a crosslinking functional group and optionally a secondary functional group different from the crosslinking functional group but capable of chemically reacting with a crosslinking functional group, for example of the hydroxyl, alkoxy and/or carboxyl type.Type: GrantFiled: June 8, 2000Date of Patent: March 15, 2005Assignee: Rhodia ChimieInventors: Jean-Marc Frances, Olivier Loubet
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Patent number: 6849668Abstract: A multi-functional photoinitiator of formula (I) R1m—Q—(A1—PI)n??(I) wherein Q is a heteroatom selected from Si, Ti, Zr and Sn or any two independently selected such heteroatoms linked by a covalent bond or a by C1-16 (preferably C1-9) alkylene group, n is at least 2 and n+m=the functionality of Q, each R1 is the same or different and is a non-photoinitiator group; each group PI is the same or different and is a photoinitiator group. Each —A1— is the same or different and is selected from linking groups of formula —(A2)p—Z— wherein p has an average of from 1 to 10, preferably from 3 to 5 and the groups —A2— are either (a) each independently selected from C2-4 alkyleneoxy groups; or (b) each independently selected from groups of formula —O—(CH2)qCO— wherein q is from 3 to 5, and Z is selected from —O—, —S— and —NR6— where R6 is C1-6 alkyl.Type: GrantFiled: August 4, 2000Date of Patent: February 1, 2005Assignee: Sun Chemical CorporationInventors: Roger Edward Burrows, Shaun Lawrence Herlihy, Derek Ronald Illsley
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Patent number: 6828355Abstract: This invention relates to resin-reinforced silicone compositions curable upon exposure to radiation in the electromagnetic spectrum, which compositions when cured demonstrate improved elastomeric properties, such as tensile strength, modulus and elongation. The inventive resin-reinforced silicone compositions may alternatively be rendered curable by exposure to moisture. In addition, the inventive composition may be rendered curable by exposure to radiation in the electromagnetic spectrum, and exposure to moisture. The inventive silicone compositions are particularly well suited for use in electronic conformal coating and potting applications, as well as in automotive gasketing applications, pressure sensitive adhesive applications and the like.Type: GrantFiled: January 18, 2002Date of Patent: December 7, 2004Assignee: Henkel CorporationInventor: Hsien-Kun Chu
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Publication number: 20040198857Abstract: A pioneering process of inducing a photochemical reaction involves upconverted fluorescence from a rare earth ion doped inorganic glass, crystal or other inorganic material. An inorganic host material doped with a rare earth ion capable of upconversion fluorescence is provided. A photoactiveable organic material is positioned at a surface of the inorganic host material, and radiation is directed at the inorganic host material to cause multiple photons to be absorbed by the rare earth ion. A single photon is emitted from the rare earth ion and is absorbed by a chemical species in the photoactivateable organic material to induce a chemical reaction.Type: ApplicationFiled: April 1, 2003Publication date: October 7, 2004Inventors: Matthew J. Dejneka, Michael E. DeRosa, Stephen L. Logunov
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Patent number: 6790473Abstract: An electronic package assembly where a low profile integrated circuit chip package is soldered to an organic (e.g., epoxy resin) substrate, e.g., a printed circuit board or card, the projecting conductive leads of the integrated circuit chip package and the solder which substantially covers these leads (and respective conductors on the substrate) having been substantially covered with ultraviolet photocured encapsulant material (e.g., polymer resin) to provide reinforcement for the solder-lead connections. The encapsulant material is dispensed about the solder and lead joints following solder reflow and solidification so as to substantially surround the solder and any portions of the leads not covered with solder.Type: GrantFiled: January 26, 2001Date of Patent: September 14, 2004Assignee: International Business Machines CorporationInventors: Konstantinos I. Papathomas, Stephen J. Fuerniss, Deborah L. Dittrich, David W. Wang
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Patent number: 6784222Abstract: An electroconductive coating composition which function as a sealer/primer includes (a) a radiation curable, polymerizable compound, (b) a photoinitiator and (c) a conductive pigment. The conductive pigment may be a mixture of pigment including a blend of conductive pigments as well as conductive pigment. Conductivity enhancers may, also, be added. The polymerizable compound is, preferably, a U curable acrylate functional compound which may be monofunctional or polyfunctional. The composition is particularly useful for sealing and priming SMC panels.Type: GrantFiled: March 6, 2002Date of Patent: August 31, 2004Inventors: Frank David Zychowski, Joseph C. Sgro
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Patent number: 6780896Abstract: Zinc-complex photoiniators and applications therefore are disclosed. The zinc-complex photoinitiators of the present invention include various pendent groups which serve to protect the compound from hydrolysis. In this manner, the stability of the photoinitiator is increased. The photoinitiators of the present invention can be used in many different processes and applications. For example, the photoinitiators are well suited for use in photocurable inks as used in ink jet printers or on a printing press.Type: GrantFiled: December 20, 2002Date of Patent: August 24, 2004Assignee: Kimberly-Clark Worldwide, Inc.Inventors: John Gavin MacDonald, Jason Lye
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Publication number: 20040138324Abstract: Processes for the living polymerization of olefin monomers with terminal carbon-carbon double bonds are disclosed. The processes employ initiators that include a metal atom and a ligand having two group 15 atoms and a group 16 atom or three group 15 atoms. The ligand is bonded to the metal atom through two anionic or covalent bonds and a dative bond. The initiators are particularly stable under reaction conditions in the absence of olefin monomer. The processes provide polymers having low polydispersities, especially block copolymers having low polydispersities. It is an additional advantage of these processes that, during block copolymer synthesis, a relatively small amount of homopolymer is formed.Type: ApplicationFiled: August 22, 2003Publication date: July 15, 2004Applicant: Massachusetts Institute of TechnologyInventors: Richard R. Schrock, Robert Baumann
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Publication number: 20040122124Abstract: Zinc-complex photoiniators and applications therefore are disclosed. The zinc-complex photoinitiators of the present invention include various pendent groups which serve to protect the compound from hydrolysis. In this manner, the stability of the photoinitiator is increased. The photoinitiators of the present invention can be used in many different processes and applications. For example, the photoinitiators are well suited for use in photocurable inks as used in ink jet printers or on a printing press.Type: ApplicationFiled: December 20, 2002Publication date: June 24, 2004Applicant: Kimberly-Clark Worldwide, Inc.Inventors: John Gavin MacDonald, Jason Lye
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Patent number: 6749995Abstract: Disclosed is a light sensitive composition containing a compound represented by the following formula (1): wherein R1, R2 and R3 independently represent a hydrogen atom, a substituted or unsubstituted alkyl group, a substituted or unsubstituted alkenyl group, a substituted or unsubstituted aryl group, or a substituted or unsubstituted heterocyclic group, provided that R1 and R2 may combine with each other to form a ring or R2 and R3 may combine with each other to form a ring.Type: GrantFiled: January 29, 2003Date of Patent: June 15, 2004Assignee: Konica CorporationInventor: Toshiyuki Matsumura
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Publication number: 20040048943Abstract: Accelerators that can be useful for an energy polymerizable composition comprising a cationically curable material; energy polymerizable compositions comprising at least one cationically curable material and an initiation system therefor, the initiation system comprising at least one organometallic complex salt and at least one accelerator; and a method for curing the compositions. The cured compositions can provide useful articles. The invention also provides compositions of matter comprising an organometallic complex salt and at least one compound selected from the Class 1 through Class 4 compounds disclosed herein.Type: ApplicationFiled: September 2, 2003Publication date: March 11, 2004Applicant: 3M Innovative Properties CompanyInventors: Wayne S. Mahoney, Michael C. Palazzotto
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Patent number: 6696506Abstract: A cationic photocatalyst composition and a photocurable composition utilizing cationic polymerization are provided which can present sufficient open time and adhesion. The cationic photocatalyst composition contains a photosensitive onium salt and a compound represented by the following formula (1). The photocurable composition contains the cationic photocatalyst composition and an epoxy compound having at least one epoxy group per molecule. Formula (1) [Compound B] (wherein R and R′ are suitably selected from hydrogen, halogen, saturated hydrocarbon groups, unsaturated hydrocarbon groups, substituting groups comprising any suitable combination of elements such as carbon, hydrogen, oxygen, nitrogen and sulfur; and l and n each is an integer of 2 or larger).Type: GrantFiled: December 13, 2000Date of Patent: February 24, 2004Assignee: Sekisui Chemical Co., Ltd.Inventor: Hiroji Fukui
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Patent number: 6693142Abstract: The objective of the present invention is to provide a production method by which a polymer of a functional group-terminated vinyl monomer can be easily and practically produced. Further, it is another object of the present invention to provide a functional group-terminated vinyl polymer which is useful as a material for the production of various functional products. The first aspect of the present invention is concerned with a production method of a functional group-terminated vinyl polymer comprising a step of synthesizing a halogen atom-terminated vinyl polymer by the radical polymerization reaction of a vinyl monomer in the presence of a halogen compound and a step of introducing a functional group to a terminus by substituting a functional group-containing group for the terminal halogen atom of said vinyl polymer.Type: GrantFiled: June 24, 2002Date of Patent: February 17, 2004Assignee: Sekisui Chemical Co., Ltd.Inventors: Takeshi Wakiya, Takamaro Kakehi
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Publication number: 20030236317Abstract: A titanium oxide dispersion composition is provides, the composition comprising a solvent and a titanium oxide with an average secondary particle diameter of 100 nm or smaller, the dispersion composition having a maximum intensity within the range of from 435 nm to 700 nm of a primary differential spectrum of a transmittance spectrum, wherein the transmittance spectrum is measured using an ultraviolet-visible spectrophotometer after adjusting a solid content of the dispersion composition to be about 2% by weight. The composition provides a film having a high hydrophilicity under the irradiation of a visible light.Type: ApplicationFiled: June 9, 2003Publication date: December 25, 2003Applicant: SUMITOMO CHEMICAL COMPANY, LIMITEDInventors: Yoshiaki Sakatani, Kensen Okusako, Hironobu Koike
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Patent number: 6632897Abstract: Described is the use of nanoscale metal oxide particles as catalysts for the thermal and/or photochemical polymerization of species having at least one polymerizable carbon-carbon multiple bond and/or at least one carbon containing ring capable of undergoing a ring opening polymerization.Type: GrantFiled: December 20, 1999Date of Patent: October 14, 2003Assignee: Institut Für Neue Materialien gemeinnützigeInventors: Elisabeth Geiter, Helmut Schmidt
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Publication number: 20030180635Abstract: A visible radiation sensitive composition is disclosed. The composition comprises at least one ethylenically unsaturated monomer capable of free radical initiated addition polymerization; optionally, at least one binder; and a photoinitiator system comprising a coinitiator and a cyanopyridone sensitizer. The coinitiator preferably comprises a metallocene and an onium compound.Type: ApplicationFiled: February 12, 2002Publication date: September 25, 2003Inventors: Harald Baumann, Michael Flugel
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Patent number: 6620864Abstract: A composition suitable for use in dental medicine and/or dentistry polymerizable by cationic polymerization consists of one or more epoxy compounds, a plasticizer, a catalyst for hardening by ring opening, a catalyst for hardening by light and an accelerator consisting of a non alkaline tertiary amine. At radiation with a light having a wavelength of 340-500 nm the composition hardens practically free of contraction and adhesiveness.Type: GrantFiled: August 17, 2001Date of Patent: September 16, 2003Assignee: LSP Dental Chemistry AGInventor: Adalbert Schmid
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Patent number: 6590009Abstract: The invention concerns a polymerization and/or crosslinking method under electron beam and/or gamma radiation for compositions based on monomers, oligomers and/or polymers with organic functional groups. The invention is characterized in that the crosslinking and/or polymerization is carried out in the presence of an initiator capable of being activated under electron beam and/or gamma radiation comprising a boron derivative of formula (I) M+B(Ar) 4 wherein: M+, a unit bearing a positive charge, is an alkaline metal selected among those of columns IA and IIA of the periodic table; Ar is an aromatic derivative, optionally substituted by at least a substituent selected among a fluorine radical, a chlorine radical, a linear or branched alkyl chain, which itself can be substituted by at least a fluorine atom.Type: GrantFiled: May 3, 2001Date of Patent: July 8, 2003Assignee: Rhodia ChimieInventor: Christian Priou
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Publication number: 20030100625Abstract: Microwave-assisted Heck arylations are disclosed using various dispersed Pd systems including the novel Pd/MgO and Pd/SiO2—Al2O3 catalyst.Type: ApplicationFiled: October 12, 2001Publication date: May 29, 2003Inventors: S. Muthukumaru Pillai, A. Wali, Sheo Satish
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Patent number: 6565696Abstract: An adhesive containing a) a compound containing at least one vinyl ether group which has a molecular weight of more than 400 and b) a photoinitiator which initiates a polymerization of component A after exposure to light with a wavelength of 100 to 600 nm is useful for the production of a film laminate.Type: GrantFiled: August 24, 2000Date of Patent: May 20, 2003Assignee: Henkel Kommanditgesellschaft auf AktienInventors: Achim Huebener, Guenter Henke, Michael Drobnik
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Publication number: 20030077541Abstract: A photosensitive composition comprising (i) a sensitizing dye represented by the following formula (I), (II) or (III) defined in the specification, (ii) a titanocene compound and (iii) a compound of undergoing a reaction with at least one of a radical and an acid to change at least one of its physical and chemical properties and maintaining the changed physical or chemical property, and a lithographic printing plate having a photosensitive layer comprising the photosensitive composition.Type: ApplicationFiled: May 28, 2002Publication date: April 24, 2003Inventors: Akinori Shibuya, Kazuto Kunita
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Patent number: 6548567Abstract: The invention relates to an ionic compound corresponding to the formula [R1X1(Z1)—Q−—X2(Z2)—R2]m Mm+ in which Mm+ is a cation of valency m, each of the groups Xi is S═Z3, S═Z4, P—R3 or P—R4; Q is N, CR5, CCN or CSO2R5, each of the groups Zi is ═O, ═NC≡N, ═C(C≡N)2, ═NS(═Z)2R6 or ═C[S(═Z)2R6]2, each of the groups Ri, is Y, YO—, YS—, Y2N— or F, Y represents a monovalent organic radical or alternatively Y is a repeating unit of a polymeric frame. The compounds are useful for producing ion conducting materials or electrolytes, as catalysts and for doping polymers.Type: GrantFiled: August 17, 2001Date of Patent: April 15, 2003Inventors: Michel Armand, Christophe Michot, Yurii Yagupolskii, Lev Yagupolskii, Andrej Bezdudny, Natalya Kondratenko
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Patent number: 6486227Abstract: The present invention is directed to energy-efficient, photoinitiators having the general formula: wherein Z each independently represent wherein R1, R2, R3, R4, R5, R6, R7, R8 are as defined in claim 1, and wherein R9 represents (R10)2O or (R10)3N; wherein R10 represents H or an alkyl group having from one to eight carbon atoms; and wherein R11 represents H, an alkyl group having from one to eight carbon atoms, a benzyl group or an aralkyl group. The present invention is also directed to a method of generating a reactive species, methods of polymerizing polymerizable materials, methods of curing an unsaturated oligomer/monomer mixture, and methods of laminating using the photoinitiators of the present invention. In addition, the present invention is directed to ink compositions, adhesive compositions and resins, and methods of printing using the above-described photoinitiators.Type: GrantFiled: June 19, 2001Date of Patent: November 26, 2002Assignee: Kimberly-Clark Worldwide, Inc.Inventors: Ronald Sinclair Nohr, John G. MacDonald
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Patent number: 6476092Abstract: A photopolymerizable composition which is capable of successfully ensuring both high sensitivity and excellent storage stability is provided as a radical photopolymerization-system composition which is highest in the sensitivity and very promising out of the image-forming techniques. The photopolymerizable composition comprises a polymerizable group-containing compound having a specific structure set forth below wherein X1 and X2 each independently represent a group containing a hetero atom wherein the hetero atom is in the &agr;-position or a halogen atom and a photopolymerization initiator.Type: GrantFiled: September 20, 2000Date of Patent: November 5, 2002Assignee: Fuji Photo Film Co., Ltd.Inventor: Kazuto Kunita
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Publication number: 20020156142Abstract: A thermally-stable cationic photoinitiator capable of flash vaporization under vacuum and temperature conditions of an available flash-evaporation chamber is selected. The photoinitiator is mixed with a cation-polymerizable monomer and/or oligomer of interest and the mixture is flash evaporated and condensed in conventional manner as a film on a cold substrate. The resulting vacuum-deposited, homogeneous layer is cured with a high-energy radiation source that causes the cationic photoinitiator to liberate acidic species that catalyze the crosslinking of the monomer/oligomer compounds in its deposited film form. As a result of the homogeneous, pinhole-free nature of the vacuum deposition process, the thin-film polymer product does not suffer from the disadvantages attendant to prior-art atmospheric processes for cationically-cured polymers.Type: ApplicationFiled: February 13, 2001Publication date: October 24, 2002Inventors: Michael G. Mikhael, Angelo Yializis
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Patent number: 6468595Abstract: A thermally-stable cationic photoinitiator capable of flash vaporization under vacuum and temperature conditions of an available flash-evaporation chamber is selected. The photoinitiator is mixed with a cation-polymerizable monomer and/or oligomer of interest and the mixture is flash evaporated and condensed in conventional manner as a film on a cold substrate. The resulting vacuum-deposited, homogeneous layer is cured with a high-energy radiation source that causes the cationic photoinitiator to liberate acidic species that catalyze the crosslinking of the monomer/oligomer compounds in its deposited film form. As a result of the homogeneous, pinhole-free nature of the vacuum deposition process, the thin-film polymer product does not suffer from the disadvantages attendant to prior-art atmospheric processes for cationically-cured polymers.Type: GrantFiled: February 13, 2001Date of Patent: October 22, 2002Assignee: Sigma Technologies International, Inc.Inventors: Michael G. Mikhael, Angelo Yializis