Specified Rate-affecting Material Contains Metal Atom Patents (Class 522/66)
  • Patent number: 7417075
    Abstract: A cationically polymerizable composition containing a cationically polymerizable compound and a cationic polymerization initiator, wherein a total content of a cationic compound, a metal compound and a strong acid compound contained in the cationically polymerizable composition is in the range of 1 to 500 ppm by weight based on the total weight of the cationically polymerizable composition.
    Type: Grant
    Filed: August 22, 2005
    Date of Patent: August 26, 2008
    Assignee: Konica Minolta Medical & Graphic, Inc.
    Inventor: Nobumasa Sasa
  • Publication number: 20080187457
    Abstract: An acrylic or other polymer composition, optionally containing aluminum trihydrate, and having undoped or doped titanium dioxide dispersed throughout is disclosed. Said composition provides a “renewable” surface and further provides a highly-sterile surface upon photoactivation of the surface by at least either low-level ultraviolet irradiation or ambient/natural light (as when using doped titanium dioxide).
    Type: Application
    Filed: November 8, 2007
    Publication date: August 7, 2008
    Inventor: John R. Mangiardi
  • Patent number: 7378455
    Abstract: A curable method useful for encapsulating solid state devices includes (A) an epoxy resin; (B) an effective amount of a cure catalyst comprising (B1) a first latent cationic cure catalyst comprising a diaryl iodonium hexafluoroantimonate salt; (B2) a second latent cationic cure catalyst comprising (B2a) a diaryl iodonium cation, and (B2b) an anion selected from perchlorate, imidodisulfurylfluoride anion, unsubstituted and substituted (C1-C12)-hydrocarbylsulfonates, (C2-C12)-perfluoroalkanoates, tetrafluoroborate, unsubstituted and substituted tetra-(C1-C12)-hydrocarbylborates, hexafluorophosphate, hexafluoroarsenate, tris(trifluoromethylsulfonyl)methyl anion, bis(trifluoromethylsulfonyl)methyl anion, bis(trifluoromethylsulfuryl)imide anion, and combinations thereof; and (B3) a cure co-catalyst selected from free-radical generating aromatic compounds, peroxy compounds, copper (II) salts of aliphatic carboxylic acids, copper (II) salts of aromatic carboxylic acids, copper (II) acetylacetonate, and combinations
    Type: Grant
    Filed: June 30, 2005
    Date of Patent: May 27, 2008
    Assignee: General Electric Company
    Inventors: Qiwei Lu, Michael O'Brien, Michael Vallance
  • Publication number: 20080119581
    Abstract: The present invention provides a process for forming a metal pattern in which a metal is chemically absorbed, and a pattern forming material and a crosslinkable monomer used for the process. The process includes: a step for forming a pattern by photolithography including an exposure step for carrying out exposure with a purified water-based developer having a pH of less than 7 on a pattern forming material containing (A) a matrix polymer having at least one of a carboxyl and a sulfonate group, and a rinsing step; a step for forming a metal-containing pattern by immersing the pattern in an aqueous solution containing a metal compound to allow for chemical absorption of a metal ion or a complex ion to the pattern; and a step for forming a metal pattern containing the elemental metal or further containing metal oxide by sintering the metal-containing pattern. A crosslinkable monomer containing a condensation product of a polyhydric alcohol with N-methylol(meth)acrylamide was used.
    Type: Application
    Filed: December 28, 2005
    Publication date: May 22, 2008
    Applicant: Tokyo Ohka Kogyo Co., Ltd.
    Inventors: Hiroshi Takanashi, Syozo Miyazawa, Tomoya Kudo
  • Publication number: 20080076847
    Abstract: Composition with at least one polymerizable binder and a polymerization initiator, which contains at least one acylgermane according to general Formula (I), in which R0 is a substituted or unsubstituted C1-18-alkyl radical or an acyl group; R1 and R2 are H, an acyl group or have one of the meanings given for R3; R3 is a branched or linear C1-18-alkyl radical which can be unsubstituted or substituted one or more times by —O—, —NH—, —NR—, —S— or interrupted by other groups, trimethylsilyl, hal-(CH3)2Si—[OSi(CH3)2]r?, (CH3)3Si—[OSi(CH3)2]r—, —COOH, —COO—R10, —CO—NR11R12, —CO-vinyl, —CO-phenyl, phenyl-C1-4-alkyl, phenyl, naphthyl or biphenyl, C5-12 cycloalkyl, a 5 or 6-membered O, S or N-containing heterocyclic ring, halogen, OH, an aromatic C6-30 radical which can be substituted or unsubstituted and/or interrupted by O, S or —NR—, or a branched, cyclic or linear C1-20 alkyl, -alkenyl, -alkoxy or -alkenoxy radical; m is 1, 2 or 3; n is 0 or 1 and p is 0 or 1; and the use of acyl germanes of Formula (I) for ex
    Type: Application
    Filed: April 2, 2007
    Publication date: March 27, 2008
    Applicant: IVOCLAR VIVADENT AG
    Inventors: Norbert Moszner, Ulrich Salz, Urs Karl Fischer, Robert Liska, Heinrich Gruber, Beate Ganster
  • Publication number: 20080045619
    Abstract: A photo-crosslinkable polyolefin composition comprises a polyolefin, a source of functionality receptive to crosslinking by UV radiation, a cationic photoinitiator and optionally includes a free-radical photoinitiator, a crosslinking accelerator or sensitizer, and other additives such as compatibilizers, inorganic fillers, nanofillers, glass, polymeric and ceramic microspheres, glass fibres, flame retardants, antioxidants, stabilizers, processing aids, foaming agents and pigments. A method for manufacturing a UV-crosslinked polyolefin article comprises forming an article by extruding, moulding or otherwise forming the UV-crosslinkable polyolefin composition and subjecting the article to UV radiation on-line with the extrusion, moulding or other forming operation.
    Type: Application
    Filed: February 28, 2007
    Publication date: February 21, 2008
    Applicant: SHAWCOR LTD.
    Inventors: Peter Jackson, Eileen Wan
  • Patent number: 7311945
    Abstract: A silicone composition which can be used in the production of varnishes that can be applied to supports to reduce the friction coefficient. The silicone composition includes at least one polyorganosilane A (POS) which can be cationically and radically cross-linked by functional cross-linking groups (GER) and a primer C chosen from onium borates. The composition also includes molecules (POS D) which are substituted by secondary functional groups (GFS) caned by silicon atoms and selected from those that include at least one alkoxy and/or epoxy and/or carboxy motif and optionally a charge (e.g. silica).
    Type: Grant
    Filed: September 21, 2004
    Date of Patent: December 25, 2007
    Assignee: Rhodia Chimie
    Inventors: Jean-Louis Bertry, Jean-Marc Frances, Fabrice Bohin, Christian Priou
  • Patent number: 7291655
    Abstract: A polymerization process with elevated productivity using a coordination catalyst, wherein electromagnetic radiation is applied during polymerization. The irradiation of light greatly increases the activity of the coordination catalyst.
    Type: Grant
    Filed: May 29, 2002
    Date of Patent: November 6, 2007
    Assignee: Borealis Technology Oy
    Inventors: Karl-Heinz Reichert, Annette Wittebrock, Kalle Kallio
  • Patent number: 7276544
    Abstract: A process for producing intraocular lenses (IOLs) capable of absorbing blue light and ultraviolet light using photo curing. Intraocular lenses so produced block blue light and ultraviolet light from reaching the retina of an eye implanted with the IOL. By blocking blue light and ultraviolet light from reaching the retina, the IOL thereby prevents potential damage to the retina.
    Type: Grant
    Filed: September 8, 2003
    Date of Patent: October 2, 2007
    Assignee: Bausch & Lomb Incorporated
    Inventors: Yu-Chin Lai, Dominic V. Ruscio, George F. Green
  • Patent number: 7256221
    Abstract: Disclosed are photo or electron beam polymerizable compositions, and preparation thereof and devices containing them. The composition contains completely or substantially completely hydrogenated hydrocarbon-based material completely free or substantially free of carbon-carbon double and triple bonds containing photo or electron beam curable terminal or pendant groups, low-outgassing photoinitiators, an optional viscosity adjustment component and an optional filler. The composition is visible light, UV or electron beam curable. It cures into a low-modulus, low outgassing polymer material. The composition can be used as an adhesive, sealant or lens potting material. It is ideal for use in lithographic tools involving deep or vacuum ultraviolet radiations, in particular, as lens potting materials for 157 nm lithographic tools.
    Type: Grant
    Filed: November 7, 2003
    Date of Patent: August 14, 2007
    Assignee: Corning Incorporated
    Inventors: Kelsee L. Coykendall, Paul G. Dewa, Robert Sabia, David C. Sauer, Paul J. Shustack, Kamal K. Soni
  • Patent number: 7253213
    Abstract: The invention relates to a process for polymerising a monomer, polymerizing and/or crosslinking an oligomer, or crosslinking a polymer or copolymer, said monomer, oligomer, polymer and copolymer being selected among precursor monomers, urethane, thiourethane and episulfide oligomers, and urethane, thiourethane and episulfide polymers and copolymers, which comprises: (a) adding to precursor monomers or oligomers or polymers or copolymers an effective amount of at least one complex of Co, Mo or W which under irradiation conditions photochemically reacts to release at least one anionically charged nucleophile or uncharged Lewis base; and (b) irradiating the mixture of (a) to release the at least one anionically charged nucleophile or uncharged Lewis base to initiate polymerisation and/or crosslinking of the monomer, oligomer, polymer or copolymer.
    Type: Grant
    Filed: April 26, 2005
    Date of Patent: August 7, 2007
    Inventors: Charles R. Kutal, Sirisoma Wanigatunga, Gabriel Keita, Yassin Turshani
  • Patent number: 7135544
    Abstract: Processes for the living polymerization of olefin monomers with terminal carbon-carbon double bonds are disclosed. The processes employ initiators that include a metal atom and a ligand having two group 15 atoms and a group 16 atom or three group 15 atoms. The ligand is bonded to the metal atom through two anionic or covalent bonds and a dative bond. The initiators are particularly stable under reaction conditions in the absence of olefin monomer. The processes provide polymers having low polydispersities, especially block copolymers having low polydispersities. It is an additional advantage of these processes that, during block copolymer synthesis, a relatively small amount of homopolymer is formed.
    Type: Grant
    Filed: December 3, 2004
    Date of Patent: November 14, 2006
    Assignee: Massachusetts Institute of Technology
    Inventors: Richard R. Schrock, Robert Bauman
  • Patent number: 7122290
    Abstract: Holographic storage mediums, methods for producing the storage medium, methods for storing data in the holographic storage medium, and optical storage reading methods are described herein. The holographic storage medium can be formed from a composition comprising a thermally crosslinked polysiloxane binder; a photoactive material; and a photo-initiator, wherein the photoactive material has a concentration that remains about the same before and after a thermal cure process to form the thermally crosslinked polysiloxane binder.
    Type: Grant
    Filed: June 15, 2004
    Date of Patent: October 17, 2006
    Assignee: General Electric Company
    Inventors: Michael Jeffrey McLaughlin, Marc Dubois, James Edward Pickett, Peifang Tian
  • Patent number: 7053133
    Abstract: An ultraviolet activatable adhesive film comprising an epoxy resin, an ultraviolet activatable cationic polymerization catalyst and cationic polymerization inhibitor and water in an amount effective to suppress the cationic polymerization of the film and prolong the time from activation to thermal press-bonding after the ultraviolet activatable adhesive film is activated by irradiation by ultraviolet rays.
    Type: Grant
    Filed: May 3, 2002
    Date of Patent: May 30, 2006
    Inventors: Hiroaki Yamaguchi, Tetsu Kitamura
  • Patent number: 7030171
    Abstract: The objective of the present invention is to provide a production method by which a polymer of a functional group-terminated vinyl monomer can be easily and practically produced. Further, it is another object of the present invention to provide a functional group-terminated vinyl polymer which is useful as a material for the production of various functional products. The first aspect of the present invention is concerned with a production method of a functional group-terminated vinyl polymer comprising a step of synthesizing a halogen atom-terminated vinyl polymer by the radical polymerization reaction of a vinyl monomer in the presence of a halogen compound and a step of introducing a functional group to a terminus by substituting a functional group-containing group for the terminal halogen atom of said vinyl polymer.
    Type: Grant
    Filed: October 31, 2003
    Date of Patent: April 18, 2006
    Assignee: Sekisui Chemical Co., Ltd.
    Inventors: Takeshi Wakiya, Takamaro Kakehi
  • Patent number: 7025954
    Abstract: In the disclosed method for the reshaping (adornment, repair, covering, prosthetic extension, etc.) of essentially rigid, keratinaceous surfaces such as nail plates with a free radical-polymerizable acrylic ester, the free radical initiator contains an encapsulated compound of the formula III wherein R1 through R4 are identical to or different from each other and are hydrogen, a mononuclear carbocyclic aromatic group, a C1-C18 aliphatic group, a C1-C18 aliphatic radical substituted with a mononuclear carbocyclic aromatic group, a cycloaliphatic group or an aromatic radical having from 6 to 10 ring carbon atoms and up to five aliphatic or oxy- or oxo-aliphatic substituents, with the proviso that at least R3 or R4 is hydrogen. The compound of formula III, in chemically-curable systems is encapsulated into the polymer matrix and utilized in combination with a metal salt co-catalyst that is mixed with the polymer and, optionally, an organic buffering compound and a crosslinker.
    Type: Grant
    Filed: May 20, 2002
    Date of Patent: April 11, 2006
    Assignee: Esstech, Inc.
    Inventor: Allen D. Johnston
  • Patent number: 6984262
    Abstract: Described is a coating composition adapted to enhance the adhesion of a polymeric coating or film applied to a substrate. The coating composition is interposed between the substrate and the polymeric coating and comprises (a) at least one coupling agent, partial hydrolysates thereof or mixtures thereof in a concentration greater than 25 weight percent, based on the weight of the total composition, and (b) an adhesion enhancing amount of an epoxy-containing material having at least two epoxy groups. The coating composition is substantially free of photochromic materials and colloidal particles chosen from silica, alumina or mixtures thereof. Also described is a process for using the coating composition and articles coated with the composition and additional coatings and films which can be photochromic.
    Type: Grant
    Filed: July 16, 2003
    Date of Patent: January 10, 2006
    Assignee: Transitions Optical, Inc.
    Inventors: Eric M. King, James P. Colton, Jessica A. Hoch
  • Patent number: 6921454
    Abstract: A radiation curable adhesive composition which includes: a) an ?,?-olefinically unsaturated ether monomer component consisting of one or more compounds having the formula: R[O—CH?CHR1]n??(I) where R is an n-valent carbon-linked organic group R1 is H or a monovalent carbon-linked organic group and n has a value of 1 or more, b) an elastomeric polymer having a tensile strength at break of greater than 1500 psi (10342 kPa), and an elongation at break of greater than 100%, and c) a cationic photoinitiator.
    Type: Grant
    Filed: November 27, 2001
    Date of Patent: July 26, 2005
    Assignee: Henkel Corporation
    Inventors: Weitong Shi, JoAnn DeMarco, Shabbir Attarwala
  • Patent number: 6919385
    Abstract: An energy-ray curing resin composition comprising a photopolymerizable resin component which can be cured by irradiation with an energy ray, a photopolymerization initiator component which makes it possible to cure the above photopolymerizable resin component by irradiation with an energy ray and a curing agent component used for curing at least one of the above photopolymerizable resin components by a method other than irradiation with an energy ray. To provide a high curability energy-ray curing resin composition which has a very high curing capacity as compared with those of conventional energy-ray curing resins and which is simple and has a high design freedom.
    Type: Grant
    Filed: February 4, 2003
    Date of Patent: July 19, 2005
    Assignee: Mitsubishi Heavy Industries, Ltd.
    Inventor: Noriya Hayashi
  • Patent number: 6911485
    Abstract: The invention relates to a process for polymerising a monomer, polymerizing and/or crosslinking a oligomer, or crosslinking a polymer or copolymer, said monomer, oligomer, polymer and copolymer being selected among precursor monomers, urethane, thiourethane and episulfide oligomers, and urethane, thiourethane and episulfide polymers and copolymers, which comprises: (a) adding to precursor monomers or oligomers or polymers or copolymers an effective amount of at least one complex of Co, Mo or W which under irradiation conditions photochemically reacts to release at least one anionically charged nucleophile or uncharged Lewis base; and (b) irridiating the mixture of (a) to release the at least one anionically charged nucleophile or uncharged Lewis base to initiate polymerisation and/or crosslinking of the monomer, oligomer, polymer or copolymer.
    Type: Grant
    Filed: April 19, 2002
    Date of Patent: June 28, 2005
    Assignees: The University of Georgia Research Foundation, Inc., Essilor International Campagnie Generale D'Optique
    Inventors: Charles R. Kutal, Sirisoma Wanigatunga, Gabriel Keita, Yassin Turshani
  • Patent number: 6906156
    Abstract: Accelerators that can be useful for an energy polymerizable composition comprising a cationically curable material; energy polymerizable compositions comprising at least one cationically curable material and an initiation system therefor, the initiation system comprising at least one organometallic complex salt and at least one accelerator; and a method for curing the compositions. The cured compositions can provide useful articles. The invention also provides compositions of matter comprising an organometallic complex salt and at least one compound selected from the Class 1 through Class 4 compounds disclosed herein.
    Type: Grant
    Filed: September 2, 2003
    Date of Patent: June 14, 2005
    Assignee: 3M Innovative Properties Company
    Inventors: Wayne S. Mahoney, Michael C. Palazzotto
  • Patent number: 6902816
    Abstract: The invention relates to silicone compositions that are used in the production of varnishes that can be applied to supports in order to reduce the friction coefficient. The inventive composition comprises at least one polyorganosiloxane A (POS) which can be cationically and radically cross-linked by functional cross-linking groups (GFR) and a primer C chosen from onium borates, characterized in that the inventive composition also comprises molecules (POS D) which are substituted by secondary functional groups (GFS) carried by silicon atoms and selected from those that include at least one alkoxy and/or epoxy and/or carboxy motif and optionally a charge (e.g. silica). The invention can be used with anti-friction varnishes for RTV silicone coatings for material used in air bags, thermal transfer ribbons or packing films.
    Type: Grant
    Filed: April 5, 2000
    Date of Patent: June 7, 2005
    Assignee: Rhodia Chimie
    Inventors: Jean-Louis Bertry, Jean-Marc Frances, Fabrice Bohin, Christian Priou
  • Patent number: 6894084
    Abstract: The present invention provides radiation curable resin compositions that contain no or essentially no volatile organic components (VOCs), and to methods of using these compositions. The radiation curable resin compositions find particular use as coating compositions. In particular, the radiation curable resin compositions of this invention comprise a vinyl dioxolane end-capped oligomer blended with a photoinitiator.
    Type: Grant
    Filed: February 12, 2001
    Date of Patent: May 17, 2005
    Assignee: Foster-Miller, Inc.
    Inventors: Robert F. Kovar, Nese Orbey, Stanley Wentworth
  • Patent number: 6878505
    Abstract: A photosensitive composition comprising (i) a sensitizing dye represented by the following formula (I), (II) or (III) defined in the specification, (ii) a titanocene compound and (iii) a compound of undergoing a reaction with at least one of a radical and an acid to change at least one of its physical and chemical properties and maintaining the changed physical or chemical property, and a lithographic printing plate having a photosensitive layer comprising the photosensitive composition.
    Type: Grant
    Filed: May 28, 2002
    Date of Patent: April 12, 2005
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Akinori Shibuya, Kazuto Kunita
  • Patent number: 6867242
    Abstract: The invention relates to a method for producing a sealed impregnation and/or release coating of flat joints, in particular of cylinder-head gaskets such as composite seals, metallic joints and multi-layered steel joints. The invention uses a silicone composition including at least a polyorganosiloxane A crosslinkable by a cationic and/or radical process by appropriate crosslinking functional groups, for example, of the alkenyl ether, acrylic, acrylate, epoxide and/or oxethane type; at least an initiator salt B selected among onium borates or an organometallic complex; and at least a reactive diluent C including a nonorganosilicon or organosilicon compound comprising in its structure at least a crosslinking functional group and optionally a secondary functional group different from the crosslinking functional group but capable of chemically reacting with a crosslinking functional group, for example of the hydroxyl, alkoxy and/or carboxyl type.
    Type: Grant
    Filed: June 8, 2000
    Date of Patent: March 15, 2005
    Assignee: Rhodia Chimie
    Inventors: Jean-Marc Frances, Olivier Loubet
  • Patent number: 6849668
    Abstract: A multi-functional photoinitiator of formula (I) R1m—Q—(A1—PI)n??(I) wherein Q is a heteroatom selected from Si, Ti, Zr and Sn or any two independently selected such heteroatoms linked by a covalent bond or a by C1-16 (preferably C1-9) alkylene group, n is at least 2 and n+m=the functionality of Q, each R1 is the same or different and is a non-photoinitiator group; each group PI is the same or different and is a photoinitiator group. Each —A1— is the same or different and is selected from linking groups of formula —(A2)p—Z— wherein p has an average of from 1 to 10, preferably from 3 to 5 and the groups —A2— are either (a) each independently selected from C2-4 alkyleneoxy groups; or (b) each independently selected from groups of formula —O—(CH2)qCO— wherein q is from 3 to 5, and Z is selected from —O—, —S— and —NR6— where R6 is C1-6 alkyl.
    Type: Grant
    Filed: August 4, 2000
    Date of Patent: February 1, 2005
    Assignee: Sun Chemical Corporation
    Inventors: Roger Edward Burrows, Shaun Lawrence Herlihy, Derek Ronald Illsley
  • Patent number: 6828355
    Abstract: This invention relates to resin-reinforced silicone compositions curable upon exposure to radiation in the electromagnetic spectrum, which compositions when cured demonstrate improved elastomeric properties, such as tensile strength, modulus and elongation. The inventive resin-reinforced silicone compositions may alternatively be rendered curable by exposure to moisture. In addition, the inventive composition may be rendered curable by exposure to radiation in the electromagnetic spectrum, and exposure to moisture. The inventive silicone compositions are particularly well suited for use in electronic conformal coating and potting applications, as well as in automotive gasketing applications, pressure sensitive adhesive applications and the like.
    Type: Grant
    Filed: January 18, 2002
    Date of Patent: December 7, 2004
    Assignee: Henkel Corporation
    Inventor: Hsien-Kun Chu
  • Publication number: 20040198857
    Abstract: A pioneering process of inducing a photochemical reaction involves upconverted fluorescence from a rare earth ion doped inorganic glass, crystal or other inorganic material. An inorganic host material doped with a rare earth ion capable of upconversion fluorescence is provided. A photoactiveable organic material is positioned at a surface of the inorganic host material, and radiation is directed at the inorganic host material to cause multiple photons to be absorbed by the rare earth ion. A single photon is emitted from the rare earth ion and is absorbed by a chemical species in the photoactivateable organic material to induce a chemical reaction.
    Type: Application
    Filed: April 1, 2003
    Publication date: October 7, 2004
    Inventors: Matthew J. Dejneka, Michael E. DeRosa, Stephen L. Logunov
  • Patent number: 6790473
    Abstract: An electronic package assembly where a low profile integrated circuit chip package is soldered to an organic (e.g., epoxy resin) substrate, e.g., a printed circuit board or card, the projecting conductive leads of the integrated circuit chip package and the solder which substantially covers these leads (and respective conductors on the substrate) having been substantially covered with ultraviolet photocured encapsulant material (e.g., polymer resin) to provide reinforcement for the solder-lead connections. The encapsulant material is dispensed about the solder and lead joints following solder reflow and solidification so as to substantially surround the solder and any portions of the leads not covered with solder.
    Type: Grant
    Filed: January 26, 2001
    Date of Patent: September 14, 2004
    Assignee: International Business Machines Corporation
    Inventors: Konstantinos I. Papathomas, Stephen J. Fuerniss, Deborah L. Dittrich, David W. Wang
  • Patent number: 6784222
    Abstract: An electroconductive coating composition which function as a sealer/primer includes (a) a radiation curable, polymerizable compound, (b) a photoinitiator and (c) a conductive pigment. The conductive pigment may be a mixture of pigment including a blend of conductive pigments as well as conductive pigment. Conductivity enhancers may, also, be added. The polymerizable compound is, preferably, a U curable acrylate functional compound which may be monofunctional or polyfunctional. The composition is particularly useful for sealing and priming SMC panels.
    Type: Grant
    Filed: March 6, 2002
    Date of Patent: August 31, 2004
    Inventors: Frank David Zychowski, Joseph C. Sgro
  • Patent number: 6780896
    Abstract: Zinc-complex photoiniators and applications therefore are disclosed. The zinc-complex photoinitiators of the present invention include various pendent groups which serve to protect the compound from hydrolysis. In this manner, the stability of the photoinitiator is increased. The photoinitiators of the present invention can be used in many different processes and applications. For example, the photoinitiators are well suited for use in photocurable inks as used in ink jet printers or on a printing press.
    Type: Grant
    Filed: December 20, 2002
    Date of Patent: August 24, 2004
    Assignee: Kimberly-Clark Worldwide, Inc.
    Inventors: John Gavin MacDonald, Jason Lye
  • Publication number: 20040138324
    Abstract: Processes for the living polymerization of olefin monomers with terminal carbon-carbon double bonds are disclosed. The processes employ initiators that include a metal atom and a ligand having two group 15 atoms and a group 16 atom or three group 15 atoms. The ligand is bonded to the metal atom through two anionic or covalent bonds and a dative bond. The initiators are particularly stable under reaction conditions in the absence of olefin monomer. The processes provide polymers having low polydispersities, especially block copolymers having low polydispersities. It is an additional advantage of these processes that, during block copolymer synthesis, a relatively small amount of homopolymer is formed.
    Type: Application
    Filed: August 22, 2003
    Publication date: July 15, 2004
    Applicant: Massachusetts Institute of Technology
    Inventors: Richard R. Schrock, Robert Baumann
  • Publication number: 20040122124
    Abstract: Zinc-complex photoiniators and applications therefore are disclosed. The zinc-complex photoinitiators of the present invention include various pendent groups which serve to protect the compound from hydrolysis. In this manner, the stability of the photoinitiator is increased. The photoinitiators of the present invention can be used in many different processes and applications. For example, the photoinitiators are well suited for use in photocurable inks as used in ink jet printers or on a printing press.
    Type: Application
    Filed: December 20, 2002
    Publication date: June 24, 2004
    Applicant: Kimberly-Clark Worldwide, Inc.
    Inventors: John Gavin MacDonald, Jason Lye
  • Patent number: 6749995
    Abstract: Disclosed is a light sensitive composition containing a compound represented by the following formula (1): wherein R1, R2 and R3 independently represent a hydrogen atom, a substituted or unsubstituted alkyl group, a substituted or unsubstituted alkenyl group, a substituted or unsubstituted aryl group, or a substituted or unsubstituted heterocyclic group, provided that R1 and R2 may combine with each other to form a ring or R2 and R3 may combine with each other to form a ring.
    Type: Grant
    Filed: January 29, 2003
    Date of Patent: June 15, 2004
    Assignee: Konica Corporation
    Inventor: Toshiyuki Matsumura
  • Publication number: 20040048943
    Abstract: Accelerators that can be useful for an energy polymerizable composition comprising a cationically curable material; energy polymerizable compositions comprising at least one cationically curable material and an initiation system therefor, the initiation system comprising at least one organometallic complex salt and at least one accelerator; and a method for curing the compositions. The cured compositions can provide useful articles. The invention also provides compositions of matter comprising an organometallic complex salt and at least one compound selected from the Class 1 through Class 4 compounds disclosed herein.
    Type: Application
    Filed: September 2, 2003
    Publication date: March 11, 2004
    Applicant: 3M Innovative Properties Company
    Inventors: Wayne S. Mahoney, Michael C. Palazzotto
  • Patent number: 6696506
    Abstract: A cationic photocatalyst composition and a photocurable composition utilizing cationic polymerization are provided which can present sufficient open time and adhesion. The cationic photocatalyst composition contains a photosensitive onium salt and a compound represented by the following formula (1). The photocurable composition contains the cationic photocatalyst composition and an epoxy compound having at least one epoxy group per molecule. Formula (1) [Compound B] (wherein R and R′ are suitably selected from hydrogen, halogen, saturated hydrocarbon groups, unsaturated hydrocarbon groups, substituting groups comprising any suitable combination of elements such as carbon, hydrogen, oxygen, nitrogen and sulfur; and l and n each is an integer of 2 or larger).
    Type: Grant
    Filed: December 13, 2000
    Date of Patent: February 24, 2004
    Assignee: Sekisui Chemical Co., Ltd.
    Inventor: Hiroji Fukui
  • Patent number: 6693142
    Abstract: The objective of the present invention is to provide a production method by which a polymer of a functional group-terminated vinyl monomer can be easily and practically produced. Further, it is another object of the present invention to provide a functional group-terminated vinyl polymer which is useful as a material for the production of various functional products. The first aspect of the present invention is concerned with a production method of a functional group-terminated vinyl polymer comprising a step of synthesizing a halogen atom-terminated vinyl polymer by the radical polymerization reaction of a vinyl monomer in the presence of a halogen compound and a step of introducing a functional group to a terminus by substituting a functional group-containing group for the terminal halogen atom of said vinyl polymer.
    Type: Grant
    Filed: June 24, 2002
    Date of Patent: February 17, 2004
    Assignee: Sekisui Chemical Co., Ltd.
    Inventors: Takeshi Wakiya, Takamaro Kakehi
  • Publication number: 20030236317
    Abstract: A titanium oxide dispersion composition is provides, the composition comprising a solvent and a titanium oxide with an average secondary particle diameter of 100 nm or smaller, the dispersion composition having a maximum intensity within the range of from 435 nm to 700 nm of a primary differential spectrum of a transmittance spectrum, wherein the transmittance spectrum is measured using an ultraviolet-visible spectrophotometer after adjusting a solid content of the dispersion composition to be about 2% by weight. The composition provides a film having a high hydrophilicity under the irradiation of a visible light.
    Type: Application
    Filed: June 9, 2003
    Publication date: December 25, 2003
    Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Yoshiaki Sakatani, Kensen Okusako, Hironobu Koike
  • Patent number: 6632897
    Abstract: Described is the use of nanoscale metal oxide particles as catalysts for the thermal and/or photochemical polymerization of species having at least one polymerizable carbon-carbon multiple bond and/or at least one carbon containing ring capable of undergoing a ring opening polymerization.
    Type: Grant
    Filed: December 20, 1999
    Date of Patent: October 14, 2003
    Assignee: Institut Für Neue Materialien gemeinnützige
    Inventors: Elisabeth Geiter, Helmut Schmidt
  • Publication number: 20030180635
    Abstract: A visible radiation sensitive composition is disclosed. The composition comprises at least one ethylenically unsaturated monomer capable of free radical initiated addition polymerization; optionally, at least one binder; and a photoinitiator system comprising a coinitiator and a cyanopyridone sensitizer. The coinitiator preferably comprises a metallocene and an onium compound.
    Type: Application
    Filed: February 12, 2002
    Publication date: September 25, 2003
    Inventors: Harald Baumann, Michael Flugel
  • Patent number: 6620864
    Abstract: A composition suitable for use in dental medicine and/or dentistry polymerizable by cationic polymerization consists of one or more epoxy compounds, a plasticizer, a catalyst for hardening by ring opening, a catalyst for hardening by light and an accelerator consisting of a non alkaline tertiary amine. At radiation with a light having a wavelength of 340-500 nm the composition hardens practically free of contraction and adhesiveness.
    Type: Grant
    Filed: August 17, 2001
    Date of Patent: September 16, 2003
    Assignee: LSP Dental Chemistry AG
    Inventor: Adalbert Schmid
  • Patent number: 6590009
    Abstract: The invention concerns a polymerization and/or crosslinking method under electron beam and/or gamma radiation for compositions based on monomers, oligomers and/or polymers with organic functional groups. The invention is characterized in that the crosslinking and/or polymerization is carried out in the presence of an initiator capable of being activated under electron beam and/or gamma radiation comprising a boron derivative of formula (I) M+B(Ar) 4 wherein: M+, a unit bearing a positive charge, is an alkaline metal selected among those of columns IA and IIA of the periodic table; Ar is an aromatic derivative, optionally substituted by at least a substituent selected among a fluorine radical, a chlorine radical, a linear or branched alkyl chain, which itself can be substituted by at least a fluorine atom.
    Type: Grant
    Filed: May 3, 2001
    Date of Patent: July 8, 2003
    Assignee: Rhodia Chimie
    Inventor: Christian Priou
  • Publication number: 20030100625
    Abstract: Microwave-assisted Heck arylations are disclosed using various dispersed Pd systems including the novel Pd/MgO and Pd/SiO2—Al2O3 catalyst.
    Type: Application
    Filed: October 12, 2001
    Publication date: May 29, 2003
    Inventors: S. Muthukumaru Pillai, A. Wali, Sheo Satish
  • Patent number: 6565696
    Abstract: An adhesive containing a) a compound containing at least one vinyl ether group which has a molecular weight of more than 400 and b) a photoinitiator which initiates a polymerization of component A after exposure to light with a wavelength of 100 to 600 nm is useful for the production of a film laminate.
    Type: Grant
    Filed: August 24, 2000
    Date of Patent: May 20, 2003
    Assignee: Henkel Kommanditgesellschaft auf Aktien
    Inventors: Achim Huebener, Guenter Henke, Michael Drobnik
  • Publication number: 20030077541
    Abstract: A photosensitive composition comprising (i) a sensitizing dye represented by the following formula (I), (II) or (III) defined in the specification, (ii) a titanocene compound and (iii) a compound of undergoing a reaction with at least one of a radical and an acid to change at least one of its physical and chemical properties and maintaining the changed physical or chemical property, and a lithographic printing plate having a photosensitive layer comprising the photosensitive composition.
    Type: Application
    Filed: May 28, 2002
    Publication date: April 24, 2003
    Inventors: Akinori Shibuya, Kazuto Kunita
  • Patent number: 6548567
    Abstract: The invention relates to an ionic compound corresponding to the formula [R1X1(Z1)—Q−—X2(Z2)—R2]m Mm+ in which Mm+ is a cation of valency m, each of the groups Xi is S═Z3, S═Z4, P—R3 or P—R4; Q is N, CR5, CCN or CSO2R5, each of the groups Zi is ═O, ═NC≡N, ═C(C≡N)2, ═NS(═Z)2R6 or ═C[S(═Z)2R6]2, each of the groups Ri, is Y, YO—, YS—, Y2N— or F, Y represents a monovalent organic radical or alternatively Y is a repeating unit of a polymeric frame. The compounds are useful for producing ion conducting materials or electrolytes, as catalysts and for doping polymers.
    Type: Grant
    Filed: August 17, 2001
    Date of Patent: April 15, 2003
    Inventors: Michel Armand, Christophe Michot, Yurii Yagupolskii, Lev Yagupolskii, Andrej Bezdudny, Natalya Kondratenko
  • Patent number: 6486227
    Abstract: The present invention is directed to energy-efficient, photoinitiators having the general formula: wherein Z each independently represent wherein R1, R2, R3, R4, R5, R6, R7, R8 are as defined in claim 1, and wherein R9 represents (R10)2O or (R10)3N; wherein R10 represents H or an alkyl group having from one to eight carbon atoms; and wherein R11 represents H, an alkyl group having from one to eight carbon atoms, a benzyl group or an aralkyl group. The present invention is also directed to a method of generating a reactive species, methods of polymerizing polymerizable materials, methods of curing an unsaturated oligomer/monomer mixture, and methods of laminating using the photoinitiators of the present invention. In addition, the present invention is directed to ink compositions, adhesive compositions and resins, and methods of printing using the above-described photoinitiators.
    Type: Grant
    Filed: June 19, 2001
    Date of Patent: November 26, 2002
    Assignee: Kimberly-Clark Worldwide, Inc.
    Inventors: Ronald Sinclair Nohr, John G. MacDonald
  • Patent number: 6476092
    Abstract: A photopolymerizable composition which is capable of successfully ensuring both high sensitivity and excellent storage stability is provided as a radical photopolymerization-system composition which is highest in the sensitivity and very promising out of the image-forming techniques. The photopolymerizable composition comprises a polymerizable group-containing compound having a specific structure set forth below wherein X1 and X2 each independently represent a group containing a hetero atom wherein the hetero atom is in the &agr;-position or a halogen atom and a photopolymerization initiator.
    Type: Grant
    Filed: September 20, 2000
    Date of Patent: November 5, 2002
    Assignee: Fuji Photo Film Co., Ltd.
    Inventor: Kazuto Kunita
  • Publication number: 20020156142
    Abstract: A thermally-stable cationic photoinitiator capable of flash vaporization under vacuum and temperature conditions of an available flash-evaporation chamber is selected. The photoinitiator is mixed with a cation-polymerizable monomer and/or oligomer of interest and the mixture is flash evaporated and condensed in conventional manner as a film on a cold substrate. The resulting vacuum-deposited, homogeneous layer is cured with a high-energy radiation source that causes the cationic photoinitiator to liberate acidic species that catalyze the crosslinking of the monomer/oligomer compounds in its deposited film form. As a result of the homogeneous, pinhole-free nature of the vacuum deposition process, the thin-film polymer product does not suffer from the disadvantages attendant to prior-art atmospheric processes for cationically-cured polymers.
    Type: Application
    Filed: February 13, 2001
    Publication date: October 24, 2002
    Inventors: Michael G. Mikhael, Angelo Yializis
  • Patent number: 6468595
    Abstract: A thermally-stable cationic photoinitiator capable of flash vaporization under vacuum and temperature conditions of an available flash-evaporation chamber is selected. The photoinitiator is mixed with a cation-polymerizable monomer and/or oligomer of interest and the mixture is flash evaporated and condensed in conventional manner as a film on a cold substrate. The resulting vacuum-deposited, homogeneous layer is cured with a high-energy radiation source that causes the cationic photoinitiator to liberate acidic species that catalyze the crosslinking of the monomer/oligomer compounds in its deposited film form. As a result of the homogeneous, pinhole-free nature of the vacuum deposition process, the thin-film polymer product does not suffer from the disadvantages attendant to prior-art atmospheric processes for cationically-cured polymers.
    Type: Grant
    Filed: February 13, 2001
    Date of Patent: October 22, 2002
    Assignee: Sigma Technologies International, Inc.
    Inventors: Michael G. Mikhael, Angelo Yializis