Abstract: Compounds of the formula I ##STR1## in which n and o are a number from 0 to 50, m is a number from 1 to 50, u and v are 0 or 1, and at least one of the indices u and v is 1, R.sub.1, R.sub.2, R.sub.2a, R.sub.3 and R.sub.4 independently of one another are, for example, aromatic hydrocarbons, R.sub.5, if n and o are 0, is for example C.sub.1 -C.sub.12 alkyl and, if n and/or o are greater than 0, or if n and o are 0 and at the same time only one index u or v is 1, R.sub.5 may additionally, for example, be an aromatic hydrocarbon, at least one of the radicals R.sub.1, R.sub.2, R.sub.2a, R.sub.3, R.sub.4 and R.sub.5 being an aromatic hydrocarbon radical which is sterically hindered ortho to the boron atom, X is, for example, C.sub.1 -C.sub.20 alkylene, phenylene, biphenylene, etc., and Z is a radical which is able to form positive ions, are suitable as photoinitiators, both the compounds per se and their combination with dyes or other electron acceptors.

Abstract: A polysilane composition including a polysilane and a plasticizer can be coated as a thin film having improved mechanical strength and a high photo decomposition rate. A polysilane composition including a polysilane and an ester can be coated as a thin film which is exposed to UV and readily dyed to form a dyed polysilane film.

Abstract: A resin composition comprising an epoxy group-containing cycloolefin resin and a crosslinking agent is provided. More specifically, a resin composition comprising an epoxy group-containing thermoplastic norbornene resin obtained by introducing epoxy groups into a thermoplastic norbornene resin, and as the crosslinking agent, a curing agent for epoxy resins or a photoreactive substance is provided. The resin composition is suitable for use as an insulating material.

Abstract: The specification describes techniques for the manufacture of optical gratings in optical fibers. The grating pattern is written into the core of the fiber without removing the fiber coating. Coating compositions with high transparency to the actinic (writing) radiation but which are UV curable are described in detail. The coating compositions contain a UV photoinitiator that absorbs sufficient UV radiation to effectively cure the polymer but is relatively transparent to UV radiation used for writing the grating. The photoinitiator is one or more compounds selected from a specified group of aliphatic and cycloaliphatic ketones.

Abstract: Silicone release agents comprising propenyl-ether functionalized silicones exhibit a rapid cationic induce photo-cure. Such propenyl-ether functionalized silicones are synthesized by the hydrosilation of various .alpha.-allyloxy-.omega.-(1-propenoxy) alkanes with various linear and cyclic hydrogen functional siloxanes.

Abstract: Absorbable polymers and blends of acrylated poly(alkylene diglycolate)s and aliphatic polyesters based on lactone monomers such as lactide, glycolide, e-caprolactone, p-dioxanone, and trimethylene carbonate are described. The polymers and blends exhibit a broad range of properties, useful in a variety of medical devices.

Abstract: A composition of matter useful in the production of photoinitiator compositions, said compositions of matter comprising 100 parts by weight of camphorquinone and from 1 to 50 parts by weight of an anthraquinone compound having in the 2-position a substituent of the formula:--X--COR.sup.1 (1)wherein R.sup.1 represents an optionally substituted hydrocarbyl radical and X represents ##STR1## wherein R.sup.2 represents hydrogen or an optionally substituted hydrocarbyl radical.

Abstract: Absorbable polymers and blends of acrylated poly(alkylene diglycolate)s and aliphatic polyesters based on lactone monomers such as lactide, glycolide, e-caprolactone, p-dioxanone, and trimethylene carbonate are described. The polymers and blends exhibit a broad range of properties, useful in a variety of medical devices.

Abstract: A novel and safe ethylenically unsaturated peroxyester composition derived from an ethylenically unsaturated dicarboxylic acid is provided, as well as processes for making and using the composition. The peroxyester composition comprises about 0.04 to about 0.70 mole fraction of a first component compound having a formula I: ##STR1## about 0.32 to about 0.50 mole fraction of a second component compound having a formula II: ##STR2## about 0.04 to about 0.70 mole fraction of a third component compound having a formula III: ##STR3## wherein Q is an unsaturated ethylene divalent radical and R.sup.1 and R.sup.2 are organic substituents. Polymeric-peroxides are prepared via polymerizing the peroxyester compositions. The peroxyester compositions are also used for curing unsaturated polyester resins and for initiating polymerization of ethylenically unsaturated monomers.

Abstract: A radiation-curable release composition is disclosed which comprises:(A) an organopolysiloxane represented by the formulaRSi(CH.sub.3).sub.2 --O--(Si(CH.sub.3).sub.2 O).sub.n (Si(CH.sub.3)(R)O).sub.m Si(CH.sub.3).sub.2 R (I)wherein in Formula (I), each R is --R.sup.1 --O(O)C--C(R.sup.2).dbd.CH.sub.2, --R.sup.1 --O--C(R.sup.2).dbd.CH.sub.2 or is derived from an organic molecule containing both ethylenic unsaturation and epoxide functionality; R.sup.1 is a hydrocarbylene group; each R.sup.2 is independently hydrogen or a methyl or ethyl group; m is a number from about 1 to about 15; and n is a number from about 50 to about 300; and(B) an organosiloxane copolymer represented by the formula(R.sub.3 SiO).sub.x (SiO.sub.4/2).sub.y (II)wherein in Formula (II), each R is independently a hydrocarbon group or a group represented by the formula--O(O)C--C(R*).dbd.CH.sub.2wherein R* is hydrogen or a methyl or ethyl group; x is a number from about 0.

Abstract: The invention relates to a polymeric, radiation-sensitive resist composition comprising (i) iodonium sulfonate radiation sensitive acid generator; (ii) a polymer; and (iii) an acid labile compound.

Abstract: A resist material comprising (a) a terpolymer, (b) a photoacid generator, and (c) a solvent has high light sensitivity, heat resistance, adhesiveness, resolution, etc., and is suitable for forming a pattern of rectangular shape.

Abstract: Resin compositions useful for filament winding applications comprising an epoxy component including at least one polyepoxide resin curable by heat, an olefinicially unsaturated monomer component including at least one polyolefinically unsaturated monomer curable by actinic radiation, a cyanate ester component including at least one cyanate ester compound having at least two cyanate functional groups per molecule, at least one organic peroxide, at least one photoinitiator, and a heat activated curing agent for epoxides. The compositions have a viscosity less than about 2000 centipoise (cps) and are capable of retaining this viscosity for at least about 6 months at about ambient temperature. The resins are capable of being immobilized by actinic radiation exposure and further heat cured without substantial resin drip. One or more organic peroxides are employed, selected from the group of organic peroxides having 10 hour decomposition half-lives at temperatures of from about 50.degree. C. to less than about 104.

Abstract: A method of smoothing irregular corneal surfaces and removing protuberances from corneal surfaces by photoablative excimer laser keratectomy is provided. Collagen compositions for use in making collagen modulators useful in photoablative procedures are described. These compositions are applied to irregular corneal surfaces in sufficient amounts to at least fill in depressions or other irregularities on a corneal surface and are converted into a modulator, as a gel or polymerized film, prior to photoablation. The collagen modulators facilitate the photoablative smoothing of irregular corneal surfaces and protect adjacent corneal tissue from undesired photoablation.

Abstract: The invention relates to the use of cobaloximes and related cobalt(II) complexes which have essentially planar equatorially coordinated ligands and a pair of axially coordinated ligands which have at least one carbon-cobalt bond, as photoinitiators for free radical polymerizations. By selection of the appropriate cobaloximes and related complexes, it is possible to prepare polymers which have useful terminal functionality at both the head and the tail ends of the growing polymer chain. The process also teaches the photochemical polymerization and copolymerizations whereby the alkyl cobaloximes and related compounds, which are used as the photoinitiators, have alkyl groups, which may in essence, be polymers with carbon-cobalt chain ends, thereby allowing grafting reactions to occur to the polymer backbone.

Abstract: A resist composition comprising (a) a polymer having at least repeating units of the formulae: ##STR1## (b) a photoacid generator and (c) a solvent, has high sensitivity to light, excellent heat resistance, adhesiveness to a substrate and suitable for pattern formation with high resolution.

Abstract: The present invention provides a photo-setting conductive coating composition which is used as an antistatic material constituting articles wherein static electrification must be avoided, such as storage vessels for semi-conductor wafers, electronic/electric parts, floor/wall coverings for a production factory of semi-conductors, etc.The photo-setting conductive coating composition comprising 100 parts by weight of an antimony oxide-containing tin oxide powder (a) having a particle size of 0.01 to 0.4 .mu.m, 10 to 100 parts by weight of a (meth)acrylate compound (b) having at least two (meth)acryloyl groups in a molecule, 10 to 100 parts by weight of an acetal resin (c) having a residual hydroxyl group of 20 to 80 molar %, 0.1 to 10 parts by weight of a photopolymerization initiator (d) and 100 to 1000 parts by weight of an organic solvent (e).

Abstract: A novel and safe ethylenically unsaturated peroxyester composition derived from an ethylenically unsaturated dicarboxylic acid is provided, as well as processes for making and using the composition. The peroxyester composition comprises about 0.04 to about 0.70 mole fraction of a first component compound having a formula I: ##STR1## about 0.32 to about 0.50 mole fraction of a second component compound having a formula II: ##STR2## about 0.04 to about 0.70 mole fraction of a third component compound having a formula III: ##STR3## wherein Q is an unsaturated ethylene divalent radical and R.sup.1 and R.sup.2 are organic substituents. Polymeric-peroxides are prepared via polymerizing the peroxyester compositions. The peroxyester compositions are also used for curing unsaturated polyester resins and for initiating polymerization of ethylenically unsaturated monomers.

Abstract: A UV and moisture-curable organopolysiloxane composition comprising (i) an organopolysiloxane terminated with a radical of formula (1): ##STR1## wherein R.sup.1 is a hydrogen atom or monovalent hydrocarbon radical, each of R.sup.2 and R.sup.3 is a divalent hydrocarbon radical which may contain a NH bond or ether bond, each of R.sup.4 and R.sup.5 is a monovalent hydrocarbon radical which may contain an ether bond, and a is equal to 0 or 1, (ii) a photo-polymerization initiator, and (iii) a curing catalyst. The composition readily cures either upon exposure to UV radiation or upon contact with moisture and from the surface to the deep interior within a short time, yielding cured products having satisfactory physical properties.

Abstract: A photosensitive composition comprises a polysilane having a repeating unit represented by formula (1) and a compound which generates an acid upon exposure to light: ##STR1## wherein each of R.sup.1 and R.sup.2 independently represents a hydrogen atom, a substituted or nonsubstituted alkyl group having 1 to 18 carbon atoms, a substituted or nonsubstituted aryl group having 6 to 18 carbon atoms, or a substituted or nonsubstituted aralkyl group having 7 to 22 carbon atoms. This photosensitive composition exhibits a high-sensitivity, and can be formed into a polysilane film pattern having a high-resolution, when it is subjected to exposure to Deep UV light, an EB, an X-ray, or the like, hard baking, and development under appropriate conditions. When an aromatic ring substituted by a hydroxyl group, a substituted or nonsubstituted alkoxyl group, or a substituted or nonsubstituted siloxyl group is introduced in one of side chains R.sup.1 and R.sup.

Abstract: Vulcanizable organopolysiloxane compositions comprise a hydroxy-terminated organopolysiloxane, an acrylic or methacryllc functional alkoxy silane, a divalent tin compound, an alkoxy-.alpha.-silyl ester, a photopolymerization initiator, and a curing catalyst whereby the composition is cured by UV irradiation and/or by the action of moisture in air. The composition has good shelf stability and can yield rubber elastomers having good physical properties.

Abstract: A resist material comprising (a) a polymer having a monomer unit having a special functional group, a monomer unit having a phenolic hydroxyl group, and if necessary a third monomer unit, (b) a photoacid generator, and (c) a solvent can provide a resist film excellent in heat resistance and adhesiveness to a substrate when exposed to light with 300 nm or less such as deep UV light, KrF excimer laser light, etc., and is suitable for forming ultrafine patterns.

Abstract: Cationically crosslinkable polyorganosiloxane compositions, well suited for providing antiadhesive coatings on a wide variety of shaped substrates via the photochemical/electron beam crosslinking thereof, include a catalytically effective amount of an onium borate of an element of Groups 15 to 17 of the Periodic Table, the anionic borate moiety of which onium borate having the formula:[BX.sub.a R.sub.b ].sup.-in which a and b are integers ranging from 0 to 4 and a+b=4; the symbols X are each a halogen atom when a ranges up to 3 and an OH functional group when a ranges up to 2; and the symbols R, which may be identical or different, are each a phenyl radical substituted by at least one electron-withdrawing substituent or by at least two halogen atoms, or an aryl radical containing at least two aromatic ring members, or such aryl radical bearing at least one electron-withdrawing substituent.

Abstract: Organosilicon compounds with a siloxane portion and groups of the general formula --OR'OCH.dbd.CHR" (i) linked via an Si--O--C bond, wherein R' is a divalent hydrocarbon radical or a group --R.degree.--(OR.degree.).sub.n --, wherein R.degree. is alkylene and n is from 1 to 12, R" is H or alkyl are useful in radiation curable compositions, in which they are mixed with an initiator. The compositions are particularly useful in UV radiation curable relase coatings.

Abstract: Improved permanent soft denture liners are disclosed which consist substantially of an amount of one or more polysiloxanes selected from acryloxyalkyl and methacryloxyalkyl-terminated polydialkylsiloxanes in which the polysiloxane is crosslinked by a material selected from suitable heat, light or chemically activated initiators with or without crosslinking agents. The preferred embodiments are visible light activated and can be applied, fitted, cured and installed in one sitting.

Abstract: Disclosed is a coating composition comprising (A) 10 to 70 parts by weight of a poly(meth)acrylate of mono- or polypentaerythritol, (B) 5 to 50 parts by weight of a urethane poly(meth)acrylate having at least two unsaturated double bonds in the molecule, (C) 5 to 50 parts by weight of a poly[(meth)acryloyloxyalkyl] (iso)cyanurate, (D) 2 to 30 parts by weight of an ultraviolet absorber, (E) 0.1 to 10 parts by weight of a photopolymerization initiator, and (F) 0.1 to 5 parts by weight of a hindered amine type light stabilizer, provided that the combined amount of components (A) to (F) is 100 parts by weight. This coating composition can form a crosslinked and cured film having excellent abrasion resistance, surface smoothness, thermal resistance, chemical resistance, durability, weather resistance and adhesion to the substrate.

Abstract: A radiation-sensitive mixture useful as a negative-working photoresist composition comprising:(a) at least one novolak resin; and(b) a photoactive benzennelated acetic acid selected from formula (I): ##STR1## wherein X is either an oxygen, sulfur or --C--H.sub.2.

Abstract: A radiation-sensitive mixture useful as a negative-working photoresist composition comprising:(a) at least one novolak resin; and(b) a photoactive benzannelated acetic acid selected from formula (I): ##STR1## wherein X is either an oxygen, sulfur or --C--H.sub.2.

Abstract: A radiation-curable composition which comprises a compound that forms an acid under the action of high-energy radiation and an acid-hardening substance, wherein the compound forming an acid contains aromatically linked chlorine or bromine and has a pK.sub.a value below 12. The composition and the recording material prepared therefrom display increased sensitivity, improved resolution and a high etch resistance after development.

Abstract: Collagen-based compositions as adhesives and sealants for medical use and preparation thereof are described. Prior to polymerization, soluble or partially fibrillar collagen monomers in solution are chemically modified with an acylating agent, sulfonating agent or a combination of the foregoing. The collagen compositions prepared accordingly can be used as medical adhesives for bonding soft tissues or be made in to a sealant film for a variety of medical uses such as wound closures and tendon wraps for preventing adhesion formation following surgery.

Abstract: A dental adhesive comprising a (meth)acryloylaminoalkyl carboxylate of the formula ##STR1## in which R.sup.1 represents hydrogen or methyl;R.sup.2 represents methylene or ethylene; andR.sup.3 represents hydrogen, methyl, or ethyl;and at least one of an initiator, a non-toxic solvent, and a filler. The dental adhesive is useful to effect a strong adhesive bonding of dental materials to collagen-containing materials.

Abstract: Disclosed herein is a photosensitive resin composition containing:a photobase generator expressed in the following general formula (I): ##STR1## where R.sub.1, R.sub.2 and R.sub.3 are individually selected from the group consisting of hydrogen, halogen, alkyl groups, alkenyl groups, alkinyl groups, phenyl groups and alkoxy groups; anda base-catalytic reaction compound which is cured or decomposed under basic conditions.

Abstract: A radiation-sensitive mixture useful as a negative-working photoresist composition comprising:(a) at least one novolak resin; and(b) a photoactive benzannelated acetic acid selected from formula (I): ##STR1## wherein X is either an oxygen, sulfur or ##STR2##

Abstract: A positive-working, radiation-sensitive mixture and a process for the production of relief images.The radiation-sensitive mixture contains(a) a water-insoluble polymeric binder which is soluble or at least dispersible in aqueous alkaline solutions and(b) an organic compound whose solubility in an aqueous alkaline developer is increased by the action of an acid and which contains one or more acid-cleavable groups and in addition a further group which produces a strong acid on exposure to radiation, the polymeric binder (a) consisting a mixture of a phenolic polymer and a resin of the novolak type.The novel mixture is particularly suitable for the production of photoresists.

Abstract: An actinic ray curable composition for casting polymerization which comprises:(A) 40-90 parts by weight of an urethane poly(meth)acrylate having at least two (meth)acryloyl groups in one molecule,(B) 10-60 parts by weight of a radical polymerizable vinyl monomer having a boiling point of 100.degree. C. or higher, and(C) 0.005-5 parts by weight, per 100 parts by weight of total of the above components (A) and (B), of at least one member selected from methylphenyl glyoxylate, 2-hydroxy-2-methyl-1-phenylpropane-1-one, hydroxycyclohexyl phenyl ketone and a photo-initiator represented by the general formula (I): ##STR1## (wherein R.sub.1 and R.sub.2 which may be identical or different each represents a phenyl group, a methoxy group, an ethoxy group or an isopropyloxy group) and a casting polymerization molded product obtained by radical polymerization of said composition by irradiation with actinic ray.

Abstract: A dental adhesive composition containing as major components:(a) at least one isocyanate-group-containing urethane prepolymer,(b) at least one isocyanate-group-containing silane compound,(c) at least one radical-polymerizable unsaturated monomer, and(d) at least one initiator selected from the group consisting of redox polymerization initiators and photopolymerization initiatorsis disclosed.This composition is excellent in bonding properties when it is used to bond a living dental tissue with a restoring material such as a metal, organic polymer, and ceramic. Also, this adhesive composition does not require a troublesome pretreatment of the restoring material with an etching agent such as phosphoric acid when the restorating material is required to bond to the living tissue.

Abstract: Photochemical conversion of tachysterols to previtamins is conducted in the presence of a polymeric photosensitizer which has the appropriate chromophore groups, e.g. anthracene groups, attached to a medium or high molecular weight, substantially uncrosslinked polymer backbone. The polymeric photosensitizer is soluble in solvents normally used for conducting the photochemical reaction (diethyl ether, dioxane, THF, t.butyl methyl ether) but insoluble in lower alcohols and hydrocarbons, so that it may be readily and simply recovered from the product mixture by use of such non-solvents.

Abstract: A water-based photopolymerizable resin composition is disclosed which is suitable for the preparation of a relief printing plate by the photolithographic techniques. The inventive composition, which basically comprises a water-soluble polymer, e.g., poly(vinyl alcohol), a photopolymerizable monomer and a photopolymerization initiator, is characterized in that at least a part of the photopolymerizable monomer is N-tetrahydrofurfuryloxymethyl acrylamide or N-tetrahydrofurfuryloxymethyl methacrylamide. By virtue of this unique ingredient in the composition, the printing plate prepared from the inventive composition is imparted with improved fidelity of pattern reproduction and durability in printing as a consequence of increased hardness and pliability to be freed from the drawback of crack formation in printing even on a cylinder of small diameter under a cold and low-humidity condition.

Abstract: The ultraviolet-curable organoploysiloxane composition of the invention comprises (A) an organopolysiloxane having bonded to a silicon atom thereof a silyl-substituted ethyl group represented by the general formula[CH.sub.2 .dbd.CR.sup.1 --CO--O--(--CH.sub.2 --).sub.a --SiR.sup.2.sub.2 --](R.sup.2 .sub.3 Si--O--).sub.c R.sup.2.sub.2--c Si--C.sub.2 H.sub.4 --,in which R.sup.1 is a hydrogen atom or a methyl group, R.sup.2 is a monovalent hydrocarbon group, a is 1, 2 or 3 and c is 1 or 2, and (B) a photopolymerization initiator. The composition is rapidly cured by ultraviolet irradiation into a gel-like material having adhesiveness without the disadvantages of catalyst poisoning and undue volume shrinkage so that the composition is useful as a potting agent in electronic and electric components.

Abstract: Acryl functional silicone compounds are made by reacting an amine functional silicon compound with a di- or multi-functional acryl compound by a Michael-type addition reaction. These acryl functional silicone compounds are purer than others because no catalyst is used and no by-products are formed. These acryl functional silicone compounds can be used as adhesion promoters and as coating compositions which can be cured by ultraviolet radiation.

Abstract: An active energy beam-curable type resin composition, which comprises (A) a graft copolymer comprising a main chain composed mainly of structural units of monomers containing one (meth)acryloyl group and a dicyclopentenyl derivative group represented by the following general formula (I): ##STR1## wherein Z represents a five-membered ring given by ##STR2## and R.sub.1 and R.sub.

Abstract: An active energy ray-curable resin composition comprises (A) a graft copolymerized polymer comprising graft chains composed mainly of structural units derived from at least one monomer selected from the group consisting of (a) hydroxyl containing (meth)acrylic monomers, (b) amino or alkylamino containing (meth)acrylic monomers, (c) carboxyl containing (meth)acrylic or vinyl monomers, (d) N-vinylpyrrolidone, (e) vinylpyridine or its derivatives and (f) (meth)acrylic amide derivatives represented by the general formula (II) shown below: ##STR1## (wherein R.sub.1 is hydrogen or methyl group and R.sub.2 is hydrogen or an alkyl or acyl group having 1 to 4 carbon atoms which may have hydroxyl group added to trunk chains composed mainly of structural units compsiting at least one monomer selected from the group consisting of the monomer represented by the general formula (I) shown below: ##STR2## (wherein R.sub.1 to R.sub.

Abstract: Photosensitive compositions having surfactant vesicles therein are described. A method is also shown in which the photosensitive vesicle containing an enclosed substance is exposed to light to control the release of the substance.

Abstract: Substituted dibenzalketones useful as water-soluble photoinitiators have the formula: ##STR1## wherein R.sup.1 and R.sup.2 are 4, alkyl or, taken together, an aliphatic ring, n=0 or an integer and R.sup.3 and R.sup.4 either are both water-solubilizing groups (a) --X(CH.sub.2).sub.m N.sup.+ R.sup.5.sub.3, (b) --X(CH.sub.2).sub.m COO.sup.- M or (c) --X(CH.sub.2).sub.m SO.sup.-.sub.3 M.sub.5 or one is such a group and the other is (d) a group --NR.sup.5.sub.2, X is --CH.sub.2 --, --O-- or --S--, R.sup.5 is an alkyl group, M is H.sup.+ or a metal cation and m=0. Such a photoinitiator compound is associated with a polymerizable compound in an aqueous photopolymerizable composition.

Abstract: An ultraviolet-curing resin composition comprising an acrylic oligomer, tris(2-hydroxyethyl)isocyanurate triacrylate, a reactive diluent and a photopolymerization initiator, wherein the acrylic oligomer is a urethane obtained from diphenylmethane diisocyanate, a polytetramethylene glycol having a molecular weight of 650 to 1,300 and a monoacrylate having a hydroxy group, the amount of tris(2-hydroxyethyl)isocyanurate triacrylate is 1 to 100 parts by weight for 100 parts by weight of the urethane acrylate, and the reactive diluent is an acrylic monomer. A mixture of tris(2-hydroxyethyl)isocyanurate triacrylate and a terminal diacrylate having a cycloacetal group may be used in place of tris(2-hydroxyethyl)isocyanurate triacrylate. The compositions are useful as secondary cladding materials and buffer materials in optical fiber units.

Abstract: The inventive photosensitive resin composition has excellent heat resistance, adhesiveness to substrate surface and photosensitivity and suitable as a material for solder resist or plating resist on printed circuit boards. The resin composition comprises, in addition to a photopolymerization initiator and curing agent for epoxy resins, a resinous ingredient composed of a diallyl phthalate resin, a first esterified resin as a reaction product of a cresol novolac type epoxy resin and 0.2-0.8 mole per mole of epoxy groups of an ethylenically unsaturated carboxylic acid and a second esterified resin as a reaction product of a phenol and/or cresol novolac type epoxy resins and 0.9-1.1 moles per mole of epoxy resins of an ethylenically unsaturated carboxylic acid in a limited proportion.

Abstract: The curable organopolysiloxane composition of the invention is formulated with two kinds of crosslinking agents including an organosilane compound having 2 or 3 isopropenyloxy groups in a molecule and an organopolysiloxane having at least 2 mercapto groups in a molecule added to the base ingredient of a hydroxy-terminated diorganopolysiloxane together with a curing catalyst and a photosensitizer. The composition has two-way curability by the condensation reaction in the presence of atmospheric moisture between the silanolic hydroxy groups and the isopropenyloxy groups and by the ultraviolet-induced addition reaction between the isopropenyloxy groups and the mercapto groups to exhibit very reliable curing behavior giving a cured rubbery elastomer having excellent properties.

Abstract: This invention describes UV-stabilized step growth polymers such as polyesters, polyurethanes, polycarbonates, and combinations thereof. The UV-stabilizing moieties present in these polymers comprise chemically bound, pendant ortho-hydroxydiphenyl ketone based moieties. The polymers are especially useful as protective films and fibers which are highly resistant to ultraviolet (UV) and sunlight degradation.

Abstract: Room temperature-curable composition made from a silicone-modified polyether containing silyl end groups having hydrolyzable groups and ester provide a cured silicone product which does not have a tacky surface. Adding a sensitizer to the composition increases the reliability of the surface to be void of tack. These compositions have less dirt pickup.

Abstract: Disclosed are shelf life improvers for photoresist compositions containing organic halides as the photoinitiator that comprise an acetylene compound having the general formula RC.tbd.CR' where R and R' are each independently phenyl, hydrogen, benzyl, vinyl, lower alkyl substituted vinyl, phenyl substituted vinyl, lower alkoxy methyl and phenoxymethyl.