With A Heterocyclic Specified Rate-affecting Material Patents (Class 522/9)
  • Patent number: 11293892
    Abstract: There is provided a chloride selective membrane including an epoxide-based matrix reacted with a stoichiometric amount of an amino compound and an activator such that the epoxide-based matrix comprising a number of quaternary ammonium groups.
    Type: Grant
    Filed: May 17, 2016
    Date of Patent: April 5, 2022
    Assignee: Siemens Healthcare Diagnostics Inc.
    Inventors: Bo Peng, David Thompson
  • Publication number: 20150148440
    Abstract: A photo-curable ink composition including an acrylic polymer or copolymer, a mono-functional monomer, a multi-functional monomer, a photo-initiator and a pigment. Also disclosed herein is a method for forming a printed article and an inkjet printing system using said photo-curable ink composition.
    Type: Application
    Filed: May 22, 2013
    Publication date: May 28, 2015
    Applicant: Hewlett-Packard Industrial Printing LTD
    Inventors: Eytan Cohen, Malan Calitz, Alex Trubnikov, Alona Makarsky
  • Patent number: 8933144
    Abstract: Provide a curable composition for imprint, which is improved in the surface roughness of the cured film. A curable composition for imprint comprising a polymerizable compound (A), a polymerization initiator (B), and a non-polymerizable compound (C), the non-polymerizable compound (C) comprising at least one species of surfactant (C1) which contains 20% by mass or more of fluorine atom, and, at least one species of polymer (C2) which contains 3% by mass or more and less than 20% by mass of fluorine atom and/or 5% by mass or more and less than 40% by mass of silicon atom, and has a weight-average molecular weight (Mw) of 1,000 to 100,000.
    Type: Grant
    Filed: March 14, 2014
    Date of Patent: January 13, 2015
    Assignee: FUJIFILM Corporation
    Inventors: Yuichiro Enomoto, Kunihiko Kodama, Shinji Tarutani
  • Publication number: 20140303273
    Abstract: The present invention is related to a UV-curable printing ink comprising a binder system consisting of at least one reactive diluent and at least one polyurethane resin which is inert to said diluent, wherein said ink is solvent-less and said binder system has a viscosity in the range of 200-400 Poises, preferably 250-300 Poises, at 30° C. and a shear rate between 40.000 s?1 and 70.000 s?1, as measured with a Laray viscometer.
    Type: Application
    Filed: December 12, 2011
    Publication date: October 9, 2014
    Applicant: Siegwerk Druckfarben AG & Co. KGaA
    Inventors: Pierre-Antoine Noirot, Thierry Marsille
  • Patent number: 8728712
    Abstract: Provided is a polymerizable composition containing (A) a polymerization initiator, (B) a polymerizable compound, (C) at least either a tungsten compound or a metal boride, (D) a compound having a maximum absorption wavelength between 300 nm and 450 nm and assuming that the maximum absorbance between 300 nm and 450 nm is 1, having an absorbance of 0.3 or less at a wavelength of 550 nm, and (E) an alkali-soluble binder.
    Type: Grant
    Filed: January 29, 2013
    Date of Patent: May 20, 2014
    Assignee: FUJIFILM Corporation
    Inventors: Yoshiharu Yabuki, Kimi Ikeda
  • Publication number: 20130216818
    Abstract: The present invention relates to an anti-reflective coating composition that can be used to form at least two layers by a single coating process and is allowed to provide an anti-reflective coating film having more improved interface adhesion between the formed layers and scratch resistance, and an anti-reflective coating film manufactured using the same.
    Type: Application
    Filed: March 15, 2013
    Publication date: August 22, 2013
    Applicant: LG CHEM, LTD.
    Inventor: LG Chem, Ltd.
  • Patent number: 8507725
    Abstract: Compounds of the formula I or (I?), wherein R1 and R?1 for example are hydrogen, C3-C8cycloalkyl or C1-C12alkyl, R2 and R2? for example are hydrogen; unsubstituted C1-C20alkyl or substituted C1-C20alkyl; and R8 and R9 for example are hydrogen, C1-C12alkyl which optionally is substituted, or phenyl which optionally is substituted; exhibit an unexpectedly good performance in photopolymerization reactions.
    Type: Grant
    Filed: May 27, 2009
    Date of Patent: August 13, 2013
    Assignee: BASF SE
    Inventors: Akira Matsumoto, Hisatoshi Kura
  • Patent number: 8507726
    Abstract: Photoinitiators mixture comprising (i) at least one compound selected from the group consisting of alpha-hydroxy ketones, monoacylphosphine oxides, bisacylphosphine oxides, ketosulfones, benzil ketals, benzoin ether, phenylglyoxylates, borates and titanocenes; and (ii) at least one compound of the formula (I) or (I?) R1, R?1, R2 and R2? R?9 independently of each other for example are hydrogen or C1-C12alkyl R7, R8, R9, R?8 and R?9 independently of each other for example are hydrogen, C1-C12alkyl which optionally is substituted or phenyl which optionally is substituted, exhibit excellent photoinitiating properties.
    Type: Grant
    Filed: October 23, 2009
    Date of Patent: August 13, 2013
    Assignee: BASF SE
    Inventors: Katia Studer, Sébastien Villeneuve, Akira Matsumoto, Hisatoshi Kura, Jan Sültemeyer
  • Patent number: 8501834
    Abstract: A dual-curing, multi-component dental composition is described. The dental composition can include: (a) one or more photopolymerizable monomers selected from the group consisting of acrylates and methacrylates; (b) one or more photoinitiators, selected from the group consisting of alpha-diketones, benzoin alkyl ethers, thioxanthones, benzophenones, acylphosphinoxides, acetophenones, ketals, titanocenes, borates and sensitizing colorants; (c) one or more molecular weight regulators selected from the group consisting of compounds which can be converted with a radical of a monomer of component (a), wherein the conversion takes place by abstraction of an H-radical from the molecular weight regulator in the allyl position; (d) one or more polymerization inhibitors for increasing the storage stability of the composition; (e) one or more inorganic fillers; (f) one or more initiators for a chemical curing at ambient temperature, and if necessary one or more further additives.
    Type: Grant
    Filed: April 12, 2011
    Date of Patent: August 6, 2013
    Assignee: VOCO GmbH
    Inventors: Reinhard Maletz, Wigand Krumme, Manfred Thomas Plaumann
  • Patent number: 8492450
    Abstract: A siloxane resin composition is provided which is superior in pattern processability and yields a cured film with high hardness and excellent abrasion resistance by means of UV curing and thermal curing. The siloxane resin composition includes (A) polysiloxane having a carboxyl group and a radical polymerizable group, (B) a photo-radical polymerization initiator and (C) a compound having a radical polymerizable group and not having a Si—O—Si bond.
    Type: Grant
    Filed: November 16, 2009
    Date of Patent: July 23, 2013
    Assignee: Toray Industries, Inc.
    Inventors: Hitoshi Araki, Mitsuhito Suwa
  • Publication number: 20130143164
    Abstract: Provided is a polymerizable composition containing (A) a polymerization initiator, (B) a polymerizable compound, (C) at least either a tungsten compound or a metal boride, (D) a compound having a maximum absorption wavelength between 300 nm and 450 nm and assuming that the maximum absorbance between 300 nm and 450 nm is 1, having an absorbance of 0.3 or less at a wavelength of 550 nm, and (E) an alkali-soluble binder.
    Type: Application
    Filed: January 29, 2013
    Publication date: June 6, 2013
    Applicant: FUJIFILM CORPORATION
    Inventor: FUJIFILM Corporation
  • Publication number: 20130052431
    Abstract: Provided is a curable composition for imprints capable of ensuring good patternability after repetitive transfer of pattern, and less causative of defects. The curable composition for imprints comprising a polymerizable compound (A), a photo-polymerization initiator (B) and a non-polymerizable compound (C); the non-polymerizable compound (C) dissolving into the curable composition for imprints in an exothermic manner.
    Type: Application
    Filed: August 24, 2012
    Publication date: February 28, 2013
    Applicant: FUJIFILM CORPORATION
    Inventors: Yuichiro ENOMOTO, Kunihiko KODAMA, Shinji TARUTANI, Hirotaka KITAGAWA, Tadashi OOMATSU
  • Patent number: 8338499
    Abstract: A radiation curable composition comprising a curable compound, a photo-initiator and a co-initiator characterized in that said co-initiator is represented by Formula I, wherein MA is the residue of a mono- or oligofunctional Michael acceptor; L is a divalent linking group positioning the two tertiary amines in a 1-3 to 1-10 position, with the proviso that both amines are aliphatic; R1, R2 and R3 independently represent an optionally substituted alkyl group, an optionally substituted alkenyl group , an optionally substituted alkynyl group or an optionally substituted (hetero) alkaryl group; any two of R1, R2 and R3 may represent the necessary atoms to form a ring; any two of R1, R2 and R3 may represent the necessary atoms to form a ring with any of the atoms of the linking group L; n is an integer ranging from 1 to 6.
    Type: Grant
    Filed: December 17, 2007
    Date of Patent: December 25, 2012
    Assignee: Agfa Graphics NV
    Inventors: Johan Loccufier, Roland Claes, Jaymes Van Luppen
  • Publication number: 20120195065
    Abstract: The present invention provides a light guide plate capable of emitting light from a light-emitting surface at a higher luminance, a surface light source device and a transmission-type image display device having the light guide plate, a light guide plate manufacturing method, and a UV curable inkjet ink for the light guide plate. A light guide plate includes: a transparent resin sheet having a light-emitting surface that emits light incident from an end face and having a rear face on the opposite side of the light-emitting surface; and a plurality of reflective dots provided on the rear face of the transparent resin sheet and formed by photo-curing of dot-shaped ink. The ink contains a pigment, a photopolymerizable component, and a photopolymerization initiator. In addition, the rear face is a liquid repellent-treated surface.
    Type: Application
    Filed: February 2, 2012
    Publication date: August 2, 2012
    Applicants: SEIREN CO., LTD., SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Kentarou HYAKUTA, Hideyuki TERASAWA
  • Patent number: 8217095
    Abstract: The object of the present invention is to provide an active energy ray-curable ink-jet printing ink, including: a coloring agent; a compound having an ethylenic double bond; and a photo-polymerization initiator, wherein the photo-polymerization initiator includes a compound represented by general formula (1): (wherein A represents any one of —O—, —CH2—, —CH(CH3)—, and —C(CH3)2—; and each of R1 and R2 independently represents a hydrogen atom, a methyl group, or a trimethylsilyl group), and an ?-aminoketone-based compound and/or an acyl phosphine oxide-based compound, and 40% by mass or more of the compound represented by general formula (1) is included with respect to the total photo-polymerization initiator.
    Type: Grant
    Filed: October 28, 2005
    Date of Patent: July 10, 2012
    Assignee: Dainippon Ink and Chemicals, Inc.
    Inventors: Hisao Yamaguchi, Yutaka Yamada, Naohito Saito, Osamu Oshima
  • Publication number: 20120162308
    Abstract: An ink composition is provided that includes (Component A) at least one compound selected from the group consisting of bis(2,4,6-trimethylbenzoyl)phenylphosphine oxide and 2,4,6-trimethylbenzoyldiphenylphosphine oxide, (Component B) at least one compound selected from the group consisting of 2-methyl-1-(4-methylthiophenyl)-2-morpholinopropan-1-one, 2-(dimethylamino)-2-[(4-methylphenyl)methyl]-1-[4-(4-morpholinyl)phenyl]-1-butanone, and 2-benzyl-2-dimethylamino-1-(4-morpholinophenyl)-1-butanone, (Component C) a thioxanthone compound, (Component D) a polymerization inhibitor, and (Component E) a polymerizable compound, Component C having a content of 0.01 to 5 wt % relative to the total weight of the ink composition, Component D having a content of 0.01 to 5 wt % relative to the total weight of the ink composition, the sum of the content of Component A and the content of Component B being 6.0 to 9.
    Type: Application
    Filed: December 28, 2011
    Publication date: June 28, 2012
    Applicant: FUJIFILM CORPORATION
    Inventors: Kyohei MOCHIZUKI, Yuusuke FUJII
  • Patent number: 7985785
    Abstract: An ink composition of the present invention is disclosed, which contains (i) a sensitizing dye represented by the following Formula (I); (ii) at least one polymerization initiator selected from the group consisting of ?-aminoketones and acyl phosphine oxides; and (iii) an ethylenically unsaturated bond-containing polymerizable compound. In Formula (I), X represents O, S or NR; n represents an integer of 0 or 1; R represents a hydrogen atom, an alkyl group or an acyl group; R1 to R8 each independently represent a hydrogen atom or a monovalent substituent; R1 and R2, R2 and R3, and R3 and R4 may be connected to each other to form a ring; and R5 or R6 may be connected to R7 or R8 to form an aliphatic ring but not to form an aromatic ring.
    Type: Grant
    Filed: January 14, 2008
    Date of Patent: July 26, 2011
    Assignee: FUJIFILM Corporation
    Inventors: Tokihiko Matsumura, Ippei Nakamura
  • Publication number: 20110134554
    Abstract: Photoinitiator mixture comprising at least one alpha-amino ketone compound; and at least one compound of the Formula (I) or (I?) wherein R1 and R?1 for example are hydrogen, C3-C8cycloalkyl or C1-C12alkyl R2 and R2? for example are hydrogen; unsubstituted C1-C20alkyl or substituted C1-C20alkyI; and R8 and R9 for example are are hydrogen, C1-C12alkyl which optionally is substituted, or phenyl which optionally is substituted; exhibit an unexpectedly good performance in photopolymerization reactions.
    Type: Application
    Filed: May 27, 2009
    Publication date: June 9, 2011
    Applicant: BASF SE
    Inventors: Akira Matsumoto, Hisatoshi Kura, Katia Studer, Sebastien Villeneuve
  • Patent number: 7932300
    Abstract: An energy beam curable type ink jet printing ink comprising (A) a colorant, (B) a compound having at least one ethylenically unsaturated bond which can be polymerized by the application of an energy beam and (C) a photopolymerization initiator, wherein the component (B) is a compound having at least one methacryloyl group as a sole polymerizable unsaturated group and the component (C) is a 2-alkyl-2-amino-2-benzyl-1-(4-morpholinophenyl)ethan-1-one. This ink has low viscosity, high sensitivity and sufficiently high film strength after curing.
    Type: Grant
    Filed: April 24, 2007
    Date of Patent: April 26, 2011
    Assignee: JSR Corporation
    Inventors: Hidenori Naruse, Shingo Naruse, Shingo Tanaka
  • Publication number: 20100015352
    Abstract: An ink-jet ink composition containing the following components of (a), (b), and (c), and having a viscosity at 25° C. in the range of from 5 mPa·s to 100 mPa·s, (a) a polymerizable compound, (b) a photopolymerization initiator, and (c) a sensitizer represented by the following formula (i): in the Formula (i), X represents O, S or NR; n represents an integer of 0 or 1; R represents a hydrogen atom, an alkyl group or an acyl group; each of R1, R2, R3, R4, R5, R6, R7 and R8 independently represents a hydrogen atom or a monovalent substituent, provided that any neighboring two of R1, R2, R3 and R4 may be bonded to each other to form a ring, and R5 and R7 or R8, or R6 and R7 or R8, may be bonded to each other to form an aliphatic ring but do not form an aromatic ring.
    Type: Application
    Filed: July 3, 2009
    Publication date: January 21, 2010
    Applicant: FUJIFILM CORPORATION
    Inventor: Tokihiko MATSUMURA
  • Patent number: 7615323
    Abstract: Lithographic printing plate precursor comprising (a) a lithographic substrate with a hydrophilic surface and (b) a radiation-sensitive coating on the hydrophilic surface comprising (i) one or more types of monomers and/or oligomers and/or polymers, each comprising at least one ethylenically unsaturated group accessible to a free radical polymerization, (ii) at least one sensitizer, and at least one coinitiator capable of forming free radicals together with the sensitizer (ii); characterized in that the at least one sensitizer is an oligomeric or polymeric compound comprising the following structural unit (Formula (I)), wherein ?1 is an aromatic or heteroaromatic unit or a combination of the two so that a conjugated n-system is present between the two groups Z in structure (I), each Z independently represents a heteroatom, each R1 and R2 is independently selected from a halogen atom, an alkyl, aryl, alkylaryl or aralkyl group, a group —NR3R4 and a group —OR5, each R3, R4 and R5 is independently selected from a
    Type: Grant
    Filed: November 11, 2005
    Date of Patent: November 10, 2009
    Assignee: Kodak Graphic Communications, GmbH
    Inventors: Bernd Strehmel, Harald Baumann, Udo Dwars, Detlef Pietsch, Axel Draber, Michael Mursal
  • Patent number: 7541131
    Abstract: The invention provides a resist composition for use in the production process of a semiconductor such as IC, in the production of a circuit substrate of liquid crystal, thermal head and the like or in other photofabrication processes, a compound for use in the resist composition and a pattern forming method using the resist composition, which are a resist composition comprising (A) a sulfonium salt represented by the following formula (I); and a pattern forming method using the resist composition: wherein R1 represents an alkyl group or an aryl group, R2 to R9 each independently represents a hydrogen atom or a substituent and may combine with each other to form a ring, Z represents an electron-withdrawing divalent linking group, Xn? represents an n-valent anion, n represents an integer of 1 to 3, and m represents the number of anions necessary for neutralizing the electric charge.
    Type: Grant
    Filed: February 17, 2006
    Date of Patent: June 2, 2009
    Assignee: FUJIFILM Corporation
    Inventor: Yasutomo Kawanishi
  • Publication number: 20090000508
    Abstract: Disclosed herein are non-aqueous, radiation curable inkjet inks exhibiting stability at high shear rate (good rheological stability), stability at high temperatures, and/or stability in inkjet print heads, especially impulse inkjet print heads. The inks have a wide process window at a variety of print speeds using an impulse inkjet print head.
    Type: Application
    Filed: July 14, 2005
    Publication date: January 1, 2009
    Inventors: Sara Edison, Matthew M. Ellison, John Fech, Xin Huo, Sudhaker Madhusoodhanan, Devdatt S. Nagvekar, Paul E. Snowwhite, Stephen Sung, Kim Lynn Webb
  • Patent number: 7402639
    Abstract: The present invention relates to 1-alkoxy-polyalkyl-peridine derivatives containing a structural element of formula (I) G1, G2, G3, G4 are independently C1-C6alkyl with the proviso that at least one is not methyl or G1 and G2 or G3 and G4, or G1 and G2 and G3 and G4 together form a C5-C12cycloalkyl group; G5, G6 independently are H, C1-C18alkyl, phenyl, naphthyl or a group COOC1-C18alkyl and X represents a group such that the free radical X• derived from X is capable of initiating polymerization of ethylenically unsaturated monomers, with the proviso that compounds A1 and A2 are excluded Further subjects of the invention are a polymerizable composition comprising a) at least one ethylenically unsaturated monomer and b) a 1-alkoxy-polyalkyl-piperidine derivative, a process for polymerizing ethylenically unsaturated monomers, and the use of 1-alkoxy-polyalkyl-piperidine derivatives for controlled polymerization.
    Type: Grant
    Filed: January 14, 2005
    Date of Patent: July 22, 2008
    Assignee: Ciba Specialty Chemicals Corp.
    Inventors: Andreas Kramer, Peter Nesvadba
  • Patent number: 7300962
    Abstract: In one aspect, the present invention provides hydrogels comprising polymer molecules and bridging molecules, wherein substantially all the polymer molecules are cross-linked by hydrogen bonds between polymer molecules and bridging molecules, wherein each bridging molecule is linked to at least two polymer molecules, and wherein there are substantially no covalent linkages between the polymer molecules. In some embodiments, the polymer molecules are poly(vinyl alcohol) (PVA) and the bridging molecules are amino acids. Some embodiments of the invention provide devices comprising hydrogels, and pharmaceutical compositions comprising biologically active molecules within hydrogels. Another aspect provides methods for forming hydrogels of the invention.
    Type: Grant
    Filed: August 9, 2005
    Date of Patent: November 27, 2007
    Assignee: University of Washington
    Inventors: Buddy D. Ratner, Prabha D. Nair, Maximiliane Silvia Boeckl, Elizabeth Reeves Leber
  • Patent number: 7276543
    Abstract: The present invention relates to a coated optical fiber comprising a glass optical fiber with a single protective coating or a combination of an inner and an outer primary coating applied thereon and optionally with a colored coating subsequently applied thereon wherein the inner primary coating or at least a portion of the single coating is prepared from a radiation curable composition which when cured as a capillary film with a 100W medium pressure mercury lamp has a percentage reacted acrylate unsaturation of at least about 54% after exposure to a dose of about 4.4 mJ/cm2 or wherein the outer primary coating is prepared from a radiation curable composition which when cured as a capillary film with a 100 W medium pressure mercury lamp has a percentage reacted acrylate unsaturation of at least about 56% after exposure to a dose of about 4.4 mJ/cm2. The invention further relates to a radiation curable composition having a high cure speed.
    Type: Grant
    Filed: October 9, 2001
    Date of Patent: October 2, 2007
    Assignee: DSM IP Assets B.V.
    Inventors: Timothy E. Bishop, Paul E. Snowwhite, Tyson Norlin, James J. Schouten, John Southwell, Anthony Toussaint
  • Patent number: 7160966
    Abstract: The present invention relates to selected 1-alkoxy-2,2 diethyl-6,6 dimethyl piperidine and 1-alkoxy-2,6 diethyl-2,3,6 trimethyl piperidine derivatives which are substituted in the 4 position by an oxygen or nitrogen atom; a polymerizable composition comprising a) at least one ethylenically unsaturated monomer and b) said piperidine derivatives. Further aspects of the present invention are a process for polymerizing ethylenically unsaturated monomers, and the use of 1-alkoxy-2,2 diethyl-6,6 dimethyl piperidine and 1-alkoxy-2,6 diethyl-2,6 dimethyl piperidine derivatives which are substituted in the 4 position by an oxygen or nitrogen atom for controlled polymerization. The intermediate N-oxyl derivatives, a composition of the N-oxyl derivatives with ethylenically unsaturated monomers and a free radical initiator, as well as a process for polymerization are also subjects of the present invention.
    Type: Grant
    Filed: February 1, 2005
    Date of Patent: January 9, 2007
    Assignee: Ciba Specialty Chemicals Corp.
    Inventors: Peter Nesvadba, Marie-Odile Zink, Andreas Kramer
  • Patent number: 6949590
    Abstract: In one aspect, the present invention provides hydrogels comprising polymer molecules and bridging molecules, wherein substantially all the polymer molecules are cross-linked by hydrogen bonds between polymer molecules and bridging molecules, wherein each bridging molecule is linked to at least two polymer molecules, and wherein there are substantially no covalent linkages between the polymer molecules. In some embodiments, the polymer molecules are poly(vinyl alcohol) (PVA) and the bridging molecules are amino acids. Some embodiments of the invention provide devices comprising hydrogels, and pharmaceutical compositions comprising biologically active molecules within hydrogels. Another aspect provides methods for forming hydrogels of the invention.
    Type: Grant
    Filed: January 9, 2003
    Date of Patent: September 27, 2005
    Assignee: University of Washington
    Inventors: Buddy D. Ratner, Prabha D. Nair, Maximiliane Silvia Boeckl, Elizabeth Reeves Leber
  • Patent number: 6896937
    Abstract: Radiation-curable ink compositions and methods of printing including the compositions are disclosed. In some embodiments, a radiation-curable hot melt ink composition includes a colorant, a polymerizable monomer, and a photoinitiating system. The photoinitiating system can include 0.5-1.5% by weight of an aromatic ketone photoinitiator, 2-10% by weight of an amine synergist, 3-8% by weight of an alpha-cleavage type photoinitiator, and 0.5-1.5% by weight of a photosensitizer.
    Type: Grant
    Filed: November 14, 2003
    Date of Patent: May 24, 2005
    Assignee: Markem Corporation
    Inventor: Richard C. Woudenberg
  • Patent number: 6797739
    Abstract: The preset invention relates to a photosensitive composition, and provides a triazine-based compound comprising new functionalized alkylthio groups of which long term storage characteristics at room temperature as well as photochemical activity as a photopolymerization initiator are superior.
    Type: Grant
    Filed: September 27, 2002
    Date of Patent: September 28, 2004
    Assignee: LG Chemical Co., Ltd.
    Inventors: Sung-Hyun Kim, Chul-Woo Lee, Jin-Seuk Kim, Jae-Hwan Lee, Dong-Chang Choi, Hyuk-Jin Cha
  • Patent number: 6756166
    Abstract: Disclosed is a photosensitive resin composition which can be developed using a dilute aqueous alkaline solution after ultraviolet ray exposure, is excellent in pot life, capable of preventing deposits from being generated in a cured coated film, capable of widening heat control tolerance, and is excellent in sensitivity, in heat resistance, in chemical resistance and in electric insulating properties, thereby rendering the composition suitable for use as a solder resist for producing a printed wiring board. This photosensitive resin composition comprises (A) an active energy ray-curable resin having at least two ethylenic unsaturated linkages per molecule thereof, (B) at least one kind material selected from acid salts of N-substituted melamine compound and acid salts of guanamine compound, (C) a photopolymerization initiator, (D) a diluent, and (E) a thermosetting compound. There is also disclosed a printed wiring board where this photosensitive resin composition is employed.
    Type: Grant
    Filed: September 23, 2002
    Date of Patent: June 29, 2004
    Assignee: Tamurakaken Corporation
    Inventors: Takao Ono, Ichiro Miura
  • Patent number: 6562464
    Abstract: The use of phenylglyoxalic esters of the formula I in which the two radicals R1 and A are as defined in the description as photoinitiators in powder coating materials for exterior applications. The compounds of the formula I show little propensity toward yellowing.
    Type: Grant
    Filed: September 21, 2001
    Date of Patent: May 13, 2003
    Assignee: BASF Aktiengesellschaft
    Inventors: Reinhold Schwalm, Rainer Königer
  • Patent number: 6559223
    Abstract: Forming graft copolymers in water using labeling of water soluble polymers with photoinitiators. Water soluble polymers can form environmentally responsive hydrophobically stimulated cages. The cages, which contain initiating radicals after irradiation, may be “opened” or “closed” by changes in environmental conditions. When the cage is closed, the radicals are trapped inside and thus do not cause substantial polymerization of water soluble monomers in the same solution. When the cage is closed, the radicals escape and cause polymerization. In another variation, hydrogels and graft copolymers are formed by covalently linking phototoinitiator groups to water soluble polymers that do not form cages. Thus, monomers may form grafts to the polymer, allowing formation of physical hydrogels.
    Type: Grant
    Filed: February 22, 2001
    Date of Patent: May 6, 2003
    Assignee: Polytechnic University
    Inventors: Mark M. Green, Sung Yun Yang
  • Patent number: 6495298
    Abstract: This invention relates to a photopolymerizable resin composition containing resin component (A) composed of a resin and/or a resin-forming ingredient and a photopolymerization initiator (B) wherein the component (A) comprises an addition-polymerizable compound (A1) having at least two ethylenically unsaturated groups and the photopolymerization initiator (B) comprises a diaminobenzophenone compound (B1), an N-phenylglycine compound (B2), and at least one kind of compound selected from a group of a 3,3′,4,4′-tetra(alkylperoxycarbonyl)benzophenone (B3), 2-methyl-1-[4-(thiomethyl)phenyl]- 2-morpholinopropan-1-one (B4), and a 1,3,5-triazine derivative (B5) containing at least one trihalomethyl group as substituent.
    Type: Grant
    Filed: November 29, 2000
    Date of Patent: December 17, 2002
    Assignee: Nippon Steel Chemical Co., Ltd.
    Inventors: Koichi Fujishiro, Manabu Higashi
  • Patent number: 6239190
    Abstract: There is disclosed a method for effecting a reaction by irradiating a substance which absorbs the radiant energy until the reaction is complete and the absorbency of the material changes so as to reduce or cease absorption of further radiant energy.
    Type: Grant
    Filed: July 28, 1997
    Date of Patent: May 29, 2001
    Assignee: Tissuemed Limited
    Inventors: Francis Wilkinson, David John Mandley
  • Patent number: 6228560
    Abstract: A photosensitive resin composition comprising (A) a binder polymer having carboxyl groups, (B) a photopolymerizable compound having at least one polymerizable ethylenically unsaturated group in the molecule, and (C) a photoinitiator can provide a film excellent in mechanical strength, chemical resistance, flexibility, and suitable for producing a photosensitive element.
    Type: Grant
    Filed: December 15, 1999
    Date of Patent: May 8, 2001
    Assignee: Hitachi Chemical Company, Ltd.
    Inventors: Tatsuya Ichikawa, Tatsuo Chiba
  • Patent number: 6060216
    Abstract: A photosensitive resin composition comprising (A) a binder polymer having carboxyl groups, (B) a photopolymerizable compound having at least one polymerizable ethylenically unsaturated group in the molecule, and (C) a photoinitiator can provide a film excellent in mechanical strength, chemical resistance, flexibility, and suitable for producing a photosensitive element.
    Type: Grant
    Filed: January 13, 1998
    Date of Patent: May 9, 2000
    Assignee: Hitachi Chemical Co., Ltd.
    Inventors: Tatsuya Ichikawa, Tatsuo Chiba
  • Patent number: 5962547
    Abstract: Radiation- or thermally-initiated cationically-curable styrene oxides of the structure ##STR1## are suitable for use in cationically curable adhesive and coating compositions.
    Type: Grant
    Filed: May 14, 1998
    Date of Patent: October 5, 1999
    Inventors: Nikola A. Nikolic, Rose Ann Schultz
  • Patent number: 5770345
    Abstract: The sensitivity of a photoresist to actinic light is improved by the addition of certain dyes. The photoresist includes a polymer matrix, a photosensitive acid generator and at least one compound selected from the group consisting of dyes containing at least one heterosulphur atom such as 2,2.sup.1,5.sup.1,2"-terthiophene and its derivatives; thianthrene and its derivatives, and 4,6-diphenylthieno(3,4-d)-1,3-dioxol-2-one-5,5-dioxide; phenylsulfone and its derivatives; and 4,5-diphenyl-1,3-dioxol-2-one; 3,4-bis(acetoxymethyl)furan; chelidonic acid and its derivatives; and 5,7,12,14-pentacenetetrone. Resist images on a substrate are formed from the compositions.
    Type: Grant
    Filed: July 16, 1996
    Date of Patent: June 23, 1998
    Assignee: International Business Machines Corporation
    Inventors: Edward Darko Babich, Karen Elizabeth Petrillo, John Patrick Simons, David Earle Seeger
  • Patent number: 5753412
    Abstract: The sensitivity of a photoresist to actinic light is improved by the addition of certain dyes. The photoresist includes a polymer matrix, a photosensitive acid generator and at least one compound selected from the group consisting of dyes containing at least one heterosulphur atom such as 2,2.sup.1,5.sup.1,2"-terthiophene and its derivatives; thianthrene and its derivatives, and 4,6-diphenylthieno(3,4-d)-1,3-dioxol-2-one-5,5-dioxide; phenylsulfone and its derivatives; and 4,5-diphenyl-l,3-dioxol-2-one; 3,4-bis(acetoxymethyl)furan; chelidonic acid and its derivatives; and 5,7,12,14-pentacenetetrone. Resist images on a substrate are formed from the compositions.
    Type: Grant
    Filed: June 5, 1996
    Date of Patent: May 19, 1998
    Assignee: International Business Machines Corporation
    Inventors: Edward Darko Babich, Karen Elizabeth Petrillo, John Patrick Simons, David Earle Seeger
  • Patent number: 5719202
    Abstract: Polymerizable compounds based on N-acylamido-piperazines are provided. Such compounds have the formula: ##STR1## wherein: R.sup.1, R.sup.2, and R.sup.3 are each independently selected from the group consisting of hydrogen and lower alkyl,B is a linking group selected from the group consisting of carbonyl, sulfonyl, amide, and carboxyl;n is one or zero;R.sup.4 is a radical selected from the group consisting of a higher aliphatic group (i.e. at least four carbon atoms, preferably from about 6 to about 50 carbon atoms), a substituted higher aliphatic group, an alicyclic group, a heterocyclic group a non-benzenoid aromatic group, and a substituted aromatic group. These compounds can be incorporated into a polymerizable composition. The compounds is preferably present in said composition in a major amount on a mole percent basis of th polymerizable monomers. These polymerizable compositions are useful as coatings, particularly in formulations containing a photoinitiator susceptible to ultra-violet radiation.
    Type: Grant
    Filed: February 27, 1996
    Date of Patent: February 17, 1998
    Assignee: Henkel Corporation
    Inventor: Paul E. Share
  • Patent number: 5686220
    Abstract: A photo-curing composition including an image forming material, an ethylenically unsaturated monomer which is curable by polymerization thereof, a polymerization initiator which initiates the polymerization of the monomer, and two or more photosensitizers each of which absorbs a light and thereby causes the polymerization initiator to initiate the polymerization of the monomer, the photosensitizers having different maximum absorption wavelengths, respectively. A photosensitive capsule including a core material including the photo-curing composition, and a shell material within which the core material is encapsulated.
    Type: Grant
    Filed: January 30, 1996
    Date of Patent: November 11, 1997
    Assignee: Brother Kogyo Kabushiki Kaisha
    Inventor: Masashi Tsuda
  • Patent number: 5599652
    Abstract: Peroxycarboxylic ester photoinitiators derived from aromatic nitrogen containing heterocyclic carboxylic acids are described. The heterocyclic aromatic ring may contain additional nitrogen atoms, be fused with another aromatic ring system, be substituted with an additional peroxycarboxylic ester group and/or be substituted with an electron group having a Hammett sigma value greater than 0.1. The peroxycarboxylic ester photoinitiators have been found to be useful in photopolymerizable compositions and photosensitive elements.
    Type: Grant
    Filed: March 22, 1996
    Date of Patent: February 4, 1997
    Assignee: Imation Corp.
    Inventor: Jeanne E. Haubrich
  • Patent number: 5593812
    Abstract: The sensitivity of a photoresist to actinic light is improved by the addition of certain dyes. The photoresist includes a polymer matrix, a photosensitive acid generator and at least one compound selected from the group consisting of dyes containing at least one heterosulphur atom such as 2,2.sup.1,5.sup.1,2"-terthiophene and its derivatives; thianthrene and its derivatives, and 4,6-diphenylthieno(3,4-d)-1,3-dioxol-2-one-5,5-dioxide; phenylsulfone and its derivatives; and 4,5-diphenyl-1,3-dioxol-2-one; 3,4-bis(acetoxymethyl)furan; chelidonic acid and its derivatives; and 5,7,12,14-pentacenetetrone. Resist images on a substrate are formed from the compositions.
    Type: Grant
    Filed: February 17, 1995
    Date of Patent: January 14, 1997
    Assignee: International Business Machines Corporation
    Inventors: Edward D. Babich, Karen E. Petrillo, John P. Simons, David E. Seeger
  • Patent number: 5527921
    Abstract: Peroxycarboxylic ester photoinitiators derived from aromatic nitrogen containing heterocyclic carboxylic acids are described. The heterocyclic aromatic ring may contain additional nitrogen atoms, be fused with another aromatic ring system, be substituted with an additional peroxycarboxylic ester group and/or be substituted with an electron group having a Hammett sigma value greater than 0.1. The peroxycarboxylic ester photoinitiators have been found to be useful in photopolymerizable compositions and photosensitive elements.
    Type: Grant
    Filed: March 21, 1995
    Date of Patent: June 18, 1996
    Assignee: Minnesota Mining and Manufacturing Company
    Inventor: Jeanne E. Haubrich
  • Patent number: 5407783
    Abstract: Photoimageable compositions, photoimageable resist compositions, and photoimageable resist elements that afford enhanced, storage stable printout images are disclosed which include a substituted 1,2-dibromoethane and a leuco dye.
    Type: Grant
    Filed: March 9, 1994
    Date of Patent: April 18, 1995
    Assignee: E. I. Du Pont de Nemours and Company
    Inventor: Thomas C. Caruso
  • Patent number: 5284735
    Abstract: A photopolymerizable composition having high sensitivity and broad development latitude comprises a radical-polymerizable compound having two or more ethylenically unsaturated double bonds in the molecule, a photoinitiator, an organic high-molecular compound, and a substituted ethylene compound.
    Type: Grant
    Filed: February 2, 1993
    Date of Patent: February 8, 1994
    Assignee: Okamoto Chemical Industry Co., Ltd.
    Inventor: Hiroaki Okamoto
  • Patent number: 5202221
    Abstract: The present invention relates to a light-sensitive composition comprising (a) a photo-crosslinkable polymer having a maleimido group at a side chain and (b) a sensitizer such as the following compounds: ##STR1## The present invention provides a light-sensitive composition having very high sensitivity; providing excellent images during only a short exposure time; and being sensitive to light of long wave length.
    Type: Grant
    Filed: November 9, 1989
    Date of Patent: April 13, 1993
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Masanori Imai, Noriaki Watanabe, Kouichi Kawamura
  • Patent number: 5064747
    Abstract: A light-sensitive composition comprises a photo-crosslinkable polymer having a photo-dimerizable unsaturated bond and a sensitizer represented by the following general formula (I): ##STR1## wherein R.sub.1 and R.sub.2 each independently represents a hydrogen atom, a substituted or unsubstituted alkyl group, a substituted or unsubstituted aryl group, a substituted or unsubstituted heterocyclic group or a substituted or unsubstituted allyl group, provided that R.sub.1 and R.sub.2 may form a ring together with the carbon atoms to which they are attached; n represents 0, 1 or 2; and G.sub.1 and G.sub.2 each independently represents a hydrogen atom, a cyano group, a substituted or unsubstituted alkoxycarbonyl group, a substituted or unsubstituted aryloxycarbonyl group, a substituted or unsubstituted acyl group, a substituted or unsubstituted arylcarbonyl group, an alkylthio group, an arylthio group, an alkylsulfonyl group, an arylsulfonyl group or a fluoroalkylsulfonyl group, provided that G.sub.1 and G.sub.
    Type: Grant
    Filed: July 19, 1990
    Date of Patent: November 12, 1991
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Masanori Imai, Noriaki Watanabe, Kouichi Kawamura
  • Patent number: 5057398
    Abstract: A photopolymerizable composition that contains a polymeric binder, a polymerizable compound and photoinitiator combination comprising an N-heterocyclic compound and a halogen compound corresponding to one of the folowing formulas I and II ##STR1## in which X.sup.1 stands for chlorine or bromine,X.sup.2 and X.sup.3 are identical or different and denote X.sup.1, hydrogen or alkyl groups,Y and Z are identical or different and denote X.sup.1, hydrogen, CN or (A).sub.n --(B).sub.n --D,A is a phenylene group,n is 0 or 1,B is CO or SO.sub.2,D is R, OR, NHR, NH.sub.2, NR.sub.2 or CX.sup.1 X.sup.2 X.sup.3,R is an alkyl, cycloalkyl, aryl or heteroyl radical,W is a five or six-membered heterocyclic ring having from 1 to 3 heteroatoms, which optionally carries substituents and optionally a fused aromatic ring, andm is 1 or 2,is distinguished by an improved light sensitivity.
    Type: Grant
    Filed: April 26, 1990
    Date of Patent: October 15, 1991
    Assignee: Hoechst Aktiengesellschaft
    Inventors: Hans-Dieter Frommeld, Hansjoerg Vollmann