Removal Of Residual Monomer Patents (Class 522/903)
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Patent number: 8389595Abstract: The invention relates to the production of superabsorbent polymers comprising polymerizing a monomer solution on a continuous belt reactor, wherein the consistency of the formed polymer gel at the end of the continuous belt reactor is controlled by adjusting the intensity of energy-rich radiation.Type: GrantFiled: February 21, 2008Date of Patent: March 5, 2013Assignee: BASF SEInventors: Matthias Weismantel, Rüdiger Funk, Sylvia Bertha, Leigh R. Blair, Kevin D. Heitzhaus, Bruce Storey
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Patent number: 7119128Abstract: A process for preparing pressure sensitive adhesives based on acrylate hotmelt, in which a monomer mixture including at least the following monomers (a) 70 to 100% by weight of compounds from the group of (meth)acrylic acid and the derivatives thereof corresponding to the following general formula is free-radically polymerized in solution wherein I. the polymerization is initiated using at least one dissociating photoinitiator and by irradiation with ultraviolet light, the photoinitiator being added to the monomer mixture before the beginning of the polymerization and/or to the reaction mixture in the course of the polymerization, II. the polyacrylate is freed from the solvent, III. the polyacrylate is processed further in the melt.Type: GrantFiled: October 26, 2001Date of Patent: October 10, 2006Assignee: tesa AktiengesellschaftInventors: Marc Husemann, Stephan Zöllner
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Patent number: 7115673Abstract: The present photosensitive resin composition 2 comprises a polyamic acid resin 4, a photosensitive agent, a dispersible compound 3 dispersible in the polyamic acid resin 4, and a solvent. The porous resin is obtained by removing the solvent from the photosensitive resin composition 2 to form a composition in which the dispersible compound 3 is dispersed in the polyamic acid resin 4, removing the dispersible compound to make the composition porous, and curing the porous photosensitive resin composition. The porous resin enables forming a fine circuit pattern and has a low dielectric constant and, when used as an insulating layer of a circuit board, brings about improved high frequency characteristics.Type: GrantFiled: December 17, 2003Date of Patent: October 3, 2006Assignee: Nitto Denko CorporationInventors: Amane Mochizuki, Takahiro Fukuoka, Mitsuhiro Kanada, Takayuki Yamamoto, Tomohiro Taruno
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Patent number: 6861469Abstract: The invention relates to water-in-oil polymer dispersions consisting of a continuous organic phase and water-soluble polymers finely distributed therein, wherein said polymers have a radical monomer content of less than 1,000 ppm. The invention also relates to a method for producing the inventive polymer dispersions and to their use of flocculation auxiliary agents, thickening agents and as additives for phytosanitary and anti-erosion agents.Type: GrantFiled: August 8, 2001Date of Patent: March 1, 2005Assignee: Stockhausen GmbH & Co. KGInventors: Bernd Diener, Veronika Gehler, Erich Küster, Daniel Roulands, Dieter Werhahn
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Patent number: 5216122Abstract: Residual ethylene oxide is removed from poly(ethylene oxide) by the steps of adding to particles of high molecular weight poly(ethylene oxide) a finely divided solid particulate material which is capable of coating the poly(ethylene oxide) particles and impeding their agglomeration under conditions of heating, heating the particles of poly(ethylene oxide) at a temperature of at least 40.degree. C. and preferably which is near their crystalline melting point, and maintaining the temperature for a sufficient time to reduce the ethylene oxide in the particles of poly(ethylene oxide) to ten ppm or less. In one embodiment, the poly(ethylene oxide) is heated by holding the particles in a heated enclosure; in another, it is heated as a slurry in a liquid medium; in yet another, it is heated by warm gas in a gaseously-fluidized bed; and in a fourth, it is heated by microwave radiation.Type: GrantFiled: May 21, 1991Date of Patent: June 1, 1993Assignee: Union Carbide Chemicals & Plastics Technology CorporationInventors: Walter T. Reichle, Geoffrey A. D'Netto, Guy M. Troy, Meyer R. Rosen, Elke M. A. Clark
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Patent number: 4654378Abstract: The instant invention is directed to a process for the manufacture of poly(dimethyldiallyl ammonium chloride) comprising:(a) casting upon a continuous belt apparatus to form a film having a thickness of 1/4 inch to 1 inch an aqueous dimethyldiallyl ammonium chloride solution having a monomer concentration of at least 65 percent, by weight, monomer, said monomer solution also containing a photoreducible dye in a concentration of 1.times.10.sup.-7 to 1.times.10.sup.-4 moles per liter, a mild reducing agent in a concentration of 1.times.10.sup.-5 to 1.times.10.sup.-2 moles per liter and thermal initiator in a concentration of 1.times.10.sup.-5 to 1.times.10.sup.-2 moles per liter;(b) passing of the solution under a series of lights which emit visible light at an intensity of 0.1 to 10,000 foot candles and controlling the temperature of the monomer solution in the range of 5.degree. C. to 65.degree. C.Type: GrantFiled: May 2, 1984Date of Patent: March 31, 1987Assignee: Calgon CorporationInventors: Wood E. Hunter, Gary P. Craun
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Patent number: 4585808Abstract: A method of reducing the monomer content of a polymer or polymerization media comprising subjecting the polymer containing the monomer to sufficient irradiation with a high energy radiation to polymerize said monomer, said radiation preferably occurring in presence of chemical agent that accelerate the rate of consumption of the undesirable monomer, i.e. the monomer considered hazardous and/or protects the polymer from radiation degradation.Type: GrantFiled: February 4, 1982Date of Patent: April 29, 1986Assignee: The Goodyear Tire & Rubber CompanyInventor: Patrick J. Reilly