Treatment Through An External Filter Or Mask (nonphotograghic Process) Patents (Class 522/910)
  • Patent number: 8361696
    Abstract: The present invention relates to a polymer resin compound including a new polycyclic compound, and a photosensitive resin composition including the polymer resin compound as an effective binder matrix. In particular, the photosensitive resin composition according to the present invention uses a polymer resin compound, which includes a compound having double cyclic structure in one molecule as a monomer, as a binder matrix. Accordingly, the photosensitive resin composition has an excellent photosensitivity and an excellent developing property, and has a low distortion property during plastic processing. For this reason, the photosensitive resin composition has an advantage of curing various transparent photosensitive materials used to manufacture a color filter of a liquid crystal display, for example, a column spacer, an overcoat, a passivation material, and the like.
    Type: Grant
    Filed: January 15, 2008
    Date of Patent: January 29, 2013
    Assignee: LG Chem, Ltd.
    Inventors: Keon-Woo Lee, Sung-Hyun Kim, Chang-Ho Cho, Dong-Kung Oh, Min-Young Lim, Ji-Heum Yoo, Sang-Kyu Kwak
  • Patent number: 8187788
    Abstract: Disclosed is a photosensitive resin composition comprising an alkali-soluble resin, wherein the dissolution rate of the alkali-soluble resin in an aqueous sodium carbonate solution is not less than 0.04 ?m/sec. When a photosensitive layer having a thickness of 30 ?m is formed by applying the photosensitive resin composition onto a base and removing the solvent by heating, and thus-obtained photosensitive layer is irradiated with an active ray of 1000 mJ/cm2 or less, the dissolution rate of the portion irradiated with the active ray in the photosensitive layer made of the photosensitive resin composition is not less than 0.22 ?m/sec and the film residual rate of the portion not irradiated with the active ray is not less than 90%.
    Type: Grant
    Filed: April 24, 2007
    Date of Patent: May 29, 2012
    Assignee: Asahi Kasei Kabushiki Kaisha
    Inventors: Kuon Miyazaki, Takashi Hayakawa
  • Patent number: 6869983
    Abstract: An in situ polymer microstructure formation method. The monomer mixture is polymerized in a solvent/precipitant through exposure to ionizing radiation in the absence any chemical mediators. If an exposure mask is employed to block out certain regions of the radiation cross section, then a patterned microstructure is formed. The polymerization mechanism is based on the so-called free-radical retrograde-precipitation polymerization process, in which polymerization occurs while the system is phase separating above the lower critical solution temperature. This method was extended to produce a crosslinked line grid-pattern of poly (N-isopropylacrylamide), which has been known to have thermoreversible properties.
    Type: Grant
    Filed: June 10, 2003
    Date of Patent: March 22, 2005
    Assignee: The University of Chicago
    Inventors: Gerard T. Caneba, Vijaya Raghavan Tirumala, Derrick C. Mancini, Hsien-Hau Wang
  • Patent number: 6242504
    Abstract: A description is given of a method of crosslinking radiation-crosslinkable pressure-sensitive adhesive films by controlled-dose exposure to actinic radiation, which involves exposing the film surface to a regular or irregular radiation pattern made up of regions of different intensity. The method permits a more precise adjustment of the adhesion—in particular, the adhesion of flexible films on a substrate.
    Type: Grant
    Filed: September 21, 1998
    Date of Patent: June 5, 2001
    Assignee: BASF Aktiengesellschaft
    Inventors: Bernd Meyer-Roscher, Wolfgang Schrof, Dieter Urban, Paul Ludwig Geiss, Walter Brockmann
  • Patent number: 5910516
    Abstract: A photochromic cured product is produced by subjecting a photopolymerizable composition containing(A) a radical-polymerizable monomer,(B) an ultraviolet polymerization initiator having the main absorption in an ultraviolet region and a molar extinction coefficient at 400 nm of 150 lit./( or more, and(C) a photochromic compound, to an irradiation with an active energy ray having, as the main spectrum, an emission spectrum of 400 nm or more, to cure the composition, whereby the polymerization can be performed easily in a short time and a cured product having an excellent photochromic property can be obtained.
    Type: Grant
    Filed: January 23, 1997
    Date of Patent: June 8, 1999
    Assignee: Tokuyama Corporation
    Inventors: Satoshi Imura, Toshihiro Nishitake
  • Patent number: 5554667
    Abstract: The instant invention provides a method of forming a structure which includes at least two laminates each having a minor area of common overlap therebetween and a major area wherein said panels are not overlapped, which comprises the step of forming a primary, wet-to-wet resin bond between said minor areas of common overlap. The invention also contemplates at least one article of manufacture produced by the method.
    Type: Grant
    Filed: June 1, 1995
    Date of Patent: September 10, 1996
    Assignee: Sunrez Corporation
    Inventors: W. Novis Smith, Mark Livesay
  • Patent number: 5167882
    Abstract: An improved stereolithography method for building a three-dimensional article including the steps of patternwise curing successive layers of a bath of curable liquid resin formulation until the article has been completely built up, removing the article from the liquid resin bath and then post-curing the article, wherein the liquid resin is a "thiol/nene" formulation including:(a) a first compound having a plurality of norbornene groups thereon;(b) a second compound having a plurality of thiol groups therein; and(c) a free radical photoinitiator,the total functionality of the formulation being greater than 4.
    Type: Grant
    Filed: February 5, 1991
    Date of Patent: December 1, 1992
    Assignee: Loctite Corporation
    Inventors: Anthony F. Jacobine, Margaret A. Rakas, David M. Glaser
  • Patent number: 5076974
    Abstract: An improved stereolithography system and method for curing a stereolithographically-produced part, including at least some material that is no more than partially transformed, by exposing the part to off-peak-absorptive wavelengths of synergistic stimulation to achieve a more uniform cure.
    Type: Grant
    Filed: November 8, 1988
    Date of Patent: December 31, 1991
    Assignee: 3 D Systems, Inc.
    Inventors: Borzo Modrek, Brent Parker, Stuart T. Spence
  • Patent number: 4857434
    Abstract: This invention is directed to a thermal or radiation curable prepolymer, formulations containing same and processes of using same, said prepolymer comprising a liquid meth(acrylate) terminated polymeric hydrocarbon maleate having pendant maleate groups. Said prepolymer either per se or formulated with mono- or multi-functional unsaturated monomers and either a thermal or photoinitiator on exposure to heat or UV or high energy ionizing radiation forms a cured material utilizable as a printing plate, coating, adhesive or sealant.
    Type: Grant
    Filed: September 2, 1987
    Date of Patent: August 15, 1989
    Assignee: W. R. Grace & Co.
    Inventor: Lori J. Klinger
  • Patent number: 4790919
    Abstract: Describes a process for controlling the polymerization and cross-linked density of electrophoretic gel products useful for separation of bioorganic molecules, which process utilizes photoinitiation. Photoinitiated polymerized gels afford the desired advantages of being ultra thin and having a high electrophoretic resolution with programmable porosity profiles.
    Type: Grant
    Filed: June 28, 1984
    Date of Patent: December 13, 1988
    Assignee: E. I. Du Pont de Nemours and Company
    Inventor: Charles Baylor, Jr.
  • Patent number: 4704198
    Abstract: Describes a process for controlling the polymerization and cross-linked density of electrophoretic gel products useful for separation of bioorganic molecules, which process does not use initiators common to processes of the art. Electron beam polymerized gels afford the desired advantages of being ultra thin and having a high electrophoretic resolution with programmable porosity profiles.
    Type: Grant
    Filed: April 27, 1984
    Date of Patent: November 3, 1987
    Assignee: E. I. Du Pont de Nemours and Company
    Inventors: Richard C. Ebersole, Robert P. Foss
  • Patent number: 4647598
    Abstract: An improved process for preparing a water-soluble polymer having an excellent water solubility and a high molecular weight, which comprises subjecting a thin layer of an aqueous solution of a water-soluble vinyl monomer to polymerization on a solid support, covering the thin layer with a substantially water-insoluble organic material, e.g. a paraffin, a silicone oil or a low molecular polyethylene, and/or a slightly water-soluble or substantially water-insoluble alkylene oxide adduct at least at a point of time when the aqueous monomer solution has not freely flowed, and further continuing the polymerization.
    Type: Grant
    Filed: January 4, 1985
    Date of Patent: March 3, 1987
    Assignee: Dai-Ichi Kogyo Seiyaku Co., Ltd.
    Inventors: Akira Yada, Shusaku Matsumoto, Yoshihiro Kawamori, Takao Saito, Tadashi Nishiyama, Yoshitugu Adachi
  • Patent number: 4603058
    Abstract: A process is described for eliminating or substantially reducing the surface tack on relief printing plates and the like articles fabricated from radiation-sensitive polymerizable resins, particularly photopolymerizable resin compositions. The process comprises immersing the article, after curing, in an aqueous solution or dispersion comprising a water-soluble or water dispersible ethylenically unsaturated monomer (acrylic, methacrylic acids and derivatives thereof preferred) and optionally a photoinitiator and exposing the immersed plate to actinic radiation.
    Type: Grant
    Filed: October 5, 1984
    Date of Patent: July 29, 1986
    Assignee: MacDermid, Incorporated
    Inventor: William R. Adams
  • Patent number: 4581389
    Abstract: A method for the production of a polymer composition comprising photopolymerizing at least one vinyl compound in the presence of at least one photoinitiator, said photoinitiator comprising at least one photosensitizer and at least one reducing agent selected from compounds of formula I and II. Polymerizable materials containing said photoinitiators and said at least one vinyl compound are also disclosed. The polymerizable materials are particularly suited for use as dental materials.
    Type: Grant
    Filed: January 5, 1984
    Date of Patent: April 8, 1986
    Assignee: Kulzer & Co. GmbH
    Inventor: Roland Schaefer