Abstract: The present invention relates to a polymer resin compound including a new polycyclic compound, and a photosensitive resin composition including the polymer resin compound as an effective binder matrix. In particular, the photosensitive resin composition according to the present invention uses a polymer resin compound, which includes a compound having double cyclic structure in one molecule as a monomer, as a binder matrix. Accordingly, the photosensitive resin composition has an excellent photosensitivity and an excellent developing property, and has a low distortion property during plastic processing. For this reason, the photosensitive resin composition has an advantage of curing various transparent photosensitive materials used to manufacture a color filter of a liquid crystal display, for example, a column spacer, an overcoat, a passivation material, and the like.

Abstract: Disclosed is a photosensitive resin composition comprising an alkali-soluble resin, wherein the dissolution rate of the alkali-soluble resin in an aqueous sodium carbonate solution is not less than 0.04 ?m/sec. When a photosensitive layer having a thickness of 30 ?m is formed by applying the photosensitive resin composition onto a base and removing the solvent by heating, and thus-obtained photosensitive layer is irradiated with an active ray of 1000 mJ/cm2 or less, the dissolution rate of the portion irradiated with the active ray in the photosensitive layer made of the photosensitive resin composition is not less than 0.22 ?m/sec and the film residual rate of the portion not irradiated with the active ray is not less than 90%.

Abstract: An in situ polymer microstructure formation method. The monomer mixture is polymerized in a solvent/precipitant through exposure to ionizing radiation in the absence any chemical mediators. If an exposure mask is employed to block out certain regions of the radiation cross section, then a patterned microstructure is formed. The polymerization mechanism is based on the so-called free-radical retrograde-precipitation polymerization process, in which polymerization occurs while the system is phase separating above the lower critical solution temperature. This method was extended to produce a crosslinked line grid-pattern of poly (N-isopropylacrylamide), which has been known to have thermoreversible properties.

Abstract: A description is given of a method of crosslinking radiation-crosslinkable pressure-sensitive adhesive films by controlled-dose exposure to actinic radiation, which involves exposing the film surface to a regular or irregular radiation pattern made up of regions of different intensity. The method permits a more precise adjustment of the adhesion—in particular, the adhesion of flexible films on a substrate.

Abstract: A photochromic cured product is produced by subjecting a photopolymerizable composition containing(A) a radical-polymerizable monomer,(B) an ultraviolet polymerization initiator having the main absorption in an ultraviolet region and a molar extinction coefficient at 400 nm of 150 lit./(mol.multidot.cm) or more, and(C) a photochromic compound, to an irradiation with an active energy ray having, as the main spectrum, an emission spectrum of 400 nm or more, to cure the composition, whereby the polymerization can be performed easily in a short time and a cured product having an excellent photochromic property can be obtained.

Abstract: The instant invention provides a method of forming a structure which includes at least two laminates each having a minor area of common overlap therebetween and a major area wherein said panels are not overlapped, which comprises the step of forming a primary, wet-to-wet resin bond between said minor areas of common overlap. The invention also contemplates at least one article of manufacture produced by the method.

Abstract: An improved stereolithography method for building a three-dimensional article including the steps of patternwise curing successive layers of a bath of curable liquid resin formulation until the article has been completely built up, removing the article from the liquid resin bath and then post-curing the article, wherein the liquid resin is a "thiol/nene" formulation including:(a) a first compound having a plurality of norbornene groups thereon;(b) a second compound having a plurality of thiol groups therein; and(c) a free radical photoinitiator,the total functionality of the formulation being greater than 4.

Abstract: An improved stereolithography system and method for curing a stereolithographically-produced part, including at least some material that is no more than partially transformed, by exposing the part to off-peak-absorptive wavelengths of synergistic stimulation to achieve a more uniform cure.

Abstract: This invention is directed to a thermal or radiation curable prepolymer, formulations containing same and processes of using same, said prepolymer comprising a liquid meth(acrylate) terminated polymeric hydrocarbon maleate having pendant maleate groups. Said prepolymer either per se or formulated with mono- or multi-functional unsaturated monomers and either a thermal or photoinitiator on exposure to heat or UV or high energy ionizing radiation forms a cured material utilizable as a printing plate, coating, adhesive or sealant.

Abstract: Describes a process for controlling the polymerization and cross-linked density of electrophoretic gel products useful for separation of bioorganic molecules, which process utilizes photoinitiation. Photoinitiated polymerized gels afford the desired advantages of being ultra thin and having a high electrophoretic resolution with programmable porosity profiles.

Abstract: Describes a process for controlling the polymerization and cross-linked density of electrophoretic gel products useful for separation of bioorganic molecules, which process does not use initiators common to processes of the art. Electron beam polymerized gels afford the desired advantages of being ultra thin and having a high electrophoretic resolution with programmable porosity profiles.

Abstract: An improved process for preparing a water-soluble polymer having an excellent water solubility and a high molecular weight, which comprises subjecting a thin layer of an aqueous solution of a water-soluble vinyl monomer to polymerization on a solid support, covering the thin layer with a substantially water-insoluble organic material, e.g. a paraffin, a silicone oil or a low molecular polyethylene, and/or a slightly water-soluble or substantially water-insoluble alkylene oxide adduct at least at a point of time when the aqueous monomer solution has not freely flowed, and further continuing the polymerization.

Abstract: A process is described for eliminating or substantially reducing the surface tack on relief printing plates and the like articles fabricated from radiation-sensitive polymerizable resins, particularly photopolymerizable resin compositions. The process comprises immersing the article, after curing, in an aqueous solution or dispersion comprising a water-soluble or water dispersible ethylenically unsaturated monomer (acrylic, methacrylic acids and derivatives thereof preferred) and optionally a photoinitiator and exposing the immersed plate to actinic radiation.

Abstract: A method for the production of a polymer composition comprising photopolymerizing at least one vinyl compound in the presence of at least one photoinitiator, said photoinitiator comprising at least one photosensitizer and at least one reducing agent selected from compounds of formula I and II. Polymerizable materials containing said photoinitiators and said at least one vinyl compound are also disclosed. The polymerizable materials are particularly suited for use as dental materials.