From Sulfur-containing Reactant Patents (Class 524/609)
  • Patent number: 10732504
    Abstract: A resist underlayer composition and a method of forming patterns using the resist underlayer composition, the resist underlayer composition including a polymer including a moiety represented by Chemical Formula 1 and a moiety represented by Chemical Formula 2, and a solvent,
    Type: Grant
    Filed: January 10, 2018
    Date of Patent: August 4, 2020
    Assignee: SAMSUNG SDI CO., LTD.
    Inventors: Shinhyo Bae, Soonhyung Kwon, Hyeon Park, Jaeyeol Baek, Beomjun Joo, Yoojeong Choi, Kwen-Woo Han
  • Patent number: 10510493
    Abstract: This core-shell composite (10) is provided with a core (11) formed from a porous carbon body having a large number of pores from the interior through to the surface, and a shell layer (12) formed from conductive polymer nanorods (12a) that extend outward from the cavities of the pores (11a) on the surface of the core. The present invention provides the core-shell composite (10), to which electrolyte ions can be efficiently adsorbed or doped, a method for producing the core-shell composite, as well as an electrode material, a catalyst, an electrode, a secondary battery and an electric double-layer capacitor that use the core-shell composite.
    Type: Grant
    Filed: February 3, 2017
    Date of Patent: December 17, 2019
    Assignees: TPR CO., LTD., NATIONAL INSTITUTE FOR MATERIALS SCIENCE
    Inventors: Naoya Kobayashi, Yusuke Yamauchi, Rahul Salunkhe, Jing Tang
  • Patent number: 10400087
    Abstract: The invention relates to hydroxybenzophenone-based compounds of formula (I) that are used to improve UV, thermal, and thereto-oxidative stability of high performance aromatic polymers in a blend or as end-cappers of the same polymers.
    Type: Grant
    Filed: September 3, 2015
    Date of Patent: September 3, 2019
    Assignee: SOLVAY SPECIALTY POLYMERS USA, LLC
    Inventors: Joel Pollino, Satchit Srinivasan
  • Patent number: 10294330
    Abstract: A polyphenylene sulfide resin composition includes a polyphenylene sulfide resin (a) of 90 to 50% by weight and a polyphenylene sulfide resin (b) and/or a polyphenylene sulfide resin (c) of the total of 10 to 50% by weight blended with the polyphenylene sulfide resin (a), relative to the total of the polyphenylene sulfide resins (a) to (c) as 100% by weight, in which the polyphenylene sulfide resin composition has a change rate of viscosity of 1.5 times or less when the composition is heated at 320° C. for 5 hours.
    Type: Grant
    Filed: July 22, 2016
    Date of Patent: May 21, 2019
    Assignee: Toray Industries, Inc.
    Inventors: Hidenobu Takao, Shu Kaiho, Shunsuke Horiuchi
  • Patent number: 10280347
    Abstract: A method for manufacturing a semiconductor device and an underfill film which can achieve voidless mounting and excellent solder bonding properties even in the case of collectively bonding a plurality of semiconductor chips are provided. The method includes a mounting step of mounting a plurality of semiconductor chips having a solder-tipped electrode onto an electronic component having a counter electrode opposing the solder-tipped electrode via an underfill film; and a compression bonding step of collectively bonding the plurality of semiconductor chips to the electronic component via the underfill film. The underfill film contains an epoxy resin, an acid anhydride, an acrylic resin, and an organic peroxide and has a minimum melt viscosity of 1,000 to 2,000 Pa*s and a melt viscosity gradient of 900 to 3,100 Pa*s/° C. from a temperature 10° C. higher than a minimum melt viscosity attainment temperature to a temperature 10° C. higher than the temperature.
    Type: Grant
    Filed: February 5, 2016
    Date of Patent: May 7, 2019
    Assignee: DEXERIALS CORPORATION
    Inventors: Kenji Kubota, Takayuki Saito
  • Patent number: 10196480
    Abstract: A conducting polymer which may have one redox couple and/or enhanced redox capacity. The polymer is a copolymer prepared by electropolymerizing a mixture of monomers.
    Type: Grant
    Filed: August 17, 2017
    Date of Patent: February 5, 2019
    Assignee: Imam Abdulrahman Bin Faisal University
    Inventor: Fadi Atef Abed Alakhras
  • Patent number: 9799420
    Abstract: When measuring the molecular mass distribution of conductive aniline polymer of formula (1) by GPC and converting its retention time into molecular mass (M) in terms of sodium polystyrene sulfonate, for the molecular mass (M), the area ratio (X/Y) of the area (X) of a region of 15,000 Da or more to the area (Y) of a region of less than 15,000 Da is 1.20 or more. A method for producing such a polymer includes: polymerization step (Z1) where specific aniline derivative (A) is polymerized in a solution containing basic compound (B), solvent (C), and oxidizing agent (D) at a liquid temperature lower than 25° C.; or polymerization step (Z2) where specific aniline derivative (A) and oxidizing agent (D) are added to and polymerized in a solution of a conductive aniline polymer (P-1) with a unit of formula (1) dissolved or dispersed in a solvent (C).
    Type: Grant
    Filed: March 4, 2015
    Date of Patent: October 24, 2017
    Assignee: Mitsubishi Chemical Corporation
    Inventors: Kohei Yamada, Yasushi Horiuchi, Yukiko Hachiya, Masashi Uzawa, Takahiro Sakai, Tamae Takagi
  • Patent number: 9796850
    Abstract: A reactive functional group-containing polyarylene sulfide resin composition having a narrow polydispersity and a low gas generation amount is manufactured by mixing a polyarylene sulfide resin (a) and a polyarylene sulfide resin (b), wherein the polyarylene sulfide (a) has a weight reduction ratio ?Wr of not higher than 0.18% under heating and an increase rate of melt viscosity of less than 1.05 times by addition of a reactive compound (c) having a reactive group relative to melt viscosity prior to addition of the reactive compound (c), and the polyarylene sulfide (b) has the weight reduction ratio ?Wr of not higher than 0.18% under heating and the increase rate of melt viscosity of not less than 1.05 times by addition of the reactive compound (c) having the reactive group relative to melt viscosity prior to addition of the reactive compound (c).
    Type: Grant
    Filed: April 26, 2013
    Date of Patent: October 24, 2017
    Assignee: Toray Industries, Inc.
    Inventors: Akinori Kanomata, Shunsuke Horiuchi, Shu Kaiho, Koji Yamauchi
  • Patent number: 9447243
    Abstract: Condensation of fluoro-substituted and silyl-substituted monomers provides polymers suitable for use, e.g., as engineering polymers. A monomer composition is condensed in the presence of a basic catalyst. The monomer composition contains a compound of formula F—X—F and a compound of formula (R1)3Si—Z—Si(R1)3, and forms an alternating X—Z polymer chain and a silyl fluoride byproduct. X has the formula -A(-R2-A)n-; each A is SO2, C(?O), or Het; R2 is an organic moiety; n is 0 or 1; Het is an aromatic nitrogen heterocycle; Z has the formula -L-R3-L-; each L is O, S, or N(R4); and each R3 is an organic moiety, and R4 comprises H or an organic moiety.
    Type: Grant
    Filed: December 3, 2013
    Date of Patent: September 20, 2016
    Assignee: The Scripps Research Institute
    Inventors: Jiajia Dong, Valery Fokin, Larisa Krasnova, Luke R. Kwisnek, James S. Oakdale, K. Barry Sharpless
  • Publication number: 20150136299
    Abstract: According to one or more embodiments, a polymeric article includes a polymeric composition which in turn includes a volume of polymer intermixed with a number of color balloons, at least a portion of the number of color balloons each including a shell enclosing a colored agent.
    Type: Application
    Filed: November 19, 2013
    Publication date: May 21, 2015
    Applicant: Ford Global Technologies, LLC
    Inventors: Noah Barlow Mass, Jim Antime Marleau, Richard E. Newton, Jessica Smith
  • Publication number: 20150129487
    Abstract: A poly(arylethersulfone) polymer comprising recurring units derived from at least one aromatic dihalocompound comprising at least one —S(?O)2— group and at least one diol (D) comprising at least one cycloaliphatic moiety (M).
    Type: Application
    Filed: May 15, 2013
    Publication date: May 14, 2015
    Inventors: Atul Bhatnagar, Hong Chen, Chantal Louis, Narmandakh Taylor, Joel Pollino
  • Patent number: 9005476
    Abstract: Polyarylene sulfide/liquid crystal polymer alloys are described as are methods of forming the polyarylene sulfide/liquid crystal polymer alloys. The polyarylene sulfide/liquid crystal polymer alloys are formed according to a melt processing method that includes melt processing a polyarylene sulfide with a reactively functionalized disulfide compound and a liquid crystal polymer in a one or two step process. The reactively functionalized disulfide compound is added in a stoichiometric amount to react with a portion of the polyarylene sulfide. The melt processing forms a polyarylene sulfide/liquid crystal polymer copolymer that is a compatibilizer in the alloy. The polyarylene sulfide/liquid crystal polymer alloys may provide low chlorine content products having excellent strength characteristics.
    Type: Grant
    Filed: September 18, 2012
    Date of Patent: April 14, 2015
    Assignee: Ticona LLC
    Inventors: Rong Luo, Xinyu Zhao, Paul C. Yung
  • Patent number: 8993708
    Abstract: A carbazole polymer including a repeating unit represented by Formula 1 and having excellent one electron oxidation-state stability, wherein, in Formula 1, R1-R4 each independently represents an alkyl group having 1-60 carbon atoms, a haloalkyl group having 1-60 carbon atoms, or similar, Cz represents a divalent group including a carbazole skeleton represented by Formula 2, and Ar represents a divalent aromatic ring or similar; wherein, in Formula 2, R5 represents a hydrogen atom, an alkyl group having 1-60 carbon atoms, or similar, R6-R11 each independently represents a hydrogen atom, a halogen atom, or similar, and m represents an integer 1-10.
    Type: Grant
    Filed: January 22, 2013
    Date of Patent: March 31, 2015
    Assignee: Nissan Chemical Industries, Ltd.
    Inventors: Yuki Shibano, Takuji Yoshimoto
  • Publication number: 20150087779
    Abstract: Methods of forming a polyarylene sulfide and systems as may be utilized in carrying out the methods are described. Included in the formation method is a filtration process for treatment of a mixture, the mixture including a polyarylene sulfide, a salt byproduct of the polyarylene sulfide formation reaction, and a solvent. The filtration process includes maintaining the downstream side of the filter medium at an increased pressure. The downstream pressure can such that the boiling temperature of the mixture at the downstream pressure can be higher than the temperature at which the polyarylene sulfide is insoluble in the solvent.
    Type: Application
    Filed: September 9, 2014
    Publication date: March 26, 2015
    Inventors: Hendrich Chiong, Michael Haubs, Damian Feord, Mark Shatzer, Jacob Grayson
  • Publication number: 20150087780
    Abstract: A method for formation of a semi-crystalline polyarylene sulfide is described. The method can include reaction of sulfur-containing monomer with a dihaloaromatic monomer in an organic amide solvent to form a polymer following by combination of the polymer with a crystallization solution. The crystallization solution is pre-heated and the mixture formed is slowly cooled to crystallize the polymer.
    Type: Application
    Filed: September 9, 2014
    Publication date: March 26, 2015
    Inventors: Hendrich Chiong, Michael Haubs, Damian Feord, Stanley Leonard, Jacob Grayson, Venkata Nekkanti
  • Patent number: 8987404
    Abstract: The invention relates to a coating composition comprising: A) at least one thiol-functional compound having at least one thiol group, B) at least one polyisocyanate cross-linking agent with at least one free isocyanate group and C) at least one catalyst compound, said catalyst compound comprising at least one catalyst for the curing reaction between the thiol groups of component A and the free isocyanate groups of component B, and at least one cyclodextrine.
    Type: Grant
    Filed: April 29, 2010
    Date of Patent: March 24, 2015
    Assignee: Axalta Coating Systems IP Co., LLC
    Inventors: Carmen Flosbach, Stefanie Matten, Katharina Dreger
  • Publication number: 20150041727
    Abstract: The invention relates to novel organic semiconducting polymers containing one or more monomers derived from s-indacene fused symmetrically on each terminus with dithieno[3,2-b;2?,3?-d]thiophene (IDDTT), cyclopenta[2,1-b;3,4-b?]dithiophene (IDCDT), or derivatives thereof, to methods for their preparation and educts or intermediates used therein, to polymer blends, mixtures and formulations containing them, to the use of the polymers, polymer blends, mixtures and formulations as semiconductors in organic electronic (OE) devices, especially in organic photovoltaic (OPV) devices and organic photodetectors (OPD), and to OE, OPV and OPD devices comprising these polymers, polymer blends, mixtures or formulations.
    Type: Application
    Filed: January 18, 2013
    Publication date: February 12, 2015
    Applicant: MERCK PATENT GMBH
    Inventors: Changsheng Wang, William Mitchell, Nicolas Blouin, Jingyao Song, Mansoor D'Lavari, Steven Tierney
  • Publication number: 20150011092
    Abstract: A resist underlayer film-forming composition for forming a resist underlayer film having both dry etching resistance and heat resistance. A resist underlayer film-forming composition comprising a polymer containing a unit structure of Formula (1): In Formula (1), R3 is a hydrogen atom, and both n1 and n2 are 0. A method for producing a semiconductor device comprising the steps of: forming an underlayer film on a semiconductor substrate using the resist underlayer film-forming composition; forming a hard mask on the underlayer film; further forming a resist film on the hard mask; forming a resist pattern by irradiation with light or electron beams and development; etching the hard mask using the resist pattern; etching the underlayer film using the hard mask patterned; and fabricating the semiconductor substrate using the patterned underlayer film.
    Type: Application
    Filed: January 25, 2013
    Publication date: January 8, 2015
    Applicant: NISSAN CHEMICAL INDUSTRIES, LTD.
    Inventors: Yasunobu Someya, Keisuke Hashimoto, Tetsuya Shinjo, Hirokazu Nishimaki, Ryo Karasawa, Rikimaru Sakamoto
  • Patent number: 8921018
    Abstract: The present invention provides a polymer compound represented by the following Formula (1) and a method for production thereof, a pigment dispersant, a pigment dispersion composition, and a photocurable composition respectively using the polymer compound, and a color filter and a method for production thereof [R1: an organic linking group having a valency of (m+n); R2: a single bond or a divalent organic linking group; A1: a monovalent organic group containing at least one moiety selected from an organic dye structure, a heterocyclic structure, an acidic group, a group having a basic nitrogen atom, a urea group, a urethane group, a group having a coordinating oxygen atom, a hydrocarbon group having 4 or more carbon atoms, an alkoxysilyl group, an epoxy group, an isocyanate group, and a hydroxyl group; m=1 to 8, n=2 to 9 (m+n=3 to 10); and P1: polymer skeleton].
    Type: Grant
    Filed: February 28, 2014
    Date of Patent: December 30, 2014
    Assignee: FUJIFILM Corporation
    Inventors: Hidenori Takahashi, Shuichiro Osada
  • Publication number: 20140374887
    Abstract: There is provided a composition for forming a passivation film that satisfies electric insulation, heat-tolerance, solvent-tolerance, and a dry etch back property at the same time.
    Type: Application
    Filed: February 8, 2013
    Publication date: December 25, 2014
    Applicant: NISSAN CHEMICAL IMDUSTRIES, LTD.
    Inventors: Mamoru Tamura, Hiroshi Ogino, Tomoyuki Enomoto
  • Patent number: 8883043
    Abstract: Poly(anilineboronic acid)/phosphate nanoparticle dispersions are produced in high yields using the reactivity of the boronic acid moiety with phosphate in the presence of fluoride. The poly(anilineboronic acid)/phosphate dispersions have been characterized using spectroscopic, microscopic and electrochemical techniques. According to 11B NMR studies, the formation of anionic tetrahedral boronate group in phosphoric acid in the presence of fluoride forms the basis of self-doped, stabilized PABA nanoparticle dispersion. Transmission electron microscope images show that 25-50 nm diameter PABA nanoparticles are formed under these conditions. UV-vis, FT-IR-ATR spectroscopic and cyclic voltammetric results confirm the formation of the conducting form of PABA.
    Type: Grant
    Filed: November 25, 2009
    Date of Patent: November 11, 2014
    Assignee: University of Manitoba
    Inventors: Michael S. Freund, Bhavana A. Deore
  • Patent number: 8877831
    Abstract: Methods and compositions are provided that relate to weighted elastomers. The weighted elastomers may comprise an elastomer and a weighting agent attached to an outer surface of the elastomer. An embodiment includes a method of cementing that comprises providing a cement composition containing cement, water, and a weighted elastomer. In addition, the cement composition may be introduced into a subterranean formation and allowed to set therein.
    Type: Grant
    Filed: March 12, 2012
    Date of Patent: November 4, 2014
    Assignee: Halliburton Energy Services, Inc.
    Inventors: Craig W. Roddy, Jeffery D. Karcher, Rickey L. Morgan, D. Chad Brenneis
  • Publication number: 20140319097
    Abstract: A phenolic monomer used in the lithographic process for semiconductor fabrication, a polymer for preparing a resist under-layer comprising the same, and a resist under-layer composition comprising the same, are disclosed.
    Type: Application
    Filed: November 1, 2012
    Publication date: October 30, 2014
    Inventors: Jeong-Sik Kim, Jae-Woo Lee, Jae-Hyun Kim
  • Patent number: 8859707
    Abstract: Disclosed are two-component lignosulfonate adhesives, methods of synthesizing two-component lignosulfonate adhesives, kits comprising two-component lignosulfonate adhesives and methods of using two-component lignosulfonate adhesives.
    Type: Grant
    Filed: March 20, 2012
    Date of Patent: October 14, 2014
    Assignee: Empire Technology Development LLC
    Inventor: Glen Leon Brizius
  • Publication number: 20140261992
    Abstract: A carrier belt for fabricating a device or component such as an anisotropic conductive film. The carrier belt includes a substrate having a sacrificial image enhancing layer. Microcavities are formed in the carrier by laser ablation through the image enhancing layer. After the image enhancement layer is removed, a plurality of conductive particles are distributed into an array of microcavities formed by laser ablation on a surface of a carrier belt and transferred to an adhesive layer. The image enhancing layer enables one to form microcavities with a fine pitch and spacing and partitions having a high aspect ratio.
    Type: Application
    Filed: March 12, 2013
    Publication date: September 18, 2014
    Applicant: Trillion Science Inc.
    Inventors: Rong-Chang Liang, Chin-Jen Tseng, Ta-Ching Wu, Jia Yen Leong, Zhiyao AN, An-Yu Ma, Maung Kyaw Aung
  • Publication number: 20140238901
    Abstract: Compositions consisting of block copolymers ?,?-di-aryl or alkyl sulfonates of poly(ethylene oxide)w-poly(propylene oxide)-poly(ethylene oxide)w of bis-ammonium and block copolymers ?,?-di-amine of poly(ethylene oxide)w-poly(propylene oxide)-poly(ethylene oxide)w, are provided that are effective in the dewatering and desalting crude oils whose specific gravities are within the range of 14 to 20° API. A method of dewatering and desalting heavy crude oil adds a mixture of the copolymer bifunctionalized with an aliphatic or aromatic secondary amine and a copolymer bifunctionalized with an aliphatic or aromatic tertiary amine.
    Type: Application
    Filed: February 27, 2014
    Publication date: August 28, 2014
    Inventors: Eugenio Alejandro FLORES OROPEZA, Cesar Andres FLORES SANDOVAL, Reyna REYES MARTINEZ, Jose Gonzalo HERNANDEZ CORTEZ, Alfonso LOPEZ ORTEGA, Laura Veronica CASTRO SOTELO, Fernando ALVAREZ RAMIREZ, Arquimedes ESTRADA MARTINEZ, Flavio Salvador VAZQUEZ MORENO
  • Patent number: 8802772
    Abstract: A method for reducing the concentration of poly(aryl ether ketone) in an original polymer composition that is exposed to an aggressive chemical environment that is more aggressive against poly(biphenyl ether sulfone) than it is against the poly(aryl ether ketone) while maintaining or exceeding at least one of the original polymer composition's tensile strength, tensile modulus, flexural strength and flexural modulus retention ratio after exposure to the aggressive chemical environment.
    Type: Grant
    Filed: February 3, 2012
    Date of Patent: August 12, 2014
    Assignee: Solvay Advanced Polymers, L.L.C.
    Inventors: Mohammad Jamal El-Hibri, Shari Weinberg
  • Patent number: 8796357
    Abstract: Provided is an ink composition capable of forming images having excellent water resistance, excellent solvent resistance and excellent adhesiveness to base materials, the ink composition including (Component A) a polymer containing a repeating unit (a1) having at least one of an aromatic ketone structure and an aliphatic 1,2-diketone structure, a repeating unit (a2) having at least one of a tertiary amine structure and a thiol structure, and a repeating unit (a3) having an ethylenically unsaturated double bond, and (Component B) a coloring material.
    Type: Grant
    Filed: March 14, 2012
    Date of Patent: August 5, 2014
    Assignee: FUJIFILM Corporation
    Inventor: Koji Hironaka
  • Publication number: 20140199592
    Abstract: The present invention relates generally to high sulfur content polymeric materials and composites, methods for making them, and devices using them such as electrochemical cells and optical elements. In one aspect, a polymeric composition comprising a copolymer of sulfur, at a level in the range of at least about 50 wt % of the copolymer, and one or more monomers each selected from the group consisting of ethylenically unsaturated monomers, epoxide monomers, and thiirane monomers, at a level in the range of about 0.1 wt % to about 50 wt % of the copolymer.
    Type: Application
    Filed: August 13, 2012
    Publication date: July 17, 2014
    Applicant: ARIZONA BOARD OF REGENTS ON BEHALF OF THE UNIVERSI OF ARIZONA
    Inventors: Dong-Chul Pyun, Jared J. Griebel, Woo Jin Chung, Richard Glass, Robert A. Norwood, Roland Himmelhuber, Adam. G. Simmonos
  • Publication number: 20140200308
    Abstract: Disclosed herein are methods and compositions of polycarbonate compositions having, among other characteristics, improved thermal dimensional stability, hydrolytic stability and high refractive index. The resulting polycarbonate copolymer composition, comprising a polycarbonate and a polysulfone, can be used in the manufacture of articles for optical applications. This abstract is intended as a scanning tool for purposes of searching in the particular art and is not intended to be limiting of the present invention.
    Type: Application
    Filed: January 11, 2013
    Publication date: July 17, 2014
    Applicant: SABIC Innovative Plastics IP B.V.
    Inventors: Roopali Rai, Theo Hoeks, Jaykisore Pal, BG Umesh, Shantaram Narayan Naik, Subramanyam Santhanam, Shweta Hegde, Hariharan Ramalingham
  • Publication number: 20140182784
    Abstract: Methods and compositions relating to poly(hydroxyl urethane) compounds are described herein that are useful as, among other things, binders and adhesives. The cross-linked composition is achieved through the reaction of a cyclic carbonate, a compound having two or more thiol groups, and a compound having two or more amine functional groups. In addition, a method of adhesively binding two or more substrates using the cross-linked composition is provided.
    Type: Application
    Filed: February 3, 2014
    Publication date: July 3, 2014
    Inventors: David Luebke, Hunaid Nulwala, Chau Tang
  • Patent number: 8759441
    Abstract: A pigment dispersion includes a color pigment and a polymeric dispersant having at least one pending chromophore group covalently bound to the polymeric backbone of the polymeric dispersant through a linking group, wherein the at least one pending chromophore group is a derivative from a color pigment selected from the group consisting of monoazo pigments, disazo pigments, ?-naphtol pigments, naphtol AS pigments, azo pigment lakes, benzimidazolone pigments, disazo condensation pigments, metal complex pigments, isoindolinone pigments, isoindolinine pigments, phthalocyanine pigments, quinacridone pigments, diketopyrrolo-pyrrole pigments, thioindigo pigments, anthraquinone pigments, anthrapyrimidine pigments, indanthrone pigments, flavanthrone pigments, pyranthrone pigments, anthanthrone pigments, isoviolanthrone pigments, aluminum pigment lakes, dioxazine pigments, triarylcarbonium pigments, and quinophthalone pigments; the at least one pending chromophore group is a chromophore group occurring as a side group
    Type: Grant
    Filed: June 23, 2006
    Date of Patent: June 24, 2014
    Assignee: Agfa Graphics NV
    Inventors: Johan Loccufier, Wojciech Jaunky, Geert Deroover, Lambertus Groenendaal
  • Publication number: 20140167312
    Abstract: A method of preparing a cured thermoplastic material includes curing a thermoplastic polymer having a thermal decomposition temperature greater than or equal to about 200° C., at a temperature of about 200° C. to about 400° C., for a total time of less than or equal to 200 hours. A method of making a shape memory material also includes curing a thermoplastic polymer to prepare a cured thermoplastic material.
    Type: Application
    Filed: August 15, 2013
    Publication date: June 19, 2014
    Applicant: BAKER HUGHES INCORPORATED
    Inventors: Jiaxiang Ren, David Gerrard, James Edward Goodson, Ping Duan, Lillian Guo
  • Publication number: 20140163166
    Abstract: The present invention relates to solar cells. Disclosed are a fluorene-containing difluoro benzotriazolyl copolymer and preparation method and use thereof; the copolymer has a structure as represented by formula (I), wherein both R1 and R2 are alkyls from C1 to C20, and n is an integer from 10 to 100. In the fluorene-containing difluoro benzotriazolyl copolymer of the present invention, because the 1,2,3-benzotriazole copolymer contains two fluorine atoms, the HOMO energy level will be reduced by 0.11 eV while the fluorine-substituted 1,2,3-benzotriazole has two imido groups with strong electron-withdrawing property; the difluoro benzotriazole is a heterocyclic compound with strong electron-withdrawing property, and an alkyl chain can be easily introduced to the N-position of the N—H bond of the benzotriazole; the functional group of the alkyl chain can improve solar energy conversion efficiency, thus solving the low efficiency problem of polymer solar cells.
    Type: Application
    Filed: September 23, 2011
    Publication date: June 12, 2014
    Inventors: Mingjie Zhou, Ping Wang, Zhenhua Zhang, Lusheng Liang
  • Publication number: 20140147609
    Abstract: A method for coating a substrate includes impacting a substrate with a plurality of particles such that the particles adhere to the substrate, bonding the particles to the substrate to form an overlayer, and crosslinking the particles in the overlayer to coat the substrate with a crosslinked polymer coating. The particles comprise a polyphenyl polymer. An article includes a substrate and a crosslinked polymer coating bonded to the substrate. The crosslinked polymer coating is a product of crosslinking polyphenylene sulfide, polyphenylsulfone, self-reinforced polyphenylene, or a combination thereof on a surface of the substrate.
    Type: Application
    Filed: November 28, 2012
    Publication date: May 29, 2014
    Inventors: Jiaxiang Ren, David Gerrard
  • Patent number: 8722841
    Abstract: There is provided a resist underlayer film having heat resistance that is used for a lithography process in the production of semiconductor devices, and a high refractive index film having transparency that is used for an electronic device. A polymer comprising a unit structure of Formula (1): wherein each of R1, R2, R3, and R5 may be a hydrogen atom, R4 may be phenyl group or naphthyl group. A resist underlayer film forming composition comprising the polymer, and a resist underlayer film formed from the composition. A high refractive index film forming composition comprising the polymer, and a high refractive index film formed from the composition.
    Type: Grant
    Filed: June 16, 2010
    Date of Patent: May 13, 2014
    Assignee: Nissan Chemical Industries, Ltd.
    Inventors: Daigo Saito, Hiroaki Okuyama, Hideki Musashi, Tetsuya Shinjo, Keisuke Hashimoto
  • Publication number: 20140118858
    Abstract: The invention provides a resin component used within a memory disk drive device and a highly reliable memory disk drive device using the resin component, the resin component having excellent flame resistance and minimal outgas. A resin component used inside a memory disk drive device (1), the resin component being an insulating bushing for protecting a lead of a motor (2) when the lead is connected to a circuit board; a carriage (4) being molded integrally with a coil for driving a swing arm (3) provided with a pickup head (3a) for reading or writing information on a memory disk on a distal end thereof, and the carriage adapted for balancing the weight of the swing arm (3); or a ramp (5) for retracting the pickup head (3a) when the memory disk stops. The resin component is a resin article molded from an amorphous resin, a crystalline resin, or a liquid crystal polymer resin, the molded resin article having 30 ppm or less outgas when measured by a prescribed method.
    Type: Application
    Filed: June 29, 2012
    Publication date: May 1, 2014
    Applicant: NTN CORPORATION
    Inventors: Hiroyuki Noda, Hiroshi Niwa
  • Patent number: 8703862
    Abstract: The present invention relates to thermoplastic molding compositions composed of the following components: (A) at least one polyarylene ether (A1) having an average of at most 0.1 phenolic end groups per polymer chain, and at least one polyarylene ether (A2) having an average of at least 1.5 phenolic end groups per polymer chain, (B) at least one fibrous or particulate filler, and (C) optionally further additives and/or processing aids. The present invention further relates to a process for producing the thermoplastic molding compositions of the invention, the use of these for producing moldings, fibers, foams, or films, and to the resultant moldings, fibers, foams, and films.
    Type: Grant
    Filed: May 25, 2011
    Date of Patent: April 22, 2014
    Assignee: BASF SE
    Inventors: Martin Weber, Christian Maletzko, Mark Völkel
  • Publication number: 20140097134
    Abstract: Provided are methods for obtaining modified polyarylene sulfide compositions having improved thermal and thermo-oxidative stability, the compositions so obtained, and articles comprising the compositions. The method comprises the steps of contacting, in the presence of a suitable solvent, a polyarylene sulfide with at least one reducing agent and at least base to form a first mixture. The reducing agent comprises zinc(0), tin(0), tin(II), bismuth (0), bismuth(III), or a combination thereof. The first mixture is heated to form a second mixture in which the polyarylene sulfide is dissolved. The polyarylene sulfide is then precipitated to obtain a modified polyarylene sulfide.
    Type: Application
    Filed: October 4, 2012
    Publication date: April 10, 2014
    Applicant: E I DUPONT DE NEMOURS AND COMPANY
    Inventors: ROBERT John DUFF, Zheng-Zheng Huang, Joel M. Pollino, Joachim C. Ritter
  • Patent number: 8691898
    Abstract: It is an object to provide a resin composition in which fluidity is conferred while maintaining the high heat resistance of a highly heat-resistant non-crystalline resin, an amount of foreign matter is greatly reduced, there is no mold deposit, the metering stability is excellent, and the transparency is also good, and a resin composition in which good heat resistance and fluidity are both achieved, the amount of foreign matter is reduced, generation of fines is reduced, and there is no bleeding out. According to the present invention, there is provided a resin composition comprising; (A) a resin component comprising 70 to 100% by weight of at least one resin selected from the group consisting of a polyphenylene ether resin, a polycarbonate resin, a polysulfone resin, a polyethersulfone resin, a polyarylate resin, a polyamide-imide resin, a polyetherimide resin, and a thermoplastic polyimide resin; and (B) an organic compound having a melting point of not less than 200° C., the organic compound being from 0.
    Type: Grant
    Filed: October 7, 2005
    Date of Patent: April 8, 2014
    Assignee: Asahi Kasei Chemicals Corporation
    Inventors: Hiroshi Kamo, Tetsuo Kurihara
  • Patent number: 8674052
    Abstract: There is provided a resist underlayer film having heat resistance that is used for a lithography process in the production of semiconductor devices, and a high refractive index film having transparency that is used for an electronic device. A polymer comprising a unit structure of Formula (1): wherein each of R1, R2, R3, and R5 may be a hydrogen atom, R4 may be phenyl group or naphthyl group. A resist underlayer film forming composition comprising the polymer, and a resist underlayer film formed from the composition. A high refractive index film forming composition comprising the polymer, and a high refractive index film formed from the composition.
    Type: Grant
    Filed: January 4, 2013
    Date of Patent: March 18, 2014
    Assignee: Nissan Chemical Industries, Ltd.
    Inventors: Daigo Saito, Hiroaki Okuyama, Hideki Musashi, Tetsuya Shinjo, Keisuke Hashimoto
  • Patent number: 8669325
    Abstract: The invention relates to compositions for forming an aesthetic image that is a work or object of art, design or architecture. These compositions generally include a synthetic polymer or a polymer that is transparent or synthetic and translucent, with this polymer present in an amount sufficient to enable the image to have at least one aesthetic or formal element. In different embodiments, the image support medium may be an image support stabilizer, the polymer may be a conductive polymer, a light emitting conductive polymer or a synthetic absorbent polymer, it may be a transparent or synthetic translucent polymer with a property provided or enhanced to facilitate the creation or preservation of the image by at least one stabilizer, or this composition may be a work or art, design or architecture. The invention also relates to a method for preparing the composition and a method for using it to make art, design or architecture.
    Type: Grant
    Filed: December 4, 2009
    Date of Patent: March 11, 2014
    Inventor: Sydney Hyman
  • Patent number: 8668915
    Abstract: Process for the preparation of a an inverse latex including from 20% to 70% by weight and preferably from 25% to 50% by weight of a branched or crosslinked polyelectrolyte, characterized in that the polyelectrolyte is a copolymer of 2-acrylamido-2-methylpropanesulfonic acid partially or totally salified with acrylamide and optionally one or more monomers chosen from monomers containing a partially or totally salified weak acid function and/or from neutral monomers other than acrylamide, the production process including the control of the pH in the initial aqueous phase; Cosmetic, dermopharmaceutical or pharmaceutical composition including the inverse latex directly obtained by the process.
    Type: Grant
    Filed: December 5, 2008
    Date of Patent: March 11, 2014
    Assignees: Societe d'Exploitation de Produits pour les Industries Chimiques SEPPIC, Scott Bader Company Limited
    Inventors: Olivier Braun, Paul Mallo, Audrey Bonnardel, Francois Guy
  • Patent number: 8648130
    Abstract: The present invention provides a resin composition which enables to obtain a transparent member having excellent transparency, high refractive index and high strength and an optical component composed of such a transparent member. A resin composition of the present invention comprises a polymerizable compound or a resin component and an organically modified fine particle produced in the presence of a high-temperature high-pressure water as a reaction field, in which an organic material is bonded to the surface of a metal fine particle.
    Type: Grant
    Filed: November 28, 2008
    Date of Patent: February 11, 2014
    Assignee: Mitsui Chemicals, Inc.
    Inventors: Akira Hasegawa, Kenichi Goto, Toyoharu Hayashi
  • Publication number: 20140039102
    Abstract: This disclosure relates generally to polysulfone compositions whose residual phenolic monomers or phenolic degradation products exhibit little or no estradiol binding activity. Also disclosed are methods for making the disclosed polysulfones and articles of manufacture comprising the disclosed polysulfones.
    Type: Application
    Filed: August 1, 2012
    Publication date: February 6, 2014
    Inventors: Robert R. Gallucci, James A. Mahood, Roy R. Odle, Steve Dimond, Eric Lee Lutz
  • Publication number: 20140031485
    Abstract: A method of photo-grafting onto a separation membrane a copolymer includes at least one of: For example, in Structure 1A, x1?2 and y1?1; R1 and R2 are independently selected from the group consisting of CH3 and H; R3 is independently selected from the group consisting of poly(oxyalkylene), quaternary ammonium salts, pyridinium salts, sulfonium salts, sulfobetaines, carboxybetaines, alcohols, phenols, tertiary amines, aryl groups; linear, branched and cyclic alkylenes; linear, branched and cyclic heteroalkylenes; linear, branched and cyclic fluoroalkylenes; and siloxyl; R4 is independently selected from the group consisting of linear, branched, and cyclic alkylenes; linear, branched and cyclic hetroalkylenes; linear, branched and cyclic fluoroalkylenes; phenyl; and siloxyl; and Z1 is 0 or 1.
    Type: Application
    Filed: September 4, 2013
    Publication date: January 30, 2014
    Applicant: International Business Machines Corporation
    Inventors: Jacquana T. Diep, Young-Hye Na, Ankit Vora
  • Publication number: 20130345372
    Abstract: Disclosed are polyfunctional sulfur-containing epoxies and compositions containing polyfunctional sulfur-containing epoxies. The polyfunctional sulfur-containing epoxies may be used as a curing agent and combined with polythioethers and/or polysulfides used to provide high elongation sealants useful in aerospace applications.
    Type: Application
    Filed: June 21, 2012
    Publication date: December 26, 2013
    Applicant: PRC-DeSoto International, Inc.
    Inventors: Timothy Blackford, Juexiao Cai, Raquel Keledjian, Renhe Lin, Jose Lozano, Chandra B. Rao, Bruce Virnelson
  • Patent number: 8604111
    Abstract: A composition is formed from a polymeric acid precursor, such as polylactic acid (PLA), that is a least partially dissolved within a polymer dispersing solvent. An emulsion may be from polymeric acid precursor that is at least partially dissolved within a solvent and a liquid that is substantially immiscible with the solvent. In certain cases, the molecular weight of the polymeric acid precursor may be reduced in forming the solution. The solution may be used in treating a formation penetrated by a wellbore.
    Type: Grant
    Filed: April 24, 2012
    Date of Patent: December 10, 2013
    Assignee: Schlumberger Technology Corporation
    Inventors: Dean M. Willberg, Carlos Abad, Marina Bulova, Dzanis Menshikau
  • Publication number: 20130323473
    Abstract: Processes for fabricating secondary structures of gas turbine engines from polymer-based materials, and secondary structures formed thereby. The processes entail performing an additive manufacturing technique to produce a secondary structure of a gas turbine engine. The additive manufacturing technique directly produces the secondary structure from a polymer-based material to have a complex three-dimensional shape characterized by portions that lie in different planes.
    Type: Application
    Filed: May 30, 2012
    Publication date: December 5, 2013
    Applicant: GENERAL ELECTRIC COMPANY
    Inventors: Benjamin Allen Dietsch, James Michael Kostka, David Edward Dale, Jared Matthew Wolfe
  • Publication number: 20130313780
    Abstract: An article includes a crosslinked product of: a first crosslinked polymer and a second crosslinked polymer, wherein the article has a gradient in glass transition temperature. A process for making the article includes combining a first crosslinked polymer and a second crosslinked polymer to form a composition; compressing the composition; heating the composition; and crosslinking the composition to form the article, the article having a gradient in glass transition temperature. An article can be a seal that includes a first portion including a crosslinked product of: a first crosslinked polymer and a second crosslinked polymer; and a second portion including a polymer which is different than a constituent polymer in the first portion, wherein the seal has a gradient in glass transition temperature.
    Type: Application
    Filed: May 23, 2012
    Publication date: November 28, 2013
    Applicant: BAKER HUGHES INCORPORATED
    Inventors: Michael H. Johnson, Nicholas Carrejo