Polymer Mixed With Unsaturated Reactant Containing Phosphorus Atom Patents (Class 525/37)
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Patent number: 8758889Abstract: Disclosed is a gas barrier film comprising a substrate film, an organic layer and an inorganic layer provided directly on the surface of the organic layer, wherein the organic layer laid under the inorganic layer has a thickness of from 0.3 ?m to 10 ?m; the organic layer laid under the inorganic layer has a hardness, measured by the nanoindentation, of 0.03 to 0.5 GPa; and the organic layer laid under the inorganic layer, assumed to have a thickness “a”, and the inorganic layer on the organic layer, assumed to have a thickness “b”, satisfying a relation of a/b>10. The gas barrier film is excellent in the barrier performance, adhesiveness, bending resistance and scratch resistance.Type: GrantFiled: March 24, 2011Date of Patent: June 24, 2014Assignee: FUJIFILM CorporationInventor: Tomoo Murakami
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Patent number: 8562953Abstract: A dendritic polymer and a magnetic resonance imaging contrast agent employing the same. The magnetic resonance contrast agent includes the dendritic polymer according to the structure of SP-DZ-L)i)j or SP-DX-Z-L)i)j, wherein, S is cyclosilane moiety with j silicon oxygen residual groups, and j is not less than 2; P is CH2CH2Ol, and l is not less than 1; D is a C3-30 dendritic moiety having n oxygen residue, and n is not less than 3; X is C3-30 moiety having bi-functional groups; Z is a C3-20 moiety having a plurality of functional group; and L is a metal cation.Type: GrantFiled: October 2, 2012Date of Patent: October 22, 2013Assignee: Industrial Technology Research InstituteInventors: Dhakshanamurthy Thirumalai, Chin-I Lin, Shian-Jy Wang
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Patent number: 8303937Abstract: A dendritic polymer and a magnetic resonance imaging contrast agent employing the same. The magnetic resonance contrast agent includes the dendritic polymer according to the structure of SP-DZ-L)i)j or SP-DX-Z-L)i)j, wherein, S is cyclosilane moiety with j silicon oxygen residual groups, and j is not less than 2; P is and l is not less than 1; D is a C3-30 dendritic moiety having n oxygen residue, and n is not less than 3; X is C3-30 moiety having bi-functional groups; Z is a C3-20 moiety having a plurality of functional group; and L is a metal cation.Type: GrantFiled: July 16, 2008Date of Patent: November 6, 2012Assignee: Industrial Technology Research InstituteInventors: Dhakshanamurthy Thirumalai, Chin-I Lin, Shian-Jy Wang
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Patent number: 7928155Abstract: In one embodiment, the present invention provides a method of making a polymer-organoclay composite composition comprising (a) contacting under condensation polymerization conditions a first monomer, a second monomer, a solvent, and an organoclay composition, said organoclay composition comprising alternating inorganic silicate layers and organic layers, to provide a first polymerization reaction mixture, wherein one of said first monomer and second monomers is a diamine and the other is an dianhydride; (b) carrying out a stoichiometry verification step on the first polymerization reaction mixture; (c) optionally adding additional reactant (monomer 1, monomer 2, or chainstopper) to the first polymerization reaction mixture to provide a second polymerization reaction mixture; and (d) removing solvent from the first polymerization reaction mixture or the second polymerization reaction mixture to provide a first polymer-organoclay composite composition comprising a polymer component and an organoclay component wType: GrantFiled: June 22, 2007Date of Patent: April 19, 2011Assignee: Sabic Innovative Plastics IP B.V.Inventors: Feng Cao, Kwok Pong Chan, Erik C. Hagberg, Farid Fouad Khouri, Tara J. Mullen, Roy Ray Odle, James Mitchell White, Norimitsu Yamaguchi
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Patent number: 7148288Abstract: A process is disclosed for formation of a preformed stabilizer for use in formation of graft polyols. The preformed stabilizer has a reduced level of transesterification products and results in less reactor fouling. The preformed stabilizer is prepared in the presence of phosphorous compounds, which reduces the unwanted transesterification products.Type: GrantFiled: June 27, 2003Date of Patent: December 12, 2006Assignee: BASF CorporationInventors: Joseph P. Borst, Mao-Yao Huang, David D. Peters
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Patent number: 5283308Abstract: Curable polyorganosiloxanes prepared using a base-catalyzed equilibration reaction involving at least one organosiloxane are treated with a composition that includes a triorganohalosilane to neutralize the catalyst. The silane can be used alone or in combination with other Lewis acids. Curable compositions containing polyorganosiloxanes prepared using the present method exhibit improved thermal stability relative to compositions containing polyorganosiloxanes prepared using prior art neutralizing agents.Type: GrantFiled: October 5, 1992Date of Patent: February 1, 1994Assignee: Dow Corning CorporationInventors: Carl J. Bilgrien, Carol A. Hoag
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Patent number: 5047467Abstract: A process for producing a grafted alkyd resin, which comprises graft-copolymerizing an alkyd resin with 0.01 to 5.0% by weight of at least one vinyl monomer selected from the group consisting of nitrogen-containing vinyl monomers and phosphorus-containing vinyl monomers.Type: GrantFiled: August 2, 1989Date of Patent: September 10, 1991Assignee: Dainippon Ink and Chemicals, Inc.Inventors: Masahide Amemoto, Hikaru Watanabe, Akio Shoji
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Patent number: 5019623Abstract: A process for producing a grafted alkyd resin, which comprises graft-copolymerizing an alkyd resin with 0.01 to 5.0% by weight of at least one vinyl monomer selected from the group consisting of nitrogen-containing vinyl monomers and phosphorus-containing vinyl monomers.Type: GrantFiled: July 27, 1989Date of Patent: May 28, 1991Assignee: Dainippon Ink and Chemicals, Inc.Inventors: Mashide Amemoto, Hikaru Watanabe, Akio Shoji
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Patent number: 5002983Abstract: A polyarylene sulfide resin composition comprising a composition obtainable by a reaction of a polymer composition comprising(A) 100 parts by weight of a polyarylene sulfide resin,(B) 0.1 to 40 parts by weight of a monomer having one or more ethylenic unsaturated bonds and(C) 0 to 40 parts by weight of an unsaturated polyester. In the polyarylene sulfide resin composition of the present invention, a polymer produced by polymerization of the monomer or the monomer and unsaturated polyester, as compared with a resin composition wherein said polymer is simply blended, is in a state wherein it is uniformly mixed with the polyarylene sulfide resin and if necessary a filler. In other words, said polymer is uniformly dispersed in and mixed with the polyarylene sulfide resin to such a degree that the composition shows no phase separation even if it is passed through molding processes such as extrusion molding, injection molding, etc. carried out under normal conditions.Type: GrantFiled: February 7, 1990Date of Patent: March 26, 1991Assignee: Mitsubishi Rayon Co., Ltd.Inventors: Akira Nakata, Naoki Yamamoto, Hiroshi Mori, Takuya Ueno
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Patent number: 4997866Abstract: A polyarylene sulfide resin composition comprising a resin composition obtainable by polymerizing 40 to 0.1 part by weight of an unsaturated polyester and 0.01 to 30 parts by weight of a monomer having one or more ethylenic unsaturated bonds in the presence of 100 parts by weight of a composition comprising 1 to 99 wt. % of a polyarylene sulfide resin and 99 to 1 wt. % of a thermoplastic polyester. Since the polyarylene sulfide resin composition of the present invention is in a state wherein the polyarylene sulfide resin and thermoplastic polyester are uniformly mixed, the constituent components are uniformly dispersed and mixed to such a degree that the composition shows no phase separation even if it is passed through molding processes such as extrusion molding, injection molding, etc. carried out under normal conditions.Type: GrantFiled: February 16, 1990Date of Patent: March 5, 1991Assignee: Mitsubishi Rayon Co., Ltd.Inventors: Akira Nakata, Naoki Yamamoto, Hiroshi Mori, Takuya Ueno
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Patent number: 4929690Abstract: Metal salts of carboxyl-containing polymers are prepared by suspending carboxyl and/or carboxylic anhydride group-containing polymers in an inert solvent, reacting with a pulverulent basic metal compound, and then working up the suspension.Type: GrantFiled: October 28, 1988Date of Patent: May 29, 1990Assignee: BASF AktiengesellschaftInventors: Hans-Helmut Goertz, Walter Denzinger, Hans-Juergen Raubenheimer
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Patent number: 4743631Abstract: Adhesion promoters for metal substrates for paints cross-linkable with U.V. or E.B. radiations or with peroxides of general formula: ##STR1## (wherein R, m and n have the meaning which we will specify in the disclosure), obtained by means of the reaction of glycidyl acrylate and/or glycidyl methacrylate with dihydrophosphonoacetic acid.Type: GrantFiled: September 6, 1985Date of Patent: May 10, 1988Assignee: Enichem Sintesi S.p.A.Inventors: Alberto Greco, Renato Butturini, Sergio Arrighetti
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Patent number: 4420587Abstract: Phosphonopolyester oligomers are prepared from hydroxyalkylated 2,2',-bis(3-allylphenyl-4-hydroxy) alkanes and phosphonyl dihalides. The oligomers are useful in the preparation of polyester resins, epoxy resins, and polyurethanes.Type: GrantFiled: September 27, 1982Date of Patent: December 13, 1983Assignee: The Dow Chemical CompanyInventor: Robert E. Hefner, Jr.
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Patent number: 4161471Abstract: Filled unsaturated ester bulk molding, sheet molding, premix or mat molding compositions are modified with elastomer to give finished products with both improved impact strength and improved surface characteristics. The elastomeric modifier is selected from the group consisting of chloroprene polymers and hydrocarbon polymers such as ethylene/propylene di-, ter-, or tetrapolymers.Type: GrantFiled: April 13, 1978Date of Patent: July 17, 1979Assignee: E. I. Du Pont de Nemours and CompanyInventor: Robert J. Kassal