Polymer Mixed With Unsaturated Reactant Containing Phosphorus Atom Patents (Class 525/37)
  • Patent number: 8758889
    Abstract: Disclosed is a gas barrier film comprising a substrate film, an organic layer and an inorganic layer provided directly on the surface of the organic layer, wherein the organic layer laid under the inorganic layer has a thickness of from 0.3 ?m to 10 ?m; the organic layer laid under the inorganic layer has a hardness, measured by the nanoindentation, of 0.03 to 0.5 GPa; and the organic layer laid under the inorganic layer, assumed to have a thickness “a”, and the inorganic layer on the organic layer, assumed to have a thickness “b”, satisfying a relation of a/b>10. The gas barrier film is excellent in the barrier performance, adhesiveness, bending resistance and scratch resistance.
    Type: Grant
    Filed: March 24, 2011
    Date of Patent: June 24, 2014
    Assignee: FUJIFILM Corporation
    Inventor: Tomoo Murakami
  • Patent number: 8562953
    Abstract: A dendritic polymer and a magnetic resonance imaging contrast agent employing the same. The magnetic resonance contrast agent includes the dendritic polymer according to the structure of SP-DZ-L)i)j or SP-DX-Z-L)i)j, wherein, S is cyclosilane moiety with j silicon oxygen residual groups, and j is not less than 2; P is CH2CH2Ol, and l is not less than 1; D is a C3-30 dendritic moiety having n oxygen residue, and n is not less than 3; X is C3-30 moiety having bi-functional groups; Z is a C3-20 moiety having a plurality of functional group; and L is a metal cation.
    Type: Grant
    Filed: October 2, 2012
    Date of Patent: October 22, 2013
    Assignee: Industrial Technology Research Institute
    Inventors: Dhakshanamurthy Thirumalai, Chin-I Lin, Shian-Jy Wang
  • Patent number: 8303937
    Abstract: A dendritic polymer and a magnetic resonance imaging contrast agent employing the same. The magnetic resonance contrast agent includes the dendritic polymer according to the structure of SP-DZ-L)i)j or SP-DX-Z-L)i)j, wherein, S is cyclosilane moiety with j silicon oxygen residual groups, and j is not less than 2; P is and l is not less than 1; D is a C3-30 dendritic moiety having n oxygen residue, and n is not less than 3; X is C3-30 moiety having bi-functional groups; Z is a C3-20 moiety having a plurality of functional group; and L is a metal cation.
    Type: Grant
    Filed: July 16, 2008
    Date of Patent: November 6, 2012
    Assignee: Industrial Technology Research Institute
    Inventors: Dhakshanamurthy Thirumalai, Chin-I Lin, Shian-Jy Wang
  • Patent number: 7928155
    Abstract: In one embodiment, the present invention provides a method of making a polymer-organoclay composite composition comprising (a) contacting under condensation polymerization conditions a first monomer, a second monomer, a solvent, and an organoclay composition, said organoclay composition comprising alternating inorganic silicate layers and organic layers, to provide a first polymerization reaction mixture, wherein one of said first monomer and second monomers is a diamine and the other is an dianhydride; (b) carrying out a stoichiometry verification step on the first polymerization reaction mixture; (c) optionally adding additional reactant (monomer 1, monomer 2, or chainstopper) to the first polymerization reaction mixture to provide a second polymerization reaction mixture; and (d) removing solvent from the first polymerization reaction mixture or the second polymerization reaction mixture to provide a first polymer-organoclay composite composition comprising a polymer component and an organoclay component w
    Type: Grant
    Filed: June 22, 2007
    Date of Patent: April 19, 2011
    Assignee: Sabic Innovative Plastics IP B.V.
    Inventors: Feng Cao, Kwok Pong Chan, Erik C. Hagberg, Farid Fouad Khouri, Tara J. Mullen, Roy Ray Odle, James Mitchell White, Norimitsu Yamaguchi
  • Patent number: 7148288
    Abstract: A process is disclosed for formation of a preformed stabilizer for use in formation of graft polyols. The preformed stabilizer has a reduced level of transesterification products and results in less reactor fouling. The preformed stabilizer is prepared in the presence of phosphorous compounds, which reduces the unwanted transesterification products.
    Type: Grant
    Filed: June 27, 2003
    Date of Patent: December 12, 2006
    Assignee: BASF Corporation
    Inventors: Joseph P. Borst, Mao-Yao Huang, David D. Peters
  • Patent number: 5283308
    Abstract: Curable polyorganosiloxanes prepared using a base-catalyzed equilibration reaction involving at least one organosiloxane are treated with a composition that includes a triorganohalosilane to neutralize the catalyst. The silane can be used alone or in combination with other Lewis acids. Curable compositions containing polyorganosiloxanes prepared using the present method exhibit improved thermal stability relative to compositions containing polyorganosiloxanes prepared using prior art neutralizing agents.
    Type: Grant
    Filed: October 5, 1992
    Date of Patent: February 1, 1994
    Assignee: Dow Corning Corporation
    Inventors: Carl J. Bilgrien, Carol A. Hoag
  • Patent number: 5047467
    Abstract: A process for producing a grafted alkyd resin, which comprises graft-copolymerizing an alkyd resin with 0.01 to 5.0% by weight of at least one vinyl monomer selected from the group consisting of nitrogen-containing vinyl monomers and phosphorus-containing vinyl monomers.
    Type: Grant
    Filed: August 2, 1989
    Date of Patent: September 10, 1991
    Assignee: Dainippon Ink and Chemicals, Inc.
    Inventors: Masahide Amemoto, Hikaru Watanabe, Akio Shoji
  • Patent number: 5019623
    Abstract: A process for producing a grafted alkyd resin, which comprises graft-copolymerizing an alkyd resin with 0.01 to 5.0% by weight of at least one vinyl monomer selected from the group consisting of nitrogen-containing vinyl monomers and phosphorus-containing vinyl monomers.
    Type: Grant
    Filed: July 27, 1989
    Date of Patent: May 28, 1991
    Assignee: Dainippon Ink and Chemicals, Inc.
    Inventors: Mashide Amemoto, Hikaru Watanabe, Akio Shoji
  • Patent number: 5002983
    Abstract: A polyarylene sulfide resin composition comprising a composition obtainable by a reaction of a polymer composition comprising(A) 100 parts by weight of a polyarylene sulfide resin,(B) 0.1 to 40 parts by weight of a monomer having one or more ethylenic unsaturated bonds and(C) 0 to 40 parts by weight of an unsaturated polyester. In the polyarylene sulfide resin composition of the present invention, a polymer produced by polymerization of the monomer or the monomer and unsaturated polyester, as compared with a resin composition wherein said polymer is simply blended, is in a state wherein it is uniformly mixed with the polyarylene sulfide resin and if necessary a filler. In other words, said polymer is uniformly dispersed in and mixed with the polyarylene sulfide resin to such a degree that the composition shows no phase separation even if it is passed through molding processes such as extrusion molding, injection molding, etc. carried out under normal conditions.
    Type: Grant
    Filed: February 7, 1990
    Date of Patent: March 26, 1991
    Assignee: Mitsubishi Rayon Co., Ltd.
    Inventors: Akira Nakata, Naoki Yamamoto, Hiroshi Mori, Takuya Ueno
  • Patent number: 4997866
    Abstract: A polyarylene sulfide resin composition comprising a resin composition obtainable by polymerizing 40 to 0.1 part by weight of an unsaturated polyester and 0.01 to 30 parts by weight of a monomer having one or more ethylenic unsaturated bonds in the presence of 100 parts by weight of a composition comprising 1 to 99 wt. % of a polyarylene sulfide resin and 99 to 1 wt. % of a thermoplastic polyester. Since the polyarylene sulfide resin composition of the present invention is in a state wherein the polyarylene sulfide resin and thermoplastic polyester are uniformly mixed, the constituent components are uniformly dispersed and mixed to such a degree that the composition shows no phase separation even if it is passed through molding processes such as extrusion molding, injection molding, etc. carried out under normal conditions.
    Type: Grant
    Filed: February 16, 1990
    Date of Patent: March 5, 1991
    Assignee: Mitsubishi Rayon Co., Ltd.
    Inventors: Akira Nakata, Naoki Yamamoto, Hiroshi Mori, Takuya Ueno
  • Patent number: 4929690
    Abstract: Metal salts of carboxyl-containing polymers are prepared by suspending carboxyl and/or carboxylic anhydride group-containing polymers in an inert solvent, reacting with a pulverulent basic metal compound, and then working up the suspension.
    Type: Grant
    Filed: October 28, 1988
    Date of Patent: May 29, 1990
    Assignee: BASF Aktiengesellschaft
    Inventors: Hans-Helmut Goertz, Walter Denzinger, Hans-Juergen Raubenheimer
  • Patent number: 4743631
    Abstract: Adhesion promoters for metal substrates for paints cross-linkable with U.V. or E.B. radiations or with peroxides of general formula: ##STR1## (wherein R, m and n have the meaning which we will specify in the disclosure), obtained by means of the reaction of glycidyl acrylate and/or glycidyl methacrylate with dihydrophosphonoacetic acid.
    Type: Grant
    Filed: September 6, 1985
    Date of Patent: May 10, 1988
    Assignee: Enichem Sintesi S.p.A.
    Inventors: Alberto Greco, Renato Butturini, Sergio Arrighetti
  • Patent number: 4420587
    Abstract: Phosphonopolyester oligomers are prepared from hydroxyalkylated 2,2',-bis(3-allylphenyl-4-hydroxy) alkanes and phosphonyl dihalides. The oligomers are useful in the preparation of polyester resins, epoxy resins, and polyurethanes.
    Type: Grant
    Filed: September 27, 1982
    Date of Patent: December 13, 1983
    Assignee: The Dow Chemical Company
    Inventor: Robert E. Hefner, Jr.
  • Patent number: 4161471
    Abstract: Filled unsaturated ester bulk molding, sheet molding, premix or mat molding compositions are modified with elastomer to give finished products with both improved impact strength and improved surface characteristics. The elastomeric modifier is selected from the group consisting of chloroprene polymers and hydrocarbon polymers such as ethylene/propylene di-, ter-, or tetrapolymers.
    Type: Grant
    Filed: April 13, 1978
    Date of Patent: July 17, 1979
    Assignee: E. I. Du Pont de Nemours and Company
    Inventor: Robert J. Kassal