Abstract: A thiol group-containing polymer is represented by HS—(R—Sr)n—R—SH, wherein R is an organic group including a —O—CH2—O— bond and/or a branched alkylene group, n is an integer of from 1 to 200, r is an integer of from 1 to 5, and the average value of r is 1.1 or more and 1.8 or less. A curable composition using the thiol group-containing polymer can be used in sealants, adhesives, paints and the like, which require properties such as a low specific gravity, a low viscosity and a low glass transition temperature.

Abstract: The poly(zwitterion-alt-sulfur dioxide) copolymer includes a structural unit having the structural formula: The copolymer is made by cocyclopolymerizing 3-(N,N-diallyl,N-carboethoxymethylammonio)propanesulfonate with sulfur dioxide to obtain an intermediate polyzwitterion (PZ) copolymer, which is hydrolyzed to form the copolymer. The copolymer may be converted to a poly(electrolyte-zwitterion) by treatment with a base, such as sodium hydroxide.

Abstract: The calcium sulfate scale-inhibiting compositions are polyelectrolyte antiscalant compositions for the inhibition of calcium sulfate scale formation in desalination plant feed brine, such as that typically used with reverse osmosis desalination plants. In order to inhibit the formation of calcium sulfate scale, the polyelectrolyte antiscalant compositions are mixed at a concentration between approximately 1 ppm and approximately 50 ppm into the desalination plant feed brine. The polyelectrolyte antiscalant composition may be either poly[disodium 3-(diallylamino)propanephosphonate]-alt-(sulfur dioxide), poly[sodium 5-(diallylcarboxymethylammonio)pentanoate]-alt-(sulfur dioxide), or poly[sodium 5-(diallylcarboxymethylammonio)pentanoate].

Abstract: An insulating varnish includes a polyamide-imide resin including a repeat unit represented by Formula (1) below derived from a synthesis reaction between a resin component (X) and a diisocyanate component (Y). The resin component (X) is derived from a synthesis reaction between a diamine component including aromatic diamines including g a divalent aromatic group (R) including three or more aromatic rings, and an acid component in the presence of an azeotrope solvent. The diisocyanate component (Y) includes a 2,4?-diphenylmethane diisocyanate (Y1) and a 4,4?-diphenylmethane diisocyanate (Y2). In Formula (1), R denotes the divalent aromatic group including three or more aromatic rings, and m and n denote an integer of from 1 to 99.

Abstract: Compositions, such as aerospace sealant, coating, and/or potting compositions are disclosed. The compositions include a polythioether and, in at least some cases, can be sprayable and fuel resistant even when substantially free of volatile organic compounds.

Abstract: To provide a highly efficient and stable method for the preparation of a silicon-containing polysulfide-type polymer, in particular, a polysulfide-type polymer with organosilyl groups, the method being carried out without generation of by-products that could have high impact on the environment. A method for the preparation of a silicon-containing polysulfide-type polymer characterized by mixing (A) a silicon-containing compound having a silicon atom-bonded monovalent organic group having an aliphatic unsaturated bond; (B) a polysulfide polymer with at least two mercapto groups in one molecule; and (C) an organic base or ammonia; the mixing being carried out in the presence of (D) sulfur.

Abstract: Compositions, such as aerospace sealant, coating, and/or potting compositions are disclosed. The compositions include a polythioether and, in at least some cases, can be sprayable and fuel resistant even when substantially free of volatile organic compounds.

Abstract: Regioregular poly(3-alkylthiophenes) and other polythiophenes can be prepared by living polymerization which have good solubility, processability and environmental stability. The polymerization method can afford regioregular poly(3-alkylthiophenes) in high yields. Kinetic study of polymerization revealed the living character of this process. The molecular weight of poly(3-alkylthiophenes) is a function of the molar ratio of the monomer to nickel initiator, and conducting polymers with relatively narrow molecular weight distribution (PDI<1.5) are now readily available. Sequential monomer addition resulted in new block copolymers containing different poly(3-alkylthiophene) segments, which further confirms the “livingness” of this system. Other synthetic methods can be used as well to conduct living polymerization. Blends and electronic devices can be prepared.

Abstract: The present invention discloses novel bottom anti-reflective coating compositions where a coating from the composition has an etch rate that can be regulated by the etch plate temperature.

Abstract: This invention relates to methods of making graft copolymers, and articles having such graft copolymers. The methods may provide better control than in radicalization or photoinitiated polymerization techniques. For example, a graft copolymer can be prepared by reacting an alkoxide ion with a polymer. The alkoxide, in turn, can be provided by any suitable technique, for example, by reacting an alcohol with a base. In some embodiments of the invention, the graft copolymers may be a normally hydrophobic polymer, such as a polysulfone, that has been made more hydrophilic due to the attachment of hydrophilic side groups such as polyethylene glycol or polypropylene glycol. The copolymers of the invention have many uses, for example, in films or porous membranes.

Abstract: Molding compositions comprise A) from 1 to 98.8% by weight of at least one polyarylene ether sulfone, B) from 1 to 98.8% by weight of at least one thermoplastic polyamide, C) from 0.1 to 60% by weight of at least one filler, D) from 0 to 40% by weight of at least one impact-modifying rubber, E) from 0 to 40% by weight of one or more different additives, and F) from 0.1 to 30% by weight of at least one thermotropic polymer, where the total of the percentages by weight of components A to F is 100%, wherein component B has a viscosity number of from 180 to 350 ml/g (measured in a 0.5% strength by weight solution in 96% strength by weight sulfuric acid to DIN 53 727).

Abstract: A polymer composition comprising chains of at least one aromatic polymer or a mixture thereof together with at least one chain linking component wherein the at least one aromatic polymer comprises polymer chains of number average molecular weight (Mn) in a first range and characterised by a polymer flow temperature, and having at least one reactive end group, and wherein the at least one chain linking component comprises at least two linking sites, characterised in that a plurality of the polymer chain end groups are adapted to react with the linking sites at chain linking temperature in excess of the polymer flow temperature to form linked polymer chains of number average molecular weight (Mn) in a second range which is in excess of the first range, substantially thermoplastic in nature; process for the preparation thereof; prepreg, composite or shaped product obtained therewith and the use thereof.

Abstract: AGE precursors can be removed from blood, plasma or PBS buffer using a modified polymeric shaped body that can be produced by reaction of diaminoguanidine and/or triaminoguannidine with a staring polymeric shaped body carrying R—X residues, where R is an alkylene group that may or may not be substituted with a hydroxyl group and contains from 1 to 3 carbon atom, and X is a group that is substituted during the reaction by carrying residues Y, on to with diaminoguanidine, or with a starting polymeric shaped body during the reaction which diaminoguanidine and/or triaminoguannidine are added during the reaction.

Abstract: The present invention relates to polythiophenes, particularly regioregular head-to-tail poly(3-alkylthiophenes) (HT-PATs), block copolymers made therefrom, and their methods of formation. The present invention provides HT-PATs with well-defined, specific end-groups, functionalization of the defined HT-PATs, and incorporation of end group functionalized HT-PATs into block copolymers with structural polymers. The intrinsically conductive diblock and triblock copolymers, formed from the HT-PATs, have excellent conductivity and low polydispersities that are useful in a number of applications. The block copolymers of the present invention have been found to exhibit conductivities that range from a low of 10?8 S/cm for certain applications to as high as several hundred S/cm or more.

Abstract: Disclosed is a composition which comprises a polymer containing at least some monomer repeat units with photosensitivity-imparting substituents which enable crosslinking or chain extension of the polymer upon exposure to actinic radiation, said polymer being of the formula 1

Abstract: A slush molding process in which the moldable thermoplastic composition powder dosed to the mold is prepared by blending ethylene carboxylic acid copolymers or ionomers with ethylene/glycidyl acrylate or methacrylate copolymer and cross-linking promoter at a temperature and for a time that does not cause significant cross-linking prior to dosing to mold, which is held for sufficient time and temperature to cause cross-linking in-situ, and optionally, other additives including release agents.

Abstract: The present invention relates to polythiophenes, particularly regioregular head-to-tail poly(3-alkylthiophenes) (HT-PATs), block copolymers made therefrom, and their methods of formation. The present invention provides HT-PATs with well-defined, specific end-groups, functionalization of the defined HT-PATs, and incorporation of end group functionalized HT-PATs into block copolymers with structural polymers. The intrinsically conductive diblock and triblock copolymers, formed from the HT-PATs, have excellent conductivity and low polydispersities that are useful in a number of applications. The block copolymers of the present invention have been found to exhibit conductivities that range from a low of 10−8 S/cm for certain applications to as high as several hundred S/cm or more.

Abstract: Disclosed is a composition which comprises a polymer containing at least some monomer repeat units with photosensitivity-imparting substituents which enable crosslinking or chain extension of the polymer upon exposure to actinic radiation, said polymer being of the formula 1

Abstract: The present invention pertains to a process for the cross-linking of modified engineering thermoplastics, in particular, of polymeric sulfinic acids or sulfinic acid salts. In particular, the invention pertains to a process for the preparation of cross-linked polymers, characterized in that solutions of polymeric sulfinic acids or sulfinic acid salts (—SO2Me), optionally in the presence of organic di- or oligohalogeno compounds [R(Hal)x], are freed from solvent and cross-linked to polymers, wherein Me stands for a monovalent or polyvalent metal cation; R stands for an optionally substituted alkyl or aryl residue containing from 1 to 20 carbon atoms; and Hal stands for F, Cl, Br or I.

Abstract: A photosensitive resin obtained by reacting a reaction product (I) prepared from a biphenyl epoxy acrylate (a) of the formula (1) and a cyanate ester compound (b) with a polybasic acid anhydride (c), and a photosensitive resin and an epoxy compound, wherein each of R1 and R9 is a hydrogen atom or methyl, and n is an integer of 1 or more. The photosensitive resin and the photosensitive resin composition have excellent developability, has high heat resistance and particularly has excellent heat resistance and reliability on electric insulation under moisture absorption lasting for a long period of time.

Abstract: There is provided a photosensitive resin having at least three moieties in the backbone chain, two moieties of which moieties are an alicyclic group moiety and a sulfonyl moiety. The photosensitive resin has a superior solubility in solvents and a superior dry-etching resistance, and enables easy fabrication of highly integrated semiconductor devices.

Abstract: Aqueous coating composition, for example for use as a clear or pigmented top coat or a primer, comprising: a) a polyol or a mixture of polyols having at least two hydroxy groups per molecule and: i a content C of carboxylate- and/or carboxylic acid-functional groups and ii a content S of sulfonate- and/or sulfonic acid-functional groups, and b) one or more cross-linkers capable of reacting with hydroxy groups. A Polyol having a content C of carboxylate- and/or carboxylic acid-functional groups and a content S of sulfonate- and/or sulfonic acid-functional groups, the total content C+S being between 0.09 and 0.6 mmol/gram polyol, and the ratio C/S having a value between 0.5 to 20 and a process for preparing the polyol resin.

Abstract: A process for the hydrogenation of aromatic polymers is disclosed. Accordingly, the solvent used comprise an ether that contains no &agr;-hydrogen atom on a carbon atom adjacent to the ether function. The process results in virtually complete hydrogenation of the aromatic units.

Abstract: Disclosed is a composition which comprises a polymer containing at least some monomer repeat units with photosensitivity-imparting substituents which enable crosslinking or chain extension of the polymer upon exposure to actinic radiation, said polymer being of the formula wherein x is an interger of 0 or 1, A is one of several specified groups, such as B is one of several specified groups, such as or mixtures thereof, and n is an integer representing the number of repeating monomer units, wherein said photosensitivity-imparting substituents are allyl ether groups, epoxy groups, or mixtures thereof. Also disclosed are a process for preparing a thermal ink jet printhead containing the aforementioned polymers and processes for preparing the aforementioned polymers.

Abstract: A rubber vulcanization agent comprising a polysulfide polymer having an average number of sulfur bonds in the repeating units of more than 2 but not more than 6 and having the formula (I) R—S&Parenopenst;Y—Sx&Parenclosest;nY—S—R  (I) wherein Y indicates an alkylene group which may include a hetero atom, R is a residue obtained by reacting a thiol group with an unsaturated alicyclic compound, an unsaturated hydrocarbon compound having the structure (III) or (IV), which may include a hetero atom so as to cap the end thiol group, n is an integer of 1 to 100, and x is more than 2 but not more than 6.

Abstract: Provided is a photosensitive resin with high sensitivity to exposure light. The photosensitive resin comprises a vinyl monomer moiety having an alicyclic group in a side chain thereof, and a sulfonyl moiety.

Abstract: Disclosed is a process which comprises reacting a polymer of the general formula ##STR1## or ##STR2## wherein x is an integer of 0 or 1, A is one of several specified groups, such as ##STR3## B is one of several specified groups, such as or mixtures thereof, and n is an integer representing the number of repeating monomer units, with a halomethylethyl ether, a hydrohalic acid, and acetic acid in the presence of a halogen-containing Lewis acid catalyst, thereby forming a halomethylated polymer.

Abstract: A resin composition comprising (a) polyarylene polyether represented by the general formula of Z.sub.1 -(polyarylene polyether) chain-Z.sub.1 ' (wherein Z.sub.1 and Z.sub.1 ' denote individually a monovalent organic group containing a cross-linkable unsaturated carbon-carbon linkage), and (b) an inorganic filler.

Abstract: Disclosed is a composition which comprises a polymer containing at least some monomer repeat units with photosensitivity-imparting substituents which enable crosslinking or chain extension of the polymer upon exposure to actinic radiation, said polymer being of the formula ##STR1## wherein x is an integer of 0 or 1, A is one of several specified groups, such as ##STR2## B is one of several specified groups, such as ##STR3## or mixtures thereof, and n is an integer representing the number of repeating monomer units, wherein said photosensitivity-imparting substituents are allyl ether groups, epoxy groups, or mixtures thereof. Also disclosed are a process for preparing a thermal ink jet printhead containing the aforementioned polymers and processes for preparing the aforementioned polymers.

Abstract: A polysulfone composition is formed from a solution of a polysulfone and a free radical polymerizable monomer exposed to ultraviolet light to form a blend of the polysulfone and copolymers of activated polysulfone and polymerized monomer having polymer segments covalently bonded to each other. The blend is separated from solvent of the solution to form a solid comprising the blend throughout its bulk matrix.

Abstract: Polyalkenylaromatic-polyethylene copolymers are prepared using protected functional organolithium initiators. Polymerization of an alkenylsubstituted aromatic monomer followed by ethylene, results in a protected functional block polystyrene-co-polyethylenyllithium. Termination with a functionalizing agent followed by deprotection produces polymeric products with high functionalization at the initiating chain-end and at least partial functionalization at the terminal chain-end.

Abstract: Disclosed is a process which comprises reacting a polymer of the general formula ##STR1## wherein x is an integer of 0 or 1, A is one of several specified groups, such as ##STR2## B is one of several specified groups, such as ##STR3## or mixtures thereof, and n is an integer representing the number of repeating monomer units, with an acetyl halide and dimethoxymethane in the presence of a halogen-containing Lewis acid catalyst and methanol, thereby forming a haloalkylated polymer. In a specific embodiment, the haloalkylated polymer is then reacted further to replace at least some of the haloalkyl groups with photosensitivity-imparting groups. Also disclosed is a process for preparing a thermal ink jet printhead with the aforementioned polymer.

Abstract: Polymer compositions comprising phenol/formaldehyde systems and polyarylsulphones having epoxy pendent or end groups are disclosed together with novel epoxy-ended polyarylsulphones and novel cross-linked epoxy-ended polyarylsulphones. The compositions can be both unreinforced and reinforced with fibres and/or other fillers.

Abstract: A process is provided for preparing poly(arylene sulfide)/poly(arylene sulfide sulfone) block copolymer comprising: contacting poly(arylene sulfide) prepolymer, a dihaloaromatic sulfone, a sulfur source, and a polar organic compound under polymerization conditions, wherein said prepolymer is prepared by contacting a dihaloaromatic compound, a phenolic compound, a polar organic compound, and a sulfur source under polymerization conditions.

Abstract: A surface covering including a blend of a silane-grafted ethylene/vinyl acetate polymer and an ungrafted thermoplastic polymer retains the desirable balance between indentation, tensile strength and elongation of a fully grafted EVA while permitting the reprocessibility of scrap material. Preferably, the silane graft density is one graft per about 100 carbons to one graft per about 5,000 carbons. The preferred EVA has about 18% to about 28% vinyl acetate.

Abstract: This invention relates to mixtures of short fibers of varying lengths, diameters and aspect ratios composed of an anisotropic polymer, to compositions containing said fibers and one or more thermoplastic or thermoset resins, and to a process for forming said mixtures.

Abstract: A molecular composite system consisting essentially of a para-oriented benzobisazole polymer and a matrix polymer, poly(2-acrylamido-2-methylpropanesulfonic acid).

Abstract: Curable compositions are made from blends of polycyanate ester of polyhydric phenols and amorphous, aromatic thermoplastic resins which are initially soluble in the polycyanate ester but which phase separate during curing of the polycyanate ester.

Abstract: Fiber composite useful in automotive construction and the aerospace industry are composed of a plastics matrix and reinforcing fibers, this plastics matrix comprising a mixture of from 90 to 40% by weight of polyether sulfone and 10 to 60% by weight of polyether ketone.

Abstract: A copolymer of sulfur dioxide and polyalkylpolysilylstyrene composed of repeating units of formula I: ##STR1## where R is a lower alkyl group, p is an integer between 2 and 5, q in an integer between 1 and 10 representing the sequence length of polyalkylpolysilylstyrene, and n is a number between 5 and 10,000, and having a number-average molecular weight of 2,000 to 2,000,000. This copolymer is a novel and useful positive resist material which is highly sensitive to light, or electron-beam or X-ray radiation and is of high dry etching resistance.

Abstract: Novel compositions of matter comprising semi-interpenetrating polymer networks resulting from the reaction between a poly(vinyl benzyl ether) of a polyphenol and engineering condensation thermoplastic may be used as components in a laminate when coated on a reinforcement or substrate. The resulting laminates which may be employed in electric circuit boards will possess desirable electrical and thermal properties as exemplified by a high glass transition temperature and a low dielectric constant.

Abstract: A process for enhancing the fabrication of thermoplastic polymers entailing the addition of from 0.01 to 1 part, per hundred parts of thermoplastic polymer, of a processing aid, said processing aid comprising a processing additive, such as a silicone or a polyol, and a processing adjuvant, such as a phosphate.

Abstract: The invention relates to a heat-curable binder mixture which comprises an organic synthetic resin A and a crosslinking agent B. Said synthetic resin A can be an epoxy resin, a polyester resin or an acrylate resin having a number average molecular weight of 500 to 20,000 and at least 0.2 equivalent per 100 g of resin of primary and/or secondary amino groups and/or hydroxyl groups, and said crosslinking agent B is an organic compound having at least 2 .beta.-alkoxyalkyl ester groups per molecule.

Abstract: A solution of a non-reactive polymer in a liquid oxazoline which may include a reactive additive such as a polyisocyanate to provide solid polymers by interpolymerization of the oxazoline and reactive additive are described.

Abstract: A block copolymer composed of polyphenylene sulfide segments and aromatic sulfide sulfone polymer segments and having a logarithmic viscosity [.eta.], determined at 206.degree. C. for its solution in alpha-chloronaphthalene in a polymer concentration of 0.4 g/100 ml of solution and calculated in accordance with the equation [.eta.]=ln (relative viscosity)/polymer concentration, of 0.03 to 1.0. A resin composition comprising the block copolymer and polyphenylene sulfide and/or an aromatic sulfide sulfone polymer and optionally a filler. The block copolymer and the resin composition have improved mechanical strength and are suitable, for example, for encapsulation of electronic component parts.

Abstract: This invention describes the preparation of reactive engineering thermoplastics containing arylcyclobutene groups pendant to an aromatic ring. The polymers are prepared by alkylation or acylation of an engineering thermoplastic which contains one or more aromatic groups capable of being alkylated or acylated with a suitable arylcyclobutene alkylating or acylating agent. The prepared reactive engineering thermoplastics containing pendant arylcyclobutene groups may be cross-linked and cured by heating above about 200.degree. C.

Abstract: A curable polymeric composition exhibiting good low temperature flexibility comprising about 50-90 parts by weight chlorinated polyethylene or chlorosulfonated polyethylene containing about 30-45 weight percent chlorine, and about 10-50 parts by weight of an ethylene terpolymer of 48-74 weight percent ethylene, 20-40 weight percent alkyl acrylate wherein the alkyl group contains 4-9 carbon atoms, and 6-12 weight percent carbon monoxide or sulfur dioxide. Such polymeric blends are especially useful for low temperature applications in contact with oil, e.g. automotive seals and hoses.

Abstract: A block copolymer comprising a polyphenylenesulfide portion and a polysulfone portion, and having a logarithmic viscosity [.eta.] in the range of 0.03 to 1.0, said logarithmic viscosity [.eta.] being a value calculated by the following equation from a relative viscosity measured at 206.degree. C. for a solution of a polymer in .alpha.-chloronaphthalene in a polymer concentration of 0.4 g/100 ml.[.eta.]=ln (relative viscosity)/polymer concentration;and a resin composition comprising a block copolymer composed of a polyphenylenesulfide portion and a polysulfone portion, polyphenylenesulfide and/or polysulfone, and if required, a filler.

Abstract: The present invention relates to polythiophenes, particularly regioregular head-to-tail poly(3-alkylthiophenes) (HT-PATs), block copolymers made therefrom, and their methods of formation. The present invention provides HT-PATs with well-defined, specific end-groups, functionalization of the defined HT-PATs, and incorporation of end group functionalized HT-PATs into block copolymers with structural polymers. The intrinsically conductive diblock and triblock copolymers, formed from the HT-PATs, have excellent conductivity and low polydispersities that are useful in a number of applications. The block copolymers of the present invention have been found to exhibit conductivities that range from a low of 10?8 S/cm for certain applications to as high as several hundred S/cm or more.

Abstract: The present invention relates to polythiophenes, particularly regioregular head-to-tail poly(3-alkylthiophenes) (HT-PATs), block copolymers made therefrom, and their methods of formation. The present invention provides HT-PATs with well-defined, specific end-groups, functionalization of the defined HT-PATs, and incorporation of end group functionalized HT-PATs into block copolymers with structural polymers. The intrinsically conductive diblock and triblock copolymers, formed from the HT-PATs, have excellent conductivity and low polydispersities that are useful in a number of applications. The block copolymers of the present invention have been found to exhibit conductivities that range from a low of 10?8 S/cm for certain applications to as high as several hundred S/cm or more.