Nitrogen Atom Is Part Of A Bridged Or Fused Ring System Patents (Class 526/259)
  • Patent number: 10519265
    Abstract: The present technology relates to a polymeric material including a plurality of polymer subunits and an active cross-linker, wherein the active cross-linker is covalently linked to the plurality of polymer subunits. The active cross-linker offers a key building block for constructing novel molecular architecture in chemomechanical soft materials and illustrates a new approach to tailor material properties.
    Type: Grant
    Filed: March 16, 2018
    Date of Patent: December 31, 2019
    Assignee: BRANDEIS UNIVERSITY
    Inventors: Ye Zhang, Bing Xu
  • Patent number: 10470874
    Abstract: The invention relates to novel optical elements having improved UV protection. The optical element comprises a light adjustable optical element with a UV absorbent layer applied to at least one surface of the optical element. The invention is particularly useful in light adjustable intraocular lenses.
    Type: Grant
    Filed: July 20, 2015
    Date of Patent: November 12, 2019
    Assignee: RxSight, Inc.
    Inventors: Robert H. Grubbs, Shiao H. Chang
  • Patent number: 10421830
    Abstract: The present invention relates to novel materials particularly useful for ophthalmic applications and methods for making and using the same. More particularly, the present invention relates to relatively soft, optically transparent, foldable, high refractive index materials particularly suited for use in the production of intraocular lenses, contact lenses, and other ocular implants and to methods for manufacturing and using the same.
    Type: Grant
    Filed: April 13, 2015
    Date of Patent: September 24, 2019
    Assignee: KEY MEDICAL TECHNOLOGIES, INC.
    Inventors: Khalid Mentak, Anthony Keslinke, Kevin Phan
  • Patent number: 10188774
    Abstract: Provided is a method for producing an antithrombotic coating material in which a high molecular weight polymer can be obtained by a solution polymerization using a radical polymerization initiator. The above-mentioned task is achieved by a method for producing an antithrombotic coating material, including steps of: preparing a methanol solution containing a monomer represented by formula (1): wherein in formula (1), R1, R2, and R3 are the same as those described in the specification, respectively; adding a radical polymerization initiator having a 10-hour half-life temperature of 60° C. or less to the methanol solution to prepare a polymerization reaction liquid; and polymerizing the monomer.
    Type: Grant
    Filed: March 10, 2016
    Date of Patent: January 29, 2019
    Assignee: TERUMO KABUSHIKI KAISHA
    Inventor: Takao Anzai
  • Patent number: 10156787
    Abstract: A composition for forming an interlayer insulating film including a polymerizable monomer, an alkali-soluble elastomer containing a polymerizable group, an imide compound represented by general formula (z-1), and a polymerization initiator, an interlayer insulating film containing a polymerized product thereof, a method for forming an interlayer insulating film pattern, and a device including the interlayer insulating film on a support. In the formula (z-1), R1 and R2 represent a hydrogen atom or an alkyl group having 1 to 5 carbon atoms, Rz00 represents a divalent organic group containing an aliphatic hydrocarbon group and/or an aromatic hydrocarbon group, Rz01 and Rz02 represent an alkyl group or an alkoxy group, and n1 and n2 are 0 or 1.
    Type: Grant
    Filed: March 23, 2017
    Date of Patent: December 18, 2018
    Assignee: TOKYO OHKA KOGYO CO., LTD.
    Inventor: Kazuhide Uno
  • Patent number: 10100226
    Abstract: The present invention relates to anaerobically curable compositions demonstrating resistance to elevated temperature conditions.
    Type: Grant
    Filed: May 3, 2016
    Date of Patent: October 16, 2018
    Assignee: HENKEL IP & HOLDING GMBH
    Inventors: Shabbir Attarwala, Qinyan Zhu, Klaus Schindler
  • Patent number: 9926450
    Abstract: The present invention provides a compound capable of improving the dispersibility of color pigments in a water-insoluble solvent; and a pigment-dispersing agent. The present invention also provides a pigment composition, a pigment dispersion, and a toner, which have satisfactory tinting strength. The present invention provides the compound containing a polymer having a monomer unit having a specific chemical structure, the compound having a moiety also having a specific structure.
    Type: Grant
    Filed: August 27, 2014
    Date of Patent: March 27, 2018
    Assignee: CANON KABUSHIKI KAISHA
    Inventors: Masashi Kawamura, Yasuaki Murai, Kosuke Mukumoto, Yuki Tsujii, Ayano Mashida, Waka Hasegawa, Masanori Seki, Takayuki Toyoda, Chiaki Nishiura, Masashi Hirose
  • Patent number: 9792944
    Abstract: A recording material includes a dye-bonded polymer compound which contains a polymer compound to which a one-photon absorption dye is bonded, and a glass transition temperature of the recording material is higher than 200° C. An optical information recording medium includes a recording layer and an intermediate layer adjacent to the recording layer, and the recording layer contains the above-described recording material.
    Type: Grant
    Filed: November 18, 2015
    Date of Patent: October 17, 2017
    Assignee: FUJIFILM Corporation
    Inventors: Hidehiro Mochizuki, Tetsuya Watanabe
  • Patent number: 9774042
    Abstract: The present invention relates to a metal phthalocyanine polymer that includes a repeating structural unit obtained by amide bonding of a structural unit represented by the following general formula (1a) to a structural unit represented by the following general formula (2a): With general formula (1a), L is a divalent or trivalent metal ion belonging to Period 3 to Period 5 on the long-form periodic table. With general formula (2a), M is a divalent or trivalent metal ion belonging to Period 3 to Period 5 on the long-form periodic table.
    Type: Grant
    Filed: April 11, 2014
    Date of Patent: September 26, 2017
    Assignee: KUMIAI CHEMICAL INDUSTRY CO., LTD.
    Inventors: Nobukatsu Nemoto, Izuru Kobayashi, Kazuto Umezu, Masaji Akimoto
  • Patent number: 9616395
    Abstract: Disclosed are membranes formed from self-assembling diblock copolymers of the formula (I): wherein R1-R4, n, and m are as described herein, which find use in preparing porous membranes. Embodiments of the membranes contain the diblock copolymer self-assembled into a cylindrical morphology. Also disclosed is a method of preparing such membrane which involves spray coating a polymer solution containing the diblock copolymer to obtain a thin film, followed by annealing the thin film in a solvent vapor and/or soaking in a solvent or mixture of solvents to form a nanoporous membrane.
    Type: Grant
    Filed: March 12, 2015
    Date of Patent: April 11, 2017
    Assignee: Pall Corportaion
    Inventors: Khaled Abdel-Hakim Helmy Aamer, Amarnauth Singh, Selina Shi
  • Patent number: 9604181
    Abstract: Disclosed are membranes formed from self-assembling block copolymers, for example, a diblock copolymer of the formula (I): wherein R1—R4, n, and m are as described herein, which find use in preparing nanoporous membranes. Embodiments of the membranes contain the block copolymer that self-assembles into a cylindrical morphology. Also disclosed is a method of preparing such membrane which involves spray coating a polymer solution containing the diblock copolymer to obtain a thin film, followed by annealing the thin film in a solvent vapor and/or soaking in a solvent or mixture of solvents to form a nanoporous membrane.
    Type: Grant
    Filed: March 12, 2015
    Date of Patent: March 28, 2017
    Assignee: Pall Corporation
    Inventors: Khaled Abdel-Hakim Helmy Aamer, Amarnauth Singh, Selina Shi
  • Patent number: 9592476
    Abstract: Disclosed are membranes formed from self-assembling block copolymers, for example, a diblock copolymer of the formula (I): wherein R1-R4, n, and m are as described herein, which find use in preparing nanoporous membranes. Embodiments of the membranes contain the block copolymer that self-assembles into a cylindrical morphology. Also disclosed is a method of preparing such membrane which involves hybrid casting a polymer solution containing the block copolymer to obtain a thin film, followed by evaporation of some of the solvent from the thin film, and coagulating the resulting this film in a bath containing a nonsolvent or poor solvent for the block copolymer.
    Type: Grant
    Filed: May 30, 2014
    Date of Patent: March 14, 2017
    Assignee: Pall Corporation
    Inventors: Khaled Abdel-Hakim Helmy Aamer, David Lukas Grzenia
  • Patent number: 9592477
    Abstract: Disclosed are membranes formed from self-assembling diblock copolymers of the formula (I): wherein R1-R4, n, and m are as described herein, which find use in preparing porous membranes. Embodiments of the membranes contain the diblock copolymer that self-assembles into a cylindrical morphology. Also disclosed is a method of preparing such a membrane which involves hybrid casting a polymer solution containing the diblock copolymer to obtain a thin film, followed by evaporation of some of the solvent from the thin film, and coagulating the resulting this film in a bath containing a nonsolvent or poor solvent for the diblock copolymer.
    Type: Grant
    Filed: May 30, 2014
    Date of Patent: March 14, 2017
    Assignee: Pall Corporation
    Inventors: Khaled Abdel-Hakim Helmy Aamer, David Lukas Grzenia
  • Patent number: 9593219
    Abstract: Disclosed are membranes formed from self-assembling block copolymers, for example, diblock copolymers of the formula (I): wherein R1-R4, n, and m are as described herein, which find use in preparing nanoporous membranes. Embodiments of the membranes contain a block copolymer that self-assembles into a cylindrical morphology. Also disclosed is a method of preparing such membrane which involves spin coating a polymer solution containing the block copolymer to obtain a thin film, followed by annealing the thin film in a solvent vapor and/or soaking in a solvent or mixture of solvents to form a nanoporous membrane.
    Type: Grant
    Filed: May 30, 2014
    Date of Patent: March 14, 2017
    Assignee: Pall Corporation
    Inventors: Khaled Abdel-Hakim Helmy Aamer, Selina Shi
  • Patent number: 9593218
    Abstract: Disclosed are self-assembled structures formed from self-assembling diblock copolymers of the formula (I): wherein R1-R4, n, and m are as described herein, which find use in preparing nanoporous membranes. In embodiments of the self-assembled structure, the block copolymer self-assembles into a cylindrical morphology. Also disclosed is a method of preparing such self-assembled structure which involves spin coating a polymer solution containing the diblock copolymer to obtain a thin film, followed by solvent annealing of the film. Further disclosed is a method of preparing porous membranes from the self-assembled structures.
    Type: Grant
    Filed: May 30, 2014
    Date of Patent: March 14, 2017
    Assignee: Pall Corporation
    Inventors: Khaled Abdel-Hakim Helmy Aamer, Selina Shi
  • Patent number: 9580530
    Abstract: The present invention relates to anaerobically curable compositions containing a benzoxazine component and which demonstrates resistance to elevated temperature conditions and/or accelerated cure speed.
    Type: Grant
    Filed: March 30, 2012
    Date of Patent: February 28, 2017
    Assignee: Henkel IP & Holding GmbH
    Inventors: Shabbir Attarwala, Qinyan Zhu, David P. Birkett, Martin Wyer, David Mullen, Lee McGarry
  • Patent number: 9382340
    Abstract: Compositions comprising a cross-linked isocyanurate homopolymer or other cross-linked triazine homopolymers in the form of a microbead that is porous or non-porous; methods of making; and methods of using the compositions are disclosed.
    Type: Grant
    Filed: March 1, 2012
    Date of Patent: July 5, 2016
    Assignee: Jordi Labs, Inc.
    Inventors: Howard C. Jordi, Mark A. Jordi
  • Patent number: 9247736
    Abstract: A multi-layer film for reducing microbial contamination on a surface. The multi-layer film can include a core layer having a first surface and a second surface opposite the first surface, an adhesive layer disposed adjacent the first surface of the core layer, and an antimicrobial layer disposed adjacent the second surface. The antimicrobial layer can include a cross-linked matrix and an antimicrobial agent dispersed within the cross-linked matrix, where the cross-linked matrix is derived from a polymerizable precursor comprising a material selected from the group consisting of a polymerizable monomer, a polymerizable polymer having a molecular weight of about 1,000 or less, and combinations thereof.
    Type: Grant
    Filed: December 14, 2006
    Date of Patent: February 2, 2016
    Assignee: 3M Innovative Properties Company
    Inventors: Caroline M. Ylitalo, Mahfuza B. Ali, Christopher B. Walker, Jr., Gerald R. A. Hofmann, Matthew T. Scholz, Alphonsus V. Pocius, Linda K. M. Olson
  • Patent number: 9233069
    Abstract: The present invention is directed to ophthalmic devices that are loaded with therapeutic agent. The devices provide prolonged release of the therapeutic agent to the eye. The ophthalmic devices are typically formed of an ophthalmic material that is particularly desirable for the loading of therapeutic agent and/or the therapeutic agent is typically particularly desirable for loading to the ophthalmic material.
    Type: Grant
    Filed: July 20, 2009
    Date of Patent: January 12, 2016
    Assignee: NOVARTIS AG
    Inventors: Brett E. Thomas, Stephen J. Van Noy, Chi-Chun Tsai
  • Patent number: 9212241
    Abstract: An optical film including a polymer including a repeating unit A including a repeating unit represented by the following Chemical Formulas 1 to 3, or a combination thereof; and a repeating unit B derived from a monomer having an unsaturated bond copolymerizable with the repeating unit A, wherein the optical film has a short wavelength dispersion of an in-plane phase-difference value (Re) (450 nm/550 nm) ranging from about 0.81 to about 1.20, and a long wavelength dispersion of an in-plane phase-difference value (Re) (650 nm/550 nm) ranging from about 0.90 to about 1.18: wherein, in Chemical Formulas 1 to 3, the variables R1 to R21 are defined herein.
    Type: Grant
    Filed: December 27, 2012
    Date of Patent: December 15, 2015
    Assignees: SAMSUNG ELECTRONICS CO., LTD., CHEIL INDUSTRIES INC.
    Inventors: Hyung Jun Kim, Moon Yeon Lee, Kyu Yeol In, Woo Joong Kim, Jong Hoon Won, Myung Sup Jung, Won Cheol Jung
  • Patent number: 9076972
    Abstract: Porphyrin polymers of Structure 1, where n is an integer (e.g., 1, 2, 3, 4, 5, or greater) are synthesized by the method shown in FIGS. 2A and 2B. The porphyrin polymers of Structure 1 are soluble in organic solvents such as 2-MeTHF and the like, and can be synthesized in bulk (i.e., in processes other than electropolymerization). These porphyrin polymers have long excited state lifetimes, making the material suitable as an organic semiconductor for organic electronic devices including transistors and memories, as well as solar cells, sensors, light-emitting devices, and other opto-electronic devices.
    Type: Grant
    Filed: May 31, 2013
    Date of Patent: July 7, 2015
    Assignee: ARIZONA BOARD OF REGENTS, A BODY CORPORATE OF THE STATE OF ARIZONA ACTING FOR AND ON BEHALF OF ARIZONA STATE UNIVERSITY
    Inventors: John Devens Gust, Jr., Paul Anthony Liddell
  • Patent number: 9056934
    Abstract: The present invention relates to novel materials particularly useful for ophthalmic applications and methods for making and using the same. More particularly, the present invention relates to relatively soft, optically transparent, foldable, high refractive index materials particularly suited for use in the production of intraocular lenses, contact lenses, and other ocular implants and to methods for manufacturing and using the same.
    Type: Grant
    Filed: March 22, 2013
    Date of Patent: June 16, 2015
    Assignee: KEY MEDICAL TECHNOLOGIES, INC.
    Inventor: Khalid Mentak
  • Publication number: 20150147697
    Abstract: A resist composition comprising a polymer comprising recurring units (a) of formula (1) and having a Mw of 1,000-500,000 as base resin is provided. R1 is H or methyl, X is a single bond or —C(?O)—O—R5—, R2 is a single bond or C1-C4 alkylene, R3 is C2-C8 alkylene, R4 is an acid labile group, R5 is a single bond or C1-C4 alkylene, and 0<a?1.0. The composition is of dual-tone type in that an intermediate dose region of resist film is dissolved in a developer, but unexposed and over-exposed regions of resist film are insoluble.
    Type: Application
    Filed: November 25, 2014
    Publication date: May 28, 2015
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Jun Hatakeyama, Masayoshi Sagehashi
  • Patent number: 9040647
    Abstract: Provided are: a method for controlling the decoloration reaction rate and color density of a fast light-modulating material to levels suitable for practical use; and a fast light-modulating material having a decoloration reaction rate and a color density which are suitable for practical use. A polymer obtained by polymerizing a paracyclophane-bridged hexaarylbisimidazole compound having a radical-polymerizable group, and a copolymer obtained by copolymerizing the compound with a (meth)acrylic acid compound or a sensitizer having a radical-polymerizable group can achieve controlled decoloration reaction rates, photosensitivity and color tones.
    Type: Grant
    Filed: November 30, 2010
    Date of Patent: May 26, 2015
    Assignees: MITSUBISHI GAS CHEMICAL COMPANY, INC.
    Inventors: Jiro Abe, Atsuhiro Tokita, Takeru Horino, Toyoji Oshima, Atsushi Kimoto
  • Publication number: 20150140497
    Abstract: A resist composition which generates acid upon exposure and exhibits changed solubility in a developing solution under action of acid, and which includes a base component (A) which exhibits changed solubility in a developing solution under action of acid, the base component (A) including a polymeric compound (A1) having a structural unit (a0) represented by general formula (a0-0) shown below (wherein V11 represents an aliphatic cyclic group with or without a substituent; R1 represents a lactam-containing cyclic group or a sultam-containing cyclic group; Y1 represents an oxygen atom (—O—), an ester bond (—C(?O)—O—) or a single bond; and W2 represents a group formed by a polymerization reaction of a polymerizable group-containing group).
    Type: Application
    Filed: November 13, 2014
    Publication date: May 21, 2015
    Inventors: Masatoshi Arai, Yoshiyuki Utsumi
  • Patent number: 9017918
    Abstract: A polymer is obtained from a hydroxyphenyl methacrylate monomer having an acid labile group substituted thereon. A positive resist composition comprising the polymer as a base resin has a very high contrast of alkaline dissolution rate before and after exposure, a high resolution, a good profile and minimal line edge roughness of a pattern after exposure, a retarded acid diffusion rate, and good etching resistance.
    Type: Grant
    Filed: June 1, 2011
    Date of Patent: April 28, 2015
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Jun Hatakeyama, Seiichiro Tachibana, Koji Hasegawa
  • Patent number: 9012581
    Abstract: Disclosed are soft, high refractive index, acrylic device materials. The materials contain a copolymeric additive for glistening resistance.
    Type: Grant
    Filed: August 23, 2010
    Date of Patent: April 21, 2015
    Assignee: Novartis AG
    Inventor: Walter R. Laredo
  • Publication number: 20150094437
    Abstract: Arylamine compounds comprising an arylamine core and at least one addition-polymerizable group X selected from the group consisting of formula (A); said addition polymerizable group attached to one ring of the arylamine core through a spacer of general formula (1): C(R1R2)—(C(R3R4))m; wherein, R1 and R2, independent of one another, each represent a C1-C8 alkyl group or an aryl group of from 5 to 30 carbon atoms, R3 and R4, independent of one another, are hydrogen, a C1 to C8 alkyl group or an aryl group of from 5 to 30 carbon atoms and m is an integer of from 0 to 6, or through a fluorene subunit of general formulae (2) or (3); wherein R5 represents hydrogen, C1 to C8-alkyl, or C5 to C30 aryl, and R6 and R7, independently of one another represent C1 alkylene or a C5 to C30 arylene group, provided that R6 and R7 both carry an addition-polymerizable group X and R5 is not hydrogen if R6 is methylene.
    Type: Application
    Filed: December 20, 2012
    Publication date: April 2, 2015
    Inventors: Jean Raphael Caille, Jonathan Maunoury
  • Publication number: 20150065670
    Abstract: Asymmetric bifunctional silyl (ABS) monomers comprising covalently linked pharmaceutical, chemical and biological agents are described. These agents can also be covalently bound via the silyl group to delivery vehicles for delivering the agents to desired targets or areas. Also described are delivery vehicles which contain ABS monomers comprising covalently linked agents and to vehicles that are covalently linked to the ABS monomers. The silyl modifications described herein can modify properties of the agents and vehicles, thereby providing desired solubility, stability, hydrophobicity and targeting.
    Type: Application
    Filed: September 10, 2014
    Publication date: March 5, 2015
    Inventors: Joseph M. DeSimone, Mathew Finniss, Mary Napier, Ashish Pandya, Matthew Parrott
  • Patent number: 8956739
    Abstract: A polymer and an organic light-emitting device including the polymer.
    Type: Grant
    Filed: August 3, 2011
    Date of Patent: February 17, 2015
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Hye-yeon Yang, Ho-suk Kang, Jhun-mo Son
  • Publication number: 20150038612
    Abstract: Novel methods and materials particularly useful for ophthalmic applications and to methods for making and using the same are disclosed herein. More particularly, relatively soft, optically transparent, foldable, high refractive index materials particularly suited for use in the production of intraocular lenses, contact lenses, and other ocular implants and to methods for manufacturing and implanting IOLs made therefrom are disclosed.
    Type: Application
    Filed: October 17, 2014
    Publication date: February 5, 2015
    Inventor: Khalid Mentak
  • Patent number: 8946366
    Abstract: Disclosed herein are a cyclic olefin compound, a photoreactive polymer, and an alignment layer comprising the photoreactive polymer, where the cyclic olefin compound can be used to provide the photoreactive polymer having not only excellences in liquid crystal alignment and alignment rate but also readiness for change in the alignment direction depending on the polarization direction.
    Type: Grant
    Filed: September 23, 2011
    Date of Patent: February 3, 2015
    Assignee: LG Chem, Ltd.
    Inventors: Dong-Woo Yoo, Sung-Ho Chun, Dai-Seung Choi, Sung-Kyoung Lee
  • Patent number: 8945726
    Abstract: Provided are a polymer for an organic electroluminescent element, which improves light emission efficiency of the element and is applicable to a wet process, and an organic electroluminescent element, which is obtained using the polymer. The polymer for an organic electroluminescent element includes a repeating unit represented by the following general formula (1) in a repeating unit constituting a main chain. Further, the organic electroluminescent element includes organic layers between an anode and a cathode laminated on a substrate, in which at least one of the organic layers includes the polymer for an organic electroluminescent element, including an indolocarbazole skeleton in the repeating unit constituting a main chain. In the general formula (1), Z represents an N-indolocarbazolyl group, W represents a charge transporting group, m and n represent molar ratios, m represents 0 to 95 mol %, and n represents 5 to 100 mol.
    Type: Grant
    Filed: February 7, 2011
    Date of Patent: February 3, 2015
    Assignee: Nippon Steel & Sumikin Chemical Co., Ltd.
    Inventors: Hiroshige Tanaka, Tohru Asari, Kazuto Shiraishi, Hiroyuki Hayashida, Yasushi Koishikawa, Kazuaki Yoshimura, Takaya Ishiyama
  • Patent number: 8927191
    Abstract: A resist composition including a base component (A) which exhibits changed solubility in a developing solution under action of acid and an acid-generator component (B) which generates acid upon exposure, wherein the base component (A) includes a polymeric compound (A1) having a structural unit (a5) represented by general formula (a5-1). In the formula (a5-1), R represents a hydrogen atom, an alkyl group of 1 to 5 carbon atoms or a halogenated alkyl group of 1 to 5 carbon atoms; each of Ra and Rb independently represents a hydrocarbon group which may have a substituent, and Ra and Rb may be mutually bonded to form a ring.
    Type: Grant
    Filed: January 17, 2012
    Date of Patent: January 6, 2015
    Assignee: Tokyo Ohka Kogyo Co., Ltd.
    Inventors: Junichi Tsuchiya, Daichi Takaki, Masatoshi Arai, Daiju Shiono, Tomoyuki Hirano
  • Publication number: 20140370418
    Abstract: The invention relates to a monomer (6, 14) carrying an imidazole-type heterocycle (3). According to the invention, the chemical structure of said monomer (6, 14) comprises at least one unit of formula (I) wherein R1 comprises an alkenyl grouping and R2 comprises a grouping for protecting one of the nitrogen atoms of the heterocycle. The invention also relates to a monomer carrying a benzimidazole-type heterocycle, and to protected polymers obtained from said monomers, deprotected polymers produced by the protected polymers, a proton exchange membrane based on deprotected polymers, and a fuel cell provided with said membrane. Furthermore, the invention relates to methods for producing the above-mentioned monomers and polymers.
    Type: Application
    Filed: September 4, 2014
    Publication date: December 18, 2014
    Applicants: PEUGEOT CITROEN AUTOMOBILES S.A., CNRS (CENTRE NATIONAL DE LA RECHERCHE SCIENTIFIQUE)
    Inventors: Xavier Glipa, Bruno Ameduri, Louis Delon, Deborah Jones, Jacques Roziere, Guillaume Frutsaert
  • Publication number: 20140371341
    Abstract: The invention relates to a dental restorative material which comprises a thermolabile compound of Formula I: [(Z1)m-Q1-X)]k-T-[Y-Q2-(Z2)n]l??Formula I, in which T represents a thermolabile unit which contains at least one thermolabile group based on non-covalent interactions, Z1 and Z2 in each case independently represent a polymerizable group selected from vinyl groups, CH2?CR1—CO—O— and CH2?CR1—CO—NR2— or an adhesive group selected from —Si(OR)3, —COOH, —O—PO(OH)2, —PO(OH)2, —SO2OH and —SH, Q1 in each case independently is missing or represents an (m+1)-valent linear or branched aliphatic C1-C20 radical which can be interrupted by —O—, —S—, —CO—O—, —O—CO—, —CO—NR3—, —NR3—CO—, —O—CO—NR3—, —NR3—CO—O— or —NR3—CO—NR3—, Q2 in each case independently is missing or represents an (n+1)-valent linear or branched aliphatic C1-C20 radical which can be interrupted by —O—, —S—, —CO—O—, —O—CO—, —CO—NR3—, —NR3—CO—, —O—CO—NR3—, —NR3—CO—O— or —NR3—CO—NR3—, X and Y in each case independently are missing or represent —O—,
    Type: Application
    Filed: September 10, 2012
    Publication date: December 18, 2014
    Applicant: IVOCLAR VIVADENT AG
    Inventors: Norbert Moszner, Thomas Hirt, Kai Rist, Ulrich Salz, Christoph Weder, Gina Fiore, Christian Heinzmann, Volker Rheinberger
  • Patent number: 8907033
    Abstract: A polymeric material including units capable of having a cationic charge at a pH of from about 4 to about 12; provided that the polymeric material has an average cationic charge density from about 2.75 or less units per 100 daltons molecular weight at a pH of from about 4 to about 12. The polymeric material is a suds enhancer and a suds volume extender for hand dishwashing compositions and personal care products such as soaps, shaving cream foam, foaming shaving gel, foam depiliatories and shampoos. The polymers are also effective as a soil release agent in fabric cleaning compositions. The polymers are also useful in agrochemical foam, fire-fighting foam, hard surface cleaner foam, and coagulant for titanium dioxide in paper making.
    Type: Grant
    Filed: October 14, 2013
    Date of Patent: December 9, 2014
    Assignee: Solvay USA Inc.
    Inventors: Vance Bergeron, Dominic Wai-Kwing Yeung, Jean-Francois Bodet, Mark Robert Sivik, Bernard William Kluesener, William Michael Scheper
  • Publication number: 20140353628
    Abstract: The present teachings relate to new semiconducting polymers. The polymers disclosed herein can exhibit high carrier mobility and/or efficient light absorption/emission characteristics, and can possess certain processing advantages such as solution-processability and/or good stability at ambient conditions.
    Type: Application
    Filed: February 24, 2014
    Publication date: December 4, 2014
    Inventor: Antonio Facchetti
  • Publication number: 20140329929
    Abstract: The invention relates to a dental restorative material which comprises a thermolabile or photolabile polymerizable compound of Formula I: [(Z1)m-Q1-X)]k-T-[Y-Q2-(Z2)n]1??Formula I, in which T represents a thermolabile or photolabile group, Z1 and Z2 in each case independently represent a polymerizable group selected from vinyl groups, CH2?CR1—CO—O— and CH2?CR1—CO—NR2— or an adhesive group selected from —Si(OR)3, —COOH, —O—PO(OH)2, —PO(OH)2, —SO2OH and —SH, wherein at least one Z1 or Z2 is a polymerizable group, Q1 in each case independently is missing or represents an (m+1)-valent linear or branched aliphatic C1-C20 radical which can be interrupted by —O—, —S—, —CO—O—, —O—CO—, —CO—NR3—, —NR3—CO—, —O—CO—NR3—, —NR3—CO—O— or —NR3—CO—NR3—, Q2 in each case independently is missing or represents an (n+1)-valent linear or branched aliphatic C1-C20 radical which can be interrupted by —O—, —S—, —CO—O—, —O—CO—, —CO—NR3—, —NR3—CO—, —O—CO—NR3—, —NR3—CO—O— or —NR3—CO—NR3—, X and Y in each case independently are missing
    Type: Application
    Filed: September 10, 2012
    Publication date: November 6, 2014
    Applicant: IVOCLAR VIVADENT AG
    Inventors: Norbert Moszner, Iris Lamparth, Thorsten Bock, Urs Karl Fischer, Ulrich Salz, Volker Rheinberger, Robert Liska
  • Patent number: 8859182
    Abstract: A resist composition contains (A) a resin having a structural unit represented by the formula (I), (B) an acid generator and (D) a compound represented by the formula (II), wherein R1, ring X1, R3, R4, m, and n are defined in the specification.
    Type: Grant
    Filed: February 24, 2012
    Date of Patent: October 14, 2014
    Assignee: Sumitomo Chemical Company, Limited
    Inventors: Koji Ichikawa, Takahiro Yasue, Akira Kamabuchi
  • Patent number: 8853306
    Abstract: The invention relates to a bituminous composition containing at least one bitumen and at least one polyolefin capable of forming a supramolecular assembly comprising one or more associative group(s). The invention also relates to the use of such bituminous composition for the preparation of asphalt mixtures useful for the coating of rolling surfaces, for the preparation of water-proofing coatings, and for the preparation of adhesive formulations.
    Type: Grant
    Filed: August 18, 2010
    Date of Patent: October 7, 2014
    Assignee: Ceca S.A.
    Inventors: Juan Antonio Gonzalez Leon, Gilles Barreto
  • Patent number: 8846855
    Abstract: Described herein are compositions including heterocyclic organic compounds based on fused thiophene compounds, polymers based on fused thiophene compounds, and methods for making the monomers and polymer along with uses in thin film-based and other devices.
    Type: Grant
    Filed: October 25, 2012
    Date of Patent: September 30, 2014
    Assignee: Corning Incorporated
    Inventors: Mingqian He, Jianfeng Li, James Robert Matthews, Weijun Niu, Arthur L Wallace
  • Publication number: 20140288253
    Abstract: A thiosulfate polymer includes both an electron-accepting photosensitizer component and thiosulfate groups in the same molecule, arranged in random order along the backbone. The thiosulfate polymer composition can be formulated into compositions and applied to various articles, or used to form a predetermined polymeric pattern after photothermal reaction to form crosslinked disulfide bonds, removing non-crosslinked polymer, and reaction with a disulfide-reactive material. Such thiosulfate polymer compositions can also be used to sequester metals in nanoparticulate form, and as a way for shaping human hair in hairdressing operations.
    Type: Application
    Filed: January 20, 2014
    Publication date: September 25, 2014
    Inventors: Mark R. Mis, Deepak Shukla
  • Publication number: 20140275459
    Abstract: The present invention relates to conjugated polymers. In various embodiments, the present invention provides a conjugated polymer including a repeating unit including a benzene ring conjugated with the polymer backbone, wherein the benzene ring is fused to two 5-membered rings, wherein each fused 5-membered ring includes N and at least one of O and S. In various embodiments, the present invention provides semiconductor devices including the polymer, and methods of making the polymer.
    Type: Application
    Filed: March 12, 2014
    Publication date: September 18, 2014
    Applicant: Iowa State University Research Foundation, Inc.
    Inventors: Malika Jeffries-EL, Jeremy J. Intemann, Brian C. Tlach
  • Patent number: 8835579
    Abstract: The present invention relates to a process for polymerizing (hetero)aromatic compounds under formation of aryl-aryl C—C couplings for preparing conjugated polymers with high molecular weight and high regioregularity, and to novel polymers obtainable by this process. The invention further relates to the use of the novel polymers as semiconductors or charge transport materials in optical, electrooptical or electronic devices including field effect transistors (FETs), thin film transistors (TFT), electroluminescent, photovoltaic and sensor devices.
    Type: Grant
    Filed: May 18, 2010
    Date of Patent: September 16, 2014
    Assignee: BASF SE
    Inventors: Pascal Hayoz, Mathias Dueggeli, Martin Elbs, Olivier Frederic Aebischer, Achim Lamatsch
  • Publication number: 20140220477
    Abstract: The present invention relates generally to substrates for making polymers and methods for making polymers. The present invention also relates generally to polymers and devices comprising the same.
    Type: Application
    Filed: February 5, 2014
    Publication date: August 7, 2014
    Applicant: Avertica, Inc.
    Inventor: Nicholas Brendan Duck
  • Patent number: 8796404
    Abstract: A polymer for an optical film including: a repeating unit A including a repeating unit represented by the following Chemical Formula 1; and a repeating unit B derived from a monomer including an unsaturated bond copolymerizable with the repeating unit A: wherein, in Chemical Formula 1, the variables R1 to R9 are defined herein.
    Type: Grant
    Filed: July 10, 2012
    Date of Patent: August 5, 2014
    Assignees: Samsung Electronics Co., Ltd., Cheil Industries, Inc.
    Inventors: Hyung Jun Kim, Myung-Sup Jung, Won Cheol Jung, Jong-Hoon Won, Kyu Yeol In
  • Publication number: 20140212813
    Abstract: A radiation-sensitive resin composition includes a first polymer including an acid-labile group, an acid generator to generate an acid upon exposure to radiation, and a second polymer including a fluorine atom and a functional group shown by a general formula (x). The second polymer has a fluorine atom content higher than a fluorine atom content of the first polymer. R1 represents an alkali-labile group. A represents an oxygen atom, —NR?—, —CO—O—# or —SO2—O—##, wherein the oxygen atom represented by A is not an oxygen atom bonded directly to an aromatic ring, a carbonyl group, or a sulfoxyl group, R? represents a hydrogen atom or an alkali-labile group, and “#” and “##” each indicate a bonding hand bonded to R1.
    Type: Application
    Filed: April 2, 2014
    Publication date: July 31, 2014
    Applicant: JSR CORPORATION
    Inventors: Yuusuke ASANO, Mitsuo SATOU, Hiromitsu NAKASHIMA, Kazuki KASAHARA, Yoshifumi OIZUMI, Masafumi HORI, Takanori KAWAKAMI, Yasuhiko MATSUDA, Kazuo NAKAHARA
  • Patent number: 8784684
    Abstract: A compound which has a benzoxazinone ring and an aromatic ring that directly bonds to the benzoxazinone ring, and has a mesogenic core substituted by a substituent having a polymerizable functional group is excellent in terms of durability, colorless, and exhibits a high ?n while having an azomethine bond.
    Type: Grant
    Filed: August 7, 2013
    Date of Patent: July 22, 2014
    Assignee: FUJIFILM Corporation
    Inventors: Satoshi Shimamura, Mitsuyoshi Ichihashi
  • Publication number: 20140200319
    Abstract: This disclosure relates generally to potassium ion sensors and monomers derived from such sensors. The disclosure also provides for polymers (e.g., random copolymers, nanoparticles, polymer thin films, and sensors) having polymerized monomeric potassium ion sensors as described herein. These compounds and polymers are useful for measuring intracellular and extracellular potassium ion concentrations.
    Type: Application
    Filed: February 13, 2012
    Publication date: July 17, 2014
    Applicant: Arizona Board of Regents, a body corporate of the State of Arizona acting for and on behalf of Arizo
    Inventors: Yanqing Tian, Deirdre Meldrum, Xianfeng Zhou, Fengyu Su, Roger H. Johnson, Cody Youngbull