6-membered Ring Contains A Single Nitrogen Atom Patents (Class 526/265)
  • Patent number: 10042259
    Abstract: Topcoat compositions comprise: a matrix polymer; a surface active polymer comprising a polymerized unit formed from a monomer of the following general formula (I): wherein: R1 represents H, F, methyl or fluorinated methyl; R2 represents optionally substituted C1 to C8 alkylene or optionally substituted C1 to C8 fluoroalkylene, optionally comprising one or more heteroatom; R3 represents H, F, optionally substituted C1 to C10 alkyl or optionally substituted C5 to C15 aryl, optionally comprising one or more heteroatom; R4 represents optionally substituted C1 to C8 alkyl, optionally substituted C1 to C8 fluoroalkyl or optionally substituted C5 to C15 aryl, optionally comprising one or more heteroatom; X represents O, S or NR5, wherein R5 is chosen from hydrogen and optionally substituted C1 to C5 alkyl; and a is 0 or 1; and a solvent. Also provided are coated substrates and pattern-forming methods which make use of the topcoat compositions.
    Type: Grant
    Filed: October 12, 2017
    Date of Patent: August 7, 2018
    Assignee: Rohm and Haas Electronic Materials LLC
    Inventors: Irvinder Kaur, Cong Liu, Doris Kang, Mingqi Li, Deyan Wang, Huaxing Zhou
  • Patent number: 9988342
    Abstract: Provided is a method for producing 2-aminoethyl methacrylate hydrochloride that, according to one embodiment, includes a step (A) for reacting a ketimine compound of 2-aminoethyl methacrylate with water and hydrogen chloride and obtaining a mixture containing 2-aminoethyl methacrylate hydrochloride, wherein in the step (A), the ratio of the total amount of hydrogen chloride to the total amount of ketimine compound of 2-aminoethyl methacrylate is 1.0-1.5 expressed in terms of equivalents, and the ratio of the total amount of water to the total amount of ketimine compound of 2-aminoethyl methacrylate is 1.0-2.0 expressed in terms of equivalents.
    Type: Grant
    Filed: January 26, 2016
    Date of Patent: June 5, 2018
    Assignee: MITSUBISHI GAS CHEMICAL COMPANY, INC.
    Inventors: Yuri Iida, Masaki Takemoto, Hideyuki Sato
  • Publication number: 20150105487
    Abstract: This invention relates to no-salt and mixed salt suspension polymerization processes for water-soluble monomers and resins and relates to catalysts produced from the same.
    Type: Application
    Filed: June 7, 2013
    Publication date: April 16, 2015
    Applicant: ROHM AND HAAS COMPANY
    Inventors: Takashi Masudo, Robert J. Olsen, Garth R. Parker, Jr., Jose A. Trejo
  • Patent number: 8999626
    Abstract: The present invention relates to a polymer compound including a dye, and a curable resin composition including the same. The polymer compound including the dye according to the present invention may exhibit characteristics such as excellent heat resistance, solubility, coating uniformity, chemical resistance and the like by introducing a single molecule type dye into a side chain of a polymer binder to be modified into a polymer form and applying the modified polymer to a curable composition.
    Type: Grant
    Filed: May 25, 2012
    Date of Patent: April 7, 2015
    Assignee: LG Chem, Ltd.
    Inventors: Jiyoung Park, Sunhwa Kim, Janghyun Ryu
  • Patent number: 8932710
    Abstract: To provide a pressure-sensitive adhesive optical film that can satisfy durability even when a thin pressure-sensitive adhesive layer is formed. A pressure-sensitive adhesive optical film comprising an optical film and a pressure-sensitive adhesive layer on at least one side of the optical film, wherein the pressure-sensitive adhesive layer is formed by a pressure-sensitive adhesive, comprising: a (meth)acrylic polymer having a weight average molecular weight of 1,500,000 to 2,800,000; containing, as a monomer component, 3 to 10% by weight of a heterocyclic ring-containing acrylic monomer; 0.5 to 5% by weight of a carboxyl group-containing monomer; 0.05 to 2% by weight of a hydroxyl group-containing monomer; and 83 to 96.45% by weight of an alkyl(meth)acrylate monomer, and a crosslinking agent.
    Type: Grant
    Filed: March 13, 2007
    Date of Patent: January 13, 2015
    Assignee: Nitto Denko Corporation
    Inventors: Shinichi Inoue, Kohei Yano, Masayuki Satake, Yutaka Moroishi
  • Publication number: 20140370114
    Abstract: Disclosed herein is a preparation method of homopolymer nanoparticles without using a surfactant. The homopolymer nanoparticles prepared thereby are expected to be widely used not only as a template of a semiconductor metal oxide, a drug delivery system (DDS), an electron transport layer (ETL), and a seed having vertical structural shape, but also in a high precision field such as replacement of an organic device polystyrene bead film.
    Type: Application
    Filed: June 13, 2014
    Publication date: December 18, 2014
    Inventors: Jae-Suk LEE, Santosh Kumar, Dong Woo Kim, Mohammad Changei, Hong-Joon Lee
  • Patent number: 8859099
    Abstract: A laminate having excellent weatherability and abrasion resistance as well as adhesion. The laminate comprises a base, a first layer formed by thermally curing an acrylic resin composition and a second layer formed by thermally curing an organosiloxane resin composition, all of which are formed in the mentioned order, wherein the acrylic resin composition comprises: (A) an acrylic copolymer which contains at least 70 mol % of a recurring unit represented by the following formula (A): wherein X is a hydrogen atom or methyl group, and Y is a methyl group, ethyl group, cycloalkyl group, hydroxyalkyl group having 2 to 5 carbon atoms or triazine-based ultraviolet absorber residue; (B) a blocked polyisocyanate compound; (C) a curing catalyst; and (D) a triazine-based ultraviolet absorber, and the organosiloxane resin composition comprises: (E) colloidal silica and (F) a hydrolysis condensate of an alkoxysilane.
    Type: Grant
    Filed: February 8, 2013
    Date of Patent: October 14, 2014
    Assignee: Teijin Chemicals, Ltd.
    Inventors: Toshio Kita, Shunsuke Kajiwara, Ryou Niimi, Takehiro Suga, Tatsuya Ekinaka, Nobuaki Takaoka
  • Publication number: 20140302435
    Abstract: The disclosure generally describes carrier resins, and in particular, resins used for carrier coatings which include at least one ester functional group and at least one cyclic aliphatic group containing at least one nitrogen atom in the cyclic ring structure. Carriers having such resins in the coating exhibit high charge and excellent relative humidity (RH) sensitivity of charge to changing environmental conditions.
    Type: Application
    Filed: April 3, 2013
    Publication date: October 9, 2014
    Applicants: National Research Council of Canada ("NRC"), XEROX CORPORATION
    Inventors: RICHARD P. VEREGIN, Qingbin Li, Andriy Kovalenko, Sergey Gusarov, Darren Makeiff, Valerie Farrugia, Michael S. Hawkins
  • Publication number: 20140272177
    Abstract: Disclosed is a dispersing agent to be used for dispersing metal particles, comprising a structural unit originating from a compound represented by a general formula of wherein R1 is a hydrogen atom or a methyl group, R2 is a hydrogen atom, an alkyl group with a carbon number equal to or greater than 1 and equal to or less than 9, a phenyl group, a bicyclopentenyl group, or a nonylphenyl group, x is 2 or 3, and n is equal to or greater than 1, and a structural unit that has an ionic group, wherein a number average molecular weight of the compound represented by general formula (I) is equal to or less than 10000.
    Type: Application
    Filed: February 6, 2014
    Publication date: September 18, 2014
    Applicant: RICOH COMPANY, LTD.
    Inventor: Masahiro Yanagisawa
  • Publication number: 20140242366
    Abstract: There is provided an organic polymer porous body having a first cyclic structure equipped with a 6-membered ring (A) or a 5-membered ring having three bonds; a second cyclic structure equipped with a 6-membered ring (B) having two or three bonds; and a carbon-carbon triple bond that links the first cyclic structure to the second cyclic structure. At least one of the first cyclic structure and the second cyclic structure contains at least one nitrogen atom.
    Type: Application
    Filed: February 19, 2014
    Publication date: August 28, 2014
    Applicant: KABUSHIKI KAISHA TOYOTA CHUO KENKYUSHO
    Inventors: Hitoshi KUMAGAI, Satoru FUJITA, Satoru YAMAMOTO, Yoshiyuki SAKAMOTO, Takahiko ASAOKA
  • Patent number: 8778235
    Abstract: A colorant multimer includes, as a partial structure of a colorant moiety, a dipyrromethene metal complex compound or tautomer thereof obtained from: (i) a dipyrromethene compound represented by the following Formula (M); and (ii) a metal or a metal compound: wherein in Formula (M), R4, R5, R6, R7, R8, R9, and R10 each independently represent a hydrogen atom or a monovalent substituent.
    Type: Grant
    Filed: September 28, 2010
    Date of Patent: July 15, 2014
    Assignee: FUJIFILM Corporation
    Inventors: Junichi Ito, Masaru Yoshikawa, Yuki Mizukawa, Kenta Ushijima, Shinichi Kanna, Haruki Inabe, Yoshihiko Fujie, Akiyoshi Goto, Yushi Kaneko, Hiroaki Idei
  • Patent number: 8765891
    Abstract: It is an object of the present invention to provide a laminate having excellent weatherability and abrasion resistance as well as adhesion. The present invention relates to a laminate comprising a base, a first layer formed by thermally curing an acrylic resin composition and a second layer formed by thermally curing an organosiloxane resin composition, all of which are formed in the mentioned order, wherein the acrylic resin composition comprises: (A) an acrylic copolymer which contains at least 70 mol % of a recurring unit represented by the following formula (A): wherein X is a hydrogen atom or methyl group, and Y is a methyl group, ethyl group, cycloalkyl group, hydroxyalkyl group having 2 to 5 carbon atoms or triazine-based ultraviolet absorber residue; (B) a blocked polyisocyanate compound; (C) a curing catalyst; and (D) a triazine-based ultraviolet absorber, and the organosiloxane resin composition comprises: (E) colloidal silica and (F) a hydrolysis condensate of an alkoxysilane.
    Type: Grant
    Filed: February 8, 2013
    Date of Patent: July 1, 2014
    Assignee: Teijin Chemicals, Ltd.
    Inventors: Toshio Kita, Shunsuke Kajiwara, Ryou Niimi, Takehiro Suga, Tatsuya Ekinaka, Nobuaki Takaoka
  • Publication number: 20140175348
    Abstract: The present invention provides a polymer compound represented by the following Formula (1) and a method for production thereof, a pigment dispersant, a pigment dispersion composition, and a photocurable composition respectively using the polymer compound, and a color filter and a method for production thereof [R1: an organic linking group having a valency of (m+n); R2: a single bond or a divalent organic linking group; A1: a monovalent organic group containing at least one moiety selected from an organic dye structure, a heterocyclic structure, an acidic group, a group having a basic nitrogen atom, a urea group, a urethane group, a group having a coordinating oxygen atom, a hydrocarbon group having 4 or more carbon atoms, an alkoxysilyl group, an epoxy group, an isocyanate group, and a hydroxyl group; m=1 to 8, n=2 to 9 (m+n=3 to 10); and P1: polymer skeleton].
    Type: Application
    Filed: February 28, 2014
    Publication date: June 26, 2014
    Applicant: FUJIFILM CORPORATION
    Inventors: Hidenori TAKAHASHI, Shuichiro OSADA
  • Patent number: 8754179
    Abstract: The present discovery uses monomers which contain reversible photo-crosslinkable groups in addition to primary polymerizable groups. The mechanical properties of these materials and the reversibility of the photo-activated shape memory effect demonstrate the effectiveness of using photo-irradiation to effect change in modulus and shape memory effect. In the preferred embodiment the reaction mixture includes a photo-reactive monomer comprising a photo reactive group and a polymerizable group; a second monomer, which is more preferably a mixture of monomers, which are acrylate based; a multi-functional crosslinking agent, preferably 1,6 hexanediol diacrylate (HDODA); an initiator, preferably a free radical initiator; and a fifth, optional, component which is a modifying polymer. The mixture of the second monomer, crosslinking agent, and initiator comprise the base polymer matrix into which the photo-reactive monomer is incorporated.
    Type: Grant
    Filed: October 6, 2005
    Date of Patent: June 17, 2014
    Assignee: Cornerstone Research Group, Inc.
    Inventors: Tat Hung Tong, Emily Snyder
  • Patent number: 8728662
    Abstract: Disclosed is a polyradical compound which can be used as an electrode active material for at least one of a positive electrode and a negative electrode. The polyradical compound has a repeating unit represented by general formula (1) and is crosslinked using a bifunctional crosslinking agent having two polymerizing groups in the molecule represented by general formula (2), wherein R1 to R3 each independently represent hydrogen or methyl group; R4 to R7 each independently represent C1 to C3 alkyl group; X represents single bond, linear, branched or cyclic C1 to C15 alkylenedioxy group, alkylene group, phenylenedioxy group, phenylene group or structure represented by general formula (3); and R8 to R13 each independently represent hydrogen or methyl group, and k represents an integer of 2 to 5.
    Type: Grant
    Filed: June 4, 2007
    Date of Patent: May 20, 2014
    Assignee: NEC Corporation
    Inventors: Masahiro Suguro, Shigeyuki Iwasa, Yuki Kusachi, Jiro Iriyama, Yukiko Morioka, Kentaro Nakahara, Sadahiko Miura
  • Patent number: 8722825
    Abstract: A polymer comprises the polymerized product of monomers comprising a nitrogen-containing monomer comprising formula (Ia), formula (Ib), or a combination of formulas (Ia) and (Ib), and an acid-deprotectable monomer having the formula (II): wherein a is 0 or 1, each Ra is independently H, F, C1-10 alkyl, or C1-10 fluoroalkyl, L1 is a straight chain or branched C1-20 alkylene group, or a monocyclic, polycyclic, or fused polycyclic C3-20 cycloalkylene group, each Rb is independently H, C1-10 alkyl, C3-20 cycloalkyl, C3-20 heterocycloalkyl, an aliphatic C5-20 oxycarbonyl, or a C1-30 acyl group optionally including a heteroatom substituent group, where each Rb is separate or at least one Rb is attached to an adjacent Rb; LN is a nitrogen-containing monocyclic, polycyclic, or fused polycyclic C3-20 heterocycloalkylene group, and X is H, C1-10 alkyl, aliphatic C5-20 oxycarbonyl, or a C1-30 acyl group optionally including a heteroatom substituent group; and each Rc is independently C1-10 alkyl, C3-20 cycloalkyl, o
    Type: Grant
    Filed: May 29, 2012
    Date of Patent: May 13, 2014
    Assignee: Rohm and Haas Electronic Materials LLC
    Inventors: Deyan Wang, Chunyi Wu, Cong Liu, Gerhard Pohlers, Cheng-bai Xu, George G. Barclay
  • Patent number: 8716421
    Abstract: This invention discloses and claims a series of polycyclic monomers and polymers useful in the production of optical waveguides. The polymers of the invention comprise one or more repeating units represented by the formula (IV): Wherein m, X, R1 and R2 are as defined herein. The films formed from the polymers of this invention exhibit significant changes in refractive index (greater than or equal to 0.5%) after exposure to suitable actinic or thermal energy thereby having superior optical transmission performance, which is of importance for modern optical applications such as wave guiding and optical data storage.
    Type: Grant
    Filed: May 23, 2013
    Date of Patent: May 6, 2014
    Assignees: Promerus, LLC, Sumitomo Bakelite Co., Ltd
    Inventors: Kazuyoshi Fujita, Nanae Kawate, Mari Ueda, Larry F Rhodes
  • Publication number: 20140045122
    Abstract: A positive resist composition comprises a polymer having a carboxyl group substituted with an acid labile group having formula (1) wherein R1 and R2 are alkyl or alkenyl, R3 and R4 are a single bond, methylene, ethylene or propylene, R5 and R6 are hydrogen or alkyl. The composition has a high dissolution contrast, high resolution, and suppressed acid diffusion rate, and forms a pattern of good profile and minimal edge roughness.
    Type: Application
    Filed: August 1, 2013
    Publication date: February 13, 2014
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Jun Hatakeyama, Koji Hasegawa
  • Patent number: 8569451
    Abstract: The present application relates to an affinity material useful in antibody purification.
    Type: Grant
    Filed: April 9, 2010
    Date of Patent: October 29, 2013
    Assignee: Biotage AB
    Inventors: Anthony Rees, Börje Sellergren, Ecevit Yilmaz, Thomas Schrader
  • Publication number: 20130236968
    Abstract: The present invention relates to multifunctional polymers represented by the following formula: The invention further provides methods for their preparation and methods for site-specific delivery of nucleic acids by combining them with targeting ligands, endosomolytic ligands and/or PK modulator ligands.
    Type: Application
    Filed: June 20, 2011
    Publication date: September 12, 2013
    Applicant: ALNYLAM PHARMACEUTICALS, INC.
    Inventors: Muthiah Manoharan, Kallanthottathil G. Rajeev
  • Publication number: 20130198968
    Abstract: Functional additives for cleansing compositions exhibiting enhanced anti soil-re-deposition and/or dye transfer inhibitory properties comprising polymers in the form of homopolymers, copolymers or terpolymers synthesized from at least one hydrophobic monomer. Examples of hydrophobic monomers include N-vinyl caprolactam, vinyl acetate, vinyl esters, acrylated glycols, methacrylamide, C1 to C12 alkyl- and C1 to C12 dialkylacrylamide, C1 to C12 alkyl- and C1 to C12 dialkylmethacrylamide, C1 to C12 alkyl aery late, C1 to C12 alkyl methacrylate, 4-butyl phenyl maleimide, octyl acrylamide.
    Type: Application
    Filed: March 11, 2011
    Publication date: August 8, 2013
    Inventors: David K. Hood, Karyn B. Visscher, Surya Kamin, Purvita Shah, Osama M. Musa, Tony Gough, Jayanti V. Patel, Sarah Orton
  • Publication number: 20130144021
    Abstract: The present invention relates to arborescent polymers and to a process for making same. In one embodiment, the present invention relates to arborescent polymers formed from at least one inimer and at least one isoolefin that have been end-functionalized with a polymer or copolymer having a low glass transition temperature (Tg), and to a process for making such arborescent polymers. In another embodiment, the present invention relates to arborescent polymers formed from at least one inimer and at least one isoolefin that have been end-functionalized with less than about 5 weight percent end blocks derived from a polymer or copolymer having a high glass transition temperature (Tg), and to a process for making such arborescent polymers.
    Type: Application
    Filed: August 31, 2012
    Publication date: June 6, 2013
    Applicants: The University of Akron
    Inventors: Gabor Kaszas, Judit Puskas, Kevin Kulbaba
  • Patent number: 8449954
    Abstract: The present invention relates to a specific photoreactive polymer that shows excellent alignment stability and thermal stability together with excellent liquid crystal alignment, thereby being desirably used in an alignment film of a liquid crystal display device, a compound having a photoreactive functional group that is used as a monomer for the preparation of the photoreactive polymer, and an alignment film.
    Type: Grant
    Filed: July 6, 2011
    Date of Patent: May 28, 2013
    Assignee: LG Chem, Ltd.
    Inventors: Dai-Seung Choi, Sung-Ho Chun, Young-Chul Won, Dong-Woo Yoo
  • Publication number: 20130115555
    Abstract: There are provided a method of forming a resist pattern includes: a step (1) in which a resist composition containing a base component (A) that generates base upon exposure and exhibits increased solubility in an alkali developing solution by the action of acid is applied to a substrate to form a resist film; a step (2) in which the resist film 2 is subjected to exposure; a step (3) in which baking is conducted after the step (2); and a step (4) in which the resist film 2 is subjected to an alkali development, thereby forming a negative-tone resist pattern in which the unexposed portion 2b of the resist film 2 has been dissolved and removed, and the resist composition used in the step (1).
    Type: Application
    Filed: November 2, 2012
    Publication date: May 9, 2013
    Applicant: TOKYO OHKA KOGYO CO., LTD.
    Inventor: Tokyo Ohka Kogyo Co., Ltd.
  • Publication number: 20130066016
    Abstract: A method for preparing a functionalized polymer, the method comprising the steps of preparing a reactive polymer and reacting the reactive polymer with a heterocyclic nitrile compound.
    Type: Application
    Filed: November 6, 2012
    Publication date: March 14, 2013
    Applicant: BRIDGESTONE CORPORATION
    Inventor: Bridgestone Corporation
  • Patent number: 8338552
    Abstract: Embodiments include a sensor comprising a co-polymer, the co-polymer comprising a first monomer and a second monomer. For some embodiments, the first monomer is poly-4-vinyl pyridine, and the second monomer is poly-4-vinyl pyridinium propylamine chloride. For some embodiments, the first monomer is polystyrene and the second monomer is poly-2-vinyl pyridinium propylamine chloride. For some embodiments, the first monomer is poly-4-vinyl pyridine, and the second monomer is poly-4-vinyl pyridinium benzylamine chloride. Other embodiments are described and claimed.
    Type: Grant
    Filed: November 16, 2010
    Date of Patent: December 25, 2012
    Assignee: California Institute of Technology
    Inventors: Margaret A. Ryan, Margie L. Homer, Shiao-Pin S. Yen, Adam Kisor, April D. Jewell, Abhijit V. Shevade, Kenneth S. Manatt, Charles Taylor, Mario Blanco, William A. Goddard
  • Patent number: 8329377
    Abstract: An imide compound represented by the formula (I): wherein R1 represents a C1-C20 aliphatic hydrocarbon group etc., W1 represents —CO—O— etc., Q1 and Q2 each independently represent a fluorine atom etc., and A represents a group represented by the formula (I-1): wherein A1 represents —CH2—CH2— etc., and a chemically amplified resist composition containing the same.
    Type: Grant
    Filed: July 21, 2009
    Date of Patent: December 11, 2012
    Assignee: Sumitomo Chemical Company, Limited
    Inventors: Ichiki Takemoto, Tatsuro Masuyama, Takashi Hiraoka
  • Publication number: 20120235099
    Abstract: The object of the present invention is to provide a radiation-sensitive colored composition which can supress the generation of the contamination of the device. A radiation-sensitive colored composition including: (A) a dye containing of from 10 ppm to 1000 ppm of a halogen ion; (B) a polymerizable compound; and (C) a solvent.
    Type: Application
    Filed: March 15, 2012
    Publication date: September 20, 2012
    Applicant: FUJIFILM CORPORATION
    Inventors: Kenta USHIJIMA, Junichi Itou, Yushi KANEKO, Yuzo NAGATA, Yoshiharu YABUKI, Atsuyasu NOZAKI, Hiroaki IDEI
  • Publication number: 20120172559
    Abstract: A one pot method of preparing cyclic carbonyl compounds comprising an active pendant pentafluorophenyl ester group is disclosed. The cyclic carbonyl compounds can be polymerized by ring opening methods to form ROP polymers comprising repeat units comprising a side chain pentafluorophenyl ester group. Using a suitable nucleophile, the pendant pentafluorophenyl ester group can be selectively transformed into a variety of other functional groups before or after the ring opening polymerization.
    Type: Application
    Filed: March 8, 2012
    Publication date: July 5, 2012
    Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATION
    Inventors: James L. Hedrick, Alshakim Nelson, Daniel P. Sanders
  • Patent number: 8163402
    Abstract: The invention relates to a polymer comprising structural unit of formula I: wherein R1, R2, R3, R4, R5, and R6 are independently at each occurrence a C1-C20 aliphatic radical, a C3-C20 aromatic radical, or a C3-C20 cycloaliphatic radical; a, b, d, e and f are independently at each occurrence 0, or an integer ranging from 1 to 4; c is independently at each occurrence 0, or an integer ranging from 1 to 3. In another aspect, the invention relates to monomers for preparing the polymers. In yet another aspect, the invention relates to an optical electronic device comprising a polymer comprising structural unit of formula I.
    Type: Grant
    Filed: December 6, 2008
    Date of Patent: April 24, 2012
    Assignee: General Electric Company
    Inventors: Qing Ye, Jie Liu, Yangang Liang, Shengxia Liu
  • Patent number: 8148484
    Abstract: Norbornene-based biocidal polymers having primary, secondary or tertiary amine or phosphine end groups, the parent monomers, processes for preparing the monomers and polymers, and their use.
    Type: Grant
    Filed: October 16, 2006
    Date of Patent: April 3, 2012
    Assignee: KE Kelit Kunststoffwerk GesmbH
    Inventors: Xaver Norbert Gstrein, Wolfgang Kern, Karl Rametsteiner, Gerhard Seyfriedsberger, Franz Stelzer
  • Patent number: 8110262
    Abstract: The present invention provides polyolefin compositions containing a polyolefin resin, a hindered amine light stabilizer, and a polymer processing aid. Methods for preparing the polymer compositions, methods for using the compositions to produce articles of manufacture, and the articles produced from these polyolefin compositions are also provided.
    Type: Grant
    Filed: November 10, 2008
    Date of Patent: February 7, 2012
    Assignee: Chevron Phillips Chemical Company LP
    Inventor: Elizabeth M. Lanier
  • Patent number: 8110641
    Abstract: An anionic polymerization method for styrene derivative containing pyridine as functional group is provided. The method includes forming a complex of (vinylphenyl)-pyridine and lithium chloride and performing anionic polymerization. Accordingly, a polymer of styrene derivative containing pyridine can be obtained. The polymer has excellent optical properties, and its molecular weight and molecular weight distribution can be controlled.
    Type: Grant
    Filed: December 16, 2008
    Date of Patent: February 7, 2012
    Assignee: Gwangju Institute of Science and Technology
    Inventors: Jae-Suk Lee, Nam-Goo Kang
  • Patent number: 8110642
    Abstract: Provided are a vinyl-biphenylpyridine monomer and a polymer thereof. More particularly, the present invention provides a vinyl-biphenylpyridine monomer having a side chain of pyridine or phenylpyridine as a functional group, a homopolymer of which molecular weight and molecular weight distribution are controlled using the monomer, and a block copolymer of which molecular structure and molecular weight are controlled to facilitate synthesis of an organic metal complex. Accordingly, the present invention provides a vinyl-biphenylpyridine monomer and a polymer thereof which are effectively used as nano and optical functional materials.
    Type: Grant
    Filed: April 3, 2007
    Date of Patent: February 7, 2012
    Assignee: Gwangju Institute of Science and Technology
    Inventors: Jae-Suk Lee, Nam-Goo Kang
  • Publication number: 20120008068
    Abstract: A polymer compound comprising a repeating unit of below formula (1) or (2), and having a polystyrene reduced number average molecular weight of 103 to 108, (wherein, Ar1 and Ar2 each independently represent a trivalent aromatic hydrocarbon group or a trivalent heterocyclic group. X1 and X2 each independently represent O, S, C(?O), S(?O), SO2, C(R1)(R2), Si(R3)(R4), N(R5), B(R6), P(R7) or P(?O)(R8). X1 and X2 are not the same. X1 and Ar2 bond to adjacent carbons in the aromatic ring of Ar1, and X2 and Ar1 bond to adjacent carbons in the aromatic ring of Ar2), (wherein, Ar3 and Ar4 each independently represent a trivalent aromatic hydrocarbon group or a trivalent heterocyclic group. X3 and X4 each independently represent N, B, P, C(R9) or Si(R10). X3 and X4 are not the same. X3 and Ar4 bond to adjacent carbons in the aromatic ring of Ar3, and X4 and Ar3 bond to adjacent carbons in the aromatic ring of Ar4.).
    Type: Application
    Filed: June 7, 2011
    Publication date: January 12, 2012
    Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Shuji DOI, Satoshi KOBAYASHI, Takanobu NOGUCHI
  • Patent number: 8088874
    Abstract: It is an object of the present invention to provide a crosslinked (meth)acrylic acid-type copolymer excellent in stability to a solvent, which causes substantially no crack due to drying when applied onto the surface of a current collector, and a secondary-cell electrode using the copolymer. The present invention relates to a crosslinked (meth)acrylic acid-type copolymer obtained by the steps of: polymerization of a (meth)acrylic acid imino compound represented by the general formula (1): (in the formula (1), R represents a hydrogen atom or a methyl group) and a (meth)acrylic acid ester in the presence of a crosslinking agent, and nitroxidation.
    Type: Grant
    Filed: June 4, 2007
    Date of Patent: January 3, 2012
    Assignee: Sumitomo Seika Chemicals Co., Ltd.
    Inventors: Nobutaka Fujimoto, Koji Ueda
  • Patent number: 8043990
    Abstract: The invention relates to a catalyst system for polymerization of olefins, the catalyst system comprising a titanium-containing procatalyst carrying internal electron donor(s), an organoaluminium cocatalyst and a mixture of external electron donors, the mixture comprising a carboxylic acid ester or derivatives thereof, an alkoxy silane and a nitrogen based compound. The invention also relates to a process for polymerization of olefin(s) and to the polyolefin synthesized by the process.
    Type: Grant
    Filed: August 25, 2008
    Date of Patent: October 25, 2011
    Assignee: Reliance Industries Limited
    Inventors: Virendrakumar Gupta, Harshad Ramdas Patil, Dhananjay Ghelabhai Naik, Sukhdeep Kaur, Gurmeet Singh, Priyanshu Bharatkumar Vyas
  • Publication number: 20110166308
    Abstract: The present invention provides polymers resulting from polymerization of at least one reactive vinyl monomer moiety and a multifunctional N-vinylformamide crosslinking moiety; polymers resulting from polymerization of at least one reactive vinyl monomer moiety and a hybrid N-vinylformamide crosslinking moiety having at least one N-vinylformamide functionality and at least one other reactive vinyl functionality; polymers resulting from polymerization of at least one hybrid reactive N-vinylformamide monomer moiety having one N-vinylformamide functionality and at least one other reactive non-vinyl functionality and a multifunctional N-vinylformamide crosslinking moiety; and polymers resulting from polymerization of at least one hybrid reactive N-vinylformamide monomer moiety having one N-vinylformamide functionality and at least one other reactive non-vinyl functionality and a hybrid N-vinylformamide crosslinking moiety having at least one N-vinylformamide functionality and at least one other reactive vinyl func
    Type: Application
    Filed: January 5, 2011
    Publication date: July 7, 2011
    Inventors: Osama M. Musa, Ilya Makarovsky, Lei Cuiyue
  • Patent number: 7968650
    Abstract: The present invention relates to compositions comprising a polymeric substrate comprising at least one volume excluding polymer. In one embodiment, the present invention provides polymeric articles that are capable of acting as osmotic drivers. The articles are capable of maintaining a desired water balance by moving water in or out of a substrate to maintain cation concentration equilibrium between the substrate and its environment.
    Type: Grant
    Filed: October 26, 2007
    Date of Patent: June 28, 2011
    Assignee: Johnson & Johnson Vision Care, Inc.
    Inventors: Brian J. Tighe, Muriel Nasso, Beverley Benning, Frank F. Molock, Jr.
  • Publication number: 20110108755
    Abstract: Disclosed are an oligomer and a phthalonitrile monomer having the formulas: M is a metal or H. The value n is an integer greater than or equal to 1 for the oligomer and greater than or equal to 0 for the phthalonitrile monomer. Ar1 and Ar2 are independently selected aromatic- or heterocyclic-containing groups. Ar1, Ar2, or both are heteroaromatic or heterocyclic groups containing a nitrogen, sulfur, or oxygen heteroatom. Also disclosed are thermosets and pyrolyzed materials made from the phthalonitrile monomer.
    Type: Application
    Filed: November 12, 2009
    Publication date: May 12, 2011
    Applicant: The Government of the United States Of America, as represented by the Secretary of the Navy
    Inventors: Matthew Laskoski, Teddy M Keller
  • Publication number: 20110108768
    Abstract: Disclosed is a composition comprising: a compound having residues of at least two kinds of nitrogenated compounds selected from the group consisting of nitrogenated compounds represented by formulae (1-1), (1-2), (1-3) and (1-4) [wherein R's independently represent a hydrogen atom or a substituent and may be the same as or different from one another]; and a phosphorescent light-emitting compound.
    Type: Application
    Filed: June 23, 2009
    Publication date: May 12, 2011
    Applicants: SUMITOMO CHEMICAL COMPANY, LIMITED, SUMATION CO., LTD.
    Inventor: Nobuhiko Akino
  • Patent number: 7935771
    Abstract: There is provided a polymer including a unit represented by Chemical Formula (1): wherein R represents -A1-SO2R1; R1w and R1x are each independently a halogen atom or a hydrogen atom; R1y is a CH3 group, a halogen atom or a hydrogen atom; A01 is a substituted or unsubstituted aromatic ring structure or a substituted or unsubstituted heterocyclic structure; A1 is a substituted or unsubstituted aliphatic hydrocarbon structure, a substituted or unsubstituted aromatic ring structure or a substituted or unsubstituted heterocyclic structure; R1 is OH, a halogen atom, ONa, OK or OR1a; R1a is a substituted or unsubstituted aliphatic hydrocarbon structure, a substituted or unsubstituted aromatic ring structure or a substituted or unsubstituted heterocyclic structure.
    Type: Grant
    Filed: November 10, 2006
    Date of Patent: May 3, 2011
    Assignee: Canon Kabushiki Kaisha
    Inventors: Tatsuki Fukui, Akiko Tominaga, Takashi Kenmoku, Masato Minami, Tetsuya Yano, Takeshi Ikeda, Atsushi Tani, Norikazu Fujimoto
  • Patent number: 7935772
    Abstract: Disclosed is a water-based resin composition containing a copolymer (A) which is obtained by carrying out emulsion polymerization of an unsaturated monomer composed of 0.5 to 50 parts by mass of a specific ethylenically unsaturated monomer (a) having a piperidyl group in a molecule and 50 to 99.5 parts by mass of an ethylenically unsaturated monomer (b), which does not substantially contain an ethylenically unsaturated monomer having a specific functional group in a molecule, with the total of the ethylenically unsaturated monomers (a) and (b) being 100 parts by mass, under the coexistence of 0.1 to 10 parts by mass of an emulsifier. Also disclosed are a weather resistance improver for water-based paints using the foregoing water-based resin composition, a weather resistance improver for thermoplastic resins, and a weather resistance improver for solvent-based paints.
    Type: Grant
    Filed: May 26, 2006
    Date of Patent: May 3, 2011
    Assignee: Mitsubishi Rayon Co., Ltd.
    Inventors: Takahiro Mukuda, Masaaki Kiura, Motomi Tanaka
  • Publication number: 20110060114
    Abstract: Embodiments include a sensor comprising a co-polymer, the co-polymer comprising a first monomer and a second monomer. For some embodiments, the first monomer is poly-4-vinyl pyridine, and the second monomer is poly-4-vinyl pyridinium propylamine chloride. For some embodiments, the first monomer is polystyrene and the second monomer is poly-2-vinyl pyridinium propylamine chloride. For some embodiments, the first monomer is poly-4-vinyl pyridine, and the second monomer is poly-4-vinyl pyridinium benzylamine chloride. Other embodiments are described and claimed.
    Type: Application
    Filed: November 16, 2010
    Publication date: March 10, 2011
    Inventors: Margaret A. Ryan, Margie L. Homer, Shiao-Pin S. Yen, Adam Kisor, April D. Jewell, Abhijit V. Shevade, Kenneth S. Manatt, Charles Taylor, Mario Blanco, William A. Goddard
  • Publication number: 20110042664
    Abstract: A charge-transporting polymer including a unit derived from at least one polymerizable compound represented by formula (1), formula (2) and formula (3): where R1 to R3 are as defined herein.
    Type: Application
    Filed: April 23, 2009
    Publication date: February 24, 2011
    Applicant: SHOWA DENKO K.K.
    Inventors: Tsuyoshi Katoh, Takeshi Igarashi
  • Publication number: 20100327738
    Abstract: The present invention provides a polymer material capable of preparing organic EL elements having low driving voltage and high durability. The polymer compound of the present invention includes a constituting unit derived from a monomer represented by the formula (1); (in the formula (1), each of A1's is independently a condensed polycyclic aromatic group optionally having a heteroatom as a ring-constituting atom; the condensed polycyclic aromatic group links to A2 at the meta position to the bonding position of the ring represented by the following formula; each of A2's is independently a six-membered ring aromatic group optionally having a heteroatom as a ring-constituting atom; at least one of A1 and A2 has a substituent having a polymerizable functional group; at least one of X's is a nitrogen atom, and n's are independently 1 or 2).
    Type: Application
    Filed: February 20, 2009
    Publication date: December 30, 2010
    Applicant: SHOWA DENKO K.K.
    Inventors: Masahiko Toba, Tsuyoshi Kato
  • Patent number: 7858694
    Abstract: Polymer of formula (I): In-[(A)x-(B)y-(A?)x?-(E)z]n obtained by nitroxyl mediated controlled free radical polymerization whereby an access of acrylate is present, wherein In is the initiator fragment starting the polymerization reaction; A and A? are the same or different monomers selected from the group consisting of acrylic acid, methacrylic acid, acrylonitrile, methacrylonitrile, acrylic acid (C1-C22)alkyl esters, acrylic acid (C1-C22)hydroxyalkyl esters, methacrylic acid (C1-C22)alkyl esters, methacrylic acid (C1-C22)hydroxyalkyl esters, acrylic acid (C1-C22)alkyl esters or methacrylic acid (C1-C22)alkyl esters which are substituted by amino, (C1-C22)alkylamino, (C1-C22)dialkylamino, —SO3H, epoxy, fluoro, perfluoro or siloxane groups, styrene, substituted styrene, acrylamide and methacrylamide, N-mono(C1-C22)alkyl acrylamide, N,N-di(C1-C22)alkyl acrylamide; provided that the amount of unsubstituted acrylic acid (C1-C22)alkyl esters or/and methacrylic acid (C1-C22)alkyl esters is more than 30% by weight ba
    Type: Grant
    Filed: August 21, 2006
    Date of Patent: December 28, 2010
    Assignee: Ciba Specialty Chemicals Corp.
    Inventors: Lothar Alexander Engelbrecht, Arend Noordam
  • Patent number: 7858720
    Abstract: Embodiments include a sensor comprising a co-polymer, the co-polymer comprising a first monomer and a second monomer. For some embodiments, the first monomer is poly-4-vinyl pyridine, and the second monomer is poly-4-vinyl pyridinium propylamine chloride. For some embodiments, the first monomer is polystyrene and the second monomer is poly-2-vinyl pyridinium propylamine chloride. For some embodiments, the first monomer is poly-4-vinyl pyridine, and the second monomer is poly-4-vinyl pyridinium benzylamine chloride. Other embodiments are described and claimed.
    Type: Grant
    Filed: June 19, 2007
    Date of Patent: December 28, 2010
    Assignee: California Institute of Technology
    Inventors: Margaret A. Ryan, Margie L. Homer, Shiao-Pin S. Yen, Adam Kisor, April D. Jewell, Abhijit V. Shevade, Kenneth S. Manatt, Charles Taylor, Mario Blanco, William A. Goddard
  • Patent number: 7851584
    Abstract: Disclosed are processes for preparing monomer complexes that include contacting 2,3,5,6-tetraminopyridine free base in water with 2,5-dihydroxy terephthalic acid dipotassium salt to form an aqueous mixture, and adjusting the pH of the aqueous mixture to within the range of from about (3) to about (5) to precipitate the monomer complex. Processes of polymerizing the monomer complexes, polyareneazoles, filaments and yarns are also disclosed.
    Type: Grant
    Filed: March 27, 2006
    Date of Patent: December 14, 2010
    Assignees: E. I. du Pont de Nemours and Company, Magellan Systems International, LLC
    Inventors: Doetze Jakob Sikkema, David J Rodini, Hasan Dindi, James Arnold Schultz, Georg Valentin Martin, Ralf Demuth, Michael Schelhaas
  • Patent number: 7851574
    Abstract: Pressure-sensitive adhesives containing at least one functionalized polymer or block polymer having a weight average of the molar mass distribution of between 5,000 g/mol and 200,000 g/mol and a difference between Mp and Mmin which is lower than 25,000 g/mol, where Mp represents the peak molar mass of a monomodal polymer or the peak molar mass of the smallest mode in a bimodal or multimodal polymer and Mmin represents the lowest molar mass in the molar mass distribution, defined at each point where the cumulative frequency of the molar mass distribution has a value of 0.05, the functionalized polymer or block polymer carries at least one type of functionalization that can be used for a subsequent cross-linking and the at least one type of functionalization of the functionalized polymer results from the use of at least one type of functionalized monomer during the production of the functionalized polymer.
    Type: Grant
    Filed: September 9, 2005
    Date of Patent: December 14, 2010
    Assignee: tesa SE
    Inventors: Thilo Dollase, Matthias Koop