6-membered Ring Contains A Single Nitrogen Atom Patents (Class 526/265)
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Patent number: 12075679Abstract: An electro-optical device according to the present disclosure includes a substrate, a colored layer, a first light-emitting element and a second light-emitting element disposed between the substrate and the colored layer in a thickness direction of the substrate, and a wall portion disposed between the first light-emitting element and the colored layer in the thickness direction and between the first light-emitting element and the second light-emitting element in plan view, wherein a first refractive index of the wall portion and a second refractive index of the colored layer are different from each other, and the colored layer includes a curved surface that is in contact with the wall portion and protrudes toward the wall portion.Type: GrantFiled: July 30, 2021Date of Patent: August 27, 2024Assignee: SEIKO EPSON CORPORATIONInventors: Jun Irobe, Takeshi Koshihara
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Patent number: 10042259Abstract: Topcoat compositions comprise: a matrix polymer; a surface active polymer comprising a polymerized unit formed from a monomer of the following general formula (I): wherein: R1 represents H, F, methyl or fluorinated methyl; R2 represents optionally substituted C1 to C8 alkylene or optionally substituted C1 to C8 fluoroalkylene, optionally comprising one or more heteroatom; R3 represents H, F, optionally substituted C1 to C10 alkyl or optionally substituted C5 to C15 aryl, optionally comprising one or more heteroatom; R4 represents optionally substituted C1 to C8 alkyl, optionally substituted C1 to C8 fluoroalkyl or optionally substituted C5 to C15 aryl, optionally comprising one or more heteroatom; X represents O, S or NR5, wherein R5 is chosen from hydrogen and optionally substituted C1 to C5 alkyl; and a is 0 or 1; and a solvent. Also provided are coated substrates and pattern-forming methods which make use of the topcoat compositions.Type: GrantFiled: October 12, 2017Date of Patent: August 7, 2018Assignee: Rohm and Haas Electronic Materials LLCInventors: Irvinder Kaur, Cong Liu, Doris Kang, Mingqi Li, Deyan Wang, Huaxing Zhou
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Patent number: 9988342Abstract: Provided is a method for producing 2-aminoethyl methacrylate hydrochloride that, according to one embodiment, includes a step (A) for reacting a ketimine compound of 2-aminoethyl methacrylate with water and hydrogen chloride and obtaining a mixture containing 2-aminoethyl methacrylate hydrochloride, wherein in the step (A), the ratio of the total amount of hydrogen chloride to the total amount of ketimine compound of 2-aminoethyl methacrylate is 1.0-1.5 expressed in terms of equivalents, and the ratio of the total amount of water to the total amount of ketimine compound of 2-aminoethyl methacrylate is 1.0-2.0 expressed in terms of equivalents.Type: GrantFiled: January 26, 2016Date of Patent: June 5, 2018Assignee: MITSUBISHI GAS CHEMICAL COMPANY, INC.Inventors: Yuri Iida, Masaki Takemoto, Hideyuki Sato
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Publication number: 20150105487Abstract: This invention relates to no-salt and mixed salt suspension polymerization processes for water-soluble monomers and resins and relates to catalysts produced from the same.Type: ApplicationFiled: June 7, 2013Publication date: April 16, 2015Applicant: ROHM AND HAAS COMPANYInventors: Takashi Masudo, Robert J. Olsen, Garth R. Parker, Jr., Jose A. Trejo
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Patent number: 8999626Abstract: The present invention relates to a polymer compound including a dye, and a curable resin composition including the same. The polymer compound including the dye according to the present invention may exhibit characteristics such as excellent heat resistance, solubility, coating uniformity, chemical resistance and the like by introducing a single molecule type dye into a side chain of a polymer binder to be modified into a polymer form and applying the modified polymer to a curable composition.Type: GrantFiled: May 25, 2012Date of Patent: April 7, 2015Assignee: LG Chem, Ltd.Inventors: Jiyoung Park, Sunhwa Kim, Janghyun Ryu
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Patent number: 8932710Abstract: To provide a pressure-sensitive adhesive optical film that can satisfy durability even when a thin pressure-sensitive adhesive layer is formed. A pressure-sensitive adhesive optical film comprising an optical film and a pressure-sensitive adhesive layer on at least one side of the optical film, wherein the pressure-sensitive adhesive layer is formed by a pressure-sensitive adhesive, comprising: a (meth)acrylic polymer having a weight average molecular weight of 1,500,000 to 2,800,000; containing, as a monomer component, 3 to 10% by weight of a heterocyclic ring-containing acrylic monomer; 0.5 to 5% by weight of a carboxyl group-containing monomer; 0.05 to 2% by weight of a hydroxyl group-containing monomer; and 83 to 96.45% by weight of an alkyl(meth)acrylate monomer, and a crosslinking agent.Type: GrantFiled: March 13, 2007Date of Patent: January 13, 2015Assignee: Nitto Denko CorporationInventors: Shinichi Inoue, Kohei Yano, Masayuki Satake, Yutaka Moroishi
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Publication number: 20140370114Abstract: Disclosed herein is a preparation method of homopolymer nanoparticles without using a surfactant. The homopolymer nanoparticles prepared thereby are expected to be widely used not only as a template of a semiconductor metal oxide, a drug delivery system (DDS), an electron transport layer (ETL), and a seed having vertical structural shape, but also in a high precision field such as replacement of an organic device polystyrene bead film.Type: ApplicationFiled: June 13, 2014Publication date: December 18, 2014Inventors: Jae-Suk LEE, Santosh Kumar, Dong Woo Kim, Mohammad Changei, Hong-Joon Lee
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Patent number: 8859099Abstract: A laminate having excellent weatherability and abrasion resistance as well as adhesion. The laminate comprises a base, a first layer formed by thermally curing an acrylic resin composition and a second layer formed by thermally curing an organosiloxane resin composition, all of which are formed in the mentioned order, wherein the acrylic resin composition comprises: (A) an acrylic copolymer which contains at least 70 mol % of a recurring unit represented by the following formula (A): wherein X is a hydrogen atom or methyl group, and Y is a methyl group, ethyl group, cycloalkyl group, hydroxyalkyl group having 2 to 5 carbon atoms or triazine-based ultraviolet absorber residue; (B) a blocked polyisocyanate compound; (C) a curing catalyst; and (D) a triazine-based ultraviolet absorber, and the organosiloxane resin composition comprises: (E) colloidal silica and (F) a hydrolysis condensate of an alkoxysilane.Type: GrantFiled: February 8, 2013Date of Patent: October 14, 2014Assignee: Teijin Chemicals, Ltd.Inventors: Toshio Kita, Shunsuke Kajiwara, Ryou Niimi, Takehiro Suga, Tatsuya Ekinaka, Nobuaki Takaoka
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Publication number: 20140302435Abstract: The disclosure generally describes carrier resins, and in particular, resins used for carrier coatings which include at least one ester functional group and at least one cyclic aliphatic group containing at least one nitrogen atom in the cyclic ring structure. Carriers having such resins in the coating exhibit high charge and excellent relative humidity (RH) sensitivity of charge to changing environmental conditions.Type: ApplicationFiled: April 3, 2013Publication date: October 9, 2014Applicants: National Research Council of Canada ("NRC"), XEROX CORPORATIONInventors: RICHARD P. VEREGIN, Qingbin Li, Andriy Kovalenko, Sergey Gusarov, Darren Makeiff, Valerie Farrugia, Michael S. Hawkins
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Publication number: 20140272177Abstract: Disclosed is a dispersing agent to be used for dispersing metal particles, comprising a structural unit originating from a compound represented by a general formula of wherein R1 is a hydrogen atom or a methyl group, R2 is a hydrogen atom, an alkyl group with a carbon number equal to or greater than 1 and equal to or less than 9, a phenyl group, a bicyclopentenyl group, or a nonylphenyl group, x is 2 or 3, and n is equal to or greater than 1, and a structural unit that has an ionic group, wherein a number average molecular weight of the compound represented by general formula (I) is equal to or less than 10000.Type: ApplicationFiled: February 6, 2014Publication date: September 18, 2014Applicant: RICOH COMPANY, LTD.Inventor: Masahiro Yanagisawa
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Publication number: 20140242366Abstract: There is provided an organic polymer porous body having a first cyclic structure equipped with a 6-membered ring (A) or a 5-membered ring having three bonds; a second cyclic structure equipped with a 6-membered ring (B) having two or three bonds; and a carbon-carbon triple bond that links the first cyclic structure to the second cyclic structure. At least one of the first cyclic structure and the second cyclic structure contains at least one nitrogen atom.Type: ApplicationFiled: February 19, 2014Publication date: August 28, 2014Applicant: KABUSHIKI KAISHA TOYOTA CHUO KENKYUSHOInventors: Hitoshi KUMAGAI, Satoru FUJITA, Satoru YAMAMOTO, Yoshiyuki SAKAMOTO, Takahiko ASAOKA
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Patent number: 8778235Abstract: A colorant multimer includes, as a partial structure of a colorant moiety, a dipyrromethene metal complex compound or tautomer thereof obtained from: (i) a dipyrromethene compound represented by the following Formula (M); and (ii) a metal or a metal compound: wherein in Formula (M), R4, R5, R6, R7, R8, R9, and R10 each independently represent a hydrogen atom or a monovalent substituent.Type: GrantFiled: September 28, 2010Date of Patent: July 15, 2014Assignee: FUJIFILM CorporationInventors: Junichi Ito, Masaru Yoshikawa, Yuki Mizukawa, Kenta Ushijima, Shinichi Kanna, Haruki Inabe, Yoshihiko Fujie, Akiyoshi Goto, Yushi Kaneko, Hiroaki Idei
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Patent number: 8765891Abstract: It is an object of the present invention to provide a laminate having excellent weatherability and abrasion resistance as well as adhesion. The present invention relates to a laminate comprising a base, a first layer formed by thermally curing an acrylic resin composition and a second layer formed by thermally curing an organosiloxane resin composition, all of which are formed in the mentioned order, wherein the acrylic resin composition comprises: (A) an acrylic copolymer which contains at least 70 mol % of a recurring unit represented by the following formula (A): wherein X is a hydrogen atom or methyl group, and Y is a methyl group, ethyl group, cycloalkyl group, hydroxyalkyl group having 2 to 5 carbon atoms or triazine-based ultraviolet absorber residue; (B) a blocked polyisocyanate compound; (C) a curing catalyst; and (D) a triazine-based ultraviolet absorber, and the organosiloxane resin composition comprises: (E) colloidal silica and (F) a hydrolysis condensate of an alkoxysilane.Type: GrantFiled: February 8, 2013Date of Patent: July 1, 2014Assignee: Teijin Chemicals, Ltd.Inventors: Toshio Kita, Shunsuke Kajiwara, Ryou Niimi, Takehiro Suga, Tatsuya Ekinaka, Nobuaki Takaoka
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Publication number: 20140175348Abstract: The present invention provides a polymer compound represented by the following Formula (1) and a method for production thereof, a pigment dispersant, a pigment dispersion composition, and a photocurable composition respectively using the polymer compound, and a color filter and a method for production thereof [R1: an organic linking group having a valency of (m+n); R2: a single bond or a divalent organic linking group; A1: a monovalent organic group containing at least one moiety selected from an organic dye structure, a heterocyclic structure, an acidic group, a group having a basic nitrogen atom, a urea group, a urethane group, a group having a coordinating oxygen atom, a hydrocarbon group having 4 or more carbon atoms, an alkoxysilyl group, an epoxy group, an isocyanate group, and a hydroxyl group; m=1 to 8, n=2 to 9 (m+n=3 to 10); and P1: polymer skeleton].Type: ApplicationFiled: February 28, 2014Publication date: June 26, 2014Applicant: FUJIFILM CORPORATIONInventors: Hidenori TAKAHASHI, Shuichiro OSADA
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Patent number: 8754179Abstract: The present discovery uses monomers which contain reversible photo-crosslinkable groups in addition to primary polymerizable groups. The mechanical properties of these materials and the reversibility of the photo-activated shape memory effect demonstrate the effectiveness of using photo-irradiation to effect change in modulus and shape memory effect. In the preferred embodiment the reaction mixture includes a photo-reactive monomer comprising a photo reactive group and a polymerizable group; a second monomer, which is more preferably a mixture of monomers, which are acrylate based; a multi-functional crosslinking agent, preferably 1,6 hexanediol diacrylate (HDODA); an initiator, preferably a free radical initiator; and a fifth, optional, component which is a modifying polymer. The mixture of the second monomer, crosslinking agent, and initiator comprise the base polymer matrix into which the photo-reactive monomer is incorporated.Type: GrantFiled: October 6, 2005Date of Patent: June 17, 2014Assignee: Cornerstone Research Group, Inc.Inventors: Tat Hung Tong, Emily Snyder
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Patent number: 8728662Abstract: Disclosed is a polyradical compound which can be used as an electrode active material for at least one of a positive electrode and a negative electrode. The polyradical compound has a repeating unit represented by general formula (1) and is crosslinked using a bifunctional crosslinking agent having two polymerizing groups in the molecule represented by general formula (2), wherein R1 to R3 each independently represent hydrogen or methyl group; R4 to R7 each independently represent C1 to C3 alkyl group; X represents single bond, linear, branched or cyclic C1 to C15 alkylenedioxy group, alkylene group, phenylenedioxy group, phenylene group or structure represented by general formula (3); and R8 to R13 each independently represent hydrogen or methyl group, and k represents an integer of 2 to 5.Type: GrantFiled: June 4, 2007Date of Patent: May 20, 2014Assignee: NEC CorporationInventors: Masahiro Suguro, Shigeyuki Iwasa, Yuki Kusachi, Jiro Iriyama, Yukiko Morioka, Kentaro Nakahara, Sadahiko Miura
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Patent number: 8722825Abstract: A polymer comprises the polymerized product of monomers comprising a nitrogen-containing monomer comprising formula (Ia), formula (Ib), or a combination of formulas (Ia) and (Ib), and an acid-deprotectable monomer having the formula (II): wherein a is 0 or 1, each Ra is independently H, F, C1-10 alkyl, or C1-10 fluoroalkyl, L1 is a straight chain or branched C1-20 alkylene group, or a monocyclic, polycyclic, or fused polycyclic C3-20 cycloalkylene group, each Rb is independently H, C1-10 alkyl, C3-20 cycloalkyl, C3-20 heterocycloalkyl, an aliphatic C5-20 oxycarbonyl, or a C1-30 acyl group optionally including a heteroatom substituent group, where each Rb is separate or at least one Rb is attached to an adjacent Rb; LN is a nitrogen-containing monocyclic, polycyclic, or fused polycyclic C3-20 heterocycloalkylene group, and X is H, C1-10 alkyl, aliphatic C5-20 oxycarbonyl, or a C1-30 acyl group optionally including a heteroatom substituent group; and each Rc is independently C1-10 alkyl, C3-20 cycloalkyl, oType: GrantFiled: May 29, 2012Date of Patent: May 13, 2014Assignee: Rohm and Haas Electronic Materials LLCInventors: Deyan Wang, Chunyi Wu, Cong Liu, Gerhard Pohlers, Cheng-bai Xu, George G. Barclay
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Patent number: 8716421Abstract: This invention discloses and claims a series of polycyclic monomers and polymers useful in the production of optical waveguides. The polymers of the invention comprise one or more repeating units represented by the formula (IV): Wherein m, X, R1 and R2 are as defined herein. The films formed from the polymers of this invention exhibit significant changes in refractive index (greater than or equal to 0.5%) after exposure to suitable actinic or thermal energy thereby having superior optical transmission performance, which is of importance for modern optical applications such as wave guiding and optical data storage.Type: GrantFiled: May 23, 2013Date of Patent: May 6, 2014Assignees: Promerus, LLC, Sumitomo Bakelite Co., LtdInventors: Kazuyoshi Fujita, Nanae Kawate, Mari Ueda, Larry F Rhodes
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Publication number: 20140045122Abstract: A positive resist composition comprises a polymer having a carboxyl group substituted with an acid labile group having formula (1) wherein R1 and R2 are alkyl or alkenyl, R3 and R4 are a single bond, methylene, ethylene or propylene, R5 and R6 are hydrogen or alkyl. The composition has a high dissolution contrast, high resolution, and suppressed acid diffusion rate, and forms a pattern of good profile and minimal edge roughness.Type: ApplicationFiled: August 1, 2013Publication date: February 13, 2014Applicant: SHIN-ETSU CHEMICAL CO., LTD.Inventors: Jun Hatakeyama, Koji Hasegawa
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Patent number: 8569451Abstract: The present application relates to an affinity material useful in antibody purification.Type: GrantFiled: April 9, 2010Date of Patent: October 29, 2013Assignee: Biotage ABInventors: Anthony Rees, Börje Sellergren, Ecevit Yilmaz, Thomas Schrader
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Publication number: 20130236968Abstract: The present invention relates to multifunctional polymers represented by the following formula: The invention further provides methods for their preparation and methods for site-specific delivery of nucleic acids by combining them with targeting ligands, endosomolytic ligands and/or PK modulator ligands.Type: ApplicationFiled: June 20, 2011Publication date: September 12, 2013Applicant: ALNYLAM PHARMACEUTICALS, INC.Inventors: Muthiah Manoharan, Kallanthottathil G. Rajeev
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Publication number: 20130198968Abstract: Functional additives for cleansing compositions exhibiting enhanced anti soil-re-deposition and/or dye transfer inhibitory properties comprising polymers in the form of homopolymers, copolymers or terpolymers synthesized from at least one hydrophobic monomer. Examples of hydrophobic monomers include N-vinyl caprolactam, vinyl acetate, vinyl esters, acrylated glycols, methacrylamide, C1 to C12 alkyl- and C1 to C12 dialkylacrylamide, C1 to C12 alkyl- and C1 to C12 dialkylmethacrylamide, C1 to C12 alkyl aery late, C1 to C12 alkyl methacrylate, 4-butyl phenyl maleimide, octyl acrylamide.Type: ApplicationFiled: March 11, 2011Publication date: August 8, 2013Inventors: David K. Hood, Karyn B. Visscher, Surya Kamin, Purvita Shah, Osama M. Musa, Tony Gough, Jayanti V. Patel, Sarah Orton
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Publication number: 20130144021Abstract: The present invention relates to arborescent polymers and to a process for making same. In one embodiment, the present invention relates to arborescent polymers formed from at least one inimer and at least one isoolefin that have been end-functionalized with a polymer or copolymer having a low glass transition temperature (Tg), and to a process for making such arborescent polymers. In another embodiment, the present invention relates to arborescent polymers formed from at least one inimer and at least one isoolefin that have been end-functionalized with less than about 5 weight percent end blocks derived from a polymer or copolymer having a high glass transition temperature (Tg), and to a process for making such arborescent polymers.Type: ApplicationFiled: August 31, 2012Publication date: June 6, 2013Applicants: The University of AkronInventors: Gabor Kaszas, Judit Puskas, Kevin Kulbaba
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Patent number: 8449954Abstract: The present invention relates to a specific photoreactive polymer that shows excellent alignment stability and thermal stability together with excellent liquid crystal alignment, thereby being desirably used in an alignment film of a liquid crystal display device, a compound having a photoreactive functional group that is used as a monomer for the preparation of the photoreactive polymer, and an alignment film.Type: GrantFiled: July 6, 2011Date of Patent: May 28, 2013Assignee: LG Chem, Ltd.Inventors: Dai-Seung Choi, Sung-Ho Chun, Young-Chul Won, Dong-Woo Yoo
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Publication number: 20130115555Abstract: There are provided a method of forming a resist pattern includes: a step (1) in which a resist composition containing a base component (A) that generates base upon exposure and exhibits increased solubility in an alkali developing solution by the action of acid is applied to a substrate to form a resist film; a step (2) in which the resist film 2 is subjected to exposure; a step (3) in which baking is conducted after the step (2); and a step (4) in which the resist film 2 is subjected to an alkali development, thereby forming a negative-tone resist pattern in which the unexposed portion 2b of the resist film 2 has been dissolved and removed, and the resist composition used in the step (1).Type: ApplicationFiled: November 2, 2012Publication date: May 9, 2013Applicant: TOKYO OHKA KOGYO CO., LTD.Inventor: Tokyo Ohka Kogyo Co., Ltd.
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Publication number: 20130066016Abstract: A method for preparing a functionalized polymer, the method comprising the steps of preparing a reactive polymer and reacting the reactive polymer with a heterocyclic nitrile compound.Type: ApplicationFiled: November 6, 2012Publication date: March 14, 2013Applicant: BRIDGESTONE CORPORATIONInventor: Bridgestone Corporation
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Patent number: 8338552Abstract: Embodiments include a sensor comprising a co-polymer, the co-polymer comprising a first monomer and a second monomer. For some embodiments, the first monomer is poly-4-vinyl pyridine, and the second monomer is poly-4-vinyl pyridinium propylamine chloride. For some embodiments, the first monomer is polystyrene and the second monomer is poly-2-vinyl pyridinium propylamine chloride. For some embodiments, the first monomer is poly-4-vinyl pyridine, and the second monomer is poly-4-vinyl pyridinium benzylamine chloride. Other embodiments are described and claimed.Type: GrantFiled: November 16, 2010Date of Patent: December 25, 2012Assignee: California Institute of TechnologyInventors: Margaret A. Ryan, Margie L. Homer, Shiao-Pin S. Yen, Adam Kisor, April D. Jewell, Abhijit V. Shevade, Kenneth S. Manatt, Charles Taylor, Mario Blanco, William A. Goddard
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Patent number: 8329377Abstract: An imide compound represented by the formula (I): wherein R1 represents a C1-C20 aliphatic hydrocarbon group etc., W1 represents —CO—O— etc., Q1 and Q2 each independently represent a fluorine atom etc., and A represents a group represented by the formula (I-1): wherein A1 represents —CH2—CH2— etc., and a chemically amplified resist composition containing the same.Type: GrantFiled: July 21, 2009Date of Patent: December 11, 2012Assignee: Sumitomo Chemical Company, LimitedInventors: Ichiki Takemoto, Tatsuro Masuyama, Takashi Hiraoka
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Publication number: 20120235099Abstract: The object of the present invention is to provide a radiation-sensitive colored composition which can supress the generation of the contamination of the device. A radiation-sensitive colored composition including: (A) a dye containing of from 10 ppm to 1000 ppm of a halogen ion; (B) a polymerizable compound; and (C) a solvent.Type: ApplicationFiled: March 15, 2012Publication date: September 20, 2012Applicant: FUJIFILM CORPORATIONInventors: Kenta USHIJIMA, Junichi Itou, Yushi KANEKO, Yuzo NAGATA, Yoshiharu YABUKI, Atsuyasu NOZAKI, Hiroaki IDEI
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Publication number: 20120172559Abstract: A one pot method of preparing cyclic carbonyl compounds comprising an active pendant pentafluorophenyl ester group is disclosed. The cyclic carbonyl compounds can be polymerized by ring opening methods to form ROP polymers comprising repeat units comprising a side chain pentafluorophenyl ester group. Using a suitable nucleophile, the pendant pentafluorophenyl ester group can be selectively transformed into a variety of other functional groups before or after the ring opening polymerization.Type: ApplicationFiled: March 8, 2012Publication date: July 5, 2012Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATIONInventors: James L. Hedrick, Alshakim Nelson, Daniel P. Sanders
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Patent number: 8163402Abstract: The invention relates to a polymer comprising structural unit of formula I: wherein R1, R2, R3, R4, R5, and R6 are independently at each occurrence a C1-C20 aliphatic radical, a C3-C20 aromatic radical, or a C3-C20 cycloaliphatic radical; a, b, d, e and f are independently at each occurrence 0, or an integer ranging from 1 to 4; c is independently at each occurrence 0, or an integer ranging from 1 to 3. In another aspect, the invention relates to monomers for preparing the polymers. In yet another aspect, the invention relates to an optical electronic device comprising a polymer comprising structural unit of formula I.Type: GrantFiled: December 6, 2008Date of Patent: April 24, 2012Assignee: General Electric CompanyInventors: Qing Ye, Jie Liu, Yangang Liang, Shengxia Liu
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Patent number: 8148484Abstract: Norbornene-based biocidal polymers having primary, secondary or tertiary amine or phosphine end groups, the parent monomers, processes for preparing the monomers and polymers, and their use.Type: GrantFiled: October 16, 2006Date of Patent: April 3, 2012Assignee: KE Kelit Kunststoffwerk GesmbHInventors: Xaver Norbert Gstrein, Wolfgang Kern, Karl Rametsteiner, Gerhard Seyfriedsberger, Franz Stelzer
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Patent number: 8110641Abstract: An anionic polymerization method for styrene derivative containing pyridine as functional group is provided. The method includes forming a complex of (vinylphenyl)-pyridine and lithium chloride and performing anionic polymerization. Accordingly, a polymer of styrene derivative containing pyridine can be obtained. The polymer has excellent optical properties, and its molecular weight and molecular weight distribution can be controlled.Type: GrantFiled: December 16, 2008Date of Patent: February 7, 2012Assignee: Gwangju Institute of Science and TechnologyInventors: Jae-Suk Lee, Nam-Goo Kang
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Patent number: 8110642Abstract: Provided are a vinyl-biphenylpyridine monomer and a polymer thereof. More particularly, the present invention provides a vinyl-biphenylpyridine monomer having a side chain of pyridine or phenylpyridine as a functional group, a homopolymer of which molecular weight and molecular weight distribution are controlled using the monomer, and a block copolymer of which molecular structure and molecular weight are controlled to facilitate synthesis of an organic metal complex. Accordingly, the present invention provides a vinyl-biphenylpyridine monomer and a polymer thereof which are effectively used as nano and optical functional materials.Type: GrantFiled: April 3, 2007Date of Patent: February 7, 2012Assignee: Gwangju Institute of Science and TechnologyInventors: Jae-Suk Lee, Nam-Goo Kang
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Patent number: 8110262Abstract: The present invention provides polyolefin compositions containing a polyolefin resin, a hindered amine light stabilizer, and a polymer processing aid. Methods for preparing the polymer compositions, methods for using the compositions to produce articles of manufacture, and the articles produced from these polyolefin compositions are also provided.Type: GrantFiled: November 10, 2008Date of Patent: February 7, 2012Assignee: Chevron Phillips Chemical Company LPInventor: Elizabeth M. Lanier
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Publication number: 20120008068Abstract: A polymer compound comprising a repeating unit of below formula (1) or (2), and having a polystyrene reduced number average molecular weight of 103 to 108, (wherein, Ar1 and Ar2 each independently represent a trivalent aromatic hydrocarbon group or a trivalent heterocyclic group. X1 and X2 each independently represent O, S, C(?O), S(?O), SO2, C(R1)(R2), Si(R3)(R4), N(R5), B(R6), P(R7) or P(?O)(R8). X1 and X2 are not the same. X1 and Ar2 bond to adjacent carbons in the aromatic ring of Ar1, and X2 and Ar1 bond to adjacent carbons in the aromatic ring of Ar2), (wherein, Ar3 and Ar4 each independently represent a trivalent aromatic hydrocarbon group or a trivalent heterocyclic group. X3 and X4 each independently represent N, B, P, C(R9) or Si(R10). X3 and X4 are not the same. X3 and Ar4 bond to adjacent carbons in the aromatic ring of Ar3, and X4 and Ar3 bond to adjacent carbons in the aromatic ring of Ar4.).Type: ApplicationFiled: June 7, 2011Publication date: January 12, 2012Applicant: SUMITOMO CHEMICAL COMPANY, LIMITEDInventors: Shuji DOI, Satoshi KOBAYASHI, Takanobu NOGUCHI
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Patent number: 8088874Abstract: It is an object of the present invention to provide a crosslinked (meth)acrylic acid-type copolymer excellent in stability to a solvent, which causes substantially no crack due to drying when applied onto the surface of a current collector, and a secondary-cell electrode using the copolymer. The present invention relates to a crosslinked (meth)acrylic acid-type copolymer obtained by the steps of: polymerization of a (meth)acrylic acid imino compound represented by the general formula (1): (in the formula (1), R represents a hydrogen atom or a methyl group) and a (meth)acrylic acid ester in the presence of a crosslinking agent, and nitroxidation.Type: GrantFiled: June 4, 2007Date of Patent: January 3, 2012Assignee: Sumitomo Seika Chemicals Co., Ltd.Inventors: Nobutaka Fujimoto, Koji Ueda
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Patent number: 8043990Abstract: The invention relates to a catalyst system for polymerization of olefins, the catalyst system comprising a titanium-containing procatalyst carrying internal electron donor(s), an organoaluminium cocatalyst and a mixture of external electron donors, the mixture comprising a carboxylic acid ester or derivatives thereof, an alkoxy silane and a nitrogen based compound. The invention also relates to a process for polymerization of olefin(s) and to the polyolefin synthesized by the process.Type: GrantFiled: August 25, 2008Date of Patent: October 25, 2011Assignee: Reliance Industries LimitedInventors: Virendrakumar Gupta, Harshad Ramdas Patil, Dhananjay Ghelabhai Naik, Sukhdeep Kaur, Gurmeet Singh, Priyanshu Bharatkumar Vyas
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Publication number: 20110166308Abstract: The present invention provides polymers resulting from polymerization of at least one reactive vinyl monomer moiety and a multifunctional N-vinylformamide crosslinking moiety; polymers resulting from polymerization of at least one reactive vinyl monomer moiety and a hybrid N-vinylformamide crosslinking moiety having at least one N-vinylformamide functionality and at least one other reactive vinyl functionality; polymers resulting from polymerization of at least one hybrid reactive N-vinylformamide monomer moiety having one N-vinylformamide functionality and at least one other reactive non-vinyl functionality and a multifunctional N-vinylformamide crosslinking moiety; and polymers resulting from polymerization of at least one hybrid reactive N-vinylformamide monomer moiety having one N-vinylformamide functionality and at least one other reactive non-vinyl functionality and a hybrid N-vinylformamide crosslinking moiety having at least one N-vinylformamide functionality and at least one other reactive vinyl funcType: ApplicationFiled: January 5, 2011Publication date: July 7, 2011Inventors: Osama M. Musa, Ilya Makarovsky, Lei Cuiyue
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Patent number: 7968650Abstract: The present invention relates to compositions comprising a polymeric substrate comprising at least one volume excluding polymer. In one embodiment, the present invention provides polymeric articles that are capable of acting as osmotic drivers. The articles are capable of maintaining a desired water balance by moving water in or out of a substrate to maintain cation concentration equilibrium between the substrate and its environment.Type: GrantFiled: October 26, 2007Date of Patent: June 28, 2011Assignee: Johnson & Johnson Vision Care, Inc.Inventors: Brian J. Tighe, Muriel Nasso, Beverley Benning, Frank F. Molock, Jr.
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Publication number: 20110108768Abstract: Disclosed is a composition comprising: a compound having residues of at least two kinds of nitrogenated compounds selected from the group consisting of nitrogenated compounds represented by formulae (1-1), (1-2), (1-3) and (1-4) [wherein R's independently represent a hydrogen atom or a substituent and may be the same as or different from one another]; and a phosphorescent light-emitting compound.Type: ApplicationFiled: June 23, 2009Publication date: May 12, 2011Applicants: SUMITOMO CHEMICAL COMPANY, LIMITED, SUMATION CO., LTD.Inventor: Nobuhiko Akino
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Publication number: 20110108755Abstract: Disclosed are an oligomer and a phthalonitrile monomer having the formulas: M is a metal or H. The value n is an integer greater than or equal to 1 for the oligomer and greater than or equal to 0 for the phthalonitrile monomer. Ar1 and Ar2 are independently selected aromatic- or heterocyclic-containing groups. Ar1, Ar2, or both are heteroaromatic or heterocyclic groups containing a nitrogen, sulfur, or oxygen heteroatom. Also disclosed are thermosets and pyrolyzed materials made from the phthalonitrile monomer.Type: ApplicationFiled: November 12, 2009Publication date: May 12, 2011Applicant: The Government of the United States Of America, as represented by the Secretary of the NavyInventors: Matthew Laskoski, Teddy M Keller
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Patent number: 7935772Abstract: Disclosed is a water-based resin composition containing a copolymer (A) which is obtained by carrying out emulsion polymerization of an unsaturated monomer composed of 0.5 to 50 parts by mass of a specific ethylenically unsaturated monomer (a) having a piperidyl group in a molecule and 50 to 99.5 parts by mass of an ethylenically unsaturated monomer (b), which does not substantially contain an ethylenically unsaturated monomer having a specific functional group in a molecule, with the total of the ethylenically unsaturated monomers (a) and (b) being 100 parts by mass, under the coexistence of 0.1 to 10 parts by mass of an emulsifier. Also disclosed are a weather resistance improver for water-based paints using the foregoing water-based resin composition, a weather resistance improver for thermoplastic resins, and a weather resistance improver for solvent-based paints.Type: GrantFiled: May 26, 2006Date of Patent: May 3, 2011Assignee: Mitsubishi Rayon Co., Ltd.Inventors: Takahiro Mukuda, Masaaki Kiura, Motomi Tanaka
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Patent number: 7935771Abstract: There is provided a polymer including a unit represented by Chemical Formula (1): wherein R represents -A1-SO2R1; R1w and R1x are each independently a halogen atom or a hydrogen atom; R1y is a CH3 group, a halogen atom or a hydrogen atom; A01 is a substituted or unsubstituted aromatic ring structure or a substituted or unsubstituted heterocyclic structure; A1 is a substituted or unsubstituted aliphatic hydrocarbon structure, a substituted or unsubstituted aromatic ring structure or a substituted or unsubstituted heterocyclic structure; R1 is OH, a halogen atom, ONa, OK or OR1a; R1a is a substituted or unsubstituted aliphatic hydrocarbon structure, a substituted or unsubstituted aromatic ring structure or a substituted or unsubstituted heterocyclic structure.Type: GrantFiled: November 10, 2006Date of Patent: May 3, 2011Assignee: Canon Kabushiki KaishaInventors: Tatsuki Fukui, Akiko Tominaga, Takashi Kenmoku, Masato Minami, Tetsuya Yano, Takeshi Ikeda, Atsushi Tani, Norikazu Fujimoto
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Publication number: 20110060114Abstract: Embodiments include a sensor comprising a co-polymer, the co-polymer comprising a first monomer and a second monomer. For some embodiments, the first monomer is poly-4-vinyl pyridine, and the second monomer is poly-4-vinyl pyridinium propylamine chloride. For some embodiments, the first monomer is polystyrene and the second monomer is poly-2-vinyl pyridinium propylamine chloride. For some embodiments, the first monomer is poly-4-vinyl pyridine, and the second monomer is poly-4-vinyl pyridinium benzylamine chloride. Other embodiments are described and claimed.Type: ApplicationFiled: November 16, 2010Publication date: March 10, 2011Inventors: Margaret A. Ryan, Margie L. Homer, Shiao-Pin S. Yen, Adam Kisor, April D. Jewell, Abhijit V. Shevade, Kenneth S. Manatt, Charles Taylor, Mario Blanco, William A. Goddard
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Publication number: 20110042664Abstract: A charge-transporting polymer including a unit derived from at least one polymerizable compound represented by formula (1), formula (2) and formula (3): where R1 to R3 are as defined herein.Type: ApplicationFiled: April 23, 2009Publication date: February 24, 2011Applicant: SHOWA DENKO K.K.Inventors: Tsuyoshi Katoh, Takeshi Igarashi
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Publication number: 20100327738Abstract: The present invention provides a polymer material capable of preparing organic EL elements having low driving voltage and high durability. The polymer compound of the present invention includes a constituting unit derived from a monomer represented by the formula (1); (in the formula (1), each of A1's is independently a condensed polycyclic aromatic group optionally having a heteroatom as a ring-constituting atom; the condensed polycyclic aromatic group links to A2 at the meta position to the bonding position of the ring represented by the following formula; each of A2's is independently a six-membered ring aromatic group optionally having a heteroatom as a ring-constituting atom; at least one of A1 and A2 has a substituent having a polymerizable functional group; at least one of X's is a nitrogen atom, and n's are independently 1 or 2).Type: ApplicationFiled: February 20, 2009Publication date: December 30, 2010Applicant: SHOWA DENKO K.K.Inventors: Masahiko Toba, Tsuyoshi Kato
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Patent number: 7858720Abstract: Embodiments include a sensor comprising a co-polymer, the co-polymer comprising a first monomer and a second monomer. For some embodiments, the first monomer is poly-4-vinyl pyridine, and the second monomer is poly-4-vinyl pyridinium propylamine chloride. For some embodiments, the first monomer is polystyrene and the second monomer is poly-2-vinyl pyridinium propylamine chloride. For some embodiments, the first monomer is poly-4-vinyl pyridine, and the second monomer is poly-4-vinyl pyridinium benzylamine chloride. Other embodiments are described and claimed.Type: GrantFiled: June 19, 2007Date of Patent: December 28, 2010Assignee: California Institute of TechnologyInventors: Margaret A. Ryan, Margie L. Homer, Shiao-Pin S. Yen, Adam Kisor, April D. Jewell, Abhijit V. Shevade, Kenneth S. Manatt, Charles Taylor, Mario Blanco, William A. Goddard
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Patent number: 7858694Abstract: Polymer of formula (I): In-[(A)x-(B)y-(A?)x?-(E)z]n obtained by nitroxyl mediated controlled free radical polymerization whereby an access of acrylate is present, wherein In is the initiator fragment starting the polymerization reaction; A and A? are the same or different monomers selected from the group consisting of acrylic acid, methacrylic acid, acrylonitrile, methacrylonitrile, acrylic acid (C1-C22)alkyl esters, acrylic acid (C1-C22)hydroxyalkyl esters, methacrylic acid (C1-C22)alkyl esters, methacrylic acid (C1-C22)hydroxyalkyl esters, acrylic acid (C1-C22)alkyl esters or methacrylic acid (C1-C22)alkyl esters which are substituted by amino, (C1-C22)alkylamino, (C1-C22)dialkylamino, —SO3H, epoxy, fluoro, perfluoro or siloxane groups, styrene, substituted styrene, acrylamide and methacrylamide, N-mono(C1-C22)alkyl acrylamide, N,N-di(C1-C22)alkyl acrylamide; provided that the amount of unsubstituted acrylic acid (C1-C22)alkyl esters or/and methacrylic acid (C1-C22)alkyl esters is more than 30% by weight baType: GrantFiled: August 21, 2006Date of Patent: December 28, 2010Assignee: Ciba Specialty Chemicals Corp.Inventors: Lothar Alexander Engelbrecht, Arend Noordam
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Patent number: 7851584Abstract: Disclosed are processes for preparing monomer complexes that include contacting 2,3,5,6-tetraminopyridine free base in water with 2,5-dihydroxy terephthalic acid dipotassium salt to form an aqueous mixture, and adjusting the pH of the aqueous mixture to within the range of from about (3) to about (5) to precipitate the monomer complex. Processes of polymerizing the monomer complexes, polyareneazoles, filaments and yarns are also disclosed.Type: GrantFiled: March 27, 2006Date of Patent: December 14, 2010Assignees: E. I. du Pont de Nemours and Company, Magellan Systems International, LLCInventors: Doetze Jakob Sikkema, David J Rodini, Hasan Dindi, James Arnold Schultz, Georg Valentin Martin, Ralf Demuth, Michael Schelhaas