Abstract: An aspect of the present invention relates to a radiation-curable vinyl chloride copolymer, which comprises a structural unit denoted by general formula (1): wherein, in general formula (1), R1 denotes a hydrogen atom or a methyl group, and L1 denotes a divalent linking group denoted by formula (2), formula (3), or general formula (4): wherein, in general formula (4), R41 denotes a hydrogen atom or a methyl group.

Abstract: The present invention provides a method of making a methylene malonate monomer that includes the steps of reacting a malonic acid ester with a source of formaldehyde optionally in the presence of an acidic or basic catalyst and optionally in the presence of an acidic or non-acidic solvent to form reaction complex. The reaction is optionally performed in the presence of or contacted with an energy transfer means such as a heat transfer agent, a heat transfer surface, a source of radiation or a laser such that reaction complex is substantially vaporized to produce a vapor phase comprising methylene malonate monomer which may be isolated. The present invention further provides methylene malonate monomers prepared by the method of the invention, as well as compositions and products formed from the methylene malonate monomers, including monomer-based products (e.g., inks, adhesives, coatings, sealants or reactive molding) and polymer-based products (e.g.

Abstract: A Photoresist composition comprising a polymer comprising a structural unit derived from a compound represented by the formula (I): wherein R1 represents a hydrogen atom or a methyl group, R2 represents a C6-C12 aromatic hydrocarbon group which can have one or more substituents, R3 represents a cyano group or a C1-C12 hydrocarbon group which can have one or more substituents and which can contain one or more heteroatoms, A1 represents a single bond, —(CH2)g—CO—O—* or —(CH2)h—O—CO—(CH2)i—CO—O—* wherein g, h and i each independently represent an integer of ?1 to 6 and * represents a binding position to the nitrogen atom, a resin having an acid-labile group and being insoluble or poorly soluble in an aqueous alkali solution but becoming soluble in an aqueous alkali solution by the action of an acid, and an acid generator.

Abstract: An aspect of the present invention relates to a radiation-curable vinyl chloride copolymer, which comprises a structural unit denoted by general formula (1): wherein, in general formula (1), R1 denotes a hydrogen atom or a methyl group, and L1 denotes a divalent linking group denoted by formula (2), formula (3), or general formula (4): wherein, in general formula (4), R41 denotes a hydrogen atom or a methyl group.

Abstract: An inimer, and process for making same, having the following formula: wherein X=halogen, nitroxide, thioester; R?H or CH3; and R?=aliphatic, non-aliphatic, linear or branched, mesogenic, non mesogenic, chiral, achiral, hydrocarbon, non-hydrocarbon, selected from fluorocarbon, oligo(oxyethylene) and siloxane substituents, alkyl, aryl, mesogenic group, non-mesogenic group, aliphatic, non-aliphatic, siloxane , perfluoroalkyl, perfluoroaryl, or other fluorocarbon group, and polymers, and the process of making them, from the inimer.

Abstract: An ultraviolet-curing resin composition of (a) 5 to 35 parts by mass of a chlorinated polyolefin with a chlorine content of 15 to 40 mass %, (b) 15 to 60 parts by mass of an alicyclic hydrocarbon mono(meth)acrylate, and (c) 5 to 80 parts by mass of a polypropylene glycol di(meth)acrylate; and, per 100 parts by mass of the total amount of components (a), (b) and (c), (d) 0 to 1100 parts by mass of an aliphatic hydrocarbon di(meth)acrylate and (e) 0 to 600 parts by mass of a polyfunctional monomer having 3 to 6 (meth)acryloyl groups in its molecule; and, per 100 parts by mass of the total amount of components (b), (c), (d) and (e), (f) 1 to 15 parts by mass of a photoinitiator; and the composition as an active ingredient in paints, inks, adhesives, sealing agents and primers.

Abstract: The aim of the present invention is to provide a multi-branched polymer, in which branch terminals can be easily modified and which have a high degree of branching and narrow dispersion. By polymerizing a compound having 2 or more polymerization-initiation sites and polymerizable unsaturated bonds with a living radical polymerization method using a metal catalyst, it is possible to produce a multi-branched polymer with narrow dispersion and a high degree of branching and having repeating units represented by the formula (I): wherein R1 to R3 each independently represents hydrogen or a hydrocarbon group, R1 may be bonded to R3 to form a ring; X represents a connecting group having a valence of 3 or higher; Y may be the same or different and each represents a functional group which may have a halogen atom at a terminal thereof; and a is an integer of 2 or larger.

Abstract: A polymer compound having a structural unit (a0) represented by a general formula (a0-1) shown below, and a structural unit (a1) that is derived from an acrylate ester containing an acid dissociable, dissolution inhibiting group but is not classified as said structural unit (a0). [wherein, R represents a hydrogen atom, a lower alkyl group, or a halogenated lower alkyl group; A represents a divalent aliphatic cyclic group that may have a substituent; B represents a divalent hydrocarbon group that may have a substituent; r represents an integer of 0 or 1; and R1 represents an acid dissociable, dissolution inhibiting group.

Abstract: A polymer comprising recurring units of formula (1) wherein R1 is F or fluoroalkyl, R2 is alkylene or fluoroalkylene, and R3 is an acid labile group and having a Mw of 1,000-500,000 is used to formulate a resist composition, which is processed by the lithography involving ArF exposure and offers many advantages including resolution, minimal line edge roughness, etch resistance, and minimal surface roughness after etching. The composition performs well when processed by the ArF immersion lithography with liquid interposed between the projection lens and the wafer.

Abstract: The present invention includes optical coatings containing ultraviolet curable monomers employing a bromine substituted fluorene structure. The fluorene backbone of the monomers of the present invention may also be functionalized with one or more polymerizable or reactive functionalities, and most readily at the 9 position. Compositions of the present invention include the reactive bromosubstituted fluorenes combined with inorganic nanoparticles, particularly nanoparticles with reactive surface modifiers exhibiting polymerizable functionality. Reactive high index nanoparticles such as surface modified zirconia are contemplated.

Abstract: A photorefractive composition comprising a polymer prepared by living radical polymerization, wherein: the living radical polymerization is carried out using a monomer, a polymerization initiator, transition metal catalyst and a ligand capable of reversibly forming a complex with the transition metal catalyst, and the polymer comprises at least one of a repeat unit including a moiety having charge transport ability and a repeat unit including a moiety having non-linear-optical ability.

Abstract: A stainproofing polymer having: (i) a reactive group selected from the group consisting of a carboxyl group or its salt, a hydroxyl group, an epoxy group, a phosphoric acid group, an alkoxysilane group, an imine group, a sulfonic acid group, an amino group, an isocyanate group and a blocked isocyanate group; and (ii) a fluoroalkyl group, characterized in that a melting point of a monomer having a fluoroalkyl group, which constitutes the polymer, is at least 70° C. and a melting point of the stainproofing polymer is at least 50° C., gives durability capable of maintaining sufficient water- and oil-repellency after cleaning.