Additional Monomer Is A Halogen-containing Monomer Patents (Class 526/329.4)
  • Patent number: 8992733
    Abstract: Disclosed is a water and oil resistant agent comprising a fluorine-containing copolymer obtained by copolymerizing a (meth)acrylate monomer having a polyfluoroalkyl group having 1 to 6 carbon atoms, the agent being able to afford a superior water and oil resistance to a paper. The invention also discloses a composition comprising the water and oil resistant agent, a process for treating a paper thereby and a treated paper thereby.
    Type: Grant
    Filed: February 14, 2011
    Date of Patent: March 31, 2015
    Assignee: Daikin Industries, Ltd.
    Inventors: Tetsuya Uehara, Kensuke Mohara, Eiji Masuda, Kayo Kusumi, Michio Matsuda
  • Patent number: 8980404
    Abstract: A composition for imprints comprising a polymerizable monomer, a photopolymerization initiator, and a polymer having a functional group with at least one of a fluorine atom or a silicon atom and having a polymerizable functional group, wherein the polymer has a weight-average molecular weight of at least 2000 and the amount of the polymer is from 0.01 to 20% by mass relative to the polymerizable monomer, is excellent in patternability and mold releasability, capable of forming good patterns and free from a problem of mold contamination.
    Type: Grant
    Filed: October 29, 2009
    Date of Patent: March 17, 2015
    Assignee: FUJIFILM Corporation
    Inventor: Kunihiko Kodama
  • Patent number: 8916650
    Abstract: The present invention relates to an inner-plasticized vinyl chloride-based copolymer resin not requiring plasticizers and a preparation method thereof. Specifically, the vinyl chloride-based copolymer resin is prepared by a suspension polymerization method of initiating the polymerization of vinyl chloride monomer, feeding a certain amount of butyl acrylate continuously or discontinuously thereinto and carrying out the additional polymerization at the temperature higher than the polymerization initiation temperature so as to prepare a core-shell type vinyl chloride-based random copolymer resin. The vinyl chloride-based copolymer resin of core-shell structure prepared by the present invention includes vinyl chloride-butyl acrylate copolymer, and it can provide a vinyl chloride-butyl acrylate copolymer product which can be processed without plasticizers positively necessary to produce a soft product.
    Type: Grant
    Filed: July 16, 2013
    Date of Patent: December 23, 2014
    Assignee: Hanwha Chemical Corporation
    Inventors: Ji-Woo Kim, Jee-Hyong Lee, Jung-Ho Kong, Yong-Kook Jung, Sang-Hyun Cho
  • Patent number: 8901264
    Abstract: To provide a copolymer which can impart sufficient dynamic water repellency, after air-drying water repellency and friction durability to a surface of an article, and which has low impact on the environment, a method for producing the same, a water repellent composition and an article excellent in dynamic water repellency, after air-drying water repellency and friction durability.
    Type: Grant
    Filed: September 9, 2010
    Date of Patent: December 2, 2014
    Assignee: Asahi Glass Company, Limited
    Inventors: Kazunori Sugiyama, Toyomichi Shimada, Nobuyuki Otozawa, Yuuichi Oomori, Minako Shimada
  • Patent number: 8871882
    Abstract: A method for the preparation of a fluoropolymer by means of emulsion polymerization of a reaction mixture in an aqueous medium is disclosed wherein the reaction mixture includes a fluoromonomer having the structure of wherein R1, R2, and R3 are each independently hydrogen atoms, alkyl groups, substituted alkyl groups, or halogens, wherein at least one of R1, R2, and R3 is a fluorine atom, and wherein R is each independently a substituent on the styrenic ring, n is an integer from 0 to 5 representing the number of the substituents on the styrenic ring; b) an emulsion stabilizer combination comprising: i) an anionic surfactant; and, ii) a cationic surfactant or a non-ionic surfactant; and, c) a free-radical initiator.
    Type: Grant
    Filed: February 14, 2012
    Date of Patent: October 28, 2014
    Assignee: Akron Polymer Systems, Inc.
    Inventors: Xiaoliang Zheng, Dong Zhang, Jiaokai Jing, Ted Calvin Germroth, Frank W. Harris, Thauming Kuo, Bin Wang, Douglas Stephens McWilliams
  • Publication number: 20140171609
    Abstract: It is provided a process for the preparation of an essentially homogeneous random copolymer from a vinyl halide monomer and an acrylate monomer, the process comprising polymerizing by a reversible-deactivation radical polymerization a vinyl halide monomer and an acrylate monomer in aqueous medium in the presence of an amphiphilic substance, a buffer, a reversible-deactivation radical initiator, a non-metallic catalyst and, optionally, a phase transfer catalyst, wherein an excess of the vinyl halide monomer together with a certain amount of the acrylate monomer are loaded in the reactor, and thereafter the rest of the acrylate monomer is added at a decreasing flow rate such that the composition of the copolymer obtained remains constant throughout the process. It is also provided a copolymer obtainable by this process and an article comprising such a copolymer.
    Type: Application
    Filed: July 24, 2012
    Publication date: June 19, 2014
    Applicant: ERCROS, S.A.
    Inventors: Rafael Obeso Cáceres, Belén Pascual Fernandez, José María Asua González
  • Patent number: 8642177
    Abstract: A method to provide acid etch resistance to contacting a calcareous substrate with a copolymer prepared from fluorinated methacrylate, short chain branched (meth)acrylate, and (meth)acrylic acid salt and a treated substrate.
    Type: Grant
    Filed: March 20, 2012
    Date of Patent: February 4, 2014
    Assignee: E I du Pont de Nemours and Company
    Inventors: Brad M Rosen, Siddhartha R. Shenoy, Anilkumar Raghavanpillai, Ernest Bryon Wysong, Joel M Pollino, James J Hughes, John Russell Crompton, Jr.
  • Patent number: 8628855
    Abstract: Presently described are articles, such as optical displays and protective films, comprising a (e.g. light transmissive) substrate having a surface layer comprising the reaction product of a mixture comprising a non-fluorinated binder precursor (e.g. of a hardcoat composition) and at least one polymerizable perfluoropolyether polymer. The resulting cured surface layer can advantageously exhibit low lint attraction in combination with low surface energy. Also described are one-step and two-step methods of synthesizing perfluoropolyether polymers having polymerizable ethylenically unsaturated groups.
    Type: Grant
    Filed: December 10, 2008
    Date of Patent: January 14, 2014
    Assignee: 3M Innovative Properties Company
    Inventors: Encai Hao, Zai-Ming Qiu, Yu Yang, Thomas P. Klun
  • Patent number: 8568875
    Abstract: Copolymers which are composed of at least 4 monomers, including (meth)acrylate compounds containing perfluoroalkyl groups, are suitable for the treatment of fiber materials. The copolymers are usually used here in the form of aqueous dispersions. The fiber materials are in particular fabrics, for example made of polyolefin. Treatment with the copolymers imparts to them oil- and water-repellent properties and also repellent properties toward low molecular weight alcohols.
    Type: Grant
    Filed: December 11, 2012
    Date of Patent: October 29, 2013
    Assignee: Huntsman Textile Effects (Germany) GmbH
    Inventors: Rolf Moors, Wilhelm Artner, Isabella Rettenbacher, Edeltraud Schidek
  • Patent number: 8552128
    Abstract: A process for the preparation of a fluoroolefin polymer from an azeotropic mixture of monomers having a constant composition, the process including the step of: contacting in a reaction zone: (i) an initiator; and (ii) an azeotropic mixture of monomers including at least one fluoroolefin and, optionally, at least one ethylenically unsaturated comonomer capable of copolymerizing therewith; wherein the contacting is carried out at a temperature, pressure and length of time sufficient to produce the fluoroolefin polymer.
    Type: Grant
    Filed: December 20, 2007
    Date of Patent: October 8, 2013
    Assignee: Honeywell International Inc.
    Inventors: George J Samuels, Gregory J Shafer, Hang T Pham
  • Patent number: 8530598
    Abstract: A resist composition for immersion exposure including: a base component (A) which exhibits changed solubility in an alkali developing solution under the action of acid; an acid-generator component (B) which generates acid upon exposure; and a fluorine-containing resin component (F); dissolved in an organic solvent (S), the fluorine-containing resin component (F) including a structural unit (f1) containing a fluorine atom, a structural unit (f2) containing a hydrophilic group-containing aliphatic hydrocarbon group, and a structural unit (f3) derived from an acrylate ester containing a tertiary alkyl group-containing group or an alkoxyalkyl group.
    Type: Grant
    Filed: January 12, 2012
    Date of Patent: September 10, 2013
    Assignee: Tokyo Ohka Kogyo Co., Ltd.
    Inventors: Masaru Takeshita, Yasuhiro Yoshii
  • Patent number: 8420292
    Abstract: A polymer comprising recurring units of formula (1) and having a solubility in alkaline developer which increases under the action of an alkaline developer is provided. The polymer has transparency to radiation of up to 200 nm and improved water repellency, water slip, acid lability and hydrolysis and is useful as an additive polymer to formulate a resist composition. R1 is H, F, methyl, or trifluoromethyl, R2 is a monovalent fluorinated hydrocarbon group, An is a (n+1)-valent hydrocarbon or fluorinated hydrocarbon group, and n is 1, 2 or 3.
    Type: Grant
    Filed: January 14, 2011
    Date of Patent: April 16, 2013
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Yuji Harada, Takeru Watanabe, Takeshi Sasami, Yuuki Suka, Koji Hasegawa
  • Patent number: 8349976
    Abstract: Copolymers which are composed of at least 4 monomers, including (meth)acrylate compounds containing perfluoroalkyl groups, are suitable for the treatment of fiber materials. The copolymers are usually used here in the form of aqueous dispersions. The fiber materials are in particular fabrics, for example made of polyolefin. Treatment with the copolymers imparts to them oil- and water-repellent properties and also repellent properties toward low molecular weight alcohols.
    Type: Grant
    Filed: May 14, 2008
    Date of Patent: January 8, 2013
    Assignee: Huntsman Textile Effects (Germany) GmbH
    Inventors: Rolf Moors, Wilhelm Artner, Isabella Rettenbacher, Edeltraud Schidek
  • Patent number: 8163858
    Abstract: A polyvinylidene difluoride copolymer with a fluoroolefin selected from 2,3,3,3-tetrafluoropropene, 1,1,3,3,3-pentafluoropropene, 2-chloro-pentafluoropropene, hexafluoropropylene, trifluoroethylene, chlorotrifluoroethylene, 3,3,3-trifluoro-2-trifluoromethylpropene and a mixture thereof, wherein the stoichiometry of the co-monomers defines the barrier properties of the copolymer. Such polymers include moisture barrier copolymers and oxygen barrier copolymer. Processes for preparing such moisture barrier copolymers and oxygen barrier copolymers are also provided.
    Type: Grant
    Filed: December 20, 2007
    Date of Patent: April 24, 2012
    Assignee: Honeywell International Inc.
    Inventors: George J Samuels, Gregory J Shafer, Tao Li, Clinton A Threlfall, Nancy Iwamoto, Eric J Rainal
  • Patent number: 8034534
    Abstract: The present invention relates to partially fluorinated (meth)acrylic polymers that can be blended with other (meth)acrylic polymers to provide enhanced surface properties.
    Type: Grant
    Filed: August 14, 2007
    Date of Patent: October 11, 2011
    Assignee: E.I. du Pont de Nemours and Company
    Inventors: William Brown Farnham, Suniti Moudgil
  • Patent number: 8034532
    Abstract: A topcoat material for application on top of a photoresist material is disclosed. The topcoat material comprises an acid-inert compound. The topcoat material also comprises a polymer or an oligomer or a cage structure which shows negligible intermixing with the imaging layer and is soluble in aqueous base developer. A method of forming a patterned material layer on a substrate and a coated substrate comprising the topcoat material is also disclosed.
    Type: Grant
    Filed: April 28, 2006
    Date of Patent: October 11, 2011
    Assignee: International Business Machines Corporation
    Inventors: Robert David Allen, Phillip Joe Brock, Carl E. Larson, Ratnam Sooriyakumaran, Linda Karin Sundberg, Hoa D Truong
  • Publication number: 20100330372
    Abstract: The present invention provides coating systems for surfaces and methods for coating and repairing surfaces.
    Type: Application
    Filed: May 16, 2008
    Publication date: December 30, 2010
    Applicant: JOHNSONDIVERSEY, INC.
    Inventors: Nathan E. Ludtke, Ryan E. Kron, Jia Liu, Christopher C. Cypcar
  • Publication number: 20100331479
    Abstract: To provide a copolymer which can impart sufficient dynamic water repellency, after air-drying water repellency and friction durability to a surface of an article, and which has low impact on the environment, a method for producing the same, a water repellent composition and an article excellent in dynamic water repellency, after air-drying water repellency and friction durability.
    Type: Application
    Filed: September 9, 2010
    Publication date: December 30, 2010
    Applicant: ASAHI GLASS COMPANY, LIMITED
    Inventors: Kazunori Sugiyama, Toyomichi Shimada, Nobuyuki Otozawa, Yuuichi Oomori
  • Patent number: 7842767
    Abstract: The present invention relates to a cross-linked polyether which is obtained by polymerization of at least one monomer selected from the group consisting of (a) (?-X-methyl) vinyl-EWG, (?-X-methyl) vinyl-ERG, or (?-X-methyl) vinyl-aryl, where X is oxygen, sulfur, PEG, PPG or poly (THF); (b) a monomer which is polymerizable with a PEG, PPG or poly (THF) cross-linker having at least one (?-X-methyl) vinyl-EWG, (?-X-methyl) vinyl-ERG or (?-X-methyl) vinyl-aryl, where X is oxygen, sulfur, PEG, PPG, or poly (THF); (c) a PEG, PPG, or poly (THF) cross-linker having at least an acrylamide or a methacrylamide end group; and (d) mixtures thereof. Various monomers, resins and methods for preparing such cross-linked polyethers are also disclosed.
    Type: Grant
    Filed: August 4, 2004
    Date of Patent: November 30, 2010
    Assignee: Matrix Innovation Inc.
    Inventor: Simon Côté
  • Patent number: 7754917
    Abstract: Fluoroalkyl amidoalkyl alcohols of the formula are disclosed and their corresponding (meth)acrylate esters. These fluoroalkyl amidoalkyl (meth)acrylate monomers can be copolymerized with a wide variety of conventional ethylenically unsaturated monomers. The resulting copolymers are useful as water, oil- and grease-proofing agents for paper, textiles and hard surfaces such as masonry and wood.
    Type: Grant
    Filed: June 18, 2007
    Date of Patent: July 13, 2010
    Assignee: Huntsman International LLC
    Inventor: Shobha Kantamneni
  • Patent number: 7687222
    Abstract: Novel polymerizable ester compounds having formulae (1) to (4) undergo no acid-induced decomposition by ?-elimination wherein A1 is a polymerizable functional group having a carbon-carbon double bond, R1 is H or —C—(R5)3, R2 and R3 are alkyl, R4 is H or alkyl, R5 is a monovalent hydrocarbon group, X is alkylene, Y is methylene, ethylene or isopropylidene, Z is alkylene, and n=1 or 2. Resist compositions comprising polymers derived from the ester compounds have excellent sensitivity and resolution and lend themselves to micropatterning lithography.
    Type: Grant
    Filed: July 5, 2007
    Date of Patent: March 30, 2010
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Takeru Watanabe, Takeshi Kinsho, Koji Hasegawa, Seiichiro Tachibana, Masaki Ohashi
  • Patent number: 7666967
    Abstract: A polymer comprising recurring units (2) obtained through polymerization of an ester compound of formula (1) is used to form a resist composition. R1 is F or C1-C6 fluoroalkyl, R2 is H or C1-C8 alkyl, R3 is O or C1-C6 alkylene, R4 and R5 each are H or C1-C10 alkyl or fluoroalkyl, and R6 is H or an acid labile group. The resist composition, when processed by ArF lithography, has advantages including improved resolution, transparency, minimal line edge roughness, and etch resistance. The resist composition exhibits better performance when processed by ArF immersion lithography with liquid interposed between a projection lens and a wafer.
    Type: Grant
    Filed: November 30, 2006
    Date of Patent: February 23, 2010
    Assignees: Shin-Etsu Chemical Co., Ltd., Panasonic Corporation, Central Glass Co., Ltd.
    Inventors: Yuji Harada, Jun Hatakeyama, Yoshio Kawai, Masaru Sasago, Masayuki Endo, Kazuhiko Maeda, Haruhiko Komoriya, Michitaka Ootani
  • Patent number: 7652112
    Abstract: A polymer extender composition comprising monomers copolymerized in the following percentages by weight: (a) from about 5% to about 90% of a monomer of the formula I: R1—OC(O)—C(R)?CH2??(I) (b) from about 5% to about 85% of vinylidene chloride, vinyl chloride, vinyl acetate, or a mixture thereof, (c) from about 0.5% to about 3% of a monomer of the formula II: HO—CH2—NH—C(O)—C(R)?CH2??(II) (d) from about 0.5% to about 3% of a monomer of the formula III HO—CH2CH2—OC(O)—C(R)?CH2??(III) and (e) from about 1% to about 5% of a monomer of the formula IV: H—(OCH2CH2)m—O—C(O)—C(R)?CH2??(IV) (f) from 0% to about 25% of methyl methacrylate, vinylbenzyl chloride, styrene or a mixture thereof, wherein each R is independently H or CH3; R1 is a linear or branched or cyclic alkyl chain having from about 4 to about 18 carbon atoms, and m is 2 to about 10.
    Type: Grant
    Filed: July 6, 2005
    Date of Patent: January 26, 2010
    Assignee: E.I. du Pont de Nemours and Company
    Inventors: Ying Wang, John J. Fitzgerald
  • Patent number: 7632906
    Abstract: Composition comprising at least one ethylenically unsaturated monomer to which a photochemically isomerizable or dimerizable molecule is covalently bonded, and at least one ethylenically unsaturated monomer to which a sensitizer is covalently bonded, are outstandingly suitable for producing polymeric alignment layers for liquid crystals.
    Type: Grant
    Filed: July 8, 2004
    Date of Patent: December 15, 2009
    Assignee: Rolic AG
    Inventors: Peggy Studer, Richard Stossel, Patrick Scheifele, Yonetatsu Matsumoto
  • Patent number: 7488780
    Abstract: The present invention relates to a process for preparing a vinyl chloride copolymer resin by copolymerizing a vinyl chloride type monomer and a macromonomer having a polymer comprising an ethylenically unsaturated monomer containing a double bond in a main chain, which generates only a few scales and shows excellent polymerization stability. The present invention is achieved by the process for preparing a vinyl chloride copolymer resin by copolymerizing a vinyl chloride type monomer and a macromonomer having a polymer comprising an ethylenically unsaturated monomer containing a double bond in a main chain, wherein the vinyl chloride type monomer and the macromonomer having a polymer comprising an ethylenically unsaturated monomer containing a double bond in a main chain are dispersed and mixed at a temperature from 20° C. to 60° C. for at least 1 minute, and then copolymerization reaction thereof is initiated.
    Type: Grant
    Filed: December 14, 2004
    Date of Patent: February 10, 2009
    Assignee: Kaneka Corporation
    Inventors: Kisaburo Noguchi, Toshihito Kawauchi, Mitsuyoshi Kuwahata, Yukio Higashiyama
  • Patent number: 7335704
    Abstract: The present invention relates to novel functional norbornenes as initiators for radical polymerization, its polymer and a process for producing the same. More particularly, the novel functional norbornenes can be selectively polymerized by ring-opening metathesis polymerization or radical polymerization to obtain various polynorbornene derivatives or grafted copolymer materials. The polynorbornene derivatives and grafted copolymer materials not only exhibit excellent functional properties but also enhanced physical and chemical properties after modification. The polynorbornene derivatives and grafted copolymer materials disclosed in the present invention exhibit excellent heat resistance, transparency and water resistance. The present invention also deals with a process for producing such derivatives and materials having controllable molecular weight with narrow molecular weight distribution.
    Type: Grant
    Filed: March 22, 2007
    Date of Patent: February 26, 2008
    Assignee: National Taiwan University of Science & Technology
    Inventors: Der-Jang Liaw, Ching-Cheng Huang, Jing-Yang Ju, Jiun-Tyng Liaw
  • Patent number: 7253241
    Abstract: In one aspect, the invention provides a water-based release coating composition comprising a mixture of (A.) from about 5 to about 100 wt % of a polymer comprising the reaction product of (a.) from 1 to about 15 wt % of a fluorinated monomer selected from the group consisting of monomers according to the general formula: RfX—OC(O)—C(R)?CH2, wherein Rf represents a perfluorinated aliphatic group having 3 or 4 carbon atoms, X is an organic divalent linking group, and R represents a hydrogen or methyl group, (b.) from about 40 to about 70 wt % of an alkyl (meth)acrylate, wherein the alkyl group contains from 16 to 22 carbon atoms, (c.) from about 3 to about 20 wt % of (meth)acrylic acid, (d.) from about 20 to about 40 wt % acrylonitrile, and (e.) from 0 to about 15 wt % of vinyl monomer, other than acrylonitrile, wherein the sum of (a.) through (e.) equals 100%; and (B.) from 0 to about 95 wt % of an extender polymer, wherein the sum of (A.) and (B.
    Type: Grant
    Filed: December 28, 2004
    Date of Patent: August 7, 2007
    Assignee: 3M Innovative Properties Company
    Inventors: James P. DiZio, David J. Kinning, George G. I. Moore
  • Patent number: 7247691
    Abstract: Fluoroalkyl amidoalkyl alcohols of the formula are disclosed and their corresponding (meth)acrylate esters. These fluoroalkyl amidoalkyl (meth)acrylate monomers can be copolymerized with a wide variety of conventional ethylenically unsaturated monomers. The resulting copolymers are useful as water, oil- and grease-proofing agents for paper, textiles and hard surfaces such as masonry and wood.
    Type: Grant
    Filed: October 25, 2004
    Date of Patent: July 24, 2007
    Assignee: Huntsman International LLC
    Inventor: Shobha Kantamneni
  • Patent number: 6841641
    Abstract: The present invention is directed to a copolymer that includes a first radically polymerizable low surface tension (meth)acrylate monomer and one or more other radically polymerizable ethylenically unsaturated monomers. The copolymer has a polydispersity index of less than 2.5. The present invention further includes a controlled radical polymerization method to make the above described low surface tension containing copolymers. The method includes the steps of adding a first radically polymerizable low surface tension (meth)acrylate monomer and one or more other radically polymerizable ethylenically unsaturated monomers to a solution containing a suitable atom transfer radical polymerization (ATRP) initiator.
    Type: Grant
    Filed: September 9, 2002
    Date of Patent: January 11, 2005
    Assignee: PPG Industries Ohio, Inc.
    Inventors: Kurt G. Olson, Simion Coca, James B. O'Dwyer, Joanne H. Smith
  • Patent number: 6835804
    Abstract: A polymer comprising recurring units of formula (2) is prepared by effecting deblocking reaction on a polymer comprising recurring units of formula (1) in the presence of an acid catalyst. In the formulae, R1 and R4 are H or methyl, R2 and R3 are C1-C10 alkyl, or R2 and R3 may form a ring, R5 is H, hydroxyl, alkyl, alkoxy or halogen, R6 and R7 are H, methyl, alkoxycarbonyl, cyano or halogen, R8 is C4-C20 tertiary alkyl, n is an integer of 0 to 4, p is a positive number, q and r each are 0 or a positive number, exclusive of q=r=0, p1 is a positive number, p2 is 0 or a positive number, and p1+p2=p. The polymer thus produced has a narrower molecular weight distribution than polymers produced by the prior art methods. A resist composition comprising the polymer as a base resin has advantages including a dissolution contrast of resist film, high resolution, exposure latitude, process flexibility, good pattern profile after exposure, and minimized line edge roughness.
    Type: Grant
    Filed: December 6, 2001
    Date of Patent: December 28, 2004
    Assignee: Shin-Etsu Chemical Co., LTD.
    Inventors: Takanobu Takeda, Osamu Watanabe
  • Patent number: 6818717
    Abstract: Novel fluorine-containing paper sizes which impart oil and grease resistance to paper and soil-release properties to textile products are described which are the copolymerization products of (a) a perfluoroalkyl-substituted (meth)acrylate or (meth)acrylamide, (b) a secondary- or tertiary-amino or quaternary ammonium group-containing (meth)acrylate or (meth)acrylamide, (c) vinylidene chloride and, optionally, d) other copolymerizable nonfluorinated vinyl monomers.
    Type: Grant
    Filed: February 21, 2003
    Date of Patent: November 16, 2004
    Assignee: Ciba Specialty Chemicals Corporation
    Inventor: Shobha Kantamneni
  • Patent number: 6806333
    Abstract: An aqueous dispersion of a fluorocopolymer, which is excellent in stability and film-forming properties as an aqueous dispersion, and which gives a coating film excellent in mechanical strength and improved in transparency, water resistance and stain resistance. A stable aqueous dispersion of a fluorocopolymer obtained in such a manner that a fluorocopolymer comprising polymerized units based on a vinyl monomer having a reactive group as the base is subjected to a composite treatment or a mixing treatment with a (meth)acrylate containing a reactive group capable of forming a bond by reaction with the above reactive group or the like.
    Type: Grant
    Filed: January 27, 2003
    Date of Patent: October 19, 2004
    Assignee: Asahi Glass Company, Limited
    Inventors: Toru Ishida, Naomi Ichikuni
  • Publication number: 20030181608
    Abstract: The invention relates to the use of an LLDPE produced using a single site catalyst, e.g. an LLDPE produced using a metallocene (m-LLDPE), in injection moulding of food packaging material, especially closures for food containers. Such materials have been found to exhibit low levels of migration, typically less than 40 mg/dm2, e.g. less than 5 mg/dm2, and are particularly suitable for use in packaging foods having a high fat content.
    Type: Application
    Filed: May 5, 2003
    Publication date: September 25, 2003
    Inventors: Hege Vale Baann, Ann Kristin Lindahl
  • Patent number: 6610456
    Abstract: Copolymers prepared by radical polymerization of a fluorine-containing aromatic monomer and an acrylate-based comonomer that may or may not be fluorinated. The polymers are useful in lithographic photoresist compositions, particularly chemical amplification resists. In a preferred embodiment, the polymers are substantially transparent to deep ultraviolet (DUV) radiation, i.e., radiation of a wavelength less than 250 nm, including 157 nm and 248 nm radiation, and are thus useful in DUV lithographic photoresist compositions. A method for using the composition to generate resist images on a substrate is also provided, i.e., in the manufacture of integrated circuits or the like.
    Type: Grant
    Filed: February 26, 2001
    Date of Patent: August 26, 2003
    Assignee: International Business Machines Corporation
    Inventors: Robert David Allen, Phillip Joe Brock, Hiroshi Ito, Gregory Michael Wallraff
  • Publication number: 20030114616
    Abstract: An aqueous dispersion of a fluorocopolymer, which is excellent in stability and film-forming properties as an aqueous dispersion and which gives a coating film excellent in mechanical strength and improved in transparency, water resistance and stain resistance.
    Type: Application
    Filed: January 27, 2003
    Publication date: June 19, 2003
    Applicant: ASAHI GLASS COMPANY LIMITED
    Inventors: Toru Ishida, Naomi Ichikuni
  • Patent number: 6579960
    Abstract: A tetrafluoroethylene/ethylene copolymer and a film excellent in flexibility, durability, light transmittance, strength and non-tackiness, and applications thereof. Such a copolymer has a ratio of the polymerized units based on tetrafluoroethylene/the polymerized units based on ethylene, of from 35/65 to 65/35 (molar ratio), contains from 1 to 10 mol % of polymerized units based on an alkyl vinyl ester (the carbon number of the alkyl group is from 5 to 17, and when branched, from 9 to 17), is crystalline and has a volumetric flow rate of from 1 to 1000 mm3/sec.
    Type: Grant
    Filed: February 12, 2002
    Date of Patent: June 17, 2003
    Assignee: Asahi Glass Company, Limited
    Inventors: Hiroki Kamiya, Shinji Okada
  • Patent number: 6566470
    Abstract: Novel fluorine-containing paper sizes which impart oil and grease resistance to paper and soil-release properties to textile products are described which are the copolymerization products of (a) a perfluoroalkyl-substituted (meth)acrylate or (meth)acrylamide, (b) a secondary- or tertiary-amino or quaternary ammonium group-containing (meth)acrylate or (meth)acrylamide, (c) vinylidene chloride and, optionally, d) other copolymerizable nonfluorinated vinyl monomers.
    Type: Grant
    Filed: April 12, 2001
    Date of Patent: May 20, 2003
    Assignee: Ciba Specialty Chemicals Corporation
    Inventors: Shobha Kantamneni, Franz Dirschl
  • Patent number: 6482911
    Abstract: Fluorochemical polymers for use in providing stain-release properties to a substrate material are disclosed. The present invention provides for polymeric fluorochemical polymers that include perfluoroaliphatic, hydrophilic, cationogenic, and either N-hydroxyalkylacrylamide and/or diacrylate monomers.
    Type: Grant
    Filed: May 8, 2001
    Date of Patent: November 19, 2002
    Assignee: 3M Innovative Properties Company
    Inventors: Chetan P. Jariwala, Linda G. Cote, Deborah J. Eilers
  • Patent number: 6479605
    Abstract: A copolymer comprising monomers copolymerized in the following percentages by weight: (a) from about 40% to about 75% of a monomer of formula I: Rf—CH2CH2—OC(O)—C(R)═CH2  I (b) from about 15% to about 55% of a monomer of formula II: R2—OC(O)—C(R)═CH2  II (c) from 1.5% to about 5% of a monomer of the formula III: HO—CH2CH2—OC(O)—C(R)═CH2  III (d) from 1.5% to about 5% of a monomer of the formula IV: H—(OCH2CH2)m—O—C(O)—C(R)═CH2  IV (e) from 1% to about 3% of a monomer of the formula V: HO—CH2—NH—C(O)—C(R)═CH2  V (f) from 0% to about to about 9.
    Type: Grant
    Filed: March 4, 2002
    Date of Patent: November 12, 2002
    Assignee: E. I. du Pont de Nemours and Company
    Inventor: Justine Gabrielle Franchina
  • Patent number: 6476169
    Abstract: Improved methods of treating water and hydrocarbon producing subterranean formations to reduce the water permeability thereof are provided. The methods basically comprise introducing into the formation a water flow resisting chemical which attaches to adsorption sites on surfaces within the porosity of the formation and reduces the water permeability thereof without substantially reducing the hydrocarbon permeability thereof. The water flow resisting chemical is comprised of a polymer of at least one hydrophilic monomer and at least one hydrophobically modified hydrophilic monomer.
    Type: Grant
    Filed: September 28, 2000
    Date of Patent: November 5, 2002
    Assignee: Halliburton Energy Services, Inc.
    Inventors: Larry S. Eoff, B. Raghava Reddy, Eldon D. Dalrymple
  • Patent number: 6476136
    Abstract: The present invention relates generally to compositions prepared by polymerizing vinyl neo C9-C13 carboxylic acid esters. Such compositions include latex compositions that are formed by polymerizing vinyl neo C9-C13 carboxylic acid esters with ethylenically unsaturated comonomers such as acrylic acid esters and vinyl acetate. The polymer compositions of the present invention are particularly suitable for use in applications such as architectural (both interior and exterior), direct-to-metal and marine coatings and transportation maintenance applications.
    Type: Grant
    Filed: February 6, 2001
    Date of Patent: November 5, 2002
    Assignee: ExxonMobil Chemical Patents Inc.
    Inventors: Vijay Swarup, Peter S. Ellis, Henry W. Yang, Oliver W. Smith, Thomas H. Henry
  • Patent number: 6437064
    Abstract: Copolymers of ethylene and alpha olefins that have been formed by a polymerization reaction in the presence of a single site catalyst, such as a metallocene, are used as a film or as a layer in multiple layer films, including molecularly oriented and irradiated heat shrinkable films. Novel blends of the copolymers with other polymeric materials are disclosed and used as a film or a layer in a film particularly in molecularly oriented and heat shrinkable films. Bags made from the multiple layer films are especially useful for shrink packaging primal cuts of meat. Processes for the formation of flexible films and packages made therefrom are also disclosed.
    Type: Grant
    Filed: January 14, 1998
    Date of Patent: August 20, 2002
    Assignee: Pechiney Emballage Flexible Europe
    Inventors: John P. Eckstein, Johnny Q. Zheng, Mark E. Nordness, Keith D. Lind, George H. Walburn, Mary E. Shepard, Gregory K. Jones, Gregory J. Seeke
  • Patent number: 6342569
    Abstract: Thermoprocessable copolymer, having a Melt Flow Index (MFI) between 0.01 and 1000, of the CTFE with an acrylic monomer having the general formula: CH2═CH—CO—O—R1   (I) wherein R1 is a hydrogenated radical from 1 to 20 C atoms, C1-C20, alkyl, linear and/or branched, or cycloalkyl radical, or R1 is H. The radical R1 can optionally contain: heteroatoms preferably Cl, O, N; one or more functional groups preferably selected from —OH, —COOH, epoxide, ester and ether; and double bonds; the amount of the comonomer of formula (I) ranges from 0.01 to 5% by moles.
    Type: Grant
    Filed: June 2, 1999
    Date of Patent: January 29, 2002
    Assignee: Ausimont S.p.A.
    Inventors: Claudia Manzoni, Julio A. Abusleme, Massimo Malavasi
  • Patent number: 6326447
    Abstract: A copolymer composition and its use as a soil release agent for fabrics comprising monomers copolymerized in the following percentages by weight (a) from about 30% to about 49% of at least one monomer of formula I: Rf—Q—A—C(O)—C(R)═CH2  I  wherein Rf is a straight or branched-chain perfluoroalkyl group of from 2 to about 20 carbon atoms, R is H or CH3, A is O, S or N(R′), wherein R′ is H or an alkyl of from 1 to about 4 carbon atoms, Q is alkylene of 1 to about 15 carbon atoms, hydroxyalkylene of 3 to about 15 carbon atoms, —(CnH2n)(OCqH2q)m—, —SO2—NR′(CnH2n)—, or —CONR′(CnH2n), wherein R′ is H or an alkyl of from 1 to about 4 carbon atoms, n is 1 to about 15, q is 2 to about 4, and m is 1 to about 15; (b) from about 10% to about 70% of at least one monomer or a mixture of monomers selected from formula IIA, formula IIB, and formula IIC: (R1)2N—(CH2)r—Z—C(O)—C(R2)&box
    Type: Grant
    Filed: May 14, 1999
    Date of Patent: December 4, 2001
    Assignee: E. I. du Pont de Nemours and Company
    Inventor: John J Fitzgerald
  • Patent number: 6221966
    Abstract: A vinyl chloride resin composition having a greatly improved processability without lowering the transparency wherein the gelation property of a vinyl chloride resin is improved with greatly decreased generation of ungelled substance; which comprises a vinyl chloride resin and 0.
    Type: Grant
    Filed: December 2, 1998
    Date of Patent: April 24, 2001
    Assignees: Kaneka Corporation, Kaneka Belgium N.V.
    Inventors: Yasushi Nakanishi, Mamoru Kadokura, Karin Janssen, Akira Takaki, Yasuhiro Miki
  • Patent number: 6177530
    Abstract: An antifouling paint composition comprising, as a vehicle, a copolymer from a monomer mixture comprising of (a1) a metal-containing polymerizable monomer having two unsaturated groups and (a2) a metal-containing polymerizable monomer represented by the following formula (I): wherein R1 represents a hydrogen atom or a methyl group; M represents Mg, Zn or Cu; and R2 represents an organic acid residue. An antifouling paint composition comprising, as a vehicle, a copolymer from a monomer mixture comprising (a) a metal-containing polymerizable monomer and (b) a polymerizable monomer represented by the following formula (II): wherein R3 reprsents a hydrogen atom or a methyl group; R4 represents an alkyl group having 1 to 10 carbon atoms, a cycloalkyl group or a phenyl group; and R5 represents an alkyl having 1 to 10 carbon atoms, a cycloalkyl group or a phenyl group.
    Type: Grant
    Filed: November 2, 1999
    Date of Patent: January 23, 2001
    Assignee: Mitsubishi Rayon Co., Ltd.
    Inventors: Mitsunori Sugihara, Kazuhiko Hotta, Masamitsu Ito
  • Patent number: 6176895
    Abstract: A composition useful for the extraction of metals and metalloids comprises (a) carbon dioxide fluid (preferably liquid or supercritical carbon dioxide); and (b) a polymer in the carbon dioxide, the polymer having bound thereto a ligand that binds the metal or metalloid; with the ligand bound to the polymer at a plurality of locations along the chain length thereof (i.e., a plurality of ligands are bound at a plurality of locations along the chain length of the polymer). The polymer is preferably a copolymer, and the polymer is preferably a fluoropolymer such as a fluoroacrylate polymer. The extraction method comprises the steps of contacting a first composition containing a metal or metalloid to be extracted with a second composition, the second composition being as described above; and then extracting the metal or metalloid from the first composition into the second composition.
    Type: Grant
    Filed: November 4, 1998
    Date of Patent: January 23, 2001
    Inventors: Joseph M. DeSimone, William Tumas, Kimberly R. Powell, T. Mark McCleskey, Timothy J. Romack, James B. McClain, Eva R. Birnbaum