Additional Monomer Is A Halogen-containing Monomer Patents (Class 526/329.4)
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Patent number: 8992733Abstract: Disclosed is a water and oil resistant agent comprising a fluorine-containing copolymer obtained by copolymerizing a (meth)acrylate monomer having a polyfluoroalkyl group having 1 to 6 carbon atoms, the agent being able to afford a superior water and oil resistance to a paper. The invention also discloses a composition comprising the water and oil resistant agent, a process for treating a paper thereby and a treated paper thereby.Type: GrantFiled: February 14, 2011Date of Patent: March 31, 2015Assignee: Daikin Industries, Ltd.Inventors: Tetsuya Uehara, Kensuke Mohara, Eiji Masuda, Kayo Kusumi, Michio Matsuda
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Patent number: 8980404Abstract: A composition for imprints comprising a polymerizable monomer, a photopolymerization initiator, and a polymer having a functional group with at least one of a fluorine atom or a silicon atom and having a polymerizable functional group, wherein the polymer has a weight-average molecular weight of at least 2000 and the amount of the polymer is from 0.01 to 20% by mass relative to the polymerizable monomer, is excellent in patternability and mold releasability, capable of forming good patterns and free from a problem of mold contamination.Type: GrantFiled: October 29, 2009Date of Patent: March 17, 2015Assignee: FUJIFILM CorporationInventor: Kunihiko Kodama
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Patent number: 8916650Abstract: The present invention relates to an inner-plasticized vinyl chloride-based copolymer resin not requiring plasticizers and a preparation method thereof. Specifically, the vinyl chloride-based copolymer resin is prepared by a suspension polymerization method of initiating the polymerization of vinyl chloride monomer, feeding a certain amount of butyl acrylate continuously or discontinuously thereinto and carrying out the additional polymerization at the temperature higher than the polymerization initiation temperature so as to prepare a core-shell type vinyl chloride-based random copolymer resin. The vinyl chloride-based copolymer resin of core-shell structure prepared by the present invention includes vinyl chloride-butyl acrylate copolymer, and it can provide a vinyl chloride-butyl acrylate copolymer product which can be processed without plasticizers positively necessary to produce a soft product.Type: GrantFiled: July 16, 2013Date of Patent: December 23, 2014Assignee: Hanwha Chemical CorporationInventors: Ji-Woo Kim, Jee-Hyong Lee, Jung-Ho Kong, Yong-Kook Jung, Sang-Hyun Cho
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Patent number: 8901264Abstract: To provide a copolymer which can impart sufficient dynamic water repellency, after air-drying water repellency and friction durability to a surface of an article, and which has low impact on the environment, a method for producing the same, a water repellent composition and an article excellent in dynamic water repellency, after air-drying water repellency and friction durability.Type: GrantFiled: September 9, 2010Date of Patent: December 2, 2014Assignee: Asahi Glass Company, LimitedInventors: Kazunori Sugiyama, Toyomichi Shimada, Nobuyuki Otozawa, Yuuichi Oomori, Minako Shimada
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Patent number: 8871882Abstract: A method for the preparation of a fluoropolymer by means of emulsion polymerization of a reaction mixture in an aqueous medium is disclosed wherein the reaction mixture includes a fluoromonomer having the structure of wherein R1, R2, and R3 are each independently hydrogen atoms, alkyl groups, substituted alkyl groups, or halogens, wherein at least one of R1, R2, and R3 is a fluorine atom, and wherein R is each independently a substituent on the styrenic ring, n is an integer from 0 to 5 representing the number of the substituents on the styrenic ring; b) an emulsion stabilizer combination comprising: i) an anionic surfactant; and, ii) a cationic surfactant or a non-ionic surfactant; and, c) a free-radical initiator.Type: GrantFiled: February 14, 2012Date of Patent: October 28, 2014Assignee: Akron Polymer Systems, Inc.Inventors: Xiaoliang Zheng, Dong Zhang, Jiaokai Jing, Ted Calvin Germroth, Frank W. Harris, Thauming Kuo, Bin Wang, Douglas Stephens McWilliams
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Publication number: 20140171609Abstract: It is provided a process for the preparation of an essentially homogeneous random copolymer from a vinyl halide monomer and an acrylate monomer, the process comprising polymerizing by a reversible-deactivation radical polymerization a vinyl halide monomer and an acrylate monomer in aqueous medium in the presence of an amphiphilic substance, a buffer, a reversible-deactivation radical initiator, a non-metallic catalyst and, optionally, a phase transfer catalyst, wherein an excess of the vinyl halide monomer together with a certain amount of the acrylate monomer are loaded in the reactor, and thereafter the rest of the acrylate monomer is added at a decreasing flow rate such that the composition of the copolymer obtained remains constant throughout the process. It is also provided a copolymer obtainable by this process and an article comprising such a copolymer.Type: ApplicationFiled: July 24, 2012Publication date: June 19, 2014Applicant: ERCROS, S.A.Inventors: Rafael Obeso Cáceres, Belén Pascual Fernandez, José María Asua González
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Patent number: 8642177Abstract: A method to provide acid etch resistance to contacting a calcareous substrate with a copolymer prepared from fluorinated methacrylate, short chain branched (meth)acrylate, and (meth)acrylic acid salt and a treated substrate.Type: GrantFiled: March 20, 2012Date of Patent: February 4, 2014Assignee: E I du Pont de Nemours and CompanyInventors: Brad M Rosen, Siddhartha R. Shenoy, Anilkumar Raghavanpillai, Ernest Bryon Wysong, Joel M Pollino, James J Hughes, John Russell Crompton, Jr.
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Patent number: 8628855Abstract: Presently described are articles, such as optical displays and protective films, comprising a (e.g. light transmissive) substrate having a surface layer comprising the reaction product of a mixture comprising a non-fluorinated binder precursor (e.g. of a hardcoat composition) and at least one polymerizable perfluoropolyether polymer. The resulting cured surface layer can advantageously exhibit low lint attraction in combination with low surface energy. Also described are one-step and two-step methods of synthesizing perfluoropolyether polymers having polymerizable ethylenically unsaturated groups.Type: GrantFiled: December 10, 2008Date of Patent: January 14, 2014Assignee: 3M Innovative Properties CompanyInventors: Encai Hao, Zai-Ming Qiu, Yu Yang, Thomas P. Klun
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Patent number: 8568875Abstract: Copolymers which are composed of at least 4 monomers, including (meth)acrylate compounds containing perfluoroalkyl groups, are suitable for the treatment of fiber materials. The copolymers are usually used here in the form of aqueous dispersions. The fiber materials are in particular fabrics, for example made of polyolefin. Treatment with the copolymers imparts to them oil- and water-repellent properties and also repellent properties toward low molecular weight alcohols.Type: GrantFiled: December 11, 2012Date of Patent: October 29, 2013Assignee: Huntsman Textile Effects (Germany) GmbHInventors: Rolf Moors, Wilhelm Artner, Isabella Rettenbacher, Edeltraud Schidek
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Patent number: 8552128Abstract: A process for the preparation of a fluoroolefin polymer from an azeotropic mixture of monomers having a constant composition, the process including the step of: contacting in a reaction zone: (i) an initiator; and (ii) an azeotropic mixture of monomers including at least one fluoroolefin and, optionally, at least one ethylenically unsaturated comonomer capable of copolymerizing therewith; wherein the contacting is carried out at a temperature, pressure and length of time sufficient to produce the fluoroolefin polymer.Type: GrantFiled: December 20, 2007Date of Patent: October 8, 2013Assignee: Honeywell International Inc.Inventors: George J Samuels, Gregory J Shafer, Hang T Pham
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Patent number: 8530598Abstract: A resist composition for immersion exposure including: a base component (A) which exhibits changed solubility in an alkali developing solution under the action of acid; an acid-generator component (B) which generates acid upon exposure; and a fluorine-containing resin component (F); dissolved in an organic solvent (S), the fluorine-containing resin component (F) including a structural unit (f1) containing a fluorine atom, a structural unit (f2) containing a hydrophilic group-containing aliphatic hydrocarbon group, and a structural unit (f3) derived from an acrylate ester containing a tertiary alkyl group-containing group or an alkoxyalkyl group.Type: GrantFiled: January 12, 2012Date of Patent: September 10, 2013Assignee: Tokyo Ohka Kogyo Co., Ltd.Inventors: Masaru Takeshita, Yasuhiro Yoshii
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Patent number: 8420292Abstract: A polymer comprising recurring units of formula (1) and having a solubility in alkaline developer which increases under the action of an alkaline developer is provided. The polymer has transparency to radiation of up to 200 nm and improved water repellency, water slip, acid lability and hydrolysis and is useful as an additive polymer to formulate a resist composition. R1 is H, F, methyl, or trifluoromethyl, R2 is a monovalent fluorinated hydrocarbon group, An is a (n+1)-valent hydrocarbon or fluorinated hydrocarbon group, and n is 1, 2 or 3.Type: GrantFiled: January 14, 2011Date of Patent: April 16, 2013Assignee: Shin-Etsu Chemical Co., Ltd.Inventors: Yuji Harada, Takeru Watanabe, Takeshi Sasami, Yuuki Suka, Koji Hasegawa
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Patent number: 8349976Abstract: Copolymers which are composed of at least 4 monomers, including (meth)acrylate compounds containing perfluoroalkyl groups, are suitable for the treatment of fiber materials. The copolymers are usually used here in the form of aqueous dispersions. The fiber materials are in particular fabrics, for example made of polyolefin. Treatment with the copolymers imparts to them oil- and water-repellent properties and also repellent properties toward low molecular weight alcohols.Type: GrantFiled: May 14, 2008Date of Patent: January 8, 2013Assignee: Huntsman Textile Effects (Germany) GmbHInventors: Rolf Moors, Wilhelm Artner, Isabella Rettenbacher, Edeltraud Schidek
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Patent number: 8163858Abstract: A polyvinylidene difluoride copolymer with a fluoroolefin selected from 2,3,3,3-tetrafluoropropene, 1,1,3,3,3-pentafluoropropene, 2-chloro-pentafluoropropene, hexafluoropropylene, trifluoroethylene, chlorotrifluoroethylene, 3,3,3-trifluoro-2-trifluoromethylpropene and a mixture thereof, wherein the stoichiometry of the co-monomers defines the barrier properties of the copolymer. Such polymers include moisture barrier copolymers and oxygen barrier copolymer. Processes for preparing such moisture barrier copolymers and oxygen barrier copolymers are also provided.Type: GrantFiled: December 20, 2007Date of Patent: April 24, 2012Assignee: Honeywell International Inc.Inventors: George J Samuels, Gregory J Shafer, Tao Li, Clinton A Threlfall, Nancy Iwamoto, Eric J Rainal
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Patent number: 8034534Abstract: The present invention relates to partially fluorinated (meth)acrylic polymers that can be blended with other (meth)acrylic polymers to provide enhanced surface properties.Type: GrantFiled: August 14, 2007Date of Patent: October 11, 2011Assignee: E.I. du Pont de Nemours and CompanyInventors: William Brown Farnham, Suniti Moudgil
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Patent number: 8034532Abstract: A topcoat material for application on top of a photoresist material is disclosed. The topcoat material comprises an acid-inert compound. The topcoat material also comprises a polymer or an oligomer or a cage structure which shows negligible intermixing with the imaging layer and is soluble in aqueous base developer. A method of forming a patterned material layer on a substrate and a coated substrate comprising the topcoat material is also disclosed.Type: GrantFiled: April 28, 2006Date of Patent: October 11, 2011Assignee: International Business Machines CorporationInventors: Robert David Allen, Phillip Joe Brock, Carl E. Larson, Ratnam Sooriyakumaran, Linda Karin Sundberg, Hoa D Truong
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Publication number: 20100330372Abstract: The present invention provides coating systems for surfaces and methods for coating and repairing surfaces.Type: ApplicationFiled: May 16, 2008Publication date: December 30, 2010Applicant: JOHNSONDIVERSEY, INC.Inventors: Nathan E. Ludtke, Ryan E. Kron, Jia Liu, Christopher C. Cypcar
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Publication number: 20100331479Abstract: To provide a copolymer which can impart sufficient dynamic water repellency, after air-drying water repellency and friction durability to a surface of an article, and which has low impact on the environment, a method for producing the same, a water repellent composition and an article excellent in dynamic water repellency, after air-drying water repellency and friction durability.Type: ApplicationFiled: September 9, 2010Publication date: December 30, 2010Applicant: ASAHI GLASS COMPANY, LIMITEDInventors: Kazunori Sugiyama, Toyomichi Shimada, Nobuyuki Otozawa, Yuuichi Oomori
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Patent number: 7842767Abstract: The present invention relates to a cross-linked polyether which is obtained by polymerization of at least one monomer selected from the group consisting of (a) (?-X-methyl) vinyl-EWG, (?-X-methyl) vinyl-ERG, or (?-X-methyl) vinyl-aryl, where X is oxygen, sulfur, PEG, PPG or poly (THF); (b) a monomer which is polymerizable with a PEG, PPG or poly (THF) cross-linker having at least one (?-X-methyl) vinyl-EWG, (?-X-methyl) vinyl-ERG or (?-X-methyl) vinyl-aryl, where X is oxygen, sulfur, PEG, PPG, or poly (THF); (c) a PEG, PPG, or poly (THF) cross-linker having at least an acrylamide or a methacrylamide end group; and (d) mixtures thereof. Various monomers, resins and methods for preparing such cross-linked polyethers are also disclosed.Type: GrantFiled: August 4, 2004Date of Patent: November 30, 2010Assignee: Matrix Innovation Inc.Inventor: Simon Côté
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Patent number: 7754917Abstract: Fluoroalkyl amidoalkyl alcohols of the formula are disclosed and their corresponding (meth)acrylate esters. These fluoroalkyl amidoalkyl (meth)acrylate monomers can be copolymerized with a wide variety of conventional ethylenically unsaturated monomers. The resulting copolymers are useful as water, oil- and grease-proofing agents for paper, textiles and hard surfaces such as masonry and wood.Type: GrantFiled: June 18, 2007Date of Patent: July 13, 2010Assignee: Huntsman International LLCInventor: Shobha Kantamneni
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Patent number: 7687222Abstract: Novel polymerizable ester compounds having formulae (1) to (4) undergo no acid-induced decomposition by ?-elimination wherein A1 is a polymerizable functional group having a carbon-carbon double bond, R1 is H or —C—(R5)3, R2 and R3 are alkyl, R4 is H or alkyl, R5 is a monovalent hydrocarbon group, X is alkylene, Y is methylene, ethylene or isopropylidene, Z is alkylene, and n=1 or 2. Resist compositions comprising polymers derived from the ester compounds have excellent sensitivity and resolution and lend themselves to micropatterning lithography.Type: GrantFiled: July 5, 2007Date of Patent: March 30, 2010Assignee: Shin-Etsu Chemical Co., Ltd.Inventors: Takeru Watanabe, Takeshi Kinsho, Koji Hasegawa, Seiichiro Tachibana, Masaki Ohashi
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Patent number: 7666967Abstract: A polymer comprising recurring units (2) obtained through polymerization of an ester compound of formula (1) is used to form a resist composition. R1 is F or C1-C6 fluoroalkyl, R2 is H or C1-C8 alkyl, R3 is O or C1-C6 alkylene, R4 and R5 each are H or C1-C10 alkyl or fluoroalkyl, and R6 is H or an acid labile group. The resist composition, when processed by ArF lithography, has advantages including improved resolution, transparency, minimal line edge roughness, and etch resistance. The resist composition exhibits better performance when processed by ArF immersion lithography with liquid interposed between a projection lens and a wafer.Type: GrantFiled: November 30, 2006Date of Patent: February 23, 2010Assignees: Shin-Etsu Chemical Co., Ltd., Panasonic Corporation, Central Glass Co., Ltd.Inventors: Yuji Harada, Jun Hatakeyama, Yoshio Kawai, Masaru Sasago, Masayuki Endo, Kazuhiko Maeda, Haruhiko Komoriya, Michitaka Ootani
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Patent number: 7652112Abstract: A polymer extender composition comprising monomers copolymerized in the following percentages by weight: (a) from about 5% to about 90% of a monomer of the formula I: R1—OC(O)—C(R)?CH2??(I) (b) from about 5% to about 85% of vinylidene chloride, vinyl chloride, vinyl acetate, or a mixture thereof, (c) from about 0.5% to about 3% of a monomer of the formula II: HO—CH2—NH—C(O)—C(R)?CH2??(II) (d) from about 0.5% to about 3% of a monomer of the formula III HO—CH2CH2—OC(O)—C(R)?CH2??(III) and (e) from about 1% to about 5% of a monomer of the formula IV: H—(OCH2CH2)m—O—C(O)—C(R)?CH2??(IV) (f) from 0% to about 25% of methyl methacrylate, vinylbenzyl chloride, styrene or a mixture thereof, wherein each R is independently H or CH3; R1 is a linear or branched or cyclic alkyl chain having from about 4 to about 18 carbon atoms, and m is 2 to about 10.Type: GrantFiled: July 6, 2005Date of Patent: January 26, 2010Assignee: E.I. du Pont de Nemours and CompanyInventors: Ying Wang, John J. Fitzgerald
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Patent number: 7632906Abstract: Composition comprising at least one ethylenically unsaturated monomer to which a photochemically isomerizable or dimerizable molecule is covalently bonded, and at least one ethylenically unsaturated monomer to which a sensitizer is covalently bonded, are outstandingly suitable for producing polymeric alignment layers for liquid crystals.Type: GrantFiled: July 8, 2004Date of Patent: December 15, 2009Assignee: Rolic AGInventors: Peggy Studer, Richard Stossel, Patrick Scheifele, Yonetatsu Matsumoto
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Patent number: 7488780Abstract: The present invention relates to a process for preparing a vinyl chloride copolymer resin by copolymerizing a vinyl chloride type monomer and a macromonomer having a polymer comprising an ethylenically unsaturated monomer containing a double bond in a main chain, which generates only a few scales and shows excellent polymerization stability. The present invention is achieved by the process for preparing a vinyl chloride copolymer resin by copolymerizing a vinyl chloride type monomer and a macromonomer having a polymer comprising an ethylenically unsaturated monomer containing a double bond in a main chain, wherein the vinyl chloride type monomer and the macromonomer having a polymer comprising an ethylenically unsaturated monomer containing a double bond in a main chain are dispersed and mixed at a temperature from 20° C. to 60° C. for at least 1 minute, and then copolymerization reaction thereof is initiated.Type: GrantFiled: December 14, 2004Date of Patent: February 10, 2009Assignee: Kaneka CorporationInventors: Kisaburo Noguchi, Toshihito Kawauchi, Mitsuyoshi Kuwahata, Yukio Higashiyama
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Patent number: 7335704Abstract: The present invention relates to novel functional norbornenes as initiators for radical polymerization, its polymer and a process for producing the same. More particularly, the novel functional norbornenes can be selectively polymerized by ring-opening metathesis polymerization or radical polymerization to obtain various polynorbornene derivatives or grafted copolymer materials. The polynorbornene derivatives and grafted copolymer materials not only exhibit excellent functional properties but also enhanced physical and chemical properties after modification. The polynorbornene derivatives and grafted copolymer materials disclosed in the present invention exhibit excellent heat resistance, transparency and water resistance. The present invention also deals with a process for producing such derivatives and materials having controllable molecular weight with narrow molecular weight distribution.Type: GrantFiled: March 22, 2007Date of Patent: February 26, 2008Assignee: National Taiwan University of Science & TechnologyInventors: Der-Jang Liaw, Ching-Cheng Huang, Jing-Yang Ju, Jiun-Tyng Liaw
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Patent number: 7253241Abstract: In one aspect, the invention provides a water-based release coating composition comprising a mixture of (A.) from about 5 to about 100 wt % of a polymer comprising the reaction product of (a.) from 1 to about 15 wt % of a fluorinated monomer selected from the group consisting of monomers according to the general formula: RfX—OC(O)—C(R)?CH2, wherein Rf represents a perfluorinated aliphatic group having 3 or 4 carbon atoms, X is an organic divalent linking group, and R represents a hydrogen or methyl group, (b.) from about 40 to about 70 wt % of an alkyl (meth)acrylate, wherein the alkyl group contains from 16 to 22 carbon atoms, (c.) from about 3 to about 20 wt % of (meth)acrylic acid, (d.) from about 20 to about 40 wt % acrylonitrile, and (e.) from 0 to about 15 wt % of vinyl monomer, other than acrylonitrile, wherein the sum of (a.) through (e.) equals 100%; and (B.) from 0 to about 95 wt % of an extender polymer, wherein the sum of (A.) and (B.Type: GrantFiled: December 28, 2004Date of Patent: August 7, 2007Assignee: 3M Innovative Properties CompanyInventors: James P. DiZio, David J. Kinning, George G. I. Moore
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Patent number: 7247691Abstract: Fluoroalkyl amidoalkyl alcohols of the formula are disclosed and their corresponding (meth)acrylate esters. These fluoroalkyl amidoalkyl (meth)acrylate monomers can be copolymerized with a wide variety of conventional ethylenically unsaturated monomers. The resulting copolymers are useful as water, oil- and grease-proofing agents for paper, textiles and hard surfaces such as masonry and wood.Type: GrantFiled: October 25, 2004Date of Patent: July 24, 2007Assignee: Huntsman International LLCInventor: Shobha Kantamneni
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Patent number: 6841641Abstract: The present invention is directed to a copolymer that includes a first radically polymerizable low surface tension (meth)acrylate monomer and one or more other radically polymerizable ethylenically unsaturated monomers. The copolymer has a polydispersity index of less than 2.5. The present invention further includes a controlled radical polymerization method to make the above described low surface tension containing copolymers. The method includes the steps of adding a first radically polymerizable low surface tension (meth)acrylate monomer and one or more other radically polymerizable ethylenically unsaturated monomers to a solution containing a suitable atom transfer radical polymerization (ATRP) initiator.Type: GrantFiled: September 9, 2002Date of Patent: January 11, 2005Assignee: PPG Industries Ohio, Inc.Inventors: Kurt G. Olson, Simion Coca, James B. O'Dwyer, Joanne H. Smith
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Patent number: 6835804Abstract: A polymer comprising recurring units of formula (2) is prepared by effecting deblocking reaction on a polymer comprising recurring units of formula (1) in the presence of an acid catalyst. In the formulae, R1 and R4 are H or methyl, R2 and R3 are C1-C10 alkyl, or R2 and R3 may form a ring, R5 is H, hydroxyl, alkyl, alkoxy or halogen, R6 and R7 are H, methyl, alkoxycarbonyl, cyano or halogen, R8 is C4-C20 tertiary alkyl, n is an integer of 0 to 4, p is a positive number, q and r each are 0 or a positive number, exclusive of q=r=0, p1 is a positive number, p2 is 0 or a positive number, and p1+p2=p. The polymer thus produced has a narrower molecular weight distribution than polymers produced by the prior art methods. A resist composition comprising the polymer as a base resin has advantages including a dissolution contrast of resist film, high resolution, exposure latitude, process flexibility, good pattern profile after exposure, and minimized line edge roughness.Type: GrantFiled: December 6, 2001Date of Patent: December 28, 2004Assignee: Shin-Etsu Chemical Co., LTD.Inventors: Takanobu Takeda, Osamu Watanabe
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Patent number: 6818717Abstract: Novel fluorine-containing paper sizes which impart oil and grease resistance to paper and soil-release properties to textile products are described which are the copolymerization products of (a) a perfluoroalkyl-substituted (meth)acrylate or (meth)acrylamide, (b) a secondary- or tertiary-amino or quaternary ammonium group-containing (meth)acrylate or (meth)acrylamide, (c) vinylidene chloride and, optionally, d) other copolymerizable nonfluorinated vinyl monomers.Type: GrantFiled: February 21, 2003Date of Patent: November 16, 2004Assignee: Ciba Specialty Chemicals CorporationInventor: Shobha Kantamneni
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Patent number: 6806333Abstract: An aqueous dispersion of a fluorocopolymer, which is excellent in stability and film-forming properties as an aqueous dispersion, and which gives a coating film excellent in mechanical strength and improved in transparency, water resistance and stain resistance. A stable aqueous dispersion of a fluorocopolymer obtained in such a manner that a fluorocopolymer comprising polymerized units based on a vinyl monomer having a reactive group as the base is subjected to a composite treatment or a mixing treatment with a (meth)acrylate containing a reactive group capable of forming a bond by reaction with the above reactive group or the like.Type: GrantFiled: January 27, 2003Date of Patent: October 19, 2004Assignee: Asahi Glass Company, LimitedInventors: Toru Ishida, Naomi Ichikuni
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Publication number: 20030181608Abstract: The invention relates to the use of an LLDPE produced using a single site catalyst, e.g. an LLDPE produced using a metallocene (m-LLDPE), in injection moulding of food packaging material, especially closures for food containers. Such materials have been found to exhibit low levels of migration, typically less than 40 mg/dm2, e.g. less than 5 mg/dm2, and are particularly suitable for use in packaging foods having a high fat content.Type: ApplicationFiled: May 5, 2003Publication date: September 25, 2003Inventors: Hege Vale Baann, Ann Kristin Lindahl
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Patent number: 6610456Abstract: Copolymers prepared by radical polymerization of a fluorine-containing aromatic monomer and an acrylate-based comonomer that may or may not be fluorinated. The polymers are useful in lithographic photoresist compositions, particularly chemical amplification resists. In a preferred embodiment, the polymers are substantially transparent to deep ultraviolet (DUV) radiation, i.e., radiation of a wavelength less than 250 nm, including 157 nm and 248 nm radiation, and are thus useful in DUV lithographic photoresist compositions. A method for using the composition to generate resist images on a substrate is also provided, i.e., in the manufacture of integrated circuits or the like.Type: GrantFiled: February 26, 2001Date of Patent: August 26, 2003Assignee: International Business Machines CorporationInventors: Robert David Allen, Phillip Joe Brock, Hiroshi Ito, Gregory Michael Wallraff
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Publication number: 20030114616Abstract: An aqueous dispersion of a fluorocopolymer, which is excellent in stability and film-forming properties as an aqueous dispersion and which gives a coating film excellent in mechanical strength and improved in transparency, water resistance and stain resistance.Type: ApplicationFiled: January 27, 2003Publication date: June 19, 2003Applicant: ASAHI GLASS COMPANY LIMITEDInventors: Toru Ishida, Naomi Ichikuni
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Patent number: 6579960Abstract: A tetrafluoroethylene/ethylene copolymer and a film excellent in flexibility, durability, light transmittance, strength and non-tackiness, and applications thereof. Such a copolymer has a ratio of the polymerized units based on tetrafluoroethylene/the polymerized units based on ethylene, of from 35/65 to 65/35 (molar ratio), contains from 1 to 10 mol % of polymerized units based on an alkyl vinyl ester (the carbon number of the alkyl group is from 5 to 17, and when branched, from 9 to 17), is crystalline and has a volumetric flow rate of from 1 to 1000 mm3/sec.Type: GrantFiled: February 12, 2002Date of Patent: June 17, 2003Assignee: Asahi Glass Company, LimitedInventors: Hiroki Kamiya, Shinji Okada
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Patent number: 6566470Abstract: Novel fluorine-containing paper sizes which impart oil and grease resistance to paper and soil-release properties to textile products are described which are the copolymerization products of (a) a perfluoroalkyl-substituted (meth)acrylate or (meth)acrylamide, (b) a secondary- or tertiary-amino or quaternary ammonium group-containing (meth)acrylate or (meth)acrylamide, (c) vinylidene chloride and, optionally, d) other copolymerizable nonfluorinated vinyl monomers.Type: GrantFiled: April 12, 2001Date of Patent: May 20, 2003Assignee: Ciba Specialty Chemicals CorporationInventors: Shobha Kantamneni, Franz Dirschl
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Patent number: 6482911Abstract: Fluorochemical polymers for use in providing stain-release properties to a substrate material are disclosed. The present invention provides for polymeric fluorochemical polymers that include perfluoroaliphatic, hydrophilic, cationogenic, and either N-hydroxyalkylacrylamide and/or diacrylate monomers.Type: GrantFiled: May 8, 2001Date of Patent: November 19, 2002Assignee: 3M Innovative Properties CompanyInventors: Chetan P. Jariwala, Linda G. Cote, Deborah J. Eilers
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Patent number: 6479605Abstract: A copolymer comprising monomers copolymerized in the following percentages by weight: (a) from about 40% to about 75% of a monomer of formula I: Rf—CH2CH2—OC(O)—C(R)═CH2 I (b) from about 15% to about 55% of a monomer of formula II: R2—OC(O)—C(R)═CH2 II (c) from 1.5% to about 5% of a monomer of the formula III: HO—CH2CH2—OC(O)—C(R)═CH2 III (d) from 1.5% to about 5% of a monomer of the formula IV: H—(OCH2CH2)m—O—C(O)—C(R)═CH2 IV (e) from 1% to about 3% of a monomer of the formula V: HO—CH2—NH—C(O)—C(R)═CH2 V (f) from 0% to about to about 9.Type: GrantFiled: March 4, 2002Date of Patent: November 12, 2002Assignee: E. I. du Pont de Nemours and CompanyInventor: Justine Gabrielle Franchina
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Patent number: 6476169Abstract: Improved methods of treating water and hydrocarbon producing subterranean formations to reduce the water permeability thereof are provided. The methods basically comprise introducing into the formation a water flow resisting chemical which attaches to adsorption sites on surfaces within the porosity of the formation and reduces the water permeability thereof without substantially reducing the hydrocarbon permeability thereof. The water flow resisting chemical is comprised of a polymer of at least one hydrophilic monomer and at least one hydrophobically modified hydrophilic monomer.Type: GrantFiled: September 28, 2000Date of Patent: November 5, 2002Assignee: Halliburton Energy Services, Inc.Inventors: Larry S. Eoff, B. Raghava Reddy, Eldon D. Dalrymple
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Patent number: 6476136Abstract: The present invention relates generally to compositions prepared by polymerizing vinyl neo C9-C13 carboxylic acid esters. Such compositions include latex compositions that are formed by polymerizing vinyl neo C9-C13 carboxylic acid esters with ethylenically unsaturated comonomers such as acrylic acid esters and vinyl acetate. The polymer compositions of the present invention are particularly suitable for use in applications such as architectural (both interior and exterior), direct-to-metal and marine coatings and transportation maintenance applications.Type: GrantFiled: February 6, 2001Date of Patent: November 5, 2002Assignee: ExxonMobil Chemical Patents Inc.Inventors: Vijay Swarup, Peter S. Ellis, Henry W. Yang, Oliver W. Smith, Thomas H. Henry
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Patent number: 6437064Abstract: Copolymers of ethylene and alpha olefins that have been formed by a polymerization reaction in the presence of a single site catalyst, such as a metallocene, are used as a film or as a layer in multiple layer films, including molecularly oriented and irradiated heat shrinkable films. Novel blends of the copolymers with other polymeric materials are disclosed and used as a film or a layer in a film particularly in molecularly oriented and heat shrinkable films. Bags made from the multiple layer films are especially useful for shrink packaging primal cuts of meat. Processes for the formation of flexible films and packages made therefrom are also disclosed.Type: GrantFiled: January 14, 1998Date of Patent: August 20, 2002Assignee: Pechiney Emballage Flexible EuropeInventors: John P. Eckstein, Johnny Q. Zheng, Mark E. Nordness, Keith D. Lind, George H. Walburn, Mary E. Shepard, Gregory K. Jones, Gregory J. Seeke
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Patent number: 6342569Abstract: Thermoprocessable copolymer, having a Melt Flow Index (MFI) between 0.01 and 1000, of the CTFE with an acrylic monomer having the general formula: CH2═CH—CO—O—R1 (I) wherein R1 is a hydrogenated radical from 1 to 20 C atoms, C1-C20, alkyl, linear and/or branched, or cycloalkyl radical, or R1 is H. The radical R1 can optionally contain: heteroatoms preferably Cl, O, N; one or more functional groups preferably selected from —OH, —COOH, epoxide, ester and ether; and double bonds; the amount of the comonomer of formula (I) ranges from 0.01 to 5% by moles.Type: GrantFiled: June 2, 1999Date of Patent: January 29, 2002Assignee: Ausimont S.p.A.Inventors: Claudia Manzoni, Julio A. Abusleme, Massimo Malavasi
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Patent number: 6326447Abstract: A copolymer composition and its use as a soil release agent for fabrics comprising monomers copolymerized in the following percentages by weight (a) from about 30% to about 49% of at least one monomer of formula I: Rf—Q—A—C(O)—C(R)═CH2 I wherein Rf is a straight or branched-chain perfluoroalkyl group of from 2 to about 20 carbon atoms, R is H or CH3, A is O, S or N(R′), wherein R′ is H or an alkyl of from 1 to about 4 carbon atoms, Q is alkylene of 1 to about 15 carbon atoms, hydroxyalkylene of 3 to about 15 carbon atoms, —(CnH2n)(OCqH2q)m—, —SO2—NR′(CnH2n)—, or —CONR′(CnH2n), wherein R′ is H or an alkyl of from 1 to about 4 carbon atoms, n is 1 to about 15, q is 2 to about 4, and m is 1 to about 15; (b) from about 10% to about 70% of at least one monomer or a mixture of monomers selected from formula IIA, formula IIB, and formula IIC: (R1)2N—(CH2)r—Z—C(O)—C(R2)&boxType: GrantFiled: May 14, 1999Date of Patent: December 4, 2001Assignee: E. I. du Pont de Nemours and CompanyInventor: John J Fitzgerald
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Patent number: 6221966Abstract: A vinyl chloride resin composition having a greatly improved processability without lowering the transparency wherein the gelation property of a vinyl chloride resin is improved with greatly decreased generation of ungelled substance; which comprises a vinyl chloride resin and 0.Type: GrantFiled: December 2, 1998Date of Patent: April 24, 2001Assignees: Kaneka Corporation, Kaneka Belgium N.V.Inventors: Yasushi Nakanishi, Mamoru Kadokura, Karin Janssen, Akira Takaki, Yasuhiro Miki
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Patent number: 6177530Abstract: An antifouling paint composition comprising, as a vehicle, a copolymer from a monomer mixture comprising of (a1) a metal-containing polymerizable monomer having two unsaturated groups and (a2) a metal-containing polymerizable monomer represented by the following formula (I): wherein R1 represents a hydrogen atom or a methyl group; M represents Mg, Zn or Cu; and R2 represents an organic acid residue. An antifouling paint composition comprising, as a vehicle, a copolymer from a monomer mixture comprising (a) a metal-containing polymerizable monomer and (b) a polymerizable monomer represented by the following formula (II): wherein R3 reprsents a hydrogen atom or a methyl group; R4 represents an alkyl group having 1 to 10 carbon atoms, a cycloalkyl group or a phenyl group; and R5 represents an alkyl having 1 to 10 carbon atoms, a cycloalkyl group or a phenyl group.Type: GrantFiled: November 2, 1999Date of Patent: January 23, 2001Assignee: Mitsubishi Rayon Co., Ltd.Inventors: Mitsunori Sugihara, Kazuhiko Hotta, Masamitsu Ito
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Patent number: 6176895Abstract: A composition useful for the extraction of metals and metalloids comprises (a) carbon dioxide fluid (preferably liquid or supercritical carbon dioxide); and (b) a polymer in the carbon dioxide, the polymer having bound thereto a ligand that binds the metal or metalloid; with the ligand bound to the polymer at a plurality of locations along the chain length thereof (i.e., a plurality of ligands are bound at a plurality of locations along the chain length of the polymer). The polymer is preferably a copolymer, and the polymer is preferably a fluoropolymer such as a fluoroacrylate polymer. The extraction method comprises the steps of contacting a first composition containing a metal or metalloid to be extracted with a second composition, the second composition being as described above; and then extracting the metal or metalloid from the first composition into the second composition.Type: GrantFiled: November 4, 1998Date of Patent: January 23, 2001Inventors: Joseph M. DeSimone, William Tumas, Kimberly R. Powell, T. Mark McCleskey, Timothy J. Romack, James B. McClain, Eva R. Birnbaum