Abstract: A method of forming a structure containing a phase-separated structure, the method including: a step of forming a layer containing a block copolymer having a plurality of blocks bonded and a purity of 98% or more, and a step of phase-separating the layer containing the block copolymer.

Abstract: The present invention provides a styrene-based star polymer with narrow dispersion and suitable as a resist material, etc. A star polymer of the present invention is represented by the formula A[C(Y)Xm]n (wherein A represents a polyvalent aliphatic hydrocarbon group with 4-15 carbons, C represents a carbon atom, X represents a styrene-based polymer chain, Y represents a hydroxy group or an oxo group, m represents an integer of 1 or 2, and n represents any integer from 2 to 5, with the proviso that if Y is a hydroxy group, m is 2, and if Y is an oxo group, m is 1). The star polymer can be produced by reacting a styrene-based polymer having an anionic end, and an aliphatic carboxylic acid ester represented by A(COOR)n (wherein R represents an alkyl group having 1-8 carbons, and A and n are as defined for the above formula).

Abstract: A compound represented by the formula (I): wherein R1 represents a hydrogen atom etc., R2 and R3 each independently represent a hydrogen atom etc., R4 represents a C1-C8 divalent hydrocarbon group, R5 represents a single bond etc., and R6 represents an unsubstituted or substituted C6-C20 aromatic hydrocarbon group, a polymer comprising a structural unit derived from the compound represented by the formula (I) and a chemically amplified positive resist composition comprising the polymer, at least one acid generator and at least one solvent.

Abstract: A vinyloxy group-containing vinyl polymer, useful as a heat or light curing reactive prepolymer, containing at least a constituent unit expressed by the following formula (I):

Abstract: A copolymer has formula: wherein R1-R5 are independently H, C1-6 alkyl, or C4-6 aryl, R6 is a fluorinated or non-fluorinated C5-30 acid decomposable group; each Ar is a monocyclic, polycyclic, or fused polycyclic C6-20 aryl group; each R7 and R8 is —OR11 or —C(CF3)2OR11 where each R11 is H, a fluorinated or non-fluorinated C5-30 acid decomposable group, or a combination; each R9 is independently F, a C1-10 alkyl, C1-10 fluoroalkyl, C1-10 alkoxy, or a C1-10 fluoroalkoxy group; R10 is a cation-bound C10-40 photoacid generator-containing group, mole fractions a, b, and d are 0 to 0.80, c is 0.01 to 0.80, e is 0 to 0.50 provided where a, b, and d are 0, e is greater than 0, the sum a+b+c+d+e is 1, l and m are integers of 1 to 4, and n is an integer of 0 to 5. A photoresist and coated substrate, each include the copolymer.

Abstract: Hydrophilic silicone copolymers are the addition polymerization product of an unsaturated silicone macromer, and unsaturated polyoxyalkylene polyether, and optionally further unsaturated addition polymerizable monomers.

Abstract: To provide a novel ABA-type triblock copolymer of vinyl ether series, comprising polyvinyl ether and an oxystyrene-series unit, and a process of producing the ABA-type copolymer at a series of steps. The invention relates to a novel ABA-type triblock copolymer comprising Segment A comprising an oxystyrene-series repeat unit (a) and Segment B comprising a vinyl ether-series repeat unit (b), in which the Segment A and the Segment B are bonded together with a single bond, and to a simple process of producing the same. The triblock copolymer can be produced at a series of steps in a simple manner, comprising living cationic polymerization of a vinyl ether-series monomer such as ethyl vinyl ether in the presence of a bifunctional initiator and a Lewis acid, and subsequently adding an oxystyrene-series monomer such as p-hydroxystyrene for living cationic polymerization.

Abstract: A vinyl ether compound represented by formula (1-a) or formula (1-b): wherein n represents 0 or 1, and R1 and R2 each independently represent a hydrogen atom, a methyl group, or an ethyl group, provided that a total of the number of carbon atoms of R1 and the number of carbon atoms of R2 is 1 or 2.

Abstract: The present invention is a thermosetting bismaleimide resin system comprising a liquid phase and a solid phase where the non-crystallizing liquid phase contains the curing agents diallyl ether of a substantially aromatic radical and a bis(alkenylphenoxy) ether of a substantially aromatic radical along with a substantially aromatic bismaleimide as a particle slurry and optionally a free radical inhibitor. The curing agents are non-crystallizing compositions for use in bismaleimide resin formulations to increase the thermal durability of a cured resin composite as shown by reduced microcracking as measured by reduced weight loss after thermal aging. The present invention resists microcracking over bismaleimide resin systems which incorporate other curing agents or combinations of curing agents. The present invention further provides a bismaleimide resin formulation suitable to make prepregs with reduced crystallization for reduced viscosity supporting improved manufacturing properties and improved tack.

Abstract: The invention relates to a process for the preparation of an aqueous solution comprising 30 to 95% by weight of water and 5 to 70% by weight of a copolymer dissolved in the water by free radical solution polymerizations of an isoprenol polyether derivative with an acrylic acid derivative, so that the copolymer has 20 to 45 mol % of an isoprenol polyether derivative structural unit and 55 to 80 mol % of an acrylic acid derivative structural unit. The aqueous solution is suitable as a superplasticizer for hydraulic binders.

Abstract: The present invention is directed to compositions of a linear polyol and a salt of a crosslinked cation exchange polymer comprising a fluoro group and an acid group. These compositions are useful to bind potassium in the gastrointestinal tract.

Abstract: A composition of matter consisting of a stable solution containing a polymer derived from a solution of a polymer containing trace metals, the derived method comprising the steps of: (a) providing a polymer solution containing a polymer, a first solvent and trace metals; (b) passing said polymer solution through an acidic cation ion exchange material to remove said trace metals therefrom and thereby forming a polymer solution containing free acid radicals; (c) precipitating said polymer from said polymer solution of step b by contacting with a second solvent wherein the polymer is substantially insoluble therein; (d) filtering said solution and said second solvent to thereby form a solid polymer cake; and (e) contacting said cake from step d with sufficient quantities of additional said second solvent in order to remove free acid radicals therefrom.

Abstract: A method for the polymerization of free radically polymerizable vinyl monomers involves polymerizing free radically (co)polymerizable vinyl monomers in a batch reaction under essentially adiabatic conditions, and utilizing scavenger monomer to reduce undesirable residual monomer.

Abstract: An isobutylene-based polymer comprising a structural unit represented by the following formula (1): and a structural unit represented by the following formula (2): wherein X represents a divalent group; Y represents a substituted or unsubstituted alicyclic group having an unsaturated bond in the ring; and n represents 0 or 1.

Abstract: Process for preparing a macromonomer, in which a starting compound H2C?CR1—C6H4-s(R4)s—R3—OH or H2C?CR2—CO—NH—R3—OH, where R1 and R2 are each H or a linear or branched alkyl radical having from 1 to 4 carbon atoms, R3 is a linear or branched alkylene, aralkylene radical which has from 1 to 20 carbon atoms and can contain one or more hydroxy groups and the radicals R4 are each, independently of one another, a linear or branched alkyl, aralkyl, alkoxy or aralkoxy radical having from 1 to 20 carbon atoms and s=0-4, is, after partial deprotonation, reacted with at least one hydroxy-functional oxirane compound in the presence of an inhibitor of free-radical polymerization with opening of the oxirane ring, where the molar ratio of the molar amounts used n(starting compound):n(oxirane compound) is in the range from 1:100 to 1:1. Macromonomers which can be obtained by the process, polymers which can be obtained therefrom and their use as additives in coating compositions, plastics and cosmetics.

Abstract: The invention provides hetero-functional compound compounds useful in a variety of adhesive applications. More particularly, the invention provides compounds bearing at least one electron rich olefinic bond and at least one electron poor olefinic bond, wherein the two olefinic bonds are separated by a C3 to about C500 aliphatic, cycloaliphatic, or aromatic spacer.

Abstract: The purpose of the present invention is to provide an organic silicon compound which has a vinyl group more reactive than those of the conventional organic silicon compounds and can be bonded with another compound. The present organic silicon compound is represented by the following formula (1), wherein R1 is, independently of each other, a vinyl group or an alkyl group having 1 to 4 carbon atoms, R2 is an alkylene group having 3 to 6 carbon atoms, and R3 is, independently of each other, a hydrogen atom or an alkyl group having 1 to 4 carbon atoms and optionally substituted with one or more fluorine atoms.

Abstract: A method for the polymerization of free radically polymerizable vinyl monomers involves polymerizing free radically (co)polymerizable vinyl monomers in a batch reaction under essentially adiabatic conditions, and utilizing scavenger monomer to reduce undesirable residual monomer.

Abstract: A method for the polymerization of free radically polymerizable vinyl monomers involves polymerizing free radically (co)polymerizable vinyl monomers in a batch reaction under essentially adiabatic conditions in the presence of an non-reactive diluent that can remain in the polymer product.

Abstract: A chemically amplified positive resist composition comprising (A) a resin which comprises (i) a polymerization unit represented by the formula (I): wherein R7 represents a hydrogen atom etc., R8 represents a C1-C4 alkyl group, p represents an integer of 1 to 3, and q represents an integer of 0 to 2, (ii) at least one polymerization unit selected from a group consisting of a polymerization unit represented by the formula (II): wherein R1 represents a hydrogen atom etc., R2 represents a C1-C8 alkyl group and ring X represents an alicyclic hydrocarbon group, and a polymerization unit represented by the formula (IV): wherein R3 represents a hydrogen atom etc., R4 and R5 independently represents a hydrogen atom etc., R10 represents a C1-C6 alkyl group etc., and (iii) a polymerization unit represented by the formula (III): wherein R3, R4 and R5 are the same as defined above, E represents a divalent hydrocarbon group, G represents a single bond etc., Z represents a carbonyl group etc.

Abstract: The present invention relates to a cross-linked polyether which is obtained by polymerization of at least one monomer selected from the group consisting of (a) (?-X-methyl) vinyl-EWG, (?-X-methyl) vinyl-ERG, or (?-X-methyl) vinyl-aryl, where X is oxygen, sulfur, PEG, PPG or poly (THF); (b) a monomer which is polymerizable with a PEG, PPG or poly (THF) cross-linker having at least one (?-X-methyl) vinyl-EWG, (?-X-methyl) vinyl-ERG or (?-X-methyl) vinyl-aryl, where X is oxygen, sulfur, PEG, PPG, or poly (THF); (c) a PEG, PPG, or poly (THF) cross-linker having at least an acrylamide or a methacrylamide end group; and (d) mixtures thereof. Various monomers, resins and methods for preparing such cross-linked polyethers are also disclosed.

Abstract: A composition of matter consisting of a stable solution containing a polymer derived from a solution of a polymer containing trace metals, the derived method comprising the steps of: (a) providing a polymer solution containing a polymer, a first solvent and trace metals; (b) passing said polymer solution through an acidic cation ion exchange material to remove said trace metals therefrom and thereby forming a polymer solution containing free acid radicals; (c) precipitating said polymer from said polymer solution of step b by contacting with a second solvent wherein the polymer is substantially insoluble therein; (d) filtering said solution and said second solvent to thereby form a solid polymer cake; and (e) contacting said cake from step d with sufficient quantities of additional said second solvent in order to remove free acid radicals therefrom.

Abstract: The present invention aims to provide a light control material capable of optionally controlling the light transmittance in an arbitrary wavelength range among a wide wavelength range, and a light control film formed by using the light control material.

Abstract: The present invention relates to a method for preparing an unsaturated ethylene-diene copolymer by high pressure radical-initiated polymerisation, said method providing an improved conversion of added diene into pendant vinyl groups.

Abstract: A process for the solution polymerization of olefins with improved on-stream time is provided. The solution polymerization process of the current invention comprises a method for the on-line removal of foulant material from one or more heat exchangers downstream of a polymerization reactor. Removal of foulant material is accomplished by deliberately applying a positive pressure differential across a heat exchanger. In the process of the current invention, reactor shut down is not required for the purpose of cleaning foulant material from a heat exchanger.

Abstract: The present invention is directed to novel flame retardant monomers and polymers, wherein the flame retardant properties of the polymers are provided by functionality in pendant groups attached to a polymer backbone (as opposed to the polymer backbone itself possessing flame retardant properties. The present invention is also directed to methods of making such polymers and monomers, and articles of manufacture incorporating such monomers and polymers.

Abstract: A photosensitive polymer for a photoresist and a photoresist composition having the same are provided. The photosensitive polymer for a photoresist includes the repeating unit represented by the formula below: wherein R1 is a C1-C20 hydrocarbon group or a C1-C20 hetero hydrocarbon group including at least one hetero atom selected from the group consisting of nitrogen, fluorine and sulfur.

Abstract: There is provided a polymer compound including a repetitive unit structure represented by the following general formula (2): General formula (2): (where X? represents a polyalkenyl group; A represents a linear or branched alkylene group having a carbon atom number of 1 to 15, which may be substituted; m represents an integer of 0 to 30; B represents a single bond or an alkylene group which may be substituted; D represents an aromatic ring structure which may be substituted; n represents an integer of 0 to 10; and R represents a hydrogen atom, an alkyl group which may be substituted, or an aromatic ring structure which may be substituted). The polymer compound is suitable for improving dispersibility of a coloring material or solid material in an ink composition or toner composition.

Abstract: A block polymer compound containing block segments, characterized in that at least one hydrophilic segment among the block segments is a copolymer segment composed of an ionic or hydrophilic repeating unit structure and a hydrophobic repeating unit structure.

Abstract: The present invention aims to provide a light control material capable of optionally controlling the light transmittance in an arbitrary wavelength range among a wide wavelength range, and a light control film formed by using the light control material.

Abstract: A composition containing a polymer compound and medium being a solvent or a binder resin, wherein the polymer compound comprises monomer units represented by the general formula (1): wherein A is a straight-chain or branched alkylene group of 1 to 15 carbon atoms, which may be substituted; m is an integer of 0 to 30, and; B is a single bond or alkylene, which may be substituted; D is an aromatic ring structure; n is an integer of 1 to 10, and R is a hydrogen atom, an alkyl group, which may be substituted, an aromatic ring structure, or a mono- or poly-valent metal cation.

Abstract: A compound represented by the following general formula (1): (1) wherein A represents an alkenyl ether group which may be substituted; B represents a linear or branched alkylene group having 1 to 15 carbon atoms which may be substituted; m represents an integer from 0 to 30; when m is larger than 1, B may be different from each other; D represents a single bond or a linear or branched alkylene group having 1 to 10 carbon atoms which may be substituted; E represents any one of an aromatic ring which may be substituted, a condensed ring which may be substituted, and a structure formed by bonding through single bonds at most three aromatic rings which may be substituted; R represents a hydrogen atom, a linear or branched alkyl group having 1 to 5 carbon atoms which may be substituted, or an aromatic ring which may be substituted; n represents a positive number larger than 1; a COOR group in the formula is substituted into the aromatic ring of E; and a hydrogen atom in the aromatic ring, which is not substituted

Abstract: The invention relates to the use of copolymers with styrene-oxide-based, vinyl-functionalized polyethers for preparing aqueous pigment preparations.

Abstract: A dispersible composition that comprises a polymer compound, a functional substance such as a colorant, and a solvent or a dispersion medium, where the polymer compound is comprised of a monomer unit represented by the general formula (1) wherein A is a straight-chain or branched alkylene group of 1 to 15 carbon atoms with or without substitution; m is an integer of 0 to 30, and when m is 2 or more, A is the same or different each other; B is a single bond or an alkylene with or without substitution; D is a substituted or unsubstituted aromatic ring structure; n is an integer of 1 to 10, and when n is 2 or more, D is the same or different with each other. The composition is usable as an ink composition or toner composition.

Abstract: Polymeric compounds suitable for ink and toner compositions, and image forming methods and apparatus using an ink or toner composition containing such a polymer compound, and particularly to a polymer compound having a repeating unit structure represented by the general formula wherein B is a linear or branched alkylene group having 1 to 15 carbon atoms and may be substituted, m is an integer of 1 to 30, q is an integer of 2 to 30, and R1 is hydrogen, an alkyl group which may be substituted, or an aromatic ring structure which may be substituted, with the proviso that when m is a plural number, the B groups may be different from each other, ink and toner compositions containing the polymer compound, a solvent or dispersion medium and a coloring material, and image forming methods and image forming apparatus using such a composition.

Abstract: The present invention provides an ink composition containing a pigment dispersed uniformly in a solvent and a block polymer having an ionic functional group, an image-forming method and an image-forming apparatus employing the ink composition. The composition comprises a pigment, a solvent and a polymer having an ionic functional group, an acid residue, or a base residue at the terminal. The polymer having an ionic functional group, an acid residue, or a base residue at the terminal is a block polymer of ABX type having A, B, and X segments, wherein A and B are respectively a block segment having a vinyl ether structure as the repeating unit, and X is a terminal segment having an ionic functional group, an acid residue, or an base residue.

Abstract: Provided is a polymeric fluorescent substance showing fluorescence in solid state, which has a specific carrier drift mobility, a specific repeating unit, and specific number-average molecular weight. The polymeric fluorescent substance is excellent in solubility to organic solvents, and has higher efficiency and longer lifetime in applying as a polymer LED.

Abstract: A composition containing a polymer compound and medium being a solvent or a binder resin, wherein the polymer compound comprises monomer units represented by the general formula (1): wherein A is a straight-chain or branched alkylene group of 1 to 15 carbon atoms, which may be substituted; m is an integer of 0 to 30, and; B is a single bond or alkylene, which may be substituted; D is an aromatic ring structure; n is an integer of 1 to 10, and R is a hydrogen atom, an alkyl group, which may be substituted, an aromatic ring structure, or a mono- or poly-valent metal cation.

Abstract: A sulfonate compound having formula (1) is novel wherein R1 to R3 are H, F or C1-20 alkyl or fluoroalkyl, at least one of R1 to R3 contains F.

Abstract: A vinyl monomer of the structure R—B—Ar(—CH?CH2)n (1) in which Ar is an aromatic ring (arylene group); n is an integer >0, in particular one or two; B is a bridge structure; R is a (C2-30)-hydrocarbon group carrying two or more protected or unprotected hydroxy groups. The monomer is characterized in that B comprises a chain of atoms linking R to Ar and consisting of 1–10 atoms selected from carbons and the heteroatoms ether oxygen, thioether sulphur or amino nitrogen, with the proviso that the terminal atom in B which is attached to R is one of the heteroatoms. A method for producing a polymer support matrix in which the vinylmonomer is one of the monomeric units. The support matrix as such is also claimed. The preferred method for producing the support matrices involves suspension polymerisation, the preferred form of matrix is beads.

Abstract: The invention provides novel polymers and photoresist compositions that comprise the polymers as a resin component. Polymers of the invention contain two distinct groups which can undergo a deblocking reaction in the presence of photogenerated acid, wherein one of the deblocking moieties is an acetal group. The second photoacid-labile group is suitably an ester, particularly as provided by polymerization of an alkyl acrylate group, such as t-butylmethacrylate.

Abstract: A radiation curable adhesive composition which includes: a) an ?,?-olefinically unsaturated ether monomer component consisting of one or more compounds having the formula: R[O—CH?CHR1]n??(I) where R is an n-valent carbon-linked organic group R1 is H or a monovalent carbon-linked organic group and n has a value of 1 or more, b) an elastomeric polymer having a tensile strength at break of greater than 1500 psi (10342 kPa), and an elongation at break of greater than 100%, and c) a cationic photoinitiator.

Abstract: A waterborne radiation curable coating composition containing at least one acrylate functional oligomer having a functionality greater than 3 and at least one vinyl ether oligomer having a functionality greater than 1 provides a cured coating resists deep scratches.

Abstract: An at least two-component mortar composition is described, which can be cured by thermal initiation and contains at least one polymerizable monomer and/or at least one curable resin, at least one polymerization initiator for the polymerizable monomer and/or the curable resin and optionally at least one filler, wherein, as polymerization initiator, at least one organically substituted ammonium salt is contained as constituent of a mortar component and at least one inorganic persulfate is contained as constituent of a further mortar component, and which, after the mortar components are mixed in situ, results in an organically substituted ammonium persulfate, the nature and amount of organically substituted ammonium salt and inorganic persulfate as well as of polymerizable monomer or curable resin being selected so that a mortar composition results, which can be polymerized by free radical polymerization due to the action of heat, as well as a method for fastening tie rods, reinforcing steel for concrete or the

Abstract: A radiation curable resin composition for a Fresnel lens is provided, which exhibits a high elastic modulus and a high refractive index and is superior in adhesion to the plastic substrate and is superior in transparency. A lens layer exhibits excellent shape retention over a wide temperature range and is less likely to chip and crack due to an external force. A Fresnel lens sheet using the radiation curable resin composition is also provided. The resin composition comprises, as an essential component, an epoxy (meth)acrylate (a) having an epoxy equivalent per weight of 450 g/eq or more, which has a cyclic structure and two or more (meth)acryloyl groups; a specific trifunctional (meth)acrylate (b); a (meth)acrylate (c) having a molecular weight of 700 or less from an aliphatic polyhydric alcohol having an oxypropylene structure; and a monofunctional (meth)acrylate (d) having a cyclic structure.

Abstract: A method has been described of preparing monodisperse polymer particles by free radical polymerization or copolymerization of hydrophobic monomers in a water-based system in the presence of cyclodextrin, characterized in that said free radical polymerization is performed with semi-continuous addition of monomer, wherein said monomer is absent before initiating polymerization, and in that a total solid contents of less than 30% by weight is present in said water-based system, in order to provide monodisperse polymer particles which are very suitable for use in many applications as e.g. in inks or toners, in photonic crystal films, in thermal printing plates for computer-to-plate or computer-to-press applications, in inkjet media, in displays, in photographic films, or as a spacing agent.

Abstract: Provided are a fluorine-containing photosensitive polymer having a hydrate structure and a resist composition including the photosensitive polymer.

Abstract: Novel cross linked polymer films prepared from poly4-[(4-cardanylazo]benzoic acid and poly4-[(4-acryloylcardanylazo]benzoic acid are disclosed. The invention also relates to novel monomers 4-[(4-cardanylazo] benzoic acid and 4-[(4-acryloylcardanylazo] benzoic acid and polymers thereof as well processes for the preparation thereof.

Abstract: The present invention provides a protolytically leaving group-containing copolymer having improved characteristics such as increased solubility in alkaline aqueous solution in the presence of a proton, thus finding application with advantage in various uses, and a process for producing the copolymer. A protolytically leaving group-containing copolymer represented by the following general formula (1): in the formula, R1, R2 and R3 are the same or different and each represents a protolytically leaving group and a, b and c represent the amounts of existence (mole %) of repeating units (A), (B) and (C), respectively, in the copolymer, which comprises the repeating unit (A) as well as the repeating unit (B) and/or the repeating unit (C) and has a weight average molecular weight of 2000˜30000, said a, b and c satisfying the condition that a is 5 to 30 mole % and (b+c) is 70 to 95 mole %.

Abstract: Fluoropolymers consisting of alternating perfluorocyclobutane and aryl ether linkages possess suitable properties for optical waveguides and other devices using refractive properties of the polymers. Perfluorocyclobutane (PFCB) polymers having aryl groups alternating on an ether chain have shown useful physical properties for optical waveguide applications. Processes for micromolding such polymeric films by replicating a pattern or image directly from a silicon master, rather than from a polydimethyl siloxane (PDMS) mold) are disclosed.