Nitrogen-containing Compound Is A Reactant Other Than Wherein Nitrogen Is Solely Present As A Carboxylic Acid Derivative Patents (Class 528/172)
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Patent number: 8372942Abstract: Provided are: a urethane-based polycarbonate resin, including a repeating unit represented by the general formula [1], and a repeating unit represented by the general formula [2], in which the urethane-based polycarbonate resin has high wear resistance by virtue of a strong hydrogen bond between urethane groups; and an electrophotographic photoconductor, including a photosensitive layer provided on a conductive substrate, in which the electrophotographic photoconductor includes the above-mentioned polycarbonate resin as a component of the photosensitive layer, has high wear resistance, and maintains an excellent electrophotographic characteristic over a longtime period: [Chem. 1] (Ar2 represents a group having a divalent aromatic group, and Ar1 represents a divalent aromatic group-containing group having a specific structure).Type: GrantFiled: December 24, 2009Date of Patent: February 12, 2013Assignee: Idemitsu Kosan Co., Ltd.Inventor: Kengo Hirata
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Patent number: 8349991Abstract: The present invention relates to amphiphilic polymers, and micelles and compositions comprising the same, and their use in a variety of biological settings, including imaging, targeting drugs, or a combination thereof for diagnostic and therapeutic purposes.Type: GrantFiled: April 17, 2006Date of Patent: January 8, 2013Assignees: Massachusetts Institute of Technology, University of Massachusetts LowellInventors: Clark K. Colton, Arthur Watterson, Rajesh Kumar, Virinder S. Parmar, Robert Fisher, Jayant Kumar
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Publication number: 20120322911Abstract: The present invention discloses a new type of polyimide membrane with high permeances and high selectivities for gas separations and particularly for CO2/CH4 and H2/CH4 separations. The polyimide membranes have CO2 permeability of 50 Barrers or higher and single-gas selectivity for CO2/CH4 of 15 or higher at 50° C. under 791 kPa for CO2/CH4 separation. The polyimide membranes have UV cross-linkable functional groups and can be used for the preparation of UV cross-linked polyimide membranes having CO2 permeability of 20 Barrers or higher and single-gas selectivity for CO2/CH4 of 35 or higher at 50° C. under 791 kPa for CO2/CH4 separation.Type: ApplicationFiled: October 21, 2011Publication date: December 20, 2012Applicant: UOP LLC.Inventors: Chunqing Liu, Travis C. Bowen, Emily G. Harbert, Raisa Minkov, Syed A. Faheem, Zara Osman
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Patent number: 8318891Abstract: A copolycarbonate-polyester, comprising units of formula wherein at least 60 percent of the total number of R1 groups are divalent aromatic organic radicals and the balance thereof are divalent aliphatic or alicyclic radicals; units of formula wherein T is a C7-20 divalent alkyl aromatic radical or a C6-20 divalent aromatic radical, and D is a divalent C6-20 aromatic radical; and units of the formula wherein R2 and R3 are each independently a halogen or a C1-6 alkyl group, R4 is a methyl or phenyl group, each c is independently 0 to 4, and T is as described above. A method of making a copolycarbonate-polyester is also disclosed.Type: GrantFiled: October 21, 2008Date of Patent: November 27, 2012Assignee: Sabic Innovative Plastics IP B.V.Inventors: Karthik Balakrishnan, James A. Mahood, Adam Zerda
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Publication number: 20120277397Abstract: Aniline copolymers and methods of making these copolymers are disclosed herein. The copolymers can, for example, be used for removing metal ions from a sample.Type: ApplicationFiled: April 25, 2011Publication date: November 1, 2012Applicant: TONGJI UNIVERSITYInventors: Meirong Huang, Hao Feng, Xingui Li
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Patent number: 8299202Abstract: The present invention relates to A phenol compound according to Formula (I): wherein: R1 is selected from the group consisting of, optionally substituted, 2-pyridyl, 3-pyridiyl and 4-pyridyl groups, wherein R1 is at position 2 or 3 of the phenol ring; R2 is selected from the group consisting of, optionally substituted, 2-pyridyl, 3-pyridiyl, 4-pyridyl and phenyl groups, wherein R2 is at position 5 or 6 of the phenol ring; and the phenol ring is optionally substituted at one or two positions, independently selected from positions 2, 3, 5 and 6, with a halogen atom or a with an optionally substituted C6-C12 aryl group or an optionally substituted C1-C10 alkyl group. The present invention relates also to (co)polymers comprising the phenol compound according to Formula (I) and membranes and ionic resins comprising said (co)polymers.Type: GrantFiled: January 30, 2009Date of Patent: October 30, 2012Inventors: Doetze Jakob Sikkema, Ronny Mathieu Versteegen, Maarten Jozef Pouderoijen
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Patent number: 8288590Abstract: Biocompatible, bioresorbable polymers comprising a plurality of monomeric repeating units containing an amide group, wherein said amide groups are N-substituted and the N-substituent and degree of N-substitution are effective to lower the melt viscosity, the solution viscosity, or both, compared to the same polymer without N-substitution.Type: GrantFiled: July 14, 2011Date of Patent: October 16, 2012Assignee: Rutgers, The State University of New JerseyInventors: Joachim B. Kohn, Durgadas Bolikal, Jaap Schut, Ernest G. Baluca
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Patent number: 8236920Abstract: A dihalobiphenyl compound represented by the formula (1): wherein A represents an amino group substituted with one or two C1-C20 hydrocarbon groups or a C1-C20 alkoxy group, R1 represents a fluorine atom, a C1-C20 alkyl group, etc., X1 represents a chlorine atom, a bromine atom or an iodine atom, an k represents an integer of 0 to 3, and a polyarylene comprising a repeating unit represented by the formula (2): wherein A, R1 and k represent the same meanings as defined above.Type: GrantFiled: September 6, 2006Date of Patent: August 7, 2012Assignee: Sumitomo Chemical Company, LimitedInventors: Noriyuki Hida, Seiji Oda, Takashi Kamikawa, Katsuhiro Suenobu
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Patent number: 8232366Abstract: The present invention relates to an aqueous alkali-developable photosensitive polyimide precursor resin composition that is appropriate for highly heat-resistant transparent protection layers and insulation layers for liquid crystal display devices. In more detail, the present invention relates to a negative-type photosensitive transparent polyimide precursor resin composition manufactured in two steps.Type: GrantFiled: March 24, 2004Date of Patent: July 31, 2012Assignee: LG Chem, Ltd.Inventors: Dong-seok Kim, Yong-sik Ahn, Kyung-jun Kim, Mi-hie Yi
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Publication number: 20120130043Abstract: Polyethersulfones having Tg greater than about 225° C. and a notched Izod value greater than about 1 ft-lb/in, as measured by ASTM D256, comprise from about 5 mol % to less than about 40 mol % structural units of formula 1; and from greater than about 60 mol % to about 95 mol % structural units of formula 2 wherein R1, R2, and R3 are independently at each occurrence a halogen atom, a nitro group, a cyano group, a C1-C12aliphatic radical, C3-C12cycloaliphatic radical, or a C3-C12aromatic radical; n, m, q are independently at each occurrence integers from 0 to 4; and Q is a C3-C20cycloaliphatic radical, or a C3-C20aromatic radical.Type: ApplicationFiled: January 30, 2012Publication date: May 24, 2012Applicant: SABIC INNOVATIVE PLASTICS IP B.V.Inventors: Daniel Joseph Brunelle, Daniel Steiger
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Publication number: 20120130042Abstract: Polyethersulfones having Tg greater than about 225° C. and a notched Izod value greater than about 1 ft-lb/in, as measured by ASTM D256, comprise from about 5 mol % to less than about 40 mol % structural units of formula 1; and from greater than about 60 mol % to about 95 mol % structural units of formula 2 wherein R1, R2, and R3 are independently at each occurrence a halogen atom, a nitro group, a cyano group, a C1-C12 aliphatic radical, C3-C12 cycloaliphatic radical, or a C3-C12 aromatic radical; n, m, q are independently at each occurrence integers from 0 to 4; and Q is a C3-C20 cycloaliphatic radical, or a C3-C20 aromatic radical.Type: ApplicationFiled: January 30, 2012Publication date: May 24, 2012Applicant: SABIC INNOVATIVE PLASTICS IP B.V.Inventors: Daniel Joseph Brunelle, Daniel Steiger
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Patent number: 8178621Abstract: A polyimide precursor composition includes an oligomer or polymer having a substituted or unsubstituted carbonyl group only in a side chain and a diamine compound. A method of manufacturing a polyimide, and a polyimide film, are also disclosed.Type: GrantFiled: May 12, 2010Date of Patent: May 15, 2012Assignee: Samsung Electronics Co., Ltd.Inventors: Sangmo Kim, Youngsuk Jung, Yooseong Yang, Byung-Hee Sohn, Eunseog Cho
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Patent number: 8153753Abstract: A polyamide having at least an alicyclic or aromatic group exhibiting a light transmittance of 80% or more in the wavelength region of 450 to 700 nm is produced by using an aramide polymer comprising specific structural units at an amount of 50 mol % or more. Colorless transparent alicyclic or aromatic polyamide films having high rigidity and high thermal resistance are provided by using the polyamide. Further, the invention provides various optical members made by using the polyamide or the polyamide films, and polyamide copolymers.Type: GrantFiled: April 7, 2004Date of Patent: April 10, 2012Assignee: Toray Industries, Inc.Inventors: Hideki Moriyama, Akimitsu Tsukuda
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Publication number: 20120016076Abstract: In a method for preparing a polyimide resin by reacting diamine and dianhydride, the polyimide resin is polymerized under the presence of a solvent having a boiling point ranging from 130° C. to 180° C. so as to be curable at a low temperature ranging from 150° C. to 250° C. Because the polyimide is curable even at a low temperature, when the polyimide resin is used as an electronic material, damage to equipment due to an otherwise high temperature process can be minimized, and in addition, the polyimide resin can be extensively used as an electronic material such as for a plastic substrate, or the like.Type: ApplicationFiled: July 13, 2011Publication date: January 19, 2012Applicant: LG CHEM. LTD.Inventors: Sang Woo KIM, Se Jin SHIN, Dong Hyun OH, Kyung Jun KIM
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Publication number: 20110287354Abstract: Provided are: a urethane-based polycarbonate resin, including a repeating unit represented by the general formula [1], and a repeating unit represented by the general formula [2], in which the urethane-based polycarbonate resin has high wear resistance by virtue of a strong hydrogen bond between urethane groups; and an electrophotographic photoconductor, including a photosensitive layer provided on a conductive substrate, in which the electrophotographic photoconductor includes the above-mentioned polycarbonate resin as a component of the photosensitive layer, has high wear resistance, and maintains an excellent electrophotographic characteristic over a longtime period: [Chem. 1] (Ar2 represents a group having a divalent aromatic group, and Ar1 represents a divalent aromatic group-containing group having a specific structure).Type: ApplicationFiled: December 24, 2009Publication date: November 24, 2011Applicant: IDEMITSU KOSAN CO., LTD.Inventor: Kengo Hirata
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Publication number: 20110269848Abstract: Biocompatible, bioresorbable polymers comprising a plurality of monomeric repeating units containing an amide group, wherein said amide groups are N-substituted and the N-substituent and degree of N-substitution are effective to lower the melt viscosity, the solution viscosity, or both, compared to the same polymer without N-substitution.Type: ApplicationFiled: July 14, 2011Publication date: November 3, 2011Applicant: RUTGERS, THE STATE UNIVERSITY OF NEW JERSEYInventors: Joachim B. Kohn, Durgadas Bolikal, Jaap Schut, Ernest G. Baluca
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Patent number: 8030437Abstract: A method for forming a polyimide composite article utilizes a polyimide resin system including at least a first prepolymer component and a second prepolymer component. A preform structure is tackified with the first prepolymer component. Using resin infusion or resin transfer molding techniques, the tackified preform structure is contacted with the second prepolymer component. The polyimide resin system is cured under suitable cure conditions so that the first and second prepolymer components mix and react to produce the polyimide composite structure.Type: GrantFiled: December 27, 2007Date of Patent: October 4, 2011Assignee: General Electric CompanyInventors: Stephen Mark Whiteker, Lisa Vinciguerra Shafer, Warren Rosal Ronk
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Patent number: 8030433Abstract: Tailorable polyimide resin systems suitable for processing by resin transfer molding (RTM) and resin infusion (RI) methods. An exemplary resin system includes first and second prepolymer components present in respective amounts to provide the desired processibility. The cured polyimide system exhibits high glass transition temperature and other properties required for gas turbine engine applications. The first and second prepolymer components independently comprise a monomeric mixture or a reaction product of a diamine component, a dianhydride component, and an end group component.Type: GrantFiled: December 27, 2007Date of Patent: October 4, 2011Assignee: General Electric CompanyInventors: Stephen Mark Whiteker, Lisa Vinciguerra Shafer, Warren Rosal Ronk
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Patent number: 8003750Abstract: A thermosetting composition comprising (a) 97.9 to 40 percent by weight of at least one bis(dihydrobenzoxazine) prepared by the reaction of an unsubstituted or substituted bisphenol with at least one unsubstituted position ortho to each hydroxyl group, formaldehyde and a primary amine; (b) 2 to 50 percent by weight of at least one organic polyamine; and (c) 0.1 to 10 percent by weight of at least one curing catalyst, selected from the group of carboxylic acids, sulfonic acids and phosphonic acids having at least two acid groups and no other reactive groups; wherein the percent by weight refer to the total amount of components (a), (b) and (c) in the composition, with the proviso that (a), (b) and (c) add up to 100 percent by weight; and (d) and optionally other components. Cured products of these compositions show valuable chemical, physical and mechanical properties.Type: GrantFiled: January 31, 2008Date of Patent: August 23, 2011Assignee: Huntsman International LLCInventor: Frans Setiabudi
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Patent number: 7989578Abstract: The present invention relates to a negative photosensitive polyimide polymer having a repeating unit of formula (1) as a polymerized unit: wherein G, Q and P* are as defined in the specification. The polyimide polymer of the present invention is developable in an aqueous alkaline solution, and has the properties associated with an insulating layer and photoresist.Type: GrantFiled: October 30, 2007Date of Patent: August 2, 2011Assignee: Eternal Chemical Co., Ltd.Inventor: Chung-Jen Wu
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Publication number: 20110184143Abstract: This invention relates to the polymerisation of five-, six- or seven-membered cyclic carbonates by ring-opening polymerisation in the presence of a system comprising a metal salt such as triflate, triflimidate, acetylacetonate or carboxylate and an alcohol.Type: ApplicationFiled: July 3, 2009Publication date: July 28, 2011Applicants: Total Petrochemicals Research Feluy, Centre National De La Recherche ScientifiqueInventors: Marion Helou, Sophie Guillaume, Jean-François Carpentier, Olivier Miserque
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Patent number: 7964698Abstract: The benefits of liquid crystal polymers and polyetherimides are combined in an all-aromatic thermoplastic liquid crystalline polyetherimide. Because of the unique molecular structure, all-aromatic thermotropic liquid crystal polymers exhibit outstanding processing properties, excellent barrier properties, low solubilities and low coefficients of thermal expansion in the processing direction. These characteristics are combined with the strength, thermal, and radiation stability of polyetherimides.Type: GrantFiled: November 5, 2007Date of Patent: June 21, 2011Assignee: United States of America as represented by the Administrator of the National Aeronautics and Space AdministrationInventors: Erik S. Weiser, Theodorus J. Dingemans, Terry L. St. Clair, Jeffrey A. Hinkley
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Publication number: 20110105689Abstract: A polyimide precursor composition includes an oligomer or polymer having a substituted or unsubstituted carbonyl group only in a side chain and a diamine compound. A method of manufacturing a polyimide, and a polyimide film, are also disclosed.Type: ApplicationFiled: May 12, 2010Publication date: May 5, 2011Applicant: SAMSUNG ELECTRONICS CO., LTD.Inventors: Sangmo KIM, Youngsuk JUNG, Yooseong YANG, Byung-Hee SOHN, Eunseog CHO
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Publication number: 20110009563Abstract: Copolymers comprising recurring units (A) of one or more of the general structural formulae -D-G-Arb-G-, -G-D-G-Arb- and/or -D-G- on one hand, and recurring units (B) of one or more of the general structural formulae —Ara-G-Arb-G-, -G-Ara-G-Arb- and/or —Ara-G- on the other hand, wherein D is a dibenzodiazocine-containing divalent group, Ara is a dibenzodiazocine-free divalent group containing a sulfone unit and/or a ketone unit, Arb is a dibenzodiazocine-free divalent group, and G is an ether or a thiether group. Preferably, recurring units (A) are of the general structural formula -D-G-Arb-G- and recurring units (B) are of the general structural formula —Ara-G-Arb-G-. Method for the preparation of the copolymers, compositions and articles made of the copolymers are also part of the invention.Type: ApplicationFiled: February 10, 2009Publication date: January 13, 2011Applicant: SOLVAY ADVANCED POLYMERS, L.L.C.Inventor: Charles Hoppin
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Publication number: 20100316695Abstract: The invention relates to a condensation product obtainable by reaction of a1) at least one bicyclic or polycyclic aromatic or heteroaromatic, where the bicyclic or polycyclic aromatic or heteroaromatic is substituted by at least one carboxyl group (—COOH), and where the carboxyl group can be present in salt form, a2) at least one carbonyl compound, a3) if appropriate at least one sulfonating agent, a4) at least one urea derivative, and a5) if appropriate at least one further aromatic or heteroaromatic, or a physiologically tolerable salt thereof.Type: ApplicationFiled: November 11, 2008Publication date: December 16, 2010Applicant: BASF SEInventors: Sebastien Garnier, Stephan Hueffer, Guenter Scherr, Joachim Roser, Ulrich Mrowietz, Hans Wilhelm Doerr, Jindrich Cinatl, Martin Michaelis
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Patent number: 7842775Abstract: Featured are novel heterocycle substituted hydroquinones, aromatic copolymers and homopolymers bearing main and side chain polar pyridine units. These polymers exhibit good mechanical properties, high thermal and oxidative stability, high doping ability and high conductivity values. These novel polymers can be used in the preparation and application of MEA on PEMFC type single cells. The combination of the above mentioned properties indicate the potential of the newly prepared materials to be used as electrolytes in high temperature PEM fuel cells.Type: GrantFiled: August 24, 2009Date of Patent: November 30, 2010Assignee: Advent Technologies SAInventors: Maria Geormezi, Nora Gourdoupi
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Patent number: 7786244Abstract: Featured are novel heterocycle substituted hydroquinones, aromatic copolymers and homopolymers bearing main and side chain polar pyridine units. These polymers exhibit good mechanical properties, high thermal and oxidative stability, high doping ability and high conductivity values. These novel polymers can be used in the preparation and application of MEA on PEMFC type single cells. The combination of the above mentioned properties indicate the potential of the newly prepared materials to be used as electrolytes in high temperature PEM fuel cells.Type: GrantFiled: September 10, 2007Date of Patent: August 31, 2010Assignee: Advent TechnologiesInventors: Maria Geormezi, Nora Gourdoupi
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Patent number: 7754843Abstract: New aromatic polyether type copolymers bearing main chain pyridine and side chain pyridine or pyrimidine units, which exhibit good mechanical properties, high thermal and oxidative stability, high doping ability and high conductivity values. The polymers are useful in the preparation and application of MEA on PEMFC type single cells. The polymers are, further, particularly suitable for use in high temperature PEM fuel cells.Type: GrantFiled: April 7, 2008Date of Patent: July 13, 2010Assignee: Advent TechnologiesInventors: Nora Gourdoupi, Maria Geormezi
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Patent number: 7709576Abstract: A process for preparing a sulfonate terminated polyarylate comprises blending a polyarylate resin with an organic compound to form a reaction mixture, wherein the organic compound contains at least one aliphatic primary amine functional group and at least one other functional group selected from the group consisting of sulfonic acids, sulfonic acid salts, and mixtures thereof, and heating the reaction mixture to a temperature of 225 to 400° C. The temperature of heating is above the glass transition temperature of the polyarylate resin. Sulfonate terminated polyarylates and compositions prepared using the above process, and articles comprising the sulfonate terminated polyarylate compositions, are also disclosed.Type: GrantFiled: March 31, 2008Date of Patent: May 4, 2010Assignee: SABIC Innovative Plastics IP B.V.Inventor: Robert Russell Gallucci
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Patent number: 7678874Abstract: This invention relates to a novel polyimide silicone having an alcoholic hydroxyl group and a process for the preparation thereof. The polyimide of the invention having a primary alcoholic hydroxyl group is represented by the following general formula (1), wherein X represents a tetravalent organic group, Y represents a divalent group having at least one monovalent group selected from the group consisting of a phenolic hydroxyl group and a carboxyl group, with at least one being a divalent organic group having an alcoholic hydroxyl group, Z represents a divalent organic group, W represents a divalent organic group having an organosiloxane structure, k is a positive number, and each of m and n is equal to 0 (zero) or a positive number, with 0.1?k/(k+m+n)?1, 0?m/(k+m+n)?0.8, 0?n/(k+m+n)?0.8.Type: GrantFiled: September 30, 2005Date of Patent: March 16, 2010Assignee: Shin-Etsu Chemical Co., Ltd.Inventors: Michihiro Sugo, Hideto Kato, Tomoyuki Goto
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Patent number: 7662904Abstract: The present invention relates to aromatic polyether resins crosslinked with amic acid or imide side chain, and more particularly, to the aromatic polyether resin crosslinked by amic acid or imide side chain, which is produced by heat curing of amic acid, wherein introduction of imide groups to the basic backbone provides excellent chemical resistance as well as heat resistance and improves surface roughness when coated as a thin film so that it can be suitable for films and flexible display plate substrate.Type: GrantFiled: February 13, 2006Date of Patent: February 16, 2010Assignee: Korea Research Institute of Chemical TechnologyInventors: Jong Chan Won, Yong Seok Kim, Eun Sang Lee, Jae Heung Lee
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Publication number: 20100029891Abstract: A thermosetting composition comprising (a) 97.9 to 40 percent by weight of at least one bis(dihydrobenzoxazine) prepared by the reaction of an unsubstituted or substituted bisphenol with at least one unsubstituted position ortho to each hydroxyl group, formaldehyde and a primary amine; (b) 2 to 50 percent by weight of at least one organic polyamine; and (c) 0.1 to 10 percent by weight of at least one curing catalyst, selected from the group of carboxylic acids, sulfonic acids and phosphonic acids having at least two acid groups and no other reactive groups; wherein the percent by weight refer to the total amount of components (a), (b) and (c) in the composition, with the proviso that (a), (b) and (c) add up to 100 percent by weight; and (d) and optionally other components. Cured products of these compositions show valuable chemical, physical and mechanical properties.Type: ApplicationFiled: January 31, 2008Publication date: February 4, 2010Applicant: HUNTSMAN INTERNATIONAL LLCInventor: Frans Setiabudi
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Publication number: 20090131623Abstract: Polymers and copolymers of formula I: in which m is typically 30 to 500 and n is 0 to 500; Ar is for example, 1,2-phenylene, 1,3-phenylene, 1,4-phenylene, or 2,6-pyridylene; Ar2 and Ar3 are selected from various bivalent aryl and heteroaryl groups; and X is for example, the bivalent SO2 or CO, have high temperature properties which make them useful as films, matrices in carbon fiber reinforced composites and high performance adhesives; processes for preparing the polymers and copolymers employ a novel C—N coupling reaction.Type: ApplicationFiled: September 2, 2008Publication date: May 21, 2009Inventors: Allan S. Hay, Sumiko Matsumura, Antisar R. Hlil
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Publication number: 20090111027Abstract: An ionically conductive polymer has the chemical structure 1 as shown herein. Examples of the polymer include 4,4?-(4-(1H-benzo[d]imidazol-2-yl)butane-2,2-diyl)diphenol, sulfonated poly(aryl ether sulfone) containing benzimidazole backbone, sulfonated poly(aryl ether sulfone) containing carboxylic acid backbone, and sulfonated poly(aryl ether sulfone) containing benzimidazole backbone from carboxylic acid containing sulfonated poly(aryl ether sulfone). The polymer has intrinsic ion conducting properties so that it is effectively conductive even under low water conditions. In one embodiment, the polymer has an ionic conductivity of at least 1×10?5 S/cm at a temperature of 120° C. when the polymer is substantially anhydrous.Type: ApplicationFiled: October 26, 2007Publication date: April 30, 2009Applicant: Battelle Memorial InstituteInventors: Ramanathan S. Lalgudi, Jeffrey Boyce, Jay Sayre, Bhima R. Vijayendran
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Patent number: 7495066Abstract: A copolycarbonate-polyester, comprising units of formula wherein at least 60 percent of the total number of R1 groups are divalent aromatic organic radicals and the balance thereof are divalent aliphatic or alicyclic radicals; units of formula wherein T is a C7-20 divalent alkyl aromatic radical or a C6-20 divalent aromatic radical, and D is a divalent C6-20 aromatic radical; and units of the formula wherein R2 and R3 are each independently a halogen or a C1-6 alkyl group, R4 is a methyl or phenyl group, each c is independently 0 to 4, and T is as described above.Type: GrantFiled: November 30, 2005Date of Patent: February 24, 2009Assignee: Sabic Innovative Plastics IP B.V.Inventors: Karthik Balakrishnan, James A. Mahood, Adam Zerda
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Publication number: 20090036632Abstract: A dihalobiphenyl compound represented by the formula (1): wherein A represents an amino group substituted with one or two C1-C20 hydrocarbon groups or a C1-C20 alkoxy group, R1 represents a fluorine atom, a C1-C20 alkyl group, etc., X1 represents a chlorine atom, a bromine atom or an iodine atom, an k represents an integer of 0 to 3, and a polyarylene comprising a repeating unit represented by the formula (2): wherein A, R1 and k represent the same meanings as defined above.Type: ApplicationFiled: September 6, 2006Publication date: February 5, 2009Inventors: Noriyuki Hida, Seiji Oda, Takashi Kamikawa, Katsuhiro Suenobu
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Publication number: 20080242827Abstract: The invention relates to a method of preparing omni-meta aromatic polysulfonamide fiber which comprises three steps of preparing spinning dope, wet spinning and post treating. The said step of preparing spinning dope comprises the following steps: (1) dissolving 3,3?-diaminodiphenyl sulphone in a polar organic solvent and cooling it to ?20˜20° C.; (2) adding m-phthaloyl chloride of the same mole of the 3,3?-diaminodiphenyl sulphone to carry out a polymerization reaction; (3) then adding an inorganic base of the same mole of 3,3?-diaminodiphenyl sulphone to neutralize the hydrogen chloride produced during the polymerization reaction. The spinning dope thus prepared has a polymer solid content of 10%-20%. The fiber prepared according to the method in the present invention has a greatly improved crimpability, and evidently increased elongation at break comparing with the conventional aromatic polysulfonamide fiber, so that the spinnability of resultant yarn is improved.Type: ApplicationFiled: November 13, 2007Publication date: October 2, 2008Applicant: SHANGHAI TANLON FIBER CO.,LTD.Inventors: Xiaofeng Wang, Jun Li, Ronghua Yuan, Haifeng Wang, Shunxing Lu, Shenghui Chen, Jicheng Chang, Qingrong Song
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Publication number: 20080113227Abstract: Featured are novel heterocycle substituted hydroquinones, aromatic copolymers and homopolymers bearing main and side chain polar pyridine units. These polymers exhibit good mechanical properties, high thermal and oxidative stability, high doping ability and high conductivity values. These novel polymers can be used in the preparation and application of MEA on PEMFC type single cells. The combination of the above mentioned properties indicate the potential of the newly prepared materials to be used as electrolytes in high temperature PEM fuel cells.Type: ApplicationFiled: September 10, 2007Publication date: May 15, 2008Inventors: Maria Geormezi, Nora Gourdoupi
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Patent number: 7288603Abstract: An object of the present invention is to obtain a novel polymeric material capable of forming a solid polymer electrolyte excellent not only in processability, solvent resistance and durability/stability but also in ion conductivity by introducing sulfonic acid group or phosphonic acid group into a polybenzazole compound having excellent properties in view of heat resistance, solvent resistance, mechanical characteristics and the like. Means attaining the object of the present invention is a polybenzazole compound including an aromatic dicarboxylic acid bond unit having sulfonic acid group and/or phosphonic acid group and satisfying either a condition that inherent viscosity measured in concentrated sulfuric acid is in the range of 0.25 to 10 dl/g or a condition that inherent viscosity measured in a methanesulfonic acid solution is in the range of 0.1 to 50 dl/g.Type: GrantFiled: November 12, 2001Date of Patent: October 30, 2007Assignee: Toyo Boseki Kabushiki KaishaInventors: Yoshimitsu Sakaguchi, Kota Kitamura, Hiroaki Taguchi, Junko Nakao, Shiro Hamamoto, Hiroshi Tachimori, Satoshi Takase
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Patent number: 7273919Abstract: High heat polyethersulfone compositions are provided which possess unexpectedly high glass transition temperatures. The polyethersulfone compositions comprise structural units derived from phthalimide bisphenols such as 3,3-bis(4 -hydroxyphenyl)-N-phenylphthalimide, and structural units derived from at least one biphenyl-bissulfone such as 4,4?-bis((4-chlorophenyl)sulfonyl)-1,1?-biphenyl. The novel polyethersulfone compositions may further comprise structural units derived from one or more biphenols such as 4,4?-biphenol, bisphenols such as BPA, or other electrophilic sulfone monomers, such as bis(4-chlorophenyl)sulfone. In one embodiment, the polyethersulfone composition of the present invention comprises structural groups derived exclusively from 3,3-bis(4-hydroxyphenyl)-N-phenylphthalimide, and 4,4?-bis((4-chlorophenyl)sulfonyl)-1,1?-biphenyl and exhibits a single glass transition of greater than 300° C.Type: GrantFiled: November 21, 2005Date of Patent: September 25, 2007Assignee: General Electric CompanyInventors: Daniel Steiger, Farid Fouad Khouri, Daniel Joseph Brunelle, Amy Beth Koren
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Patent number: 7235192Abstract: A method of preparing a capped poly(arylene ether) resin includes reacting a capping agent with a blend of two or more poly(arylene ether) resins having different intrinsic viscosities. Cured compositions prepared from these capped poly(arylene ether) resins exhibit improved balances of stiffness, toughness, and dielectric properties compared to compositions with two or more separately capped and isolated poly(arylene ether) resins.Type: GrantFiled: July 1, 2003Date of Patent: June 26, 2007Assignee: General Electric CompanyInventors: Gary William Yeager, Hua Guo, Zhiqing Lin, Shahid Murtuza
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Patent number: 7186454Abstract: A material for dielectric films is a polymerizable composition containing an organic solvent, and an adamantanepolycarboxylic acid derivative represented by following Formula (1): wherein X is hydrogen atom, a hydrocarbon group or R4; R1, R2, R3 and R4 and are each independently a protected or unprotected carboxyl group, etc.; and Y1, Y2, Y3 and Y4 are each independently a single bond or a bivalent aromatic cyclic group; and an aromatic polyamine derivative represented by following Formula (2): wherein Ring Z is a monocyclic or polycyclic aromatic ring; and R5, R6, R7 and R8 are each a substituent bound to Ring Z and are each independently a protected or unprotected amino group, etc., dissolved in the organic solvent.Type: GrantFiled: March 24, 2004Date of Patent: March 6, 2007Assignee: Daicel Chemical Industries, Ltd.Inventors: Shinya Nagano, Jiichiro Hashimoto, Kiyoharu Tsutsumi, Yoshinori Funaki
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Patent number: 7169878Abstract: A diamine compound represented by the formula (1): wherein R1 is a trivalent organic group, each of X1 and X2 is a bivalent organic group, X3 is an alkyl or fluoroalkyl group having from 1 to 22 carbon atoms, or a cyclic substituent selected from aromatic rings, aliphatic rings, heterocyclic rings and their substituted groups, and n is an integer of from 2 to 5. And, a polyimide precursor and a polyimide synthesized by using the diamine compound; and a treating agent for liquid crystal alignment containing the polyimide precursor and/or the polyimide.Type: GrantFiled: December 26, 2001Date of Patent: January 30, 2007Assignee: Nissan Chemical Industries, Ltd.Inventors: Kazuyoshi Hosaka, Hideyuki Nawata
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Patent number: 7148314Abstract: A method for preparation of a sulfonic and or sulfonic acid salt containing polyimide resins comprising melt reaction of a polyimide resin with an organic compound, wherein the organic compound contains at least one aliphatic primary amine functionality and at least one other functionality selected from the group consisting of sulfonic acids, sulfonic acid salts or mixtures thereof.Type: GrantFiled: July 7, 2004Date of Patent: December 12, 2006Assignee: General Electric CompanyInventors: Robert R. Gallucci, Tara J. Smith
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Patent number: 7132496Abstract: The invention relates to the following: a method for step-by-step alkylation of primary polymeric amines by step-by-step deprotonation with a metallo-organic base and a subsequent reaction with an alkyl halide; a method for modifying tertiary polymeric amines with other functional groups; polymers with secondary/tertiary amino groups and with quaternary ammonium groups; polymers with secondary/tertiary amino groups and other functional groups, especially cation exchanger groupings; membranes consisting of the above polymers, either non-crosslinked or ionically or covalently cross-linked; acid-base-blends/membranes, and a method for producing same, consisting of basic polymers with polymers containing sulphonic acid, phosphonic acid or carboxyl groups; the use of ion exchanger polymers as membranes in membrane processes, e.g.Type: GrantFiled: October 30, 2001Date of Patent: November 7, 2006Inventors: Jochen Kerres, W. Zhang, C. Tang
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Patent number: 7129318Abstract: Polyimide resins that are suitable for processing by resin transfer molding (RTM) and resin infusion (RI) methods at reduced processing temperatures are provided. The inventive RTM and RI processable polyimide resins exhibit melting at temperatures of less than about 200° C. and melt viscosities at 200° C. of less than about 3000 centipoise. A process for synthesizing the inventive resins is also provided, as is a fiber-reinforced composite material. The fiber-reinforced composite material employs the inventive polyimide resin as its resin matrix and demonstrates good heat resistance and mechanical properties.Type: GrantFiled: August 30, 2004Date of Patent: October 31, 2006Assignee: I.S.T. (MA) CorporationInventors: Gary L. Deets, Jianming Xiong
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Patent number: 7115699Abstract: Provided are a sulfonated polymer capable of high hot water resistance even if it has an increased amount of the sulfonic groups introduced therein, and a solid polymer electrolyte containing the sulfonated polymer that has high proton conductivity and excellent generating performance. The sulfonated polymer has repeating units represented by the formula (1?): wherein B's are each independently an oxygen or a sulfur atom, R1 to R3 may be the same or different and are selected from a hydrogen atom, a fluorine atom, a nitrile group and an alkyl group, n is an integer of 2 or greater, and Q is a structure represented by the formula (q): wherein A is independently a divalent atom or organic group or a direct bond, and R4 to R11 may be the same or different and are selected from a hydrogen atom, a fluorine atom, an alkyl group and an aromatic group.Type: GrantFiled: October 6, 2004Date of Patent: October 3, 2006Assignee: JSR CorporationInventors: Yoshitaka Yamakawa, Makoto Higami, Toshiaki Kadota
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Patent number: 7090925Abstract: A material for dielectric films is a polymerizable composition containing an adamantanepolycarboxylic acid represented by following Formula (1): wherein X is a hydrogen atom, a carboxyl group or a hydrocarbon group; and Y1, Y2, Y3 and Y4 are the same as or different from one another and are each a single bond or a bivalent aromatic cyclic group; an aromatic polyamine represented by following Formula (2): wherein Ring Z is a monocyclic or polycyclic aromatic ring; and R1 and R2 are each a substituent bound to Ring Z, are the same as or different from each other and are each an amino group, a mono-substituted amino group, a hydroxyl group or a mercapto group; and a solvent other than ketones and aldehydes, in which the adamantanepolycarboxylic acid and aromatic polyamine are dissolved in the solventType: GrantFiled: March 24, 2004Date of Patent: August 15, 2006Assignee: Daicel Chemical Industries, Ltd.Inventors: Shinya Nagano, Jiichiro Hashimoto, Kiyoharu Tsutsumi, Yoshinori Funaki
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Patent number: 7078477Abstract: In the process of the present invention, a solvent-soluble polyimide is produced by polycondensing at least one tetracarboxylic acid component with at least one diamine component in a solvent in the presence of a tertiary amine. The tetracarboxylic acid component is selected from the group consisting of tetracarboxylic dianhydrides represented by the following formula 1: wherein R is as defined in the specification, and tetracarboxylic acids and their derivatives represented by the following formula 2: wherein R and Y1 to Y4 are as defined in the specification. Unlike the conventional techniques using an excessively large amount of a chemical imidation agent such as acetic anhydride and a chemical imidation catalyst such as triethylamine, in the process of the present invention, the solvent-soluble polyimide having a high polymerization degree is easily produced in a solvent with good productivity by using only a catalytic amount of the tertiary amine.Type: GrantFiled: June 25, 2004Date of Patent: July 18, 2006Assignee: Mitsubishi Gas Chemical Company, Inc.Inventors: Hiroki Oguro, Shuta Kihara, Tsuyoshi Bito
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Patent number: RE43880Abstract: This invention relates to the composition and a solvent-free process for preparing novel imide oligomers and polymers specifically formulated with effective amounts of a dianhydride such as 2,3,3?,4-biphenyltetra carboxylic dianydride (a-BPDA), at least one aromatic diamine and an endcapped of 4-phenylethynylphthalic anhydride (PEPA) or nadic anhydride to produce imide oligomers that possess a low-melt viscosity of 1-60 poise at 260-280° C. When the imide oligomer melt is cured at about 371° C. in a press or autoclave under 100-500 psi, the melt resulted in a thermoset polyimide having a glass transition temperature (Tg) equal to and above 310° C. A novel feature of this process is that the monomers; namely the dianhydrides, diamines and the endcaps, are melt processable to form imide oligomers at temperatures ranging between 232-280° C. (450-535° F.) without any solvent.Type: GrantFiled: May 8, 2006Date of Patent: December 25, 2012Assignee: The United States of America as Represented by the Administrator of National Aeronautics and Space AdministrationInventor: Chun-Hua Chuang