Phenolic Reactant Contains At Least Two Aryl Rings And Two Diverse Phenolic To Oxygen Bonds Patents (Class 528/185)
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Patent number: 5539080Abstract: A process is disclosed for making circuit elements by photolithography comprising depositing an antireflective polyimide or polyimide precursor layer on a substrate and heating the substrate at 200.degree. C. to 500.degree. to provide a functional integrated circuit element that includes an antireflective polyimide layer. The antireflective polyimide layer contains a sufficient concentration of at least one chromophore to give rise to an absorbance sufficient to attenuate actinic radiation at 405 or 436 nm. Preferred chromophores include those arising from perylenes, naphthalenes and anthraquinones. The chromophore may reside in a dye which is a component of the polyimide coating mixture or it may reside in a residue which is incorporated into the polyimide itself.Type: GrantFiled: April 19, 1995Date of Patent: July 23, 1996Assignee: International Business Machines CorporationInventors: Dennis P. Hogan, Harold G. Linde, Ronald A. Warren
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Patent number: 5534614Abstract: A polyamide precursor of a polybenzazole polymer is prepared by reacting an aromatic bis(alkenyl)ester with a ring forming, aromatic diamine. The precursor can be prepared in an organic solvent for the monomers to form a soluble polyamide precursor which can be subsequently cyclocondensed to form a PBX polymer. A polybenzoxazole precursor is prepared by the reaction of a bis(alkenyl)ester and a bis(ortho-hydroxyamine). A polybenzazole polymer is easily prepared by heating the polyamide, PBX precursor.Type: GrantFiled: March 28, 1994Date of Patent: July 9, 1996Assignee: The Dow Chemical CompanyInventors: James J. O'Briem, Edmund P. Woo
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Patent number: 5516875Abstract: This invention concerns positive-working photodefinable polyimide precursors which make use of chemical amplification based on photoacid catalyzed cleavage of acid labile-poly(amic acetal esters).Type: GrantFiled: December 15, 1994Date of Patent: May 14, 1996Assignee: E. I. Du Pont de Nemours and CompanyInventor: Howard E. Simmons, III
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Patent number: 5516876Abstract: Polyimide oligomers include (1) linear, monofunctional crosslinking oligomers prepared by condensing a monoanhydride end cap with a diamine that includes alternating ether and "sulfone" (--SO.sub.2 --, --S--, --CO--, --(CF.sub.3).sub.2 C--, or --(CH.sub.3).sub.2 C--) linkages connecting alternating aromatic radicals and with a dianhydride (or dianhydride mixture), particularly the unsaturated, aliphatic dianhydride commonly known as MCTC; (2) linear, mono- or difunctional crosslinking oligomers prepared by condensing an amine end cap with a diamine and a dianhydride; and (3) multidimensional, crosslinking oligomers having an aromatic hub and at least three radiating arms connected to the hub, each arm including a crosslinking end cap at its distal end and at least one imide linkage. Blends, prepregs, and composites can be prepared from the oligomers.Type: GrantFiled: April 25, 1994Date of Patent: May 14, 1996Assignee: The Boeing CompanyInventors: Hyman R. Lubowitz, Clyde H. Sheppard
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Patent number: 5510448Abstract: A composition comprising a copolyestercarbonate derived from a dihydric phenol, a carbonate precursor, and an aliphatic alpha omega dicarboxylic acid or ester precursor wherein the dicarboxylic acid or ester precursor has from 10 to about 20 carbon atoms, inclusive, and is present in the copolyestercarbonate in quantities of from about 2 to 30 mole percent of the dihydric phenol.Type: GrantFiled: January 17, 1995Date of Patent: April 23, 1996Assignee: General Electric CompanyInventors: Luca P. Fontane, Kenneth F. Miller, Christianus A. A. Claesen, Peter W. van Es, Theodorus O. N. de Vroomen, Clayton V. Quinn, Richard W. Campbell
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Patent number: 5510182Abstract: A composition comprising a copolyestercarbonate derived from a dihydric phenol, a carbonate precursor, and an aliphatic alpha omega dicarboxylic acid or ester precursor wherein the dicarboxylic acid or ester precursor has from 10 to about 20 carbon atoms, inclusive, and is present in the copolyestercarbonate in quantities of from about 2 to 30 mole percent of the dihydric phenol.Type: GrantFiled: March 29, 1994Date of Patent: April 23, 1996Assignee: General Electric CompanyInventors: Luca P. Fontana, Kenneth F. Miller, Adrianus A. Claesen, Peter W. van Es, Theodorus O. N. de Vroomen, Clayton B. Quinn, Richard W. Campbell
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Patent number: 5508357Abstract: A polyimide comprises structural units represented by the following formula: ##STR1## wherein Ar is a group consisting of 10-90 mole % of a first specific structural sub-unit and 90-10 mole % of a second particular structural sub-unit. A process for the production of the polyimide and a thermosetting resin composition comprising the polyimide and a particular polymaleimide are also disclosed.Type: GrantFiled: September 16, 1994Date of Patent: April 16, 1996Assignee: Hitachi Chemical Company, Ltd.Inventors: Hidekazu Matsuura, Yoshihide Iwasaki, Kaori Ikeda, Takayuki Suzuki, Masashi Tanaka, Yasuo Miyadera
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Patent number: 5508377Abstract: This invention relates to a novel polyimide or polyimide copolymer having excellent heat resistance and greatly improved processability, and has a novel aromatic diamino compound used for the polyimide, a preparation process thereof, a polyimide-based resin composition comprising the polyimide or polyimide copolymer and a fibrous reinforcement, a process for preparing the resin composition, an injection molded article of the resin composition.The polyimide comprise a requisite structural unit having one or more recurring structural units of the formula: ##STR1## wherein L is an oxygen atom, carbonyl, isopropylidene or hexafluoroisopropylidene, and X is ##STR2## and Ar is a tetravalent radical having 6 to 27 carbon atoms and being selected from the group consisting of a monoaromatic radical, condensed polyaromatic radical and noncondensed polyaromatic radical having aromatic radicals connected to each other with a direct bond or a bridge member.Type: GrantFiled: December 13, 1994Date of Patent: April 16, 1996Assignee: Mitsui Toatsu Chemicals, Inc.Inventors: Wataru Yamashita, Yuichi Okawa, Shoji Tamai, Akihiro Yamaguchi
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Patent number: 5508374Abstract: A melt processable poly(ester-amide) which is capable of forming an anisotropic melt phase is provided. A poly(ester-amide) of the present invention may have recurring units of: (a) 4-hydroxybenzoyl moiety, (b) 6-oxy-2-naphthoyl moiety, (c) 4,4'-biphenol moiety, (d) terephthaloyl moiety, and (e) an aromatic moiety capable of forming an amide linkage in the proportions indicated. Preferably, the moiety capable of forming an amide linkage is derived from p-aminophenol, p-phenylenediamine, N-acetyl-p-aminophenol, etc. The resulting poly(ester-amide) is capable of undergoing melt-processing in the temperature range of from about 300.degree. to about 400.degree. C.Type: GrantFiled: July 7, 1995Date of Patent: April 16, 1996Assignee: Hoechst Celanese Corp.Inventors: Cherylyn Lee, Larry F. Charbonneau
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Patent number: 5504182Abstract: Thermoplastically processable aromatic polyether amideThermoplastically processable aromatic polyether amide of the formula (I) ##STR1## in which the symbols Ar, Ar', Ar.sub.1, Ar.sub.2, R, R', Y, x, y and z have the following meanings:Ar is a divalent, substituted or unsubstituted, aromatic or heteroaromatic radical or a group--Ar*--Q--Ar*--in whichQ is a bond or an --O--, --C(CH.sub.3).sub.2, --CO--, --S--, --SO-- or --SO.sub.2 -- bridge and Ar* is an aromatic radical. The carbonyl groups of the Ar radical are on non-adjacent ring carbon atoms.A is up to three different radicals.Ar' has the meaning given for Ar or is an Ar--Z--Ar group.In this case, Z is a --C(CH.sub.3).sub.2 -- or --O--Ar*--O--bridge.Y is a --C(CH.sub.3).sub.2 --, --SO.sub.2 --, --S-- or a --C(CF.sub.3).sub.2 --bridge and has up to two different meanings in the same polymer.Ar.sub.1 and Ar.sub.2 are identical or different from one another and are each a substituted or unsubstituted para- or meta-arylene radical.Type: GrantFiled: April 30, 1993Date of Patent: April 2, 1996Assignee: Hoechst AktiengesellschaftInventors: Harald Cherdron, Willi Kreuder, Arnold Schneller, Otto Herrmann-Schonherr
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Patent number: 5502157Abstract: A copolyimide was prepared by reacting 3,4'-oxydianiline (3,4'-ODA) with a dianhydride blend comprising, based on the total amount of the dianhydride blend, about 67 to 80 mole percent of 4,4'-oxydiphthalic anhydride (ODPA) and about 20 to 33 mole percent of 3,3',4,4'-benzophenonetetracarboxylic dianhydride (BTDA). The copolyimide may be endcapped with up to about 10 mole percent of a monofunctional aromatic anhydride and has unbalanced stoichiometry such that a molar deficit in the dianhydride blend is compensated with twice the molar amount of the monofunctional aromatic anhydride. The copolyimide was used to prepare composites, films and adhesives. The film and adhesive properties were significantly better than those of LaRC.TM.-IA.Type: GrantFiled: August 31, 1994Date of Patent: March 26, 1996Assignee: The United States of America as represented by the Administrator of the National Aeronautics and Space AdministrationInventors: Alice C. Chang, Terry L. St. Clair
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Patent number: 5502156Abstract: Disclosed is a thermally-stable SnO.sub.2 -surfaced polyimide film wherein the electrical conductivity of the SnO.sub.2 surface is within the range of about 3.0.times.10.sup.-3 to about 1.times.10.sup.-2 ohms.sup.-1,. Also disclosed is a method of preparing this film from a solution containing a polyamic acid and SnCl.sub.4 (DMSO).sub.2.Type: GrantFiled: July 28, 1994Date of Patent: March 26, 1996Assignee: The United States of America as represented by the Administrator of the National Aeronautics and Space AdministrationInventors: Anne K. St. Clair, Stephen A. Ezzell, Larry T. Taylor, Harold G. Boston
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Patent number: 5498691Abstract: Disclosed are bis-meta-benzotrifluoride compounds having the general formula ##STR1## where each A is independently selected from the group consisting of NO.sub.2, NH.sub.2, and NH.sub.3.sup.+ Z.sup.-, Z.sup.- is an anion and B is selected from the group consisting of O, CO, S, SO, and SO.sub.2. The diamine compounds are useful as monomers in making polyimides, polyamide-imides, and polyamides.Type: GrantFiled: October 9, 1990Date of Patent: March 12, 1996Assignee: Occidental Chemical CorporationInventors: Jeffrey S. Stults, Henry C. Lin, Robert A. Buchanan, Robert L. Ostrozynski
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Patent number: 5496915Abstract: Polyimides are obtainable by reacting a dianhydride component with a diamine component, at least one diamine containing cycloaliphatic units, with the proviso that the dianhydride component is a mixture of different dianhydrides if the diamine component consists only of one diamine containing cycloaliphatic units and the diamine component is a mixture of different diamines if the dianhydride component consists of only one dianhydride.Type: GrantFiled: February 13, 1995Date of Patent: March 5, 1996Assignee: BASF AktiengesellschaftInventors: Christian Fischer, Karin Elbl-Weiser, Ju/ rgen Koch
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Patent number: 5496670Abstract: A macroscopically isotropic side chain liquid crystal polymer is described containing photochromic mesogenic groups and which through irradiation with light is capable of being permanently or substantially permanently converted into an optically anisotropic phase without having been pre-oriented. The polymer is preferably a polyester between on the one hand either an aliphatic, optionally substituted, .alpha.,.omega.-dicarboxylic acid having a total chain length of up to 24 carbon atoms, or an aryl-, in particular phenyl-, carboxylic acid, and on the other hand an optionally substituted 1,3-propanediol containing the mesogenic group, or a group containing the mesogenic group, attached to the carbon in the 2-position. Furthermore, an optical storage device comprising a film of the polymer.Type: GrantFiled: August 30, 1993Date of Patent: March 5, 1996Assignees: Riso National Laboratory, Consiglio Nazionale della RichercheInventors: Soren Hvilsted, P. S. Ramanujam, Fulvio Andruzzi
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Patent number: 5489669Abstract: A polyimide represented by the general formula (1): ##STR1## wherein Y represents a hydrocarbon group having 4 to 20 carbon atoms or a sulfur atom; each of R.sub.1 to R.sub.4, R.sub.i and R.sub.j represents a halogen atom, a hydrocarbon group having 1 to 6 carbon atoms or a halogen-containing hydrocarbon group having 1 to 6 carbon atoms; each of a, b, c, d, e and f represents an integer of 0 to 4 satisfying a+b.ltoreq.4, c+d.ltoreq.4 and e+f.ltoreq.4; and X represents a tetravalent organic group having 2 or more carbon atoms.Type: GrantFiled: June 30, 1994Date of Patent: February 6, 1996Assignee: Sumitomo Chemical Company, LimitedInventors: Mika Shirasaki, Mitsuhiro Shibata, Shuichi Kanagawa
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Patent number: 5489644Abstract: Solutions of polyimide-forming substances containA) aromatic or partly aromatic diamines andB) tetraesters of imide-forming aromatic or partly aromatic tetracarboxylic acids or mixtures of these tetraesters with the corresponding tri-, di- and/or monoesters.These solutions are suitable for the production of coatings.Type: GrantFiled: March 31, 1994Date of Patent: February 6, 1996Assignee: BASF Lacke + FarbenInventors: Rainer Blum, Gerhard Hoffmann
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Patent number: 5484879Abstract: Polyimide polymers of the following recurring structure and the corresponding polyamic acids are disclosed: ##STR1## wherein AR.sub.1 is ##STR2## where X is O, S, SO, SO.sub.2, CO, C(CF.sub.3).sub.2, C(CH.sub.3).sub.2, Si(CH.sub.3).sub.2, or a single bond, wherein AR.sub.2 may be pyromellitic dianhydride, a substituted pyromellitic dianhydride, naphthanoic dianhydride, or ##STR3## where Y is O, S, SO, SO.sub.2, CO, C(CF.sub.3).sub.2, C(CH.sub.3).sub.2, Si(CH.sub.3).sub.2 --O--AR--O--, or a single bond, where AR is an aromatic nucleus.Type: GrantFiled: December 17, 1990Date of Patent: January 16, 1996Assignee: Occidental Chemical CorporationInventors: Robert A. Buchanan, Jeffrey S. Stults, Ronald F. Spohn
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Patent number: 5480965Abstract: This invention relates to a novel thermoplastic and amorphous polyimide which is readily soluble in organic solvent, a novel aromatic diamino compound used for the polyimide, a preparation process thereof, a polyimide-based resin composition comprising the thermoplastic polyimide and a fibrous reinforcement, a process for preparing the resin composition, an injection molded article of the resin composition, a polyimide-based composite obtained by molding the above soluble and thermoplastic polyimide in combination with a fibrous reinforcement, and a fibrous reinforcement having a surface modified with the above polyimide.Type: GrantFiled: July 26, 1994Date of Patent: January 2, 1996Assignee: Mitsui Toatsu Chemicals, Inc.Inventors: Wataru Yamashita, Yuichi Okawa, Hideaki Oikawa, Tadashi Asanuma, Yuko Ishihara, Mitsunori Matsuo, Keizaburo Yamaguchi, Akihiro Yamaguchi, Shoji Tamai
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Patent number: 5478916Abstract: A solvent resistant copolyimide was prepared by reacting 4,4'-oxydiphthalic anhydride with a diaimine blend comprising, based on the total amount of the diamine blend, about 75 to 90 mole percent of 3,4'-oxydianiline and about 10 to 25 mole percent p-phenylene diamine. The solvent resistant copolyimide had a higher glass transition temperature when cured at 350.degree. , 371.degree. and 400.degree. C. than LaRC.TM.-IA. The composite prepared from the copolyimide had similar mechanical properties to LaRC.TM.-IA. Films prepared from the copolyimide were resistant to immediate breakage when exposed to solvents such as dimethylacetamide and chloroform. The adhesive properties of the copolyimide were maintained even after testing at 23.degree., 150.degree., 177.degree. and 204.degree. C.Type: GrantFiled: September 1, 1994Date of Patent: December 26, 1995Assignee: The United States of America as represented by the Administrator of the National Aeronautics and Space AdministrationInventors: Alice C. Chang, Terry L. St. Clair
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Patent number: 5478914Abstract: Polyimides comprising recurring units of the following general formula (1) ##STR1## wherein R.sub.1 represents a tetravalent aromatic group. Polyimide copolymers and preparations of the polyimides and the polyimide copolymers are also described.Type: GrantFiled: July 1, 1994Date of Patent: December 26, 1995Assignee: Shin-Etsu Chemical Co., Ltd.Inventors: Ichiro Kaneko, Atushi Sugitani, Masahiro Yuyama, Kiyoshi Motomi
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Patent number: 5478915Abstract: Polyimide oligomers are described which comprise the condensation product of: at least one phenylindane diamine and at least one aromatic bis(ether anhydride). The polyimide oligomers of the invention are readily processed to form solution prepregable polyimide composites having high glass transition temperatures and high temperature and oxidative stability. More particularly, the present invention provides for crosslinkable polyimide oligomers prepared by reacting, in a suitable solvent under an inert atmosphere, a mixture of monomers comprising: (A) an aromatic diamine component comprising from about 25 to 100 mole % of at least one phenylindane diamine; (B) a dianhydride component comprising from about 25 to 100 mole % of at least one aromatic his(ether anhydride); and (C) at least one end-cap monomer selected from the group consisting of monoanhydrides, acyl halides and aromatic amines, wherein each end-cap monomer contains at least one crosslinkable functional group in the molecule.Type: GrantFiled: December 30, 1993Date of Patent: December 26, 1995Assignee: Ciba-Geigy CorporationInventors: Michael Amone, Mark R. Southcott
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Patent number: 5478917Abstract: Solutions of polyimide-forming substances containA) aromatic or partly aromatic polyamines andB) amides or a mixture of esters and amides of tetracarboxylic acids.Solutions are useful as coating compositions.Type: GrantFiled: October 11, 1994Date of Patent: December 26, 1995Assignee: BASF Lacke + Farben AktiengesellschaftInventors: Rainer Blum, Gerhard Hoffmann
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Patent number: 5478913Abstract: Copolyimides from 1,4-bis(4-aminophenoxy)-2-phenylbenzene and m- or p-phenylene diamine with biphenyl dianhydride exhibit a high Tg and reduced melt viscosity.Type: GrantFiled: August 31, 1994Date of Patent: December 26, 1995Assignee: E. I. Du Pont de Nemours and CompanyInventors: Richard J. Boyce, Thomas P. Gannett, James M. Sonnett, Murty S. Tanikella, Brian C. Auman
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Patent number: 5472823Abstract: A photosensitive resin composition comprising, as its main ingredient, a poly(amic acid) resin constituted of a diamino compound represented by formula: ##STR1## and optionally used other diamino compound and a tetracarboxylic acid dianhydride as its constituent monomers and/or a poly(amic acid) ester resin obtained by esterifying said poly(amic acid) resin and/or a polyimide resin obtained by a dehydrating or alcohol-eliminating ring-closure reaction of said poly(amic acid) resin or poly(amic acid) ester resin has an excellent developability and a high film strength and can form a relief patter of low thermal expansion.Type: GrantFiled: January 15, 1993Date of Patent: December 5, 1995Assignee: Hitachi Chemical Co., Ltd.Inventors: Hideo Hagiwara, Makoto Kaji, Hiroshi Nishizawa, Kenji Suzuki, Yasunori Kojima
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Patent number: 5473010Abstract: The present invention relates to a polyimide based resin composition comprises 1 to 50 parts by weight of polyetherimide for 100 parts by weight a resin composition comprising 50 to 99 parts by weight of polyarylether ketone and 50 to 1 parts by weight of polyimide having specific structural units.The polyimide based resin compositions have excellent fatigue characteristics and creep resistance and are expected widely to apply in field of machine and automobile parts which is required permanence for mechanical strength.Type: GrantFiled: August 30, 1994Date of Patent: December 5, 1995Assignee: Mitsui Toatsu Chemicals, Inc.Inventors: Atsushi Morita, Tomohito Koba, Toshiaki Takahashi, Katsunori Shimamura, Toshiyuki Kataoka, Hiroyuki Furukawa, Hiroaki Tomimoto
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Patent number: 5464927Abstract: Copolyamic acid is obtained from tetracarboxylic acid dianhydride, diamine and a fluorinated diamine and/or fluorinated tetracarboxylic acid dianhydride; and optionally ester or amine salt derivative thereof to obtain radiation sensitive polymer; and low optical high thermally stable polyimide from curing the above polyamic acid and/or derivative thereof.Type: GrantFiled: May 10, 1993Date of Patent: November 7, 1995Assignee: International Business Machines CorporationInventors: Marie Angelopoulos, Jeffrey D. Gelorme, Jeffrey W. Labadie, David A. Lewis, Sally A. Swanson, Nancy C. Labianca
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Patent number: 5464925Abstract: The present invention is an oligomer represented by the formula: ##STR1## wherein X is a moiety selected from the group consisting of: ##STR2## where each Y is independently S, O, CH.sub.2, C.dbd.O, CH.sub.3 --C--CH.sub.3, O.dbd.S.dbd.O, or CF.sub.3 --C--CF.sub.3.In another aspect, the present invention is a polymer of the above-described oligomer.Type: GrantFiled: May 25, 1994Date of Patent: November 7, 1995Assignee: The Dow Chemical CompanyInventors: Eric S. Moyer, Denise J. D. Moyer
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Patent number: 5464928Abstract: The invention is a direct process for preparing semi-crystalline polyimides. This process comprises the steps of: providing a polar aprotic solvent, adding a dianhydride and a diamine to the solvent to form a mixture, stirring the mixture at ambient temperature, and adding glacial acetic acid to the mixture to provide a ratio of polar aprotic solvent to glacial acetic acid which ranges from about 90 to 10 to about 75 to 25 by volume to form a solution. The solution was heated to a range from about 110.degree. C. to about 140.degree. C. to form a polyimide precipitate. The polyimide precipitate was recovered as a semi-crystalline polyimide powder.Type: GrantFiled: September 1, 1994Date of Patent: November 7, 1995Assignee: The United States of America as represented by the United States National Aeronautics and Space AdministrationInventors: Alice C. Chang, Terry L. St. Clair
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Patent number: 5464923Abstract: The present invention provides novel substituted biphenyl pyrazines or pyrazine derivatives ("BPD") which are functional and have useful application as a monomer for a variety of high performance polymers such as polyester, polyarylate, polycarbonate, polyetherketones, epoxides, polyimides, polyamides, and polyamides-imides; and as pigments for coating compositions such as paints. These BPD have the general formula: ##STR1## wherein R.sub.1 -R.sub.8 and n are defined herein.Type: GrantFiled: October 19, 1994Date of Patent: November 7, 1995Assignee: Hoechst Celanese CorporationInventors: Richard Vicari, George Kvakovszky, Olan S. Fruchey
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Patent number: 5463016Abstract: This invention provides (1) a granular material of a polyimide precursor, which has excellent solubility in solvents and excellent moldability and from which a polyimide molding having excellent mechanical properties can be produced, (2) a mixture of a granular material of a polyimide precursor with a solvent, in which the polyimide precursor shows excellent storage stability and (3) a process for the production of a granular material of a polyimide precursor, in which a solvent can be easily removed. Particularly provided are a polyimide precursor granular material having an intrinsic viscosity of 0.7 or higher and a polyimide precursor mixture which consists of a polyimide precursor granular polyimide having an intrinsic viscosity of 0.7 or higher and a solvent that does not exhibit a strong-mutual interaction with the polyimide precursor, as well as a process for the production of the polyimide precursor granular material.Type: GrantFiled: February 9, 1994Date of Patent: October 31, 1995Assignee: Unitika Ltd.Inventors: Isao Tomioka, Takeshi Nakano, Mikio Furukawa, Yoshiaki Echigo
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Patent number: 5459233Abstract: In one aspect, the present invention relates to polyimides having excellent thermal resistance and process for preparing the same comprising carrying out condensation of 4,4'-bis(3-aminophenoxy)biphenyl with pyromellitic dianhydride in the presence of a different diamine compound and optionally with a different tetracarboxylic acid dianhydride.In a second aspect, the present invention relates to a heat resistant resin composition consisting essentially of an aromatic polyetherimide and a defined polyimide.In a third aspect, the present invention relates to a polyimide resin composition comprised on a defined polyimide and a separate high-temperature engineering polymer.In a fourth aspect, the present invention relates to a resin composition comprised of a defined polyimide and an aromatic polyamideimide.Type: GrantFiled: December 7, 1993Date of Patent: October 17, 1995Assignee: Mitsui Toatsu Chemicals, IncorporatedInventors: Shoji Tamai, Masahiro Ohta, Saburo Kawashima, Katsuaki Iiyama, Hideaki Oikawa, Akihiro Yamaguchi
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Patent number: 5457154Abstract: A moldable polyimide resin composition which has melt-flowability and excellent processability in addition to essential heat-resistant of polyimide and comprises an aromatic bisimide compound and polyimide resin. A further aspect relates to a carbon fiber reinforced polyimide resin composition which has excellent mechanical strengths and comprises a carbon fiber coated with aromatic bisimide compound on the surface and the polyimide resin. A still further aspect relates to a novel bisimide compound which is very useful as the aromatic bisimide compound in the composition.Type: GrantFiled: November 9, 1992Date of Patent: October 10, 1995Assignee: Mitsui Toatsu Chemicals, Inc.Inventors: Masahiro Ohta, Akio Matsuyama, Eiji Senoue, Fumiaki Kuwano, Osamu Yasui, Yasunori Yoshida, Akinori Ryu, Tadashi Kobayashi
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Patent number: 5455327Abstract: Two monomers containing meta-biphenylenedioxy moieties were prepared. One monomer, a diamine, is used to prepare polyimide, polyamide, and epoxy polymers. The other monomer, a dianhydride, was used to prepare polyimide polymers. These polymers are used to make films, coatings, and selective membranes.Type: GrantFiled: December 16, 1993Date of Patent: October 3, 1995Assignee: The United States of America as represented by the Administrator of the National Aeronautics and Space AdministrationInventors: Terry L. St. Clair, J. Richard Pratt
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Patent number: 5453515Abstract: Benzophenone iminodiimides of the formula I ##STR1## which Y denotes hydroxyl or carboxyl, R.sub.1 denotes the optionally substituted radicals alkylene, phenylene or benzylidene, R.sub.2 denotes the radicals OH, substituted or unsubstituted alkyl or NH--CO--NHR.sub.3 and R.sub.3 denotes the radicals H, alkyl, phenyl or benzyl, processes for their preparation and polymers prepared therefrom.Type: GrantFiled: December 27, 1993Date of Patent: September 26, 1995Assignee: Chemie Linz Gesellschaft m.b.H.Inventors: Gerd Greber, deceased, Heinrich Gruber, Afschin Hassanein
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Patent number: 5449742Abstract: Polyimide optical waveguide structures comprising a core within a cladding wherein at least one of the core and the cladding is a polyimide containing 6FDA, BTDA, an aromatic diamine having bulky methyl groups ortho to the amine, and a co-diamine wherein the polyimides have the properties of low optical loss, low optical absorbance, controllable refractive index, and high thermal stability, and wherein the polyimides are photosensitive and solvent resistant.Type: GrantFiled: February 15, 1994Date of Patent: September 12, 1995Assignee: Amoco CorporationInventors: Allyson J. Beuhler, David A. Wargowski
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Patent number: 5436103Abstract: Modified unsaturated linear polymers have at least a first residue, a second residue and an acid residue. The first, second and acid residues correspond to a first, second and acid monomers used to prepare the polymers. The first monomer may be a diacid, anhydride, diacid ester or mixture thereof. The second monomer may be a diol or glycol. The acid monomer may be an aromatic dicarboxylic acid, different than the first monomer. The first residue is present in a concentration not less than about 7.5 mole % and the acid residue is present in a concentration ranging between 2.5 mole % and 12.5 mole %, based on the total mole monomer ratio of the polymer. The polymers have a glass transition temperature ranging from about 54.degree. C. to about 64.degree. C.Type: GrantFiled: August 27, 1993Date of Patent: July 25, 1995Assignee: Xerox CorporationInventors: Robert D. Bayley, Carol A. Fox, Thomas R. Hoffend, James R. Paxson
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Patent number: 5436310Abstract: Novel aromatic poly(ether ketones) having imide, amide, ester, azo, quinoxaline, benzimidazole, benzoxazole, or benzothiazole groups, comprising, for example, a repeat unit ##STR1## are prepared by Friedel Crafts polymerization.Type: GrantFiled: June 29, 1989Date of Patent: July 25, 1995Assignee: Raychem CorporationInventors: Klaus J. Dahl, Patrick J. Horner, Heinrich C. Gors, Viktors Jansons, Richard H. Whiteley
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Patent number: 5434240Abstract: Disclosed herein are novel poly(imide-ethers) containing ortho substitution in the main chain of the polymer. These polymers are made from novel aromatic bis-carboxylic anhydrides which contain two ether groups attached to an aromatic ring in ortho positions to each other. The polymers are particularly useful for films, fibers and encapsulation, as well as thermoplastics.Type: GrantFiled: April 29, 1994Date of Patent: July 18, 1995Assignee: The University of LiverpoolInventors: Geoffrey C. Eastmond, Jerzy Paprotny
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Patent number: 5432256Abstract: The present invention provides a liquid crystal aligning film having a reduced after image and a good liquid crystal aligning property caused by a rubbing treatment of a thin film consisting of organics, and its liquid crystal display device.Type: GrantFiled: June 7, 1993Date of Patent: July 11, 1995Assignee: Chisso CorporationInventors: Yukino Abe, Minoru Nakayama, Shizuo Murata
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Patent number: 5428102Abstract: A series of polyimides based on the dianhydride of 1,4-bis(3,4-dicarboxyphenoxy)benzene (HQDEA) or on 2,2-bis[4(3-aminophenoxy)phenyl]hexafluoropropane (3-BDAF) are evolved from high molecular weight polyamic acid solutions yielding flexible free-standing films and coatings in the fully imidized form which have a dielectric constant in the range of 2.5 to 3.1 at 10 GHz.Type: GrantFiled: May 2, 1994Date of Patent: June 27, 1995Assignee: The United States of America as represented by the United States National Aeronautics and Space AdministrationInventors: Anne K. St. Clair, Terry L. St. Clair, William P. Winfree
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Patent number: 5420233Abstract: An agent for vertical orientation treatment consisting essentially of a polyimide which contains a linear alkyl group having at least 12 carbon atoms in an amount of at least 5% by weight of the alkyl group to the total weight of the polyimide, and which, when a coating film of the polyimide is formed on a substrate, has a surface energy of not more than 38 dyn/cm.Type: GrantFiled: June 15, 1993Date of Patent: May 30, 1995Assignee: Nissan Chemical Industries Ltd.Inventors: Hideyuki Isogai, Toyohiko Abe
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Patent number: 5412065Abstract: Polyimide oligomers are described which comprise the intercondensation product of a monomer mixture comprising (A) at least one aromatic bis(ether anhydride), (B) at least one phenylindane diamine, and (C) at least one end-cap monomer selected from the group consisting of monoanhydrides, acyl halides and amines, wherein each end-cap monomer (C) contains at least one crosslinkable group in the molecule and wherein the phenylindane diamine component (B) is present in the mixture in a stoichiometric excess. The monomers react in a suitable solvent under an inert atmosphere to form polyimide oligomers having a number average molecular weight of from about 1,000 to about 15,000. The polyimide oligomers of the present invention are readily processed to form polyimide matrix resins with high temperature and oxidative stability.Type: GrantFiled: April 9, 1993Date of Patent: May 2, 1995Assignee: Ciba-Geigy CorporationInventors: Michael Amone, Mark Southcott
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Patent number: 5410012Abstract: Novel poly(N-arylenebenzimidazole)s (PNABIs) are prepared by the aromatic nucleophilic displacement reaction of novel di(hydroxyphenyl-N-arylene benzimidazole) monomers with activated aromatic dihalides or activated aromatic dinitro compounds. The polymerizations are carried out in polar aprotic solvents such as N-methyl-2-pyrrolidinone or N,N-dimethylacetamide using alkali metal bases such as potassium carbonate at elevated temperatures under nitrogen. The di(hydroxyphenyl-N-arylenebenzimidazole) monomers are synthesized by reacting phenyl-4-hydroxybenzoate with bis(2-aminoanilino)arylenes in diphenylsulfone. Moderate molecular weight PNABIs of new chemical structures were prepared that exhibit a favorable combination of physical and mechanical properties. The use of the novel di(hydroxyphenyl-N-arylenebenzimidazole)s permits a more economical and easier way to prepare PNABIs than previous routes.Type: GrantFiled: March 5, 1993Date of Patent: April 25, 1995Assignee: The United States of America as represented by the Administrator of the National Aeronautics and Space AdministrationInventors: John W. Connell, Paul M. Hergenrother, Joseph G. Smith, Jr.
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Patent number: 5405936Abstract: Liquid-melt aliphatic dicarboxylic acids tend to undergo undesirable discoloration during prolonged storage. The discoloration can be avoided by an addition of 0.1 to 3.0% by weight of a primary amine.Type: GrantFiled: March 4, 1994Date of Patent: April 11, 1995Assignee: Huels AktiengesellschaftInventors: Salih Mumcu, Franz-Erich Baumann
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Patent number: 5399655Abstract: This invention concerns positive-working photodefinable polyimide precursors which make use of chemical amplification based on photoacid catalyzed cleavage of acid labile-poly(amic acetal esters).Type: GrantFiled: October 29, 1993Date of Patent: March 21, 1995Assignee: E. I. du Pont de Nemours and CompanyInventor: Howard E. Simmons, III
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Patent number: 5393864Abstract: A random polyimide copolymer, based on a rigid dianhydride, a rigid diamine and an additional diamine and/or dianhydride containing one or more flexibilizing linkages. Soft-baked coatings of the poly(amic acid) precursor are readily processed using conventional aqueous base developers, such as tetramethylammonium hydroxide. The polyimide and soft-baked coatings are useful as a dielectric layer In multichip module applications or as a stress buffer coating.Type: GrantFiled: April 26, 1993Date of Patent: February 28, 1995Assignee: E. I. Du Pont de Nemours and CompanyInventor: John D. Summers
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Patent number: 5386002Abstract: Polyetherimides, polyesterimides, poly(ester etherimides) and poly(carbonate imides) which are thermoplastic, polymeric materials contain divalent bisimides of formula ##STR1## wherein R is independently in each occurrence hydrogen, alkyl of from 1 to 20 carbons, aryl or aralkyl of from 1 to 20 carbons, halogen or NO.sub.2. Novel monomeric bisimides corresponding to the above formula are also disclosed.Type: GrantFiled: December 3, 1993Date of Patent: January 31, 1995Assignee: The Dow Chemical CompanyInventors: Muthiah N. Inbasekaran, Daniel J. Murray, Michael N. Mang, James L. Brewbaker
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Patent number: 5384337Abstract: A poromeric material for maintaining an electrostatic charge is provided, the material including a matrix of fibers, a polymeric binder for binding the matrix, and electrets present substantially uniformly throughout the poromeric material. Also provided are methods for making the poromeric material. In one embodiment, a polymeric binder mixture having electrets substantially uniformly contained therein is formed. The matrix of fibers is impregnated with the mixture and cured, whereby the electrets are substantially uniformly distributed throughout the matrix to produce the electrostatic poromeric material. In an alternative embodiment, the electrets are contained in the fibers of the matrix. The poromeric material may be used to encase a core to form a roller, for example, a hickey-removing roller.Type: GrantFiled: February 5, 1993Date of Patent: January 24, 1995Inventor: William D. Budinger
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Patent number: 5382649Abstract: Thermoplastic polyester-imides having improved mechanical properties, characterized in that they consist of recurring units of the formula I ##STR1## in which R denotes an 2,4-tolylene, 2,6-tolylene, 2,5-bis(4-phenylenethio) thiadiazole,or a 1,4-bis(phenylenethio)diphenyl sulfone radical, a process for their preparation and their use for the production of industrial components of plastic.Type: GrantFiled: November 10, 1993Date of Patent: January 17, 1995Assignee: Chemie Linz GmbHInventor: Heinrich Horacek