Nitrogen Is Ring Member Patents (Class 556/407)
  • Patent number: 9879159
    Abstract: Materials containing the reaction products of a cyclic azasilane with water and a compound or polymer containing an isocyanate or epoxy functional group and methods for their synthesis are provided. Stable mixtures containing a cyclic azasilane and a compound or polymer containing an isocyanate or epoxy functional group according to invention are stored under anhydrous conditions. The invention also provides a novel class of materials, mono and bis(cycloaza)disiloxanes comprising one or two cyclic structures bridged by an Si—O—Si bond.
    Type: Grant
    Filed: December 3, 2015
    Date of Patent: January 30, 2018
    Assignee: Gelest Technologies, Inc.
    Inventors: Barry C. Arkles, Youlin Pan
  • Patent number: 9815858
    Abstract: Hydridosilapyrroles and hydridosilaazapyrrole are a new class of heterocyclic compounds having a silicon bound to carbon and nitrogen atoms within the ring system and one or two hydrogen atoms on the silicon atom. The compounds have formula (I): in which R is a substituted or unsubstituted organic group and R? is an alkyl group. These compounds react with a variety of organic and inorganic hydroxyl groups by a ring-opening reaction and may be used to produce silicon nitride or silicon carbonitride films.
    Type: Grant
    Filed: June 8, 2016
    Date of Patent: November 14, 2017
    Assignee: Gelest Technologies, Inc.
    Inventors: Barry C. Arkles, Youlin Pan, Fernando Jove
  • Patent number: 9685352
    Abstract: An electronic device manufacturing system is provided that may reduce the amount of resources used in electronic device manufacturing processes. In some embodiments, unreacted ozone exiting a process tool operating in an ozone mode may be diverted and used as an oxidant in an abatement tool when the process tool is operating in a non-ozone mode. Numerous other embodiments are provided.
    Type: Grant
    Filed: January 30, 2015
    Date of Patent: June 20, 2017
    Assignee: APPLIED MATERIALS, INC.
    Inventors: Daniel O. Clark, Phil Chandler, Jay J. Jung
  • Patent number: 9627193
    Abstract: Described herein are precursors and methods for forming silicon-containing films. In one aspect, there is provided a precursor of Formula I: wherein R1 is selected from linear or branched C3 to C10 alkyl group, linear or branched C3 to C10 alkenyl group, linear or branched C3 to C10 alkynyl group, C1 to C6 dialkylamino group, electron withdrawing group, and C6 to C10 aryl group; R2 is selected from hydrogen, linear or branched C1 to C10 alkyl group, linear or branched C3 to C6 alkenyl group, linear or branched C3 to C6 alkynyl group, C1 to C6 dialkylamino group, C6 to C10 aryl group, linear or branched C1 to C6 fluorinated alkyl group, electron withdrawing group, and C4 to C10 aryl group; optionally wherein R1 and R2 are linked together to form ring selected from substituted or unsubstituted aromatic ring or substituted or unsubstituted aliphatic ring; and n=1 or 2.
    Type: Grant
    Filed: October 10, 2014
    Date of Patent: April 18, 2017
    Assignee: VERSUM MATERIALS US, LLC
    Inventors: Steven Gerard Mayorga, Heather Regina Bowen, Xinjian Lei, Manchao Xiao, Haripin Chandra, Anupama Mallikarjunan, Ronald Martin Pearlstein
  • Patent number: 9613799
    Abstract: Described herein are precursors and methods for forming silicon-containing films. In one aspect, there is provided a precursor of Formula I: wherein R1 is selected from linear or branched C3 to C10 alkyl group, linear or branched C3 to C10 alkenyl group, linear or branched C3 to C10 alkynyl group, C1 to C6 dialkylamino group, electron withdrawing group, and C6 to C10 aryl group; R2 is selected from hydrogen, linear or branched C1 to C10 alkyl group, linear or branched C3 to C6 alkenyl group, linear or branched C3 to C6 alkynyl group, C1 to C6 dialkylamino group, C6 to C10 aryl group, linear or branched C1 to C6 fluorinated alkyl group, electron withdrawing group, and C4 to C10 aryl group; optionally wherein R1 and R2 are linked together to form ring selected from substituted or unsubstituted aromatic ring or substituted or unsubstituted aliphatic ring; and n=1 or 2.
    Type: Grant
    Filed: March 18, 2016
    Date of Patent: April 4, 2017
    Assignee: AIR PRODUCTS AND CHEMICALS, INC.
    Inventors: Manchao Xiao, Xinjian Lei, Daniel P. Spence, Haripin Chandra, Bing Han, Mark Leonard O'Neill, Steven Gerard Mayorga, Anupama Mallikarjunan
  • Patent number: 9382270
    Abstract: Provided are silacyclopropane-based compounds and methods of making the same. Also provided are methods of using said compounds in film deposition processes to deposit films comprising silicon. Certain methods comprise exposing a substrate surface to a silacyclopropane-based precursor and a co-reagent in various combinations.
    Type: Grant
    Filed: October 6, 2015
    Date of Patent: July 5, 2016
    Assignee: Applied Materials, Inc.
    Inventors: Mark Saly, David Thompson
  • Patent number: 9371341
    Abstract: A method for producing a cyclic aminoorganoxysilane compound is provided. The method comprises the step of conducting dehydrochlorination coupling of a chloroalkylalkoxysilane compound represented by the formula: wherein R1 is a straight or branched divalent C1-10 hydrocarbon group, R2 is hydrogen atom or an unsubstituted or substituted C1-10 monovalent hydrocarbon group, R3 and R4 are respectively a C1-10 monovalent hydrocarbon group, and n is 0, 1, or 2 and an aminoalcohol represented by the formula: wherein R5 is a straight or branched C2-10 divalent hydrocarbon group which may contain a heteroatom and R6 is hydrogen atom or a straight or branched C1-10 monovalent hydrocarbon group, and promoting intramolecular transesterification to thereby produce a cyclic aminoorganoxysilane compound represented by the formula: wherein R1 to R6 and n are as defined above.
    Type: Grant
    Filed: October 13, 2015
    Date of Patent: June 21, 2016
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Masato Kawakami, Yoichi Tonomura, Tohru Kubota
  • Patent number: 9120825
    Abstract: This invention aims at providing a material from which a silicon-containing thin film can be efficiently produced at a low temperature of 500° C. or less without using plasma or the like. The invention relates to produce a hydrosilane derivative represented by the general formula (1?) by reacting a chlorosilane derivative (3) with a compound M2Z (4) and produce the silicon-containing thin film by using the hydrosilane derivative as the material. In the formulae, R1, R2 are defined in the specification.
    Type: Grant
    Filed: May 30, 2011
    Date of Patent: September 1, 2015
    Assignees: TOSOH CORPORATION, SAGAMI CHEMICAL RESEARCH INSTITUTE
    Inventors: Ken-ichi Tada, Kohei Iwanaga, Toshiki Yamamoto, Atsushi Maniwa
  • Publication number: 20150147824
    Abstract: A silicon precursor composition is described, including a silylene compound selected from among: silylene compounds of the formula: wherein each of R and R1 is independently selected from organo substituents; amidinate silylenes; and bis(amidinate) silylenes. The silylene compounds are usefully employed to form high purity, conformal silicon-containing films of Si02, Si3N4, SiC and doped silicates in the manufacture of microelectronic device products, by vapor deposition processes such as CVD, pulsed CVD, ALD and pulsed plasma processes. In one implementation, such silicon precursors can be utilized in the presence of oxidant, to seal porosity in a substrate comprising porous silicon oxide by depositing silicon oxide in the porosity at low temperature, e.g., temperature in a range of from 50° C. to 200° C.
    Type: Application
    Filed: May 22, 2013
    Publication date: May 28, 2015
    Applicant: ADVANCED TECHNOLOGY MATERIALS, INC.
    Inventors: Thomas M. Cameron, Susan V. DiMeo, Bryan C. Hendrix, Weimin Li
  • Publication number: 20150097162
    Abstract: Provided is an organic electroluminescent element which has improved driving voltage and improved current efficiency. An organic electroluminescent element having the above-mentioned improved characteristics is provided by using, as a material for organic electroluminescent elements, a polycyclic aromatic compound in which a nitrogen atom and another heteroatom or a metal atom (X) are adjacent to each other in a non-aromatic ring.
    Type: Application
    Filed: September 11, 2013
    Publication date: April 9, 2015
    Applicants: JNC Corporation, Kyoto University
    Inventors: Yohei Ono, Kazushi Shiren, Toshiaki Ikuta, Jingping Ni, Takeshi Matsushita, Takuji Hatakeyama, Masaharu Nakamura, Shiguma Hashimoto
  • Publication number: 20150024608
    Abstract: Described herein are precursors and methods for forming silicon-containing films. In one aspect, there is provided a precursor of Formula I: wherein R1 is selected from linear or branched C3 to C10 alkyl group, linear or branched C3 to C10 alkenyl group, linear or branched C3 to C10 alkynyl group, C1 to C6 dialkylamino group, electron withdrawing group, and C6 to C10 aryl group; R2 is selected from hydrogen, linear or branched C1 to C10 alkyl group, linear or branched C3 to C6 alkenyl group, linear or branched C3 to C6 alkynyl group, C1 to C6 dialkylamino group, C6 to C10 aryl group, linear or branched C1 to C6 fluorinated alkyl group, electron withdrawing group, and C4 to C10 aryl group; optionally wherein R1 and R2 are linked together to form ring selected from substituted or unsubstituted aromatic ring or substituted or unsubstituted aliphatic ring; and n=1 or 2.
    Type: Application
    Filed: October 10, 2014
    Publication date: January 22, 2015
    Applicant: AIR PRODUCTS AND CHEMICALS, INC.
    Inventors: Steven Gerard Mayorga, Heather Regina Bowen, Xinjian Lei, Manchao Xiao, Haripin Chandra, Anupama Mallikarjunan, Ronald Martin Pearlstein
  • Patent number: 8933258
    Abstract: Disclosed herein are methods for a simple process to make 3-aminoorgano functional silanes and siloxanes, free from isomers, by the use of commonly available materials. One embodiment of such a method comprises reacting aminoorgano functional silanes with hexamethyldisilazane in the presence of an acidic catalyst to produce a cyclic gamma-functional aminoorganic silane and beta isomers; separating the cyclic gamma-functional aminoorganic silane and the beta isomers; and converting the separated cyclic gamma-functional aminoorganic silane to pure gamma-aminoalkylsilane or pure aminoorganic siloxane. Also disclosed herein are cyclic derivatives of gamma-functional aminoorganic silanes.
    Type: Grant
    Filed: May 27, 2013
    Date of Patent: January 13, 2015
    Assignee: Genesee Polymers Corp.
    Inventors: Charles Piskoti, Charles R Piskoti
  • Patent number: 8927749
    Abstract: A compound according to a formula I and devices incorporating the same are described. The compound according to the formula I can have the structure: wherein X is Si or Ge; R1 and R2 represent mono, di, tri, tetra, or penta substitutions or no substitution; R3, R4 represent mono, di, tri, or tetra substitutions or no substitution; R1 and R2 are optionally joined to form a ring, which may be further substituted; L is a single bond or comprises an aryl or heteroaryl group having from 5-20 carbon atoms, which is optionally further substituted; and A is an aromatic group. A contains a group selected from the group consisting of indole, carbazole, benzofuran, dibenzofuran, benzothiophene, dibenzothiophene, benzoselenophene, dibenzoselenophene, triphenylene, azacarbazole, azadibenzofuran, azadibenzothiophene, azadibenzoselenophene, azatriphenylene, and combinations thereof, which are optionally further substituted. The device can include the compound according to Formula I in an organic layer.
    Type: Grant
    Filed: March 7, 2013
    Date of Patent: January 6, 2015
    Assignee: Universal Display Corporation
    Inventors: Pierre-Luc T. Boudreault, Chuanjun Xia
  • Publication number: 20150004317
    Abstract: Disclosed are Si-containing thin film forming precursors, methods of synthesizing the same, and methods of using the same to deposit silicon-containing films using vapor deposition processes for manufacturing semiconductors, photovoltaics, LCD-TFT, flat panel-type devices, refractory materials, or aeronautics.
    Type: Application
    Filed: July 19, 2013
    Publication date: January 1, 2015
    Inventors: Christian Dussarrat, Glenn Kuchenbeiser, Venkateswara R. Pallem
  • Patent number: 8716375
    Abstract: This invention relates to an organosilicon compound having a cyclic structure with nitrogen atom and silicon atom, and one or more sulfur atoms in its molecule, and having a bonding side of one or more groups having as small steric hindrance to silicon atom, a rubber composition formed by compounding an inorganic filler (B) and the organosilicon compound (C) into a rubber component (A) consisting of natural rubber and/or diene-based synthetic rubber, and a tire using such a rubber composition.
    Type: Grant
    Filed: April 22, 2010
    Date of Patent: May 6, 2014
    Assignee: Bridgestone Corporation
    Inventors: Noriaki Yukimura, Seiichi Kato, Satoshi Horie
  • Patent number: 8686173
    Abstract: A process for preparing 1,3,5-triethyl-2,4,6-trihydrido-2,4,6-triethylamino-1,3,5-triaza-2,4,6-trisilacyclohexane, wherein trichlorosilane is reacted with ethylamine in a solvent.
    Type: Grant
    Filed: July 1, 2011
    Date of Patent: April 1, 2014
    Assignee: Wacker Chemie AG
    Inventors: Wolfgang Knies, Hans Eiblmeier
  • Publication number: 20140051878
    Abstract: The invention relates to new metal complexes having N-aminoamidinate ligands, more particularly metal complexes having N,N?-bis(dimethylamino)acetamidinate, N,N?-bis(dimethylamino)formamidinate, N-dimethylaminoacetamidinate or N-dimethylamino-N?-isopropyl-acetamidinate ligands as well as to their preparation and use. The metal complexes are characterized by a five-membered chelate ring. The metal complexes are formed with the metals from the main groups of the PTE, but also with transition-group elements such as tantalum (Ta), iron (Fe), cobalt (Co), nickel (Ni), copper (Cu) or zinc (Zn), and also with precious metals such as palladium (Pd). The complexes of the invention find use as precursors for the preparation of functional layers by means of gas-phase thin-film processes such as CVD, MO-CVD and ALD. Additionally they may be used as catalysts for olefin hydroamination and for olefin polymerization.
    Type: Application
    Filed: February 20, 2012
    Publication date: February 20, 2014
    Inventors: Joerg Sundermeyer, Wolf Schorn, Ralf Karch
  • Publication number: 20130330482
    Abstract: The present invention relates to carbon-doped silicon nitride thin film and forming method and device thereof The carbon-doped silicon nitride thin film is prepared by using a precursor having at least one of bis(dimethylamino)diethylsilane, N,N-Dimethyltrimethylsilylamine and a cyclic structure with a N—Si bond. The method for forming a carbon-doped silicon nitride thin film includes: providing a precursor having at least one of bis(dimethylamino)diethylsilane, N,N-Dimethyltrimethylsilylamine and a cyclic structure with a N—Si bond to form the carbon-doped silicon nitride thin film. The device for forming the carbon-doped silicon nitride thin film includes a reactor and a container with the aforementioned precursor coupled to the reactor.
    Type: Application
    Filed: January 30, 2013
    Publication date: December 12, 2013
    Applicant: NATIONAL CHIAO TUNG UNIVERSITY
    Inventors: Jihperng Leu, Hung-En Tu, Wei-Gan Chiu
  • Patent number: 8536360
    Abstract: Compositions and methods for practical, stereoselective allylation and crotylation for aldehyde substrates are described. The compositions and methods comprise reagents for allylation and/or crotylation and acids. In some embodiments, the reagents and acids are pre-mixed.
    Type: Grant
    Filed: April 19, 2011
    Date of Patent: September 17, 2013
    Assignee: The Trustees of Columbia University in the City of New York
    Inventors: Hyunwoo Kim, James Lincoln Leighton
  • Patent number: 8450512
    Abstract: Disclosed herein are methods for a simple process to make 3-aminoorgano functional silanes and siloxanes, free from isomers, by the use of commonly available materials. One embodiment of such a method comprises reacting aminoorgano functional silanes with hexamethyldisilazane in the presence of an acidic catalyst to produce a cyclic gamma-functional aminoorganic silane and beta isomers; separating the cyclic gamma-functional aminoorganic silane and the beta isomers; and converting the separated cyclic gamma-functional aminoorganic silane to pure gamma-aminoalkylsilane or pure aminoorganic siloxane. Also disclosed herein are cyclic derivatives of gamma-functional aminoorganic silanes.
    Type: Grant
    Filed: September 8, 2010
    Date of Patent: May 28, 2013
    Assignee: Genesee Polymers Corporation
    Inventors: Charles Piskoti, Charles R. Piskoti
  • Publication number: 20130123528
    Abstract: This invention aims at providing a material from which a silicon-containing thin film can be efficiently produced at a low temperature of 500° C. or less without using plasma or the like. The invention relates to produce a hydrosilane derivative represented by the general formula (1?) by reacting a chlorosilane derivative (3) with a compound M2Z (4) and produce the silicon-containing thin film by using the hydrosilane derivative as the material. In the formulae, R1, R2 are defined in the specification.
    Type: Application
    Filed: May 30, 2011
    Publication date: May 16, 2013
    Applicants: SAGAMI CHEMICAL RESEARCH INSTITUTE, TOSOH CORPORATION
    Inventors: Ken-ichi Tada, Kohei Iwanaga, Toshiki Yamamoto, Atsushi Maniwa
  • Patent number: 8399695
    Abstract: This invention relates to organometallic precursor compounds represented by the formula (H)mM(R)n wherein M is a metal or metalloid, R is the same or different and is a substituted or unsubstituted, saturated or unsaturated, heterocyclic radical containing at least one nitrogen atom, m is from 0 to a value less than the oxidation state of M, n is from 1 to a value equal to the oxidation state of M, and m+n is a value equal to the oxidation state of M, a process for producing the organometallic precursor compounds, and a method for producing a film or coating from the organometallic precursor compounds.
    Type: Grant
    Filed: December 19, 2007
    Date of Patent: March 19, 2013
    Assignee: Praxair Technology, Inc.
    Inventor: Scott Houston Meiere
  • Patent number: 8389649
    Abstract: The present invention is a siloxane-based resin composition including a siloxane-based resin and an imidosilane compound having a specific structure. Moreover, the present invention is a siloxane-based resin composition including a siloxane-based resin which is a reactive product to be obtained by hydrolyzing an alkoxysilane compound and an imidosilane compound having a specific structure and then making the resulting hydrolysate undergo a condensation reaction. According to the present invention, it is possible to form a cured film excellent in adhesion.
    Type: Grant
    Filed: May 27, 2008
    Date of Patent: March 5, 2013
    Assignee: Toray Industries, Inc.
    Inventors: Mitsuhito Suwa, Hirokazu Iimori
  • Patent number: 8361627
    Abstract: The invention relates to a composition for the corrosion protection of metal substrates and to the production thereof, and to a method for producing corrosion-resistant coatings.
    Type: Grant
    Filed: January 7, 2010
    Date of Patent: January 29, 2013
    Assignees: EADS Deutschland GmbH, Technische Universität Wien
    Inventors: Theo Hack, Dominik Raps, Ralf Supplit, Ulrich Schubert
  • Publication number: 20130021546
    Abstract: A substrate used for a liquid crystal display element having two or more substrates arranged oppositely to each other and a liquid crystal material exhibiting a blue phase between the substrates, where a polar component of surface free energy on a substrate surface in contact with the liquid crystal material is less than 5 mJm?2; and a substrate used for a liquid crystal display element having two or more substrates arranged oppositely to each other and a liquid crystal material exhibiting a blue phase between the substrates, where a polar component of surface free energy on a substrate surface in contact with the liquid crystal material is in the range of 5 to 20 mJm?2, and a contact angle with an isotropic phase of the liquid crystal material on the substrate surface is 50 degrees or less.
    Type: Application
    Filed: August 26, 2010
    Publication date: January 24, 2013
    Applicants: KYUSHU UNIVERSITY, NATIONAL UNIVERSITY CORPORATION, JNC PETROCHEMICAL CORPORATION, JNC CORPORATION
    Inventors: Hirotsugu Kikuchi, Shin-ichi Yamamoto, Yasuhiro Haseba, Takafumi Kuninobu
  • Patent number: 8318966
    Abstract: This invention relates to organometallic compounds represented by the formula HaM(NR1R2)x(NR3H)y(NH2)z wherein M is a metal or metalloid, each of R1, R2 and R3 is the same or different and is independently a hydrocarbon group or a heteroatom-containing group, a is a value from 0 to 3, x is a value from 0 to 3, y is a value from 0 to 4, z is a value from 0 to 4, and a+x+y+z is equal to the oxidation state of M, provided that at least one of y and z is a value of at least 1, a process for producing the organometallic compounds, and a method for producing a film or coating from organometallic precursor compounds.
    Type: Grant
    Filed: May 29, 2007
    Date of Patent: November 27, 2012
    Assignee: Praxair Technology, Inc.
    Inventor: Scott Houston Meiere
  • Patent number: 8258332
    Abstract: A method for preparing a functionalized polymer, the method comprising the steps of preparing a reactive polymer, and reacting the reactive polymer with a halosilane compound containing an amino group.
    Type: Grant
    Filed: June 18, 2008
    Date of Patent: September 4, 2012
    Assignee: Bridgestone Corporation
    Inventors: Terrence E. Hogan, Steven Luo, Yoichi Ozawa, Junko Matsushita, Ryuji Nakagawa, Eiju Suzuki, Ken Tanaka
  • Publication number: 20120190875
    Abstract: Compositions and methods for practical, stereoselective allylation and crotylation for aldehyde substrates are described. The compositions and methods comprise reagents for allylation and/or crotylation and acids. In some embodiments, the reagents and acids are pre-mixed.
    Type: Application
    Filed: April 19, 2011
    Publication date: July 26, 2012
    Applicant: THE TRUSTEES OF COLUMBIA UNIVERSITY IN THE CITY OF NEW YORK
    Inventors: Hyunwoo KIM, James Lincoln LEIGHTON
  • Publication number: 20120178267
    Abstract: Silicon precursors for forming silicon-containing films in the manufacture of semiconductor devices, such as low dielectric constant (k) thin films, high k gate silicates, low temperature silicon epitaxial films, and films containing silicon nitride (Si3N4), siliconoxynitride (SiOxNy) and/or silicon dioxide (SiO2). The precursors of the invention are amenable to use in low temperature (e.g., <500° C.) chemical vapor deposition processes, for fabrication of ULSI devices and device structures.
    Type: Application
    Filed: March 19, 2012
    Publication date: July 12, 2012
    Applicant: ADVANCED TECHNOLOGY MATERIALS, INC.
    Inventors: Ziyun Wang, Chongying Xu, Ravi K. Laxman, Thomas H. Baum, Bryan Hendrix, Jeffrey Roeder
  • Patent number: 8183403
    Abstract: This invention relates to a novel compound capable of largely reducing hysteresis loss of a rubber composition but also highly improving wear resistance, and more particularly to an organosilicon compound characterized by having one or more silicon-oxygen bond (Si—O) and 1-10 sulfur atoms (S) in its molecule, including one or more chain alkoxy groups and having one or more nitrogen atoms (N) at a position distant by 3-8 atoms from silicon atom (Si).
    Type: Grant
    Filed: February 20, 2009
    Date of Patent: May 22, 2012
    Assignee: Bridgestone Corporation
    Inventors: Noriaki Yukimura, Yasuo Fukushima
  • Publication number: 20120108718
    Abstract: This invention relates to an organosilicon compound having a cyclic structure with nitrogen atom and silicon atom, and one or more sulfur atoms in its molecule, and having a bonding side of one or more groups having as small steric hindrance to silicon atom, a rubber composition formed by compounding an inorganic filler (B) and the organosilicon compound (C) into a rubber component (A) consisting of natural rubber and/or diene-based synthetic rubber, and a tire using such a rubber composition.
    Type: Application
    Filed: April 22, 2010
    Publication date: May 3, 2012
    Applicant: BRIDGESTONE CORPORATION
    Inventors: Noriaki Yukimura, Seiichi Kato, Satoshi Horie
  • Publication number: 20120071650
    Abstract: The invention relates to a method (a) for producing aminoorganyltriorganylsilanes of the general formula (1) R?3-nR1nSi—R2—NR3R4 (1), a method (b) for producing cyclic aminosilanes of the general formula (4), and a method (III) for producing silylorganoamines of the general formula (7) R013-tR11tSi—R12—NR13—R14—SiR023-sR15s (7), wherein amines are reacted with halogen organylsilanes, wherein R?, R1, R2, R3, R4, R, R5, R6, R01, R02, R11, R12, R13, R14, R15, n, and s have the meanings specified in claims 1 to 3, wherein after the reaction, the ammonium halides of the amines produced as by-products are released by adding a base (B) to the reaction mixture, the amines are removed from the reaction mixture by distillation, two liquid phases are formed by further adding base (B) to the reaction mixture, wherein the one phase contains at least 90 wt % of the hydrohalide of the base (B) and said phase is separated.
    Type: Application
    Filed: June 1, 2010
    Publication date: March 22, 2012
    Applicant: WACKER CHEMIE AG
    Inventor: Michael STEPP
  • Patent number: 8088883
    Abstract: A transition metal complex obtained by contacting a bipyridine compound represented by the formula (1): wherein R1, R2 and R3 represent a C1-C10 alkyl group which may be substituted, etc., and R4 and R5 represent a hydrogen atom etc., with a compound of a transition metal belonging to Group 9, 10 or 11, and a process for producing a conjugated aromatic compound comprising reacting an aromatic compound (A) wherein one or two leaving groups are bonded to an aromatic ring with an aromatic compound (A) having the same structure as that of the above-mentioned aromatic compound (A) or an aromatic compound (B) being structurally different from the above-mentioned aromatic compound (A) and having one or two leaving groups bonded to an aromatic ring, in the presence of said transition metal complex.
    Type: Grant
    Filed: July 25, 2008
    Date of Patent: January 3, 2012
    Assignee: Sumitomo Chemical Company, Limited
    Inventors: Taku Asaumi, Takashi Kamikawa
  • Patent number: 8088940
    Abstract: In accordance with the present invention, a hydrolyzable silane of low VOC-generating potential is provided which possesses: (i) at least one organofunctional group, said group being a non-bulky electron-withdrawing group and/or a group which interacts with an organic resin, the organofunctional group being bonded to a silicon atom of a hydrolyzable silyl group through a stable bridging groups; and (ii) at least one hydrolyzable group bonded to silicon and containing at least two heteroatoms selected from the group consisting of oxygen, nitrogen and their combinations, hydrolysis of the hydrolyzable group generating a compound having a vapor pressure lower than 0.1 mm Hg at 20° C.
    Type: Grant
    Filed: March 30, 2007
    Date of Patent: January 3, 2012
    Assignee: Momentive Performance Materials Inc.
    Inventors: Misty W. Huang, Antonio Chaves, Bruce A. Waldman, Shayne J. Landon
  • Publication number: 20110166373
    Abstract: In the preparation of aminoorganylsilanes and cyclic aminosilanes by reaction of an organyl amine with a haloorganylsilane, the byproduct halide salt of the amine reactant is decomposed to amine by addition of a base whose halide salt forms a liquid phase at a temperature below 200° C., and the liquid base halide is separated from the reaction mixture.
    Type: Application
    Filed: July 28, 2008
    Publication date: July 7, 2011
    Applicant: Wacker Chemie AG
    Inventors: Wolfgang Ziche, Volker Stanjek
  • Patent number: 7939684
    Abstract: A method of preparing an ultra-pure metal amidinate compound comprising using a microchannel device for synthesis in reacting a metal halide solution with a lithium amidinate solution to produce an ultra-pure alkylmetal compound for processes such as chemical vapor deposition.
    Type: Grant
    Filed: February 5, 2010
    Date of Patent: May 10, 2011
    Assignee: Rohm and Haas Company
    Inventors: Francis Joseph Lipiecki, Stephen G. Maroldo, Deodatta Vinayak Shenai-Khatkhate, Robert A. Ware
  • Publication number: 20110105778
    Abstract: The present invention relates to compounds containing a moiety of the formula (1) and to the use thereof in organic electroluminescent devices and to organic electroluminescent devices which comprise compounds of this type.
    Type: Application
    Filed: October 14, 2009
    Publication date: May 5, 2011
    Applicant: Merck Patent GmbH
    Inventors: Philipp Stoessel, Holger Heil, Dominik Joosteen, Christof Pflumm, Anja Gerhard
  • Patent number: 7935395
    Abstract: A liquid crystal molecule is disclosed, having a structure represented by the following general formula (1): wherein X1 is a group selected among groups represented by the following formula (2): X2 is represented by the following formula (3): R1 represents a linear or branched hydrocarbon group or an alkoxy group each having from 4 to 16 carbon atoms; R2 represents an optionally branched organosiloxane or organosilane having from 1 to 6 silicon atoms; other variables in formulae are defined therein.
    Type: Grant
    Filed: October 5, 2009
    Date of Patent: May 3, 2011
    Assignee: Sony Corporation
    Inventors: Rika Kotake, Hidehiko Takanashi, Ken Kobayashi
  • Patent number: 7932412
    Abstract: To provide an aminoaryl-containing organosilicon compound with high efficiency, after protecting amino groups of a haloaniline compound with a specific compound, to form a Grignard reagent and to deprotect the aforementioned groups by reacting the Grignard reagent with a silicon compound.
    Type: Grant
    Filed: October 27, 2010
    Date of Patent: April 26, 2011
    Assignee: Dow Corning Toray Co., Ltd.
    Inventors: Keiji Wakita, Yasushi Sugiura
  • Patent number: 7855300
    Abstract: The present invention provides a compound that exhibits an excellent antitumor effect and reduces side effects, such as skin disorders, of the existing retinoid by selectively activating on the nuclear receptor RAR?, thereby possibly producing significant improvement of clinical profits. Specifically, the present invention provides a bis(trimethylsilyl)phenyl compound represented by Formula (I): wherein X is N or CH; Y is O or S; R1, R2, and R3 are the same or different and are hydrogen or lower alkyl; R4 and R5 are the same or different and are hydrogen, lower alkyl, or halogen; and a bond between a carbon atom to which R1 is attached and a carbon atom to which R2 is attached is a single bond or a double bond; or a salt thereof.
    Type: Grant
    Filed: October 10, 2008
    Date of Patent: December 21, 2010
    Assignee: Taiho Pharmaceutical Co., Ltd.
    Inventors: Yoshimitsu Suda, Hiromi Oshiumi, Koji Murakami
  • Publication number: 20100317818
    Abstract: A method for preparing a functionalized polymer, the method comprising the steps of preparing a reactive polymer, and reacting the reactive polymer with a halosilane compound containing an amino group.
    Type: Application
    Filed: June 18, 2008
    Publication date: December 16, 2010
    Inventors: Terrence Hogan, Steven Luo, Yoichi Ozawa, Junko Matsushita, Ryuji Nakagawa, Ken Tanaka, Eiju Susuki
  • Patent number: 7851580
    Abstract: A composition of matter comprises a polymer network, including silicon atoms and oxygen atoms, a first organic side-chain attached to at least some silicon atoms within the polymer network comprising a flexible linking group and a terminal group, the terminal group including at least one atom providing a lone pair of electrons. The composition of matter can be used to form a proton-conducting membrane. In illustrative examples, the polymer network can be an organic-inorganic hybrid network and the terminal group can includes a nitrogen-containing heterocycle.
    Type: Grant
    Filed: May 28, 2004
    Date of Patent: December 14, 2010
    Assignees: Toyota Motor Engineering & Manufacturing North America, Inc., Georgia Tech Research Corporation
    Inventors: Siwen Li, Meilin Liu, Qunhui Sun, Wen Li
  • Patent number: 7847116
    Abstract: To provide an aminoaryl containing organosilicon compound with high efficiency, after protecting amino groups of a haloaniline compound with a specific compound, to form a Grignard reagent and to deprotect the aforementioned groups by reacting the Grignard reagent with a silicon compound.
    Type: Grant
    Filed: October 4, 2005
    Date of Patent: December 7, 2010
    Assignee: Dow Corning Toray Company, Ltd.
    Inventors: Keiji Wakita, Yasushi Sugiura
  • Patent number: 7829204
    Abstract: A material for organic electroluminescence device with specific structure having poor symmetry. An an organic electroluminescence device comprising a cathode, an anode and an organic thin film layer which is sandwiched between the cathode and the anode and comprises at least one layer, wherein at least one layer in the organic thin film layer contains a material for the organic electroluminescence device described above. An organic electroluminescence device with excellent efficiency of light emission, without pixel defects and which is superior in heat resistance is obtained.
    Type: Grant
    Filed: December 13, 2004
    Date of Patent: November 9, 2010
    Assignee: Idemitsu Kosan Co., Ltd.
    Inventors: Toshihiro Iwakuma, Seiji Tomita, Mitsunori Ito
  • Patent number: 7790819
    Abstract: Cyclic organosilicon compounds that may be employed as an electron donor for polymerization catalyst systems, polymerization catalyst systems employing the cyclic organosilicon compounds as an electron donor, methods of making the polymerization catalyst systems, and polymerization processes to produce polyolefin are disclosed. The organosilicon compounds, which are useful as electron donors in polymerization catalyst systems for the production of polyolefins, are represented by the formula: where Q1, Q2, Q3, and Q4 may be identical or different and are each hetero-atoms selected from the group consisting of N, O, S, Si, B, and P. R1, R2, R3, and R4 may be identical or different and are each hydrocarbon-based substituents to Q1, Q2, Q3, and Q4, respectively. The subscripts i, j, m, and n are independently 0 to 3 R5 and R6 may be identical or different and are each a bridging group with a backbone chain length between the two hetero-atoms Q1 and Q3, and Q2 and Q4, respectively, 1-8 atoms.
    Type: Grant
    Filed: April 13, 2009
    Date of Patent: September 7, 2010
    Assignee: Formosa Plastics Corporation, U.S.A.
    Inventors: Yiqun Fang, Honglan Lu
  • Patent number: 7785720
    Abstract: Disclosed is an organic light emitting device. The organic light emitting device comprises a first electrode, organic material layer(s) comprising a light emitting layer, and a second electrode. The first electrode, the organic material layer(s), and the second electrode form layered structure and at least one layer of the organic material layer(s) include the compound of Formula 1 or the compound of Formula 1 into which a thermosetting or photo-crosslinkable functional group is introduced.
    Type: Grant
    Filed: September 23, 2005
    Date of Patent: August 31, 2010
    Assignee: LG Chem, Ltd.
    Inventors: Wook Dong Cho, Ji Eun Kim, Byung Sun Jeon, Dong Seob Jeong, Seok Hee Yoon, Jae Min Moon
  • Patent number: 7781605
    Abstract: Silicon precursors for forming silicon-containing films in the manufacture of semiconductor devices, such as films including silicon carbonitride, silicon oxycarbonitride, and silicon nitride (Si3N4), and a method of depositing the silicon precursors on substrates using low temperature (e.g., <550° C.) chemical vapor deposition processes, for fabrication of ULSI devices and device structures.
    Type: Grant
    Filed: October 13, 2009
    Date of Patent: August 24, 2010
    Assignee: Advanced Technology Materials, Inc.
    Inventors: Ziyun Wang, Chongying Xu, Bryan C. Hendrix, Jeffrey F. Roeder, Tianniu Chen, Thomas H. Baum
  • Patent number: 7777063
    Abstract: The invention relates to organosilicon compounds, and to the ways in which they can be made and used.
    Type: Grant
    Filed: August 15, 2006
    Date of Patent: August 17, 2010
    Assignee: Evonik Degussa GmbH
    Inventors: Karsten Korth, Andre Hasse, Susann Witzsche, Oliver Klockmann, Philipp Albert
  • Publication number: 20100185003
    Abstract: A method of preparing an ultra-pure metal amidinate compound comprising using a microchannel device for synthesis in reacting a metal halide solution with a lithium amidinate solution to produce an ultra-pure alkylmetal compound for processes such as chemical vapor deposition.
    Type: Application
    Filed: February 5, 2010
    Publication date: July 22, 2010
    Applicant: ROHM AND HAAS COMPANY
    Inventors: Francis Joseph Lipiecki, Stephen G. Maroldo, Deodatta Vinayak Shenai-Khatkhate, Robert A. Ware
  • Publication number: 20100185002
    Abstract: A method of preparing an ultra-pure metal amidinate compound comprising using a microchannel device for synthesis in reacting a metal halide solution with a lithium amidinate solution to produce an ultra-pure alkylmetal compound for processes such as chemical vapor deposition.
    Type: Application
    Filed: February 5, 2010
    Publication date: July 22, 2010
    Applicant: ROHM AND HAAS COMPANY
    Inventors: Francis Joseph Lipiecki, Stephen G. Maroldo, Deodatta Vinayak Shenai-Khatkhate, Robert A. Ware