Abstract: Oligomers that contain an ethylenically unsaturated group, a silane group, and an aspartate group and/or hydantoin group are described. Also disclosed are methods for producing and using such compounds, such as their use in coating compositions, such as coating compositions suitable for application to optical glass fiber substrates.

Abstract: A cyclic silazane compound having an alkoxysilyl group, represented by the following general formula (1): wherein R1, R2, R5 and R6 each independently represent an unsubstituted monovalent hydrocarbon group having 1 to 10 carbon atoms, R3 represents a divalent hydrocarbon group having 4 to 20 carbon atoms, which may contain a sulfur atom, an ester bond or a urea bond, R4 represents a hydrogen atom or an unsubstituted monovalent hydrocarbon group having 1 to 10 carbon atoms, m is 0 or 1, and n is 0, 1 or 2.

Abstract: A moisture-curable composition, including at least one polymer P containing reactive silane groups; between 0.1 and 5 wt.-%, based on the total composition, of at least one organosilane OS of the formula (I), wherein R20 independently stands for a monovalent, optionally cyclic or branched, hydrocarbyl or heterocarbyl radical, optionally comprising aromatic moieties, which contains 1 to 12 carbon atoms and wherein the carbon atom next to the silicon atom either bonds via a C?C double bond to another carbon atom or bonds to a heteroatom selected from O, N, and S; R21 independently stands for a linear, cyclic, or branched divalent hydrocarbyl radical having 2 to 12 carbon atoms and optionally containing aromatic moieties; R22 stands for a hydrogen atom or a group of the formula (Ia); characterized in that the curable composition does not contain catalytically active organometallic or acidic compounds.

Abstract: Provided is a surface treatment agent including an alkoxysilane compound having a cyclic silazane structure represented by the following general formula (1): wherein R1 represents an unsubstituted linear alkyl group having 6 to 20 carbon atoms, R2 represents a substituted or unsubstituted alkylene group having 3 to 6 carbon atoms that may include a heteroatom, R3 and R4 each independently represent a substituted or unsubstituted monovalent hydrocarbon group having 1 to 10 carbon atoms, and n represents an integer of 0 or 1.

Abstract: The present invention is directed to a functionalized elastomer, wherein the functionalized elastomer is a copolymer of a first monomer and a second monomer, the first monomer selected from the group consisting of conjugated diene monomers and vinyl aromatic monomers, and the second monomer of formula 1 wherein R1=C1-C8 alkyl, aryl, substituted aryl, or —SiR3 where R3 are independently C1-C8 alkyl; R2=C1-C8 alkyl, aryl, or substituted aryl, or —SiR3; and n=0-3.

Abstract: Materials containing the reaction products of a cyclic azasilane with water and a compound or polymer containing an isocyanate or epoxy functional group and methods for their synthesis are provided. Stable mixtures containing a cyclic azasilane and a compound or polymer containing an isocyanate or epoxy functional group according to invention are stored under anhydrous conditions. The invention also provides a novel class of materials, mono and bis(cycloaza)disiloxanes comprising one or two cyclic structures bridged by an Si—O—Si bond.

Abstract: Hydridosilapyrroles and hydridosilaazapyrrole are a new class of heterocyclic compounds having a silicon bound to carbon and nitrogen atoms within the ring system and one or two hydrogen atoms on the silicon atom. The compounds have formula (I): in which R is a substituted or unsubstituted organic group and R? is an alkyl group. These compounds react with a variety of organic and inorganic hydroxyl groups by a ring-opening reaction and may be used to produce silicon nitride or silicon carbonitride films.

Abstract: An electronic device manufacturing system is provided that may reduce the amount of resources used in electronic device manufacturing processes. In some embodiments, unreacted ozone exiting a process tool operating in an ozone mode may be diverted and used as an oxidant in an abatement tool when the process tool is operating in a non-ozone mode. Numerous other embodiments are provided.

Abstract: Described herein are precursors and methods for forming silicon-containing films. In one aspect, there is provided a precursor of Formula I: wherein R1 is selected from linear or branched C3 to C10 alkyl group, linear or branched C3 to C10 alkenyl group, linear or branched C3 to C10 alkynyl group, C1 to C6 dialkylamino group, electron withdrawing group, and C6 to C10 aryl group; R2 is selected from hydrogen, linear or branched C1 to C10 alkyl group, linear or branched C3 to C6 alkenyl group, linear or branched C3 to C6 alkynyl group, C1 to C6 dialkylamino group, C6 to C10 aryl group, linear or branched C1 to C6 fluorinated alkyl group, electron withdrawing group, and C4 to C10 aryl group; optionally wherein R1 and R2 are linked together to form ring selected from substituted or unsubstituted aromatic ring or substituted or unsubstituted aliphatic ring; and n=1 or 2.

Abstract: Described herein are precursors and methods for forming silicon-containing films. In one aspect, there is provided a precursor of Formula I: wherein R1 is selected from linear or branched C3 to C10 alkyl group, linear or branched C3 to C10 alkenyl group, linear or branched C3 to C10 alkynyl group, C1 to C6 dialkylamino group, electron withdrawing group, and C6 to C10 aryl group; R2 is selected from hydrogen, linear or branched C1 to C10 alkyl group, linear or branched C3 to C6 alkenyl group, linear or branched C3 to C6 alkynyl group, C1 to C6 dialkylamino group, C6 to C10 aryl group, linear or branched C1 to C6 fluorinated alkyl group, electron withdrawing group, and C4 to C10 aryl group; optionally wherein R1 and R2 are linked together to form ring selected from substituted or unsubstituted aromatic ring or substituted or unsubstituted aliphatic ring; and n=1 or 2.

Abstract: Provided are silacyclopropane-based compounds and methods of making the same. Also provided are methods of using said compounds in film deposition processes to deposit films comprising silicon. Certain methods comprise exposing a substrate surface to a silacyclopropane-based precursor and a co-reagent in various combinations.

Abstract: A method for producing a cyclic aminoorganoxysilane compound is provided. The method comprises the step of conducting dehydrochlorination coupling of a chloroalkylalkoxysilane compound represented by the formula: wherein R1 is a straight or branched divalent C1-10 hydrocarbon group, R2 is hydrogen atom or an unsubstituted or substituted C1-10 monovalent hydrocarbon group, R3 and R4 are respectively a C1-10 monovalent hydrocarbon group, and n is 0, 1, or 2 and an aminoalcohol represented by the formula: wherein R5 is a straight or branched C2-10 divalent hydrocarbon group which may contain a heteroatom and R6 is hydrogen atom or a straight or branched C1-10 monovalent hydrocarbon group, and promoting intramolecular transesterification to thereby produce a cyclic aminoorganoxysilane compound represented by the formula: wherein R1 to R6 and n are as defined above.

Abstract: This invention aims at providing a material from which a silicon-containing thin film can be efficiently produced at a low temperature of 500° C. or less without using plasma or the like. The invention relates to produce a hydrosilane derivative represented by the general formula (1?) by reacting a chlorosilane derivative (3) with a compound M2Z (4) and produce the silicon-containing thin film by using the hydrosilane derivative as the material. In the formulae, R1, R2 are defined in the specification.

Abstract: A silicon precursor composition is described, including a silylene compound selected from among: silylene compounds of the formula: wherein each of R and R1 is independently selected from organo substituents; amidinate silylenes; and bis(amidinate) silylenes. The silylene compounds are usefully employed to form high purity, conformal silicon-containing films of Si02, Si3N4, SiC and doped silicates in the manufacture of microelectronic device products, by vapor deposition processes such as CVD, pulsed CVD, ALD and pulsed plasma processes. In one implementation, such silicon precursors can be utilized in the presence of oxidant, to seal porosity in a substrate comprising porous silicon oxide by depositing silicon oxide in the porosity at low temperature, e.g., temperature in a range of from 50° C. to 200° C.

Abstract: Provided is an organic electroluminescent element which has improved driving voltage and improved current efficiency. An organic electroluminescent element having the above-mentioned improved characteristics is provided by using, as a material for organic electroluminescent elements, a polycyclic aromatic compound in which a nitrogen atom and another heteroatom or a metal atom (X) are adjacent to each other in a non-aromatic ring.

Abstract: Described herein are precursors and methods for forming silicon-containing films. In one aspect, there is provided a precursor of Formula I: wherein R1 is selected from linear or branched C3 to C10 alkyl group, linear or branched C3 to C10 alkenyl group, linear or branched C3 to C10 alkynyl group, C1 to C6 dialkylamino group, electron withdrawing group, and C6 to C10 aryl group; R2 is selected from hydrogen, linear or branched C1 to C10 alkyl group, linear or branched C3 to C6 alkenyl group, linear or branched C3 to C6 alkynyl group, C1 to C6 dialkylamino group, C6 to C10 aryl group, linear or branched C1 to C6 fluorinated alkyl group, electron withdrawing group, and C4 to C10 aryl group; optionally wherein R1 and R2 are linked together to form ring selected from substituted or unsubstituted aromatic ring or substituted or unsubstituted aliphatic ring; and n=1 or 2.

Abstract: Disclosed herein are methods for a simple process to make 3-aminoorgano functional silanes and siloxanes, free from isomers, by the use of commonly available materials. One embodiment of such a method comprises reacting aminoorgano functional silanes with hexamethyldisilazane in the presence of an acidic catalyst to produce a cyclic gamma-functional aminoorganic silane and beta isomers; separating the cyclic gamma-functional aminoorganic silane and the beta isomers; and converting the separated cyclic gamma-functional aminoorganic silane to pure gamma-aminoalkylsilane or pure aminoorganic siloxane. Also disclosed herein are cyclic derivatives of gamma-functional aminoorganic silanes.

Abstract: A compound according to a formula I and devices incorporating the same are described. The compound according to the formula I can have the structure: wherein X is Si or Ge; R1 and R2 represent mono, di, tri, tetra, or penta substitutions or no substitution; R3, R4 represent mono, di, tri, or tetra substitutions or no substitution; R1 and R2 are optionally joined to form a ring, which may be further substituted; L is a single bond or comprises an aryl or heteroaryl group having from 5-20 carbon atoms, which is optionally further substituted; and A is an aromatic group. A contains a group selected from the group consisting of indole, carbazole, benzofuran, dibenzofuran, benzothiophene, dibenzothiophene, benzoselenophene, dibenzoselenophene, triphenylene, azacarbazole, azadibenzofuran, azadibenzothiophene, azadibenzoselenophene, azatriphenylene, and combinations thereof, which are optionally further substituted. The device can include the compound according to Formula I in an organic layer.

Abstract: Disclosed are Si-containing thin film forming precursors, methods of synthesizing the same, and methods of using the same to deposit silicon-containing films using vapor deposition processes for manufacturing semiconductors, photovoltaics, LCD-TFT, flat panel-type devices, refractory materials, or aeronautics.

Abstract: This invention relates to an organosilicon compound having a cyclic structure with nitrogen atom and silicon atom, and one or more sulfur atoms in its molecule, and having a bonding side of one or more groups having as small steric hindrance to silicon atom, a rubber composition formed by compounding an inorganic filler (B) and the organosilicon compound (C) into a rubber component (A) consisting of natural rubber and/or diene-based synthetic rubber, and a tire using such a rubber composition.

Abstract: A process for preparing 1,3,5-triethyl-2,4,6-trihydrido-2,4,6-triethylamino-1,3,5-triaza-2,4,6-trisilacyclohexane, wherein trichlorosilane is reacted with ethylamine in a solvent.

Abstract: The invention relates to new metal complexes having N-aminoamidinate ligands, more particularly metal complexes having N,N?-bis(dimethylamino)acetamidinate, N,N?-bis(dimethylamino)formamidinate, N-dimethylaminoacetamidinate or N-dimethylamino-N?-isopropyl-acetamidinate ligands as well as to their preparation and use. The metal complexes are characterized by a five-membered chelate ring. The metal complexes are formed with the metals from the main groups of the PTE, but also with transition-group elements such as tantalum (Ta), iron (Fe), cobalt (Co), nickel (Ni), copper (Cu) or zinc (Zn), and also with precious metals such as palladium (Pd). The complexes of the invention find use as precursors for the preparation of functional layers by means of gas-phase thin-film processes such as CVD, MO-CVD and ALD. Additionally they may be used as catalysts for olefin hydroamination and for olefin polymerization.

Abstract: The present invention relates to carbon-doped silicon nitride thin film and forming method and device thereof The carbon-doped silicon nitride thin film is prepared by using a precursor having at least one of bis(dimethylamino)diethylsilane, N,N-Dimethyltrimethylsilylamine and a cyclic structure with a N—Si bond. The method for forming a carbon-doped silicon nitride thin film includes: providing a precursor having at least one of bis(dimethylamino)diethylsilane, N,N-Dimethyltrimethylsilylamine and a cyclic structure with a N—Si bond to form the carbon-doped silicon nitride thin film. The device for forming the carbon-doped silicon nitride thin film includes a reactor and a container with the aforementioned precursor coupled to the reactor.

Abstract: Compositions and methods for practical, stereoselective allylation and crotylation for aldehyde substrates are described. The compositions and methods comprise reagents for allylation and/or crotylation and acids. In some embodiments, the reagents and acids are pre-mixed.

Abstract: Disclosed herein are methods for a simple process to make 3-aminoorgano functional silanes and siloxanes, free from isomers, by the use of commonly available materials. One embodiment of such a method comprises reacting aminoorgano functional silanes with hexamethyldisilazane in the presence of an acidic catalyst to produce a cyclic gamma-functional aminoorganic silane and beta isomers; separating the cyclic gamma-functional aminoorganic silane and the beta isomers; and converting the separated cyclic gamma-functional aminoorganic silane to pure gamma-aminoalkylsilane or pure aminoorganic siloxane. Also disclosed herein are cyclic derivatives of gamma-functional aminoorganic silanes.

Abstract: This invention aims at providing a material from which a silicon-containing thin film can be efficiently produced at a low temperature of 500° C. or less without using plasma or the like. The invention relates to produce a hydrosilane derivative represented by the general formula (1?) by reacting a chlorosilane derivative (3) with a compound M2Z (4) and produce the silicon-containing thin film by using the hydrosilane derivative as the material. In the formulae, R1, R2 are defined in the specification.

Abstract: This invention relates to organometallic precursor compounds represented by the formula (H)mM(R)n wherein M is a metal or metalloid, R is the same or different and is a substituted or unsubstituted, saturated or unsaturated, heterocyclic radical containing at least one nitrogen atom, m is from 0 to a value less than the oxidation state of M, n is from 1 to a value equal to the oxidation state of M, and m+n is a value equal to the oxidation state of M, a process for producing the organometallic precursor compounds, and a method for producing a film or coating from the organometallic precursor compounds.

Abstract: The present invention is a siloxane-based resin composition including a siloxane-based resin and an imidosilane compound having a specific structure. Moreover, the present invention is a siloxane-based resin composition including a siloxane-based resin which is a reactive product to be obtained by hydrolyzing an alkoxysilane compound and an imidosilane compound having a specific structure and then making the resulting hydrolysate undergo a condensation reaction. According to the present invention, it is possible to form a cured film excellent in adhesion.

Abstract: The invention relates to a composition for the corrosion protection of metal substrates and to the production thereof, and to a method for producing corrosion-resistant coatings.

Abstract: A substrate used for a liquid crystal display element having two or more substrates arranged oppositely to each other and a liquid crystal material exhibiting a blue phase between the substrates, where a polar component of surface free energy on a substrate surface in contact with the liquid crystal material is less than 5 mJm?2; and a substrate used for a liquid crystal display element having two or more substrates arranged oppositely to each other and a liquid crystal material exhibiting a blue phase between the substrates, where a polar component of surface free energy on a substrate surface in contact with the liquid crystal material is in the range of 5 to 20 mJm?2, and a contact angle with an isotropic phase of the liquid crystal material on the substrate surface is 50 degrees or less.

Abstract: This invention relates to organometallic compounds represented by the formula HaM(NR1R2)x(NR3H)y(NH2)z wherein M is a metal or metalloid, each of R1, R2 and R3 is the same or different and is independently a hydrocarbon group or a heteroatom-containing group, a is a value from 0 to 3, x is a value from 0 to 3, y is a value from 0 to 4, z is a value from 0 to 4, and a+x+y+z is equal to the oxidation state of M, provided that at least one of y and z is a value of at least 1, a process for producing the organometallic compounds, and a method for producing a film or coating from organometallic precursor compounds.

Abstract: A method for preparing a functionalized polymer, the method comprising the steps of preparing a reactive polymer, and reacting the reactive polymer with a halosilane compound containing an amino group.

Abstract: Compositions and methods for practical, stereoselective allylation and crotylation for aldehyde substrates are described. The compositions and methods comprise reagents for allylation and/or crotylation and acids. In some embodiments, the reagents and acids are pre-mixed.

Abstract: Silicon precursors for forming silicon-containing films in the manufacture of semiconductor devices, such as low dielectric constant (k) thin films, high k gate silicates, low temperature silicon epitaxial films, and films containing silicon nitride (Si3N4), siliconoxynitride (SiOxNy) and/or silicon dioxide (SiO2). The precursors of the invention are amenable to use in low temperature (e.g., <500° C.) chemical vapor deposition processes, for fabrication of ULSI devices and device structures.

Abstract: This invention relates to a novel compound capable of largely reducing hysteresis loss of a rubber composition but also highly improving wear resistance, and more particularly to an organosilicon compound characterized by having one or more silicon-oxygen bond (Si—O) and 1-10 sulfur atoms (S) in its molecule, including one or more chain alkoxy groups and having one or more nitrogen atoms (N) at a position distant by 3-8 atoms from silicon atom (Si).

Abstract: This invention relates to an organosilicon compound having a cyclic structure with nitrogen atom and silicon atom, and one or more sulfur atoms in its molecule, and having a bonding side of one or more groups having as small steric hindrance to silicon atom, a rubber composition formed by compounding an inorganic filler (B) and the organosilicon compound (C) into a rubber component (A) consisting of natural rubber and/or diene-based synthetic rubber, and a tire using such a rubber composition.

Abstract: The invention relates to a method (a) for producing aminoorganyltriorganylsilanes of the general formula (1) R?3-nR1nSi—R2—NR3R4 (1), a method (b) for producing cyclic aminosilanes of the general formula (4), and a method (III) for producing silylorganoamines of the general formula (7) R013-tR11tSi—R12—NR13—R14—SiR023-sR15s (7), wherein amines are reacted with halogen organylsilanes, wherein R?, R1, R2, R3, R4, R, R5, R6, R01, R02, R11, R12, R13, R14, R15, n, and s have the meanings specified in claims 1 to 3, wherein after the reaction, the ammonium halides of the amines produced as by-products are released by adding a base (B) to the reaction mixture, the amines are removed from the reaction mixture by distillation, two liquid phases are formed by further adding base (B) to the reaction mixture, wherein the one phase contains at least 90 wt % of the hydrohalide of the base (B) and said phase is separated.

Abstract: In accordance with the present invention, a hydrolyzable silane of low VOC-generating potential is provided which possesses: (i) at least one organofunctional group, said group being a non-bulky electron-withdrawing group and/or a group which interacts with an organic resin, the organofunctional group being bonded to a silicon atom of a hydrolyzable silyl group through a stable bridging groups; and (ii) at least one hydrolyzable group bonded to silicon and containing at least two heteroatoms selected from the group consisting of oxygen, nitrogen and their combinations, hydrolysis of the hydrolyzable group generating a compound having a vapor pressure lower than 0.1 mm Hg at 20° C.

Abstract: A transition metal complex obtained by contacting a bipyridine compound represented by the formula (1): wherein R1, R2 and R3 represent a C1-C10 alkyl group which may be substituted, etc., and R4 and R5 represent a hydrogen atom etc., with a compound of a transition metal belonging to Group 9, 10 or 11, and a process for producing a conjugated aromatic compound comprising reacting an aromatic compound (A) wherein one or two leaving groups are bonded to an aromatic ring with an aromatic compound (A) having the same structure as that of the above-mentioned aromatic compound (A) or an aromatic compound (B) being structurally different from the above-mentioned aromatic compound (A) and having one or two leaving groups bonded to an aromatic ring, in the presence of said transition metal complex.

Abstract: In the preparation of aminoorganylsilanes and cyclic aminosilanes by reaction of an organyl amine with a haloorganylsilane, the byproduct halide salt of the amine reactant is decomposed to amine by addition of a base whose halide salt forms a liquid phase at a temperature below 200° C., and the liquid base halide is separated from the reaction mixture.

Abstract: A method of preparing an ultra-pure metal amidinate compound comprising using a microchannel device for synthesis in reacting a metal halide solution with a lithium amidinate solution to produce an ultra-pure alkylmetal compound for processes such as chemical vapor deposition.

Abstract: The present invention relates to compounds containing a moiety of the formula (1) and to the use thereof in organic electroluminescent devices and to organic electroluminescent devices which comprise compounds of this type.

Abstract: A liquid crystal molecule is disclosed, having a structure represented by the following general formula (1): wherein X1 is a group selected among groups represented by the following formula (2): X2 is represented by the following formula (3): R1 represents a linear or branched hydrocarbon group or an alkoxy group each having from 4 to 16 carbon atoms; R2 represents an optionally branched organosiloxane or organosilane having from 1 to 6 silicon atoms; other variables in formulae are defined therein.

Abstract: To provide an aminoaryl-containing organosilicon compound with high efficiency, after protecting amino groups of a haloaniline compound with a specific compound, to form a Grignard reagent and to deprotect the aforementioned groups by reacting the Grignard reagent with a silicon compound.

Abstract: The present invention provides a compound that exhibits an excellent antitumor effect and reduces side effects, such as skin disorders, of the existing retinoid by selectively activating on the nuclear receptor RAR?, thereby possibly producing significant improvement of clinical profits. Specifically, the present invention provides a bis(trimethylsilyl)phenyl compound represented by Formula (I): wherein X is N or CH; Y is O or S; R1, R2, and R3 are the same or different and are hydrogen or lower alkyl; R4 and R5 are the same or different and are hydrogen, lower alkyl, or halogen; and a bond between a carbon atom to which R1 is attached and a carbon atom to which R2 is attached is a single bond or a double bond; or a salt thereof.

Abstract: A method for preparing a functionalized polymer, the method comprising the steps of preparing a reactive polymer, and reacting the reactive polymer with a halosilane compound containing an amino group.

Abstract: A composition of matter comprises a polymer network, including silicon atoms and oxygen atoms, a first organic side-chain attached to at least some silicon atoms within the polymer network comprising a flexible linking group and a terminal group, the terminal group including at least one atom providing a lone pair of electrons. The composition of matter can be used to form a proton-conducting membrane. In illustrative examples, the polymer network can be an organic-inorganic hybrid network and the terminal group can includes a nitrogen-containing heterocycle.

Abstract: To provide an aminoaryl containing organosilicon compound with high efficiency, after protecting amino groups of a haloaniline compound with a specific compound, to form a Grignard reagent and to deprotect the aforementioned groups by reacting the Grignard reagent with a silicon compound.

Abstract: A material for organic electroluminescence device with specific structure having poor symmetry. An an organic electroluminescence device comprising a cathode, an anode and an organic thin film layer which is sandwiched between the cathode and the anode and comprises at least one layer, wherein at least one layer in the organic thin film layer contains a material for the organic electroluminescence device described above. An organic electroluminescence device with excellent efficiency of light emission, without pixel defects and which is superior in heat resistance is obtained.

Abstract: Cyclic organosilicon compounds that may be employed as an electron donor for polymerization catalyst systems, polymerization catalyst systems employing the cyclic organosilicon compounds as an electron donor, methods of making the polymerization catalyst systems, and polymerization processes to produce polyolefin are disclosed. The organosilicon compounds, which are useful as electron donors in polymerization catalyst systems for the production of polyolefins, are represented by the formula: where Q1, Q2, Q3, and Q4 may be identical or different and are each hetero-atoms selected from the group consisting of N, O, S, Si, B, and P. R1, R2, R3, and R4 may be identical or different and are each hydrocarbon-based substituents to Q1, Q2, Q3, and Q4, respectively. The subscripts i, j, m, and n are independently 0 to 3 R5 and R6 may be identical or different and are each a bridging group with a backbone chain length between the two hetero-atoms Q1 and Q3, and Q2 and Q4, respectively, 1-8 atoms.