Carbon Or Halogen Bonded Directly To The Metal Patents (Class 556/41)
  • Publication number: 20140329929
    Abstract: The invention relates to a dental restorative material which comprises a thermolabile or photolabile polymerizable compound of Formula I: [(Z1)m-Q1-X)]k-T-[Y-Q2-(Z2)n]1??Formula I, in which T represents a thermolabile or photolabile group, Z1 and Z2 in each case independently represent a polymerizable group selected from vinyl groups, CH2?CR1—CO—O— and CH2?CR1—CO—NR2— or an adhesive group selected from —Si(OR)3, —COOH, —O—PO(OH)2, —PO(OH)2, —SO2OH and —SH, wherein at least one Z1 or Z2 is a polymerizable group, Q1 in each case independently is missing or represents an (m+1)-valent linear or branched aliphatic C1-C20 radical which can be interrupted by —O—, —S—, —CO—O—, —O—CO—, —CO—NR3—, —NR3—CO—, —O—CO—NR3—, —NR3—CO—O— or —NR3—CO—NR3—, Q2 in each case independently is missing or represents an (n+1)-valent linear or branched aliphatic C1-C20 radical which can be interrupted by —O—, —S—, —CO—O—, —O—CO—, —CO—NR3—, —NR3—CO—, —O—CO—NR3—, —NR3—CO—O— or —NR3—CO—NR3—, X and Y in each case independently are missing
    Type: Application
    Filed: September 10, 2012
    Publication date: November 6, 2014
    Applicant: IVOCLAR VIVADENT AG
    Inventors: Norbert Moszner, Iris Lamparth, Thorsten Bock, Urs Karl Fischer, Ulrich Salz, Volker Rheinberger, Robert Liska
  • Patent number: 8674126
    Abstract: A material which electronically isolates a rubidium or cesium atom, which is bonded to only one or two oxygen atoms. This electronic isolation is manifested in narrow photoluminescence emission spectral peaks. The material may be an alkali metal compound comprises the empirical formula: AM(R1)(OR)x; where A is selected from Rb and Cs; M is selected from Al, Ti and V; each R is an independently selected alkyl or aryl group, R1 is selected from alkyl alcohol, aryl alcohol, or a carboxyl group, where OR and R1 are not the same, and x is 2, 3, or 4.
    Type: Grant
    Filed: September 27, 2011
    Date of Patent: March 18, 2014
    Assignee: Battelle Memorial Institute
    Inventor: Steven Risser
  • Patent number: 8642796
    Abstract: An object of the present invention is to provide an organoruthenium compound which has good film formation characteristics as an organoruthenium compound for chemical deposition, has a high vapor pressure, and can easily form a film even when hydrogen is used as a reactant gas. The present invention relates to an organoruthenium compound, dicarbonyl-bis(5-methyl-2,4-hexanediketonato)ruthenium (II) which can have isomers 1 to 3, wherein the content of the isomer 2 is 30% by mass or more, the content of the isomer 3 is 30% by mass or less, and the balance is the isomer 1.
    Type: Grant
    Filed: June 15, 2011
    Date of Patent: February 4, 2014
    Assignee: Tanaka Kikinzoku Kogyo K. K.
    Inventors: Masayuki Saito, Kazuharu Suzuki, Shunichi Nabeya
  • Publication number: 20140030188
    Abstract: A manufacturing process for the preparation of radiolabeled compounds of formula (I) includes reacting compounds of formula (II) with a source of readionuclide of a halogen in the presence of an oxidant under acidic condition, wherein: *I is 123I, 124I, 125I or 131I; R is lower alkyl, optionally substituted with one or more fluorine atoms; Q is C(O), O, NR?, S, S(O)2, C(O)2, (CH2)p; Y is C(O), O, NR?, S, S(O)2, C(O)2, (CH2)p; R? is H, C(O), S(O)2, C(O)2; Z is H, C1-C4 alkyl, benzyl, substituted benzyl or trialkylsilyl; m is 0, 1, 2, 3, 4 or 5; n is 0, 1, 2, 3, 4, 5 or 6; and p is 0, 1, 2, 3, 4, 5 or 6.
    Type: Application
    Filed: May 9, 2013
    Publication date: January 30, 2014
    Applicant: Molecular Insight Pharmaceuticals, Inc.
    Inventor: Molecular Insight Pharmaceuticals, Inc.
  • Publication number: 20130065864
    Abstract: The present invention relates to novel iridium and/or rhodium containing complexes for use as a cytotoxic, such as an anti-cancer agent. There is also provided a method of preparing said compounds.
    Type: Application
    Filed: May 20, 2011
    Publication date: March 14, 2013
    Applicant: UNIVERSITY OF WARWICK
    Inventors: Abraha Habtemariam, Zhe Liu, Joan Josep Soldevila, Ana Maria Pizarro, Peter John Sadler
  • Publication number: 20130045863
    Abstract: A composition has an empirical formula M (glycerol) a (X) b, where M represents a metal atom selected from titanium, zirconium, hafnium or aluminium, X is a ligand derived from acetylacetone or a peroxo ion; a is a number between 1 and 2. 5; b is a number in the range from 1 to 2. An alternative composition results from the reaction of a compound of titanium, zirconium, hafnium or aluminium with (a) glycerol and (b) either: (i) acetylacetone or (ii) hydrogen peroxide, an inorganic base and water. The composition is useful in applications requiring water-stable metal chelates, particularly as a catalyst for esterification and polyurethane reactions.
    Type: Application
    Filed: January 19, 2011
    Publication date: February 21, 2013
    Applicant: JOHNSON MATTHEY PLC
    Inventors: Alan Thomas Cooper, Mark Dixon
  • Publication number: 20130041104
    Abstract: The invention relates to novel chemical compounds, which can be fluorinated with 18F under especially mild conditions. The novel chemical compounds thereby enable the use of a novel fluorination method according to the invention, wherein the substrate to be fluorinated is immobilized on a polymer during the fluorination. The method is characterized in that the method requires fewer and simpler manipulations than methods of the prior art. The occupational safety in the laboratory or hospital is thereby increased especially during work with the radionuclide 18F.
    Type: Application
    Filed: January 17, 2011
    Publication date: February 14, 2013
    Applicant: APTENIA S.R.L.
    Inventor: Matteo Scabini
  • Publication number: 20130034497
    Abstract: This invention relates to derivatives of Iodine-labeled homoglutamic acids and glutamic acids and their analogues suitable for labeling or already labeled by Iodine, methods of preparing such compounds, compositions comprising such compounds, kits comprising such compounds or compositions and uses of such compounds, compositions or kits for diagnostic imaging or radiotherapy.
    Type: Application
    Filed: November 15, 2010
    Publication date: February 7, 2013
    Applicant: PIRAMAL IMAGING SA
    Inventors: Heribert Schmitt-Willich, Niels Böhnke, Norman Koglin, Andre Müller, Holger Siebeneicher, Matthias Friebe
  • Patent number: 8304567
    Abstract: An organoruthenium complex represented by the general formula (1-1), bis(acetylacetonato)(1,5-hexadiene)ruthenium and bis(acetylacetonato)(1,3-pentadiene)ruthenium have low melting points, show excellent stability against moisture, air and heat, and are suitable for the film formation by a CVD method. (1-1) wherein X represents a group represented by the general formula (1-2); Y represent a group represented by the general formula (1-2) or a linear or branched alkyl group having 1 to 8 carbon atoms; Z represents a hydrogen atom or an alkyl group having 1 to 4 carbon atoms; and L represents an unsaturated hydrocarbon compound having at least two double bonds: (1-2) wherein Ra and Rb independently represent a linear or branched alkyl group having 1 to 5 carbon atoms.
    Type: Grant
    Filed: July 26, 2007
    Date of Patent: November 6, 2012
    Assignee: Ube Industries, Ltd
    Inventors: Takumi Kadota, Chihiro Hasegawa, Hiroki Kanato, Hiroshi Nihei
  • Publication number: 20120177921
    Abstract: A process for preparing transition metal carbonates with a mean particle diameter in the range from 6 to 19 ?m (D50), which comprises combining, in a stirred vessel, at least one solution of at least one transition metal salt with at least one solution of at least one alkali metal carbonate or alkali metal hydrogencarbonate to prepare an aqueous suspension of transition metal carbonate, and, in at least one further compartment, continuously introducing a mechanical power in the range from 50 to 10 000 W/l in a proportion of the suspension in each case, based on the proportion of the suspension, and then recycling the proportion into the stirred vessel.
    Type: Application
    Filed: January 6, 2012
    Publication date: July 12, 2012
    Applicant: BASF SE
    Inventors: Martin SCHULZ-DOBRICK, Simon SCHRÖDLE
  • Patent number: 8088937
    Abstract: Disclosed herein are compounds of the formula: (R)x—Sn—(R?)4-x wherein: R is alkyl; R? is a moiety selected from the group consisting of: w is 0 or 1; x is 1 or 2; y is 1, 2, 3, or 4; and Z is a linear, branched, cyclic, or aromatic hydrocarbon. These compounds are excellent stabilizers for halogen-containing resins, such as PVC.
    Type: Grant
    Filed: July 8, 2010
    Date of Patent: January 3, 2012
    Assignee: Galata Chemicals, LLC
    Inventors: Edward Krainer, Peter Frenkel
  • Publication number: 20100324213
    Abstract: RTV-organopolysiloxane compositions are crosslinkable by polycondensation and are devoid of alkyltin-based catalysts; novel organopolysiloxane polycondensation catalysts are useful therefor.
    Type: Application
    Filed: December 18, 2008
    Publication date: December 23, 2010
    Inventors: Christian Maliverney, Delphine Blanc, Rachid Ferhat
  • Publication number: 20100173815
    Abstract: The present invention provides cyclopentadienyl molybdenum hexa-carbonyl complexes which can be represented by general formula (1) which is indicated below. General Formula (1) In this formula R1 to R10 each individually represent a group selected from the group comprising hydrogen, a methyl group and an ethyl group and may be the same or different.
    Type: Application
    Filed: February 1, 2008
    Publication date: July 8, 2010
    Inventors: Eiji Nagatomi, Noriaki Shinoda, Yoshihiko Aihara
  • Publication number: 20090275654
    Abstract: The present invention provides novel pharmaceutical gallium compositions, as well as methods for their preparation and methods for treating conditions and diseases such as cancer, hypercalcemia, osteoporosis, osteopenia, and Paget's disease.
    Type: Application
    Filed: April 28, 2009
    Publication date: November 5, 2009
    Applicant: Genta Incorporated
    Inventor: Bob D. Brown
  • Publication number: 20090175775
    Abstract: The present invention relates to a metal complex of the general formula M(L)n, wherein each L is independently selected and represents a ligand and at least one L is vitamin B12 (cyanocobalamin) or a derivative thereof bound through the nitrogen atom of its cyanide group to M, which is an element selected from the transition metals, thus, forming a M-NC—[Co] moiety with [Co] representing vitamin B12 without cyanide and wherein n is 1, 2, 3, 4, 5 or 6. The complex can be prepared by mixing a precursor molecule with vitamin B12. The metal complexes can be used for radiodiagnostics, chemotherapy and radionuclide therapy.
    Type: Application
    Filed: January 10, 2005
    Publication date: July 9, 2009
    Inventors: Roger Alberto, Susanne Barbara Kunze, Hector Knight Castro, Stefan Mundwiler
  • Publication number: 20090131702
    Abstract: A method of production of metal carboxylates and of their metal carboxylate-aminoate or metal carboxylate-methioninate hydroxy analog derivatives, and their use as growth promoters in animal nutrition. It comprises mixing stoichiometric quantities of formic or butyric acid and oxide and of the dry basic salt of divalent metal, the oxide or hydroxide of Zn2+ or Cu2+, to give an exothermic reaction, without addiction of solvents, giving rise to a dry carboxylate of divalent metal that is easy to use. It also describes the use of a stage of mixing with metal aminoates or hydroxy analogs of methionine in the process, for forming either a carboxylate-aminoate of divalent metal or a carboxylate-methioninate hydroxy analog of divalent metal, products that are finally obtained in a dry form that is easy to use.
    Type: Application
    Filed: January 21, 2009
    Publication date: May 21, 2009
    Inventor: Enrique PABLOS
  • Publication number: 20090118527
    Abstract: The present invention provides a method for producing a fullerene derivative comprising reacting: a serene; an organometallic reagent (A) comprising B, Al, Zn, Sn, Pb, Te, Ti, Mn, Zr or Sm; and a copper compound (B).
    Type: Application
    Filed: March 15, 2007
    Publication date: May 7, 2009
    Applicant: JAPAN SCIENCE AND TECHNOLOGY AGENCY
    Inventors: Eiichi Nakamura, Yutaka Matsuo, Takahiro Nakae
  • Patent number: 7523563
    Abstract: The present invention relates to a process for preparing a granular hydrohalide salt of a particular metal complex compound which is composed of a divalent metal cation as central ion and of an amino dicarboxylic acid ion and, where appropriate, water as ligand, where the hydrohalide salt is obtained with a specific particle size distribution.
    Type: Grant
    Filed: August 18, 2005
    Date of Patent: April 28, 2009
    Assignee: Verla-Pharm Arzneimittelfabrik Apotheker H.J.v. Ehrlich GmbH & Co. KG
    Inventor: Guenter Hopf
  • Patent number: 7244858
    Abstract: This invention relates to organometallic precursor compounds represented by the formula (L)M(L?)2(NO) wherein M is a Group 6 metal, L is a substituted or unsubstituted anionic ligand and L? is the same or different and is a ? acceptor ligand, a process for producing the organometallic precursor compounds, and a method for producing a film, coating or powder from the organometallic precursor compounds.
    Type: Grant
    Filed: January 19, 2005
    Date of Patent: July 17, 2007
    Assignee: Praxair Technology, Inc.
    Inventor: Scott Houston Meiere
  • Patent number: 7084306
    Abstract: Disclosed is a process for preparing 2,2,6,6-tetramethyl-3,5-heptanedione, comprising reacting a pivalic acid alkyl ester with pinacolone in the presence of an alkali metal alkoxide catalyst using a pivalic acid alkyl ester as a solvent but using no other solvent or reacting them in an amide type or urea type solvent in the presence of an alkali metal alkoxide catalyst. Also disclosed is a process for preparing a 2,2,6,6-tetramethyl-3,5-heptanesione metal complex using the 2,2,6,6-tetramethyl-3,5-heptanedione obtained by the above process. The process for preparing 2,2,6,6-tetramethyl-3,5-heptanedione is an industrially advantageous process in which an alkali metal alkoxide that is easy to handle can be used as a catalyst for preparing 2,2,6,6-tetramethyl-3,5-heptanedione from a pivalic acid alkyl ester and pinacolone.
    Type: Grant
    Filed: December 18, 2002
    Date of Patent: August 1, 2006
    Assignee: Showa Denko K.K.
    Inventors: Makoto Saito, Takashi Ueda, Takashi Tani
  • Patent number: 7067702
    Abstract: A process for preparing vinyl substituted beta-diketones includes reacting a halogen-containing beta-diketone with an olefin in a reaction zone under Heck coupling reaction conditions in the presence of a catalyst, a base, and an organic phosphine to provide a vinyl substituted beta-diketone product.
    Type: Grant
    Filed: May 12, 2005
    Date of Patent: June 27, 2006
    Assignee: The Johns Hopkins University
    Inventors: Glen E. Southard, George M. Murray
  • Patent number: 6870054
    Abstract: Disclosed is a process for forming an organometallic cyclometallated iridium compound comprising reacting an iridium halide complex with a silver salt and excess organic cyclometallating ligand in a diol solvent. The process provides better yields and control of desired isomers.
    Type: Grant
    Filed: December 5, 2003
    Date of Patent: March 22, 2005
    Assignee: Eastman Kodak Company
    Inventors: Joseph C. Deaton, Richard L. Parton
  • Patent number: 6849752
    Abstract: The invention relates to a process for synthesizing an ionic metal complex represented by the general formula (1) or (5). This process includes reacting in an organic solvent a compound (corresponding to ligand of the complex) represented by the general formula (2) or (6) with a halogen-containing compound represented by the general formula (3) or (4), in the presence of a reaction aid containing an element selected from the group consisting of elements of groups 1-4 and 11-14 of the periodic table. It is possible by this process to easily and efficiently synthesize the ionic metal complex, which can be used as a supporting electrolyte for electrochemical devices, a polymerization catalyst of polyolefins and so forth, or a catalyst for organic synthesis.
    Type: Grant
    Filed: November 1, 2002
    Date of Patent: February 1, 2005
    Assignee: Central Glass Company, Ltd.
    Inventors: Shoichi Tsujioka, Hironari Takase, Mikihiro Takahashi, Yoshimi Isono
  • Patent number: 6838573
    Abstract: This invention relates to copper(+1)(?-diketonate)(L) and related copper complexes such as copper (+1)(?-ketoiminate)(L) represented by the formula: wherein X represents O or NR9, R1 and R3 are each independently comprised of the group C1-8 alkyl, C1-8 fluoroalkyl, aryl, C1-8 alkoxy, and C1-8 alkyl ethers and R2 is H, C1-8 alkyl, C1-8 alkoxy, and halogen, R9 is C1-8 alkyl, C1-8 fluoroalkyl, phenyl, alkylphenyl, trialkylsilyl, and L represents a ligand having the structure: (R4)(R5)C?(R6)(R7) or R4—C?C—R7 wherein R4, is comprised of the group C1-8 alkanol, C1-8 alkoxyalkanol, C1-8 unsaturated alkoxyalkanol, trialkylsilanol, C1-8 aalkylamine, phenylamine; R5, R6, and R7 are comprised of the group H, C1-8 alkyl, triakylsilyl, alkoxy or phenyl.
    Type: Grant
    Filed: January 30, 2004
    Date of Patent: January 4, 2005
    Assignee: Air Products and Chemicals, Inc.
    Inventors: Morteza Farnia, Robert Sam Zorich, James Richard Thurmond, John Anthony Thomas Norman
  • Patent number: 6764537
    Abstract: A method for chemical vapor deposition of copper metal thin film on a substrate includes heating a substrate onto which the copper metal thin film is to be deposited in a chemical vapor deposition chamber; vaporizing a precursor containing the copper metal, wherein the precursor is a compound of (&agr;-methylstyrene)Cu(I)(hfac), where hfac is hexafluoroacetylacetonate, and (hfac)Cu(I)L, where L is an alkene; introducing the vaporized precursor into the chemical vapor deposition chamber adjacent the heated substrate; and condensing the vaporized precursor onto the substrate thereby depositing copper metal onto the substrate. A copper metal precursor for use in the chemical vapor deposition of a copper metal thin film is a compound of (&agr;-methylstyrene)Cu(I)(hfac), where hfac is hexafluoroacetylacetonate, and (hfac)Cu(I)L, where L is an alkene taken from the group of alkenes consisting of 1-pentene, 1-hexene and trimethylvinylsilane.
    Type: Grant
    Filed: June 2, 2003
    Date of Patent: July 20, 2004
    Assignee: Sharp Laboratories of America, Inc.
    Inventors: Wei-Wei Zhuang, Lawrence J. Charneski, David R. Evans, Sheng Teng Hsu
  • Patent number: 6642401
    Abstract: A &bgr;-diketonatocopper(I) complex which contains as a ligand (L) an allene compound and is represented by formula (2) wherein, R6 and R7 may be the same or different and each represents linear or branched C1-4 alkyl, C1-4 alkoxy, or linear or branched C1-4 fluoroalkyl, R8 represents hydrogen or fluorine, and L represents the allene compound, and a process for producing the same. The complex is useful in forming a thin copper film by metal-organic vapor deposition (hereinafter abbreviated as MOCVD) method.
    Type: Grant
    Filed: August 8, 2002
    Date of Patent: November 4, 2003
    Assignee: Nissan Chemical Industries, Ltd.
    Inventors: Hisayuki Watanabe, Hideki Musashi, Yasuo Kawamura
  • Patent number: 6559328
    Abstract: An indium precursor composition having utility for incorporation of indium in a microelectronic device structure, e.g., as an indium-containing film on a device substrate by bubbler or liquid delivery MOCVD techniques, or as a dopant species incorporated in a device substrate by ion implantation techniques. The precursor composition includes a precursor of the formula R1R2InL wherein: R1 and R2 may be same or different and are independently selected from C6-C10 aryl, C6-C10 fluoroaryl, C6-C10 perfluoroaryl, C1-C6 alkyl, C1-C6 fluoroalkyl, or C1-C6 perfluoroalkyl; and L is &bgr;-diketonato or carboxylate. Indium-containing metal films may be formed on a substrate, such as indium-copper metallization, and shallow junction indium ion-implanted structures may be formed in integrated circuitry, using the precursors of the invention.
    Type: Grant
    Filed: April 3, 2001
    Date of Patent: May 6, 2003
    Assignee: Advanced Technology Materials, Inc.
    Inventors: Thomas H. Baum, Chongying Xu
  • Patent number: 6534666
    Abstract: This invention relates to an improvement in a purification process for producing those liquid copper based complexes of &bgr;-diketones and, particularly the monovalent copper complexes of &bgr;-diketones, which are suited for application by chemical vapor deposition in the electronics industry. In the basic process for preparing a copper based complex, a reactive copper compound is reacted with a fluorinated &bgr;-diketonate and an organo source such as an olefinic source or one having acetylenic unsaturation. Purification is effected by contacting reaction product with a double deionized deoxygenated water source and preferably an acid/water source. An aqueous layer and an organic layer are formed with the aqueous layer containing byproducts and the organic phase containing product.
    Type: Grant
    Filed: December 27, 2001
    Date of Patent: March 18, 2003
    Assignee: Air Products and Chemicals, Inc.
    Inventors: Robert Sam Zorich, James Richard Thurmond, David Allen Roberts
  • Patent number: 6359159
    Abstract: Chemical vapor deposition processes utilize as precursors volatile metal complexes with ligands containing metalloid elements silicon, germanium, tin or lead.
    Type: Grant
    Filed: December 4, 2000
    Date of Patent: March 19, 2002
    Assignee: Research Foundation of State University of New York
    Inventors: John T. Welch, Paul J. Toscano, Rolf Claessen, Andrei Kornilov, Kulbinder Kumar Banger
  • Patent number: 6329490
    Abstract: Disclosed are polyhedral organosilicon compounds which are possible to be polymerized and can form a film excellent in adhesiveness to a substrate, having a high hardness, a high transparency and having water and oil repellency, and comprise organofluoro groups or both of organofluoro groups and reactive functional groups, the compounds being soluble in an organic solvent and stable. Organosilicon compounds which have perfluoroalkyl groups or both perfluoroalkyl groups and reactive functional groups and which have a polyhedral structure have the following formulas of (I), (II) and (III): [Rf1—X1—(CH2)a—SiO1.5]m  (I) [Rf1—X1—(CH2)a—SiO1.5]m[Rf2—(X2)c—(CH2)b—SiO1.5]n  (II) [Rf1—X1—(CH2)a—SiO1.5]m[R—(X2)c—(CH2)b—SiO1.
    Type: Grant
    Filed: March 31, 2000
    Date of Patent: December 11, 2001
    Assignees: Mitsubishi Materials Corporation, Dai Nippon Toryo Co., Ltd.
    Inventors: Yukiya Yamashita, Kenji Hayashi, Masaoki Ishihara
  • Patent number: 6184403
    Abstract: Chemical vapor deposition processes utilize as precursors volatile metal complexes with ligands containing metalloid elements silicon, germanium, tin or lead.
    Type: Grant
    Filed: May 19, 1999
    Date of Patent: February 6, 2001
    Assignee: Research Foundation of State University of New York
    Inventors: John T. Welch, Paul J. Toscano, Rolf Claessen, Andrei Kornilov, Kulbinder Kumar Banger
  • Patent number: 6063887
    Abstract: A 1-acyloxy-organotetrasiloxane represented by the general formula: ##STR1## wherein R.sup.1 is a monovalent organic group containing an acryloyloxy group or a monovalent organic group containing a methacryloyloxy group, and R.sup.2 is a monovalent hydrocarbon group, and a process for producing the above mentioned 1-acyloxy-organotetrasiloxane, which is characterized by subjecting hexamethylcyclotrisiloxane to a ring-opening reaction with an acyloxysilane represented by the general formula: ##STR2## wherein R.sup.1 is a monovalent organic group containing an acryloyloxy group or a monovalent organic group containing a methacryloyloxy group, and R.sup.2 is a monovalent hydrocarbon group, in the presence of an acidic catalyst.
    Type: Grant
    Filed: May 18, 1998
    Date of Patent: May 16, 2000
    Assignee: Dow Corning Toray Silicone Co., Ltd.
    Inventor: Tadashi Okawa
  • Patent number: 5892078
    Abstract: The present invention relates to a stereorigid metallocene compound which has as ligands at least two substituted or unsubstituted cyclopentadienyl groups which are connected to one another via a five-membered ring, where at least one cyclopentadienyl group is fuzed to the five-membered ring and the ligand system of the stereorigid metallocene compound is different from 4-?(.eta..sup.5 -3'-alkyl-cyclopentadienyl)-4,6,6-trimethyl-(.eta..sup.5 -2-alkyl-4,5-tetrahydropentalene)!. The metallocene compound of the invention is suitable as a catalyst component for olefin polymerization.
    Type: Grant
    Filed: October 14, 1997
    Date of Patent: April 6, 1999
    Assignee: Targor GmbH
    Inventors: Markus res, Frank ber, Berthold Schiemenz
  • Patent number: 5883277
    Abstract: Metallocene complexes having a cationic bridge of the formula ##STR1## where the substituents have the following meanings: M is a metal of transition group III, IV, V or VI of the Periodic Table of the Elements or a metal of the lanthanide group,X is fluorine, chlorine, bromine, iodine, hydrogen, C.sub.1 -C.sub.10 -alkyl, C.sub.6 -C.sub.15 -aryl or --OR.sup.5,R.sup.1 to R.sup.12, Y, Z and n having the meanings set out in the specification, said complexes can be prepared via ligand systems of the formula II ##STR2## as intermediates.
    Type: Grant
    Filed: August 14, 1997
    Date of Patent: March 16, 1999
    Assignee: BASF Aktiengesellschaft
    Inventors: David Fischer, Franz Langhauser, Gunther Schweier, Hans-Herbert Brintzinger, Nadine Leyser
  • Patent number: 5756610
    Abstract: A novel titanium (III)-based .beta.-diketonate-coordinated compound is disclosed for catalyzing the polymerization reaction of syndiotactic polystyrenes. The titanium (III)-based compound is represented by the following formula 1: ##STR1## wherein X is a C.sub.1 .about.C.sub.12 alkoxy or amine group, or a halogen atom; R is a C.sub.1 .about.C.sub.12 alkyl, aryl, or alkylsilane group. Preferably, X is N(SiMe.sub.3).sub.2 -- or OMe--, and R is phenyl, methyl, or t-butyl. The titanium (III)-based compounds are prepared by reacting titanium trichloride with diketone and tetrahydrofuran to form an intermediate product, then reacting the intermediate product Ti(AcAc)Cl.sub.2 (THF).sub.2 with either aminosilane or alcohol.
    Type: Grant
    Filed: January 10, 1997
    Date of Patent: May 26, 1998
    Assignee: Industrail Technoloy Research Institute
    Inventors: Jing-Chemg Tsai, Kuang Kai Liu, Shu-Ling Peng, Shian-Jy Wang
  • Patent number: 5113004
    Abstract: Organosilicon compounds represented by the following general formula, which acquire high thermal resistance suitable for silane coupling agents by containing a phenylene group between an alkoxysilyl group and a (metha)acrylic group; ##STR1## (wherein R.sup.1 represents a monovalent hydrocarbon residue containing one or two carbon atoms, R.sup.2 represents a divalent hydrocarbon residue containing two or three carbon atoms, R.sup.3 represents a hydrogen atom or a methyl group, m represents an integer from 1 to 3, and n represents 0 to 1).
    Type: Grant
    Filed: June 17, 1991
    Date of Patent: May 12, 1992
    Assignee: Shin-Etsu Chemical Company, Limited
    Inventors: Hideyoshi Yanagisawa, Masaaki Yamaya
  • Patent number: 5051523
    Abstract: There is disclosed a process for the preparation of analytically pure chelate complexes which can be used in diagnostic medicine, for example as contrast media or radiopharmaceuticals. The process comprises transcomplexing a complex of a .beta.-dicarbonyl compound and a metal ion, for example a metal acetylacetonate, which is readily soluble in an organic solvent that is not miscible in all proportions with water, with a stoichiometric amount or with a less than equivalent amount of a chelating agent whose binding affinity for the metal ion is greater than that of the .beta.-dicarbonyl compound.
    Type: Grant
    Filed: January 13, 1989
    Date of Patent: September 24, 1991
    Assignee: Ciba-Geigy Corporation
    Inventors: Heinrich H. Peter, Theophile Moerker
  • Patent number: 4952713
    Abstract: The present invention constitutes a class of organometallic complexes which reversibly react with hydrogen to form dihydrides and processes by which these compounds can be utilized. The class includes bimetallic complexes in which two cyclopentadienyl rings are bridged together and also separately .pi.-bonded to two transition metal atoms. The transition metals are believed to bond with the hydrogen in forming the dihydride. Transition metals such as Fe, Mn or Co may be employed in the complexes although Cr constitutes the preferred metal. A multiple number of ancilliary ligands such as CO are bonded to the metal atoms in the complexes. Alkyl groups and the like may be substituted on the cyclopentadienyl rings. These organometallic compounds may be used in absorption/desorption systems and in facilitated transport membrane systems for storing and separating out H.sub.2 from mixed gas streams such as the produce gas from coal gasification processes.
    Type: Grant
    Filed: June 2, 1988
    Date of Patent: August 28, 1990
    Assignee: Battelle Memorial Institute
    Inventors: Michael A. Lilga, Richard T. Hallen
  • Patent number: 4921942
    Abstract: Organometallic compounds and compositions comprising a metal, an amido carboxyl moiety bonded to the metal, an active moiety bonded to the metal, and at least one modifier moiety sufficient to satisfy the valency of the metal. These compounds and compositions are capable of combining the substantivity of the amido carboxyl metal system, functional efficacy of an active moiety, and film-forming properties in a single compound or composition.
    Type: Grant
    Filed: January 19, 1988
    Date of Patent: May 1, 1990
    Assignee: Stepan Company
    Inventors: Randal J. Bernhardt, Melvin L. Loeb, James W. Kay
  • Patent number: 4845254
    Abstract: Novel compounds for absorbing carbon monoxide and olefinically-unsaturated compounds from feedstreams are of the formula ##STR1## wherein R.sub.1 is trichloromethyl or R.sub.F ; R.sub.F is C.sub.n F.sub.2n+1 and n is 1-8; R.sub.2 is H or hydrocarbyl of 2-20 carbon atoms having at least one olefinic unsaturated bond; M.sup.I is Cu.sup.I or Ag.sup.I and R.sub.3 is hydrocarbyl of 2-20 carbon atoms having at least one olefinic unsaturated bond.
    Type: Grant
    Filed: March 14, 1988
    Date of Patent: July 4, 1989
    Assignee: Air Products and Chemicals, Inc.
    Inventors: John A. T. Norman, Robert E. Stevens
  • Patent number: 4568660
    Abstract: A polymerization catalyst composition including ##STR1## wherein R is an alkyl group having 3 to 20 carbon atoms; m is 4 or 6 and n is 0 or 1. Preferably the composition also includes, ##STR2## wherein R.sub.1 and R.sub.2 are independently hydrogen, an alkyl or alkoxy group of form 1 to 5 carbons. Preferably r is 1; m is 4 and R is nonyl and the molar ratio of WCl.sub.m O.sub.n to ##STR3## is from about 1:1 to about 1:3.
    Type: Grant
    Filed: November 16, 1984
    Date of Patent: February 4, 1986
    Assignee: Hercules Incorporated
    Inventor: Daniel W. Klosiewicz
  • Patent number: 4551502
    Abstract: Novel complexes are prepared from water-soluble compounds having at least one amidocarbonylic unit and a square planar organometallic compound.
    Type: Grant
    Filed: September 19, 1983
    Date of Patent: November 5, 1985
    Inventors: Bobby A. Howell, Erik W. Walles