Chalcogen Bonded Directly To Silicon Patents (Class 556/417)
  • Patent number: 9745216
    Abstract: Hydrophobically modified Si-containing polyamines are useful for treating scale in industrial process streams. Preferred hydrophobically modified Si-containing polyamines are particularly useful for treating aluminosilicate scale in difficult-to-treat industrial process streams, such as in the Bayer alumina process streams, nuclear waste streams and kraft paper mill effluent streams.
    Type: Grant
    Filed: April 11, 2016
    Date of Patent: August 29, 2017
    Assignee: Cytec Technology Corp.
    Inventors: Howard Heitner, Donald P. Spitzer
  • Publication number: 20140377791
    Abstract: The present invention relates to a compound which is a novel two-photon absorbing fluorescent substance, a production method for the compound, a fluorescence sensor and molecular probe able to sense various substrates or enzyme activity or the like using the same, and a method of sensing enzyme activity or the like using the same. More specifically, the present invention relates to a novel two-photon absorbing fluorescent substance which has the high photo-stability and large two-photon absorption cross-section value of acedan which is a two-photon absorbing fluorescent substance, and has the high fluorescence efficiency of coumarin which is a one-photon absorbing fluorescent substance, while exhibiting absorption and emission characteristics at a longer wavelength than existing acedan and coumarin and so being advantageous in in-vivo imaging.
    Type: Application
    Filed: March 21, 2013
    Publication date: December 25, 2014
    Inventors: Kyo Han Ahn, Dokyoung Kim
  • Publication number: 20140356735
    Abstract: Described herein are liquid, organosilicon compounds that including a substituent that is a cyano (—CN), cyanate (—OCN), isocyanate (—NCO), thiocyanate (—SCN) or isothiocyanate (—NCS). The organosilicon compounds are useful in electrolyte compositions and can be used in any electrochemical device where electrolytes are conventionally used.
    Type: Application
    Filed: June 4, 2014
    Publication date: December 4, 2014
    Inventors: Jose Adrian Pena Hueso, David Osmalov, Jian Dong, Monica Usrey, Michael Pollina, Robert C. West
  • Publication number: 20140249273
    Abstract: The below compound, which may be made by reacting a 3-trialkoxysilylpropyl amine with an acrylic acid ester, a methacrylic acid ester, a diester of maleic acid, a diester of fumaric acid, or acrylonitrile to form a secondary amino propylalkoxysilane, and reacting the secondary amino propylalkoxysilane with an isocyanate. R1 is an alkyl group, X is —CHR3—CHR4—CO—O—R2 or —CH2—CH2—CN, R2 is an organic group, R3 is —H or —CO—O—R2, R4 is —H or —CH3, but R4 is —H if R3 is —CO—O—R2, R5 is an aliphatic group or a residue of hexamethylene diisocyanate cyclic trimer or hexamethylene diisocyanate cyclic dimer, and n is 2 or 3. The below compound, which may be made by reacting a 3-trialkoxysilylpropyl amine with acrylonitrile. R1 is an alkyl group.
    Type: Application
    Filed: February 26, 2014
    Publication date: September 4, 2014
    Applicant: The Government of the United States of America, as represented by the Secretary of the Navy
    Inventors: Arthur A. Webb, Jozef Verborgt
  • Patent number: 8747694
    Abstract: In accordance with one aspect, the present invention provides a composition which contains the amino-siloxane structures I, or III, as described herein. The composition is useful for the capture of carbon dioxide from process streams. In addition, the present invention provides methods of preparing the amino-siloxane composition. Another aspect of the present invention provides methods for reducing the amount of carbon dioxide in a process stream employing the amino-siloxane compositions of the invention, as species which react with carbon dioxide to form an adduct with carbon dioxide.
    Type: Grant
    Filed: June 17, 2010
    Date of Patent: June 10, 2014
    Assignee: General Electric Company
    Inventors: Robert James Perry, Michael Joseph O'Brien
  • Publication number: 20140031545
    Abstract: Processes for making an organozinc reagents are disclosed comprising reacting (A) organomagnesium or organozinc complexes with (B) at least one coordination compound comprising one or more carboxylate groups and/or alcoholate groups and/or tertiary amine groups, optionally in combination with zinc ions and/or lithium ions and/or halide ions, wherein the halide ions are selected from chloride, bromide and iodide, the organozinc complex comprises an aryl group, a heteroaryl group or a benzyl group when the coordinating compound is a chelating polyamine, and the reaction is conducted in the presence of zinc complexed with at least one coordinating compound when reactant (A) comprises at least one organomagnesium complex. The resulting organozinc reagents may optionally be isolated from solvents to obtain a solid reagent. The reagents may be used for making organic compounds via Negishi cross-coupling reactions or via aldehyde and/or ketone oxidative addition reactions.
    Type: Application
    Filed: December 21, 2011
    Publication date: January 30, 2014
    Applicant: LUDWIG-MAXIMILIAN-UNIVERSITAT MUNCHEN
    Inventors: Paul Knochel, Sebastian Bernhardt, Georg Manolikakes
  • Patent number: 8575292
    Abstract: There is provided a hydroxyl-functional carbamoyl organosilicon compound, an anti-corrosion and/or adhesion promoting coating composition based thereon, a method for coating a metal surface employing the coating composition and the resulting coated metal article.
    Type: Grant
    Filed: April 24, 2007
    Date of Patent: November 5, 2013
    Assignee: Momentive Performance Materials Inc.
    Inventors: Shiu-Chin H. Su, Suresh K. Rajaraman, Alexander S. Borovik, Kendall L. Guyer, Eric R. Pohl
  • Publication number: 20130075364
    Abstract: Methods for forming a pattern in a lithography process for semiconductor wafer manufacturing are provided. In an example, a method includes forming a photoresist layer over a material layer; performing a first exposure process on the photoresist layer, thereby forming an exposed photoresist layer having soluble portions and unsoluble portions; treating the exposed photoresist layer, wherein the treating includes one of performing a second exposure process on the exposed photoresist layer and forming an adsorbing chemical layer over the exposed photoresist layer; and developing the exposed and treated photoresist layer to remove the soluble portions of the photoresist layer, wherein the unsoluble portions of the photoresist layer form a photoresist pattern that exposes portions of the material layer.
    Type: Application
    Filed: September 22, 2011
    Publication date: March 28, 2013
    Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
    Inventors: Chien-Wei Wang, Ko-Bin Kao, Wei-Liang Lin, Jui-Ching Wu, Chia-Hsiang Lin, Ai-Jen Jung
  • Publication number: 20130060014
    Abstract: A surface-modified inorganic material and a preparation method thereof. A surface-modified inorganic material is provided which is obtained by allowing an organosilane compound having allyl or an allyl derivative to react with an inorganic material, particularly solid silica or ITO glass, in the presence of an acid and an organic solvent, to introduce an organic group into the inorganic material even at room temperature, as well as a preparation method thereof. The invention can effectively introduce the organic group into the inorganic material even at room temperature, and thus is very effective in introducing compounds having a thermally sensitive functional group, for example, natural compounds or proteins. It is possible to introduce various organic groups into an inorganic material and to separate and purify organic molecule-bonded organosilane compounds using a silica gel column to effectively bond them to inorganic materials.
    Type: Application
    Filed: August 31, 2012
    Publication date: March 7, 2013
    Applicant: Industry-Academic Cooperation Foundation, Yonsei University
    Inventors: Chul-Ho Jun, Ye-Lim Yeon, Ji-Sung Lee, Young-Jun Park
  • Publication number: 20120251825
    Abstract: The present invention relates to a hollow sphere with a mesoporous structure, and a method for manufacturing the same. The hollow sphere with a mesoporous structure comprises: a shell with plural mesopores penetrating the shell, wherein the shell comprises: a mesoporous silicon oxide material, and mesopores of the mesoporous silicon oxide material are arranged in Ia3d cubic symmetry. In addition, according to the method of the present invention, the aforementioned hollow sphere with the mesoporous structure can be easily obtained by use of mixed surfactants of a cationic surfactant and a non-ionic surfactant.
    Type: Application
    Filed: August 5, 2011
    Publication date: October 4, 2012
    Inventors: Chia-Min YANG, Li-Lin Chang, Pei-Hsin Ku, Nien-Chu Lai, Kuan-Yi Li
  • Publication number: 20120225020
    Abstract: This disclosure provides choline analogs comprising the following structure: where each R1 independently is H or isotopically enriched D, R2 is a protecting group, and N is 14N or isotopically enriched 15N. This disclosure also provides methods of making choline analogs, which include performing a protection step on a betaine aldehyde to form a choline analog, and methods of using choline analogs to form hyperpolarized compounds.
    Type: Application
    Filed: February 24, 2012
    Publication date: September 6, 2012
    Inventors: Eduard Y. Chekmenev, Roman V. Shchepin
  • Publication number: 20120178956
    Abstract: A method for preparing a functional structured surface includes the controlled removal of material from a film including at least one buried pore, the inner surface of the pore including at least one chemical linkage group, where the material is removed so as to expose part of the inner surface of the pore that is not affected by the removal of material.
    Type: Application
    Filed: September 8, 2010
    Publication date: July 12, 2012
    Inventors: Sandrine Dourdain, Pierre Terech
  • Publication number: 20110308390
    Abstract: In accordance with one aspect, the present invention provides a composition which contains the amino-siloxane structures I, or III, as described herein. The composition is useful for the capture of carbon dioxide from process streams. In addition, the present invention provides methods of preparing the amino-siloxane composition. Another aspect of the present invention provides methods for reducing the amount of carbon dioxide in a process stream employing the amino-siloxane compositions of the invention, as species which react with carbon dioxide to form an adduct with carbon dioxide.
    Type: Application
    Filed: June 17, 2010
    Publication date: December 22, 2011
    Applicant: GENERAL ELECTRIC COMPANY
    Inventors: Robert James Perry, Michael Joseph O'Brien
  • Publication number: 20110287205
    Abstract: Mercaptosilanes are disclosed of the formula I wherein R1 is an alkyl polyether group —O—(R5—O)m—R6. They are prepared by a procedure in which a silane of the formula II is subjected to a catatyzed reaction with an alkyl polyether R1—H, R7—OH being split off, the molar ratio of the alkyl polyethers R1—H to the silane of the formula II is at least 0.5 and R7—OH is separated off from the reaction mixture continuously or discontinuously. They can be used in shaped articles.
    Type: Application
    Filed: August 2, 2011
    Publication date: November 24, 2011
    Inventors: Oliver Klockmann, Philipp Albert, Andre Hasse, Karsten Korth, Relmund Pieter
  • Publication number: 20110232178
    Abstract: Compounds and methods that release 1-methylcyclopropene, 1-trifluoromethylcyclopropene, and other substituted cyclopropenes are disclosed. The compounds and methods overcome present limitations for storage, transportation, and application of the cyclopropene containing compounds by using light, including sunlight, and/or heat as the primary release trigger. Additional products released include innocuous gases and value added aryl-group compounds.
    Type: Application
    Filed: March 23, 2011
    Publication date: September 29, 2011
    Inventors: John Perrin Davis, Cheryl D. Stevenson
  • Patent number: 8026245
    Abstract: The present invention relates to the use of a compound of formula (I) for the manufacture of a medicament for the prevention or the treatment of HIV infection wherein the compound of formula (I) is a compound of formula a N-oxide, a pharmaceutically acceptable addition salt, a quaternary amine or a stereochemically isomeric form thereof, wherein A and B each represents a radical of formula and wherein —C-D- represents a bivalent radical of formula —N?CH—NR17—??(c-1); or —NR17—CH?N—??(c-2); provided that when A represents a radical of formula (a) then B represents a radical of formula (b) and when A represents a radical of formula (b) then B represents a radical of formula (a).
    Type: Grant
    Filed: September 21, 2004
    Date of Patent: September 27, 2011
    Assignee: Janssen Pharmaceutica N.V.
    Inventors: Paul Adriaan Jan Janssen, Frank Xavier Jozef Herwig Arts, legal representative, Paulus Joannes Lewi, Marc René de Jonge, Lucien Maria Henricus Koymans, Frederik Frans Desiré Daeyaert, Jan Heeres, Hendrik Maarten Vinkers, Ruben Gerardus George Leenders, Dirk Alfons Leo Vandenput
  • Publication number: 20110178313
    Abstract: A polysiloxane represented by the formula (1) or (2): where R, R1, R2, m and n are defined in the specification.
    Type: Application
    Filed: March 28, 2011
    Publication date: July 21, 2011
    Inventors: Nobumasa Ootake, Kazuhiro Yoshida, Kenichi Watanabe, Yasuhito Yamaryo
  • Patent number: 7915330
    Abstract: A silicone fluid comprising a chromophore-substituted polyorganosiloxane having a formula (2): wherein x is an integer in the range of 60 to 2000; y is an integer in the range of 5 to 100; a ratio x:y is in a range of about 10:1 to about 20:1; and X is a photostabilizing chromophore.
    Type: Grant
    Filed: September 5, 2008
    Date of Patent: March 29, 2011
    Assignee: Hallstar Innovations Corp.
    Inventors: Craig A. Bonda, Anna Pavlovic, Anthony J. O'Lenick, Jr.
  • Publication number: 20100274028
    Abstract: The invention relates to a process for treating a composition comprising organosilanes and at least one polar organic compound and/or at least one extraneous metal and/or a compound containing extraneous metal, wherein the composition is contacted with at least one adsorbent and a composition in which the content of the organic polar compound and/or of the extraneous metal and/or of the compound containing extraneous metal is reduced is subsequently obtained, and also to a corresponding composition in which the content of polar organic compounds and/or extraneous metals has been reduced to traces, and to the use of organic resins, activated carbons, silicates and/or zeolites for reducing the amounts of the compounds mentioned.
    Type: Application
    Filed: August 19, 2008
    Publication date: October 28, 2010
    Applicant: EVONIK DEGUSSA GmbH
    Inventors: Ekkehard Mueh, Hartwig Rauleder, Helmut Mack, Jaroslaw Monkiewicz
  • Patent number: 7686878
    Abstract: A coating composition is provided which includes an adhesion promoter or a crosslinker silane which, upon hydrolysis, of its hydrolyzable sites, produces a reduced amount of volatile organic compound compared to that produced by the hydrolysis of a silane possessing an equivalent number of hydrolyzable sites all of which are hydrolyzable alkoxy groups.
    Type: Grant
    Filed: December 6, 2005
    Date of Patent: March 30, 2010
    Assignee: Momentive Performance Materials, Inc.
    Inventor: Kendall L. Guyer
  • Patent number: 7449539
    Abstract: The present inventors have obtained a PSQ derivative of a completely condensed type into which a functional group is readily introduced by using a novel PSQ derivative of an incompletely condensed type in which four alkaline metal atoms are bonded to silsesquioxane of a cage type having eight Si's. The above silsesquioxane derivative is represented by Formula (1). A silsesquioxane derivative to which alkaline metal atoms are bonded is represented by Formula (2). In Formula (1) and Formula (2), R is a group selected from alkyl, aryl and arylalkyl; Y is a group represented by Formula (a) or Formula (b); and M is a monovalent alkaline metal atom. X in Formula (a) and Formula (b) is hydrogen, halogen, a hydroxyl group or a monovalent organic group, and Z is —O—, —CH2— or a single bond. The preferred organic group is a functional group or a group having a functional group.
    Type: Grant
    Filed: October 11, 2006
    Date of Patent: November 11, 2008
    Assignee: Chisso Corporation
    Inventors: Yoshitaka Morimoto, Kenichi Watanabe, Nobumasa Ootake, Jyun-ichi Inagaki, Kazuhiro Yoshida, Koji Ohguma
  • Publication number: 20080001318
    Abstract: The present invention relates to polymeric compositions useful in the manufacture of biocompatible medical devices. More particularly, the present invention relates to certain cationic monomers capable of polymerization to form polymeric compositions having desirable physical characteristics useful in the manufacture of ophthalmic devices. Such properties include the ability to extract the polymerized medical devices with water. This avoids the use of organic solvents as is typical in the art. The polymer compositions comprise polymerized silicon-containing monomers end-capped with polymerizable cationic hydrophilic groups.
    Type: Application
    Filed: June 30, 2006
    Publication date: January 3, 2008
    Inventors: Derek Schorzman, Jay Kunzler
  • Patent number: 7169873
    Abstract: The present inventors have obtained a PSQ derivative of a completely condensed type into which a functional group is readily introduced by using a novel PSQ derivative of an incompletely condensed type in which four alkaline metal atoms are bonded to silsesquioxane of a cage type having eight Si's. The above silsesquioxane derivative is represented by Formula (1). A silsesquioxane derivative to which alkaline metal atoms are bonded is represented by Formula (2). In Formula (1) and Formula (2), R is a group selected from alkyl, aryl and arylalkyl; Y is a group represented by Formula (a) or Formula (b); and M is a monovalent alkaline metal atom. X in Formula (a) and Formula (b) is hydrogen, halogen, a hydroxyl group or a monovalent organic group, and Z is —O—, —CH2— or a single bond. The preferred organic group is a functional group or a group having a functional group.
    Type: Grant
    Filed: September 17, 2002
    Date of Patent: January 30, 2007
    Assignee: Chisso Corporation
    Inventors: Yoshitaka Morimoto, Kenichi Watanabe, Nobumasa Ootake, Jyun-ichi Inagaki, Kazuhiro Yoshida, Koji Ohguma
  • Patent number: 7034165
    Abstract: The invention relates to 3,5-dihydroxy-2,2-dimethyl-valeronitriles for the synthesis of epothilones and epothilone derivatives and process for the production of these new intermediate products in the synthesis and the use for the production of epothilones or epothilone derivatives.
    Type: Grant
    Filed: August 5, 2002
    Date of Patent: April 25, 2006
    Assignee: Schering AG
    Inventors: Jurgen Westermann, Johannes Platzek, Orlin Petrov
  • Patent number: 6825382
    Abstract: Disclosed herein are trifluoromethylepinephrine compounds having the following structural formula (I) wherein R1-R5 are each independently selected from the group consisting of H, alkyl, alkoxyl, aryl, heteroaryl, cycloalkyl, heterocycloalkyl, acyl, thioacyl, sulfonyl mercapto, alkylthio, carboxy, amino, alkylamino dialkylamino, carbamoyl, arylthio, and heteroarylthio; wherein X, Y, and Z are each independently selected from the group consisting of H or trifluoromethyl with the proviso that at least one of which is trifluoromethyl. Also disclosed are pharmaceutical compositions comprising the trifluoromethylepinephrine compounds and methods of making and using thereof. Novel trifluoroepinephrine intermediates are also disclosed.
    Type: Grant
    Filed: March 3, 2003
    Date of Patent: November 30, 2004
    Assignee: The United States of America as represented by the Secretary of the Army
    Inventor: Jeffrey R. Ammann
  • Patent number: 6723864
    Abstract: Siloxane bischloroformates are prepared in a continuous process by phosgenating siloxane bisphenols in a flow reactor using a substantial excess of phosgene and sodium hydroxide. While very high levels (>95%) of conversion of the siloxane bisphenol to the corresponding siloxane bischloroformate are achieved using a flow reactor according to the method of the invention, only more modest conversion (˜90%) of the siloxane bisphenol to the corresponding siloxane bischloroformate is attained when analogous batch processes are employed. The process holds promise for use in the manufacture of silicone-containing copolycarbonates which requires high purity siloxane bischloroformate intermediates.
    Type: Grant
    Filed: August 16, 2002
    Date of Patent: April 20, 2004
    Assignee: General Electric Company
    Inventors: James Manio Silva, David Michel Dardaris, Gary Charles Davis
  • Patent number: 6646088
    Abstract: This invention relates to chemical compositions comprising one or more urethane oligomers of at least two repeating units selected from the group consisting of fluorine-containing urethane oligomers and long-chain hydrocarbon-containing urethane oligomers. These urethane oligomers comprise the reaction product of (a) one or, more polyfunctional isocyanate compounds; (b) one or more polyols; (c) one or more monoalcohols selected from the group consisting of fluorochemical monoalcohols, optionally substituted long-chain hydrocarbon monoalcohols, and mixtures thereof; (d) one or more silanes; and optionally (e) one or more water-solubilizing compounds comprising one or more water-solubilizing groups and at least one isocyanate-reactive hydrogen containing group. The chemical compositions of the present invention can be applied as coatings and these coatings can impart stain-release characteristics and resist being worn-off due to wear and abrasion.
    Type: Grant
    Filed: March 26, 2002
    Date of Patent: November 11, 2003
    Assignee: 3M Innovative Properties Company
    Inventors: Wayne W. Fan, Steven J. Martin, Zai-Ming Qiu, Michael S. Terrazas, Linda G. Coté, Mitchell T. Johnson, Larry A. Lien
  • Publication number: 20030096793
    Abstract: Compounds of formula (I, II or III), wherein X is OH; Y is OH, H, lower alkyl of one to six carbons or heteroatoms or F; Z and Z′ are independently H, lower alkyl or Q3Si where Q is lower alkyl or aryl; n is 3-50; n′ is 2-50; A and B are independently a) alkyl of one to ten carbons or heteroatoms, b) aryl of four to seven carbons or heteroatoms, c) cyclic of three to ten carbons or heteroatoms, or moieties of the formulas (d, e, or f); R1-R11 groups are each independently hydrogen, alkyl of one to ten carbons or heteroatoms, aryl of 4 to 14 carbons or heteroatoms, arylalkyl of five to twenty carbons or heteroatoms; unsubstituted carbonyl or substituted carbonyl. Heteroatoms are nitrogen, oxygen, silicon or sulfur. At least one of A or B, or both A and B are d), e), or f). The compounds of formula (I) inhibit protease enzymes and can be used as pharmaceuticals.
    Type: Application
    Filed: June 11, 2002
    Publication date: May 22, 2003
    Applicant: Research Foundation of State University of New York
    Inventors: Scott McN. Sieburth, Alfred M. Mutahi, Chien-An Chen
  • Patent number: 6403818
    Abstract: The invention provides a process for producing an &agr;-hydroxy-carbonyl compound or an &agr;-protected hydroxy-carbonyl compound by reacting a carbonyl compound (I) with a compound (II) and a compound (III). The compounds (I), (II) and (III) are defined below. R1, R2, R3 and R4 are an organic group. PG is a protective group for hydroxy group. Y is R4N, S or O. The product is useful in pharmacology.
    Type: Grant
    Filed: February 28, 2001
    Date of Patent: June 11, 2002
    Assignee: Eisai Co., Ltd.
    Inventor: Hisao Nemoto
  • Patent number: 6262287
    Abstract: Organosiloxane fragrance precursor compounds having at least one organosiloxane unit of the formula or a mixture thereof and if any other siloxane unit(s) in the said organosiloxanes being present this/these is/are of formula wherein R represents a substituted or unsubstituted C1-8 alkyl group or a substituted or unsubstituted aryl group; R″ represents a hydrogen atom, a monovalent C1-8 hydrocarbon group or a monovalent C1-8 halogenated hydrocarbon group; R1 represents a hydrogen atom or a substituted or unsubstituted C1-8 alkyl group or a substituted or unsubstituted aryl group or a bond connecting CR1 and CR3; R3 represents a hydrogen atom or a substituted or unsubstituted C1-8 alkyl group or a substituted or unsubstituted aryl group; represents (CR42)n whereby R4 represents a substituted or unsubstituted C1-8 alkyl group or a substituted or unsubstituted aryl group or a hydrogen atom and whereby n is from 0-20 and each R4 is the same or different; OR2 repres
    Type: Grant
    Filed: May 12, 1998
    Date of Patent: July 17, 2001
    Assignee: Givaudan-Roure (International) SA
    Inventors: Denise Anderson, Georg Frater
  • Patent number: 6020512
    Abstract: Novel processes and intermediates useful in the preparation of Cryptophycin compounds are disclosed.
    Type: Grant
    Filed: February 25, 1998
    Date of Patent: February 1, 2000
    Assignees: Eli Lilly and Company, Wayne State University, University of Hawaii
    Inventors: Michael J. Martinelli, Eric D Moher, Naresh K Nayyar, Joseph M Pawlak, David W Hoard, Vien V Khau, John E Toth, David L Varie
  • Patent number: 5985853
    Abstract: A subject of the invention is the products of formula (I): ##STR1## in which: R.sub.1, R.sub.2 and R.sub.3, identical or different, represent a linear, branched or cyclic alkyl radical, an alkenyl or alkynyl radical, containing up to 8 carbon atoms, optionally substituted by one or more halogen atoms, an aryl radical optionally substituted by one or more halogen atoms, one or more hydroxyl radicals, one or more linear or branched alkyl radicals, optionally substituted by one or more halogen atoms, one or more O-alkyl or S-alkyl radicals optionally substituted by one or more halogen atoms,X represents a hydrogen atom, a halogen atom, an alkyl, alkenyl, alkynyl, O-alkyl, O-alkenyl, O-alkynyl, S-alkyl, S-alkenyl or S-alkynyl radical, optionally substituted by one or more halogen atoms and containing up to 11 carbon atoms, an aryl radical containing up to 14 carbon atoms, a C.tbd.N, NO.sub.2, NH.sub.2, ##STR2## CO.sub.2 alk.sub.3 radical, alk.sub.1, alk.sub.2 and alk.sub.
    Type: Grant
    Filed: December 4, 1997
    Date of Patent: November 16, 1999
    Assignee: Hoechst Marion Roussel
    Inventors: Sylvain Laugraud, deceased, by Pierre Laugtaud, legal representative, by Rolande Laugraud, legal representative, by Philippe Laugraud, legal representative, by Bruno Laugraud, legal representative, by Martine Sollossi, legal representative, Nicole Reinier
  • Patent number: 5961962
    Abstract: Topically applicable sunscreen/cosmetic compositions well suited for enhanced photoprotection of human skin and/or hair against the damaging effects of UV-A and UV-B irradiation, particularly solar radiation, comprise a photoprotecting effective amount of a novel cinnamonitrile-substituted polyorganosiloxane/polyorganosilane.
    Type: Grant
    Filed: July 28, 1998
    Date of Patent: October 5, 1999
    Assignee: Societe L'Oreal S.A.
    Inventors: Herve Richard, Madeleine Leduc, Alain Lagrange
  • Patent number: 5912377
    Abstract: A composition of matter comprises an aromatic cyanate ester silane comprising at least one cyanate ester group and at least one hydrolyzable silyl group. In the presence of a cyanate ester resin the aromatic cyanate ester silane acts as a coupling agent to improve the adhesion of the cyanate ester to a substrate. The curable compositions are useful as reinforced composites, and as adhesive and coating compositions.
    Type: Grant
    Filed: June 5, 1996
    Date of Patent: June 15, 1999
    Assignee: Minnesota Mining and Manufacturing Company
    Inventors: Joyce B. Hall, Kim M. Vogel, Fred B. McCormick, Hiroyaki Yamaguchi
  • Patent number: 5892086
    Abstract: Compositions of unstrained perfluorinated ether organo substituted cyclosiloxanes of formula (I): ##STR1## wherein m is an integer of 1 to 12; n is an integer of 1 to 4; X is a divalent radical which may include O, NH, N(CH.sub.3), OC(O), NHC(O), N(CH.sub.3)C(O)CH.sub.2 ; and R.sup.F is a perfluorinated ether radical of the general formula (II): ##STR2## wherein p is an integer of 1 to 10 are described, along with copolymer compositions prepared from these cyclopolysiloxanes and from mixtures of these cyclosiloxanes and other siloxanes.
    Type: Grant
    Filed: May 29, 1998
    Date of Patent: April 6, 1999
    Assignee: PCR, Inc.
    Inventors: Mark A. Buese, John Scott Shaffer
  • Patent number: 5827509
    Abstract: Topically applicable sunscreen/cosmetic compositions well suited for enhanced photoprotection of human skin and/or hair against the damaging effects of UV-A and UV-B irradiation, particularly solar radiation, comprise a photoprotecting effective amount of a novel cinnamonitrile-substituted polyorganosiloxane/polyorganosilane having one of the formulae (1) to (3): ##STR1## wherein A is a monovalent cinnamonitrile radical which comprises an alkylene or alkyleneoxy bridging group, which is bonded directly to a silicon atom, and which has the formula (4): ##STR2##
    Type: Grant
    Filed: November 17, 1995
    Date of Patent: October 27, 1998
    Assignee: Societe L'Oreal S.A.
    Inventors: Herve Richard, Madeleine Leduc, Alain Lagrange
  • Patent number: 5807922
    Abstract: Novel organosilane derivatized long-chain compounds containing halosilane and hydroxysilane groups are disclosed and claimed. A process for the syntheses of these novel compositions is also disclosed, which involves simple one-pot hydrosilylation reaction of substituted halosilanes with substituted long-chain olefinic compounds, and subsequent hydrolysis to form surface active silanol derivatives. Preferred embodiments include organosilane derivatives of fatty acids derived from tung oil, high erucic acid rape seed oil, and linseed oil. These compositions feature high surface activity in forming stable organic/water emulsions of various difficultly emulsifiable materials as compared with conventional emulsifying agents. These compositions are useful as reactive-dispersants, defoamers, reactive-surfactants in emulsion polymerization, crosslinkers, film formers, gloss enhancers, anticorrosive additives, adhesion promoters and as general property enhancers in coatings, adhesives and inks.
    Type: Grant
    Filed: October 30, 1996
    Date of Patent: September 15, 1998
    Assignee: University of Southern Mississippi
    Inventors: Shelby Freland Thames, Kamlesh Gopichand Panjnani, Rajan Hariharan
  • Patent number: 5654469
    Abstract: Compounds of Formula I ##STR1## wherein the symbols are as defined in the specification.
    Type: Grant
    Filed: May 31, 1996
    Date of Patent: August 5, 1997
    Assignee: Allergan
    Inventors: Vidyasagar Vuligonda, Min Teng, Richard L. Beard, Alan T. Johnson, Yuan Lin, Roshantha A. Chandraratna
  • Patent number: 5594156
    Abstract: A process for preparing silyl cyanohydrins that comprises reacting an aldehyde or ketone with a hydrogen cyanide, a trisubstituted halosilane and a correspondingly substituted disilazane or silyl amine.
    Type: Grant
    Filed: August 18, 1995
    Date of Patent: January 14, 1997
    Assignee: Huls America Inc.
    Inventors: Chitoor S. Subramaniam, Gerald L. Larson
  • Patent number: 5359101
    Abstract: Anionically polymerizable monomers containing at least one silicon or titanium atom form polymeric photoresists having good dry etch resistance for use in microlithography. The monomers are of the formula ##STR1## wherein A is --H or --CH.dbd.CH.sub.2 ; X is a strong electron withdrawing group;Y is a strong electron withdrawing group containing at least one silicon or titanium atom.Preferably Y is ##STR2## wherein n is 1-5 and R.sup.2, R.sup.3 and R.sup.4 are C.sub.1 -C.sub.10 alkyl. A particularly preferred monomer is 3-trimethylsilylpropyl 2-cyanoacrylate.Methods for applying a resist coating by vapor deposition of these monomers and exposure to radiation are described. A positive or negative tone image can be produced, depending upon the imaging method employed. The imaging layer may be applied over a planarizing layer to form a multilayer photoresist.
    Type: Grant
    Filed: October 1, 1991
    Date of Patent: October 25, 1994
    Assignee: Loctite Ireland, Ltd.
    Inventors: John Woods, Pauline Coakley
  • Patent number: 5332825
    Abstract: This invention relates to two processes for preparing aminoacetonitriles in one vessel under anhydrous conditions. Process I involves the steps of: (A) reacting trimethylsilyl cyanide and an aldehyde in a water miscible amide solvent to obtain a silyl blocked cyanohydrin solution; (B) adding a catalytic amount of water to the silyl blocked cyanohydrin solution from Step (A); and (C) passing ammonia through the solution to obtain an aminoacetonitrile. Process II involves the steps of: (A') reacting trimethylsilyl cyanide with an aldehyde in the absence of solvent to form a silyl blocked cyanohydrin; (B') adding a water miscible amide solvent to the silyl blocked cyanohydrin from Step (A') to obtain a solution; and (C') passing ammonia through the solution to obtain an aminoacetonitrile. Aminoacetonitriles are important intermediates in the preparation of amino acids, thiadiazoles, acylaminoacetonitriles, and imidazole derivatives.
    Type: Grant
    Filed: October 13, 1993
    Date of Patent: July 26, 1994
    Assignee: Eastman Kodak Company
    Inventor: Paul R. Buckland
  • Patent number: 5329023
    Abstract: The invention relates to a method of preparing optically active alcohols which consist substantially (at least 75% e.e.) or entirely of one enantiomer of formula 4 ##STR1## wherein R and A are as defined therein. The method comprises, which maintaining enantiomeric excess, converting an optically active cyanohydrin of formula 1 ##STR2## into optically active protected cyanohydrin of formula 2 ##STR3## converting the protected cyanohydrin of formula 2 into an optically active compound of formula 3 ##STR4## removing the protecting group B.
    Type: Grant
    Filed: June 15, 1992
    Date of Patent: July 12, 1994
    Assignee: Duphar International Research B.V.
    Inventors: Johannes Brussee, Arne Van Der Gen
  • Patent number: 5247108
    Abstract: An oil comprising an amino-modified silicone fluid containing an amino group with an amine equivalent of 10,000 to 200,000 g/mol and having a viscosity of 10 to 100,000 centistokes at 25.degree. C. is effective in preventing any electric contact failure in relays, switches, motors, corotrons and similar electric elements.
    Type: Grant
    Filed: September 9, 1992
    Date of Patent: September 21, 1993
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Motohiko Hirai, Takahiro Goi
  • Patent number: 5239100
    Abstract: Novel dimethylpolysiloxane compounds having antibacterial activity are disclosed. Biguanidyl group or cyanoguanidyl group are introduced into dimetylpolysiloxane compounds.
    Type: Grant
    Filed: December 24, 1992
    Date of Patent: August 24, 1993
    Assignee: Mitsubishi Materials Corporation
    Inventors: Honda Tsunetoshi, Akiko Azuma, Akira Nishihara
  • Patent number: 5218136
    Abstract: A styryl compound of the formula: ##STR1## wherein R.sub.1, R.sub.2 and R.sub.11 are the same or different and a hydrogen atom, an optionally substituted alkyl, alkenyl or aralkyl group or R.sub.1 and R.sub.2 may form a ring together with the nitrogen atom to which they are bonded, which ring may include at least one hetero atom in addition to said nitrogen atom; R.sub.10 is an optionally substituted alkylene group; R.sub.3 is --OH, --OCOR.sub.5 or --OSi(R.sub.5).sub.3 in which R.sup.5 is an alkyl group; R.sub.12 and R.sub.13 are independently a hydrogen atom, an optionally substituted lower alkyl or alkoxy group, an amide group or a halogen atom; X, Y, W and Z are the same or different and an electron attracting group, and n is a number of 2-15, which is suitable as a light absorber in a photoresist composition.
    Type: Grant
    Filed: December 27, 1988
    Date of Patent: June 8, 1993
    Assignee: Sumitomo Chemical Company, Limited
    Inventors: Takanori Yamamoto, Shinji Konishi, Ryotaro Hanawa, Akirhiro Furuta, Takeshi Hioki, Jun Tomioka
  • Patent number: 5217645
    Abstract: A mesomorphic compound represented by the following formula (I): ##STR1## wherein R.sub.1 denotes a linear or branched alkyl group having 2-16 carbon atoms capable of including one or non-neighboring two methylene groups which can be replaced with --O--, --S--, --CO--, --COO-- or --OCO-- and capable of including a hydrogen atom which can be replaced with a fluorine atom; A denotes --A.sub.1 -- or --A.sub.1 --A.sub.2 --; B.sub.2 denotes --B.sub.3 -- or --B.sub.3 --B.sub.4 --; A.sub.1, A.sub.2, B.sub.1, B.sub.3 and B.sub.4 independently denote ##STR2## wherein Y.sub.1 and Y.sub.2 independently denote a hydrogen atom, F, Cl, Br, --CH.sub.3, --CN or --CF.sub.3, with the proviso that B.sub.1 can be a single bond; Z.sub.1 and Z.sub.2 independently denote a single bond, --COO--, --OCO--, --CH.sub.2 O-- or --OCH.sub.2 --; Z.sub.3 denotes --O--, --CO--, --COO-- or --OCO--; R.sub.2, R.sub.3 and R.sub.
    Type: Grant
    Filed: September 13, 1991
    Date of Patent: June 8, 1993
    Assignee: Canon Kabushiki Kaisha
    Inventors: Takashi Iwaki, Takao Takiguchi, Takeshi Togano, Yoko Yamada, Shinichi Nakamura
  • Patent number: 5110968
    Abstract: A naphthalocyanine derivative having as substituents at least one group of a formula: SR.sup.1 wherein R.sup.1 is --(CR.sup.2 R.sup.3).sub.x SiR.sup.4 R.sup.5 R.sup.6, in which R.sup.2 to R.sup.6 are H, alkyl groups, etc. is excellent in solubility in saturated hydrocarbon solvents and in absorption of semiconductor laser lights and thus, is suitable for producing optical recording media.
    Type: Grant
    Filed: May 30, 1991
    Date of Patent: May 5, 1992
    Assignee: Hitachi, Chemical Company Ltd.
    Inventors: Seiji Tai, Nobuyuki Hayashi, Koichi Kamijima, Takayuki Akimoto, Mitsuo Katayose, Hideo Hagiwara
  • Patent number: 5106530
    Abstract: The present invention relates to compounds of the formula ##STR1## in which Z is a halogen atom, a cyano group or a hydroxyl group,n is 0, 1 or 2,R' is a radical of the formulaR'"--[Si(R*).sub.2 ].sub.x (CH.sub.2).sub.y R""-- (9),in whichx is the number 0 or 1,y is an integer from 1 to 18,R'"is a defined in the description,R* is identical or different, optionally substituted C.sub.1 - to C.sub.18 -hydrocarbon or hydrocarbonoxy radicals,R"" is a phenylene or biphenylene radical or a radical of the formula --E--, whereE is a divalent radical of the formula --O-- or --[Si(R*).sub.2 ].sub.z --, andz is the number 0 or 1,and the compounds contain at least one group of the formula --Si(R*).sub.2 -- per molecule, and the radicalR" is a cholesteryl radical, a radical as defined for R* or a radical of the formula --C.sub.6 H.sub.4 --R*,and the preparation and use thereof.
    Type: Grant
    Filed: June 22, 1990
    Date of Patent: April 21, 1992
    Assignee: Consortium fur Elektrochemische Ind.
    Inventors: Wolfgang Haas, Norman Haberle, Rainer Winkler, Franz-Heinrich Kreuzer
  • Patent number: 5087716
    Abstract: Difunctional halo silicon amide compounds are prepared by cleaving the nitrogen-silicon bond in a nitrogen-silicon heterocycle with a reactive halide. The reaction is straight forward with no intermediates or byproducts. The halo functionality is capable of capping any SiOH group. When the other functionality is an acrylamide, the capped entity may be polymerized or crosslinked by free radical initiators of the acrylamide functionality thereby producing useful products such as paper release coatings and photoresists.
    Type: Grant
    Filed: December 24, 1990
    Date of Patent: February 11, 1992
    Assignee: Dow Corning Corporation
    Inventors: Antony P. Wright, Padmakumari J. Varaprath
  • Patent number: RE35462
    Abstract: The present invention relates to compounds of the formula ##STR1## in which Z is a halogen atom, a cyano group or a hydroxyl group,n is 0, 1 or 2,R' is a radical of the formulaR"'--[Si(R*).sub.2 ].sub.x (CH.sub.2).sub.y R""-- (9),in whichx is the number 0 or 1,y is an integer from 1 to 18,R"'is a defined in the description,R* is identical or different, optionally substituted C.sub.1 - to C.sub.18 -hydrocarbon or hydrocarbonoxy radicals,R"" is a phenylene or biphenylene radical or a radical of the formula --E--, whereE is a divalent radical of the formula --O-- or --[Si(R*).sub.2 ].sub.z --, andz is the number 0 or 1,and the compounds contain at least one group of the formula --Si(R*).sub.2 -- per molecule, and the radicalR" is a cholesteryl radical, a radical as defined for R* or a radical of the formula --C.sub.6 H.sub.4 --R*,and the preparation and use thereof.
    Type: Grant
    Filed: February 7, 1994
    Date of Patent: February 25, 1997
    Assignee: Consortium fur elekochemische Ind. GmbH
    Inventors: Wolfgang Haas, Norman Haberle, Rainer Winkler, Franz-Heinrich Kreuzer