Chalcogen Bonded Directly To Silicon Patents (Class 556/417)
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Patent number: 11299628Abstract: Provided is an organopolysiloxane composition, comprising: (A) an organopolysiloxane having at least two silicon atom-bonded alkenyl groups in each molecule, (B) an organohydrogenpolysiloxane having at least two silicon atom-bonded hydrogen atoms in each molecule, (C) a platinum catalyst, and (D) a specific isocyanide compound.Type: GrantFiled: November 6, 2018Date of Patent: April 12, 2022Assignee: SHIN-ETSU CHEMICAL CO., LTD.Inventors: Daisuke Noda, Koji Sakuta
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Patent number: 9745216Abstract: Hydrophobically modified Si-containing polyamines are useful for treating scale in industrial process streams. Preferred hydrophobically modified Si-containing polyamines are particularly useful for treating aluminosilicate scale in difficult-to-treat industrial process streams, such as in the Bayer alumina process streams, nuclear waste streams and kraft paper mill effluent streams.Type: GrantFiled: April 11, 2016Date of Patent: August 29, 2017Assignee: Cytec Technology Corp.Inventors: Howard Heitner, Donald P. Spitzer
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Publication number: 20140377791Abstract: The present invention relates to a compound which is a novel two-photon absorbing fluorescent substance, a production method for the compound, a fluorescence sensor and molecular probe able to sense various substrates or enzyme activity or the like using the same, and a method of sensing enzyme activity or the like using the same. More specifically, the present invention relates to a novel two-photon absorbing fluorescent substance which has the high photo-stability and large two-photon absorption cross-section value of acedan which is a two-photon absorbing fluorescent substance, and has the high fluorescence efficiency of coumarin which is a one-photon absorbing fluorescent substance, while exhibiting absorption and emission characteristics at a longer wavelength than existing acedan and coumarin and so being advantageous in in-vivo imaging.Type: ApplicationFiled: March 21, 2013Publication date: December 25, 2014Inventors: Kyo Han Ahn, Dokyoung Kim
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NITRILE-SUBSTITUTED SILANES AND ELECTROLYTE COMPOSITIONS AND ELECTROCHEMICAL DEVICES CONTAINING THEM
Publication number: 20140356735Abstract: Described herein are liquid, organosilicon compounds that including a substituent that is a cyano (—CN), cyanate (—OCN), isocyanate (—NCO), thiocyanate (—SCN) or isothiocyanate (—NCS). The organosilicon compounds are useful in electrolyte compositions and can be used in any electrochemical device where electrolytes are conventionally used.Type: ApplicationFiled: June 4, 2014Publication date: December 4, 2014Inventors: Jose Adrian Pena Hueso, David Osmalov, Jian Dong, Monica Usrey, Michael Pollina, Robert C. West -
Publication number: 20140249273Abstract: The below compound, which may be made by reacting a 3-trialkoxysilylpropyl amine with an acrylic acid ester, a methacrylic acid ester, a diester of maleic acid, a diester of fumaric acid, or acrylonitrile to form a secondary amino propylalkoxysilane, and reacting the secondary amino propylalkoxysilane with an isocyanate. R1 is an alkyl group, X is —CHR3—CHR4—CO—O—R2 or —CH2—CH2—CN, R2 is an organic group, R3 is —H or —CO—O—R2, R4 is —H or —CH3, but R4 is —H if R3 is —CO—O—R2, R5 is an aliphatic group or a residue of hexamethylene diisocyanate cyclic trimer or hexamethylene diisocyanate cyclic dimer, and n is 2 or 3. The below compound, which may be made by reacting a 3-trialkoxysilylpropyl amine with acrylonitrile. R1 is an alkyl group.Type: ApplicationFiled: February 26, 2014Publication date: September 4, 2014Applicant: The Government of the United States of America, as represented by the Secretary of the NavyInventors: Arthur A. Webb, Jozef Verborgt
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Patent number: 8747694Abstract: In accordance with one aspect, the present invention provides a composition which contains the amino-siloxane structures I, or III, as described herein. The composition is useful for the capture of carbon dioxide from process streams. In addition, the present invention provides methods of preparing the amino-siloxane composition. Another aspect of the present invention provides methods for reducing the amount of carbon dioxide in a process stream employing the amino-siloxane compositions of the invention, as species which react with carbon dioxide to form an adduct with carbon dioxide.Type: GrantFiled: June 17, 2010Date of Patent: June 10, 2014Assignee: General Electric CompanyInventors: Robert James Perry, Michael Joseph O'Brien
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Publication number: 20140031545Abstract: Processes for making an organozinc reagents are disclosed comprising reacting (A) organomagnesium or organozinc complexes with (B) at least one coordination compound comprising one or more carboxylate groups and/or alcoholate groups and/or tertiary amine groups, optionally in combination with zinc ions and/or lithium ions and/or halide ions, wherein the halide ions are selected from chloride, bromide and iodide, the organozinc complex comprises an aryl group, a heteroaryl group or a benzyl group when the coordinating compound is a chelating polyamine, and the reaction is conducted in the presence of zinc complexed with at least one coordinating compound when reactant (A) comprises at least one organomagnesium complex. The resulting organozinc reagents may optionally be isolated from solvents to obtain a solid reagent. The reagents may be used for making organic compounds via Negishi cross-coupling reactions or via aldehyde and/or ketone oxidative addition reactions.Type: ApplicationFiled: December 21, 2011Publication date: January 30, 2014Applicant: LUDWIG-MAXIMILIAN-UNIVERSITAT MUNCHENInventors: Paul Knochel, Sebastian Bernhardt, Georg Manolikakes
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Patent number: 8575292Abstract: There is provided a hydroxyl-functional carbamoyl organosilicon compound, an anti-corrosion and/or adhesion promoting coating composition based thereon, a method for coating a metal surface employing the coating composition and the resulting coated metal article.Type: GrantFiled: April 24, 2007Date of Patent: November 5, 2013Assignee: Momentive Performance Materials Inc.Inventors: Shiu-Chin H. Su, Suresh K. Rajaraman, Alexander S. Borovik, Kendall L. Guyer, Eric R. Pohl
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Publication number: 20130075364Abstract: Methods for forming a pattern in a lithography process for semiconductor wafer manufacturing are provided. In an example, a method includes forming a photoresist layer over a material layer; performing a first exposure process on the photoresist layer, thereby forming an exposed photoresist layer having soluble portions and unsoluble portions; treating the exposed photoresist layer, wherein the treating includes one of performing a second exposure process on the exposed photoresist layer and forming an adsorbing chemical layer over the exposed photoresist layer; and developing the exposed and treated photoresist layer to remove the soluble portions of the photoresist layer, wherein the unsoluble portions of the photoresist layer form a photoresist pattern that exposes portions of the material layer.Type: ApplicationFiled: September 22, 2011Publication date: March 28, 2013Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.Inventors: Chien-Wei Wang, Ko-Bin Kao, Wei-Liang Lin, Jui-Ching Wu, Chia-Hsiang Lin, Ai-Jen Jung
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Publication number: 20130060014Abstract: A surface-modified inorganic material and a preparation method thereof. A surface-modified inorganic material is provided which is obtained by allowing an organosilane compound having allyl or an allyl derivative to react with an inorganic material, particularly solid silica or ITO glass, in the presence of an acid and an organic solvent, to introduce an organic group into the inorganic material even at room temperature, as well as a preparation method thereof. The invention can effectively introduce the organic group into the inorganic material even at room temperature, and thus is very effective in introducing compounds having a thermally sensitive functional group, for example, natural compounds or proteins. It is possible to introduce various organic groups into an inorganic material and to separate and purify organic molecule-bonded organosilane compounds using a silica gel column to effectively bond them to inorganic materials.Type: ApplicationFiled: August 31, 2012Publication date: March 7, 2013Applicant: Industry-Academic Cooperation Foundation, Yonsei UniversityInventors: Chul-Ho Jun, Ye-Lim Yeon, Ji-Sung Lee, Young-Jun Park
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Publication number: 20120251825Abstract: The present invention relates to a hollow sphere with a mesoporous structure, and a method for manufacturing the same. The hollow sphere with a mesoporous structure comprises: a shell with plural mesopores penetrating the shell, wherein the shell comprises: a mesoporous silicon oxide material, and mesopores of the mesoporous silicon oxide material are arranged in Ia3d cubic symmetry. In addition, according to the method of the present invention, the aforementioned hollow sphere with the mesoporous structure can be easily obtained by use of mixed surfactants of a cationic surfactant and a non-ionic surfactant.Type: ApplicationFiled: August 5, 2011Publication date: October 4, 2012Inventors: Chia-Min YANG, Li-Lin Chang, Pei-Hsin Ku, Nien-Chu Lai, Kuan-Yi Li
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Publication number: 20120225020Abstract: This disclosure provides choline analogs comprising the following structure: where each R1 independently is H or isotopically enriched D, R2 is a protecting group, and N is 14N or isotopically enriched 15N. This disclosure also provides methods of making choline analogs, which include performing a protection step on a betaine aldehyde to form a choline analog, and methods of using choline analogs to form hyperpolarized compounds.Type: ApplicationFiled: February 24, 2012Publication date: September 6, 2012Inventors: Eduard Y. Chekmenev, Roman V. Shchepin
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Publication number: 20120178956Abstract: A method for preparing a functional structured surface includes the controlled removal of material from a film including at least one buried pore, the inner surface of the pore including at least one chemical linkage group, where the material is removed so as to expose part of the inner surface of the pore that is not affected by the removal of material.Type: ApplicationFiled: September 8, 2010Publication date: July 12, 2012Inventors: Sandrine Dourdain, Pierre Terech
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Publication number: 20110308390Abstract: In accordance with one aspect, the present invention provides a composition which contains the amino-siloxane structures I, or III, as described herein. The composition is useful for the capture of carbon dioxide from process streams. In addition, the present invention provides methods of preparing the amino-siloxane composition. Another aspect of the present invention provides methods for reducing the amount of carbon dioxide in a process stream employing the amino-siloxane compositions of the invention, as species which react with carbon dioxide to form an adduct with carbon dioxide.Type: ApplicationFiled: June 17, 2010Publication date: December 22, 2011Applicant: GENERAL ELECTRIC COMPANYInventors: Robert James Perry, Michael Joseph O'Brien
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Publication number: 20110287205Abstract: Mercaptosilanes are disclosed of the formula I wherein R1 is an alkyl polyether group —O—(R5—O)m—R6. They are prepared by a procedure in which a silane of the formula II is subjected to a catatyzed reaction with an alkyl polyether R1—H, R7—OH being split off, the molar ratio of the alkyl polyethers R1—H to the silane of the formula II is at least 0.5 and R7—OH is separated off from the reaction mixture continuously or discontinuously. They can be used in shaped articles.Type: ApplicationFiled: August 2, 2011Publication date: November 24, 2011Inventors: Oliver Klockmann, Philipp Albert, Andre Hasse, Karsten Korth, Relmund Pieter
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Publication number: 20110232178Abstract: Compounds and methods that release 1-methylcyclopropene, 1-trifluoromethylcyclopropene, and other substituted cyclopropenes are disclosed. The compounds and methods overcome present limitations for storage, transportation, and application of the cyclopropene containing compounds by using light, including sunlight, and/or heat as the primary release trigger. Additional products released include innocuous gases and value added aryl-group compounds.Type: ApplicationFiled: March 23, 2011Publication date: September 29, 2011Inventors: John Perrin Davis, Cheryl D. Stevenson
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Patent number: 8026245Abstract: The present invention relates to the use of a compound of formula (I) for the manufacture of a medicament for the prevention or the treatment of HIV infection wherein the compound of formula (I) is a compound of formula a N-oxide, a pharmaceutically acceptable addition salt, a quaternary amine or a stereochemically isomeric form thereof, wherein A and B each represents a radical of formula and wherein —C-D- represents a bivalent radical of formula —N?CH—NR17—??(c-1); or —NR17—CH?N—??(c-2); provided that when A represents a radical of formula (a) then B represents a radical of formula (b) and when A represents a radical of formula (b) then B represents a radical of formula (a).Type: GrantFiled: September 21, 2004Date of Patent: September 27, 2011Assignee: Janssen Pharmaceutica N.V.Inventors: Paul Adriaan Jan Janssen, Frank Xavier Jozef Herwig Arts, legal representative, Paulus Joannes Lewi, Marc René de Jonge, Lucien Maria Henricus Koymans, Frederik Frans Desiré Daeyaert, Jan Heeres, Hendrik Maarten Vinkers, Ruben Gerardus George Leenders, Dirk Alfons Leo Vandenput
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Publication number: 20110178313Abstract: A polysiloxane represented by the formula (1) or (2): where R, R1, R2, m and n are defined in the specification.Type: ApplicationFiled: March 28, 2011Publication date: July 21, 2011Inventors: Nobumasa Ootake, Kazuhiro Yoshida, Kenichi Watanabe, Yasuhito Yamaryo
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Patent number: 7915330Abstract: A silicone fluid comprising a chromophore-substituted polyorganosiloxane having a formula (2): wherein x is an integer in the range of 60 to 2000; y is an integer in the range of 5 to 100; a ratio x:y is in a range of about 10:1 to about 20:1; and X is a photostabilizing chromophore.Type: GrantFiled: September 5, 2008Date of Patent: March 29, 2011Assignee: Hallstar Innovations Corp.Inventors: Craig A. Bonda, Anna Pavlovic, Anthony J. O'Lenick, Jr.
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Publication number: 20100274028Abstract: The invention relates to a process for treating a composition comprising organosilanes and at least one polar organic compound and/or at least one extraneous metal and/or a compound containing extraneous metal, wherein the composition is contacted with at least one adsorbent and a composition in which the content of the organic polar compound and/or of the extraneous metal and/or of the compound containing extraneous metal is reduced is subsequently obtained, and also to a corresponding composition in which the content of polar organic compounds and/or extraneous metals has been reduced to traces, and to the use of organic resins, activated carbons, silicates and/or zeolites for reducing the amounts of the compounds mentioned.Type: ApplicationFiled: August 19, 2008Publication date: October 28, 2010Applicant: EVONIK DEGUSSA GmbHInventors: Ekkehard Mueh, Hartwig Rauleder, Helmut Mack, Jaroslaw Monkiewicz
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Patent number: 7686878Abstract: A coating composition is provided which includes an adhesion promoter or a crosslinker silane which, upon hydrolysis, of its hydrolyzable sites, produces a reduced amount of volatile organic compound compared to that produced by the hydrolysis of a silane possessing an equivalent number of hydrolyzable sites all of which are hydrolyzable alkoxy groups.Type: GrantFiled: December 6, 2005Date of Patent: March 30, 2010Assignee: Momentive Performance Materials, Inc.Inventor: Kendall L. Guyer
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Patent number: 7449539Abstract: The present inventors have obtained a PSQ derivative of a completely condensed type into which a functional group is readily introduced by using a novel PSQ derivative of an incompletely condensed type in which four alkaline metal atoms are bonded to silsesquioxane of a cage type having eight Si's. The above silsesquioxane derivative is represented by Formula (1). A silsesquioxane derivative to which alkaline metal atoms are bonded is represented by Formula (2). In Formula (1) and Formula (2), R is a group selected from alkyl, aryl and arylalkyl; Y is a group represented by Formula (a) or Formula (b); and M is a monovalent alkaline metal atom. X in Formula (a) and Formula (b) is hydrogen, halogen, a hydroxyl group or a monovalent organic group, and Z is —O—, —CH2— or a single bond. The preferred organic group is a functional group or a group having a functional group.Type: GrantFiled: October 11, 2006Date of Patent: November 11, 2008Assignee: Chisso CorporationInventors: Yoshitaka Morimoto, Kenichi Watanabe, Nobumasa Ootake, Jyun-ichi Inagaki, Kazuhiro Yoshida, Koji Ohguma
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Publication number: 20080001318Abstract: The present invention relates to polymeric compositions useful in the manufacture of biocompatible medical devices. More particularly, the present invention relates to certain cationic monomers capable of polymerization to form polymeric compositions having desirable physical characteristics useful in the manufacture of ophthalmic devices. Such properties include the ability to extract the polymerized medical devices with water. This avoids the use of organic solvents as is typical in the art. The polymer compositions comprise polymerized silicon-containing monomers end-capped with polymerizable cationic hydrophilic groups.Type: ApplicationFiled: June 30, 2006Publication date: January 3, 2008Inventors: Derek Schorzman, Jay Kunzler
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Patent number: 7169873Abstract: The present inventors have obtained a PSQ derivative of a completely condensed type into which a functional group is readily introduced by using a novel PSQ derivative of an incompletely condensed type in which four alkaline metal atoms are bonded to silsesquioxane of a cage type having eight Si's. The above silsesquioxane derivative is represented by Formula (1). A silsesquioxane derivative to which alkaline metal atoms are bonded is represented by Formula (2). In Formula (1) and Formula (2), R is a group selected from alkyl, aryl and arylalkyl; Y is a group represented by Formula (a) or Formula (b); and M is a monovalent alkaline metal atom. X in Formula (a) and Formula (b) is hydrogen, halogen, a hydroxyl group or a monovalent organic group, and Z is —O—, —CH2— or a single bond. The preferred organic group is a functional group or a group having a functional group.Type: GrantFiled: September 17, 2002Date of Patent: January 30, 2007Assignee: Chisso CorporationInventors: Yoshitaka Morimoto, Kenichi Watanabe, Nobumasa Ootake, Jyun-ichi Inagaki, Kazuhiro Yoshida, Koji Ohguma
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Patent number: 7034165Abstract: The invention relates to 3,5-dihydroxy-2,2-dimethyl-valeronitriles for the synthesis of epothilones and epothilone derivatives and process for the production of these new intermediate products in the synthesis and the use for the production of epothilones or epothilone derivatives.Type: GrantFiled: August 5, 2002Date of Patent: April 25, 2006Assignee: Schering AGInventors: Jurgen Westermann, Johannes Platzek, Orlin Petrov
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Patent number: 6825382Abstract: Disclosed herein are trifluoromethylepinephrine compounds having the following structural formula (I) wherein R1-R5 are each independently selected from the group consisting of H, alkyl, alkoxyl, aryl, heteroaryl, cycloalkyl, heterocycloalkyl, acyl, thioacyl, sulfonyl mercapto, alkylthio, carboxy, amino, alkylamino dialkylamino, carbamoyl, arylthio, and heteroarylthio; wherein X, Y, and Z are each independently selected from the group consisting of H or trifluoromethyl with the proviso that at least one of which is trifluoromethyl. Also disclosed are pharmaceutical compositions comprising the trifluoromethylepinephrine compounds and methods of making and using thereof. Novel trifluoroepinephrine intermediates are also disclosed.Type: GrantFiled: March 3, 2003Date of Patent: November 30, 2004Assignee: The United States of America as represented by the Secretary of the ArmyInventor: Jeffrey R. Ammann
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Patent number: 6723864Abstract: Siloxane bischloroformates are prepared in a continuous process by phosgenating siloxane bisphenols in a flow reactor using a substantial excess of phosgene and sodium hydroxide. While very high levels (>95%) of conversion of the siloxane bisphenol to the corresponding siloxane bischloroformate are achieved using a flow reactor according to the method of the invention, only more modest conversion (˜90%) of the siloxane bisphenol to the corresponding siloxane bischloroformate is attained when analogous batch processes are employed. The process holds promise for use in the manufacture of silicone-containing copolycarbonates which requires high purity siloxane bischloroformate intermediates.Type: GrantFiled: August 16, 2002Date of Patent: April 20, 2004Assignee: General Electric CompanyInventors: James Manio Silva, David Michel Dardaris, Gary Charles Davis
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Patent number: 6646088Abstract: This invention relates to chemical compositions comprising one or more urethane oligomers of at least two repeating units selected from the group consisting of fluorine-containing urethane oligomers and long-chain hydrocarbon-containing urethane oligomers. These urethane oligomers comprise the reaction product of (a) one or, more polyfunctional isocyanate compounds; (b) one or more polyols; (c) one or more monoalcohols selected from the group consisting of fluorochemical monoalcohols, optionally substituted long-chain hydrocarbon monoalcohols, and mixtures thereof; (d) one or more silanes; and optionally (e) one or more water-solubilizing compounds comprising one or more water-solubilizing groups and at least one isocyanate-reactive hydrogen containing group. The chemical compositions of the present invention can be applied as coatings and these coatings can impart stain-release characteristics and resist being worn-off due to wear and abrasion.Type: GrantFiled: March 26, 2002Date of Patent: November 11, 2003Assignee: 3M Innovative Properties CompanyInventors: Wayne W. Fan, Steven J. Martin, Zai-Ming Qiu, Michael S. Terrazas, Linda G. Coté, Mitchell T. Johnson, Larry A. Lien
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Publication number: 20030096793Abstract: Compounds of formula (I, II or III), wherein X is OH; Y is OH, H, lower alkyl of one to six carbons or heteroatoms or F; Z and Z′ are independently H, lower alkyl or Q3Si where Q is lower alkyl or aryl; n is 3-50; n′ is 2-50; A and B are independently a) alkyl of one to ten carbons or heteroatoms, b) aryl of four to seven carbons or heteroatoms, c) cyclic of three to ten carbons or heteroatoms, or moieties of the formulas (d, e, or f); R1-R11 groups are each independently hydrogen, alkyl of one to ten carbons or heteroatoms, aryl of 4 to 14 carbons or heteroatoms, arylalkyl of five to twenty carbons or heteroatoms; unsubstituted carbonyl or substituted carbonyl. Heteroatoms are nitrogen, oxygen, silicon or sulfur. At least one of A or B, or both A and B are d), e), or f). The compounds of formula (I) inhibit protease enzymes and can be used as pharmaceuticals.Type: ApplicationFiled: June 11, 2002Publication date: May 22, 2003Applicant: Research Foundation of State University of New YorkInventors: Scott McN. Sieburth, Alfred M. Mutahi, Chien-An Chen
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Patent number: 6403818Abstract: The invention provides a process for producing an &agr;-hydroxy-carbonyl compound or an &agr;-protected hydroxy-carbonyl compound by reacting a carbonyl compound (I) with a compound (II) and a compound (III). The compounds (I), (II) and (III) are defined below. R1, R2, R3 and R4 are an organic group. PG is a protective group for hydroxy group. Y is R4N, S or O. The product is useful in pharmacology.Type: GrantFiled: February 28, 2001Date of Patent: June 11, 2002Assignee: Eisai Co., Ltd.Inventor: Hisao Nemoto
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Patent number: 6262287Abstract: Organosiloxane fragrance precursor compounds having at least one organosiloxane unit of the formula or a mixture thereof and if any other siloxane unit(s) in the said organosiloxanes being present this/these is/are of formula wherein R represents a substituted or unsubstituted C1-8 alkyl group or a substituted or unsubstituted aryl group; R″ represents a hydrogen atom, a monovalent C1-8 hydrocarbon group or a monovalent C1-8 halogenated hydrocarbon group; R1 represents a hydrogen atom or a substituted or unsubstituted C1-8 alkyl group or a substituted or unsubstituted aryl group or a bond connecting CR1 and CR3; R3 represents a hydrogen atom or a substituted or unsubstituted C1-8 alkyl group or a substituted or unsubstituted aryl group; represents (CR42)n whereby R4 represents a substituted or unsubstituted C1-8 alkyl group or a substituted or unsubstituted aryl group or a hydrogen atom and whereby n is from 0-20 and each R4 is the same or different; OR2 represType: GrantFiled: May 12, 1998Date of Patent: July 17, 2001Assignee: Givaudan-Roure (International) SAInventors: Denise Anderson, Georg Frater
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Patent number: 6020512Abstract: Novel processes and intermediates useful in the preparation of Cryptophycin compounds are disclosed.Type: GrantFiled: February 25, 1998Date of Patent: February 1, 2000Assignees: Eli Lilly and Company, Wayne State University, University of HawaiiInventors: Michael J. Martinelli, Eric D Moher, Naresh K Nayyar, Joseph M Pawlak, David W Hoard, Vien V Khau, John E Toth, David L Varie
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Patent number: 5985853Abstract: A subject of the invention is the products of formula (I): ##STR1## in which: R.sub.1, R.sub.2 and R.sub.3, identical or different, represent a linear, branched or cyclic alkyl radical, an alkenyl or alkynyl radical, containing up to 8 carbon atoms, optionally substituted by one or more halogen atoms, an aryl radical optionally substituted by one or more halogen atoms, one or more hydroxyl radicals, one or more linear or branched alkyl radicals, optionally substituted by one or more halogen atoms, one or more O-alkyl or S-alkyl radicals optionally substituted by one or more halogen atoms,X represents a hydrogen atom, a halogen atom, an alkyl, alkenyl, alkynyl, O-alkyl, O-alkenyl, O-alkynyl, S-alkyl, S-alkenyl or S-alkynyl radical, optionally substituted by one or more halogen atoms and containing up to 11 carbon atoms, an aryl radical containing up to 14 carbon atoms, a C.tbd.N, NO.sub.2, NH.sub.2, ##STR2## CO.sub.2 alk.sub.3 radical, alk.sub.1, alk.sub.2 and alk.sub.Type: GrantFiled: December 4, 1997Date of Patent: November 16, 1999Assignee: Hoechst Marion RousselInventors: Sylvain Laugraud, deceased, by Pierre Laugtaud, legal representative, by Rolande Laugraud, legal representative, by Philippe Laugraud, legal representative, by Bruno Laugraud, legal representative, by Martine Sollossi, legal representative, Nicole Reinier
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Patent number: 5961962Abstract: Topically applicable sunscreen/cosmetic compositions well suited for enhanced photoprotection of human skin and/or hair against the damaging effects of UV-A and UV-B irradiation, particularly solar radiation, comprise a photoprotecting effective amount of a novel cinnamonitrile-substituted polyorganosiloxane/polyorganosilane.Type: GrantFiled: July 28, 1998Date of Patent: October 5, 1999Assignee: Societe L'Oreal S.A.Inventors: Herve Richard, Madeleine Leduc, Alain Lagrange
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Patent number: 5912377Abstract: A composition of matter comprises an aromatic cyanate ester silane comprising at least one cyanate ester group and at least one hydrolyzable silyl group. In the presence of a cyanate ester resin the aromatic cyanate ester silane acts as a coupling agent to improve the adhesion of the cyanate ester to a substrate. The curable compositions are useful as reinforced composites, and as adhesive and coating compositions.Type: GrantFiled: June 5, 1996Date of Patent: June 15, 1999Assignee: Minnesota Mining and Manufacturing CompanyInventors: Joyce B. Hall, Kim M. Vogel, Fred B. McCormick, Hiroyaki Yamaguchi
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Patent number: 5892086Abstract: Compositions of unstrained perfluorinated ether organo substituted cyclosiloxanes of formula (I): ##STR1## wherein m is an integer of 1 to 12; n is an integer of 1 to 4; X is a divalent radical which may include O, NH, N(CH.sub.3), OC(O), NHC(O), N(CH.sub.3)C(O)CH.sub.2 ; and R.sup.F is a perfluorinated ether radical of the general formula (II): ##STR2## wherein p is an integer of 1 to 10 are described, along with copolymer compositions prepared from these cyclopolysiloxanes and from mixtures of these cyclosiloxanes and other siloxanes.Type: GrantFiled: May 29, 1998Date of Patent: April 6, 1999Assignee: PCR, Inc.Inventors: Mark A. Buese, John Scott Shaffer
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Patent number: 5827509Abstract: Topically applicable sunscreen/cosmetic compositions well suited for enhanced photoprotection of human skin and/or hair against the damaging effects of UV-A and UV-B irradiation, particularly solar radiation, comprise a photoprotecting effective amount of a novel cinnamonitrile-substituted polyorganosiloxane/polyorganosilane having one of the formulae (1) to (3): ##STR1## wherein A is a monovalent cinnamonitrile radical which comprises an alkylene or alkyleneoxy bridging group, which is bonded directly to a silicon atom, and which has the formula (4): ##STR2##Type: GrantFiled: November 17, 1995Date of Patent: October 27, 1998Assignee: Societe L'Oreal S.A.Inventors: Herve Richard, Madeleine Leduc, Alain Lagrange
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Patent number: 5807922Abstract: Novel organosilane derivatized long-chain compounds containing halosilane and hydroxysilane groups are disclosed and claimed. A process for the syntheses of these novel compositions is also disclosed, which involves simple one-pot hydrosilylation reaction of substituted halosilanes with substituted long-chain olefinic compounds, and subsequent hydrolysis to form surface active silanol derivatives. Preferred embodiments include organosilane derivatives of fatty acids derived from tung oil, high erucic acid rape seed oil, and linseed oil. These compositions feature high surface activity in forming stable organic/water emulsions of various difficultly emulsifiable materials as compared with conventional emulsifying agents. These compositions are useful as reactive-dispersants, defoamers, reactive-surfactants in emulsion polymerization, crosslinkers, film formers, gloss enhancers, anticorrosive additives, adhesion promoters and as general property enhancers in coatings, adhesives and inks.Type: GrantFiled: October 30, 1996Date of Patent: September 15, 1998Assignee: University of Southern MississippiInventors: Shelby Freland Thames, Kamlesh Gopichand Panjnani, Rajan Hariharan
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Patent number: 5654469Abstract: Compounds of Formula I ##STR1## wherein the symbols are as defined in the specification.Type: GrantFiled: May 31, 1996Date of Patent: August 5, 1997Assignee: AllerganInventors: Vidyasagar Vuligonda, Min Teng, Richard L. Beard, Alan T. Johnson, Yuan Lin, Roshantha A. Chandraratna
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Patent number: 5594156Abstract: A process for preparing silyl cyanohydrins that comprises reacting an aldehyde or ketone with a hydrogen cyanide, a trisubstituted halosilane and a correspondingly substituted disilazane or silyl amine.Type: GrantFiled: August 18, 1995Date of Patent: January 14, 1997Assignee: Huls America Inc.Inventors: Chitoor S. Subramaniam, Gerald L. Larson
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Patent number: 5359101Abstract: Anionically polymerizable monomers containing at least one silicon or titanium atom form polymeric photoresists having good dry etch resistance for use in microlithography. The monomers are of the formula ##STR1## wherein A is --H or --CH.dbd.CH.sub.2 ; X is a strong electron withdrawing group;Y is a strong electron withdrawing group containing at least one silicon or titanium atom.Preferably Y is ##STR2## wherein n is 1-5 and R.sup.2, R.sup.3 and R.sup.4 are C.sub.1 -C.sub.10 alkyl. A particularly preferred monomer is 3-trimethylsilylpropyl 2-cyanoacrylate.Methods for applying a resist coating by vapor deposition of these monomers and exposure to radiation are described. A positive or negative tone image can be produced, depending upon the imaging method employed. The imaging layer may be applied over a planarizing layer to form a multilayer photoresist.Type: GrantFiled: October 1, 1991Date of Patent: October 25, 1994Assignee: Loctite Ireland, Ltd.Inventors: John Woods, Pauline Coakley
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Patent number: 5332825Abstract: This invention relates to two processes for preparing aminoacetonitriles in one vessel under anhydrous conditions. Process I involves the steps of: (A) reacting trimethylsilyl cyanide and an aldehyde in a water miscible amide solvent to obtain a silyl blocked cyanohydrin solution; (B) adding a catalytic amount of water to the silyl blocked cyanohydrin solution from Step (A); and (C) passing ammonia through the solution to obtain an aminoacetonitrile. Process II involves the steps of: (A') reacting trimethylsilyl cyanide with an aldehyde in the absence of solvent to form a silyl blocked cyanohydrin; (B') adding a water miscible amide solvent to the silyl blocked cyanohydrin from Step (A') to obtain a solution; and (C') passing ammonia through the solution to obtain an aminoacetonitrile. Aminoacetonitriles are important intermediates in the preparation of amino acids, thiadiazoles, acylaminoacetonitriles, and imidazole derivatives.Type: GrantFiled: October 13, 1993Date of Patent: July 26, 1994Assignee: Eastman Kodak CompanyInventor: Paul R. Buckland
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Patent number: 5329023Abstract: The invention relates to a method of preparing optically active alcohols which consist substantially (at least 75% e.e.) or entirely of one enantiomer of formula 4 ##STR1## wherein R and A are as defined therein. The method comprises, which maintaining enantiomeric excess, converting an optically active cyanohydrin of formula 1 ##STR2## into optically active protected cyanohydrin of formula 2 ##STR3## converting the protected cyanohydrin of formula 2 into an optically active compound of formula 3 ##STR4## removing the protecting group B.Type: GrantFiled: June 15, 1992Date of Patent: July 12, 1994Assignee: Duphar International Research B.V.Inventors: Johannes Brussee, Arne Van Der Gen
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Patent number: 5247108Abstract: An oil comprising an amino-modified silicone fluid containing an amino group with an amine equivalent of 10,000 to 200,000 g/mol and having a viscosity of 10 to 100,000 centistokes at 25.degree. C. is effective in preventing any electric contact failure in relays, switches, motors, corotrons and similar electric elements.Type: GrantFiled: September 9, 1992Date of Patent: September 21, 1993Assignee: Shin-Etsu Chemical Co., Ltd.Inventors: Motohiko Hirai, Takahiro Goi
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Patent number: 5239100Abstract: Novel dimethylpolysiloxane compounds having antibacterial activity are disclosed. Biguanidyl group or cyanoguanidyl group are introduced into dimetylpolysiloxane compounds.Type: GrantFiled: December 24, 1992Date of Patent: August 24, 1993Assignee: Mitsubishi Materials CorporationInventors: Honda Tsunetoshi, Akiko Azuma, Akira Nishihara
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Patent number: 5218136Abstract: A styryl compound of the formula: ##STR1## wherein R.sub.1, R.sub.2 and R.sub.11 are the same or different and a hydrogen atom, an optionally substituted alkyl, alkenyl or aralkyl group or R.sub.1 and R.sub.2 may form a ring together with the nitrogen atom to which they are bonded, which ring may include at least one hetero atom in addition to said nitrogen atom; R.sub.10 is an optionally substituted alkylene group; R.sub.3 is --OH, --OCOR.sub.5 or --OSi(R.sub.5).sub.3 in which R.sup.5 is an alkyl group; R.sub.12 and R.sub.13 are independently a hydrogen atom, an optionally substituted lower alkyl or alkoxy group, an amide group or a halogen atom; X, Y, W and Z are the same or different and an electron attracting group, and n is a number of 2-15, which is suitable as a light absorber in a photoresist composition.Type: GrantFiled: December 27, 1988Date of Patent: June 8, 1993Assignee: Sumitomo Chemical Company, LimitedInventors: Takanori Yamamoto, Shinji Konishi, Ryotaro Hanawa, Akirhiro Furuta, Takeshi Hioki, Jun Tomioka
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Patent number: 5217645Abstract: A mesomorphic compound represented by the following formula (I): ##STR1## wherein R.sub.1 denotes a linear or branched alkyl group having 2-16 carbon atoms capable of including one or non-neighboring two methylene groups which can be replaced with --O--, --S--, --CO--, --COO-- or --OCO-- and capable of including a hydrogen atom which can be replaced with a fluorine atom; A denotes --A.sub.1 -- or --A.sub.1 --A.sub.2 --; B.sub.2 denotes --B.sub.3 -- or --B.sub.3 --B.sub.4 --; A.sub.1, A.sub.2, B.sub.1, B.sub.3 and B.sub.4 independently denote ##STR2## wherein Y.sub.1 and Y.sub.2 independently denote a hydrogen atom, F, Cl, Br, --CH.sub.3, --CN or --CF.sub.3, with the proviso that B.sub.1 can be a single bond; Z.sub.1 and Z.sub.2 independently denote a single bond, --COO--, --OCO--, --CH.sub.2 O-- or --OCH.sub.2 --; Z.sub.3 denotes --O--, --CO--, --COO-- or --OCO--; R.sub.2, R.sub.3 and R.sub.Type: GrantFiled: September 13, 1991Date of Patent: June 8, 1993Assignee: Canon Kabushiki KaishaInventors: Takashi Iwaki, Takao Takiguchi, Takeshi Togano, Yoko Yamada, Shinichi Nakamura
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Patent number: 5110968Abstract: A naphthalocyanine derivative having as substituents at least one group of a formula: SR.sup.1 wherein R.sup.1 is --(CR.sup.2 R.sup.3).sub.x SiR.sup.4 R.sup.5 R.sup.6, in which R.sup.2 to R.sup.6 are H, alkyl groups, etc. is excellent in solubility in saturated hydrocarbon solvents and in absorption of semiconductor laser lights and thus, is suitable for producing optical recording media.Type: GrantFiled: May 30, 1991Date of Patent: May 5, 1992Assignee: Hitachi, Chemical Company Ltd.Inventors: Seiji Tai, Nobuyuki Hayashi, Koichi Kamijima, Takayuki Akimoto, Mitsuo Katayose, Hideo Hagiwara
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Patent number: 5106530Abstract: The present invention relates to compounds of the formula ##STR1## in which Z is a halogen atom, a cyano group or a hydroxyl group,n is 0, 1 or 2,R' is a radical of the formulaR'"--[Si(R*).sub.2 ].sub.x (CH.sub.2).sub.y R""-- (9),in whichx is the number 0 or 1,y is an integer from 1 to 18,R'"is a defined in the description,R* is identical or different, optionally substituted C.sub.1 - to C.sub.18 -hydrocarbon or hydrocarbonoxy radicals,R"" is a phenylene or biphenylene radical or a radical of the formula --E--, whereE is a divalent radical of the formula --O-- or --[Si(R*).sub.2 ].sub.z --, andz is the number 0 or 1,and the compounds contain at least one group of the formula --Si(R*).sub.2 -- per molecule, and the radicalR" is a cholesteryl radical, a radical as defined for R* or a radical of the formula --C.sub.6 H.sub.4 --R*,and the preparation and use thereof.Type: GrantFiled: June 22, 1990Date of Patent: April 21, 1992Assignee: Consortium fur Elektrochemische Ind.Inventors: Wolfgang Haas, Norman Haberle, Rainer Winkler, Franz-Heinrich Kreuzer
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Patent number: RE35462Abstract: The present invention relates to compounds of the formula ##STR1## in which Z is a halogen atom, a cyano group or a hydroxyl group,n is 0, 1 or 2,R' is a radical of the formulaR"'--[Si(R*).sub.2 ].sub.x (CH.sub.2).sub.y R""-- (9),in whichx is the number 0 or 1,y is an integer from 1 to 18,R"'is a defined in the description,R* is identical or different, optionally substituted C.sub.1 - to C.sub.18 -hydrocarbon or hydrocarbonoxy radicals,R"" is a phenylene or biphenylene radical or a radical of the formula --E--, whereE is a divalent radical of the formula --O-- or --[Si(R*).sub.2 ].sub.z --, andz is the number 0 or 1,and the compounds contain at least one group of the formula --Si(R*).sub.2 -- per molecule, and the radicalR" is a cholesteryl radical, a radical as defined for R* or a radical of the formula --C.sub.6 H.sub.4 --R*,and the preparation and use thereof.Type: GrantFiled: February 7, 1994Date of Patent: February 25, 1997Assignee: Consortium fur elekochemische Ind. GmbHInventors: Wolfgang Haas, Norman Haberle, Rainer Winkler, Franz-Heinrich Kreuzer