Two Silicons Bonded Directly To The Same Oxygen Patents (Class 556/433)
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Patent number: 11472925Abstract: Provided is a polymer of the formula: and compositions comprising the same. The polymers comprise a cyclic unsaturated group (Z3) within the siloxane polymer backbone. The polymers have been found to exhibit good thermal conductivity and may find utility in a variety of applications.Type: GrantFiled: March 22, 2018Date of Patent: October 18, 2022Assignee: MOMENTIVE PERFORMANCE MATERIALS INC.Inventors: Pranabesh Dutta, Vinu Krishnan Appukuttan, Sandeep Naik, Anubhav Saxena
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Patent number: 10858518Abstract: Provided is a curable organopolysiloxane composition from which highly heat-resistant cured products can be obtained, the curable organopolysiloxane composition comprising: (A) 100 parts by mass of a novel organopolysiloxane represented by formula (1) (R1 is an alkyl group or an alkoxy substituted alkyl group having 1 to 6 carbon atoms, R2 is a group selected from an alkyl group having 1 to 20 carbon atoms, an aryl group having 6 to 20 carbon atoms, and a group in which a portion of the hydrogen atoms of those groups is substituted with a halogen atom, Ar is an arylene group having 6 carbon atoms or more, a is 1 to 1,000, b is 1 to 5,000, and n is 1 to 3, the total of n in an unsubstituted or substituted alkoxysilyl group on both ends of the molecular chain being 3 or more); and (B) 0.01 to 10 parts by mass of a curing catalyst. Also provided are electrical and electronic components, a vehicle oil seal, a building sealant, etc. which use the cured product of the composition.Type: GrantFiled: November 6, 2017Date of Patent: December 8, 2020Assignee: SHIN-ETSU CHEMICAL CO., LTD.Inventors: Tomoki Akiba, Tadashi Araki, Takafumi Sakamoto
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Publication number: 20130341528Abstract: A fluorescent material includes a silica matrix, and a fluorescent dye compound covalently bonded to the silica matrix. The fluorescent dye compound may have first and second absorption wavelengths and an emission wavelength. A method for producing a photoswitchable fluorescent material includes combining silane monomers and fluorescent silane dyes, and initiating a polymerization reaction between the silane monomers and the photoswitchable fluorescent silane dyes, thereby creating photoswitchable fluorescent dye compounds covalently bonded to a silica matrix. The authenticity of a product may be verified according to a method in which a fluorescent material is present in or on a product, and the material is tested for fluorescence at first and second absorption wavelengths, the presence of structural characteristics, or both. The fluorescent material may exhibit on/off functionality through the use of the fluorescent material at different absorption wavelengths.Type: ApplicationFiled: June 20, 2012Publication date: December 26, 2013Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATIONInventors: Dylan J. Boday, Jason T. Wertz
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Patent number: 8404882Abstract: The present invention relates to a one-terminal reactive organopolysiloxane further having a hydrophilic polyalkyleneoxide group at the omega-terminal and a method for its production. Thus, the present invention provides a one-terminal reactive organopolysiloxane which is characterized by having a polyalkyleneoxide at the omega-terminal, and composed of blocks arranged in the following order: A-B—C—Y wherein A is a monovalent polyalkyleneoxide group having an alkoxy group at a terminal, B is a substituted or unsubstituted divalent alkylene group, C is a divalent polysiloxane group, Y is a monovalent group selected from the group consisting of an alkyl group having a reactive group, a hydrogen atom, a styryl group and a trialkoxysiloxy group, and provides a method for the preparation thereof.Type: GrantFiled: September 24, 2010Date of Patent: March 26, 2013Assignee: Shin-Etsu Chemical Co., Ltd.Inventor: Mamoru Hagiwara
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Patent number: 8394980Abstract: An amino acid-modified organopolysiloxane is provided. It has an amino acid derivative bonded to at least one silicon atom of the organopolysiloxane segment constituting the backbone of the organopolysiloxane via an amide bond represented by the following general formula (1): wherein X and Y are independently a C1-10 divalent hydrocarbon group; m is an integer of 0 to 4; Ra is hydrogen atom, a monovalent hydrocarbon group containing 1 to 4 carbon atoms, or an organic group represented by the following general formula (2): (wherein Rb is hydrogen atom, a C1-7 monovalent hydrocarbon group, an alkaline metal, or an alkaline earth metal, and Rc is independently hydrogen atom, hydroxy group, or a C1-10 monovalent hydrocarbon group optionally containing oxygen atom, sulfur atom, or nitrogen atom); and Z is an organic group represented by the general formula (2).Type: GrantFiled: August 13, 2012Date of Patent: March 12, 2013Assignee: Shin-Etsu Chemical Co., Ltd.Inventor: Hiroyuki Moriya
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Patent number: 8338630Abstract: An amino acid-modified organopolysiloxane is provided. It has an amino acid derivative bonded to at least one silicon atom of the organopolysiloxane segment constituting the backbone of the organopolysiloxane via an amide bond represented by the following general formula (1): wherein X and Y are independently a C1-10 divalent hydrocarbon group; m is an integer of 0 to 4; Ra is hydrogen atom, a monovalent hydrocarbon group containing 1 to 4 carbon atoms, or an organic group represented by the following general formula (2): (wherein Rb is hydrogen atom, a C1-7 monovalent hydrocarbon group, an alkaline metal, or an alkaline earth metal, and Rc is independently hydrogen atom, hydroxy group, or a C1-10 monovalent hydrocarbon group optionally containing oxygen atom, sulfur atom, or nitrogen atom); and Z is an organic group represented by the general formula (2).Type: GrantFiled: December 10, 2010Date of Patent: December 25, 2012Assignee: Shin-Etsu Chemical Co., Ltd.Inventor: Hiroyuki Moriya
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Patent number: 7875981Abstract: To provide an insulating film material that can be advantageously used for forming an insulating film having a low dielectric constant and excellent resistance to damage, such as etching resistance and resistance to liquid reagents, a multilayer interconnection structure in which a parasitic capacitance between the interconnections can be reduced, efficient methods for manufacturing the multilayer interconnection structure, and an efficient method for manufacturing a semiconductor device with a high speed and reliability. The insulating film material contains at least a silicon compound having a steric structure represented by Structural Formula (1) below. where, R1, R2, R3, and R4 may be the same or different and at least one of them represents a functional group containing any of a hydrocarbon and an unsaturated hydrocarbon.Type: GrantFiled: February 26, 2008Date of Patent: January 25, 2011Assignee: Fujitsu LimitedInventors: Yasushi Kobayashi, Yoshihiro Nakata, Shirou Ozaki
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Patent number: 7425373Abstract: A primer composition comprising a compound containing an epoxy group, a Si—H group, and an aromatic ring per molecule, and a solvent is effective for assisting in integral molding or bonding a silicone rubber to an adherend of gold, silver or platinum.Type: GrantFiled: May 4, 2005Date of Patent: September 16, 2008Assignee: Shin-Etsu Chemical Co., Ltd.Inventors: Naoki Yamakawa, Noriyuki Meguriya
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Patent number: 7132294Abstract: The invention provides a device for selective molecular recognition, the device comprising a sensing portion, wherein said sensing portion includes a substrate having coated thereon a layer comprising a non-volatile, small molecule compound having at least two pendant and terminal unsaturated groups, each being functionalized with at least one halogen substituted alcohol or phenol functional group. The compound of the invention preferably has one of the following general formulae: wherein A is a core moiety; B is a pendant and terminal unsaturated group; q is at least 1; r is at least 2; X is a linking group; and n is an integer designating the number of repeating units from 1 to 3, with the proviso that, if n is greater than 1, then the B groups differ from each other in at least two of the repeating units. The device is used to detect the molecules of a hydrogen bond accepting vapor such as an organophosphonate or nitroaromatic vapor.Type: GrantFiled: February 25, 2002Date of Patent: November 7, 2006Assignee: The United States of America as represented by the Secretary of the NavyInventors: Eric J. Houser, Robert Andrew McGill
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Patent number: 6534587Abstract: Symmetric and asymmetric cyclic silalkylenesiloxane monomers and copolymers thereof, as well as crosslinked and/or reinforced silalkylenesiloxane copolymers, medical devices containing such materials, and methods of preparation.Type: GrantFiled: May 9, 2000Date of Patent: March 18, 2003Assignee: Medtronic, IncInventors: Mark A. Tapsak, Edward Di Domenico
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Patent number: 6011167Abstract: Polyorganosiloxazane is provided which is capable of being converted into a ceramic material having low dielectric constant. The polymer according to the present invention is characterized by comprising the main repeating units of --(RSiN.sub.3)--, --(RSiN.sub.2 O)--, --(RSiNO.sub.2)-- and --(RSiO.sub.3)--, wherein, R represents an alkyl, alkenyl, cycloalkyl, aryl, alkylamino or alkylsilyl group, and by having a number-average molecular weight ranging from 300 to 100,000. The polyorganosiloxazane of the present invention has superior thermal resistance, and a ceramic material obtainable by firing the same at a predetermined temperature shows very low specific dielectric constant of 2.7 or less, making it useful particularly as a material in electronics.Type: GrantFiled: August 26, 1998Date of Patent: January 4, 2000Assignee: Tonen CorporationInventors: Yuuji Tashiro, Osamu Funayama
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Patent number: 5969072Abstract: Carborane-silane/siloxane compounds having unsaturated organic end groups e represented by the formula: ##STR1## wherein: u and x are independently selected positive integers, v and w are independently selected integers greater than or equal to zero, R.sup.1, R.sup.2, R.sup.3, R.sup.4, R.sup.5, R.sup.6, R.sup.7 and R.sup.8 are independently selected from the group consisting of alkyl, aryl, alkylaryl, haloalkyl, haloaryl and mixtures thereof; A and E are independently selected from the group consisting of O, an aliphatic bridge, an aryl bridge and mixtures thereof; and R.sup.9 and R.sup.10 are unsubstituted or substituted vinyl or ethynyl groups.Type: GrantFiled: February 27, 1998Date of Patent: October 19, 1999Assignee: The United States of America as represented by the Secretary of the NavyInventors: Teddy M. Keller, Eric J. Houser
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Patent number: 5864000Abstract: This invention relates to a hybrid phenolic/polysiloxane resin derivable by (A) reacting a phenolic compound with (a) a siloxane polymer or (b) an aldehyde and (B) reacting the reaction product of stage (A)(a) with an aldehyde, or, (A)(b) with a siloxane polymer to form the hybrid phenolic/polysiloxane resin, said resin having a siloxane content of 1-40% by weight of the total hybrid resin and a viscosity in the range of 100-10000 mPa s. The products derived from the hybrid resins of the present invention have enhanced impact strength; can tolerate higher burst pressures in pipe applications, have improved resistance to hydrolysis and other environmental weathering characteristics; have improved fire stability; and show improved film flexibility in coatings.Type: GrantFiled: September 19, 1997Date of Patent: January 26, 1999Assignee: Blagden Chemicals LimitedInventors: Alan William Lightbody, John Edwar Jones, Murray Roy Orpin
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Patent number: 5691433Abstract: A silicon-containing polymer comprising a structural unit of the formula (1): ##STR1## wherein R.sup.1 and R.sup.2 are the same or different and represent a monovalent organic group having 1 to 20 carbon atoms, and the benzene ring may have a substituent, which has good heat resistance.Type: GrantFiled: March 28, 1996Date of Patent: November 25, 1997Assignee: Kanegafuchi Chemical Industry Co., Ltd.Inventors: Jun Kotani, Manabu Tsumura, Takahisa Iwahara, Toshifumi Hirose
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Patent number: 5679818Abstract: The present invention is a compound having the formula:R.sup.1 --Ac.sup.1 --Ar.sup.1 --M--Ar.sup.2 --Ac.sup.2 --R.sup.2where R.sup.1 and R.sup.2 are independently selected from the group consing of hydrogen, unsubstituted alkyl groups, substituted alkyl groups, unsubstituted aryl groups, and substituted aryl groups, where Ac.sup.1 and Ac.sup.2 are independently selected alkynyl groups having at least 1 carbon-carbon triple bond, where Ar.sup.1 and Ar.sup.2 are independently selected substituted or unsubstituted aromatic diradicals, and where M has the structure ##STR1## where m is a positive integer, wherein x, p, y, r, n, and z are independently selected integers, where z.noteq.0 when n.noteq.0, and where R.sup.3 through R.sup.14 are independently selected from the group consisting of hydrogen, unsubstituted alkyl groups, substituted alkyl groups, unsubstituted aryl groups, and substituted aryl groups.Type: GrantFiled: July 26, 1996Date of Patent: October 21, 1997Assignee: The United States of America as represented by the Secretary of the NavyInventors: Daniel Bucca, Teddy M. Keller
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Patent number: 5677444Abstract: A novel and simple method is proposed for the synthetic preparation of an N,N-disubstituted .beta.-ketothioamide compound represented by the general formulaR.sup.1 R.sup.2 N--CS--CH.sub.2 --CO--R.sup.3,in which R.sup.1 and R.sup.2 are each a monovalent hydrocarbon group or each a divalent hydrocarbon group jointly forming a cyclic structure together with the nitrogen atom and R.sup.3 is a hydrogen atom, a monovalent hydrocarbon group or a divalent hydrocarbon group forming a cyclic structure jointly with R.sup.1, R.sup.1 being a divalent hydrocarbon group and R.sup.2 being a monovalent hydrocarbon group. The method comprises:(a) mixing an N,N-disubstituted amide compound represented by the general formulaR.sup.1 R.sup.2 N--CO--R.sup.3,and a bis(trialkylsilyl)thioketene compound represented by the general formula(R.sub.3 Si).sub.2 C.dbd.C.dbd.Type: GrantFiled: September 15, 1995Date of Patent: October 14, 1997Assignee: Japan as represented by Director General of Agency of Industrial Science and TechnologyInventors: Tohru Tsuchiya, Isao Shibuya, Yoichi Taguchi, Akihiro Oishi, Kazumasa Honda
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Patent number: 5548051Abstract: Single component inorganic/organic network materials incorporating the physical properties of glasses with the flexibility of organic materials of empirical formula X(SiO.sub.1.5).sub.n wherein X is one or more flexible organic linkages and n is greater than or equal to 2, as well as precursors thereof, are disclosed.Type: GrantFiled: August 7, 1995Date of Patent: August 20, 1996Assignee: E. I Du Pont de Nemours and CompanyInventors: Michael J. Michalczyk, Kenneth G. Sharp
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Patent number: 5240813Abstract: Novel polysilphenylenesiloxanes having a three-dimensional mesh structure of silphenylenesiloxane core surrounded by triorganosilyl groups, which have a good sensitivity to ionizing radiations such as deep ultraviolet rays, electron beams and X-rays, a high softening point of 400.degree. C. or more, and a good resistance to O.sub.2 -plasma etching, and exhibit a high contrast and low swelling. These polysiphenylenesiloxanes are useful as a resist material, especially a top layer resist of the bi-level resist system and an interlevel dielectric or heat-resisting protective layer. The resist material has a high resolution because of a high contrast, low swelling and high thermal resistance thereof.Type: GrantFiled: November 15, 1990Date of Patent: August 31, 1993Assignee: Fujitsu LimitedInventors: Keiji Watanabe, Akira Oikawa, Shun-ichi Fukuyama, Masaaki Yamagami, Takahisa Namiki
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Patent number: 5118828Abstract: The fluorine-containing organosilicon compound of the present invention is represented by the following formula: ##STR1## wherein Rf is a perfluoroalkyl group. This compound is quite useful as a raw material for the production of polysilethylenesiloxanes excellent in solvent resistance.Type: GrantFiled: June 28, 1991Date of Patent: June 2, 1992Assignee: Shin-Etsu Chemical Co., Ltd.Inventors: Toshio Takago, Hirofumi Kishita, Shinichi Sato, Hitoshi Kinami, Shuji Suganuma, Koichi Yamaguchi, Kenichi Fukuda, Hirokazu Yamada
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Patent number: 4985576Abstract: A bisindenyl derivate of the formula I ##STR1## (M.sup.1 =Si or Ge, R.sup.6 and R.sup.7 =unsubstituted or substituted idenyl radical)is obtained in very good yield by reacting a compound of the formula II ##STR2## (X=halogen) with a compound of the formula III or IVR.sup.6 -M.sup.2 (III) R.sup.7 -M.sup.2 (IV)(M.sup.2 =alkali metal)if, in the reaction, compound III or IV is added slowly to compound II.Compound I is suitable as a starting material for the preparation of metallocene catalyst components.Type: GrantFiled: December 29, 1989Date of Patent: January 15, 1991Assignee: Hoechst AktiengesellschaftInventors: Jurgen Rohrmann, Martin Antberg
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Patent number: 4772675Abstract: The method of this invention produces an elastomeric silicone sealant having an improved shelf life. The sealant comprises an alkoxysilethylene ended polydiorganosiloxane polymer, an alkoxytrialkoxysilane crosslinker, and a titanium catalyst.Type: GrantFiled: January 28, 1988Date of Patent: September 20, 1988Assignee: Dow Corning CorporationInventors: Jerome M. Klosowski, Michael D. Meddaugh
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Patent number: 4382144Abstract: This invention is directed to the preparation of certain arylene bis-silanols in highly purified form and to the preparation of five new arylene bis-silanols in particular, along with a procedure for polymerizing these and other arylene-type bis-silanols using phosgene as a polymerization promotor or catalyst, to obtain highly purified, high molecular weight arylene-siloxanylene polymers having the characteristic structure: ##STR1## where Y is an arylene or substituted arylene moiety; R and R' are the same or different alkyl group(s), substituted alkyl group(s) or a phenyl group, x ranges from about 1 to 3 and n ranges from about 300 to 1500, said polymers having molecular weights (number average) of 100,000 and higher.Preferred polymers are those arylenesiloxanylenecarbonate polymers which, when laminated to polycarbonate sheets or glass maintain their transparency, stability and adherence to said substrates at temperatures of up to and including 400.degree. F.Type: GrantFiled: January 27, 1982Date of Patent: May 3, 1983Assignee: The United States of America as represented by the Secretary of the Air ForceInventors: Harold Rosenberg, Tsu-tzu Tsai
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Patent number: 4366323Abstract: This invention is directed to the preparation of certain arylene bis-silanols in highly purified form and to the preparation of five new arylene bis-silanols in particular, along with a procedure for polymerizing these and other arylene-type bis-silanols using phosgene as a polymerization promotor or catalyst, to obtain highly purified, high molecular weight arylene-siloxanylene polymers having the characteristic structure: ##STR1## where Y is an arylene or substituted arylene moiety; R and R' are the same or different alkyl group(s), substituted alkyl group(s) or a phenyl group, x ranges from about 1 to 3 and n ranges from about 300 to 1500; said polymers having molecular weights (number average) of 100,000 and higher.Preferred polymers are those arylenesiloxanylenecarbonate polymers which, when laminated to polycarbonate sheets or glass maintain their transparency, stability and adherence to said substrates at temperatures of up to and including 400.degree. F.Type: GrantFiled: January 27, 1982Date of Patent: December 28, 1982Assignee: The United States of America as represented by the Secretary of the Air ForceInventors: Harold Rosenberg, Tsu-tzu Tsai
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Patent number: 4306042Abstract: An oxygen permeable contact lens fabricated from a copolymer of a (a) siloxanyl alkylester, an ester derivative of acrylic or methacrylic acid, surface wetting agent and an oxygen permeable crosslinking agent. The copolymer can be made either hard, soft or elasticmeric with improved oxygen permeability.Type: GrantFiled: September 8, 1980Date of Patent: December 15, 1981Inventor: Russell A. Neefe
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Patent number: H1612Abstract: A method for making silarylene-siloxane polymers having the Formula: ##STR1## where R.sub.1 -R.sub.6 are alkyl or aryl and n is an integer above about , wherein the rate of reaction and the degree of polymerization achieved when reacting disilanols with dichlorosilanes to form silarylene-siloxane polymers are unexpectedly enhanced by a subsequent charge into the reaction medium of a tertiary amine which functions as an acid acceptor.Type: GrantFiled: August 2, 1993Date of Patent: November 5, 1996Assignee: The United States of America as represented by the Secretary of the NavyInventors: Robert A. Rhein, James C. Baldwin