Two Silicons Bonded Directly To The Same Oxygen Patents (Class 556/433)
  • Patent number: 11472925
    Abstract: Provided is a polymer of the formula: and compositions comprising the same. The polymers comprise a cyclic unsaturated group (Z3) within the siloxane polymer backbone. The polymers have been found to exhibit good thermal conductivity and may find utility in a variety of applications.
    Type: Grant
    Filed: March 22, 2018
    Date of Patent: October 18, 2022
    Assignee: MOMENTIVE PERFORMANCE MATERIALS INC.
    Inventors: Pranabesh Dutta, Vinu Krishnan Appukuttan, Sandeep Naik, Anubhav Saxena
  • Patent number: 10858518
    Abstract: Provided is a curable organopolysiloxane composition from which highly heat-resistant cured products can be obtained, the curable organopolysiloxane composition comprising: (A) 100 parts by mass of a novel organopolysiloxane represented by formula (1) (R1 is an alkyl group or an alkoxy substituted alkyl group having 1 to 6 carbon atoms, R2 is a group selected from an alkyl group having 1 to 20 carbon atoms, an aryl group having 6 to 20 carbon atoms, and a group in which a portion of the hydrogen atoms of those groups is substituted with a halogen atom, Ar is an arylene group having 6 carbon atoms or more, a is 1 to 1,000, b is 1 to 5,000, and n is 1 to 3, the total of n in an unsubstituted or substituted alkoxysilyl group on both ends of the molecular chain being 3 or more); and (B) 0.01 to 10 parts by mass of a curing catalyst. Also provided are electrical and electronic components, a vehicle oil seal, a building sealant, etc. which use the cured product of the composition.
    Type: Grant
    Filed: November 6, 2017
    Date of Patent: December 8, 2020
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Tomoki Akiba, Tadashi Araki, Takafumi Sakamoto
  • Publication number: 20130341528
    Abstract: A fluorescent material includes a silica matrix, and a fluorescent dye compound covalently bonded to the silica matrix. The fluorescent dye compound may have first and second absorption wavelengths and an emission wavelength. A method for producing a photoswitchable fluorescent material includes combining silane monomers and fluorescent silane dyes, and initiating a polymerization reaction between the silane monomers and the photoswitchable fluorescent silane dyes, thereby creating photoswitchable fluorescent dye compounds covalently bonded to a silica matrix. The authenticity of a product may be verified according to a method in which a fluorescent material is present in or on a product, and the material is tested for fluorescence at first and second absorption wavelengths, the presence of structural characteristics, or both. The fluorescent material may exhibit on/off functionality through the use of the fluorescent material at different absorption wavelengths.
    Type: Application
    Filed: June 20, 2012
    Publication date: December 26, 2013
    Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATION
    Inventors: Dylan J. Boday, Jason T. Wertz
  • Patent number: 8404882
    Abstract: The present invention relates to a one-terminal reactive organopolysiloxane further having a hydrophilic polyalkyleneoxide group at the omega-terminal and a method for its production. Thus, the present invention provides a one-terminal reactive organopolysiloxane which is characterized by having a polyalkyleneoxide at the omega-terminal, and composed of blocks arranged in the following order: A-B—C—Y wherein A is a monovalent polyalkyleneoxide group having an alkoxy group at a terminal, B is a substituted or unsubstituted divalent alkylene group, C is a divalent polysiloxane group, Y is a monovalent group selected from the group consisting of an alkyl group having a reactive group, a hydrogen atom, a styryl group and a trialkoxysiloxy group, and provides a method for the preparation thereof.
    Type: Grant
    Filed: September 24, 2010
    Date of Patent: March 26, 2013
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventor: Mamoru Hagiwara
  • Patent number: 8394980
    Abstract: An amino acid-modified organopolysiloxane is provided. It has an amino acid derivative bonded to at least one silicon atom of the organopolysiloxane segment constituting the backbone of the organopolysiloxane via an amide bond represented by the following general formula (1): wherein X and Y are independently a C1-10 divalent hydrocarbon group; m is an integer of 0 to 4; Ra is hydrogen atom, a monovalent hydrocarbon group containing 1 to 4 carbon atoms, or an organic group represented by the following general formula (2): (wherein Rb is hydrogen atom, a C1-7 monovalent hydrocarbon group, an alkaline metal, or an alkaline earth metal, and Rc is independently hydrogen atom, hydroxy group, or a C1-10 monovalent hydrocarbon group optionally containing oxygen atom, sulfur atom, or nitrogen atom); and Z is an organic group represented by the general formula (2).
    Type: Grant
    Filed: August 13, 2012
    Date of Patent: March 12, 2013
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventor: Hiroyuki Moriya
  • Patent number: 8338630
    Abstract: An amino acid-modified organopolysiloxane is provided. It has an amino acid derivative bonded to at least one silicon atom of the organopolysiloxane segment constituting the backbone of the organopolysiloxane via an amide bond represented by the following general formula (1): wherein X and Y are independently a C1-10 divalent hydrocarbon group; m is an integer of 0 to 4; Ra is hydrogen atom, a monovalent hydrocarbon group containing 1 to 4 carbon atoms, or an organic group represented by the following general formula (2): (wherein Rb is hydrogen atom, a C1-7 monovalent hydrocarbon group, an alkaline metal, or an alkaline earth metal, and Rc is independently hydrogen atom, hydroxy group, or a C1-10 monovalent hydrocarbon group optionally containing oxygen atom, sulfur atom, or nitrogen atom); and Z is an organic group represented by the general formula (2).
    Type: Grant
    Filed: December 10, 2010
    Date of Patent: December 25, 2012
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventor: Hiroyuki Moriya
  • Patent number: 7875981
    Abstract: To provide an insulating film material that can be advantageously used for forming an insulating film having a low dielectric constant and excellent resistance to damage, such as etching resistance and resistance to liquid reagents, a multilayer interconnection structure in which a parasitic capacitance between the interconnections can be reduced, efficient methods for manufacturing the multilayer interconnection structure, and an efficient method for manufacturing a semiconductor device with a high speed and reliability. The insulating film material contains at least a silicon compound having a steric structure represented by Structural Formula (1) below. where, R1, R2, R3, and R4 may be the same or different and at least one of them represents a functional group containing any of a hydrocarbon and an unsaturated hydrocarbon.
    Type: Grant
    Filed: February 26, 2008
    Date of Patent: January 25, 2011
    Assignee: Fujitsu Limited
    Inventors: Yasushi Kobayashi, Yoshihiro Nakata, Shirou Ozaki
  • Patent number: 7425373
    Abstract: A primer composition comprising a compound containing an epoxy group, a Si—H group, and an aromatic ring per molecule, and a solvent is effective for assisting in integral molding or bonding a silicone rubber to an adherend of gold, silver or platinum.
    Type: Grant
    Filed: May 4, 2005
    Date of Patent: September 16, 2008
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Naoki Yamakawa, Noriyuki Meguriya
  • Patent number: 7132294
    Abstract: The invention provides a device for selective molecular recognition, the device comprising a sensing portion, wherein said sensing portion includes a substrate having coated thereon a layer comprising a non-volatile, small molecule compound having at least two pendant and terminal unsaturated groups, each being functionalized with at least one halogen substituted alcohol or phenol functional group. The compound of the invention preferably has one of the following general formulae: wherein A is a core moiety; B is a pendant and terminal unsaturated group; q is at least 1; r is at least 2; X is a linking group; and n is an integer designating the number of repeating units from 1 to 3, with the proviso that, if n is greater than 1, then the B groups differ from each other in at least two of the repeating units. The device is used to detect the molecules of a hydrogen bond accepting vapor such as an organophosphonate or nitroaromatic vapor.
    Type: Grant
    Filed: February 25, 2002
    Date of Patent: November 7, 2006
    Assignee: The United States of America as represented by the Secretary of the Navy
    Inventors: Eric J. Houser, Robert Andrew McGill
  • Patent number: 6534587
    Abstract: Symmetric and asymmetric cyclic silalkylenesiloxane monomers and copolymers thereof, as well as crosslinked and/or reinforced silalkylenesiloxane copolymers, medical devices containing such materials, and methods of preparation.
    Type: Grant
    Filed: May 9, 2000
    Date of Patent: March 18, 2003
    Assignee: Medtronic, Inc
    Inventors: Mark A. Tapsak, Edward Di Domenico
  • Patent number: 6011167
    Abstract: Polyorganosiloxazane is provided which is capable of being converted into a ceramic material having low dielectric constant. The polymer according to the present invention is characterized by comprising the main repeating units of --(RSiN.sub.3)--, --(RSiN.sub.2 O)--, --(RSiNO.sub.2)-- and --(RSiO.sub.3)--, wherein, R represents an alkyl, alkenyl, cycloalkyl, aryl, alkylamino or alkylsilyl group, and by having a number-average molecular weight ranging from 300 to 100,000. The polyorganosiloxazane of the present invention has superior thermal resistance, and a ceramic material obtainable by firing the same at a predetermined temperature shows very low specific dielectric constant of 2.7 or less, making it useful particularly as a material in electronics.
    Type: Grant
    Filed: August 26, 1998
    Date of Patent: January 4, 2000
    Assignee: Tonen Corporation
    Inventors: Yuuji Tashiro, Osamu Funayama
  • Patent number: 5969072
    Abstract: Carborane-silane/siloxane compounds having unsaturated organic end groups e represented by the formula: ##STR1## wherein: u and x are independently selected positive integers, v and w are independently selected integers greater than or equal to zero, R.sup.1, R.sup.2, R.sup.3, R.sup.4, R.sup.5, R.sup.6, R.sup.7 and R.sup.8 are independently selected from the group consisting of alkyl, aryl, alkylaryl, haloalkyl, haloaryl and mixtures thereof; A and E are independently selected from the group consisting of O, an aliphatic bridge, an aryl bridge and mixtures thereof; and R.sup.9 and R.sup.10 are unsubstituted or substituted vinyl or ethynyl groups.
    Type: Grant
    Filed: February 27, 1998
    Date of Patent: October 19, 1999
    Assignee: The United States of America as represented by the Secretary of the Navy
    Inventors: Teddy M. Keller, Eric J. Houser
  • Patent number: 5864000
    Abstract: This invention relates to a hybrid phenolic/polysiloxane resin derivable by (A) reacting a phenolic compound with (a) a siloxane polymer or (b) an aldehyde and (B) reacting the reaction product of stage (A)(a) with an aldehyde, or, (A)(b) with a siloxane polymer to form the hybrid phenolic/polysiloxane resin, said resin having a siloxane content of 1-40% by weight of the total hybrid resin and a viscosity in the range of 100-10000 mPa s. The products derived from the hybrid resins of the present invention have enhanced impact strength; can tolerate higher burst pressures in pipe applications, have improved resistance to hydrolysis and other environmental weathering characteristics; have improved fire stability; and show improved film flexibility in coatings.
    Type: Grant
    Filed: September 19, 1997
    Date of Patent: January 26, 1999
    Assignee: Blagden Chemicals Limited
    Inventors: Alan William Lightbody, John Edwar Jones, Murray Roy Orpin
  • Patent number: 5691433
    Abstract: A silicon-containing polymer comprising a structural unit of the formula (1): ##STR1## wherein R.sup.1 and R.sup.2 are the same or different and represent a monovalent organic group having 1 to 20 carbon atoms, and the benzene ring may have a substituent, which has good heat resistance.
    Type: Grant
    Filed: March 28, 1996
    Date of Patent: November 25, 1997
    Assignee: Kanegafuchi Chemical Industry Co., Ltd.
    Inventors: Jun Kotani, Manabu Tsumura, Takahisa Iwahara, Toshifumi Hirose
  • Patent number: 5679818
    Abstract: The present invention is a compound having the formula:R.sup.1 --Ac.sup.1 --Ar.sup.1 --M--Ar.sup.2 --Ac.sup.2 --R.sup.2where R.sup.1 and R.sup.2 are independently selected from the group consing of hydrogen, unsubstituted alkyl groups, substituted alkyl groups, unsubstituted aryl groups, and substituted aryl groups, where Ac.sup.1 and Ac.sup.2 are independently selected alkynyl groups having at least 1 carbon-carbon triple bond, where Ar.sup.1 and Ar.sup.2 are independently selected substituted or unsubstituted aromatic diradicals, and where M has the structure ##STR1## where m is a positive integer, wherein x, p, y, r, n, and z are independently selected integers, where z.noteq.0 when n.noteq.0, and where R.sup.3 through R.sup.14 are independently selected from the group consisting of hydrogen, unsubstituted alkyl groups, substituted alkyl groups, unsubstituted aryl groups, and substituted aryl groups.
    Type: Grant
    Filed: July 26, 1996
    Date of Patent: October 21, 1997
    Assignee: The United States of America as represented by the Secretary of the Navy
    Inventors: Daniel Bucca, Teddy M. Keller
  • Patent number: 5677444
    Abstract: A novel and simple method is proposed for the synthetic preparation of an N,N-disubstituted .beta.-ketothioamide compound represented by the general formulaR.sup.1 R.sup.2 N--CS--CH.sub.2 --CO--R.sup.3,in which R.sup.1 and R.sup.2 are each a monovalent hydrocarbon group or each a divalent hydrocarbon group jointly forming a cyclic structure together with the nitrogen atom and R.sup.3 is a hydrogen atom, a monovalent hydrocarbon group or a divalent hydrocarbon group forming a cyclic structure jointly with R.sup.1, R.sup.1 being a divalent hydrocarbon group and R.sup.2 being a monovalent hydrocarbon group. The method comprises:(a) mixing an N,N-disubstituted amide compound represented by the general formulaR.sup.1 R.sup.2 N--CO--R.sup.3,and a bis(trialkylsilyl)thioketene compound represented by the general formula(R.sub.3 Si).sub.2 C.dbd.C.dbd.
    Type: Grant
    Filed: September 15, 1995
    Date of Patent: October 14, 1997
    Assignee: Japan as represented by Director General of Agency of Industrial Science and Technology
    Inventors: Tohru Tsuchiya, Isao Shibuya, Yoichi Taguchi, Akihiro Oishi, Kazumasa Honda
  • Patent number: 5548051
    Abstract: Single component inorganic/organic network materials incorporating the physical properties of glasses with the flexibility of organic materials of empirical formula X(SiO.sub.1.5).sub.n wherein X is one or more flexible organic linkages and n is greater than or equal to 2, as well as precursors thereof, are disclosed.
    Type: Grant
    Filed: August 7, 1995
    Date of Patent: August 20, 1996
    Assignee: E. I Du Pont de Nemours and Company
    Inventors: Michael J. Michalczyk, Kenneth G. Sharp
  • Patent number: 5240813
    Abstract: Novel polysilphenylenesiloxanes having a three-dimensional mesh structure of silphenylenesiloxane core surrounded by triorganosilyl groups, which have a good sensitivity to ionizing radiations such as deep ultraviolet rays, electron beams and X-rays, a high softening point of 400.degree. C. or more, and a good resistance to O.sub.2 -plasma etching, and exhibit a high contrast and low swelling. These polysiphenylenesiloxanes are useful as a resist material, especially a top layer resist of the bi-level resist system and an interlevel dielectric or heat-resisting protective layer. The resist material has a high resolution because of a high contrast, low swelling and high thermal resistance thereof.
    Type: Grant
    Filed: November 15, 1990
    Date of Patent: August 31, 1993
    Assignee: Fujitsu Limited
    Inventors: Keiji Watanabe, Akira Oikawa, Shun-ichi Fukuyama, Masaaki Yamagami, Takahisa Namiki
  • Patent number: 5118828
    Abstract: The fluorine-containing organosilicon compound of the present invention is represented by the following formula: ##STR1## wherein Rf is a perfluoroalkyl group. This compound is quite useful as a raw material for the production of polysilethylenesiloxanes excellent in solvent resistance.
    Type: Grant
    Filed: June 28, 1991
    Date of Patent: June 2, 1992
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Toshio Takago, Hirofumi Kishita, Shinichi Sato, Hitoshi Kinami, Shuji Suganuma, Koichi Yamaguchi, Kenichi Fukuda, Hirokazu Yamada
  • Patent number: 4985576
    Abstract: A bisindenyl derivate of the formula I ##STR1## (M.sup.1 =Si or Ge, R.sup.6 and R.sup.7 =unsubstituted or substituted idenyl radical)is obtained in very good yield by reacting a compound of the formula II ##STR2## (X=halogen) with a compound of the formula III or IVR.sup.6 -M.sup.2 (III) R.sup.7 -M.sup.2 (IV)(M.sup.2 =alkali metal)if, in the reaction, compound III or IV is added slowly to compound II.Compound I is suitable as a starting material for the preparation of metallocene catalyst components.
    Type: Grant
    Filed: December 29, 1989
    Date of Patent: January 15, 1991
    Assignee: Hoechst Aktiengesellschaft
    Inventors: Jurgen Rohrmann, Martin Antberg
  • Patent number: 4772675
    Abstract: The method of this invention produces an elastomeric silicone sealant having an improved shelf life. The sealant comprises an alkoxysilethylene ended polydiorganosiloxane polymer, an alkoxytrialkoxysilane crosslinker, and a titanium catalyst.
    Type: Grant
    Filed: January 28, 1988
    Date of Patent: September 20, 1988
    Assignee: Dow Corning Corporation
    Inventors: Jerome M. Klosowski, Michael D. Meddaugh
  • Patent number: 4382144
    Abstract: This invention is directed to the preparation of certain arylene bis-silanols in highly purified form and to the preparation of five new arylene bis-silanols in particular, along with a procedure for polymerizing these and other arylene-type bis-silanols using phosgene as a polymerization promotor or catalyst, to obtain highly purified, high molecular weight arylene-siloxanylene polymers having the characteristic structure: ##STR1## where Y is an arylene or substituted arylene moiety; R and R' are the same or different alkyl group(s), substituted alkyl group(s) or a phenyl group, x ranges from about 1 to 3 and n ranges from about 300 to 1500, said polymers having molecular weights (number average) of 100,000 and higher.Preferred polymers are those arylenesiloxanylenecarbonate polymers which, when laminated to polycarbonate sheets or glass maintain their transparency, stability and adherence to said substrates at temperatures of up to and including 400.degree. F.
    Type: Grant
    Filed: January 27, 1982
    Date of Patent: May 3, 1983
    Assignee: The United States of America as represented by the Secretary of the Air Force
    Inventors: Harold Rosenberg, Tsu-tzu Tsai
  • Patent number: 4366323
    Abstract: This invention is directed to the preparation of certain arylene bis-silanols in highly purified form and to the preparation of five new arylene bis-silanols in particular, along with a procedure for polymerizing these and other arylene-type bis-silanols using phosgene as a polymerization promotor or catalyst, to obtain highly purified, high molecular weight arylene-siloxanylene polymers having the characteristic structure: ##STR1## where Y is an arylene or substituted arylene moiety; R and R' are the same or different alkyl group(s), substituted alkyl group(s) or a phenyl group, x ranges from about 1 to 3 and n ranges from about 300 to 1500; said polymers having molecular weights (number average) of 100,000 and higher.Preferred polymers are those arylenesiloxanylenecarbonate polymers which, when laminated to polycarbonate sheets or glass maintain their transparency, stability and adherence to said substrates at temperatures of up to and including 400.degree. F.
    Type: Grant
    Filed: January 27, 1982
    Date of Patent: December 28, 1982
    Assignee: The United States of America as represented by the Secretary of the Air Force
    Inventors: Harold Rosenberg, Tsu-tzu Tsai
  • Patent number: 4306042
    Abstract: An oxygen permeable contact lens fabricated from a copolymer of a (a) siloxanyl alkylester, an ester derivative of acrylic or methacrylic acid, surface wetting agent and an oxygen permeable crosslinking agent. The copolymer can be made either hard, soft or elasticmeric with improved oxygen permeability.
    Type: Grant
    Filed: September 8, 1980
    Date of Patent: December 15, 1981
    Inventor: Russell A. Neefe
  • Patent number: H1612
    Abstract: A method for making silarylene-siloxane polymers having the Formula: ##STR1## where R.sub.1 -R.sub.6 are alkyl or aryl and n is an integer above about , wherein the rate of reaction and the degree of polymerization achieved when reacting disilanols with dichlorosilanes to form silarylene-siloxane polymers are unexpectedly enhanced by a subsequent charge into the reaction medium of a tertiary amine which functions as an acid acceptor.
    Type: Grant
    Filed: August 2, 1993
    Date of Patent: November 5, 1996
    Assignee: The United States of America as represented by the Secretary of the Navy
    Inventors: Robert A. Rhein, James C. Baldwin