Two Silicons Bonded Directly To The Same Acyclic Saturated Hydrocarbon Patents (Class 556/435)
  • Publication number: 20150122149
    Abstract: A method for producing a polysilane includes a step of reacting (i) at least two silane monomers and (ii) at least one alkali metal. The silane monomers contain the following structural units: at least one aryl group, at least one alkyl group, at least one alkenyl group, and at least three halogen atoms. At least three of the halogen atoms are bonded to a silicon atom of one of the silane monomers.
    Type: Application
    Filed: January 13, 2015
    Publication date: May 7, 2015
    Inventors: TOBIAS LEHMANN, JOAHIM BILL, ANDREAS KIENZLE
  • Patent number: 8987494
    Abstract: A series of silicon compounds are provided, which are excellent precursors to small carbosilanes, such as 1,3,5-trisilapentane, 2,4,6-trisilaheptane, tris(silylmethyl)silane and tetrakis(silylmethyl)silane. A method of preparing a carbosilane involves forming a Grignard, lithium, or metallic reagent from a halomethyltrialkoxysilane, reacting the Grignard, lithium, or metallic reagent with a dihalodihydridosilane, a trihalohydridosilane, a tetrahalosilane, a dialkoxydihydridosilane, a trialkoxyhydridosilane, or a tetraalkoxysilane to yield a carbosilane precursor, and reducing the precursor to form the carbosilane.
    Type: Grant
    Filed: February 26, 2013
    Date of Patent: March 24, 2015
    Assignee: Gelest Technologies, Inc.
    Inventors: Gerald L. Larson, Youlin Pan, Barry C. Arkles
  • Publication number: 20150080536
    Abstract: Disclosed herein are cobalt complexes containing terdentate pyridine di-imine ligands and their use as efficient and selective dehydrogenative silylation, hydrosilylation, and crosslinking catalysts.
    Type: Application
    Filed: November 19, 2014
    Publication date: March 19, 2015
    Inventors: Tianning Diao, Paul J. Chirik, Aroop Kumar Roy, Kenrick Lewis, Susan Nye, Keith J. Weller, Johannes G. P. Delis, Renyuan Yu
  • Publication number: 20150057462
    Abstract: A series of silicon compounds are provided, which are excellent precursors to small carbosilanes, such as 1,3,5-trisilapentane, 2,4,6-trisilaheptane, tris(silylmethyl)silane and tetrakis(silylmethyl)silane. A method of preparing a carbosilane involves forming a Grignard, lithium, or metallic reagent from a halomethyltrialkoxysilane, reacting the Grignard, lithium, or metallic reagent with a dihalodihydridosilane, a trihalohydridosilane, a tetrahalosilane, a dialkoxydihydridosilane, a trialkoxyhydridosilane, or a tetraalkoxysilane to yield a carbosilane precursor, and reducing the precursor to form the carbosilane.
    Type: Application
    Filed: November 4, 2014
    Publication date: February 26, 2015
    Inventors: Gerald L. LARSON, Youlin PAN, Barry C. ARKLES
  • Publication number: 20150011787
    Abstract: The present invention relates to a process for the preparation of organic-inorganic hybrid silicates and metal-silicates of the ECS type which uses as starting material the corresponding disilanes: said process is characterized by the presence of boric acid in the reagent mixture. With the process of the invention, ECS silicates and metal-silicates are obtained, characterized by an X-Ray diffractogram with reflections exclusively at angular values higher than 4.0° of 2?, and characterized by an ordered structure which contains: —structural units having formula (a), wherein R is an organic group: —boron—one or more elements T, different from boron, selected from groups IIIB, NB, VB, and transition metals, with a molar ratio Si/(Si+T) in said structure greater than 0.3 and lower than 1, wherein Si is the silicon contained in the structural unit having formula (a). The silicates and metal-silicates so obtained, containing both boron and at least one element T, are new.
    Type: Application
    Filed: December 21, 2012
    Publication date: January 8, 2015
    Applicant: Eni S.p.A.
    Inventors: Giuseppe Bellussi, Angela Carati, Roberto Millini, Caterina Rizzo, Stefano Zanardi
  • Publication number: 20140363682
    Abstract: The invention provides a surface modifier comprising an organosilicon-containing fluoropolymer compound having formula (1), a hydrolyzate thereof, or a partial hydrolytic condensate thereof. When an article is treated the surface modifier, the surface modifier forms thereon a coating having water/oil repellency and quick water slip as well as UV resistance, heat resistance, and chemical resistance.
    Type: Application
    Filed: April 29, 2014
    Publication date: December 11, 2014
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Takashi MATSUDA, Yuji Yamane, Ryusuke Sakoh, Noriyuki Koike
  • Publication number: 20140364627
    Abstract: This invention relates to hydrolysable silanes useful in the modification of elastomers, and as coupling agents for diene elastomer compositions containing a filler. In particular the invention relates to novel hydrolysable silanes containing an aziridine ring herein named (Az).
    Type: Application
    Filed: December 7, 2012
    Publication date: December 11, 2014
    Inventors: Michael Wolfgang Backer, Thomas Chaussee, Oliver Debever, Sebastien Grofils
  • Publication number: 20140272995
    Abstract: System, including methods and compositions, for making and using emulsions that include a silicone oil and a silicone surfactant. The emulsions may include aqueous droplets disposed in a continuous phase that includes a silicone oil and a silicone surfactant. The aqueous droplets may contain an analyte, optionally at partial occupancy, and/or a luminescent (e.g., photoluminescent) reporter. An assay of the analyte may be performed with the droplets. In some cases, signals may be detected from the droplets, and a characteristic of the analyte, such as an analyte level or activity, may be determined based on the signals.
    Type: Application
    Filed: March 17, 2014
    Publication date: September 18, 2014
    Inventors: Erin R. Chia, Amy L. Hiddessen, Benjamin J. Hindson, Adam Lowe, Chunxiao Han
  • Patent number: 8835664
    Abstract: The present invention relates to a novel fluorinated compound, a composition comprising the same, and a method for manufacturing a film by using the same, and more particularly a novel compound having a structure in which one or more fluorine and acrylate-based functional groups are substituted in a silane core, a composition comprising the compound and photoinitiator, and a method for manufacturing a film by using the same. If the composition comprising the compound according to the present invention is used, it is possible to manufacture a film in which a refractive index is low, reflectivity is reduced, and transmissivity is increased.
    Type: Grant
    Filed: February 1, 2011
    Date of Patent: September 16, 2014
    Assignees: LG Chem, Ltd., Industry-Academic Cooperation Foundation, Yonsei University
    Inventors: Soon-Hwa Jung, Jin-Young Park, Yeong-Rae Chang, Eun-Kyoung Kim
  • Patent number: 8778224
    Abstract: The present invention provides a fluorescent dye-silane hybrid resin manufactured by polycondensing an alkoxysilane bonded with a fluorescent dye with an organo-silane. More particularly, the present invention provides a fluorescent dye-siloxane hybrid resin that is manufactured by reacting a fluorescent dye having one or more functional groups with an alkoxysilane having an organic functional group to form an alkoxysilane bonded with the fluorescent dye and then polycondensing the alkoxysilane bonded with a fluorescent dye with an organo-silanediol and an organo-alkoxysilane having a thermocurable or ultraviolet-curable functional group without water. The fluorescent dye-silane hybrid resin has excellent thermostability, photostability, fluorescence characteristics, and processibility.
    Type: Grant
    Filed: December 20, 2011
    Date of Patent: July 15, 2014
    Assignee: Korea Advanced Institute of Science and Technology
    Inventors: Byeong-Soo Bae, Seung-Yeon Kwak
  • Publication number: 20140135517
    Abstract: A composition contains (A) a hydrosilylation reaction catalyst and (B) an aliphatically unsaturated compound having an average, per molecule, of one or more aliphatically unsaturated organic groups capable of undergoing hydrosilylation reaction. The composition is capable of reacting via hydrosilylation reaction to form a reaction product, such as a silane, a gum, a gel, a rubber, or a resin. Ingredient (A) contains a platinum-ligand complex that can be prepared by reacting a platinum precursor and a ligand.
    Type: Application
    Filed: June 20, 2012
    Publication date: May 15, 2014
    Applicant: Dow Corning Corporation
    Inventors: Stephen Edward Cray, Bogdan Marciniec, Binh Thanh Nguyen, Avril E. Surgenor, Richard Gregory Taylor, Ming-Shin Tzou, Paul Cornelius Vandort, Ireneusz Kownacki, Krystian Posala
  • Patent number: 8692011
    Abstract: A novel composition for use as a print head face plate coating. In particular, the coating comprises siloxyfluorocarbon (SFC), which is composed of networked precursors containing reactive siloxane groups attached to fluorocarbon chains. The present SFC coatings can be used to produce a surface whereby solid ink and ultraviolet (UV) curable inks do not adhere when applied at elevated temperatures and over an extended period of time. The advantages of the present coating are fewer print head related defects, and longer front face life.
    Type: Grant
    Filed: March 22, 2011
    Date of Patent: April 8, 2014
    Assignee: Xerox Corporation
    Inventors: Carolyn Moorlag, Yu Qi, Michelle N. Chretien, Peter G. Odell, Guiqin Song, Qi Zhang, Nan-Xing Hu
  • Publication number: 20130334459
    Abstract: A reaction product is formed utilizing a method that includes the step of combining a metal silicide and an aliphatic hydrocarbyl halide at a temperature of from 200° C. to 600° C. The aliphatic hydrocarbyl halide has the formula HaCbXc, wherein a is 0 or more, b is 1 or more, c is one or more, and X is halo. The method allows the reaction product to be formed in a predictable and controlled manner. Moreover, the components used in this method can be easily recycled and/or re-used in other processes.
    Type: Application
    Filed: November 29, 2012
    Publication date: December 19, 2013
    Applicant: Dow Corning Corporation
    Inventors: Dimitris Katsoulis, Robert Morgan, Wendy Sparschu
  • Publication number: 20130274497
    Abstract: A series of silicon compounds are provided, which are excellent precursors to small carbosilanes, such as 1,3,5-trisilapentane, 2,4,6-trisilaheptane, tris(silylmethyl)silane and tetrakis(silylmethyl)silane. A method of preparing a carbosilane involves forming a Grignard, lithium, or metallic reagent from a halomethyltrialkoxysilane, reacting the Grignard, lithium, or metallic reagent with a dihalodihydridosilane, a trihalohydridosilane, a tetrahalosilane, a dialkoxydihydridosilane, a trialkoxyhydridosilane, or a tetraalkoxysilane to yield a carbosilane precursor, and reducing the precursor to form the carbosilane.
    Type: Application
    Filed: February 26, 2013
    Publication date: October 17, 2013
    Applicant: GELEST TECHNOLOGIES, INC.
    Inventors: Gerald L. LARSON, Youlin PAN, Barry C. ARKLES
  • Publication number: 20130175680
    Abstract: A multiphase ultra low k dielectric process is described incorporating a first precursor comprising at least one of carbosilane and alkoxycarbosilane molecules containing the group Si—(CH2)n—Si where n is an integer 1, 2 or 3 and a second precursor containing the group Si—R* where R* is an embedded organic porogen, a high frequency radio frequency power in a PECVD chamber and an energy post treatment including ultraviolet radiation. An ultra low k porous SiCOH dielectric material having at least one of a k in the range from 2.2 to 2.3, 2.3 to 2.4, 2.4 to 2.5, and 2.5 to 2.55 and a modulus of elasticity greater than 5, 6, 7.8 and 9 GPa, respectively and a semiconductor integrated circuit comprising interconnect wiring having porous SiCOH dielectric material as described above.
    Type: Application
    Filed: January 10, 2012
    Publication date: July 11, 2013
    Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATION
    Inventors: Stephen M. Gates, Alfred Grill, Errol T. Ryan
  • Patent number: 8404882
    Abstract: The present invention relates to a one-terminal reactive organopolysiloxane further having a hydrophilic polyalkyleneoxide group at the omega-terminal and a method for its production. Thus, the present invention provides a one-terminal reactive organopolysiloxane which is characterized by having a polyalkyleneoxide at the omega-terminal, and composed of blocks arranged in the following order: A-B—C—Y wherein A is a monovalent polyalkyleneoxide group having an alkoxy group at a terminal, B is a substituted or unsubstituted divalent alkylene group, C is a divalent polysiloxane group, Y is a monovalent group selected from the group consisting of an alkyl group having a reactive group, a hydrogen atom, a styryl group and a trialkoxysiloxy group, and provides a method for the preparation thereof.
    Type: Grant
    Filed: September 24, 2010
    Date of Patent: March 26, 2013
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventor: Mamoru Hagiwara
  • Publication number: 20130059818
    Abstract: Highly branched macromolecules synthesized from a polyfunctional core, preferably silicon, or polyphenolic, with a carbosilane structure at its periphery functionalized with groups, preferably anionic, giving to the macromolecule a net negative charge. Furthermore, the invention relates to the procedures for their synthesis and their uses as antiviral agents, antibacterial and antifungal agents.
    Type: Application
    Filed: February 17, 2011
    Publication date: March 7, 2013
    Applicant: UNIVERSIDAD DE ALCALA DE HENARES (UAH)
    Inventors: Javier De La Mata De La Mata, Rafael Gómez Ramírez, Ma Ángeles Muñoz Fernández, Javier Sánchez-Nieves Fernández, Paula Ortega López, Louis Chonco Jimenez, Beatriz Rasines Moreno, Eduardo Arnaiz Garrido, Ma Jesús Serramia Lobera
  • Publication number: 20130011679
    Abstract: The present application discloses a process for preparing silica particles, said process comprising the step of mixing (I) an aqueous phase and (II) an oily phase comprising pre-polymerized tetraalkoxy orthosilicate, one or more alcohols, and optionally one or more polyalkylene glycols, wherein said aqueous phase comprises, in an aqueous solvent, one or more C6-30-alkyl modified polysaccharides, and optionally one or more polyalkylene glycols.
    Type: Application
    Filed: September 23, 2010
    Publication date: January 10, 2013
    Applicant: FEF Chemicals A/S
    Inventor: Thomas Everdahl
  • Publication number: 20120308802
    Abstract: The present invention relates to a novel fluorinated compound, a composition comprising the same, and a method for manufacturing a film by using the same, and more particularly a novel compound having a structure in which one or more fluorine and acrylate-based functional groups are substituted in a silane core, a composition comprising the compound and photoinitiator, and a method for manufacturing a film by using the same. If the composition comprising the compound according to the present invention is used, it is possible to manufacture a film in which a refractive index is low, reflectivity is reduced, and transmissivity is increased.
    Type: Application
    Filed: February 1, 2011
    Publication date: December 6, 2012
    Inventors: Soon-Hwa Jung, Jin-Young Park, Yeong-Rae Chang, Eun-Kyoung Kim
  • Publication number: 20120237583
    Abstract: The present invention relates to a novel organopolysiloxane having a specified structure and a cosmetic containing the aforementioned organopolysiloxane. The novel organopolysiloxane according to the present invention is volatile, possesses stability at low temperature, provides superior glossiness, and has a superior property with respect to miscibility with a UV-ray absorber, and which is useful as a replacement of octamethylcyclotetrasiloxane, decamethylcyclopentasiloxane, or methyltrime-thicone. The cosmetic according to the present invention can provide superior feeling to the touch during use and a superior outer appearance. Furthermore, a degree of freedom in blending various components such as UV-ray absorbers into the cosmetic according to the present invention is increased.
    Type: Application
    Filed: December 2, 2010
    Publication date: September 20, 2012
    Inventors: Akito Hayashi, Tomohiro Iimura, Haruhiko Furukawa, Hidetoshi Kondo
  • Patent number: 8247592
    Abstract: Disclosed is a method of storing a fluorine-containing disilanol compound represented by the following formula (3) in the presence of a tertiary amine in such an amount that a molar ratio of the tertiary amine to a silanol group of the fluorine-containing disilanol compound ranges from 0.001 to 20, HO—Z—R1—Rf—R1—Z—OH??(3) wherein Rf is a divalent fluorinated hydrocarbon group or a divalent fluorinated polyether group, R1 may be the same with or different from each other and is a substituted or unsubstituted divalent hydrocarbon group which may have at least one atom selected from the group consisting of oxygen, nitrogen, silicon, and sulfur atoms, and Z is a group represented by the following formula (2) —SiR2R3—??(2) wherein R2 and R3 may be the same with or different from each other and are monovalent organic groups.
    Type: Grant
    Filed: May 19, 2011
    Date of Patent: August 21, 2012
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Yasunori Sakano, Takashi Matsuda, Noriyuki Koike
  • Publication number: 20120123143
    Abstract: The invention relates to a method for producing alkoxy-substituted 1,2-bissilylethanes of the general formula 1 (R1O)nR2(3-n)Si—CH2—CH2—SiR2(3-n)(OR1)n??(1), which comprises reacting, in a first step, a mixture containing compounds of the general formulae 2 and 3 ClnR2(3-n)Si—CH2—CH2—SiR2(3-n)Cln??(2) ClnR2(3-n)Si—CH?CH—SiR2(3-n)Cln??(3) with an alcohol of the general formula 4 R1OH??(4) and, in a second step, subjecting the resultant mixture which contains compounds of the general formula 1 and compounds of the general formula 5 (R1O)nR2(3-n)Si—CH?CH—SiR2(3-n)(OR1)n??(5) to reductive conditions such that the compound of the general formula 5 is converted into a compound of the general formula 1, wherein R1 and R2 are monovalent, unsubstituted or halogen-substituted hydrocarbon radicals having 1 to 16 carbon atoms and n is the value 1, 2 or 3.
    Type: Application
    Filed: November 11, 2011
    Publication date: May 17, 2012
    Applicant: WACKER CHEMIE AG
    Inventors: Alfred POPP, Margit STEINER-LANGLECHNER
  • Patent number: 8163950
    Abstract: A silane containing a bulky hydrocarbon group or groups R therein and having the formula (III) R3?(x+y)(R1)x(R2)ySi(OR3) can be produced by reacting a silane of the formula (I) (R1)x(R2)ySiCl3?(x+y)(OR3) with a Grignard reagent of the formula (II) RMgX Further, a tri-organo-chlorosilane of the formula (XIIa) (R1)(R2)(R3)SiCl can be produced by reacting a tri-organo-silane of the formula (XIa) (R1)(R2)(R3)SiZ1 with hydrochloric acid. Furthermore, a tri-organo-monoalkoxysilane of the formula (XXIII) R3?(x+y)(R1)x(R2)ySi(OR3) can be produced when a silane of the formula (XXI) (R1)x(R2)ySiCl4?(x+y) is reacted with a Grignard reagent of the formula (XXII) RMgX with addition of and reaction with an alcohol or an epoxy compound during the reaction.
    Type: Grant
    Filed: July 19, 2011
    Date of Patent: April 24, 2012
    Assignees: Shin-Etsu Chemical Co., Ltd., Hokko Chemical Industry Co., Ltd.
    Inventors: Tadashi Bannou, Shin Masaoka, Yoshiki Hayakawa
  • Patent number: 8101788
    Abstract: Novel silicon precursors for low temperature deposition of silicon films are described herein. The disclosed precursors possess low vaporization temperatures, preferably less than about 500° C. In addition, embodiments of the silicon precursors incorporate a —Si—Y—Si— bond, where Y may comprise an amino group, a substituted or unsubstituted hydrocarbyl group, or oxygen. In an embodiment a silicon precursor has the formula: where Y is a hydrocarbyl group, a substituted hydrocarbyl group, oxygen, or an amino group; R1, R2, R3, and R4 are each independently a hydrogen group, a hydrocarbyl group, a substituted hydrocarbyl group, a heterohydrocarbyl group, wherein R1, R2, R3, and R4 may be the same or different from one another; X1, X2, X3, and X4 are each independently, a hydrogen group, a hydrocarbyl group, a substituted hydrocarbyl group, or a hydrazino group, wherein X1, X2, X3, and X4 may be the same or different from one another.
    Type: Grant
    Filed: April 2, 2007
    Date of Patent: January 24, 2012
    Assignee: Air Liquide Electronics U.S. LP
    Inventors: Ziyun Wang, Ashutosh Misra, Ravi Laxman
  • Publication number: 20110245388
    Abstract: In a polycarbonate resin composition containing a polycarbonate resin and a polycarbosilane compound, the use of the polycarbosilane compound modifies the surface properties of the polycarbonate resin composition without adversely affecting the intrinsic characteristics of the polycarbonate resin, such as transparency, heat resistance, and mechanical properties, e.g., impact resistance. A polycarbonate resin composition containing 100 parts by mass of a polycarbonate resin, 0.001 to 1 part by mass of a metal salt compound, and 0.005 to 5 parts by mass of a polycarbosilane compound has significantly improved flame resistance and high transparency and causes markedly reduced outgassing and mold fouling, without losing impact resistance and heat resistance.
    Type: Application
    Filed: January 7, 2010
    Publication date: October 6, 2011
    Applicant: Mitsubishi Engineering-Plastics Corporation
    Inventor: Toshiki Monden
  • Patent number: 7968741
    Abstract: A method of preparing a disilanol compound by hydrolyzing a dichlorosilane compound having Si—Cl bonds at both ends, characterized in that the method comprises the step of hydrolyzing the dichlorosilane compound in the presence of a tertiary amine compound.
    Type: Grant
    Filed: July 19, 2007
    Date of Patent: June 28, 2011
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Yasunori Sakano, Takashi Matsuda, Noriyuki Koike
  • Publication number: 20110082309
    Abstract: A simple method of producing an organosilicon compound of a formula R2n(OR4)mSi—R1—Si(OR4)mR2n is disclosed. The method comprises the following two steps, Y—R1—Y+SiXm+1R2n->R2nXmSi—R1—SiXmR2n R2nXmSi—R1—SiXmR2n+M(OR4)r,->R2n(OR4)mSi—R1—Si(OR4)mR2n In the formulas, R1 is methylene, alkylene, or arylene, R2 is alkyl, alkenyl, alkynyl, or aryl, m and n is 0 to 3, provided m+n=3, at least one m being 1 or more, Y is halogen, X is hydrogen or halogen, R4 is alkyl, alkenyl, alkynyl, or aryl, M is metal, and r is the valence of the metal). The organosilicon compound is used to form a film having excellent heat resistance, chemical resistance, conductivity, and modulus of elasticity.
    Type: Application
    Filed: March 30, 2010
    Publication date: April 7, 2011
    Applicant: JSR CORPORATION
    Inventors: Youhei Nobe, Kang-go Chung, Ryuuichi Saitou
  • Publication number: 20110077420
    Abstract: The present invention relates to a preparation method for a linear or cyclic trisilaalkane which is a substance useful in the preparation of polycarbosilane and silicon carbide precursors. Linear or cyclic trisilaalkane and organic trichlorosilane derivatives can be synthesized simultaneously and in high yield by reacting bis(chlorosily)methane having a Si—H bond, either alone or together with an organic chloride, using a quaternary organic phosphonium salt compound as a catalyst. Further, since the catalyst can be recovered after use, the present invention is very economical and is thus effective for mass-producing precursors for organic/inorganic hybrid substances.
    Type: Application
    Filed: May 22, 2009
    Publication date: March 31, 2011
    Applicant: SAMSUNG FINE CHEMICALS CO., LTD.
    Inventor: Il Nam Jung
  • Patent number: 7906224
    Abstract: An organic electroluminescent element comprising a cathode and an anode having therebetween at least one organic compound layer, wherein one of the organic compound layer comprises a polymer having a repeat unit represented by Formula (1) (wherein Ar1 represents an arylene group which may have a substituent or a heteroarylene group having not more than two heteroatoms, which may have a substituent; and L1 represents a divalent linkage group selected from a prescribed group; and n1 represents an integer of not less than two).
    Type: Grant
    Filed: August 17, 2004
    Date of Patent: March 15, 2011
    Assignee: Konica Minolta Holdings, Inc.
    Inventors: Hideo Taka, Hiroshi Kita
  • Publication number: 20110042789
    Abstract: A chemical vapor deposition material includes an organosilane compound shown by the following general formula (1). wherein R1 and R2 individually represent a hydrogen atom, an alkyl group having 1 to 4 carbon atoms, a vinyl group, or a phenyl group, R3 and R4 individually represent an alkyl group having 1 to 4 carbon atoms, an acetyl group, or a phenyl group, m is an integer from 0 to 2, and n is an integer from 1 to 3.
    Type: Application
    Filed: March 24, 2009
    Publication date: February 24, 2011
    Applicant: JSR Corporation
    Inventors: Hisashi Nakagawa, Yohei Nobe, Kang-go Chung, Ryuichi Saito, Terukazu Kokubo
  • Publication number: 20110004010
    Abstract: The invention has an object to obtain an organic inorganic composite material having high activity and high selectivity, and suitable as a catalyst material having small elution of an active metal from a carrier, and further to obtain an organosilicon compound suitable for the preparation of the composite material. The composite material is an organic inorganic composite material comprising an organosilicon compound having at least two groups containing reactive silicon at a molecular end, bonded to one silicon atom constituting the organosilicon compound, and an inorganic oxide material, the organosilicon compound and the inorganic oxide material being bonded to each other through a plurality of groups containing reactive silicon of the organosilicon compound. The organosilicon compound is represented by the following general formula (1) or (2). Formula (1) wherein symbols are the same as defined in claim 17. Formula (2) wherein symbols are the same as defined in claim 18.
    Type: Application
    Filed: March 5, 2008
    Publication date: January 6, 2011
    Applicants: National Instit of Advanced Indust Sci and Tech, N.E. Chemcat Corporation
    Inventors: Shun-ya Onozawa, Norihisa Fukaya, Kaori Saitou, Toshiyasu Sakakura, Hiroyuki Yasuda, Yukio Takagi, Masae Ueda
  • Publication number: 20100261925
    Abstract: A method of producing a silicon compound shown by the following general formula (7) includes reacting an organomagnesium compound shown by the following general formula (1) with an organosilane compound shown by the following general formula (2) in a solvent that contains at least one compound selected from a compound shown by the following general formula (3), a compound shown by the following general formula (4), a compound shown by the following general formula (5), and a compound shown by the following general formula (6).
    Type: Application
    Filed: July 8, 2008
    Publication date: October 14, 2010
    Applicant: JSR Corporation
    Inventors: Hisashi Nakagawa, Youhei Nobe, Kenji Ishizuki, Terukazu Kokubo
  • Publication number: 20100105818
    Abstract: The invention provides structurally modified, pyrogenically prepared silicas obtained by reaction of pyrogenic silicas with cyclic polysiloxanes of the type —[O—Si(R2)]n—, where R is a C1 to C6 alkyl group and n is 3 to 9, and subsequent structural modification of the silanized silicas obtained. The invention further provides an adhesive comprising the structurally modified, pyrogenically prepared silicas.
    Type: Application
    Filed: May 6, 2008
    Publication date: April 29, 2010
    Applicant: Evonik Degussa GmbH
    Inventors: Juergen Meyer, Mario Scholz
  • Publication number: 20100006006
    Abstract: Modified silicates are described which are obtained by reacting a waterglass solution with alkylsilanes of the general formula R—(CH2)n—Si—(X)3, in which X, in each case independently, is CH3, OCH3, OC2H5, OC3H7, OCOCH3 or Cl, and R is a saturated or unsaturated, linear or branched or cyclic radical having at least one O and/or N atom and at least 2 carbon atoms, and n is a number between 1 and 3, at a temperature in the range of from about 20 to about 80° C. The modified silicates are suitable for the hydrophilic finishing of hard surfaces, and can be used in detergents and cleaners.
    Type: Application
    Filed: July 10, 2009
    Publication date: January 14, 2010
    Applicant: COGNIS IP MANAGEMENT GMBH
    Inventors: Ralf Bohlander, Thomas Albers, Wolfgang Pesch, Michael Langen
  • Patent number: 7544827
    Abstract: Chemical vapor deposition processes result in films having low dielectric constants when suitable chemical precursors are utilized. Preferred chemical precursors include siloxanes, (fluoroalkyl)fluorosiloxanes, (fluoroalkyl)silanes, (alkyl)fluorosilanes, (fluoroalkyl)fluorosilanes, alkylsiloxysilanes, alkoxysilanes, alkylalkoxysilanes, silylmethanes, alkoxysilylmethanes, alkylalkoxysilylmethanes, alkoxymethanes, alkylalkoxymethanes, and mixtures thereof. The precursors are particularly suited to thermal CVD for producing low dielectric constant films at relatively low temperatures, particularly without the use of additional oxidizing agents. Such films are useful in the microelectronics industry.
    Type: Grant
    Filed: October 16, 2006
    Date of Patent: June 9, 2009
    Assignee: ASM Japan K.K.
    Inventor: Michael A. Todd
  • Patent number: 7504470
    Abstract: A thin film comprising a composition obtained by polymerizing a monomer having the formula I: wherein: R1 is a hydrolysable group, R2 is a polarizability reducing organic group, and R3 is a bridging hydrocarbon group, to form a siloxane material. The invention also concerns methods for producing the thin films. The thin film can be used a low k dielectric in integrated circuit devices. The novel dielectric materials have excellent properties of planarization resulting in good local and global planarity on top a semiconductor substrate topography, which reduces or eliminates the need for chemical mechanical planarization after dielectric and oxide liner deposition.
    Type: Grant
    Filed: August 31, 2005
    Date of Patent: March 17, 2009
    Assignee: Silecs Oy
    Inventors: Juha T. Rantala, Jyri Paulasaari, Janne Kylmä, Turo T. Törmänen, Jarkko Pietikäinen, Nigel Hacker, Admir Hadzic
  • Patent number: 7488839
    Abstract: Fluorinated organosilicon compounds having formula (1) wherein Rf is a perfluoroalkyl group containing at least one ether bond, Q is a polyether group in the form of a homopolymer chain of ethylene glycol or propylene glycol or a copolymer chain of both, R is hydrogen or alkyl, X is a divalent linking group exclusive of oxygen atom, Y is a divalent linking group, p is an integer of at least 3, and n is a number of 0<n<3 have an excellent surface tension reducing ability and can be produced with ease of molecular weight control while minimizing formation of solvent-insoluble components. These compounds are safe to the human body and useful as a surfactant.
    Type: Grant
    Filed: May 18, 2006
    Date of Patent: February 10, 2009
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Hiromasa Yamaguchi, Hirofumi Kishita, Koichi Yamaguchi
  • Publication number: 20090025609
    Abstract: A coating liquid for forming a low dielectric constant amorphous silica-based coating film with a dielectric constant of 3.0 or below and a film strength (Young's modulus) of 3.0 GPa or more, and also having a smooth surface with an excellent hydrophobicity. The coating liquid contains (1) a silicon compound obtained by hydrolyzing bis(trialcoxysilyl)alkane (BTASA) and alcoxysilane (AS) in the presence of tetraalkylammoniumhydroxide (TAAOH), or (2) a silicon compound obtained by hydrolyzing bis(trialcoxysilyl)alkane (BTASA), alcoxysilane (AS) and tetraalkylorthosilicate (TAOS) in the presence of tetraalkylammoniumhydroxide (TAAOH).
    Type: Application
    Filed: December 15, 2006
    Publication date: January 29, 2009
    Inventors: Miki Egami, Hiroki Arao, Akira Nakashima, Michio Komatsu
  • Patent number: 7132294
    Abstract: The invention provides a device for selective molecular recognition, the device comprising a sensing portion, wherein said sensing portion includes a substrate having coated thereon a layer comprising a non-volatile, small molecule compound having at least two pendant and terminal unsaturated groups, each being functionalized with at least one halogen substituted alcohol or phenol functional group. The compound of the invention preferably has one of the following general formulae: wherein A is a core moiety; B is a pendant and terminal unsaturated group; q is at least 1; r is at least 2; X is a linking group; and n is an integer designating the number of repeating units from 1 to 3, with the proviso that, if n is greater than 1, then the B groups differ from each other in at least two of the repeating units. The device is used to detect the molecules of a hydrogen bond accepting vapor such as an organophosphonate or nitroaromatic vapor.
    Type: Grant
    Filed: February 25, 2002
    Date of Patent: November 7, 2006
    Assignee: The United States of America as represented by the Secretary of the Navy
    Inventors: Eric J. Houser, Robert Andrew McGill
  • Patent number: 7078548
    Abstract: The invention provides a device for selective molecular recognition, the device comprising a sensing portion, wherein said sensing portion includes a substrate having coated thereon a layer comprising a hyperbranched compound having: (1) a polymer backbone portion that is at least partly randomly branched; (2) at least one pendant group extending from the polymer backbone portion; and (3) at least one halogen substituted alcohol or phenol group substituted at the pendant group(s) of the polymer backbone portion. The compound of the invention preferably has the general formula: wherein A is the hyperbranched backbone portion of the polymer; L and M are independently selected pendant groups of said polymer backbone; X and Y are independently selected halogen substituted alcohol or phenol groups; q and r are independently selected and at least 1; and n is at least 3. The device is used to detect the molecules of a hydrogen bond accepting vapor such as organophosphorus or nitroaromatic species.
    Type: Grant
    Filed: March 6, 2002
    Date of Patent: July 18, 2006
    Assignee: The United States of America as represented by the Secretary of the Navy
    Inventors: Eric J. Houser, Robert A. McGill
  • Patent number: 6784306
    Abstract: Fluorinated organosilicon compounds having at least one fluorinated organic group and at least three SiH groups in a molecule are capable of hydrosilylation reaction with such compounds as vinyl group-bearing fluoro-polymers in a stable manner and fully compatible therewith.
    Type: Grant
    Filed: February 20, 2002
    Date of Patent: August 31, 2004
    Assignee: Shin-etsu Chemical Co., Ltd.
    Inventors: Kenichi Fukuda, Koichi Yamaguchi
  • Patent number: 6730802
    Abstract: The compound 2,4,6-trimethyl-2,4,6-trisila heptane, the preparation thereof, and the use thereof as a silicon carbide precursor in chemical vapor deposition and infiltration procedures are disclosed.
    Type: Grant
    Filed: July 9, 2002
    Date of Patent: May 4, 2004
    Assignee: Starfire Systems, Inc.
    Inventors: Qionghua Shen, Leo Spitz MacDonald
  • Patent number: 6703519
    Abstract: Heat stable poly(ethynylene phenylene ethynylene silylene) polymers with a determined molecular weight bearing at the chain end, groups derived from a chain limiter. Methods for preparing these polymers, hardened products obtained by heat treatment of these polymers, and matrices for composites comprising these polymers.
    Type: Grant
    Filed: March 15, 2002
    Date of Patent: March 9, 2004
    Assignee: Commissariat a L' Energie Atomique
    Inventors: Pierrick Buvat, Christian Levassort, Franck Jousse
  • Patent number: 6696538
    Abstract: The present invention relates to low a dielectric material essential for a next generation semiconductor with high density and high performance, and more particularly to a low dielectric material that is thermally stable and has good film-forming properties and excellent mechanical properties, a dielectric film comprising the low dielectric material, and a semiconductor device manufactured using the dielectric film. The present invention provides an organic silicate polymer having a flexible organic bridge unit in the network prepared by the resin composition of the component (a) and the component (b).
    Type: Grant
    Filed: February 2, 2001
    Date of Patent: February 24, 2004
    Assignee: LG Chemical Ltd.
    Inventors: Min-Jin Ko, Hye-Yeong Nam, Jung-Won Kang, Myung-Sun Moon, Dong-Seok Shin
  • Patent number: 6570031
    Abstract: The present invention relates to a novel dendrimic compounds, to a method for the production thereof and to the use thereof as catalysts for the production of polymers, in particular to the use thereof as co-catalysts for metallocenes for polymerizing unsaturated compounds.
    Type: Grant
    Filed: September 22, 2000
    Date of Patent: May 27, 2003
    Assignee: Bayer Aktiengesellschaft
    Inventors: Sigurd Becke, Uwe Denninger, Michael Mager, Heike Windisch
  • Patent number: 6555644
    Abstract: A multi-reactive silicon compound has at least one polyalkyleneglycol substituent with the number average molecular weight being 200 to 10,000 as synthesized by reacting an organohalosilane compound having H—Si bonds with a polyalkyleneglycol ether compound having unsaturated substituents in the presence of a hydrosilylation catalyst. The multi-reactive silicon compound having polyalkyleneglycol substituents is very soluble in organic solvents and reactive to living polymeric ions with high thermal stability due to multiple functional groups, and active living groups. Thus, the addition of the multi-reactive silicon compound to a living polymer solution during an anionic or cationic polymerization reaction activates an intense substitution reaction under mild conditions to introduce a third functional group to the end or side chain of the polymer comprising a repeating monomer unit and provide organic-inorganic hybrid polymers.
    Type: Grant
    Filed: June 13, 2001
    Date of Patent: April 29, 2003
    Assignee: Korea Kumho Petrochemical Co., Ltd.
    Inventors: YoungHoon Ko, EunKyoung Kim
  • Patent number: 6552204
    Abstract: The present invention relates to a novel process for producing a &dgr;-lactone of the formula: using an acyl halide of the formula: wherein R1, R2 R3 and X are described herein. In particular, the present invention relates to a process for enantioselectively producing the &dgr;-lactone and novel intermediates disclosed herein.
    Type: Grant
    Filed: September 22, 2000
    Date of Patent: April 22, 2003
    Assignee: Roche Colorado Corporation
    Inventors: Peter J. Harrington, Lewis M. Hodges, Kurt Puentener, Michelangelo Scalone
  • Patent number: 6534587
    Abstract: Symmetric and asymmetric cyclic silalkylenesiloxane monomers and copolymers thereof, as well as crosslinked and/or reinforced silalkylenesiloxane copolymers, medical devices containing such materials, and methods of preparation.
    Type: Grant
    Filed: May 9, 2000
    Date of Patent: March 18, 2003
    Assignee: Medtronic, Inc
    Inventors: Mark A. Tapsak, Edward Di Domenico
  • Patent number: 6521774
    Abstract: A novel organosilicon compound obtained by introducing an alkylene group or analogue instead of the oxygen atom in an Si—O—Si linkage is capable of hydrosilylation reaction with another compound having a vinyl group to form a hydrosilylated derivative which is less prone to decomposition under acidic or basic conditions.
    Type: Grant
    Filed: April 25, 2001
    Date of Patent: February 18, 2003
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Noriyuki Koike, Koichi Yamaguchi, Yasunori Sakano
  • Patent number: 6500976
    Abstract: Organosilicon compounds each having in a molecule (A) a perfluoroalkyl group of at least 3 carbon atoms which may be separated by an etheric oxygen atom, (B) a monovalent hydrocarbon group containing a carboxylic acid anhydride structure, and (C) a hydrosilyl (SiH) group are novel and added to thermosetting elastomer compositions as adhesion aids whereby the compositions are improved in adhesion to various materials including metals, alloys, plastics, and ceramics.
    Type: Grant
    Filed: October 5, 2001
    Date of Patent: December 31, 2002
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Takashi Matsuda, Mikio Shiono, Kenichi Fukuda