Two Silicons Bonded Directly To The Same Acyclic Saturated Hydrocarbon Patents (Class 556/435)
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Publication number: 20150122149Abstract: A method for producing a polysilane includes a step of reacting (i) at least two silane monomers and (ii) at least one alkali metal. The silane monomers contain the following structural units: at least one aryl group, at least one alkyl group, at least one alkenyl group, and at least three halogen atoms. At least three of the halogen atoms are bonded to a silicon atom of one of the silane monomers.Type: ApplicationFiled: January 13, 2015Publication date: May 7, 2015Inventors: TOBIAS LEHMANN, JOAHIM BILL, ANDREAS KIENZLE
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Patent number: 8987494Abstract: A series of silicon compounds are provided, which are excellent precursors to small carbosilanes, such as 1,3,5-trisilapentane, 2,4,6-trisilaheptane, tris(silylmethyl)silane and tetrakis(silylmethyl)silane. A method of preparing a carbosilane involves forming a Grignard, lithium, or metallic reagent from a halomethyltrialkoxysilane, reacting the Grignard, lithium, or metallic reagent with a dihalodihydridosilane, a trihalohydridosilane, a tetrahalosilane, a dialkoxydihydridosilane, a trialkoxyhydridosilane, or a tetraalkoxysilane to yield a carbosilane precursor, and reducing the precursor to form the carbosilane.Type: GrantFiled: February 26, 2013Date of Patent: March 24, 2015Assignee: Gelest Technologies, Inc.Inventors: Gerald L. Larson, Youlin Pan, Barry C. Arkles
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Publication number: 20150080536Abstract: Disclosed herein are cobalt complexes containing terdentate pyridine di-imine ligands and their use as efficient and selective dehydrogenative silylation, hydrosilylation, and crosslinking catalysts.Type: ApplicationFiled: November 19, 2014Publication date: March 19, 2015Inventors: Tianning Diao, Paul J. Chirik, Aroop Kumar Roy, Kenrick Lewis, Susan Nye, Keith J. Weller, Johannes G. P. Delis, Renyuan Yu
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Publication number: 20150057462Abstract: A series of silicon compounds are provided, which are excellent precursors to small carbosilanes, such as 1,3,5-trisilapentane, 2,4,6-trisilaheptane, tris(silylmethyl)silane and tetrakis(silylmethyl)silane. A method of preparing a carbosilane involves forming a Grignard, lithium, or metallic reagent from a halomethyltrialkoxysilane, reacting the Grignard, lithium, or metallic reagent with a dihalodihydridosilane, a trihalohydridosilane, a tetrahalosilane, a dialkoxydihydridosilane, a trialkoxyhydridosilane, or a tetraalkoxysilane to yield a carbosilane precursor, and reducing the precursor to form the carbosilane.Type: ApplicationFiled: November 4, 2014Publication date: February 26, 2015Inventors: Gerald L. LARSON, Youlin PAN, Barry C. ARKLES
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Publication number: 20150011787Abstract: The present invention relates to a process for the preparation of organic-inorganic hybrid silicates and metal-silicates of the ECS type which uses as starting material the corresponding disilanes: said process is characterized by the presence of boric acid in the reagent mixture. With the process of the invention, ECS silicates and metal-silicates are obtained, characterized by an X-Ray diffractogram with reflections exclusively at angular values higher than 4.0° of 2?, and characterized by an ordered structure which contains: —structural units having formula (a), wherein R is an organic group: —boron—one or more elements T, different from boron, selected from groups IIIB, NB, VB, and transition metals, with a molar ratio Si/(Si+T) in said structure greater than 0.3 and lower than 1, wherein Si is the silicon contained in the structural unit having formula (a). The silicates and metal-silicates so obtained, containing both boron and at least one element T, are new.Type: ApplicationFiled: December 21, 2012Publication date: January 8, 2015Applicant: Eni S.p.A.Inventors: Giuseppe Bellussi, Angela Carati, Roberto Millini, Caterina Rizzo, Stefano Zanardi
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Publication number: 20140364627Abstract: This invention relates to hydrolysable silanes useful in the modification of elastomers, and as coupling agents for diene elastomer compositions containing a filler. In particular the invention relates to novel hydrolysable silanes containing an aziridine ring herein named (Az).Type: ApplicationFiled: December 7, 2012Publication date: December 11, 2014Inventors: Michael Wolfgang Backer, Thomas Chaussee, Oliver Debever, Sebastien Grofils
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Publication number: 20140363682Abstract: The invention provides a surface modifier comprising an organosilicon-containing fluoropolymer compound having formula (1), a hydrolyzate thereof, or a partial hydrolytic condensate thereof. When an article is treated the surface modifier, the surface modifier forms thereon a coating having water/oil repellency and quick water slip as well as UV resistance, heat resistance, and chemical resistance.Type: ApplicationFiled: April 29, 2014Publication date: December 11, 2014Applicant: Shin-Etsu Chemical Co., Ltd.Inventors: Takashi MATSUDA, Yuji Yamane, Ryusuke Sakoh, Noriyuki Koike
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Publication number: 20140272995Abstract: System, including methods and compositions, for making and using emulsions that include a silicone oil and a silicone surfactant. The emulsions may include aqueous droplets disposed in a continuous phase that includes a silicone oil and a silicone surfactant. The aqueous droplets may contain an analyte, optionally at partial occupancy, and/or a luminescent (e.g., photoluminescent) reporter. An assay of the analyte may be performed with the droplets. In some cases, signals may be detected from the droplets, and a characteristic of the analyte, such as an analyte level or activity, may be determined based on the signals.Type: ApplicationFiled: March 17, 2014Publication date: September 18, 2014Inventors: Erin R. Chia, Amy L. Hiddessen, Benjamin J. Hindson, Adam Lowe, Chunxiao Han
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Patent number: 8835664Abstract: The present invention relates to a novel fluorinated compound, a composition comprising the same, and a method for manufacturing a film by using the same, and more particularly a novel compound having a structure in which one or more fluorine and acrylate-based functional groups are substituted in a silane core, a composition comprising the compound and photoinitiator, and a method for manufacturing a film by using the same. If the composition comprising the compound according to the present invention is used, it is possible to manufacture a film in which a refractive index is low, reflectivity is reduced, and transmissivity is increased.Type: GrantFiled: February 1, 2011Date of Patent: September 16, 2014Assignees: LG Chem, Ltd., Industry-Academic Cooperation Foundation, Yonsei UniversityInventors: Soon-Hwa Jung, Jin-Young Park, Yeong-Rae Chang, Eun-Kyoung Kim
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Patent number: 8778224Abstract: The present invention provides a fluorescent dye-silane hybrid resin manufactured by polycondensing an alkoxysilane bonded with a fluorescent dye with an organo-silane. More particularly, the present invention provides a fluorescent dye-siloxane hybrid resin that is manufactured by reacting a fluorescent dye having one or more functional groups with an alkoxysilane having an organic functional group to form an alkoxysilane bonded with the fluorescent dye and then polycondensing the alkoxysilane bonded with a fluorescent dye with an organo-silanediol and an organo-alkoxysilane having a thermocurable or ultraviolet-curable functional group without water. The fluorescent dye-silane hybrid resin has excellent thermostability, photostability, fluorescence characteristics, and processibility.Type: GrantFiled: December 20, 2011Date of Patent: July 15, 2014Assignee: Korea Advanced Institute of Science and TechnologyInventors: Byeong-Soo Bae, Seung-Yeon Kwak
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Publication number: 20140135517Abstract: A composition contains (A) a hydrosilylation reaction catalyst and (B) an aliphatically unsaturated compound having an average, per molecule, of one or more aliphatically unsaturated organic groups capable of undergoing hydrosilylation reaction. The composition is capable of reacting via hydrosilylation reaction to form a reaction product, such as a silane, a gum, a gel, a rubber, or a resin. Ingredient (A) contains a platinum-ligand complex that can be prepared by reacting a platinum precursor and a ligand.Type: ApplicationFiled: June 20, 2012Publication date: May 15, 2014Applicant: Dow Corning CorporationInventors: Stephen Edward Cray, Bogdan Marciniec, Binh Thanh Nguyen, Avril E. Surgenor, Richard Gregory Taylor, Ming-Shin Tzou, Paul Cornelius Vandort, Ireneusz Kownacki, Krystian Posala
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Patent number: 8692011Abstract: A novel composition for use as a print head face plate coating. In particular, the coating comprises siloxyfluorocarbon (SFC), which is composed of networked precursors containing reactive siloxane groups attached to fluorocarbon chains. The present SFC coatings can be used to produce a surface whereby solid ink and ultraviolet (UV) curable inks do not adhere when applied at elevated temperatures and over an extended period of time. The advantages of the present coating are fewer print head related defects, and longer front face life.Type: GrantFiled: March 22, 2011Date of Patent: April 8, 2014Assignee: Xerox CorporationInventors: Carolyn Moorlag, Yu Qi, Michelle N. Chretien, Peter G. Odell, Guiqin Song, Qi Zhang, Nan-Xing Hu
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Publication number: 20130334459Abstract: A reaction product is formed utilizing a method that includes the step of combining a metal silicide and an aliphatic hydrocarbyl halide at a temperature of from 200° C. to 600° C. The aliphatic hydrocarbyl halide has the formula HaCbXc, wherein a is 0 or more, b is 1 or more, c is one or more, and X is halo. The method allows the reaction product to be formed in a predictable and controlled manner. Moreover, the components used in this method can be easily recycled and/or re-used in other processes.Type: ApplicationFiled: November 29, 2012Publication date: December 19, 2013Applicant: Dow Corning CorporationInventors: Dimitris Katsoulis, Robert Morgan, Wendy Sparschu
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Publication number: 20130274497Abstract: A series of silicon compounds are provided, which are excellent precursors to small carbosilanes, such as 1,3,5-trisilapentane, 2,4,6-trisilaheptane, tris(silylmethyl)silane and tetrakis(silylmethyl)silane. A method of preparing a carbosilane involves forming a Grignard, lithium, or metallic reagent from a halomethyltrialkoxysilane, reacting the Grignard, lithium, or metallic reagent with a dihalodihydridosilane, a trihalohydridosilane, a tetrahalosilane, a dialkoxydihydridosilane, a trialkoxyhydridosilane, or a tetraalkoxysilane to yield a carbosilane precursor, and reducing the precursor to form the carbosilane.Type: ApplicationFiled: February 26, 2013Publication date: October 17, 2013Applicant: GELEST TECHNOLOGIES, INC.Inventors: Gerald L. LARSON, Youlin PAN, Barry C. ARKLES
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Publication number: 20130175680Abstract: A multiphase ultra low k dielectric process is described incorporating a first precursor comprising at least one of carbosilane and alkoxycarbosilane molecules containing the group Si—(CH2)n—Si where n is an integer 1, 2 or 3 and a second precursor containing the group Si—R* where R* is an embedded organic porogen, a high frequency radio frequency power in a PECVD chamber and an energy post treatment including ultraviolet radiation. An ultra low k porous SiCOH dielectric material having at least one of a k in the range from 2.2 to 2.3, 2.3 to 2.4, 2.4 to 2.5, and 2.5 to 2.55 and a modulus of elasticity greater than 5, 6, 7.8 and 9 GPa, respectively and a semiconductor integrated circuit comprising interconnect wiring having porous SiCOH dielectric material as described above.Type: ApplicationFiled: January 10, 2012Publication date: July 11, 2013Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATIONInventors: Stephen M. Gates, Alfred Grill, Errol T. Ryan
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Patent number: 8404882Abstract: The present invention relates to a one-terminal reactive organopolysiloxane further having a hydrophilic polyalkyleneoxide group at the omega-terminal and a method for its production. Thus, the present invention provides a one-terminal reactive organopolysiloxane which is characterized by having a polyalkyleneoxide at the omega-terminal, and composed of blocks arranged in the following order: A-B—C—Y wherein A is a monovalent polyalkyleneoxide group having an alkoxy group at a terminal, B is a substituted or unsubstituted divalent alkylene group, C is a divalent polysiloxane group, Y is a monovalent group selected from the group consisting of an alkyl group having a reactive group, a hydrogen atom, a styryl group and a trialkoxysiloxy group, and provides a method for the preparation thereof.Type: GrantFiled: September 24, 2010Date of Patent: March 26, 2013Assignee: Shin-Etsu Chemical Co., Ltd.Inventor: Mamoru Hagiwara
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Publication number: 20130059818Abstract: Highly branched macromolecules synthesized from a polyfunctional core, preferably silicon, or polyphenolic, with a carbosilane structure at its periphery functionalized with groups, preferably anionic, giving to the macromolecule a net negative charge. Furthermore, the invention relates to the procedures for their synthesis and their uses as antiviral agents, antibacterial and antifungal agents.Type: ApplicationFiled: February 17, 2011Publication date: March 7, 2013Applicant: UNIVERSIDAD DE ALCALA DE HENARES (UAH)Inventors: Javier De La Mata De La Mata, Rafael Gómez Ramírez, Ma Ángeles Muñoz Fernández, Javier Sánchez-Nieves Fernández, Paula Ortega López, Louis Chonco Jimenez, Beatriz Rasines Moreno, Eduardo Arnaiz Garrido, Ma Jesús Serramia Lobera
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Publication number: 20130011679Abstract: The present application discloses a process for preparing silica particles, said process comprising the step of mixing (I) an aqueous phase and (II) an oily phase comprising pre-polymerized tetraalkoxy orthosilicate, one or more alcohols, and optionally one or more polyalkylene glycols, wherein said aqueous phase comprises, in an aqueous solvent, one or more C6-30-alkyl modified polysaccharides, and optionally one or more polyalkylene glycols.Type: ApplicationFiled: September 23, 2010Publication date: January 10, 2013Applicant: FEF Chemicals A/SInventor: Thomas Everdahl
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Publication number: 20120308802Abstract: The present invention relates to a novel fluorinated compound, a composition comprising the same, and a method for manufacturing a film by using the same, and more particularly a novel compound having a structure in which one or more fluorine and acrylate-based functional groups are substituted in a silane core, a composition comprising the compound and photoinitiator, and a method for manufacturing a film by using the same. If the composition comprising the compound according to the present invention is used, it is possible to manufacture a film in which a refractive index is low, reflectivity is reduced, and transmissivity is increased.Type: ApplicationFiled: February 1, 2011Publication date: December 6, 2012Inventors: Soon-Hwa Jung, Jin-Young Park, Yeong-Rae Chang, Eun-Kyoung Kim
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Publication number: 20120237583Abstract: The present invention relates to a novel organopolysiloxane having a specified structure and a cosmetic containing the aforementioned organopolysiloxane. The novel organopolysiloxane according to the present invention is volatile, possesses stability at low temperature, provides superior glossiness, and has a superior property with respect to miscibility with a UV-ray absorber, and which is useful as a replacement of octamethylcyclotetrasiloxane, decamethylcyclopentasiloxane, or methyltrime-thicone. The cosmetic according to the present invention can provide superior feeling to the touch during use and a superior outer appearance. Furthermore, a degree of freedom in blending various components such as UV-ray absorbers into the cosmetic according to the present invention is increased.Type: ApplicationFiled: December 2, 2010Publication date: September 20, 2012Inventors: Akito Hayashi, Tomohiro Iimura, Haruhiko Furukawa, Hidetoshi Kondo
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Patent number: 8247592Abstract: Disclosed is a method of storing a fluorine-containing disilanol compound represented by the following formula (3) in the presence of a tertiary amine in such an amount that a molar ratio of the tertiary amine to a silanol group of the fluorine-containing disilanol compound ranges from 0.001 to 20, HO—Z—R1—Rf—R1—Z—OH??(3) wherein Rf is a divalent fluorinated hydrocarbon group or a divalent fluorinated polyether group, R1 may be the same with or different from each other and is a substituted or unsubstituted divalent hydrocarbon group which may have at least one atom selected from the group consisting of oxygen, nitrogen, silicon, and sulfur atoms, and Z is a group represented by the following formula (2) —SiR2R3—??(2) wherein R2 and R3 may be the same with or different from each other and are monovalent organic groups.Type: GrantFiled: May 19, 2011Date of Patent: August 21, 2012Assignee: Shin-Etsu Chemical Co., Ltd.Inventors: Yasunori Sakano, Takashi Matsuda, Noriyuki Koike
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Publication number: 20120123143Abstract: The invention relates to a method for producing alkoxy-substituted 1,2-bissilylethanes of the general formula 1 (R1O)nR2(3-n)Si—CH2—CH2—SiR2(3-n)(OR1)n??(1), which comprises reacting, in a first step, a mixture containing compounds of the general formulae 2 and 3 ClnR2(3-n)Si—CH2—CH2—SiR2(3-n)Cln??(2) ClnR2(3-n)Si—CH?CH—SiR2(3-n)Cln??(3) with an alcohol of the general formula 4 R1OH??(4) and, in a second step, subjecting the resultant mixture which contains compounds of the general formula 1 and compounds of the general formula 5 (R1O)nR2(3-n)Si—CH?CH—SiR2(3-n)(OR1)n??(5) to reductive conditions such that the compound of the general formula 5 is converted into a compound of the general formula 1, wherein R1 and R2 are monovalent, unsubstituted or halogen-substituted hydrocarbon radicals having 1 to 16 carbon atoms and n is the value 1, 2 or 3.Type: ApplicationFiled: November 11, 2011Publication date: May 17, 2012Applicant: WACKER CHEMIE AGInventors: Alfred POPP, Margit STEINER-LANGLECHNER
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Patent number: 8163950Abstract: A silane containing a bulky hydrocarbon group or groups R therein and having the formula (III) R3?(x+y)(R1)x(R2)ySi(OR3) can be produced by reacting a silane of the formula (I) (R1)x(R2)ySiCl3?(x+y)(OR3) with a Grignard reagent of the formula (II) RMgX Further, a tri-organo-chlorosilane of the formula (XIIa) (R1)(R2)(R3)SiCl can be produced by reacting a tri-organo-silane of the formula (XIa) (R1)(R2)(R3)SiZ1 with hydrochloric acid. Furthermore, a tri-organo-monoalkoxysilane of the formula (XXIII) R3?(x+y)(R1)x(R2)ySi(OR3) can be produced when a silane of the formula (XXI) (R1)x(R2)ySiCl4?(x+y) is reacted with a Grignard reagent of the formula (XXII) RMgX with addition of and reaction with an alcohol or an epoxy compound during the reaction.Type: GrantFiled: July 19, 2011Date of Patent: April 24, 2012Assignees: Shin-Etsu Chemical Co., Ltd., Hokko Chemical Industry Co., Ltd.Inventors: Tadashi Bannou, Shin Masaoka, Yoshiki Hayakawa
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Patent number: 8101788Abstract: Novel silicon precursors for low temperature deposition of silicon films are described herein. The disclosed precursors possess low vaporization temperatures, preferably less than about 500° C. In addition, embodiments of the silicon precursors incorporate a —Si—Y—Si— bond, where Y may comprise an amino group, a substituted or unsubstituted hydrocarbyl group, or oxygen. In an embodiment a silicon precursor has the formula: where Y is a hydrocarbyl group, a substituted hydrocarbyl group, oxygen, or an amino group; R1, R2, R3, and R4 are each independently a hydrogen group, a hydrocarbyl group, a substituted hydrocarbyl group, a heterohydrocarbyl group, wherein R1, R2, R3, and R4 may be the same or different from one another; X1, X2, X3, and X4 are each independently, a hydrogen group, a hydrocarbyl group, a substituted hydrocarbyl group, or a hydrazino group, wherein X1, X2, X3, and X4 may be the same or different from one another.Type: GrantFiled: April 2, 2007Date of Patent: January 24, 2012Assignee: Air Liquide Electronics U.S. LPInventors: Ziyun Wang, Ashutosh Misra, Ravi Laxman
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Publication number: 20110245388Abstract: In a polycarbonate resin composition containing a polycarbonate resin and a polycarbosilane compound, the use of the polycarbosilane compound modifies the surface properties of the polycarbonate resin composition without adversely affecting the intrinsic characteristics of the polycarbonate resin, such as transparency, heat resistance, and mechanical properties, e.g., impact resistance. A polycarbonate resin composition containing 100 parts by mass of a polycarbonate resin, 0.001 to 1 part by mass of a metal salt compound, and 0.005 to 5 parts by mass of a polycarbosilane compound has significantly improved flame resistance and high transparency and causes markedly reduced outgassing and mold fouling, without losing impact resistance and heat resistance.Type: ApplicationFiled: January 7, 2010Publication date: October 6, 2011Applicant: Mitsubishi Engineering-Plastics CorporationInventor: Toshiki Monden
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Patent number: 7968741Abstract: A method of preparing a disilanol compound by hydrolyzing a dichlorosilane compound having Si—Cl bonds at both ends, characterized in that the method comprises the step of hydrolyzing the dichlorosilane compound in the presence of a tertiary amine compound.Type: GrantFiled: July 19, 2007Date of Patent: June 28, 2011Assignee: Shin-Etsu Chemical Co., Ltd.Inventors: Yasunori Sakano, Takashi Matsuda, Noriyuki Koike
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Publication number: 20110082309Abstract: A simple method of producing an organosilicon compound of a formula R2n(OR4)mSi—R1—Si(OR4)mR2n is disclosed. The method comprises the following two steps, Y—R1—Y+SiXm+1R2n->R2nXmSi—R1—SiXmR2n R2nXmSi—R1—SiXmR2n+M(OR4)r,->R2n(OR4)mSi—R1—Si(OR4)mR2n In the formulas, R1 is methylene, alkylene, or arylene, R2 is alkyl, alkenyl, alkynyl, or aryl, m and n is 0 to 3, provided m+n=3, at least one m being 1 or more, Y is halogen, X is hydrogen or halogen, R4 is alkyl, alkenyl, alkynyl, or aryl, M is metal, and r is the valence of the metal). The organosilicon compound is used to form a film having excellent heat resistance, chemical resistance, conductivity, and modulus of elasticity.Type: ApplicationFiled: March 30, 2010Publication date: April 7, 2011Applicant: JSR CORPORATIONInventors: Youhei Nobe, Kang-go Chung, Ryuuichi Saitou
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Publication number: 20110077420Abstract: The present invention relates to a preparation method for a linear or cyclic trisilaalkane which is a substance useful in the preparation of polycarbosilane and silicon carbide precursors. Linear or cyclic trisilaalkane and organic trichlorosilane derivatives can be synthesized simultaneously and in high yield by reacting bis(chlorosily)methane having a Si—H bond, either alone or together with an organic chloride, using a quaternary organic phosphonium salt compound as a catalyst. Further, since the catalyst can be recovered after use, the present invention is very economical and is thus effective for mass-producing precursors for organic/inorganic hybrid substances.Type: ApplicationFiled: May 22, 2009Publication date: March 31, 2011Applicant: SAMSUNG FINE CHEMICALS CO., LTD.Inventor: Il Nam Jung
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Patent number: 7906224Abstract: An organic electroluminescent element comprising a cathode and an anode having therebetween at least one organic compound layer, wherein one of the organic compound layer comprises a polymer having a repeat unit represented by Formula (1) (wherein Ar1 represents an arylene group which may have a substituent or a heteroarylene group having not more than two heteroatoms, which may have a substituent; and L1 represents a divalent linkage group selected from a prescribed group; and n1 represents an integer of not less than two).Type: GrantFiled: August 17, 2004Date of Patent: March 15, 2011Assignee: Konica Minolta Holdings, Inc.Inventors: Hideo Taka, Hiroshi Kita
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Publication number: 20110042789Abstract: A chemical vapor deposition material includes an organosilane compound shown by the following general formula (1). wherein R1 and R2 individually represent a hydrogen atom, an alkyl group having 1 to 4 carbon atoms, a vinyl group, or a phenyl group, R3 and R4 individually represent an alkyl group having 1 to 4 carbon atoms, an acetyl group, or a phenyl group, m is an integer from 0 to 2, and n is an integer from 1 to 3.Type: ApplicationFiled: March 24, 2009Publication date: February 24, 2011Applicant: JSR CorporationInventors: Hisashi Nakagawa, Yohei Nobe, Kang-go Chung, Ryuichi Saito, Terukazu Kokubo
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Publication number: 20110004010Abstract: The invention has an object to obtain an organic inorganic composite material having high activity and high selectivity, and suitable as a catalyst material having small elution of an active metal from a carrier, and further to obtain an organosilicon compound suitable for the preparation of the composite material. The composite material is an organic inorganic composite material comprising an organosilicon compound having at least two groups containing reactive silicon at a molecular end, bonded to one silicon atom constituting the organosilicon compound, and an inorganic oxide material, the organosilicon compound and the inorganic oxide material being bonded to each other through a plurality of groups containing reactive silicon of the organosilicon compound. The organosilicon compound is represented by the following general formula (1) or (2). Formula (1) wherein symbols are the same as defined in claim 17. Formula (2) wherein symbols are the same as defined in claim 18.Type: ApplicationFiled: March 5, 2008Publication date: January 6, 2011Applicants: National Instit of Advanced Indust Sci and Tech, N.E. Chemcat CorporationInventors: Shun-ya Onozawa, Norihisa Fukaya, Kaori Saitou, Toshiyasu Sakakura, Hiroyuki Yasuda, Yukio Takagi, Masae Ueda
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Publication number: 20100261925Abstract: A method of producing a silicon compound shown by the following general formula (7) includes reacting an organomagnesium compound shown by the following general formula (1) with an organosilane compound shown by the following general formula (2) in a solvent that contains at least one compound selected from a compound shown by the following general formula (3), a compound shown by the following general formula (4), a compound shown by the following general formula (5), and a compound shown by the following general formula (6).Type: ApplicationFiled: July 8, 2008Publication date: October 14, 2010Applicant: JSR CorporationInventors: Hisashi Nakagawa, Youhei Nobe, Kenji Ishizuki, Terukazu Kokubo
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Publication number: 20100105818Abstract: The invention provides structurally modified, pyrogenically prepared silicas obtained by reaction of pyrogenic silicas with cyclic polysiloxanes of the type —[O—Si(R2)]n—, where R is a C1 to C6 alkyl group and n is 3 to 9, and subsequent structural modification of the silanized silicas obtained. The invention further provides an adhesive comprising the structurally modified, pyrogenically prepared silicas.Type: ApplicationFiled: May 6, 2008Publication date: April 29, 2010Applicant: Evonik Degussa GmbHInventors: Juergen Meyer, Mario Scholz
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Publication number: 20100006006Abstract: Modified silicates are described which are obtained by reacting a waterglass solution with alkylsilanes of the general formula R—(CH2)n—Si—(X)3, in which X, in each case independently, is CH3, OCH3, OC2H5, OC3H7, OCOCH3 or Cl, and R is a saturated or unsaturated, linear or branched or cyclic radical having at least one O and/or N atom and at least 2 carbon atoms, and n is a number between 1 and 3, at a temperature in the range of from about 20 to about 80° C. The modified silicates are suitable for the hydrophilic finishing of hard surfaces, and can be used in detergents and cleaners.Type: ApplicationFiled: July 10, 2009Publication date: January 14, 2010Applicant: COGNIS IP MANAGEMENT GMBHInventors: Ralf Bohlander, Thomas Albers, Wolfgang Pesch, Michael Langen
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Patent number: 7544827Abstract: Chemical vapor deposition processes result in films having low dielectric constants when suitable chemical precursors are utilized. Preferred chemical precursors include siloxanes, (fluoroalkyl)fluorosiloxanes, (fluoroalkyl)silanes, (alkyl)fluorosilanes, (fluoroalkyl)fluorosilanes, alkylsiloxysilanes, alkoxysilanes, alkylalkoxysilanes, silylmethanes, alkoxysilylmethanes, alkylalkoxysilylmethanes, alkoxymethanes, alkylalkoxymethanes, and mixtures thereof. The precursors are particularly suited to thermal CVD for producing low dielectric constant films at relatively low temperatures, particularly without the use of additional oxidizing agents. Such films are useful in the microelectronics industry.Type: GrantFiled: October 16, 2006Date of Patent: June 9, 2009Assignee: ASM Japan K.K.Inventor: Michael A. Todd
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Patent number: 7504470Abstract: A thin film comprising a composition obtained by polymerizing a monomer having the formula I: wherein: R1 is a hydrolysable group, R2 is a polarizability reducing organic group, and R3 is a bridging hydrocarbon group, to form a siloxane material. The invention also concerns methods for producing the thin films. The thin film can be used a low k dielectric in integrated circuit devices. The novel dielectric materials have excellent properties of planarization resulting in good local and global planarity on top a semiconductor substrate topography, which reduces or eliminates the need for chemical mechanical planarization after dielectric and oxide liner deposition.Type: GrantFiled: August 31, 2005Date of Patent: March 17, 2009Assignee: Silecs OyInventors: Juha T. Rantala, Jyri Paulasaari, Janne Kylmä, Turo T. Törmänen, Jarkko Pietikäinen, Nigel Hacker, Admir Hadzic
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Patent number: 7488839Abstract: Fluorinated organosilicon compounds having formula (1) wherein Rf is a perfluoroalkyl group containing at least one ether bond, Q is a polyether group in the form of a homopolymer chain of ethylene glycol or propylene glycol or a copolymer chain of both, R is hydrogen or alkyl, X is a divalent linking group exclusive of oxygen atom, Y is a divalent linking group, p is an integer of at least 3, and n is a number of 0<n<3 have an excellent surface tension reducing ability and can be produced with ease of molecular weight control while minimizing formation of solvent-insoluble components. These compounds are safe to the human body and useful as a surfactant.Type: GrantFiled: May 18, 2006Date of Patent: February 10, 2009Assignee: Shin-Etsu Chemical Co., Ltd.Inventors: Hiromasa Yamaguchi, Hirofumi Kishita, Koichi Yamaguchi
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Publication number: 20090025609Abstract: A coating liquid for forming a low dielectric constant amorphous silica-based coating film with a dielectric constant of 3.0 or below and a film strength (Young's modulus) of 3.0 GPa or more, and also having a smooth surface with an excellent hydrophobicity. The coating liquid contains (1) a silicon compound obtained by hydrolyzing bis(trialcoxysilyl)alkane (BTASA) and alcoxysilane (AS) in the presence of tetraalkylammoniumhydroxide (TAAOH), or (2) a silicon compound obtained by hydrolyzing bis(trialcoxysilyl)alkane (BTASA), alcoxysilane (AS) and tetraalkylorthosilicate (TAOS) in the presence of tetraalkylammoniumhydroxide (TAAOH).Type: ApplicationFiled: December 15, 2006Publication date: January 29, 2009Inventors: Miki Egami, Hiroki Arao, Akira Nakashima, Michio Komatsu
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Patent number: 7132294Abstract: The invention provides a device for selective molecular recognition, the device comprising a sensing portion, wherein said sensing portion includes a substrate having coated thereon a layer comprising a non-volatile, small molecule compound having at least two pendant and terminal unsaturated groups, each being functionalized with at least one halogen substituted alcohol or phenol functional group. The compound of the invention preferably has one of the following general formulae: wherein A is a core moiety; B is a pendant and terminal unsaturated group; q is at least 1; r is at least 2; X is a linking group; and n is an integer designating the number of repeating units from 1 to 3, with the proviso that, if n is greater than 1, then the B groups differ from each other in at least two of the repeating units. The device is used to detect the molecules of a hydrogen bond accepting vapor such as an organophosphonate or nitroaromatic vapor.Type: GrantFiled: February 25, 2002Date of Patent: November 7, 2006Assignee: The United States of America as represented by the Secretary of the NavyInventors: Eric J. Houser, Robert Andrew McGill
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Patent number: 7078548Abstract: The invention provides a device for selective molecular recognition, the device comprising a sensing portion, wherein said sensing portion includes a substrate having coated thereon a layer comprising a hyperbranched compound having: (1) a polymer backbone portion that is at least partly randomly branched; (2) at least one pendant group extending from the polymer backbone portion; and (3) at least one halogen substituted alcohol or phenol group substituted at the pendant group(s) of the polymer backbone portion. The compound of the invention preferably has the general formula: wherein A is the hyperbranched backbone portion of the polymer; L and M are independently selected pendant groups of said polymer backbone; X and Y are independently selected halogen substituted alcohol or phenol groups; q and r are independently selected and at least 1; and n is at least 3. The device is used to detect the molecules of a hydrogen bond accepting vapor such as organophosphorus or nitroaromatic species.Type: GrantFiled: March 6, 2002Date of Patent: July 18, 2006Assignee: The United States of America as represented by the Secretary of the NavyInventors: Eric J. Houser, Robert A. McGill
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Patent number: 6784306Abstract: Fluorinated organosilicon compounds having at least one fluorinated organic group and at least three SiH groups in a molecule are capable of hydrosilylation reaction with such compounds as vinyl group-bearing fluoro-polymers in a stable manner and fully compatible therewith.Type: GrantFiled: February 20, 2002Date of Patent: August 31, 2004Assignee: Shin-etsu Chemical Co., Ltd.Inventors: Kenichi Fukuda, Koichi Yamaguchi
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Patent number: 6730802Abstract: The compound 2,4,6-trimethyl-2,4,6-trisila heptane, the preparation thereof, and the use thereof as a silicon carbide precursor in chemical vapor deposition and infiltration procedures are disclosed.Type: GrantFiled: July 9, 2002Date of Patent: May 4, 2004Assignee: Starfire Systems, Inc.Inventors: Qionghua Shen, Leo Spitz MacDonald
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Patent number: 6703519Abstract: Heat stable poly(ethynylene phenylene ethynylene silylene) polymers with a determined molecular weight bearing at the chain end, groups derived from a chain limiter. Methods for preparing these polymers, hardened products obtained by heat treatment of these polymers, and matrices for composites comprising these polymers.Type: GrantFiled: March 15, 2002Date of Patent: March 9, 2004Assignee: Commissariat a L' Energie AtomiqueInventors: Pierrick Buvat, Christian Levassort, Franck Jousse
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Patent number: 6696538Abstract: The present invention relates to low a dielectric material essential for a next generation semiconductor with high density and high performance, and more particularly to a low dielectric material that is thermally stable and has good film-forming properties and excellent mechanical properties, a dielectric film comprising the low dielectric material, and a semiconductor device manufactured using the dielectric film. The present invention provides an organic silicate polymer having a flexible organic bridge unit in the network prepared by the resin composition of the component (a) and the component (b).Type: GrantFiled: February 2, 2001Date of Patent: February 24, 2004Assignee: LG Chemical Ltd.Inventors: Min-Jin Ko, Hye-Yeong Nam, Jung-Won Kang, Myung-Sun Moon, Dong-Seok Shin
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Patent number: 6570031Abstract: The present invention relates to a novel dendrimic compounds, to a method for the production thereof and to the use thereof as catalysts for the production of polymers, in particular to the use thereof as co-catalysts for metallocenes for polymerizing unsaturated compounds.Type: GrantFiled: September 22, 2000Date of Patent: May 27, 2003Assignee: Bayer AktiengesellschaftInventors: Sigurd Becke, Uwe Denninger, Michael Mager, Heike Windisch
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Patent number: 6555644Abstract: A multi-reactive silicon compound has at least one polyalkyleneglycol substituent with the number average molecular weight being 200 to 10,000 as synthesized by reacting an organohalosilane compound having H—Si bonds with a polyalkyleneglycol ether compound having unsaturated substituents in the presence of a hydrosilylation catalyst. The multi-reactive silicon compound having polyalkyleneglycol substituents is very soluble in organic solvents and reactive to living polymeric ions with high thermal stability due to multiple functional groups, and active living groups. Thus, the addition of the multi-reactive silicon compound to a living polymer solution during an anionic or cationic polymerization reaction activates an intense substitution reaction under mild conditions to introduce a third functional group to the end or side chain of the polymer comprising a repeating monomer unit and provide organic-inorganic hybrid polymers.Type: GrantFiled: June 13, 2001Date of Patent: April 29, 2003Assignee: Korea Kumho Petrochemical Co., Ltd.Inventors: YoungHoon Ko, EunKyoung Kim
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Patent number: 6552204Abstract: The present invention relates to a novel process for producing a &dgr;-lactone of the formula: using an acyl halide of the formula: wherein R1, R2 R3 and X are described herein. In particular, the present invention relates to a process for enantioselectively producing the &dgr;-lactone and novel intermediates disclosed herein.Type: GrantFiled: September 22, 2000Date of Patent: April 22, 2003Assignee: Roche Colorado CorporationInventors: Peter J. Harrington, Lewis M. Hodges, Kurt Puentener, Michelangelo Scalone
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Patent number: 6534587Abstract: Symmetric and asymmetric cyclic silalkylenesiloxane monomers and copolymers thereof, as well as crosslinked and/or reinforced silalkylenesiloxane copolymers, medical devices containing such materials, and methods of preparation.Type: GrantFiled: May 9, 2000Date of Patent: March 18, 2003Assignee: Medtronic, IncInventors: Mark A. Tapsak, Edward Di Domenico
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Patent number: 6521774Abstract: A novel organosilicon compound obtained by introducing an alkylene group or analogue instead of the oxygen atom in an Si—O—Si linkage is capable of hydrosilylation reaction with another compound having a vinyl group to form a hydrosilylated derivative which is less prone to decomposition under acidic or basic conditions.Type: GrantFiled: April 25, 2001Date of Patent: February 18, 2003Assignee: Shin-Etsu Chemical Co., Ltd.Inventors: Noriyuki Koike, Koichi Yamaguchi, Yasunori Sakano
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Patent number: 6500976Abstract: Organosilicon compounds each having in a molecule (A) a perfluoroalkyl group of at least 3 carbon atoms which may be separated by an etheric oxygen atom, (B) a monovalent hydrocarbon group containing a carboxylic acid anhydride structure, and (C) a hydrosilyl (SiH) group are novel and added to thermosetting elastomer compositions as adhesion aids whereby the compositions are improved in adhesion to various materials including metals, alloys, plastics, and ceramics.Type: GrantFiled: October 5, 2001Date of Patent: December 31, 2002Assignee: Shin-Etsu Chemical Co., Ltd.Inventors: Takashi Matsuda, Mikio Shiono, Kenichi Fukuda