Ring Consisting Of Silicon And Oxygen Patents (Class 556/460)
  • Patent number: 6572923
    Abstract: Methods for synthesizing extra low-k CVD precursors and forming extra low-k dielectric films on the surfaces of semiconductors wafers and integrated circuits are disclosed. An asymmetric organocyclosiloxane compound is applied to the surface where it will react with and form a film that will have a dielectric constant, k, from 2.0 to 2.5.
    Type: Grant
    Filed: January 9, 2002
    Date of Patent: June 3, 2003
    Assignee: The BOC Group, Inc.
    Inventors: Ce Ma, Qing Min Wang
  • Patent number: 6566348
    Abstract: The present invention relates to immediately acting pest control compositions based on cyclic polysiloxanes, which can be employed without a residue and without a lasting action.
    Type: Grant
    Filed: May 21, 1998
    Date of Patent: May 20, 2003
    Assignee: Bayer Aktiengesellschaft
    Inventors: Jochen Kalbe, Andreas Turberg, Michael Londershausen, Norbert Mencke, Reiner Pospischil, Rainer Sonneck
  • Patent number: 6541077
    Abstract: A silicon-containing polymer having a tetrafunctional siloxane portion as the basic skeleton, and containing a carboxylic acid group-containing triorganosiloxane portion and a carboxylic acid derivative group-containing triorganosiloxane portion in a specific proportion. It may be advantageously used as a negative non-chemical amplification resist polymer or a positive chemical amplification resist polymer.
    Type: Grant
    Filed: May 9, 2001
    Date of Patent: April 1, 2003
    Assignee: Fujitsu Limited
    Inventors: Miwa Kozawa, Keiji Watanabe, Ei Yano
  • Patent number: 6531260
    Abstract: A novel polysiloxane having the following structural units (I) and/or (II) and the structural unit (III), wherein A1 and A2 are an acid-dissociable monovalent organic group, R1 is hydrogen, monovalent (halogenated) hydrocarbon, halogen, or amino, R2 is monovalent (halogenated) hydrocarbon group, or halogen. A method of preparing such a polysiloxane, a silicon-containing alicyclic compound providing this polysiloxane, and a radiation-sensitive resin composition comprising this polysiloxane are also provided. The polysiloxane is useful as a resin component for a resist material, effectively senses radiation with a short wavelength, exhibits high transparency to radiation and superior dry etching properties, and excels in basic resist properties required for resist materials such as high sensitivity, resolution, developability, etc.
    Type: Grant
    Filed: April 3, 2001
    Date of Patent: March 11, 2003
    Assignee: JSR Corporation
    Inventors: Haruo Iwasawa, Tsutomu Shimokawa, Akihiro Hayashi, Satoru Nishiyama
  • Patent number: 6492480
    Abstract: Disclosed is a method for the preparation of a linear polysilalkylenesiloxane from four- to seven-membered cyclic silalkylenesiloxane by subjecting the cyclic silalkylenesiloxane to ring opening polymerization by using as a catalyst a polynuclear ruthenium-carbonyl complex in which carbonyl groups are coordinated with three or four ruthenium atoms, in the presence of a silane compound having at least one Si—H bond.
    Type: Grant
    Filed: June 20, 2001
    Date of Patent: December 10, 2002
    Assignee: Japan Science and Technology Corporation
    Inventors: Hideo Nagashima, Kouki Matsubara, Junichi Terasawa
  • Patent number: 6448360
    Abstract: A process for the production of a cyclic siloxane described by formula (R1(CH3)SiO)d comprising reacting in the presence of an alkali catalyst a siloxane mixture comprising a silane or a linear siloxane described by general formula HO(R1(CH3)SiO)bH and a cyclic siloxane described by general formula (R1(CH3)SiO)c, where R1 is an alkenyl group having 6 to 14 carbon atoms, b is an integer of one or greater, c is an integer of 3 or greater, and d is an integer of 3 or greater.
    Type: Grant
    Filed: January 19, 2001
    Date of Patent: September 10, 2002
    Assignee: Dow Corning Toray Silicone Co., Ltd.
    Inventors: Tadashi Okawa, Junichi Maeshima, Norikatsu Higuchi, Takao Takemasa
  • Publication number: 20020068223
    Abstract: Disclosed is a holographic recording medium. The novel holographic recording mediums disclosed herein comprises: a) at least one polyfunctional epoxide monomer or oligomer which undergoes acid initiated cationic polymerization. Each epoxide in the monomer or oligomer is linked by group comprising a siloxane to a silicon atom and each monomer or oligomer has an epoxy equivalent weight of greater than about 300 grams/mole epoxide; b) a binder which is capable of supporting cationic polymerization; c) an acid generator capable of producing an acid upon exposure to actinic radiation; and optionally d) a sensitizer.
    Type: Application
    Filed: August 28, 2001
    Publication date: June 6, 2002
    Applicant: Aprilis, Inc.
    Inventors: Erdem A. Cetin, Richard A. Minns, David A. Waldman
  • Patent number: 6395858
    Abstract: The present invention relates to mixtures of catenate and cyclic siloxane oligomers of the formulae I and II where the substituents R consist of (i) aminopropyl-functional groups of the formula —(CH2)3—NH2 or —(CH2)3—NHR′ or —(CH2)3—NH(CH2)2—NH2 or —(CH2)3—NH(CH2)2—NH(CH2)2—NH2,in which R′ is a linear, branched or cyclic alkyl group of 1 to 18 carbon atoms or an aryl group of 6 to 12 carbon atoms, and (ii) methoxy, ethoxy, 2-methoxyethoxy and/or propoxy groups, and (iii) if desired, alkyl, alkenyl, isoalkyl or cycloalkyl groups of 1 to 18 carbon atoms and/or aryl groups of 6 to 12 carbon atoms, and where not more than one aminopropyl-functional group is attached to one silicon atom and the degree of oligomerization of compounds of the formula I is within the range 2<m<30 and that of compounds of the formula II is 3≦n≦30 and the quotient of the molar proportion of Si/alkoxy group is ≧0.5.
    Type: Grant
    Filed: October 27, 1999
    Date of Patent: May 28, 2002
    Assignee: Degussa AG
    Inventors: Helmut Mack, Dieter Barfurth, Roland Edelmann, Albert-Johannes Frings, Michael Horn, Peter Jenkner, Ralf Laven, Jaroslaw Monkiewicz, Burkhard Standke
  • Patent number: 6395826
    Abstract: The present invention relates to mixtures prepared from (A) at least one linear, branched, or cyclic monomeric organosilane having at least two silicon atoms with hydrolyzable and/or condensation-crosslinking groups in which the silicon atoms are bonded to one another through at least one carbon atom in a linking unit, and (B) at least one boron- and/or aluminum-containing compound having the formula (I) RxM(OR′)3−x  (I)  wherein M is Al or B, x is 0, 1, or 2, R is C1-C6-alkyl, C6-C12-aryl, or (O)½, with the proviso that if R is (O)½, then the compound of the formula (I) is a chain when x is 1 and a cyclic or cage-form compound when x is 2, and each R′ is independently H, C1-C10-alkyl, or C6-C12-aryl. The invention further relates to hybrid materials prepared from such mixtures and to coatings produced therefrom.
    Type: Grant
    Filed: March 24, 1999
    Date of Patent: May 28, 2002
    Assignee: Bayer Aktiengesellschaft
    Inventors: Michael Mager, Steffen Hofacker
  • Patent number: 6380406
    Abstract: A process for forming an olefin epoxidation catalyst is described. The process comprises reacting a tert-alkyl trihydroxysilane with a titanium complex such that the ratio of Si:Ti is 7. The catalyst is very active and selective in olefin epoxidation.
    Type: Grant
    Filed: August 4, 2000
    Date of Patent: April 30, 2002
    Assignee: Arco Chemical Technology, L.P.
    Inventor: Kevin M. Carroll
  • Patent number: 6346553
    Abstract: Alkylmethylsiloxane-dimethylsiloxane polyalkylene oxide copolymers useful as surfactants for both oil-in-water emulsions and silicone-in-water emulsions are disclosed.
    Type: Grant
    Filed: April 13, 2000
    Date of Patent: February 12, 2002
    Assignee: Archimica (Florida), Inc.
    Inventors: Gary E. LeGrow, Mark A. Buese
  • Patent number: 6342562
    Abstract: A silicon-containing polymer having a tetrafunctional siloxane portion as the basic skeleton, and containing a carboxylic acid group-containing triorganosiloxane portion and a carboxylic acid derivative group-containing triorganosiloxane portion in a specific proportion. It may be advantageously used as a negative non-chemical amplification resist polymer or a positive chemical amplification resist polymer.
    Type: Grant
    Filed: April 20, 2000
    Date of Patent: January 29, 2002
    Assignee: Fujitsu Limited
    Inventors: Miwa Kozawa, Keiji Watanabe, Ei Yano
  • Patent number: 6329490
    Abstract: Disclosed are polyhedral organosilicon compounds which are possible to be polymerized and can form a film excellent in adhesiveness to a substrate, having a high hardness, a high transparency and having water and oil repellency, and comprise organofluoro groups or both of organofluoro groups and reactive functional groups, the compounds being soluble in an organic solvent and stable. Organosilicon compounds which have perfluoroalkyl groups or both perfluoroalkyl groups and reactive functional groups and which have a polyhedral structure have the following formulas of (I), (II) and (III): [Rf1—X1—(CH2)a—SiO1.5]m  (I) [Rf1—X1—(CH2)a—SiO1.5]m[Rf2—(X2)c—(CH2)b—SiO1.5]n  (II) [Rf1—X1—(CH2)a—SiO1.5]m[R—(X2)c—(CH2)b—SiO1.
    Type: Grant
    Filed: March 31, 2000
    Date of Patent: December 11, 2001
    Assignees: Mitsubishi Materials Corporation, Dai Nippon Toryo Co., Ltd.
    Inventors: Yukiya Yamashita, Kenji Hayashi, Masaoki Ishihara
  • Patent number: 6310146
    Abstract: A cured silsesquioxane resin and method for its preparation are disclosed. By using a silyl-terminated hydrocarbon in the hydrosilylation reaction curable composition used to prepare the cured silsesquioxane resin, the cured silsesquioxane resin has improved strength and toughness without significant loss of modulus. A typical silyl-terminated hydrocarbon useful in this invention is silphenylene.
    Type: Grant
    Filed: July 1, 1999
    Date of Patent: October 30, 2001
    Assignees: Dow Corning Corporation, Massachusetts Institute of Technology
    Inventors: Dimitris Elias Katsoulis, Zhongtao Li, Frederick Jerome McGarry, Bihn Thanh Nguyen, Bizhong Zhu
  • Patent number: 6303811
    Abstract: A cyclic organosilicon compound comprising one aliphatic unsaturation described by formula where each R is an independently selected hydrocarbon radical free from aliphatic unsaturation comprising 1 to about 18 carbon atoms; each X is independently selected from the group consisting of halogen, alkoxy, acyloxy, and ketoximo; m is an integer from 2 to 7; p is an integer from 0 to 6; m+p is an integer from 2 to 8; n is 0, 1, or 2; each Z is independently selected from the group consisting of divalent hydrocarbon radicals free of aliphatic unsaturation comprising about 2 to 18 carbon atoms and a combination of divalent hydrocarbon radicals and siloxane segments; and Y is selected from the group consisting of hydrocarbon radicals comprising one aliphatic unsaturation and 2 to about 18 carbon atoms and a combination comprising one aliphatic unsaturation of hydrocarbon radicals, siloxane segments, and a divalent hydrocarbon radical free of aliphatic unsaturation comprising 2 to about 18 carbo
    Type: Grant
    Filed: December 21, 1998
    Date of Patent: October 16, 2001
    Assignee: Dow Corning Corporation
    Inventors: Robert Harold Krahnke, Timothy B. Lueder, Richard Alan Palmer, Nick Evan Shephard
  • Patent number: 6288195
    Abstract: An organopolysiloxane gum is prepared by polymerizing a cyclic organopolysiloxane with a low molecular weight linear organopolysiloxane end-blocked with a triorganosilyl group in the presence of a thermally decomposable catalyst. After the polymerization reaction, the catalyst is deactivated by heating the reaction product under a subatmospheric pressure of typically up to 500 mmHg.
    Type: Grant
    Filed: December 2, 1999
    Date of Patent: September 11, 2001
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Masaharu Takahashi, Yutaka Hagiwara, Minoru Igarashi, Kenji Tawara, Yoshio Tomizawa
  • Patent number: 6288196
    Abstract: An organopolysiloxane gum is continuously prepared by (I) mixing at least one cyclopolysiloxane with an end capping agent, (II) feeding the mixture to a self-cleaning reactor along with an alkaline polymerization catalyst, and effecting polymerization at a temperature of 100 to 250° C. and under subatmospheric pressure, (III) continuously adding a neutralizing agent to the reaction mixture of step (II), thereby terminating the polymerization reaction, and (IV) continuously removing the cyclopolysiloxane and volatile components from the reaction mixture.
    Type: Grant
    Filed: December 2, 1999
    Date of Patent: September 11, 2001
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Masaharu Takahashi, Yutaka Hagiwara
  • Patent number: 6284906
    Abstract: This invention relates to methods for the preparation of hyperbranched siloxane polymers by anionic polymerization of a cyclotrisiloxane having the functional group Si—OH, and for the preparation of linear siloxane polymers by cationic or anionic polymerization of a cyclotrisiloxane having a vinylterminated functional group. Furthermore, this invention concerns novel cyclotrisiloxanes useful for the preparation of the aforementioned polymers.
    Type: Grant
    Filed: July 6, 2000
    Date of Patent: September 4, 2001
    Assignee: University of Southern California
    Inventors: Jyri Kalevi Paulasaari, William P. Weber
  • Patent number: 6284859
    Abstract: A polymerization process comprising mixing siloxanes having silicon-bonded groups R′ with ionic phosphazene base catalysts and allowing condensation via reaction of Si—R′ groups with the formation of a Si—O—Si linkage, R′ denoting a hydroxyl group or a hydrocarbonoxy group having up to 8 carbon atoms is claimed. The catalysts may be of the general formulae: {((R12N)3P═N—)x(R12N)3−xP—N(H)R2}+{A−} or {((R12N)3P═N—)y(R12N)4−yP}+{A}− in which R1 is hydrogen or an optionally substituted hydrocarbon group or in which two R1 groups bonded to the same N atom may be linked to complete a heterocyclic ring, R2 is hydrogen or an optionally substituted hydrocarbon group, x is 1, 2 or 3, y is 1, 2, 3 or 4 and A is an anion.
    Type: Grant
    Filed: December 9, 1999
    Date of Patent: September 4, 2001
    Assignee: Dow Corning Limited
    Inventors: Peter Hupfield, Avril Surgenor, Richard Taylor
  • Patent number: 6262289
    Abstract: This invention is a method for the production of a cyclic oligosiloxane, which comprises heating a linear or cyclic polysiloxane in the presence of a metal alkoxide, by which the cyclic oligosiloxane can be produced with high yield by a method having industrially high practical value, because it can carry out the reaction under moderate conditions without causing gelation of the reaction system, in comparison with conventional methods using an alkaline or acidic catalyst.
    Type: Grant
    Filed: December 8, 1999
    Date of Patent: July 17, 2001
    Assignee: Kaneka Corporation
    Inventor: Katsuya Ouchi
  • Patent number: 6252030
    Abstract: A method for manufacturing an organic solvent-soluble hydrogenated octasilsesquioxane-vinyl group-containing compound copolymer comprising reacting 1 mol of (A) a hydrogenated octasilsesquioxane described by formula I with 0.2 to less than 3 mol of (B) a divinyl group-containing compound described by formula (2) CH2═CH—L—CH═CH2   Formula 2 where L is selected from the group consisting of (a) a divalent hydrocarbon group comprising 3 to 10 carbon atoms and (b) —(SiR2O)m—SiR2—, where each R is independently selected from the group consisting of alkyls comprising 1 to 6 carbon atoms and aryls comprising 6 to 9 carbon atoms and 1≦m≦10; in the presence of a hydrosilylation catalyst.
    Type: Grant
    Filed: March 9, 2000
    Date of Patent: June 26, 2001
    Assignee: Dow Corning Asia, Ltd.
    Inventors: Gregg Alan Zank, Michitaka Suto
  • Patent number: 6248853
    Abstract: A liquid state non-solvent silicone resin obtained from a polycondensation reaction of material (A) dimethyl poly siloxane, material (B) vinyl methyl cyclo siloxane and material (C) diphenyl dihydroxy silane, the reaction being performed at a temperature within about 140˜180° C. under the presence of an anionic polymerization catalyzer.
    Type: Grant
    Filed: January 5, 1999
    Date of Patent: June 19, 2001
    Assignee: Silitek Corporation
    Inventors: Yong Zhou Sun, Peng Zhao, Jian Liu, Chi-Lung Tsai
  • Patent number: 6232425
    Abstract: A process for making organosilyl end-stopped diorganopolysiloxane fluid is provided comprising the steps of reacting an organic end-stopping compound with a fluorosilicone trimer in the presence of a catalytic amount of linear phosphonitrilic acid, and inactivating the linear phosphonitrilic acid, thereby forming organosilyl end-stopped diorganopolysiloxane fluid.
    Type: Grant
    Filed: December 31, 1998
    Date of Patent: May 15, 2001
    Assignee: General Electric Company
    Inventors: John S. Razzano, Nancy E. Gosh
  • Patent number: 6225490
    Abstract: For the continuous hydrolysis of organochlorosilane, a reaction system comprising at least three stages of hydrolysis is used. Each stage includes a reactor and a phase separator wherein hydrolysis is effected to form a hydrolysis mixture which is separated into a hydrolyzate and a hydrogen chloride-containing aqueous medium. The separated aqueous medium is circulated to the reactor. The hydrolyzate is conveyed to the reactor of the subsequent stage. The organochlorosilane is fed into the first stage reactor, the aqueous medium containing an amount of water corresponding to the consumption in one stage is fed into one stage reactor from the subsequent stage, and an amount of water corresponding to the consumption in the overall reaction system is fed in the last stage. Then the entire amount of hydrogen chloride generated in multiple stages of hydrolysis is recovered as anhydrous hydrogen chloride from the first stage.
    Type: Grant
    Filed: May 27, 1998
    Date of Patent: May 1, 2001
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Hiroshi Nakayama, Naoyuki Ida, Hiroyuki Kobayashi, Yukinori Satoh, Yoshihiro Shirota, Masaaki Furuya
  • Patent number: 6214962
    Abstract: An organopolysiloxane gum is continuously prepared by (I) mixing at least one cyclopolysiloxane with an end capping agent, (II) feeding the mixture to a self-cleaning reactor along with a polymerization catalyst of thermal decomposition type, and effecting polymerization at a temperature of 80-130° C., (III) heating the reaction mixture of step (II) at a temperature of 130-200° C. under subatmospheric pressure for deactivating the catalyst, thereby terminating the polymerization reaction, and (IV) continuously removing the cyclopolysiloxane and volatile components from the reaction product.
    Type: Grant
    Filed: December 2, 1999
    Date of Patent: April 10, 2001
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Masaharu Takahashi, Yutaka Hagiwara, Minoru Igarashi, Keiji Shibata, Kenji Tawara, Yoshio Tomizawa
  • Patent number: 6187827
    Abstract: A process for the recovery of methyl polysiloxane in the form of methyl cyclosiloxane of the general formula (R2SiO)x, wherein R is selected from alkyl, alkenyl, aryl and alkaryl groups and “x” is an integer selected from 3-6, in which: a) liquifying silicone feedstock as herein defined is liquefied in a solvent selected from alcohol or siloxane in presence of a catalyst at a temperature of between 110° C.-180° C. to obtain a liquefied mass consisting of a mixture of methyl polysiloxane, solvent and filler; b) adding a metal hydroxide to the liquefied mass so as to convent the fillers to their corresponding silicates, the said silicates thus obtained are removed and the liquid recovered; and c) cyclyzing methyl polysiloxane in the liquid medium thus obtained in the presence of a cracking catalyst in the temperature range of 115-160° C. so as to crack the liquid methyl polysiloxane to a mixture of volatile methyl cyclosiloxane.
    Type: Grant
    Filed: March 12, 1999
    Date of Patent: February 13, 2001
    Inventors: Soumitra Ranjan Mukherjee, Amit Kumar Paul
  • Patent number: 6180811
    Abstract: A process for continuously reducing the amount of cyclic organosiloxane in a recirculating process stream. The process comprises washing a process stream in a wash step to reduce chloride content of the process stream, distilling the process stream into a low-boiling fraction comprising low molecular weight cyclic organosiloxanes and an inert solvent and a high-boiling fraction comprising linear organosiloxanes and high molecular weight cyclic organosiloxanes, and reequilibrating the overhead low-boiling fraction in the presence of a reequilibration catalyst to form a reequilibration mixture comprising high molecular weight cyclic organosiloxanes and the inert solvent, and recycling the reequilibration mixture to the wash step.
    Type: Grant
    Filed: December 22, 1998
    Date of Patent: January 30, 2001
    Assignee: Dow Corning Corporation
    Inventors: David Harold Bramer, Larry Herbert Wood
  • Patent number: 6172250
    Abstract: A process for the preparation of biologically active silicon compounds by hydrolysis of a precursor which produces a compound which prevents the formation of polymers from the silicon hydrolyzed bonds.
    Type: Grant
    Filed: July 16, 1996
    Date of Patent: January 9, 2001
    Assignee: Exsymol S.A.M.
    Inventors: Marie-Christine Seguin, Jean Gueyne, Jean-Francois Nicolay, Andre Franco
  • Patent number: 6160150
    Abstract: A cyclic organosilicon compound comprising one silicon-bonded hydrogen atom described by formula ##STR1## where each R is an independently selected hydrocarbon radical free from aliphatic unsaturation comprising 1 to about 18 carbon atoms; each X is independently selected from the group consisting of halogen, alkoxy, acyloxy, and ketoximo; m is an integer from 2 to 7; p is an integer from 0 to 6; m+p is an integer from 2 to 8; n is 0, 1, or 2; and each Z is independently selected from the group consisting of divalent hydrocarbon radicals free of aliphatic unsaturation comprising about 2 to 18 carbon atoms and a combination of divalent hydrocarbon radicals and siloxane segments. The cyclic organosilicon compounds comprising one silicon-bonded hydrogen atom of the present invention are useful as endcappers for polymers.
    Type: Grant
    Filed: December 21, 1998
    Date of Patent: December 12, 2000
    Assignee: Dow Corning Corporation
    Inventors: Robert Harold Krahnke, Timothy B. Lueder, Richard Alan Palmer, Nick Evan Shephard
  • Patent number: 6127557
    Abstract: A method for producing silasesquioxane metal complexes of the formula (II)((R.sup.1 SiO.sub.1,5).sub.n (R.sup.2a SiO.sub.1,5).sub.m ((B).sub.q (O).sub.r)).sub.u (M).sub.v (Y).sub.win which R.sup.1 represents C.sub.5 -C.sub.10 -cycloalkyl, norbornyl or adamantyl; R.sup.2a represents oxygen; B represents H, OH, halogen, alkoxy, SiR.sup.3.sub.y in which R.sup.3 can be C.sub.1 -C.sub.4 alkyl, aryl or substituted silyl groups, and y represents 2 or 3, and R.sup.1 and R.sup.3 can be functionalized; M represents metals of the 4.sup.th to 7.sup.th subgroups of the periodic system of elements; Y represents C.sub.1 -C.sub.20 alkyl or aryl groups devoid of beta-hydrogen, silyl, alkoxy, OH, halogen, oxo, imido, fluorenyl, indenyl, cyclopentadienyl, in which the individual ligands can be substituted; n=6 or 7; m=0 or 1; q=0-2; r=0-2; u=1-4; v=1-4; w=0-12, in which a metal compound of the 4.sup.th to 7.sup.th subgroups of the periodic system of elements and at least one silasesquioxane compound of the formula (I)(R.sup.
    Type: Grant
    Filed: October 18, 1999
    Date of Patent: October 3, 2000
    Assignee: Solvay Deutschland GmbH
    Inventors: Rutger Anthony Van Santen, Hendrikus Cornesis Louis Abbenhuis, Martinus Lambertus Wilhelmus Vorstenbosch
  • Patent number: 6100417
    Abstract: Method is provided for reacting silsesquioxane resins or polyhedral oligomeric silsesquioxanes (POSS) bearing one or more olefinic groups with strong acids to cleave one or more olefin bonds of the olefinic groups to form POSS species of monomers or polymers having one or more functionalities suitable for reaction with a wide range of polymeric systems, to thus form new POSS derived compounds. Also provided are the new compounds so formed.
    Type: Grant
    Filed: August 31, 1999
    Date of Patent: August 8, 2000
    Assignee: The United States of America as represented by the Secretary of the Air Force
    Inventors: Joseph D. Lichtenhan, Frank J. Feher, Daravong Soulivong
  • Patent number: 6069259
    Abstract: A composition relating to an oligomeric alkoxy siloxane substituted with polymerizible epoxy or 1-alkenyl groups, and a process for the production of that composition, are disclosed. The process entails a hydrolysis-condensation oligomerization of an epoxy- or 1-alkenyl ether-functional trialkoxy silane, catalyzed by an ion exchange resin, and separation of the resin from the resulting oligomer.
    Type: Grant
    Filed: February 6, 1998
    Date of Patent: May 30, 2000
    Assignee: Rensselaer Polytechnic Institute
    Inventor: James Vincent Crivello
  • Patent number: 6037486
    Abstract: The present invention relates to an improved cracking process for increasing the yield and purity of fluoro-alkyl substituted cyclic compounds by using an alkali metal carbonate for the cracking catalyst.
    Type: Grant
    Filed: December 8, 1998
    Date of Patent: March 14, 2000
    Assignee: General Electric Company
    Inventor: John S. Razzano
  • Patent number: 5942638
    Abstract: A synthetic process for the selective preparation of reactive polyhedral oligomeric silsesquioxanes (POSS) as well as polyhedral oligomeric silicate (POS) (spherosilicate) is provided. The method claimed herein employs metal catalyzed metathesis reactions for the selective reaction of .alpha.-olefin containing polyhedral oligomeric silsesquioxanes or silicates with olefinic reagents bearing functionalities useful for grafting reactions, polymerization chemistry and sol-gel processes. The use of metal catalyzed metathesis chemistry to form both linear or network polyhedral silsesquioxane polymers directly from .alpha.-olefin-containing polyhedral oligomeric silsesquioxanes is also described.
    Type: Grant
    Filed: January 5, 1998
    Date of Patent: August 24, 1999
    Assignee: The United States of America as represented by the Secretary of the Air Force
    Inventors: Joseph D. Lichtenhan, Joseph J. Schwabb, Frank J. Feher, Daravong Soulivong
  • Patent number: 5939576
    Abstract: A synthetic process for the selective preparation of reactive polyhedral oligomeric silsesquioxanes (POSS) as well as polyhedral oligomeric silicate (POS) (spherosilicate) is provided. The inventive process employs the use of metal catalyzed hydrosilylation reactions for the selective reaction of silane containing polyhedral oligomeric silsesquioxanes or silicates with olefinic reagents bearing functionalities useful for grafting reactions, polymerization chemistry and sol-gel processes. The invention also discloses metal-catalyzed hydrosulfidation reactions and metal-catalyzed hydrophosphidation reacttions for functionalization of polycyclic silicones.
    Type: Grant
    Filed: January 5, 1998
    Date of Patent: August 17, 1999
    Assignee: The United States of America as represented by the Secretary of the Air Force
    Inventors: Joseph D. Lichtenhan, Joseph J. Schwab, Frank J. Feher, Daravong Soulivong
  • Patent number: 5914420
    Abstract: Compositions of unstrained perfluorinated organo substituted cyclosiloxanes of formula (I): ##STR1## wherein m is an integer of 1 to 12; n is an integer of 1 to 4; X is a divalent radical which may include O, NH, N(CH.sub.3), OC(O), NHC(O), N(CH.sub.3)C(O)CH.sub.2 ; and R.sup.F is a perfluorinated straight chain or branched chain monovalent alkyl radical of 1 to 25 carbon atoms; or R.sup.F is a perfluorinated ether radical of the general formula (II): ##STR2## wherein p is an integer of 1 to 10 are described, along with copolymer compositions prepared from these cyclopolysiloxanes and from mixtures of these cyclosiloxanes and other siloxanes.
    Type: Grant
    Filed: May 29, 1998
    Date of Patent: June 22, 1999
    Assignee: PCR, Inc.
    Inventors: Mark A. Buese, John Scott Shaffer
  • Patent number: 5852153
    Abstract: A novel cyclotrisiloxane having the following general formula (1) and a novel copolymer synthesized using the cyclotrisiloxane are provided. The copolymer is excellent in low-temperature characteristics, heat resistance, temperature-viscosity characteristics, and compatibility with various fluids and is particularly useful as a starting material for use in cosmetics and greases. ##STR1## wherein R.sup.2 is a hydrogen atom, an alkyl group, an aryl group, an aralkyl group, a halogenated alkyl group, an alkenyl group, an acryloyloxypropyl group or a methacryloyloxypropyl group, and R.sup.3 is a methyl group or a phenyl group.
    Type: Grant
    Filed: September 4, 1997
    Date of Patent: December 22, 1998
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Michihiro Sugo, Hisashi Aoki
  • Patent number: 5834585
    Abstract: A method for separating hexamethylcyclotrisiloxane that does not require the use of a distillation set up adapted for use with solids and that collects the hexamethylcyclotrisiloxane in the form of an easy-to-handle solution. The method comprising inducing the ascent in the gaseous state of a hexamethylcyclotrisiloxane-containing mixture of polydimethylcyclosiloxanes in a distillation column provided with a sidestream element in the middle region of the column so as to induce the ascent of gaseous hexamethylcyclotrisiloxane to at least the level of the sidestream element, supplying into said distillation column solvent having a boiling point below that of hexamethylcyclotrisiloxane and capable of dissolving hexamethylcyclotrisiloxane, so as to form a liquid mixture of hexamethylcyclotrisiloxane and said solvent in the vicinity of the sidestream element, and withdrawing the said liquid mixture from the sidestream element.
    Type: Grant
    Filed: July 14, 1997
    Date of Patent: November 10, 1998
    Assignee: Dow Corning Toray Silicone Co., Ltd.
    Inventor: Toshi Nomura
  • Patent number: 5834613
    Abstract: Chemically stable, perfluorinated, linear or cyclic polyorganosiloxanes (POS), and a process for the preparation thereof. Antifoams, agents for lowering surface tension, dirt repellents, antiadhesives, lubricants, oleophobic and/or hydrophobic agents, coatings and other compositions containing the perfluorinated POS are disclosed.
    Type: Grant
    Filed: July 25, 1996
    Date of Patent: November 10, 1998
    Assignee: Rhone-Poulenc Chimie
    Inventors: Philippe Jost, Philippe Karrer, Gerard Mignani, Philippe Olier
  • Patent number: 5703191
    Abstract: The present invention is directed to a purified polyalkylsiloxane composition having a boiling point, under atmospheric conditions, of less than about 250.degree. C. and containing high boiling impurities, including siloxanes and silanol-terminated siloxanes, that have boiling points, under atmospheric conditions, of greater than about 250.degree. C. in a total concentration of less than 14 ppm. The present invention is further directed to a method of producing a purified polyalkylsiloxane composition, having a boiling point, under atmospheric conditions, of less than about 250.degree. C., by distilling a polyalkylsiloxane starting material containing high boiling impurities having boiling points, under atmospheric conditions, of greater than about 250.degree. C. in a total concentration of at least 14 ppm, under conditions effective to produce a purified polyalkylsiloxane composition having a boiling point under atmospheric conditions of less than about 250.degree. C.
    Type: Grant
    Filed: December 19, 1995
    Date of Patent: December 30, 1997
    Assignee: Corning Incorporated
    Inventors: Danny L. Henderson, Dale R. Powers
  • Patent number: 5700899
    Abstract: A curable silicone composition based on an organopolysiloxane having a cyclotrisiloxane structure quickly cures by brief heating or ultraviolet exposure. It further contains an acid, acid generator, base or base generator or an oniom salt photo-initiator as a curing agent. The cured product has release property from adhesive substance which remains unchanged with the lapse of time and good mold release properties, and thus provides a lightly releasable cured film. The composition is widely used as adhesive tape backing agents, mold release agents, protective coating agents, water and oil repellent agents, and paint base.
    Type: Grant
    Filed: August 12, 1996
    Date of Patent: December 23, 1997
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Shunji Aoki, Toshio Ohba, Yasuaki Hara, Kunio Itoh
  • Patent number: 5679335
    Abstract: A method of treating human skin to decrease transepidermal water loss. A method of enhancing the substantivity of conditioning compounds applied to the skin. A film forming conditioning formulation which includes as an ingredient thereof an organosilicon compound is applied to the skin. The improvement resides in the utilization of a formulation which includes as the organosilicon compound a cyclic alkylmethyl polysiloxane.
    Type: Grant
    Filed: April 10, 1992
    Date of Patent: October 21, 1997
    Assignee: Dow Corning Corporation
    Inventors: Gary Edward Legrow, Regina Marie Malczewski
  • Patent number: 5670689
    Abstract: The present invention relates to a process for the manufacture of cyclic polydiorganosiloxanes, especially octamethylcyclotetrasiloxane (D.sub.4) and decamethylcyclopentasiloxane (D.sub.5) by depolymerization of polydiorganosiloxanes in the presence of an initiator, characterized in that the initiator comprises either:1) at least one hydroxide chosen especially from the group made up of caesium, rubidium or quaternary phosphonium hydroxides, or:2) the association of a fluorine-free caesium or rubidium salt, or of a salt of quaternary phosphoniums, with a hydroxyl-containing strong base of an alkali or alkaline-earth metal other than Cs and Rb.
    Type: Grant
    Filed: May 10, 1996
    Date of Patent: September 23, 1997
    Assignee: Rhone-Poulenc Chimie
    Inventors: Christian Allandrieu, Denis Cardinaud
  • Patent number: 5660690
    Abstract: The invention relates to an improved distillation method wherein hexamethylcyclotrisiloxane is isolated from a crude blend thereof by mixing the crude blend with a hydrocarbon co-solvent having a normal boiling point of 125.degree. C. to 150.degree. C. and distilling the resulting mixture in an apparatus having a reboiler, a fractionating column and a condenser, whereby deposition of solid hexamethylcyclotrisiloxane in the condenser is eliminated.
    Type: Grant
    Filed: June 3, 1996
    Date of Patent: August 26, 1997
    Assignee: Dow Corning Corporation
    Inventors: Gerald Alphonse Gornowicz, Rocco Joseph Voci
  • Patent number: 5650449
    Abstract: This invention may be described as follows. (1) A defoaming agent for the production of highly elastic soft and semi-rigid polyurethane foam, having as a main component thereof an organio silicone compound represented by the following formula (I) ##STR1## wherein each R.sup.1 is a monovalent hydrocarbon group of one to eighteen (18) carbon atoms, R.sup.2 is a monovalent hydrocarbon group of one to eighteen (18) carbon atoms or an organic substituent, and x and y are each not less than 1, providing x+y equals a number between 3 to 8. A method for the production of a highly elastic soft and semirigid polyurethane foam with said defoaming agent per formula (1) and a highly elastic soft polyurethane foam and a semirigid polyurethane foam produced by this method are also taught.
    Type: Grant
    Filed: April 22, 1996
    Date of Patent: July 22, 1997
    Inventors: Torahiko Mukuno, Yoshio Ofuji, Masao Takase
  • Patent number: 5624977
    Abstract: Provided is a thermoplastic fluorosilicone resin of the average compositional formula (1):(RfCH.sub.2 CH.sub.2 SiO.sub.3/2).sub.x (C.sub.6 H.sub.5 SiO.sub.3/2).sub.y (SiO.sub.2).sub.z ( 1)wherein Rf is a perfluoroalkyl group having 1 to 10 carbon atoms, and x, y, and z are 0.2.ltoreq.x.ltoreq.0.95, 0<y.ltoreq.0.8, 0.ltoreq.z.ltoreq.0.05, and x+y+z=1 and having a softening point of 50.degree.-200.degree. C. The fluorosilicone resin is useful for microcapsulating a platinum catalyst for prolonging the pot life of an addition type organopolysiloxane composition and can be used as a coating agent for forming a weather resistant, stainproof, water repellent coating.
    Type: Grant
    Filed: November 30, 1994
    Date of Patent: April 29, 1997
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Mitsuhiro Takarada, Yoshiteru Kobayashi, Takashi Kondou
  • Patent number: 5621130
    Abstract: A photosensitive member having stable electrophotographic characteristics can be constituted by an electroconductive support and a photosensitive layer disposed thereon and containing a novel fullerene compound having an organosilicon group as a charge-transporting substance. The fullerene compound may preferably have a polyhedral structure, particularly that of Buckminsterfullerene (C.sub.60) and be represented by the formula: C.sub.60 (A).sub.n . . . (2), wherein A denotes an organosilicon group represented by the formula: ##STR1## (wherein R.sub.1-1 and R.sub.1-2 independently denote a hydrogen atom, a substituted or unsubstituted alkyl group, a substituted or unsubstituted aryl group, a substituted or unsubstituted alkoxy group, a substituted or unsubstituted silyl group, a substituted or unsubstituted germyl group, a halogen atom, or a group constituting a substituted or unsubstituted ring by a mutual combination of R.sub.1-1 and R.sub.
    Type: Grant
    Filed: October 27, 1993
    Date of Patent: April 15, 1997
    Assignee: Canon Kabushiki Kaisha
    Inventors: Wataru Ando, Takeshi Akasaka, Shigeru Nagase, Kaoru Kobayashi, Hajime Miyazaki
  • Patent number: 5610258
    Abstract: The crosslinkable nematic polyorganosiloxanes are cyclic polyorganosiloxanes containing at least three different mesogenic side groups per polyorganosiloxane, where at least two mesogenic side groups per polyorganosiloxane each contain at least three radicals selected from aromatic, heteroaromatic and cycloaliphatic radicals. They contain a methacrylic or acrylic group in at least one of the mesogenic side groups. The cyclic polyorganosiloxanes have a broad nematic phase and can be readily aligned.
    Type: Grant
    Filed: October 11, 1995
    Date of Patent: March 11, 1997
    Assignee: Consortium f ur elektrochemische Industrie GmbH
    Inventors: Hans-Peter Weitzel, Susanne Weber-Koegl, Sotirios Chatzinerantzis
  • Patent number: 5589562
    Abstract: A synthesis process for polysilsesquioxanes which produces a high yield, tractable copolymer of perfectly alternating silsesquioxane and bridging group segments is provided. A difunctional silsesquioxane monomer of the formula Si.sub.8 R.sub.8 O.sub.11 (OA).sub.2 or Si.sub.7 R.sub.7 O.sub.9 (OSiR.sup.4 R.sup.5 R.sup.6) (OA).sub.2 is reacted with a difunctional compound of the formula X-M-X which forms a bridging group for a time sufficient to condense the difunctional silsesquioxane monomers and bridging groups into a linear polymer containing alternating silsesquioxane and bridging group segments. The resulting linear copolymer is essentially free of impurities and has controllable properties through the proper selection of the monomeric starting materials.
    Type: Grant
    Filed: February 3, 1995
    Date of Patent: December 31, 1996
    Assignee: The University of Dayton
    Inventors: Joseph D. Lichtenhan, Ngo Quang Vu, Jeffrey W. Gilman, Frank J. Feher
  • Patent number: 5581004
    Abstract: The magnesium complexes of cyclic hydrocarbons and conjugated dienes, such as 1,2-dimethylenecycloalkanes and 1,3-butadienes, are readily prepared in high yields using highly reactive magnesium. Reactions of these (2-butene-1,4-diyl)magnesium reagents with electrophiles such as dibromoalkanes, alkylditosylates, alkylditriflates, bromoalkylnitriles, esters, or amides serve as a convenient method for synthesizing carbocyclic systems. Significantly, carbocycles prepared by this method contain functional groups such as the exocyclic double bond or a keto group in one of the rings which could be used for further elaboration of these molecules. Furthermore, fused bicyclic systems containing a substituted five-membered ring can be conveniently prepared at high temperatures by the reactions of (2-butene-1,4-diyl)magnesium complexes with carboxylic esters or acid halides whereas low temperatures lead to regioselective synthesis of .beta.,.gamma.-unsaturated ketones. Additionally, .gamma.-lactones, including spiro .
    Type: Grant
    Filed: October 17, 1994
    Date of Patent: December 3, 1996
    Assignee: Board of Regents of the University of Nebraska
    Inventor: Reuben D. Rieke