Silicon To Hydrogen Bond Formed Patents (Class 556/474)
  • Patent number: 9023479
    Abstract: Provided are a coating composition for low refractive layer including fluorine-containing compound of the following Chemical Formula 1, an anti-reflection film using the same, and a polarizer and an image display device including the same, wherein the fluorine-containing compound of the following Chemical Formula 1 has a low refractive index of 1.28 to 1.40, thereby making it possible to easily adjust a refractive index of the anti-reflection film and be usefully used as a coating material of the anti-reflection film having an excellent mechanical property such as durability, or the like.
    Type: Grant
    Filed: November 1, 2012
    Date of Patent: May 5, 2015
    Assignee: SK Innovation Co., Ltd.
    Inventors: Sung Ho Son, Yun Bong Kim, Won Seok Jang, Yong Gyun Cho
  • Publication number: 20150080596
    Abstract: A method of producing a hydrosilane compound in a microreactor comprises reducing a halosilane compound in the microreactor and in the presence of a reducing agent to produce the hydrosilane compound.
    Type: Application
    Filed: February 14, 2013
    Publication date: March 19, 2015
    Inventors: Binh Thanh Nguyen, Simon Parsley, Jacob Remacle, Levon Shahinian, Hanh Vo
  • Publication number: 20140212352
    Abstract: The invention relates to a process for producing a product gas mixture containing hydrogen-containing chlorosilanes within an integrated process by hydrogenating integrated process by-product silicon tetrachloride and organochlorosilane, more particularly methyltrichlorosilane, with hydrogen in a pressurized hydrogenation reactor comprising one or more reaction spaces each consisting of a reactor tube of gastight ceramic material, wherein the product gas mixture is worked up and at least a portion of at least one product of the product gas mixture is used as starting material for the hydrogenation or as starting material for some other process within the integrated process. The invention further relates to an integrated system useful for practising the integrated process.
    Type: Application
    Filed: January 27, 2012
    Publication date: July 31, 2014
    Applicant: EVONIK DEGUSSA GmbH
    Inventors: Yuecel Önal, Guido Stochniol, Ingo Pauli, Norbert Schladerbeck
  • Publication number: 20110311439
    Abstract: A method for producing hydrogen (H2) includes the steps consisting in: a) reacting a compound (C) including one or more groups Si—H with a fluoride ions source, thereby forming hydrogen and a by-product (C1); and b) recovering the obtained hydrogen.
    Type: Application
    Filed: December 16, 2009
    Publication date: December 22, 2011
    Applicant: UNIVERSITE DE LA MEDITERRANEE AIX-MARSEILLE II
    Inventor: Jean-Michel Brunel
  • Publication number: 20110158883
    Abstract: The invention relates to a method for the catalytic hydrogenation of halogenated silanes or halogenated germanes, according to which halogenated monosilanes, oligosilanes or polysilanes, or monogermanes, oligogermanes or polygermanes, are hydrogenated or partially hydrogenated with hydrogenated Lewis acid-base pairs, and the partially halogenated Lewis acid base pairs can be rehydrogenated, especially with further addition of H2 and the heterolysis thereof on the Lewis acid-base pairs, releasing hydrogen halide.
    Type: Application
    Filed: March 28, 2008
    Publication date: June 30, 2011
    Applicant: REV RENEWABLE ENERGY VENTURES INC.
    Inventors: Sven Holl, Sayed-Javad Mohsseni-Ala, Christian Bauch
  • Patent number: 7019145
    Abstract: The invention concerns an improved method for preparing catalysts for hydrosilylation reactions of compounds with ethylene or acetylene unsaturation (for example olefins or acetylene derivatives), in particular but not exclusively those involving polyorganosiloxanes (POS) bearing Si—H units and POS bearing Si-(ethylene or acetylene unsaturation) units. Said preparation corresponds to the following synthesis (I), wherein: A=B=carbon: T1, T2=cyclohexyl, t-butyl or methyl; T3, T4=H; DVTMS=divinyltetramethylsiloxane; t-BuOK=potassium tert-butylate; T.A=room temperature. The invention is characterised in that it consists in carrying out said synthesis in a single step by bringing together salt (III) above, Karstedt (IV) in the presence of a solvent (V) (THF) and a base (VI) (t-BuOK) at room temperature.
    Type: Grant
    Filed: June 4, 2002
    Date of Patent: March 28, 2006
    Assignee: Rhodia Chimie
    Inventors: Olivier Buisine, Istvan Marko, Sebastien Sterin
  • Patent number: 6482381
    Abstract: Halogen-substituted silicon compounds are hydrogenated by reaction with hydrogen in a chloroaluminate salt melt as a reaction medium containing a finely divided metal capable of forming interstitial hydrides which are suspended in the melt, the finely divided interstitial metal hydrides being formed in situ in the melt by reduction of a metal halide with an electropositive element as a halogen acceptor I selected from the group consisting of magnesium, calcium and aluminum.
    Type: Grant
    Filed: September 25, 2000
    Date of Patent: November 19, 2002
    Assignee: Degussa AG
    Inventors: Wolfgang Sundermeyer, Hans Liesenhoff
  • Patent number: 6462214
    Abstract: According to the present invention, a method of preparing a silacycloalkane, comprising the steps of (A) adding a substituted silacycloalkane having the formula: wherein X1 is —F, —Cl, —Br, or —OR1 and X2 is X1 or H, wherein R1 is C1-C8 hydrocarbyl, and n is 1, 2, or 3, to a suspension of lithium aluminum hydride in a glycol diether at a temperature not greater than 50° C. to form a mixture, wherein the glycol diether consists essentially of a linear arrangement of oxyalkylene units having formulae independently selected from —OCH2CH2—, —OCH2CH(CH3)—, and —OCH2CH(CH2CH3)—, and end-groups having the formulae —R2 and —OR2, wherein each R2 is independently selected from C1-C8 alkyl, phenyl, and C1-C8 alkyl-substituted phenyl, provided the glycol diether has a normal boiling point of at least 85° C. and a viscosity not greater than 3000 mm2/s at 25° C.
    Type: Grant
    Filed: March 5, 2002
    Date of Patent: October 8, 2002
    Assignee: Dow Corning Corporation
    Inventors: Binh Thanh Nguyen, John Patrick Cannady, Yasushi Sugiura
  • Patent number: 6420585
    Abstract: A method for the preparation of triorganooxysilanes containing one silicon-hydrogen bond is provided which comprises reacting at least one tetraorganooxysilane with at least one metal hydride.
    Type: Grant
    Filed: September 14, 2001
    Date of Patent: July 16, 2002
    Assignee: General Electric Company
    Inventor: Florian Johannes Schattenmann
  • Patent number: 6384257
    Abstract: The invention concerns the upgrading of a by-product of direct synthesis, namely MeSiCl3, by vapor phase catalytic hydrogenation of said by-product to obtain MeHSiCl2 with greater added value. The invention concerns a method for preparing MeHSiCl2 by catalytic hydrogenation of MeSiCl3 in the presence of a metal catalyst with high selectivity levels in MeHSiCl2 economically and without having recourse to drastic and industrially unsuitable conditions. The invention uses a catalyst comprising a bimetal ruthenium/tin catalytic agent. Said catalytic agent is obtained by reacting ruthenium chloride and tin chloride in an acid medium. In practice, the catalyst is formed by a silica powder support impregnated by the ruthenium/tin catalytic agent.
    Type: Grant
    Filed: September 26, 2001
    Date of Patent: May 7, 2002
    Assignee: Rhodia Chimie
    Inventors: Pascale Colin, Roland Jacquot, Philippe Morel
  • Patent number: 5965762
    Abstract: New chlorohydrosilane derivatives having the general formula (I) and preparation method thereof. The chlorohydrosilane derivatives (I) of the present invention which have both Si--Cl and Si--H bonds are prepared by partially reducing chlorosilane of the formula (II) which have at least two Si--Cl bonds with lithiumaluminum hydride. The chlorohydrosilane derivatives (I) of the present invention, which have both Si--H and Si--Cl bonds in a molecule can be advantageously used in preparing various compounds because a Si--H bond enables the hydrosilylation with unsaturated organic compounds, while a Si--Cl bond can participate in hydrolysis or in a reaction with a nucleophilic compound such as Grignard reatent: ##STR1## wherein R.sup.1 is straight, branched, or cyclic alkyl group having 1 to 30 carbon atoms, which can include an aromatic group or heterocyclic group, and R.sup.
    Type: Grant
    Filed: July 9, 1998
    Date of Patent: October 12, 1999
    Assignee: Korea Institute of Science and Technology
    Inventors: Il Nam Jung, Bok Ryul Yoo, Joon Soo Han, Weon-Cheol Lim
  • Patent number: 5866707
    Abstract: A process for preparing organosilicon compounds having Si-bonded hydrogen atoms comprises,in a first step,reacting silanes of the general formula R.sup.1 R.sub.a SiX.sub.3-a, where R. is a monovalent hydrocarbon radical free from aliphatic multiple bonds, R.sup.1 is a monovalent terminal unsaturated hydrocarbon radical, X is a halogen atom or a radical of the formula --OR.sup.2, and a is 0 or 1; with organosilicon compounds having at least two Si-bonded hydrogen atoms per molecule; in the presence of catalysts which promote the addition of Si-bonded hydrogen to an aliphatic multiple bond; and removing excess silanes by distillation, where the ratio employed of aliphatic double bond in the silane to Si-bonded hydrogen in the organosilicon compound is from 1.0 to 2.0; andin a second step,reacting the resultant compounds having hydrolyzable groups with silanes of the general formula H.sub.b R.sub.3-b SiZ or siloxanes of the general formula H.sub.b R.sub.3-b SiOSiR.sub.3-b H.sub.
    Type: Grant
    Filed: April 29, 1998
    Date of Patent: February 2, 1999
    Assignee: Wacker-Chemie GmbH
    Inventor: Christian Herzig
  • Patent number: 5856548
    Abstract: The invention relates to a process for preparing dimethylmonochlorosilane (CH.sub.3).sub.2 Si(H)Cl by partial hydrogenation of dimethyldichlorosilane (CH.sub.3).sub.2 SiCl.sub.2 in a reaction system comprising magnesium hydride and aluminum chloride and an inert liquid organic vehicle while milling continually.
    Type: Grant
    Filed: April 29, 1998
    Date of Patent: January 5, 1999
    Assignee: Th. Goldschmidt AG
    Inventors: Jurgen Drose, Wilfried Knott, Dirk Wolfgram
  • Patent number: 5646326
    Abstract: Alkylhydrogenchlorosilanes of formula IR.sub.(4-n-m) SiCl.sub.n H.sub.m (I),wherein m and n are each equal to 1 or 2 and m+n.ltoreq.3 and R is an alkyl group having from 1 to 5 carbon atoms, are prepared by reacting alkylchlorosilanes of formula IIR.sub.(4-p) SiCl.sub.p (II),wherein p is equal to 1, 2 or 3, with hydrogen.The alkylhydrogenchlorosilanes are employed as a starting material in hydrosilylation reactions.
    Type: Grant
    Filed: November 21, 1995
    Date of Patent: July 8, 1997
    Assignee: Huels Aktiengesellschaft
    Inventor: Joachim Schuler
  • Patent number: 5492736
    Abstract: The present invention is a process for forming a fluorine-containing silicon oxide film on a substrate by plasma-enhanced chemical vapor deposition using a fluorinated silicon source of the formula: ##STR1## wherein at least one of R.sup.1 -R.sup.6 is fluorine and the remaining R groups are independently H, F, non-fluorinated-, partially fluorinated- or perfluorinated-: alkyl, alkenyl, alkynyl, aryl or benzylic groups, or C.sub.x H.sub.2x when one or more of R.sup.1, R.sup.2 or R.sup.3 is connected to R.sup.4, R.sup.5 or R.sup.6 through a bridging group C.sub.y H.sub.2y ; where x is 1-6, and y is 0-6; where M is Si or C and n is 0-6 and R.sup.7 is independently H, F, C.sub.z H.sub.2z+1 where z is 1-6 or C.sub.r H.sub.s F.sub.t where r is 1-6, s is (2r+1-t); t is 1 to (2r+1) . The present invention is also the film formed by that process and several novel source materials used in the process.
    Type: Grant
    Filed: November 28, 1994
    Date of Patent: February 20, 1996
    Assignee: Air Products and Chemicals, Inc.
    Inventors: Ravi K. Laxman, Arthur K. Hochberg, David A. Roberts, Raymond N. Vrtis
  • Patent number: 5455367
    Abstract: A method for the synthesis of silanes or organosilicon hydrides by the reduction of the corresponding silicon halides or organosilicon halides with a magnesium hydride in a liquid reaction medium is carried out by utilizing the following distinguishing features:a) the use of non-pyrophoric, preferably autocatalytically produced, storage magnesium hydride as magnesium hydride,b) the use of conventional ethers as reaction medium, andc) the continuous removal of the magnesium halide formed being deposited on the surface of the magnesium hydride particles during the reaction by the action of mechanical energy or ultrasound so as to form a fresh surface.
    Type: Grant
    Filed: April 19, 1994
    Date of Patent: October 3, 1995
    Assignee: Th. Goldschmidt AG
    Inventors: Klaus-Dieter Klein, Wilfried Knott, Gotz Koerner
  • Patent number: 5416232
    Abstract: Catalysts composed of nitrogen-containing heterocyclic hydrocarbons, optionally fixed to a support material, for disproportionating aryl- and alkylhalodisilanes into the corresponding mono- and polysilanes, and a process of using these catalysts for disproportionating disilanes.
    Type: Grant
    Filed: February 7, 1994
    Date of Patent: May 16, 1995
    Assignee: Solvay Deutschland GmbH
    Inventors: Erica Brendler, Gerhard Roewer
  • Patent number: 5376715
    Abstract: The invention relates to silicon compounds, to mixtures thereof in aromatic polycarbonates and aromatic polyester carbonates and to their use as heat stabilizers in aromatic polycarbonates and aromatic polyester carbonates.
    Type: Grant
    Filed: January 18, 1994
    Date of Patent: December 27, 1994
    Assignees: Bayer Aktiengesellschaft, Miles Inc.
    Inventors: Gerhard Fennhoff, Jurgen Kirsch, Karsten-Josef Idel, Klaus Kircher, Charles Lundy
  • Patent number: 5329038
    Abstract: A process for the hydrogenation of chlorosilanes. The process comprises contacting a chlorosilane with aluminum and a hydrogen source selected from a group consisting of hydrogen gas and gaseous hydrogen chloride in the presence of a catalyst. The catalyst is selected from a group consisting of copper and copper compounds, tin and tin compounds, zinc and zinc compounds, and mixtures thereof.
    Type: Grant
    Filed: December 29, 1993
    Date of Patent: July 12, 1994
    Assignee: Dow Corning Corporation
    Inventors: Kirk M. Chadwick, Roland L. Halm, Brian R. Keyes
  • Patent number: 5028706
    Abstract: The present invention relates to a process for the preparation of compounds of the formula I ##STR1## in which Hal denotes F, Cl, Br or I; X denoted O, S or CH.sub.2 ; Y denotes CH or N; R.sup.1 denotes H or (C.sub.1 -C.sub.4 -alkyl; R.sup.2 denotes H, F, Cl or Br and R.sup.3 denotes H, F, Cl, Br, (C.sub.1 -C.sub.4)alkyl or (C.sub.1 -C.sub.4)alkoxy, which comprises reacting a compound of the formula II ##STR2## in which aryl stands for an unsubstituted or substituted phenyl, naphthyl or thienyl radical of the formulae (A), (B) or (C) ##STR3## in which R.sup.4, R.sup.5 and R.sup.6 independently of each other denote H, alkyl, alkoxy, alkylthio, dialkylamino, phenoxy, phenylthio or phenyl and m, n and o independently of each denote the values 0, 1 or 2, and X, Y, R.sup.1, R.sup.2 and R.sup.3 are as defined in formula I,with a halogen or a halogen compound of the formula IIIHal.sub.p --Z.sub.q (III)in which Z denotes F, Cl, Br, I, H, PHal.sub.4 or SO.sub.
    Type: Grant
    Filed: July 13, 1989
    Date of Patent: July 2, 1991
    Assignee: Hoechst Aktiengesellschaft
    Inventor: Hans H. Schubert
  • Patent number: 5015624
    Abstract: The present invention is a process for reducing the number of halogens on organohalosilanes and volatile organohalopolysilanes, while preventing unwanted reactions. The process takes advantage of the high susceptibility of the silicon-halogen bond to chemical reduction by an alkylaluminum hydride. This susceptibility allows the halogen to be quickly removed from the organohalosilane, forming reduced product, before less favorable reactions can occur. The reduced product is immediately removed from the reaction mixture by vacuum distillation, preventing further reactions. The process may be used to remove one or more, or all, of the halogens from organohalosilanes and volatile organohalopolysilanes.
    Type: Grant
    Filed: April 30, 1990
    Date of Patent: May 14, 1991
    Assignee: Dow Corning Corporation
    Inventor: William J. Schulz, Jr.
  • Patent number: 4925963
    Abstract: A process for the reduction of an organosilicon halide to an organosilicon hydride using an amine alane hence avoiding the problem of dismutation of the hydrocarbyl group as well as avoiding cleavage of the silicon-carbon bonds associated with other methods for reduction of organosilicon halides.
    Type: Grant
    Filed: October 12, 1989
    Date of Patent: May 15, 1990
    Assignee: Ethyl Corporation
    Inventor: Everett M. Marlett
  • Patent number: 4816541
    Abstract: A method is disclosed for the synthesis of SiH-containing organopolysiloxanes from the corresponding Si-halogen-containing organopolysiloxanes by the reaction with metal hydrides in a liquid reaction medium. The method has the following combiniation of characteristics:(a) the use of a metal hydride being LiH, NaH, KH, CaH.sub.2 or MgH.sub.2 ;(b) the use of ethers as reaction medium;(c) the continuous removal of the metal halide depositing on the surface of the metal hydride particles during the reaction by the action of mechanical energy or ultrasound with formation of a fresh surface.The reaction proceeds practically quantitatively and at low temperatures. It can be applied with particular advantage to industrially obtained mixtures of .alpha.,.omega.-dichloroorganopolysiloxanes.
    Type: Grant
    Filed: October 7, 1987
    Date of Patent: March 28, 1989
    Assignee: Th. Goldschmidt AG
    Inventors: Gotz Koerner, Christian Weitemeyer, Dietmar Wewers
  • Patent number: 4814155
    Abstract: The invention relates to the selective and stepwise reduction of polyhalosilanes by reacting at room temperature or below with alkyltin hydrides without the use of free radical intermediates. Alkyltin hydrides selectively and stepwise reduce the Si--Br, Si--Cl, or Si--I bonds while leaving intact any Si--F bonds. When two or more different halogens are present on the polyhalosilane, the halogen with the highest atomic weight is preferentially reduced.
    Type: Grant
    Filed: July 27, 1987
    Date of Patent: March 21, 1989
    Assignee: Dow Corning Corporation
    Inventors: Kenneth G. Sharp, John J. D'Errico
  • Patent number: 4772675
    Abstract: The method of this invention produces an elastomeric silicone sealant having an improved shelf life. The sealant comprises an alkoxysilethylene ended polydiorganosiloxane polymer, an alkoxytrialkoxysilane crosslinker, and a titanium catalyst.
    Type: Grant
    Filed: January 28, 1988
    Date of Patent: September 20, 1988
    Assignee: Dow Corning Corporation
    Inventors: Jerome M. Klosowski, Michael D. Meddaugh
  • Patent number: 4704444
    Abstract: A polyhydridosilane has a catenated silicon backbone of 9 to 4000 silicon atoms with an average number of hydrogen atoms per silicon atom in the range of 0.3 to 2.2, at least 0.1 gram of the polyhydridosilane being soluble at 20.degree. C. in 100 grams of tetrahydrofuran, toluene, or methylene chloride. The polyhydridosilane can be derivatized or it can be converted to a pyropolymer or a nitrogen-containing pyropolymer which is useful as an abrasive, ceramic, electrical, or electro-optical material.
    Type: Grant
    Filed: May 20, 1986
    Date of Patent: November 3, 1987
    Assignee: Minnesota Mining and Manufacturing Company
    Inventors: Katherine A. Brown-Wensley, Robert A. Sinclair
  • Patent number: 4665209
    Abstract: A process for the preparation of hydrogenosilanes or halogenosilanes corresponding to the general formula I:R--SiR'.sub.
    Type: Grant
    Filed: December 24, 1985
    Date of Patent: May 12, 1987
    Assignee: Centre National de la Recherche Scientifique
    Inventors: Robert J. Corriu, Genevieve E. Cerveau, Claude G. Chuit, Catherine Reye
  • Patent number: 4611035
    Abstract: A polyhydridosilane has a catenated silicon backbone of 9 to 4000 silicon atoms with an average number of hydrogen atoms per silicon atom in the range of 0.3 to 2.2, at least 0.1 gram of the polyhydridosilane being soluble at 20.degree. C. in 100 grams of tetrahydrofuran, toluene, or methylene chloride. The polyhydridosilane can be derivatized or it can be converted to a pyropolymer or a nitrogen-containing pyropolymer which is useful as an abrasive, ceramic, electrical, or electro-optical material.
    Type: Grant
    Filed: May 1, 1985
    Date of Patent: September 9, 1986
    Assignee: Minnesota Mining and Manufacturing Company
    Inventors: Katherine A. Brown-Wensley, Robert A. Sinclair
  • Patent number: 4600484
    Abstract: A process for the addition of compounds containing silicon-bonded hydrogen to compounds containing aliphatic unsaturation. The process is activated by actinic radiation and is conducted in the presence of a platinum complex having one cyclopentadienyl group that is eta-bonded to the platinum atom and three aliphatic groups that are sigma-bonded to the platinum atom.
    Type: Grant
    Filed: October 25, 1984
    Date of Patent: July 15, 1986
    Assignee: Minnesota Mining and Manufacturing Company
    Inventor: Timothy J. Drahnak
  • Patent number: 4542005
    Abstract: In preparing of silicon hydrides with use of a mixture of an alkyl aluminum hydride and a trialkyl aluminum as a reducing agent for a silicon compound, an aluminum halide compound is added to said mixture in an amount sufficient for converting at least 90 mol % of the trialkyl aluminum to a dialkyl aluminum monohalide prior to the reduction reaction. Silicon hydrides are obtained with a high yield and quality.
    Type: Grant
    Filed: March 8, 1983
    Date of Patent: September 17, 1985
    Assignee: Mitsui Toatsu Chemicals, Inc.
    Inventors: Iwao Tetsuya, Hirai Reiji, Ashida Yoshinori
  • Patent number: 4537942
    Abstract: A polyhydridosilane has a catenated silicon backbone of 9 to 4000 silicon atoms with an average number of hydrogen atoms per silicon atoms in the range of 0.3 to 2.2, at least 0.1 gram of the polyhydridosilane being soluble at 20.degree. C. in 100 grams of tetrahydrofuran, toluene, or methylene chloride. The polyhydridosilane can be derivatized or it can be converted to a pyropolymer or a nitrogen-containing pyropolymer which is useful as an abrasive, ceramic, electrical, or electro-optical material.
    Type: Grant
    Filed: April 6, 1984
    Date of Patent: August 27, 1985
    Assignee: Minnesota Mining and Manufacturing Company
    Inventors: Katherine A. Brown-Wensley, Robert A. Sinclair
  • Patent number: RE46657
    Abstract: A method of making a trihalosilane comprising contacting an organotrihalosilane according to the formula RS1X3 (I), wherein R is C1-C10 hydrocarbyl and each X independently is halo, with hydrogen, wherein the mole ratio of the organotrihalosilane to hydrogen is from 0.009:1 to 1:2300, in the presence of a catalyst comprising a metal selected from (i) Re, (ii) a mixture comprising Re and at least one element selected from Pd, Ru, Mn, Cu, and Rh, (iii) a mixture comprising Ir and at least one element selected from Pd and Rh, (iv) Mn, (v) a mixture comprising Mn and Rh, (vi) Ag, (vii) Mg, and (viii) Rh at from 300 to 800° C. to form a trihalosilane.
    Type: Grant
    Filed: May 13, 2015
    Date of Patent: January 2, 2018
    Assignee: Dow Corning Corporation
    Inventors: Stephanie Berger, Dimitris Katsoulis, Robert Thomas Larsen, Matthew J. McLaughlin, Unnikrishnan R. Pillai, Jonathan David Wineland