Halogen Bonded Directly To The Silicon Patents (Class 556/484)
  • Patent number: 10266614
    Abstract: Disclosed are a modified conjugated diene-based polymer represented by Chemical Formula 2a or 2b defined herein and a method of preparing the same.
    Type: Grant
    Filed: October 14, 2015
    Date of Patent: April 23, 2019
    Assignee: LG Chem, Ltd.
    Inventors: Hae-Sung Sohn, No-Ma Kim, He-Seung Lee
  • Patent number: 9023479
    Abstract: Provided are a coating composition for low refractive layer including fluorine-containing compound of the following Chemical Formula 1, an anti-reflection film using the same, and a polarizer and an image display device including the same, wherein the fluorine-containing compound of the following Chemical Formula 1 has a low refractive index of 1.28 to 1.40, thereby making it possible to easily adjust a refractive index of the anti-reflection film and be usefully used as a coating material of the anti-reflection film having an excellent mechanical property such as durability, or the like.
    Type: Grant
    Filed: November 1, 2012
    Date of Patent: May 5, 2015
    Assignee: SK Innovation Co., Ltd.
    Inventors: Sung Ho Son, Yun Bong Kim, Won Seok Jang, Yong Gyun Cho
  • Patent number: 8992737
    Abstract: A trihalosilane refining device and a trihalosilane refining method are provided. The trihalosilane refining device can be useful in obtaining high-purity trihalosilane from a feed containing a trihalosilane while consuming a small amount of energy.
    Type: Grant
    Filed: November 25, 2013
    Date of Patent: March 31, 2015
    Assignee: LG Chem, Ltd.
    Inventors: Sung Kyu Lee, Joon Ho Shin, Jong Ku Lee, Sung Kyun Kim
  • Patent number: 8974642
    Abstract: A trihalosilane refining device and a trihalosilane refining method are provided. The trihalosilane refining device can be useful in obtaining high-purity trihalosilane from a feed containing a trihalosilane while consuming a small amount of energy.
    Type: Grant
    Filed: November 25, 2013
    Date of Patent: March 10, 2015
    Assignee: LG Chem, Ltd.
    Inventors: Sung Kyu Lee, Joon Ho Shin, Jong Ku Lee, Sung Kyun Kim
  • Patent number: 8968521
    Abstract: A trihalosilane refining device and a trihalosilane refining method are provided. The trihalosilane refining device can be useful in obtaining high-purity trihalosilane from a feed containing a trihalosilane while consuming a small amount of energy.
    Type: Grant
    Filed: November 25, 2013
    Date of Patent: March 3, 2015
    Assignee: LG Chem, Ltd.
    Inventors: Sung Kyu Lee, Joon Ho Shin, Jong Ku Lee, Sung Kyun Kim
  • Publication number: 20100317885
    Abstract: This invention involves a process for the preparation of haloalkylalkoxysilanes and haloalkylhalosilancs. The process comprises reacting an alkoxyhydridosilane or a halohydridosilanc silane with an alkenylhalide compound in the presence of a catalytic amount of an iridium containing catalyst. When a halohydridosilane is the silane reactant. the resulting haloalkylhalosilane may be alkoxylated by reaction with a C1-C6, alcohol, In another aspect of the invention, the reacting is conducted under a reduced oxygen atmosphere to improve the catalyst activity and the yield of the resulting haloalkylhalosilane or haloalkylalkox vsi lane.
    Type: Application
    Filed: January 13, 2009
    Publication date: December 16, 2010
    Inventors: Paul Charles Dinh, Keiji Wakita
  • Patent number: 7396951
    Abstract: A process for the production of trialkoxyhalosilanes which comprises reacting a tetrahalosilane [37] with a tetra-alkoxysilane [38] in the presence of an alcohol whose alkoxy group is the same as those of the tetraalkoxysilane to thereby obtain a trialkoxyhalosilane [39], characterized in that the alcohol is used in an amount of 5 to 50% by mole based on the total amount of Si of the tetrahalosilane and the tetraalkoxysilane: SiX4 [37] (wherein X is halogeno) Si(OR1)4 [38] (wherein R1 is a hydrocarbon group having 1 to 6 carbon atoms) XSi(OR1)3 [39] (wherein X and R1 are each as defined above).
    Type: Grant
    Filed: May 21, 2007
    Date of Patent: July 8, 2008
    Assignee: Ube Industries, Ltd.
    Inventors: Motozo Yoshikiyo, Yasuhiro Tanaka, Toshikazu Machida, Hiroshi Sato, Nobuyuki Kuroda, Mitsumasa Tsugawa, Sanae Hatakenaka, Mikio Fujimoto
  • Patent number: 7396950
    Abstract: A process for the production of trialkoxyhalosilanes which comprises reacting a tetrahalosilane [37] with a tetra-alkoxysilane [38] in the presence of an alcohol whose alkoxy group is the same as those of the tetraalkoxysilane to thereby obtain a trialkoxyhalosilane [39], characterized in that the alcohol is used in an amount of 5 to 50% by mole based on the total amount of Si of the tetrahalosilane and the tetraalkoxysilane: SiX4 [37] (wherein X is halogeno) Si(OR1)4 [38] (wherein R1 is a hydrocarbon group having 1 to 6 carbon atoms) XSi(OR1)3 [39] (wherein X and R1 are each as defined above).
    Type: Grant
    Filed: May 21, 2007
    Date of Patent: July 8, 2008
    Assignee: Ube Industries, Ltd.
    Inventors: Motozo Yoshikiyo, Yasuhiro Tanaka, Toshikazu Machida, Hiroshi Sato, Nobuyuki Kuroda, Mitsumasa Tsugawa, Sanae Hatakenaka, Mikio Fujimoto
  • Patent number: 7368590
    Abstract: Aluminum chloride is removed effectively from compound mixtures containing organochlorosilanes such as are produced in the direct synthesis, by adding a diluent containing organochlorosilanes and optionally chloromethane to a solids content <15% and a concentration of compounds having a boiling point >71° C. of less than 25%, and evaporating this diluted mixture into a volatile product stream and an AlCl3-containing solid.
    Type: Grant
    Filed: March 17, 2005
    Date of Patent: May 6, 2008
    Assignee: Wacker Chemie AG
    Inventors: Wilfried Kalchauer, Herbert Straussberger
  • Publication number: 20070191622
    Abstract: The present invention relates to (2-cyclopentenyl)chlorosilane derivatives and the preparation method thereof. In particular, it relates to a very economical process which reacts cyclopentadiene, which is formed by a cracking of industrially produced low-priced dicyclopentadiene, with a silane compound containing silicon-hydrogen bonds at elevated temperature in a hydrocarbon compound with a boiling point of a predetermined range, thus also enabling to prevent problematic production of dicyclopentadiene polymer by using the hydrocarbon compound. Further, in the presence of a group 10 metal compound catalyst, the process herein is capable of lowering the reaction temperature and increasing the yield in the reaction of sterically hindered alkyl-dichlorosilane. The (2-cyclopentenyl)chlorosilane may be useful in preparing an organic silicon compound containing an unsaturated group or a functional silicone polymer using the same, or in modifying the surface or manufacturing a thin layer.
    Type: Application
    Filed: December 6, 2006
    Publication date: August 16, 2007
    Inventors: Bok Ryul Yoo, Joon Soo Han, Weon Cheol Lim
  • Patent number: 7030260
    Abstract: The preparation of halosilanes having mixed-halogen substituents is described comprising providing an aryl-halo-silane having one more first halogens and one or more aryl groups, and substituting one or more of said aryl groups of said aryl-halo-silane with a second halogen having an atomic number greater than that of said first halogen.
    Type: Grant
    Filed: February 27, 2003
    Date of Patent: April 18, 2006
    Assignee: Honeywell International Inc.
    Inventors: Edward Asirvatham, Jeff Czarnecki, Matthew H. Luly, Lawrence F. Mullan, Alagappan Thenappan
  • Patent number: 6737118
    Abstract: Silica-based low dielectric constant materials having three-dimensional network structures containing siloxane backbones which comprise SiO4 tetrahedron structural units, as well as their production and use. The materials can be applied as interlayer dielectrics for semiconductor elements and the like.
    Type: Grant
    Filed: April 12, 2002
    Date of Patent: May 18, 2004
    Assignee: Nippon Steel Corporation
    Inventors: Noriko Yamada, Toru Takahashi, Tadashi Sakon, Yoichi Matsuzaki, Atsushi Nogami, Shingo Katayama, Ikuko Shiina
  • Publication number: 20040082803
    Abstract: The present invention provides organosilicon compounds containing two trichlorosilyl groups and their preparation methods. Organosilicon compounds of formula II are prepared by reacting linear chain or cyclic olefins of formula I with trichlorosilane in the presence of quaternary organophosphonium salt as a catalyst.
    Type: Application
    Filed: March 28, 2003
    Publication date: April 29, 2004
    Applicant: KOREA INSTITUTE OF SCIENCE AND TECHNOLOGY
    Inventors: Il Nam Jung, Bok Ryul Yoo, Joon Soo Han, Seung-Hyun Kang
  • Publication number: 20040019231
    Abstract: The preparation of halosilanes having mixed-halogen substituents is described comprising providing an aryl-halo-silane having one more first halogens and one or more aryl groups, and substituting one or more of said aryl groups of said aryl-halo-silane with a second halogen having an atomic number greater than that of said first halogen.
    Type: Application
    Filed: February 27, 2003
    Publication date: January 29, 2004
    Inventors: Edward Asirvatham, Jeff Czarnecki, Matthew H. Luly, Lawrence F. Mullan, Alagappan Thenappan
  • Publication number: 20030104145
    Abstract: The present invention provides a new chemical adsorbent which can form an extremely thin and transparent film in nanometer order which is fixed uniformly and firmly on a substrate, and give an alignment characteristic of high thermal stability to the thin film; as well as a liquid crystal alignment layer and a liquid crystal display device having a desirable alignment characteristic, a superior alignment control force over a liquid crystal molecule, and a superior thermal stability by using the above-mentioned chemical adsorbent. This purpose can be actualized by developing a new compound which is transparent and stable in a range of a visible ray (a wavelength from 400 nm to 700 nm), and has a photosensitivity in a range of an ultraviolet ray and a far-ultraviolet ray (a wavelength from 200 nm to 400 nm), and can form a thin film in a monolayer through a chemisorption on a substrate.
    Type: Application
    Filed: October 21, 2002
    Publication date: June 5, 2003
    Applicant: Matsushita Electric Industrial Co., Ltd.
    Inventors: Kazufumi Ogawa, Tadashi Ohtake, Takaiki Nomura
  • Publication number: 20030055277
    Abstract: In an industrial process for preparing organohalosilanes by reacting metallic silicon particles with an organohalide in the presence of a copper catalyst, a contact mass composed of the metallic silicon and the catalyst further contains an effective amount of a phosphonium compound having on the molecule at least one group of the formula: [R2R3R4P—]+Y− wherein R2, R3 and R4 each are a monovalent hydrocarbon group and Y is a halogen atom or acid group. The invention drastically increases the silane formation rate and the utilization of silicon without lowering the selectivity of useful silane.
    Type: Application
    Filed: August 29, 2002
    Publication date: March 20, 2003
    Inventors: Susumu Ueno, Toshio Shinohara, Mikio Aramata, Yoichi Tanifuji, Tetsuya Inukai, Hajime Ishizaka
  • Patent number: 6524715
    Abstract: A thin film forming chemical absorption material including at least a functional group of the formula CF3—CF2—CH2—O—(benzene)—CH=CH—C(O)—(benzene)— and a —SiX group (X represents halogen) as an end group bonded by siloxane bond. The chemical absorption material can form a monomolecular thin-film having photosensitive groups that are transparent and stable in a visible light region and cause photochemical reaction in an ultraviolet region. A liquid crystal alignment film includes an aggregation of adsorption molecules chemically absorbed directly on a surface with electrodes or chemically adsorbed indirectly thereon through another material layer having a characteristic group the formula above and a —O—Si bond group at a molecular end group.
    Type: Grant
    Filed: March 1, 2001
    Date of Patent: February 25, 2003
    Assignee: Matsushita Electric Industrial Co., Ltd.
    Inventors: Tadashi Ootake, Kazufumi Ogawa, Takaiki Nomura, Takako Takebe
  • Patent number: 6495221
    Abstract: The present invention provides a new chemical adsorbent which can form an extremely thin and transparent film in nanometer order which is fixed uniformly and firmly on a substrate, and give an alignment characteristic of high thermal stability to the thin film; as well as a liquid crystal alignment layer and a liquid crystal display device having a desirable alignment characteristic, a superior alignment control force over a liquid crystal molecule, and a superior thermal stability by using the above-mentioned chemical adsorbent. This purpose can be actualized by developing a new compound which is transparent and stable in a range of a visible ray (a wavelength from 400 nm to 700 nm), and has a photosensitivity in a range of an ultraviolet ray and a far-ultraviolet ray (a wavelength from 200 nm to 400 nm), and can form a thin film in a monolayer through a chemisorption on a substrate.
    Type: Grant
    Filed: May 18, 1999
    Date of Patent: December 17, 2002
    Assignee: Matsushita Electric Industrial Co., Ltd.
    Inventors: Kazufumi Ogawa, Tadashi Ohtake, Takaiki Nomura
  • Patent number: 6399733
    Abstract: A process for preparing a highly pure silicone ladder polymer of the general formula (1): wherein R1 and R2 represent F, H, a lower alkyl group, an alkenyl group, an aryl group, a lower fluorinated alkyl group, a fluorinated alkenyl group or a fluorinated aryl group; R3, R4, R5 and R6 each represents H, a lower alkyl group or a lower fluorinated alkyl group; and n represents an integer of 5 to 10000, which comprises: (a) a step of obtaining a prepolymer in which at least one organosilane compound is dissolved in an organic solvent and hydrolyzed with ultrapure water; (b) a step of washing the obtained prepolymer with ultrapure water; and, (c) a step of dissolving the washed prepolymer in an organic solvent and heating without a catalyst.
    Type: Grant
    Filed: October 11, 2000
    Date of Patent: June 4, 2002
    Assignee: Mitsubishi Denki Kabushiki Kaisha
    Inventors: Shigeyuki Yamamoto, Naoki Yasuda, Motohisa Taguchi
  • Publication number: 20010051698
    Abstract: This invention relates to metallocene catalyst compositions which are highly active for the polymerization of olefins, particularly prochiral &agr;-olefins. The catalyst compositions contain at least one metallocene, and least one activator and a support that has been fluorided using a fluoride containing compound.
    Type: Application
    Filed: June 20, 2001
    Publication date: December 13, 2001
    Inventor: Anthony N. Speca
  • Patent number: 6153578
    Abstract: Fragrant silanes having the formula:(R.sup.1 O).sub.a (R.sup.2 O).sub.b (R.sup.3 O).sub.c (R.sup.4).sub.d (R.sup.5).sub.e SiR.sup.6where R.sup.1, R.sup.2 and R.sup.3 are derived from the group of alcohols consisting of R.sup.1 OH, R.sup.2 OH and R.sup.3 OH wherein R.sup.1 OH, R.sup.2 OH and R.sup.3 OH are fragrant alcohols or alternatively R.sup.1, R.sup.2 and R.sup.3 are derived from the group of fragrant esters, ketones, or aldehydes having the structure:R.sup.7 --CH.sub.2 (C.dbd.O)--R.sup.8wherein the fragrant ester, ketone or aldehyde is capable of exhibiting the enol form of the carbonyl moiety under reaction conditions, with R.sup.4 and R.sup.5 selected from the group consisting of monovalent hydrocarbon radical having from one to forty carbon atoms and monovalent alkoxy radicals having from one to forty carbon atoms, R.sup.
    Type: Grant
    Filed: August 30, 1999
    Date of Patent: November 28, 2000
    Assignee: General Electric Company
    Inventor: Robert J. Perry
  • Patent number: 5545255
    Abstract: An ultra thin, water and oil repelling and durable overcoat is easily formed on a substrate surface via covalent bonding by applying a finishing agent of the invention, comprising a chemically adsorptive compound with a chlorosilyl group and a nonaqueous viscous liquid or solid medium, on the substrate surface. A finishing agent, comprising a chemically adsorptive compound with a chlorosilyl group and a nonaqueous viscous liquid or solid medium, is applied on a substrate surface comprising hydrophilic groups. The substrate surface is then reacted with the chemically adsorptive compound at room temperature, and the agent containing unreacted chemically adsorptive compound is removed. The generation of hydrochloric acid gas can be prevented by adding tertiary amine or amide in the molar amount of one to three times more than the chemically adsorptive compound contained in the finishing agent.
    Type: Grant
    Filed: April 21, 1995
    Date of Patent: August 13, 1996
    Assignee: Matsushita Electric Industrial Co., Ltd.
    Inventor: Kazufumi Ogawa
  • Patent number: 5514827
    Abstract: This invention includes di- and tri(alkoxysilylalkyl)- or haloalkoxysilylalkylcyclic pentanes, which may have substituents thereon, including vinyl groups, and their use as waterproofing agents, as crosslinking agents in room temperature vulcanizing silicone caulks, in coating compositions and as surface treatments. The cyclic hydrocarbons are pentane (C.sub.s). The silane groups are attached to the ring through an alkyl group, which may have substituents thereon. Multiple silane groups may be attached to the ring. The silanes may have the standard substituents thereon, including alkoxy and halogens.The specific silanes contemplated herein have the following formula:R.sub.a X.sub.3-a Si(CR'.sub.2).sub.n !.sub.b cycloC.sub.5 R".sub.
    Type: Grant
    Filed: January 25, 1995
    Date of Patent: May 7, 1996
    Assignee: OSi Specialties, Inc.
    Inventor: Herbert E. Petty
  • Patent number: 5087716
    Abstract: Difunctional halo silicon amide compounds are prepared by cleaving the nitrogen-silicon bond in a nitrogen-silicon heterocycle with a reactive halide. The reaction is straight forward with no intermediates or byproducts. The halo functionality is capable of capping any SiOH group. When the other functionality is an acrylamide, the capped entity may be polymerized or crosslinked by free radical initiators of the acrylamide functionality thereby producing useful products such as paper release coatings and photoresists.
    Type: Grant
    Filed: December 24, 1990
    Date of Patent: February 11, 1992
    Assignee: Dow Corning Corporation
    Inventors: Antony P. Wright, Padmakumari J. Varaprath
  • Patent number: 5082958
    Abstract: Difunctional halo silicon amide compounds are prepared by cleaving the nitrogen-silicon bond in a nitrogen-silicon heterocycle with a reactive halide. The reaction is straight forward with no intermediates or byproducts. The halo functionality is capable of capping any SiOH group. When the other functionality is an acrylamide, the capped entity may be polymerized or crosslinked by free radical initiators of the acrylamide functionality thereby producing useful products such as paper release coatings and photoresists.
    Type: Grant
    Filed: January 22, 1990
    Date of Patent: January 21, 1992
    Assignee: Dow Corning Corporation
    Inventors: Antony P. Wright, Padmakumari J. Varaprath
  • Patent number: 5082962
    Abstract: Novel silanes having sterically hindered aminohydrocarbyl groups of the formula X.sub.3 SiRCR'.sub.2 NR".sub.2 and having utility as coupling agents and a process for their preparation are described.
    Type: Grant
    Filed: February 6, 1991
    Date of Patent: January 21, 1992
    Assignee: Union Carbide Chemicals and Plastics Technology Corporation
    Inventor: Curtis L. Schilling, Jr.
  • Patent number: 5017717
    Abstract: Difunctional halo silicon amide compounds are prepared by cleaving the nitrogen-silicon bond in a nitrogen-silicon heterocycle with a reactive halide. The reaction is straight forward with no intermediates or byproducts. The halo functionality is capable of capping any SiOH group. When the other functionality is an acrylamide, the capped entity may be polymerized or crosslinked by free radical initiators of the acrylamide functionality thereby producing useful products such as paper release coatings and photoresists.
    Type: Grant
    Filed: October 30, 1990
    Date of Patent: May 21, 1991
    Assignee: Dow Corning Corporation
    Inventors: Antony P. Wright, Padmakumari J. Varaprath
  • Patent number: 4921976
    Abstract: A silicon compound represented by formula (I): ##STR1## wherein either one of R.sup.1 and R.sup.2 represents a vinyl group with the other representing a hydrogen atom; either one of R.sup.3 and R.sup.4 represents a vinyl group with the other representing a hydrogen atom; and R.sup.5, R.sup.6, and R.sup.7, which may be the same or different, each represents a substituted or unsubstituted monovalent hydrocarbon group, an alkoxy group or a halogen atom. The compound exhibits improved compatibility with polymerizable monomers or organic polymers and is useful as a crosslinking agent or modifier.
    Type: Grant
    Filed: November 16, 1988
    Date of Patent: May 1, 1990
    Assignee: Toshiba Silicone Co., Ltd.
    Inventor: Keiji Kabeta
  • Patent number: 4783495
    Abstract: ((Hydroxyphenyl)silane derivatives of the formula ##STR1## are effective in stabilizing organic materials against oxidative, thermal and actinic degradation, said derivatives being particularly effective as process stabilizers in organic materials containing phenolic antioxidants.
    Type: Grant
    Filed: November 20, 1987
    Date of Patent: November 8, 1988
    Assignee: Ciba-Geigy Corporation
    Inventors: Stephen D. Pastor, Edward T. Hessell
  • Patent number: 4748262
    Abstract: The invention provides organosilane compounds of a novel class having one or two (phenyl dimethyl carbinyl) groups bonded to the silicon atom as represented by the general formula (PhMe.sub.2 C).sub.p R.sub.q X.sub.r Si, in which Ph is a phenyl group, Me is a methyl group, R is a monovalent hydrocarbon group selected from the class consisting of alkyl, alkenyl and aryl groups, X is a halogen atom or an alkoxy group, p is 1 or 2, q is zero, 1 or 2 and r is zero, 1, 2 or 3 with the proviso that p+q+r=4. The compound can be prepared by the reaction of a Grignard reagent PhMe.sub.2 C. MgY, in which Y is a halogen atom, with a silane compound represented by the general formula R.sub.q SiX.sub.4-q in an organic solvent.
    Type: Grant
    Filed: September 1, 1987
    Date of Patent: May 31, 1988
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Toshinobu Ishihara, Minoru Takamizawa, Mikio Endo, Toru Kubota
  • Patent number: 4692537
    Abstract: There are prepared silafluoroolefins and silafluoroolefin ethers and polymers thereof by reacting carbon with silicon tetrafluoroide and a source of hydrogen followed by polymerization. The polymers are useful for architectural purposes and as release coatings.
    Type: Grant
    Filed: December 9, 1985
    Date of Patent: September 8, 1987
    Inventor: Roy E. McAlister
  • Patent number: 4677216
    Abstract: A novel 2-substituted-1,3-butadiene compound which may be used as a coupling agent is disclosed, i.e. a 2-substituted-1,3-butadiene compound of the general formula (I) ##STR1## in which R.sup.1, R.sup.2 and R.sup.3 independently represent a halogen, a lower alkyl group, or a lower alkoxy group with the exception of those compounds wherein R.sup.1, R.sup.2 and R.sup.3 are all lower alkyl groups.
    Type: Grant
    Filed: February 22, 1985
    Date of Patent: June 30, 1987
    Assignee: Nissan Chemical Industries, Ltd.
    Inventor: Fumie Sato
  • Patent number: 4469881
    Abstract: [2-(p-t-Butylphenyl)ethyl]silanes are provided having the general formula:Si(B).sub.x (R).sub.y (A).sub.zwherein B is a (p-t-butylphenyl)ethyl moiety, R is an alkyl or aryl moiety and A is a hydrolyzeable moiety; x equals 1 or 2, y equals 0, 1 or 2 and z equals 1, 2 or 3 such that x plus y plus z equals 4. The bulky substituted silanes are produced by the hydrosilylation of p-t-butylstyrene.[2-(p-t-Butylphenyl)ethyl] substituted disiloxanes are also provided, having the general formula:(B).sub.x (R).sub.y (A).sub.z Si--O--Si(A).sub.z (R).sub.y (B).sub.xwherein B, R, A, x, y and z are as defined above except that z equals 0,1 or 2 and x plus y plus z equals 3. The bulky substituted disiloxanes are produced by the hydrolysis of above-described bulky substituted silanes.
    Type: Grant
    Filed: September 27, 1982
    Date of Patent: September 4, 1984
    Assignee: Petrarch Systems Inc.
    Inventor: Barry C. Arkles
  • Patent number: 4395460
    Abstract: What is disclosed is a process for preparing polysilazane polymers by contacting and reacting chlorine-containing disilanes with ammonia. The polysilazane polymers are useful as chemical intermediates to produce silicon-containing chemical compounds. They are also useful in the formation of silicon carbide-containing ceramic materials.
    Type: Grant
    Filed: September 21, 1981
    Date of Patent: July 26, 1983
    Assignee: Dow Corning Corporation
    Inventor: John H. Gaul
  • Patent number: 4310640
    Abstract: A composition comprising (a) an organic compound having at least one hydrolyzable silyl group and (b) an organic amine and/or an alkali metal hydroxide. The composition is curable upon exposure to moisture, and has superior properties, such as hardness, toughness and stain resistance, when used for example as a coating. The composition can be utilized as a coating material.
    Type: Grant
    Filed: May 16, 1980
    Date of Patent: January 12, 1982
    Assignee: Kanegafuchi Kogaku Kogyo Kabushiki Kaisha
    Inventors: Yasushi Kato, Hisao Furukawa, Shoichi Matsumura, Saori Nakatsuka
  • Patent number: 4220556
    Abstract: Novel heterogeneous silylhydrocarbyl phosphine transition metal complex catalysts and intermediates therefor are prepared by (a) the selective monoaddition of silane having chlorine, alkoxy or acyloxy groups to an .alpha., .omega.-diene, (b) followed by the addition of a phosphine to the resulting .omega.-alkenyl silanes to form the corresponding silylalkyl phosphines, (c) which are then covalently anchored as such or in the form of their transition metal complexes via condensation of their reactive silane substituents with hydroxy groups of silica and metal oxides, (d) optionally followed by complexing the free phosphine groups of anchored silylalkyl phosphines with transition metal compounds.
    Type: Grant
    Filed: January 19, 1979
    Date of Patent: September 2, 1980
    Assignee: Exxon Research & Engineering Co.
    Inventors: Alexis A. Oswald, Lawrence L. Murrell