Halogen Bonded Directly To Acyclic Carbon Patents (Class 556/488)
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Patent number: 8993788Abstract: A compound of formula (I), wherein R1 is hydrogen or a hydroxyl protecting group; and R2 and R3 are same or different and are independently selected from halogen or —O—SO2—X; wherein X is —C1-C4 alkyl; C1-C4 alkyl substituted with one or more halogen; or substituted or unsubstituted phenyl wherein said phenyl substituent is selected from halogen, nitro and C1-C4 alkyl; provided that when R3 is bromine, X is not p-toluoyl; and a process for the preparation thereof.Type: GrantFiled: November 1, 2011Date of Patent: March 31, 2015Assignee: UPL LimitedInventors: Jaidev Rajnikant Shroff, Vikram Rajnikant Shroff, Birja Shanker
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Publication number: 20150065740Abstract: The present invention is directed to a process for the synthesis of organohalosilane monomers, comprising the steps of (1) forming a slurry of cyclone fines, ultra fines and/or spent contact mass in a thermally stable solvent and reacting the agitated slurry with an organohalide of the formula R1X in the presence of an additive for a time and at a temperature sufficient to produce organohalosilane monomers having the formulae R1SiHX2, R12SiHX, R13SiX, R1SiX3, and R12SiX2; wherein R1 is a saturated or unsaturated aromatic group, a saturated or unsaturated aliphatic group, alkaryl group, or cycloaliphatic hydrocarbyl group, and X is a halogen; and (2) recovering said organohalosilane monomers.Type: ApplicationFiled: August 28, 2014Publication date: March 5, 2015Inventors: Kenrick Martin Lewis, Yanjun Zhu, Abellard T. Mereigh, John Razzano, John David Neely
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Patent number: 8927754Abstract: Disclosed are silazane compounds having two fluoroalkyl groups, represented by the following general formula (1): wherein Rf and Rf? are each a fluoroalkyl group, R1 is a hydrogen atoms or an aliphatic monovalent hydrocarbon group, R2 and R3 are each an aliphatic monovalent hydrocarbon group, R4 is a hydrogen atom or an aliphatic monovalent hydrocarbon group, a and b are each 0 or 1, m, n and p are each an integer of 0 to 6, q is an integer of 1 to 6, and r is 1 or 2. By treating an inorganic material with the silazane compound having two fluoroalkyl groups, high water and oil repellency and high sliding properties can be imparted to the inorganic material in good balance.Type: GrantFiled: April 12, 2012Date of Patent: January 6, 2015Assignee: Shin-Etsu Chemical Co., Ltd.Inventors: Takayuki Honma, Ayumu Kiyomori, Tohru Kubota, Daijitsu Harada, Hiroyuki Yamazaki, Masaki Takeuchi
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Publication number: 20140200311Abstract: A (meth)allylsilane compound that a functional group of a (meth)allylsilyl group or a halogenosilyl group bonded to the (meth)allylsilyl group via a spacer group is bonded directly or through a divergent spacer group to a dehydrogenated residue of an amino group of an amino group-containing compound; a carbaminic acid ester group or an amide group derived from a dehydrogenated residue of the amino group; an aromatic compound; a polymerizable unsaturated groups; perfluoro group; a dehydrogenated residue of saccharide or a carbohydrate polyol (excluding when the divergent spacer group is an alkylene group, or an alkylene group and an arylene group); a dehydrogenated residue of an amino acid; a halogenosilyl group; or a substituted silyl group in which a halogen of the halogenosilyl group is substituted.Type: ApplicationFiled: June 28, 2012Publication date: July 17, 2014Applicant: KYOEISHA CHEMICAL CO., LTD.Inventors: Toyoshi Shimada, Yoshinori Takamatsu
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Publication number: 20140012027Abstract: A method for producing a fluorine-containing substituted compound, the method including: introducing an organofluorine compound and an organolithium compound into a microreactor provided with a flow path capable of mixing a plurality of liquids, to thereby obtain a reaction product; and introducing, into the microreactor, the reaction product and an electrophile exhibiting electrophilic effect on the reaction product, to thereby obtain a fluorine-containing substituted compound.Type: ApplicationFiled: September 9, 2013Publication date: January 9, 2014Applicants: Taiyo Nippon Sanso Corporation, Kyoto UniversityInventors: Junichi YOSHIDA, Aiichiro NAGAKI
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Patent number: 8618320Abstract: A practical and efficient method for halogenation of activated carbon atoms using readily available N-haloimides and a Lewis acid catalyst has been disclosed. This methodology is applicable to a range of compounds and any halogen atom can be directly introduced to the substrate. The mild reaction conditions, easy workup procedure and simple operation make this method valuable from both an environmental and preparative point of view.Type: GrantFiled: February 24, 2012Date of Patent: December 31, 2013Assignee: Japan Science and Technology AgencyInventors: Yanhua Zhang, Hisashi Yamamoto, Kazutaka Shibatomi
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Publication number: 20130217900Abstract: A compound of formula (I), wherein R1 is hydrogen or a hydroxyl protecting group; and R2 and R3 are same or different and are independently selected from halogen or —O—SO2—X; wherein X is —C1-C4 alkyl; C1-C4 alkyl substituted with one or more halogen; or substituted or unsubstituted phenyl wherein said phenyl substituent is selected from halogen, nitro and C1-C4 alkyl; provided that when R3 is bromine, X is not p-toluoyl; and a process for the preparation thereof.Type: ApplicationFiled: November 1, 2011Publication date: August 22, 2013Applicant: UNITED PHOSPHORUS LIMITEDInventors: Jaidev Rajnikant Shroff, Vikram Rajnikant Shroff, Birja Shanker
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Publication number: 20130146100Abstract: A water repellent protective film forming agent is provided for forming a protective film on a wafer that has an uneven pattern at its surface. The protective film is formed at least on surfaces of recessed portions of the wafer at the time of cleaning the wafer. The wafer is a wafer that contains a material including silicon element at least at the surfaces of the recessed portions of the uneven pattern or a wafer that contains at least one kind of material selected from the group consisting of titanium, titanium nitride, tungsten, aluminum, copper, tin, tantalum nitride and ruthenium at least at a part of the surfaces of the recessed portions of the uneven pattern.Type: ApplicationFiled: November 2, 2012Publication date: June 13, 2013Inventor: Central Glass Company, Limited
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Publication number: 20130075364Abstract: Methods for forming a pattern in a lithography process for semiconductor wafer manufacturing are provided. In an example, a method includes forming a photoresist layer over a material layer; performing a first exposure process on the photoresist layer, thereby forming an exposed photoresist layer having soluble portions and unsoluble portions; treating the exposed photoresist layer, wherein the treating includes one of performing a second exposure process on the exposed photoresist layer and forming an adsorbing chemical layer over the exposed photoresist layer; and developing the exposed and treated photoresist layer to remove the soluble portions of the photoresist layer, wherein the unsoluble portions of the photoresist layer form a photoresist pattern that exposes portions of the material layer.Type: ApplicationFiled: September 22, 2011Publication date: March 28, 2013Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.Inventors: Chien-Wei Wang, Ko-Bin Kao, Wei-Liang Lin, Jui-Ching Wu, Chia-Hsiang Lin, Ai-Jen Jung
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Patent number: 8283486Abstract: Disclosed are a radiation-polymerizable functional group-containing organosilicon compound, including (A) a norbornane skeleton structure, (B) a hydrolyzable silyl group bonded directly to the norbornane skeleton structure, and (C) a radiation-polymerizable functional group bonded to the norbornane skeleton structure, either directly or via a carbon atom, a hetero atom, or a combination thereof, and a method of producing the radiation-polymerizable functional group-containing organosilicon compound. Also disclosed are a haloalkyl group-containing organosilicon compound, including (D) a norbornane skeleton structure, (E) a hydrolyzable silyl group bonded directly to the norbornane skeleton structure, and (F) a haloalkyl group, which is bonded directly to the norbornane skeleton structure and either contains or does not contain a hetero atom, and a method of producing the haloalkyl group-containing organosilicon compound.Type: GrantFiled: June 14, 2011Date of Patent: October 9, 2012Assignee: Shin-Etsu Chemical Co., Ltd.Inventor: Kazuhiro Tsuchida
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Patent number: 8147954Abstract: Disclosed are a perfluoropolyether-modified silane compound, an antifouling coating composition comprising the same, and a film comprising the same.Type: GrantFiled: October 29, 2008Date of Patent: April 3, 2012Assignee: Korea Research Institute of Chemical TechnologyInventors: Soo Bok Lee, In Jun Park, Jong Wook Ha, Kwang Won Lee, Sang Goo Lee, Eun Young Park, Eun Kyung Kim
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Publication number: 20120041221Abstract: A fibrillar, nanotextured coating is deposited on a substrate by contacting the substrate with a reaction mixture comprising a reagent which is hydrolyzable to produced a cross-linked reaction product, and a first solvent which solvates the reagent and the reaction product. The reagent is hydrolyzed so as to provide a cross-linked reaction product which is bonded to the substrate. The substrate is then contacted with a second solvent which is a non-solvent for the reaction product so as to cause nanoscopic phase separation of the reaction product, resulting in the formation of a fibrillar nanotextured coating which is bonded to the substrate. The thus produced coating may be subjected to further chemical modification. The method may be utilized to produce superhydrophobic coatings. Also disclosed are coatings made by the method of the present invention.Type: ApplicationFiled: October 21, 2011Publication date: February 16, 2012Inventors: Thomas J. McCarthy, Lichao Gao
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Publication number: 20120024382Abstract: The invention relates to novel polyaromatic and polyheteroaromatic compounds and derivatives thereof. The compounds display high solubility in organic solvents. A further aspect of the invention relates to the use of the novel compounds in the fabrication of organic film based heterojunction devices. In one form the devices display high conversion efficiencies in solar cell applications.Type: ApplicationFiled: November 27, 2009Publication date: February 2, 2012Applicants: THE UNIVERSITY OF ULM, THE UNIVERSITY OF MELBOURNEInventors: Andrew Holmes, David Jones, Wing Ho Wallace Wong, Chang Qi Ma, Peter Baeuerle
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Publication number: 20110245525Abstract: Disclosed are a radiation-polymerizable functional group-containing organosilicon compound, including (A) a norbornane skeleton structure, (B) a hydrolyzable silyl group bonded directly to the norbornane skeleton structure, and (C) a radiation-polymerizable functional group bonded to the norbornane skeleton structure, either directly or via a carbon atom, a hetero atom, or a combination thereof, and a method of producing the radiation-polymerizable functional group-containing organosilicon compound. Also disclosed are a haloalkyl group-containing organosilicon compound, including (D) a norbornane skeleton structure, (E) a hydrolyzable silyl group bonded directly to the norbornane skeleton structure, and (F) a haloalkyl group, which is bonded directly to the norbornane skeleton structure and either contains or does not contain a hetero atom, and a method of producing the haloalkyl group-containing organosilicon compound.Type: ApplicationFiled: June 14, 2011Publication date: October 6, 2011Applicant: Shin-Etsu Chemical Co., Ltd.Inventor: Kazuhiro TSUCHIDA
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Publication number: 20110165808Abstract: A composition for coating comprising at least one compound of formula I and optionally at least one compound of formula II RaSi(R1)n(X1)3-n??I RbSi(R2)m(X2)3-m??II wherein Ra is a straight-chain or branched C(1-24) alkyl group, Rb is an aromatic group, such as an optionally substituted carbocyclic and heterocyclic group comprising five-, six- or ten-membered ring systems, which is linked by a single covalent bond or a spacer unit, such as a straight-chain or branched alkyl residue having 1 to 8 carbon atoms, to the Si-atom, R1 and R2 are independently of each other a lower alkyl group, such as a straight chain and branched hydrocarbon radical having 1 to 6 carbon atoms, X1 and X2 are independently of each other a hydrolysable group, such as a halogen or an alkoxy group and n, m are independently of each other 0 or 1, with the proviso that if n and m are independently of each other 0 or 1, X may represent the same or different groups.Type: ApplicationFiled: January 4, 2011Publication date: July 7, 2011Applicant: UNIVERSITY OF ZURICHInventors: Jan Zimmermann, Stefan Seeger, Georg Artus, Stefan Jung
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Publication number: 20110009659Abstract: High boiling residue from the direct synthesis of alkylchlorosilanes are converted in large part to monosilanes by heating the residue by passage of alternating current in a pressurized reactor.Type: ApplicationFiled: February 16, 2009Publication date: January 13, 2011Applicant: WACKER CHEMIE AGInventors: Manfred Boeck, Paul Fuchs, Konrad Mautner
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Publication number: 20100291299Abstract: Cyclopentadienyl and Indenyl barium/strontium metal precursors and Lewis base adducts thereof are described. Such precursors have utility for forming Ba- and/or Sr-containing films on substrates, in the manufacture of microelectronic devices or structures.Type: ApplicationFiled: August 3, 2008Publication date: November 18, 2010Applicant: ADVANCED TECHNOLOGY MATERIALS, INC.Inventors: Thomas M. Cameron, Chongying Xu
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Publication number: 20100228043Abstract: The compound is a silane surface treatment agent and is useful for modifying the surfaces of silicon oxide and other metal oxides with hexafluorodimethyl carbinol functional groups. Additionally provided is a surface treatment procedure that effectively bonds it and other alkoxysilanes via homogeneous and heterogeneous amine catalysis onto metal oxide surfaces.Type: ApplicationFiled: May 17, 2010Publication date: September 9, 2010Applicant: The Government of the United States of America, as represented by the Secretary of the NavyInventors: Arthur W. Snow, Edward E. Foos
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Publication number: 20100216984Abstract: The present invention provides compounds of the formula (I): C-Q-O—Si(R1)(R2)—N wherein C is a chromophore; Q is selected from the group consisting of optionally substituted aliphatic, aryl, heteroaryl, cycloalkyl or heterocycloalkyl; R1 and R2 are independently selected from the group consisting of optionally substituted C1-8 alkyl, cycloalkyl, heterocycloalkyl, aryl, heteroaryl, C1-8 alkyloxy, cycloalkyloxy, heterocycloalkyloxy, alkylsilyloxy and arylsilyloxy; and N is a glycosylamine or abasic moiety.Type: ApplicationFiled: May 16, 2008Publication date: August 26, 2010Applicant: Dharmacon, Inc.Inventor: Michael Oren Delaney
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Publication number: 20100215894Abstract: Disclosed is a composition comprising: an aqueous dispersion of fluoroalkylsilyl surface modified nanoparticles, wherein the nanoparticles comprise at least one member selected from the group consisting of silica, titania, zirconia, layered magnesium silicate, aluminosilicate, natural clay, synthetic clay and mixtures thereof, and wherein the fluoroalkylsilyl is: (F(CF2)nCH2CH2)mSi(O—)p, where n is 2, 3 or 4, p is 1, 2 or 3, and m is (4?p). Also disclosed are processes of making an aqueous dispersion of fluoroalkylsilyl surface modified nanoparticles, and treating a substrate with an aqueous dispersion of fluoroalkylsilyl surface modified nanoparticles. Articles and substrates comprising the fluoroalkylsilyl surface modified nanoparticles are also disclosed.Type: ApplicationFiled: February 1, 2010Publication date: August 26, 2010Applicant: INVISTA North America S.ar.IInventors: Isaac Keene IVERSON, Martin August RUDAT
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Publication number: 20090184313Abstract: The present invention relates to organic electroluminescent devices, in particular blue-emitting devices, in which compounds of the formulae (1) to (4) are used as host material or dopant in the emitting layer and/or as hole-transport material and/or as electron-transport material.Type: ApplicationFiled: May 3, 2007Publication date: July 23, 2009Applicant: Merck Patent GmbHInventors: Arne Buesing, Philipp Stoessel, Holger Heil
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Publication number: 20090124821Abstract: Disclosed are a radiation-polymerizable functional group-containing organosilicon compound, including (A) a norbornane skeleton structure, (B) a hydrolyzable silyl group bonded directly to the norbornane skeleton structure, and (C) a radiation-polymerizable functional group bonded to the norbornane skeleton structure, either directly or via a carbon atom, a hetero atom, or a combination thereof, and a method of producing the radiation-polymerizable functional group-containing organosilicon compound. Also disclosed are a haloalkyl group-containing organosilicon compound, including (D) a norbornane skeleton structure, (E) a hydrolyzable silyl group bonded directly to the norbornane skeleton structure, and (F) a haloalkyl group, which is bonded directly to the norbornane skeleton structure and either contains or does not contain a hetero atom, and a method of producing the haloalkyl group-containing organosilicon compound.Type: ApplicationFiled: November 6, 2008Publication date: May 14, 2009Applicant: Shin-Etsu Chemical Co., Ltd.Inventor: Kazuhiro TSUCHIDA
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Patent number: 7307233Abstract: The present invention is directed to the provision of an isotope separation method, which can effectively prevent, without the use of a second gas, a secondary reaction and the formation of a polymer involved in a multiphoton dissociation reaction in laser isotope separation and, at the same time, can efficiently separate a target isotope with low activation energy, and a working substance for use in the isotope separation. The isotope separation method comprises the step of irradiating a working substance for isotope separation comprising a compound represented by formula SiX3-CY2-CZ3 or SiX3-CY?CZ2, wherein X, Y, and Z, which may be the same or different, represent a halogen atom, H, or an alkyl group; and at least one of Z's represents a halogen atom with the remaining Z's being H or an alkyl group, with a laser beam to dissociate only a molecule containing a particular target isotope atom, whereby the dissociation product or the nondissociation molecule is enriched with the target Si isotope atom.Type: GrantFiled: December 19, 2003Date of Patent: December 11, 2007Assignee: Kawasaki Jukogyo Kabushiki KaishaInventors: Keiji Nomaru, Hideki Hattori, Yoshiaki Takatani
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Patent number: 7196212Abstract: Novel perfluoropolyether-modified silanes are improved in water/oil repellency, parting properties, chemical resistance, lubricity, durability, antifouling properties and fingerprint wipe-off. An antireflection filter is also provided comprising an inorganic antireflection layer including a surface layer in the form of a silicon dioxide-base inorganic layer, and an antifouling layer, preferably of the perfluoropolyether-modified silane, on the surface layer. The antifouling layer has a sliding angle of oleic acid of up to 5°, a change of the sliding angle after solvent washing relative to the sliding angle before solvent washing being up to 10%.Type: GrantFiled: October 4, 2002Date of Patent: March 27, 2007Assignee: Shin-Etsu Chemical Co., Ltd.Inventors: Koichi Yamaguchi, Hirofumi Kishita
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Patent number: 7081508Abstract: A primer composition comprises (a) a fluoroalkylene or fluoropolyether compound having at least one alkenyl radical and at least one hydrolyzable silyl radical, (b) an organic titanic acid ester, (c) an organic tin compound, and (d) a silane compound. The primer composition is fully adherent to various substrates of metals, glass, ceramics, cement, mortar, carbon, and plastics, and is particularly suited for use with a thermosetting elastomer composition based on a polymer having at least two alkenyl radicals and a perfluoropolyether structure in its backbone.Type: GrantFiled: June 25, 2004Date of Patent: July 25, 2006Assignee: Shin-Etsu Chemical Co., Ltd.Inventors: Takashi Matsuda, Yasuhisa Osawa
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Patent number: 6803475Abstract: A method of increasing the fluorous nature of a compound includes the step of reacting the compound with at least one second compound having the formula: wherein Rf is a fluorous group and m is 0, 1 or 2.Type: GrantFiled: October 22, 2003Date of Patent: October 12, 2004Assignee: University of PittsburghInventors: Peter Wipf, Stephan Roever
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Patent number: 6803477Abstract: An efficient method is disclosed for the preparation of trifluoromethyl- and difluoromethylsilanes using magnesium metal mediated reductive tri- and difluoromethylation of chlorosilanes with tri- and difluoromethyl sulfides, sulfoxides, and sulfones. One byproduct of the process is diphenyl disulfide. Since phenyl trifluoromethyl sulfone, sulfoxide and sulfide are readily prepared from readily available trifluoromethane and diphenyl disulfide, the method can be considered “pseudo-catalytic” for the preparation of (trifluoromethyl)trimethylsilane from environmentally benign trifluoromethane.Type: GrantFiled: November 27, 2002Date of Patent: October 12, 2004Assignee: University of Southern CaliforniaInventors: G. K. Surya Prakash, Jinbo Hu, George A. Olah
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Patent number: 6783812Abstract: Compounds useful as components of LC and FLC compositions which in turn are useful in the manufacture of optical devices. Compounds of this invention have a silane tail, which can contain more than one Si. Compounds of this invention can include those with disilane tails. The invention provides LC compositions containing one or more of the silanes of this invention. Addition of one or more of the compounds of this invention to LC compositions can result in significant improvement in optical or LC properties. In particular, the compounds of this invention can significantly lower the melting point, freezing point or both of an LC composition resulting in significant improvement in device stability.Type: GrantFiled: January 3, 2001Date of Patent: August 31, 2004Assignee: Displaytech, Inc.Inventors: Michael Wand, Neil Gough, Kundalika More, William N. Thurmes, Xin-Hua Chen
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Patent number: 6703083Abstract: Silicon compounds having a low viscosity and a low threshold voltage and improved mutual solubility, a liquid crystal composition comprising the same and a liquid crystal display using the liquid crystal composition. The silicon compound is represented by formula (1): wherein Y1 is, for example, alkylene having 1 to 10 carbon atoms, Y2 is, for example, hydrogen, halogen, —CN, —C≡C—CN, or alkyl having 1 to 10 carbon atoms; A1, A2, A3, and A4 each are, for example, independently 1,4-cyclohexylene, 1,4-cyclohexenylene, 1,4-phenylene, or 1,4-phenylene; Z1, Z2 and Z3 each are independently a single bond, —(CH2)2—, —OCH2—, —CH2O—, —CH═CH—, —C≡C—, —(CH2)4—, —O(CH2)3—, —(CH2)3O—, —COO—, —OCO—, —OCF2—, or —CF2O—; and p and q each are independently 0 or 1.Type: GrantFiled: February 28, 2002Date of Patent: March 9, 2004Assignees: Chisso Corporation, Chisso Petrochemical CorporationInventors: Takashi Kato, Yasuyuki Koizumi, Yasuhiro Kubo, Kanetsugu Terashima
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Publication number: 20030153778Abstract: An efficient method is disclosed for the preparation of trifluoromethyl- and difluoromethylsilanes using magnesium metal mediated reductive tri- and difluoromethylation of chlorosilanes with tri- and difluoromethyl sulfides, sulfoxides, and sulfones. One byproduct of the process is diphenyl disulfide. Since phenyl trifluoromethyl sulfone, sulfoxide and sulfide are readily prepared from readily available trifluoromethane and diphenyl disulfide, the method can be considered “pseudo-catalytic” for the preparation of (trifluoromethyl)trimethylsilane from environmentally benign trifluoromethane.Type: ApplicationFiled: November 27, 2002Publication date: August 14, 2003Inventors: G.K. Surya Prakash, Jinbo Hu, George A. Olah
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Patent number: 6361870Abstract: The invention relates to a coating material comprising condensates of at least one compound (A) of the general formula RaMZb (a=0-3; b=1-4; a+b=3, 4), where R is a non-hydrolyzable organic group, and at least one compound (B) of the general formula R′xMZy(x=1-3; y=1-3; x+y=3, 4), where R is a non-hydrolyzable organic group and at least one R′ contains a perfluoro polyether structure separated from M by at least two atoms, where M is an element from the periodic table of elements selected from the main groups III-V or from the subgroups II-IV and Z is a hydrolyzable organic group, and where at least one R is not equal to at least one R′.Type: GrantFiled: March 27, 2000Date of Patent: March 26, 2002Inventors: Rudolf Steffl, Reiner Kasemann, Wolfgang Burger
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Publication number: 20010033937Abstract: Molecular dipolar rotors comprising a base, an axle connected to said base and oriented substantially perpendicular to said base, and a rotor portion having an electric dipole moment are provided. The molecular dipolar rotors may be attached to a surface. Arrays of molecular dipolar rotors attached to surfaces are provided. Molecular dipolar rotors are useful in preparation of small devices.Type: ApplicationFiled: March 20, 2001Publication date: October 25, 2001Inventors: Josef Michl, John C. Price, Thomas F. Magnera
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Patent number: 6207846Abstract: The present invention provides an improved process and intermediate compounds for the preparation of di-fluorovinylsilane insecticidal and acaricidal agents of the formula I wherein Ar is phenyl, 1- or 2-napthyl or a 5- or 6-membered heteroaromatic ring, each of which may be optionally substituted by any combination of from one to three halogen, C1-C4alkyl, C1-C4haloalkyl, C1-C4alkoxy, C1-C4haloalkoxy, C(O)R2 or S(O)nR3 groups, R and R1 are each independently C1-C4 alkyl or C3-C5 cycloalkyl; Ar1 is phenoxyphenyl, phenyl, biphenyl; phenoxypyridyl, benzylpyridyl, benzylphenyl, 1- or 2- napthyl or a 5- or 6-membered heteroaromatic ring, each of which may be optionally substituted by any combination of from one to five halogen, C1-C4alkyl, C1-C4haloalkyl, C1-C4alkoxy, C1-C4haloalkoxy or C(O)R4 groups, n is an integer of 0, 1 or 2; R2 and R4 are each independently C1-C4alkyl, benzyl or phenyl; R3 is C114 C4alkyl or C1 -C4haloalkyl; and the fluorine atoms attached to the double bond are traType: GrantFiled: July 2, 1999Date of Patent: March 27, 2001Assignee: American Cyanamid Co.Inventors: Keith D. Barnes, Yulin Hu
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Patent number: 6197989Abstract: A fluorine-containing organic silicon compound represented by the following formula 1, which is useful as various industrial base materials required to have performances such as water and oil repellency, anti-fouling properties or release properties and as raw materials therefor.Type: GrantFiled: March 17, 1999Date of Patent: March 6, 2001Assignees: Asahi Glass Company Ltd., OSi Specialties, Inc.Inventors: Yutaka Furukawa, Mami Kotera, Seisaku Kumai, Robert E. Ruckle, Jr., Gerald J. Murphy
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Patent number: 6194597Abstract: There is disclosed a method for preparing a silyl-functional living cationic polymer which can be subsequently coupled to form a moisture-curable telechelic system, said method comprising reacting, in the presence of a Lewis acid, (A) at least one cationically polymerizable monomer with (B) an initiator of the formula wherein R is selected from H or methyl group, R′ is a divalent non-aromatic hydrocarbon group having, 1 to 6 carbon atoms, R″ is selected from alkyl groups having 1 to 10 carbon atoms or aryl groups having, 6 to 10 carbon atoms, X is halogen, Y is halogen and n is 1, 2 or 3.Type: GrantFiled: April 15, 1999Date of Patent: February 27, 2001Assignees: Dow Corning Corporation, University of MassachusettsInventors: Rudolf Faust, Savvas E. Hadjikyriacou, Aroop Kumar Roy, Toshio Suzuki
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Patent number: 6087519Abstract: The invention relates to an adhesive substance for improved adhesion between a vulcanizable polymer and a metallic reinforcing carrier.The use of an adhesive substance with the following structure is proposed in order to produce an improved adhesion between rubber and a metallic reinforcing carrier:X--(R).sub.n --(Ar).sub.i --(R).sub.m --Y,whereinX: --SH; --Si(Cl).sub.3 ; --Si(OR.sub.1).sub.3 ; --COOHwith R.sub.1 : alkyl remainder (branched and unbranched), particularly --CH.sub.3 ; --C.sub.2 H.sub.5 or --C.sub.3 H.sub.7 ;R: --CH.sub.2 --; --CF.sub.2 --; wherein 0.ltoreq.n,m.ltoreq.12, or--CH.sub.2 --CO--NH--CH.sub.2 --; --CF.sub.2 --CO--NH--CF.sub.2 --; --CH.sub.2 --CO--NH--CF.sub.2 --; --CF.sub.2 --CO--NH--CH.sub.2 --, wherein 0.ltoreq.n,m.ltoreq.4Ar: aromatic and/or heteroaromatic system, comprised of one or several of the following molecules:benzene, phenylene, aniline, thiophene, pyrrole, furane,with or without substituentswherein 0.ltoreq.i.ltoreq.Type: GrantFiled: April 16, 1997Date of Patent: July 11, 2000Assignee: Continental AktiengesellschaftInventors: Francis Garnier, Philippe Lang, Richard Michalitsch, Bernd Kaiser, Gerhard E. Nauer
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Patent number: 5990335Abstract: A di-p-tolyldialkylsilane derivative, a photoluminescence polymer formed from the derivative, and methods for preparing the derivative and polymer are provided. The di-p-tolyldialkylsilane derivative is represented by the following formula (1): ##STR1## where R.sub.1 and R.sub.2 are independently selected from the group consisting of phenyl and --(CH.dbd.CH).sub.k R.sub.3 (k is an integer between and inclusive of 0 and 2, and R.sub.3 is hydrogen or alkyl), and X.sup.2 is selected from the group consisting of hydrogen, halogen atom and cyano group. The di-p-tolylalkylsilane derivative of the formula (1) is very useful as a monomer of a functional polymer. The photoluminescence polymer formed from the di-p-tolylalkylsilane derivative of the chemical formula (1) contains a repeating unit having a silicon between the conjugated double bonds, thereby suppressing electron movement of the conjugated double bond. As a result, a range of colors between blue and green, particularly, blue, can be obtained.Type: GrantFiled: January 8, 1998Date of Patent: November 23, 1999Assignee: Samsung Display Devices Co., Ltd.Inventors: Hwan-kyu Kim, Soo-min Lee, Mi-kyung Ryu, Ki-dong Kim
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Patent number: 5981785Abstract: A novel initiator which may be used to prepare a silyl-functional living cationic polymer is disclosed, said initiator having the formula ##STR1## wherein R is independently selected from the group consisting of alkyl groups having 1 to 10 carbon atoms and aryl groups having 6 to 10 carbon atoms, R' is a divalent aliphatic hydrocarbon group having at least 3 carbon atoms, X is halogen, Y is selected from the group consisting of halogen, alkoxy, acyloxy and hydroxyl groups and a is 1, 2 or 3.Type: GrantFiled: December 3, 1998Date of Patent: November 9, 1999Assignees: University of Massachusetts, Dow Corning CorporationInventors: Rudolf Faust, Savvas E. Hadjikyriacou, Toshio Suzuki
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Patent number: 5858599Abstract: An anti-offsetting oil including an organopolysiloxane having the formula (1) below and containing low molecular weight organopolysiloxanes having a molecular weight of 3,000 or less in a content of 50 ppm or less. ##STR1## wherein R.sub.f 's represent a perfluoroalkyl which may contain at least one ether linkage; R's represent a monovalent hydrocarbon group; Y's represent a divalent organic group having 2 to 5 carbon atoms; a represents an integer of 1 or more and b represents an integer of 0 or more, provided that a and b satisfy 3a+3b+2=15 to 4,000; and c and d are an integer of 0 to 3. This fluid has a good wettability to silicone rubber or fluorine forming the surfaces of fixing rolls of electrophotographic copying machines, and hence can effectively prevent offset. Since it contains no low-molecular weight organopolysiloxanes, the electric-contact failure may hardly occur.Type: GrantFiled: November 6, 1997Date of Patent: January 12, 1999Assignee: Shin-Etsu Chemical Co., Ltd.Inventors: Hiromasa Yamaguchi, Hirofumi Kishita
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Patent number: 5859247Abstract: The present invention provides several methods of synthesis and separation in which organic/fluorous phase separation techniques are used to effect separations. The present invention also provides novel compositions of matter comprising fluorous Si, Sn and Ge compounds.Type: GrantFiled: July 31, 1996Date of Patent: January 12, 1999Assignee: University of PittsburghInventors: Dennis P. Curran, Sabine Hadida Ruah, Masahide Hoshino, Armido Studer, Peter Wipf, Patrick Jeger, Sun-Young Kim, Rafael Ferritto
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Patent number: 5849750Abstract: Non-naturally occuring dynemicin analogs are provided, which are useful as DNA cleaving agents, cytotoxic agents, and/or anti-tumor compounds. Methods of making dynemicin analogs are also provided.Type: GrantFiled: March 5, 1997Date of Patent: December 15, 1998Assignee: California Institute of TechnologyInventor: Andrew Gordon Myers
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Patent number: 5780661Abstract: Allyl silane compounds represented by the formula (CH.sub.2 .dbd.CH--CH.sub.2 --)R.sub.n SiCl.sub.3-n (R represents, independently of each other, hydrocarbon groups with a carbon number of C.sub.1 to C.sub.8 ; n represents an integer from 0 to 3) are reacted with AX (AX stands for mercaptans, thiocarboxylic acids, carbon tetrachloride, or chloroform, the letter X represents, respectively, H bonded to sulfur in the case of mercaptans and thiocarboxylic acids, chlorine in the case of carbon tetrachloride, and H in the case of chloroform, and the letter A represents a residual group bonded to X) in the presence of radical generating agents, thereby obtaining allylsilane compounds represented by the formula (ACH.sub.2 CHXCH.sub.2)R.sub.n SiCl.sub.3-n (R, n, A and X have the same meaning as above).Type: GrantFiled: June 5, 1997Date of Patent: July 14, 1998Assignee: Dow Corning Asia, Ltd.Inventors: Mitsuhiro Iwata, Hideki Sakurai, Takanobu Sanji
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Patent number: 5710102Abstract: Difluorovinylsilane compounds having the structural formula I ##STR1## and compositions thereof, and methods for the control of insect and acarid pests and protection of plants.Type: GrantFiled: February 24, 1997Date of Patent: January 20, 1998Assignee: American Cyanamid CompanyInventors: Keith Douglas Barnes, Yulin Hu
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Patent number: 5674967Abstract: A composition comprising perfluoroalkylalkylsilane and a completely hydrolyzable silane or siloxane is disclosed for providing nonwetting properties to the surface of various substrates such as glass, plastic, metal, organic polymer coated substrates or inorganic coated substrates. The nonwetting property, as measured by contact angle of a drop of water on the treated substrate surface, is more durable than the nonwetting property of a surface treated with the same perfluoroalkylalkylsilane with the hydrolyzable silane or siloxane.Type: GrantFiled: September 23, 1996Date of Patent: October 7, 1997Assignee: PPG Industries, Inc.Inventor: George B. Goodwin
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Patent number: 5639845Abstract: A novel and very efficient method is disclosed for the introduction of perfluoroalkyl groups into an organopolysiloxane by utilizing the hydrosilation reaction with an organohydrogenpolysiloxane. Different from the conventional but inefficient hydrosilation reaction using a perfluoroalkyl-substituted ethylene as the olefin compound, the inventive method utilizes a propene-1 3-substituted by a perfluoroalkyl group compound as the olefin compound to react with an organohydrogenpolysiloxane by which a very high efficiency in the hydrosilation reaction can be obtained without side reactions which otherwise greatly decrease the yield of the desired perfluoroalkyl-containing organopolysiloxane product.Type: GrantFiled: November 1, 1995Date of Patent: June 17, 1997Assignee: Shin-Etsu Chemical Co., Ltd.Inventors: Hiroshi Inomata, Yasushi Yamamoto, Yasuo Tarumi, Noriyuki Koike, Kouichi Ishida
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Patent number: 5545255Abstract: An ultra thin, water and oil repelling and durable overcoat is easily formed on a substrate surface via covalent bonding by applying a finishing agent of the invention, comprising a chemically adsorptive compound with a chlorosilyl group and a nonaqueous viscous liquid or solid medium, on the substrate surface. A finishing agent, comprising a chemically adsorptive compound with a chlorosilyl group and a nonaqueous viscous liquid or solid medium, is applied on a substrate surface comprising hydrophilic groups. The substrate surface is then reacted with the chemically adsorptive compound at room temperature, and the agent containing unreacted chemically adsorptive compound is removed. The generation of hydrochloric acid gas can be prevented by adding tertiary amine or amide in the molar amount of one to three times more than the chemically adsorptive compound contained in the finishing agent.Type: GrantFiled: April 21, 1995Date of Patent: August 13, 1996Assignee: Matsushita Electric Industrial Co., Ltd.Inventor: Kazufumi Ogawa
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Patent number: 5475124Abstract: A composition which is curable to an elastomer comprising:A polymer or mixture of polymers of the formula ##STR1## A composition which is curable to a pressure sensitive adhesive comprising the above polymer and a sufficient amount of tackifier. The invention also relates to fluorosilane compounds useful in the preparation of silicone macromonomer, their preparation and the preparation of silicone macromonomer.Type: GrantFiled: May 20, 1994Date of Patent: December 12, 1995Assignee: Minnesota Mining and Manufacturing CompanyInventors: Mieczyslaw H. Mazurek, Steven S. Kantner, Charles M. Leir, Audrey A. Sherman
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Patent number: 5464917Abstract: A straight-chain organopolysiloxane represented by the general formula: ##STR1## wherein R.sup.1 represents a monovalent hydrocarbon group, R.sup.2 represents a bivalent organic group, Rf represents a perfluoroalkyl ether group or a perfluoroalkyl group, X represents a hydrogen atom or an organosilyl group, and n is an integer of 15 to 4,000 and having a content of cyclic polysiloxanes with a molecular weight of 3,000 or below of 50 ppm or below. This organopolysiloxane is novel in that the content of cyclic siloxanes with a molecular weight of 3,000 or below is only 50 ppm or below and the organopolysiloxane can obviate contact failure due to volatilization of components or surrounding contamination due to bleeding when used as materials in the field of electricity and electronics or as building materials.Type: GrantFiled: August 1, 1994Date of Patent: November 7, 1995Assignee: Shin-Etsu Chemical Co., Ltd.Inventors: Hirofumi Kishita, Kouichi Yamaguchi, Nobuyuki Kobayashi, Kouichi Ishida
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Patent number: 5463009Abstract: A fluorine-modified silicon compound having a polymerization degree of from 1 to 400 and containing at least one siloxane unit represented by formula (1): ##STR1## wherein R.sup.1 represents an aliphatic straight-chain or branched hydrocarbon group having 1 to 20 carbon atoms or an alicyclic hydrocarbon group having 5 to 10 carbon atoms or an aromatic hydrocarbon compound having 6 to 10 carbon atoms; and m represents 0 or an integer of from 1 to 10; a process for preparing the same; and a cosmetic containing the same are disclosed. The fluorine-modified silicone derivative exhibits high water- and oil-repellency to provide cosmetics which wear long and have a good feel on use.Type: GrantFiled: December 8, 1994Date of Patent: October 31, 1995Assignee: Kao CorporationInventors: Jouji Okada, Akira Kawamata, Tadayuki Tokunaga, Makoto Torizuka, Masahiko Asahi
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Patent number: 5453528Abstract: The present invention relates to an improved method for preparing a fluorinated silane having the formulaR.sup.1.sub.4 Si (I)or the formulaR.sup.2.sub.3 Si(R.sup.3 SiR.sup.4.sub.2).sub.z R.sup.3 SiR.sup.2.sub.3(II)said method comprising reacting the corresponding halide-functional or alkoxy-functional silane with lithium aluminum hydride or sodium borohydride to form a hydride-functional silane and then reacting the latter with a vinyl-terminated fluorotelomer or an allyl-terminated fluorotelomer, wherein at least three R.sub.1 of said silane (I), at least two of the R.sup.2 and at least one R.sup.4 of said silane (II) are selected from derivatives of fluorotelomers or fluorocotelomers, z has an average value of 0 to 4 and R.sup.3 is a derivative of an alkylene-terminated telechelic divalent telomer or cotelomer.Type: GrantFiled: November 21, 1994Date of Patent: September 26, 1995Assignee: Dow Corning CorporationInventors: Bernard Boutevin, Francine Guida-Pietrasanta, Amedee Ratsimiehety, Gerardo Caporiccio