The Chalcogen, X, Is In A -c(=x)- Group Patents (Class 558/52)
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Patent number: 9346750Abstract: A salt represented by the formula (X): wherein Q1 and Q2 each independently represent a fluorine atom etc., L1 and L2 independently each represent a C1-C17 divalent saturated hydrocarbon group, ring W1 represents a C3-C36 saturated hydrocarbon ring, R2 is independently in each occurrence a hydroxyl group etc., s represents an integer of 0 to 2, Z+ represents an organic counter ion, and W10 represents a group represented by the formula (X-1): wherein ring W2 represents a C4-C36 saturated hydrocarbon ring in which one or more —CH2— can be replaced by —O— or —CO—, with the proviso that at least one —CH2— in the C4-C36 saturated hydrocarbon ring is replaced by —CO—, R3 is independently in each occurrence a C1-C6 alkyl group etc., and t represents an integer of 0 to 2, or a group represented by the formula (X-2): wherein ring W3 represents a C3-C36 saturated hydrocarbon ring, R4 is independently in each occurrence a hydroxyl group etc., R5 is independently in each occurrence a C1-C6 alkyl group etc.Type: GrantFiled: November 16, 2010Date of Patent: May 24, 2016Assignee: SUMITOMO CHEMICAL COMPANY, LIMITEDInventors: Koji Ichikawa, Mitsuyoshi Ochiai, Masako Sugihara
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Patent number: 9169202Abstract: A surface active agent comprising an arylated methyl ester of a fatty acid, or mixture of fatty acids, derived from biodiesel or a triglyceride source is disclosed. The fatty acid mixture is condensed to methyl esters and alkylated with aromatic substituents under Friedel-Crafts conditions. The alkylated methyl esters may be alkoxylated using a catalyst derived from fatty acids, alkaline earth salts, and strong acids. The resulting nonionic surfactant may also be sulfonated to produce one class of anionic surfactants. The alkylated methyl esters may also be directly sulfonated to produce another class of anionic surfactants.Type: GrantFiled: September 19, 2011Date of Patent: October 27, 2015Assignee: HUNTSMAN PETROCHEMICAL LLCInventors: George A. Smith, Daniel R. Weaver, Zheng Chai
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Patent number: 9061980Abstract: A compound of formula (I) wherein Y is oxygen or sulfur, and X1, X2 and X3 are independently of each other hydrogen, halogen, hydroxy or linear or branched (C1-6)-alkoxy, or hydroxy-(C1-6)alkyl or (C1-6)alkoxy-(C1-6)alkyl, mono- or dihalogenated (C1-6)-alkyl, amino(C1-6)-alkyl, hydroxy(C1-6)-alkyl, with one of the two provisos that: (1) at least of X1, X2 and X3 is other than hydrogen, and (2) X2 is other than hydroxy, when X1 and X3 are hydrogen.Type: GrantFiled: July 11, 2008Date of Patent: June 23, 2015Assignee: NABRIVA THERAPEUTICS, AGInventors: Klaus Thirring, Werner Heilmayer
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Publication number: 20150094276Abstract: This invention relates to novel substituted styryl benzylsulfones that are multikinase inhibitors and pharmaceutically acceptable acid addition salts thereof. The invention also provides compositions comprising a compound of this invention and the use of such compositions in methods of treating diseases and conditions beneficially treated by an agent that inhibits kinases, such as phosphatidylinositol 3-kinase (PI3-K) and polo-like kinase (PLK-1).Type: ApplicationFiled: April 19, 2013Publication date: April 2, 2015Inventor: Roger D. Tung
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Patent number: 8900794Abstract: A photoacid generator compound has the formula (I): [A-(CHR1)p]k-(L)-(CH2)m—(C(R2)2)n—SO3?Z+??(I) wherein A is a substituted or unsubstituted, monocyclic, polycyclic, or fused polycyclic C5 or greater cycloaliphatic group optionally comprising O, S, N, F, or a combination comprising at least one of the foregoing, R1 is H, a single bond, or a substituted or unsubstituted C1-30 alkyl group, wherein when R1 is a single bond, R1 is covalently bonded to a carbon atom of A, each R2 is independently H, F, or C1-4 fluoroalkyl, wherein at least one R2 is not hydrogen, L is a linking group comprising a sulfonate group, a sulfonamide group, or a C1-30 sulfonate or sulfonamide-containing group, Z is an organic or inorganic cation, p is an integer of 0 to 10,k is 1 or 2, m is an integer of 0 or greater, and n is an integer of 1 or greater.Type: GrantFiled: September 28, 2012Date of Patent: December 2, 2014Assignee: Rohm and Haas Electronic Materials LLCInventors: Emad Aqad, Cheng-Bai Xu, Mingqi Li, Shintaro Yamada, William Williams, III
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Publication number: 20140315713Abstract: The present invention provides a compound represented by the formula (1). The compound represented by the formula (1) is a developing agent superior in both color-developing sensitivity with low energy and image stability [in the following formula, wherein R1 is a hydrogen atom, an alkyl group, an alkenyl group, an aryl group or an aralkyl group, R2 in the number of m are each independently an alkyl group, an alkenyl group, an aryl group, an aralkyl group, an alkoxy group, a halogen atom, a hydroxy group, a cyano group, a nitro group, a carboxy group or an amino group, R3 in the number of n are each independently an alkyl group, an alkenyl group, an aryl group, an aralkyl group, an alkoxy group, a halogen atom, a hydroxy group, a cyano group, a nitro group, a carboxy group or an amino group, and m and n are each independently an integer of 0-4.Type: ApplicationFiled: October 31, 2012Publication date: October 23, 2014Applicants: NIPPON PAPER INDUSTRIES CO., LTD., MITSUBISHI CHEMICAL CORPORATIONInventors: Akihito Ogino, Yoshimi Midorikawa, Yukiko Sato, Keiichiro Inada, Mai Higuchi, Mamoru Suga
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Patent number: 8846966Abstract: In the present invention, a target alkoxycarbonylfluoroalkanesulfonic acid salt is obtained by using a halofluoroalkanoic acid ester as a starting raw material, sulfinating the halofluoroalkanoic acid ester in the presence of an amine (as a first step), and then, oxidizing the resulting sulfination product (as a second step). Further, an alkoxycarbonylfluoroalkanesulfinic acid onium salt, which is useful as a photoacid generator, is obtained by salt exchange reaction of the alkoxycarbonylfluoroalkanesulfonic acid salt.Type: GrantFiled: October 21, 2009Date of Patent: September 30, 2014Assignee: Central Glass Company, LimitedInventors: Yuji Hagiwara, Ryozo Takihana, Masanori Fushimi, Yoshimi Isono, Satoru Narizuka
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Publication number: 20140275380Abstract: The present invention relates to novel dispersants based on reaction products of two and one moles respectively of the branched ester alcohol or alkokylated ester alcohol with maleic anhydride that has been subjected to a further sulfonation reaction. The compounds are useful as dispersing and wetting agents. The invention further relates to the use of the dispersants of the invention to produce stable aqueous dispersions of high performance thermoplastic polymers.Type: ApplicationFiled: March 17, 2014Publication date: September 18, 2014Inventor: James T. Tanner
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Publication number: 20140194604Abstract: The present invention is directed to methods for oxidizing internal olefins to ketones. In various embodiments, each method comprising contacting an organic substrate, having an initial internal olefin, with a mixture of (a) a biscationic palladium salt; and (b) an oxidizing agent; dissolved or dispersed in a solvent system to form a reaction mixture, said solvent system comprising at least one C2-6 carbon nitrile and optionally at least one secondary alkyl amide, said method conducted under conditions sufficient to convert at least 50 mol % of the initial internal olefin to a ketone, said ketone positioned on a carbon of the initial internal olefin. The transformation occurs at room temperature and shows wide substrate scope. Applications to the oxidation of seed oil derivatives and a bioactive natural product are described.Type: ApplicationFiled: January 8, 2014Publication date: July 10, 2014Applicant: CALIFORNIA INSTITUTE OF TECHNOLOGYInventors: Bill MORANDI, Robert H. GRUBBS, Zachary K. WICKENS
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Publication number: 20140120472Abstract: A resist composition including a base component (A) which exhibits changed solubility in an alkali developing solution under action of acid and an acid-generator component (B) including a compound represented by (b1-1), a compound represented by (b1-1?) and/or a compound represented by (b1-1?) (R1?-R3? represents an aryl group or an alkyl group, provided that at least one of R1?-R3? represents a substituted aryl group being substituted with a group represented by (b1-1-0), and two of R1?-R3? may be mutually bonded to form a ring with the sulfur atom; X represents a C3-C30 hydrocarbon group; Q1 represents a carbonyl group-containing divalent linking group; X10 represents a C1-C30 hydrocarbon group; Q3 represents a single bond or a divalent linking group; Y10 represents —C(?O)— or —SO2—; Y11 represents a C1-C10 alkyl group or a fluorinated alkyl group: Q2 represents a single bond or an alkylene group; and W represents a C2-C10 alkylene group).Type: ApplicationFiled: January 6, 2014Publication date: May 1, 2014Applicant: Tokyo Ohka Kogyo Co., Ltd.Inventors: Hideo HADA, Yoshiyuki UTSUMI, Takehiro SESHIMO, Akiya KAWAUE
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Patent number: 8633223Abstract: The present invention relates to a process for preparing 2-methyl-2?-phenylpropionic acid derivatives showing antihistamine activity in more simplified way, intermediate compounds and their preparation processes used therefor. According to the present invention, pharmaceutically useful 2-methyl-2?-phenylpropionic acid derivatives can be prepared with high yield and purity on industrial scale.Type: GrantFiled: December 26, 2012Date of Patent: January 21, 2014Assignee: Yuhan CorporationInventors: Chun-Ho Lee, Ja-Heouk Khoo, Kyoung-Chan Kwon, Hyun Ju
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Patent number: 8552219Abstract: Provided is a process for the preparing 1-phenyl-3-dimethylaminopropane derivatives of formula I, (The formula should be inserted here) and its pharmaceutically acceptable salts thereof via novel intermediates.Type: GrantFiled: September 20, 2011Date of Patent: October 8, 2013Assignee: Ind-Swift Laboratories LimitedInventors: Shekhar Bhaskar Bhirud, Perminder Singh Johar, Sushanta Mishra, Danish Jamshad
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Publication number: 20130261133Abstract: The compounds of the invention exhibit antiprotozoal, antimicrobial, and anticancer properties that are useful for the treatment or prevention of infections or cancer in a patient (e.g., a human). For example, the compounds and methods described herein can be used for the treatment or prevention of protozoal infections such as leishmaniasis, malaria, and trypanosoma infections, bacterial infections such as S. aureus and C. albicans, and cancers such as breast, colon, lung, or prostate cancer. The invention further provides methods of synthesizing such compounds as well as kits useful for administering the compounds.Type: ApplicationFiled: March 14, 2013Publication date: October 3, 2013Applicant: The University of MontanaInventors: John Howard Hoody, David Brian Bolstad
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Publication number: 20130209938Abstract: A resist composition according to the present invention includes at least a base resin, a photoacid generator and a solvent, wherein the photoacid generator comprises a fluorine-containing sulfonic acid salt of the following general formula (4). In the formula, X independently represents a hydrogen atom or a fluorine atom; n represents an integer of 1 to 6; R1 represents a hydrogen atom, or an alkyl, alkenyl, oxoalkyl, aryl or aralkyl group; any of hydrogen atoms on carbons in R1 may be substituted with a substituent; R2 represents RAO or RBRCN; and A represents a divalent group. This fluorine-containing sulfonic acid salt can serve as a photoacid generator having high solubility in a resist solvent and thus can suitably be used for a resist composition such that the resist composition shows high resolution, wide DOF, small LER and high sensitivity to form a good pattern shape in lithographic processes.Type: ApplicationFiled: October 14, 2011Publication date: August 15, 2013Applicant: Central Glass Company, Ltd.Inventors: Ryozo Takihana, Satoru Narizuka
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Patent number: 8507174Abstract: A positive resist composition comprising (A) a compound capable of generating an acid upon irradiation with an actinic ray or radiation, (B) a resin capable of increasing the solubility in an alkali developer by the action of an acid, and (C) a compound having a specific structure, which decomposes by the action of an acid to generate an acid, a pattern forming method using the positive resist composition, and a compound for use in the positive resist composition are provided as a positive resist composition exhibiting good performance in terms of pattern profile, line edge roughness, pattern collapse, sensitivity and resolution in normal exposure (dry exposure), immersion exposure and double exposure, a pattern forming method using the positive resist composition and a compound for use in the positive resist composition.Type: GrantFiled: August 11, 2008Date of Patent: August 13, 2013Assignee: FUJIFILM CorporationInventors: Hidenori Takahashi, Kenji Wada, Sou Kamimura
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Patent number: 8501382Abstract: There are disclosed sulfonic acid precursor compositions, as are methods of using these compositions in, for example, photolithography. Other embodiments are also disclosed.Type: GrantFiled: February 19, 2010Date of Patent: August 6, 2013Assignee: The Research Foundation of State Univ. of New YorkInventor: Robert L. Brainard
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Patent number: 8487106Abstract: The present invention relates to a process for preparing 2-methyl-2?-phenylpropionic acid derivatives showing antihistamine activity in more simplified way, intermediate compounds and their preparation processes used therefore. According to the present invention, pharmaceutically useful 2-methyl-2?-phenylpropionic acid derivatives can be prepared with high yield and purity on industrial scale.Type: GrantFiled: December 26, 2012Date of Patent: July 16, 2013Assignee: Yuhan CorporationInventors: Chun-Ho Lee, Ja-Heouk Khoo, Kyoung-Chan Kwon, Hyun Ju
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Publication number: 20130131201Abstract: The invention relates to a novel synthesis method for forming superacid functional molecules that include monomers, as well as new polymers and copolymers formed from the monomers, and uses for these superacid molecules, polymers, and copolymers. The superacid molecules have an alpha,alpha-difluorosulfonic acid functionality that can be obtained by a reaction between various Grignard reagents and an alkyl(2-fluorosulfonyl)-1,1-difluoroacetate, such as methyl(2-fluorosulfonyl-1,1-difluoroacetate. The molecules, polymers and copolymers would be expected to have enhanced ion conductivity, and would be useful in a variety of applications, including as ion-conductive materials, surfactants, and ion exchange resins.Type: ApplicationFiled: August 1, 2011Publication date: May 23, 2013Applicant: Arkema Inc.Inventors: James T. Goldbach, Xiaobo Wan, David A. Mountz
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Patent number: 8435717Abstract: A sulfonic acid onium salt represented by the following formula (1) can be used as a superior radiosensitive acid generator for resist compositions. It is possible to form a good pattern by using a resist composition containing this sulfonic acid onium salt. In formula (1), R1 represents a monovalent organic group, and Q+ represents a sulfonium cation or iodonium cation.Type: GrantFiled: February 14, 2008Date of Patent: May 7, 2013Assignee: Central Glass Company, LimitedInventors: Yuji Hagiwara, Jonathan Joachim Jodry, Satoru Narizuka, Kazuhiko Maeda
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Patent number: 8383274Abstract: Disclosed are a nonaqueous electrolytic solution for lithium secondary battery comprising an electrolyte dissolved in a nonaqueous solvent and containing at least one compound represented by the formula (I) in an amount of from 0.01 to 10% by mass of the nonaqueous electrolytic solution; a lithium battery containing the electrolytic solution and excellent in low-temperature and high-temperature cycle property; and a formyloxy group-containing compound having a specific structure which is used in lithium batteries, etc. (wherein X represents an alkylene group, an alkenylene group or an alkynylene group; R1 represents H, an alkyl group, a cycloalkyl group or a group of the formula (II); R2 represents an alkyl group, a cycloalkyl group or a group of the formula (II); R3 to R7 each represent H, F, a methoxy group or an ethoxy group.Type: GrantFiled: July 1, 2009Date of Patent: February 26, 2013Assignee: Ube Industries, Ltd.Inventor: Koji Abe
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Patent number: 8367704Abstract: The present invention relates to a process for preparing 2-methyl-2?-phenylpropionic acid derivatives showing antihistamine activity in more simplified way, intermediate compounds and their preparation processes used therefor. According to the present invention, pharmaceutically useful 2-methyl-2?-phenylpropionic acid derivatives can be prepared with high yield and purity on industrial scale.Type: GrantFiled: February 12, 2009Date of Patent: February 5, 2013Assignee: Yuhan CorporationInventors: Chun-Ho Lee, Ja-Heouk Khoo, Kyoung-Chan Kwon, Hyun Ju
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Patent number: 8349502Abstract: Disclosed is an electrolyte comprising a compound having both a sulfonate group and a cyclic carbonate group. The electrolyte forms a more stable and dense SEI layer on the surface of an anode, and thus improves the capacity maintenance characteristics and lifespan characteristics of a battery. Also, disclosed is a compound represented by the following Formula 1, and a method for preparing the same by reacting 4-(hydroxyalkyl)-1,3-dioxolan-2-one with a sulfonyl halide compound: wherein each of R1 and R2 independently represents a C1˜C6 alkylene group optionally containing a C1˜C6 alkyl group or C2˜C6 alkenyl group introduced thereto; R3 is selected from the group consisting of a hydrogen atom, C1˜C20 alkyl group, C3˜C8 cyclic alkyl group, C2˜C6 alkenyl group, halo-substituted alkyl group, phenyl group and benzyl group.Type: GrantFiled: September 20, 2007Date of Patent: January 8, 2013Assignee: LG Chem, Ltd.Inventors: Jeong Hwan Koh, Yong Joon Ha, Jin Hyun Park, Chul Haeng Lee, Young Min Lim, Jeong Ae Ahn, Dmitry Pogozhev
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Publication number: 20120330008Abstract: A novel process is described for the preparation of pharmaceutically useful compounds such as 1-{4-[2-(azepan-1-yl)ethoxy]benzyl}-2-(4-hydroxyphenyl)-3-methyl-1H-indol-5-ol acetic acid commonly known as bazedoxifene acetate of the formula-1 using 2-(4-{[5-(benzyloxy)-2-[4-(benzyloxy)phenyl]-3-methyl-1H-indol-1-yl]methyl}phenoxy)ethyl-4-methylbenzenzene-1-sulfonate (formula 2a)Type: ApplicationFiled: September 8, 2011Publication date: December 27, 2012Applicant: DIVI'S LABORATORIES LIMITEDInventors: Murali Krishna Prasad Divi, Gundu Rao Padakandla, Bolneni Nageswara Rao, Dandu Venkata Suresh
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Publication number: 20120301797Abstract: The present invention provides an excellent nonaqueous electrolytic solution capable of improving low-temperature and high-temperature cycle properties and load characteristics after high-temperature charging storage, an electrochemical element using it, and an alkynyl compound used for it. The nonaqueous electrolytic solution of the present invention comprises containing at least one alkynyl compound represented by the following general formula (I) in an amount of from 0.01 to 10% by mass in the nonaqueous electrolytic solution. R1(O)n—X1—R2??(I) (In the formula, X1 represents a group —C(?O)—, a group —C(?O)—C(?O)—, a group —S(?O)2—, a group —P(?O) (—R3)—, or a group —X2—S(?O)2O—.Type: ApplicationFiled: February 2, 2011Publication date: November 29, 2012Applicant: UBE Industries, Ltd.Inventors: Koji Abe, Kazuhiro Miyoshi, Masahide Kondo
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Publication number: 20120291669Abstract: The invention relates to sulfosuccinates of the general formula (1), where M is hydrogen or a cation and the groups R4 and R5—independently of each other—are hydrogen or a cation or an alkyl group, wherein no more than one of the groups R4 or R5 is hydrogen or a cation, wherein said sulfosuccinates contain at least one alcohol building block that is assigned to the mono-alcohols with 8 to 36 carbon atoms in total, on the condition that said mono-alcohols are Guerbet alcohols (GA) containing at least two branches per molecule. Said sulfosuccinates are suitable as surfactants having improved dynamic surface tension.Type: ApplicationFiled: January 14, 2011Publication date: November 22, 2012Applicant: Congnis IP Management GmbHInventors: Stefan Busch, Paul Birnbrich, Eike Ulf Mahnke, Anja Wick
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Publication number: 20120046247Abstract: This invention relates to compounds of Formula (I), (II), or (III) as shown in the specification, which contain a 1,5-diphenylpenta-1,4-dien-3-one backbone. These compounds can be used to treat cancer, inflammatory disease, or autoimmune disease.Type: ApplicationFiled: August 16, 2011Publication date: February 23, 2012Inventors: Charles C-Y Shih, Toshio Kitamura, Qian Shi, Toshiyuki Kawashima, Hui-Kang Wang
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Publication number: 20120029223Abstract: Substituted alkyl methyl malonate compounds are produced in an essentially one step method, the method suitable for large scale production of alkyl malonate compounds. According to one embodiment the method comprises reacting a methyl malonate with a di-functional, doubly tosylated, alkyl chain.Type: ApplicationFiled: July 27, 2010Publication date: February 2, 2012Inventors: Gad Friedman, Andreas Stadelmaier
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Publication number: 20110245110Abstract: Compounds represented by the following structural formulas can be used as photoacid generators: Such compounds are useful, for example, in fabricating arrays of polymers.Type: ApplicationFiled: May 9, 2011Publication date: October 6, 2011Applicant: AFFYMETRIX, INC.Inventors: Glenn H. McGall, Andrea Cupoletti
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Publication number: 20110236827Abstract: The present invention provides a resin obtained by reacting a compound represented by the formula (I): wherein R1 represents a hydrogen atom or a C1-C6 alkyl group, R2, R3 and R4 each independently represents a C1-C6 alkyl group and R1, R2, R3, R4 and A1 are bonded to form a ring, A1 represents a C1-C20 saturated hydrocarbon group in which one or more —CH2— can be replaced by —O—, B1 and B2 each independently represent a C1-C6 alkylene group, L1 and L2 each independently represent a halogen atom, —O—CH?CH2, —O—CH?CH(CH3) or —O—SO2—R? in which R? represents a C1-C6 alkyl group or a C6-C20 aryl group, with a polyhydric phenol compound.Type: ApplicationFiled: March 23, 2011Publication date: September 29, 2011Applicant: SUMITOMO CHEMICAL COMPANY, LIMITEDInventors: Ichiki TAKEMOTO, Nobuo ANDO
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Publication number: 20110207954Abstract: In the present invention, a target alkoxycarbonylfluoroalkanesulfonic acid salt is obtained by using a halofluoroalkanoic acid ester as a starting raw material, sulfinating the halofluoroalkanoic acid ester in the presence of an amine (as a first step), and then, oxidizing the resulting sulfination product (as a second step). Further, an alkoxycarbonylfluoroalkanesulfinic acid onium salt, which is useful as a photoacid generator, is obtained by salt exchange reaction of the alkoxycarbonylfluoroalkanesulfonic acid salt.Type: ApplicationFiled: October 21, 2009Publication date: August 25, 2011Applicant: Central Glass Company, LimitedInventors: Yuji Hagiwara, Ryozo Takihana, Masanori Fushimi, Yoshimi Isono, Satoru Narizuka
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Publication number: 20110183258Abstract: A positive resist composition comprising (A) a compound capable of generating an acid upon irradiation with an actinic ray or radiation, (B) a resin capable of increasing the solubility in an alkali developer by the action of an acid, and (C) a compound having a specific structure, which decomposes by the action of an acid to generate an acid, a pattern forming method using the positive resist composition, and a compound for use in the positive resist composition are provided as a positive resist composition exhibiting good performance in terms of pattern profile, line edge roughness, pattern collapse, sensitivity and resolution in normal exposure (dry exposure), immersion exposure and double exposure, a pattern forming method using the positive resist composition and a compound for use in the positive resist composition.Type: ApplicationFiled: August 11, 2008Publication date: July 28, 2011Applicant: FUJIFILM CORPORATIONInventors: Hidenori Takahashi, Kenji Wada, Sou Kamimura
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Publication number: 20110183199Abstract: Disclosed are a nonaqueous electrolytic solution for lithium secondary battery comprising an electrolyte dissolved in a nonaqueous solvent and containing at least one compound represented by the formula (I) in an amount of from 0.01 to 10% by mass of the nonaqueous electrolytic solution; a lithium battery containing the electrolytic solution and excellent in low-temperature and high-temperature cycle property; and a formyloxy group-containing compound having a specific structure which is used in lithium batteries, etc. (wherein X represents an alkylene group, an alkenylene group or an alkynylene group; R1 represents H, an alkyl group, a cycloalkyl group or a group of the formula (II); R2 represents an alkyl group, a cycloalkyl group or a group of the formula (II); R3 to R7 each represent H, F, a methoxy group or an ethoxy group.Type: ApplicationFiled: July 1, 2009Publication date: July 28, 2011Applicant: UBE INDUSTRIES, LTD.Inventor: Koji Abe
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Publication number: 20110159431Abstract: The present invention provides photoacid generators for use in chemically amplified resists and lithographic processes using the same.Type: ApplicationFiled: June 10, 2009Publication date: June 30, 2011Inventors: Kenneth E. Gonsalves, Mingxing Wang
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Publication number: 20110112293Abstract: The present invention provides novel and advantageous processes for preparing and purifying chemical compounds such as pharmaceuticals. The processes comprise a nucleophilic substitution reaction with a moiety X wherein the leaving group L of a substrate S in the reaction is covalently attached to a purification moiety M. This concept offers a convenient and lime-saving way to purity the desired product S-X from non-reacted precursors S-L-M and by-products L-M.Type: ApplicationFiled: April 9, 2009Publication date: May 12, 2011Applicant: BAYER SCHERING PHARMA AKTIENGESELLSCHAFTInventors: John Cyr, Ananth Srinivasan, Mathias Berndt, Keith Graham, Dae Yoon Chi, Byoung Se Lee, So Young Chu, Song-Yi Lim, Sang Ju Lee, Jin-Sook Ryu, Seung Jun Oh
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Publication number: 20110064998Abstract: Disclosed are (1) a nonaqueous electrolytic solution for lithium battery comprising an electrolyte dissolved in a nonaqueous solvent, which contains at least one hydroxy acid derivative compound represented by the formulae (I) and (II) in an amount of from 0.Type: ApplicationFiled: March 10, 2009Publication date: March 17, 2011Applicant: UBE INDUSTRIES, LTD.Inventors: Koji Abe, Kazuyuki Kawabe
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Publication number: 20110009636Abstract: The present invention relates to a process for preparing 2-methyl-2?-phenylpropionic acid derivatives showing antihistamine activity in more simplified way, intermediate compounds and their preparation processes used therefor. According to the present invention, pharmaceutically useful 2-methyl-2?-phenylpropionic acid derivatives can be prepared with high yield and purity on industrial scale.Type: ApplicationFiled: February 12, 2009Publication date: January 13, 2011Inventors: Chun-Ho Lee, Ja-Heouk Khoo, Kyoung-Chan Kwon, Hyun Ju
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Publication number: 20110009638Abstract: Disclosed is a method for preparing a compound of Formula 1 wherein Q and Z are as defined in the disclosure comprising distilling water from a mixture comprising a compound of Formula 2, a compound of Formula 3, a base comprising at least one compound selected from the group consisting of alkaline earth metal hydroxides of Formula 4 wherein M is Ca, Sr or Ba, alkali metal carbonates of Formula 4a wherein M1 is Li, Na or K, 1,5-diazabicyclo[4.3.0]non-5-ene and 1,8-diazabicyclo[5.4.0]undec-7-ene, and an aprotic solvent capable of forming a low-boiling azeotrope with water.Type: ApplicationFiled: April 8, 2009Publication date: January 13, 2011Applicant: E.I. DU PONT DE NEMOURS AND COMPANYInventor: Gary David Annis
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Publication number: 20100304293Abstract: A salt represented by the formula (a): wherein Q1 and Q2 each independently represent a fluorine atom etc., X1 represents a single bond etc., X2 represents a single bond etc., Y1 represents a C3-C6 alicyclic hydrocarbon group etc., with the proviso that —X2—Y1 group has one or more fluorine atoms, and Z+ represents an organic counter cation, and a photoresist composition comprising the salt represented by the formula (a) and a resin comprising a structural unit having an acid-labile group and being insoluble or poorly soluble in an aqueous alkali solution but becoming soluble in an aqueous alkali solution by the action of an acid.Type: ApplicationFiled: May 25, 2010Publication date: December 2, 2010Applicant: SUMITOMO CHEMICAL COMPANY, LIMITEDInventors: Koji ICHIKAWA, Isao Yoshida
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Publication number: 20100273105Abstract: A resist composition including a base material component (A) which exhibits changed solubility in an alkali developing solution under action of acid, and an acid generator component (B) which generates acid upon exposure, the acid generator component (B) including an acid generator (B1) consisting of a compound represented by general formula (b1-1) shown below: wherein RX represents a hydrocarbon group which may have a hetero atom; R1 represents a divalent linking group; Y1 represents an alkylene group of 1 to 4 carbon atoms or a fluorinated alkylene group of 1 to 4 carbon atoms; n represents an integer of 1 to 3; and Z represents an organic cation (exclusive of an amine ion and a quaternary ammonium ion) having a valence of n.Type: ApplicationFiled: April 22, 2010Publication date: October 28, 2010Applicant: TOKYO OHKA KOGYO CO., LTD.Inventors: Yoshiyuki Utsumi, Takehiro Seshimo
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Publication number: 20100215610Abstract: Methods and compositions are provided for forming ester based compositions. The ester based compositions may be used in consumer products. In one aspect, a method is provided for producing acyl alkylisethionate esters by the esterification of a sulfonate composition having two or more sulfonate isomers with fatty acid(s). In another aspect, a method is provided for forming an ester based composition including a blend of acyl alkylisethionate and acylisethionate esters.Type: ApplicationFiled: May 1, 2007Publication date: August 26, 2010Applicant: Huntsman Petrochemical CorporationInventors: Prakasa R. Anantaneni, George A. Smith, Martin J. Renner
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Publication number: 20100016623Abstract: The present invention concerns the use of dibutyl tin oxide for regioselective catalytic diol mono-tosylation at a concentration lower than 2 mol %. The present invention also concerns the use of a generic acetal compound of Formula (Ic) in a catalytic process for regioselective diol mono-tosylat ion, wherein Y is selected from the group of C1-6alkyl, phenyl and benzyl. The concentration of the generic acetal compound of Formula (Ic) is less than about 2 mol %, preferably ranges between about 2 mol % and about 0.0005 mol %, preferably ranges between about 0.1 mol % and about 0.005 mol %.Type: ApplicationFiled: November 9, 2007Publication date: January 21, 2010Inventors: Michel Joseph Maurice Guillaume, Yolande Lydia Lang
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Publication number: 20090291390Abstract: An acid generating agent represented by the following formula (1) or (2) is provided, which is included in chemically amplified resist compositions: wherein in the formula (1) and (2), X represents an unsubstituted or substituted alkyl group having 1 to 20 carbon atoms and selected from alkyl, haloalkyl and alkylsulfonyl, which may have at least one hydrogen atom substituted by an ether group, an ester group, a carbonyl group, an acetal group, a nitrile group, a cyano group, a hydroxyl group, a carboxyl group or an aldehyde group, or represents a perfluoroalkyl group having 1 to 4 carbon atoms; R6 represents an alkyl group having 1 to 10 carbon atoms, an alkoxy group having 1 to 10 carbon atoms, or a heteroatom selected from nitrogen, sulfur, fluorine and oxygen; m is an integer from 0 to 2; and A+ is an organic counterion.Type: ApplicationFiled: September 5, 2008Publication date: November 26, 2009Applicant: Korea Kumho Petrochemical Co., Ltd.Inventors: Sung-Do Jung, Jin-Ho Kim, Jung-Hoon Oh, Hyun-Soon Lim
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Patent number: 7498431Abstract: Processes for preparing compounds of formula I are disclosed comprising the steps of: (a) forming of chiral propionic acid ester compounds of formula V. (b) reacting compounds of formula V with aniline compounds to yield compounds of formula I.Type: GrantFiled: December 1, 2005Date of Patent: March 3, 2009Inventor: Bomi Patel Framroze
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Patent number: 7449599Abstract: The present invention is directed to phenyl carboxamide compounds which are inhibitors of the beta-secretase enzyme and that are useful in the treatment of diseases in which the beta-secretase enzyme is involved, such as Alzheimer's disease. The invention is also directed to pharmaceutical compositions comprising these compounds and the use of these compounds and compositions in the treatment of such diseases in which the beta-secretase enzyme is involved.Type: GrantFiled: May 9, 2005Date of Patent: November 11, 2008Assignee: Merck + Co Inc.Inventors: Craig A. Coburn, Thomas G. Steele, Joseph P. Vacca, David Allen Annis, Jr., Gergely M. Makara, Huw M. Nash, Praveen K. Tadikonda, Tong Wang
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Publication number: 20080124656Abstract: Sulfonate salts have the formula: R1COOCH2CH2CF2CF2SO3?M+ wherein R1 is alkyl, aryl or hetero-aryl, M+ is a Li, Na, K, ammonium or tetramethylammonium ion. Onium salts, oxime sulfonates and sulfonyloxyimides derived from these salts are effective photoacid generators in chemically amplified resist compositions.Type: ApplicationFiled: June 25, 2007Publication date: May 29, 2008Applicant: SHIN-ETSU CHEMICAL CO., LTD.Inventors: Katsuhiro KOBAYASHI, Youichi OHSAWA, Takeshi KINSHO, Takeru WATANABE
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Publication number: 20080081925Abstract: The present invention provides a sulfonium compound represented by the formula (I): wherein Q1 and Q2 each independently represent a fluorine atom or a C1-C6 perfluoroalkyl group, and A+ represents an organic counter ion.Type: ApplicationFiled: August 10, 2007Publication date: April 3, 2008Applicant: SUMITOMO CHEMICAL COMPANY, LIMITEDInventors: Hiromu Sakamoto, Yukako Harada
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Patent number: 7276539Abstract: A compound of formula I wherein R1 represents chloro, fluoro or hydroxy as well as optical isomers and racemates thereof as well as pharmaceutically acceptable salts, prodrugs, solvates and crystalline forms thereof, processes for preparing such compounds, their utility in treating clinical conditions associated with insulin resistance, methods for their therapeutic use and pharmaceutical compositions containing them.Type: GrantFiled: December 18, 2002Date of Patent: October 2, 2007Assignee: AstraZeneca ABInventors: Eva-Lotte Alstermark Lindstedt, Anna Maria Persdotter Boije, Patrick Holm
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Patent number: 7002008Abstract: A process for preparing a compound of the formula comprising: (a) formation of 3(S)-(4-hydroxyphenyl)-3-methanesulfonyloxy-propionic acid methyl ester compound of the formula (b) cyclization of the product of Step (a) with 4-fluoroaniline to yield 1-(4-fluorophenyl)-4(S)-(4-hydroxyphenyl)-azetidin-2-one.Type: GrantFiled: June 16, 2003Date of Patent: February 21, 2006Inventor: Bomi Patel Framroze
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Publication number: 20040260110Abstract: Methyl (R)-2-(R1OSO2)-2-(2-chlorophenyl)acetates useful as intermediates in the preparation of methyl (S)-2(2-chlorophenyl)-2-(4,5,6,7-tetrahydrothieno[3,2-c]-5-pyridyl)acetate.Type: ApplicationFiled: July 14, 2004Publication date: December 23, 2004Inventors: Andre Bousquet, Andree Musolino
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Patent number: RE41151Abstract: In accordance with the present invention, there are provided normal modified forms of nonsteroidal anti-inflammatory drugs. Modified NSAIDs according to the invention provide a new class of anti-inflammatory agent which provide the therapeutic benefits of NSAIDs while causing a much lower incidence of side-effects then typically observed with such agents.Type: GrantFiled: August 20, 2008Date of Patent: February 23, 2010Assignee: Medinox, Inc.Inventors: Ching-San Lai, Tingmin Wang