Abstract: Methods for forming a pattern in a lithography process for semiconductor wafer manufacturing are provided. In an example, a method includes forming a photoresist layer over a material layer; performing a first exposure process on the photoresist layer, thereby forming an exposed photoresist layer having soluble portions and unsoluble portions; treating the exposed photoresist layer, wherein the treating includes one of performing a second exposure process on the exposed photoresist layer and forming an adsorbing chemical layer over the exposed photoresist layer; and developing the exposed and treated photoresist layer to remove the soluble portions of the photoresist layer, wherein the unsoluble portions of the photoresist layer form a photoresist pattern that exposes portions of the material layer.

Abstract: The present invention provides a method of making sulfur containing fluoroalkyl amines which overcomes the problems of previously known methods. Sulfur containing fluoroalkyl amines are useful as intermediates for compounds which are in turn useful for imparting water and oil repellency to textiles. Sulfur containing fluoroalkyl amines used in this manner may be found in Example 8 of Rondestvedt et al. (U.S. Pat. No. 3,655,732) wherein they are made by reacting an iodo-fluoroalkyl with an aminoalkyl thiol. Specifically, Rondestvedt et al. teaches reacting CF3(CF2)5(CH2)2I (an iodo-fluoroalkyl) with HS—CH2CH2—NH2 (an aminoalkyl thiol) to make CF3(CF2)5(CH2)2—S—CH2CH2—NH2 (a sulfur containing fluoroalkyl amine). Unlike previously known methods, the method of the present invention can achieve higher yields of sulfur containing fluoroalkyl amines without resorting to costly solvents.

Abstract: A magnetic recording medium having high bonding capability between the surface lubricant and the diamond-like carbon (DLC) protective layer in the surface of the magnetic recording medium is disclosed. The lubricant is a fluorine-containing lubricant for magnetic recording media represented by the following formula (1), (2) or (3), wherein the substituents R1, R2, R3, R4, R5 and R6 in the terminal part of the lubricant each independently represent an organic group, and at least one of the substituents R1 and R2, at least one of the substituents R3 and R4, and at least one of the substituents R5 and R6 each have an isocyanate group: Also disclosed is a magnetic recording medium using the lubricant.

Abstract: The present invention relates to blocked fluorine-containing polyisocyanates which have a fluorine content, calculated as F=19, of 1.0 to 20.0 wt. %, preferably 4.0 to 10.0 wt. %, and are suitable for preparing stoving coatings having a water- and soil-repellent surface, wherein the fluorine-containing polyisocyanates are based on the reaction product of aliphatic polyisocyanates or polyisocyanate mixtures having an NCO content of 10 to 25 wt. % and a functionality of at least 2.5 with monofunctional isocyanate blocking agents and a fluorinated monoalcohols wherein i) 75 to 95 equivalent-% of the isocyanate groups are reacted with isocyanate blocking agents, ii) 5 to 25 equivalent-% of the isocyanate groups are reacted with fluorinated monoalcohols and iii) the equivalents of i) and ii) add up to 100%.

Abstract: The invention relates to monomers derived from perhalogenated sultones, to a process for their preparation, to the polymers obtained from the said monomers and to their use for the production of ion-conductive materials.The monomers are compounds corresponding to the formula A--CFX--SO.sub.2 Z in which A denotes one groups [sic] R.sup.3 --O--CF.sub.2 -- or R.sup.3 -- or R.sup.1 R.sup.2 N--CO--; Z denotes F, Cl, --OSi(CH.sub.3).sub.3 or an ionic group, Z being other than F when A denotes R.sup.3 --O--CF.sub.2 -- or R.sup.3 --; X denotes F, Cl, H or R.sub.F, X being R.sub.F when A denotes R.sup.3 --; the radicals R.sup.1, R.sup.2 and R.sup.3 are chosen from polymerizable nonperfluorinated organic radicals; R.sub.F is chosen from perfluoroalkyl radicals and perfluoroaryl radicals.The polymers obtained from these monomers can be employed for the production of ion-conductive materials.

Abstract: A substrate having oil-, water- and soil-repellency and/or soil release properties is produced by treating the substrate with a polyfluoro organic compound having at least 1 urea linkage derived from: (A) at least 1 polyisocyanate which contains at least three isocyanate groups per molecule, (B) at least 1 fluorochemical compound which contains (i) a single functional group having 1 or more Zerewitinoff hydrogen atom S and (ii) at least 2 carbon atoms each of which contains at least 2 fluorine atoms, and (C) sufficient water to react with from about 5% to about 60% of the isocyanate groups.

Abstract: Novel trans-beta-isocyanatoacrylate esters, their preparation and use in forming novel polymeric compositions, including polymers useful as adhesives, are disclosed. The trans-beta-isocyanatoacrylate esters have the formula: ##STR1## wherein R is C.sub.1 -C.sub.18 linear or branched alkyls; C.sub.5 -C.sub.6 cycloalkyl; aryl; alkaryl; aralkyl; C.sub.1 -C.sub.18 halogenated alkyl; halogenated aryl; C.sub.1 -C.sub.8 alkoxyalkyl; or alkoxyaryl.

Abstract: The invention relates to a process for the preparation of known .beta.-halogeno-tert.-alkyl isocyanates of the formula ##STR1## in which X represents chlorine,Y represents hydrogen or chlorine,R.sub.1 represents in each case straight-chain or branched alkyl or halogenoalkyl andR.sub.2 represents in each case straight-chain or branched alkyl, halogenoalkyl or optionally halogen- and/or trifluoromethyl-substituted phenyl,where tert.-alkyl isocyanates of the formula (II) ##STR2## in which R.sub.1 and R.sub.2 have the meaning given above,are converted to the corresponding tert.-alkylcarbamoyl chlorides by means of hydrogen chloride gas, these are reacted with elemental chlorine under irradiation or in the presence of catalysts, and finally the .beta.-halogeno-tert.-alkyl isocyanates are liberated by dehydrohalogenation at elevated temperature.

Abstract: The invention relates to a new process for the preparation of known .beta.-halogeno-tert.-alkyl isocyanates of the formula ##STR1## in which X represents chlorine,Y represents hydrogen or chlorine,R.sup.1 represents in each case straight-chain or branched alkyl or halogeno alkyl andR.sup.2 represents in each case straight-chain or branched alkyl or halogeno alkyl or optionally halogen-and/or trifluoromethyl-substituted phenyl,where tert.-alkyl isocyanates of the formula (II) ##STR2## are reacted with chlorine, optionally under irradiation or in the presence of catalysts, in a suitable apparatus.

Abstract: Organic mono- or di-isocyanates are prepared by the decomposition of the corresponding urethanes, by means of a continuous process in which:(a) an urethane flow is continuously fed to a decomposition reactor containing a liquid mixture, composed of a high boiling inert organic solvent, of an unaltered urethane and isocyanate, kept at the boiling conditions of the solvent, at a temperature suitable to decompose the urethane and evaporate the alcohol which is the co-product of the reaction;(b) the liquid mixture is continuously withdrawn from the reactor in (a) and is fed to a flash equipment, at an operating temperature lower than the decomposition temperature of the urethane, where the isocyanate is partially evaporated and the residuous liquid mixture is recycled to the reactor in (a); and(c) the steam flow generated in (b) is distilled to separate the isocyanate in pure or substantially pure form.

Abstract: Substituted ethylamines of the formula ##STR1## wherein R.sub.1 is phenyl optionally mono-, di- or trisubstituted by halogen, lower alkyl, lower haloalkyl or lower alkoxy, or is an aromatic heterocycle having 5 to 7 chains wherein the heteroatom is nitrogen, oxygen or sulfur,R.sub.2 is lower alkyl,R.sub.3 and R.sub.4, each independently, represent hydrogen, lower alkyl or lower alkenyl,R.sub.5 is phenyl optionally mono-, di- or trisubstituted by halogen or lower alkoxy or is an aromatic heterocycle having 5 to 7 chains wherein the heteroatom is nitrogen, oxygen or sulfur andQ represents a --CH.dbd.CH-- ethylene group or a 1,2-diyl ##STR2## propane group, their acid addition salts and their optically active forms. These substituted ethylamines have psycotropic properties and are useful as medicines.

Abstract: Polyfluorinated diisocyanates having the formula OCN--CH.sub.2 CH.sub.2 --(CF.sub.2).sub.n --CH.sub.2 CH.sub.2 --NCO, in which n is a whole number from 2 to 16, inclusive, and their analogous monofunctional isocyanates having the formula F(CF.sub.2).sub.n --CH.sub.2 CH.sub.2 --NCO, wherein n is a whole number from 1 to 20, inclusive. The polyfluorinated diisocyanates react with polyfluorinated diols having the formula HO--CH.sub.2 CH.sub.2 --(CF.sub.2).sub.n --CH.sub.2 CH.sub.2 --OH, wherein n is a whole number of from 1 to 20, inclusive, to form useful fluorinated polyurethanes.

Abstract: The reaction of a zinc compound compound of formula IIICF.sub.3 CCl.sub.2 ZnCl.yL (III)wherein y is 1 or 2 and L is a solvent ligand selected from the group consisting of the N-disubstituted acid amides, N-substituted lactams and organic sulfoxides, with an aldehyde of formula IIR--CHO (II)wherein R is an aliphatic or aromatic hydrocarbon radical or an aliphatic or aromatic heterocyclic radical, gives 1-propanols of formula I ##STR1## in high yields.

Abstract: New anisotropic compounds of the formula (1) are useful in liquid crystal mixtures for electrooptical displays; at least one of the end groups of the compounds (1) is an alkyl group which carries cyano or halogen in a terminal or non-terminal position. This offers advantages for longitudinal polarization and/or cross-polarization of the anisotropic compounds with the aid of the comparatively highly polarizing cyano or halogen substituents, in particular high clear points, low .DELTA..epsilon./.epsilon..perp. values and/or negative .DELTA..epsilon. values.

Abstract: Perfluoropolyether oligomers or block polymers, having a backbone with one or a plurality of perfluoropolyether segments each consisting essentially of (1) at least one perfluoroisopropyleneoxy unit, (2) a bis(perfluoromethyleneoxy-terminated) unit, and (3) a perfluoroethylidene unit terminating each segment, the backbone of the perfluoropolyether being terminated with COF and/or a functional or nonfunctional derivative thereof, said perfluoropolyethers being made by reacting a perfluoroaliphatic diacid fluoride with hexafluoropropylene epoxide to produce an acid fluoride-terminated perfluoropolyether adduct or oligomer which then can be photopolymerized to yield an acid fluoride-terminated perfluoropolyether block polymer. These oligomers and block polymers are useful as high temperature lubricants, hydraulic fluids, gaskets, adhesives and coatings as well as co-reactants wtih urethane in forming propellant binders.