Annealing Patents (Class 65/117)
  • Patent number: 10894901
    Abstract: The present invention provides a method for producing a polishing composition which can polish an object to be polished at a high polishing speed and with fewer scratches (defects). The present invention is a method for producing a polishing composition, the method including: preparing silica in which an intensity of a peak of a silica four-membered ring structure and an intensity of a peak derived from a silica random network structure when analyzed by Raman spectroscopy satisfy a predetermined requirement; and mixing the silica with a dispersing medium.
    Type: Grant
    Filed: June 12, 2017
    Date of Patent: January 19, 2021
    Assignee: FUJIMI INCORPORATED
    Inventors: Yoshihiro Izawa, Shota Suzuki
  • Patent number: 10710920
    Abstract: According to one embodiment, a method for thermally treating glass articles may include holding a glass article at a treatment temperature equal to an annealing temperature of the glass article ±15° C. for a holding time greater than or equal to 5 minutes. Thereafter, the glass article may be cooled from the treatment temperature through a strain point of the glass article at a first cooling rate CR1 less than 0° C./min and greater than ?20° C./min such that a density of the glass article is greater than or equal to 0.003 g/cc after cooling. The glass article is subsequently cooled from below the strain point at a second cooling rate CR2, wherein |CR2|>|CR1|.
    Type: Grant
    Filed: December 30, 2015
    Date of Patent: July 14, 2020
    Assignee: CORNING INCORPORATED
    Inventors: Adam James Ellison, Timothy James Kiczenski, Stephanie Lynn Morris, Robert Anthony Schaut, Steven Alvin Tietje
  • Patent number: 9487426
    Abstract: A method for heat treating a synthetic quartz glass having a hydroxyl concentration with a maximum/minimum difference (?OH) of less than 350 ppm involves the steps of first heat treatment of holding at 1,150-1,060° C. for a time of 0.5-10 hours, cooling down to a second heat treatment temperature at a rate of ?7° C./hr to ?30° C./hr, second heat treatment of holding at 1,030-950° C. for a time of 5-20 hours, and annealing at a rate of ?25° C./hr to ?85° C./hr. Two stages of heat treatment ensures that the glass has a low birefringence.
    Type: Grant
    Filed: February 13, 2015
    Date of Patent: November 8, 2016
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Hisashi Yagi, Masaki Takeuchi, Daijitsu Harada
  • Patent number: 9010151
    Abstract: A glass sheet cutting device fuses and divides a glass substrate using a preset cutting line as a boundary while supplying an assist gas and a laser beam from above the glass substrate along the preset cutting line of the glass substrate. The glass sheet cutting device includes a first laser irradiator for radiating a fusing laser beam and a second laser irradiator for radiating an annealing laser beam. Through a fusing gap formed between fused end surfaces by fusing, the second laser irradiator radiates the annealing laser beam obliquely from above onto the fused end surface to be annealed.
    Type: Grant
    Filed: September 14, 2012
    Date of Patent: April 21, 2015
    Assignee: Nippon Electric Glass Co., Ltd.
    Inventors: Takahide Fujii, Setsuo Uchida, Naotoshi Inayama, Takayuki Noda, Sho Itoh, Michiharu Eta
  • Publication number: 20150080206
    Abstract: Silica-titania glasses with small temperature variations in coefficient of thermal expansion over a wide range of zero-crossover temperatures and methods for making the glasses. The method includes a cooling protocol with controlled anneals over two different temperature regimes. A higher temperature controlled anneal may occur over a temperature interval from 750° C.-950° C. or a sub-interval thereof. A lower temperature controlled anneal may occur over a temperature interval from 650° C.-875° C. or a sub-interval thereof. The controlled anneals permit independent control over CTE slope and Tzc of silica-titania glasses. The independent control provides CTE slope and Tzc values for silica-titania glasses of fixed composition over ranges heretofore possible only through variations in composition.
    Type: Application
    Filed: September 2, 2014
    Publication date: March 19, 2015
    Inventor: Carlos Alberto Duran
  • Patent number: 8893527
    Abstract: A method for annealing a glass disk is disclosed. The glass disk is placed on a base, whereby the bottom surface of the glass disk makes a contact with the base, and the top surface of the glass disk is exposed to air. The glass disk is heated with thermal energy supplied to the glass disk, the thermal energy comprising first thermal energy supplied from the air through the top surface and second thermal energy supplied from the base through the bottom surface.
    Type: Grant
    Filed: July 21, 2011
    Date of Patent: November 25, 2014
    Assignee: WD Media, LLC
    Inventors: Richie Y. Chan, Magenthiran Verapatran, Mohamad F. Azmi, Beehuah Ong
  • Patent number: 8857215
    Abstract: Disclosed is an apparatus and method for heat treating glass sheets, and in particular for heat treating very thing glass sheets arranged in closely spaced stacks. The glass sheets are positioned on a moving belt such that their major surfaces are substantially perpendicular to a direction of belt travel through the apparatus to aid in producing a uniform temperature profile within the glass sheets. The apparatus comprises air curtains positioned at the inlet and outlet of the apparatus to minimize the ingress of particulate into the apparatus. A reduced velocity of heated air flow within a lower portion of the apparatus relative to a velocity of the heated air in an upper portion of the apparatus causes particulate to drop out of the lower portion air flow. A rotating brush and vacuums positioned adjacent a lower portion of the belt assist in removing particulate from the moving belt.
    Type: Grant
    Filed: May 16, 2012
    Date of Patent: October 14, 2014
    Assignee: Corning Incorporated
    Inventors: George O. Dale, Juergen Tinz
  • Patent number: 8850852
    Abstract: A method for processing a coated glass substrate may include a high-temperature activation process.
    Type: Grant
    Filed: June 28, 2011
    Date of Patent: October 7, 2014
    Assignee: First Solar, Inc
    Inventors: Daniel Burgard, Joshua Conley, James Hinkle, Stephen Murphy, Thomas Truman
  • Publication number: 20140290310
    Abstract: Methods for processing glass using select wavelength radiation in a convective environment, broadly referred to as “Local Temporary Annealing”, “LASER Edge Strengthening” and “LASER Enhanced Thermal Strengthening.” Local Temporary Annealing allows strengthened glass to be brought to a neutral stress state so daughter units can be cut from strengthened glass and other processes usually only performed on annealed glass. LASER Edge Strengthening allows surface compression to be thermally imparted to the edges of a whole sheet or daughter units cut from annealed glass, or modification of residual edge stress profiles in strengthened glass to produce stable, strengthened edges. LASER Enhanced Thermal Strengthening allows surface compression to be imparted to a sheet of annealed glass whilst maintaining reduced surface temperatures so the glass has superior geometric stability and surface compression can be imparted at levels not conventionally possible.
    Type: Application
    Filed: July 30, 2013
    Publication date: October 2, 2014
    Inventor: Richard Green
  • Publication number: 20140165654
    Abstract: Surface modification layers and associated heat treatments, that may be provided on a sheet, a carrier, or both, to control both room-temperature van der Waals (and/or hydrogen) bonding and high temperature covalent bonding between the thin sheet and carrier. The room-temperature bonding is controlled so as to be sufficient to hold the thin sheet and carrier together during vacuum processing, wet processing, and/or ultrasonic cleaning processing, for example. And at the same time, the high temperature covalent bonding is controlled so as to prevent a permanent bond between the thin sheet and carrier during high temperature processing, as well as maintain a sufficient bond to prevent delamination during high temperature processing.
    Type: Application
    Filed: October 7, 2013
    Publication date: June 19, 2014
    Applicant: Corning Incorporated
    Inventors: Robert Alan Bellman, Dana Craig Bookbinder, Robert George Manley, Prantik Mazumder
  • Patent number: 8713969
    Abstract: The disclosure describes a method by which the Tzc of a silica-titania glass article, for example, a EUVL mirror substrate, can be tuned to within a specification range by means of a selected final anneal that shifts Tzc of the article or substrate to the desired Tzc value. In addition, since different mirrors in a set can be specified at different values of Tzc, this process can be on used glass samples or pieces from a single glass boule to make parts with different Tzc values, thus reducing the number of separate boules required to fill an order.
    Type: Grant
    Filed: August 26, 2010
    Date of Patent: May 6, 2014
    Assignee: Corning Incorporated
    Inventors: Carlos Duran, Kenneth Edward Hrdina
  • Publication number: 20140053608
    Abstract: [Problem] The provision of a synthetic quartz glass heat treatment method that can, by a single heat treatment, and without particular limitations on the OH group concentration distribution of the starting material, regulate the birefringence fast axis direction in the synthetic quartz glass after it has been heat-treated. [Means of Overcoming the Problem] A heat treatment method for synthetic quartz glass whereby columnar synthetic quartz glass having two opposing end faces and a lateral face is heat-treated covered with thermal insulator; wherein said heat treatment is performed using as end face thermal insulator which covers said two end faces, and as lateral face thermal insulator which covers said lateral face, thermal insulators that differ in at least either type or thickness to afford different thermal insulation effects such that the birefringence fast axis direction of said synthetic quartz glass is regulated.
    Type: Application
    Filed: July 18, 2013
    Publication date: February 27, 2014
    Applicants: SHIN-ETSU QUARTZ PRODUCTS CO., LTD., HERAEUS QUARZGLAS GMBH & CO. KG
    Inventor: Shigeo Harada
  • Publication number: 20140000090
    Abstract: An optical ceramic material heat treatment apparatus, comprising: a furnace body that is capable to contain an optical ceramic material to be heat treated in the inside thereof; a temperature drop control heater that generates heat during dropping a temperature of the optical ceramic material; a refrigerant intake unit that introduces a refrigerant into the inside of the furnace body to flow the refrigerant therein; and a control unit that controls the temperature drop rate, wherein the temperature drop control heater is arranged in the inside of the furnace body and/or in the refrigerant intake unit, the control unit controls at least one of an amount of heat generation of the temperature drop control heater, and a flow rate of the refrigerant in the inside of the furnace body to control a temperature drop rate at the optical ceramic material or in the vicinity thereof to be kept in a predetermined profile.
    Type: Application
    Filed: September 3, 2013
    Publication date: January 2, 2014
    Inventor: Yuta HARA
  • Patent number: 8618442
    Abstract: A nozzle housing assembly, which is used in a convection heating furnace for a heat treatable glass sheet. The nozzle housing assembly comprises an elongated enclosure, at least one elongated heating resistance in the enclosure for heating convection air, and orifices in a bottom surface of the enclosure for blasting heated convection air against the glass sheet. The enclosure is divided with a flow-throttling partition into a top supply duct and a bottom nozzle box, the heating resistances being housed in the latter. Flow-throttling openings present in the partition are positioned to comply with the location and shape of the heating resistances.
    Type: Grant
    Filed: August 23, 2011
    Date of Patent: December 31, 2013
    Assignee: Glaston Services Ltd. Oy
    Inventor: Mikko Rantala
  • Patent number: 8596094
    Abstract: A method of making a silica glass having a uniform fictive temperature. The glass article is heated at a target fictive temperature, or heated or cooled at a rate that is less than the rate of change of the fictive temperature, for a time that is sufficient to allow the fictive temperature of the glass to come within 3° C. of the target fictive temperature. The silica glass is then cooled from the target fictive temperature to a temperature below the strain point of the glass at a cooling rate that is greater than the relaxation rate of the glass at the target fictive temperature. The silica glass has a fictive temperature that varies by less than 3° C. after the annealing step. A silica glass made by the method is also described.
    Type: Grant
    Filed: October 12, 2010
    Date of Patent: December 3, 2013
    Assignee: Corning Incorporated
    Inventors: Carlos Duran, Kenneth Edward Hrdina, Ulrich Wilhelm Heinz Neukirch
  • Patent number: 8590342
    Abstract: The present invention relates to a process for production of a TiO2—SiO2 glass body, comprising a step of, when an annealing point of a TiO2—SiO2 glass body after transparent vitrification is taken as T1(° C.), holding the glass body after transparent vitrification in a temperature region of from T1?90(° C.) to T1?220(° C.) for 120 hours or more.
    Type: Grant
    Filed: November 14, 2011
    Date of Patent: November 26, 2013
    Assignee: Asahi Glass Company, Limited
    Inventors: Akio Koike, Takahiro Mitsumori, Yasutomi Iwahashi, Tomonori Ogawa
  • Patent number: 8578739
    Abstract: An optical fiber apparatus is suitable to operate under irradiation, more particularly to mitigating the damage of a rare-earth-doped optical fiber element as part of an optical fiber assembly causes by irradiation. The irradiation mitigation attributes to a photo-annealing apparatus including at least a shorter wavelength photo-annealing spectral content, which is relative to that of a pump light source, for effectively photo-annealing the rare-earth-doped fiber element. Photo-annealing by such shorter wavelength light results in a fast and nearly complete recovery of radiation induced attenuation of the rare-earth-doped optical fiber element in the wavelength range from 900 nm to 1700 nm.
    Type: Grant
    Filed: October 4, 2010
    Date of Patent: November 12, 2013
    Assignee: National Applied Research Laboratories
    Inventors: Tz-Shiuan Peng, Ren-Young Liu, Lon Wang
  • Patent number: 8402786
    Abstract: A process for producing a synthetic silica glass optical component which contains at least 1×1017 molecules/cm3 and has an OH concentration of at most 200 ppm and substantially no reduction type defects, by treating a synthetic silica glass having a hydrogen molecule content of less than 1×1017 molecules/cm3 at a temperature of from 300 to 600° C. in a hydrogen gas-containing atmosphere at a pressure of from 2 to 30 atms.
    Type: Grant
    Filed: October 30, 2002
    Date of Patent: March 26, 2013
    Assignee: Asahi Glass Company, Limited
    Inventors: Yoshiaki Ikuta, Shinya Kikugawa, Akio Masui, Noriaki Shimodaira, Shuhei Yoshizawa
  • Patent number: 8402790
    Abstract: To provide a process to improve acid resistance of a glass substrate for an information recording medium. A process for producing a glass substrate for an information recording medium, comprising processing a glass formed into a plate by a float process, a down-draw method or a press method, wherein, in cooling of the glass in the last step where the glass has a temperature of at least its strain point, the time during which the glass temperature is at least its strain point and at most a temperature where the glass viscosity is 1010 dPa·s is at least 13 minutes.
    Type: Grant
    Filed: October 21, 2010
    Date of Patent: March 26, 2013
    Assignee: Asahi Glass Company, Limited
    Inventors: Jun Endo, Tetsuya Nakashima
  • Publication number: 20130021602
    Abstract: A mode-locked laser system operable at low temperature can include an annealed, frequency-conversion crystal and a housing to maintain an annealed condition of the crystal during standard operation at the low temperature. In one embodiment, the crystal can have an increased length. First beam shaping optics can be configured to focus a beam from a light source to an elliptical cross section at a beam waist located in or proximate to the crystal. A harmonic separation block can divide an output from the crystal into beams of different frequencies separated in space. In one embodiment, the mode-locked laser system can further include second beam shaping optics configured to convert an elliptical cross section of the desired frequency beam into a beam with a desired aspect ratio, such as a circular cross section.
    Type: Application
    Filed: March 5, 2012
    Publication date: January 24, 2013
    Applicant: KLA-Tencor Corporation
    Inventors: Vladimir Dribinski, Yung-Ho Alex Chuang, J. Joseph Armstrong, John Fielden
  • Publication number: 20120297830
    Abstract: A method for improving the thermo-mechanical properties of an aluminum-titanate composite, the composite including at least one of strontium-feldspar, mullite, cordierite, or a combination thereof, including: combining a glass source and an aluminum-titanate source into a batch composition; and firing the combined batch composite composition to produce the aluminum-titanate composite. Another method for improving the thermo-mechanical properties of the composite dips a fired composite article into phosphoric acid, and then anneal the dipped composite article. The resulting composites have a thin glass film situated between the ceramic granules of the composite, which can arrest microcrack propagation.
    Type: Application
    Filed: May 27, 2011
    Publication date: November 29, 2012
    Inventors: Monika Backhaus-Ricoult, Christopher Raymond Glose
  • Patent number: 8316668
    Abstract: A method for manufacturing glass hard disk substrates comprises annealing and then tempering previously formed glass hard disk substrates. The annealed and tempered glass hard disk substrates have improved strength and stress resistance without chemical treatments.
    Type: Grant
    Filed: September 23, 2010
    Date of Patent: November 27, 2012
    Assignee: WD Media, Inc.
    Inventors: Richie Yuan Lin Chan, Magenthiran Verapatran, Mohamad Faisal Azmi, Beehuah Ong
  • Publication number: 20120291490
    Abstract: A method and an apparatus for annealing a glass sheet, which can sufficiently reduce ITT formed in the glass sheet, are provided. In the method for annealing a glass sheet G of the present invention, in a state that a heated and bent glass sheet G is placed on a forming mold 16, first, a region of the glass sheet G to be lifted up is cooled by cooling devices 20, 22, to make the temperature of the region to be lifted up to be a temperature of at most the strain point. Next, in this state, a lift-up member 36 is operated to lift up the region of the glass sheet G to be lifted up, by rods 38, 38 . . . , to separate the glass sheet G from the forming mold 16.
    Type: Application
    Filed: July 31, 2012
    Publication date: November 22, 2012
    Applicant: Asahi Glass Company, Limited
    Inventors: Hiroshi YAMAKAWA, Akira SUGAHARA, Yasumasa KATO
  • Patent number: 8304081
    Abstract: The invention relates to a process for making a SiO2—RExOy—Al2O3 glass comprising preparing a glass according to a conventional process wherein the conventional process comprises a step of heat treating a mixture of SiO2, RExOy, and Al2O3 at a temperature greater than the spinodal temperature for 0.1 to 10 hours wherein RExOy is a rare earth oxide and RE is a rare earth element chosen from Sc, Y, La, Ce, Pr, Nd, Pm, Sm, Eu, Gd, Tb, Dy, Ho, Er, Tm, Yb, Lu, and combinations thereof. The invention also relates to glasses prepared by the process and glass lasers, optical amplifiers and laminated glass that comprise the glass prepared by the process.
    Type: Grant
    Filed: October 16, 2007
    Date of Patent: November 6, 2012
    Assignees: Rensselaer Polytechnic Institute, Sekisui Chemical Co., Ltd.
    Inventors: Minoru Tomozawa, Bungo Hatta
  • Patent number: 8263511
    Abstract: A fused silica glass article having a low absolute refractive index and low concentrations of hydroxyl groups, halogens, and metal having a low absolute refractive index. The glass article contains less than about 10 ppm protium-containing and deuterium-containing hydroxyl groups by weight and less than about 20 ppm halogens by weight. The silica glass article also has an absolute refractive index (ARI) less than or equal to 1.560820. In one embodiment, the ARI of the fused silica article is achieved by lowering the fictive temperature of the fused silica. A method of lowering the fictive temperature is also described.
    Type: Grant
    Filed: December 22, 2009
    Date of Patent: September 11, 2012
    Assignee: Corning Incorporated
    Inventors: Carlos Duran, Richard Michael Fiacco, Kenneth Edward Hrdina, Daniel Raymond Sempolinski
  • Publication number: 20120182622
    Abstract: The present invention provides a synthetic silica glass for an optical member in which not only a fast axis direction in an optical axis direction is controlled, and a birefringence in an off-axis direction is reduced, but a magnitude of a birefringence in the optical axis direction is controlled to an arbitrary value, such that an average value of a value BR cos 2?xy defined from a birefringence BR and a fast axis direction ?xy as measured from a parallel direction to the principal optical axis direction is defined as an average birefringence AveBR cos 2?xy, and when a maximum value of a birefringence measured from a vertical direction to the principal optical axis direction of the optical member is defined as a maximum birefringence BRmax in an off-axis direction, the following expression (1-1) and expression (2-1) are established: ?1.0?AveBR cos 2?xy<0.0??(1-1) 0.0?BRmax?1.0??(2-1).
    Type: Application
    Filed: February 7, 2012
    Publication date: July 19, 2012
    Applicant: Asahi Glass Company, Limited
    Inventors: Masaaki TAKATA, Long Shao, Kei Iwata, Tomonori Ogawa
  • Patent number: 8196807
    Abstract: Method of identifying a container (1) obtained by a process comprising the following steps: (A) starting from a blank (2) of the container (1), at least part of the said container (1) is formed; (B) a two-dimensional or three-dimensional marking zone (4), the temperature of which is maintained at a value below the glass transformation temperature of the constituent substrate, is provided in or on the substrate of the blank (2) and, in the said marking zone (4), an identification code (5) is reproduced by illumination (6) of the said marking zone (4) with at least one beam (7) of coherent monochromatic localized electromagnetic radiation to which the substrate is at least partially transparent, the said beam (7) being operated and controlled in order to remove or modify the constituent substrate of the wall (3) and to leave the identification code (5), in positive or negative form, in the said wall so that the said code is readable; and (C) at least the said marking zone (4) is annealed so as at least to reduc
    Type: Grant
    Filed: April 26, 2006
    Date of Patent: June 12, 2012
    Assignee: Becton Dickinson France S.A.S.
    Inventor: Jean-Pierre Grimard
  • Publication number: 20120121857
    Abstract: The present invention relates to a process for production of a TiO2—SiO2 glass body, comprising a step of, when an annealing point of a TiO2—SiO2 glass body after transparent vitrification is taken as T1(° C.), holding the glass body after transparent vitrification in a temperature region of from T1?90(° C.) to T1?220(° C.) for 120 hours or more.
    Type: Application
    Filed: November 14, 2011
    Publication date: May 17, 2012
    Applicant: Asahi Glass Company, Limited
    Inventors: Akio Koike, Takahiro Mitsumori, Yasutomi Iwahashi, Tomonori Ogawa
  • Publication number: 20120100341
    Abstract: The present invention relates to a process for production of a TiO2—SiO2 glass body, comprising: a step of, when an annealing point of a TiO2—SiO2 glass body after transparent vitrification is taken as T1 (° C.), heating the glass body after transparent vitrification at a temperature of T1+400° C. or more for 20 hours or more; and a step of cooling the glass body after the heating step up to T1?400 (° C.) from T1 (° C.) in an average temperature decreasing rate of 10° C./hr or less.
    Type: Application
    Filed: November 18, 2011
    Publication date: April 26, 2012
    Applicant: Asahi Glass Company, Limited
    Inventors: Akio KOIKE, Takahiro Mitsumori, Yasutomi Iwahashi, Tomonori Ogawa
  • Publication number: 20120000247
    Abstract: A method for processing a coated glass substrate may include a high-temperature activation process.
    Type: Application
    Filed: June 28, 2011
    Publication date: January 5, 2012
    Inventors: Daniel Burgard, Joshua Conley, James Hinkle, Stephen Murphy, Thomas Truman
  • Patent number: 8034731
    Abstract: The present invention is to provide a TiO2—SiO2 glass whose coefficient of linear thermal expansion at the time of irradiating with high EUV energy light becomes substantially zero when used as an optical member of an exposure tool for EUVL. The present invention relates to a TiO2-containing silica glass, having a fictive temperature of 1,000° C. or lower, a OH concentration of 600 ppm or higher, a temperature at which the coefficient of linear thermal expansion becomes 0 ppb/° C. of from 40 to 110° C., and an average coefficient of linear thermal expansion in the temperature range of 20 to 100° C., of 50 ppb/° C. or lower.
    Type: Grant
    Filed: August 24, 2010
    Date of Patent: October 11, 2011
    Assignee: Asahi Glass Company, Limited
    Inventors: Akio Koike, Yasutomi Iwahashi, Shinya Kikugawa
  • Publication number: 20110209503
    Abstract: A method of making a fused silica article having a combined concentration of protium and deuterium in a range from about 1×1016 molecules/cm3 up to about 6×1019 molecules/cm3. In some embodiments, deuterium is present in an amount greater than its natural isotopic abundance. The method includes the steps of providing a fused silica boule, diffusing at least one of protium and deuterium into the boule, and annealing the boule to form the fused silica article. A method of diffusing hydrogen into fused silica and a fused silica article loaded with hydrogen formed by the method are also described.
    Type: Application
    Filed: May 12, 2011
    Publication date: September 1, 2011
    Inventors: Michael A. Mueller, Michael Thomas Murtagh
  • Patent number: 7980098
    Abstract: To optimize an optical component of synthetic quartz glass, in the case of which a quartz glass blank is subjected to a multistage annealing treatment, with respect to compaction and central birefringence, the present invention suggests a method comprising the following steps: (a) a first treatment phase during which the quartz glass blank is treated in an upper temperature range between 1130° C. and 1240° C., (b) cooling the quartz glass blank at a first-higher-mean cooling rate to a quenching temperature below 1100° C., a fictive temperature with a high mean value of 1100° C. or more being reached in the quartz glass, (c) a second treatment phase which comprises cooling of the quartz glass blank at a second-lower-mean cooling rate, and in which the quartz glass blank is treated in a lower temperature range between 950° C. and 1100° C. such that a fictive temperature is reached in the quartz glass with a low mean value which is at least 50° C.
    Type: Grant
    Filed: April 18, 2008
    Date of Patent: July 19, 2011
    Assignee: Heraeus Quarzglas GmbH & Co. KG
    Inventors: Bodo Kuehn, Steffen Kaiser, Denis Kassube, Kerstin Merget
  • Patent number: 7954340
    Abstract: When a synthetic quartz glass substrate is prepared from a synthetic quartz glass block, (I) the block has a hydrogen molecule concentration of 5×1017-1×1019 molecules/cm3, (II) the substrate has a hydrogen molecule concentration of 5×1015-5×1017 molecules/cm3, (III) the substrate has an in-plane variation of its internal transmittance at 193.4 nm which is up to 0.2%, and (IV) the substrate has an internal transmittance of at least 99.6% at 193.4 nm. The synthetic quartz glass substrate has a high transmittance and a uniform transmittance distribution, and is adapted for use with excimer lasers, particularly ArF excimer lasers.
    Type: Grant
    Filed: April 2, 2009
    Date of Patent: June 7, 2011
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Hisatoshi Otsuka, Kazuo Shirota, Osamu Sekizawa
  • Publication number: 20110123710
    Abstract: To provide a process to improve acid resistance of a glass substrate for an information recording medium. A process for producing a glass substrate for an information recording medium, comprising processing a glass formed into a plate by a float process, a down-draw method or a press method, wherein, in cooling of the glass in the last step where the glass has a temperature of at least its strain point, the time during which the glass temperature is at least its strain point and at most a temperature where the glass viscosity is 1010 dPa·s is at least 13 minutes.
    Type: Application
    Filed: October 21, 2010
    Publication date: May 26, 2011
    Applicant: Asahi Glass Company, Limited
    Inventors: Jun ENDO, Tetsuya Nakashima
  • Publication number: 20110092354
    Abstract: A method of making a silica glass having a uniform fictive temperature. The glass article is heated at a target fictive temperature, or heated or cooled at a rate that is less than the rate of change of the fictive temperature, for a time that is sufficient to allow the fictive temperature of the glass to come within 3° C. of the target fictive temperature. The silica glass is then cooled from the target fictive temperature to a temperature below the strain point of the glass at a cooling rate that is greater than the relaxation rate of the glass at the target fictive temperature. The silica glass has a fictive temperature that varies by less than 3° C. after the annealing step. A silica glass made by the method is also described.
    Type: Application
    Filed: October 12, 2010
    Publication date: April 21, 2011
    Inventors: Carlos Duran, Kenneth Edward Hrdina, Ulrich Wilhelm Heinz Neukirch
  • Publication number: 20110048075
    Abstract: The disclosure describes a method by which the Tzc of a silica-titania glass article, for example, a EUVL mirror substrate, can be tuned to within a specification range by means of a selected final anneal that shifts Tzc of the article or substrate to the desired Tzc value. In addition, since different mirrors in a set can be specified at different values of Tzc, this process can be on used glass samples or pieces from a single glass boule to make parts with different Tzc values, thus reducing the number of separate boules required to fill an order.
    Type: Application
    Filed: August 26, 2010
    Publication date: March 3, 2011
    Inventors: Carlos Duran, Kenneth Edward Hrdina
  • Publication number: 20100330377
    Abstract: The invention relates to a device for forming aerosol, the device comprising at least one gas-dispersing atomizer for atomizing a liquid into aerosol by means of gas at an atomizing head of the atomizer and an atomizing chamber, which is in flow connection with the atomizing head and in which flow restraints are arranged for changing the hydrodynamic properties of the aerosol flow discharging from the atomizing head. According to the present invention the flow restraints are arranged in the inner walls of the atomizing chamber in such a manner that they protrude from the inner walls to the inside of the atomizing chamber.
    Type: Application
    Filed: June 30, 2010
    Publication date: December 30, 2010
    Applicant: BENEQ OY
    Inventors: Joonas ILMARINEN, Markku RAJALA, Tomi VALKEAPÄÄ, Kai ASIKKALA
  • Patent number: 7827824
    Abstract: A synthetic quartz glass substrate having (i) an OH concentration of 1-100 ppm and a hydrogen molecule concentration of 1×1016-1×1019 molecules/cm3, (ii) an in-plane variation of its internal transmission at wavelength 193.4 nm which is up to 0.2%, and (iii) an internal transmission of at least 99.6% at wavelength 193.4 nm is suited for use with excimer lasers.
    Type: Grant
    Filed: September 6, 2007
    Date of Patent: November 9, 2010
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Hisatoshi Otsuka, Kazuo Shirota, Osamu Sekizawa
  • Patent number: 7749930
    Abstract: An ideal quartz glass for a wafer jig for use in an environment having an etching effect is distinguished by both high purity and high resistance to dry etching. To indicate a quartz glass that substantially fulfills these requirements, it is suggested according to the invention that the quartz glass is doped with nitrogen at least in a near-surface area, has a mean content of metastable hydroxyl groups of less than 30 wt ppm and that its fictive temperature is below 1250° C. and its viscosity is at least 1013 dPa·s at a temperature of 1200° C. An economic method for producing such a quartz glass comprises the following method steps: melting an SiO2 raw material to obtain a quartz glass blank, the SiO2 raw material or the quartz glass blank being subjected to a dehydration measure, heating the SiO2 raw material or the quartz glass blank to a nitriding temperature in the range between 1050° C. and 1850° C.
    Type: Grant
    Filed: March 30, 2006
    Date of Patent: July 6, 2010
    Assignee: Heraeus Quarzglas GmbH & Co. KG
    Inventors: Juergen Weber, Tobias Pogge, Martin Trommer, Bodo Kuehn, Ulrich Kirst, Waltraud Werdecker
  • Publication number: 20100126221
    Abstract: A process for making glass sheet with low compaction suitable for high temperature applications, such as low-temperature polysilicon-based TFT displays, and glass sheets thus made. The glass sheet desirably has an anneal point of at least 765° C., a CTE at most 42×10?7/° C. The process involves cooling the glass melt form a temperature corresponding to a viscosity of 1.0×1010 poise to a temperature corresponding to a viscosity of 1.0×1015 poise at a cooling rate CR, where CR?5° C./second. The absolute value of the measured compaction of the glass sheet desirably is at most 175 ppm upon being re-heated to 675° C. for a period of time.
    Type: Application
    Filed: January 22, 2009
    Publication date: May 27, 2010
    Inventors: Paul Stephen Danielson, Adam James Ellison, Timothy J. Kiczenski
  • Publication number: 20090056381
    Abstract: A method of making a fused silica article having a combined concentration of protium and deuterium in a range from about 1×1016 molecules/cm3 up to about 6×1019 molecules/cm3. In some embodiments, deuterium is present in an amount greater than its natural isotopic abundance. The method includes the steps of providing a fused silica boule, diffusing at least one of protium and deuterium into the boule, and annealing the boule to form the fused silica article. A method of diffusing hydrogen into fused silica and a fused silica article loaded with hydrogen formed by the method are also described.
    Type: Application
    Filed: June 16, 2008
    Publication date: March 5, 2009
    Inventors: Michael A. Mueller, Michael Thomas Murtagh
  • Publication number: 20090042710
    Abstract: There are provided glass-ceramics comprising, in mass %, 50-60% SiO2, 22-26% Al2O3 and 3-5% Li2O, having an average crystal grain diameter exceeding 100 nm, and having an average linear thermal expansion coefficient of 30×10?7/° C. or below within a temperature range of 0° C. to 50° C. These glass-ceramics are manufactured by a step of melting glass raw materials, a step of forming the molten glass, a step of annealing the formed glass, a first heat treating step for heat treating the annealed glass at a temperature of 650-750° C. for 0.1 hour to 200 hours, and a second heat treating step for heat treating the glass at a temperature of 800-1000° C. for 0.1 hour to 50 hours.
    Type: Application
    Filed: January 26, 2006
    Publication date: February 12, 2009
    Applicant: KABUSHIKI KAISHA OHARA
    Inventor: Hiroyuki Minamikawa
  • Publication number: 20090004088
    Abstract: To optimize an optical component of synthetic quartz glass, in the case of which a quartz glass blank is subjected to a multistage annealing treatment, with respect to compaction and central birefringence, the present invention suggests a method comprising the following steps: (a) a first treatment phase during which the quartz glass blank is treated in an upper temperature range between 1130° C. and 1240° C., (b) cooling the quartz glass blank at a first-higher-mean cooling rate to a quenching temperature below 1100° C., a fictive temperature with a high mean value of 1100° C. or more being reached in the quartz glass, (c) a second treatment phase which comprises cooling of the quartz glass blank at a second-lower-mean cooling rate, and in which the quartz glass blank is treated in a lower temperature range between 950° C. and 1100° C. such that a fictive temperature is reached in the quartz glass with a low mean value which is at least 50° C.
    Type: Application
    Filed: April 18, 2008
    Publication date: January 1, 2009
    Applicant: Heraeus Quarzglas GmbH & Co. KG
    Inventors: Bodo Kuehn, Steffen Kaiser, Denis Kassube, Kerstin Merget
  • Patent number: 7363777
    Abstract: A convection compatible closed cassette and method are described herein where the closed cassette is used to heat treat (compact) one or more glass sheets in a uniform manner and in a clean environment. In the preferred embodiment, the closed cassette includes multiple enclosed sections that are supported by a mounting structure in a manner where there is an open passageway between the major surfaces of each pair of the supported enclosed sections. And, each enclosed section is designed to hold and support multiple glass sheets in a manner where there is a space between the major surfaces of each pair of the supported glass sheets. In operation, the closed cassette is placed into an oven (e.g., lehr, batch kiln) so that hot/cold unfiltered air can flow across the major surfaces of each enclosed section and uniformly heat/cool the enclosed glass sheets.
    Type: Grant
    Filed: March 5, 2004
    Date of Patent: April 29, 2008
    Assignee: Corning Incorporated
    Inventor: Ronald A. Davidson
  • Patent number: 7213415
    Abstract: In a process for producing an air-quench-toughened glass plate, defective glass plates containing nickel sulfide (NiS) are removed by compulsory breaking the glass plates. Such compulsory breakage is carried out in the course of a batch-manner soaking process carried out after a toughening step; in the course of a toughening step carried out after generation of cracks in an annealing step; in the course of a toughening step carried out after generation of cracks in a pretreatment step; or in the course of a continuous annealing step carried out after a toughening step. Through the method, NiS-free toughened glass plates of high-quality can be produced.
    Type: Grant
    Filed: June 13, 2003
    Date of Patent: May 8, 2007
    Assignee: Nippon Sheet Glass Company, Limited
    Inventors: Chihiro Sakai, Masashi Kikuta, Masayuki Maenaka
  • Patent number: 7207193
    Abstract: A method of fabricating a glass sheet comprises modifying the thermal stress in the glass such that it is a tensile stress or substantially zero stress in a particular temperature zone of the glass, with that zone selected such that the glass sheet is formed substantially free of warping. In an example embodiment, the modifying of the thermal stress is effected by non-uniform cooling of the glass across the glass transition temperature range. This non-uniform cooling may be applied in cooling segments that are linear and at least two of the segments have differing slope.
    Type: Grant
    Filed: December 8, 2003
    Date of Patent: April 24, 2007
    Assignee: Corning Incorporated
    Inventors: May Xun, Gautam Meda
  • Patent number: 7162894
    Abstract: The invention relates to the loading of quartz glass objects with hydrogen in an annealing process in a furnace for improving the homogeneity of the refractive index and the laser resistance while, at the same time, maintaining a specified stress birefringence of each of the glass objects. Initially, the distribution of the refractive index, the stress birefringence, the distribution of the hydrogen and the differences in refractive index, which are to the equalized, are determined in the respective glass object, after which the hydrogen change, which is necessary for equalizing the refractive index, is determined. Furthermore, the annealing temperature and its holding time, as well as the hydrogen concentration and the hydrogen pressure in the furnace are adjusted to achieve a sufficiently equalized distribution of refractive index.
    Type: Grant
    Filed: August 30, 2002
    Date of Patent: January 16, 2007
    Assignee: Schott Glas
    Inventors: Rolf Martin, Gordon Von Der Goenna
  • Patent number: 7128944
    Abstract: The invention relates to thermally tempered safety glass comprising an non-abrasive and porous SiO2 layer which is stable during sintering and has a refractive index of between 1.25 and 1.40. The inventive safety glass can be obtained by coating standard soda-lime glass with an aqueous coating solution having a pH value of between 3 and 8 and containing between 0.5 and 5.0 wt. % of [SiOx(OH)y]n particles (0<y<4 and 0<x<2) having a particle size of between 10 and 60 nm, and a surfactant mixture. The coated glass is then dried, thermally hardened at temperatures of at least 600° C. for several minutes, and thermally tempered by a flow of air.
    Type: Grant
    Filed: October 17, 2001
    Date of Patent: October 31, 2006
    Assignee: Flabeg Solarglas GmbH & Co., KG
    Inventors: Hans-Joachim Becker, Armin Dauwalter, Andreas Gombert, Walther Glaubitt, Thomas Hofmann, Monika Kursawe
  • Patent number: 7111477
    Abstract: An object is to provide a method for producing an optical synthetic quartz glass and an optical synthetic glass, having a birefringence of lower than 0.5 nm/cm and having favorable refractive index distribution, yet without lowering the productivity, as well as to provide an annealing furnace suitably used in practicing said method. In a step of raising the temperature of a columnar optical synthetic quartz glass preform to a temperature of from 800° C. to 1200° C., and after keeping for a definite time, lowering the temperature, the temperature is lowered with a temperature difference of from 1 to 20° C. between the temperature of the light transmitting surface of the optical synthetic quartz glass preform and the temperature of the outer peripheral side surface of the optical synthetic quartz glass preform at temperature-lowering rates of from 2 to 50° C./hour, respectively.
    Type: Grant
    Filed: December 16, 2002
    Date of Patent: September 26, 2006
    Assignees: Heraeus Quarzglas GmbH & Co. Kg, Shin-Etsu Quartz Products Co., Ltd.
    Inventors: Takayuki Oshima, Akira Fujinoki