Having Gas Feeding Or Withdrawal Means Patents (Class 65/530)
  • Patent number: 5713979
    Abstract: An induction-heated furnace, suitable for heat treatment of synthetic silica bodies, under conditions of high purity, includes a tubular susceptor (1) disposed with its axis vertical and an induction coil (3) for raising the temperature of the susceptor. The susceptor is made from graphite and/or silicon carbide, and is enclosed within a vacuum envelope (2) made from vitreous silica or fused quartz, the envelope being surrounded by the induction coil which is liquid-cooled. The design is such that the vacuum envelope (2) operates at temperatures below those at which either devitrification or sagging of the envelope might occur even when the tubular susceptor (1) is heated to a temperature of 1700.degree. C. Thus sintering of a porous synthetic silica body (9) can be carried out under atmospheric or reduced pressure, the furnace including a shaft (7) adapted to support the body to be heated and capable of rotation about and movement along said vertical axis of the tubular susceptor (1).
    Type: Grant
    Filed: November 10, 1994
    Date of Patent: February 3, 1998
    Assignee: TSL Group PLC
    Inventors: Robert Nicholson, Bernard Phillipe Robert Poullain, Ian George Sayce
  • Patent number: 5707415
    Abstract: A vaporizer (film evaporator) (13) for halide-free, silicon-containing liquid reactants used in producing preforms is provided. The vaporizer includes a plurality of packed-bed columns (22) surrounding a central tube (24). A mixture of liquid reactant, e.g., octamethylcyclotetrasiloxane, and gas, e.g., oxygen, is sprayed onto the top surfaces (54) of the columns (22) by a set of spray nozzles (32). The liquid reactant and the gas flow downward together through the columns and are heated by hot oil (28) which flows around the columns' walls (50). The liquid reactant evaporates into the gas until the dew point temperature is reached, at which point all of the liquid reactant will have been converted into vapor. The vapor/gas mixture exits the bottom surfaces 56 of columns (22), where its direction of flow changes from downward to upward. This change in flow direction separates higher molecular weight species (46) from the vapor/gas mixture.
    Type: Grant
    Filed: December 22, 1995
    Date of Patent: January 13, 1998
    Assignee: Corning Incorporated
    Inventor: Michael B. Cain
  • Patent number: 5601629
    Abstract: A fiberglass product usable as an end product or an intermediate product is formed as a pack in a forming station but only 1/7th of the conventional quantity of binder is applied. After curing to a self-sustaining form, additional binder is added in an amount in excess of the amount required in the final product and then the excess binder and moisture is removed by one or more stripping steps. Additional moisture is removed by electronic means to the desired moisture level for commercial products.
    Type: Grant
    Filed: December 16, 1994
    Date of Patent: February 11, 1997
    Inventor: Clarence H. Helbing
  • Patent number: 5443611
    Abstract: A thread is formed of one or a plurality of fans of continuous filaments on which a sizing composition is deposited. The moisture content on the thread is controlled by subjecting the fans of filaments to a current of air transversely to the direction of movement of the filaments between the zone in which the size is deposited and the zone in which the filaments are gathered together.
    Type: Grant
    Filed: December 13, 1993
    Date of Patent: August 22, 1995
    Assignee: Vetrotex France
    Inventors: Yvan Salvador, Dominique Gerard, Eric Huet
  • Patent number: 5352261
    Abstract: There is provided an apparatus for the production of a hermetically coated optical fiber in which a glass preform for an optical fiber is melt drawn in a melt drawing furnace to produce a bare optical fiber which is passed to a reactor where a feed gas is supplied and the bare optical fiber is coated with a thin carbon coating made from the feed gas by the Chemical Vapor Deposition method characterized in that the reactor comprises an upper portion to which the feed gas is supplied, a middle portion in which the CVD method is substantially carried out and a lower portion from which an exhausted gas is withdrawn, and a cross sectional area of the middle portion perpendicular to a longitudinal direction of the optical fiber is larger than that of the upper portion.
    Type: Grant
    Filed: May 25, 1993
    Date of Patent: October 4, 1994
    Assignee: Sumitomo Electric Industries, Ltd.
    Inventors: Haruhiko Aikawa, Katsuya Nagayama, Toshio Danzuka
  • Patent number: 5338328
    Abstract: A mass production method and apparatus of hermetic coating optical fiber where a bare fiber drawn from a preform is hermetically coated by CVD method in a reactor vessel, wherein a liquid flushes solid particles or by-products sticking to the reactor inner wall. The liquid may be supplied continuously or intermittently, to flush carbon particles generated during carbon coating process. The invention enables to produce a long hermetic coating optical fiber without choking the reactor, and improves a yield rate and productivity.
    Type: Grant
    Filed: November 9, 1993
    Date of Patent: August 16, 1994
    Assignee: Sumitomo Electric Industries, Ltd.
    Inventors: Haruhiko Aikawa, Yoichi Ishiguro, Toshio Danzuka