Abstract: A gas ionizer includes a photocatalyst activated with an electric field to emit electrons. The photocatalyst is also illuminated with an ultraviolet light source. The ionized gas is passed through a chamber between the photocatalyst and the ultraviolet light source. The photocatalyst may be titanium oxide.

Abstract: One embodiment of an improved ozone generator is comprehensively disclosed by descriptions of computer generated drawings depicting the first commercial version of the invention, which combines the following features: an extruded base with longitudinal channels for receiving connections at distributed points; an extruded cover for detachably engaging the base at each opposing sides and covering a substantial portion of said base; a central baffle that is integral with the cover fro dividing the enclosed volume into a reaction chamber and a circuitry chamber; one or more ultraviolet light sources mounted to connection points on a channel within the reaction chamber; electronic circuitry mounted to connection points on a channel within the circuitry chamber for controlling and transforming an input voltage to drive the light sources; sliding end caps secured to channels in the base for separately covering apertures formed by the ends of the cover and base and for detachably connecting the cover to the base; and

Abstract: The invention relates to a gas liquid contactor and effluent cleaning system and method and more particularly to individually fed nozzle banks including an array of nozzles configured to produce uniformly spaced flat liquid jets shaped to minimize disruption from a gas. An embodiment of the invention is directed towards a gas liquid contactor having a plurality of modules including a liquid inlet and outlet and a gas inlet and outlet. An array of nozzles is in communication with the liquid inlet and the gas inlet. The array of nozzles is configured to produce uniformly spaced flat liquid jets shaped to minimize disruption from a gas flow and maximize gas flow and liquid flow interactions while rapidly replenishing the liquid.

Abstract: Aspects include a valve comprising a flowing liquid, operable to control a flow of gas through a port. Certain aspects include reaction chambers operable to react gases, and in some aspects gases are substantially contained within an envelope comprised of a flowing liquid. Certain embodiments control gas entrance into a chamber with a valve comprised of a flowing liquid controlling gas flow through a port. Various gas scrubbing systems are described, including systems comprising reaction chambers operable to react gases that yield substantial amounts of solid reaction products. Methods for controlling gas flow are disclosed. Systems and methods include sequential steps of wet-scrubbing, reacting and further wet-scrubbing a gas stream.

Abstract: An air cleaning apparatus is disclosed which, in one embodiment, has: an inlet for ambient air; an outlet for purified air; a mechanism for the uptake of a scrubbing liquor and for the removal of impurities dissolved or dispersed in the ambient air by contact with said scrubbing liquor; an inlet for feeding a scrubbing liquor from a scrubbing liquor feeding tank; an outlet for discharging used scrubbing liquor; and a blower for drawing ambient air into the apparatus, flowing the air through the apparatus and discharging the purified air from the apparatus. A kit including an apparatus as described above and a refill of scrubbing liquor ingredients, or of a scrubbing liquor concentrate or of a ready-to-use scrubbing liquor is also disclosed.

Abstract: A method of reducing PFC emissions during a semiconductor manufacturing process that includes a set of sub-processes each of which produces at least one PFC includes the steps of exhausting PFC's produced by each sub-process to a common line to form a combined exhaust stream, treating the combined exhaust stream from each sub-process using a separate PFC abatement system, combining the treated exhaust streams to form a combined treated stream, and wet scrubbing the combined treated stream.

Abstract: A method for the scrubbing of noxious substances from an exhaust gas stream from an evacuated process chamber containing a tool for the processing of semiconductor devices. The method comprises directing the stream from the chamber in to a duct containing a multi-way valve and selectively adjusting the valve to cause different fractions of the stream to be directed to relevant treatment/collection/exhaust points.