Abstract: A filter member is movable between a first position and a second position when passage of air through the filter member is obstructed.

Abstract: A system in one embodiment includes a barrier; an inverted cone in the barrier; and a member under the inverted cone and having dimensions that cause solids passing therealong between the member and the barrier to have about a constant velocity profile thereacross. A method for purging a gas from a solid/gas mixture according to one embodiment includes adding solids to a barrier having an inverted cone therein and a member under the inverted cone, wherein the solids passing along the member have about a constant vertical velocity profile thereacross; and injecting a purge gas into the solids from at least one point adjacent the member.

Abstract: Described is a device for conditioning a comminuted light alloy feedstock to heat and remove impurities from the feedstock. The conditioner device includes a reaction chamber having a substrate feed port for feeding the comminuted light alloy feedstock into the reaction chamber and a discharge port for allowing the conditioned feedstock to exit the reaction chamber. A scrubber gas baffle is positioned at one end of the reaction chamber and coupled to a scrubber gas injector which is configured to inject a scrubber gas through the scrubber gas baffle at a volume and rate of flow sufficient to fluidize the feedstock in the reaction chamber. A scrubber gas heater is also provided for heating the scrubber gas to a temperature sufficient to condition the feedstock as desired.

Abstract: A continuous pressure letdown system connected to a hopper decreases a pressure of a 2-phase (gas and solid) dusty gas stream flowing through the system. The system includes a discharge line for receiving the dusty gas from the hopper, a valve, a cascade nozzle assembly positioned downstream of the discharge line, a purge ring, an inert gas supply connected to the purge ring, an inert gas throttle, and a filter. The valve connects the hopper to the discharge line and controls introduction of the dusty gas stream into the discharge line. The purge ring is connected between the discharge line and the cascade nozzle assembly. The inert gas throttle controls a flow rate of an inert gas into the cascade nozzle assembly. The filter is connected downstream of the cascade nozzle assembly.

Abstract: A semiconductor manufacturing process facility requiring use therein of air exhaust for its operation, such facility including clean room and gray room components, with the clean room having at least one semiconductor manufacturing tool therein, and wherein air exhaust is flowed through a region of the clean room. The facility includes an air exhaust treatment apparatus arranged to (i) receive air exhaust after flow thereof through said region of said clean room, (ii) produce a treated air exhaust, and (iii) recirculate the treated air exhaust to an ambient air environment in the facility, e.g., to the gray room of the facility.

Abstract: Integrated separation and preparation process comprising a gas separation process wherein a first component is separated from a mixture of components by diffusion of the first component through a porous partition into a stream of sweeping component; and a preparation process wherein the sweeping component is used as feed. Separation unit and device for use in such a process and industrial set-up for use in such a process.

Abstract: Method for supplying a high purity gas product comprising providing a first gas stream including a major component and at least one impurity component, determining the concentration of the at least one impurity component, and comparing the concentration so determined with a reference concentration for that component. When the value of the concentration so determined is less than or equal to the reference concentration, the first gas stream is utilized to provide the high purity gas product. When the value of the concentration so determined is greater than the reference concentration, a second gas stream comprising the major component is provided and the first and second gas streams are mixed to yield a mixed gas stream having a concentration of the at least one impurity component that is less than the reference concentration.

Abstract: A vacuum/reduced pressure refining vessel (1) is connected, by an upstream duct (5) to a dry dust collector (3) that uses a filter (2). The dry dust collector (3) is connected to a reduced pressure evacuating apparatus (4) by a downstream duct (6), and a block valve (7) is provided in the upstream duct (5). At the start of a vacuum/reduced pressure refining treatment, a non-oxidizing gas is injected into the upstream duct at a position that is upstream of the block valve (7) to substantially replace the oxygen in the upstream duct and to hermetically close the upstream duct. After the hermetically closed state has been established in the upstream duct, the block valve (7) is opened and operation of the dry dust collector (3) is started.

Abstract: A method for the scrubbing of noxious substances from an exhaust gas stream from an evacuated process chamber containing a tool for the processing of semiconductor devices. The method comprises directing the stream from the chamber in to a duct containing a multi-way valve and selectively adjusting the valve to cause different fractions of the stream to be directed to relevant treatment/collection/exhaust points.

Abstract: A clog-resistant inlet structure for introducing a particulate solids-containing and/or solids-forming gas stream to a gas processing system, including: a gas-permeable wall enclosing a gas flow path, and an outer annular jacket circumscribing the gas-permeable wall to define an annular gas reservoir therebetween; and a flow passage for introducing a gas into the annular gas reservoir during the flow of the particulate solids-containing and/or solids-forming gas stream to a gas processing system through such inlet structure at a pressure sufficient to cause the gas to permeate through the gas-permeable wall to combat the deposition or formation of solids on the interior surface of the gas-permeable wall. The inlet structure may further optionally include a downstream annular section in which the wall surface bounding the gas stream is blanketed with a falling liquid film, to combat solids deposition or formation on the blanketed wall surface.