Abstract: A steam strainer having two support rings spaced from each other in a longitudinal direction and multiple adjacent, ring segment-shaped strainer elements which have a large number of through-holes, are each detachably secured to the support rings and extend between these support rings to form a lateral surface, wherein the side edges of directly adjacent strainer elements abut each other.

Abstract: An air filtering device and an air cleaning system of a semiconductor manufacturing apparatus to reduce cost and increase manufacturing productivity. The air filtering device may include a frame having an open aperture coupled to an air supply line. A buffer frame configured to be inserted into the frame may include a plurality of slot parts, each slot part having a plurality of air in/out apertures through which air may flow in or out from the buffer frame. A plurality of filters may be releasably fastened to the plurality of slot parts to filter pollution material contained in air flowing through the air in/out apertures. An air interrupter for interrupting air flowing through the air in/out apertures may be used when replacing the plurality of filters, thereby providing purified air to the semiconductor manufacturing apparatus during the replacement.

Abstract: The present invention relates to a process and a device for eliminating particles from a stream of fluid, having a channel for turbulent flow of the fluid and a series of objects placed along the channel.

Abstract: An edge filter assembly is disclosed. The edge filter assembly may include a housing having an inlet and an outlet. The edge filter assembly may further include a filter element disposed within the housing including first and second filter plates and first and second spacers disposed between the first and second filter plates. The spacers and filter plates may be configured and arranged to form a flow channel extending generally radially within the housing and defined between the first and second filter plates and the first and second spacers. The flow channel may have an inner flow gate and an outer flow gate. The inner flow gate may be disposed radially inward of the outer flow gate and may have a different cross-sectional configuration than the outer flow gate. The first filter plate may have an axial projection extending therefrom generally aligned with a fluid path within the housing.

Abstract: The present invention relates to a process and a device for eliminating particles from a stream of fluid, having a channel for turbulent flow of the fluid and a series of objects placed along the channel.

Abstract: An apparatus for removing particles from a fluid stream includes an unobstructed channel for conveying a stream in turbulent flow and a series of objects extending at least along one side of the channel, the objects being closely spaced from each other in the direction of flow so as to define therebetween spaces in which eddies penetrate from the channel to cause collection of particles on surfaces of the objects upon decay of the eddies.

Abstract: The present invention relates to a process and a device for eliminating particles from a stream of fluid, having a channel for turbulent flow of the fluid and a series of objects placed along the channel.

Abstract: The present invention relates to an enhanced exclusion filter having a cylindrical stack of substantially identical annular disks and a central rotating element. Each annular disk engages the rotating element by at least one strut which extends inward from the inner perimeter of the annular disk toward the central axis of the cylindrical stack. Protuberances extend from the annular disks and engage depressions in adjacent annular disks to maintain the spacing between adjacent annular disks. Dimples extending through the annular disks may be utilized to form a depression on one surface of an annular disk and a protuberance on the opposite surface of the annular disk. The annular disks are angularly offset by a fixed amount from the adjacent annular disks so that rough vane surfaces are formed by the struts of the annular disks. Preferably a pattern of substantially identical angular offsets is used.

Abstract: A flow control device (FCD) controls low flow rate fluid flow to within closely tolerated and consistently maintained limits by way of improved stacked disc technology. Stacking face to face of similar disc configurations generates novel enhanced etched disc stacks allowing course and fine flow adjustments, maintenance of cleanliness, resistance to flow degradation, improved structural strength and the ability to make real time flow adjustments during mission life. A stainless/copper sandwiched embodiment seals face to face leakage faster than known means for controlling etched disc face to face seal designs.