On An Electrically Insulating Substrate Patents (Class 977/723)
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Patent number: 11543380Abstract: A semiconductor sensor-based near-patient diagnostic system and related methods.Type: GrantFiled: November 14, 2019Date of Patent: January 3, 2023Assignee: FemtoDx, Inc.Inventors: Pritiraj Mohanty, Shyamsunder Erramilli
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Patent number: 8986980Abstract: A technique is provided for a structure. A substrate has a nanopillar vertically positioned on the substrate. A bottom layer is formed beneath the substrate. A top layer is formed on top of the substrate and on top of the nanopillar, and a cover layer covers the top layer and the nanopillar. A window is formed through the bottom layer and formed through the substrate, and the window ends at the top layer. A nanopore is formed through the top layer by removing the cover layer and the nanopillar.Type: GrantFiled: May 11, 2012Date of Patent: March 24, 2015Assignee: International Business Machines CorporationInventors: Gustavo A. Stolovitzky, Deqiang Wang
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Patent number: 8946680Abstract: A tunnel field effect transistor (TFET) includes a source region, the source region comprising a first portion of a nanowire; a channel region, the channel region comprising a second portion of the nanowire; a drain region, the drain region comprising a portion of a silicon pad, the silicon pad being located adjacent to the channel region; and a gate configured such that the gate surrounds the channel region and at least a portion of the source region.Type: GrantFiled: August 10, 2012Date of Patent: February 3, 2015Assignee: International Business Machines CorporationInventors: Sarunya Bangsaruntip, Isaac Lauer, Amlan Majumdar, Jeffrey Sleight
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Patent number: 8699206Abstract: Methods and apparatus for storing information or energy. An array of nano vacuum tubes is evacuated to a pressure below 10?6 Torr, where each nano vacuum tube has an anodic electrode, a cathodic electrode spaced apart from the anodic electrode, and an intervening evacuated region. An excess of electrons is stored on the cathodic electrode.Type: GrantFiled: October 20, 2010Date of Patent: April 15, 2014Assignee: The Board of Trustees of the University of IllinoisInventors: Alfred W. Hubler, Onyeama Osuagwu
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Patent number: 8692385Abstract: Device for connecting nano-objects to external electrical systems, and method for producing the device. According to the invention, which applies in particular to molecular characterization, a device including the following is produced: an upper layer equipped with upper contact pads to be connected to a nano-object; a lower layer, equipped with lower contact pads to be connected to an external electrical system; above the lower layer, a bonding layer including electrical through-vias in contact with the lower pads; and, between the bonding layer and the upper layer, at least two layers equipped with conductive lines and electrical vias, for connecting the upper pads to the lower pads.Type: GrantFiled: December 5, 2011Date of Patent: April 8, 2014Assignee: Commissariat a l'energie atomique et aux energies alternativesInventors: Aurélie Thuaire, Xavier Baillin, Nicolas Sillon
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Patent number: 8580586Abstract: A memory array includes a plurality of memory cells, each of which receives a bit line, a first word line, and a second word line. Each memory cell includes a cell selection circuit, which allows the memory cell to be selected. Each memory cell also includes a two-terminal switching device, which includes first and second conductive terminals in electrical communication with a nanotube article. The memory array also includes a memory operation circuit, which is operably coupled to the bit line, the first word line, and the second word line of each cell. The circuit can select the cell by activating an appropriate line, and can apply appropriate electrical stimuli to an appropriate line to reprogrammably change the relative resistance of the nanotube article between the first and second terminals. The relative resistance corresponds to an informational state of the memory cell.Type: GrantFiled: January 15, 2009Date of Patent: November 12, 2013Assignee: Nantero Inc.Inventors: Claude L. Bertin, Frank Guo, Thomas Rueckes, Steven L. Konsek, Mitchell Meinhold, Max Strasburg, Ramesh Sivarajan, X. M. Henry Huang
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Patent number: 8536015Abstract: In accordance with aspects of the invention, a method of forming a metal-insulator-metal stack is provided. The method includes forming a first conducting layer, forming a resistivity-switching carbon-based material above the first conducting layer, and forming a second conducting layer above the carbon-based material, wherein the carbon-based material has a thickness of not more than ten atomic layers. Other aspects are also described.Type: GrantFiled: January 17, 2012Date of Patent: September 17, 2013Assignee: SanDisk 3D LLCInventors: Roy E. Scheuerlein, Alper Ilkbahar, April D. Schricker
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Patent number: 8492838Abstract: Shallow trenches are formed around a vertical stack of a buried insulator portion and a top semiconductor portion. A dielectric material layer is deposited directly on sidewalls of the top semiconductor portion. Shallow trench isolation structures are formed by filling the shallow trenches with a dielectric material such as silicon oxide. After planarization, the top semiconductor portion is laterally contacted and surrounded by the dielectric material layer. The dielectric material layer prevents exposure of the handle substrate underneath the buried insulator portion during wet etches, thereby ensuring electrical isolation between the handle substrate and gate electrodes subsequently formed on the top semiconductor portion.Type: GrantFiled: November 16, 2009Date of Patent: July 23, 2013Assignee: International Business Machines CorporationInventors: Robert H. Dennard, Marwan H. Khater, Leathen Shi, Jeng-Bang Yau
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Patent number: 8414831Abstract: A chlorine gas sensor system includes carbon nanotubes at least partially coated with a metal oxide deposited on a substrate, and a source of infra-red light positioned to illuminate at least a portion of the coated nanotubes.Type: GrantFiled: June 10, 2009Date of Patent: April 9, 2013Assignee: The University of ToledoInventor: Ahalapitiya H. Jayatissa
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Patent number: 8405063Abstract: A component including a substrate, at least one layer including a color conversion material including quantum dots disposed over the substrate, and a layer including a conductive material (e.g., indium-tin-oxide) disposed over the at least one layer. (Embodiments of such component are also referred to herein as a QD light-enhancement substrate (QD-LES).) In certain preferred embodiments, the substrate is transparent to light, for example, visible light, ultraviolet light, and/or infrared radiation. In certain embodiments, the substrate is flexible. In certain embodiments, the substrate includes an outcoupling element (e.g., a microlens array). A film including a color conversion material including quantum dots and a conductive material is also provided. In certain embodiments, a component includes a film described herein. Lighting devices are also provided. In certain embodiments, a lighting device includes a film described herein.Type: GrantFiled: January 20, 2010Date of Patent: March 26, 2013Assignee: QD Vision, Inc.Inventors: Peter T. Kazlas, Seth Coe-Sullivan
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Patent number: 8358010Abstract: A method for realizing a nanometric circuit architecture includes: realizing plural active areas on a semiconductor substrate; realizing on the substrate a seed layer of a first material; realizing a mask-spacer of a second material on the seed layer in a region comprised between the active areas; realizing a mask overlapping the mask-spacer and extending in a substantially perpendicular direction thereto; selectively removing the seed layer exposed on the substrate; selectively removing the mask and the mask-spacer obtaining a seed-spacer comprising a linear portion extending in that region and a portion substantially orthogonal thereto; realizing by MSPT from the seed-spacer an insulating spacer reproducing at least part of the profile of the seed-spacer; realizing by MSPT a nano-wire of conductive material from the seed-spacer or insulating spacer, the nano-wire comprising a first portion at least partially extending in the region and a second portion contacting a respective active area.Type: GrantFiled: February 28, 2005Date of Patent: January 22, 2013Assignee: STMicroelectronics S.r.l.Inventors: Danilo Mascolo, Gianfranco Cerofolini
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Patent number: 8344295Abstract: Techniques for providing heat to a small area and apparatus capable of providing heat to a small area are provided.Type: GrantFiled: October 14, 2009Date of Patent: January 1, 2013Assignee: Korea University Research and Business FoundationInventors: Kwangyeol Lee, Donghoon Choi
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Patent number: 8343815Abstract: A tunnel field effect transistor (TFET) includes a source region, the source region comprising a first portion of a nanowire; a channel region, the channel region comprising a second portion of the nanowire; a drain region, the drain region comprising a portion of a silicon pad, the silicon pad being located adjacent to the channel region; and a gate configured such that the gate surrounds the channel region and at least a portion of the source region.Type: GrantFiled: May 11, 2010Date of Patent: January 1, 2013Assignee: International Business Machines CorporationInventors: Sarunya Bangsaruntip, Isaac Lauer, Amlan Majumdar, Jeffrey Sleight
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Patent number: 8300420Abstract: A circuit substrate includes an electrically conductive layer having electrically conductive patterns formed therein, an insulating layer having a through hole, and a composite layer positioned between the electrically conductive layer and the insulating layer. The through hole is configured for having an electronic component mounted thereon. The composite layer includes a polymer matrix and at least one carbon nanotube bundle embedded in the polymer matrix. One end of the at least one carbon nanotube bundle contacts the electrically conductive patterns, and the other is exposed in the through hole of the insulation layer.Type: GrantFiled: May 24, 2009Date of Patent: October 30, 2012Assignee: Zhen Ding Technology Co., Ltd.Inventors: Chung-Jen Tsai, Hung-Yi Chang, Chia-Cheng Chen, Meng-Chieh Hsu, Cheng-Hsien Lin
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Publication number: 20120181507Abstract: A semiconductor structure including an ordered array of parallel graphene nanoribbons located on a surface of a semiconductor substrate is provided using a deterministically assembled parallel set of nanowires as an etch mask. The deterministically assembled parallel set of nanowires is formed across a gap present in a patterned graphene layer utilizing an electric field assisted assembly process. A semiconductor device, such as a field effect transistor, can be formed on the ordered array of parallel graphene nanoribbons.Type: ApplicationFiled: January 19, 2011Publication date: July 19, 2012Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATIONInventors: Christos D. Dimitrakopoulos, Alfred Grill, Timothy J. McArdle
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Patent number: 8206505Abstract: The inventive method for forming nano-dimensional clusters consists in introducing a solution containing a cluster-forming material into nano-pores of natural or artificial origin contained in a substrate material and in subsequently exposing said solution to a laser radiation pulse in such a way that a low-temperature plasma producing a gaseous medium in the domain of the existence thereof, wherein a cluster material is returned to a pure material by the crystallization thereof on a liquid substrate while the plasma is cooling, occurs, thereby forming mono-crystal quantum dots spliced with the substrate material. Said method makes it possible to form two- or three-dimensional cluster lattices and clusters spliced with each other from different materials. The invention also makes it possible to produce wires from different materials in the substrate nano-cavities and the quantum dots from the solution micro-drops distributed through an organic material applied to a glass.Type: GrantFiled: November 29, 2005Date of Patent: June 26, 2012Inventors: Sergei Nikolaevich Maximovsky, Grigory Avramovich Radutsky
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Patent number: 8183576Abstract: Light-emitting diodes, and methods of manufacturing the light-emitting diode, are provided wherein a plurality of nano-rods may be formed on a reflection electrode. The plurality of nano-rods extend perpendicularly from an upper surface of the reflection electrode. Each of the nano-rods includes a first region doped with a first type dopant, a second region doped with a second type dopant that is an opposite type to the first type dopant, and an active region between the first region and the second region. A transparent insulating layer may be formed between the plurality of nano-rods. A transparent electrode may be formed on the plurality of nano-rods and the transparent insulating layer.Type: GrantFiled: April 14, 2009Date of Patent: May 22, 2012Assignee: Samsung Electronics Co., Ltd.Inventors: Bokki Min, Youngsoo Park, Taek Kim, Junyoun Kim
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Patent number: 8110476Abstract: In accordance with aspects of the invention, a method of forming a memory cell is provided, the method including forming a steering element above a substrate, and forming a memory element coupled to the steering element, wherein the memory element comprises a carbon-based material having a thickness of not more than ten atomic layers. The memory element may be formed by repeatedly performing the following steps: forming a layer of a carbon-based material, the layer having a thickness of about one monolayer, and subjecting the layer of carbon-based material to a thermal anneal. Other aspects are also described.Type: GrantFiled: April 6, 2009Date of Patent: February 7, 2012Assignee: SanDisk 3D LLCInventors: Roy E. Scheuerlein, Alper Ilkbahar, April D. Shricker
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Patent number: 8101953Abstract: A thin film transistor includes a source electrode, a drain electrode, a semiconducting layer, and a gate electrode. The drain electrode is spaced from the source electrode. The semiconducting layer is connected to the source electrode and the drain electrode. The gate electrode is insulated from the source electrode, the drain electrode, and the semiconducting layer by an insulating layer. The semiconducting layer includes at least two stacked carbon nanotube films. Each carbon nanotube film includes an amount of carbon nanotubes. At least a part of the carbon nanotubes of each carbon nanotube film are aligned along a direction from the source electrode to the drain electrode.Type: GrantFiled: April 2, 2009Date of Patent: January 24, 2012Assignees: Tsinghua University, Hon Hai Precision Industry Co., Ltd.Inventors: Kai-Li Jiang, Qun-Qing Li, Shou-Shan Fan
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Sieving media from planar arrays of nanoscale grooves, method of making and method of using the same
Patent number: 8088282Abstract: Disclosed herein are an apparatus and a method for separating molecules on the basis of size and or structure, and to a method of making the apparatus. Generally, the separation method includes passing a fluid comprising particles having different effective molecular diameters through a plurality of open, nanoscale channels disposed in surfaces of substrates. The method also includes obtaining a plurality of fractions of the passed fluid such that each of the fractions includes a major portion containing particles having similar size and shape and substantially free of particles having larger size and shape. The apparatus includes first and second substrates each of which has a surface containing a plurality of open, nanoscale channels disposed therein. The surfaces are bonded together such that each of the channels of the first substrate is in fluid communication with at least two of the channels of the second substrate and is misaligned relative to the channels of the second substrate.Type: GrantFiled: February 9, 2011Date of Patent: January 3, 2012Assignee: Intel CorporationInventor: Scott Sibbett -
Patent number: 7990751Abstract: A nanogap switching element is equipped with an inter-electrode gap portion including a gap of a nanometer order between a first electrode and a second electrode. A switching phenomenon is caused in the inter-electrode gap portion by applying a voltage between the first and second electrodes. The nanogap switching element is shifted from its low resistance state to its high resistance state by receiving a voltage pulse application of a first voltage value, and shifted from its high resistance state to its low resistance state by receiving a voltage pulse application of a second voltage value lower than the first voltage value. When the nanogap switching element is shifted from the high resistance state to the low resistance state, a voltage pulse of an intermediate voltage value between the first and second voltage values is applied thereto before the voltage pulse application of the second voltage value thereto.Type: GrantFiled: December 18, 2008Date of Patent: August 2, 2011Assignees: Funai Electric Advanced Applied Technology Research Institute Inc., National Institute of Advanced Industrial Science and Technology, Funai Electric Co., Ltd.Inventors: Yuichiro Masuda, Shigeo Furuta, Tsuyoshi Takahashi, Tetsuo Shimizu, Yasuhisa Naitoh, Masayo Horikawa
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Patent number: 7972900Abstract: The present invention provides methods of forming metal oxide semiconductor nanostructures and, in particular, zinc oxide (ZnO) semiconductor nanostructures, possessing high surface area, plant-like morphologies on a variety of substrates. Optoelectronic devices, such as photovoltaic cells, incorporating the nanostructures are also provided.Type: GrantFiled: April 16, 2010Date of Patent: July 5, 2011Assignee: University of Utah Research FoundationInventors: Ashutosh Tiwari, Michael R. Snure
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Patent number: 7955559Abstract: Nanoelectronic devices for the detection and quantification of biomolecules are Provided. In certain embodiments, the devices are configured to detect and measure blood glucose levels. Also provided are methods of fabricating nanoelectronic devices for the detection of biomolecules.Type: GrantFiled: June 25, 2008Date of Patent: June 7, 2011Assignee: Nanomix, Inc.Inventors: Kanchan A. Joshi, Ray Radtkey, Christian Valcke
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Patent number: 7947542Abstract: A method for making a thin film transistor, the method comprising the steps of: (a) providing a carbon nanotube array and an insulating substrate; (b) pulling out a carbon nanotube film from the carbon nanotube array by using a tool; (c) placing at least one carbon nanotube film on a surface of the insulating substrate, to form a carbon nanotube layer thereon; (d) forming a source electrode and a drain electrode; wherein the source electrode and the drain electrode being spaced therebetween, and electrically connected to the carbon nanotube layer; and (e) covering the carbon nanotube layer with an insulating layer, and a gate electrode being located on the insulating layer.Type: GrantFiled: April 2, 2009Date of Patent: May 24, 2011Assignees: Tsinghua University, Hon Hai Precision Industry Co., Ltd.Inventors: Kai Liu, Kai-Li Jiang, Shou-Shan Fan
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Sieving media from planar arrays of nanoscale grooves, method of making and method of using the same
Patent number: 7906026Abstract: Disclosed herein are an apparatus and a method for separating molecules on the basis of size and or structure, and to a method of making the apparatus. Generally, the separation method includes passing a fluid comprising particles having different effective molecular diameters through a plurality of open, nanoscale channels disposed in surfaces of substrates. The method also includes obtaining a plurality of fractions of the passed fluid such that each of the fractions includes a major portion containing particles having similar size and shape and substantially free of particles having larger size and shape. The apparatus includes first and second substrates each of which has a surface containing a plurality of open, nanoscale channels disposed therein. The surfaces are bonded together such that each of the channels of the first substrate is in fluid communication with at least two of the channels of the second substrate and is misaligned relative to the channels of the second substrate.Type: GrantFiled: December 1, 2008Date of Patent: March 15, 2011Assignee: Intel CorporationInventor: Scott Sibbett -
Patent number: 7884488Abstract: A structure and method of forming low cost bond pads is described. In one embodiment, the invention includes depositing an insulating layer over a last metal line of a substrate and forming an opening in the insulating layer. A colloid is printed over the insulating layer and fills the opening in the insulating layer. A conductive via and bond pads are formed by heating the colloid.Type: GrantFiled: May 1, 2008Date of Patent: February 8, 2011Assignee: Qimonda AGInventor: Harry Hedler
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Patent number: 7838933Abstract: A method of depositing elongated nanostructures that allows accurate positioning and orientation is described. The method involves printing or otherwise depositing elongated nanostructures in a carrier solution. The deposited droplets are also elongated, usually by patterning the surface upon which the droplets are deposited. As the droplet evaporates, the fluid flow within the droplets is controlled such that the nanostructures are deposited either at the edge of the elongated droplet or the center of the elongated droplet. The described deposition technique has particular application in forming the active region of a transistor.Type: GrantFiled: December 22, 2006Date of Patent: November 23, 2010Inventors: Michael L. Chabinyc, William S. Wong
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Patent number: 7776425Abstract: A non-vacuum-based, non-collodial chemistry-based method of synthesizing metal nanoparticles and nanoparticle-nanostructured material composites obtained by that method. An embodiment of the method of this invention for fabricating a nanoparticle-nanostructured material composite and synthesizing nanoparticles includes preparing a nanostructured/nanotextured material, and, contacting the nanostructured/nanotextured material with a solution. Nanoparticles are synthesized on the nanostructured/nanotextured material as a result of the contact. The method of the present invention can be utilized to fabricate SPR and SERS substrates for sensing and detection. Additional systems based on this approach (e.g., surface plasmon resonance absorption and alloying sensors and nanocatalysts) are described.Type: GrantFiled: January 21, 2004Date of Patent: August 17, 2010Assignee: The Penn State Research FoundationInventors: Ali Kaan Kalkan, Stephen J. Fonash
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Patent number: 7696477Abstract: In one aspect of the present invention, an electric-field-enhancement structure is disclosed. The electric-field-enhancement structure includes a substrate and an ordered arrangement of dielectric particles having at least two adjacent dielectric particles spaced from each other a controlled distance. The controlled distance is selected so that when a resonance mode is excited in each of the at least two adjacent dielectric particles responsive to excitation electromagnetic radiation, each of the resonance modes interacts with each other to result in an enhanced electric field between the at least two adjacent dielectric particles. Other aspects of the present invention are electric-field-enhancement apparatuses that utilize the described electric-field-enhancement structures, and methods of enhancing an electric field between adjacent dielectric particles.Type: GrantFiled: March 14, 2007Date of Patent: April 13, 2010Assignee: Hewlett-Packard Development Company, L.P.Inventors: Mihail Sigalas, R. Stanley Williams, David A. Fattal, Shih-Yuan Wang, Raymond G. Beausoleil
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Patent number: 7550823Abstract: A nonvolatile memory cell is capable of reducing an excessive current leakage due to a rough surface of a polysilicon and of performing even at a low temperature process by forming the first oxide film including a silicon oxynitride (SiOxNy) layer using nitrous oxide plasma and by forming a plurality of silicon nanocrystals in a nitride film by implanting a silicon nanocrystal on the nitride film by an ion implantation method, and a fabricating method thereof and a memory apparatus including the nonvolatile memory cell.Type: GrantFiled: July 13, 2007Date of Patent: June 23, 2009Assignee: Samsung Mobile Display Co., Ltd.Inventors: Byoung Deog Choi, Jun Sin Yi, Sung Wook Jung, Sung Hyung Hwang
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Patent number: 7545241Abstract: A microstrip line element is composed of a first electrode layer (10) as a substrate which is more of a metal, a dielectric layer (20) formed by oxidizing, nitriding or oxiynitriding the first electrode layer (10), a conductor layer (30) formed on the dielectric layer (20) and a second electrode layer (40) formed on the conductor layer (30). The conductor layer (30) is composed of at least conductive nanoparticles (32) and a binder resin (31).Type: GrantFiled: March 11, 2005Date of Patent: June 9, 2009Assignee: NEC CorporationInventors: Yoshiaki Wakabayashi, Hirokazu Tohya, Kouichi Yamaguchi, Akiji Higuchi, Kenji Yamada
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Patent number: 7538337Abstract: Semiconductor devices may be fabricated using nanowires. In an example embodiment, a conductive gate may be used to control conduction along the nanowires, in which case one of the contacts is a drain and the other a source. The nanowires may be grown in a trench or through-hole in a substrate or in particular in an epitaxial layer on substrate. In another example embodiment, the gate may be provided only at one end of the nanowires. The nanowires can be of the same material along their length; alternatively different materials can be used, especially different materials adjacent to the gate and between the gate and the base of the trench.Type: GrantFiled: June 7, 2005Date of Patent: May 26, 2009Assignee: NXP B.V.Inventors: Erwin A. Hijzen, Erik P. A. M. Bakkers, Raymond J. E. Hueting, Abraham R. Balkenende
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Publication number: 20090057762Abstract: Field-effect transistors (FETs) having nanowire channels are provided. In one aspect, a FET is provided. The FET comprises a substrate having a silicon-on-insulator (SOI) layer which is divided into at least two sections electrically isolated from one another, one section included in a source region and the other section included in a drain region; a channel region connecting the source region and the drain region and including at least one nanowire; an epitaxial semiconductor material, grown from the SOI layer, covering the nanowire and attaching the nanowire to each section of the SOI layer; and a gate over the channel region.Type: ApplicationFiled: September 5, 2007Publication date: March 5, 2009Applicant: International Business Machines CorporationInventors: Sarunya Bangsaruntip, Guy Moshe Cohen, Katherine Lynn Saenger
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Patent number: 7456508Abstract: A hosting structure of nanometric components is described comprising a substrate, a first multi-spacer level comprising a first plurality of spacers including first conductive spacers parallel to each other, and at least a second multi-spacer level realized above said first multi-spacer level and comprising a second plurality of spacers arranged transversally to said first plurality of spacers and including at least a lower discontinuous insulating layer and an upper layer, including in turn second conductive spacers. In particular, each pair of spacers of the second multi-spacer level defines with a spacer of the first multi-spacer level a plurality of nanometric hosting seats having at least a first and a second conduction terminal realized by portions of the first conductive spacers and of the second conductive spacers faced in the hosting seats. A method for manufacturing such a structure is also described.Type: GrantFiled: August 30, 2005Date of Patent: November 25, 2008Assignee: STMicroelectronics S.r.l.Inventors: Danilo Mascolo, Gianfranco Cerofolini, Gianguido Rizzotto
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Patent number: 7453081Abstract: A memory cell includes a first electrode, a second electrode, storage material positioned between the first electrode and the second electrode, and a nanocomposite insulator contacting the storage material.Type: GrantFiled: July 20, 2006Date of Patent: November 18, 2008Assignee: Qimonda North America Corp.Inventors: Thomas Happ, Jan Boris Philipp
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Publication number: 20080280078Abstract: The invention provides a glazing that includes a substrate on which there is provided a coating comprising carbon nanotubes. The glazing can be an IG unit comprising two spaced-apart panes bounding a between-pane space, the IG unit having at least one exterior surface on which there is provided a transparent conductor coating comprising carbon nanotubes. The glazing can alternatively be a laminated glass assembly comprising two panes of glass and an interlayer comprising carbon nanotubes sandwiched therebetween. Monolithic substrate embodiments are also provided. In certain embodiments, the coating comprises both dielectric film and carbon nanotubes.Type: ApplicationFiled: June 29, 2007Publication date: November 13, 2008Inventors: Annette J. Krisko, Keith J. Burrows
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Publication number: 20070232036Abstract: Provided is a product including a group of a plurality of wires, in which longitudinal directions of the wires are arranged in one direction, and a method of producing the same. The longitudinal directions of a plurality of wires each covered with a polymer are arranged in one direction in a solvent, and the plurality of the wires whose longitudinal directions are arranged in one direction is fixed by using the polymer.Type: ApplicationFiled: March 16, 2007Publication date: October 4, 2007Inventors: Morimi Hashimoto, Eiichi Fujii
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Patent number: 7271434Abstract: The present invention discloses a method including providing a substrate; forming a lower conductor over the substrate; forming a conducting nanostructure over the lower conductor; forming a thin dielectric over the conducting nanostructure; and forming an upper conductor over the thin dielectric. The present invention further discloses a device including a substrate; a lower conductor located over the substrate; a conducting nanostructure located over the lower conductor; a thin dielectric located over the conducting nanostructure; and an upper conductor located over the thin dielectric.Type: GrantFiled: December 17, 2003Date of Patent: September 18, 2007Assignee: Intel CorporationInventors: Scot A. Kellar, Sarah E. Kim
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Patent number: 7226856Abstract: An integrated circuit and a method of manufacturing an integrated circuit is provided including providing an integrated circuit having a trench and via provided in a dielectric layer. A nano-electrode-array is formed over the dielectric layer in the trench and via, and a conductor is deposited over the nano-electrode-array. The conductor and the nano-electrode-array are coplanar with a surface of the dielectric layer.Type: GrantFiled: November 15, 2004Date of Patent: June 5, 2007Assignee: KLA-Tencor Technologies CorporationInventors: Sergey D. Lopatin, Robert Fiordalice, Faivel Pintchovski, Igor Ivanov, Wen Z. Kong, Artur Kolics
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Patent number: 7199305Abstract: The invention provides a nanolithographic protosubstrate adapted for nanolithographic formation of nanostructures on the protosubstrate comprising: a substrate having a top surface exposed for nanolithographic formation of nanostructures, wherein the top surface comprises: electrically insulating surface regions; and at least one discreet electrode topology surrounded by the electrically insulating surface regions, wherein the electrode topology is adapted with electrical interconnections for electrically coupling the electrode topology to an external device.Type: GrantFiled: May 23, 2003Date of Patent: April 3, 2007Assignee: NanoInk, Inc.Inventors: Sylvain Cruchon-Dupeyrat, Michael Nelson, Jeff Rendlen, Joseph Fragala
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Patent number: 7157990Abstract: A radio frequency (RF) filter includes a substrate, first and second dielectric layers formed on first and second portions of the substrate, a ground plane formed on a third portion of said substrate, a carbon nanotube array, and first and second electrodes. The third portion of the substrate includes, at least in part, the area between the first and second portions thereof. The carbon nanotube array is formed on a portion of said ground plane between the first and second dielectric layers. The first and second electrodes are formed on the first and second dielectric layers, such that an RF signal may be input to and output from the carbon nanotube array via the first and second signal guides. A third electrode is disposed over the carbon nanotube array and is used to voltage bias the array.Type: GrantFiled: May 21, 2004Date of Patent: January 2, 2007Assignee: Northrop Grumman CorporationInventors: John Douglas Adam, Robert Miles Young
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Patent number: 7110299Abstract: A memory is described which has memory cells that store data using hot electron injection. The data is erased through electron tunneling. The memory cells are described as floating gate transistors wherein the floating gate is fabricated using a conductive layer of nanocrystalline silicon particles. Each nanocrystalline silicon particle has a diameter of about 10 ? to 100 ?. The nanocrystalline silicon particles are in contact such that a charge stored on the floating gate is shared between the particles. The floating gate has a reduced electron affinity to allow for data erase operations using lower voltages.Type: GrantFiled: January 3, 2005Date of Patent: September 19, 2006Assignee: Micron Technology, Inc.Inventor: Leonard Forbes
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Patent number: 7109072Abstract: The silicon wires formed around metal particles by crystal growth have the problem of metal pollution. For its solution, in the present invention, a silicon bridge is formed through standard silicon processes such as the lithography and the wet etching using hydrofluoric acid performed to an SOI substrate. Thereafter, a thermal oxide film is desirably formed at a high temperature to form a high-quality gate insulating film. It is also desirable to form a coaxial gate electrode. Then, after burying the bridge sections of the silicon bridge in a resist film, the silicon on the bridge girders is removed, and thereafter, the silicon wires buried in the resist film are collected. In this manner, the silicon wires can be collected without dispersing into the hydrofluoric acid solution. Then, a transistor using the silicon wires as a channel is formed.Type: GrantFiled: March 7, 2005Date of Patent: September 19, 2006Assignee: Hitachi, Ltd.Inventors: Shinichi Saito, Tadashi Arai, Seong-Kee Park, Toshiyuki Mine